JP2010116532A - Re-releasable process film - Google Patents
Re-releasable process film Download PDFInfo
- Publication number
- JP2010116532A JP2010116532A JP2009039490A JP2009039490A JP2010116532A JP 2010116532 A JP2010116532 A JP 2010116532A JP 2009039490 A JP2009039490 A JP 2009039490A JP 2009039490 A JP2009039490 A JP 2009039490A JP 2010116532 A JP2010116532 A JP 2010116532A
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- JP
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- Prior art keywords
- process film
- film
- mass
- pressure
- printed wiring
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 182
- 230000008569 process Effects 0.000 title claims abstract description 152
- 239000000853 adhesive Substances 0.000 claims abstract description 89
- 230000001070 adhesive effect Effects 0.000 claims abstract description 89
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims abstract description 71
- 239000010410 layer Substances 0.000 claims abstract description 56
- 239000000178 monomer Substances 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 40
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 27
- 238000009826 distribution Methods 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 16
- 239000012948 isocyanate Substances 0.000 claims abstract description 13
- 150000002513 isocyanates Chemical class 0.000 claims abstract description 13
- 229920001577 copolymer Polymers 0.000 claims description 42
- -1 polypropylene Polymers 0.000 claims description 25
- 238000003860 storage Methods 0.000 claims description 24
- 239000003795 chemical substances by application Substances 0.000 claims description 22
- 238000007731 hot pressing Methods 0.000 claims description 22
- 229920001721 polyimide Polymers 0.000 claims description 22
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 18
- 229920002554 vinyl polymer Polymers 0.000 claims description 17
- 239000004642 Polyimide Substances 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 claims description 14
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical group COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 13
- 229920001296 polysiloxane Polymers 0.000 claims description 12
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical group CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims description 11
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 11
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 11
- 239000007769 metal material Substances 0.000 claims description 10
- 239000012790 adhesive layer Substances 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 239000002985 plastic film Substances 0.000 claims description 9
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 claims description 9
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 230000008859 change Effects 0.000 claims description 8
- 229910010272 inorganic material Inorganic materials 0.000 claims description 8
- 239000011147 inorganic material Substances 0.000 claims description 8
- 239000004743 Polypropylene Substances 0.000 claims description 7
- 229920001155 polypropylene Polymers 0.000 claims description 7
- 238000000691 measurement method Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 5
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 4
- 230000000295 complement effect Effects 0.000 claims description 4
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 229920006243 acrylic copolymer Polymers 0.000 abstract 2
- 238000012360 testing method Methods 0.000 description 35
- 239000000758 substrate Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 238000001035 drying Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- 239000007787 solid Substances 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000011109 contamination Methods 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000005227 gel permeation chromatography Methods 0.000 description 8
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000005056 polyisocyanate Substances 0.000 description 3
- 229920001228 polyisocyanate Polymers 0.000 description 3
- 238000004080 punching Methods 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 208000023514 Barrett esophagus Diseases 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical class C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000011086 glassine Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000005487 naphthalate group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/414—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2425/00—Presence of styrenic polymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2479/00—Presence of polyamine or polyimide
- C09J2479/08—Presence of polyamine or polyimide polyimide
- C09J2479/086—Presence of polyamine or polyimide polyimide in the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本発明は、再剥離性工程フィルムに関し、さらに詳しくは、多層プリント配線板に用いるフレキシブルプリント配線基板作製用基材シート、あるいは、金属材料又はそれ以外の無機材料、例えば電荷結合素子又は相補性金属酸化膜半導体素子におけるガラス部などに好適に適用される、基材フィルムと、その一方の面に設けられたアクリル系粘着剤層を有する再剥離性工程フィルムに関する。 The present invention relates to a removable process film, and more particularly, a base sheet for producing a flexible printed wiring board used for a multilayer printed wiring board, or a metal material or other inorganic material such as a charge coupled device or a complementary metal. The present invention relates to a removable process film having a base film and an acrylic pressure-sensitive adhesive layer provided on one surface thereof, which is preferably applied to a glass portion or the like in an oxide film semiconductor element.
プリント配線基板は、それに搭載される電気・電子部品間を接続するために必要な導体の回路パターンが、絶縁基板の表面又は表面とその内部にプリントなどによって形成された配線板である。
このようなプリント配線基板は、形状面から見ると硬質プリント配線基板とフレキシブルプリント配線基板に大別することができ、また構造的には単層、2層以上の多層に分けられる。
これらのプリント配線基板の中で、フレキシブルプリント配線基板は、柔軟性に富む絶縁性の基材シートに導体の回路パターンを形成したものであって、電子機器内部の狭くて複雑構造をもつスペース内での立体的な高密度実装には不可欠な基板である。このようなフレキシブルプリント配線基板は、近年の電子機器類の小型軽量化、高密度化、高精度化などの要請に応え得る最も有力な電子機器用部材の一つであり、その需要は急速に伸びてきている。
The printed wiring board is a wiring board in which a circuit pattern of a conductor necessary for connecting between electrical and electronic components mounted thereon is formed by printing or the like on the surface of the insulating substrate or on the surface thereof.
Such a printed wiring board can be roughly classified into a hard printed wiring board and a flexible printed wiring board from the viewpoint of shape, and is structurally divided into a single layer and two or more layers.
Among these printed wiring boards, flexible printed wiring boards are formed by forming a circuit pattern of conductors on a flexible insulating base sheet, and in a space having a narrow and complicated structure inside an electronic device. It is an indispensable substrate for three-dimensional high-density mounting. Such a flexible printed circuit board is one of the most prominent electronic device members that can meet the recent demands for smaller, lighter, higher density, and higher precision of electronic devices, and the demand is rapidly increasing. It is growing.
前記フレキシブルプリント配線基板においては、可撓性が要求されることから、絶縁性の基材シートとしてプラスチックシート、例えばポリイミドシート、ポリフェニレンスルフィドシートなどの耐熱性や絶縁性などに優れるプラスチックシートが用いられ、そして、この基材シートの表面又は表面とその内部に、銅などの金属材料により回路パターンが形成される。回路パターンの形成方法としては、例えば銅張り積層板の銅箔の必要な部分のみを残して、他をエッチング処理により溶解除去するサブストラクティブ法の外、アディティブ法などが知られている。このアディティブ法は、基板の必要部分のみにメッキ処理を施して回路パターンを形成させる方法であって、セミアディティブ法とフルアディティブ法がある。
このようなフレキシブルプリント配線基板に要求される性能としては、例えば寸法精度、低反り・ねじれ率、耐熱性、引き剥がし強さ、曲げ強さ、高体積抵抗率、耐薬品性、加熱曲げ強さなどの外、プリント配線基板の加工適性も重要である。
In the flexible printed circuit board, since flexibility is required, a plastic sheet excellent in heat resistance and insulation, such as a polyimide sheet and a polyphenylene sulfide sheet, is used as an insulating base sheet. Then, a circuit pattern is formed of a metal material such as copper on the surface of the base sheet or on the surface and inside thereof. As a method for forming a circuit pattern, for example, an additive method is known in addition to a subtractive method in which only a necessary portion of a copper foil of a copper-clad laminate is left and other components are dissolved and removed by an etching process. This additive method is a method of forming a circuit pattern by plating only a necessary portion of a substrate, and includes a semi-additive method and a full additive method.
The performance required for such a flexible printed circuit board includes, for example, dimensional accuracy, low warpage / twist rate, heat resistance, peel strength, bending strength, high volume resistivity, chemical resistance, and heat bending strength. In addition, the processability of the printed wiring board is also important.
このようなフレキシブルプリント配線基板においては、上述した回路形成や電気・電子部品を実装する過程において、該配線基板への溶剤汚染、異物混入、瑕の発生などを抑制するために一般にそれらの処理を行う前に、フレキシブルプリント配線基材作製用に用いられる基材シートに予め再剥離性工程フィルムが貼付される。この工程フィルムは、基材フィルムの一方の面に再剥離が可能な粘着剤層が設けられたものであって、フレキシブルプリント配線基板用の基材シートに貼付された後、抜き加工、溶剤への浸漬、熱プレスなどの種々の工程を経たのち、作製されたフレキシブルプリント配線基板から剥離される。したがって、前記工程中で浮きや剥がれなどが発生しない上、剥がした後で被着体(基材シート)に糊残りがなく、かつ被着体にカールの発生をもたらすことがないような再剥離性を有することが肝要である。 In such a flexible printed wiring board, in the process of circuit formation and mounting of electrical / electronic components described above, in order to suppress solvent contamination, foreign matter mixing, generation of wrinkles, etc., the processing is generally performed. Before performing, a removability process film is previously stuck to the base material sheet used for flexible printed wiring board preparation. This process film is provided with a releasable pressure-sensitive adhesive layer on one surface of a base film, and after being attached to a base sheet for a flexible printed wiring board, it is subjected to a punching process and a solvent. After being subjected to various processes such as immersion and hot pressing, it is peeled off from the produced flexible printed wiring board. Therefore, re-peeling is performed so that no floating or peeling occurs in the process, and no adherence remains on the adherend (base sheet) after peeling, and no curling occurs on the adherend. It is important to have sex.
そこで、本出願人は、先に、フレキシブルプリント配線基板作製用の基材シートに上述した処理を行い、フレキシブルプリント配線基板を作製する過程において、ズレ、浮き、剥がれなどが発生せず、該配線基板表面への溶剤汚染、異物混入、瑕の発生などを効果的に抑制し得ると共に、剥がした後で被着体に糊残りが生じにくい上、被着体にカールの発生をもたらしにくい再剥離性工程フィルムを見出し、出願した(例えば、特許文献1参照)。
ところで、近年、電子機器の高性能化、高速化に伴ってプリント配線板も高密度実装、高密度配線化が求められてきており、その要求を満足させるものとして多層プリント配線板が注目を浴びている。さらに、最近、電気・電子機器の小型化に伴い、多層プリント配線板は、ますます薄型化、高密度化が求められており、接着シート(熱硬化性樹脂シート)を用いた多層プリント配線板が使用されるようになってきた。
このような多層プリント配線板の製造においては、例えば回路パターンが設けられ、電気・電子部品が実装されたフレキシブルプリント配線基板を、エポキシ系樹脂シートなどの接着性シートを介して、他のフレキシブルプリント配線基板と積み重ねていく方法が用いられる。
具体的には、一般に再剥離性工程フィルムが貼付された基材シートに回路パターンを形成し、さらに電気・電子部品を実装して、その上にカバーレイシート(ポリイミドシートなど)を設けたものを1ユニットとし、上記再剥離性工程フィルムを剥がして、露出した基材シートと、別のユニットのカバーレイシートとを対面させ、その間にエポキシ系樹脂シートなどの接着性シートを介挿して、前記ユニットを積上げていく方法が用いられる。この方法においては、ユニットとユニット間の接着が充分に高いことが必要である。
Therefore, the applicant first performs the above-described processing on the base sheet for producing the flexible printed wiring board, and in the process of producing the flexible printed wiring board, there is no occurrence of displacement, floating, peeling, etc. Re-peeling that can effectively prevent solvent contamination, foreign material contamination, wrinkles, etc. on the substrate surface, and that the adhesive remains less likely to remain on the adherend after peeling. Found a filing process film (see, for example, Patent Document 1).
By the way, in recent years, as electronic devices have higher performance and higher speed, printed wiring boards have been demanded to have high-density mounting and high-density wiring, and multilayer printed wiring boards have attracted attention as satisfying the requirements. ing. Furthermore, with the recent miniaturization of electrical and electronic equipment, multilayer printed wiring boards are increasingly required to be thinner and denser, and multilayer printed wiring boards using adhesive sheets (thermosetting resin sheets). Has come to be used.
In the production of such a multilayer printed wiring board, for example, a flexible printed wiring board provided with a circuit pattern and mounted with electrical / electronic components is connected to another flexible printed circuit via an adhesive sheet such as an epoxy resin sheet. A method of stacking with a wiring board is used.
Specifically, a circuit pattern is generally formed on a substrate sheet to which a removable process film is attached, and electrical and electronic components are mounted thereon, and a cover lay sheet (polyimide sheet, etc.) is provided thereon. 1 unit, peel off the re-peelable process film, face the exposed base sheet and the cover lay sheet of another unit, and interpose an adhesive sheet such as an epoxy resin sheet between them, A method of stacking the units is used. In this method, it is necessary that the adhesion between the units is sufficiently high.
一方、デジタルカメラ、ビデオカメラ、カメラ付携帯電話などにおいては、近年、電荷結合素子(CCD)や相補性金属酸化膜半導体素子(CMOS)などの固体撮像素子が搭載されている。これらのCCDやCMOSの製品製造の際においては、光を受入れるためのガラス部には、通常保護用として再剥離性工程フィルムが貼付される。上記ガラス部には、リフロー工程などによる高温(例えば260℃程度)が付与される場合があり、したがって、この用途に用いられる再剥離性工程フィルムに対して、この温度に耐える優れた耐熱性、例えば被着体に対する糊残りや基材フィルムの変形が少ないことが要求される。 On the other hand, solid-state imaging devices such as charge coupled devices (CCD) and complementary metal oxide semiconductor devices (CMOS) have recently been mounted in digital cameras, video cameras, camera-equipped mobile phones, and the like. In manufacturing these CCD and CMOS products, a removable process film is usually attached to the glass portion for receiving light for protection. The glass part may be given a high temperature (for example, about 260 ° C.) due to a reflow process, etc. Therefore, the releasable process film used in this application has excellent heat resistance that can withstand this temperature, For example, it is required that the adhesive residue on the adherend and the deformation of the base film are small.
前記特許文献1に記載の再剥離性工程フィルムは、前述したように、基材シートを被着体として貼付した場合、ズレ、浮き、剥がれなどが発生せず、該配線基板表面への溶剤汚染、異物混入、瑕の発生などを効果的に抑制し得ると共に、剥がした後で被着体に糊残りが生じにくい上、被着体にカールの発生をもたらしにくいなどの優れた特性を有するものの、多層プリント配線板に用いられる配線基板ユニットに使用した場合、該再剥離性工程フィルムを剥がした際に、被着体の基材シート側が汚染され、ユニットとユニットとの積層に用いられるエポキシ系樹脂シートなどの接着性シートと該基材シートとの接着力が不十分となるといった問題が生じ、その改善が望まれていた。
また、CCDやCMOSのガラス部に適用される用途においては、耐熱性に優れる、例えば260℃、数分間のリフロー工程に耐える再剥離性工程フィルムが要求される。
本発明は、このような状況下になされたもので、基材フィルムと、その一方の面に設けられたアクリル系粘着剤層を有する再剥離性工程フィルムであって、多層プリント配線板に用いられるフレキシブルプリント配線基板作製用基材シートに使用した場合、該再剥離性工程フィルムを剥がした際に、被着体である基材シート側の汚染が抑制され、エポキシ系樹脂シートなどの接着性シートと該基材シートとの接着力が充分に高くなる再剥離性工程フィルム、あるいはCCDやCMOSのガラス部に適用される場合、260℃近辺の温度が付与されても、被着体に対する糊残りや基材フィルムの変形が少ない耐熱性に優れる再剥離性工程フィルムを提供することを目的とするものである。
As described above, the removable process film described in Patent Document 1 does not cause displacement, floating, peeling, etc. when the base sheet is attached as an adherend, and solvent contamination on the surface of the wiring board. In addition to being able to effectively suppress foreign matter contamination, wrinkle generation, etc., it also has excellent characteristics such as being less likely to cause adhesive residue on the adherend after peeling and also less likely to cause curling on the adherend. When used in a wiring board unit used in a multilayer printed wiring board, when the removable process film is peeled off, the substrate sheet side of the adherend is contaminated, and the epoxy system used for laminating the unit There has been a problem that the adhesive force between an adhesive sheet such as a resin sheet and the base sheet is insufficient, and improvement has been desired.
Moreover, in the application applied to the glass part of CCD and CMOS, the releasable process film which is excellent in heat resistance, for example, can endure the reflow process of 260 degreeC for several minutes is requested | required.
The present invention has been made under such circumstances, and is a removable process film having a base film and an acrylic pressure-sensitive adhesive layer provided on one surface thereof, and used for a multilayer printed wiring board. When it is used for a base sheet for producing a flexible printed wiring board, when the film is removed, the contamination on the base sheet side that is the adherend is suppressed, and adhesion such as an epoxy resin sheet When applied to a re-peelable process film in which the adhesive strength between the sheet and the base sheet is sufficiently high, or a glass part of a CCD or CMOS, even if a temperature around 260 ° C. is applied, the adhesive to the adherend An object of the present invention is to provide a removable process film that is excellent in heat resistance with little deformation of the rest and base film.
本発明者らは、前記目的を達成するために鋭意研究を重ねた結果、多層プリント配線板に用いられるフレキシブルプリント配線基板作製用基材シートに使用した場合において、再剥離性工程フィルムを剥がした際に、被着体側に移行する汚染物質が、再剥離性工程フィルムにおけるアクリル系粘着剤層中のオリゴマー成分であることを突き止めた。本発明者らは、アクリル系粘着剤層中の該オリゴマー成分の含有量を減少させるべく、さらに研究を重ねた結果、前記粘着剤層を構成するアクリル系粘着剤を製造する際に、アクリル系粘着剤中の樹脂成分であるアクリレート系共重合体の分子量分布をある値以下に制御すると共に、好ましくは残存モノマーの含有量がある範囲内にあるように抑制することにより、粘着剤中のオリゴマー成分の含有量が減少すること、そして粘着剤層を使用時まで保護する剥離材の剥離剤層として、非シリコーン系のものを用いることにより、上記フレキシブルプリント配線基板作製用基材シートの貼付用として、より好適な再剥離性工程フィルムが得られることを見出した。
さらに、CCDやCMOSのガラス部貼付用の場合、基材フィルムとして、特定の式で規定される貯蔵弾性率の変化率が、ある値以下であるものを用いることにより、耐熱性に優れる再剥離性工程フィルムが得られることを見出した。本発明は、かかる知見に基づいて完成したものである。
As a result of intensive studies to achieve the above object, the present inventors have peeled off the removable process film when used for a base sheet for producing a flexible printed wiring board used for a multilayer printed wiring board. At that time, it was found that the pollutant migrating to the adherend side was an oligomer component in the acrylic pressure-sensitive adhesive layer in the removable process film. As a result of further research to reduce the content of the oligomer component in the acrylic pressure-sensitive adhesive layer, the present inventors have found that when producing the acrylic pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer, The oligomer in the pressure-sensitive adhesive is controlled by controlling the molecular weight distribution of the acrylate copolymer, which is the resin component in the pressure-sensitive adhesive, to a certain value or less, and preferably suppressing the residual monomer content within a certain range. For application of the base sheet for flexible printed wiring board production by using a non-silicone release agent layer as a release agent layer for the release material that protects the adhesive layer until use. As a result, it was found that a more suitable removable process film can be obtained.
Furthermore, in the case of pasting a glass part of a CCD or CMOS, a re-peeling excellent in heat resistance can be achieved by using a base film whose rate of change in storage elastic modulus defined by a specific formula is less than a certain value. It has been found that a process film can be obtained. The present invention has been completed based on such findings.
すなわち、本発明は、
[1]基材フィルムと、その一方の面に設けられた粘着剤層を有する再剥離性工程フィルムであって、前記粘着剤層が(A)アクリル酸ブチル単位40〜80質量%と、スチレン単位1〜15質量%と、メタクリル酸メチル単位1〜30質量%と、アクリル酸メチル単位1〜30質量%と、水酸基含有ビニル系単量体単位1〜10質量%と、カルボキシル基含有ビニル系単量体単位0.1〜1質量%とを有するアクリレート系共重合体、及び(B)イソシアネート系架橋剤を含むと共に、上記アクリレート系共重合体の重量平均分子量Mwが30万〜100万であり、分子量分布(重量平均分子量Mw/数平均分子量Mn)が3.0以下である粘着剤を用いて形成されてなることを特徴とする再剥離性工程フィルム、
[2]残存モノマーの含有量が、アクリレート系共重合体に対して、5〜20質量%である粘着剤を用いた上記[1]項に記載の再剥離性工程フィルム、
[3]粘着剤層が、非シリコーン系剥離剤層を有する剥離材で積層されてなる上記[1]又は[2]項に記載の再剥離性工程フィルム、
[4]非シリコーン系剥離剤層がポリプロピレン樹脂である上記[1]〜[3]項のいずれかに記載の再剥離性工程フィルム、
[5]粘着剤がイソシアネート系架橋剤として、トリレンジイソシアネート系架橋剤とキシリレンジイソシアネート系架橋剤とを併用して得られたものである上記[1]〜[4]項のいずれかに記載の再剥離性工程フィルム、
[6]多層プリント配線板に用いられるフレキシブルプリント配線板用である上記[1]〜[5]項のいずれかに記載の再剥離性工程フィルム、
[7](a)被着体のフレキシブルプリント配線基板に用いられるプラスチックシートに対する保持力が、JIS Z 0237に準じた測定法で、70,000秒以上であり、かつ70,000秒の時点でズレの発生が実質上認められない、
(b)被着体のフレキシブルプリント配線基板に用いられるプラスチックシートに対する粘着力が、熱プレス前で、JIS Z 0237に準じた測定法で、0.01〜0.5N/25mmである、
(c)被着体のフレキシブルプリント配線基板に用いられるプラスチックシートに貼付後、温度180℃、圧力4.3N/mm2の条件で60分間の熱プレスを行った後の粘着力が、JIS Z 0237に準じた測定法で、2.0N/25mm以下である、及び
(d)粘着剤層のゲル分率が95%以上である、
上記[6]項に記載の再剥離性工程フィルム、
[8]フレキシブルプリント配線基板が、ポリイミドシート又はポリフェニレンスルフィドシートを用いて得られたものである上記[6]又は[7]項に記載の再剥離性工程フィルム、
[9]基材フィルムが、ポリエチレンテレフタレートフィルムである上記[6]〜[8]項のいずれかに記載の再剥離性工程フィルム、
[10]金属材料又はそれ以外の無機材料に適用される上記[1]〜[4]項のいずれかに記載の再剥離性工程フィルム、
[11]電荷結合素子又は相補性金属酸化膜半導体素子におけるガラス部に適用される上記[10]項に記載の再剥離性工程フィルム、
[12]粘着剤がイソシアネート系架橋剤として、キシリレンジイソシアネート系架橋剤を用いて得られたものである上記[1]〜[4]項のいずれか又は[10]又は[11]項に記載の再剥離性工程フィルム、
[13]基材フィルムが、23℃における貯蔵弾性率をG'23、260℃における貯蔵弾性率をG'260とした場合、下記式で表される貯蔵弾性率の変化率Xが85%以下である上記[1]〜[4]項、[10]〜[12]項のいずれかに記載の再剥離性工程フィルム、
X(%)=[(G'23−G'260)/G'23]×100
[14]基材フィルムが、ポリイミドフィルムである上記[1]〜[8]項、[10]〜[13]項のいずれかに記載の再剥離性工程フィルム、
を提供するものである。
That is, the present invention
[1] A removable process film having a base film and a pressure-sensitive adhesive layer provided on one surface thereof, wherein the pressure-sensitive adhesive layer is (A) 40 to 80% by mass of butyl acrylate units, and styrene 1 to 15% by mass of units, 1 to 30% by mass of methyl methacrylate units, 1 to 30% by mass of methyl acrylate units, 1 to 10% by mass of a hydroxyl group-containing vinyl monomer unit, and a carboxyl group-containing vinyl system Including an acrylate copolymer having a monomer unit of 0.1 to 1% by mass, and (B) an isocyanate crosslinking agent, the weight average molecular weight Mw of the acrylate copolymer is 300,000 to 1,000,000. A removable process film characterized by being formed using an adhesive having a molecular weight distribution (weight average molecular weight Mw / number average molecular weight Mn) of 3.0 or less,
[2] The releasable process film according to the above [1], wherein an adhesive having a residual monomer content of 5 to 20% by mass with respect to the acrylate copolymer is used,
[3] The releasable process film according to the above [1] or [2], wherein the pressure-sensitive adhesive layer is laminated with a release material having a non-silicone release agent layer,
[4] The removable process film according to any one of [1] to [3], wherein the non-silicone release agent layer is a polypropylene resin.
[5] The adhesive according to any one of [1] to [4] above, wherein the pressure-sensitive adhesive is obtained by using together a tolylene diisocyanate crosslinking agent and a xylylene diisocyanate crosslinking agent as an isocyanate crosslinking agent. Re-peelable process film,
[6] The removable film according to any one of [1] to [5], which is for a flexible printed wiring board used for a multilayer printed wiring board,
[7] (a) When the adherence of the adherend to the plastic sheet used for the flexible printed wiring board is 70,000 seconds or more and 70,000 seconds as measured according to JIS Z 0237 There is virtually no discrepancy,
(B) The adhesive strength of the adherend to the plastic sheet used for the flexible printed wiring board is 0.01 to 0.5 N / 25 mm in a measurement method according to JIS Z 0237 before hot pressing.
After application to the plastic sheet used in (c) adherend of the flexible printed wiring board, a temperature 180 ° C., the adhesive strength after the 60 minutes of heat pressing under a pressure of 4.3 N / mm 2 is, JIS Z The measurement method according to 0237 is 2.0 N / 25 mm or less, and (d) the gel fraction of the pressure-sensitive adhesive layer is 95% or more.
The removable process film according to the above item [6],
[8] The removable process film according to [6] or [7], wherein the flexible printed wiring board is obtained using a polyimide sheet or a polyphenylene sulfide sheet.
[9] The removable process film according to any one of [6] to [8], wherein the base film is a polyethylene terephthalate film,
[10] The releasable process film according to any one of [1] to [4], which is applied to a metal material or other inorganic material,
[11] The removable process film according to [10], which is applied to a glass portion in a charge coupled device or a complementary metal oxide film semiconductor device,
[12] The adhesive described in any one of [1] to [4] above, or [10] or [11], wherein the pressure-sensitive adhesive is obtained by using a xylylene diisocyanate crosslinking agent as the isocyanate crosslinking agent. Re-peelable process film,
[13] When the storage elastic modulus at 23 ° C. is G ′ 23 and the storage elastic modulus at 260 ° C. is G ′ 260 , the change rate X of the storage elastic modulus represented by the following formula is 85% or less. The removable film according to any one of the above items [1] to [4] and [10] to [12],
X (%) = [(G ′ 23 −G ′ 260 ) / G ′ 23 ] × 100
[14] The removable film according to any one of [1] to [8], [10] to [13], wherein the substrate film is a polyimide film,
Is to provide.
本発明によれば、基材フィルムと、その一方の面に設けられたアクリル系粘着剤層を有する再剥離性工程フィルムであって、(1)多層プリント配線板に用いられるフレキシブルプリント配線基板作製用基材シートに使用した場合、該再剥離性工程フィルムを剥がした際に、被着体である基材シート側の汚染が抑制され、エポキシ系樹脂シートなどの接着性シートと該基材シートとの接着力の低下を抑制し得る再剥離性工程フィルムを提供することができる。また、(2)金属材料又はそれ以外の無機材料、例えばCCDやCMOSのガラス部などに適用した場合、260℃近辺の温度が付与されても、被着体に対する糊残りや基材フィルムの変形が少ない耐熱性に優れる再剥離性工程フィルムを提供することができる。 According to the present invention, a removable process film having a base film and an acrylic pressure-sensitive adhesive layer provided on one surface thereof, (1) Fabrication of a flexible printed wiring board used for a multilayer printed wiring board When used for a base material sheet, when the removable film is peeled off, contamination on the base material sheet side as an adherend is suppressed, and an adhesive sheet such as an epoxy resin sheet and the base material sheet It is possible to provide a removable process film that can suppress a decrease in adhesive strength. In addition, (2) when applied to a metal material or other inorganic material such as a glass part of a CCD or CMOS, even if a temperature around 260 ° C. is applied, the adhesive residue on the adherend or deformation of the substrate film It is possible to provide a removable process film having a low heat resistance and excellent heat resistance.
本発明の再剥離性工程フィルム(以下、「工程フィルム」と略称することがある)は、基材フィルムと、その一方の面に設けられた粘着剤層を有する再剥離性工程フィルムであって、前記粘着剤層が、(A)以下に示す特定の単量体単位を特定の割合で有するアクリレート系共重合体、及び(B)イソシアネート系架橋剤を含むと共に、上記アクリレート系共重合体の重量平均分子量Mwが30万〜100万であり、分子量分布(重量平均分子量Mw/数平均分子量Mn)が3.0以下である粘着剤を用いて形成されてなることを特徴とする。
このような性状の粘着剤層を有する本発明の再剥離性工程フィルムは、用途によって、再剥離性工程フィルムA(以下、「工程フィルムA」と略称することがある)及び再剥離性工程フィルムB(以下、「工程フィルムB」と略称することがある)に分けることができる。
工程フィルムAは、多層プリント配線板に用いられるフレキシブルプリント配線板用であり、工程フィルムBは、金属材料又はそれ以外の無機材料、例えばCCDやCMOSのガラス部用などである。
The removable process film of the present invention (hereinafter sometimes abbreviated as “process film”) is a removable process film having a base film and an adhesive layer provided on one surface thereof. The pressure-sensitive adhesive layer contains (A) an acrylate copolymer having a specific monomer unit shown below at a specific ratio, and (B) an isocyanate cross-linking agent. It is formed using an adhesive having a weight average molecular weight Mw of 300,000 to 1,000,000 and a molecular weight distribution (weight average molecular weight Mw / number average molecular weight Mn) of 3.0 or less.
The removable process film of the present invention having such a pressure-sensitive adhesive layer has a removable process film A (hereinafter sometimes abbreviated as “process film A”) and a removable process film depending on the application. B (hereinafter sometimes abbreviated as “process film B”).
The process film A is for a flexible printed wiring board used for a multilayer printed wiring board, and the process film B is for a metal material or other inorganic material such as a glass part of a CCD or CMOS.
[工程フィルムA用基材フィルム]
本発明の再剥離性工程フィルムAにおける基材フィルムとしては、耐熱性に優れるフィルムであることが肝要であり、具体的にはポリエチレンテレフタレートフィルム、ポリカーボネートフィルム、非晶性ポリオレフィンフィルム、アラミドフィルム、ポリエチレンナフタレートフィルム、ポリフェニレンスルフィドフィルム、さらには芳香族ポリスルホンフィルム、ポリエーテルイミドフィルム、ポリアリレートフィルム、ポリエーテルエーテルケトンフィルム、各種液晶ポリマーフィルムなどのスーパーエンジニアリングプラスチックフィルム等を挙げることができるが、これらの中で、機械特性、電気絶縁性、バリヤー性、耐熱性、耐薬品性、経済性などのバランスに優れる点から、ポリエチレンテレフタレートフィルムが好適である。この基材フィルムの厚さについては特に制限はないが、通常16〜200μm、好ましくは25〜100μmの範囲である。
[Base film for process film A]
As the base film in the removable process film A of the present invention, it is important that the film is excellent in heat resistance, and specifically, a polyethylene terephthalate film, a polycarbonate film, an amorphous polyolefin film, an aramid film, polyethylene. Super engineering plastic films such as naphthalate film, polyphenylene sulfide film, aromatic polysulfone film, polyetherimide film, polyarylate film, polyetheretherketone film, and various liquid crystal polymer films can be mentioned. Among them, polyethylene terephthalate film is preferred because of its excellent balance of mechanical properties, electrical insulation, barrier properties, heat resistance, chemical resistance, economy, etc. Although there is no restriction | limiting in particular about the thickness of this base film, Usually, 16-200 micrometers, Preferably it is the range of 25-100 micrometers.
[工程フィルムB用基材フィルム]
工程フィルムB用基材フィルムは、金属材料又はそれ以外の無機材料用であって、前記の工程フィルムA用基材フィルムよりも、さらに優れた耐熱性が要求される。例えば、工程フィルムBが、CCDやCMOSのガラス部に適用される場合には、リフロー工程などによる260℃近辺の高温が付与される場合があり、したがって、この温度に耐える優れた耐熱性(被着体に対する糊残りや基材フィルムの変形が少ない)が求められる。
なお、工程フィルムBが適用される金属材料としては、例えば金、白金、銀、銅、鉄、アルミニウム、又はそれらの合金、ウェハに用いられる半導体金属などが挙げられ、金属材料以外の無機材料としては、例えばガラス板、セラミックス板などが挙げられる。
工程フィルムB用基材フィルムとしては、23℃における貯蔵弾性率をG'23、260℃における貯蔵弾性率をG'260とした場合、下記式で表される貯蔵弾性率の変化率Xが85%以下であるフィルムを用いることが好ましい。
X(%)=[(G'23−G'260)/G'23]×100
このような基材フィルムとしては、例えばポリイミドフィルムやポリアラミドフィルムなどを挙げることができるが、特にポリイミドフィルムが好適である。
なお、上記貯蔵弾性率G'23及び貯蔵弾性率G'260は、下記の方法で測定した値である。
基材フィルムを動的粘弾性測定装置[TAインスツルメンツ社製、商品名「DMA−Q800」]に測定長さ(チャック間距離)を20mmとして装着し、周波数11Hz、振幅20μm、昇温速度5℃/minの条件下で、温度範囲15〜300℃の貯蔵弾性率G'を測定し、23℃での貯蔵弾性率G'23、260℃での貯蔵弾性率G'260とした。
当該工程フィルムB用基材フィルムの厚さについては特に制限はないが、通常16〜200μm、好ましくは25〜100μmの範囲である。
[Base film for process film B]
The base film for the process film B is for a metal material or other inorganic material, and more excellent heat resistance is required than the base film for the process film A. For example, when the process film B is applied to a glass part of a CCD or a CMOS, a high temperature around 260 ° C. due to a reflow process or the like may be applied. There is a demand for a small amount of adhesive residue and deformation of the base film on the adherend.
In addition, as a metal material to which the process film B is applied, for example, gold, platinum, silver, copper, iron, aluminum, or an alloy thereof, a semiconductor metal used for a wafer, and the like, an inorganic material other than the metal material is used. Examples thereof include a glass plate and a ceramic plate.
As the base film for the process film B, when the storage elastic modulus at 23 ° C. is G ′ 23 and the storage elastic modulus at 260 ° C. is G ′ 260 , the change rate X of the storage elastic modulus represented by the following formula is 85. It is preferable to use a film that is not more than%.
X (%) = [(G ′ 23 −G ′ 260 ) / G ′ 23 ] × 100
Examples of such a base film include a polyimide film and a polyaramid film, and a polyimide film is particularly preferable.
The storage elastic modulus G ′ 23 and the storage elastic modulus G ′ 260 are values measured by the following method.
The base film is mounted on a dynamic viscoelasticity measuring apparatus [TA Instruments, trade name “DMA-Q800”] with a measurement length (distance between chucks) of 20 mm, a frequency of 11 Hz, an amplitude of 20 μm, and a temperature increase rate of 5 ° C. / under the conditions of min, 'measures the storage modulus G at 23 ° C.' temperature range 15 to 300 storage modulus G ° C. was 23, 260 ° C. the storage modulus G '260 at.
Although there is no restriction | limiting in particular about the thickness of the said base film for process films B, Usually, 16-200 micrometers, Preferably it is the range of 25-100 micrometers.
前記の工程フィルムA用及びB用基材フィルムは、少なくとも粘着剤層が設けられる側の面に、粘着剤層との接着性を向上させる目的で、所望により、酸化法や凹凸化法などにより表面処理を施すことができる。また、プライマー処理を施すこともできる。上記酸化法としては、例えばコロナ放電処理、プラズマ処理、クロム酸処理(湿式)、火炎処理、熱風処理、オゾン・紫外線照射処理などが用いられ、凹凸化法としては、例えばサンドブラスト法、溶剤処理法などが用いられる。これらの表面処理法は基材フィルムの種類に応じて適宜選ばれるが、一般にはコロナ放電処理法が効果及び操作性などの面から、好ましく用いられる。 For the purpose of improving the adhesiveness with the pressure-sensitive adhesive layer at least on the surface on which the pressure-sensitive adhesive layer is provided, the base film for process films A and B is optionally oxidized or uneven. Surface treatment can be applied. Moreover, primer treatment can also be performed. Examples of the oxidation method include corona discharge treatment, plasma treatment, chromic acid treatment (wet), flame treatment, hot air treatment, ozone / ultraviolet irradiation treatment, and the like. Etc. are used. These surface treatment methods are appropriately selected according to the type of the base film, but generally, the corona discharge treatment method is preferably used from the viewpoints of effects and operability.
[工程フィルムA用及びB用粘着剤層]
本発明の再剥離性工程フィルムA及びBにおいて、前記基材フィルムの一方の面に設けられる粘着剤層は、(A)アクリル酸ブチル単位と、スチレン単位と、メタクリル酸メチル単位と、アクリル酸メチル単位と、水酸基含有ビニル系単量体単位と、カルボキシル基含有ビニル系単量体単位とを少なくとも有するアクリレート系共重合体、及び(B)イソシアネート系架橋剤を含む粘着剤を用いて形成される。
[Adhesive layer for process film A and B]
In the removable process films A and B of the present invention, the pressure-sensitive adhesive layer provided on one surface of the base film is (A) a butyl acrylate unit, a styrene unit, a methyl methacrylate unit, and an acrylic acid. It is formed using an adhesive containing an acrylate copolymer having at least a methyl unit, a hydroxyl group-containing vinyl monomer unit, and a carboxyl group-containing vinyl monomer unit, and (B) an isocyanate crosslinking agent. The
((A)アクリレート系共重合体)
本発明で用いる粘着剤において、(A)成分のアクリレート系共重合体におけるメタクリル酸メチル単位及びスチレン単位は、凝集力とガラス転移温度を高め、工程フィルムAにおいては、熱プレス後のフレキシブルプリント配線基板に対するズレや粘着力上昇を抑制する作用を有している。一方、アクリル酸メチル単位は、当該アクリレート系共重合体の製造において、重合を安定化させ、分子量を高める作用を有している。当該アクリレート系共重合体における水酸基含有ビニル系単量体単位及びカルボキシル基含有ビニル系単量体単位は、後述の架橋剤と反応し得る架橋性官能基(水酸基、カルボキシル基)を当該アクリレート系共重合体に付与するために導入される。
((A) acrylate copolymer)
In the pressure-sensitive adhesive used in the present invention, the methyl methacrylate unit and the styrene unit in the acrylate copolymer of the component (A) increase the cohesive force and glass transition temperature. In the process film A, the flexible printed wiring after hot pressing It has the effect of suppressing displacement with respect to the substrate and an increase in adhesive force. On the other hand, the methyl acrylate unit has the effect of stabilizing the polymerization and increasing the molecular weight in the production of the acrylate copolymer. The hydroxyl group-containing vinyl monomer unit and the carboxyl group-containing vinyl monomer unit in the acrylate copolymer have a crosslinkable functional group (hydroxyl group, carboxyl group) that can react with a crosslinking agent described later. Introduced to impart to the polymer.
前記の水酸基含有ビニル系単量体単位を形成する単量体としては、例えば(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸2−ヒドロキシプロピル、(メタ)アクリル酸3−ヒドロキシプロピル、(メタ)アクリル酸2−ヒドロキシブチル、(メタ)アクリル酸3−ヒドロキシブチル、(メタ)アクリル酸4−ヒドロキシブチルなどの(メタ)アクリル酸ヒドロキシアルキルエステル等を挙げることができる。これらは1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。これらの中では、アクリル酸2−ヒドロキシエチル及びメタクリル酸2−ヒドロキシエチルが好適である。 Examples of the monomer forming the hydroxyl group-containing vinyl monomer unit include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, Examples include (meth) acrylic acid hydroxyalkyl esters such as (meth) acrylic acid 2-hydroxybutyl, (meth) acrylic acid 3-hydroxybutyl, and (meth) acrylic acid 4-hydroxybutyl. These may be used individually by 1 type and may be used in combination of 2 or more type. Of these, 2-hydroxyethyl acrylate and 2-hydroxyethyl methacrylate are preferred.
一方、前記のカルボキシル基含有ビニル系単量体単位を形成する単量体としては、例えばアクリル酸、メタクリル酸、クロトン酸、マレイン酸、イタコン酸、シトラコン酸などのエチレン性不飽和カルボン酸等を挙げることができる。これらは1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。これらの中では、メタクリル酸及びアクリル酸が好適である。
本発明においては、当該アクリレート系共重合体に前記の水酸基含有ビニル系単量体単位と、カルボン酸含有ビニル系単量体単位とを共に導入することにより、当該アクリレート系共重合体と架橋剤との反応性が良好なものとなる。
前記粘着剤の樹脂成分であるアクリレート系共重合体において、アクリル酸ブチル単位の含有量が、後で示すように40.0質量%以上であれば、工程フィルムAをフレキシブルプリント配線基板作製用基材シートに貼付し、例えば熱プレスした場合に、該基材シートと工程フィルムの間でズレが発生しにくい。
On the other hand, examples of the monomer that forms the carboxyl group-containing vinyl monomer unit include ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, citraconic acid, and the like. Can be mentioned. These may be used individually by 1 type and may be used in combination of 2 or more type. Of these, methacrylic acid and acrylic acid are preferred.
In the present invention, by introducing both the hydroxyl group-containing vinyl monomer unit and the carboxylic acid-containing vinyl monomer unit into the acrylate copolymer, the acrylate copolymer and the crosslinking agent are introduced. The reactivity with is good.
In the acrylate copolymer that is the resin component of the pressure-sensitive adhesive, if the content of the butyl acrylate unit is 40.0% by mass or more as will be shown later, the process film A is formed on the flexible printed wiring board production base. When affixed to a material sheet and, for example, hot-pressed, misalignment is unlikely to occur between the substrate sheet and the process film.
当該アクリレート系共重合体における前記各単位の含有割合は、粘着剤の性能の点から、アクリル酸ブチル単位40〜80質量%、スチレン単位1〜15質量%、メタクリル酸メチル単位1〜30質量%、アクリル酸メチル単位1〜30質量%、水酸基含有ビニル系単量体単位1〜10質量%及びカルボキシル基含有ビニル系単量体単位0.1〜1質量%であり、アクリル酸ブチル単位50〜65質量%、スチレン単位2〜10質量%、メタクリル酸メチル単位3〜20質量%、アクリル酸メチル単位5〜20質量%、水酸基含有ビニル系単量体単位2〜7質量%及びカルボキシル基含有ビニル系単量体単位0.1〜0.5質量%であることが好ましい。 The content ratio of each unit in the acrylate copolymer is 40 to 80% by mass of butyl acrylate units, 1 to 15% by mass of styrene units, and 1 to 30% by mass of methyl methacrylate units from the viewpoint of the performance of the pressure-sensitive adhesive. 1 to 30% by mass of a methyl acrylate unit, 1 to 10% by mass of a hydroxyl group-containing vinyl monomer unit and 0.1 to 1% by mass of a carboxyl group-containing vinyl monomer unit, and 50 to 50% of a butyl acrylate unit 65% by mass, styrene units 2 to 10% by mass, methyl methacrylate units 3 to 20% by mass, methyl acrylate units 5 to 20% by mass, hydroxyl group-containing vinyl monomer units 2 to 7% by mass and carboxyl group-containing vinyl It is preferable that it is 0.1-0.5 mass% of system monomer units.
さらに、前記アクリレート系共重合体においては、所望により、前記単量体と共重合可能な他の単量体を共重合成分として用いることができる。この他の単量体の例としては、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、メタクリル酸ブチル、(メタ)アクリル酸ペンチル、(メタ)アクリル酸ヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸デシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸ミリスチル、(メタ)アクリル酸パルミチル、(メタ)アクリル酸ステアリルなどのアクリル酸ブチル及び(メタ)アクリル酸メチル以外のエステル部分のアルキル基の炭素数が2〜20の(メタ)アクリル酸エステル;酢酸ビニル、プロピオン酸ビニルなどのビニルエステル類;エチレン、プロピレン、イソブチレンなどのオレフィン類;塩化ビニル、ビニリデンクロリドなどのハロゲン化オレフィン類;ブタジエン、イソプレン、クロロプレンなどのジエン系単量体;アクリロニトリル、メタクリロニトリルなどのニトリル系単量体;アクリルアミド、N−メチルアクリルアミド、N,N−ジメチルアクリルアミドなどのアクリルアミド類;α−メチルスチレンなどが挙げられる。これらは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Furthermore, in the acrylate copolymer, if desired, another monomer copolymerizable with the monomer can be used as a copolymerization component. Examples of this other monomer include ethyl (meth) acrylate, propyl (meth) acrylate, butyl methacrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, decyl (meth) acrylate, dodecyl (meth) acrylate, myristyl (meth) acrylate, palmityl (meth) acrylate, stearyl (meth) acrylate (Meth) acrylic acid ester having 2 to 20 carbon atoms in the alkyl group of the ester moiety other than butyl acrylate and methyl (meth) acrylate; vinyl esters such as vinyl acetate and vinyl propionate; ethylene, propylene, Olefins such as isobutylene; Halogenated olefins such as vinyl chloride and vinylidene chloride; Pig Diene monomers such as diene, isoprene and chloroprene; nitrile monomers such as acrylonitrile and methacrylonitrile; acrylamides such as acrylamide, N-methylacrylamide and N, N-dimethylacrylamide; α-methylstyrene and the like Can be mentioned. These may be used alone or in combination of two or more.
本発明においては、前記アクリレート系共重合体は、その共重合形態については特に制限はなく、ランダム、ブロック、グラフト共重合体のいずれであってもよい。また、分子量は、重量平均分子量Mwで30万〜100万及び分子量分布(重量平均分子量Mw/数平均分子量Mn)が3.0以下である。
上記重量平均分子量Mwが30万〜100万の範囲にあれば、得られる粘着剤は良好な粘着性能を発揮する。また、分子量分布Mw/Mnが3.0以下であれば、重量平均分子量が1,000〜30,000程度のオリゴマーの含有量が少なく、本発明の目的を達成することができる。好ましい分子量分布Mw/Mnは2.8以下である。
なお、上記重量平均分子量Mw及び数平均分子量Mnは、ゲルパーミエーションクロマトグラフィー(GPC)法により測定したポリスチレン換算の値である。
In the present invention, the acrylate copolymer is not particularly limited as to its copolymerization form, and may be any of random, block, and graft copolymers. The molecular weight is 300,000 to 1,000,000 in terms of weight average molecular weight Mw and the molecular weight distribution (weight average molecular weight Mw / number average molecular weight Mn) is 3.0 or less.
If the weight average molecular weight Mw is in the range of 300,000 to 1,000,000, the resulting adhesive exhibits good adhesive performance. Moreover, if molecular weight distribution Mw / Mn is 3.0 or less, content of the oligomer whose weight average molecular weight is about 1,000-30,000 is small, and the objective of this invention can be achieved. A preferred molecular weight distribution Mw / Mn is 2.8 or less.
In addition, the said weight average molecular weight Mw and number average molecular weight Mn are the values of polystyrene conversion measured by the gel permeation chromatography (GPC) method.
従来、アクリル系粘着剤における樹脂成分であるアクリレート系共重合体の製造においては、通常(メタ)アクリル酸エステル、活性水素をもつ官能基を有するビニル系モノマー及び所望により用いられる他のモノマーを用い、ラジカル重合開始剤と、適当な溶媒の存在下に、40%程度のモノマーが消費するまで、一段目のラジカル重合を行ったのち、残存する未反応のモノマーをできるだけなくすために、さらに二段目のラジカル重合を行う、2段重合法が採用されている。
しかしながら、本発明者の研究によると、このような2段重合法を採用すると、二段目の重合において、前述したオリゴマーの形成が多く生じ、このオリゴマーが、再剥離性工程フィルムAを被着体の基材シートから剥がした際に、該被着体側に移行し、エポキシ系樹脂フィルムなどの接着性フィルムと該被着体との接着力を低下させることを見出した。 そこで、本発明者は、さらに研究を重ね、前記一段目のラジカル重合にて、未反応モノマーの残存量が、生成した粘着剤中のアクリレート系共重合体に対して、5〜20質量%程度、好ましくは5〜15質量%になるように反応を停止させる1段重合法を採用することにより、オリゴマーの形成を少なくすることができた。これにより生成したアクリレート系共重合体の重量平均分子量Mwを30万〜100万の範囲に、かつ分子量分布Mw/Mnを3.0以下に制御し得ることに成功したものである。粘着剤中に含有する残存未反応モノマーは、粘着剤層を形成する際の加熱、乾燥処理時において逸散し、粘着剤層中に実質上残存しないことも分かった。
Conventionally, in the production of an acrylate copolymer, which is a resin component in an acrylic pressure-sensitive adhesive, usually a (meth) acrylic acid ester, a vinyl monomer having a functional group having active hydrogen, and other monomers used as desired are used. In order to eliminate the remaining unreacted monomer as much as possible after performing the first radical polymerization until about 40% of the monomer is consumed in the presence of a radical polymerization initiator and a suitable solvent, a further two-stage A two-stage polymerization method that performs radical polymerization of the eye is employed.
However, according to the inventor's research, when such a two-stage polymerization method is adopted, the formation of the oligomer described above often occurs in the second-stage polymerization, and this oligomer adheres to the removable process film A. When it peeled from the base material sheet | seat of a body, it moved to this adherend side, and it discovered that the adhesive force of adhesive films, such as an epoxy resin film, and this adherend was reduced. Therefore, the present inventor conducted further research, and in the first-stage radical polymerization, the residual amount of unreacted monomer was about 5 to 20% by mass with respect to the acrylate copolymer in the produced pressure-sensitive adhesive. The formation of oligomers could be reduced by adopting a one-stage polymerization method in which the reaction was stopped preferably at 5 to 15% by mass. The resulting acrylate copolymer has succeeded in controlling the weight average molecular weight Mw in the range of 300,000 to 1,000,000 and the molecular weight distribution Mw / Mn to 3.0 or less. It was also found that the remaining unreacted monomer contained in the pressure-sensitive adhesive dissipates during the heating and drying processes when forming the pressure-sensitive adhesive layer and does not substantially remain in the pressure-sensitive adhesive layer.
((B)イソシアネート系架橋剤)
本発明においては、当該粘着剤の架橋剤として、イソシアネート系架橋剤が必須成分として用いられる。このイソシアネート系架橋剤の例としては、トリレンジイソシアネート系、ジフェニルメタンジイソシアネート系、キシリレンジイソシアネート系などの芳香族ポリイソシアネート類、ヘキサメチレンジイソシアネート系などの脂肪族ポリイソシアネート類、イソホロンジイソシアネート系、水素添加ジフェニルメタンジイソシアネート系などの脂環式ポリイソシアネート類など、及びそれらのビウレット体、イソシアヌレート体、さらにはエチレングリコール、プロピレングリコール、ネオペンチルグリコール、トリメチロールプロパン、ヒマシ油などの低分子活性水素含有化合物との反応物であるアダクト体などを挙げることができる。
((B) Isocyanate-based crosslinking agent)
In the present invention, an isocyanate-based crosslinking agent is used as an essential component as a crosslinking agent for the pressure-sensitive adhesive. Examples of the isocyanate-based crosslinking agent include aromatic polyisocyanates such as tolylene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate, aliphatic polyisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, and hydrogenated diphenylmethane. Diisocyanate-based alicyclic polyisocyanates and the like, and their biurets, isocyanurates, and low molecular active hydrogen-containing compounds such as ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, castor oil, etc. The adduct body which is a reaction material can be mentioned.
これらのイソシアネート系架橋剤の中で、工程フィルムAにおいては、反応性や、基材と粘着剤との密着性に優れ、糊残りが少ない点、及び熱プレス後に適度の粘着力が得られるなどの点から、トリレンジイソシアネート系とキシリレンジイソシアネート系を併用することが望ましい。この場合、その使用量は、前記アクリレート系共重合体100質量部に対し、トリレンジイソシアネート系とキシリレンジイソシアネート系の合計量で、通常0.5〜30質量部、好ましくは1.0〜20質量部の範囲で、後述の性状を有する粘着剤層が得られるように選定される。
一方、工程フィルムBにおいては、耐熱性の観点から、キシリレンジイソシアネート系が好ましい。その使用量は、前記アクリレート系共重合体100質量部に対して、通常0.5〜30質量部、好ましくは1.0〜20質量部の範囲である。
Among these isocyanate-based crosslinking agents, in the process film A, the reactivity and the adhesion between the base material and the pressure-sensitive adhesive are excellent, the adhesive residue is small, and an appropriate pressure-sensitive adhesive force is obtained after hot pressing, etc. From this point, it is desirable to use a tolylene diisocyanate and a xylylene diisocyanate in combination. In this case, the amount used is the total amount of tolylene diisocyanate and xylylene diisocyanate based on 100 parts by mass of the acrylate copolymer, usually 0.5 to 30 parts by mass, preferably 1.0 to 20 parts. The pressure-sensitive adhesive layer having the properties described later is selected within the range of parts by mass.
On the other hand, in the process film B, xylylene diisocyanate is preferable from the viewpoint of heat resistance. The usage-amount is 0.5-30 mass parts normally with respect to 100 mass parts of said acrylate-type copolymers, Preferably it is the range of 1.0-20 mass parts.
この粘着剤には、本発明の目的が損なわれない範囲で、所望によりアクリル系粘着剤に通常使用されている各種添加剤、例えば酸化防止剤、紫外線吸収剤、光安定剤、軟化剤、充填剤、架橋促進剤などを適宜添加することができる。なお、粘着付与剤の併用は可能であるが、粘着力の上昇につながるために好ましくない。 In this pressure-sensitive adhesive, various additives usually used for acrylic pressure-sensitive adhesives as desired, such as antioxidants, ultraviolet absorbers, light stabilizers, softeners, fillings, etc., as long as the object of the present invention is not impaired. An agent, a crosslinking accelerator and the like can be appropriately added. Although a tackifier can be used in combination, it is not preferable because it leads to an increase in adhesive strength.
[再剥離性工程フィルムAの性状]
前記粘着剤を用いて形成された本発明の再剥離性工程フィルムAにおいては、以下に示す性状を有することが望ましい。
まず、被着体のフレキシブルプリント配線基板作製用基材シートに対する保持力が、通常70,000秒以上であり、かつ70,000秒の時点でズレの発生が実質上認められないのがよい。この保持力が70,000秒未満では、工程フィルムを被着体の基材シートに貼付し、抜き加工、溶剤への浸漬、熱プレスなどの操作の過程で工程フィルムと被着体との間でズレが発生するおそれがある。なお、上記保持力は、下記に示す方法で測定した値である。又、ズレの発生が「実質上認められない」とは、70,000秒時点でのズレが0.1mm未満のことをいう。
[Properties of Removable Process Film A]
The re-peelable process film A of the present invention formed using the pressure-sensitive adhesive desirably has the following properties.
First, the holding force of the adherend to the base sheet for producing a flexible printed wiring board is usually 70,000 seconds or more, and it is preferable that no deviation is substantially observed at the time point of 70,000 seconds. If the holding force is less than 70,000 seconds, the process film is affixed to the substrate sheet of the adherend, and the process film and the adherend are subjected to operations such as punching, immersion in a solvent, and hot press. There is a risk of misalignment. In addition, the said retention strength is the value measured by the method shown below. Further, “substantially no occurrence of deviation” means that the deviation at 70,000 seconds is less than 0.1 mm.
(保持力)
JIS Z 0237に準じ、SUS製の保持力測定用試験板の試験片の工程フィルム貼着部に、フレキシブル配線基板作製用に用いる基材シートとしてポリイミドシートを接着させ試験板とした。次いで、工程フィルムを裁断して、幅25mm、長さ150mmの試験片を作製した。試験板の一端にこの試験片の一端の粘着剤層面を25mm×25mmの面積が接するように貼り付け、2kgのローラで5往復して圧着させる。15分後にクリープテスター内にセットし40℃条件下で15分間放置する。9.807Nの荷重を鉛直下向きにかけ、落下するまでの時間又は70,000秒時点でのズレの発生の有無とズレ量を測定する。
(Holding power)
In accordance with JIS Z 0237, a polyimide sheet was bonded as a base sheet used for the production of a flexible wiring board to a test film attaching portion of a test piece of a test plate for holding power measurement made of SUS to obtain a test plate. Next, the process film was cut to prepare a test piece having a width of 25 mm and a length of 150 mm. The pressure-sensitive adhesive layer surface of one end of this test piece is attached to one end of the test plate so that the area of 25 mm × 25 mm is in contact with the test plate, and the pressure is reciprocated 5 times with a 2 kg roller. After 15 minutes, set in a creep tester and leave at 40 ° C. for 15 minutes. A load of 9.807 N is applied vertically downward, and the time until it falls or the occurrence of deviation and the amount of deviation at 70,000 seconds are measured.
次に、被着体のフレキシブルプリント配線基板作製用に用いられる基材シートに対する粘着力が、熱プレス前で0.01〜0.5N/25mmであることが好ましく、温度180℃、圧力4.3N/mm2の条件下において、60分間熱プレス後で2.0N/25mm以下であることが好ましい。熱プレス前の粘着力が上記範囲にあれば、工程フィルムを被着体のプリント配線基板作製用基材シートに貼付し、打抜き加工や溶剤への浸漬など、熱プレス前に機械的な操作を行っても十分な粘着力を有し、工程フィルムと被着体との間でズレが発生しにくい上、工程フィルムの剥離が容易であり、しかも剥離後に生じる糊残りや被着体のカールの発生を抑制することができる。熱プレス前の粘着力は、好ましくは0.03〜0.4N/25mmである。また、熱プレス後の粘着力が2.0N/25mm以下あれば、工程フィルムを被着体のプリント配線基板作製用基材シートに貼付し、熱プレス操作を行った後の工程フィルムの剥離が比較的容易であり、しかも剥離後に生じる糊残りや被着体のカール発生を抑制することができる。また、熱プレス操作を行った場合、十分な粘着力を有し、工程フィルムと被着体との間でズレが発生するのを抑制する上から、熱プレス後の粘着力の下限は0.08N/25mm程度である。好ましい熱プレス後の粘着力は0.12〜1.0N/25mmである。なお、熱プレス前及び熱プレス後の粘着力は、下記に示す方法で測定した値である。 Next, it is preferable that the adhesive force with respect to the base material sheet used for preparation of the flexible printed wiring board of the adherend is 0.01 to 0.5 N / 25 mm before hot pressing, the temperature is 180 ° C., and the pressure is 4. It is preferably 2.0 N / 25 mm or less after hot pressing for 60 minutes under the condition of 3 N / mm 2 . If the adhesive strength before hot pressing is within the above range, the process film is affixed to the substrate sheet for printed circuit board production of the adherend, and mechanical operations such as punching and immersion in a solvent are performed before hot pressing. Adhesive strength is sufficient even if it is performed, and it is difficult for deviation to occur between the process film and the adherend, and the process film is easy to peel off. Occurrence can be suppressed. The adhesive strength before hot pressing is preferably 0.03 to 0.4 N / 25 mm. Also, if the adhesive strength after hot pressing is 2.0 N / 25 mm or less, the process film is affixed to the substrate sheet for printed circuit board production of the adherend, and the process film is peeled off after performing the hot press operation. It is relatively easy, and it is possible to suppress the occurrence of adhesive residue and curling of the adherend after peeling. In addition, when a hot press operation is performed, the lower limit of the adhesive strength after hot pressing is 0, because it has sufficient adhesive strength and suppresses the occurrence of displacement between the process film and the adherend. It is about 08 N / 25 mm. Preferable adhesive strength after hot pressing is 0.12 to 1.0 N / 25 mm. In addition, the adhesive force before hot press and after hot press is the value measured by the method shown below.
(熱プレス前の粘着力)
JIS Z 0237に準じて、SUS製の粘着力測定用試験板の試験片の工程フィルム貼着部に、フレキシブル配線基板作製用に用いる基材シートとしてポリイミドシートを幅120mm、長さ150mmに作製し接着させ試験板とした。一方、工程フィルムを幅25mm、長さ250mmに裁断し試験片とする。この試験片の一端の粘着剤層面を試験板に、貼付面積が幅25mm×長さ約90mmになるように貼り付け、2kgのローラで1往復させて圧着する。貼り付けてから24時間後に剥離角度180度、剥離速度300mm/minで試験片を剥離したときの粘着力を測定する。測定開始領域及び終了領域の各15%を除いたチャートの中央部70%の平均値を熱プレス前の粘着力とする。
(熱プレス後の粘着力)
幅120mm、長さ150mmの大きさに裁断したフレキシブルプリント配線基板作製用に用いられる基材シート(ポリイミドシート)を用意し、一方、工程フィルムを幅100mm、長さ250mmに裁断し試験片とする。この試験片の一端の粘着剤層面を基材シートに、貼付面積が幅100mm×長さ約90mmになるように貼り付けた後、温度180℃のプレス板にて、試験片の上から圧力4.3N/mm2を加えて60分間熱プレスする。その後、熱プレスされた試験片と基材シートとが貼りあわせられたシートを幅25mm、長さ250mmに裁断し、基材シート側をSUS製の粘着力測定用試験板に接着させ、JIS Z 0237に準じて、剥離角度180度、剥離速度300mm/minにて試験片を剥離したときの粘着力を測定する。測定開始領域及び終了領域の各15%を除いたチャートの中央部70%の平均値を熱プレス後の粘着力とする。
(Adhesive strength before hot pressing)
According to JIS Z 0237, a polyimide sheet having a width of 120 mm and a length of 150 mm is prepared as a base material sheet for use in the production of a flexible wiring board in a process film sticking portion of a test piece of an adhesive strength measurement test plate made of SUS. A test plate was bonded. On the other hand, the process film is cut into a width of 25 mm and a length of 250 mm to obtain a test piece. The pressure-sensitive adhesive layer surface at one end of the test piece is attached to a test plate so that the application area is 25 mm wide × about 90 mm long, and is reciprocated once by a 2 kg roller and is pressed. After 24 hours from the pasting, the adhesive strength when the test piece is peeled off at a peeling angle of 180 degrees and a peeling speed of 300 mm / min is measured. The average value of the central part 70% of the chart excluding 15% of the measurement start area and the end area is taken as the adhesive strength before hot pressing.
(Adhesive strength after hot pressing)
A base sheet (polyimide sheet) used for producing a flexible printed wiring board cut to a size of 120 mm in width and 150 mm in length is prepared, while the process film is cut into a width of 100 mm and a length of 250 mm to obtain a test piece. . The pressure-sensitive adhesive layer surface at one end of the test piece was attached to the base sheet so that the sticking area was 100 mm wide × about 90 mm long, and then the pressure was applied from above the test piece with a press plate at a temperature of 180 ° C. Add 3 N / mm 2 and heat press for 60 minutes. Thereafter, the sheet obtained by bonding the hot-pressed test piece and the base sheet is cut into a width of 25 mm and a length of 250 mm, and the base sheet side is bonded to a SUS adhesive pressure test plate. According to 0237, the adhesive strength when the test piece is peeled off at a peeling angle of 180 degrees and a peeling speed of 300 mm / min is measured. The average value of the central portion 70% of the chart excluding 15% of the measurement start region and the end region is taken as the adhesive strength after hot pressing.
さらに、本発明の再剥離性工程フィルムA及びBにおける粘着剤層のゲル分率は、通常95%以上である。このゲル分率が95%未満では、工程フィルムAにおいては、工程フィルムの粘着剤層面を被着体のプリント配線基板作製用基材シートに貼付し、各種操作を行ったのち、工程フィルムを剥がす際に糊残りが生じやすく、被着体を汚染する原因となり、さらに、熱プレス時に工程フィルムのズレが発生し易く、回路印刷精度が低下する問題を招く原因にもなる。好ましいゲル分率は96%以上である。なお、上記ゲル分率は、下記の方法により測定した値である。 Furthermore, the gel fraction of the pressure-sensitive adhesive layer in the removable process films A and B of the present invention is usually 95% or more. When the gel fraction is less than 95%, in the process film A, the pressure-sensitive adhesive layer surface of the process film is affixed to the substrate sheet for preparing the printed wiring board of the adherend, and after various operations, the process film is peeled off. At this time, adhesive residue is liable to occur, causing the adherend to be contaminated, and further, the process film is liable to be displaced at the time of hot pressing, thereby causing a problem that the circuit printing accuracy is lowered. A preferable gel fraction is 96% or more. The gel fraction is a value measured by the following method.
(ゲル分率の測定方法)
厚さ25μmのポリエチレンテレフタレートフィルムに剥離剤としてシリコーン樹脂を塗布した剥離フィルムの剥離剤層面の上に、当該粘着剤を塗工し、本発明の再剥離性工程フィルム作製時と同一条件で架橋化させたのち、剥離フィルムから粘着剤(50mm×100mm)を剥ぎ取る。次いで、100×130mmサイズの200メッシュの金綱上に、上記架橋化粘着剤2枚(合計質量Ag)を金網で包み込み、これをソックスレー抽出器にセットし、酢酸エチルの還流下で16時間抽出処理する。次に、抽出処理後、金網上に残存する粘着剤を100℃で24時間乾燥させ、23℃、50%RHの雰囲気下で3時間以上調湿後、該粘着剤の質量を測定し(Bg)、次式
ゲル分率(%)=(B/A)×100
により、ゲル分率を算出する。
(Measurement method of gel fraction)
The pressure-sensitive adhesive is applied on the release agent layer surface of a release film in which a silicone resin is applied as a release agent to a polyethylene terephthalate film with a thickness of 25 μm, and is crosslinked under the same conditions as in the re-removable process film preparation of the present invention. Then, the adhesive (50 mm × 100 mm) is peeled off from the release film. Next, wrap the two cross-linked pressure-sensitive adhesives (total mass Ag) on a metal mesh of 200 mesh of 100 × 130 mm size with a wire mesh, set this in a Soxhlet extractor, and extract for 16 hours under reflux of ethyl acetate To do. Next, after the extraction treatment, the pressure-sensitive adhesive remaining on the wire mesh is dried at 100 ° C. for 24 hours, and after conditioning in an atmosphere of 23 ° C. and 50% RH for 3 hours or more, the mass of the pressure-sensitive adhesive is measured (Bg ), The following formula Gel fraction (%) = (B / A) × 100
To calculate the gel fraction.
[工程フィルムA及びB用剥離材]
工程フィルムA及びBの粘着剤層には、剥離材を積層することができる。この剥離材としては、例えばグラシン紙、コート紙、キャストコート紙などの紙基材、これらの紙基材にポリエチレンなどの熱可塑性樹脂をラミネートしたラミネート紙、あるいはポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレートなどのポリエステルフィルム、ポリプロピレンやポリエチレンなどのポリオレフィンフィルムなどのプラスチックフィルムに、オレフィン系樹脂、イソプレン系樹脂、ブタジエン系樹脂などのゴム系エラストマー、長鎖アルキル系樹脂、アルキド系樹脂、フッ素系樹脂などの剥離剤を塗布したものなどが挙げられる。また、これらの剥離剤をそのままシート状にしたものなどが挙げられる。特に、本発明の工程フィルムAをフレキシブルプリント配線基板作製用基材シートに使用した場合、シリコーン系剥離剤を使用すると、剥離剤層から粘着剤層に微量移行し、そのシリコーン成分が該基材シートに付着し、汚染する場合がある。したがって、フレキシブル配線基板作製用途に本発明の工程フィルムAを用いる場合には、非シリコーン系剥離剤の使用が好ましい。上記剥離剤の中でも成分移行が少なく、結果として接着力が大きくなるオレフィン系樹脂であるポリプロピレン樹脂が好ましく用いられる。剥離剤層としての厚さは0.01〜100μm程度である。また、この剥離材の厚さについては特に制限はないが、通常20〜150μm程度である。
[Release material for process films A and B]
A release material can be laminated on the pressure-sensitive adhesive layers of the process films A and B. Examples of the release material include paper substrates such as glassine paper, coated paper, and cast coated paper, laminated paper obtained by laminating a thermoplastic resin such as polyethylene on these paper substrates, or polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate. Polyester films such as phthalates, plastic films such as polyolefin films such as polypropylene and polyethylene, olefin resins, isoprene resins, rubber elastomers such as butadiene resins, long-chain alkyl resins, alkyd resins, fluorine resins, etc. And the like applied with a release agent. Moreover, what made these release agents into a sheet form as it is is mentioned. In particular, when the process film A of the present invention is used for a base sheet for producing a flexible printed wiring board, if a silicone release agent is used, a small amount of the silicone component is transferred from the release agent layer to the adhesive layer. It may adhere to the sheet and contaminate it. Therefore, when using the process film A of this invention for a flexible wiring board preparation use, use of a non-silicone release agent is preferable. Among the release agents, a polypropylene resin, which is an olefin-based resin that causes little component migration and results in a large adhesive force, is preferably used. The thickness of the release agent layer is about 0.01 to 100 μm. The thickness of the release material is not particularly limited, but is usually about 20 to 150 μm.
[再剥離性工程フィルムA及びBの作製]
本発明の再剥離性工程フィルムA及びBは、基材フィルムの一方の面に前述の本発明に係わる粘着剤を直接塗布し、100〜130℃程度で1〜5分間程度加熱乾燥して粘着剤層を形成し、その粘着剤層面に剥離材を設けることにより作製することができる。また、剥離材の剥離処理面に粘着剤を塗布し、上述のように加熱乾燥して粘着剤層を形成したのち、これを基材フィルムの一方の面に貼着して作製することもできる。粘着剤層と基材フィルムとの密着性を考慮すると前者の作製方法が好ましく適用される。
なお、上記作製操作において、粘着剤塗布後の乾燥処理は十分に行うことが望ましい。乾燥が不十分な場合は、被着体に貼付後のズレの発生及び残留溶剤や残存モノマーの増大の原因となる。さらに、乾燥が不十分な場合は、工程フィルムAにおいては、粘着剤層とプリント配線基板作製用基材シートの間でズレが発生しやすく、熱プレス後の粘着力が大きく上昇し、剥離した際にプリント配線基板作製用基材シートのカールや糊残りが発生しやすくなる。
本発明の再剥離性工程フィルムA及びBにおける粘着剤層の厚さは、通常5〜60μm、好ましくは5〜30μm程度である。
[Preparation of removable film A and B]
The re-peelable process films A and B of the present invention are coated by directly applying the above-mentioned pressure-sensitive adhesive according to the present invention on one surface of a base film, and then dried by heating at about 100 to 130 ° C. for about 1 to 5 minutes. It can be produced by forming an adhesive layer and providing a release material on the pressure-sensitive adhesive layer surface. Moreover, after apply | coating an adhesive to the peeling process surface of a peeling material and heat-drying as mentioned above and forming an adhesive layer, this can also be produced by sticking to one side of a base film. . Considering the adhesion between the pressure-sensitive adhesive layer and the substrate film, the former production method is preferably applied.
In addition, in the said production operation, it is desirable to fully perform the drying process after adhesive application. Insufficient drying may cause a shift after being applied to the adherend and increase residual solvent and residual monomer. Furthermore, when the drying is insufficient, in the process film A, a shift is likely to occur between the pressure-sensitive adhesive layer and the substrate sheet for producing a printed wiring board, and the adhesive strength after hot pressing greatly increases and peels off. In this case, curling and adhesive residue of the base sheet for producing a printed wiring board is likely to occur.
The thickness of the pressure-sensitive adhesive layer in the removable process films A and B of the present invention is usually 5 to 60 μm, preferably about 5 to 30 μm.
本発明の再剥離性工程フィルムAは、前述した多層プリント配線板に用いられるフレキシブルプリント配線基板作製用の工程フィルムとして使用される。本発明の再剥離性工程フィルムAを多層プリント配線板に用いられるフレキシブルプリント配線基板作製用の基材シートに使用した場合、該再剥離性工程フィルムを剥がした際に、被着体である基材シート側の汚染が抑制され、エポキシ系樹脂シートなどの接着性シートと該基材シートとの接着力の低下を抑制することができ、品質の良い多層プリント配線板を作製することができる。本発明の再剥離性工程フィルムAが適用されるフレキシブルプリント配線基板の基材シートの種類については特に制限はないが、該フレキシブルプリント配線基板には、通常ポリイミドやポリフェレンスルフィドなどの耐熱性プラスチックシートが使用されている。
一方、本発明の再剥離性工程フィルムBは、金属材料又はそれ以外の無機材料、例えばCCDやCMOSのガラス部の保護フィルムなどとして適用される。この場合、260℃近辺の高温が付与されることがあるが、被着体のガラス部に対する糊残りを抑制し得ると共に、基材フィルムの変形も少ない。
The removable process film A of the present invention is used as a process film for producing a flexible printed circuit board used for the multilayer printed circuit board described above. When the releasable process film A of the present invention is used for a base sheet for producing a flexible printed wiring board used for a multilayer printed wiring board, when the removable process film is peeled off, the substrate which is an adherend is used. Contamination on the material sheet side is suppressed, a decrease in the adhesive force between the adhesive sheet such as an epoxy resin sheet and the base sheet can be suppressed, and a high-quality multilayer printed wiring board can be produced. Although there is no restriction | limiting in particular about the kind of base material sheet | seat of the flexible printed wiring board to which the removability process film A of this invention is applied, Usually, this heat-resistant plastics, such as a polyimide and polyferylene sulfide, are in this flexible printed wiring board Sheets are being used.
On the other hand, the re-peelable process film B of the present invention is applied as a metal material or other inorganic material, such as a protective film for a glass part of a CCD or CMOS. In this case, although a high temperature around 260 ° C. may be applied, adhesive residue on the glass part of the adherend can be suppressed, and deformation of the base film is small.
次に、本発明を実施例により、さらに詳細に説明するが、本発明は、これらの例によってなんら限定されるものではない。
なお、各例で作製された工程フィルムの諸特性は、下記の方法に従って評価した。
(1)接着試験
22cm×22cmの大きさに裁断したフレキシブルプリント配線基板作製に用いられる基材シート(ポリイミドシート)を試験板(被着体)として、20cm×20cmの大きさに裁断した工程フィルムの粘着剤層面を気泡の入らないように貼付し、温度180℃、圧力4.3N/mm2の条件下で1時間熱プレスした後、工程フィルムを剥離する。工程フィルムを剥離した被着体面と新しいプリント配線基板作製用に用いられる基材シート(ポリイミドシート)の間に接着シート(パイララックス「LF0100」[デュポン(株)製、登録商標「Pyralux」、アクリル変性エポキシ系接着シート]、幅20mm、長さ150mm)をはさみ、温度180℃、圧力4.3N/mm2の条件下で30分間熱プレスした後、被着体の基材シートをSUS製の粘着力測定用試験板に接着させ、JIS Z 0237に準じて、剥離角度180度、剥離速度300mm/minにてポリイミドシートと他方のポリイミドシートの接着強度を測定する。
なお、接着力は、30N/20mm以上が合格である。
EXAMPLES Next, although an Example demonstrates this invention further in detail, this invention is not limited at all by these examples.
In addition, the various characteristics of the process film produced in each example were evaluated according to the following method.
(1) Adhesion test A process film cut to a size of 20 cm x 20 cm using a base sheet (polyimide sheet) used for production of a flexible printed circuit board cut to a size of 22 cm x 22 cm as a test plate (adhered body) The pressure-sensitive adhesive layer surface was affixed so as not to contain air bubbles, hot-pressed for 1 hour under conditions of a temperature of 180 ° C. and a pressure of 4.3 N / mm 2 , and then the process film was peeled off. Adhesive sheet (Pilalux “LF0100” [manufactured by DuPont, registered trademark “Pyralux”, acrylic) between the adherend surface from which the process film has been peeled off and a base sheet (polyimide sheet) used for the production of a new printed wiring board Modified epoxy adhesive sheet], 20 mm wide and 150 mm long), and hot-pressed for 30 minutes under the conditions of a temperature of 180 ° C. and a pressure of 4.3 N / mm 2 , and then the base material sheet of the adherend is made of SUS Adhering to a test plate for measuring adhesive strength, the adhesion strength between the polyimide sheet and the other polyimide sheet is measured at a peeling angle of 180 degrees and a peeling speed of 300 mm / min according to JIS Z 0237.
In addition, as for adhesive force, 30 N / 20mm or more is a pass.
(2)熱プレス後のズレ
22cm×22cmの大きさに裁断したフレキシブルプリント配線基板作製に用いられる基材シート(ポリイミドシート)を試験板(被着体)として、20cm×20cmの大きさに裁断した工程フィルムの粘着剤層面を気泡の入らないように貼付し、四隅に径6mmのスルーホールをあける。これを温度180℃、圧力4.3N/mm2の条件下で60分間熱プレスしたのち、四隅のスルーホールにおける工程フィルムと被着体とのズレを測定し、平均値をズレとする。
(2) Deviation after hot pressing A base sheet (polyimide sheet) used for the production of a flexible printed circuit board cut to a size of 22 cm × 22 cm is cut to a size of 20 cm × 20 cm using a test plate (adhered body). The pressure-sensitive adhesive layer surface of the processed film is affixed so that air bubbles do not enter, and through-holes with a diameter of 6 mm are formed at the four corners. This is hot-pressed for 60 minutes under the conditions of a temperature of 180 ° C. and a pressure of 4.3 N / mm 2 , and then the deviation between the process film and the adherend in the four corner through holes is measured, and the average value is taken as the deviation.
(3)粘着剤層と基材フィルムとの密着性
JIS K 5600−5−6に準じて、工程フィルムの粘着剤層にロータリーカッターで1mm角の碁盤目100マスを付け、付着テープ(セロテープ[ニチバン社製、登録商標])を圧着させた後、約60°の角度で付着テープを0.5秒〜1.0秒で引き剥がしたときの、100マスのうちの残存膜数を数えることにより、工程フィルムにおける基材フィルムと粘着剤層との密着性について試験を行った。密着性の評価は下記の判定基準で行った。
90/100以上 :5
80/100〜90/100未満:4
70/100〜80/100未満:3
60/100〜70/100未満:2
60/100未満 :1
(3) Adhesiveness between pressure-sensitive adhesive layer and substrate film In accordance with JIS K 5600-5-6, 100 mm square grids of 1 mm square are attached to the pressure-sensitive adhesive layer of the process film with a rotary cutter, and adhesive tape (cello tape [ Nichiban Co., Ltd., registered trademark]), and after the adhesive tape is peeled off at an angle of about 60 ° in 0.5 seconds to 1.0 seconds, count the number of remaining films in 100 squares. Thus, the adhesion between the base film and the pressure-sensitive adhesive layer in the process film was tested. Evaluation of adhesion was performed according to the following criteria.
90/100 or more: 5
80/100 to less than 90/100: 4
70/100 to less than 80/100: 3
60/100 to less than 70/100: 2
Less than 60/100: 1
(4)糊残り評価試験−1
22cm×22cmの大きさに裁断したフレキシブルプリント配線基板作製に用いられる基材シート(ポリイミドシート)を試験板(被着体)として、20cm×20cmの大きさに裁断した工程フィルムの粘着剤層面を気泡の入らないように貼付し、温度180℃、圧力4.3N/mm2の条件下で60分間熱プレスしたのち、工程フィルムを剥離し、試験板の表面について、FT−IR(フーリエ変換赤外吸収スペクトル分析、ATR法)でIR測定を行い、粘着剤に由来する吸収ピークの有無により糊残りの有無を調べ、糊残りがない場合を○、糊残りがある場合を×として評価した。
(4) Adhesive residue evaluation test -1
The base material sheet (polyimide sheet) used for the production of a flexible printed wiring board cut to a size of 22 cm × 22 cm is used as a test plate (adhered body), and the pressure-sensitive adhesive layer surface of the process film cut to a size of 20 cm × 20 cm is used. Affixed so as not to contain bubbles and hot pressed for 60 minutes under conditions of a temperature of 180 ° C. and a pressure of 4.3 N / mm 2 , the process film was peeled off, and the surface of the test plate was subjected to FT-IR (Fourier transform red). IR measurement was performed by external absorption spectrum analysis (ATR method), and the presence or absence of adhesive residue was examined based on the presence or absence of an absorption peak derived from the pressure-sensitive adhesive.
(5)糊残り評価試験−2
7cm×15cm、厚さ2mmのフロートガラス板を試験片(被着体)として、3cm×5cmの大きさに裁断した工程フィルムの粘着剤層面を気泡の入らないように貼付し、最高温度260℃、加熱時間3分間のIRリフロー(リフロー炉:相模理工製WL−15−20DNX型)を行った。その後室温にて1時間放置した後、工程フィルムを剥がし、被着体表面をデジタル顕微鏡により観察し、糊残りの有無を調べた。糊残りの評価は下記判定基準で行った。
1cm2中の糊残りの割合
5%未満 :○
5%〜30%未満:△
30%以上 :×
(5) Adhesive residue evaluation test-2
A 7 cm × 15 cm, 2 mm thick float glass plate was used as a test piece (adhered body), and the adhesive layer surface of the process film cut to a size of 3 cm × 5 cm was stuck so as not to contain bubbles, and the maximum temperature was 260 ° C. Then, IR reflow (reflow furnace: WL-15-20DNX type, manufactured by Sagami Riko Co., Ltd.) with a heating time of 3 minutes was performed. Then, after being left at room temperature for 1 hour, the process film was peeled off, and the surface of the adherend was observed with a digital microscope to examine the presence or absence of adhesive residue. Evaluation of adhesive residue was performed according to the following criteria.
Ratio of remaining glue in 1 cm 2 Less than 5%: ○
5% to less than 30%: △
30% or more: ×
(6)残留シリコーン
22cm×22cmの大きさに裁断したフレキシブルプリント配線基板作製に用いられる基材シート(ポリイミドシート)を試験板(被着体)として、20cm×20cmの大きさに裁断した工程フィルムの粘着剤層面を気泡の入らないように貼付し、温度180℃、圧力4.3N/mm2の条件下で1時間熱プレスした後、工程フィルムを剥離する。試験板表面の元素分析を、X線光電子分光法(XPS)により、下記の条件で行った。
測定装置:アルバックファイ製 Quantera SXM
X線源:AlKα(1486.6 eV)
取出し角度:45度
測定元素:ケイ素(Si)、炭素(C)及び窒素(N)
なお、Si量は、Si/(Si+C+N)の値に100を乗じて、「原子%」で表示した。Si量が検出されればシリコーンが移行している。
(6) Residual silicone Process film cut to a size of 20 cm x 20 cm using a base sheet (polyimide sheet) used for the production of a flexible printed circuit board cut to a size of 22 cm x 22 cm as a test plate (adhered body) The pressure-sensitive adhesive layer surface was affixed so as not to contain air bubbles, hot-pressed for 1 hour under conditions of a temperature of 180 ° C. and a pressure of 4.3 N / mm 2 , and then the process film was peeled off. Elemental analysis of the test plate surface was performed by X-ray photoelectron spectroscopy (XPS) under the following conditions.
Measuring device: Quantera SXM manufactured by ULVAC-PHI
X-ray source: AlKα (1486.6 eV)
Extraction angle: 45 degrees Measurement elements: silicon (Si), carbon (C) and nitrogen (N)
The amount of Si was expressed in “atomic%” by multiplying the value of Si / (Si + C + N) by 100. If the amount of Si is detected, the silicone has migrated.
(7)数平均分子量と分子量分布の測定(GPC法)
各実施例等で得られた粘着剤をテトラヒドロフランに溶解し(ポリマー濃度:10ミリグラム/ミリリットル)、標準ポリスチレン換算の重量平均分子量と分子量分布をゲル浸透クロマトフラフィー(GPC)法により測定した。測定はGPC装置[高速GPC装置「HLC−8120GPC」、東ソー(株)製]を用い、高速カラムTSK guard column HXL−H、TSKGel GMHXL、TSKGel GMHXL、TSKGel G2000HXL(以上すべて東ソー(株)製)をこの順序で装置に連結して測定した。カラム温度40℃、送液速度1.0ミリリットル/分とし、検出器としては紫外可視検出器(検出器波長;254nm)及び示差屈折計(いずれも東ソー(株)製)を用いた。
分子量分布はGPC法により測定した重量平均分子量(Mw)と数平均分子量(Mn)の比(Mw/Mn)である。なお、モノマー成分は排除した値である。
(7) Measurement of number average molecular weight and molecular weight distribution (GPC method)
The pressure-sensitive adhesive obtained in each example was dissolved in tetrahydrofuran (polymer concentration: 10 milligram / milliliter), and the weight average molecular weight and molecular weight distribution in terms of standard polystyrene were measured by gel permeation chromatography (GPC). The measurement uses a GPC device [High-speed GPC device “HLC-8120GPC”, manufactured by Tosoh Corporation], high-speed column TSK guard column H XL- H, TSKgel GMH XL , TSKgel GMH XL , TSKgel G2000H XL (all of which are Tosoh Corporation) )) Was connected to the apparatus in this order and measured. The column temperature was 40 ° C., the liquid feeding speed was 1.0 ml / min, and an ultraviolet-visible detector (detector wavelength: 254 nm) and a differential refractometer (both manufactured by Tosoh Corporation) were used as detectors.
The molecular weight distribution is a ratio (Mw / Mn) of the weight average molecular weight (Mw) and the number average molecular weight (Mn) measured by the GPC method. The monomer component is the excluded value.
(8)貯蔵弾性率の変化率
下記の方法で23℃における貯蔵弾性率G'23及び260℃における貯蔵弾性率をG'260を測定し、式
X(%)=[(G'23−G'260)/G'23]×100
により、貯蔵弾性率の変化率Xを求めた。
<G'23及びG'260の測定>
基材フィルムを動的粘弾性測定装置[TAインスツルメンツ社製、商品名「DMA−Q800」]に測定長さ(チャック間距離)を20mmとして装着し、周波数11Hz、振幅20μm、昇温速度5℃/minの条件下で、温度範囲15〜300℃の貯蔵弾性率G'を測定し、23℃での貯蔵弾性率G'23、260℃での貯蔵弾性率G'260とした。
また、粘着剤層の保持力、熱プレス前及び熱プレス後の粘着力、ゲル分率は、明細書本文記載の方法に従って測定した。
(8) 'the storage modulus at 23 and 260 ° C. G' storage modulus G at 23 ° C. in storage modulus change rate following method to measure 260, wherein X (%) = [(G '23 -G '260) / G' 23] × 100
Thus, the change rate X of the storage elastic modulus was obtained.
<G '23 and G' 260 measurements>
The base film is mounted on a dynamic viscoelasticity measuring apparatus [TA Instruments, trade name “DMA-Q800”] with a measurement length (distance between chucks) of 20 mm, a frequency of 11 Hz, an amplitude of 20 μm, and a temperature increase rate of 5 ° C. / under the conditions of min, 'measures the storage modulus G at 23 ° C.' temperature range 15 to 300 storage modulus G ° C. was 23, 260 ° C. the storage modulus G '260 at.
In addition, the holding power of the pressure-sensitive adhesive layer, the pressure-sensitive adhesive strength before and after hot pressing, and the gel fraction were measured according to the methods described in the specification.
実施例1
撹拌機、還流冷却器、滴下ロート、窒素ガス導入管及び温度計を備えた反応装置を用い、アクリル酸ブチル(BA)61.0質量部、メタクリル酸メチル(MMA)18.0質量部、スチレン(St)3.5質量部、アクリル酸メチル(MA)12.0質量部、メタクリル酸2−ヒドロキシエチル(HEMA)5.0質量部、アクリル酸(AAc)0.15質量部を、重合開始剤としてアゾビスイソブチロニトリル(AIBN)0.01質量部を使用し、溶媒としてトルエンを加えて、窒素ガス雰囲気下で、溶液重合させ、固形分40.0質量%、重量平均分子量約45万、分子量分布(Mw/Mn)2.60のアクリレート系共重合体を製造した。
なお、残存モノマーの含有量は、下記の測定法により、アクリレート系共重合体に対して、10.0質量%であった。
<残存モノマー含有量の測定>
残存モノマー含有量はガスクロマトグラフ法で測定定量し算出した。
このアクリレート系共重合体100質量部に、トリレンジイソシアネート系(TDI系)架橋剤[東洋インキ製造(株)製、商品名「オリバインBHS8515」(固形分37.5質量%)]8.0質量部と、キシリレンジイソシアネート系(XDI系)架橋剤[武田薬品工業(株)製、商品名「D−110N」(固形分75質量%)]3.0質量部、トルエン30.0質量部、酢酸エチル1.0質量部を配合し、粘着剤を調製した。
次に、厚さ50μmのポリエチレンテレフタレート(PET)フィルム[ユニチカ(株)製、商品名「エンブレットTA−50」]の片面に、乾燥後の塗布量が10g/m2(厚さ10μm)になるように直接塗工し、120℃で1分間乾燥させたのち、その上にシリコーン系剥離剤層を有する剥離材[王子製紙社製、商品名「40RL−01Z」]をラミネートし、工程フィルムを作製し、諸特性を評価した。なお、試験板(被着体)としては、ポリイミドシートを用いた。また、糊残りは、糊残り評価試験−1を採用した。結果を第1表に示す。
Example 1
Using a reactor equipped with a stirrer, reflux condenser, dropping funnel, nitrogen gas inlet tube and thermometer, butyl acrylate (BA) 61.0 parts by mass, methyl methacrylate (MMA) 18.0 parts by mass, styrene (St) 3.5 parts by mass, methyl acrylate (MA) 12.0 parts by mass, 2-hydroxyethyl methacrylate (HEMA) 5.0 parts by mass, acrylic acid (AAc) 0.15 parts by mass Using 0.01 parts by mass of azobisisobutyronitrile (AIBN) as an agent, adding toluene as a solvent, solution polymerization in a nitrogen gas atmosphere, solid content of 40.0% by mass, weight average molecular weight of about 45 An acrylate copolymer having a molecular weight distribution (Mw / Mn) of 2.60 was produced.
In addition, content of the residual monomer was 10.0 mass% with respect to the acrylate copolymer by the following measuring method.
<Measurement of residual monomer content>
The residual monomer content was calculated by measurement and quantification by gas chromatography.
To 100 parts by mass of this acrylate copolymer, a tolylene diisocyanate (TDI) cross-linking agent [manufactured by Toyo Ink Manufacturing Co., Ltd., trade name “Olivein BHS8515” (solid content: 37.5% by mass)] 8.0 mass Parts, xylylene diisocyanate-based (XDI-based) crosslinker [manufactured by Takeda Pharmaceutical Co., Ltd., trade name “D-110N” (solid content: 75% by mass)], 3.0 parts by mass of toluene, 1.0 mass part of ethyl acetate was mix | blended and the adhesive was prepared.
Next, the coating amount after drying is 10 g / m 2 (thickness 10 μm) on one side of a polyethylene terephthalate (PET) film [trade name “Embret TA-50” manufactured by Unitika Ltd.] having a thickness of 50 μm. After direct coating, and drying at 120 ° C. for 1 minute, a release material having a silicone release agent layer (trade name “40RL-01Z” manufactured by Oji Paper Co., Ltd.) is laminated thereon, and a process film And various properties were evaluated. A polyimide sheet was used as the test plate (adhered body). Moreover, the adhesive residue evaluation test-1 was used for the adhesive residue. The results are shown in Table 1.
実施例2
モノマー組成を第1表のように変えた以外は実施例1と同様にして、固形分40.0質量%、重量平均分子量約46万、分子量分布(Mw/Mn)2.70、残存モノマー12.0質量%のアクリレート系共重合体を製造した。
以下、実施例1と同様にして工程フィルムを作製し、諸特性を評価した。結果を第1表に示す。
Example 2
Except that the monomer composition was changed as shown in Table 1, the same procedure as in Example 1 was conducted, except that the solid content was 40.0% by mass, the weight average molecular weight was about 460,000, the molecular weight distribution (Mw / Mn) was 2.70, the residual monomer 12 A 0.0 mass% acrylate copolymer was produced.
Hereafter, the process film was produced like Example 1 and various characteristics were evaluated. The results are shown in Table 1.
比較例1
実施例1において、溶液重合を行ったのち、さらにもう一度重合を行った以外は、実施例1と同様にしてアクリレート系共重合体を製造した。得られたアクリレート系共重合体の重量平均分子量は約47万、分子量分布(Mw/Mn)は3.29であった。
また、残存モノマーの含有量は、実施例1と同様にして測定したところ、アクリレート系共重合体に対して、3.4質量%であった。
以下、実施例1と同様にして工程フィルムを作製し、諸特性を評価した。結果を第1表に示す。
Comparative Example 1
In Example 1, an acrylate copolymer was produced in the same manner as in Example 1 except that the solution polymerization was performed and then the polymerization was performed again. The weight average molecular weight of the obtained acrylate copolymer was about 470,000, and the molecular weight distribution (Mw / Mn) was 3.29.
Further, the content of the residual monomer was measured in the same manner as in Example 1, and found to be 3.4% by mass with respect to the acrylate copolymer.
Hereafter, the process film was produced like Example 1 and various characteristics were evaluated. The results are shown in Table 1.
第1表から分かるように、実施例1の工程フィルムは、比較例1のものに比べて、接着試験において、極めて高い接着力を有している。 As can be seen from Table 1, the process film of Example 1 has an extremely high adhesive force in the adhesion test as compared with that of Comparative Example 1.
実施例3
撹拌機、還流冷却器、滴下ロート、窒素ガス導入管及び温度計を備えた反応装置を用い、アクリル酸ブチル(BA)60.0質量部、メタクリル酸メチル(MMA)18.0質量部、スチレン(St)3.5質量部、アクリル酸メチル(MA)13.0質量部、メタクリル酸2−ヒドロキシエチル(HEMA)5.0質量部、アクリル酸(AAC)0.15質量部を、重合開始剤としてアゾビスイソブチロニトリル(AIBN)0.01質量部を使用し、溶媒としてトルエンを加えて、窒素ガス雰囲気下で、溶液重合させ、固形分40.0質量%、重量平均分子量約47万、分子量分布(Mw/Mn)2.4のアクリレート系共重合体溶液を製造した。
また、残存モノマーの含有量は、実施例1と同様にして測定したところ、アクリレート系共重合体に対して、11.0質量%であった。
このアクリレート系共重合体溶液100質量部(固形分40.0質量%)に、トリレンジイソシアネート系(TDI系)架橋剤[東洋インキ製造(株)製、商品名「オリバインBHS8515」(固形分37.5質量%)]8.0質量部と、キシリレンジイソシアネート系(XDI系)架橋剤[武田薬品工業(株)製、商品名「D−110N」(固形分75質量%)]3.0質量部、酢酸エチル40.0質量部を配合し、粘着剤を調製した。
次に、厚さ50μmのポリエチレンテレフタレート(PET)フィルム[ユニチカ(株)製、商品名「エンブレットTA−50」]の片面に、乾燥後の塗布量が10g/m2(厚さ10μm)になるように直接塗工し、120℃で1分間乾燥させたのち、その上にポリプロピレン樹脂からなる剥離材[王子製紙社製、商品名「アルファンPP40SD−001」]をラミネートし、工程フィルムを作製し、諸特性を評価した。なお、糊残りは、糊残り評価試験−1を採用した。結果を第2表に示す。
Example 3
Using a reactor equipped with a stirrer, reflux condenser, dropping funnel, nitrogen gas inlet tube and thermometer, butyl acrylate (BA) 60.0 parts by mass, methyl methacrylate (MMA) 18.0 parts by mass, styrene (St) 3.5 parts by mass, methyl acrylate (MA) 13.0 parts by mass, 2-hydroxyethyl methacrylate (HEMA) 5.0 parts by mass, acrylic acid (AAC) 0.15 parts by mass Using 0.01 parts by mass of azobisisobutyronitrile (AIBN) as an agent, adding toluene as a solvent, solution polymerization in a nitrogen gas atmosphere, solid content of 40.0% by mass, weight average molecular weight of about 47 An acrylate copolymer solution having a molecular weight distribution (Mw / Mn) of 2.4 was produced.
Further, the content of the residual monomer was measured in the same manner as in Example 1, and found to be 11.0% by mass with respect to the acrylate copolymer.
To 100 parts by mass of this acrylate copolymer solution (solid content 40.0% by mass), a tolylene diisocyanate (TDI) crosslinking agent [manufactured by Toyo Ink Mfg. Co., Ltd., trade name “Olivein BHS8515” (solid content 37 .5 mass%)] 8.0 parts by mass and xylylene diisocyanate (XDI) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name “D-110N” (solid content: 75 mass%)] 3.0 An adhesive was prepared by blending part by mass and 40.0 parts by mass of ethyl acetate.
Next, the coating amount after drying is 10 g / m 2 (thickness 10 μm) on one side of a polyethylene terephthalate (PET) film [trade name “Embret TA-50” manufactured by Unitika Ltd.] having a thickness of 50 μm. After coating directly and drying at 120 ° C. for 1 minute, a release material made of polypropylene resin (made by Oji Paper Co., Ltd., trade name “Alphan PP40SD-001”) is laminated thereon, and a process film is formed. It produced and evaluated various characteristics. In addition, the adhesive residue used the adhesive residue evaluation test-1. The results are shown in Table 2.
実施例4
モノマー組成を第2表のように変えた以外は実施例3と同様にして、固形分40.0質量%、重量平均分子量約50万、分子量分布(Mw/Mn)2.7、残存モノマー8.3質量%のアクリレート系共重合体を製造した。
以下、実施例3と同様にして工程フィルムを作製し、諸特性を評価した。結果を第2表に示す。
Example 4
Except for changing the monomer composition as shown in Table 2, the same procedure as in Example 3 was performed, except that the solid content was 40.0% by mass, the weight average molecular weight was about 500,000, the molecular weight distribution (Mw / Mn) 2.7, the residual monomer 8 A 3 mass% acrylate copolymer was produced.
Hereafter, the process film was produced similarly to Example 3 and various characteristics were evaluated. The results are shown in Table 2.
実施例5
剥離材を片面にアルキッド樹脂で離型処理した厚み50μmのポリエチレンテレフタレートフィルム[リンテック(株)製、商品名「PET50 AL−5」]に変えた以外は実施例3と同様にして工程フィルムを作製し、諸特性を評価した。結果を第2表に示す。
Example 5
A process film was produced in the same manner as in Example 3 except that the release material was changed to a polyethylene terephthalate film having a thickness of 50 μm, which was release-treated with an alkyd resin on one side [trade name “PET50 AL-5”, manufactured by Lintec Corporation]. Various characteristics were evaluated. The results are shown in Table 2.
実施例6
シリコーン系剥離剤層を用いた剥離材として[リンテック(株)製、商品名「SP−PET3811」]を使用した以外は、実施例3と同様にして工程フィルムを作製した。結果を第2表に示す。
Example 6
A process film was produced in the same manner as in Example 3 except that [Rintec Co., Ltd., trade name “SP-PET3811]] was used as a release material using a silicone release agent layer. The results are shown in Table 2.
比較例2
実施例3において、溶液重合を行ったのち、さらにもう一度重合を行った以外は、実施例3と同様にしてアクリレート系共重合体を製造した。得られたアクリレート系共重合体の重量平均分子量は約55万、分子量分布(Mw/Mn)は3.4であった。
また、残存モノマーの含有量は、実施例1と同様にして測定したところ、アクリレート系共重合体に対して、3.5質量%であった。
以下、実施例3と同様にして工程フィルムを作製し、諸特性を評価した。結果を第2表に示す。
Comparative Example 2
In Example 3, an acrylate copolymer was produced in the same manner as in Example 3 except that the solution polymerization was performed and then the polymerization was performed again. The weight average molecular weight of the obtained acrylate copolymer was about 550,000, and the molecular weight distribution (Mw / Mn) was 3.4.
Further, the content of the residual monomer was measured in the same manner as in Example 1, and found to be 3.5% by mass relative to the acrylate copolymer.
Hereafter, the process film was produced similarly to Example 3 and various characteristics were evaluated. The results are shown in Table 2.
第2表から分かるように、実施例3〜6の工程フィルムは、比較例2のものに比べて、接着試験において、高い接着力を有している。また、実施例3〜5は非シリコーン系剥離剤層を有する剥離材を使用したものであるが、実施例6はシリコーン系剥離剤層を有する剥離材を使用しているため、接着試験における接着力が、実施例3〜5に比べて劣る。 As can be seen from Table 2, the process films of Examples 3 to 6 have higher adhesive strength in the adhesion test than those of Comparative Example 2. Moreover, although Examples 3-5 use the release material which has a non-silicone-type release agent layer, since Example 6 uses the release material which has a silicone-type release agent layer, it is adhesion in an adhesion test. The force is inferior compared to Examples 3-5.
実施例7
実施例3と同様にしてアクリレート系共重合体溶液を製造した。
このアクリレート系共重合体溶液100質量部(固形分40.0質量%)に、キシレンジイソシアネート系(XDI系)架橋剤[武田薬品工業(株)製、商品名「D−110N」(固形分75質量%)]9.0質量部、酢酸エチル40.0質量部を配合し、粘着剤を調製した。
次に、厚さ50μm、貯蔵弾性率の変化率が40%のポリイミドフィルム[東レ・デュポン(株)製、登録商標「カプトン」]の片面に、乾燥後の塗布量が10g/m2になるように直接塗工し、120℃で1分間乾燥させたのち、その上にポリプロピレン樹脂からなる剥離材[王子製紙社製、商品名「アルファンPP40SD−001」]をラミネートし、工程フィルムを作製し、糊残りを、糊残り評価試験−2を採用して評価した。結果を第3表に示す。
Example 7
An acrylate copolymer solution was produced in the same manner as in Example 3.
To 100 parts by mass of this acrylate copolymer solution (solid content 40.0% by mass), a xylene diisocyanate (XDI) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name “D-110N” (solid content 75 (Mass%)] 9.0 parts by mass and 40.0 parts by mass of ethyl acetate were blended to prepare an adhesive.
Next, a thickness of 50 [mu] m, the polyimide film of the rate of change of 40% storage modulus [Du Pont-Toray Co., Ltd., registered trademark "Kapton"] on one side of the coating amount after drying becomes 10 g / m 2 And then drying at 120 ° C. for 1 minute, and then laminating a release material made of polypropylene resin (trade name “Alphan PP40SD-001” manufactured by Oji Paper Co., Ltd.) to produce a process film The adhesive residue was evaluated using Adhesive residue evaluation test-2. The results are shown in Table 3.
実施例8
実施例1と同様にアクリレート系共重合体を製造した。
このアクリレート系共重合体溶液100質量部(固形分40.0質量%)に、キシレンジイソシアネート系(XDI系)架橋剤[武田薬品工業(株)製、商品名「D−110N」(固形分75質量%)]7.0質量部、酢酸エチル40.0質量部を配合し、粘着剤を調製した。
次に、厚さ50μm、貯蔵弾性率の変化率が40%のポリイミドフィルム[東レ・デュポン(株)製、商品名「カプトン」(登録商標)]の片面に、乾燥後の塗布量が10g/m2になるように直接塗工し、120℃で1分間乾燥させたのち、その上にポリプロピレン樹脂からなる剥離材[王子製紙社製、商品名「アルファンPP40SD−001」]をラミネートし、工程フィルムを作製し、糊残りを、糊残り評価試験−2を採用して評価した。結果を第3表に示す。
Example 8
An acrylate copolymer was produced in the same manner as in Example 1.
To 100 parts by mass of this acrylate copolymer solution (solid content 40.0% by mass), a xylene diisocyanate (XDI) crosslinking agent [manufactured by Takeda Pharmaceutical Co., Ltd., trade name “D-110N” (solid content 75 Mass%)] 7.0 parts by mass and 40.0 parts by mass of ethyl acetate were blended to prepare an adhesive.
Next, on a single side of a polyimide film (trade name “Kapton” (registered trademark), manufactured by Toray DuPont Co., Ltd.) having a thickness of 50 μm and a storage elastic modulus change rate of 40%, the coating amount after drying is 10 g / After coating directly to m 2 and drying at 120 ° C. for 1 minute, a release material made of polypropylene resin [manufactured by Oji Paper Co., Ltd., trade name “Alphan PP40SD-001”] was laminated thereon, A process film was produced, and the adhesive residue was evaluated by adopting adhesive residue evaluation test-2. The results are shown in Table 3.
比較例3
比較例1で作製した粘着剤溶液を用いた以外は実施例7と同様にして工程フィルムを作製し、糊残りを、糊残り評価試験−2を採用して評価した。結果を第3表に示す。
Comparative Example 3
A process film was prepared in the same manner as in Example 7 except that the pressure-sensitive adhesive solution prepared in Comparative Example 1 was used, and the adhesive residue was evaluated using Adhesive Residue Evaluation Test-2. The results are shown in Table 3.
本発明の再剥離性工程フィルムは、多層プリント配線板に用いられるフレキシブルプリント配線基板作製用基材シートに使用した場合、該再剥離性工程フィルムを剥がした際に、被着体である基材シート側の汚染が抑制され、エポキシ系樹脂シートなどの接着性シートと該基材シートとの接着力の低下を抑制することができる。また、CCDやCMOSのガラス部などに適用した場合、260℃近辺の温度が付与されても、被着体に対する糊残りや基材フィルムの変形が少ないなど、耐熱性に優れている。 The removable process film of the present invention is a base material that is an adherend when the removable process film is peeled off when used for a base sheet for producing a flexible printed wiring board used for a multilayer printed wiring board. Contamination on the sheet side is suppressed, and a decrease in the adhesive force between the adhesive sheet such as an epoxy resin sheet and the base sheet can be suppressed. In addition, when applied to a glass part of a CCD or CMOS, even when a temperature around 260 ° C. is applied, the adhesive residue and the base film are less deformed with respect to the adherend and are excellent in heat resistance.
Claims (14)
(b)被着体のフレキシブルプリント配線基板に用いられるプラスチックシートに対する粘着力が、熱プレス前で、JIS Z 0237に準じた測定法で、0.01〜0.5N/25mmである、
(c)被着体のフレキシブルプリント配線基板に用いられるプラスチックシートに貼付後、温度180℃、圧力4.3N/mm2の条件で60分間の熱プレスを行った後の粘着力が、JIS Z 0237に準じた測定法で、2.0N/25mm以下である、及び
(d)粘着剤層のゲル分率が95%以上である、
請求項6に記載の再剥離性工程フィルム。 (A) The holding force of the adherend to the plastic sheet used for the flexible printed wiring board is 70,000 seconds or more and a deviation occurs at the time of 70,000 seconds as measured according to JIS Z 0237. Is virtually unacceptable,
(B) The adhesive strength of the adherend to the plastic sheet used for the flexible printed wiring board is 0.01 to 0.5 N / 25 mm in a measurement method according to JIS Z 0237 before hot pressing.
(C) The adhesive strength after 60 minutes of hot pressing under conditions of temperature 180 ° C. and pressure 4.3 N / mm 2 after sticking to a plastic sheet used for the flexible printed wiring board of the adherend is JIS Z The measurement method according to 0237 is 2.0 N / 25 mm or less, and (d) the gel fraction of the pressure-sensitive adhesive layer is 95% or more.
The removable process film according to claim 6.
X(%)=[(G'23−G'260)/G'23]×100 When the base film has a storage elastic modulus at 23 ° C. of G ′ 23 and a storage elastic modulus at 260 ° C. of G ′ 260 , the change rate X of the storage elastic modulus represented by the following formula is 85% or less: Item 14. The removable film according to any one of Items 1 to 4 and 10 to 12.
X (%) = [(G ′ 23 −G ′ 260 ) / G ′ 23 ] × 100
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