TW200933779A - Stocker with purge condition sensing - Google Patents

Abstract

The present invention provides a method, system, and components for protecting reticles and specifically for providing purging and sensing and confirmation of the purge streams. A storage housing with a purge system for reticle pods has an automated robotic mechanism for transferring reticle pods includes a gripper with an air flow sensor therewith. The housing includes receptacles for receiving the reticle pods, the receptacle having purge outlets as part of the purge system that discharge purge streams when the reticle pod is not in place and discharge into the reticle pod when the pod is seated. The air flow sensor on the gripper can confirm and measure a purge stream at a receptacle before placing the reticle pod on the receptacle.

Description

200933779 IX. Description of the Invention: [Technical Field] The present invention relates to a method, system and assembly for protecting a substrate, and more particularly to providing cleaning and confirming cleaning of a wafer and Photomask methods, systems and components. [Prior Art] Particles and airborne molecular contaminants (AMC) can cause considerable problems in semiconductor manufacturing sites. Such contaminants can cause defects such as smog recticles. Typically, a reticle transfer case is used during storage and transportation to protect the reticle from such contaminants. However, the accumulation of such contaminants in the reticle transfer box is common. This reduces the overall reticle quality. Because of the accumulation of such contaminants, when a semiconductor tool is used to remove the reticle from the reticle transfer case for use, the smear has an opportunity to enter the reticle transfer case. The smog is also a problem related to wafer processing. The substrate described herein refers to a reticle and a semiconductor wafer. Minimizing the contamination in a reticle transfer box involves a process of cleaning. One of the disadvantages of periodic cleaning is that it is possible to reduce manufacturing efficiency. It is known that nitrogen and wafers can be cleaned with nitrogen. Cleaning with nitrogen removes contaminants from the reticle container, but causes problems due to the need to contain and control nitrogen. Although nitrogen is not considered toxic, the reduction of oxygen in the nitrogen-enriched environment can lead to suffocation. Therefore, the leakage of nitrogen into the human space is unacceptable. Nitrogen enrichment can only be detected with sophisticated sensing equipment. Pure clean air is not cheap. Traditional nitrogen cleaning can still cause haze. 6 200933779 Therefore, there is still a great need to economically and safely protect reticle and wafer from contaminants and to prevent smog during storage and transportation. Solutions involving cleaning require proper identification and cleaning in situ. A substrate storage system, referred to as a stocker, can have many slots for a large number of substrate containers, and when it comes to cleaning, it would be desirable to be able to monitor or confirm the functionality and suitability of the cleaning system. Such monitoring and validation is desirably performed at discrete slots in the substrate container placement location. SUMMARY OF THE INVENTION The present invention provides a method, system, and assembly for protecting substrates (e.g., reticle and wafer) and, in particular, for minimizing smog formation on substrates during storage and use, including A substrate storage cabinet in a continuous cleaning capability and a sensing system for separately confirming the cleaning function in each of the substrate transfer cassette accommodation areas. Cleaning the reticle by temporarily and continuously maintaining additional dry clean air preferably with a reduced humidity level or by temporarily storing the reticle in a container adjacent to a sorbent or drying medium without cleaning. The haze formation can be eliminated, minimized or adequately controlled. In addition, one of the filter media in the container can be placed to be "replenished" during substantially continuous cleaning of the reticle, which can be easily maintained in the reticle container when the container is not currently cleaned. Humidity level. Although the embodiments herein specifically refer to reticle and reticle transfer cartridges, the inventive concepts are also applicable to wafer and wafer containers or transport boxes. The present invention comprises a reticle reservoir comprising a storage housing having a plurality of stored reticle or a plurality of reticle storage receptacles for receiving a reticle transfer box, such as a reticle standard mechanical interface ( SMIF) transfer box. The storage enclosure may include a test area or a plurality of shelves, each of the shelves containing a plurality of reticle reservoirs for the reticle transfer box. The storage enclosure can be a reticle storage cabinet, library or tool for transferring the reticle from a reticle transport container, such as a reticle standard mechanical interface (SMIF) transport cassette, to a tool library for use. The storage enclosure may also be or include a clean room, inspection area, or a combination thereof. In one embodiment, the cleaning system includes a plurality of cleaning lines, each cleaning line being coupled to an outlet of one of the reticle storage receptacles. The outlet distributes air upwardly such that when a reticle transfer box is placed in the receptacle, the connection of the outlet causes cleaning fluid to flow into the reticle transfer case. When a reticle transfer box is not yet positioned, the cleaning fluid can still be discharged upwards in a clean stream to the environment in which the outer casing is stored. An automated mechanical transmission mechanism including a gripper can have an air flu detector on each grip to detect and confirm the flow of cleaning fluid at each of the receptacles. In a preferred embodiment, the grip has a U-shaped portion and an extension, wherein an air flu detector is located on the extension. The extension is positioned such that when a reticle transfer box is moved toward one of the seating positions of the receptacle, the sensor moves through the flow of cleaning fluid and detects and confirms the flow of cleaning fluid.

A preferred embodiment of the present invention can use a diffuser at the entrance of each reticle receptacle or reticle container (e.g., a Q-mask SMIF transfer cartridge) that allows the associated cleaning line to enter each of the transfers The gas distribution of the box is more uniform. The diffuser can be mounted at the inlet or injection port of the receptacle or container or at the outlet of the cleaning line that allows gas to flow into the transfer box. The venting of the reticle transfer box is preferably carried out via a filter that passes into the environment of the storage housing. The mechanical transmission mechanism can have an air flu detector in position to periodically sense and confirm exhaust from the reticle transfer box. The system of the present invention may also comprise a source of cleaning gas coupled to the cleaning system, 8 200933779 comprising a clean dry air (CDA), a particularly good CDA or a source of dry inert gas such as nitrogen. A preferred embodiment of the invention uses a particularly good CDA. In one embodiment, each storage receptacle of the system of the present invention can be used to house a reticle transfer case, such as a container or carrier. The reticle transfer case includes an inlet to connect at least one of the cleaning lines of the cleaning system. An exemplary reticle transfer cartridge of the system of the present invention can be based on a standard mechanical interface (SMIF) © vehicle, for example, as generally described in the U.S. Application No. 60/668,189, the disclosure of which is incorporated herein by reference. The U.S. application was filed on April 4, 2005 and entitled "Environmental Control IN A RETICLE SMIF POD" (now U.S. Patent No. 7,400,383) The contents of the present invention, including U.S. Application Serial No. 60/668,189, the disclosure of which is incorporated herein by reference in its entirety in its entirety in its entirety in its entirety in its entirety in the the the the the the the The reticle transfer case includes a filter member. For example, the filter member can comprise particulate mash or adsorptive media and combinations thereof for protecting the reticle from contaminants during storage and transportation. The gas (4) may be included in each reticle transfer box or other reticle storage system towel to maintain a water concentration less than 1G (1G ring) of water. The storage environment without water can substantially reduce or eliminate the risk of water entering the sanitary ware with the reticle. Moreover, the environment without water in the real f can be reduced or formed in the light. This can be achieved on the cover, especially on its quartz material. Therefore, it can be reduced in the optical system of the tool or on the at least one reticle surface 9 200933779. The smog can usually be formed from ammonium sulphate. This can occur in the presence of sulfuric acid, aqueous ammonia, and water. Thus, by removing water from the reticle environment, the formation of ammonium sulphate on the surface of the reticle can be substantially reduced or eliminated. The system of the present invention can also include a semiconductor tool light. A hood storage chamber. For example, the reticle storage chamber can be associated with conventional semiconductor tools such as lithography tools. In one embodiment, the reticle storage chamber can be coupled to a chamber cleaning line. The invention also provides A method of cleaning a reticle reservoir, which may be continuous. Preferably, the method includes providing a blister storage receptacle of a storage enclosure of the system of the present invention with at least one cleaning line comprising CDA or Preferably, the invention comprises a gas of a particularly good CDA. The invention also includes systems and methods for cleaning a reticle storage cabinet, a wafer container storage cabinet, a library, a tool, a clean room, and an inspection area. The method includes introducing a gas into the reticle transfer case housed by a reticle storage receptacle. A method can also include contacting a reticle disposed in the reticle transfer case with a gas containing a CDA or a particularly good CDA. Additionally, the system of the present invention can include an ionizer associated with the cleaning system. For example, the ionizer can be associated with at least one of a plurality of cleaning lines of the cleaning system. A system for cleaning a reticle reservoir is provided, comprising a storage housing having a plurality of container receiving regions configured to store a receptacle. The storage enclosure can include a plurality of shelves each containing a plurality of reticle storage receptacles. The system also includes a cleaning system associated with the storage enclosure. In one embodiment, the cleaning system includes a plurality of cleaning lines, each of which is connected to the storage tanks of the 200933779. Additionally, the system of the present invention can include an ionizer associated with the cleaning system. For example, the ionizer can be associated with one of the plurality of cleaning glines of the cleaning system. The system of the present invention may also comprise a source of cleaning gas coupled to the cleaning system, 'first and comprising a CDA or a particularly good source of A. It is defined as air with a water concentration of less than 2 (parts per million). A particularly good CDA is defined in this article as having less than! The gas that is ringing (billions of points) is used.

1a and 1b are schematic illustrations of an exemplary reticle transfer case of the system of the present invention. A reticle transfer case 2 can be equipped with a chemical filtration system or a moisture absorbent. The reticle transfer case typically includes a door or base portion 4 that mates with the carrier housing or cover 6 to form a hermetically sealed space 8 to provide a controlled environment. In the seal ring, the three can store and transfer the reticle 9. For example, the reticle 9 may comprise a quartz subtractive, glazing or substrate that is susceptible to damage by the granules and the solitized H species. This reticle transfer box is more closely disclosed in the reference to the article No. 11/396,949 L. Preferably, the crotch portion 4 of Figures 1a and 1b may comprise opposing "door upper surface 1" and a lower door surface U separated by a transverse wall 12. In the ia and lb diagrams, the plurality of reticle support members 14, #g 丨 〜 尤 侧面 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧A central portion 2 that generally surrounds the upper surface of the door extends outwardly and is disposed in a spaced apart relationship. The reticle supports can be used for (4) the upper surface - maintaining the reticle at a predetermined height. The reticle side locating members and the back locating members can be used to manually position the reticle to ensure proper lateral and rearward placement of the reticle on its support. In one embodiment, the filter 22 of the first embodiment can have a variety of configurations, each of which provides a fluid permeable, low pressure drop absorbent composite filter, such as U.S. Patent No. 7,014,693, No. 6,761,753. No. 6,610,128 and 6, 447, 584, the contents of each of which are hereby incorporated by reference. For example, the adsorbent media of the filter can include, but is not limited to, chemisorbent or physically adsorptive media and combinations thereof. Other media used in the filter may include 'for example' high efficiency particulate air (HEPA) or ultra low penetration air (ULPA) media, such media Can be used in combination or with adsorptive media. Preferably, the present hair

A reticle transfer cartridge of the present invention can include a passive purifier or drying unit. A solid-state passive purifier or drying unit reduces the extent to which contaminants may come into contact with the reticle.

The moisture concentration in the hermetic sealed space 8 of the reticle transfer case 2 in Fig. 1 is maintained at a concentration level close to several ppb. The system/force of the preferred embodiment of the present invention maintains or controls the humidity level in the reticle transfer case to a concentration less than about H) PPb. In the embodiment, the reticle transfer case of FIG. 1 can be used with Systems and Associations of the Invention to Achieve Such Humidity Levels The system of the present invention - the preferred embodiment provides periodic or continuous cleaning of a self-contained CDA or, more preferably, a particularly good cda. This month's expected/monthly cleansing body can be an inert gas such as dry chlorine or milk. The H-mura of this month is associated with the reticle transfer box 2 by the injection or population aperture 24, or the aperture 24 can be connected to at least the "cleaning line." The population hole μ <<>> has a diffusing element 25 which allows the cleaning gas to flow more evenly within each of the transport boxes. The material is made of a porous material having a pore diameter of 1-3 μm. A metal such as nickel or a single steel can allow particles having a diameter of less than 3 nanometers (nm) to pass through by sintering the gold color. 12 200933779 Larger particles cannot pass. The diffuser may also be located at each of the cleaning line outlets of the cleaning cartridge or for transferring any inspection tool to the reticle housing or a tool mask library for transferring the reticle from the shipping container to the library Cleaning of tools stored or used. /, s, etc. for the filter 22 may also comprise an extraction section as explained in more detail below, with the apertures 5.0 and 5. 构成 forming the inlet aperture. . In this embodiment, in the embodiment, the entrances 5.0 and the pure holes 5 are circumferentially parallel to the lateral wall 12 of the door portion 4 in the first and second lb diagrams: face to face: face to face: The extension and the extraction opening may also be used for the same as the inlet joint 26 and the extractor joint. The present invention also covers other connecting members for the bore. For example, ^, -, etc., for example, s, the inlet joint can be detachably coupled to the cleaning line of the invention system. Moreover, the extractor joint can also be detachably lightened to a cleaning gas removal line, which can be associated with - cleaning gas evacuation ^. The person σ and the extractor connector can also be used to allow a one-way airflow. When the system of the present invention* is cleaning the reticle transfer material, the check will prevent contaminants from entering the wire seal 8 . In addition, a diaphragm valve having a slit, for example, may be combined with the check valve or may be associated with the diaphragm as described in the U.S. Patent No. 5,482,101, the disclosure of which is incorporated herein by reference. The check valve is used in combination with the population and extractor: head. The diaphragm valve and the check valve may also limit the conditions in which the filter 22 and its medium are exposed to the outside of the reticle transfer box 2. The present invention also contemplates that the system of the present invention injects a cleaning gas of a package of CDA, a particularly good CDA, nitrogen or other inert gas into the hermetically sealed space 8 such that at least a portion of the cleaning gas is passed through the filtration. 13 200933779 The device exits and discharges the mask value from the consumption to the entrance of the gas. In one embodiment, the extractor connector can be replaced by an inlet connector flow cap value. Therefore, the cleaning gas can pressurize the space of the hermetic seal via the delivery box after the cleaning gas is cleaned. Generally, the space of the hermetic seal is discharged from the first figure. The cleaning of the tight-sealing space 8 can be removed by removing trace contaminants from the gas stream. In one embodiment, cleaning by the system of the present invention removes and removes particulates and other contaminants, such as particulates and contaminants associated with the ❹/胄 absorbing media. The CDA or the excellent CDA can be used to maintain and control the humidity level in the reticle transfer box 2. For example, the BB* < month system can remove moisture from the filter 22. In addition, the cleaning line of the system of the present invention can be supplied with the wire (4), and the cleaning contaminant = maintains a water concentration of less than about 1 〇 in the reticle transfer case. For example, the , can be connected to the reticle transfer box - or a plurality of storage receptacles. The cleaning line can also be part of the system of the present invention. In one embodiment, the cleaning line can also be associated with a conventional ionizer. For example, a cleaning gas from a gas source containing a CDA or a particularly good CDA enters the cleaning line and passes through the (iv)-ionizer m gas and then is discharged from the cleaning reading and can be shaped like a mask. n in the storage seat. Alternatively, the separation benefit can be associated with a cleaning system of the system of the present invention. The purge gas flow rate through the isolators can be about 15 cubic feet per minute (cfm), but the invention also encompasses other suitable flow rates that can be adjusted based on, for example, the level of depreciation in the reticle transfer box. The manifold pressure of the ionizer of one of the systems of the present invention can range from about 0 to 70 pounds per square inch 14 200933779 ❹ ginseng (PSI). In one embodiment, the ionizer may comprise an ultra-clean TEFLON (Ε· 1. du Pont de Nemours and Company, 1007 Market Street, Wilmington, Delaware 19898) tube associated with one or more cleaning lines as a continuous column Device. The diameter of the exemplary tube can be from about 6 to 10 millimeters (mm). One of the systems of the present invention can also be associated with a plurality of cleaning lines. Preferably, an ionizer can employ steady state DC electron emission. The present invention also contemplates the use of an in-line ionizer sold by Ion Systems, Inc. of Berkeley, Calif., in one embodiment. 'One of the systems of the present invention can include a carrier. And a transfer case portion that cooperates to form a controlled environment. The transport container: can include a first surface configured to be located within the controlled environment. ^ 〇Ρ 〇Ρ , , _ _ _ 表面 表面 _ _ 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面The reticle detailer - 疋i may also include a central aperture surrounded by the first and second surfaces and defining a path between the first and second surfaces. Preferably, the reticle transfer case may include a plurality of reticle support members and guide rails mounted on the private machine path, the first surface, to support a RM cover thereon. For example, the reticle support and the guide rail may define a reticle receiving area, and the occlusion cover area has a surface that is substantially coextensive with one of the patterned surfaces of the reticle. . Further, the reticle transfer case may include an open end and a porous bottom end. Box. A transverse wall can connect the open end to the bottom end of the hole for its longitudinal flow passage. The filter frame can be tightly placed in a central hole and with _

The cover transfer box is hermetically sprayed. In one embodiment, the open end is positionable near the first surface. The porous bottom end may also be recessed from the first surface. Preferably, the reticle transfer box contains a filter' that has a filter shape and a range of filters. The filter may be layered and disposed in sealing engagement with the open end; in the passage of 2009 20091, so that substantially all of the gas entering or exiting the filter passes through the filter region. Filters for, but not limited to, reticle transfer boxes, storage cabinets, libraries, tools, clean rooms or inspection areas of the system of the present invention may comprise an ion exchange resin Q, for example, which may be included in the system of the present invention. A filter of at least one ion exchange resin to protect the reticle during storage and transportation. Alternatively, the filter used in a system of the invention may not comprise an ion exchange resin. The plasma exchange resin can be characterized by a porosity of greater than about 300 ml/g. Preferably, the filter ion exchange resin can be a cationic exchange resin having a chemical acid point concentration of about 1.8 meq/g. For example, a filter or one of its various layers of exchange resin may comprise a surface area of about 45 square meters per gram. An exemplary resin for the filter is commercially available under the tradename AMBERLYST (Rohm and Hass Company, 100 Independence Mall West, Philadelphia, Pennsylvania 19106). Preferably, the filter of the reticle transfer cassette can be made to be depleted after a considerable period of use. For example, the invention contemplates the use of various filter layers that need to be maintained or replaced together. In one embodiment, the filter layer comprising a chemisorbable medium can be made thinner than the layer having a physically adsorbable medium because the physically adsorbable medium tends to be depleted prior to the chemisorbent medium. Filters that use the various filter layers that are depleted after a comparable period of time can reduce operating costs by causing any potential failure time to phase out. Figure 2 is a schematic illustration of an exemplary filter of a reticle transfer cartridge of the system of the present invention and its various layers. As shown, the first filter layer 28 and the second filter layer 3 can be placed in communication with each other. For example, the first filter layer can be disposed on the surface of the second filter layer 3 . The first and second filter layers may also comprise a cover sheet. As shown, the second filter layer 200933779 30 features a cover sheet 32. The cover sheet 32 can be a polyester nonwoven material. Preferably, the first and second transition layers comprise a chemisorbent or physically adsorbable material for removing contaminants such as volatile cerium oxide compounds. In one embodiment, a reticle transfer case, storage cabinet, library, tool, clean room or inspection area of the system of the present invention comprises a first transition layer having a physically adsorbable medium. An exemplary physically adsorbent medium can comprise activated carbon. The activated carbon of a physically adsorbent medium can be untreated or treated and granulated. A system of the invention is also characterized by having a second filter layer comprising a chemisorbable medium. For example, a chemisorbent medium of a second filter layer can comprise a cation exchange resin. Preferably, the cation exchange resin comprises a copolymer, such as a divinyl styrene copolymer having at least one acidic functional group. An exemplary chemisorbent medium for use in a filter layer of a filtration system is a cationic ion exchange resin, such as a chemically acidic copolymer. In one embodiment, the physically adsorbent medium for a filter layer can comprise activated carbon which can be untreated or treated and granulated. The physically adsorbent medium can form a block that is held together by the binder material. Exemplary physically adsorbent media can be chemically acidated and obtained from organic sources such as coal. As shown, the filter or filter layer 34 of Figure 3 includes a cover sheet 36. In one embodiment, the cover sheet comprises a polyester nonwoven material. Preferably, the filter comprises a chemisorbent or physically adsorbable medium. In addition, a filter 38 includes a first cover sheet 40 and a second cover sheet 42. The filter 38 also includes a body portion 44 disposed on the first cover sheet. An exemplary cover sheet for a filter of a reticle transfer cartridge can comprise a filterable or non-filterable nonwoven material, such as polyester, polyamide, polypropylene, or any combination thereof. For example, 17 200933779 A cover sheet comprising a filterable nonwoven material removes the particles contained in the gas stream passing therethrough. A cover sheet can also be used to hold the honeycomb or pleated elements. Alternatively, a cover sheet can hold a given medium such as, for example, activated carbon or beads comprising a sulfonated divinyl styrene copolymer. Preferably, the cover sheet of a filter may comprise a chemically inert material such as, for example, polyester or polypropylene. For example, a filter of a reticle transfer case, storage cabinet, library, tool, clean room or inspection area of a system of the present invention can be held by any suitable container or frame. These containers or frames are also suitable for making filter layer replacement easier. A filter or filter layer can comprise a filter component having a pleated element. The pleated element increases the surface area of the filter element to help remove particulates or contaminants contained in the airflow path therethrough. Figure 3 is a schematic illustration of an exemplary filter of a reticle transfer cartridge of the system of the present invention. In an embodiment, the pass layer 46 comprises a high surface area transition component. Additionally, the filter layer can comprise a chemisorbent or physically adsorbent medium and a binder type material. Preferably, the transition layer comprising a high surface area transition component comprises a medium disposed on, for example, a composite material 48. The binder type material can also be introduced into the media to aid in bonding. For example, one of the first or second filter layers of a reticle transfer cartridge can utilize a nonwoven composite material comprising at least one cation exchange resin that can be bonded to airborne contaminants. Exemplary first or second filter layers comprising a chemisorbable medium and methods of making such filter layers are generally described in U.S. Patent Nos. 6,447,584, 6,740,147, 6,610,128, and 6,761,753. The contents of these patents are hereby incorporated by reference herein. A filter layer can also be made by applying a chemisorbent medium dry to a non-woven composite or earner material, which is then heated and calendered at 18 200933779. For example, the nonwoven composite can be a polyester. In one embodiment, the chemosorbable medium is a porous diethylstilbene styrene copolymer comprising an acidic functional group. Exemplary acidic functional groups include sulfonic acid and carboxylic acid functional groups. The chemisorbent medium can be characterized by a pore size of between about 50 and 400 angstroms (A). Additionally, the surface area of the media can be greater than about 20 square meters per gram. For example, the acidic functional groups of the styrene-butadiene copolymer are also characterized by an acidity level above about 1 meq/g. In one embodiment, a first or second transition layer comprises chemisorbent media particles distributed throughout the material (e.g., nonwoven material, fibrous matrix material, or polyester material, etc.). Preferably, a filter layer of chemosorbable media particles may comprise a cation exchange resin. For example, the media particles can be chemically acidic particles. Such media particles can be characterized as having an exemplary particle diameter of from about 0.3 mm to about 1.2 mm. Further, a chemisorbable media particle can have, for example, a porosity and an average pore diameter of about 0.3 ml/g and 250 A, respectively. A chemisorbent medium of one of the first or second filter layers of a reticle transfer cartridge filter is particularly useful for removing contaminants. Further, the chemisorbable medium is capable of removing particulates in a gas stream, for example, when the particle size of the particles is greater than the pore size of the medium. In one embodiment, the first or second filter layer of a reticle transfer cartridge can comprise a physically adsorbable medium. An exemplary physical adsorptive media is activated carbon. The activated carbon is generally described in U.S. Patent Nos. 5,607,647 and 5,582,865, the disclosures of each of each of Preferably, the first or second filter layer of the reticle transfer case of the system of the present invention is used for the first or second filter layer. Alternatively, the physically adsorptive medium may comprise, for example, a synthetic carbon material, as generally described in U.S. Patent No. 5,834,114, the disclosure of which is incorporated herein by reference. Real f » Shouting materials can also be used in combination with activated carbon for a physically adsorbable medium. In one embodiment, the one or-physical-adhesive medium transition or filter layer comprises untreated granulated activated carbon capable of removing contaminants such as volatile cerium oxide compounds contained in the gas stream. In one embodiment, the system of the present invention includes a cleaning system associated with a storage enclosure. The cleaning system may comprise a plurality of storage lines, each of the storage lines being connected to (four) ◎ ^ at least one storage receptacle of the transfer box. Preferably, the cleaning system can provide a CD containing a CDa or a particularly good CM via at least a cleaning line to or from a plurality of storage receptacles. The invention also covers that the cleaning system can provide the storage receptacles For example, an inert gas such as dry nitrogen or argon is used. For example, the moon/絜 system used to make the best is from Aeronex, §an Diego, California.

Manufactured by Incorporated. An exemplary CDA or a particularly good source of CDA is also generally described in U.S. Publication Nos. 2005/0017198 and 2006/0118138, the disclosures of each of which are hereby incorporated by reference. Figure 4 is a schematic illustration of an exemplary cleaning system of the system of the present invention. An inlet gas is introduced to the cleaning system 50 as shown. In one embodiment, the inlet gas can be a CDA. For example, an inlet gas containing CDA meets the requirements of the International Standards Organization (ISO) 8573-1. Generally, such specifications may require that the inlet gas contain particle sizes of less than about 0.1 μm, less than 0.1 mgiif3, -20 ° C, and 〇.1 mgm·3, respectively, 20 200933779 particle concentration, dew point, and oil concentration. The cleaning system can also have a CDA inlet pressure and temperature from about 〇 to 10 bar and from about 15 to 33 °C. For a CDA inlet gas, exemplary pollutant concentrations are listed in Table 1. Table 1 Contaminant concentrations Volatile inorganic compounds, such as so2, H2S, H2S04, HF, HC1 and H3P04 about 5 ppbv volatile bases, such as NH3, NMP and small molecular amines about 100 ppbv condensable organic matter about 100 ppbv water about 2000 ppbv The high melting point compound 'e.g., a hydrocarbon containing s, P or Si about 1 ppbv. The cleaning system 50 of Fig. 4 also includes an exhaust gas containing a cleaning gas for - or a plurality of storage receptacles. In one embodiment, the π/combustion gas from the cleaning system may comprise a source of cleaning gas. For example, t, the source of cleaning gas may comprise CDA or a particularly good CDA1 for a source of cleaning gas comprising a particularly good CDA, the exemplary contaminant concentrations are included in Table 2. Table 2 Contaminant Concentrations Volatile inorganic compounds such as so2, H2S, H2S〇4, HF, HC1 and H3P〇4 about < 0.001 ppbv volatile bases such as NH3, NMP and small molecular amines < 1 ppbv 21 200933779 Concentrated organic matter about < 0.1 ppbv water about < 1 ppbv high melting point compound, such as hydrocarbon containing S, P or Si about < 0_001 ppbv Preferably, the pressure drop of the cleaning system can be less than about 1 bar. The cleaning gas can be discharged from the cleaning system at a pressure of from about 6 to 7 bar and a temperature of from about 15 to 34 °C. The flow rate of the cleaning gas from the cleaning system can also be about 300 liters per minute.

The cleaning system 50 of Figure 4 can also include an optional discharge port. Figure 5a is a schematic illustration of an exemplary cleaning system of the present invention. As shown, an inlet gas is introduced into the cleaning system 52. Preferably, the inlet gas can be CDA. For example, an inlet gas can contain CDA. The cleaning system can also include an optional drain and instrument air, power, or input. Additionally, the cleaning system can include an exhaust gas containing cleaning gas for one or more storage receptacles. The cleaning system can include a source of cleaning gas associated with a storage enclosure 54. In one embodiment, a source of cleaning gas exits the cleaning system and can be introduced into the storage enclosure 54 via one or more cleaning lines. An ionizer 55 can be added to a cleaning outlet line or to the cleaning system. The source of cleaning gas can also contain a particularly good CDA. The inlet and outlet gases comprising CDA and particularly preferred CDA can be as described herein, for example, in Tables 1 and 2, respectively. Referring to Figure 5b, one or two cleaning systems 50, 52 for providing a CDA or a particularly good CDA are coupled to a storage enclosure, such as a reticle transfer box storage cabinet 54.1. The storage cabinet has receptacles 58 in the form of shelves that are perpendicular to the cleaning lines to provide a cleaning CDA or a particularly good 22 200933779 CDA to a reticle transfer box housed in the receptacles. The transport boxes respectively discharge the clean or particularly good cda into the enclosed interior environment 54 2 of the reticle transfer box storage cabinet 54.1, as indicated by arrow 5 (7). A moisture absorbent or desiccant 54.8 is located in the light. The transfer box acts as a "transitioner (4) and is located in the clean flow stream so that it can be effectively replenished and dehumidified from the CDA or the superior CDA cleaning stream. Additionally, as indicated by the additional cleaning line 54.9' The CDA or the special (10) cleaning material reticle can also be used. The storage casing in the form of a reticle transfer box storage cabinet can empt the closed inner ring

The environment ' is indicated by the discharge arrow 56.2. Typically, the discharge port is preferably located in the lower portion of the outer casing, and the auxiliary inlet 56 3 is located in the upper region of the outer casing. In an embodiment, one of the cleaning systems of the system of the present invention comprises a plurality of cleaning lines. For example, the cleaning system - the cleaning line can be connected to at least the storage receptacle. Preferably, a storage enclosure - the shelf can comprise a plurality of storage receptacles. The & diagram is a schematic illustration of an exemplary shelf of the system of the present invention comprising a plurality of storage receptacles. As shown, the shelf 56 includes a plurality of storage receptacles 58. Although the shelf in the figure is included

Four storage receptacles for receiving the reticle transfer case, but the present invention contemplates any other suitable number of receptacles. Each of the storage receptacles can be (4) accommodated - a reticle transfer box. The reticle transfer box contains at least a population connected to - or a plurality of cleaning lines, such as an inlet aperture. The shelf 56 in Figure 6a can be associated with a connecting tube 6〇 for at least one cleaning line. These connecting pipes can be (4) _ in the middle? The deaf person contains but is secretive or special CDA di body source. In an embodiment, the truss may include a channel a, 1 may be provided to the storage receptacle 58 - a source of cleaning gas. Preferably, the channels associated with the Na may contain *_out σ 64, respectively. An exemplary outlet for the shelf can be associated with one or more 23 200933779 storage receptacles. As shown, the outlets of the shelf can be used to connect or mate to an inlet aperture, an exit aperture, or a combination thereof. For example, the storage receptacles of the shelf house a reticle transfer box that includes at least one inlet aperture for introducing a source of clean air. The inlet opening of the transfer box may be associated with at least one outlet of the shelf when the reticle transfer case is received in the storage receptacle. Further disclosure of such and related aspects of the present invention is disclosed in U.S. Provisional Application Serial No. 60/892,196, the entire disclosure of which is incorporated herein by reference in its entirety in The cleaning system) is owned by the owner of the present invention. This application is incorporated herein by reference. This disclosure illustrates one of the clean connection options between the reticle transfer case and the storage receptacle. An exemplary connection system between the receptacle portion and the reticle transfer box can be an elastic sleeve that serves as a clean inlet on the door of the reticle transfer box and a metal nozzle on the storage receptacle shelf ( Clean the exit) to match. In one embodiment, an inlet aperture of a reticle transfer box can be coupled to one or more cleaning lines. For example, an inlet port can be connected or associated with a cleaning line for one or more of the connecting tubes 60, the plurality of channels 62 via the shelves 56 of FIGS. 6a, 6b, 6c, and 6d. And a plurality of outlets 64 introduce a source of cleaning gas. As noted above, a cleaning line can be coupled to a cleaning system associated with a storage enclosure containing one of the shelves. Preferably, the association of a cleaning line with an inlet opening of a reticle transfer box received by a storage receptacle may be achieved by an automated component such as, but not limited to, a conventional stylized computer system and Devices, such programmed computer systems and devices are executable to indicate manipulation of the reticle transfer case and shelf as part of a storage cabinet control system. The general practitioner of the art can connect the entrance of the photomask transfer box to the other of the photomask storage receptacle.

❹ 200933779 Select an exemplary stylized computer system and device to clean the pipeline. Referring to Figures 6b, 6c and 6d, let's take a look at the example. A U-shaped frame defines a space 64), and has a clean mouth 64. An automated mechanical device having a grip 70.2 grasps the reticle transfer box at the rim edge 7〇.4. An air flow sensor 71.2 is particularly early with the gripper. This confirmation can be performed after the reticle transfer case 66 is joined and (10) the clean air transfer case is confirmed. Before the receptacle 71.7 or the placement of the 7a, 7b, and 7c diagrams is an illustration of an exemplary reticle transfer case housed by a light preserving receptacle, the reticle storage The seat is associated with a shelf of the type shown in Figure 6a or 6b. As shown, a reticle transfer case 66 can be disposed on a shelf 68 of a storage housing 70. In the embodiment of the invention, the storage enclosure comprises a plurality of shelves. For example, each of the shelves can be packaged with 3 main-small-storage storage receptacles. The reticle transfer in the first, seventh, and seventh embodiments is stored in one of the shelves. Preferably, the reticle transport boxes are white χ — 3 - inlet apertures, the inlet apertures being connectable to the clearing wires at least. An exemplary cleaning (4) is placed in the space 72 of the storage enclosure and provides a source of cleaning gas to the reticle transfer box. These cleaning lines can also be connected or associated with the Na and its passage or outlet. The reticle transfer case 66 of Figures 7a, 7b, 7c can also be operated by an automated device 74 having grips 7 在 2 under the control of the storage cabinet control system. The automated devices and systems of the prior art include automated devices for reticle storage and transportation as outlined in U.S. Patent Nos. 6,991,416, 6,364, 595, 7,039, 499, and U.S. Patent Publication No. 2006/0078407, each of which is incorporated herein by reference. The contents of the case and the public disclosure 25 200933779 This is incorporated herein by reference. The plurality of methods that can be used for the reticle storage and transport wheel can respectively include - or 72 can also be accessed via a conventional hole or door:::: and: 'Storage housing, door, _ auxiliary hand storage Light extraction = The storage enclosure can also contain a "circulation system" that is cleanable with flushable (four), excellent CDA or other inert gases.

The box 'to prevent contaminants from accumulating thereon and to minimize the moisture absorbed by the reticle transfer boxes. The circulation system is capable of positive pressure at the ° when the door is opened, thereby preventing contaminants from entering through the open door: the shell is present - in the embodiment, the reticle storage receptacle can be used to accommodate one The entrance cover transfer box 'this person π is connected or associated with at least the cleaning line. For example, the reticle transfer case 66 of Figures 7a and 7b is received by a throwing frame (10) and a cleaning line associated therewith can be provided to the transfer case as shown, - cleaning A gas source is associated with the throwing frame via a cleaning line 76 and is connectable to a reticle transfer box disposed thereon. Preferably, the shelf contains an outlet for a source of cleaning gas provided via the cleaning line. An exemplary outlet of the thrower can be used to connect or couple to an inlet of a reticle transfer box. The

The inlet of the reticle transfer box may be an inlet aperture connected or associated with the cleaning line via one or more of the shelves, passages and outlets. Additionally, the system of the present invention includes a storage enclosure having a plurality of reticle storage receptacles. The storage enclosure of the system of the present invention may be any conventional storage, including such automated storage enclosures as generally described in U.S. Patent Nos. 6,562,094 and 6,848,876, and U.S. Pat. Case 26 200933779 and A opened within the 4th paragraph of this ^ ^ 式 并 本文 本文 本文 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : Store the contaminants in the outer cover = the most, = save the outer casing so that it may contact the light fruit transfer box or its two = = =, can be associated with the unit, take the single transfer box. The Zen deposit list =: in - The movable compartment for accessing and staging the optical storage receptacles has a plurality of housings for accommodating the reticle transfer box. The detachability during the reticle transfer and the transport operation is optional. It can also be, and does not have, a motor or a moving part. The storage and production of the material is the same as the home of the object. The components can also be located outside the _ storage enclosure and other live-action maps. The frame can be rotated around an axis to provide a storage coffin 2 (four), _ storage enclosure allows The cleaning gas is in its entire interior. The fines (4) such as CDA or special CDA clean gas == ring, can be exposed to the light green box and the hood of the light cover. No, storage case 78 pack

The number of shelves 8 is associated with a plurality of reticle storage receptacles. In an embodiment, a cleaning system can be associated with the storage enclosure. An exemplary cleaning system can include a plurality of lines. The cleaning line 82 in the first and third milk maps provides a source of cleaning gas along the two side banks Z 27 200933779 of the storage enclosure. The source of cleaning gas may comprise a (3) particularly good source of CDA for removing contaminants in the reticle transfer box or reticle. / Block = I: The 2 lines 82 are respectively connected to the reticle storage receptacles of the scaffolding 8 ,, and the storage receptacles are for accommodating their transport boxes 84. In one embodiment, the storage enclosure 78 of the storage, cover, and hood may include a plurality of shelves that include a plurality of storage receptacles. The conventional device and device of the reticle transfer case and the reticle therein are shown in Fig. 8A, and include a == kinetic mechanical transmission mechanism 85 for accommodating the receptacle 8 of the reticle transfer case. Preferably, the reticle storage receptacle can be used to accommodate a reticle transfer box having a human π. The population is connected or associated with at least the cleaning line... the cleaning gas source can be via the -cleaning line and the shelf Connected or associated. Alternatively, the source of cleaning gas can be coupled to a reticle transfer box disposed on the shelf. - An exemplary throwing frame contains an outlet for the source of cleaning gas provided by the cleaning line.参见 See Figures 9, 1G, 11 and 12' for illustrations - the gripper 9〇 is coupled to the reticle transfer case to place and remove the different views of the reticle transfer case from the receptacle. For illustrative purposes, the gripper is shown isolated from the automated mechanical transmission mechanism. In such a configuration, the "difficult jaws" are secured to the recess defined by the prongs by simply inserting the forks 92, 93 under the top flange 96 of the reticle transfer cartridge. Within 98. The gripper is raised to engage the bottom surface of the flange so that the gripper subsequently supports the reticle transfer case. Then, the gripper is moved to convey the reticle transfer case. Specifically, referring to Figures 12 and 13, the gripper has an air flu detector 102, and the air flu detector 102 can be a hot wire anemometer (hot wire) embedded in the hand 1 〇4 of the gripper. Anemometer ). The air flu detector can be used to sense and measure 28 200933779 to measure non-air cleaning gases such as nitrogen and CDA. Referring to Figure 14, a block diagram illustrates an exemplary arrangement of one of the components of sensing system 110. The position of the gripper above the receptacle, as shown in Figure 10, positions the air flu detector over the clean stream exiting the outlet 64 and detects and measures the clean stream. Fig. 15 illustrates an example of an automated mechanical transfer mechanism that moves between rows of receptacles in a storage cabinet to place a reticle transfer box. The sensing system senses and measures the clean airflow as it moves past the clean stream from the outlet on a receptacle. A data point of approximately 1 liter/minute or 5 liters/minute may indicate a problem with the cleaning system. For example, a conventional device can be disposed within the housing for removing the reticle from each of the housings and repositioning the reticle into each of the housings. The device can be a standard mechanical device that includes a drive system. The controller for controlling the drive system of the mechanism can calculate a curve of the motion prior to performing a commanded motion. The controller can also recalculate a curve multiple times until the controller determines the motion to be performed. The mechanism can also include a gripper arm for grasping the reticle transfer case in the storage case. The gripper arm can be driven by a gripper arm drive to move away from and toward the storage housing. The mechanism can include a vertical post that is movably mounted to the vertical post. The vertical movement of the gripper arm relative to the vertical post can be provided by a vertical drive. The mechanism can also include a bracket that rotatably mounts the vertical post thereon. The robotic arm is controlled by a storage cabinet control system. Although the present invention has been described in connection with the preferred embodiments thereof, those of ordinary skill in the art can make equivalent changes, substitutions, and other types of changes to the contents described herein. Such variations as disclosed in all other embodiments may also be included or incorporated in each of the above embodiments. Therefore, the protection granted by the patent certificate 29 200933779 will be limited only by the definition contained in the scope of the accompanying patent application and any equivalent scope thereof. BRIEF DESCRIPTION OF THE DRAWINGS The first drawing is an exploded view of an exemplary reticle transfer case of the system of the present invention; the lb is a perspective view of the reticle transfer case of the first drawing; A schematic diagram of an exemplary filter of a reticle transfer case; FIG. 3 is an illustration of an exemplary filter of a reticle transfer case of the system of the present invention; FIG. 4 is a system of the present invention A schematic diagram of an exemplary cleaning system; Figure 5a is a schematic diagram of an exemplary cleaning system of the system of the present invention; Figure 5b is a schematic diagram of an exemplary cleaning system of the system of the present invention; Figure 6a is a diagram of A top view of an exemplary shelf of the inventive storage receptacle; Figure 6b is a top view of one of the U-shaped alternative storage receptacles, wherein the cleaning exit aperture is located on the adjacent side of the opening; Figure 6c is a light a side view of the cover box and one of the air flow sensors © mechanical grip; Figure 6d is a top view of the grip of the 6c figure, the reticle transfer case and the receptacle; Figure 7a is an example Top view of the reticle transfer box, An exemplary reticle transfer case is housed in a reticle storage receptacle associated with a shelf of the type illustrated in Figure 6a; Figure 7b is a side view of three stacked shelves; Figure 8a A schematic view of an exemplary storage enclosure of the system of the present invention having a mechanical transfer mechanism having a grip; 30 200933779 Figure 8b is an upwardly facing riser of the receptacle and a light placed on the shelf Cover transfer box; Fig. 9 is a plan view of the body; the first picture is a top view of the handle of the shawl-transfer transfer box (four), the reticle transfer box is located at the position of hiding the money (4) Position, this position can be tied

In the process of placing the reticle transfer box on the receptacle or in the process of removing the receptacle, and the position is suitable. The cleaning flow from the outlet on the receptacle is shown in Fig. 1 is a top view of the gripper and the reticle transfer case shown in Fig. 1G, wherein the reticle transfer case is located on the receptacle; Fig. 12 is - A perspective view of a gripper having a cleaned influenza detector; Figure 13 is a detailed exploded view of an extension of a gripper having an air flu detector; and Fig. 14 is a block diagram of connections of components in the sensing system; And ❹ 'The receptacles have the gripper of the reticle transfer box on the clean line receptacle, the 15th material 1 table, the solution is in the storage cabinet towel transfer reticle transfer box to clean the influenza test system Fine implementation of monitoring. 4. Door or base part 5.0: Hole 6: Carrier case or cover 9: Photomask 11 • Door lower surface 14: Photomask support [Main component symbol description] 2: Photomask transfer case 5: Carrier case or cover 5-1: Hole 8: Space for hermetic sealing 10: Door upper surface 12: Transverse wall 31 200933779 16: Mask side positioning member 18: Back positioning member 20: Center portion 22: Filter 24: Injection or inlet Hole 25: Diffusion element 26: Inlet joint 27: Extractor joint 28: First filter layer 30: Second filter layer 32: Cover sheet 34: Filter, or damper layer 36: Cover sheet 38: Filter 40: A cover sheet 42: second cover sheet 44: body portion 46: filter, layer 48: composite material 50: cleaning system 52: cleaning system 54: storage housing 54.1: reticle transfer box storage cabinet 54.2: closed internal environment 4.7: Arrow 54.8: Filter 54.9: Cleaning line 55: Ionizer 56.2: Discharge arrow 56.3: Auxiliary inlet 55: Ionizer 56: Shelf 58: Storage receptacle 60: Connection tube 62: Channel 64: Out σ 64.2: Space 66 · Photomask transfer box 68: Shelf 70: Storage housing 70.2 : Grip 70.4 : Flange 71.2 : Air flow sensor 71.7 : Housing 72 : Space for storage housing 74 : Automation

32 200933779 76 : Cleaning line 78 : 80 : Shelf 82 : 84 : Photomask transfer box 87 : 90 : Grip 92 : 93 : Fork 96 : 98 : Groove 102 104 : Hand grip 110 Storage housing cleaning line Rack fork top flange: air flu detector: sensing system

❿ 33

Claims (1)

200933779 X. Patent application scope: 1. A substrate carrier storage cabinet having an open interior separated from the outside of the storage cabinet, the storage cabinet comprising: a plurality of accommodating areas for accommodating a plurality of substrate carriers A cleaning system consisting of a plurality of discrete cleaning inlets located within the interior of the storage cabinet, a cleaning gas source connected to the cleaning inlets, the cleaning inlets providing concentrated cleaning gas at specific locations within the storage cabinet And a mechanical arm mechanically moving in the storage cabinet, the sensor is mounted with a sensor, and the sensor can communicate with a storage cabinet control system, the arm and the sensor can be moved to The sensor is used to sense the cleaning gas in the vicinity of each of the plurality of cleaning gas inlets. 2. The substrate carrier storage cabinet of claim 1, wherein each of the accommodating regions for a substrate carrier has one of the discrete cleaning inlets associated with the sensor and the sensor The storage cabinet control system is configured to detect the movement of the cleaning gas in each of the accommodating areas. 3. The substrate carrier storage cabinet of claim 2, further comprising a plurality of substrate carriers, wherein the substrate carriers are used as a plurality of transfer boxes, each of the transfer boxes having a casing, a door, and a transfer box for cleaning An inlet and a transfer box cleaning outlet, the housing and the door forming an outer casing, and wherein the sensor is configured to detect that the cleaning gas flow is present near the receiving area of each of the transport boxes to confirm the cleaning The system works. 4. The substrate carrier storage cabinet of claim 1, wherein the robot arm further comprises a gripper for attaching to the substrate carrier for placing the substrate carrier 34 200933779 in the equal volume The substrate carriers are captured in the regions and in the accommodating regions. 5. The substrate carrier storage cabinet of claim 4, wherein the grip is for gripping an upper mechanical flange of one of the transfer boxes, and the sensor is placed on one of the grip boxes Sensing the presence of a clean gas stream prior to accommodating the area. 6. The substrate carrier storage cabinet of claim 5, wherein each of the separate cleaning inlets is attached to each of the accommodating areas. 7. The substrate carrier storage cabinet of claim 1, further comprising a plurality of substrate carriers, wherein the substrate carriers are used as wafer containers. 8. The substrate carrier storage cabinet of claim 1, further comprising a plurality of substrate carriers, wherein the substrate carriers are used as a reticle transfer case. 9. A reticle transfer box storage cabinet having an open interior isolated from an exterior of one of the storage cabinets, each such reticle transfer case comprising a downward facing door, a container portion, and in the door One of the transport box cleaning inlets for injecting cleaning gas into the reticle transfer box, the storage cabinet comprising: a plurality of shelves defining a plurality of reticle transfer box receptacles, each of which is adapted _ a reticle transfer box; a cleaning system comprising a plurality of upwardly facing cleaning connectors connected to a source of cleaning gas, each reticle transfer case receptacle having one of the plurality of cleaning connectors, each of the cleaning connections The device is configured to be connected to one of the transfer box cleaning inlets on the door of the reticle transfer box placed on the receptacle; a mechanical lifting arm for placing and capturing the reticle transfer boxes, The mechanical lift arm includes a clean gas flu detector attached to the mechanical lift arm. The reticle transfer case storage case of claim 9, further comprising a plurality of reticle transfer cases each having a light leather. 11. The reticle transfer case storage cabinet of claim 9, further comprising a storage cabinet control system </ RTI> for controlling the mechanical lift arm and receiving signals from the clean gas flu detector. 12. A method for monitoring a flow of a cleaning gas in a substrate storage cabinet, the method comprising: mechanically placing a plurality of substrate containers on the substrate using a robotic arm | 复 a plurality of transfer cassettes in the storage grid And receiving the substrate container from the transfer cassette accommodating receptacles in the substrate storage cabinet; and sensing the cleaning in the vicinity of the storage receptacles by means of a sensor attached to the mechanical arm Gas flow. 13. The method of claim 12, further comprising the step of confirming the operability of a cleaning connector at the receptacle prior to placing a transport cassette on a magazine. 14. The method of claim 13 further comprising the step of: sensing a flow of the cleaning gas in the vicinity of the particular receptacle in the storage cabinet prior to placing a transport cassette on a particular receptacle, The transfer case is held by the robot arm to place the transfer case on the specific receptacle. 15. A reticle transfer box storage cabinet comprising: a plurality of inlet holes; 〉 a monthly cleaning system consisting of a plurality of discrete moon-cleaning inlets located in the interior of the storage hub and connected to the inlet holes, a cleaning gas The source is connected to the cleaning inlets, the cleaning inlets are located in a specific portion of the storage cabinet, and the cleaning gas is concentrated; and a mechanical arm is mechanically moved in the storage cabinet, and the arm is mounted thereon. There is a sensor and is communicable with a storage cabinet control system, the arm and the sensor being movable to the vicinity of each of the cleaning gas inlets for sensing the cleaning gas. Ο 37