TW200930796A - Method of producing liquid crystal composition - Google Patents

Method of producing liquid crystal composition Download PDF

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Publication number
TW200930796A
TW200930796A TW097141721A TW97141721A TW200930796A TW 200930796 A TW200930796 A TW 200930796A TW 097141721 A TW097141721 A TW 097141721A TW 97141721 A TW97141721 A TW 97141721A TW 200930796 A TW200930796 A TW 200930796A
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TW
Taiwan
Prior art keywords
liquid crystal
crystal composition
compound
microwave
patent application
Prior art date
Application number
TW097141721A
Other languages
Chinese (zh)
Other versions
TWI392725B (en
Inventor
Kazuki Kurisawa
Masakazu Kaneoya
Kunihiko Kotani
Original Assignee
Dainippon Ink & Chemicals
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Publication of TW200930796A publication Critical patent/TW200930796A/en
Application granted granted Critical
Publication of TWI392725B publication Critical patent/TWI392725B/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/42Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40
    • C09K19/46Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40 containing esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/02Liquid crystal materials characterised by optical, electrical or physical properties of the components, in general
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/14Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
    • C09K19/18Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain the chain containing carbon-to-carbon triple bonds, e.g. tolans
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/20Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers
    • C09K19/2007Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers the chain containing -COO- or -OCO- groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/30Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
    • C09K19/3001Cyclohexane rings
    • C09K19/3059Cyclohexane rings in which at least two rings are linked by a carbon chain containing carbon to carbon triple bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/30Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
    • C09K19/3001Cyclohexane rings
    • C09K19/3066Cyclohexane rings in which the rings are linked by a chain containing carbon and oxygen atoms, e.g. esters or ethers
    • C09K19/3068Cyclohexane rings in which the rings are linked by a chain containing carbon and oxygen atoms, e.g. esters or ethers chain containing -COO- or -OCO- groups

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  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Liquid Crystal Substances (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The object of the present invention is to provide an efficient method for producing a liquid crystal composition having high reliability during the production of a liquid crystal composition by mixing more than two kinds of liquid crystal compounds. The method of attaining the said object is characterized in that at least one of the more than two kinds of liquid compounds having a melting point higher than 30 DEG C is irradiated by a microwave. The said method of this invention is capable of producing a liquid crystal composition having high reliability of high quality without using large scale apparatus such as a reducing pressure device, a heating device and the like, and thus is a highly practical method for producing a liquid crystal composition having high reliability.

Description

200930796 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種可用作爲液晶顯示元件之構成零配件 之液晶組成物之製法。 【先前技術】 * 液晶顯示元件係以計時器、電子式桌上型計算機爲首而 已演變成被使用於各種量測儀器、汽車用面板、文字處理機 、電子手帳、印表機、電腦、電視等。液晶顯示方式之代表 e 性者係包括:TN (扭轉向列)型、STN (超扭轉向列)型、 DS (動態光散射)型、GH (賓主)型或可以高速響應之FLC (強介電性液晶)等。此外,驅動方式也從先前的靜態驅動 演變成以多路驅動爲通用方式,並且已有單純矩陣方式,最 近則有主動矩陣方式已付諸實務應用化。 使用於此等之液晶組成物通常係混合兩種以上之化合物 來製造,其混合比雖然係根據液晶組成物之物性(向列相溫 度範圍、折射率異方向性(Δη)、介電常數異方向性(Δε ® )、黏度、彈性常數等)或光電特性(響應時間、臨界電壓BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a process for producing a liquid crystal composition which can be used as a constituent of a liquid crystal display element. [Prior Art] * Liquid crystal display elements have evolved into various measuring instruments, automotive panels, word processors, electronic PDAs, printers, computers, and televisions, including timers and electronic desktop computers. Wait. The representative of the liquid crystal display system includes: TN (twisted nematic) type, STN (super twisted nematic) type, DS (dynamic light scattering) type, GH (guest master) type or FLC capable of high speed response. Electrical liquid crystal) and the like. In addition, the driving method has evolved from the previous static driving to the multiplex driving, and the simple matrix method has been adopted. Recently, the active matrix method has been put into practical application. The liquid crystal composition used herein is usually produced by mixing two or more kinds of compounds, and the mixing ratio thereof is based on the physical properties of the liquid crystal composition (nematic phase temperature range, refractive index anisotropy (Δη), and dielectric constant). Directionality (Δε ® ), viscosity, elastic constant, etc.) or photoelectric properties (response time, threshold voltage)

、V-T (電壓-溫度)曲線之陡峭性等)爲目的之液晶元件的 顯示方式或驅動方式來配合各種數値所決定,但是幾乎是該 組成物係必須爲對於熱、光、水份等具有高可靠性。此外, 特別是在主動矩陣驅動方式之情況時,則除此以外,重要的 是電壓保持率(VHR )必須足夠高。爲提高液晶組成物之可 靠性、電阻率及電壓保持率(VHR ),則必須關於用於構成 組成物之各液晶化合物可達成高可靠性與電壓保持率(VHR 200930796 )。然而,即使使用可靠性、電阻率及電壓保持率(VHR ) 爲高之液晶化合物,但是在製造此等混合物之液晶組成物時 ,卻有可能導致品質劣化之情況。 液晶組成物之製法,已有提案揭述藉由加熱的溶解混合 、或將液晶化合物溶解於有機溶劑而在混合後移除有機溶劑 之方法(參閱發明專利文獻1)。然而,此等提案所揭述之方 法多半會導致品質劣化。例如,就藉由加熱的溶解混合而言 ,卻會造成液晶化合物由於在加熱時之氧而發生氧化分解, 〇 使得液晶組成物之電阻率或電壓保持率(VHR )顯著地降低 。並且,有可能導致液晶上限轉移溫度降低,使得液晶組成 物之物性或光電特性發生變化之情況。此外,在溶解於有機 溶劑之方法,則有可能導致由於有機溶劑之雜質或摻質而使 得液晶組成物之電阻率或電壓保持率(VHR )顯著降低之情 況。並且,會構成有機溶劑無法完全移除而殘留,結果同樣 地也會導致液晶組成物之電阻率降低,或顯著降低電壓保持 率之原因。在另一方面,也有提案一種藉由在減壓狀態下以 © 較低的溫度來加熱之製法,其係針對於具有低電阻値之液晶 組成物之製造(參閱發明專利文獻2)所揭述。然而,該引用 文獻所揭述之方法,雖然可實施在較低的溫度下之製造,但 是仍然需要加熱,因此無法完全排除加熱所引起之不良影響 ,且也需要伴隨加熱之設備。並且,該引用文獻所揭述之方 法卻有需要伴隨減壓之大規模的裝置之問題。亦即,爲一面 減壓、一面溶解液晶化合物,則需要能耐減壓之容器,以致 製造裝置必然不得不使用能減壓之大規模者。此外,減壓雖 200930796 ' 然一般情況係使用真空泵,但是作爲附帶設備而也需要真空 泵所使用的用於防止油霧逆流之阱、及用於冷卻阱之冷卻裝 置。如上所述,在減壓下製造液晶組成物之方法,必然導致 設備的大型化,使其不得不投入過高的資本,以對應正在增 加之液晶組成物的需要。 有鑑於此,目前正在期望著可開發出一種以簡便設備而 可有效率地製造更高品質之液晶組成物的方法。 (發明專利文獻1)日本發明專利特開平第5- 1 05876號 〇 公報(第5頁之右欄) (發明專利文獻2 )日本發明專利特開第2002-1 94356號 公報(第4頁之實施例) 【發明內容】 〔所欲解決之技術問題〕 本發明所欲解決之技術問題係關於在製造經混合兩種以 上的液晶化合物所構成的液晶組成物時,提供一種可製造具 有高可靠性之液晶組成物、且可有效率地製造之方法。 〇 〔解決問題之技術方法〕 本發明之發明人等爲解決關於如上所述之技術問題而專 心硏討結果’終於達成本發明。本發明係提供一種液晶組成 物之製法’其特徵爲在至少一種之熔點爲高於3 0°c之兩種以 上的液晶化合物照射微波。 〔發明之功效〕 本發明之製法係可在不需要減壓裝置、加熱裝置等之大 規模設備下製造具有高可靠性之高品質之液晶組成物。亦即 200930796 ,對於正被要求可抑制電阻率之降低、雜質之形成少、物性 値之變動少、且具有高可靠性之液晶組成物之製造上是非常 合乎實用。 【實施方式】 〔本發明之最佳實施方式〕 在下文中,則就本發明之一實例加以說明。 本發明之製法係在不使用有機溶媒等之溶劑下,藉由在 含有至少一種之熔點爲高於30°C之兩種以上的液晶化合物之 © 液晶化合物照射微波,以有效率地製造液晶組成物者。特別 是在使用兩種之熔點爲高於30°C之兩種以上的液晶化合物之 液晶組成物的製造上係有效,且在使用五種以上之熔點爲高 於30°C之兩種以上的液晶化合物之液晶組成物的製造上係更 有效。 熔點爲30 °C以上之化合物的含率較佳爲60%以上,更佳 爲70%以上,特佳爲80%以上。 液晶組成物可含有液晶化合物以外之添加劑。添加劑係 © 可使用抗氧化劑、紫外線吸收劑、抗靜電劑、界面活性劑等 。此外,也可含有液晶性或非液晶性之光學活性化合物。若 未具有液晶骨架之化合物之添加量爲太多時,則由於對於液 晶之特性將會造成不良影響,因此欲添加未具有液晶骨架之 化合物時,則其合計含率較佳爲5 %以下,更佳爲3 %以下, 特佳爲1%以下。 微波之照射時間較佳爲1小時以下,更佳爲30分鐘以下 。若照射微波時之溫度爲太高時’則所製造之組成物的品質 200930796 將會降低,若其係太低時,則由於製造需要耗費時間,因此 當然有其最適的溫度。因此,較佳爲在從40 °C至所製得之液 晶組成物的液晶相上限溫度+50°C之範圍,更佳爲在+30°C之 範圍。 所使用的微波之頻率較佳爲300 MHz以上、3 THz以下 ,更佳爲500 MHz以上。照射強度較佳爲100W以上,更佳 爲1 kw以上。 本發明之製法,由於可在低溫製造液晶組成物,在一般 © 大氣雰圍氣下也可製造高品質之液晶組成物。然而,爲製造 更高品質之液晶組成物,較佳爲將微波之照射在密閉條件下 進行,更佳爲在惰性氣體大氣下進行》惰性氣體係適合使用 氦氣、氖氣、Μ氣等之稀有氣體及氮氣等。 本發明之製法雖然並不需要使用減壓措施,但是也可在 減壓狀態下進行組成物之製造。 以本發明之製法所製得之液晶組成物雖然並無特殊限制 ,但是在減壓下製造時,則特佳爲大量含有會揮發的分子量 © 較小之液晶化合物的液晶組成物之製造。 液晶化合物之分子量較佳爲含有300以下之化合物,更 佳爲含有250以下之化合物。 爲更有效率地製造液晶組成物,較佳爲所構成的液晶分 子會發生極性化偏移。具體言之,可實現比在所構成的液晶 化合物具有特定的結構或官能基之情況時爲更有效率地製造 。較佳的結構係在液晶化合物之分子中至少具有一芳香環。 此外,較佳的官能基則爲鹵素、氰基等之電子吸引性官能基 200930796 ,且較佳爲在分子中具有此等之官能基的化合物,更佳爲在 芳香環具有該電子吸引性官能基的化合物。 具體言之,所構成的化合物較佳爲以通式(I)所代表之 化合物。 R1—A—Z1—B-(z2—C^R2 (I) (式中,R1及R2係各自獨立地代表也可爲經以氟取代之碳原 ❹ 子數爲1至16之烷基、碳原子數爲1至16之烷氧基、碳原 子數爲2至16之烯基、碳原子數爲3至16之烯氧基、氟原 子、氯原子或氰基;A、B及C係各自獨立地代表1,4-伸苯基 、2 或 3-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、3,5-二氟-1,4-伸苯基、2或3-氯-1,4-伸苯基、2,3-二氯-1,4-伸苯基、3,5-二 氯·1,4-伸苯基、2-甲基-1,4-伸苯基、3-甲基-1,4-伸苯基、萘 -2,6-二基 '菲-2,7-二基、弗-2,7-二基、反式-1,4-伸環己基、 1,2,3,4-四氫萘-2,6-二基、十氫萘-2,6-二基、反式-1,3-二噚烷 ® -2,5-二基、吡啶-2,5-二基、嘧啶-2,5-二基、吡阱-2,5-二基、 或嗒哄-2,5 -二基,且此等之基係也可更進一步經以丨至3個 氟原子加以取代;m係代表0、1或2; Z1及Z2係各自獨立地 代表單鍵、-CH2CH2-、-(CH2)4-、·0(:Η2…-CH20-、-COO-、 -CH = CH_、-CF = CF-、_CH = N-N = CH_或-C=C-。但是,若 m;^ 2時’則兩個之Z2及C係各自獨立地可爲相同或不同。) 在通式(I)中,A、B及C中之至少一較佳爲芳香環, 更佳爲1,4-伸苯基、2或3-氟-1,4-伸苯基、2,3-二氟-l,4-伸苯 -10- 200930796 基、3,5-二氟-1,4-伸苯基、2或3·氯伸苯基、2,3_二氯_丨,4_ 伸苯基、3,5-二氯-1,4-伸苯基、2_甲基-丨,4_伸苯基、3_甲基-丨,4· 伸苯基、萘-2,6-二基、菲-2,7-二基、莽 _2,7_ 二基、1,2,3,4-四氫萘-2,6-二基、吡啶_2,5-二基、嘧啶_2,5_二基 '吡阱_2,5-二基、或嗒阱-2,5-二基;特佳爲〗,4_伸苯基、2或^氟-^-伸苯基、2,3-二氟-1,4-伸苯基、3,5_二氟-匕仁伸苯基。 R1及R2較佳爲一者係代表氟原子、氯原子或氰基,而另 一者係代表碳原子數爲1至16之烷基、碳原子數爲1至16 © 之院氧基、碳原子數爲2至16之烯基、碳原子數爲3至16 之烯氧基之化合物。 若以本發明之製法製造TFT用液晶組成物時,則在通式 (Ο所代表之化合物中’ R1及R2較佳爲各自獨立地代表氟 原子、碳原子數爲1至16之烷基、或碳原子數爲2至16之 烯基之化合物。在此情況下,所獲得之液晶組成物係具有高 電壓保持率。 《實施例》 © 在下文中,則列舉實施例更詳細地說明本發明,但是本 發明並不受限於此等實施例者》此外,在下文中之實施例及 比較例之組成物中的「%」係意謂「重量%」。 微波之照射係使用富士電子工業股份有限公司(Fuji Electronic Industrial Co.,Ltd.)製造之微波照射裝置(特訂 商品)來實施(高頻輸出功率:6 kW、振盪頻率:2,450 MHz ±50 MHz )。所製得之液晶組成物的分析係使用下列裝置: 氣相層析法:HEWLETT PACKARD公司製造之HP6890 -11 - 200930796 可靠性之確認係藉由實施測定液晶組成物之電阻率、使 用氣相層析法來確認雜質之形成及經混合的化合物之分解、 及測定電壓保持率或電流値、物性値。 〔實施例1〕液晶組成物之製造 實施由下列化合物所構成的液晶組成物(STN 1、液晶上 限溫度爲95.1°C )之製造。The display mode or driving method of the liquid crystal element for the purpose of the purpose of the VT (voltage-temperature curve steepness, etc.) is determined by various numbers, but it is almost necessary for the composition to have heat, light, moisture, etc. High reliability. Further, especially in the case of the active matrix driving method, it is important that the voltage holding ratio (VHR) must be sufficiently high. In order to improve the reliability, resistivity, and voltage holding ratio (VHR) of the liquid crystal composition, it is necessary to achieve high reliability and voltage holding ratio with respect to each liquid crystal compound constituting the composition (VHR 200930796). However, even when a liquid crystal compound having high reliability, resistivity, and voltage holding ratio (VHR) is used, when the liquid crystal composition of these mixtures is produced, there is a possibility that the quality is deteriorated. In the method of producing a liquid crystal composition, there has been proposed a method of removing an organic solvent by mixing after dissolving and mixing by heating or dissolving a liquid crystal compound in an organic solvent (see Patent Document 1). However, the methods disclosed in these proposals are likely to cause quality degradation. For example, in the case of dissolving and mixing by heating, the liquid crystal compound is oxidatively decomposed due to oxygen upon heating, and the resistivity or voltage holding ratio (VHR) of the liquid crystal composition is remarkably lowered. Further, there is a possibility that the liquid crystal upper limit transfer temperature is lowered to cause a change in physical properties or photoelectric characteristics of the liquid crystal composition. Further, in the method of dissolving in an organic solvent, there is a possibility that the resistivity or voltage holding ratio (VHR) of the liquid crystal composition is remarkably lowered due to impurities or dopants of the organic solvent. Further, the organic solvent is not completely removed and remains, and as a result, the resistivity of the liquid crystal composition is lowered or the voltage holding ratio is remarkably lowered. On the other hand, there has also been proposed a method of heating by a lower temperature at a reduced pressure, which is directed to the manufacture of a liquid crystal composition having a low resistance ( (refer to Patent Document 2). . However, the method disclosed in the cited document, although it can be manufactured at a lower temperature, still requires heating, so that the adverse effects caused by heating cannot be completely eliminated, and equipment accompanying heating is also required. Moreover, the method disclosed in the cited document has a problem of a large-scale device that requires decompression. That is, in order to dissolve the liquid crystal compound while decompressing one side, a container capable of withstanding decompression is required, so that the manufacturing apparatus must use a large-scale decompression. Further, although the decompression is 200930796', the vacuum pump is generally used. However, as an accessory device, a well for preventing backflow of the oil mist and a cooling device for cooling the trap are also required. As described above, the method of producing a liquid crystal composition under reduced pressure inevitably leads to an increase in size of the apparatus, which necessitates the investment of excessive capital to correspond to the demand for the liquid crystal composition being increased. In view of the above, it is currently desired to develop a method for efficiently producing a higher quality liquid crystal composition with a simple apparatus. (Patent Document 1) Japanese Laid-Open Patent Publication No. Hei No. 5-105876 (the right column of the fifth page) (Invention Patent Document 2) Japanese Patent Laid-Open Publication No. 2002-1 94356 (page 4) EMBODIMENT OF THE INVENTION [Technical Problem to be Solved] The technical problem to be solved by the present invention is to provide a highly reliable manufacturing process for producing a liquid crystal composition composed of two or more liquid crystal compounds. A liquid crystal composition and a method that can be efficiently produced. [Technical method for solving the problem] The inventors of the present invention have finally achieved the present invention in order to solve the technical problem as described above and to concentrate on the results. The present invention provides a process for producing a liquid crystal composition, which is characterized in that microwaves are irradiated to at least one of liquid crystal compounds having a melting point higher than 30 ° C. [Effect of the Invention] The production method of the present invention can produce a high-quality liquid crystal composition having high reliability without requiring a large-scale apparatus such as a decompression device or a heating device. In the case of 200930796, it is very practical to manufacture a liquid crystal composition which is required to suppress a decrease in resistivity, a small amount of impurities, and a small change in physical properties, and which has high reliability. [Embodiment] [Best Embodiment of the Invention] Hereinafter, an example of the invention will be described. The method of the present invention is to efficiently produce a liquid crystal composition by irradiating microwaves with at least one liquid crystal compound containing at least one liquid crystal compound having a melting point of higher than 30 ° C without using an organic solvent or the like. Object. In particular, it is effective to use two liquid crystal compositions in which two or more kinds of liquid crystal compounds having a melting point of higher than 30 ° C are used, and two or more kinds of melting points of more than 30 ° C are used. The liquid crystal composition of the liquid crystal compound is more effective in the production. The content of the compound having a melting point of 30 ° C or more is preferably 60% or more, more preferably 70% or more, and particularly preferably 80% or more. The liquid crystal composition may contain additives other than the liquid crystal compound. Additives © Antioxidants, UV absorbers, antistatic agents, surfactants, etc. can be used. Further, an optically active compound having liquid crystallinity or non-liquid crystallinity may also be contained. If the amount of the compound having no liquid crystal skeleton is too large, the effect on the characteristics of the liquid crystal will be adversely affected. Therefore, when a compound having no liquid crystal skeleton is to be added, the total content is preferably 5% or less. More preferably, it is 3% or less, and particularly preferably 1% or less. The irradiation time of the microwave is preferably 1 hour or less, more preferably 30 minutes or less. If the temperature when the microwave is irradiated is too high, the quality of the composition to be manufactured 200930796 will be lowered, and if it is too low, it will take time to manufacture, so of course, it has an optimum temperature. Therefore, it is preferably in the range of from 50 ° C to the liquid crystal phase upper limit temperature of the liquid crystal composition obtained by +50 ° C, more preferably in the range of +30 ° C. The frequency of the microwave used is preferably 300 MHz or more, 3 THz or less, and more preferably 500 MHz or more. The irradiation intensity is preferably 100 W or more, more preferably 1 kw or more. According to the process of the present invention, since a liquid crystal composition can be produced at a low temperature, a high-quality liquid crystal composition can be produced in a general atmosphere atmosphere. However, in order to produce a higher quality liquid crystal composition, it is preferred to carry out the irradiation of the microwave under a closed condition, and more preferably in an inert gas atmosphere. The inert gas system is suitable for use with helium, neon, xenon, and the like. Rare gases and nitrogen. Although the production method of the present invention does not require the use of a pressure reducing measure, the production of the composition can be carried out under reduced pressure. The liquid crystal composition obtained by the production method of the present invention is not particularly limited. However, when it is produced under reduced pressure, it is particularly preferable to produce a liquid crystal composition containing a large amount of a liquid crystal compound having a small molecular weight which is volatilized. The molecular weight of the liquid crystal compound is preferably a compound having 300 or less, more preferably a compound having 250 or less. In order to produce the liquid crystal composition more efficiently, it is preferred that the liquid crystal molecules formed are polarized and shifted. Specifically, it can be produced more efficiently than when the liquid crystal compound to be formed has a specific structure or functional group. A preferred structure has at least one aromatic ring in the molecule of the liquid crystal compound. Further, a preferred functional group is an electron-attracting functional group 200930796 of a halogen, a cyano group or the like, and preferably a compound having such a functional group in a molecule, and more preferably has an electron attracting function in the aromatic ring. Base compound. Specifically, the compound to be constituted is preferably a compound represented by the formula (I). R1—A—Z1—B—(z2—C^R2 (I) (wherein R1 and R2 each independently represent an alkyl group having 1 to 16 carbon atoms and having a carbon number substituted by fluorine, An alkoxy group having 1 to 16 carbon atoms, an alkenyl group having 2 to 16 carbon atoms, an alkenyloxy group having 3 to 16 carbon atoms, a fluorine atom, a chlorine atom or a cyano group; A, B and C systems Each independently represents 1,4-phenylene, 2 or 3-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 3,5-difluoro-1, 4-phenylene, 2 or 3-chloro-1,4-phenylene, 2,3-dichloro-1,4-phenylene, 3,5-dichloro-1,4-phenylene, 2-methyl-1,4-phenylene, 3-methyl-1,4-phenylene, naphthalene-2,6-diyl'phenanthrene-2,7-diyl, ef-2,7- Dibasic, trans-1,4-cyclohexylene, 1,2,3,4-tetrahydronaphthalene-2,6-diyl, decahydronaphthalene-2,6-diyl, trans-1,3 -dioxane®-2,5-diyl, pyridine-2,5-diyl, pyrimidine-2,5-diyl, pyridene-2,5-diyl, or 嗒哄-2,5-di And the bases of these may be further substituted with 丨 to 3 fluorine atoms; m represents 0, 1 or 2; Z1 and Z2 each independently represent a single bond, -CH2CH2-, -(CH2 ) 4-, ·0(:Η2...-CH20- -COO-, -CH = CH_, -CF = CF-, _CH = NN = CH_ or -C=C-. However, if m; ^ 2 when 'the two Z2 and C are independently The same or different.) In the formula (I), at least one of A, B and C is preferably an aromatic ring, more preferably 1,4-phenylene, 2 or 3-fluoro-1,4-stretch Phenyl, 2,3-difluoro-l,4-benzobenzene-10-200930796, 3,5-difluoro-1,4-phenylene, 2 or 3·chlorophenyl, 2,3_ Dichloro-hydrazine, 4_phenylene, 3,5-dichloro-1,4-phenylene, 2-methyl-oxime, 4-phenylene, 3-methyl-oxime, 4·phenylene , naphthalene-2,6-diyl, phenanthrene-2,7-diyl, 莽_2,7-diyl, 1,2,3,4-tetrahydronaphthalene-2,6-diyl, pyridine_2, 5-diyl, pyrimidine_2,5-diyl'-pyridyl-2,5-diyl, or oxime-2,5-diyl; especially good, 4_phenyl, 2 or fluoro -^-Extended phenyl, 2,3-difluoro-1,4-phenylene, 3,5-difluoro-barium phenyl. R1 and R2 are preferably one representing a fluorine atom or a chlorine atom. Or a cyano group, and the other one represents an alkyl group having 1 to 16 carbon atoms, an alkyl group having 1 to 16 carbon atoms, an alkenyl group having 2 to 16 carbon atoms, and 3 carbon atoms. Combination of alkenyloxy groups up to 16 When the liquid crystal composition for TFT is produced by the method of the present invention, 'R1 and R2 in the compound represented by the formula 较佳 are preferably each independently represent a fluorine atom and an alkyl group having 1 to 16 carbon atoms. a compound having a base or an alkenyl group having 2 to 16 carbon atoms. In this case, the obtained liquid crystal composition has a high voltage holding ratio. <<Examples>> In the following, the present invention will be described in more detail by way of examples, but the present invention is not limited by the examples. In addition, "%" in the compositions of the examples and comparative examples below "It means "% by weight". The microwave irradiation was carried out using a microwave irradiation device (special order product) manufactured by Fuji Electronic Industrial Co., Ltd. (high-frequency output power: 6 kW, oscillation frequency: 2,450 MHz ± 50 MHz). The analysis of the obtained liquid crystal composition used the following apparatus: Gas chromatography: HP6890 -11 - 200930796 manufactured by HEWLETT PACKARD Co., Ltd. The reliability was confirmed by performing the measurement of the resistivity of the liquid crystal composition, using the vapor phase layer. The analysis method confirms the formation of impurities and the decomposition of the mixed compound, and measures the voltage holding ratio, current 値, and physical properties. [Example 1] Production of liquid crystal composition A liquid crystal composition (STN 1 and liquid crystal upper limit temperature: 95.1 ° C) composed of the following compounds was produced.

-12- 200930796 C2H5-12- 200930796 C2H5

F Fl〇^^-c F F c朴·F Fl〇^^-c F F c Park·

coc C^Hg-Coc C^Hg-

cocCoc

0C2H50C2H5

〇4Η9〇4Η9

,0^0^〇~ 8g 79〇C 5g 71 °C 16g 8°C 2g 31 °C 16g 64°C 2g 80°C 3g 38°C 20g 109°C 9g 177°C 6g 207°C 5g 203°C 4g 210oC以上 4g 210oC以上 在容量爲150毫升之分離式燒瓶,稱取如上所述之各化 合物及其所揭述之數量。將該分離式燒瓶架設在微波產生裝 置,並以1 kW之輸出功率來照射微波加熱。經照射1 0分鐘 後,停止微波之照射,讓分離式燒瓶冷卻後,從微波照射裝 -13- 200930796 ' 置取出,藉此可獲得100克之向列液晶狀態之STN1。 經測定所製得之液晶組成物的電阻率,結果則爲1 · 1X1011 Ω cm。並且,藉由氣相層析法分析所製得之液晶組成物,結 果係並未混入•形成經混合的化合物以外之物質、且也觀測 不到經混合的化合物之分解。經測定所製得之液晶組成物的 物性,結果係可獲得吾所欲之特性。經將該液晶注入於STN 面板並測定光電特性,結果係可獲得吾所欲之特性。根據如 上所述之結果,則可明白實施例1之液晶組成物係具有非常 φ 高的可靠性。 本發明之製法係可在不需要大規模的設備下以40分鐘即 可製造高品質之液晶組成物。 〔比較例1〕在減壓下之液晶組成物之製造 根據日本發明專利特開第2002-194356號公報所揭述之 方法來製造與實施例1相同之液晶組成物(STN1 )。 在茄子型燒瓶稱取吾所欲數量之液晶化合物。然後,將 該茄子型燒瓶安裝在旋轉式蒸發器。將茄子型燒瓶浸漬於50 Φ °C油浴,並使其旋轉。使用真空泵以歷時5分鐘使旋轉式蒸 發器緩慢地減壓至20 kPa。設定油浴之溫度爲UOt,並以5 t /min之速率升溫。在液晶變化成液體狀態而呈透明之30分 鐘後,則將油浴變更爲水浴來加以冷卻。待降低至室溫後, 停止旋轉並停止減壓。經由以氮氣取代燒瓶內以使其恢復至 大氣壓後,由旋轉式蒸發器卸下茄子型燒瓶,藉此可獲得100 克之向列液晶狀態之STN1。 經測定所製得之液晶組成物的電阻率,結果則爲1.2x1 011 -14- 200930796 ' Ω cm。藉由氣相層析法分析所製得之液晶組成物,結果係並 未混入•形成所混合的化合物以外之物質,且也未觀測到所 混合的化合物之分解。經測定所製得之液晶組成物的物性, 結果係可獲得吾所欲之特性。然而,卻確認到某些分子量較 低的化合物已揮發而導致組成改變。此外,製造必須使用需 要配備大規模設備的減壓裝置或加熱裝置,而且需要長的製 造時間。 〔比較例2〕在大氣下之液晶組成物之製造 〇 根據在日本發明專利特開平第5-1 05 876號公報所揭述之 方法來製造與實施例1相同之液晶組成物(STN 1 )。 在茄子型燒瓶稱取吾所欲數量之液晶化合物。在該茄子 型燒瓶中放入磁鐵式轉子後,放置在5 0°C之熱板上,並藉由 —面以5°C /min之速率將熱板之溫度升溫至11 0°C、一面使轉 子旋轉來加以攪拌。在液晶變化成液體狀態而呈透明之30分 鐘後,則停止熱板之加熱,並緩慢地恢復至室溫。藉此可獲 得100克之向列液晶狀態之STN1。 Ο 經測定所製得之液晶組成物的電阻率,結果則爲1.1X1 〇9 Ω cm。藉由氣相層析法分析所製得之液晶組成物,結果係出 現許多所混合的化合物以外之物質,經分析結則可知道用於 構成液晶組成物之液晶化合物係已經氧化分解。經測定液晶 上限點轉移溫度,結果係已降低爲94.0°C,因此品質之劣化 大。關於比較例2之製法,其在所製得之液晶組成物的可靠 性方面係明顯地比實施例者差。 〔實施例2〕液晶組成物之製造 -15- 200930796 實施由下化列合物所構成的液晶組成物(TFT 1、液晶上 限溫度爲6 8.0 °C )之製造。, 0^0^〇~ 8g 79〇C 5g 71 °C 16g 8°C 2g 31 °C 16g 64°C 2g 80°C 3g 38°C 20g 109°C 9g 177°C 6g 207°C 5g 203° C 4g 210oC or more 4g 210oC or more In a 150 ml-volume separation flask, the respective compounds as described above and the amounts thereof are recited. The separable flask was mounted on a microwave generating device and irradiated with microwave heating at an output of 1 kW. After the irradiation for 10 minutes, the microwave irradiation was stopped, and the separation flask was cooled, and then taken out from the microwave irradiation device -13 - 200930796', whereby 100 g of the nematic liquid crystal state of STN1 was obtained. The resistivity of the obtained liquid crystal composition was measured and found to be 1 · 1×10 11 Ω cm. Further, the obtained liquid crystal composition was analyzed by gas chromatography, and the results were not mixed with the formation of a substance other than the mixed compound, and decomposition of the mixed compound was not observed. The physical properties of the obtained liquid crystal composition were measured, and as a result, the desired properties were obtained. The liquid crystal was injected into the STN panel and the photoelectric characteristics were measured, and as a result, the desired characteristics were obtained. From the results as described above, it is understood that the liquid crystal composition of Example 1 has a very high reliability. The process of the present invention enables the production of high quality liquid crystal compositions in 40 minutes without the need for large scale equipment. [Comparative Example 1] Production of a liquid crystal composition under reduced pressure A liquid crystal composition (STN1) similar to that of Example 1 was produced by the method disclosed in Japanese Laid-Open Patent Publication No. 2002-194356. Weigh the desired amount of liquid crystal compound in an eggplant type flask. Then, the eggplant type flask was mounted on a rotary evaporator. The eggplant flask was immersed in a 50 Φ °C oil bath and rotated. The rotary evaporator was slowly depressurized to 20 kPa using a vacuum pump for 5 minutes. Set the temperature of the oil bath to UOt and raise the temperature at a rate of 5 t /min. After the liquid crystal was changed to a liquid state and was transparent for 30 minutes, the oil bath was changed to a water bath to be cooled. After lowering to room temperature, stop the rotation and stop the decompression. After replacing the inside of the flask with nitrogen to return it to atmospheric pressure, the eggplant type flask was removed by a rotary evaporator, whereby 100 g of nematic liquid crystal STN1 was obtained. The resistivity of the obtained liquid crystal composition was measured and found to be 1.2 x 1 011 -14 to 200930796 ' Ω cm. The obtained liquid crystal composition was analyzed by gas chromatography, and as a result, substances other than the mixed compound were not mixed, and decomposition of the mixed compound was not observed. The physical properties of the obtained liquid crystal composition were measured, and as a result, the desired properties were obtained. However, it was confirmed that some of the lower molecular weight compounds have volatilized to cause a composition change. In addition, the manufacture must use a pressure reducing device or a heating device that requires a large-scale equipment, and requires a long manufacturing time. [Comparative Example 2] Production of a liquid crystal composition under the atmosphere 制造 The same liquid crystal composition (STN 1 ) as in Example 1 was produced according to the method disclosed in Japanese Laid-Open Patent Publication No. Hei. 5-105876. . Weigh the desired amount of liquid crystal compound in an eggplant type flask. After placing the magnet rotor in the eggplant type flask, it was placed on a hot plate at 50 ° C, and the temperature of the hot plate was raised to 110 ° C at a rate of 5 ° C / min. Rotate the rotor to stir. After the liquid crystal was changed to a liquid state and was transparent for 30 minutes, the heating of the hot plate was stopped and the temperature was slowly returned to room temperature. Thereby, a STN1 of a nematic liquid crystal state of 100 g can be obtained.电阻 The resistivity of the liquid crystal composition obtained was measured and found to be 1.1×1 〇9 Ω cm. The liquid crystal composition obtained by gas chromatography was analyzed, and as a result, a substance other than the mixed compound appeared, and it was found that the liquid crystal compound used for constituting the liquid crystal composition had been oxidatively decomposed. When the liquid crystal upper limit point transfer temperature was measured, the result was reduced to 94.0 ° C, so the deterioration of quality was large. Regarding the preparation method of Comparative Example 2, it was remarkably inferior to the examples in terms of the reliability of the obtained liquid crystal composition. [Example 2] Production of liquid crystal composition -15- 200930796 A liquid crystal composition (TFT 1 and liquid crystal upper limit temperature of 6 8.0 ° C) composed of the lower layer compound was produced.

C3H7~0~^0^0^C2HsC3H7~0~^0^0^C2Hs

15g 1〇(TC 以上 15g 15g 49°C 15g 1〇〇°C以上 15g 173°C 15g 166°C 15g 17°C 15g 63°C 15g 56°C 15g 1〇〇°C以上 在容量爲150毫升之分離式燒瓶,稱取如上所述之各化 合物及其所揭述之數量。將分離式燒瓶架設在微波產生裝置 ,並以1 kW之輸出功率來照射微波來加熱。經照射10分鐘 後,停止微波之照射’讓分離式燒瓶冷卻後,從微波照射裝 置取出,藉此可獲得100克之向列液晶狀態之TFT 1。 經測定所製得之液晶組成物的電阻率,結果則爲1.5 X 1 014 Ω cm。此外,藉由氣相層析法分析所製得之液晶組成物,結 -16- 200930796 4 果係並未混入•形成所混合的化合物以外之物質,且也未觀 測到所混合的化合物之分解。經測定所製得之液晶組成物的 物性,結果係可獲得吾所欲之特性。經將該液晶注入於TFT 面板並測定光電特性,結果係可獲得吾所欲之特性。此外, 使用於TFT面板時之電壓保持率也爲足夠地高者。 本發明之製法係可在不需要大規模的設備下以40分鐘即 可製造高品質之液晶組成物。根據如上所述之結果,則可明 白實施例2之液晶組成物係具有非常高的可靠性。 © 〔比較例3〕在減壓下之液晶組成物之製造 根據在日本發明專利特開第2002-194356號公報所揭述 之方法來製造與實施例2相同之液晶組成物(TFT1)。 在茄子型燒瓶稱取吾所欲數量之液晶化合物。然後,將 該茄子型燒瓶安裝在旋轉式蒸發器。將茄子型燒瓶浸漬於50 °C油浴,並使其旋轉。使用真空泵以歷時5分鐘使旋轉式蒸 發器緩慢地減壓至20 kPa。然後,設定油浴之溫度爲85°C, 並以5°C /min之速率升溫。在液晶變化成液體狀態而呈透明 © 之30分鐘後,則改變油浴爲水浴來加以冷卻。降低至室溫後 ,停止旋轉並停止減壓。經由以氮氣取代燒瓶內以使其恢復 至大氣壓後,由旋轉式蒸發器卸下茄子型燒瓶,藉此可獲得 100克之向列液晶狀態之TFT 1。 經測定所製得之液晶組成物的電阻率,結果則爲1.2x1 0 14 Ω cm。藉由氣相層析法分析所製得之液晶組成物,結果係並 未混入•形成所混合的化合物以外之物質,且也未觀測到所 混合的化合物之分解。經測定所製得之液晶組成物的物性, -17- 200930796 ' 結果係可獲得吾所欲之特性。然而’卻確認到某些分子量較 低的化合物已揮發而導致組成改變。此外’製造必須使用需 要配備大規模設備的減壓裝置或加熱裝置’而且需要長的製 造時間。 〔比較例4〕在大氣下之液晶組成物之製造 根據在日本發明專利特開平第5-1 05 876號公報所揭述之 方法來製造與實施例2相同之液晶組成物(TFT 1) 在茄子型燒瓶稱取吾所欲數量之液晶化合物。在該茄子 © 型燒瓶中放入磁鐵式轉子後,放置在50°C之熱板上,並藉由 —面以5°C /min之速率將熱板之溫度升溫至85°C、一面使轉 子旋轉來加以攪拌。在液晶變化成液體狀態而呈透明之30分 鐘後,則停止熱板之加熱,並緩慢地使其恢復至室溫。藉此 可獲得1〇〇克之向列液晶狀態之TFT 1。 經測定所製得之液晶組成物的電阻率,結果則爲1.3x1 013 Ω cm。藉由氣相層析法分析所製得之液晶組成物,結果係出 現許多所混合的化合物以外之物質,經分析結則可知道用於 〇 構成液晶組成物之液晶化合物係已經氧化分解。經測定液晶 上限點轉移溫度,結果係已降低爲66.8 °c,因此品質之劣化 大。關於比較例4之製法,其在所製得之液晶組成物的可靠 性方面係明顯地比實施例者差。 【圖式簡單說明】 無。 【主要元件符號說明】 &gt;fnr 無。 -18 -15g 1〇(TC above 15g 15g 49°C 15g 1〇〇°C above 15g 173°C 15g 166°C 15g 17°C 15g 63°C 15g 56°C 15g 1〇〇°C above 150ml The separated flask was weighed and the amount of each compound as described above and the amount disclosed. The separation flask was placed in a microwave generating device and heated by irradiating microwaves at an output of 1 kW. After irradiation for 10 minutes, The microwave irradiation was stopped. After the separation flask was cooled, it was taken out from the microwave irradiation device, whereby 100 g of the nematic liquid crystal state of the TFT 1 was obtained. The resistivity of the liquid crystal composition obtained was measured and found to be 1.5 X. 1 014 Ω cm. In addition, the liquid crystal composition obtained by gas chromatography was analyzed, and the mixture was not mixed with the substance formed by the mixed compound, and no substance was observed. Decomposition of the mixed compound. The physical properties of the obtained liquid crystal composition were measured, and as a result, the desired characteristics were obtained. The liquid crystal was injected into the TFT panel and the photoelectric characteristics were measured, and as a result, the desired characteristics were obtained. In addition, used in TFT The voltage holding ratio at the time of the board is also sufficiently high. The method of the present invention can produce a high-quality liquid crystal composition in 40 minutes without requiring a large-scale apparatus. According to the results as described above, it can be understood The liquid crystal composition of Example 2 has a very high reliability. © [Comparative Example 3] The liquid crystal composition under reduced pressure is produced according to the method disclosed in Japanese Laid-Open Patent Publication No. 2002-194356. The same liquid crystal composition (TFT1) as in Example 2 was produced. The liquid crystal compound of the desired amount was weighed in an eggplant type flask. Then, the eggplant type flask was mounted on a rotary evaporator. The eggplant type flask was immersed in 50 °. C oil bath and rotate it. Slowly depressurize the rotary evaporator to 20 kPa using a vacuum pump for 5 minutes. Then, set the temperature of the oil bath to 85 ° C and heat up at 5 ° C / min. After the liquid crystal changes to a liquid state and is transparent for 30 minutes, the oil bath is changed to a water bath to be cooled. After lowering to room temperature, the rotation is stopped and the pressure is stopped. The flask is replaced with nitrogen to restore it to After the atmospheric pressure, the eggplant type flask was removed by a rotary evaporator, whereby 100 g of the nematic liquid crystal state of the TFT 1 was obtained. The resistivity of the liquid crystal composition obtained by the measurement was found to be 1.2 x 1 0 14 Ω cm. The obtained liquid crystal composition was analyzed by gas chromatography, and as a result, no substance other than the mixed compound was formed, and decomposition of the mixed compound was not observed. The physical properties of the liquid crystal composition, -17- 200930796 'The result is that we can obtain the characteristics we want. However, it has been confirmed that some of the lower molecular weight compounds have volatilized to cause a composition change. In addition, manufacturing must use a pressure reducing device or a heating device that requires large-scale equipment and requires a long manufacturing time. [Comparative Example 4] Production of a liquid crystal composition in the atmosphere The same liquid crystal composition (TFT 1) as in Example 2 was produced by the method disclosed in Japanese Laid-Open Patent Publication No. Hei. 5-105876. The eggplant type flask was weighed for the desired amount of liquid crystal compound. After placing a magnet rotor in the eggplant type flask, it was placed on a hot plate at 50 ° C, and the temperature of the hot plate was raised to 85 ° C by a surface at a rate of 5 ° C / min. The rotor is rotated to stir. After the liquid crystal was changed to a liquid state and was transparent for 30 minutes, the heating of the hot plate was stopped, and the temperature was slowly returned to room temperature. Thereby, the TFT 1 of the nematic liquid crystal state of 1 gram can be obtained. The resistivity of the obtained liquid crystal composition was measured and found to be 1.3 x 1 013 Ω cm. The liquid crystal composition obtained by gas chromatography was analyzed, and as a result, a substance other than the mixed compound appeared, and it was found that the liquid crystal compound used for constituting the liquid crystal composition had been oxidatively decomposed. When the liquid crystal upper limit point transfer temperature was measured, the result was reduced to 66.8 °c, so the deterioration of quality was large. Regarding the preparation method of Comparative Example 4, it was remarkably inferior to the examples in terms of the reliability of the obtained liquid crystal composition. [Simple description of the diagram] None. [Main component symbol description] &gt;fnr None. -18 -

Claims (1)

200930796 # 十、申請專利範圍: 1· 一種液晶組成物之製法,其特徵爲在至少一種之熔點爲高於 3 Ot之兩種以上的液晶化合物照射微波。 2.如申請專利範圍第1項之製法’其在液晶化合物之中,至少 兩種之熔點爲高於30°C ° 3 .如申請專利範圍第1項之製法,其中微波之照射時間爲1 小時以下。 4. 如申請專利範圍第1項之製法,其係在減壓下進行微波之照 © 射。 5. 如申請專利範圍第1項之製法,其係在惰性氣體大氣下進行 微波之照射。 6. 如申請專利範圍第1項之製法,其在照射微波時之溫度係在 從40°C至所製得之液晶組成物的液晶相上限溫度+50°C之 範圍。 7. 如申請專利範圍第4項之製法,其在將減壓狀態恢復至大氣 壓時係使用惰性氣體。 ❹ -19- 200930796 七、指定代表圖: (一) 本案指定代表圖為:無。 (二) 本代表圖之元件符號簡單說明: te 〇 ❹ 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: ^Ff~ 〇200930796 # X. Patent application scope: 1. A method for preparing a liquid crystal composition, characterized in that at least one liquid crystal compound having a melting point higher than 3 Ot is irradiated with microwaves. 2. The method of claim 1 of the patent application, wherein at least two of the liquid crystal compounds have a melting point higher than 30 ° C ° 3 , as in the method of claim 1 of the patent application, wherein the irradiation time of the microwave is 1 Less than an hour. 4. For the production method of the first paragraph of the patent application, it is subjected to microwave irradiation under reduced pressure. 5. For the production method of the first paragraph of the patent application, it is irradiated by microwave under an inert gas atmosphere. 6. The method of claim 1, wherein the temperature at which the microwave is irradiated is in a range from 40 ° C to a liquid crystal phase upper limit temperature of the obtained liquid crystal composition + 50 ° C. 7. In the case of the method of claim 4, an inert gas is used in returning the reduced pressure to atmospheric pressure. ❹ -19- 200930796 VII. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: te 〇 八 8. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: ^Ff~ 〇
TW097141721A 2007-10-31 2008-10-30 Method of producing liquid crystal composition TWI392725B (en)

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