TW200945736A - Contactless lifting of an object by an inverted planar motor - Google Patents

Contactless lifting of an object by an inverted planar motor Download PDF

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Publication number
TW200945736A
TW200945736A TW097150728A TW97150728A TW200945736A TW 200945736 A TW200945736 A TW 200945736A TW 097150728 A TW097150728 A TW 097150728A TW 97150728 A TW97150728 A TW 97150728A TW 200945736 A TW200945736 A TW 200945736A
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Taiwan
Prior art keywords
magnetic
coil actuator
support
plane
planar
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TW097150728A
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Chinese (zh)
Inventor
Petrus Carolus Maria Frissen
Johan Cornelis Compter
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Koninkl Philips Electronics Nv
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Publication of TW200945736A publication Critical patent/TW200945736A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816Bearings
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K41/00Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02Linear motors; Sectional motors
    • H02K41/03Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K2201/00Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18Machines moving with multiple degrees of freedom
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K7/00Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/08Structural association with bearings
    • H02K7/09Structural association with bearings with magnetic bearings

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Reciprocating, Oscillating Or Vibrating Motors (AREA)
  • Linear Motors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

An inverted planar motor employs an integration of a magnetic planar support (20) and a magnetic lift support (30), and a coil actuator (10) magnetically interactive with the magnetic planar support (20) and the magnetic lift support (30). In operation, coil actuator (10) concurrently moves the magnetic planar support (20) and the magnetic lift support (30) parallel to an XY plane of an XYZ reference frame associated with the coil actuator (10) based on a magnetic interaction between the coil actuator (10) and the magnetic planar support (20), and exclusively moves the magnetic lift support (30) orthogonal to the XY plane of the XYZ reference frame associated with the coil actuator (10) based on a magnetic interaction between the coil actuator (10) and the magnetic lift support (30).

Description

200945736 九、發明說明: 【發明所屬之技術領域】 本發明大體上係關於任何類型之反向平面馬達。本發明 具體係關於藉由反向平面馬達提供物件之無接觸提升。 【先前技術】 圖1例示此項技術中已知之普通的反向平面馬達,其使 用與磁性平面支撐件20磁性交互作用之線圈致動器1〇β在 操作中’換向電流被有選擇地施加於線圈致動器10以基於 線圈致動器10與磁性平面支撐件2〇之間之磁性交互作用平 行於與線圈致動器10相關之ΧΥΖ座標系統之χγ平面移動 磁性平面支撐件20。具體地說,如此項技術中所已知的, 換向電流可被有選擇地施加於線圈致動器1〇,藉此磁性平 面支撐件20可在X軸方向被線性位移,在γ軸方向被線性 位移及/或在Rz方向被旋轉,如藉由各自的雙向箭頭所 不。所不之反向平面馬達在許多應用中已證明非常有用, 例如光微影法系統之晶圓階段或標線階段。但,圖1之反 向平面馬達之一限制係無法在沒有不當的消耗功率的情况 下顯著提升藉由磁性平面支推件2〇支樓之物件(例如,一 曰曰圓)。為克服該限制,本發明提供與磁性平面支撐件汕 體化且同樣藉由線圈致動器10可活動的磁性提升支揮 【發明内容】 本發明之一 ^ 支樓件和磁,| 一形式係一反 性提升支撐件 反向平面馬達’其包含與磁性平面 件一體化之結構,及與磁性支撐件 136724.doc 200945736 磁性交互作用之線圈致動器。在操作中,基於線圈致動器 與磁性平面支撐件之間之磁性交互作用,線圈致動器平行 於與線圈致動器相關之XYZ座標系統之XY平面同時移動 磁性支撐件(例如,在X軸方向上磁性支撐件之線性位移, 在Y軸方向上磁性支撐件之線性位移及/或在Rz方向上磁性 支撐件之旋轉)。另外,基於線圈致動器與磁性提升支撐 件之間之磁性交互作用,線圈致動器垂直於與線圈致動器 相關之XYZ座標系統之XY平面專門移動磁性提升支撐件 (例如’在Z軸方向上磁性提升支撐件之線性位移)。 本發明之第二形式係包含一物件及上述反向平面馬達之 一系統。該物件藉由磁性支撐件支撐,藉此該物件可平行 於與線圈致動器相關之XYZ座標系統之χγ平面移動作為 線圈致動器與磁性平面支撐件之間之磁性交互作用之函 數,及藉此該物件可垂直於ΧΥΖ座標系統之χγ平面移動 作為線圈致動器與磁性提升支撐件之間之磁性交互作用之 函數。 本發明之第二形式係操作反向平面馬達之方法,其包括 一體化磁性平面支撐件與磁性提升支撐件,及與磁性支撐 件磁性交互作用的線圏致動器。該方法包含磁性交互作用 線圈致動器與磁性平面支撐件,其中線圈致動器平行於與 線圈致動器相關之ΧΥΖ座標系統之χγ平面同時移動磁性 支撐件,及磁性交互作用線圈致動器與磁性提升支撐件, 其中線圈致動器垂直於與線圈致動器相關之ΧΥΖ座標系統 之ΧΥ平面專門移動磁性提升支撐件。 I36724.doc 200945736 自本發明之各種實施例之以下具體描述結合圖式閱讀, 本發月之上述形式及其他形式以及本發明之各種特徵與優 點將變得更明顯。具體描述及圖式僅係本發明之例示而非 限制,本發明之範圍藉由附屬請求項及其等效物界定。 【實施方式】 參閱圖2,其顯示使用文中預先描述與圖i有關之線圈致 動器1〇與磁性平面支撐件2〇之本發明之普通反向平面馬 達及與磁性平面支撐件20—體化之磁性提升支撐件3〇。 對本發明來說,文中廣泛定義"線圈致動器,,為結構上經構 形具備回應於換向電流之線圈用於產生如此項技術中已知 的致動磁場之任何裝置,且文中廣泛定義,,磁性平面支撐 件與磁性提升支撐件"為結構上經構形具備相對於線圈 致動器之線圈定位之磁體以與此項技術中已知之線圈致動 器産生的致動磁場磁性交互作用之任何裝置。此外,根據 本發明,"磁性平面支撐件與磁性提升支撐件之一體化"被 廣泛疋義為磁性支撐件以一基於線圈致動器與磁性平面支 撑件之磁性交互作用促成兩磁性支料之㈣平面移動且 另外基於線圈致動器與磁性提升支撐件之間之磁性交互作 用促成磁性提升支擇件之專門提升移㈣方式達成之任何 類型之結合、統一成單個實體等。 仍參閱圖2,在操作令,換向電流可被有選擇地施加於 線圈致動器1G’如此項技術中所已知的,以平行於與線圈 致動器10相關之χΥΖ座標系、统之χγ平面同時移動磁性平 面支揮件2G與磁性提升支撐件3〇。具體地說,#於根據本 136724.doc 200945736 發明設計的磁性支撐件20與30之一體化結構,換向電流可 被有選擇地施加於線圈致動器10,藉此磁性平面支搏件2〇 與磁性提升支撐件30被同時在X軸方向線性位移、在γ軸 方向線性位移及/或在Rz方向旋轉,如藉由各自的雙向箭 頭所示。更具體的說’ 一般技術者亦將瞭解平行於XYZ座 才示系統之XY平面之磁性支撐件20與30之同時平面移動包 含換向電流被施加於線圈致動器1 〇之預定線圈串/組,其 基於線圈致動器10之線圈與磁性平面支撐件2〇之磁體之間 之磁性交互作用產生勞侖茲力以在X軸方向、γ抽方向及/ 或平行於XYZ座標系統之XY平面的Rz方向同時移動磁性 支撐件20與30。該等換向電流亦可産生額外的基於線圈致 動器10之線圈與磁性提升支撐件30之磁體之間之磁性交互 作用的勞侖茲力。在該情况下,根據本發明可設計磁性支 撐件20與30之一體化結構以中和線圈致動器1〇之線圈與磁 性提升支撐件30之磁體之間之任何磁性交互作用,如文中 將進一步解釋。 仍參閱圖2,換向電流可被有選擇地施加於線圈致動器 10,如此項技術中所已知的,以垂直於與線圈致動器1〇相 關之XYZ座標系統之XY平面專門移動磁性提升支撐件 3〇。具體地說,再鑒於根據本發明設計的磁性支撐件2〇與 30之一體化結構,該等換向電流可被有選擇地施加於線圈 致動器10藉此磁性提升支撐件3〇被專門地在z軸方向線性 位移,如藉由各自的雙向箭頭所示。更具體的說,一般技 術者將進一步瞭解垂直於X Y Z座標系統之x Y平面之磁性 136724.doc 200945736 k:升支擇件3 0之專門的提升移動包含換向電流被施加於線 圈致動器10之預定線圈串/組’其基於線圈致動器1〇之線 圈與磁性提升支撐件30之磁體之間之磁性交互作用產生勞 命兹力以在Ζ軸方向垂直於χγζ座標系統之χγ平面專門移 動磁性提升支撐件30〇該等換向電流亦可産生額外的基於 線圈致動器10之線圈與磁性平面支撐件2〇之磁體之間之磁 性父互作用的勞侖茲力。在該情况下,根據本發明可設計 磁性支撑件20與30之一體化結構以中和線圈致動器1〇之線 圈與磁性平面支撐件20之磁體之間之任何磁性交互作用, 如文中將進一步解釋。 在實踐中,一般技術者將瞭解,設計的換向電流之波形 峰-峰振幅、形狀及頻率係取決於馬達之許多的設計物理 參數,例如線圈致動器10之每一線圈之匝圈數量及磁性支 樓件20與3 0之每一磁體之磁通量强度。 亦在實踐中,一般技術者將瞭解,任何類型之軸承(例 如’空氣)可用於限制在ΧΥΖ座標系統之Rx方向與Ry方向 之磁性支撐件20與30任何旋轉,及/或在χγζ座標系統之z 轴方向之磁性平面支撐件2〇任何線性位移《同時或二者擇 一’磁性提升支撐件30可使用Halbach磁體以在線圈致動 器10與磁性平面支撐件20之間提供軸承功能。 參閱圖3,線圈致動器1〇(圖2)之一實例係一使用具有線 圈陣列13 <固定線圈模塊12的線圈致動器11,該線圈陣列 13藉由任何合適的方法固定至線圈模塊12之頂端外部,如 所不°線圈模塊12亦可裝納用於施加換向電流至線圈陣列 136724.doc 200945736 13之各種組件(沒有顯示),例如放大器和磁性感測器(例 如’霍爾感測器),及用於提供冷却流體至該等組件之冷 却通道14。同時,磁性平面支撐件20(圖2)之一實例係磁性 平面支撐件21,其使用具有磁性陣列24之一對磁力不可渗 透的鏡子模塊22與磁力可滲透的載體23,該磁性陣列24藉 由任何方式固定至載體23之底端外部,如圖4之最佳所 示。為支持磁性平面支撐件21與磁性提升支撐件(沒有顯 示)之一體化結構,鏡子模塊22與載體23被設計成具有許 多自鏡子模塊22之頂端外部延伸至載體23之底端外部之提 升通道25,且磁性陣列24被設計成在磁體之間具有一間隔 以曝露提升通道2 5。在該情况下,磁性提升支律件之組件 (沒有顯示)可被可移動地插入提升通道25以一體化磁性提 升支撐件與磁性平面支撐件2 1。 為進一步便於對圖3與4的理解,圖5例示使用線圈致動 器40、磁性平面支撐件50及磁性提升支撐件6〇之反向平面 馬達線圈致動器40之線圈模塊(沒有顯示)被鼓入平臺8〇 中以藉此在操作中保持固定。線圈致動器4〇具有線圈陣列 41,其中九(9)個線圈被顯示,每一線圈具有配置在線圈中 間的一或多個霍爾感測器42。具體地說,對於該實施例, 線圈 41(1)、41(2)、41(4)、41(6)、41(8)及 41(9)具有配置 在其中間之單個霍爾感測器42,同時線圈41(3)、41(5)及 41 (7)具有配置在其中間之一對疊置霍爾感測器42。一般技 術者將瞭解合併放大器43與霍爾電極44。 磁性平面支撐件50具有固定至載體52之底端外部之磁性 136724.doc 200945736 板51其中九(9)個磁體51被顯示。在載體52頂上的係鏡子 模塊53與m定板54 ^磁性提升支撐件經由提升銷^之插 入與磁性平面切件5G—體化,其中三(3)個被顯示,其中 磁性平面支撑件5G之提升通道垂直貫f載體52、鏡子模塊 3及固疋板54,且經由磁性板51可進入。銷磁體以藉由任 何方式被固定至提升銷61之底部邊緣,同時每—提升銷61 經由彈簧64在Z轴方向被垂直向下偏置。此外,每一提升 銷61具有一導件63以便於提升銷61在載體52中垂直移動。 每一提升銷61之頂部邊緣被用於支撐一物件7〇(例如, 一晶圓)且受線圈41與霍爾感測器4 2控制在偏置位置與致 動位置之間。磁性提升支撐件6〇之偏置位置包括被配置在 夾具54(沒有顯示)上之物件7〇作為彈簧M迫使提升銷^在 z軸方向垂直向下之函數。磁性提升支撐件6〇之致動位置 包括如圖5所示配置在夾具54上之物件7〇作為線圈陣列41 之鄰接線圈(例如,線圈41(3)、41(5)及41(7),如所示)與 銷磁體62(例如,銷磁體62(1)至62(3),如所示)之間強度足 以克服彈簧64(例如,彈簧64(1)至64(3) ’如所示)之偏置力 之磁性交互作用的函數。在線圈41(3)、線圈41(5)及線圈 41(7)中間疊置一對霍爾感測器42之目的係為分別便於銷磁 體62(1)、62(2)及62(3)之位置之測量。具體地說,疊置的 霍爾感測器42在銷磁體62之方向上係敏感的,藉此頂部霍 爾感測器42之輸出信號與底部霍爾感測器42之輸出之間的 差異對各自的線圈41係不敏感的以藉此反映銷磁體62之精 確位置測量。 136724.doc 12 200945736 圖6例示作為物件7〇之一處理階段(例如,晶圓階段)的 系統90(例如,光微影系統),其合併圖5所示之線圈致動器 40、磁性平面支撐件5〇及磁性提升支撐件60。系統9〇進一 步使用電流換向器91與干涉儀系統92以有選擇地執行圖7 所不之流程圖1〇〇表示之無接觸物件平面移動方法或圖8所 示之流程圖110表示之無接觸物件提升移動方法。 參閱圖7’執行流程圖1〇〇以平行於χγζ參考面之父丫平 面移動物件70至其中之任何期望的位置。具體地說,流程 圖100之階段S 102包含藉由系統90確定磁性支撐件50/60相 對於線圈致動器4〇之位置。在該階段,一般技術者將瞭解 使用干涉儀系統52與鏡子模塊53(圖5)光學相關以藉此測量 磁性支撐件50與60相對於線圈致動器40之位置。 其後’流程圖1〇〇之階段S1〇4包含藉由電流換向器91使 串聯換向電流Ici(圖6)施加至線圈致動器40以平行於XYZ 座標系統之XY平面同時移動磁性支撐件5〇與6〇。具體地 說’如此項技術中所已知的,霍爾感測器42(圖5)用來確定 磁體51(圖5)相對於線圈致動器4〇之位置以藉此施加線圈電 流Ici至線圈41(圖5)以一同時依一平行於XYZ座標系統之 XY平面之期望方向移動磁性支撐件50與60的方式與磁體 51磁性交互作用。此外,當磁性支撐件5〇與6〇在期望的方 向移動時’藉由致動線圈41與銷磁體62(圖5)之交互作用産 生之任何額外的勞侖茲力不足以克服彈簣64(圖5)之偏置 力。 在實踐中’在該等階段之初始執行之後,根據需要以重 136724.doc 200945736 複的方式連續執行階段S102與S104直到物件70已被移動至 期望的平面位置。 參閱圖8 ’執行流程圖110以在提升位置(即,如文中所 預先描述的支撐件60致動位置)與夾緊位置(即,如文中所 預先描述的支撐件60偏置位置)之間移動物件70。具體地 說,流程圖110之階段S112包含藉由系統90確定磁性提升 支樓件60相對於線圈致動器40之位置。在該階段中,疊置 霍爾感測II 42(圖5)被用於磁性感測銷磁體62以藉此測量磁 性提升支撐件60相對於線圈致動器40之位置。 其後,流程圖110之階段S114包含藉由電流換向器91施 加串聯換向電流IC2(圖6)至線圈致動器40以垂直於χγζ座 標系統之XY平面專門移動磁性提升支撐件60。如文中所 預先描述,換向電流Icz被施加於線圈41 (圖5)以一克服彈 簧64(圖5)之偏置强度的方式與銷磁體62磁性交互作用以依 一垂直於XYZ座標系統之XY平面的期望方向移動磁性提 升支撐件60。在該情况下,當在夾緊位置與提升位置之間 移動物件70時,鑒於施加至磁性平面支撐件5〇之總淨力作 為銷磁體62相對於磁體5 1之間隔配置之函數係零,藉由在 線圈41與磁體51(圖5)之間之磁性交互作用産生之任何額外 的勞侖茲力被中和。 在實踐中,在初始執行之後,根據需要以重複的方式連 續執行階段S122與S124直到物件70依照要求已被移動至夹 緊位置或提升位置。 參閱圖2-8, 一般技術者將瞭解本發明之反向平面馬達 136724.doc •14· 200945736 可被使用在許多應用中,例如在半導體製造應用_ (例 如,ASML、LAK-Tencor、ΑΜΑΤ、NXP)、反應或侵入性 應用中之樣本/基板定位、高加速度/速度應用、真空應 用、製造應用、中間應用(例如,在χ光裝置中之快門葉 片)及消費者電子應用(例如,CD/DVD/藍光驅動系統)。 另外,在實踐中,本發明之反向平面馬達之每一組件之 實際結構配置與相對尺寸係取決於馬達之明確應用之細200945736 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention generally relates to any type of reverse planar motor. The invention is particularly directed to providing contactless lifting of articles by a reverse plane motor. [Prior Art] FIG. 1 illustrates a conventional reverse plane motor known in the art that uses a coil actuator 1 〇β that magnetically interacts with a magnetic planar support 20 to operate in a 'commutated current selectively The coil actuator 10 is applied to move the magnetic planar support 20 parallel to the χ-gamma plane of the ΧΥΖ coordinate system associated with the coil actuator 10 based on the magnetic interaction between the coil actuator 10 and the magnetic planar support 2〇. Specifically, as is known in the art, the commutating current can be selectively applied to the coil actuator 1〇, whereby the magnetic planar support 20 can be linearly displaced in the X-axis direction in the γ-axis direction. It is linearly displaced and/or rotated in the Rz direction, as by the respective two-way arrows. The reverse planar motor has proven to be very useful in many applications, such as the wafer phase or the marking phase of a photolithography system. However, one of the limitations of the reverse planar motor of Figure 1 is that it is not possible to significantly increase the object (e.g., a circle) of the support by the magnetic plane support member 2 without undue power consumption. In order to overcome this limitation, the present invention provides a magnetic lifting support that is colloidal with a magnetic planar support and that is also movable by the coil actuator 10. [Invention] One of the present inventions, a building member and a magnetic, | A counter-lifting support reverse plane motor that includes a structure that is integral with the magnetic planar member and a magnetic actuator that interacts magnetically with the magnetic support 136724.doc 200945736. In operation, based on the magnetic interaction between the coil actuator and the magnetic planar support, the coil actuator moves the magnetic support simultaneously parallel to the XY plane of the XYZ coordinate system associated with the coil actuator (eg, at X) Linear displacement of the magnetic support in the axial direction, linear displacement of the magnetic support in the Y-axis direction and/or rotation of the magnetic support in the Rz direction). Additionally, based on the magnetic interaction between the coil actuator and the magnetic lift support, the coil actuator specifically moves the magnetic lift support perpendicular to the XY plane of the XYZ coordinate system associated with the coil actuator (eg, 'on the Z axis The linear displacement of the magnetic lifting support in the direction). A second form of the invention comprises an article and a system of the reverse plane motor described above. The article is supported by a magnetic support whereby the object can be parallel to the χ gamma plane movement of the XYZ coordinate system associated with the coil actuator as a function of magnetic interaction between the coil actuator and the magnetic planar support, and Thereby the object can be moved perpendicular to the χ gamma plane of the ΧΥΖ coordinate system as a function of the magnetic interaction between the coil actuator and the magnetic lifting support. A second form of the invention is a method of operating a reverse planar motor that includes an integrated magnetic planar support and a magnetic lift support, and a turns actuator that magnetically interacts with the magnetic support. The method includes a magnetic interaction coil actuator and a magnetic planar support, wherein the coil actuator moves the magnetic support simultaneously parallel to the χ gamma plane of the ΧΥΖ coordinate system associated with the coil actuator, and the magnetic interaction coil actuator And the magnetic lifting support, wherein the coil actuator specifically moves the magnetic lifting support perpendicular to the meandering plane of the ΧΥΖ coordinate system associated with the coil actuator. The above-described and other forms of the present invention, as well as various features and advantages of the present invention, will become more apparent from the detailed description of the embodiments of the invention. The detailed description and drawings are intended to be illustrative and not restrict [Embodiment] Referring to Figure 2, there is shown a conventional reverse plane motor of the present invention and a magnetic planar support member 20, which are described in advance with respect to the coil actuator 1 and the magnetic planar support member 2 of Figure i. The magnetic lifting support 3〇. For the purposes of the present invention, a coil actuator is broadly defined as any device that is structurally configured to have a coil in response to commutation current for generating an actuating magnetic field as is known in the art. Definitions, a magnetic planar support and a magnetic lifting support " is a structurally configured magnet having a coil positioned relative to the coil actuator to produce an actuating magnetic field magnetic force with a coil actuator known in the art Any device that interacts. Further, according to the present invention, "integration of the magnetic planar support member and the magnetic lifting support member" is widely defined as a magnetic support member which promotes two magnetic branches by a magnetic interaction between the coil actuator and the magnetic planar support member. The (4) plane movement and additionally based on the magnetic interaction between the coil actuator and the magnetic lifting support facilitates the combination of any type of special lifting movement of the magnetic lifting support (4), unified into a single entity, and the like. Still referring to Fig. 2, in an operational command, commutating current can be selectively applied to the coil actuator 1G' as known in the art to be parallel to the coordinate system associated with the coil actuator 10. Then, the γ plane simultaneously moves the magnetic plane support member 2G and the magnetic lift support member 3〇. Specifically, #in the integrated structure of the magnetic support members 20 and 30 designed according to the invention of 136724.doc 200945736, a commutating current can be selectively applied to the coil actuator 10, whereby the magnetic plane beat member 2 The crucible and the magnetic lifting support 30 are simultaneously linearly displaced in the X-axis direction, linearly displaced in the γ-axis direction, and/or rotated in the Rz direction as indicated by the respective double-headed arrows. More specifically, 'the average skilled person will also understand that the simultaneous planar movement of the magnetic supports 20 and 30 parallel to the XY plane of the XYZ mount system includes a predetermined coil train to which the commutating current is applied to the coil actuator 1 / The group, based on the magnetic interaction between the coil of the coil actuator 10 and the magnet of the magnetic planar support 2, produces a Lorentz force in the X-axis direction, the gamma pumping direction and/or the XY of the XYZ coordinate system. The magnetic support members 20 and 30 are simultaneously moved in the Rz direction of the plane. These commutating currents can also create additional Lorentz forces based on the magnetic interaction between the coils of the coil actuator 10 and the magnets of the magnetic lifting support 30. In this case, the integrated structure of the magnetic supports 20 and 30 can be designed in accordance with the present invention to neutralize any magnetic interaction between the coil of the coil actuator 1 and the magnet of the magnetic lifting support 30, as will be Further explanation. Still referring to Fig. 2, the commutating current can be selectively applied to the coil actuator 10, as is known in the art, specifically moving perpendicular to the XY plane of the XYZ coordinate system associated with the coil actuator 1A. Magnetic lifting support 3〇. Specifically, in view of the integrated structure of the magnetic support members 2 and 30 designed in accordance with the present invention, the commutating currents can be selectively applied to the coil actuator 10 whereby the magnetic lifting support member 3 is specialized The ground is linearly displaced in the z-axis direction as indicated by the respective double-headed arrows. More specifically, the average person will further understand the magnetic 136724.doc 200945736 k perpendicular to the x y plane of the XYZ coordinate system: the special lifting movement of the spur support 30 includes the commutation current applied to the coil actuator The predetermined coil train/group of 10's magnetic interaction between the coil based on the coil actuator 1〇 and the magnet of the magnetic lift support 30 generates a labor force force perpendicular to the χγ plane of the χγζ coordinate system in the x-axis direction Specially moving the magnetic lifting support 30 〇 these commutating currents can also create additional Lorentz forces based on the magnetic parent interaction between the coils of the coil actuator 10 and the magnets of the magnetic planar support 2〇. In this case, the integrated structure of the magnetic supports 20 and 30 can be designed in accordance with the present invention to neutralize any magnetic interaction between the coil of the coil actuator 1 and the magnet of the magnetic planar support 20, as will be Further explanation. In practice, one of ordinary skill will appreciate that the waveform peak-to-peak amplitude, shape, and frequency of the designed commutating current are dependent upon many of the design physical parameters of the motor, such as the number of turns per coil of the coil actuator 10. And the magnetic flux strength of each of the magnetic building members 20 and 30. Also in practice, one of ordinary skill will appreciate that any type of bearing (e.g., 'air) can be used to limit any rotation of the magnetic supports 20 and 30 in the Rx and Ry directions of the ΧΥΖ coordinate system, and/or in the χγζ coordinate system. Magnetic plane support 2 in the z-axis direction Any linear displacement "simultaneously or alternatively" The magnetic lifting support 30 may use a Halbach magnet to provide a bearing function between the coil actuator 10 and the magnetic planar support 20. Referring to Figure 3, one example of a coil actuator 1 (Fig. 2) is a coil actuator 11 having a coil array 13 < fixed coil module 12, the coil array 13 being secured to the coil by any suitable method. Outside the top of module 12, coil module 12 can also be used to apply commutating current to coil arrays 136724.doc 200945736 13 various components (not shown), such as amplifiers and magnetic sensors (eg 'ho Sensors, and cooling channels 14 for providing cooling fluid to the components. Meanwhile, one example of the magnetic planar support 20 (Fig. 2) is a magnetic planar support 21 that uses a mirror module 22 having a magnetically impermeable mirror array 22 and a magnetically permeable carrier 23, the magnetic array 24 It is fixed to the outside of the bottom end of the carrier 23 by any means, as best shown in FIG. In order to support the integrated structure of the magnetic planar support 21 and the magnetic lifting support (not shown), the mirror module 22 and the carrier 23 are designed to have a plurality of lifting passages extending from the top end of the mirror module 22 to the outside of the bottom end of the carrier 23. 25, and the magnetic array 24 is designed to have a space between the magnets to expose the lift channel 25. In this case, an assembly of the magnetic lifting member (not shown) can be movably inserted into the lifting passage 25 to integrate the magnetic lifting support with the magnetic planar support 21. To further facilitate the understanding of FIGS. 3 and 4, FIG. 5 illustrates a coil module (not shown) of the reverse planar motor coil actuator 40 using the coil actuator 40, the magnetic planar support 50, and the magnetic lifting support 6〇. It is drummed into the platform 8 to thereby remain fixed during operation. The coil actuator 4 has a coil array 41 in which nine (9) coils are shown, each coil having one or more Hall sensors 42 disposed intermediate the coils. Specifically, for this embodiment, the coils 41(1), 41(2), 41(4), 41(6), 41(8), and 41(9) have a single Hall sensing disposed therebetween. The dampers 42 (3), 41 (5), and 41 (7) have a pair of stacked Hall sensors 42 disposed therebetween. The average amplifier 43 and Hall electrode 44 will be understood by those of ordinary skill. The magnetic planar support 50 has a magnetic 136724.doc 200945736 plate 51 fixed to the outside of the bottom end of the carrier 52 in which nine (9) magnets 51 are shown. The Mirror Module 53 and the m-plate 54 on the top of the carrier 52 are magnetically lifted by the insertion of the lifting pin and the magnetic plane cutting member 5G, wherein three (3) are displayed, wherein the magnetic plane support 5G The lifting passage is perpendicular to the f carrier 52, the mirror module 3, and the solid plate 54, and is accessible via the magnetic plate 51. The pin magnet is fixed to the bottom edge of the lift pin 61 by any means while the lift pin 61 is vertically downwardly biased in the Z-axis direction via the spring 64. Further, each of the lift pins 61 has a guide 63 to facilitate vertical movement of the lift pins 61 in the carrier 52. The top edge of each lift pin 61 is used to support an object 7 (e.g., a wafer) and is controlled between the biased position and the actuated position by the coil 41 and the Hall sensor 42. The offset position of the magnetic lift support 6〇 includes the object 7 disposed on the clamp 54 (not shown) as a function of the spring M forcing the lift pin to be vertically downward in the z-axis direction. The actuating position of the magnetic lifting support 6〇 includes the object 7 disposed on the jig 54 as shown in FIG. 5 as an adjacent coil of the coil array 41 (for example, the coils 41(3), 41(5), and 41(7) The strength between the pin magnets 62 (eg, pin magnets 62(1) through 62(3), as shown) is sufficient to overcome the spring 64 (eg, springs 64(1) through 64(3)' as The function of the magnetic interaction of the biasing force shown). The purpose of stacking a pair of Hall sensors 42 between the coil 41 (3), the coil 41 (5) and the coil 41 (7) is to facilitate the pin magnets 62 (1), 62 (2) and 62 (3, respectively). The measurement of the location. Specifically, the stacked Hall sensors 42 are sensitive in the direction of the pin magnets 62, whereby the difference between the output signal of the top Hall sensor 42 and the output of the bottom Hall sensor 42 The respective coils 41 are insensitive to thereby reflect the precise position measurement of the pin magnets 62. Figure 6 illustrates a system 90 (e. The support member 5 and the magnetic lifting support member 60. The system 9 further uses the current commutator 91 and the interferometer system 92 to selectively perform the contactless object plane movement method represented by the flowchart 1 of FIG. 7 or the flowchart 110 shown in FIG. Contact object lifting method. Referring to Figure 7', a flow chart 1 is performed to move the object 70 parallel to the parent plane of the χγζ reference plane to any desired position therein. Specifically, stage S 102 of flowchart 100 includes determining, by system 90, the position of magnetic support 50/60 relative to coil actuator 4A. At this stage, one of ordinary skill will appreciate that the interferometer system 52 is optically related to the mirror module 53 (Fig. 5) to thereby measure the position of the magnetic supports 50 and 60 relative to the coil actuator 40. Thereafter, the stage S1〇4 of the flowchart 1 includes applying the series commutating current Ici (FIG. 6) to the coil actuator 40 by the current commutator 91 to simultaneously move the magnetic body parallel to the XY plane of the XYZ coordinate system. The support members are 5〇 and 6〇. Specifically, as is known in the art, Hall sensor 42 (Fig. 5) is used to determine the position of magnet 51 (Fig. 5) relative to coil actuator 4 to thereby apply coil current Ici to Coil 41 (Fig. 5) magnetically interacts with magnet 51 in a manner that simultaneously moves magnetic supports 50 and 60 in a desired direction parallel to the XY plane of the XYZ coordinate system. Furthermore, any additional Lorentz force generated by the interaction of the actuating coil 41 with the pin magnet 62 (Fig. 5) is insufficient to overcome the magazine 64 when the magnetic supports 5〇 and 6〇 are moved in the desired direction. (Fig. 5) The biasing force. In practice, after the initial execution of the stages, stages S102 and S104 are continuously executed as needed in the manner of a weight 136724.doc 200945736 until the object 70 has been moved to the desired planar position. Referring to Figure 8 'executing flow chart 110 between the lift position (i.e., the support member 60 actuated position as previously described herein) and the clamp position (i.e., the support member 60 offset position as previously described herein) Moving the object 70. In particular, stage S112 of flowchart 110 includes determining, by system 90, the position of magnetic lift slab member 60 relative to coil actuator 40. In this stage, the stacked Hall sensing II 42 (Fig. 5) is used for the magnetic sensing pin magnet 62 to thereby measure the position of the magnetic lifting support 60 relative to the coil actuator 40. Thereafter, stage S114 of flowchart 110 includes applying series commutating current IC2 (Fig. 6) to coil actuator 40 via current commutator 91 to specifically move magnetic lift support 60 perpendicular to the XY plane of the χγζ coordinate system. As previously described herein, the commutating current Icz is applied to the coil 41 (Fig. 5) to magnetically interact with the pin magnet 62 in a manner that overcomes the biasing strength of the spring 64 (Fig. 5) to be perpendicular to the XYZ coordinate system. The magnetic lifting support 60 is moved in the desired direction of the XY plane. In this case, when the object 70 is moved between the clamped position and the raised position, the total net force applied to the magnetic planar support 5 is zero as a function of the spacing configuration of the pin magnet 62 relative to the magnet 51. Any additional Lorentz forces generated by the magnetic interaction between coil 41 and magnet 51 (Fig. 5) are neutralized. In practice, after the initial execution, stages S122 and S124 are continuously executed in a repeated manner as needed until the object 70 has been moved to the gripping position or the raised position as required. Referring to Figures 2-8, one of ordinary skill will appreciate that the reverse planar motor of the present invention 136724.doc • 14· 200945736 can be used in many applications, such as in semiconductor manufacturing applications (e.g., ASML, LAK-Tencor, ΑΜΑΤ, NXP), sample/substrate positioning in reactive or invasive applications, high acceleration/speed applications, vacuum applications, manufacturing applications, intermediate applications (eg, shutter blades in calenders), and consumer electronics applications (eg, CD /DVD/Blu-ray drive system). In addition, in practice, the actual structural configuration and relative dimensions of each component of the reverse planar motor of the present invention depend on the precise application of the motor.

節。因而,本發明沒有設想在許多潛在應用當中本發明之 反向平面馬達之每一組件之最好的結構配置與相對尺寸之 任何具體的類型。 雖然文中所揭示之本發明之實施例目前認為係較佳的, 在不違本發明<精神肖範圍m下可做各種變換與修 飾。在附加請求項中指出本發明之範圍,且在等效物之意 義與範圍之内之所有變換意欲被包含於其中。 【圖式簡單說明】 圖“示此項技術中已知之一普通反向平面馬達之一方 塊圖之一透視俯視圖。 圖〇 丁根據本發明之一反向平面馬達之一普通實施例 之一方塊圖之一透視俯視圖。 圖3例不根據本發明之—線圈致動器與—磁性平面支推 牛之τ範實施例之—示意圖之—透視俯視圖; 圖4例示圖3所示之該磁性平面支標件之一示一透 視仰視圖。 圖5例示根據本發 馬達 示意圖之 136724.doc 200945736 示範實施例之一側視圖。 圖6例示使用根據本發明之一反向平面馬達之一系統之 一方塊圖。 圖7例示此項技術中已知之表示一無接觸物件平面移動 方法之一流程圖。 圖8例示根據本發明之一無接觸物件上升移動方法之一 代表流程圖。 【主要元件符號說明】 10 線圈致動器 11 線圈致動器 12 線圈模塊 13 線圈陣列 14 冷却通道 20 磁性平面支撐件 21 磁性平面支撐件 22 鏡子模塊 23 載體 24 磁性陣列 25 提升通道 30 磁性提升支撐件 40 線圈致動器 41 線圈陣列 42 霍爾感測器 43 放大器 136724.doc -16- 200945736 44 霍爾電極 50 磁性平面支撐件 51 磁性板 52 載體 . 53 鏡子模塊 54 夾具 60 磁性提升支撐件 61 提升銷 ❿ 62 銷磁體 63 導件 64 彈簣 70 物件 80 平臺 90 系統 91 電流換向器 φ 92 干涉儀系統 136724.doc -17-Section. Thus, the present invention does not contemplate any particular type of configuration and relative dimensions of each component of the reverse planar motor of the present invention in many potential applications. While the embodiments of the invention disclosed herein are presently considered to be preferred, various changes and modifications may be made without departing from the invention. The scope of the present invention is indicated by the appended claims, and all modifications are intended to be included within the meaning and scope of the equivalents. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective top view of one of the ordinary reverse plane motors known in the art. Figure 1 is a block diagram of one of the conventional embodiments of a reverse plane motor according to the present invention. Figure 3 is a perspective top view of a coil actuator and a magnetic plane-supporting embodiment of the present invention; Figure 4 illustrates the magnetic plane shown in Figure 3; One of the support members shows a perspective bottom view. Figure 5 illustrates a side view of an exemplary embodiment of 136724.doc 200945736 in accordance with the present motor schematic. Figure 6 illustrates one of the systems using one of the reverse plane motors in accordance with the present invention. Figure 7 illustrates a flow chart of a method for moving a contactless object in the art as known in the art. Figure 8 illustrates a flow chart representative of one of the methods for ascending movement of a contactless object in accordance with the present invention. 10 coil actuator 11 coil actuator 12 coil module 13 coil array 14 cooling channel 20 magnetic plane support 21 magnetic plane support 22 mirror Module 23 Carrier 24 Magnetic Array 25 Lifting Channel 30 Magnetic Lifting Support 40 Coil Actuator 41 Coil Array 42 Hall Detector 43 Amplifier 136724.doc -16- 200945736 44 Hall Electrode 50 Magnetic Plane Support 51 Magnetic Plate 52 Carrier. 53 Mirror Module 54 Clamp 60 Magnetic Lifting Support 61 Lifting Pin ❿ 62 Pin Magnet 63 Guide 64 Bobber 70 Object 80 Platform 90 System 91 Current Commutator φ 92 Interferometer System 136724.doc -17-

Claims (1)

200945736 十、申請專利範園: 1. 一種反向平面馬達,其包含: 一體化之一磁性平面支撐件(20)與一磁性提升支撐件 (30);及 一線圈致動器(10),其與該磁性平面支撐件(20)及該 磁性提升支撐件(30)磁性交互作用, 其中該線圈致動器(10)基於該線圈致動器〇〇)與 該磁性平面支撐件(20)之間之一磁性交互作用,平行 於與該線圈致動器(10)相關之一XYZ座標系統之一χγ 平面同時移動該磁性平面支撐件(2〇)與該磁性提升支 撐件(30),且 其中該線圈致動器(10)基於該線圈致動器(1〇)與 该磁性提升支撐件(3〇)之間之一磁性交互作用,垂直 於與該線圈致動器(10)相關之該ΧΥΖ座標系統之χγ平 面專門移動該磁性提升支撐件(30)。 2. 如請求項1之反向平面馬達,其中換向電流施加至該線 圈致動器(10)使該磁性提升支撐件(30)在一偏置位置與 一致動位置之間移動’並中和該磁性平面支撐件(2〇)垂 直於與該線圈致動器(10)相關之該ΧΥΖ座標系統之χγ平 面之任何移動。 3 ·如請求項1之反向平面馬達,其中該磁性提升支撐件(30) 包括: 至少一提升銷(61),其可移動地插入該磁性平面支撐 件(20);及 136724.doc 200945736 至 >、銷磁體(62),每一銷磁體(62)被固定至一個別 提升銷(61)。 4. 如請求項3之反向平面馬達,其中換向電流施加至線圈 致動器(1〇)在該線圈致動器(10)與該至少一銷磁體(62)之 間産生一磁性交互作用以垂直於與該線圈致動器(丨〇)相 關之該XYZ座標系統之XY平面專門移動該磁性提升支撐 件(30)。 5. 如凊求項3之反向平面馬達,其中該線圈致動器(丨〇)包 括: 用於每一銷磁體(62)之一對疊置磁性感測器(42),每 對疊置磁性感測器(42)可操作以確定一相應銷磁體(62) 相對於該線圈致動器(10)之一位置。 6. 如請求項3之反向平面馬達,其中該磁性提升支撐件 進一步包括: 至少一彈簧(64),每一彈簧(64)垂直於與該線圈致動 器(1〇)相關之該XYZ座標系統之XY平面施加一偏置力至 一相應提升銷(61)。 7. —種系統,其包含: 一反向平面馬達,其包括: 一體化之一磁性平面支撐件(2〇)與一磁性提升支 撐件(30);及 一線圈致動器(10),其與該磁性平面支律件(2〇) 及該磁性提升支樓件(30)磁性交互作用, 其中該線圈致動器(10)基於該線圈致動器(1〇) 136724.doc 200945736 與該磁性平面支撐件(20)之間之一磁性交互作用,平 行於與該線圈致動器(10)相交之一 XYZ座標系統之一 XY平面專門移動該磁性平面支撐件(2〇)與該磁性提升 支撐件(30),且 * 其中該線圈致動器(丨〇)基於該線圈致動器(10) 與該磁性提升支撐件(30)之間之一磁性交互作用,垂 直於與該線圈致動器(1〇)相關之該XYZ座標系統之χγ Ο 平面專門移動該磁性提升支撐件(30);及 一物件(70) ’其可藉由該磁性平面支撐件(2〇)與該磁 性提升支撐件(30)之一體化結構支撐。 8.如請求項7之系統,其中換向電流施加至該線圈致動器 (1〇)使該磁性提升支撐件(3〇)在一偏置位置與一致動位 置之間移動並中和該磁性平面支撐件(2〇)垂直於與該線 圈致動器(10)相關之該χγζ座標系統之χγ平面之任何移 動。 φ 9.如凊求項7之系統,其中該磁性提升支撐件(30)包括: 至^ 乂升銷(61)’其可移動地插入該磁性平面支撐 件(20);及 ' 至少一銷磁體(62),每一銷磁體(62)被固定至一個別 提升鎖(61)。 月长項9之系統,其中換向電流施加至線圈致動器(1〇) 在該線圈致動器(10)與該至少一銷磁體(62)之間產生一 磁陡交互作用以垂直於與該線圈致動器(10)相關之該 座払系統之ΧΥ平面專門移動該磁性提升支撐件 136724.doc 200945736 (30)。 11 ·如靖求項9之系統,其中該線圈致動器(1〇)包括: 用於每一銷磁體(62)之一對疊置磁性感測器(42),每 對疊置磁J·生感測器(42)可操作以確定一相應銷磁體(62) 相對於該線圈致動器(1〇)之一位置。 12.如清求項9之系統,其中該磁性提升支撐件⑽進一步包 括: 至少-彈簧(64),每一彈簧(64)垂直於與該線圈致動 器(1〇)相關之該XYZ座標系、统之χγ平面施加一偏置力至 一相應提升銷(61)。 13·如請求項7之系統,其中: 該系統係一光微影系統(90);且 該物件(70)係一晶圓。 Μ· 一種操作一反向平面馬達之方法,該反向平面馬達包 2 : 一磁性平面支樓件(20)與一磁性提升支撐件(30)之 一體化結構;及-線圈致動器⑽,其與該磁性平面支 撑件⑽及該磁性提升支撐件(3〇)磁性交互仙,該方 法包含: 200945736 (10)相關之該XYZ座標系統之XY平面專門移動該磁性提 升支撐件(30)。 15.如請求項14之方法,其中該磁性提升支撐件(30)可在一 偏置位置與一致動位置之間移動。 參200945736 X. Patent application garden: 1. A reverse plane motor comprising: an integrated magnetic plane support member (20) and a magnetic lifting support member (30); and a coil actuator (10), It magnetically interacts with the magnetic planar support (20) and the magnetic lifting support (30), wherein the coil actuator (10) is based on the coil actuator () and the magnetic planar support (20) a magnetic interaction between the magnetic planar support (2) and the magnetic lifting support (30) simultaneously parallel to one of the XYZ coordinate systems of one of the XYZ coordinate systems associated with the coil actuator (10), And wherein the coil actuator (10) is based on a magnetic interaction between the coil actuator (1〇) and the magnetic lifting support (3〇), perpendicular to the coil actuator (10) The χ γ plane of the ΧΥΖ coordinate system specifically moves the magnetic lifting support (30). 2. The reverse planar motor of claim 1, wherein a commutating current is applied to the coil actuator (10) to move the magnetic lifting support (30) between an offset position and a coordinated position. And the magnetic planar support (2〇) is perpendicular to any movement of the χ γ plane of the ΧΥΖ coordinate system associated with the coil actuator (10). 3. The reverse planar motor of claim 1, wherein the magnetic lift support (30) comprises: at least one lift pin (61) movably inserted into the magnetic planar support (20); and 136724.doc 200945736 To >, the pin magnet (62), each pin magnet (62) is fixed to an additional lift pin (61). 4. The reverse planar motor of claim 3, wherein the commutating current is applied to the coil actuator (1〇) to create a magnetic interaction between the coil actuator (10) and the at least one pin magnet (62) The action specifically moves the magnetic lift support (30) perpendicular to the XY plane of the XYZ coordinate system associated with the coil actuator (丨〇). 5. The reverse planar motor of claim 3, wherein the coil actuator comprises: a pair of magnetic sensors (42) for each pin magnet (62), each pair of stacks A magnetic sensor (42) is operable to determine a position of a corresponding pin magnet (62) relative to the coil actuator (10). 6. The reverse planar motor of claim 3, wherein the magnetic lift support further comprises: at least one spring (64), each spring (64) being perpendicular to the XYZ associated with the coil actuator (1〇) The XY plane of the coordinate system applies a biasing force to a corresponding lift pin (61). 7. A system comprising: a reverse plane motor comprising: an integral one of a magnetic planar support (2 turns) and a magnetic lift support (30); and a coil actuator (10), It magnetically interacts with the magnetic planar support member (2〇) and the magnetic lifting branch member (30), wherein the coil actuator (10) is based on the coil actuator (1〇) 136724.doc 200945736 and Magnetic interaction between the magnetic planar support (20), parallel to the XY plane of one of the XYZ coordinate systems intersecting the coil actuator (10), specifically moving the magnetic planar support (2〇) a magnetic lifting support (30), and wherein the coil actuator (磁性) is based on a magnetic interaction between the coil actuator (10) and the magnetic lifting support (30), perpendicular to The 致γ Ο plane of the XYZ coordinate system associated with the coil actuator (1〇) specifically moves the magnetic lifting support (30); and an object (70) 'which can be supported by the magnetic planar support (2〇) The integrated structure of the magnetic lifting support (30) is supported. 8. The system of claim 7, wherein a commutating current is applied to the coil actuator (1〇) to move the magnetic lifting support (3〇) between an offset position and a coincident position and neutralize the The magnetic planar support (2〇) is perpendicular to any movement of the χγ plane of the χγζ coordinate system associated with the coil actuator (10). φ 9. The system of claim 7, wherein the magnetic lift support (30) comprises: to a lift pin (61) movably inserted into the magnetic planar support (20); and 'at least one pin A magnet (62), each pin magnet (62) is secured to an additional lift lock (61). A system of month length item 9, wherein a commutating current is applied to the coil actuator (1〇) to create a magnetic steep interaction between the coil actuator (10) and the at least one pin magnet (62) to be perpendicular to The pupil plane of the yoke system associated with the coil actuator (10) specifically moves the magnetic lift support 136724.doc 200945736 (30). 11. The system of claim 9, wherein the coil actuator (1) comprises: a pair of magnetic sensors (42) for each pin magnet (62), each pair of stacked magnetic J The biosensor (42) is operable to determine a position of a corresponding pin magnet (62) relative to the coil actuator (1). 12. The system of claim 9, wherein the magnetic lift support (10) further comprises: at least a spring (64), each spring (64) being perpendicular to the XYZ coordinate associated with the coil actuator (1〇) The gamma plane of the system is applied with a biasing force to a corresponding lifting pin (61). 13. The system of claim 7, wherein: the system is a photolithography system (90); and the object (70) is a wafer. Μ· A method of operating a reverse plane motor, the reverse plane motor package 2: an integrated structure of a magnetic planar branch member (20) and a magnetic lifting support (30); and a coil actuator (10) And magnetically interacting with the magnetic planar support member (10) and the magnetic lifting support member (3〇), the method comprising: 200945736 (10) related to the XY plane of the XYZ coordinate system specifically moving the magnetic lifting support member (30) . 15. The method of claim 14, wherein the magnetic lifting support (30) is moveable between an offset position and an intermeshing position. Reference 136724.doc136724.doc
TW097150728A 2007-12-28 2008-12-25 Contactless lifting of an object by an inverted planar motor TW200945736A (en)

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