201007350 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種光罩盒之承栽盒，特別係有關於一種於光 罩盒之承載盒中配置缓衝定位裝置’用以固定承載盒中的光罩盒。 【先前技術】 近代半導體科技發展迅速，其中光學微影技術（0ptical Lithography)扮演重要的角色，只要是關於圖形（pattern)定義，皆需 ©仰賴光學微影技術。光學微影技術在半導體的應用上，是將設計好 的線路製作成具有特定形狀可透光之光罩(phGtGmask)e利用曝光原 理，則光源通過光罩投影至矽晶圓（siHc〇n wafer)可曝光顯示特定圖 案。由於任何附著於光罩上的塵埃顆粒（如微粒、粉塵或有機物）都會 造成投影成像的品質劣化1於產生圖形的光罩必須保持絕對潔 淨’因此在-般的晶圓製程中，都提供無塵室⑷娜r_)的環境以 避免空氣中的顆粒污染。然而，目前的無塵室也無法達到絕對無塵 狀態。現代的半導體製程皆利用抗污染的光罩盒和純p〇d)進行光 罩的保存與運輸，以使光罩保持潔淨。 巾目前最為普遍的運送光罩方式，通f是祕單—個光軍存放 於單-個光罩盒當中，再將多個光罩盒一同放置於一個光罩盒之運 輸盒’並於光罩盒之運輸的盒内充填軟性物f (如泡棉海棉等），減 少光罩盒之運輸盒的盒内間隙，並藉此加強並固定各個光罩盒，以 避免光罩盒之運輸盒於運送光罩盒途中所產生的震動，影響存放於 光罩盒令的光罩而導致光罩之摩擦或損壞。然而，就光罩供應商而 言，出貨時除了需將光罩盒固定安置於光罩盒之運輸盒内以外，還 必須以人工方式將軟性物質充填於光罩盒之運輸盒並確保盒内不 會有過多個間隙；就光罩需求方而言，欲取出光罩盒時也必須先 6 201007350 . 以人工方式將充填於光罩盒之運輸盒盒内的軟性物質取出，才得以 取出光罩盒，並且還需針對這些用來充填用的軟性物質加以處裡， 因此。供需雙方除了都需耗費時間與人力成本進行軟性物質的包裝 與拆卸以外，若將這些使用過的軟性物質直接丟棄而不重複使用， 這些無法自行分解的軟性物質又將對環境造成污染。 【發明内容】 為了解決上述問題，本發明之主要目的在於提供一種將緩衝定 位裝置配置於光罩盒之承載盒中，用以固定承載盒中的光罩盒，以 ©使承載盒中的光罩盒具有較佳之防震與保護效果。 本發明之另一主要目的在於提供一種光罩盒之承載盒，其緩衝 定位裝置具有較佳之防止光罩摩擦或損壞，並減少塵粒的產生。 本發明之又一主要目的在於提供一種緩衝定位裝置，其具有較 佳之彈性結構，可有效釋放應力。 本發明之還有一主要目的在於提供一種緩衝定位裝置，其具有 較為簡單之裝設方式，且易於取出。 依據上述目的，本發明提供一種配置於光罩盒之承載盒中的緩 Λ衝定位裝置。此光罩盒之承載盒包括一具有第一容置空間之上蓋 φ 體，以及一具有第二容置空間之下蓋體，並於下蓋體之容置空間中 配置一緩衝定位裝置，上蓋體與下蓋體蓋合後形成一第三容置空 間，一光罩盒配置於下蓋體之緩衝定位裝置中。其中，緩衝定位裝 置包含一對承載結構及複數個彈性件，承載結構係由一底部以及與 底部連接並向橫向及縱向方向延伸的複數個翼部，複數個彈性件係 與底部連接並向另一相對之縱向彎折以形成複數個彎折部，且這些 彎折部具有一共同平面，而共同平面與下蓋體之底面接觸。 因此，將光罩盒置於承載盒下蓋體的緩衝定位裝置中，並另裝 設一緩衝定位裝置於上蓋體中，當承載盒之上蓋體蓋合於下蓋體 7 201007350 時，緩衝定位裝置可完全包覆於光罩盒之上下方，並可同時在承載 盒與光罩盒之間隙中形成一緩衝保護作用，以避免承載盒於運送光 罩盒途中所產生的震動，影響存放於光罩盒中的光罩而導致光罩之 摩擦或損壞，因此具有較佳之防震與保護效果，並可減少塵粒的產 生。 【實施方式】 由於本發明係揭露一種光罩盒之承載盒，特別是一種於光罩盒 之承載盒中配置緩衝定位裝置，並藉由這些緩衝定位裝置來固定承 G 載盒中的光罩盒。由於，本發明所利用到的一些光罩或光罩盒之詳 細製造或處理過程，係利用現有技術來達成，故在下述說明中，並 不作完整描述。而且下述内文中之圖式，亦並未依據實際之相關尺 寸完整繪製，其作用僅在表達與本創作特徵有關之示意圖。 首先，請參考第1圖，其係根據本發明之緩衝定位裝置之一較 佳實施例示意圖。如第1圖所示，緩衝定位裝置2包含一對承載結 構21以及複數個彈性件22，承載結構21係由一底部211以及與底 部211連接並向橫向及縱向方向延伸的複數個翼部212,複數個彈性 _ 件22係與底部211連接並向另一相對之縱向彎折以形成複數個彎折 部221，且這些彎折部221具有一共同平面。 接著，請參考第2圖，係根據本發明之用以承載光罩盒之承載 盒之一較佳實施例示意圖。很明顯地，此光罩盒之承載盒1包括一 上蓋體11以及一下蓋體12,上蓋體11與下蓋體12各具有一容置空 間，並於下蓋體12之容置空間中配置一緩衝定位裝置2，並且使得 緩衝定位裝置2之彎折部221與下蓋體12之底面相接觸，如第2圖 所示。當上蓋體11與下蓋體12蓋合後形成一較大之容置空間。接 著，將一光罩盒3配置於下蓋體12之緩衝定位裝置2中，故可將光 罩盒3固定於承載盒1，如第3圖所示。 8 201007350 • 承上所述’承載盒1之材質為―高分子塑膠材料，承m 及複數個彈性件22之材質則可為金屬材料或高分子塑膠戰…構 載結構21及複數個彈性件22可利用一體形成的方式製料，且承 明之一較佳實施例中，承載結構21之底部211以及翼部成。在本發 數個分枝元件所形成。此外，另可於承載盒丨之上蓋體^12係由複 間中也配置-個同樣的緩衝定位裝置2(未顯示於圖11的容置空 承載盒i之上蓋體U蓋合於下蓋體12時，緩衝 署因此，當 包2光罩盒3之上方與下方，並可同時在承^ 2完全 間隙中形成一緩衝保護作用，以避免承裁盒1 、、、、光罩盒3之 所產生的震動，影響存放於光罩盒3^送光軍盒3途中 損壞，因此具有較佳之防震與保護效果 ^ 罩之摩擦或 第4圖係根據本發明緩衝定位| ^ ^塵粒的產生。 圖。此緩衝定位裝置2包含承載結構23以 施例之透視 載結構23係由複數個第一底部231以及與第—底部件24,此承 向及縱向方向延伸的複數個翼部232所 "° 連接並向橫 部231以及翼部232 A福數個八姑_从風’承載結構23之第-底201007350 IX. Description of the Invention: [Technical Field] The present invention relates to a housing for a photomask case, and more particularly to a buffer positioning device disposed in a carrying case of a photomask case for fixing a bearing The reticle box in the box. [Prior Art] Modern semiconductor technology has developed rapidly, and optical lithography (Optical Lithography) plays an important role. As long as it is about the definition of a pattern, it is necessary to rely on optical lithography. In the application of semiconductors, the optical lithography technology is to make the designed circuit into a light ray with a specific shape (phGtGmask). Using the exposure principle, the light source is projected through the reticle to the silicon wafer (siHc〇n wafer). ) can display a specific pattern by exposure. Any dust particles (such as particles, dust, or organic matter) attached to the reticle will cause deterioration in the quality of the projected image. 1. The reticle that produces the pattern must remain absolutely clean. Therefore, no one is provided in the general wafer process. Dust chamber (4) Na r_) environment to avoid particle contamination in the air. However, the current clean room cannot reach an absolute dust-free state. Modern semiconductor processes use a contamination-resistant reticle and pure p〇d) to preserve and transport the reticle to keep the reticle clean. The towel is currently the most common way to transport the reticle. The pass is the secret list - a light army is stored in a single-mask box, and then multiple mask boxes are placed together in a transport box of a reticle box. The box transported by the cover box is filled with soft material f (such as foam sponge, etc.), reducing the gap inside the box of the transport box of the mask box, and thereby reinforcing and fixing the respective mask boxes to avoid transport of the mask box The vibration generated by the box on the way of transporting the reticle box affects the reticle stored in the reticle box and causes friction or damage to the reticle. However, as far as the mask supplier is concerned, in addition to fixing the mask box in the transport box of the mask box, it is necessary to manually fill the transport box of the mask box with the soft material and ensure the box. There will be no gaps in the inside; in the case of the reticle demand side, it is necessary to remove the reticle box before the 6 201007350. The soft substance filled in the transport box of the reticle box is manually removed before being taken out. The mask box is also required to be used for these soft substances for filling, and therefore. In addition to the time-consuming and labor-intensive packaging and disassembly of soft materials, both the supply and demand sides will discard the soft materials that are not self-decomposing and will pollute the environment. SUMMARY OF THE INVENTION In order to solve the above problems, a main object of the present invention is to provide a buffer positioning device disposed in a carrying case of a photomask case for fixing a photomask case in a carrying case to enable light in the carrying case The cover box has better shock and protection effects. Another main object of the present invention is to provide a carrying case for a photomask case, the cushioning and positioning device having a better preventing friction or damage of the photomask and reducing the generation of dust particles. Another main object of the present invention is to provide a cushioning positioning device which has a better elastic structure and can effectively release stress. Still another object of the present invention is to provide a buffer positioning device which has a relatively simple mounting method and is easy to remove. In accordance with the above objects, the present invention provides a cushioning positioning device that is disposed in a carrier of a reticle housing. The carrying case of the reticle box includes a cover φ body having a first accommodating space, and a cover body having a second accommodating space, and a buffer positioning device disposed in the accommodating space of the lower cover body, the upper cover The cover body and the lower cover body are combined to form a third accommodating space, and a hood is disposed in the buffer positioning device of the lower cover body. The buffer positioning device comprises a pair of bearing structures and a plurality of elastic members. The bearing structure is a bottom portion and a plurality of wing portions connected to the bottom portion and extending in the lateral direction and the longitudinal direction, and the plurality of elastic members are connected to the bottom portion and are opposite to each other. An opposite longitudinal bend is formed to form a plurality of bends, and the bends have a common plane, and the common plane is in contact with the bottom surface of the lower cover. Therefore, the photomask box is placed in the buffer positioning device of the lower cover of the carrying case, and a buffer positioning device is additionally installed in the upper cover body. When the cover body of the carrying case is covered by the lower cover body 7 201007350, the buffer positioning is performed. The device can be completely covered under the reticle box, and can simultaneously form a buffer protection function in the gap between the carrying case and the reticle box to avoid the vibration generated by the carrying case on the way of transporting the reticle case, affecting the storage The reticle in the mask case causes friction or damage of the reticle, so that it has better shock and protection effects and can reduce the generation of dust particles. [Embodiment] The present invention discloses a carrying case of a photomask case, in particular, a buffer positioning device is disposed in a carrying case of the photomask case, and the photomask in the G carrying case is fixed by the buffer positioning device. box. Since the detailed fabrication or processing of some of the reticle or reticle housings utilized in the present invention is accomplished using the prior art, it will not be fully described in the following description. Moreover, the drawings in the following texts are not completely drawn according to the actual relevant dimensions, and their functions are only to express the schematic diagrams related to the present creative features. First, please refer to Fig. 1, which is a schematic view of a preferred embodiment of a buffer positioning device according to the present invention. As shown in FIG. 1, the buffer positioning device 2 includes a pair of bearing structures 21 and a plurality of elastic members 22. The bearing structure 21 is composed of a bottom portion 211 and a plurality of wing portions 212 connected to the bottom portion 211 and extending in the lateral and longitudinal directions. A plurality of elastic members 22 are coupled to the bottom portion 211 and bent toward the other opposing longitudinal direction to form a plurality of bent portions 221, and the bent portions 221 have a common plane. Next, please refer to FIG. 2, which is a schematic view of a preferred embodiment of a carrying case for carrying a photomask case according to the present invention. It is obvious that the carrying case 1 of the reticle case includes an upper cover body 11 and a lower cover body 12. The upper cover body 11 and the lower cover body 12 each have an accommodating space and are disposed in the accommodating space of the lower cover body 12. The cushioning device 2 is buffered, and the bent portion 221 of the cushioning positioning device 2 is brought into contact with the bottom surface of the lower cover body 12, as shown in Fig. 2. When the upper cover body 11 and the lower cover body 12 are closed, a large accommodating space is formed. Then, a photomask case 3 is placed in the buffer positioning device 2 of the lower cover body 12, so that the photomask case 3 can be fixed to the carrier case 1, as shown in Fig. 3. 8 201007350 • The material of the carrier box 1 is “polymer plastic material, the material of the m and the plurality of elastic members 22 can be metal materials or polymer plastic warfare... the structure 21 and a plurality of elastic members 22 can be formed in an integrally formed manner, and in one preferred embodiment, the bottom portion 211 of the load bearing structure 21 and the wings are formed. It is formed in this branching component. In addition, the cover body 12 can be disposed on the carrying case, and the same buffer positioning device 2 is also disposed in the duplex (the cover U is not shown in the cover empty cover box i of FIG. When the body 12 is used, the buffering unit can form a cushioning protection function in the full gap of the bearing 2 when the bag 2 is above and below the mask case 3, so as to avoid the receiving box 1 , , , and the mask case 3 . The vibration generated by the vibration of the reticle box 3^ is transmitted to the light box 3, so that it has better shock and protection effects. The friction of the cover or the fourth figure is based on the buffering position of the present invention. The buffer positioning device 2 includes a carrier structure 23, and the perspective carrier structure 23 of the embodiment is composed of a plurality of first bottom portions 231 and a plurality of wing portions 232 extending from the first bottom member 24 in the bearing and longitudinal directions. Connected to the transverse 231 and the wing 232 A for a number of eight _ _ from the wind 'bearing structure 23 of the first - bottom
件，藉此可湘連H 這些分枝元件相互連接，以形成一整體之 _233將 ❹ 由複數個第二底部241以及與第二底部2二’ 彈性件24係 向弯折以形成複數個_-，其中，f折部242延 部232延伸之方向為相反之方方向，且這些變折部災具有二共同 平：。：件24之第二底部241以及f折部242亦可為複數個分枝 兀件’藉此可利用連接部243將這些分枝元件相互連接以形成另 -整體之結構，其中，此緩㈣位裝置2可為—體成型的方式製成。 根據上述之緩衝定位裝置2,將-對承載結構23之第—底部231 以十字方式交錯組裝為-承載結構組之整體結構，其交錯組裝所形 成之夾角Ci為約60度〜120度，而最佳之角度為9〇度並將彈性 9 201007350 件24之第二底部241以十字方式交錯組裝為一彈性件組之整體結 構，其交錯組裝所形成之夾角C2為約60度〜120度，而最佳之角度 為90度，再將承載結構23之承載結構組與彈性件24之彈性件組再 次以十字方式交錯組裝，使得承載結構23之第一底部231可固接於 彈性件24之第二底部241上，其中，固接的方式可以焊接固定或以 黏膠固定。 第5A圖係根據本發明承載結構之一較佳實施例示意圖，承載結 構23之翼部232係由具有不同斜率之一第一翼部段232a與一第二 翼部段232b所組成，其中，第一翼部段232a與一第二翼部段232b ® 所形成之夾角C3為約90度〜170度，而最佳之角度為135度或150 度。 本發明另提供一承載結構之另一較佳實施例，承載結構之翼部 係由具有不同斜率之一第一翼部段與一第二翼部段所組成，其中， 第一翼部段與一第二翼部段可為一弧形結構。 第5A圖係根據本發明彈性件之一較佳實施例示意圖，彈性件 24之彎折部242係由具有不同斜率之一第一彎折段242a、一第二彎 折段242b與一第三彎折段242c所組成，因此，此彎折部242為一 ❿近似U型之結構，其中，第一彎折段242a與第三彎折段242c可形 成一夾角之互補角C4為約30度〜90度，而最佳之角度為70度或85 度，第二彎折段242b與第三彎折段242c所形成之夾角C5為約90 度〜170度，而最佳之角度為135度。 第5B圖係根據本發明彈性件之另一較佳實施例示意圖，彈性件 24之彎折部242係由具有不同斜率之一第一彎折段242a、一第二彎 折段242b、一第三彎折段242c以及一第四彎折段242d所組成，因 此，此彎折部242為一近似P型之結構，其中，第一彎折段242a 與第三彎折段242c可形成一夾角之互補角C4為約30度〜90度，而 201007350 最佳之角度為70度或85度，第二彎折段242b與第三彎折段242c 所形成之夾角C5為約90度〜170度，而最佳之角度為135度。 因此，將光罩盒置於承載盒下蓋體的緩衝定位裝置中，並另裝 設一緩衝定位裝置於上蓋體中，當承載盒之上蓋體蓋合於下蓋體 時，緩衝定位裝置可完全包覆於光罩盒之上下方，並可同時在承載 盒與光罩盒之間隙中形成一緩衝保護作用，以避免承載盒於運送光 罩盒途中所產生的震動，影響存放於光罩盒中的光罩而導致光罩之 摩擦或損壞，因此具有較佳之防震與保護效果，並可減少塵粒的產 生。 以上所述僅為本發明之較佳實施例，並非用以限定本發明之權利 範圍；同時以上的描述，對於熟知本技術領域之專門人士應可明瞭 及實施，因此其他未脫離本發明所揭示之精神下所完成的等效改變 或修飾，均應包含在下述之申請專利範圍中。 【圖式簡單說明】 第1圖係緩衝定位裝置之示意圖。 第2圖係於承載盒中配置緩衝定位裝置之示意圖。 第3圖係於承載盒中配置光罩盒之示意圖。 第4圖係緩衝定位裝置之透視圖。 第5A圖係緩衝定位裝置之侧視圖。 第5B圖係緩衝定位裝置之侧視圖。 【主要元件符號說明】 1 承載盒 11 上蓋體 12 下蓋體 2 緩衝定位裝置 11 201007350 21 承載結構 211 底部 212 翼部 22 彈性件 221 彎折部 23 承載結構 231 第一底部 232 翼部 232a 第二翼部段The branching elements are connected to each other to form a unitary _233 which is bent by the plurality of second bottom portions 241 and the second bottom portion 2' elastic members 24 to form a plurality of _-, wherein the direction in which the extension portion 232 of the f-fold portion 242 extends is the opposite direction, and the transition portions have two common levels: The second bottom portion 241 of the member 24 and the f-folded portion 242 may also be a plurality of branching members', whereby the branching members may be connected to each other by the connecting portion 243 to form another-integral structure, wherein The bit device 2 can be made in a body-formed manner. According to the above-mentioned buffer positioning device 2, the first bottom portion 231 of the load-bearing structure 23 is interleaved into a whole structure of the load-bearing structure group in a crosswise manner, and the interlaced angle Ci formed by the staggered assembly is about 60 to 120 degrees. The optimum angle is 9 degrees and the second bottom 241 of the elastic 9 201007350 piece 24 is interlaced into a whole structure of an elastic member group in a cross manner, and the angle C2 formed by the staggered assembly is about 60 degrees to 120 degrees. The optimum angle is 90 degrees, and the load-bearing structure group of the load-bearing structure 23 and the elastic member group of the elastic member 24 are again cross-assembled in a cross manner, so that the first bottom portion 231 of the load-bearing structure 23 can be fixed to the elastic member 24. The second bottom portion 241 is fixed in a manner of being fixed by welding or by adhesive. 5A is a schematic view of a preferred embodiment of a load-bearing structure according to the present invention. The wing portion 232 of the load-bearing structure 23 is composed of a first wing section 232a and a second wing section 232b having different slopes, wherein The angle C3 formed by the first wing section 232a and the second wing section 232b ® is about 90 degrees to 170 degrees, and the optimum angle is 135 degrees or 150 degrees. The present invention further provides another preferred embodiment of a load-bearing structure, wherein the wing portion of the load-bearing structure is composed of a first wing segment having a different slope and a second wing segment, wherein the first wing segment is A second wing section can be an arcuate structure. 5A is a schematic view of a preferred embodiment of the elastic member according to the present invention. The bent portion 242 of the elastic member 24 is composed of a first bent portion 242a, a second bent portion 242b and a third having different slopes. The bent portion 242c is formed. Therefore, the bent portion 242 is a substantially U-shaped structure, wherein the first bent portion 242a and the third bent portion 242c can form an angle complementary to the angle C4 of about 30 degrees. ～90 degrees, and the optimum angle is 70 degrees or 85 degrees, and the angle C5 formed by the second bending section 242b and the third bending section 242c is about 90 degrees to 170 degrees, and the optimum angle is 135 degrees. . 5B is a schematic view of another preferred embodiment of the elastic member according to the present invention. The bent portion 242 of the elastic member 24 is composed of a first bent portion 242a having a different slope, a second bent portion 242b, and a first portion. The third bending portion 242c and the fourth bending portion 242d are formed. Therefore, the bending portion 242 is an approximately P-shaped structure, wherein the first bending portion 242a and the third bending portion 242c can form an angle. The complementary angle C4 is about 30 degrees to 90 degrees, and the optimal angle of 201007350 is 70 degrees or 85 degrees, and the angle C5 formed by the second bending section 242b and the third bending section 242c is about 90 degrees to 170 degrees. And the best angle is 135 degrees. Therefore, the photomask box is placed in the buffer positioning device of the lower cover of the carrying case, and a buffer positioning device is additionally installed in the upper cover body. When the upper cover body of the carrying case is closed to the lower cover body, the buffer positioning device can be It is completely covered on the upper and lower sides of the reticle box, and can simultaneously form a buffer protection function in the gap between the carrying case and the reticle box to avoid the vibration generated by the carrying case on the way of transporting the reticle case, and affecting the storage in the reticle The reticle in the box causes friction or damage of the reticle, so it has better shock and protection effects and can reduce the generation of dust particles. The above description is only the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. The above description should be understood and implemented by those skilled in the art, and thus the other disclosures are not disclosed. Equivalent changes or modifications made in the spirit of the invention are to be included in the scope of the claims below. [Simple description of the drawing] Fig. 1 is a schematic diagram of a buffer positioning device. Figure 2 is a schematic diagram of a buffer positioning device disposed in a carrier box. Figure 3 is a schematic view showing the arrangement of the reticle in the carrying case. Figure 4 is a perspective view of the cushioning positioning device. Figure 5A is a side view of the buffer positioning device. Figure 5B is a side view of the buffer positioning device. [Main component symbol description] 1 Carrying case 11 Upper cover 12 Lower cover 2 Buffering and positioning device 11 201007350 21 Carrying structure 211 Bottom 212 Wing 22 Elastic member 221 Bending portion 23 Carrying structure 231 First bottom 232 Wing 232a Second Wing section
232b 第一翼部段 233 連接部 24 彈性件 241 第二底部 242 彎折部 242a 第一彎折段 242b 第二彎折段 242c 第三彎折段 242d 第四彎折段 243 連接部 3 光罩盒 C1 承載結構底部之夾角 C2 彈性件底部之夾角 C3 第一翼部與一第二翼部段之夾角 C4 第一彎折段與第三彎折段夾角之互補角 C5 第二彎折段與第三彎折段之夾角 12232b first wing section 233 connecting portion 24 elastic member 241 second bottom portion 242 bent portion 242a first bent portion 242b second bent portion 242c third bent portion 242d fourth bent portion 243 connecting portion 3 mask The angle C2 of the bottom of the C1 bearing structure is the angle C3 of the bottom of the elastic member C3 The angle C3 between the first wing and the second wing section C4 The complementary angle C5 of the angle between the first bending section and the third bending section The second bending section The angle between the third bending section 12