KR20100070311A - Method for producing liquid crystal composition - Google Patents

Method for producing liquid crystal composition Download PDF

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KR20100070311A
KR20100070311A KR1020097021877A KR20097021877A KR20100070311A KR 20100070311 A KR20100070311 A KR 20100070311A KR 1020097021877 A KR1020097021877 A KR 1020097021877A KR 20097021877 A KR20097021877 A KR 20097021877A KR 20100070311 A KR20100070311 A KR 20100070311A
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liquid crystal
crystal composition
manufacturing
compound
microwave
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KR101441470B1 (en
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가즈키 구리사와
마사카즈 가네오야
구니히코 고타니
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디아이씨 가부시끼가이샤
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    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/42Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40
    • C09K19/46Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40 containing esters
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    • C09K19/02Liquid crystal materials characterised by optical, electrical or physical properties of the components, in general
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    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/14Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain
    • C09K19/18Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a carbon chain the chain containing carbon-to-carbon triple bonds, e.g. tolans
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    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/10Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings
    • C09K19/20Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers
    • C09K19/2007Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing at least two benzene rings linked by a chain containing carbon and oxygen atoms as chain links, e.g. esters or ethers the chain containing -COO- or -OCO- groups
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    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/30Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
    • C09K19/3001Cyclohexane rings
    • C09K19/3059Cyclohexane rings in which at least two rings are linked by a carbon chain containing carbon to carbon triple bonds
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    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/06Non-steroidal liquid crystal compounds
    • C09K19/08Non-steroidal liquid crystal compounds containing at least two non-condensed rings
    • C09K19/30Non-steroidal liquid crystal compounds containing at least two non-condensed rings containing saturated or unsaturated non-aromatic rings, e.g. cyclohexane rings
    • C09K19/3001Cyclohexane rings
    • C09K19/3066Cyclohexane rings in which the rings are linked by a chain containing carbon and oxygen atoms, e.g. esters or ethers
    • C09K19/3068Cyclohexane rings in which the rings are linked by a chain containing carbon and oxygen atoms, e.g. esters or ethers chain containing -COO- or -OCO- groups

Abstract

Disclosed is a method for producing a liquid crystal composition which is useful as a constituting member of a liquid crystal display device. This method for producing a liquid crystal composition is characterized in that two or more kinds of liquid crystal compounds, at least one of which has a melting point higher than 30°C, are irradiated with a microwave. This method for producing a liquid crystal composition enables to efficiently produce a liquid crystal composition wherein two or more kinds of liquid crystal compounds are mixed in a short time. A liquid crystal composition produced by this method has high reliability from the viewpoint of specific resistance.

Description

액정 조성물의 제조 방법{METHOD FOR PRODUCING LIQUID CRYSTAL COMPOSITION}Manufacturing method of liquid crystal composition {METHOD FOR PRODUCING LIQUID CRYSTAL COMPOSITION}

본 발명은, 액정 표시 소자의 구성 부재로서 유용한 액정 조성물의 제조 방법에 관한 것이다.This invention relates to the manufacturing method of the liquid crystal composition useful as a structural member of a liquid crystal display element.

액정 표시 소자는, 시계, 전자 계산기를 비롯하여, 각종 측정 기기, 자동차용 패널, 워드프로세서, 전자 수첩, 프린터, 컴퓨터, 텔레비전 등에 사용되도록 되어 있다. 액정 표시 방식으로서는, 그 대표적인 것으로 TN(트위스티드 네마틱)형, STN(수퍼 트위스티드 네마틱)형, DS(동적 광산란)형, GH(게스트·호스트)형 혹은 고속 응답이 가능한 FLC(강유전성 액정) 등을 들 수 있다. 또한 구동 방식으로서도 종래의 스태틱 구동으로부터 멀티플렉스 구동이 일반적으로 되고, 또한 단순 매트릭스 방식, 최근에는 액티브 매트릭스 방식이 실용화되고 있다.The liquid crystal display element is used for clocks, electronic calculators, various measuring instruments, automobile panels, word processors, electronic notebooks, printers, computers, televisions, and the like. Typical examples of the liquid crystal display include TN (twisted nematic) type, STN (super twisted nematic) type, DS (dynamic light scattering) type, GH (guest host) type or FLC (ferroelectric liquid crystal) capable of fast response. Can be mentioned. Moreover, as a drive system, multiplex drive is generally used from the conventional static drive, and the simple matrix system and the active matrix system have been put to practical use in recent years.

이들에 사용되는 액정 조성물은, 통상 2종류 이상의 화합물을 혼합하여 만들 수 있고, 액정 조성물의 물성(네마틱상 온도 범위, 굴절률 이방성(Δn), 유전율 이방성(Δε), 점도, 탄성 정수 등)이나 전기 광학적 특성(응답 시간, 역치 전압, V-T 곡선의 급준성(急峻性) 등)을 목적으로 하는 액정 소자의 표시 방식이나 구동 방식에 따라, 여러가지 값에 맞추기 위해서 혼합비가 결정되어 있지만, 대부분의 경 우에 대해 열, 광, 수분 등에 대한 신뢰성이 높은 것이 필요하다. 또한, 특히 액티브 매트릭스 구동 방식의 경우에는 그것에 더하여, 전압 유지율(VHR)이 충분히 높은 것이 중요하다. 액정 조성물의 신뢰성, 비저항 및 전압 유지율(VHR)을 높이기 위해서는, 조성물을 구성하는 개개의 액정 화합물의 각각에 대해 높은 신뢰성과 전압 유지율(VHR)이 달성되어 있을 필요가 있다. 그러나, 신뢰성, 비저항 및 전압 유지율(VHR)이 높은 액정 화합물을 사용해도, 그들의 혼합물인 액정 조성물을 제조할 때에 품질을 열화시켜 버리는 경우가 있다.The liquid crystal composition used for these can be normally made by mixing two or more types of compounds, and the physical properties (nematic phase temperature range, refractive index anisotropy (Δn), dielectric anisotropy (Δε), viscosity, elastic constant, etc.) of the liquid crystal composition and electrical Depending on the display method and the driving method of the liquid crystal device for the purpose of optical characteristics (response time, threshold voltage, steepness of the VT curve, etc.), the mixing ratio is determined to match various values, but in most cases It is necessary to have high reliability for heat, light, moisture, and the like. In addition, especially in the case of the active matrix driving method, it is important that the voltage holding ratio VHR is sufficiently high. In order to increase the reliability, specific resistance, and voltage retention (VHR) of the liquid crystal composition, high reliability and voltage retention (VHR) need to be achieved for each of the individual liquid crystal compounds constituting the composition. However, even when a liquid crystal compound having high reliability, specific resistance and voltage retention (VHR) is used, the quality may be deteriorated when the liquid crystal composition which is a mixture thereof is produced.

액정 조성물의 제조 방법으로서는, 가열에 의한 용해 혼합이나, 유기 용제에 액정 화합물을 용해시켜 혼합 후, 유기 용제를 제거시키는 방법이 제안되어 있다(특허문헌 1 참조). 그러나, 이들에 제안되어 있는 방법에서는, 품질을 열화시켜 버리는 경우가 많다. 예를 들면 가열에 의한 용해 혼합에서는, 가열시에 산소에 의해 액정 화합물이 산화 분해해 버려 액정 조성물의 비저항이나 전압 유지율(VHR)을 현저하게 저하시켜 버린다. 또한 액정 상한 전이 온도를 저하시켜, 액정 조성물의 물성이나 전기 광학 특성을 변화시켜 버리는 경우가 있다. 또한 유기 용제에 용해시키는 방법에서는, 유기 용제의 불순물이나 도펀트에 의해 액정 조성물의 비저항이나 전압 유지율(VHR)이 현저하게 저하하는 경우가 있다. 또한 유기 용제가 완전히 제거되지 않고 잔류해 버림과 동시에 액정 조성물의 비저항을 저하시키거나, 전압 유지율을 현저하게 저하시키는 원인이 된다. 한편, 감압 상태에서 비교적 저온으로 가열하는 것에 의한 제조 방법도 제안되어 있고, 낮은 저항값을 갖는 액정 조성물의 제조에 대해 개시되어 있다(특허문헌 2 참조). 그러나, 당해 인용 문헌 기재의 방법은 비교적 낮은 온도에서 제조가 가능하지만 가열이 필요하여, 가열에 의한 악영향을 완전하게 배제할 수는 없고, 가열에 수반하는 설비도 필요하다.As a manufacturing method of a liquid crystal composition, the method of melt-mixing by heating, and the method of removing an organic solvent after melt | dissolving and mixing a liquid crystal compound in the organic solvent is proposed (refer patent document 1). However, in the methods proposed to these, quality often deteriorates. For example, in dissolution mixing by heating, the liquid crystal compound is oxidatively decomposed by oxygen at the time of heating, thereby significantly lowering the specific resistance and voltage retention (VHR) of the liquid crystal composition. Moreover, liquid crystal upper limit transition temperature may be reduced and the physical property and electro-optical characteristic of a liquid crystal composition may be changed. Moreover, in the method of making it melt | dissolve in an organic solvent, the specific resistance and voltage retention (VHR) of a liquid crystal composition may fall remarkably by the impurity and dopant of an organic solvent. In addition, the organic solvent remains without being completely removed, and at the same time, it causes the specific resistance of the liquid crystal composition to be lowered or the voltage retention is significantly lowered. On the other hand, the manufacturing method by heating to comparatively low temperature in a pressure reduction state is also proposed, and it is disclosed about manufacture of the liquid crystal composition which has a low resistance value (refer patent document 2). However, the method described in the cited document can be manufactured at a relatively low temperature, but heating is required, and thus adverse effects due to heating cannot be completely excluded, and a facility accompanying heating is also required.

또한, 당해 인용문헌 기재의 방법은 감압에 수반하는 대규모 장치가 필요하게 되는 문제점을 갖고 있다. 즉, 감압하면서 액정 화합물을 용해하기 위해서는 감압에 견디는 용기가 필요하게 되고, 제조 장치는 필연적으로 감압에 견디도록 대규모의 것이 된다. 또, 감압은 일반적으로 진공 펌프를 사용하는 것이 일반적이지만, 진공 펌프에 사용되는 오일 미스트의 역류를 막기 위한 트랩, 트랩을 냉각하기 위한 냉각 장치도 부수하는 설비로서 필요하다. 이와 같이, 감압 하에 액정 조성물을 제조하는 것은 설비의 비대화를 초래하고, 증대하는 액정 조성물의 수요에 대응하기 위해서 과대한 투자가 부득이하다.In addition, the method described in the cited document has a problem that a large-scale device with a reduced pressure is required. That is, in order to melt | dissolve a liquid crystal compound, while reducing pressure, the container which endures pressure reduction is needed, and a manufacturing apparatus becomes a large-scale thing necessarily to endure pressure reduction. Moreover, although pressure reduction generally uses a vacuum pump, it is necessary as a facility which also attaches the trap for preventing the backflow of the oil mist used for a vacuum pump, and the cooling apparatus for cooling a trap. As described above, manufacturing the liquid crystal composition under reduced pressure causes an increase in equipment, and excessive investment is inevitable in order to respond to the increasing demand for the liquid crystal composition.

이상과 같이, 고품위의 액정 조성물을 보다 간소한 설비로, 효율적으로 제조하는 방법의 개발이 요망되고 있었다.As mentioned above, development of the method of manufacturing a high quality liquid crystal composition with a simpler facility efficiently was desired.

특허문헌 1 : 일본 특개평5-105876호 공보(5페이지 우란)Patent Document 1: Japanese Patent Application Laid-Open No. 5-105876 (Uran, page 5)

특허문헌 2 : 일본 특개2002-194356호 공보(4페이지 실시예)Patent Document 2: Japanese Patent Application Laid-Open No. 2002-194356 (Example 4 pages)

[발명의 개시][Initiation of invention]

[발명이 해결하고자 하는 과제][Problem to Solve Invention]

본원 발명이 해결하고자 하는 과제는, 2종 이상의 액정 화합물을 혼합하여 이루어지는 액정 조성물의 제조에 있어서, 제조되는 액정 조성물의 신뢰성이 높고, 효율적으로 제조할 수 있는 방법을 제공하는 것에 있다.The problem to be solved by the present invention is to provide a method of producing a liquid crystal composition obtained by mixing two or more liquid crystal compounds, which is highly reliable and can be efficiently manufactured.

[과제를 해결하기 위한 수단][Means for solving the problem]

상기 과제의 해결에 대해 본원 발명자들은 예의 검토한 결과, 본원 발명의 완성에 이르렀다. 본원 발명은, 적어도 1종의 융점이 30℃보다 큰 2종 이상의 액정 화합물에 마이크로파를 조사하는 것을 특징으로 하는 액정 조성물의 제조 방법을 제공한다.MEANS TO SOLVE THE PROBLEM As a result of earnestly examining about the said subject, the present inventors completed the present invention. This invention provides the manufacturing method of the liquid crystal composition characterized by irradiating a microwave to 2 or more types of liquid crystal compounds in which at least 1 type of melting | fusing point is larger than 30 degreeC.

[발명의 효과][Effects of the Invention]

본 발명의 제조 방법은, 감압 장치, 가열 장치 등의 대규모 설비를 요하지 않고, 신뢰성이 높은 고품위의 액정 조성물을 제조하는 것이 가능하다. 즉, 비저항의 저하를 억제하여, 불순물의 생성이 적고, 물성값의 변동이 적은, 높은 신뢰성이 요구되고 있는 액정 조성물의 제조에 매우 실용적이다.The manufacturing method of this invention does not require large-scale installations, such as a pressure reduction device and a heating device, and can manufacture highly reliable liquid crystal composition of high quality. That is, it is very practical for the manufacture of the liquid crystal composition which suppresses the fall of specific resistance, produces | generates the impurity, and requires high reliability with little change of a physical property value.

[발명을 실시하기 위한 최량의 형태]BEST MODE FOR CARRYING OUT THE INVENTION [

이하에 본 발명의 일례에 대해 설명한다.An example of the present invention will be described below.

본원 발명의 제조 방법은, 유기 용매 등의 용제를 사용하지 않고, 적어도 1종의 융점이 30℃보다 큰 2종 이상의 액정 화합물을 함유하는 액정 화합물에 마이크로파를 조사함으로써, 효율적으로 액정 조성물을 제조하는 것이다. 특히, 2종의 융점이 30℃보다 큰 2종 이상의 액정 화합물을 사용한 액정 조성물의 제조에 유효하며, 5종 이상의 융점이 30℃보다 큰 2종 이상의 액정 화합물을 사용한 액정 조성물의 제조에 더욱 유효하다.The production method of the present invention efficiently produces a liquid crystal composition by irradiating microwaves to a liquid crystal compound containing two or more liquid crystal compounds having at least one melting point greater than 30 ° C. without using a solvent such as an organic solvent. will be. In particular, it is effective for manufacture of the liquid crystal composition using 2 or more types of liquid crystal compounds with two types of melting | fusing points larger than 30 degreeC, and is more effective for manufacture of the liquid crystal composition using two or more types of liquid crystal compounds with 5 or more types of melting points larger than 30 degreeC. .

융점이 30℃ 이상의 화합물의 함유율은, 60% 이상이 바람직하고, 70% 이상이 보다 바람직하고, 80% 이상이 특히 바람직하다.60% or more is preferable, as for the content rate of a compound whose melting | fusing point is 30 degreeC or more, 70% or more is more preferable, 80% or more is especially preferable.

액정 조성물에는 액정 화합물 이외의 첨가제를 함유하고 있어도 좋다. 첨가제로서는, 산화 방지제, 자외선 흡수제, 대전 방지제, 계면활성제 등이 사용 가능하다. 또, 액정성 또는 비액정성의 광학 활성 화합물을 함유하고 있어도 좋다. 액정 골격을 갖지 않는 화합물은 첨가량이 너무 많으면 액정의 특성에 악영향을 미치기 때문에, 액정 골격을 갖지 않는 화합물을 첨가하는 경우 합계로 5% 이하의 함유율이 바람직하고, 3% 이하가 보다 바람직하고, 1% 이하가 특히 바람직하다.The liquid crystal composition may contain additives other than liquid crystal compounds. As an additive, antioxidant, a ultraviolet absorber, an antistatic agent, surfactant, etc. can be used. Moreover, you may contain the liquid crystalline or non-liquid crystalline optically active compound. Since the compound which does not have a liquid crystal frame | skeleton has a bad influence on the characteristic of a liquid crystal, if the addition amount is too large, when adding a compound which does not have a liquid crystal frame | skeleton, the content rate of 5% or less in total is preferable, 3% or less is more preferable, 1 % Or less is particularly preferable.

마이크로파의 조사 시간은, 1시간 이하인 것이 바람직하고, 30분 이하인 것이 보다 바람직하다. 마이크로파 조사시의 온도는 너무 높으면 제조되는 조성물의 품질이 저하하고, 너무 낮으면 제조에 시간이 걸리기 때문에 최적의 온도가 있다. 따라서, 40℃로부터, 제조되는 액정 조성물의 액정상 상한 온도+50℃의 범위인 것이 바람직하고, +30℃의 범위인 것이 보다 바람직하다.It is preferable that it is 1 hour or less, and, as for the irradiation time of a microwave, it is more preferable that it is 30 minutes or less. If the temperature at the time of microwave irradiation is too high, the quality of the composition to be produced is deteriorated, and if too low, the production takes time, so there is an optimum temperature. Therefore, it is preferable that it is the range of the liquid-crystal upper limit temperature +50 degreeC of the liquid crystal composition manufactured from 40 degreeC, and it is more preferable that it is the range of +30 degreeC.

사용하는 마이크로파의 주파수는, 300MHz 이상 3THz 이하가 바람직하고, 500MHz 이상이 보다 바람직하다. 조사 강도는, 100W 이상이 바람직하고, 1kW 이상이 보다 바람직하다.300 MHz or more and 3 THz or less are preferable, and, as for the frequency of the microwave used, 500 MHz or more is more preferable. 100 W or more is preferable and 1 kW or more of irradiation intensity is more preferable.

본원 발명의 제조 방법은, 낮은 온도에서 액정 조성물의 제조가 가능하기 때문에, 통상의 대기 분위기 하에서도 고품위의 액정 조성물을 제조하는 것이 가능하다. 그러나, 보다 고품위의 액정 조성물을 제조하기 위해서, 마이크로파의 조사를 밀폐 조건 하에서 행하는 것이 바람직하고, 불활성 가스 분위기 하에서 행하는 것이 보다 바람직하다. 불활성 가스로서는, 헬륨, 네온, 아르곤 등의 희(希)가스, 질소 가스 등을 호적(好適)하게 사용할 수 있다.Since the manufacturing method of this invention can manufacture a liquid crystal composition at low temperature, it is possible to manufacture a high quality liquid crystal composition also under normal atmospheric atmosphere. However, in order to manufacture a higher quality liquid crystal composition, it is preferable to perform microwave irradiation under sealed conditions, and it is more preferable to carry out in inert gas atmosphere. As an inert gas, rare gases, such as helium, neon, argon, nitrogen gas, etc. can be used suitably.

본원 발명의 제조 방법은 감압 수단을 사용할 필요는 없지만, 제조하는 조성물을 감압 상태에서도 적용하는 것이 가능하다.Although the manufacturing method of this invention does not need to use a pressure reduction means, it is possible to apply the composition to manufacture also in a reduced pressure state.

본원 발명의 제조 방법으로 제조하는 액정 조성물에 특별히 제한은 없지만, 감압 하에서 제조한 경우에 있어서는, 휘발하는, 비교적 분자량이 작은 액정 화합물을 대량으로 함유하는 액정 조성물의 제조가 특히 바람직하다.Although there is no restriction | limiting in particular in the liquid crystal composition manufactured by the manufacturing method of this invention, When manufacturing under reduced pressure, manufacture of the liquid crystal composition containing a large amount of volatilized comparatively small molecular weight compounds is especially preferable.

액정 화합물의 분자량으로서는, 300 이하의 화합물을 함유하는 것이 바람직하고, 250 이하의 화합물을 함유하는 것이 보다 바람직하다.As a molecular weight of a liquid crystal compound, it is preferable to contain a compound of 300 or less, and it is more preferable to contain a compound of 250 or less.

보다 효율적으로 액정 조성물을 제조하기 위해서는, 구성되는 액정 분자의 분극에 치우침이 있는 것이 바람직하다. 구체적으로는, 구성되는 액정 화합물에 특정한 구조 또는 관능기를 갖고 있는 경우보다 효율적인 제조가 가능하게 된다. 바람직한 구조로서는, 액정 화합물의 분자 중에 적어도 하나의 방향환을 갖고 있는 것이 바람직하다. 또, 바람직한 관능기로서는, 할로겐, 시아노기 등의 전자 흡인성의 관능기가 바람직하고, 이들 관능기를 분자 중에 갖고 있는 화합물이 바람직하고, 방향환에 상기 전자 흡인성 관능기를 갖고 있는 화합물이 보다 바람직하다.In order to manufacture a liquid crystal composition more efficiently, it is preferable that the polarization of the liquid crystal molecule comprised is biased. Specifically, more efficient manufacture becomes possible when it has a specific structure or a functional group in the liquid crystal compound comprised. As a preferable structure, what has at least 1 aromatic ring in the molecule | numerator of a liquid crystal compound is preferable. Moreover, as a preferable functional group, electron withdrawing functional groups, such as a halogen and a cyano group, are preferable, the compound which has these functional groups in a molecule is preferable, and the compound which has the said electron withdrawing functional group in an aromatic ring is more preferable.

구성되는 화합물로서는 구체적으로는, 일반식(I)으로 표시되는 화합물이 바람직하다.As a compound comprised, the compound specifically, represented by General formula (I) is preferable.

Figure 112009064158085-PCT00001
Figure 112009064158085-PCT00001

(식 중, R1 및 R2는, 각각 독립적으로 불소 치환되어 있어도 좋은 탄소 원자수 1∼16의 알킬기, 탄소 원자수 1∼16의 알콕시기, 탄소 원자수 2∼16의 알케닐기, 탄소 원자수 3∼16의 알케닐옥시기, 불소 원자, 염소 원자 또는 시아노기를 나타내고, A, B 및 C는, 각각 독립적으로 1,4-페닐렌기, 2 또는 3-플루오로-1,4-페닐렌기, 2,3-디플루오로-1,4-페닐렌기, 3,5-디플루오로-1,4-페닐렌기, 2 또는 3-클로로-1,4-페닐렌기, 2,3-디클로로-1,4-페닐렌기, 3,5-디클로로-1,4-페닐렌기, 2-메틸-1,4-페닐렌기, 3-메틸-1,4-페닐렌기, 나프탈렌-2,6-디일기, 페난트렌-2,7-디일기, 플루오렌-2,7-디일기, 트랜스-1,4-시클로헥실렌기, 1,2,3,4-테트라히드로나프탈렌-2,6-디일기, 데카히드로나프탈렌-2,6-디일기, 트랜스-1,3-디옥산-2,5-디일기, 피리딘-2,5-디일기, 피리미딘-2,5-디일기, 피라진-2,5-디일기 또는 피리다진-2,5-디일기를 나타내고, 이들 기는 또한 1∼3의 불소 원자에 의해 치환되어 있어도 좋고, m은 0, 1 또는 2를 나타내고, Z1 및 Z2는 각각 독립적으로 단결합, -CH2CH2-, -(CH2)4-, -OCH2-, -CH2O-, -COO-, -CH=CH-, -CF=CF-, -CH=N-N=CH- 또는 -C≡C-를 나타낸다. 단, m이 2의 경우, 2개의 Z2 및 C는, 각각 독립적으로 동일해도 좋고, 달라도 좋다)(In formula, R <1> and R <2> is a C1-C16 alkyl group, C1-C16 alkoxy group, C2-C16 alkenyl group, and carbon atom which may each independently be fluorine-substituted. An alkenyloxy group, a fluorine atom, a chlorine atom or a cyano group is selected. A, B and C each independently represent a 1,4-phenylene group, a 2 or 3-fluoro-1,4-phenylene group. , 2,3-difluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2 or 3-chloro-1,4-phenylene group, 2,3-dichloro- 1,4-phenylene group, 3,5-dichloro-1,4-phenylene group, 2-methyl-1,4-phenylene group, 3-methyl-1,4-phenylene group, naphthalene-2,6-diyl group , Phenanthrene-2,7-diyl group, fluorene-2,7-diyl group, trans-1,4-cyclohexylene group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group , Decahydronaphthalene-2,6-diyl group, trans-1,3-dioxane-2,5-diyl group, pyridine-2,5-diyl group, pyrimidine-2,5-diyl group, pyrazine-2 5-diyl or Li Minced represents a 2,5-diyl group, these groups may also be substituted by fluorine atoms of 1~3, m denotes 0, 1 or 2, Z 1 and Z 2 is a single bond, each independently, -CH 2 CH 2 -,-(CH 2 ) 4- , -OCH 2- , -CH 2 O-, -COO-, -CH = CH-, -CF = CF-, -CH = NN = CH- or -C≡C-, provided that when m is 2, two Z 2 and C may be the same independently or different)

일반식(I)에 있어서, A, B 및 C의 적어도 하나가 방향환인 것이 바람직하고, 1,4-페닐렌기, 2 또는 3-플루오로-1,4-페닐렌기, 2,3-디플루오로-1,4-페닐렌기, 3,5-디플루오로-1,4-페닐렌기, 2 또는 3-클로로-1,4-페닐렌기, 2,3-디클로로-1,4-페닐렌기, 3,5-디클로로-1,4-페닐렌기, 2-메틸-1,4-페닐렌기, 3-메틸-1,4-페닐렌기, 나프탈렌-2,6-디일기, 페난트렌-2,7-디일기, 플루오렌-2,7-디일기, 1,2,3,4-테 트라히드로나프탈렌-2,6-디일기, 피리딘-2,5-디일기, 피리미딘-2,5-디일기, 피라진-2,5-디일기 또는 피리다진-2,5-디일기가 보다 바람직하고, 1,4-페닐렌기, 2 또는 3-플루오로-1,4-페닐렌기, 2,3-디플루오로-1,4-페닐렌기, 3,5-디플루오로-1,4-페닐렌기가 특히 바람직하다.In general formula (I), it is preferable that at least 1 of A, B, and C is an aromatic ring, and it is a 1, 4- phenylene group, 2 or 3-fluoro- 1, 4- phenylene group, 2, 3- difluoro Rho-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2 or 3-chloro-1,4-phenylene group, 2,3-dichloro-1,4-phenylene group, 3,5-dichloro-1,4-phenylene group, 2-methyl-1,4-phenylene group, 3-methyl-1,4-phenylene group, naphthalene-2,6-diyl group, phenanthrene-2,7 -Diyl group, fluorene-2,7-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, pyridine-2,5-diyl group, pyrimidine-2,5- Diyl group, pyrazine-2,5-diyl group or pyridazine-2,5-diyl group are more preferable, A 1, 4- phenylene group, 2 or 3-fluoro- 1, 4- phenylene group, 2, 3 -Difluoro-1,4-phenylene group and 3,5-difluoro-1,4-phenylene group are particularly preferable.

R1 및 R2는, 한쪽이 불소 원자, 염소 원자 또는 시아노기를 나타내고, 다른 한쪽이 탄소 원자수 1∼16의 알킬기, 탄소 원자수 1∼16의 알콕시기, 탄소 원자수 2∼16의 알케닐기, 탄소 원자수 3∼16의 알케닐옥시기를 나타내는 화합물이 바람직하다.R 1 and R 2 each represent a fluorine atom, a chlorine atom or a cyano group, and the other represents an alkyl group having 1 to 16 carbon atoms, an alkoxy group having 1 to 16 carbon atoms, and an alke having 2 to 16 carbon atoms. Preference is given to compounds which show a nil group and an alkenyloxy group having 3 to 16 carbon atoms.

본원 발명의 제조 방법에 의해 TFT용 액정 조성물을 제조하는 경우, 일반식(I)으로 표시되는 화합물에 있어서, R1 및 R2는 각각 독립적으로 불소 원자, 탄소 원자수 1∼16의 알킬기 또는 탄소 원자수 2∼16의 알케닐기를 나타내는 화합물이 바람직하다. 이 경우, 얻어진 액정 조성물은 높은 전압 유지율을 갖는다.When manufacturing the liquid crystal composition for TFT by the manufacturing method of this invention, in the compound represented by general formula (I), R <1> and R <2> are respectively independently a fluorine atom, a C1-C16 alkyl group, or carbon Preference is given to compounds which represent alkenyl groups having 2 to 16 atoms. In this case, the obtained liquid crystal composition has a high voltage retention.

이하, 실시예를 들어 본 발명을 더욱 상술하지만, 본 발명은 이들 실시예에 한정되는 것은 아니다. 또한, 이하의 실시예 및 비교예의 조성물에 있어서의 「%」는 『질량%』를 의미한다.Hereinafter, although an Example is given and this invention is further explained, this invention is not limited to these Examples. In addition, "%" in the composition of the following example and a comparative example means "mass%."

마이크로파의 조사는 후지덴파고기사제의 마이크로파 조사 장치(특별 주문품)를 사용하여 행했다(고주파 출력 : 6kW, 발진 주파수 : 2450MHz±50MHz). 제작한 액정 조성물의 분석에는 이하의 장치를 사용했다.Microwave irradiation was performed using a microwave irradiation device (special order product) made by Fuji Denpago Co., Ltd. (high frequency output: 6 kW, oscillation frequency: 2450 MHz ± 50 MHz). The following apparatus was used for the analysis of the produced liquid crystal composition.

가스 크로마토그래피 : HEWLETT-PACKARD사제 HP6890Gas chromatography: HP6890 from HEWLETT-PACKARD

신뢰성의 확인에는 액정 조성물의 비저항을 측정, 가스 크로마토그래피에 의한 불순물의 생성 및 배합한 화합물의 분해의 확인, 전압 유지율이나 전류값, 물성값의 측정에 의해 행했다.Reliability was confirmed by measuring the specific resistance of the liquid crystal composition, confirming the generation of impurities by gas chromatography and decomposition of the compound to be blended, measurement of voltage retention, current value, and physical property value.

(실시예1) 액정 조성물의 제조Example 1 Preparation of Liquid Crystal Composition

이하의 화합물에 의해 구성되는, 액정 조성물(STN1, 액정 상한 온도 95.1℃)의 제조를 행했다.The liquid crystal composition (STN1, liquid crystal upper limit temperature 95.1 degreeC) comprised with the following compounds was manufactured.

Figure 112009064158085-PCT00002
Figure 112009064158085-PCT00002

용량 150ml의 세퍼러블 플라스크에, 상기 각 화합물을 기재한 양 계량했다. 이 세퍼러블 플라스크를 마이크로파 발생 장치에 셋팅하고, 1kW의 출력으로 마이크로파를 조사하여 가열했다. 10분 조사 후, 마이크로파의 조사를 정지하고, 세퍼러블 플라스크를 냉각하고 마이크로파 조사 장치로부터 취출하여, 네마틱 액정 상태의 STN1을 100g 얻었다.The amount of each compound described above was measured in a 150 ml separable flask. This separable flask was set in a microwave generator, and the microwaves were irradiated and heated at an output of 1 kW. After 10 minutes of irradiation, microwave irradiation was stopped, the separable flask was cooled and taken out from the microwave irradiation device to obtain 100 g of STN1 in the nematic liquid crystal state.

제작한 액정 조성물의 비저항을 측정하자, 1.1×1011Ωcm이었다. 또한 제작한 액정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질은 혼입·생성하지 않고, 배합한 화합물의 분해도 보이지 않았다. 제작한 액정 조성물의 물성을 측정한 바 원하는 특성이 얻어졌다. 이 액정을 STN 패널에 주입하고 전기 광학적 특성을 측정한 바 원하는 특성이 얻어졌다. 이상으로부터, 실시예1의 액정 조성물은 매우 높은 신뢰성을 갖고 있는 것이 명백하다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.1 x 10 11 Ωcm. Moreover, when the produced liquid crystal composition was analyzed by gas chromatography, the substance other than the compound which mix | blended was not mixed and produced, and the decomposition | disassembly of the compound which mix | blended was not seen, either. When the physical property of the produced liquid crystal composition was measured, the desired characteristic was obtained. The liquid crystal was injected into the STN panel, and the electro-optical characteristics were measured to obtain desired characteristics. As mentioned above, it is clear that the liquid crystal composition of Example 1 has very high reliability.

본원 발명의 제조 방법은, 대규모 설비를 필요로 하지 않고 40분 사이에 고품질의 액정 조성물의 제조가 가능하였다.The manufacturing method of this invention was able to manufacture the high quality liquid crystal composition in 40 minutes, without requiring large scale equipment.

(비교예1) 감압 하에 있어서의 액정 조성물의 제조(Comparative Example 1) Preparation of liquid crystal composition under reduced pressure

실시예1과 동일하게 액정 조성물(STN1)을 일본 특개2002-194356호 공보에 기재되어 있는 방법에 따라 제조를 행했다.In the same manner as in Example 1, a liquid crystal composition (STN1) was produced according to the method described in JP-A-2002-194356.

가지 모양 플라스크에 소정의 액정 화합물을 계량했다. 이 가지 모양 플라스크를 로터리 이베이퍼레이터에 부착했다. 가지 모양 플라스크를 50℃의 오일 배쓰(oil bath)에 침지하고, 회전시켰다. 로터리 이베이퍼레이터를 진공 펌프에 의해 5분에 걸쳐 천천히 20kPa로 감압했다. 오일 배쓰의 온도를 110℃로 설정하고 5℃/min으로 승온했다. 액정이 액체 상태로 변화하고 투명해지고 나서 30분 후, 오일 배쓰를 수욕(水浴)으로 바꾸어 냉각했다. 실온까지 내린 후, 회전을 멈추고, 감압을 정지했다. 플라스크 내를 질소 가스로 치환함으로써 대기압으로 되돌린 후, 가지 모양 플라스크를 로터리 이베이퍼레이터로부터 떼내어, 네마틱 액정 상태 의 STN1을 100g 얻었다.A predetermined liquid crystal compound was weighed into a branched flask. This branched flask was attached to a rotary evaporator. The branched flask was immersed in an oil bath at 50 ° C. and spun. The rotary evaporator was slowly depressurized to 20 kPa over 5 minutes by a vacuum pump. The temperature of the oil bath was set to 110 ° C, and the temperature was raised to 5 ° C / min. 30 minutes after the liquid crystal changed to a liquid state and became transparent, the oil bath was changed to a water bath and cooled. After falling to room temperature, the rotation was stopped and the pressure was stopped. After returning to atmospheric pressure by substituting the inside of a flask with nitrogen gas, the branched flask was removed from the rotary evaporator and 100g of STN1 of the nematic liquid crystal state was obtained.

제작한 액정 조성물의 비저항을 측정하자, 1.2×1011Ωcm이었다. 제작한 액정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질은 혼입·생성하지 않고, 배합한 화합물의 분해도 보이지 않았다. 제작한 액정 조성물의 물성을 측정한 바 원하는 특성이 얻어졌다. 그러나, 비교적 분자량이 낮은 화합물의 약간의 휘발이 확인되고, 조성이 변해 버렸다. 또, 제조에 대규모 설비를 필요로 하는 감압 장치나 가열 장치를 사용할 필요가 있는 데다, 긴 제조 시간이 필요하다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.2 x 10 11 Ωcm. When the produced liquid crystal composition was analyzed by gas chromatography, the substance other than the compound which mix | blended was not mixed and produced, and the decomposition | disassembly of the compound which mix | blended was not seen, either. When the physical property of the produced liquid crystal composition was measured, the desired characteristic was obtained. However, some volatilization of the compound with a relatively low molecular weight was confirmed, and the composition changed. In addition, it is necessary to use a pressure reduction device or a heating device that requires a large-scale facility for production, and a long production time is required.

(비교예2) 대기 하에 있어서의 액정 조성물의 제조Comparative Example 2 Preparation of Liquid Crystal Composition in Air

실시예1과 동일하게 액정 조성물(STN1)을 일본 특개평5-105876호 공보에 기재되어 있는 방법에 따라 제조를 행했다.In the same manner as in Example 1, a liquid crystal composition (STN1) was produced according to the method described in JP-A-5-105876.

가지 모양 플라스크에 소정의 액정 화합물을 계량했다. 이 가지 모양 플라스크 중에 자석식 회전자를 넣어, 50℃의 핫플레이트에 두고, 핫플레이트의 온도를 5℃/min로 110℃로 승온하면서 회전자를 회전시킴으로써 교반했다. 액정이 액체 상태로 변화하고 투명해지고 나서 30분 후 핫플레이트의 가열을 멈추고, 서서히 실온으로 되돌렸다. 네마틱 액정 상태의 STN1을 100g 얻었다.A predetermined liquid crystal compound was weighed into a branched flask. A magnetic rotor was placed in this branched flask, placed on a 50 ° C hotplate, and stirred by rotating the rotor while raising the temperature of the hotplate to 110 ° C at 5 ° C / min. After 30 minutes after the liquid crystal had changed to a liquid state and became transparent, the heating of the hot plate was stopped and gradually returned to room temperature. 100g of STN1 of the nematic liquid crystal state was obtained.

제작한 액정 조성물의 비저항을 측정하자, 1.1×109Ωcm이었다. 제작한 액정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질이 다수 출현하고 있고, 분석의 결과, 액정 조성물을 구성하는 액정 화합물이 산화 분해하 여 있음을 알 수 있었다. 액정 상한점 이전 온도를 측정하자 94.0℃로 저하하여 있고, 품질의 열화가 컸다. 비교예2의 제조 방법에 있어서는 제조한 액정 조성물의 신뢰성의 점에서 실시예에 뒤지는 것이 명백하다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.1 x 10 9 Ωcm. When the produced liquid crystal composition was analyzed by gas chromatography, many substances other than the compound compound appeared, and it turned out that the liquid crystal compound which comprises a liquid crystal composition oxidatively decomposes. When the temperature before a liquid crystal upper limit was measured, it fell to 94.0 degreeC and the quality deterioration was large. In the manufacturing method of the comparative example 2, it is clear that it is inferior to an Example from the point of reliability of the produced liquid crystal composition.

(실시예2) 액정 조성물의 제조Example 2 Preparation of Liquid Crystal Composition

이하의 화합물에 의해 구성되는, 액정 조성물(TFT1, 액정 상한 온도 68.0℃)의 제조를 행했다.The liquid crystal composition (TFT1, liquid crystal upper limit temperature 68.0 degreeC) comprised with the following compounds was manufactured.

Figure 112009064158085-PCT00003
Figure 112009064158085-PCT00003

용량 150ml의 세퍼러블 플라스크에, 상기 각 화합물을 기재한 양 계량했다. 이 세퍼러블 플라스크를 마이크로파 발생 장치에 셋팅하고, 1kW의 출력으로 마이크로파를 조사하여 가열했다. 10분 조사 후, 마이크로파의 조사를 정지하고, 세퍼러블 플라스크를 냉각하고 마이크로파 조사 장치로부터 취출하여, 네마틱 액정 상태 의 TFT1을 100g 얻었다.The amount of each compound described above was measured in a 150 ml separable flask. This separable flask was set in a microwave generator, and the microwaves were irradiated and heated at an output of 1 kW. After 10 minutes of irradiation, microwave irradiation was stopped, the separable flask was cooled, taken out from the microwave irradiation device, and 100 g of TFT1 in a nematic liquid crystal state was obtained.

제작한 액정 조성물의 비저항을 측정하자, 1.5×1014Ωcm이었다. 또한 제작한 액정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질은 혼입·생성하지 않고, 배합한 화합물의 분해도 보이지 않았다. 제작한 액정 조성물의 물성을 측정한 바 원하는 특성이 얻어졌다. 이 액정을 TFT 패널에 주입하고 전기 광학적 특성을 측정한 바 원하는 특성이 얻어졌다. 또, TFT 패널에 사용한 경우의 전압 유지율도 충분히 높은 것이었다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.5 x 10 14 Ωcm. Moreover, when the produced liquid crystal composition was analyzed by gas chromatography, the substance other than the compound which mix | blended was not mixed and produced, and the decomposition | disassembly of the compound which mix | blended was not seen, either. When the physical property of the produced liquid crystal composition was measured, the desired characteristic was obtained. The desired characteristic was obtained when this liquid crystal was injected into TFT panel, and the electro-optical characteristic was measured. Moreover, the voltage retention in the case of using for a TFT panel was also high enough.

본원 발명의 제조 방법은, 대규모 설비를 필요로 하지 않고 40분 사이에 고품질의 액정 조성물의 제조가 가능하였다. 이상으로부터, 실시예2의 액정 조성물은 매우 높은 신뢰성을 갖고 있는 것이 명백하다.The manufacturing method of this invention was able to manufacture the high quality liquid crystal composition in 40 minutes, without requiring large scale equipment. As mentioned above, it is clear that the liquid crystal composition of Example 2 has very high reliability.

(비교예3) 감압 하에 있어서의 액정 조성물의 제조Comparative Example 3 Preparation of Liquid Crystal Composition Under reduced pressure

실시예2와 동일하게 액정 조성물(TFT1)을 일본 특개2002-194356호 공보에 기재되어 있는 방법에 따라 제조를 행했다.In the same manner as in Example 2, a liquid crystal composition (TFT1) was produced according to the method described in JP-A-2002-194356.

가지 모양 플라스크에 소정의 액정 화합물을 계량했다. 이 가지 모양 플라스크를 로터리 이베이퍼레이터에 부착했다. 가지 모양 플라스크를 50℃의 오일 배쓰에 침지하고, 회전시켰다. 로터리 이베이퍼레이터를 진공 펌프에 의해 5분에 걸쳐 천천히 20kPa로 감압했다. 오일 배쓰의 온도를 85℃로 설정하고 5℃/min으로 승온했다. 액정이 액체 상태로 변화하고 투명해지고 나서 30분 후, 오일 배쓰를 수욕으로 바꾸어 냉각했다. 실온까지 내린 후, 회전을 멈추고, 감압을 정지했다. 플라스크 내를 질소 가스로 치환함으로써 대기압으로 되돌린 후, 가지 모양 플라스크를 로터리 이베이퍼레이터로부터 떼내어, 네마틱 액정 상태의 TFT1을 100g 얻었다.A predetermined liquid crystal compound was weighed into a branched flask. This branched flask was attached to a rotary evaporator. The branched flask was immersed in an oil bath at 50 ° C. and spun. The rotary evaporator was slowly depressurized to 20 kPa over 5 minutes by a vacuum pump. The temperature of the oil bath was set to 85 degreeC, and it heated up at 5 degree-C / min. 30 minutes after the liquid crystal changed to a liquid state and became transparent, the oil bath was changed to a water bath and cooled. After falling to room temperature, the rotation was stopped and the pressure was stopped. After returning to atmospheric pressure by substituting the inside of a flask with nitrogen gas, the branched flask was removed from the rotary evaporator and 100g of TFT1 of a nematic liquid crystal state was obtained.

제작한 액정 조성물의 비저항을 측정하자, 1.2×1014Ωcm이었다. 제작한 액정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질은 혼입·생성하지 않고, 배합한 화합물의 분해도 보이지 않았다. 제작한 액정 조성물의 물성을 측정한 바 원하는 특성이 얻어졌다. 그러나, 비교적 분자량이 낮은 화합물의 약간의 휘발이 확인되어, 조성이 변해 버렸다. 또, 제조에 대규모 설비를 필요로 하는 감압 장치나 가열 장치를 사용할 필요가 있는 데다, 긴 제조 시간이 필요하다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.2 x 10 14 Ωcm. When the produced liquid crystal composition was analyzed by gas chromatography, the substance other than the compound which mix | blended was not mixed and produced, and the decomposition | disassembly of the compound which mix | blended was not seen, either. When the physical property of the produced liquid crystal composition was measured, the desired characteristic was obtained. However, some volatilization of the compound with a relatively low molecular weight was confirmed, and the composition changed. In addition, it is necessary to use a pressure reduction device or a heating device that requires a large-scale facility for production, and a long production time is required.

(비교예4) 대기 하에 있어서의 액정 조성물의 제조Comparative Example 4 Preparation of Liquid Crystal Composition in Air

실시예2와 동일하게 액정 조성물(TFT1)을 일본 특개평5-105876호 공보에 기재되어 있는 방법에 따라 제조를 행했다.In the same manner as in Example 2, a liquid crystal composition (TFT1) was produced according to the method described in JP-A-5-105876.

가지 모양 플라스크에 소정의 액정 화합물을 계량했다. 이 가지 모양 플라스크 중에 자석식 회전자를 넣어, 50℃의 핫플레이트에 두고, 핫플레이트의 온도를 5℃/min로 85℃로 승온하면서 회전자를 회전시킴으로써 교반했다. 액정이 액체 상태로 변화하고 투명해지고 나서 30분 후 핫플레이트의 가열을 멈추고, 서서히 실온으로 되돌렸다. 네마틱 액정 상태의 TFT1을 100g 얻었다.A predetermined liquid crystal compound was weighed into a branched flask. A magnetic rotor was placed in this branched flask, placed on a 50 ° C hotplate, and stirred by rotating the rotor while raising the temperature of the hotplate to 85 ° C at 5 ° C / min. After 30 minutes after the liquid crystal had changed to a liquid state and became transparent, the heating of the hot plate was stopped and gradually returned to room temperature. 100g of TFT1 of the nematic liquid crystal state was obtained.

제작한 액정 조성물의 비저항을 측정하자, 1.3×1013Ωcm이었다. 제작한 액 정 조성물을 가스 크로마토그래피로 분석한 바, 배합한 화합물 이외의 물질이 다수 출현하고 있고, 분석의 결과, 액정 조성물을 구성하는 액정 화합물이 산화 분해하여 있는 것이 알 수 있었다. 액정 상한점 이전 온도를 측정하자 66.8℃로 저하하여 있고, 품질의 열화가 컸다. 비교예4의 제조 방법에 있어서는 제조한 액정 조성물의 신뢰성의 점에서 실시예에 뒤지는 것이 명백하다.When the specific resistance of the produced liquid crystal composition was measured, it was 1.3 × 10 13 Ωcm. When the produced liquid crystal composition was analyzed by gas chromatography, many substances other than the compound compound appeared, and it turned out that the liquid crystal compound which comprises a liquid crystal composition oxidatively decomposes. When the temperature before a liquid crystal upper limit was measured, it fell to 66.8 degreeC and the quality deterioration was large. In the manufacturing method of the comparative example 4, it is clear that it is inferior to an Example by the point of reliability of the produced liquid crystal composition.

본 발명의 제조 방법은, 비저항의 저하를 억제하여, 불순물의 생성이 적고, 물성값의 변동이 적은, 높은 신뢰성이 요구되고 있는 액정 조성물의 제조에 매우 실용적이다.The manufacturing method of this invention suppresses the fall of specific resistance, is very practical for manufacture of the liquid crystal composition in which high reliability with little generation | occurrence | production of an impurity and few fluctuation | variation of a physical property value is calculated | required.

Claims (7)

적어도 1종의 융점이 30℃보다 큰 2종 이상의 액정 화합물에 마이크로파를 조사하는 것을 특징으로 하는 액정 조성물의 제조 방법.Microwave is irradiated to 2 or more types of liquid crystal compounds with at least 1 type of melting | fusing point larger than 30 degreeC, The manufacturing method of the liquid crystal composition characterized by the above-mentioned. 제1항에 있어서,The method of claim 1, 액정 화합물 중, 적어도 2종의 융점이 30℃보다 큰 제조 방법.The manufacturing method in which at least 2 sorts of melting | fusing points are larger than 30 degreeC in a liquid crystal compound. 제1항에 있어서,The method of claim 1, 마이크로파의 조사 시간이 1시간 이하인 제조 방법.The manufacturing method whose irradiation time of a microwave is 1 hour or less. 제1항에 있어서,The method of claim 1, 마이크로파의 조사를 감압 하에 행하는 제조 방법.The manufacturing method which irradiates a microwave under reduced pressure. 제1항에 있어서,The method of claim 1, 마이크로파의 조사를 불활성 가스 분위기 하에서 행하는 제조 방법.The manufacturing method which irradiates a microwave in inert gas atmosphere. 제1항에 있어서,The method of claim 1, 마이크로파 조사시의 온도가, 40℃로부터, 제조되는 액정 조성물의 액정상 상한 온도+50℃의 범위인 제조 방법.The manufacturing method in which the temperature at the time of microwave irradiation is the range of the liquid-crystal upper limit temperature +50 degreeC of the liquid crystal composition manufactured from 40 degreeC. 제4항에 있어서,The method of claim 4, wherein 감압 상태를 대기압으로 되돌릴 때에 불활성 가스를 사용하는 제조 방법.The manufacturing method which uses an inert gas when returning a reduced pressure state to atmospheric pressure.
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