TW200951197A - Removable processing film - Google Patents

Removable processing film Download PDF

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Publication number
TW200951197A
TW200951197A TW098108526A TW98108526A TW200951197A TW 200951197 A TW200951197 A TW 200951197A TW 098108526 A TW098108526 A TW 098108526A TW 98108526 A TW98108526 A TW 98108526A TW 200951197 A TW200951197 A TW 200951197A
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Taiwan
Prior art keywords
film
peelable
mass
processed film
adhesive
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TW098108526A
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Chinese (zh)
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TWI450941B (en
Inventor
Kenji Nasu
Akihito Yamada
Yuichi Kurata
Kouji Tabata
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Lintec Corp
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4602Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/414Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2425/00Presence of styrenic polymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00Presence of (meth)acrylic polymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00Presence of polyester
    • C09J2467/006Presence of polyester in the substrate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2479/00Presence of polyamine or polyimide
    • C09J2479/08Presence of polyamine or polyimide polyimide
    • C09J2479/086Presence of polyamine or polyimide polyimide in the substrate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)

Abstract

A removable processing film comprising a substrate film and an adhesive layer formed on one face of the substrate film. The adhesive layer comprises (A) an acrylic copolymer containing 40 to 80 mass% of butyl acrylate unit, 1 to 15 mass% of styrene unit, 1 to 30 mass% of methyl methacrylate unit, 1 to 30 mass % of methyl acrylate unit, 1 to 10 mass% of vinyl monomer unit having hydroxyl group and 0.1 to 1 mass% of vinyl monomer unit having carboxyl group and having a weight-average molecular weight of 300,000 to 1, 000,000 and a molecular distribution (Mw/Mn) of 3.0 or less and (B) an isocyanate closslinking agent. When adherend is a substrate sheet, the processing film can reduce contamination on the side of substrate sheet and can maintain adhesive strength with a sticky sheet applied to the released face after releasing sufficiently high and is applicable even when an adherend is a glass portion exposed to a temperature as high as about 260 DEG C.

Description

200951197 六、發明說明: 【發明所屬之技術領域】 本發明涉及再剝離性加工薄膜,更詳言之,涉及用於 多層印刷配線板之軟性配線板製作用之基材薄片,或適用 於金屬材料或其以外之無機材料,例如電荷耦合裝置或互 補式金屬氧化半導體元件之玻璃部等之具有基材薄膜與設 於其一面之丙烯醯系黏著劑層之再剝離性加工薄膜。 ©【先前技4标】 印刷配線板係藉印刷等形成搭載於其之電器·電子零 件間之連接所需之導體電路圖案於絕緣基板表面或表面與 其內部之配線板。 如此之印刷配線板,從形狀面觀之可大致分爲硬質印 刷配線板與軟性印刷配線板,構造上可分爲單層、2層以 上之多層。 這些印刷配線板之中,軟性印刷配線板係於富柔軟性 ❿ 之絕緣性基材薄片形成導體電路圖案,係爲立體高密度構 裝於電子機器內部之狹窄、具複雜構造之空間內時不可或 缺之基板。如此之軟性印刷配線板係回應近年來之電子機 器類之小型輕量化、高密度化、高精度化等需求之最佳電 子機器用構材之一,其需求快速延伸。 因於該軟性印刷配線板有撓性之要求,作爲絕緣性基 材薄片之塑膠薄片係用例如聚醯亞胺薄片、聚苯硫醚薄片 等耐熱性、絕緣性等優良之塑膠薄片,且於此基材薄片表 面或表面與其內部以銅等金屬材料形成電路圖案。電路圖 200951197 案之形成方法已知除例如僅留下銅面積層板之銅箔的必要 部分,藉蝕刻處理溶解去除其餘部分之減去法以外,有加 成法等。此加成法係僅於基板之必要部分施以鍍敷處理形 成電路圖案之方法,有半加成法與全加成法。 如此之軟性印刷配線板之要求性能除例如尺寸精度、 低翹曲•扭曲率、耐熱性、剝離強度、彎曲強度、高體積 電阻率、耐藥物性、加熱彎曲強度等以外,印刷配線板之 加工適性亦極重要。 Ο 如此之印刷配線板,在上述之電路形成、電器.電子 零件之構裝過程中,爲抑制對該配線板之溶劑污染、異物 混入、瑕疵發生等,一般在進行該等處理以前,先於用在 軟性印刷電路基材製作用之基材薄片貼合再剝離性加工薄 膜。此加工薄膜係於基材薄膜之一面設有可再剝離之黏著 劑層,貼合於軟性印刷配線板用之基材薄片後,經衝切加 工、溶劑浸泡、熱壓等種種加工後,自所製作之軟性印刷 A 配線板剝離。因此,具有可於該加工中不發生浮起、剝落 等,並在剝離後不於被著體(基材薄片)有殘膠,且不致 使被著體發生捲曲之再剝離性至關重要。 因而,本申請人先前於軟性印刷配線板製作用之基材 薄片進行該處理而發現,於製作軟性印刷配線板之過程不 發生滑移、浮起、剝落等,可有效抑制往該配線板表面之 溶劑污染、異物混入、瑕疵發生等,並於剝離後不於被著 體留下殘膠,且不致使被著體發生捲曲之再剝離性加工薄 膜,提出過申請(參照例如專利文獻1)。 200951197 而近年來,伴隨電子機器之高性能化、高速化,於印 刷配線板亦有高密度構裝、高密度配線化之要求,爲滿足 該需求,多層印刷配線板多受矚目。又,最近,隨電器· 電子機器之小型化,多層印刷配線板愈見有薄型化、高密 度化之要求,使用接著薄片(熱硬化性樹脂薄片)之多層 印刷配線板已漸受採用。 製造如此之多層印刷配線板係用例如介著環氧樹脂薄 片等接著性薄片,將設有電路圖案,構裝有電器•電子零 件之軟性印刷配線板與其它軟性印刷配線板疊合之方法。 具體而言,一般係用:以於貼有再剝離性加工薄膜之 基材薄片形成電路圖案,更構裝電器•電子零件,於其上 設包覆薄片(聚醯亞胺薄片等)者爲1單元,剝除該再剝 離性加工薄膜,使露出之基材薄片與其它單元之包覆薄片 相向,於其間插入環氧系樹脂薄片等接著性薄片,疊合該 單元之方法。此一方法中,單元與單元間之接著必須夠高。 而於數位相機、攝影機、照相手機等,近年來搭載有 電荷耦合裝置(CCD)、互補式金屬氧化半導體元件(CMOS) 等固態攝影元件。製造這些CCD、CMOS的製品之際,於 用以受光之玻璃部通常貼有保護用之再剝離性加工薄膜。 該玻璃部有時因迴焊加工等暴露於高溫(例如260 °C左 右),因此,對於用在此用途之再剝離性加工薄膜,有能耐 此溫度之優良耐熱性,例如對於被著體之殘膠、基材薄膜 之變形少之要求。 [專利文獻1]特開2005-28 1 423號公報 200951197 【發明内容】 (發明所欲解決之課題) 該專利文獻1所述之再剝離性加工薄膜,如前敘,以 基材薄片爲被著體貼合時,雖具有不發生滑移、浮起、剝 落等,可有效抑制往該配線板表面之溶劑污染、異物混入、 瑕疵之發生等,且剝除後不易於被著體留下殘膠,不易導 致被著體捲曲等優良特性,但使用在用於多層印刷配線板 之配線板單元時,該再剝離性加工薄膜經剝除之際,有被 ® 著體之基材薄片側受污染,用於積層單元與單元之環氧樹 脂薄片等接著性薄片與該基材薄片之接著力不足之問題, 其改善受到期待。 又,在用於CCD、CMOS之玻璃部之用途,有耐熱性 優良,例如可耐260 °C數分鐘之迴焊加工之再剝離性加工薄 膜之需求。 本發明係於如此狀況下所做,其目的在提供,具有基 材薄膜與設於其一表面之丙烯醯系黏著劑層之再剝離性加 ❹ 工薄膜,係使用於用在多層印刷配線板之軟性印刷配線板 製作用之基材薄片時,該再剝離性加工薄膜經剝除之際, 被著體基材薄片側之污染受抑制,環氧樹脂系樹脂薄片等 接著性薄片與該基材薄片之接著力夠高之再剝離性加工薄 膜,或用於CCD、CMOS之玻璃部時,暴露於260°C左右之 溫度,對於被著體之殘膠、基材薄膜之變形亦少之耐熱性 優良之再剝離性加工薄膜。 (用以解決課題之手段) 本發明人等爲達該目的一再精心探討結果査明,使用 200951197 於用在多層印刷配線板之軟性印刷配線板製作用基材薄片 時,再剝離性加工薄膜經剝除之際,遷移至被著體側之污 染物質,係丙烯醯系黏著劑層中之低聚物成分。本發明人 等爲減少丙烯醯系黏著劑層中該低聚物成分之含量,更重 複硏究結果發現,製造構成該黏著劑層之丙烯醯系黏著劑 之際,控制丙嬙醯系黏著劑中之樹脂成分丙烯醯系共聚物 之分子量分布於某値以下,且較佳者抑制殘留單體含量於 某範圍內,即可減少黏著劑中之低聚物成分含量,並以非 © 矽酮系剝離材用作保護黏著劑層至使用前之剝離劑層,可 得作爲該軟性印刷配線板製作用基材薄片之貼合用之更合 適之再剝離性加工薄膜。 更發現,在CCD、CMOS之玻璃部貼合用時,使用特 定式所規定之儲存彈性模數變化率在某値以下者作爲基材 薄膜,可得耐熱性優良之再剝離性加工薄膜。本發明即係 基於該見解而完成。 亦即,本發明提供 φ [1]—種再剝離性加工薄膜,係具有基材薄膜,與設在該 基材薄膜的一面之黏著劑層之再剝離性加工薄膜’其特徵 爲該黏著劑層係使用含(A)具有丙烯酸丁酯單元40〜80質 量%、苯乙烯單元1〜15質量%、甲基丙烯酸甲酯單元1 〜30質量%、丙烯酸甲酯單元1〜30質量%、含羥基之乙 烯系單體單元1〜10質量%與含羧基之乙烯系單體單元〇.1 〜1質量%之丙烯酸酯系共聚物,及(B)異氰酸酯系交聯 劑,且該丙烯酸酯系共聚物之重量平均分子量Mw係30萬 〜100萬,分子量分布(重量平均分子量Mw/數量平均分子 200951197 量Μη)係3.0以下之黏著劑形成; [2]如[1]之再剝離性加工薄膜,其中(Α)丙烯酸酯系共聚物 中殘留單體之含量佔該(Α)丙烯酸酯系共聚物之5〜20質量 % ; [3 ] —種再剝離性加工薄膜’係積層如[1 ]或[2 ]之再剝離性 加工薄膜與具有非矽酮系剝離劑層之剝離材,使該再剝離 性加工薄膜之黏著劑層相對於該剝離材之剝離劑層之面而 ▲ 成; [4] 如[3]之再剝離性加工薄膜,其中非矽酮系剝離劑層係 聚丙烯樹脂; [5] 如[1]〜[4]中任一之再剝離性加工薄膜,其中黏著劑兼 含甲苯二異氰酸酯系交聯劑與二甲苯二異氰酸酯系交聯劑 作爲異氰酸酯系交聯劑; [6] 如[1]〜[5]中任一之再剝離性加工薄膜,其中以用於多 層印刷配線板之軟性印刷配線板之塑膠薄片用作被著體; φ [7]如[6]之再剝離性加工薄膜,其中 (a) 依JIS Ζ 0237之測定法,對於用於軟性印刷配線板之 塑膠薄片即被著體之保持力,於溫度40°C係70,000秒以 上,且於70,000秒之時,滑移未達0.1mm ; (b) 依JIS Z 023 7之測定法,對於用於軟性印刷配線板之 塑膠薄片即被著體之黏著力,在熱壓前係 0.01〜 0.5N/25mm ; (c) 貼合在用於軟性印刷配線板之塑膠薄片(被著體)後,於 溫度180°C、壓力4.3N/mm2之條件下熱壓60分鐘後之黏著 200951197 力’依JIS Z 0237之測定法,係2.0N/25mm以下,且 (d)黏著劑層之凝膠分率係95%以上; [8] 如[6]或[7]之再剝離性加工薄膜,其中軟性印刷配線板 之塑膠薄片係使用聚醯亞胺薄片或聚苯硫醚薄片而得者; [9] 如[6]〜[8]中任一之再剝離性加工薄膜,其中基材薄膜 係聚對酞酸乙二酯薄膜; [1〇]如[1]〜[4]中任一之再剝離性加工薄膜,其中以金屬 I 材料或其以外之無機材料用作被著體; [11] 如[10]之再剝離性加工薄膜,其中被著體係電荷耦合 裝置或互補式金屬氧化膜半導體元件之玻璃部; [12] 如[1]〜[4]、[10]或[11]中任一之再剝離性加工薄膜, 其中黏著劑係以二甲苯二異氰酸酯系交聯劑用作異氰酸酯 系交聯劑而得者; [13] 如[1]〜[4]、[10]〜[12]中任一之再剝離性加工薄膜, 其中基材薄膜於23°C之儲存彈性模數爲G’23,260°C之儲存 φ 彈性模數爲G’26。時,下述式之儲存彈性模數變化率X係85 %以下, X(%)= [(G’23— G’26〇)/G’23]x100 及 [14] 如[1]〜[8]、[10]〜[13]中任一之再剝離性加工薄膜, 其中基材薄膜係聚醯亞胺薄膜。 (發明效果) 依本發明可提供具有基材薄膜,與設在其一面之丙烯 醯系黏著劑層之再剝離性加工薄膜,其係(1)使用在用於 -10- 200951197 多層印刷配線板之軟性印刷配線板製作用基材薄片時,該 再剝離性加工薄膜經剝除之際,可抑制被著體基材薄片側 之污染,環氧樹脂薄片等接著性薄片與該基材薄片之接著 力下降可予抑制之再剝離性加工薄膜。並可提供,(2)用 於金屬材料或其以外之無機材料,例如CCD、CMOS之玻 璃部等時,暴露於260°C左右之溫度,對於被著體之殘膠、 基材薄膜之變形仍少之耐熱性優良之再剝離性加工薄膜。 【實施方式】 (實施發明之最佳形態) 本發明之再剝離性加工薄膜(以下或簡稱「加工薄膜」) 係具有基材薄膜’與設在其一面之黏著劑層之再剝離性加 工薄膜’其特徵爲該黏著劑層係使用含(A)以特定比率具有 下示特定單體單元之丙烯酸酯系共聚物,及(B)異氰酸酯系 交聯劑’且該丙烯酸酯系共聚物之重量平均分子量Mw係 30萬〜100萬,分子量分布(重量平均分子量Mw/數量平均 分子量Μη)係3.0以下之黏著劑形成。 具有如此性狀之黏著劑層的本發明之再剝離性加工薄 膜’依用途可分爲再剝離性加工薄膜Α(以下或簡稱「加 工薄膜A」)及再剝離性加工薄膜b (以下或簡稱「加工 薄膜B」)。 加工薄膜A係以於用在多層印刷配線板之富柔軟性之 絕緣性基材薄片形成電路圖案之軟性印刷配線板之塑膠薄 片用作被著體之加工薄膜,加工薄膜B係以金屬材料或其 以外之無機材料,例如CCD、CMOS之玻璃部等用作被著 體之加工薄膜。 -11- 200951197 [加工薄膜A用基材薄膜] 本發明之再剝離性加工薄膜A之基材薄膜係耐熱性優 良之薄膜至關重要,具體而言,有聚對酞酸乙二酯薄膜、 聚碳酸酯薄膜、非晶性聚烯烴薄膜、芳族聚醯胺薄膜、聚 萘酸乙二酯薄膜、聚苯硫醚薄膜以及芳族聚颯薄膜、聚醚 醯亞胺薄膜、聚芳酯薄膜、聚醚醚酮薄膜、各種液晶聚合 物薄膜等超級工程塑膠薄膜等,其中因機械特性、電絕緣 性、阻障性、耐熱性、耐藥物性、經濟性等之均衡優良, © 以聚對酞酸乙二酯薄膜爲合適。此基材薄膜之厚度無特殊 限制’通常係16〜200/zm,25〜100ym之範圍更佳。 [加工薄膜B用基材薄膜] 加工薄膜B用基材薄膜係金屬材料或其以外之無機材 料用,較之該加工薄膜A用基材薄膜,有更優良的耐熱性 之要求。例如,加工薄膜B當用於CCD、CMOS之玻璃部時, 因迴焊加工等有時暴露於26(TC左右之高溫,因此,有能耐 此溫度之優良耐熱性(對於被著體之殘膠、基材薄膜之變 ® 形少)之要求。 而’加工薄膜B所適用之金屬材料有例如金、鈾、銀、 銅 '鐵、鋁或該等之合金,用於晶圓之半導體金屬等,金 屬材料以外之無機材料有例如玻璃板、陶瓷板等。 加工薄膜B用基材薄膜係以使用,於23 °C之儲存彈性 模數爲G,23,260〇C之儲存彈性模數爲g,26。時,下述式之儲 存彈性模數變化率X係85%以下之薄膜爲佳。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a re-peelable processed film, and more particularly to a substrate sheet for use in a flexible wiring board for a multilayer printed wiring board, or to a metal material. Or an inorganic material other than the inorganic material such as a charge-coupled device or a glass portion of a complementary metal oxide semiconductor device, and a re-peelable processed film having a base film and an acryl-based adhesive layer provided on one surface thereof. © [Prior Art 4] The printed wiring board is a wiring board that forms a conductor circuit pattern required for connection between an electric appliance and an electronic component mounted on the surface of the insulating substrate or the surface thereof by printing or the like. Such a printed wiring board can be roughly classified into a hard printed wiring board and a flexible printed wiring board in terms of shape, and can be divided into a single layer or a plurality of layers or more. Among these printed wiring boards, the flexible printed wiring board is formed of a conductive circuit pattern of an insulating base sheet having flexibility, and is not suitable for a three-dimensional high-density structure in a narrow and complicated structure inside the electronic device. Or missing substrate. Such a flexible printed wiring board is one of the best electronic machine components in response to the demand for small size, light weight, high density, and high precision of electronic devices in recent years, and its demand is rapidly expanding. Because of the flexibility of the flexible printed wiring board, the plastic sheet as the insulating base sheet is made of, for example, a plastic sheet excellent in heat resistance and insulation such as a polyimide sheet or a polyphenylene sulfide sheet. The surface or surface of the substrate sheet and its interior are formed into a circuit pattern with a metal material such as copper. Circuit diagram The method of forming the method of 200951197 is known, except for the necessary portion of the copper foil which leaves only the copper area laminate, and the subtraction method for removing and removing the remaining portion by the etching treatment, there is an addition method or the like. This addition method is a method of forming a circuit pattern by plating only on a necessary portion of the substrate, and has a semi-additive method and a full additive method. The required performance of such a flexible printed wiring board is processed in addition to, for example, dimensional accuracy, low warpage, distortion, heat resistance, peel strength, bending strength, high volume resistivity, chemical resistance, heat bending strength, etc. Fitness is also extremely important.如此 In such a printed wiring board, in order to suppress solvent contamination, foreign matter intrusion, enthalpy generation, etc. in the circuit formation, electrical and electronic components, generally before the processing, prior to The re-peelable processed film is bonded to a base sheet for producing a flexible printed circuit board. The processed film is provided with a re-peelable adhesive layer on one surface of the base film, and is bonded to a base sheet for a flexible printed wiring board, and then subjected to various processes such as punching, solvent immersion, and hot pressing. The produced flexible printed A wiring board was peeled off. Therefore, it is important to have no releasability which does not cause floating or peeling during the processing, and which does not have residual glue after being peeled off (substrate sheet), and which does not cause curling of the object. Therefore, the present applicant has previously performed this treatment on a base sheet for producing a flexible printed wiring board, and found that slippage, lifting, peeling, and the like do not occur during the process of producing a flexible printed wiring board, and the surface of the wiring board can be effectively suppressed. A re-peelable processed film which does not leave a residue after being peeled off, and which does not cause curling of the object after the peeling, has been proposed (see, for example, Patent Document 1) . 200951197 In recent years, with the high performance and high speed of electronic equipment, there is a demand for high-density packaging and high-density wiring in printed wiring boards. In order to meet this demand, multilayer printed wiring boards have attracted much attention. Further, recently, with the miniaturization of electric appliances and electronic equipment, multilayer printed wiring boards have become increasingly thinner and denser, and multilayer printed wiring boards using a subsequent sheet (thermosetting resin sheet) have been increasingly used. In the production of such a multilayer printed wiring board, for example, a flexible printed wiring board having electrical and electronic components and a flexible printed wiring board are laminated with an adhesive sheet such as an epoxy resin sheet. Specifically, it is generally used to form a circuit pattern on a substrate sheet to which a re-peelable processed film is attached, and to further comprise an electric or electronic component, and a cover sheet (polyimide sheet or the like) is provided thereon. In one unit, the re-peelable processed film is peeled off, and the exposed base sheet is opposed to the coated sheet of the other unit, and an adhesive sheet such as an epoxy resin sheet is interposed therebetween, and the unit is superposed. In this method, the cell and the cell must be high enough. In recent years, solid-state imaging devices such as a charge coupled device (CCD) and a complementary metal oxide semiconductor device (CMOS) have been mounted on digital cameras, video cameras, and camera phones. When these CCD and CMOS products are produced, a re-peelable processed film for protection is usually attached to the glass portion for receiving light. The glass portion may be exposed to a high temperature (for example, at about 260 ° C) by reflow processing or the like. Therefore, the re-peelable processed film used for the purpose may have excellent heat resistance against the temperature, for example, for the object to be treated. Residual glue and substrate film have less deformation requirements. [Problem to be Solved by the Invention] The re-peelable processed film described in Patent Document 1 is as described above with a base sheet as a base material. When the body is attached, it does not cause slippage, floating, peeling, etc., and it can effectively suppress solvent contamination, foreign matter intrusion, sputum formation, etc. on the surface of the wiring board, and it is not easy to be left behind by the body after peeling. Glue, which is not easy to cause excellent characteristics such as being curled by the body, but when used in a wiring board unit for a multilayer printed wiring board, when the re-peelable processed film is peeled off, the substrate sheet of the body is subjected to the side of the substrate. The contamination is insufficient for the adhesion of the adhesive sheet such as the epoxy resin sheet or the like to the laminate unit and the substrate, and the improvement is expected. Further, it is excellent in heat resistance for use in a glass portion for CCD or CMOS, and is, for example, a re-peelable film which can withstand reflow processing at 260 ° C for several minutes. The present invention has been made under such circumstances, and an object thereof is to provide a re-peelable reinforced film having a base film and an acryl-based adhesive layer provided on one surface thereof, which is used for a multilayer printed wiring board. In the case of the base sheet for the production of the flexible printed wiring board, when the re-peelable processed film is peeled off, the contamination on the side of the substrate sheet is suppressed, and the adhesive sheet such as an epoxy resin sheet or the like When the re-peelable processed film of the material sheet is high enough, or when it is used for the glass part of CCD or CMOS, it is exposed to a temperature of about 260 ° C, and the deformation of the residual residue and the substrate film is small. A re-peelable processed film excellent in heat resistance. (Means for Solving the Problems) The inventors of the present invention have repeatedly conducted intensive investigations to find out the results, and have used the film of 200951197 for the production of a base sheet for a flexible printed wiring board for a multilayer printed wiring board. At the time of stripping, the contaminant that migrates to the side of the object is the oligomer component in the acryl-based adhesive layer. The present inventors have found that in order to reduce the content of the oligomer component in the acryl-based adhesive layer, it has been found that the acrylic-based adhesive is controlled when the acryl-based adhesive constituting the adhesive layer is produced. The molecular weight distribution of the propylene-based copolymer of the resin component is less than or equal to a certain size, and preferably, the content of the residual monomer is within a certain range, thereby reducing the content of the oligomer component in the adhesive, and the non-fluorenone The release material is used as a protective adhesive layer to the release agent layer before use, and a re-peelable processed film which is more suitable for bonding the base sheet for the production of the flexible printed wiring board can be obtained. In addition, when a glass portion of a CCD or a CMOS is used for bonding, a re-peelable processed film having excellent heat resistance can be obtained by using, as a base film, a storage elastic modulus change rate prescribed by a specific formula. The present invention has been completed based on this finding. That is, the present invention provides a φ [1] re-peelable processed film having a base film and a re-peelable processed film of an adhesive layer provided on one side of the base film, which is characterized by the adhesive. The layer system contains (A) 40 to 80% by mass of butyl acrylate unit, 1 to 15% by mass of styrene unit, 1 to 30% by mass of methyl methacrylate unit, and 1 to 30% by mass of methyl acrylate unit, and 1 to 10% by mass of a vinyl monomer unit of a hydroxyl group, an acrylate-based copolymer having a carboxyl group-containing vinyl monomer unit of 0.1 to 1% by mass, and (B) an isocyanate crosslinking agent, and the acrylate system The weight average molecular weight Mw of the copolymer is 300,000 to 1,000,000, and the molecular weight distribution (weight average molecular weight Mw / number average molecular weight 200951197 Μη) is formed by an adhesive of 3.0 or less; [2] Re-peelable processed film of [1] Wherein the content of the residual monomer in the (Α) acrylate-based copolymer accounts for 5 to 20% by mass of the (Α) acrylate-based copolymer; [3] a re-peelable processed film 'separate layer such as [1] Or [2] re-peelable processed film with non-矽a release material of the release agent layer, such that the adhesive layer of the re-peelable processed film is formed with respect to the surface of the release agent layer of the release material; [4] a re-peelable processed film such as [3], wherein [5] The re-peelable processed film according to any one of [1] to [4] wherein the adhesive further contains a toluene diisocyanate crosslinking agent and a xylene diisocyanate system. [6] The re-peelable processed film of any one of [1] to [5], wherein a plastic sheet for a flexible printed wiring board for a multilayer printed wiring board is used as a Φ [7] The re-peelable processed film of [6], wherein (a) according to JIS Ζ 0237, the retention of force on the plastic sheet used for the flexible printed wiring board, at temperature 40 ° C is more than 70,000 seconds, and at 70,000 seconds, the slip is less than 0.1 mm; (b) According to the JIS Z 023 7 measurement method, the plastic sheet used for the flexible printed wiring board is adhered to the body. Force, 0.01~0.5N/25mm before hot pressing; (c) Bonded to plastic sheet for flexible printed wiring board After being subjected to heat treatment at a temperature of 180 ° C and a pressure of 4.3 N/mm 2 for 60 minutes, the adhesion of 200951197 is based on the measurement method of JIS Z 0237, which is 2.0 N/25 mm or less, and (d) The adhesive layer has a gel fraction of 95% or more; [8] A re-peelable processed film such as [6] or [7], wherein the plastic sheet of the flexible printed wiring board is made of polyimide film or polyphenylene sulfide. [9] The re-peelable processed film according to any one of [6] to [8], wherein the base film is a polyethylene terephthalate film; [1]] [1] [4] The re-peelable processed film according to any one of [4], wherein the metal I material or an inorganic material other than the same is used as the object; [11] The re-peelable processed film according to [10], wherein the system is charge-coupled The re-peelable processed film of any one of [1] to [4], [10] or [11], wherein the adhesive is xylene The isocyanate-based crosslinking agent is used as an isocyanate-based crosslinking agent, and the re-peelable processed film according to any one of [1] to [4], [10] to [12], wherein the substrate film is 23 ° C Storage elastic modulus of φ G'23,260 ° C storage elastic modulus G'26. When the storage modulus of the following formula changes the rate X by 85% or less, X(%) = [(G'23 - G'26〇) / G'23] x100 and [14] such as [1]~[ The re-peelable processed film according to any one of [10] to [13] wherein the base film is a polyimide film. (Effect of the Invention) According to the present invention, there is provided a re-peelable processed film having a base film and an acryl-based adhesive layer provided on one side thereof, which is used in a multilayer printed wiring board for -10 200951197 In the case of the base sheet for the production of a flexible printed wiring board, when the re-peelable processed film is peeled off, contamination on the side of the substrate sheet can be suppressed, and the adhesive sheet such as an epoxy sheet and the substrate sheet can be prevented. Then, the force is reduced to a re-peelable processed film which can be suppressed. And (2) for metal materials or other inorganic materials, such as CCD, CMOS glass, etc., exposed to a temperature of about 260 ° C, for the deformation of the residual glue, the substrate film A re-peelable processed film which is still excellent in heat resistance. [Embodiment] The best reworkable film of the present invention (hereinafter referred to as "processed film") is a re-peelable processed film having a base film 'and an adhesive layer provided on one side thereof. 'It is characterized in that the adhesive layer is an acrylate-based copolymer containing (A) a specific monomer unit shown below at a specific ratio, and (B) an isocyanate-based crosslinking agent' and the weight of the acrylate-based copolymer The average molecular weight Mw is 300,000 to 1,000,000, and the molecular weight distribution (weight average molecular weight Mw / number average molecular weight Μη) is 3.0 or less. The re-peelable processed film of the present invention having the same adhesive layer can be classified into a re-peelable processed film (hereinafter referred to as "processed film A") and a re-peelable processed film b (hereinafter referred to as " Processed film B"). The processed film A is used as a processed film of a flexible printed wiring board in which a flexible printed wiring sheet of a multilayer printed wiring board is formed into a circuit pattern, and the processed film B is made of a metal material or Other inorganic materials, such as CCD, CMOS glass, etc., are used as processed films of the object. -11- 200951197 [Substrate film for processed film A] The base film of the re-peelable processed film A of the present invention is essential for a film having excellent heat resistance, specifically, a polyethylene terephthalate film, Polycarbonate film, amorphous polyolefin film, aromatic polyamide film, polyethylene naphthalate film, polyphenylene sulfide film, and aromatic polyfluorene film, polyether quinone film, polyarylate film , polyetheretherketone film, various liquid crystal polymer films and other super engineering plastic films, etc., which are excellent in balance of mechanical properties, electrical insulation, barrier properties, heat resistance, drug resistance, economy, etc. A film of ethylene phthalate is suitable. The thickness of the base film is not particularly limited 'usually 16 to 200 / zm, and the range of 25 to 100 μm is more preferable. [Substrate film for processing film B] The substrate film for processing film B is a metal material or an inorganic material other than the substrate material, and has a higher heat resistance than the substrate film for processed film A. For example, when the processed film B is used for the glass portion of a CCD or a CMOS, it may be exposed to a high temperature of about 26 TC due to reflow processing or the like. Therefore, it has excellent heat resistance against this temperature (for the residual adhesive of the object) The requirements for the change of the base film are small. The metal materials suitable for processing the film B are, for example, gold, uranium, silver, copper 'iron, aluminum or alloys thereof, semiconductor metals for wafers, etc. The inorganic material other than the metal material is, for example, a glass plate, a ceramic plate, etc. The base film for processing the film B is used, and the storage elastic modulus at 23 ° C is G, and the storage elastic modulus of 23, 260 〇 C is When g, 26, a film having a storage elastic modulus change rate of the following formula of 85% or less is preferable.

X(% )= [(G^S- G,26〇)/G,23]XlOO 如此之基材薄膜有例如聚醯亞胺薄膜、芳族聚醯胺薄 -12- 200951197 膜等,聚醯亞胺薄膜尤合適。 而,該儲存彈性模數〇’23及儲存彈性模數g’26。,係依 下述方法測得之値。 基材薄膜以測定長度(夾頭間距)20mm安裝於動態黏彈 性測定裝置[TA Instruments公司製,商品名DMA-Q800], 在頻率1 1Hz,振幅20 /z m,升溫速度5°C /min之條件下, 測定溫度範圍15〜300 °C之儲存彈性模數G’,得23 °C之儲 存彈性模數G’23、260°C之儲存彈性模數G’26。。 © 該加工薄膜B用基材薄膜之厚度無特殊限制,通常係 16 〜200// m,25 〜100// m 更佳。 該加工薄膜A用及B用基材薄膜,至少於設黏著劑層 側之面,爲提升與黏著劑層之接著性,必要時,可藉氧化 法、凹凸化法等施以表面處理。並亦可施以底塗處理。該 氧化法係用例如電暈放電處理、電漿處理、鉻酸處理(濕 式)、火焰處理、熱風處理、臭氧•紫外線照射處理等, 凹凸化法係用例如噴砂法、溶劑處理法等。這些表面處理 φ 法係依基材薄膜之種類適當選擇,一般,電暈放電處理法 於效果及操作性等較佳。 [加工薄膜A用及B用黏著劑層] 本發明之再剝離性加工薄膜A及B,設於該基材薄膜 一面之黏著劑層係使用含(A)至少具有丙烯酸丁酯單元、 苯乙烯單元、甲基丙烯酸甲酯單元、丙烯酸甲酯單元、含 羥基之乙烯系單體單元與含羧基之乙烯系單體單元之丙烯 酸酯系共聚物,及(B)異氰酸酯系交聯劑之黏著劑形成。 ((A)丙烯酸酯系共聚物) -13- 200951197 用於本發明之黏著劑,(A)成分之丙烯酸酯系共聚物 中,甲基丙烯酸甲酯單元及苯乙烯單元提高凝集力與玻璃 轉移溫度,於加工薄膜A,具有抑制對於熱壓後之軟性印 刷配線板之滑移、黏著力上升之作用。而丙烯酸甲酯單元, 於該丙烯酸酯系共聚物之製造,具有使聚合安定化,提高 分子量之作用。該丙烯酸酯系共聚物中,含羥基之乙烯系 單體單元及含羧基之乙烯系單體單元,係被導入以於該丙 烯酸酯系共聚物賦予能與後敘交聯劑反應之交聯性官能基 © (羥基、羧基)。 形成該含羥基之乙烯系單體單元之單體有例如(甲基) 丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙 烯酸3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯 酸3-羥丁酯、(甲基)丙烯酸4-羥丁酯等(甲基)丙烯酸 羥基烷基酯等。這些可單獨使用1種,亦可組合2種以上 使用。這些之中以丙烯酸2·羥乙酯及甲基丙烯酸2-羥乙酯 爲合適® ❹ 而,形成該含羧基之乙烯系單體單元之單體有例如丙 烯酸、甲基丙烯酸、巴豆酸、順丁烯二酸、伊康酸、檸康 酸等乙烯式不飽和羧酸等。這些可單獨使用1種,亦可組 合2種以上使用。這些之中以甲基丙烯酸及丙烯酸爲合適。 本發明中,於該丙烯酸酯系共聚物一倂導入該含羥基 之乙烯系單體單元,與含羧酸之乙烯系單體單元’該丙烯 酸酯系共聚物與交聯劑之反應性即良好。 該黏著劑之樹脂成分丙烯酸酯系共聚物中’丙嫌酸丁 酯單元之含量,若如後敘係40.0質量%以上’則貼合加工 -14- 200951197 薄膜A於軟性印刷配線板製作用基材薄片,例如經熱壓 時’該基材薄片與加工薄膜之間不易發生滑移。 該丙烯酸酯系共聚物中該各單元之含有比率,基於黏 著劑之性能,係丙烯酸丁酯單元40〜80質量%,苯乙烯單 元1〜15質量%,甲基丙烯酸甲酯單元1〜30質量%,丙 烯酸甲酯單元1〜30質量%,含羥基之乙烯系單體單元1 〜10質量%且含羧基之乙烯系單體單元0.1〜1質量%,以 丙烯酸丁酯單元50〜65質量%、苯乙烯單元2〜10質量 ® %、甲基丙烯酸甲酯單元3〜20質量%、丙烯酸甲酯單元5 〜20質量%、含羥基之乙烯系單體單元2〜7質量%且含羧 基之乙烯系單體單元0.1〜0.5質量%爲較佳。 又,該丙烯酸酯系共聚物中,必要時,可以能與該單 體共聚之其它單體用作共聚成分。此其它單體成分有例如 (甲基)丙烯酸羥乙酯、(甲基)丙烯酸丙酯、甲基丙烯 酸丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲 基)丙烯酸環己酯、(甲基)丙烯酸2-乙己酯、(甲基) 〇 丙烯酸異辛酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸十 二酯、(甲基)丙烯酸肉豆蔻酯、(甲基)丙烯酸棕櫚酯、 (甲基)丙烯酸硬脂酯等丙烯酸丁酯及(甲基)丙烯酸甲 酯以外之酯部分之烷基碳原子數2〜20之(甲基)丙烯酸 酯;乙酸乙烯酯、丙酸乙烯酯等乙烯酯類;乙烯、丙烯、 異丁烯等烯烴類;氯乙烯、二氯亞乙烯等鹵化烯烴類;丁 二烯、異平、氯平等二烯系單體;丙烯腈、甲丙烯腈等腈 系單體;丙烯醯胺、N-甲基丙烯醯胺、N,N-二甲基丙烯醯 胺等丙烯醯胺類;α-甲苯乙烯等。這些可單獨使用,亦可 -15- 200951197 組合2種以上使用。 本發明中,該丙烯酸酯系共聚物其共聚形態無特殊限 制,隨機、嵌段、接枝共聚物中任一皆可。又’分子量係 重量平均分子量Mw爲30萬〜100萬’分子量分布(重量平 均分子量Mw/數量平均分子量Mn)3.〇以下。 該重量平均分子量Mw在30萬〜1〇〇萬之範圍,則得 到之黏著劑可發揮良好之黏著性能。又,分子量分布Mw/Mn 若係3.0以下,則重量平均分子量1,〇〇〇〜30,000左右之低 ❹ 聚物含量低,可達成本發明之目的。較佳分子量分布Mw/Mn 係2.8以下。 而,該重量平均分子量Mw及數量平均分子量Μη係 由凝膠滲透層析(GPC)法測得之聚苯乙烯換算値,本發明中 除非特加聲明係依以下條件測定。 GPC裝置:高速 GPC裝置[東曹(股)製,商品名 HLC-8120GPC] 管柱:高速管柱[東曹(股)製,商品名TSK guard column Φ Hxl-H、TSKGelGMHxL、TSKGel GMHxl、TSKGel G2000Hxl] 依此順序連結於裝置作測定。 溶出溶劑:四氫呋喃 聚合物濃度:10毫克/毫升 溫度:4 0 °c 流速:1.0ml/分鐘 偵測器:紫外可見偵測器(偵測器波長;254nm )及微 i差折射計[皆係東曹(股)製] :而,單體成分係採用排除値。 -16- 200951197 向來,丙烯酿系黏著劑中,樹脂成分丙烯酸酯系共聚 物之製造通常係使用(甲基)丙烯酸酯、有具活性氫之官 能基之乙烯系單體及必要時之其它單體’於自由基聚合引 發劑與適當溶劑之存在下進行第一段自由基聚合至單體消 耗達40%左右後,爲盡量去除殘餘未反應單體,更進行第 二段自由基聚合,採用2段聚合法。 然而,經本發明人之硏究發現,採用如此之2段聚合 法時,於第二段聚合多有前敘低聚物形成,此低聚物在將 €> 再剝離性加工薄膜自被著體基材薄片經剝除之際,遷移至 該被著體側,降低環氧系樹脂薄膜等接著性薄膜與該被著 體之接著力。因而本發明人更重複硏究發現,採用以該第 一段自由基聚合至未反應單體殘留量可係佔生成之黏著劑 中之丙烯酸酯系共聚物之5〜20質量%左右,較佳者5〜15 質量%時停止反應之1段聚合法,即可減少低聚物之形 成。藉此可成功控制生成之丙烯酸酯系共聚物之重量平均 分子量Mw於30萬〜100萬之範圍,且分子量分布Mw/Μη Φ 爲3.0以下。得知含於黏著劑中之殘留未反應單體於形成 黏著劑層之際於加熱、乾燥處理時揮散,實質上不殘留於 黏著劑層中。 ((Β)異氰酸酯系交聯劑) 本發明中,該黏著劑之交聯劑係以異氰酸酯系交聯劑 用作必要成分。此異氰酸酯系交聯劑之例有甲苯二異氰酸 酯系、二苯甲烷二異氰酸酯系、二甲苯二異氰酸酯系等芳 族聚異氰酸酯類,六亞甲二異氰酸酯系等脂族聚異氰酸酯 類,異佛酮二異氰酸酯系、加氫二苯甲烷二異氰酸酯系等 -17- 200951197 脂環式聚異氰酸酯類等,及該等之縮二脲體、異三聚氰酸 酯體’以及與乙二醇、丙二醇、新戊二醇、三羥甲丙烷、 蓖麻油等低分子含活性氫之化合物之反應產物加成體等。 這些異氰酸酯系交聯劑之中,於加工薄膜A因反應 性、基材與黏著劑之密著性優良、殘膠少,及熱壓後可得 適度之黏著力等,以倂用甲苯二異氰酸酯系交聯劑與二甲 苯二異氰酸酯系交聯劑二者爲宜。此時,其用量通常係選 定爲相對於該丙烯酸酯系共聚物100質量份,甲苯二異氰 © 酸酯系與二甲苯二異氰酸酯系之合計量達0.5〜30質量 份,較佳者1.0〜20質量份,以得具後敘性狀之黏著劑層》 而於加工薄膜B從耐熱性之觀點,以二甲苯二異氰酸 酯系爲佳。其用量通常係相對於該丙烯酸酯系共聚物100 質量份爲0.5〜30質量份,較佳者1.0〜20質量份。 此黏著劑在無損於本發明目的之範圍,必要時可於丙 烯醯系黏著劑適當添加常用之各種添加劑,例如抗氧化 劑、紫外線吸收劑、光安定劑、軟化劑、塡料、交聯促進 〇劑等。而,雖可倂用黏著賦予劑,但因隨之黏著力上升故 不佳。 [再剝離性加工薄膜A之性狀] 使用該黏著劑形成之本發明之再剝離性加工薄膜A, 宜具有下示性狀。 首先,對於被著體軟性印刷配線板製作用基材薄片之 保持力通常係70,000秒以上,且70,000秒之時宜實質上不 見有滑移發生。此保持力未達70,000秒者,將加工薄膜貼 合於被著體基材薄片,衝切加工、浸泡於溶劑、熱壓等操 -18- 200951197 作過程中加工薄膜與被著體之間有發生滑移之虞。而,該 保持力係依下示方法測得之値。又,「實質上不見」滑移 發生指70,000秒之時滑移未達0.1mm» (保持力) 依JIS Z 0237,於SUS製之保持力測定用試驗板之試 片的加工薄膜貼著部,使作爲用於軟性印刷配線板製作用 之基材薄片之聚醯亞胺薄片接著,爲試驗板。其次,裁切 加工薄膜製作寬度25mm,長度150mm之試片。於試驗板 © 之一端將此試片之一端的黏著劑層面以25mmx25mm之面 積接觸貼合,以2kg之輥來回壓合5次。15分鐘後設置於 潛變測試儀內於40°C條件下放置1 5分鐘。施以垂直向下之 9.8 07N荷重,測定至落下爲止之時間或70,000秒之時有無 滑移發生與滑移量。 其次,對於用於軟性印刷配線板製作用基材薄片(被著 體)之黏著力,以熱壓前係0.01〜0.5 N/25 mm爲佳,溫度180 °C、壓力4.3N/mm2之條件下,熱壓60分鐘後以係2.0N/25mm 〇 以下爲佳。熱壓前之黏著力若在上述範圍,貼合加工薄膜 於被著體軟性印刷配線板製作用基材薄片,熱壓前進行衝 切加工、浸泡於溶劑等機械操作,亦具有充分之黏著力, 加工薄膜與被著體之間不易發生滑移,且加工薄膜易於剝 離,並可抑制剝離後之殘膠、被著體捲曲之發生。熱壓前 之黏著力以0.03〜0.4N/25mm爲佳。又,熱壓後之黏著力 若係2.ON/2 5mm以下,則將加工薄膜貼合於被著體印刷配 線板製作用基材薄片,進行熱壓操作後加工薄膜比較容易 剝離,並可抑制剝離後殘膠、被著體捲曲之發生。又,經 -19- 200951197 熱壓操作,爲具有充分之黏著力,抑制加工薄膜與被著體 間滑移之發生,熱壓後黏著力之下限係0.08 N/25mm左右。 較佳者熱壓後之黏著力係0.12〜1.0 N/25mm。而,熱壓前 及熱壓後之黏著力係依下示方法測得之値。 (熱壓前之黏著力) 依;TIS Z 0237,於SUS製之黏著力測定用試驗板之試 片的加工薄膜貼著部,作爲用於軟性印刷配線板製作用之 基材薄片將聚醯亞胺薄片製作成寬度120mm、長度150mm © 接著,爲試驗板。另將加工薄膜裁切成寬度25mm,長度 2 5 0mm之試片。將此試片之一端的黏著劑層面貼合於試驗 板,使貼合面積可爲寬度25mmx長度約90mm,以2kg之輥 來回壓合1次。貼合起24小時後,測定以剝離角度1 80度, 剝離速度300mm/min剝離試片時之黏著力。測定開始區域 及結束區域之各15%除外,以圖中央部70%之平均値爲熱 壓前之黏著力。 (熱壓後之黏著力) 〇 準備裁切成寬度120mm,長度150mm大小之用於軟性 印刷配線板製作用之基材薄片(聚醯亞胺薄片),另將加工 薄膜裁切成寬度10 0mm、長度2 5 0mm爲試片。於此試片之 一端的黏著劑層面,將基材薄片以使貼合面積可達寬度 lOOmmx長度約90mm貼合後,以溫度180°C之壓板自試片 上施加壓力4.3 N/mm2熱壓60分鐘。然後,將貼合經熱壓 之試片與基材薄片之薄片裁切成寬度25mm,長度250mm, 使基材薄片側接著於SUS製之黏著力測定用試驗板,依JIS Z 0237,測定以剝離角度180度,剝離速度300mm/min剝 -20- 200951197 離試片時之黏著力。測定開始區域及結束區域之各15% 外,以圖中央部70%之平均値爲熱壓後之黏著力。 又,本發明之再剝離性加工薄膜A及B之黏著劑層 凝膠分率通常係95%以上。此凝膠分率未達95%則將加 薄膜A之黏著劑層面貼合於被著體印刷配線板製作用基 薄片,進行各種操作後,剝除加工薄膜之際易於發生殘膠 造成被著體之污染,又,熱壓時加工薄膜容易發生滑移 並導致電路印刷精度下降之問題。較佳凝膠分率係96% © 上。而,該凝膠分率係依下述方法測得之値。 (凝膠分率之測定方法) 塗布該黏著劑於厚度25//m之聚對酞酸乙二酯薄膜 布有矽酮樹脂作爲剝離劑之剝離薄膜之剝離劑層面上, 與製作本發明之再剝離性加工薄膜時同之條件使其交聯 後,自剝離薄膜剝除黏著劑(50mmxl00mm)。其次, 100x130 mm大小之200目金屬網上,以金屬網包入該交 化黏著劑2片(合計質量Ag),將之設置於索克斯雷萃 ^ 器(Soxhlet extraction apparatus),在乙酸乙醋之回流下萃 處理16小時。其次,萃取處理後,使殘留在金屬網上之 著劑於100°C乾燥24小時,在23°C、50% RH之氛圔下 濕3小時以上後,測定該黏著劑之質量(B g),由下式 凝膠分率(% ) = ( B/A ) xlOO 算出凝膠分率。 [加工薄膜A及B用剝離材] 於加工薄膜A及B之黏著劑層可積層以剝離材。此 離材有例如玻璃紙、塗被紙、澆塗紙等紙基材,積層聚 除 之 工 材 9 以 塗 以 化 於 聯 取 取 黏 調 剝 乙 -21- 200951197 烯等熱塑性樹脂於這些紙基材之積層紙,或於聚對酞酸乙 二酯、聚對酞酸丁二酯、聚萘酸乙二酯等聚酯薄膜,聚丙 烯、聚乙烯等聚烯烴薄膜等塑膠薄膜,塗布烯烴系樹脂、 異戊二烯系樹脂、丁二烯系樹脂等橡膠系彈性體,長鏈烷 基系樹脂、醇酸系樹脂、矽酮系樹脂、氟系樹脂等剝離劑 者。又有,將這些剝離劑直接製成薄片狀者等。尤以使用 本發明之加工薄膜A於軟性印刷配線板製作用基材薄片 時’使用矽酮系剝離劑則自剝離劑層微量遷移至黏著劑 〇 層,有時該矽酮成分附著於該基材薄片,造成污染。因此, 使用本發明之加工薄膜A於軟性印刷配線板製作用途時, 以使用非矽酮系剝離劑爲佳。該剝離劑之中,以使用成分 遷移少,最終接著力大之烯烴系樹脂的聚丙烯樹脂爲佳。 剝離劑層之厚度係0.01〜lOOym左右。又,此剝離材之厚 度無特殊限制,通常係20〜150 β m左右。 [再剝離性加工薄膜A及B之製作] 本發明之再剝離性加工薄膜A及B可於基材薄片之一 G 面直接塗布前敘本發明有關之黏著劑,於100〜13 0°C左右 加熱乾燥1〜5分鐘左右形成黏著劑層,於該黏著劑層面設 剝離材而製作。又亦可塗布黏著劑於剝離材之剝離處理 面,如上加熱乾燥形成黏著劑層後,將之貼合於基材薄膜 之一面而製作。考慮黏著劑層與基材薄膜之密著性,則前 者之製作方法較適用。 而,該製作操作中,黏著劑塗布後之乾燥處理宜充分 進行。乾燥不充分時,貼合於被著體後造成滑移之發生及 殘餘溶劑、殘留單體之增加。而且,乾燥不充分時,加工 -22- 200951197 薄膜A之黏著劑層與印刷配線板製作用基材薄片之間易於 發生滑移,熱壓後黏著力大幅上升,經剝離之際容易有印 刷配線板製作用基材薄片之捲曲、殘膠發生。 本發明之再剝離性加工薄膜A及B之黏著劑層,厚度 通常係5〜60/zm,5〜30/zm左右較佳。 本發明之再剝離性加工薄膜A係使用來作爲,.用於前 敘多層印刷配線板之軟性印刷配線板製作用之加工薄膜。 以本發明之再剝離性加工薄膜A使用作用於多層印刷配線 © 板之軟性印刷配線板製作用基材薄片時,該再剝離性加工 薄膜經剝除之際,被著體基材薄片側之污染被抑制,環氧 系樹脂薄片等接著性薄片與該基材薄片之接著力下降可予 抑制,可製作品質良好之多層印刷配線板。本發明之再剝 離性加工薄膜A所適用之軟性印刷配線板之基材薄片,其 種類無特殊限制,該軟性印刷配線板通常係使用聚醯亞 胺、聚苯硫醚等耐熱性塑膠薄片。 而本發明之再剝離性加工薄膜B適用作爲,金屬材料 Ο 或其以外之無機材料,例如CCD、CMOS之玻璃部之保護 薄膜等。此時’雖會暴露於260°C左右之高溫,但對於被著 體之玻璃部之殘膨卻可予抑制,且基材薄膜之變形亦少。 實施例 其次,舉實施例更詳細說明本發明,但本發明絕不限 於這些例。 而各例中製作之加工薄膜之諸特性係依下述方法評 估。 (1 )接著力 -23- 200951197 以裁切成22cmx22cm大小之用於製作軟性印刷配線板 之基材薄片(聚醯亞胺薄片)爲試驗板(被著體),將裁切 成20cmx20cm大小之加工薄膜之黏著劑層面貼合而不夾入 氣泡,溫度180°C、壓力4.3 N/mm2之條件下熱壓1小時後, 剝離加工薄膜。加工薄膜經剝離之被著體面與新的用於印 刷配線板製作用之基材薄片(聚醯亞胺薄片)之間夾以接 著薄片(Pyralux LF0100 [杜邦(股)製,註冊商標Pyralux, 丙烯醯改質環氧系接著薄片],寬度20mm,長度150mm ), © 溫度180°C、壓力4.3N/mm2之條件下熱壓30分鐘後,將被 著體之基材薄片接著於SUS製之黏著力測定用試驗板,依 JIS Z 0237,以剝離角度180度,剝離速度300mm/min測定 聚醯亞胺薄片與另一聚醯亞胺薄片之黏著力,以之爲接著 力。 而接著力係以30N/20mm以上爲合格。 (2 )熱壓後之滑移 以裁切成22cmx22cm大小之用於製作軟性印刷配線板 〇 之基材薄片(聚醢亞胺薄片)爲試驗板(被著體),將裁切 成20cmx20cm大小之加工薄膜之黏著劑層面貼合而不夾入 氣泡,於四隅開出徑6mm之通孔。將之於溫度180°C、壓 力4.3 N/mm2之條件下熱壓60分鐘後,測定四隅通孔處加 工薄膜與被著體之滑移,以平均値爲滑移。 (3)黏著劑層與基材薄膜之密著性 依JIS K 5 600-5-6,於加工薄膜之黏著劑層以旋轉刀具 切成 1mm 見方之棋盤目 100 格,將黏膠帶 (CELLOTAPE[Nichiban公司製,註冊商標])壓合後,黏 -24- 200951197 膠帶以約60°之角度經0.5秒〜1〇秒拔除時,數出〗〇〇格 之中的殘留膜數’進行加工薄膜之基材薄膜與黏著劑層之 密著性試驗。密著性係依下述判定基準評估。 90/100 以上. :5 80/100〜未達 90/100 ; 4 70/100 〜未達 80/1 00 ; 3 60/100〜未達 70/100 : 2 未達 60/100 : ! β (4)殘膠評估試驗-1 以裁切成22cmx22cm大小之用於製作軟性印刷配線板 之基材薄片(聚醯亞胺薄片)爲試驗板(被著體),將裁切 成20cmx20cm大小之加工薄膜之黏著劑層面貼合而不夾入 氣泡’溫度180 °C、壓力4,3N/mm2之條件下熱壓60分鐘後, 剝離加工薄膜,試驗板之表面以FT-IR (傅立葉變換紅外線 吸收光譜分析,ATR法)進行IR測定,藉來自黏著劑之吸 收峰之有無探察有無殘膠,無殘膠者評估爲〇,有殘膠者 參爲X。 (5)殘膠評估試驗-2 以7cmxl5cm’厚度2mm之浮法玻璃板爲試片(被著 體),將裁切成3cmx5cm大小之加工薄膜之黏著劑層面貼 合而不夾入氣泡,進行最高溫度260 °C、加熱時間3分鐘之 IR迴焊(迴焊爐:相模理工製WL-15-20DNX型)。然後於 室溫放置1小時後,剝除加工薄膜,被著體表面以數位顯 微鏡觀察,探察有無殘膠。殘膠係依下述判定基準作評估。 lcm2中之殘膠比率 -25- 200951197 未達5% :〇 5%〜未達30% : △X(%)=[(G^S-G,26〇)/G,23]XlOO such a substrate film is, for example, a polyimide film, an aromatic polyamine thin film -12-200951197 film, etc. An imine film is particularly suitable. However, the storage elastic modulus 〇'23 and the storage elastic modulus g'26. , measured by the following method. The base film was attached to a dynamic viscoelasticity measuring apparatus [manufactured by TA Instruments, trade name DMA-Q800] at a measurement length (clamp pitch) of 20 mm, at a frequency of 1 Hz, an amplitude of 20 /zm, and a temperature increase rate of 5 ° C / min. Under the conditions, the storage elastic modulus G' of the temperature range of 15 to 300 ° C was measured, and the storage elastic modulus G'23 at 23 ° C and the storage elastic modulus G' 26 at 260 ° C were obtained. . The thickness of the base film for the processed film B is not particularly limited, and is usually 16 to 200 / / m, preferably 25 to 100 / / m. The film for processing A and the film for B are at least on the side where the adhesive layer is provided, and the adhesion to the adhesive layer is improved. If necessary, surface treatment can be carried out by an oxidation method or a roughening method. It can also be applied as a primer. The oxidation method is, for example, a corona discharge treatment, a plasma treatment, a chromic acid treatment (wet), a flame treatment, a hot air treatment, an ozone/ultraviolet irradiation treatment, etc., and the embossing method is, for example, a sand blast method or a solvent treatment method. These surface treatment φ methods are appropriately selected depending on the type of the base film, and generally, the corona discharge treatment method is preferable in terms of effect and workability. [Adhesive layer for processing film A and B] The re-peelable processed films A and B of the present invention are provided on the adhesive film layer of one side of the base film, containing (A) at least a butyl acrylate unit, and styrene. a unit, a methyl methacrylate unit, a methyl acrylate unit, a hydroxyl group-containing vinyl monomer unit, an acrylate-based copolymer of a carboxyl group-containing vinyl monomer unit, and (B) an isocyanate crosslinking agent-based adhesive form. ((A) Acrylate Copolymer) -13- 200951197 Used in the adhesive of the present invention, in the acrylate copolymer of the component (A), the methyl methacrylate unit and the styrene unit improve the cohesive force and the glass transfer The temperature of the processed film A has an effect of suppressing the slippage and the adhesion of the soft printed wiring board after the hot pressing. Further, the methyl acrylate unit has a function of making the polymerization stable and increasing the molecular weight in the production of the acrylate copolymer. In the acrylate-based copolymer, a hydroxyl group-containing vinyl monomer unit and a carboxyl group-containing vinyl monomer unit are introduced to impart crosslinkability to the subsequent copolymerization reaction of the acrylate copolymer. Functional group © (hydroxyl, carboxyl). The monomer forming the hydroxyl group-containing vinyl monomer unit is, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, (A) A hydroxyalkyl (meth) acrylate such as 2-hydroxybutyl acrylate, 3-hydroxybutyl (meth)acrylate or 4-hydroxybutyl (meth)acrylate. These may be used alone or in combination of two or more. Among them, 2-hydroxyethyl acrylate and 2-hydroxyethyl methacrylate are suitable ❹, and monomers forming the carboxyl group-containing vinyl monomer unit are, for example, acrylic acid, methacrylic acid, crotonic acid, and cis. An ethylenically unsaturated carboxylic acid such as butenedioic acid, itaconic acid or citraconic acid. These may be used alone or in combination of two or more. Among these, methacrylic acid and acrylic acid are suitable. In the present invention, the acrylate-based copolymer is introduced into the hydroxyl group-containing vinyl monomer unit, and the carboxylic acid-containing vinyl monomer unit is excellent in reactivity with the acrylate copolymer and the crosslinking agent. . In the resin component of the adhesive agent, the content of the 'acrylic acid butyl ester unit is 40.0% by mass or more as described later', and the bonding process is 14-200951197. The film A is used in the production of a flexible printed wiring board. The material sheet, for example, when hot pressed, is unlikely to slip between the substrate sheet and the processed film. The content ratio of each unit in the acrylate-based copolymer is 40 to 80% by mass based on the properties of the adhesive, 1 to 15% by mass of the styrene unit, and 1 to 30% by mass of the methyl methacrylate unit. %, the methyl acrylate unit is 1 to 30% by mass, the hydroxyl group-containing vinyl monomer unit is 1 to 10% by mass, and the carboxyl group-containing vinyl monomer unit is 0.1 to 1% by mass, and the butyl acrylate unit is 50 to 65 % by mass. 2 to 10% by mass of styrene unit, 3 to 20% by mass of methyl methacrylate unit, 5 to 20% by mass of methyl acrylate unit, 2 to 7% by mass of hydroxyl group-containing monomer unit, and carboxyl group-containing The vinyl monomer unit is preferably 0.1 to 0.5% by mass. Further, in the acrylate-based copolymer, if necessary, other monomers copolymerizable with the monomer may be used as a copolymerization component. The other monomer components are, for example, hydroxyethyl (meth)acrylate, propyl (meth)acrylate, butyl methacrylate, amyl (meth)acrylate, hexyl (meth)acrylate, (methyl) Cyclohexyl acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth) oxime, decyl (meth) acrylate, dodecyl (meth) acrylate, myristyl (meth) acrylate a (meth) acrylate having an alkyl group having 2 to 20 carbon atoms, such as butyl acrylate or stearyl methacrylate; and an ester moiety other than methyl (meth) acrylate; Vinyl esters such as vinyl acetate and vinyl propionate; olefins such as ethylene, propylene and isobutylene; halogenated olefins such as vinyl chloride and dichloroethylene; butadiene, isopyrene and chlorinated diene monomers; a nitrile monomer such as a nitrile or a methacrylonitrile; an acrylamide such as acrylamide, N-methyl acrylamide or N,N-dimethyl acrylamide; or α-methyl styrene. These can be used alone or in combination of -15- 200951197 in combination of two or more. In the present invention, the copolymerization form of the acrylate-based copolymer is not particularly limited, and any of random, block, and graft copolymers may be used. Further, the molecular weight is a weight average molecular weight Mw of 300,000 to 1,000,000. The molecular weight distribution (weight average molecular weight Mw / number average molecular weight Mn) is 3. 〇 or less. The weight average molecular weight Mw is in the range of 300,000 to 1,000,000, and the adhesive can be used to exhibit good adhesion. Further, when the molecular weight distribution Mw/Mn is 3.0 or less, the weight average molecular weight is 1, and the low ruthenium content of about 30,000 to 30,000 is low, which is possible for the purpose of the invention. The preferred molecular weight distribution Mw/Mn is 2.8 or less. Further, the weight average molecular weight Mw and the number average molecular weight Μη are converted into polystyrene by a gel permeation chromatography (GPC) method, and the present invention is determined according to the following conditions unless otherwise stated. GPC device: high-speed GPC device [Tosoh Corporation, trade name HLC-8120GPC] Pipe column: high-speed pipe column [Tosoh Corporation, trade name TSK guard column Φ Hxl-H, TSKGelGMHxL, TSKGel GMHxl, TSKGel G2000Hxl] is connected to the device for measurement in this order. Dissolution solvent: tetrahydrofuran polymer concentration: 10 mg / ml temperature: 40 ° c flow rate: 1.0 ml / min detector: UV-visible detector (detector wavelength; 254 nm) and micro-i difference refractometer Tosoh (share) system: : However, the monomer component is excluded. -16- 200951197 In the acryl-based adhesive, the resin component acrylate copolymer is usually produced by using (meth) acrylate, a vinyl monomer having a functional group having active hydrogen, and other orders if necessary. After the first stage radical polymerization is carried out in the presence of a radical polymerization initiator and a suitable solvent to a monomer consumption of about 40%, in order to remove residual unreacted monomers as much as possible, a second-stage radical polymerization is further employed. 2-stage polymerization method. However, it has been found by the inventors of the present invention that when such a two-stage polymerization method is employed, a plurality of pre-formed oligomers are formed in the second-stage polymerization, and the oligomer is in the form of a re-peeling film. When the body base sheet is peeled off, it migrates to the object side, and the adhesive force of the adhesive film such as an epoxy resin film and the adherend is lowered. Therefore, the present inventors have further found that the amount of residual polymerizable to the unreacted monomer in the first stage can be about 5 to 20% by mass of the acrylate-based copolymer in the resulting adhesive, preferably. When the reaction is carried out at a temperature of 5 to 15% by mass, the first-stage polymerization method in which the reaction is stopped can reduce the formation of oligomers. Thereby, the weight average molecular weight Mw of the produced acrylate-based copolymer can be successfully controlled in the range of 300,000 to 1,000,000, and the molecular weight distribution Mw/Μη Φ is 3.0 or less. It is understood that the residual unreacted monomer contained in the adhesive is volatilized during heating and drying treatment at the time of forming the adhesive layer, and does not substantially remain in the adhesive layer. ((Β) Isocyanate-based crosslinking agent) In the present invention, the crosslinking agent of the adhesive is used as an essential component with an isocyanate crosslinking agent. Examples of the isocyanate crosslinking agent include aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate and xylene diisocyanate, and aliphatic polyisocyanates such as hexamethylene diisocyanate. Isocyanate-based, hydrogenated diphenylmethane diisocyanate, etc. -17-200951197 alicyclic polyisocyanate, and the like, and the biuret, isocyanurate, and ethylene glycol, propylene glycol, new a reaction product adduct of a low molecular weight active hydrogen-containing compound such as pentanediol, trimethylolpropane or castor oil. Among these isocyanate-based crosslinking agents, the processed film A is excellent in adhesion, adhesion between the substrate and the adhesive, less residual rubber, and moderate adhesion after hot pressing, and toluene diisocyanate is used. Both a crosslinking agent and a xylene diisocyanate crosslinking agent are preferred. In this case, the amount thereof is usually selected to be 100 parts by mass based on 100 parts by mass of the acrylate copolymer, and the total amount of toluene diisocyanate and xylene diisocyanate is 0.5 to 30 parts by mass, preferably 1.0 to 1. 20 parts by mass, in order to obtain an adhesive layer having a later-described property, and the processed film B is preferably a xylene diisocyanate from the viewpoint of heat resistance. The amount thereof is usually 0.5 to 30 parts by mass, preferably 1.0 to 20 parts by mass, per 100 parts by mass of the acrylate-based copolymer. The adhesive may not be used in the range of the object of the present invention, and may be appropriately added with various additives such as an antioxidant, an ultraviolet absorber, a light stabilizer, a softener, a tanning agent, and a cross-linking to promote the hydrazine in the acryl-based adhesive. Agents, etc. However, although the adhesion-imparting agent can be used, it is not preferable because the adhesion is increased. [Properties of Re-peelable Processed Film A] The re-peelable processed film A of the present invention formed using the adhesive preferably has the properties shown below. First, the holding force of the base sheet for the production of the flexible printed wiring board is usually 70,000 seconds or more, and at the time of 70,000 seconds, substantially no slip occurs. If the holding force is less than 70,000 seconds, the processed film is bonded to the substrate sheet to be pressed, punched, immersed in a solvent, hot pressed, etc. -18-200951197. The process between the processed film and the object is The slippage occurs. However, the retention force is measured by the method shown below. In addition, "substantially not visible" slip occurs when the slip is less than 0.1 mm at 70,000 seconds. (Retention force) According to JIS Z 0237, the processed film sticking portion of the test piece for the holding force measurement tester made of SUS The polyimide film which is used as a base sheet for the production of a flexible printed wiring board was next used as a test board. Next, the processed film was cut into a test piece having a width of 25 mm and a length of 150 mm. At the end of the test plate, the adhesive layer at one end of the test piece was brought into contact with a surface of 25 mm x 25 mm, and pressed back and forth 5 times with a 2 kg roller. After 15 minutes, it was placed in a creep tester at 40 ° C for 15 minutes. Apply a vertical downward 9.8 07N load and measure the amount of slippage and slippage at the time of the drop or 70,000 seconds. Next, the adhesion force for the base sheet (the object to be coated) for the production of a flexible printed wiring board is preferably 0.01 to 0.5 N/25 mm before the hot pressing, and the temperature is 180 ° C and the pressure is 4.3 N/mm 2 . Next, after hot pressing for 60 minutes, it is preferably 2.0 N/25 mm 〇 or less. When the adhesive force before the hot pressing is in the above range, the processed film is bonded to the base sheet for the production of the flexible printed wiring board, and the mechanical operation such as punching and immersion in a solvent before hot pressing has sufficient adhesion. The slippage between the processed film and the object to be treated is less likely to occur, and the processed film is easily peeled off, and the occurrence of residual glue after peeling and curling of the object can be suppressed. The adhesive force before hot pressing is preferably 0.03 to 0.4 N/25 mm. In addition, when the adhesive force after the hot pressing is 2.ON/2 5 mm or less, the processed film is bonded to the base sheet for the production of the printed wiring board, and the processed film is relatively easily peeled off after the hot pressing operation. It inhibits the occurrence of residual glue and curl of the object after peeling. Further, the hot pressing operation of -19-200951197 has a sufficient adhesive force to suppress the occurrence of slippage between the processed film and the object, and the lower limit of the adhesive force after hot pressing is about 0.08 N/25 mm. Preferably, the adhesive force after hot pressing is 0.12 to 1.0 N/25 mm. However, the adhesion force before and after hot pressing is measured by the method shown below. (Adhesive force before hot pressing); TIS Z 0237, a processed film adhering portion of a test piece for a test plate for measuring adhesion of SUS, which is used as a base sheet for the production of a flexible printed wiring board. The imide sheet was formed to have a width of 120 mm and a length of 150 mm. Next, it was a test plate. The processed film was also cut into test pieces having a width of 25 mm and a length of 250 mm. The adhesive layer at one end of the test piece was attached to the test plate so that the bonding area was 25 mm in width and about 90 mm in length, and was pressed back and forth once with a 2 kg roller. 24 hours after the bonding, the adhesion at the peeling angle of 180 degrees and the peeling speed of 300 mm/min when the test piece was peeled off was measured. Except for 15% of each of the measurement start region and the end region, the average enthalpy of 70% at the center of the figure is the adhesion before hot pressing. (Adhesive force after hot pressing) 〇 Prepared to cut into a substrate sheet (polyimide sheet) for the production of flexible printed wiring boards with a width of 120 mm and a length of 150 mm, and cut the processed film into a width of 10 mm. The length of 2 500 mm is the test piece. At the adhesive layer at one end of the test piece, the substrate sheet was bonded so that the bonding area was up to a width of 100 mmx and the length was about 90 mm, and the pressure was applied to the test piece at a temperature of 180 ° C to apply a pressure of 4.3 N/mm 2 . minute. Then, the sheet to which the hot-pressed test piece and the base sheet were bonded was cut into a width of 25 mm and a length of 250 mm, and the base sheet side was placed on a test plate for measuring the adhesion force made of SUS, and measured according to JIS Z 0237. Peeling angle 180 degrees, peeling speed 300mm/min peeling -20- 200951197 Adhesion force from the test piece. The average enthalpy of 70% in the center of the figure was measured by the hot pressing after 15% of each of the start region and the end region. Further, the adhesive layer of the re-peelable processed films A and B of the present invention has a gel fraction of usually 95% or more. When the gel fraction is less than 95%, the adhesive layer of the film A is bonded to the base sheet for the production of the printed wiring board, and after various operations are performed, the residual film is easily peeled off due to the peeling of the processed film. The pollution of the body, in addition, the film is prone to slip during hot pressing and causes a problem of reduced circuit printing accuracy. The preferred gel fraction is 96% © above. However, the gel fraction was measured by the following method. (Method for measuring gel fraction) The adhesive is applied to a release film of a release film having a thickness of 25/m of a polyethylene terephthalate film and an anthrone resin as a release agent, and the present invention is produced. After peeling the film, the adhesive was peeled off from the peeling film (50 mm x 100 mm) after the conditions were crosslinked. Next, on a 200-mesh metal net of 100×130 mm size, two pieces of the cross-linking adhesive (total mass Ag) were wrapped in a metal mesh, and set in a Soxhlet extraction apparatus in acetic acid. The vinegar was refluxed for 16 hours. Next, after the extraction treatment, the agent remaining on the metal mesh was dried at 100 ° C for 24 hours, and after being wetted for 3 hours or more under the atmosphere of 23 ° C and 50% RH, the mass of the adhesive was measured (B g The gel fraction was calculated from the gel fraction (%) = (B/A) xlOO of the following formula. [Removable Material for Processed Films A and B] The adhesive layer of the processed films A and B can be laminated to form a release material. The material for separation is, for example, a paper substrate such as a cellophane, a coated paper, or a coated paper, and the laminated material 9 is coated with a thermoplastic resin such as a binder to remove the adhesive, such as B--21-200951197. Laminated paper, or polyester film such as polyethylene terephthalate, polybutylene terephthalate or polyethylene naphthalate, polyolefin film such as polypropylene or polyethylene, coated with olefin A rubber-based elastomer such as a resin, an isoprene-based resin or a butadiene-based resin, or a release agent such as a long-chain alkyl-based resin, an alkyd-based resin, an anthrone-based resin, or a fluorine-based resin. Further, these release agents are directly formed into a sheet shape or the like. In particular, when the processed film A of the present invention is used in a base sheet for producing a flexible printed wiring board, the use of an anthrone-based release agent slightly migrates from the release agent layer to the adhesive layer, and the anthrone component may adhere to the base. Sheets, causing pollution. Therefore, when the processed film A of the present invention is used for the production of a flexible printed wiring board, it is preferred to use a non-fluorenone-based release agent. Among the above-mentioned release agents, a polypropylene resin having a small amount of olefin-based resin which has a small amount of component migration and a high strength is preferable. The thickness of the release agent layer is about 0.01 to 100 μm. Further, the thickness of the release material is not particularly limited and is usually about 20 to 150 μm. [Preparation of Re-peelable Processed Films A and B] The re-peelable processed films A and B of the present invention can be directly coated on the G-plane of one of the base sheets, and the adhesives according to the present invention are applied at 100 to 13 0 ° C. The adhesive layer is formed by heating and drying for about 1 to 5 minutes on the left and right sides, and a release material is formed on the adhesive layer. Further, an adhesive may be applied to the release surface of the release material, and the adhesive layer may be formed by heating and drying as described above, and then bonded to one surface of the base film. Considering the adhesion of the adhesive layer to the substrate film, the former method is suitable. Further, in the production operation, the drying treatment after the application of the adhesive is preferably carried out sufficiently. When the drying is insufficient, the occurrence of slippage and an increase in residual solvent and residual monomers are caused after bonding to the object. Further, when the drying is insufficient, the adhesive layer of the film -22-200951197 is easily slipped between the adhesive sheet of the film A and the base sheet for producing a printed wiring board, and the adhesive force is greatly increased after the hot pressing, and the printed wiring is easily peeled off. The curling of the substrate sheet for sheet production and the occurrence of residual glue occur. The adhesive layer of the re-peelable processed films A and B of the present invention has a thickness of usually 5 to 60/zm and preferably about 5 to 30/zm. The re-peelable processed film A of the present invention is used as a processed film for producing a flexible printed wiring board for a multilayer printed wiring board. When the base sheet for soft printed wiring board production of the multilayer printed wiring board is used in the re-peelable processed film A of the present invention, when the re-peelable processed film is peeled off, it is placed on the side of the substrate sheet. When the contamination is suppressed, the adhesion between the adhesive sheet such as the epoxy resin sheet and the substrate sheet can be suppressed, and a multilayer printed wiring board having good quality can be produced. The type of the base sheet of the flexible printed wiring board to which the re-peelable processed film A of the present invention is applied is not particularly limited, and the flexible printed wiring board usually uses a heat-resistant plastic sheet such as polyimide or polyphenylene sulfide. Further, the re-peelable processed film B of the present invention is suitably used as a metal material Ο or an inorganic material other than the inorganic material such as a CCD or a CMOS glass portion. At this time, although it is exposed to a high temperature of about 260 ° C, the residual of the glass portion of the object can be suppressed, and the deformation of the base film is small. EXAMPLES Next, the present invention will be described in more detail by way of examples, but the present invention is by no means limited to these examples. The properties of the processed film produced in each case were evaluated by the following methods. (1) Next force -23- 200951197 A base sheet (polyimine sheet) for making a flexible printed wiring board which is cut into a size of 22 cm x 22 cm is used as a test board (received body), and is cut into a size of 20 cm x 20 cm. The adhesive layer of the processed film was bonded without sandwiching the air bubbles, and the film was peeled off after hot pressing at a temperature of 180 ° C and a pressure of 4.3 N/mm 2 for 1 hour. The processed film is peeled between the surface and the new substrate sheet (polyimide sheet) used for the production of printed wiring boards, and then the sheet is attached (Pyralux LF0100 [made by DuPont Co., Ltd., registered trademark Pyralux, propylene]醯 modified epoxy-based sheet], width 20 mm, length 150 mm), heat-pressed for 30 minutes under conditions of a temperature of 180 ° C and a pressure of 4.3 N/mm 2 , and then the substrate sheet of the object was placed in SUS. For the adhesion test, the adhesion of the polyimide film to another polyimide film was measured in accordance with JIS Z 0237 at a peeling angle of 180 degrees and a peeling speed of 300 mm/min. Then the force is qualified to be 30N/20mm or more. (2) Sliding after hot pressing to cut a substrate sheet (polyimine sheet) for making a flexible printed wiring board into a test board (bedding) of 22 cm x 22 cm, which will be cut into a size of 20 cm x 20 cm. The adhesive layer of the processed film is bonded without sandwiching the air bubbles, and a through hole having a diameter of 6 mm is opened at four turns. After hot pressing at a temperature of 180 ° C and a pressure of 4.3 N/mm 2 for 60 minutes, the slip of the processed film and the object at the through hole of the four turns was measured, and the average enthalpy was slipped. (3) The adhesion between the adhesive layer and the substrate film is in accordance with JIS K 5 600-5-6, and the adhesive layer of the processed film is cut into a 1 mm square by the rotary cutter, and the adhesive tape (CELLOTAPE [ Nichiban company, registered trademark]) After pressing, the adhesive-24-200951197 tape is removed at an angle of about 60° for 0.5 seconds to 1 sec., and the number of residual films in the 〇〇 grid is processed. The adhesion test between the substrate film and the adhesive layer. The adhesion is evaluated according to the following criteria. 90/100 or more. :5 80/100~Unsold 90/100; 4 70/100 ~ not up to 80/1 00; 3 60/100~not up to 70/100 : 2 not up to 60/100 : ! β ( 4) Residue Evaluation Test-1 A substrate sheet (polyimine sheet) for making a flexible printed wiring board which is cut into a size of 22 cm x 22 cm is used as a test sheet (bedding), and is cut into a size of 20 cm x 20 cm. The adhesive layer of the film is bonded without being sandwiched with air bubbles at a temperature of 180 ° C and a pressure of 4, 3 N/mm 2 for 60 minutes. The film is peeled off and the surface of the test plate is FT-IR (Fourier transform infrared absorption). Spectral analysis, ATR method) The IR measurement was carried out by the presence or absence of the absorption peak from the adhesive to detect the presence or absence of residual glue, and those without residual glue were evaluated as sputum, and those with residual glue were referred to as X. (5) Residual rubber evaluation test-2 A 7 mm x 15 cm 2 mm float glass plate was used as a test piece (in-situ), and the adhesive layer cut into a 3 cm x 5 cm-sized processed film was attached without sandwiching bubbles. IR reflow with a maximum temperature of 260 °C and a heating time of 3 minutes (reflow oven: phase mold WL-15-20DNX type). Then, after standing at room temperature for 1 hour, the processed film was peeled off, and the surface of the object was observed by a digital microscope to examine the presence or absence of residual glue. Residual gums were evaluated according to the following criteria. Residue ratio in lcm2 -25- 200951197 Less than 5% : 〇 5%~Unreached 30% : △

30%以上 :X (6)殘留矽酮 以裁切成22cmx22cm大小之用於製作軟性印刷配線板 之基材薄片(聚醯亞胺薄片)爲試驗板(被著體),將裁切 成20cmx20cm大小之加工薄膜之黏著劑層面貼合而不夾入 氣泡,溫度180°C、壓力4.3N/mm2之條件下熱壓1小時後, ® 剝離加工薄膜。試驗板表面以X線光電分光法(XPS)依 下述條件進行元素分析。 測定裝置:ARUBAKFAI 製 Quantera SXM X 線源:AIK α ( 1 486.6 eV) 射出角度:45度 測定元素:矽(Si)、碳(C)及氮(N) 而Si量係於Si/(Si + C + N)之値乘以100,以「原子%」 表示。有Si量之偵測則矽酮已遷移。 © (7)重量平均分子量與數量平均分子量之測定法(GPC) 溶解各實施例中得之黏著劑於四氫呋喃(聚合物濃 度:10毫克/毫升),以凝膠滲透層析(GPC )法測定標準 聚苯乙烯換算之重量平均分子量與數量平均分子量。測定 係使用GPC裝置[高速GPC裝置HLC-8120GPC,東曹(股) 製],依序連結高速管柱 TSK guard column HxL-H、TSKGel GMHxl、TSKGel GMHxl、TSKGel G2000Hxl (以上皆係東曹 (股)製)於裝置作測定。管柱溫度爲4CTC、輸液速度1.0 毫升/分鐘,偵測器係用紫外可見偵測器(偵測器波長; -26- 200951197 2 54 nm)及微差折射計(皆係東曹(股)製)β 分子量分布係以GPC法測得之重量平均分子量(Mw)與 數量平均分子量(Mn)之比(Mw/Mn)。而,單體成分係排除値。 (8)儲存彈性模數變化率 依下述方法測定23°C之儲存彈性模數G,23&amp; 26(TC之 儲存彈性模數G’26。,由式 X ( % ) = [ ( G ’ 2 3 — G ’ 2 6 0 ) / G ’ 2 3 ] X 1 0 〇 求出儲存彈性模數變化率X。 ® &lt; G ’ 2 3及G ’ 2 6 D之測定〉 將基材薄膜以測定長度(夾頭間距)2〇mm安裝於動態黏 彈性測定裝置[TA Instruments公司製,商品名DMA-Q800], 頻率1 1Hz,振幅20 a m,升溫速度5°C /min之條件下,測 定溫度範圍15〜300°C之儲存彈性模數G’,得23°C之儲存 彈性模數G’23、260°C之儲存彈性模數G’26。。 又,黏著劑層之保持力、熱壓前及熱壓後之黏著力、 凝膠分率係依說明書本文所述之方法測定。 ©實施例1 使用備有攪拌機、回流冷卻器、滴液漏斗、氮氣導入 管及溫度計之反應裝置,將丙烯酸丁酯(BA)61.0質量份、 甲基丙烯酸甲酯(MM A ) 18.0質量份、苯乙烯(St) 3.5質 量份、丙烯酸甲酯(MA) 12.0質量份、甲基丙烯酸2-羥乙 酯(HEM A ) 5.0質量份、丙烯酸(A Ac ) 0.15質量份以偶 氮雙異丁腈(AIBN ) 0.01質量份用作聚合引發劑,加甲苯 作爲溶劑,於氮氣氛圍下溶液聚合,製造固體成分4 0.0質 量%,重量平均分子量約45萬,分子量分布(Mw/Mn)2.60 -27- 200951197 之丙烯酸酯系共聚物。 而,殘留單體含量係由下述測定法,爲丙烯酸酯系共 聚物之10.0質量%。 &lt;殘留單體含量之測定&gt; 殘留單體含量係以氣態層析法定量測定,算出。 於此丙烯酸酯系共聚物100質量份配合甲苯二異氰酸 酯系(TDI系)交聯劑[東洋油墨製造(股)製,商品名OLIBINE BHS8515 (固體成分37.5質量% ) ]8.0質量份與二甲苯二 異氰酸酯系(XDI系)交聯劑[武田藥品工業(股)製,商 品名D-110N (固體成分75質量% ) ]3.0質量份、甲苯30.0 質量份、乙酸乙酯1.0質量份,調製黏著劑。 其次,直接塗布於厚度50#m之聚對酞酸乙二酯(PET) 薄膜[YUNITIKA(股)製,商品名ENPLETTA-50]之一面, 至乾燥後之塗布量可達l〇g/m2 (厚度10μ m),於12(TC乾燥 1分鐘後,於其上積層具有矽酮系剝離劑層之剝離材[王子 製紙公司製,商品名40RL-01Z],製作加工薄膜,評估諸特 性。而試驗板(被著體)係用聚醯亞胺薄片。又,殘膠係 以殘膠評估試驗-1評估。結果如表1。 實施例2 如表1變化單體組成以外如同實施例1製造固體成分 40.0質量%,重量平均分子量約 46萬,分子量分布 (Mw/Mn)2.70,殘留單體12.0質量%之丙烯酸酯系共聚物。 以下如同實施例1製作加工薄膜,評估諸特性。結果 如表1。 比較例1 -28- 200951197 實施例1中,進行溶液聚合後’再聚合—次以外’如 同實施例1製造丙稀酸酯系共聚物°得到之丙儲酸醋系共 聚物之重量平均分子量約47萬,分子量分布(Mw/Mn)3·29。 又,殘留單體含量如同實施例1測定,爲丙燦酸酯系 共聚物之3.4質量%。 以下’如同實施例1製作加工薄膜,評估諸特性。結 果如表1。30% or more: X (6) Residual anthrone is cut into a 22cm x 22cm substrate sheet (polyimine sheet) for making a flexible printed wiring board as a test board (bedding), which will be cut into 20cm x 20cm The adhesive layer of the processed film of the size is bonded without sandwiching the air bubbles, and after hot pressing for 1 hour at a temperature of 180 ° C and a pressure of 4.3 N/mm 2 , the film is peeled off. The surface of the test plate was subjected to elemental analysis by X-ray photoelectron spectroscopy (XPS) under the following conditions. Measuring device: ARTUKAFAI Quantera SXM X Line source: AIK α (1 486.6 eV) Injection angle: 45 degrees Measurement elements: bismuth (Si), carbon (C) and nitrogen (N) and Si amount in Si/(Si + Multiply C + N) by 100, expressed as "atomic %". When the amount of Si is detected, the fluorenone has migrated. © (7) Determination of weight average molecular weight and number average molecular weight (GPC) The adhesive obtained in each example was dissolved in tetrahydrofuran (polymer concentration: 10 mg/ml) and determined by gel permeation chromatography (GPC). The weight average molecular weight and the number average molecular weight in terms of standard polystyrene. The measurement system uses a GPC device [high-speed GPC device HLC-8120GPC, manufactured by Tosoh Co., Ltd.], and sequentially connects the high-speed column TSK guard column HxL-H, TSKGel GMHxl, TSKGel GMHxl, TSKGel G2000Hxl (all of which are Dongcao) )) is measured in the device. The column temperature is 4CTC, the infusion rate is 1.0 ml/min, and the detector uses UV-visible detector (detector wavelength; -26- 200951197 2 54 nm) and differential refractometer (both toss) The β molecular weight distribution is a ratio (Mw/Mn) of a weight average molecular weight (Mw) to a number average molecular weight (Mn) measured by a GPC method. However, the monomer component excludes hydrazine. (8) Storage elastic modulus change rate The storage elastic modulus G, 23 & 26 (TC storage elastic modulus G'26 of TC) was measured by the following method. From the formula X (%) = [(G' 2 3 — G ' 2 6 0 ) / G ' 2 3 ] X 1 0 〇 Determine the storage elastic modulus change rate X. ® &lt; G ' 2 3 and G ' 2 6 D Determination > The measurement length (clamp pitch) was measured by a dynamic viscoelasticity measuring apparatus [manufactured by TA Instruments, trade name DMA-Q800] at a frequency of 1 Hz, an amplitude of 20 am, and a temperature increase rate of 5 ° C /min. The storage elastic modulus G' of the temperature range of 15 to 300 ° C, the storage elastic modulus G'23 of 23 ° C, the storage elastic modulus G'26 of 260 ° C. Also, the retention of the adhesive layer, The adhesion and gel fraction before and after hot pressing are determined by the method described in the specification. © Example 1 A reaction apparatus equipped with a stirrer, a reflux condenser, a dropping funnel, a nitrogen introduction tube, and a thermometer was used. 61.0 parts by mass of butyl acrylate (BA), 18.0 parts by mass of methyl methacrylate (MM A ), 3.5 parts by mass of styrene (St), acrylic acid 12.0 parts by mass of ester (MA), 5.0 parts by mass of 2-hydroxyethyl methacrylate (HEM A ), 0.15 parts by mass of acrylic acid (A Ac ), 0.01 parts by mass of azobisisobutyronitrile (AIBN) as a polymerization initiator And adding toluene as a solvent, and solution polymerization under a nitrogen atmosphere to produce an acrylate-based copolymer having a solid content of 0.0% by mass, a weight average molecular weight of about 450,000, and a molecular weight distribution (Mw/Mn) of 2.60-27-200951197. The monomer content is 10.0% by mass of the acrylate-based copolymer by the following measurement method. <Measurement of Residual Monomer Content> The residual monomer content is quantitatively measured by a gas chromatography method and is calculated. 100 parts by mass of a copolymer and a toluene diisocyanate-based (TDI) crosslinking agent [manufactured by Toyo Ink Co., Ltd., trade name: OLIBINE BHS8515 (solid content: 37.5 mass%)] 8.0 parts by mass and xylene diisocyanate (XDI) A cross-linking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name: D-110N (solid content: 75 mass%)] 3.0 parts by mass, toluene 30.0 parts by mass, and ethyl acetate 1.0 parts by mass to prepare an adhesive. Coated with a polyethylene terephthalate (PET) film (manufactured by YUNITIKA Co., Ltd., trade name ENPLETTA-50) with a thickness of 50#m, and the coating amount after drying is up to l〇g/m2 (thickness) After 10 minutes of TC drying, a release material having an anthrone-based release agent layer (manufactured by Oji Paper Co., Ltd., trade name: 40RL-01Z) was laminated thereon to prepare a processed film, and the properties were evaluated. The test plate (on the body) was coated with a polyimide film. Further, the residual gum was evaluated by Residue Evaluation Test-1. The results are shown in Table 1. Example 2 An acrylate-based copolymer having a solid content of 40.0% by mass, a weight average molecular weight of about 460,000, a molecular weight distribution (Mw/Mn) of 2.70, and a residual monomer of 12.0% by mass, as in Example 1, was changed as in Table 1. . The processed film was produced as in Example 1 below, and the properties were evaluated. The results are shown in Table 1. Comparative Example 1 -28- 200951197 In Example 1, the weight average molecular weight of the C-storage vinegar-based copolymer obtained by performing the solution polymerization after 'repolymerization-time other than the production of the acrylate copolymer as in Example 1 470,000, molecular weight distribution (Mw / Mn) 3.29. Further, the residual monomer content was measured in the same manner as in Example 1 and was 3.4% by mass based on the propionic acid ester copolymer. The processed film was produced as in Example 1 below, and the properties were evaluated. The results are shown in Table 1.

-29- 200951197 表1 實施例1 實施例2 比較例3 單體 (質量份) BA 61.0 63.0 61.0 MMA 18.0 15.0 18.0 St 3.5 5.0 3.5 ΜΑ 12.0 12.0 12.0 HEMA 5.0 5.0 5.0 AAc 0.15 0.15 0.15 交聯劑 (質量份) BHS8515 8.0 8.0 8.0 D-110N 3.0 3.0 3.0 丙烯酸酯系 共聚物 Mw 45萬 46萬 47萬 Mw/Mn 2.60 2.70 3.29 丙烯酸酯系# 單體含量(質 矣聚物之殘留 10.0 12.0 3.4 黏著力 (N/25mm) 熱壓前 0.06 0.08 0.12 熱壓後 0.20 0.31 0.42 熱壓後之滑移Um) 0 0 0 與基材薄膜之密著性 5 5 5 殘膠評估試顆 Μ 〇 〇 〇 保持力 (秒) 70,000 &lt; 70,000 &lt; 70,000 &lt; 70,000秒時 之滑移量 無滑移 (&lt;0.1mm) 無滑移 (&lt;0.1mm) 無滑移 (&lt;0.1mm) 凝膠分率(%) 97.4 97.6 95.7 接著力(N/20mm) 40.0 38.0 2.0 -30- 200951197 由表1知,實施例1及2之加工薄膜相較於比較例1 者,於接著試驗具有極高之接著力。 實施例3 使用備有攪拌機、回流冷卻器、滴液漏斗、氮氣導入 管及溫度計之反應裝置,將丙烯酸丁酯(BA) 60.0質量份、 甲基丙烯酸甲酯(MM A ) 18.0質量份、苯乙烯(St) 3.5質 量份、丙烯酸甲酯(MA) 13.0質量份、甲基丙烯酸2-羥乙 酯(HEM A ) 5.0質量份、丙烯酸(AAC) 0.15質量份使用 © 偶氮雙異丁腈(AIBN) 0.01質量份作爲聚合引發劑,加甲 苯作爲溶劑,於氮氣氛圔下溶液聚合,製造固體成分40.0 質量%,重量平均分子量約47萬,分子量分布(Mw/Mn)2.4 之丙烯酸酯系共聚物。 又,殘留單體含量係如同實施例1測定,爲丙烯酸酯 系共聚物之11.0質量%。 於此丙烯酸酯系共聚物溶液100質量份(固體成分40.0 質量%)配合甲苯二異氰酸酯系(TDI系)交聯劑[東洋油 ® 墨製造(股)製,商品名OLIBINE BHS8515C固體成分37.5 質量%) ]8.0質量份與二甲苯二異氰酸酯系(XDI系)交 聯劑[武田藥品工業(股)製,商品名D-110N (固體成分 75質量%) ]3.0質量份、乙酸乙酯40.0質量份,調製黏著 劑。 其次,直接塗布於厚度50#m之聚對酞酸乙二酯(PET) 薄膜[丫111^11'11^(股)製,商品名丑,1^1'丁入-5 0]之一面, 至乾燥後塗布量可達l〇g/m2 (厚度' 10 /z m),於120°C乾燥1 -31- 200951197 分鐘後,於其上積層聚丙烯樹脂所成之剝離材[王子製紙公 司製,商品名ALFAN PP40SD-001],製作加工薄膜,評估 諸特性。而,殘膠係以殘膠評估試驗-1評估。結果如表2。 實施例4 如表2變化單體組成以外如同實施例3,製造固體成分 40.0質量%,重量平均分子量約 50萬,分子量分布 (Mw/Mn)2.7,殘留單體8.3質量%之丙烯酸酯系共聚物。 以下如同實施例3製作加工薄膜,評估諸特性。結果 ❾如表2。 實施例5 剝離材變爲其一面以醇酸樹脂作脫模處理之厚度50g m之聚對酞酸乙二酯薄膜[LINTEC (股)製,商品名PET50 AL-5]以外,如同實施例3製作加工薄膜,評估諸特性。結 果如表2。 實施例6 以使用矽酮系剝離劑層之剝離材[LINTEC (股)製,商 〇 品名SP-PET38 1 1]使用以外,如同實施例3製作加工薄膜。 結果如表2 » 比較例2 實施例3中,進行溶液聚合後,再一次進行聚合以外, 如同實施例3製造丙烯酸酯系共聚物。得到之丙烯酸酯系 共聚物之重量平均分子量約55萬,分子量分布(Mw/Mn) 3.4。 又,殘留單體含量係如同實施例1測定,爲丙烯酸酯 * 系共聚物之3.5質量%。 -32- .200951197 以下,如同實施例3製作加工薄膜,評估諸特性。結 果如表2。-29- 200951197 Table 1 Example 1 Example 2 Comparative Example 3 Monomer (parts by mass) BA 61.0 63.0 61.0 MMA 18.0 15.0 18.0 St 3.5 5.0 3.5 ΜΑ 12.0 12.0 12.0 HEMA 5.0 5.0 5.0 AAc 0.15 0.15 0.15 Crosslinking agent (quality份) BHS8515 8.0 8.0 8.0 D-110N 3.0 3.0 3.0 Acrylate Copolymer Mw 456.46 million Mwan/Mn 2.60 2.70 3.29 Acrylate # monomer content (residue of ruthenium polymer 10.0 12.0 3.4 Adhesion ( N/25mm) 0.06 0.08 before hot pressing 0.22 0.20 after hot pressing 0.31 0.42 Slip after hot pressing Um) 0 0 0 Adhesion to substrate film 5 5 5 Residue evaluation test Μ 〇〇〇 Retention ( Second) 70,000 &lt; 70,000 &lt; 70,000 &lt; slip amount at 70,000 seconds without slip (&lt;0.1 mm) no slip (&lt;0.1 mm) no slip (&lt;0.1 mm) gel fraction ( %) 97.4 97.6 95.7 Next force (N/20 mm) 40.0 38.0 2.0 -30- 200951197 It is understood from Table 1 that the processed films of Examples 1 and 2 have a very high adhesion force in the subsequent tests as compared with Comparative Example 1. Example 3 60.0 parts by mass of butyl acrylate (BA), 18.0 parts by mass of methyl methacrylate (MM A ), and benzene were used in a reaction apparatus equipped with a stirrer, a reflux condenser, a dropping funnel, a nitrogen introduction tube, and a thermometer. 3.5 parts by mass of ethylene (St), 13.0 parts by mass of methyl acrylate (MA), 5.0 parts by mass of 2-hydroxyethyl methacrylate (HEM A ), 0.15 parts by mass of acrylic acid (AAC) using azobisisobutyronitrile ( AIBN) 0.01 parts by mass of a polymerization initiator, adding toluene as a solvent, and solution polymerization under a nitrogen atmosphere to produce a solid content of 40.0% by mass, a weight average molecular weight of about 470,000, and a molecular weight distribution (Mw/Mn) of 2.4 acrylate copolymerization. Things. Further, the residual monomer content was measured in the same manner as in Example 1 and was 11.0% by mass of the acrylate-based copolymer. 100 parts by mass of the acrylate-based copolymer solution (solid content: 40.0% by mass), and a toluene diisocyanate-based (TDI-based) crosslinking agent [manufactured by Toyo Oil® Ink Co., Ltd., trade name: OLIBINE BHS8515C, solid content, 37.5 mass% ] 8.0 parts by mass of a xylene diisocyanate-based (XDI-based) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name: D-110N (solid content: 75 mass%)] 3.0 parts by mass, and ethyl acetate 40.0 parts by mass , modulation of the adhesive. Secondly, it is directly coated on a polyethylene terephthalate (PET) film with a thickness of 50#m [丫111^11'11^(share) system, the product name is ugly, 1^1' Ding into -5 0] , after drying, the coating amount can reach l〇g/m2 (thickness '10 /zm), after drying at 120 °C for 1 -31-200951197 minutes, the release resin formed by laminating polypropylene resin on it [Oji Paper Co., Ltd. The product name is ALFAN PP40SD-001], and the film is processed and evaluated. However, the residual gum was evaluated by Residue Evaluation Test-1. The results are shown in Table 2. Example 4 As in Example 2, except that the monomer composition was changed, as in Example 3, an acrylate copolymer having a solid content of 40.0% by mass, a weight average molecular weight of about 500,000, a molecular weight distribution (Mw/Mn) of 2.7, and a residual monomer of 8.3% by mass was produced. Things. The processed film was produced as in Example 3, and the properties were evaluated. The results are shown in Table 2. Example 5 The release material was changed to a polyethylene terephthalate film having a thickness of 50 g m which was subjected to release treatment with an alkyd resin on one side, as in Example 3, manufactured by LINTEC Co., Ltd., trade name PET50 AL-5. The processed film was fabricated and evaluated for characteristics. The results are shown in Table 2. Example 6 A processed film was produced as in Example 3 except that a release material (manufactured by LINTEC Co., Ltd., trade name SP-PET 38 1 1) using an anthrone-based release agent layer was used. The results are shown in Table 2: Comparative Example 2 In Example 3, an acrylate-based copolymer was produced as in Example 3, except that polymerization was carried out again after solution polymerization. The obtained acrylate-based copolymer had a weight average molecular weight of about 550,000 and a molecular weight distribution (Mw/Mn) of 3.4. Further, the residual monomer content was measured in the same manner as in Example 1 and was 3.5% by mass of the acrylate* copolymer. -32-.200951197 Hereinafter, a processed film was produced as in Example 3, and various characteristics were evaluated. The results are shown in Table 2.

-33- 200951197-33- 200951197

Ζ0 比較例2 〇 g Ο 〇6 ν〇 CO ο cn &lt;'&lt; ο ν〇 1 &lt; Ο Ο ΟΟ Ο cn 55萬 〇 CO cn ALFAN PP40 SD-001 (N Ο o o 〇 〇 〇 V ο ο 無滑移 (&lt;0.1mm) CS vo σ\ ο 實施例6 〇 g ο 〇6 UO CO Ο CO 1 &lt; ο ι〇 Ό « Η Ο ο οό Ο CO 47萬 〇 03 〇 r-H 1-H SP-PET3811 s ο 沄 o o 〇 〇 ι-Η V ο ο 卜 無滑移 (&lt;0.1mm) ι 1 〇6 o ο CN CO 實施例5 ο s ο οό CO ο CO 1 * ο w-i νο ι 4 Ο ο οό ο cn 47萬 〇 Ο r»H ι-Η PET50AL-5 s ci s o o w-1 〇 ο ο V ο ο ο 無滑移 (&lt; 0.1mm) 〇6 ON Ο ο 實施例4 ο vo ο νο ο Ο CO 赘_Η ο 1 &lt; Ο ο οό Ο CO 50萬 〇 03 m od ALFAN PP40 SD-001 S o o o ΙΟ 〇 ο ο V ο ο 無滑移 (&lt;0.1mm) s; ο 實施例3 o g ο οό CO ο cn 1 &lt; ο ι 1 Ο ο οό ο CO 47萬 〇 03 Ο »-Η ι-Η ALFAN PP40 SD-001 g o c5 o un 〇 ο c5 V ο ο 無滑移 (〈0.1mm) 1 i 00 ON ο &lt; OQ ΜΜΑ &lt; ΗΕΜΑ AAC BHS8515 D-110N 1 Mw/Mn 燄 •Ν ^ 辦_ 剝離材 熱壓前 熱壓後 /—N B 绝 N m 癒 TlvV» 與基材薄膜之密著性 殘膠評估試驗-1 /-Ν Μ丨 (秒) 70,000秒時 之滑移量 凝膠分率(%) 接著試驗(N/20mm) 單體 (質量份) 交聯劑 (質量份) 丙烯酸酯系 共聚物 *π\ 味_ 趦聽 1E钿 黏著力 (N/25mm) 111 Μ 園 保持力 —寸ε, 200951197 由表2知,實施例3〜6之加工薄膜較之比較例2者, 於接著試驗具有高接著力。又,實施例3〜5係使用具有非 矽酮系剝離劑層之剝離材,而實施例卩係使用具有矽酮系 剝離劑層之剝離材,故於接著試驗之接著力不如實施例3 〜5 〇 實施例7 如同實施例3製造丙烯酸.酯系共聚物溶液。 於此丙烯酸酯系共聚物溶液1〇〇質量份(固體成分4 0.0 ® 質量%)配合二甲苯二異氰酸酯系(XDI系)交聯劑[武田 藥品工業(股)製,商品名D-110N(固體成分75質量%)]9.0 質量份、乙酸乙酯40.0質量份,調製黏著劑。 其次,直接塗布於厚度50ym,儲存彈性模數變化率 40%之聚醯亞胺薄膜[東麗•杜邦(股)製,註冊商標ΚΑΡΤΟΝ] 之一面,至乾燥後塗布量可達l〇g/m2,於120°C乾燥1分鐘 後,於其上積層聚丙烯樹脂所成之剝離材[王子製紙公司 製,商品名ALFAN PP40SD-001],製作加工薄膜,採用殘 w 膠評估試驗-2評估殘膠。結果如表3。 實施例8 如同實施例1製造丙烯酸酯系共聚物。 於此丙烯酸酯系共聚物溶液1〇〇質量份(固體成分40.0 質量%)配合二甲苯二異氰酸酯系(XDI系)交聯劑[武田 藥品工業(股)製,商品名D-11 0N(固體成分75質量% )]7.0 質量份、乙酸乙酯40.0質量份,調製黏著劑。 其次,直接塗布於厚度50 vm,儲存彈性模數變化率 -35- 200951197 40 %之聚醯亞胺薄膜[東麗•杜邦(股)製,註冊商標ΚΑΡΤΟΝ] 之一面,至乾燥後塗布量可達l〇g/m2,於120°C乾燥1分鐘 後,於其上積層聚丙烯樹脂所成之剝離材[王子製紙公司 製,商品名ALFAN PP40SD-001],製作加工薄膜,採用殘 膠評估試驗-2評估殘膠。結果如表3。 比較例3 使用比較例1中製作之黏著劑溶液以外如同實施例7 製作加工薄膜,採用殘膠評估試驗-2評估殘膠。結果如表 ©3Ζ0 Comparative Example 2 〇g Ο 〇6 ν〇CO ο cn &lt;'&lt; ο ν〇1 &lt; Ο Ο ΟΟ cn cn 55 million 〇CO cn ALFAN PP40 SD-001 (N Ο oo 〇〇〇V ο ο No slip (&lt;0.1mm) CS vo σ\ ο Example 6 〇g ο 〇6 UO CO Ο CO 1 &lt; ο ι〇Ό « Η Ο ο οό Ο CO 47 million 〇 03 〇rH 1-H SP -PET3811 s ο 沄oo 〇〇ι-Η V ο ο 卜 no slip (&lt;0.1mm) ι 1 〇6 o ο CN CO Example 5 ο s ο οό CO ο CO 1 * ο wi νο ι 4 Ο ο οό ο cn 470,000 〇Ο r»H ι-Η PET50AL-5 s ci soo w-1 〇ο ο V ο ο ο No slip (&lt; 0.1mm) 〇6 ON Ο ο Example 4 ο vo ο Νο ο Ο CO 赘_Η ο 1 &lt; Ο ο οό Ο CO 500,000 〇 03 m od ALFAN PP40 SD-001 S ooo ΙΟ 〇ο ο V ο ο No slip (&lt;0.1mm) s; ο Example 3 og ο οό CO ο cn 1 &lt; ο ι 1 Ο ο οό ο CO 47 million 〇 03 Ο »-Η ι-Η ALFAN PP40 SD-001 go c5 o un 〇ο c5 V ο ο No slip (<0.1 Mm) 1 i 00 ON ο &lt; OQ ΜΜΑ &lt; ΗΕΜΑ AAC BHS8515 D-110N 1 Mw/Mn flame • Ν ^ _ _ stripping material hot pressing After hot pressing / - NB N m TlvV» Adhesive evaluation test with substrate film - 1 / - Ν 秒 (seconds) Slip amount at 70,000 seconds Gel fraction (%) Next test (N/20mm) Monomer (parts by mass) Crosslinking agent (parts by mass) Acrylate copolymer *π\ Flavor _ 趦 Listening 1E钿 Adhesion (N/25mm) 111 Μ Garden holding power—inch ε, 200951197 by As shown in Table 2, the processed films of Examples 3 to 6 had higher adhesion in the subsequent tests than Comparative Example 2. Further, Examples 3 to 5 were carried out using a release material having a non-nonanone-based release agent layer. For example, a release material having an anthrone-based release agent layer was used, so that the adhesive strength of the subsequent test was not as good as in Examples 3 to 5. Example 7 An acrylic acid-ester copolymer solution was produced as in Example 3. 1 part by mass of the acrylate-based copolymer solution (solid content: 40.0% by mass), and a xylene diisocyanate-based (XDI-based) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name D-110N ( Solid content: 75 mass%)] 9.0 parts by mass and ethyl acetate 40.0 parts by mass to prepare an adhesive. Secondly, it is directly coated on a surface of 50 μm thick and stored in a polyimide film with a change rate of elastic modulus of 40% [manufactured by Toray Dupont Co., Ltd., registered trademark ΚΑΡΤΟΝ], and the coating amount can reach l〇g/ after drying. M2, after drying at 120 ° C for 1 minute, a release material made of a polypropylene resin (manufactured by Oji Paper Co., Ltd., trade name ALFAN PP40SD-001) was formed thereon, and a processed film was produced, and the evaluation was carried out using a residual rubber evaluation test-2. Residue. The results are shown in Table 3. Example 8 An acrylate-based copolymer was produced as in Example 1. 1 part by mass of the acrylate-based copolymer solution (solid content: 40.0% by mass), and a xylene diisocyanate-based (XDI-based) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name D-11 0N (solid) The component was 75 mass%)] 7.0 parts by mass, and 40.0 parts by mass of ethyl acetate, and an adhesive was prepared. Secondly, it is directly coated on a surface of 50 μm thick and stored in a polyimine film (manufactured by Toray Dupont Co., Ltd., registered trademark ΚΑΡΤΟΝ) with an elastic modulus change rate of -35-200951197 40%. After drying at 120 ° C for 1 minute, the laminate was laminated with a polypropylene resin (manufactured by Oji Paper Co., Ltd., trade name ALFAN PP40SD-001) to prepare a processed film, which was evaluated by residual glue. Test-2 evaluated the residual glue. The results are shown in Table 3. Comparative Example 3 A processed film was produced as in Example 7 except that the adhesive solution prepared in Comparative Example 1 was used, and the residual adhesive was evaluated by Residue Evaluation Test-2. The result is shown in the table ©3

-36- 200951197 表3 實施例7 實施例8 比較例3 單體 價量份) BA 60.0 61.0 61.0 MMA 18.0 18.0 18.0 St 3.5 3.5 3.5 ΜΑ 13.0 12.0 12.0 HEMA 5.0 5.0 5.0 AAC 0.15 0.15 0.15 交聯劑 (質量份) BHS8515 0.0 0.0 8.0 D-110N 9.0 7.0 3.0 丙烯酸酯系 共聚物 Mw 47萬 45萬 47萬 Mw/Mn 2.40 2.60 3.29 丙烯酸酯系共聚物之殘留單 體含量(質量%) 11.0 10.0 3.4 剝離材 ALFAN PP40 SD-001 ALFAN PP40 SD-001 ALFAN PP40 SD-001 與基材薄膜之密著性 5 5 5 殘膠碰試驗-2 〇 〇 X 殘留矽酮(原子%) 0.0 0.0 0.0 凝膠分率(%) 97.8 98.3 95.7 -37- 200951197 (產業上之利用可能性) 本發明之再剝離性加工薄膜,使用於用在多層印刷配 線板之軟性印刷配線板製作用基材薄片時,該再剝離性加 X薄膜經剝除之際,被著體基材薄片側之污染被抑制,環 氧系樹脂薄片等接著性薄片與該基材薄片之接著力下降可 予抑制。又,以CCD、CMOS之玻璃部等用作被著體時, 暴露於260 °C左右之溫度,對於被著體之殘膠、基材薄片之 變形亦少,耐熱性優良。 © 【圖式簡單說明】 drrr 彌0 【主要元件符號說明】 Ατι*· 無。 -38--36- 200951197 Table 3 Example 7 Example 8 Comparative Example 3 Part of the valence of the monomer BA 60.0 61.0 61.0 MMA 18.0 18.0 18.0 St 3.5 3.5 3.5 ΜΑ 13.0 12.0 12.0 HEMA 5.0 5.0 5.0 AAC 0.15 0.15 0.15 Crosslinker (quality份) BHS8515 0.0 0.0 8.0 D-110N 9.0 7.0 3.0 Acrylate copolymer Mw 474,45,700,000 Mw/Mn 2.40 2.60 3.29 Residual monomer content of acrylate copolymer (% by mass) 11.0 10.0 3.4 Release material ALFAN PP40 SD-001 ALFAN PP40 SD-001 ALFAN PP40 SD-001 Adhesion to substrate film 5 5 5 Residue test - 2 〇〇X Residual fluorenone (atomic %) 0.0 0.0 0.0 Gel fraction (% 97.8 98.3 95.7 -37- 200951197 (Industrial Applicability) The re-peelable film of the present invention is used for a base sheet for producing a flexible printed wiring board for a multilayer printed wiring board. When the X film is peeled off, the contamination on the side of the substrate sheet is suppressed, and the adhesion between the adhesive sheet such as the epoxy resin sheet and the substrate sheet can be suppressed. Further, when a glass portion such as a CCD or a CMOS is used as a substrate, it is exposed to a temperature of about 260 ° C, and the deformation of the residue and the substrate sheet of the object is small, and the heat resistance is excellent. © [Simple description] drrr 0 [Main component symbol description] Ατι*· None. -38-

Claims (1)

200951197 七、申請專利範圍: 1. 一種再剝離性加工薄膜,係具有基材薄膜,與設在該基 材薄膜的一面之黏著劑層之再剝離性加工薄膜,其特徵 爲該黏著劑層係使用含(A)具有丙烯酸丁酯單元40〜80 質量%、苯乙烯單元1〜15質量%、甲基丙烯酸甲酯單 元1〜30質量%、丙烯酸甲酯單元1〜30質量%、含羥 基之乙烯系單體單元1〜10質量%與含羧基之乙烯系單 體單元0.1〜1質量%之丙烯酸酯系共聚物,及(B)異 Q 氰酸酯系交聯劑,且該丙烯酸酯系共聚物之重量平均分 子量Mw係30萬〜100萬,分子量分布(重量平均分子量 Mw/數量平均分子量Μη)係3.0以下之黏著劑形成》 2. 如申請專利範圍第1項之再剝離性加工薄膜,其中(Α) 丙烯酸酯系共聚物中殘留單體之含量佔該(Α)丙烯酸酯 系共聚物之5〜20質量%。 3. —種再剝離性加工薄膜,係積層如申請專利範圍第1或 2項之再剝離性加工薄膜與具有非矽酮系剝離劑層之剝 〇 離材,使該再剝離性加工薄膜之黏著劑層相向於該剝離 材之剝離劑層之面而成。 4. 如申請專利範圍第3項之再剝離性加工薄膜,其中非矽 酮系剝離劑層係聚丙烯樹脂。 5. 如申請專利範圍第1或2項之再剝離性加工薄膜,其中 黏著劑兼含甲苯二異氰酸酯系交聯劑與二甲苯二異氰 酸酯系交聯劑作爲異氰酸酯系交聯劑。 6. 如申請專利範圍第1或2項之再剝離性加工薄膜,其中 以用於多層印刷配線板之軟性印刷配線板之塑膠薄片 -39- 200951197 用作被著體。 7. 如申請專利範圍第6項之再剝離性加工薄膜,其中 (a) 依JIS Z 0237之測定法,對於用於軟性印刷配線板 之塑膠薄片即被著體之保持力,於溫度40 °C係 70,000秒以上,且於70,000秒之時滑移未達0.1mm, (b) 依nS Z 0237之測定法,對於用於軟性印刷配線板 之塑膠薄片即被著體之黏著力,在熱壓前係0.01〜 0.5N/25mm · (c) 貼合在用於軟性印刷配線板之塑膠薄片(被著體) 後,於溫度180°C、壓力4.3N/mm2之條件下進行熱 壓60分鐘後之黏著力,依JIS Z 0237之測定法,係 2.0N/25mm 以下,且 (d) 黏著劑層之凝膠分率係95%以上。 8. 如申請專利範圍第6項之再剝離性加工薄膜,其中軟性 印刷配線板之塑膠薄片係使用聚醯亞胺薄片或聚苯硫 醚薄片而得者》 ©9.如申請專利範圍第6項之再剝離性加工薄膜,其中基材 薄膜係聚對酞酸乙二酯薄膜。 10.如申請專利範圍第丨或2項之再剝離性加工薄膜,其中 以金屬材料或其以外之無機材料用作被著體。 11.如申請專利範圍第10項之再剝離性加工薄膜,其中被 著體係電荷耦合裝置或互補式金屬氧化膜半導體元件 之玻璃部。 12.如申請專利範圍第1或2項之再剝離性加工薄膜,其中 黏著劑係以二甲苯二異氰酸酯系交聯劑用作異氰酸酯 系交聯劑而得者。 -40- 200951197 13. 如申請專利範圍第ι〇項之再剝離性加工薄膜,其中黏 著劑係以二甲苯二異氰酸酯系交聯劑用作異氰酸酯系 交聯劑而得者。 14. 如申請專利範圍第1或2項之再剝離性加工薄膜,其中 基材薄膜於23°C之儲存彈性模數爲G’23,26(TC之儲存 彈性模數爲G,26()時,下述式之儲存彈性模數變化率X 係8 5 %以下, X ( /6 ) — [(G’23 _ G ’2 6。) / G ’2 3 ] X 1 0 0 。 0 15.如申請專利範圍第10項之再剝離性加工薄膜,其中基 材薄膜於23°c之儲存彈性模數爲〇,23,260。(:之儲存彈 性模數爲G’26。時,下述式之儲存彈性模數變化率X係 85%以下, X ( /0 ) — [ ( G * 2 3 — G ’ 2 6。)/ G ’ 2 3 ] X 1 0 〇 。 1 6.如申請專利範圍第1或2項之再剝離性加工薄膜,其中 基材薄膜係聚醯亞胺薄膜。 17.如申請專利範圍第項之再剝離性加工薄膜,其中基 Q 材薄膜係聚醯亞胺薄膜。 -41 - 200951197 四、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: ίΒΕ 。 ❹五、本案若有化學式時,請揭示最能顯示發明特徵的化學式:200951197 VII. Patent application scope: 1. A re-peelable processed film, which is a re-peelable processed film having a substrate film and an adhesive layer provided on one side of the substrate film, characterized in that the adhesive layer is The use of (A) has a butyl acrylate unit of 40 to 80% by mass, a styrene unit of 1 to 15% by mass, a methyl methacrylate unit of 1 to 30% by mass, a methyl acrylate unit of 1 to 30% by mass, and a hydroxyl group. 1 to 10% by mass of the vinyl monomer unit, 0.1 to 1% by mass of the acrylate-based copolymer having a carboxyl group-containing vinyl monomer unit, and (B) an iso-Q cyanate-based crosslinking agent, and the acrylate system The weight average molecular weight Mw of the copolymer is 300,000 to 1,000,000, and the molecular weight distribution (weight average molecular weight Mw / number average molecular weight Μη) is an adhesive formation of 3.0 or less. 2. Re-peelable processed film according to claim 1 The content of the residual monomer in the (Α) acrylate-based copolymer accounts for 5 to 20% by mass of the (Α) acrylate-based copolymer. 3. A re-peelable processed film, which is a re-peelable processed film having a non-fluorenone-based release agent layer as disclosed in claim 1 or 2, such that the re-peelable processed film is The adhesive layer is formed to face the surface of the release agent layer of the release material. 4. A re-peelable processed film according to claim 3, wherein the non-ketone-based release agent layer is a polypropylene resin. 5. The re-peelable processed film according to claim 1 or 2, wherein the adhesive further comprises a toluene diisocyanate crosslinking agent and a xylene diisocyanate crosslinking agent as an isocyanate crosslinking agent. 6. The re-peelable processed film according to claim 1 or 2, wherein the plastic sheet-39-200951197 for a flexible printed wiring board for a multilayer printed wiring board is used as an object. 7. The re-peelable processed film according to item 6 of the patent application, wherein (a) according to the measurement method of JIS Z 0237, the holding force of the plastic sheet for the flexible printed wiring board, that is, the temperature at 40 ° The C system is 70,000 seconds or more, and the slip is less than 0.1 mm at 70,000 seconds. (b) According to the measurement method of nS Z 0237, the adhesive force for the plastic sheet used for the flexible printed wiring board is the heat of the body. 0.01 to 0.5 N/25 mm before pressing. (c) After being applied to a plastic sheet (attached body) used for a flexible printed wiring board, hot pressing is performed at a temperature of 180 ° C and a pressure of 4.3 N/mm 2 . The adhesion after minute is 2.0 N/25 mm or less according to the measurement method of JIS Z 0237, and (d) the gel fraction of the adhesive layer is 95% or more. 8. The re-peelable processed film according to item 6 of the patent application, wherein the plastic sheet of the flexible printed wiring board is obtained by using a polyimide film or a polyphenylene sulfide sheet. ©9. Patent Application No. 6 A re-peelable processed film, wherein the substrate film is a polyethylene terephthalate film. 10. The re-peelable processed film of claim 2 or 2, wherein the metal material or an inorganic material other than the same is used as the object. 11. The re-peelable processed film according to claim 10, wherein the glass portion of the system charge-coupled device or the complementary metal oxide film semiconductor device is used. 12. The re-peelable processed film according to claim 1 or 2, wherein the adhesive is obtained by using a xylene diisocyanate crosslinking agent as an isocyanate crosslinking agent. The re-peelable processed film of the invention of claim 1, wherein the adhesive is obtained by using a xylene diisocyanate crosslinking agent as an isocyanate crosslinking agent. 14. The re-peelable processed film according to claim 1 or 2, wherein the storage film has a storage elastic modulus of G'23, 26 at 23 ° C (the storage elastic modulus of TC is G, 26 () When the storage elastic modulus change rate of the following formula is X 55% or less, X ( /6 ) — [(G'23 _ G '2 6 .) / G '2 3 ] X 1 0 0 . 0 15 The re-peelable processed film according to claim 10, wherein the storage film has a storage elastic modulus of 23, 260 at 23 ° C. (: the storage elastic modulus is G'26. The storage elastic modulus change rate of the above formula is 85% or less, X ( /0 ) — [ ( G * 2 3 — G ' 2 6 .) / G ' 2 3 ] X 1 0 〇. The re-peelable processed film of the first or second aspect of the invention, wherein the base film is a polyimide film. 17. The re-peelable processed film according to the scope of the patent application, wherein the base Q film is polyimine. Film -41 - 200951197 IV. Designated representative map: (1) The representative representative of the case is: No. (2) The symbol of the symbol of the representative figure is simple: ΒΕ 。 、 、 、 、 、 、 、 、 、 、 Please disclosed invention features most indicative of the formula:
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