TW200904513A - Gas cleaning method for organic compound with low concentration - Google Patents

Gas cleaning method for organic compound with low concentration Download PDF

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TW200904513A
TW200904513A TW96126704A TW96126704A TW200904513A TW 200904513 A TW200904513 A TW 200904513A TW 96126704 A TW96126704 A TW 96126704A TW 96126704 A TW96126704 A TW 96126704A TW 200904513 A TW200904513 A TW 200904513A
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catalyst
adsorption
organic compound
concentration organic
low concentration
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TW96126704A
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TWI348390B (en
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feng-tang Zhang
zhi-neng Zhang
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Jg Environmental Tech Co Ltd
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Abstract

A gas cleaning method to treat the low concentration organic compounds, specially for odor compounds such as dimethyl-sulfur (DMS), dimethyl-di-sulfur(DMDS), hydrogen sulfide (H2S), formaldehyde, acetic acid, isopropyl alcohol and acetone. It comprises: at least a catalyst adsorption unit deposited in parallel or in series; and/or an ozone generator, which supplies ozone to the catalyst adsorption unit and enhances the adsorption effect of the catalyst, oxidoreduction reaction at a low temperature or decomposition reaction to covert to something harmless or processable. By the method, the catalyst adsorption part is with better effect and longer service life.

Description

200904513 九、發明說明: 【發明所屬之技術領域】 本發明係揭示-種用以處_ — _ 淨化方法,特贱關於-料對包含_ = 例如二曱基硫(DMS)、二曱基二 、化。物. 叶 硫(DMDs)、硫化氫(H2S) 專硫化物及W、醋酸、㈣醇、㈣等惡臭化合物之氣 體淨化方法。而本發明主要係用於增,媒效率、延長觸 Γ200904513 IX. Description of the invention: [Technical field to which the invention pertains] The present invention discloses a method for purifying ___, especially for a material pair comprising _ = for example, dimercaptosulfur (DMS), dimercapto And. Materials. Methods for the purification of sulphur (DMDs), hydrogen sulfide (H2S) sulphide and W, acetic acid, (tetra) alcohol, (iv) and other malodorous compounds. The invention is mainly used for increasing, media efficiency, and prolonging the touch.

媒壽命且適用於淨化處理高風量低濃度之㈣㈣H 面板製造業等無塵室空氣淨化或其排放廢氣之淨化: 途’同時適狀-般廢水廠、塗料卿及㈣化工業等 空氣淨化之用。 【先前技術】 近來,國際間對於環保議題及工業安全衛生及高科技 廠潔淨室分子污染物淨化之日益重視,考量工業廢氣對環 U 境及勞工以至於一般大眾身體產生之危害,對於工業廢氣 排放標準日趨嚴格,國内外法規都已制定出相關的濃度及 臭味的排放標準;另一方面,近來高科技廠之高階製程對 於含硫化合物及低沸點有機化合物等難處理之分子污染 物,在外氣引入潔淨室前的淨化程度要求愈為嚴苛。 例如在半導體晶圓製造廠及TFT-LCD面板光電製造 業面板製程中’去光阻程序(stripping process)所使用之去 光阻剝離液(stripper)主要成分為高沸點且幾乎完全溶於水 的有機化合物,包括單乙醇胺(MEA)、二曱基亞颯(DMS0) 200904513 以及乙二料了零⑽博1在去^製财,去光阻 劑中的-甲基㈣雜是—種高義切性而且揮發性低 的液體,但在處理過程中,極容易形且惡㈣二 曱基硫(dimethyl sulfide, DMS)和二审甘一 ★ τ 暴二硫(dimethyl disulfide,DMDS)的氣態污染物。然而,以傳統吸附法、冷 凝法及吸收法並無法完全去除低沸點及低會溶性的二甲^ 硫與二甲基二硫’而且其在低濃度下即會產生惡臭,極^Medium life and suitable for purification and treatment of high air volume and low concentration (4) (4) H panel manufacturing and other clean room air purification or purification of exhaust gas: At the same time, the same as the appropriate waste water plant, paint Qing and (4) chemical industry and other air purification . [Prior Art] Recently, the international community has paid more and more attention to environmental issues, industrial safety and hygiene, and purification of molecular pollutants in clean rooms of high-tech factories, considering the harmful effects of industrial waste gas on the environment and the workers and the general public. Emission standards are becoming more stringent, and domestic and foreign regulations have established relevant emission and odor emission standards. On the other hand, high-end processes of high-tech factories have recently dealt with difficult-to-treat molecular pollutants such as sulfur compounds and low-boiling organic compounds. The degree of purification required before the introduction of external air into the clean room is more stringent. For example, in the semiconductor wafer fabrication plant and the TFT-LCD panel photovoltaic manufacturing panel process, the stripper used in the stripping process is mainly composed of a high-boiling and almost completely water-soluble stripper. Organic compounds, including monoethanolamine (MEA), dimercaptoarrene (DMS0) 200904513, and bismuth zero (10) Bo 1 in the ^ ^ ^ ^, to the photoresist - methyl (tetra) is a kind of high-cut Sexual and low volatility liquid, but it is very easy to form and treat dimethyl sulfide (DMS) and dimethyl disulfide (DMDS) gaseous pollutants during the treatment. However, conventional adsorption, condensing, and absorption methods cannot completely remove low-boiling and low-soluble dimethyl sulphur and dimethyl disulfide, and they produce malodor at low concentrations.

影響廠房周圍生活環境而引發民眾抗議,同時也影響到礙 房周圍其他高科技廠高階製程之產品良率。 空氣中低》辰度有機化合物氣體之淨化技術可運用物理 方法、化學方法及其混合法。物理方法係將空氣通過採用 吸收、吸附、分離等物理步驟之淨化設備以除去空氣中低 濃度有機化合物’㈣的物理方法有機械分離法、過濾法―、 吸附法、洗條法和靜電法。吊用的化學方法有熱氧化法和 催化燃燒法等。國内目前隶常採用的淨化設備係以抽風與 簡易滤網或一般吸附或水洗洗務處理,此傳統設備及方法 係無法有效淨化如二甲基硫與二甲基二硫等含硫化合物之 氣體,是造成空氣污染臭味的主因;同時,也是造成被污 染之外氣導引進入如半導體晶圓製造廠及TFT-LCD面板 光電製造廠等高階製程潔淨室,影響產品良率之分子污染 物主要來源之一。 此外,尚有運用觸媒催化法來淨化處理空氣中含硫化 合物氣體,觸媒催化法之優點為含硫化合物之脫除效率 高、反應溫度低、能源消耗低及避免生成二次污染物等, 200904513 是-種環境友好的催化淨化技術。然而,此項技術目前最 需要突破的是開發低溫氧化觸媒,由於低濃度有機化合物 的處理效率不佳,所以開發之觸媒必需具有以下特點: 1、具低溫氧化活性之奈米觸媒負載技術 利用奈米觸媒特有的催化特性,小晶粒觸媒載 體粒仏小、孔道⑯、晶内擴散阻力小、暴露在外的 原子多(高30%)、含有眾多的晶間隙(二次孔 〇 洞)、具有較強的吸附能力,對於大分子或液相反 應有利。反應物與產物能於多孔性觸媒載體孔洞快 速擴散,減少阻塞或積碳,而降低觸媒的失活速 率’延長觸媒壽命。 • 2、具中孔洞特性之吸附/催化基材合成技術 ' 利用中孔洞的高表面積與孔洞特性,提高含硫 化合物的吸附去除效率,由於孔容積和孔隙率均提 间,預估可增加三成的吸附量,且因晶間空隙增大 可吸附較大分子,總體觸媒效率可提升30°/。以上。 3、k升氧化活性的助劑輔助技術 無論吸附劑或觸媒,均會隨使用時間而呈現部 分覆蓋的現象’設計以低電壓激發系統中的氧氣或 水氣使產生具較高氧化活性的氧化助劑,如:〇2、 〇 H〇 ·、〇3等,加速觸媒表面的氧化還原循 環進行,加逮觸媒表面污染物的降解,以達到降低 積碳的目的,預計可大幅提升觸媒的壽命。 200904513 【發明内容】 為了改善上述習知技術所面臨的問題,本發明之目的 在提供一種低濃度有機化合物之氣體淨化方法,其包含: 至少一個觸媒吸附單元,其以並聯及/或串聯設置;及 一臭氧產生單元,其可提供臭氧於該觸媒吸附單元, 作為加強觸媒吸附功能或低溫氧化還原或分解反應之用。 本發明之空氣中低濃度有機化合物之氣體淨化濾材裝 置中,可包含一複數個觸媒吸附單元,其中該觸媒吸附單 元型式可為固定床式、轉輪式、轉塔式或流體化床式;各 觸媒吸附單元可同時進行吸附反應或觸媒氧化還原或分解 反應;或者是,該吸附觸媒單元可部分進行吸附反應,同 時部分進行觸媒氧化還原或分解反應。 此外,本發明提供一種低濃度有機化合物之氣體淨化 方法,其包含下列步驟: (1) 提供一種空氣中低濃度有機化合物之氣體淨化 濾材,其中該觸媒吸附單元中充塡有觸媒吸附 材; (2) 所欲處理之含低濃度有機化合物之空氣導入該 裝置,使充填觸媒吸附材之觸媒吸附單元進一步 進行化學性吸附反應,同時排出經吸附後之乾淨 氣流; (3) 選擇開啟及/或關閉相關閥組,選擇是否導入臭 氧產生單元所產生之臭氧,使充填觸媒吸附材之 觸媒吸附單元,進一步進行化學性吸附反應及低 200904513 溫氧化還原或分解反應,同時排出經吸附後之乾 淨氣流; (4)開啟及/或關閉相關閥組,將已吸附飽和之觸媒 吸附材導入一水氣或蒸氣產生單元產生之水氣 或蒸氣,以進一步進行觸媒吸附材之活化再生或 更換。 其中步驟(2)及(3)中之化學反應式以低濃度有機惡臭 化合物DMS之有機廢氣為例: a、 單獨化學性吸附Affecting the living environment around the factory and causing public protests, it also affects the yield of high-end processes in other high-tech factories around the house. In the air, the purification technology of organic compound gas can use physical methods, chemical methods and mixing methods. The physical method is a mechanical separation method, a filtration method, an adsorption method, a washing method, and an electrostatic method in which the air is passed through a purification apparatus using physical steps of absorption, adsorption, separation, and the like to remove low-concentration organic compounds in the air. The chemical methods for hanging are thermal oxidation and catalytic combustion. The purification equipment currently used in China is treated by suction and simple filter or general adsorption or washing and washing. This traditional equipment and method cannot effectively purify sulfur compounds such as dimethyl sulfide and dimethyl disulfide. Gas is the main cause of air pollution odor; at the same time, it also causes the contaminated gas to lead into the high-order process clean room such as semiconductor wafer manufacturer and TFT-LCD panel photoelectric manufacturing factory, which affects the product yield. One of the main sources of things. In addition, catalytic catalysts are used to purify sulfur-containing compounds in the air. The catalytic catalyst has the advantages of high removal efficiency of sulfur-containing compounds, low reaction temperature, low energy consumption, and avoidance of secondary pollutants. , 200904513 is an environmentally friendly catalytic purification technology. However, the most important breakthrough of this technology is the development of low-temperature oxidation catalyst. Due to the poor processing efficiency of low-concentration organic compounds, the catalyst developed must have the following characteristics: 1. Nano-catalyst load with low-temperature oxidation activity. The technology utilizes the unique catalytic properties of the nanocatalyst, the small-grain catalyst carrier has small particle size, the channel 16, the intra-crystal diffusion resistance is small, the exposed atoms are many (30% higher), and there are numerous crystal gaps (secondary holes). It has a strong adsorption capacity and is advantageous for macromolecular or liquid phase reactions. The reactants and products can diffuse rapidly in the pores of the porous catalyst carrier, reducing clogging or carbon deposition, and reducing the rate of catalyst deactivation to extend the life of the catalyst. • 2. Adsorption/catalytic substrate synthesis technology with mesoporous characteristics. Using high surface area and pore characteristics of mesopores to improve the adsorption removal efficiency of sulfur-containing compounds, it is estimated that 30% increase due to pore volume and porosity. The amount of adsorption, and the increase of intergranular voids can adsorb larger molecules, the overall catalyst efficiency can be increased by 30 ° /. the above. 3, k liter oxidation activity auxiliary technology, regardless of the adsorbent or catalyst, will be partially covered with the use of time 'designed with low voltage excitation system oxygen or water gas to produce a higher oxidation activity Oxidation aids, such as: 〇2, 〇H〇·, 〇3, etc., accelerate the redox cycle on the surface of the catalyst, and increase the degradation of the surface pollutants of the catalyst to achieve the purpose of reducing carbon deposition, which is expected to be greatly improved. The life of the catalyst. 200904513 SUMMARY OF THE INVENTION In order to improve the problems faced by the above-mentioned prior art, an object of the present invention is to provide a gas purification method for a low concentration organic compound, comprising: at least one catalyst adsorption unit arranged in parallel and/or in series And an ozone generating unit for providing ozone to the catalyst adsorption unit for enhancing the adsorption function of the catalyst or the low-temperature redox or decomposition reaction. The gas purification filter device of the low concentration organic compound in the air of the present invention may comprise a plurality of catalyst adsorption units, wherein the catalyst adsorption unit type may be a fixed bed type, a rotary wheel type, a turret type or a fluidized bed. Each of the catalyst adsorption units may simultaneously perform an adsorption reaction or a catalyst redox or decomposition reaction; or, the adsorption catalyst unit may partially perform an adsorption reaction while partially performing a catalyst redox or decomposition reaction. In addition, the present invention provides a gas purification method for a low concentration organic compound, which comprises the following steps: (1) providing a gas purification filter material of a low concentration organic compound in air, wherein the catalyst adsorption unit is filled with a catalyst adsorption material (2) The air containing the low concentration organic compound to be treated is introduced into the device, and the catalyst adsorption unit filled with the catalyst adsorption material is further subjected to a chemical adsorption reaction, and at the same time, the cleaned air flow after adsorption is discharged; (3) Selection Turn on and/or close the relevant valve group, select whether to introduce the ozone generated by the ozone generating unit, and make the catalyst adsorption unit filled with the catalyst adsorbing material, further carry out chemical adsorption reaction and low temperature oxidation or reduction reaction of 200904513, and discharge at the same time (3) opening and/or closing the relevant valve group, introducing the adsorbed saturated adsorbent material into the water vapor or vapor generated by the water vapor or steam generating unit to further carry out the catalyst adsorbing material. Activated regeneration or replacement. The chemical reaction formula in the steps (2) and (3) is exemplified by the organic waste gas of the low-concentration organic malodorous compound DMS: a. Chemical adsorption alone

Ma++ DMS + Ma+--S(CH3)2 ; 或者: b、 線上臭氧加強氧化反應 Ma++ DMS Ma+ -S(CH3)2 ;Ma++ DMS + Ma+--S(CH3)2 ; or: b, on-line ozone enhanced oxidation reaction Ma++ DMS Ma+ -S(CH3)2 ;

Ma+--S(CH3)2+03 +Ma++DMSO (吸附性)+ 02 ; Ma+--S(CH3)2+203 +Ma++DMSOO (吸附性)+ 202 ; Ma+--S(CH3)2+303 +Ma++S02 个 + 2C02 +3 H20。 本發明之空氣中低濃度有機化合物之氣體淨化方法 中,該裝置可包含一複數個觸媒吸附單元,其係可同時進 行步驟(2)或及(3);或者是,該等複數個觸媒吸附單 元可部分進行步驟(2),並同時部分進行步驟(3)。 本發明之空氣中低濃度有機化合物之氣體淨化方法 中,該觸媒吸附材係由觸媒載體與觸媒組成,其中該觸媒 載體係選自活性碳、沸石、氧化鋁、其他多孔性物質或其 200904513 混合物;該觸媒之活性部 ,、〜Ni、Cu、阶為N,blt金屬,其係選自Μη 吸附材成形之形狀並==細圭係選自&而觸媒 狀、直球狀、蜂較佳可為眺狀、顆粒 二狀、多層:欠堆疊狀或發泡狀等形式。 " 目的在提供一種用於上述空氣中低濃产右 =物之氣體淨化裝置與方法 二 =觸::r其中該觸媒載體係選自活性碳= 虱化鋁其他多孔性物質或复、、日人舲.$艇上甘 分為N-orbit全屬甘总西"…物’该觸媒之活性部 巧金屬,其係選自MnFe、c〇Ni、Cu、% ς心其較佳係選自Cu;而觸媒吸 之 特別限制,較佳可盔圓知社 夕a 了為圓柱狀、顆粒狀、真球狀、蜂巢狀、 夕層次堆疊狀或發泡狀等形式。 Ο 根據本發明之觸媒吸附材,其可進行化學性吸附並可 學性再生還原。例如以低濃度有機惡臭化合物咖之 機廢氣為例,在單獨進行化學性吸附時之機制:Ma+--S(CH3)2+03 +Ma++DMSO (adsorption)+ 02 ; Ma+--S(CH3)2+203 +Ma++DMSOO (adsorption)+ 202 ; Ma+--S(CH3 ) 2+303 + Ma++S02 + 2C02 +3 H20. In the method for purifying a low concentration organic compound in the air of the present invention, the apparatus may comprise a plurality of catalyst adsorption units, which may perform steps (2) or (3) simultaneously; or, the plurality of contacts The medium adsorption unit may partially perform the step (2) and simultaneously perform the step (3). In the method for purifying a low concentration organic compound in the air of the present invention, the catalyst adsorbing material is composed of a catalyst carrier and a catalyst, wherein the catalyst carrier is selected from the group consisting of activated carbon, zeolite, alumina, and other porous materials. Or a mixture thereof of 200904513; an active portion of the catalyst, ~Ni, Cu, a grade N, a blt metal, which is selected from the shape of the Μη adsorbent material and is == 细 圭 is selected from & The straight spherical shape and the bee may preferably be in the form of a scorpion, a granule, or a plurality of layers: an under-stacked or a foamed form. " The purpose is to provide a gas purifying device and method for the low concentration of right-handed substances in the above air=Touch::r wherein the catalyst carrier is selected from activated carbon = other porous materials or complexes of aluminum telluride , Japanese people 舲. The boat is divided into N-orbit all belong to Gan Zongxi "...the 'active' of the active part of the catalyst, which is selected from the group consisting of MnFe, c〇Ni, Cu, % The best is selected from the group consisting of Cu; and the special limitation of the catalyst is that it is preferably in the form of a column, a granule, a true sphere, a honeycomb, an tier stack or a foam.触 According to the catalyst adsorbent of the present invention, it can be chemically adsorbed and can be reductively reduced. For example, the low-concentration organic malodorous compound coffee machine exhaust gas, in the case of chemical adsorption alone:

Ma + DMS M£ S(CH3) 線上以臭氧加強氧化之機制(其可延長吸附劑之壽奇Ma + DMS M £ S (CH3) line strengthens the oxidation mechanism with ozone (which can extend the life of the adsorbent)

Ma+ + DMS ^ Ma+-S(CH3)2 Ma+--S(CH3)2 + 〇3 + Ma+ + DMSO (吸附性)+ 02 Ma+--S(CH3)2 + 2〇3 + Ma+ + DMSOO (吸附性)+ 202 Ma+—S(CH3)2 + 303 + Ma+ + S02 个 + 2C02 +3H2〇 因此本發明之觸媒吸附材可搭配所設計之裝置使用, 吸附後之觸媒吸附材可取出以其他裝置化學性再生還原, 10 200904513 或者是於線上直接化學性再生還原。 下列實施例係僅為用以說明本發明,而不應解讀為限 制本發明之⑽。應注意的是,舉凡與料實施例等效的 變化與置換’諸如對於熟習此項技藝者顯而易見且為合理 者,可於不脫離本發明之範.下進行者,均應理解為:蓋 於本發明之齡之内。因此,本發明之保護範圍當以下文 之申請專利範圍所界定者為準。 【實施方式】 化學吸附劑合成 化學吸附劑1 將含結晶水之硝酸銅50克加入500毫升水後,充分 攪拌至硝酸銅完全溶解,將硝酸銅溶液25〇毫升倒入含 有200克活性碳之圓形瓶中,以旋轉揮發儀將水分去除 後,再加入剩下的250毫升硝酸銅溶液,再以旋轉揮發 儀將水分去除’將樣品以12〇t:烘乾,可得樣品248.5 克。 化學吸附劑2 將含結晶水之硝酸銅50克加入5〇〇毫升水後,充分 攪拌至硝酸銅完全溶解,將硝酸銅溶液25〇毫升倒入含 有200克γ型沸石之圓形瓶中,以旋轉揮發儀將水分去 除後,再加入剩下的250毫升硝酸銅溶液,再以旋轉揮 發儀將水分去除,將樣品以12(rc烘乾,可得樣品248 克。 200904513 化學吸附劑3 將高錳酸鉀79克加入1000毫升水後,充分攪拌至 高錳酸鉀完全溶解,將該溶液1000毫升倒入含有500 克活性碳中,並使其充分混合,靜置1小時後,將樣品 以120°C烘乾,可得樣品534克。 【實施例1】 第一圖為本發明之空氣中低濃度有機化合物之氣體淨 化裝置較佳具體例之示意圖。該裝置包含觸媒吸附單元 11,其中充塡有觸媒吸附材111,且其係由觸媒載體與觸 媒組成,而該觸媒載體係選自活性碳、沸石、氧化鋁、其 他多孔性物質或其混合物;該觸媒之活性部分為N-orbit 金屬,其係選自Mn、Fe、Co、Ni、Cu、Pb或Zn ;且其 並聯設置一風機30,該風機係設置於觸媒吸附單元11之 上游或下游端,其係可抽送所欲處理之空氣經過觸媒吸附 材111至該觸媒吸附單元11 ; 一控制閥41,其係可控制臭 氧是否需要進入觸媒吸附單元11及觸媒吸附材111 ;及一 臭氧產生單元20,其可提供臭氧於該觸媒吸附單元11及 觸媒吸附材111,作為加強觸媒吸附功能、低溫氧化還原 或分解反應之用。 而吸附完成之觸媒吸附材可取出再以活化還原處理, 另充填新品於觸媒吸附單元11。 【實施例2】 12 200904513 使用如實施例1所述之裝置,開啟風機3〇、關閉闕41 ,經由風機30可將空氣入口 31之所欲處理之低濃度有機 化合物之氣體導入觸媒吸附單元11及觸媒吸附材111,進 行化學性吸附反應,吸附後之乾淨氣體流經一氣體出口 32 排出。同時可以選擇開啟閥41,導入臭氧產生單元20所 產生之臭氧並調節臭氧供應或產生之濃度,使先前已進行 化學性吸附之觸媒吸附單元n内之觸媒吸附材ηι可同時 p 進行低溫氧化還原或及分解反應,以延長觸媒吸附單元11 内部所充填之觸媒吸附材lu之使用壽命及其處理效率, 而所產生之結淨氣體氣由該氣體出口 32排出。 於觸媒吸附單元11内部所充填之觸媒吸附材ln吸附 .飽和後,可將其進行線外觸媒吸附材之再生活化還原反應 〇 實施例3-5為分別以難處理的低濃度有機惡臭化合物 DMS、DMDS及Hj作為含難處理的低濃度有機化合物之 U 氣體,測試本發明裝置所充填之觸媒吸附材之處理效能, 實施例3、4所使用之觸媒吸附材組成為吸附劑丨、2,而 實施例5所使用之觸媒吸附材組成為吸附劑3,各組實施 例結果如下表1、2、3所示。 同時,於進行實施例3-4低濃度DMS及DMDS有機 硫化合物之氣體淨化處理後之吸附劑,進行高溫脫附即時 '線上尾氣Mass分析’其結果如第二圖所示,於第二圖之 脫附尾氣分析質譜可見,於脫附進行過程之尾氣中,確實 有大量之DMSO及DMSOO存在。 13 200904513 表1、以DMS測試充填吸附材處理效能之結果 觸媒線速度 (m/s) DMS 入口漢度(ppb) DMS 出口濃度(ppb) 去除效率 (%) 觸媒壽命(hrs) (效率>95%) 臭氧 加入濃度(ppm) 臭氧 出口濃度(ppm) 0.5 900 15 98.3% > 8,000 6.8 <0.1 0.5 3,600 20 99.4% > 4,000 6.8 <0.1 0.5 15,000 30 99.8% >1,440 39.0 <0.1 1.0 1,800 18 —99.0% > 3,600 3.4 <0.1 1.0 150 1〜3 >98.0% > 8,600 <0.4 <0.01 1.0 150 12 〜15 >90.0% >270 0 (無臭氧供應) 0 1.0 30 <1 >97.0% > 8,600 <0.1 <0.01 1.0 30 3〜6 >80.0% -·—- >1,080 0 (無臭氡供應) 0 由上表中可見,當於輸入高濃度之DMS(900、3,600、 15,000、1,800 ppb)時,加入臭氧後之去除效率達98%以 上’且具長時效之觸媒壽命;而於低濃度之DMS(150、30 ppb)時’可發現在有供給臭氧時’去除效率皆在97%以上, 而在未添加臭氧情形’去除效率僅分別大於90%及80%, 〇 、更見添加臭氧對去除效率之影響,且於底濃度下, 添加六氧可有效提升觸媒壽命大於八倍之多(8600: 1〇8〇)。 2 ρ DMDS 度(ppb) 去除效率 (%) 觸媒壽命(hrs) (效率>95%) 臭氧加入濃 度(ppm) 臭氧出口濃 度(ppm) 8 99.1% >3860 6.8ppm <0.1 12 99.7% >1680 6.8ppm <0.1 15 99.2% > 1680 3.4ppm <0.1 觸媒吸附材處理效能之結果Ma+ + DMS ^ Ma+-S(CH3)2 Ma+--S(CH3)2 + 〇3 + Ma+ + DMSO (adsorption) + 02 Ma+--S(CH3)2 + 2〇3 + Ma+ + DMSOO (Adsorption Sex) + 202 Ma+—S(CH3)2 + 303 + Ma+ + S02 + 2C02 +3H2〇 Therefore, the catalyst adsorbent of the present invention can be used in combination with the designed device, and the adsorbent adsorbent after adsorption can be taken out to other Device chemical regeneration reduction, 10 200904513 or direct chemical regeneration on the line. The following examples are merely illustrative of the invention and are not to be construed as limiting (10) of the invention. It should be noted that variations and substitutions equivalent to those of the material embodiments, such as those apparent to those skilled in the art, and which can be made without departing from the scope of the invention, are to be understood as Within the age of the invention. Therefore, the scope of the invention is defined by the scope of the following claims. [Example] Chemical adsorbent synthetic chemical adsorbent 1 50 g of copper nitrate containing crystal water was added to 500 ml of water, and then fully stirred until copper nitrate was completely dissolved, and 25 ml of copper nitrate solution was poured into 200 g of activated carbon. In a round bottle, remove the water by a rotary volatizer, then add the remaining 250 ml of copper nitrate solution, and then remove the water by a rotary volatizer. 'When the sample is dried at 12 〇t:, 248.5 g of the sample is obtained. Chemical adsorbent 2 50 g of copper nitrate containing crystal water was added to 5 ml of water, and then fully stirred until copper nitrate was completely dissolved, and 25 ml of a copper nitrate solution was poured into a round bottle containing 200 g of γ-type zeolite. After removing the water by a rotary volatizer, the remaining 250 ml of copper nitrate solution was added, and the water was removed by a rotary volatizer, and the sample was dried at 12 (rc, and 248 g of the sample was obtained. 200904513 Chemical adsorbent 3 After adding 79 g of potassium permanganate to 1000 ml of water, stir well until potassium permanganate is completely dissolved. Pour 1000 ml of the solution into 500 g of activated carbon and mix it thoroughly. After standing for 1 hour, the sample is taken. The sample was dried at 120 ° C, and 534 g of a sample was obtained. [Example 1] The first figure is a schematic diagram of a preferred embodiment of a gas purifying apparatus for a low concentration organic compound in the air of the present invention. The apparatus comprises a catalyst adsorption unit 11, The catalyst adsorbent material 111 is filled with a catalyst carrier and a catalyst, and the catalyst carrier is selected from the group consisting of activated carbon, zeolite, alumina, other porous materials or a mixture thereof; Active part The N-orbit metal is selected from the group consisting of Mn, Fe, Co, Ni, Cu, Pb or Zn; and a fan 30 is arranged in parallel, and the fan is disposed upstream or downstream of the catalyst adsorption unit 11 The air to be treated may be pumped through the catalyst adsorption material 111 to the catalyst adsorption unit 11; a control valve 41 for controlling whether ozone needs to enter the catalyst adsorption unit 11 and the catalyst adsorption material 111; and an ozone generation The unit 20 can provide ozone to the catalyst adsorption unit 11 and the catalyst adsorption material 111 for enhancing the adsorption function of the catalyst, low-temperature redox or decomposition reaction, and the adsorbent adsorbent material can be taken out and activated. The reduction treatment is further filled with a new product in the catalyst adsorption unit 11. [Embodiment 2] 12 200904513 Using the apparatus as described in Embodiment 1, the fan 3 is turned on, the crucible 41 is turned off, and the air inlet 31 can be opened via the blower 30. The treated gas of the low concentration organic compound is introduced into the catalyst adsorption unit 11 and the catalyst adsorption material 111 to perform a chemical adsorption reaction, and the adsorbed clean gas is discharged through a gas outlet 32. At the same time, the opening valve 41 can be selected. The ozone generated by the ozone generating unit 20 is introduced and the concentration of the ozone supply or the concentration is adjusted, so that the catalytic adsorbent ηι in the catalyst adsorption unit n which has been chemically adsorbed before can simultaneously perform low-temperature redox or decomposition reaction. The service life of the catalyst adsorbing material lu filled in the catalyst adsorbing unit 11 and the processing efficiency thereof are extended, and the generated clean gas is discharged from the gas outlet 32. The touch filled in the catalyst adsorption unit 11 The adsorbent material ln is adsorbed. After saturation, it can be subjected to regeneration and reduction reaction of the external catalyst adsorbing material. Examples 3-5 are difficult to treat the low-concentration organic malodorous compounds DMS, DMDS and Hj, respectively. The U gas of the treated low concentration organic compound was tested for the treatment efficiency of the catalyst adsorbing material filled in the apparatus of the present invention. The catalyst adsorbing materials used in Examples 3 and 4 were composed of adsorbent 丨, 2, and Example 5 The catalyst adsorbent material used was composed of adsorbent 3, and the results of the respective examples are shown in Tables 1, 2 and 3 below. At the same time, the adsorbent after the gas purification treatment of the low-concentration DMS and the DMDS organic sulfur compound of Example 3-4 is carried out, and the high-temperature desorption is immediately performed on the 'line exhaust gas analysis'. The result is shown in the second figure, in the second figure. The desorption tail gas analysis mass spectrum shows that a large amount of DMSO and DMSOO are present in the tail gas of the desorption process. 13 200904513 Table 1. Results of treatment efficiency of packed adsorbent by DMS. Catalytic linear velocity (m/s) DMS inlet Hanitude (ppb) DMS outlet concentration (ppb) removal efficiency (%) Catalyst lifetime (hrs) (efficiency) >95%) Ozone addition concentration (ppm) Ozone outlet concentration (ppm) 0.5 900 15 98.3% > 8,000 6.8 <0.1 0.5 3,600 20 99.4% > 4,000 6.8 <0.1 0.5 15,000 30 99.8% > 1,440 39.0 <0.1 1.0 1,800 18 —99.0% > 3,600 3.4 <0.1 1.0 150 1~3 >98.0% > 8,600 <0.4 <0.01 1.0 150 12 〜15 >90.0% >270 0 (no ozone Supply) 0 1.0 30 <1 >97.0% > 8,600 <0.1 <0.01 1.0 30 3~6 >80.0% -·-- >1,080 0 (no skunk supply) 0 As can be seen from the above table, When inputting high concentration DMS (900, 3, 600, 15,000, 1,800 ppb), the removal efficiency after adding ozone is over 98%' and has a long-acting catalyst life; and at low concentration DMS (150, 30 ppb) When the time is 'there is ozone, the removal efficiency is above 97%, and in the case of no ozone added, the removal efficiency is only greater than 90% and 80%, respectively. The effect of ozone addition on the removal efficiency, and at the bottom concentration, the addition of hexaoxide can effectively increase the catalyst life by more than eight times (8600: 1〇8〇). 2 ρ DMDS degree (ppb) removal efficiency (%) Catalyst lifetime (hrs) (efficiency > 95%) Ozone addition concentration (ppm) Ozone outlet concentration (ppm) 8 99.1% >3860 6.8ppm <0.1 12 99.7 % >1680 6.8ppm <0.1 15 99.2% > 1680 3.4ppm <0.1 Catalyst Adsorption Material Processing Results

(s ') 14 200904513 由上表中可見,不論輸入濃度多少之DKlSpGO、 3,600、1,800 ppb),力口入臭氧後之去除效率皆達990/〇以上, 且具長時效之觸媒壽命。 表3、以H2S測試充填觸媒吸附材處理效能之結果 觸媒線速度 h2s h2s 去除效率 觸媒壽命(hrs) — 〜 臭氧加入:農 -~~~~--- 臭氧出口濃 (m/s) 入口濃度(ppb) 出口濃度(ppb) (%) (效率>95%) 度(ppm) S Γηητπ'ΐ 0.5 900 10 98.9% >2880 6.8ppm <0.1 0.5 3,600 15 99.6% > 1440 6.8ppm <0.1 1 1,800 13 99.3% > 1440 3.4ppm ----~_ <0.1 '~-—— 由上表中可見,不論輸入濃度多少之H2S(90〇、3,6()()、 1,800 ppb),加入臭氧後之去除效率皆達98%以上,且具長 時效之觸媒壽命。 產業可利用性 本發明之空氣低濃度有機化合物之氣體淨化方法及其 所使用之觸媒吸附材可處理含惡臭化合物之氣體,例如二 甲基硫(DMS)、二曱基二硫(DMDS)、硫化氫(HA)等硫化 物及甲路、醋酸、異丙醇、丙酮等含惡臭化合物之唆氫化 合物,可解決傳統處理裝置不能或不適處理某些低濃度有 機化合物之氣體的問題,並可增加觸媒效率,延長觸媒壽 命,為相當符合環保及能源需求之優良技術,值得應用於 高風量低濃度排放之高科技晶圓製造、光電面板製造業、 塗裝印刷業及相關化工業;同時亦可應用於高科技晶圓製 15 200904513 造、光電面板製造業潔淨室潔淨空氣淨化含硫化合物及碳 氳化合物之空氣分子微污染物AMC淨化之用。 【圖式簡單說明】 第一圖為本發明之空氣中低濃度有機化合物之氣體淨 化裝置較佳具體例的示意圖。 第二圖脫附尾氣分析質譜圖,其係為進行脫附即時線 上Mass分析之結果。 r 【主要元件符號說明】 II 觸媒吸附單元 20 臭氧產生單元 30 風機 31 低濃度有機氣體入口 32 氣體出口 U 41 閥 III 觸媒吸附材(s ') 14 200904513 It can be seen from the above table that regardless of the input concentration of DKlSpGO, 3,600, 1,800 ppb), the removal efficiency after the ozone is more than 990 / 〇, and the long-acting catalyst life . Table 3. Results of H2S test filling catalyst adsorption material. Catalyst line speed h2s h2s Removal efficiency Catalyst life (hrs) — ~ Ozone addition: Agriculture-~~~~--- Ozone outlet thick (m/s Entrance concentration (ppb) outlet concentration (ppb) (%) (efficiency > 95%) degree (ppm) S Γηητπ'ΐ 0.5 900 10 98.9% >2880 6.8ppm <0.1 0.5 3,600 15 99.6% > 1440 6.8ppm <0.1 1 1,800 13 99.3% > 1440 3.4ppm ----~_ <0.1 '~-—— As can be seen from the above table, regardless of the input concentration, H2S (90〇, 3, 6() (), 1,800 ppb), the removal efficiency after adding ozone is more than 98%, and has a long-lasting catalyst life. INDUSTRIAL APPLICABILITY The gas purification method of the low-concentration organic compound of the present invention and the catalyst adsorbing material used therefor can treat a gas containing a malodorous compound such as dimethyl sulfide (DMS) or dimercapto disulfide (DMDS). Sulfide such as hydrogen sulfide (HA) and a hydrogen compound containing a malodorous compound such as a road, acetic acid, isopropanol or acetone, which can solve the problem that a conventional treatment device cannot or does not handle a gas of a certain low concentration of an organic compound, and It can increase catalyst efficiency and extend catalyst life. It is an excellent technology that meets environmental protection and energy requirements. It is worthy of high-tech wafer fabrication, photovoltaic panel manufacturing, coating and printing industry and related industries with high air volume and low concentration emission. At the same time, it can also be used in the high-tech wafer system 15 200904513 manufacturing, photovoltaic panel manufacturing clean room clean air purification sulfur compounds and carbon monoxide compounds air molecules micro-pollutants AMC purification. BRIEF DESCRIPTION OF THE DRAWINGS The first figure is a schematic view showing a preferred embodiment of a gas purifying apparatus for a low concentration organic compound in the air of the present invention. The second graph desorbs the exhaust gas analysis mass spectrum, which is the result of the Mass analysis on the desorption line. r [Description of main component symbols] II Catalyst adsorption unit 20 Ozone generation unit 30 Fan 31 Low concentration organic gas inlet 32 Gas outlet U 41 Valve III Catalyst adsorbent

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Claims (1)

200904513 十、申請專利範圍: 1. 一種低濃度有機化合物之氣體淨化方法,其包含下列步 驟: (a) 提供一種低濃度有機化合物之氣體淨化濾材裝置,其 係包含一觸媒吸附單元,且該觸媒吸附單元中充塡一 觸媒吸附材; (b) 所欲處理之低濃度有機化合物之空氣導入該裝置,使 充填該觸媒吸附材之觸媒吸附單元進一步進行化學 性吸附反應,同時排出經吸附後之乾淨氣流; (c) 選擇開啟及/或關閉相關閥組,選擇是否導.入臭氧產 生單元所產生之臭氧,使充填該觸媒吸附材之觸媒吸 附單元進一步進行化學性吸附反應及低溫氧化還原 或分解反應,同時排出經吸附後之乾淨氣流。 2. 如申請專利範圍第1項之低濃度有機化合物之氣體淨化 方法,其中該步驟(2)及(3)中處理DMS之化學反 應式係為: (a) 單獨進行化學性吸附 Ma+ + DMS Ma+-S(CH3)2 ; (b) 線上以臭氧加強氧化 Ma+ + DMS + Ma+--S(CH3)2 ; Ma+--S(CH3)2 + 03 + Ma+ + DMSO (吸附性)+ 〇2 ; Ma+--S(CH3)2 + 203 + Ma+ + DMSOO (吸附 性)+ 202 ; 17 200904513 Ma'-S(CH3)2 + 3〇3 + Ma+ + S02 个 + 2c〇2 +3Η20。 3.如申請專利範圍第1或2項之低濃度有機化合物之氣體 淨化方法,其進一步包含步驟⑷:係以開啟及/或關閉 相關閥組,將已吸附飽和之觸媒吸附材導入一水氣或蒸 氣產生單元產生之水氣或蒸氣,以進一步進行觸媒吸附 材之活化再生或更換。 η 4.如申請專利範圍第3項之低濃度有機化合物之氣體淨化 方法,其進一步包含步驟(5):係設置一空氣淨化處理 設備以終處理步驟(3)所生成之新污染物。 5·^申請專利範圍第i或2項之低濃度有機化合物之氣體 爭化方法,其中該至少一個觸媒吸附單元可同時進行步 驟(2)或步驟(3);其中該觸媒吸附單元亦可部分進行 步驟(2),同時部分進行步驟(3)。 6’如申請專利範圍第1或2項之低濃度有機化合物之氣體 (耗方法’其+該臭氧產生單元可為線上產生臭氧,亦 可為線外產生臭氧供應。 7. 如申請專·圍第6項之低濃度有機化合物之氣體淨化 =去,其中該臭氧產生單元為線上產生方法,其係包含 务、外線法、電解法、無聲放電法、尖端放電法、電漿法。 8. 如申請專利範圍第1或2項之低濃度有機化合物之氣體 9乎化方法,其中該觸媒吸附材係由觸媒載體與觸媒組成。 9·如申請專利範圍第8項之低濃度有機化合物之氣體淨化 方法,其中該觸媒載體係選自活性碳、沸石、氧化鋁、 18 200904513 其他多孔性物質或其混合物。200904513 X. Patent application scope: 1. A gas purification method for a low concentration organic compound, comprising the following steps: (a) providing a gas purification filter device with a low concentration organic compound, comprising a catalyst adsorption unit, and The catalyst adsorption unit is filled with a catalyst adsorption material; (b) the air of the low concentration organic compound to be treated is introduced into the device, and the catalyst adsorption unit filled with the catalyst adsorption material is further subjected to a chemical adsorption reaction, and simultaneously Exhaust the cleaned air stream after adsorption; (c) Select to open and/or close the relevant valve group, select whether to introduce the ozone generated by the ozone generating unit, and further chemicalize the catalyst adsorption unit filled with the catalyst adsorbing material. The adsorption reaction and the low-temperature redox or decomposition reaction simultaneously discharge the cleaned gas stream after adsorption. 2. For the gas purification method of the low concentration organic compound in the first application of the patent scope, wherein the chemical reaction formula of the DMS in the steps (2) and (3) is: (a) chemical adsorption alone Ma+ + DMS Ma+-S(CH3)2 ; (b) Ozone enhanced oxidation on the line Ma+ + DMS + Ma+--S(CH3)2 ; Ma+--S(CH3)2 + 03 + Ma+ + DMSO (adsorption) + 〇2 Ma+--S(CH3)2 + 203 + Ma+ + DMSOO (adsorbing) + 202 ; 17 200904513 Ma'-S(CH3)2 + 3〇3 + Ma+ + S02 + 2c〇2 +3Η20. 3. The method for purifying a low concentration organic compound according to claim 1 or 2, further comprising the step (4) of: opening and/or closing the relevant valve group to introduce the adsorbed saturated adsorbent into the water. The water or vapor generated by the gas or steam generating unit is further activated or reactivated or replaced by the catalytic adsorbent. η 4. The gas purification method of the low concentration organic compound according to claim 3, further comprising the step (5) of: setting an air purification treatment device to finally process the new pollutant generated in the step (3). 5. The method for gasification of a low concentration organic compound of the invention of claim i or 2, wherein the at least one catalyst adsorption unit can simultaneously perform step (2) or step (3); wherein the catalyst adsorption unit is also Step (2) may be partially performed while step (3) is partially performed. 6'If the application of the low-concentration organic compound gas in the first or second patent range (the method of 'the + ozone generating unit can generate ozone on the line, can also produce ozone supply outside the line. The gas purification of the low-concentration organic compound of item 6==, wherein the ozone generating unit is an on-line generation method, which comprises a method of dividing the line, an external line, an electrolysis method, a silent discharge method, a tip discharge method, and a plasma method. A method for applying a gas of a low concentration organic compound according to claim 1 or 2, wherein the catalyst adsorbent is composed of a catalyst carrier and a catalyst. 9. A low concentration organic compound as in claim 8 A gas purification method, wherein the catalyst carrier is selected from the group consisting of activated carbon, zeolite, alumina, 18 200904513 other porous materials or mixtures thereof. •如申清專利範圍第8項之低濃度有機化合物之氣體淨 化方去,其中該觸媒吸附材成形形狀可為圓柱狀、顆粒 狀、真球狀、蜂巢狀或多層次堆疊狀或發泡狀。 i如申睛專利範圍第8項之低濃度有機化合物之氣體淨 法其中5亥觸媒之活性部分為N-orbit金屬(過渡 金屬第―員)’其係選自Mn、Fe、Co、Ni、Cu或Zn。 12.如申請專利範圍第U項之低濃度有機化合物之氣體淨 化方法,其中該觸媒之活性部分係為Cu。 13·—種用於如巾請專利範圍第1或2項之低濃度有機化合 物之氣體#化方法之觸媒吸附材,其係由觸媒載體愈觸 媒組成。 ~ 14.=申請專利範圍第13項之觸媒吸附材,其中該觸制 體係選自活性碳、彿石、氧化銘、其他多孔性物質幻 之混合物。 AH請專利範㈣13項之觸媒吸附材,其中該觸媒怒 7材成形形狀可為圓柱狀、顆粒狀、真球狀、蜂巢狀 多層次堆疊狀或發泡狀。 16’ =請^範圍第13項之吸附觸媒,其中該觸媒之活 W為N-〇rblt金屬(過渡金屬第一類),且係選自 _、Fe、Co、Ni、Cu、pb 或 Zn。 I申請專利範圍第16項之吸附觸媒,其中該觸銲之活 性部分係為Cu。 * 19• If the gas concentration of the low-concentration organic compound in the eighth paragraph of the patent scope is applied, the shape of the catalyst adsorbing material may be cylindrical, granular, true spherical, honeycomb or multi-layer stacked or foamed. shape. i. For example, the gas concentration method of the low concentration organic compound in the eighth item of the patent scope is that the active part of the 5 hai catalyst is N-orbit metal (transition metal ―member), which is selected from the group consisting of Mn, Fe, Co, and Ni. , Cu or Zn. 12. A gas purification method for a low concentration organic compound according to the U of claim U, wherein the active portion of the catalyst is Cu. 13. A catalyst-adsorbing material for a gas-based method of a low-concentration organic compound according to the first or second aspect of the patent application, which is composed of a catalyst carrier and a catalyst. ~ 14.= The catalyst adsorption material of claim 13 of the patent scope, wherein the tactile system is selected from the group consisting of activated carbon, buddha, oxidized, and other porous materials. AH invites the catalyst adsorption material of the 13th patent (4), wherein the shape of the catalyst anger material can be cylindrical, granular, true spherical, honeycomb-like multi-layer stacked or foamed. 16' = Please select the adsorption catalyst of the 13th item, wherein the activity W of the catalyst is N-〇rblt metal (transition metal first type), and is selected from _, Fe, Co, Ni, Cu, pb Or Zn. I. The adsorption catalyst of claim 16 wherein the active portion of the contact is Cu. * 19
TW96126704A 2007-07-20 2007-07-20 Gas cleaning method for organic compound with low concentration TW200904513A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102274689A (en) * 2010-06-13 2011-12-14 杰智环境科技股份有限公司 Catalyst purification apparatus for incinerator end gas, and method thereof
TWI402100B (en) * 2009-08-11 2013-07-21
TWI447334B (en) * 2011-05-31 2014-08-01
TWI681807B (en) * 2018-08-17 2020-01-11 精遠科技有限公司 Heatless regeneration system and method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402100B (en) * 2009-08-11 2013-07-21
CN102274689A (en) * 2010-06-13 2011-12-14 杰智环境科技股份有限公司 Catalyst purification apparatus for incinerator end gas, and method thereof
TWI447334B (en) * 2011-05-31 2014-08-01
TWI681807B (en) * 2018-08-17 2020-01-11 精遠科技有限公司 Heatless regeneration system and method thereof

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