200914637 九、發明說明 【發明所屬之技術領域】 本發明有關一附件-一插件-以於灘鍍裝置中調整濺鍍 標靶及基板間之距離。藉由導入本發明之插件，此距離可 被方便地調整，而不需對該裝置進一步改變。 【先前技術】 濺鍍已成爲一公認的塗覆技術，以塗覆平面式基板， 諸如顯示玻璃片、窗玻璃片、觸控螢幕、及許多其他現代 器具。於濺鍍裝置中，待塗覆之基板被運送在濺鍍磁控管 之前面。此一濺鍍磁控管具有一原子噴灑來源之作用，藉 此標靶材料原子-吾人想要以此材料塗覆該基板-係藉由離 子自該標靶表面撞出，該等離子電加速離開一低壓氣體電 漿。該電漿被一磁場所局限，該磁場藉由與該標靶的濺鍍 側面相向地安裝之磁鐵所維持。爲了現在將提及之各種理 由，於此濺鍍製程中，該標靶及該基板間之距離係重要的 雖然原子之噴灑主要發生在一垂直於該標靶表面之方 向中，在此由於該撞出製程之隨機本質格外地有角度散佈 。爲了保證該塗層之均勻性，其係因此得當的是使該標靶 延伸超過該基板之邊緣達該標靶至基板距離的至少兩倍。 因此，較大之標靶至基板距離在該等邊緣導致一增加之溢 出。一增加溢出亦自動地暗含一較低之總塗覆速度。另外 ，對於與一撞出標靶原子之氣體原子在其至該基板的路徑 -4- 200914637 上之撞擊，一較大之標靶至基板距離含有一較高或然率， 又引導至一較低之塗覆效率。有時候在此需要具有延伸直 至該基板之磁場線，以微調該塗層之性質。當這係需要時 ，特別之磁鐵列陣被使用，其產生進一步延伸之磁場。因 一磁場之強度隨著該距離急遽地下降-其係一偶極場-此所 謂延伸該磁場線的‘不平衡磁控管’之可能性係相當受限 於距離。在該情況下，其可爲有助於整個移動該磁控管較 接近於該基板，以致該經塗覆之基板來至在該磁場線的影 響之下。 該標靶至基板距離亦影響該基板之溫度：因該標靶由 於該等氣體離子之撞擊傾向於變得非常熱（且因此必須被 冷卻），該熱輻射將加熱該基板。有時候，這可爲有助於 在該製程中例如改善黏附力或該塗層中之第二反應，但其 對於該基板亦可爲有害的，譬如當該基板具有一低軟化點 時。在該情況下，其可爲需要增加該距離。 同樣地，其可爲感興趣的是增加該標靶至基板之距離 ，以便限制電弧在該標靶基板之撞擊。發生在被濺鍍及未 被濺鍍區域間之標靶表面上的電弧-電火花可賦予足夠能 量，以射出較大片之標靶材料朝向該基板。當這太接近該 基板發生時，這可導致該塗層中之瑕疵。 因此，能夠調整該標靶至基板距離之需求已總是存在 於濺鍍裝置中。當用於靜止不動、平面式塗覆機-諸如用 於該電子工業，以塗覆具有200或300毫米直徑之晶圓-時，該標靶至基板距離之調整係相當直接的，於大面積塗 -5- 200914637 覆機中延伸超過4公尺寬度的轉動、管狀標靶之案例中， 其係遠較困難的。 藉由提供呈轉動細管之形式的標靶材料使標靶材料餵 入該電漿，其中在該標靶材料之表面維持一靜止不動、修 長磁場之主意，係首先敘述在歸屬於McKelvey的一系列 美國專利（4356073 、 4422916 、 4443318 、 4445997 、 4466877)中。具有較大庫存之材料、較佳冷卻與及較佳 製程控制的優點勝過以增加的複雜性安裝標靶之缺點。實 際上，一高電流必需餵入至該標靶，以維持該電漿，這轉 而使其需要藉著一循環進出該標靶之冷卻劑冷卻該標靶， 同時其係於一必需保持靜止不動的磁性列陣之前面旋轉， 且這全部同時維持真空完整性。 根本上二競爭之設計已經自此基本槪念顯現。 首先，在此有冷卻劑進、冷卻劑出、電流及來自單一 軸承外殻之原動力的餵入該靶管之必要性的解決方法，該 外殼被稱爲‘端塊’，並安裝在該真空室之壁面上。於此 案例中，該標靶軸係大致上垂直於該端塊被安裝之壁面。 這係已知爲該懸臂式安裝（US 4549885、US 4519885、 US 5200049、US 2004/1 40208、WO 2006/023 25 7 )。一在 相向於該端塊之標靶端部的小機械式支座可爲需要的，以 於操作期間提供機械式支撐。對於該端塊至該壁面之安裝 螺絲，藉由提供修長凹槽，該標靶至基板距離可被相當輕 易地調整。 其次，在此對於二端塊上方之標靶有分配該必要性之 -6- 200914637 解決方法，該二端塊位在該標靶之任一端部。於此案例中 ，安裝該標靶，使其軸心平行於該等端塊被安裝之壁面。 該等端塊接著係直角型。進一步發展之範例被敘述於美國 專利 us 4422916、US 44459975、US 5096562、US 6736948 、世界專利WO 2006/007504中。在此第二解決方法內， 二設計流派已經顯現，即一流派，其中該等端塊係附接至 該壁面之盒件，其中該盒件之內部保持可由該壁面之大氣 側面達到及可看見（例如於美國專利US 6736948中）； 第二流派，其中該等端塊係設有一介面之封閉式模組盒件 ，該介面係與一併入安裝壁面的基座上之介面匹配，藉因 此該介面允許以單一鎖定螺絲快速安裝（拆卸），如在 http://www.bekaert.com/bac/Products/Sputter%20hardwre/ End % 20Block.htm 上所示。 圖1 a及1 b提供該後一設計的一簡化圖示，其中用於 承載一可旋轉之標靶1 1 2的端塊1 1 0係可移去地附接至提 供於濺鍍裝置的壁面Π6中之安裝基座114。該安裝基座 114具有一與端塊介面122匹配之基座介面120。該等介 面1 2〇、1 22藉著環首螺釘11 8被壓至彼此頂抗。經過該 等介面1 20、1 22，冷卻劑或電流或原動力係由該供給線 路122、1221專送至該標靶1 12。於此現存設計中，當需 要作成一修改，以便移動該可旋轉之標靶進一步遠離該安 裝基座、亦即較接近該基板時，於該濺鍍裝置之壁面中切 割一開口。如在圖2a及2b所示，這能藉由在該濺鍍裝置 之壁面2 1 6中切割一開口與焊接或以靜態密封件（例如〇 200914637 型環）用螺栓將一盒件230鎖至該壁面所做成。在盒件 230之底部，安裝—安裝基座214。不用說此一程序對該 濺鑛裝置呈現一長久、深遠之變化。此外’所有供給線路 需要被延伸，且在此盒件內連接它們係不直接的。因此， 該等發明家找尋及發現一對此問題之解決方法。 【發明內容】 因此，本發明之目的係提供一快速、可逆及輕易之系 統，藉由該系統能改變該濺鍍裝置中之端塊的空間位置。 如果端塊係封閉式、模組型，一附件被導入，其提供在幾 分鐘內改變該安裝基座及該端塊間之距離的可能性。除外 端塊定位之問題以外，某些其他問題能被解決，當作免費 贈品，如將在下面敘述者。 根據本發明之第一態樣，呈現一具有申請專利範圔第 1項之特色的插件。該插件能被插入可用在該濺鍍裝置內 側的安裝基座及一端塊之間。在該技藝中已知此安裝基座 /端塊組合。一般地，一或多個（通常偶數個）安裝基座 係可用在濺鍍模組上，其係可安裝於濺鍍裝置上。此安裝 基座大致上包括一固定至該濺鍍模組之凸緣的軸環，該凸 緣係真空密閉地界接至該灑鍍裝置之凸緣。該安裝基座具 有一基座介面，其與該端塊之端塊介面匹配。藉由彼此匹 配這些介面，當基座及端塊被夾住彼此抵靠著時，用於操 作一可旋轉標靶所需之冷卻劑餵入及或冷卻劑引出或電流 饋送及或原動力的必要性係自動地互連。再者，該介面提 -8 - 200914637 供機構’以防止冷卻劑及/或氣體之可能的洩漏，諸如ο 型環及〇型環承納壁凹。該靶管係藉著一可旋轉之互連 件連接至於該端塊本身。在該技藝中已知若干互連件，諸 如於美國專利5591314及世界專利WO 00/00766中所敘 述。當允許於真空中旋轉時，該端塊之功能係傳送該濺鍍 必需品至該標靶。爲此目的，可旋轉之真空密封件、可旋 轉之冷卻劑密封件、可旋轉之電流連接器、用於承載該標 粑之軸承、及將該磁鐵棒保持在適當位置之固持機構被提 供在該端塊內側。如所敘述之端塊可爲直通式端塊或它們 可爲直角型端塊。 現在’本發明之插件的特徵係其一端部設有該基座介 面之複製件’而另一端部係設有該端塊介面之複製件。當 插入時，該插件的基座介面複製件係連接至該端塊之介面 ，且該插件的端塊介面複製件係連接至該基座介面。其係 好像該安裝基座被位移進入該濺鍍裝置，且因此該端塊可 爲位於該真空室內側之其他地方。因該插件的功能係不僅 只位移該端塊，囘時也維持其操作性，必需在該插件內側 提供機構，以達成此目的。 用於移動進入該真空室之自由度實際上係無限制的， 但必需考慮該事實，即該等插件必需能夠承載該等端塊隨 同該標靶及該冷卻劑之重量。因此，二組構特別被喜好， 亦即一組構’其中該等介面係於實質上彼此平行之平面中 ’·與一組構，其中該等介面係於實質上彼此垂直之平面中 200914637 該等介面如何被彼此夾住抵靠係特別重要的，因這夾 緊作用必需能夠承載該端塊隨同標靶及冷卻劑之負載。實 現此目的之第一方式係具有一環首螺釘連接。一螺紋環件 係接著在該基座介面複製件端部藉著該插件上之圓周背脊 可旋轉地固持於該插件上，該背脊在該一環件端部與一內 側階梯狀部份鄰接。在朝向該環件之另一端部的內側，一 內螺紋被切除，並與該端塊之外螺紋嚙合。首先，端塊及 插件之介面係小心地彼此匹配，且接著該環首螺釘係以螺 紋鎖上及以一活動扳手繫緊。在該插件之另一端部，該環 首螺釘被該安裝基座所扣留，而該外側扣紋係在該插件之 具有該端塊介面複製件的端部。將該插件固定至該安裝基 座及將該插件固定至該端塊之另一方式係使用一分段式拉 緊環。此一拉緊環具有一在該內側切開之V型裂口，且 通常被分成二或三片段，該等片段係能鉸接地彼此連接。 該裂口在該端塊與該插件及該插件與該安裝基座上捉住該 截錐形凸緣。當一連接二片段之板手螺絲係關上（更像 ISO-KF型真空連接器）時，該等介面被緊緊地壓抵靠著 彼此。 爲了適當地彼此連接該等介面，其有益的是提供裝入 一孔洞之導引栓銷，以便獲得一良好之對齊。當作另一選 擇，可使用該電流之饋通或該冷卻劑之進入或流出，以對 於該等咬合介面提供導引。 當然亦能夠使用其他型式之耦接件，諸如卡口型耦接 件。 -10- 200914637 當一插件係導入該安裝基座及該端塊之間時，爲了維 持標靶之操作性，必需餵入該標靶之必需品必需傳送通過 該插件。如之前所論及：爲保持該標靶起作用，以下係需 要的： - 供給一負電流，用於維持該電漿，與加速該電漿 中之正離子朝向該標靶，以便將濺鍍材料原子位 移出該標靶。該等離子之運動撞擊係高的，且大 部份能量供給係因此轉變成熱、亦即該標靶變熱 。通過該插件之電流傳送可經過一軸向彈性地安 裝於該插件中之堅硬的銅棒所達成。 - 因此需要供給一冷卻劑-通常冷卻水-用於將該標 靶保持在一工作溫度。因非常需要某一冷卻力， 該被加熱之冷卻劑必需被取出該標靶。一封閉式 冷卻迴路被用於此目的。在該等插件管噴口之安 裝基座介面複製件係呈現與該端塊之承納嘴部嚙 合，而在該另一端部，該等端塊介面複製件嘴部 承納該安裝基座之噴口。 - 爲了將新的標靶材料餵入該電漿，原動力必需供 給至該標靶，以保持其轉動。該標靶之旋轉係同 樣重要的，因爲該標靶之被加熱部份一旦其離開 該電漿區域係冷卻。通常藉由一具有旋轉式限制 承窩及栓銷配置之軸桿達成旋轉作用，雖然其他 型式之旋轉傳送係同樣可能的。於該插件中，該 原動力能被傳送經過一藉由軸承所固定之實心軸 -11 - 200914637 桿及以在任一側面之適當的承窩及栓銷配置 知。彈性軸桿亦能被用於此目的。 於操作期間，該標靶將無論如何越來越溫暖。這 該標靶之軸向膨脹。此外，亦可由於例如該靶管之鬆 生該標靶之徑向偏差。爲了保持該濺鍍製程受控制， 與該理想情況（無軸向或徑向偏差）之偏差必需被保 一最小値。然而，這是不可能的，且在極端之情況中 等偏差可導致該端塊中之密封件及軸承上之過度磨損 美國專利US 6736948中，已藉由導入一‘軸向順應 ’發現對此問題的一解決方法。該等發明家了解當該 件具有某些韌性時，該相同之問題可藉由使用其插件 地克服。該韌性必需允許該等介面複製件關於彼此之 差。此韌性能以若干方式獲得： - 該等介面間之韌性0型環的使用。.因目前此 型環係存在的，在此已有一微小程度之韌性 而，這能藉由使用例如更厚〇型環、具有 韌性之0型環、雙重0型環（在該介面之 側面有一 〇型環）所改善。 - 用於該插件之韌性外殼的使用。該外殼-通 爲管狀，雖然不排除其他形狀-可由允許某 性之高級聚合材料所製成，諸如Flametec Kytec®PVDF (聚偏二氟乙烯）或 ECTFE( 及三氟氯乙烯之共聚物）或PEEKTM (聚醚 )。另一選擇係，一金屬管能被用在此處， 所預 導致 垂發 這些 持至 ，該 。在 端塊 等插 輕易 小偏 等Ο 。然 較佳 每一 常將 些韌 TM 乙烯 醚酮 一圓 -12- 200914637 周金屬彈簧被焊接’諸如不銹鋼真空波紋管的一 部份。 當然亦可能保持這些特色的一組合。當該插件係迫離 開其平衡位置時’必需小心該插件中及在該等介面之傳送 機構不會過度應變及保持起作用。爲此目的，軟管、撓性 軸桿、及撓性電導體能被用於傳送該等必需品經過該插件 〇 根據本發明之第二態樣，主張一對插件。由上文，其 將爲清楚的是如果使用支撐該標靶之二端部的二端塊，並 非操作該標靶之所有必需品必需藉由兩端塊所供給。實際 上，該等必需品能在該二端塊上方分開。當將這些必需品 指示爲（F )冷卻劑餵入、（E )冷卻劑引出、（C )電流 饋送、（M)原動力時，可產生該等必需品之7種有意義 的區分：[F][ECM]、[E][FCM]、[C][FEM]、[M][FEC]、 [FEnCM]、[FC][EM]及[FMHEC]。雖然這些區分之每一種 係技術上可同樣地施行，[M][FEC]及[C][FEM]之組合實際 上可被發現。 根據本發明之第三態樣，主張一濺鍍模組。此等模組 具有用於該安裝基座的載具之作用，且通常包含管件及電 子設備之所有需要的餵入及控制配件。然而，該模組亦可 爲一安裝基座所固定之門件，並在該內側上承載一端塊（ 例如在待審申請案PCT/EP2006/060216中所敘述）。於該 端塊及該安裝基座之間安裝本發明之插件。該插件之設計 直接允許它們被串連地安裝，因該等介面係相容的。 -13 - 200914637 該等模組亦可配備有一對匹配之安裝基座及端塊耦接 件（亦即此一對之第一構件包括可匹配至第一端塊之第一 安裝基座，且此一對之第二構件包括可匹配至第二端塊之 第二安裝基座）。此一對能承載一標靶。同樣地，另一對 (安裝基座、端塊）耦接件能被加至該相同之模組，以承 載第二標靶。存在承載高達四個標靶之模組，但該原理能 被甚至進一步延伸。本發明之插件能有利地被用於相對另 一標靶降低一標靶。當該等插件被製成甚至較長時，它們 可甚至在該基板之平面下方延伸，在此第二標靶可被安裝 ’其於單次通過中濺鍍該基板之另一邊。這樣一來，申請 案PCT/EP2006/063 1 73中所揭示之主意實際上變得特別簡 單與易於施行。 藉由本發明，藉由在該等不同（或一）安裝基座及對 應端塊之間插入上述插件，現存裝置可被方便地修改。此 一修改方法可被迅速與方便地執行-而不需任何特別之工 具-因在該現存裝置上不需任何供給線路之延伸，對該塗 覆模組也不需任何特別之修改。 【實施方式】 圖3a及3b顯示該插件如何可被方便地導入一現存裝 置’而不需修改該裝置。顯示該安裝基座314之現存零組 件’其係固定至該塗覆裝置之壁面316。該端塊31〇係可 經過該等介面320及322匹配至該安裝基座314，但於此 案例中’該插件34〇已被導入該安裝基座及該端塊之間。 -14- 200914637 該插件340具有該端塊介面322的一複製件3 22’及該安裝 基座介面320的一複製件320'。先前被用於繫緊該端塊至 該安裝基座之環首螺釘318現在被用於固定該插件3 40至 該安裝基座314。該環首螺釘之複製件31 8'現在被導入， 以將該端塊繫緊至該插件。在該插件3 4 0內側，提供機構 344，以經由連接桿342自該供給及提取管324、3 24’傳送 該冷卻劑至該端塊，與由連接器324’傳送該電流至該端塊 3 10° 圖4a、4b及4c進一步更詳細地顯示圖3之插件440 。在該插件的一端部，提供螺絲螺紋445，用於以該安裝 基座之環首螺釘旋緊。該連接桿442係可軸向移動地安 裝-可能彈簧負載式-於該插件442中，以確保適當之電接 觸。管件444、444'係被設有一流出口及嘴部連接器（未 示出）’一管件用於餵入冷卻劑，一管件用於由該端塊提 取冷卻劑。環首螺釘418'係該安裝基座之環首螺釘的一複 製件，且旋緊至該端塊螺紋上。 圖5a、5b及5c顯示該對插件之傳送原動力的另一構 件。該插件之外殻540保持完全相同的。在一旋轉軸桿 550內側被旋轉軸承552、552'所固定。原動力由該安裝 基座被帶來經過具有一成十字形之凹部的傳送盤片554, 來自該安裝基座軸桿之柱螺栓嚙合在該盤片中。這些柱螺 栓被拷貝在該插件555之另一端部，用於進一步連接至該 端塊。 兩插件係設有該必需之真空及冷卻劑密封件，以免洩 -15- 200914637 漏。在它們所密封的零件不會相對彼此移動之意義上，這 些密封件係靜止不動之密封件。所有旋轉式密封件係倂入 在該端塊內側。其結果是’該插件內側之壓力能被保持在 大氣壓。 【圖式簡單說明】 現在將參考所附圖面更詳細地敘述本發明，其中 -圖1 a及1 b敘述一端塊安裝件之標準狀態。 -圖2a及2b顯不該先則技藝解決方法，用於降低一 標靶朝向該基板。 -圖3a及3b顯示如何可有益地使用該插件的前面及 橫截面圖。 -圖4a、4b及4c顯示垂直於[FEC]型插件之軸心的側 視圖、軸向橫截面及橫截面圖。 -圖5 a、5 b及5 c顯示垂直於[M]型插件之軸心的側視 圖、軸向橫截面及橫截面圖。 如在圖la、lb及圖2a、2b中所描述之先前技藝已在 ‘先前技術’段落中充分地討論，這些圖面將不會在下文 進一步說明。於該等圖面中，相像之元件係以該等命名者 之最後相等二位數命名。該第一位數接著意指該圖面之數 目。 【主要元件符號說明】 11 〇 :端塊 -16- 200914637 1 1 2 :標靶 1 14 :安裝基座 1 1 6 :壁面 1 1 8 :環首螺釘 120 :基座介面 122 :端塊介面 1 2 2 ’ ：供給線路 214 :安裝基座 2 1 6 :壁面 2 3 0 :盒件 3 1 0 :端塊 3 14 :安裝基座 3 1 6 :壁面 3 1 8 :環首螺釘 3 1 8 ’ ：環首螺釘 3 20 :基座介面 3 2 0 ’ ：複製件 3 22 :端塊介面 3 2 2 ’ ：複製件 3 24 :供給管 3 24’ ：提取管 340 :插件 3 4 2 :連接桿 3 44 :機構 200914637 4 1 8 ’ ：環首螺釘 4 4 0 :插件 442 :連接桿 4 4 4 :管件 4445 ：管件 4 4 5 :螺絲螺紋 540 :外殻 5 5 0 :軸桿 5 5 2 :軸承 5 5 2 ’ ：軸承 5 5 4 :傳送盤片 5 5 5 :插件 -18-BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an accessory - an insert - for adjusting the distance between a sputtering target and a substrate in a beach plating apparatus. By introducing the insert of the present invention, this distance can be easily adjusted without further changes to the device. [Prior Art] Sputtering has become a well-established coating technique for coating planar substrates such as display glass sheets, glazing sheets, touch screens, and many other modern appliances. In the sputtering apparatus, the substrate to be coated is transported in front of the sputter magnetron. The sputtered magnetron has an atomic spray source whereby the target material atom - which we want to coat the substrate with - is ejected from the surface of the target by ions, and the plasma accelerates away A low pressure gas plasma. The plasma is limited by a magnetic field that is maintained by a magnet mounted opposite the sputtering side of the target. For various reasons as will now be mentioned, the distance between the target and the substrate is important in this sputtering process, although atomic spray occurs primarily in a direction perpendicular to the target surface, as The random nature of the knockout process is exceptionally angular. In order to ensure uniformity of the coating, it is therefore appropriate to extend the target beyond the edge of the substrate by at least twice the distance from the target to the substrate. Therefore, a larger target-to-substrate distance results in an increased overflow at the edges. An increased overflow also automatically implies a lower total coating speed. In addition, for a collision with a gas atom colliding with the target atom on its path -4-200914637 to the substrate, a larger target-to-substrate distance contains a higher probability and leads to a lower one. Coating efficiency. Sometimes it is necessary to have magnetic field lines extending up to the substrate to fine tune the properties of the coating. When this is desired, a special array of magnets is used which produces a magnetic field that is further extended. Since the strength of a magnetic field drops sharply with this distance - it is a dipole field - the possibility of extending the 'unbalanced magnetron' of the magnetic field line is quite limited by the distance. In this case, it may be to facilitate the entire movement of the magnetron closer to the substrate such that the coated substrate comes under the influence of the magnetic field lines. The target-to-substrate distance also affects the temperature of the substrate: the target tends to become very hot (and therefore must be cooled) due to the impact of the gas ions, which will heat the substrate. Occasionally, this may be helpful in, for example, improving adhesion or a second reaction in the coating, but it may also be detrimental to the substrate, such as when the substrate has a low softening point. In this case, it may be necessary to increase the distance. As such, it may be of interest to increase the distance of the target to the substrate in order to limit the impact of the arc on the target substrate. An arc-spark that occurs on the target surface between the sputtered and unsputtered regions imparts sufficient energy to eject a larger piece of target material toward the substrate. This can cause defects in the coating when this is too close to the substrate. Therefore, the need to be able to adjust the target to substrate distance has always been present in the sputtering apparatus. When used in stationary, flat coaters - such as the electronics industry to coat wafers having a diameter of 200 or 300 mm - the target-to-substrate distance adjustment is fairly straightforward, over a large area Tu-5-200914637 In the case of rotating, tubular targets that extend over 4 meters in width, it is far more difficult. The target material is fed into the plasma by providing a target material in the form of a rotating capillary tube, wherein the idea of maintaining a stationary, slender magnetic field on the surface of the target material is first described in a series belonging to McKelvey. U.S. Patents (4356073, 4422916, 4443318, 4445997, 4466877). The advantages of materials with larger inventory, better cooling, and better process control outweigh the disadvantages of installing targets with increased complexity. In fact, a high current must be fed to the target to maintain the plasma, which in turn requires cooling of the target by a cycle of coolant entering and exiting the target, while at the same time it must remain stationary. The stationary magnetic array rotates in front of the surface, and this all maintains vacuum integrity at the same time. Basically, the design of the second competition has since become apparent. First, there is a solution to the necessity of feeding the target tube, such as coolant inlet, coolant outlet, current, and motive force from a single bearing housing, which is referred to as an 'end block' and is mounted in the vacuum. On the wall of the room. In this case, the target axis is substantially perpendicular to the wall on which the end block is mounted. This is known as the cantilever mounting (US 4,549,885, US 4,519,885, US 5,200, 049, US 2004/1 40 208, WO 2006/ 023 25 7 ). A small mechanical mount facing the target end of the end block may be desirable to provide mechanical support during operation. For the mounting screws of the end block to the wall, the target-to-substrate distance can be adjusted relatively easily by providing a slender groove. Secondly, there is a -6-200914637 solution for the target above the two-end block, which is located at either end of the target. In this case, the target is mounted such that its axis is parallel to the wall on which the end blocks are mounted. The end blocks are then right angled. Examples of further development are described in U.S. Patent No. 4,422,916, U.S. Patent 4,459, 975, U.S. Patent 5,096, 062, U.S. Pat. Within this second solution, two design genres have emerged, i.e., first class, wherein the end blocks are attached to the wall of the box, wherein the interior of the box remains accessible and visible from the atmospheric side of the wall (e.g., in U.S. Patent No. 6,736,948); the second genre, wherein the end blocks are provided with an interface closed modular box that is mated with an interface on a pedestal that incorporates the mounting wall, thereby This interface allows quick installation (disassembly) with a single locking screw, as shown at http://www.bekaert.com/bac/Products/Sputter%20hardwre/ End % 20Block.htm. Figures 1a and 1b provide a simplified illustration of the latter design in which an end block 110 for carrying a rotatable target 1 1 2 is removably attached to a sputter device. The mounting base 114 in the wall Π6. The mounting base 114 has a base interface 120 that mates with the end block interface 122. The interfaces 1 2〇, 1 22 are pressed against each other by the ring head screw 11 8 . Through the interfaces 1 20, 1 22, coolant or current or motive power is delivered to the target 1 12 by the supply lines 122, 1221. In this prior art design, when a modification is required to move the rotatable target further away from the mounting base, i.e., closer to the substrate, an opening is cut in the wall of the sputtering apparatus. As shown in Figures 2a and 2b, this can be achieved by bolting an opening in the wall 21 of the sputtering apparatus with a weld or by bolting a box 230 to a static seal (e.g., a 〇200914637 ring). This wall is made of. At the bottom of the box member 230, a mounting base 214 is mounted. Needless to say, this procedure presents a long-lasting and far-reaching change to the spilling device. In addition, all supply lines need to be extended and it is not straightforward to connect them within this box. Therefore, the inventors sought and found a solution to this problem. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a fast, reversible and easy system by which the spatial position of the end blocks in the sputtering apparatus can be varied. If the end block is of a closed, modular type, an accessory is introduced which provides the possibility of changing the distance between the mounting base and the end block within a few minutes. In addition to the problem of end block positioning, some other issues can be resolved as free gifts, as will be described below. According to a first aspect of the present invention, an insert having the features of the first item of the patent application is presented. The insert can be inserted between a mounting base and an end block that can be used on the inside of the sputtering apparatus. This mounting base/end block combination is known in the art. Typically, one or more (usually an even number) mounting bases can be used on the sputter module, which can be mounted on a sputter device. The mounting base generally includes a collar secured to the flange of the sputter module, the flange being vacuum-tightly bound to the flange of the sputter device. The mounting base has a base interface that mates with the end block interface of the end block. By matching these interfaces to each other, the coolant feed and/or coolant extraction or current feed and or motive force required to operate a rotatable target are required when the base and end blocks are clamped against each other. Sex lines are automatically interconnected. Furthermore, the interface provides a mechanism to prevent possible leakage of coolant and/or gas, such as ο-rings and 〇-rings. The target tube is attached to the end block itself by a rotatable interconnect. A number of interconnects are known in the art, as described in U.S. Patent 5,591,314 and World Patent WO 00/00766. When allowed to rotate in a vacuum, the function of the end block is to deliver the sputter necessities to the target. For this purpose, a rotatable vacuum seal, a rotatable coolant seal, a rotatable current connector, a bearing for carrying the label, and a holding mechanism for holding the magnet rod in place are provided Inside the end block. The end blocks as described may be straight-through end blocks or they may be right-angle end blocks. The insert of the present invention is now characterized in that a replica of the pedestal interface is provided at one end and a replica of the end block interface is provided at the other end. When inserted, the base interface replica of the insert is attached to the interface of the end block, and the end block interface copy of the insert is coupled to the base interface. It appears that the mounting base is displaced into the sputtering apparatus, and thus the end block can be located elsewhere on the side of the vacuum chamber. Since the function of the plug-in not only displaces the end block but also maintains its operability when it is returned, it is necessary to provide a mechanism inside the plug-in to achieve this. The degree of freedom for moving into the vacuum chamber is in fact unlimited, but it must be taken into account that the inserts must be able to carry the end blocks along with the weight of the target and the coolant. Therefore, the two-component is particularly preferred, that is, a set of structures in which the interfaces are in a plane substantially parallel to each other' and a set of structures, wherein the interfaces are in a plane substantially perpendicular to each other 200914637 It is particularly important how the interfaces are clamped against each other because the clamping action must be able to carry the load of the end block along with the target and the coolant. The first way to achieve this is to have a ring head screw connection. A threaded ring member is then rotatably retained to the insert at the end of the base interface replica by a circumferential ridge on the insert, the ridge abutting an inner stepped portion at the end of the loop. On the inner side toward the other end of the ring member, an internal thread is cut away and threadedly engaged with the outer end of the end piece. First, the interface between the end block and the insert is carefully matched to each other, and then the ring head screw is threaded and fastened with a spanner wrench. At the other end of the insert, the eye screw is retained by the mounting base and the outer buckle is attached to the end of the insert having the end block interface replica. Another way of securing the insert to the mounting base and securing the insert to the end block is to use a segmented tension ring. The tensioning ring has a V-shaped slit cut inwardly and is generally divided into two or three segments that are hingedly connected to each other. The split catches the frustoconical flange on the end block and the insert and the insert and the mounting base. When a wrench screw that connects the two segments is closed (more like an ISO-KF vacuum connector), the interfaces are pressed tight against each other. In order to properly connect the interfaces to one another, it is beneficial to provide a guide pin that fits into a hole to achieve a good alignment. Alternatively, the feedthrough of the current or the entry or exit of the coolant may be used to provide guidance for the bite interfaces. It is of course also possible to use other types of couplings, such as bayonet type couplings. -10- 200914637 When a plug-in is introduced between the mounting base and the end block, in order to maintain the operability of the target, the necessity to feed the target must be transmitted through the insert. As previously discussed: in order to maintain the target, the following are required: - supply a negative current for maintaining the plasma, and accelerating the positive ions in the plasma toward the target to cause the sputtering material The atom is displaced out of the target. The motion of the plasma is high, and most of the energy supply is thus converted to heat, i.e., the target becomes hot. Current transfer through the insert can be achieved by a rigid copper rod that is axially resiliently mounted in the insert. - It is therefore necessary to supply a coolant - usually cooling water - for maintaining the target at an operating temperature. The heated coolant must be removed from the target because a certain cooling force is highly desirable. A closed cooling circuit is used for this purpose. The mounting base interface replicas of the plug nozzles are engaged with the receiving mouth of the end block, and at the other end, the end block interface replica mouth receives the spout of the mounting base . - In order to feed the new target material into the plasma, the prime mover must be supplied to the target to maintain its rotation. The rotation of the target is also important because the heated portion of the target cools as soon as it leaves the plasma region. Rotation is usually achieved by a shaft with a rotary restraint socket and pin configuration, although other types of rotary transmissions are equally possible. In the insert, the motive force can be transmitted through a solid shaft -11 - 200914637 rod secured by bearings and configured with appropriate socket and pin configurations on either side. Elastic shafts can also be used for this purpose. The target will be warmer anyway during operation. This target expands axially. In addition, radial deviations of the target may also be due to, for example, the target tube. In order to keep the sputtering process under control, the deviation from this ideal (no axial or radial deviation) must be kept to a minimum. However, this is not possible, and in extreme cases moderate deviations can lead to excessive wear on the seals and bearings in the end block. In US Pat. No. 6,736,948, this problem has been discovered by introducing an 'axial compliance'. a solution. The inventors understand that when the part has some toughness, the same problem can be overcome by using its plug-in. This toughness must allow the interface replicas to differ from each other. This toughness can be obtained in several ways: - The use of a tough 0-ring between the interfaces. Because of the current existence of this type of ring system, there has been a slight degree of toughness here, which can be achieved by using, for example, a thicker 〇-shaped ring, a tough 0-ring, and a double 0-ring (on the side of the interface). One type of ring) improved. - Use of the flexible housing for this insert. The outer casing - the tubular shape, although not excluding other shapes - may be made of a high-grade polymeric material that allows for certain properties, such as Flametec Kytec® PVDF (polyvinylidene fluoride) or ECTFE (and copolymer of chlorotrifluoroethylene) or PEEKTM (polyether). Another option is that a metal tube can be used here, which is expected to cause the sag to be held. In the end block, the insertion is easy to be small and equal. However, it is preferred that each of the tough TM vinyl ether ketones a round -12-200914637 metal spring is welded, such as a part of a stainless steel vacuum bellows. Of course, it is also possible to maintain a combination of these features. When the insert is forced to leave its equilibrium position, care must be taken that the transfer mechanism in the insert and in the interface does not become excessively strained and remains active. For this purpose, hoses, flexible shafts, and flexible electrical conductors can be used to convey the necessities through the insert. According to a second aspect of the invention, a pair of inserts is claimed. From the above, it will be clear that if a two-end block supporting the two ends of the target is used, all the necessities of not operating the target must be supplied by the two blocks. In fact, the necessities can be separated above the two end blocks. When these necessities are indicated as (F) coolant feed, (E) coolant draw, (C) current feed, (M) prime mover, seven meaningful distinctions can be made of such necessities: [F][ECM ], [E][FCM], [C][FEM], [M][FEC], [FEnCM], [FC][EM], and [FMHEC]. Although each of these distinctions can be technically performed in the same way, a combination of [M][FEC] and [C][FEM] can actually be found. According to a third aspect of the invention, a sputtering module is claimed. These modules have the function of a carrier for the mounting base and typically contain all of the required feed and control accessories for the tube and electronics. However, the module can also be a door member to which a mounting base is attached, and which carries an end piece on the inner side (as described, for example, in PCT/EP2006/060216). The insert of the present invention is mounted between the end block and the mounting base. The plug-in design allows them to be installed in series, as these interfaces are compatible. -13 - 200914637 The modules may also be equipped with a pair of matching mounting bases and end block couplings (ie, the first member of the pair includes a first mounting base that is matable to the first end block, and The second member of the pair includes a second mounting base that can be mated to the second end block. This pair can carry a target. Similarly, another pair (mounting base, end block) coupling can be added to the same module to carry the second target. There are modules that carry up to four targets, but this principle can be extended even further. The insert of the present invention can advantageously be used to lower a target relative to another target. When the inserts are made even longer, they may extend even below the plane of the substrate where the second target can be mounted 'sputtering the other side of the substrate in a single pass. In this way, the idea disclosed in the application PCT/EP2006/063 1 73 actually becomes particularly simple and easy to implement. With the present invention, existing devices can be easily modified by inserting the plug-in between the different (or one) mounting bases and the corresponding end blocks. This modification can be performed quickly and conveniently - without the need for any special tools - no additional modifications to the coating module are required since no extension of the supply line is required on the existing device. [Embodiment] Figures 3a and 3b show how the plug-in can be conveniently imported into an existing device without modifying the device. The existing component '' showing the mounting base 314' is secured to the wall 316 of the coating apparatus. The end block 31 can be mated to the mounting base 314 via the interfaces 320 and 322, but in this case the insert 34 has been introduced between the mounting base and the end block. The plug-in 340 has a copy 3 22' of the end block interface 322 and a copy 320' of the mounting base interface 320. A ring head screw 318 that was previously used to fasten the end block to the mounting base is now used to secure the insert 3 40 to the mounting base 314. A copy of the ring head screw 318' is now introduced to tie the end block to the insert. Inside the insert 300, a mechanism 344 is provided to transfer the coolant from the supply and extraction tubes 324, 3 24' to the end block via a connecting rod 342, and the current is delivered to the end block by the connector 324' 3 10° Figures 4a, 4b and 4c show the plug-in 440 of Figure 3 in further detail. At one end of the insert, a screw thread 445 is provided for tightening with the eye screw of the mounting base. The connecting rod 442 is axially movably mounted - possibly spring loaded - in the insert 442 to ensure proper electrical contact. The tubular members 444, 444' are provided with a first-rate outlet and mouth connector (not shown), a tube for feeding the coolant, and a tube for extracting the coolant from the end block. The ring head screw 418' is a replica of the ring head screw of the mounting base and is screwed onto the end block threads. Figures 5a, 5b and 5c show another component of the transfer motive power of the pair of inserts. The outer casing 540 of the insert remains identical. The inside of a rotating shaft 550 is fixed by the rotary bearings 552, 552'. The motive power is carried by the mounting base through a transport disk 554 having a cross-shaped recess into which the stud from the mounting base shaft engages. These studs are copied to the other end of the insert 555 for further connection to the end block. The two inserts are equipped with the necessary vacuum and coolant seals to prevent leakage of -15-200914637. These seals are stationary seals in the sense that the parts they seal do not move relative to one another. All rotary seals are snapped inside the end block. As a result, the pressure inside the insert can be maintained at atmospheric pressure. BRIEF DESCRIPTION OF THE DRAWINGS The invention will now be described in more detail with reference to the accompanying drawings, in which - Figures 1a and 1b illustrate the standard state of one end block mount. - Figures 2a and 2b show a prior art solution for reducing a target towards the substrate. - Figures 3a and 3b show how the front and cross-sectional views of the insert can be used beneficially. - Figures 4a, 4b and 4c show a side view, an axial cross section and a cross-sectional view perpendicular to the axis of the [FEC] type insert. - Figures 5 a, 5 b and 5 c show side views, axial cross sections and cross-sectional views perpendicular to the axis of the [M] type insert. The prior art as described in Figures la, lb and Figures 2a, 2b has been fully discussed in the 'Prior Art' section, which will not be further explained below. In these drawings, the similar components are named after the last two digits of the naming person. This first digit then follows the number of the drawing. [Main component symbol description] 11 〇: End block-16- 200914637 1 1 2 : Target 1 14 : Mounting base 1 1 6 : Wall surface 1 1 8 : Ring head screw 120 : Base interface 122 : End block interface 1 2 2 ' : supply line 214 : mounting base 2 1 6 : wall 2 3 0 : box 3 1 0 : end block 3 14 : mounting base 3 1 6 : wall 3 1 8 : ring head screw 3 1 8 ' : ring head screw 3 20 : base interface 3 2 0 ' : copy 3 22 : end block interface 3 2 2 ' : copy 3 24 : supply tube 3 24' : extraction tube 340 : insert 3 4 2 : connecting rod 3 44 : Mechanism 200914637 4 1 8 ' : Ring head screw 4 4 0 : Insert 442 : Connecting rod 4 4 4 : Pipe fitting 4445 : Pipe fitting 4 4 5 : Screw thread 540 : Housing 5 5 0 : Shaft 5 5 2 : Bearing 5 5 2 ' : bearing 5 5 4 : transfer disc 5 5 5 : insert -18-