TW200904236A - Surface light emitter - Google Patents

Surface light emitter Download PDF

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Publication number
TW200904236A
TW200904236A TW97111687A TW97111687A TW200904236A TW 200904236 A TW200904236 A TW 200904236A TW 97111687 A TW97111687 A TW 97111687A TW 97111687 A TW97111687 A TW 97111687A TW 200904236 A TW200904236 A TW 200904236A
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TW
Taiwan
Prior art keywords
light
layer
refractive index
scattering
scattering layer
Prior art date
Application number
TW97111687A
Other languages
Chinese (zh)
Inventor
Norihiro Itou
Takeyuki Yamaki
Nobuhiro Ide
Kenji Kawano
Original Assignee
Matsushita Electric Works Ltd
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Publication date
Priority claimed from JP2007095188A external-priority patent/JP5536977B2/en
Priority claimed from JP2007165421A external-priority patent/JP5065776B2/en
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Publication of TW200904236A publication Critical patent/TW200904236A/en

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Abstract

A surface light emitter having improved light transmission efficiency of transmitting light to the externality, including a light-transmitting substrate 1, a light-scattering layer 2 formed on the surface of the light-transmitting substrate 1, and an organic or inorganic light emitter 3 which is formed on the surface of the light-scattering layer 2 and uses optical or electrical energy to emit light. The light-scattering layer 2 includes a binder 4 and two fillers 5 and 6, the refractive indexes of which satisfy the relationship Nf2 > Nb > Nf1, where Nb is the refractive index of the binder 4, and Nf1 and Nf2 are the refractive indices of the two fillers 5 and 6. The presence of the two types of fillers 5 and 6 in the light-scattering layer 2 disrupts the critical angle of the light exiting the light-scattering layer 2 into the light-transmitting substrate 1, which causes a greater percentage of light entering the light-transmitting substrate 1 and improves the light transmitting efficiency of transmitting light to the externality.

Description

200904236 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種面發光體,其用在各 液晶用背光源、照明用光源等。 谷制μ、顯不轉、 【先前技術】 作為各種顯示器、顯示元件、背光源、昭 利用光或電能發光的面發光體,具有高亮度用, 量等很多優異的特徵。該等面發光體之中各朽^輕 材料發光的有機電致發光元件(有姐=電 ν左右的低電壓就能得到高亮度的面發 J $為用數 面上該表 EL·材料所構成的發光層8,還有形 《表上的有機 極9等構件所構成的。並且,^透日 8表面上的對向電 施加電壓,使發光層8所發的光極9之間 性基板1 *發$。 臂心㈣電極層7以及透光 在此’像有機EL元件那檨由;^ M % 為發光體_的發光層8射出的發光元件,從其作 射率,以及發光光線射出===出由發光層8的折 光性基板i的折射率所決 ^H即透明電極層7或透 光會在界面全反射,被封人發在臨界角以上時’ 波光。根據古典光學㈣奈I 8 件的内部’消失成為導 為 '時,所發光線被取出到外部的2 2發光層8的折射率 l/(2n )。例如當發光層8的 為^效率77可近似為;^ 以上的光成為導波光變成了^ ^時’ ei7%左右,80% 失掉,從有機發光元件取出光線的ί取出 損失光而損 200904236 又 -在發光物質内使用了螢光材料的有機EL元件,其在利用 ,各電極7以及9注入的電荷的再結合所產生的激子㈣㈣之 中:跟發光有關白勺’只有單態激子而已,其產生機率為1/4。亦即, 就异是僅考慮此點’效率就為5%如此相當地低。相對於此,近年, =發光層本身發光鱗的方法,已進展_發出從三態激子的 %光也能獲得發光的發光材料,進而發現能夠躍進地提高量子效 率的可能性。 > 然而,即使以此方式使量子效率提高,但如果光取出效率低, 則合併之效果仍會使得有機EL元件的發光效率降低。換言之,-若 改善取出效率,則應能根據共效效果躍進地提高發光效率°。 在透光性基板1的表面上隔著透明電極層7疊層發光層8形 成有機EL元件時,如上所述,約達到8〇%的損失光,大部^是^ 於⑴在透光性基板1與空氣之界面的全反射,⑺在透明電U ? 與透光性基板1之界面的全反射所造成。亦即,光從高折射^ ,入射到低折射的介質時,根據全反射的概念,具大於等於 界角的入射角的光線,在該界面被全反射後被封人該内部。' : 透光性基板1與^氣的界面的全反射,與(2)之透明電極層7 光性基板1的界面的全反射的比例,若分別考慮立 之、, 前者約35%,後者約45%。 因此,現在,就改善光取出效率之方法而言,有人遂 改變透光性基板1與空氣的界面的性質,(2)改變透明電極^ 透光性基板1的界面的性質2種方法。關於前者,有人提& •猝 由在透光性紐1表φ設錄射層或魏構造啸高 率: 方法f照例如日本專师則川號公報)或形成繞射光拇J 方法(參照例如日本特開平⑺—奶37!號公報)等。 、勺 關於後者,如圖3B所示,在透明電極層7與透光性美 間形成光散射層2,用光散射層2使光散射。藉此,降低^ 極層7與透光性基板!的界面所產生的全反射的比例,使 J 出效率提高。光散射部2,細在透光性基板丨的_電極 200904236 性基板1的透明電極層7 散射層2的表面上形成緩和> 因此,如圖3B所不,在光 緩和層的平^ 1 ’使凹凸被攤平而變平滑,並在 曰本艮薄的透明電極層7(參照例如 等ΪΪ) 咖軸1、日本特開聽—娜號公報 4 而’如上所述若在絲1射層2與透明電極声7之門來出έ- 光會在透日㈣極層7與緩和層31的界日面發生全it 该王反射會降低絲出效率,故希光取蚊率能更加提高 【發明内容】 鑑於上述觀點而生,目的在於提供 明電極層與緩和層之界面發生光之全反射,能提i 為達成上述目的’本發明—態樣之面發光體,包含 土材,光散射層,形成於前述透光性基材之表面. 益 ,光體層,形成於前述光散射層表面,藉光或電能而發工或忒 層包含黏結劑及2種充填料,當以前述黏結劑之 折射率為Nb 1述2種充填料其中之一的折射率為邱、另 之折射率為Nf2時,滿足Nf2>Nb>Nf12關係。 依照如此構成’形成在透光性基板與發光層之間之光散射 層,由於係以包含滿足上述折射率之關係的黏結劑及2種充填料 =成,因此光散射效果放大’從發光體層(薄膜)發出之光從光 政射層射出到透光性基材時,臨界角發生混亂,光入射到透光性 基材之入射效率提雨,光取出到外部之效率更大。 【實施方式】 實施發明之最佳形熊 200904236 (第1實施形態) 就本發明第1實施形態之面發光體,參照圖1A以及1B説明 之。圖1A係表不第1實施形態之面發光體的構造,圖⑴係表示 形成在该透光性基材1表面上的光散射層2。 ' 养i祕可使用藉光或電能發光的有機或是無機構 ^元件。發紐3,伽軸在光㈣層2上的咖電=層有 、對向賴(陰極)9以及視g要峨置的電洞輸送 Ϊ二if送層11等所構成的。在發光層8所發出的光線,通 ΐί 7,再如圖1B中箭頭所示,透射過光散射層2以及 透光性基材1,發射到外部。 基材1而言,可使用公知的透明基板,例如納玻璃 J無驗破财_的基板,或是聚碳酸 J可撓性基板等。透紐基材丨的折射率,— 146〜丨6= 圍内。 ^ίίίΐ層2係使黏結劑4内含有2種充填料料5、6所形成的。 形成在透絲基材1表面上的被覆膜,其係將摻 :ίίΪΪ 及黏結劑形成材料所調製而成的液狀塗布材料 二沾ft在透光性基材1表面上’並讓形成在透光性基材1表 出乾燥所製成的。在此所謂乾燥,係指從塗膜除去液體 中或,發性成分)而留下固體的被覆_意思,乾燥時亦可因應 。又,在乾燥製得被覆膜之後,亦可將被覆膜加熱而 處理。再者’亦可利用持續乾燥 就塗膜形成方法而言,可使用旋轉塗布法、喷塗ί ^貝,主佈法、印刷塗佈法等,惟並不限於該等以外之方法。 絲形成ϋ光散射層2中,在由黏結劑形成材料所生成的 ί占:者充填料料5、6 ’且該等構件互相形成相異態相。 充填料料5、6保持並拘束為分散狀態。該黏結 '、藉由使▲布成被覆膜狀的液狀塗布材料組成物乾燥,而由 200904236 =劑:ί材f所形成的。在乾燥時,黏結劑形成材料可起化學 起化學變化。藉由使黏結劑形成材料,從溶解及/; =二:=可因應需要而含有其他:ί有 塗劑、以乙m 物為代表用來形成平滑塗膜的勻 触物;二::醇::子;:二、;酸乙二醇單乙醚等的乙二醇 用來控制膜厚的增黏劑的二乙二醇衍生物等為代表 材1之間的密合二;二J合弗:劑,以及用來賦予跟透光性基 光散射層2 f有2種充填料料5、6所形成的 其中一種的^射率為Nb ’ 2種充填咖、6 4以及2種充填料料5、;,: ’則選擇黏結劑 使黏結劑4以及2種紐料^滿足Nf2>Nb>Nfi的關係。若可 藉由其折射率的差,的折射率滿足此關係,則便能 使透明電極層7 極層7與透光性基材⑽面, 有機發光層8發出之光當的f界角產生混亂,以增加 的比例’結^ 電極層7入射到透光性‘ 中空氧化矽微粒、5聚言,例如:氣凝膠(咖ge〇微粒、 化物微粒等。又,微粒、有機聚合物微粒、金屬氧 過界面活性材料處理S腺、6,粒子’為了提高分散性,宜經 度的表面被覆處理。q、布处理等不會使折射率顯著變化程 惟2種充;:料,-般在1.2〜2.5的範圍内, 甲,”令一種的充填料料其折射率Nfi宜 200904236 ϋ ^下3。ί射率雨1的下限並無特別限定,一般在u左 料二爲’ο猎由使八中—種充填料料的折射率邱在μ以下,使 幅降低。結果,便能形成光散射性高,且 為佳又填f料5、6的折射率Nfi與呢的差宜在〇.5以上 ί ί 填料料5、6的折射率W與Nf2的差設在0.5 高光取出效率增加,結果上能更進一步提 限並無特別限定,惟與吨的差其上 等=3=的其低m 8以及對㈣i9 徑宜在5·以上為i si /Γ故充填料料5、6的平均粒 情況下(例如Ra=2()nm ^糙1大的 和層(平坦化層)(參照3b)。辕* 二 曰々表面上δ又置緩 Ra在2〇nm以下即以無特別〇限曰制、。才料或形成方法,使粗糙度 料料時,其中一種充填 佳。如是,藉由在2種充經的2倍以上為 5的平均粒徑為另一種充填' 料 ^,5襄其中—種充填料料 均粒徑大的充填料料平均粒徑的2倍以上,以在平 =將充填料料5、6分散於= 充=i6的狀態 中充填料料5、6的分散性 “I ^ ^提兩黏結劑4 光散射層2。2種充填料料5、6並成千^刀f有充真料料5、6之 制,惟兩者的平均粒徑差宜在二、〜差的上限並無特別限 料料5、6的粒經或平均粒 =使=内為佳。又,充填 係由後述使用雷射光繞射原理的粒 200904236 度分=量裝置_量之數值。 卜’點結劑4的材料,/ 氧化石夕多孔質體等 =如可為有機聚合物、金屬氧化 率”足上述關係式選擇充填料料5、6的折射 一般在1.H.60喊圍^羊的材枓即可。黏結劑4的折射率灿 在黏結劑4與充填料料$、 料5、6宜從氣凝膠微粒 勺上述材料的組合之中,充填料 中選擇至少i種,黏==微粒以及聚合物製中空微粒 至少1種為佳。 從有機聚合物以及金屬氧化物選擇 的範圍内為佳。又_^=4別限^ ’惟-般宜在100〜2000nm 無特別限制,惟—般相^ ==,料5、6的含有比率並 宜設定在10 ·· 90〜7〇 : 4而吕充填料料5、6的質量比率 亦無特別限制,惟小折射圭'、xt ^再者,2種充填料料5、6的比率 1的質量比率摻合為佳。與大折射率⑽者宜以i ·· 9〜9 : 所述那樣僅限於2種充埴=^蜊4中含有的充填料料並非如上 等。此時必須至少2種充填料6,已’更可包含第3充填料料 光散射層2的折射;與黏結齊B有上述關係。 定成與透光性基材1的折射的^圍内,惟仍宜設 可降低從光散射層2义射斤射率相同或比其更小, 比例,使光線取邮材1⑽规發生全反射的 又,光散射層2其濁霧声彳 定在2〜5G的範_為佳全透射率)嘴)宜設 成光取有體^便_及外觀,而達 高光取出效率,但可\的濁霧度値高時,即便提 豆士,就FM △ ,Γ 白色化,損及面發光體的外觀。 散射層2上的明之。如前所述,形成於光 係有機EL το件’只要具備公知的有機el 200904236 元件構造即可,例如可為像在稱為多 電極之間,隔著例如透明電極等的電荷發極與陰極 置多數有機發光層8而使發光亮度ίβ方向直列設 在構成有機EL元件的電極7以及9之^。 係使用具備光透射性的透明電極声7。 ’至>'其中一個電極 7亟7以及9都使用具備光透射;生的電極個 的效果,可使用任何材料當作且/、要不妨礙到本發明 Α^^(ΐτο). ^ ^ 極薄膜、導電性高分子、導電性 ,魏物、金等的金屬 r 是受體)的有機層、,電體與導電性雜物(施體或 或離子鑛膜法等的氣相形=透明電極通常係使用麵法 塗布透:咖寺^ ^ 粗糙、數百mn等級的凹凸時 日^月文射f 2的表面形成 相沉積法形成透明電極層7的話在2的表面上直接以氣 成表面有凹凸的透明電極層7 反映出該凹凸,而形 使用在光散射層2 ^ #歧會降低。在此,若 導電層的話,_㈣的布的塗1法形成透明 =形絲面精的朗電極層 層設置在光散㈣2表面之的翻導電層作為基底 明導=古用2層構造形成透明二^ (naphthalopeiylene)、二策其 丁花、f 茈(phthaloPer>lene)、萘酞茈 (C_arin)、,二唑、雒笨^ I :烯棘四苯基丁二烯、香豆素 琳金屬錯合物、來(8—雙苯乙稀基、環戊二稀、啥 嗜•錯合物、j(5—miS錯合物、參(4—甲基―8 —經基 V 本暴〜8 —羥基喹啉)鋁錯合物、胺基喹啉 12 200904236 金屬錯合物、苯并喹啉金屬錯合物、參—(對聯三苯_4—基)胺、 ,喃、=丫咬酮(肿似祝㈣)、紅螢烯扣&咖),及此等之衍生物、 f 1二芳基一2,5~二(2—噻吩基)吡咯衍生物、二苯乙烯基苯衍生 物、笨乙稀基亞芳基衍生物、苯乙烯基胺衍生物,及分子一部分 此等發光性化合物所構成之基之化合物或高分子等。又, 燐物所代表之發光色素由來之化合物,亦可使用各種 =視等發光材料之化合物或高分子。 門在有機發光層8與透明電極層7以及對向電極9之 從該等透明電極層7以及對㈣極9而來的載子 金屬,,層、銅酞花青層、受體等。’成例如鹼 化,故元件,會因為水分或氧等外部因素而劣 度不同。因此亦;st;;響姉造?供電附近點與發光面中心亮 輔助電_材料可以錢mu之上或之下形助電極。 ⑽叫或利用光能=:以=能 其次’就本實施形態之面發光裝置以實施例具體説明之。又, 200904236 f量平均分子量,係以凝膠滲透層析法(gd permeati〇n chrormtography ; GPC) ’ 用 TOSOH(股)製「HLC—812〇」去 董儀器,並用標準聚苯乙婦製作成檢量線,測量當作其換算値。' (實施例1) '、 於四乙氧基石夕烧86.8質量份中加入異丙醇8〇3 5質量份 加入7-甲基丙烯醯氧基丙基三甲氧基矽烷34 7 石雜75質量份,使用分散器充分混合,得到溶液。將得到夜 於40 C恆溫槽中游2小時,得到重量平均分子量i〇5〇為為 結劑形成材料的矽酮樹脂5質量%溶液。 卞馮钻 ⑽其次此石夕嗣樹脂溶液中,添加將中空氧化石夕微粒(平均粒 ίΓΓ哲外s殼厚度1〇nm)之1ΡΑ分散溶膠(固體成分:20 i量Γ ^觸媒化成1業公司製)以異丙醇稀釋成5質量 氧化石夕微粒/侧樹輸合化合物換算)以固體 得到含有中空氧化侧&之_樹脂溶液。 -氧化鈦二表被覆之氧化秒 成分:2〇質晉Γ LL )之甲乙嗣分散溶膠(固體 之溶膠,奸由二觸媒成工業公司製)以異丙醇稀釋成5質量% (扩人二人二:氧化石夕微粒/氧化石夕—氧化鈦複合微粒/石夕酉同樹脂 ==_明«量基料_侧,得顺 之形ί存上sf:=化ί物3」其=炫氧她之情形,為Si〇2 質量。 、置於二说乳基石夕燒之情形’為Sio] 5之形式之 中空 Nd 為 1务 率呢為UW系滿足Nf2>N:>Nf:^二-氧化鈦微粒之折射 述液狀塗布;才。黏結劑形成材料’係將上 圓偏先相疋薄膜之折射率。中空氧化石夕微粒及氧化 14 200904236 :夕-氧化鈦微粒之各折射率,使用浸液法測定。具體而古,將料 原理之粒度分_定裝置’係則錢雷射繞射 Μηίί 1使用無驗玻璃板(C〇ming公司製「胤咖」、折射率 上以旋轉塗布機以麵-之條』ί =乾燥’製作被覆膜,再將被覆膜 :=材 之折射率為M5,小於透光性基材1之折ίί ΐΐ 散射層2之濁霧度値為3 0。 土何…斤射羊又光 方式,化__咖公司製),在上述 即/□之透明作為度1施m、片電阻 f5:4^15 ^ 安裝ΐί空__ 7之嫌基材1 -二苯基,^置層7之上形成膜厚4-之-, (NPB)(eRay S) , ^ ^ ^ 其次,在電洞輸送層1〇 基__q)(eRay公司製)之^^機6 = 形成參(H里 再者,於其上形賴厚兼電子輸送層。 厚8〇職之A1(高純度化學公H子之上,真空蒸鑛膜 並形成作為發光體3之有機EL元件^成作為陰極之對向電極9, 15 200904236 之後’將形成有上述各層之透光性基材1,不暴露於,而 運送到露點一80〇C以下之乾燥氮氣氛圍之手套箱中。另一方面, 預先將吸水劑(Dynic公司製)貼於玻璃製封帽,同時, 问 部塗布紫外線硬化樹脂性密封齊j。並且,藉由在手套箱内^ ^ 以密封劑貼在透光性基材,使得包圍有機EL元件,藉 射使密封劑硬化,崎有機EL元件(發光體)3 封得到 面發光體。 ·π目在封付到 (實施例2) 上巧關1得狀_樹麟液巾,添加巾空氧化石夕微 氧化砍-氧化財合微粒/糊獅(縮合化合 二 ,質量基準計為_3G,製備塗布材料組成物,^ ! 2之折射率小於透光性基材1之折射率。光2吏 小於透光性基材1之折射率L5卜並且,於光散 面發光體。 阳丁 $成有機EL兀件(發光體)3,並得到 (實施例3) 體貪置基準計為6_/3G,製備塗布材料 ^= 吏固 組成物與實關1同樣地進行 4 $賊塗布材料 之折射率大於透級基材丨/ ’ ’使縣散射層2 1.63,大於透光性基材i才之;廿光f射層k折射率為 實施例1同樣地進行,形成古、·並且,於光散射層2上與 光體。订化成有機EL元件(發光體)3,並得到面發 (實施例4) 與實施例1同樣地進杆,丄、, 2之上,將熱分解型透明導電散射層2。其次,於光散射層 版印刷法印刷塗布,於12(Γγ 籾劑(住友金屬礦山公司製)以網 、C進行2〇分鐘乾燥後,於35(TC進行丄 16 200904236 小時加熱處理,形成透明電極 樣地(ti例开有機见元件(發光體)3,得到ίίίί 不形成光散射層2,於益驗被璃之矣 行,剩樣地進 基準計為算)_質量 物。使用此塗布材料組成物’與實施例/ ) 布材料組成 射層2,再者,鱼實雜彳二 同樣地進行,形成光散 體)3,得到面發^體。㈤樣地進行,形成有機EL元件(發光 光體^進行之實施例卜4及比較例1-2之面發 製),使流經有機Εί元=^賈,係,DC電源(祕ley公司 度計(TOPCON公” -内狀電翻定在1GmA/em2,使用亮 壓特性在各例巾其結果如表1所示。又,電流—電BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface light-emitting body which is used for each liquid crystal backlight, a light source for illumination, or the like. In the case of a variety of displays, display elements, backlights, and surface-emitting materials that emit light or electric energy, there are many excellent features such as high brightness and amount. An organic electroluminescence device in which the light-emitting materials of the surface-emitting materials emit light (there is a low voltage of about sb=electric ν to obtain a high-brightness surface-emitting J$ for the surface EL. The luminescent layer 8 is also formed by a member such as an organic pole 9 on the surface. Further, a voltage is applied to the opposite direction on the surface of the day 8, and the photoelectrode 9 is formed between the luminescent layer 8. 1 *发$. The arm (four) electrode layer 7 and the light-emitting element that emits light from the light-emitting layer 8 of the organic light-emitting element, such as the organic EL element, from which the light-emitting element is emitted, and the light-emitting ray The emission === is determined by the refractive index of the refractive substrate i of the light-emitting layer 8, that is, the transparent electrode layer 7 or the light-transmissive layer is totally reflected at the interface, and is sealed when the human is emitted above the critical angle. (4) When the internal 'disappearance becomes the ', the light-emitting line is taken out to the outer refractive index l/(2n) of the 2 2 light-emitting layer 8. For example, when the light-emitting layer 8 is ^, the efficiency 77 can be approximated as ;^ The above light becomes the guided wave light becomes ^ ^ when 'ei 7% or so, 80% is lost, the light is taken out from the organic light-emitting element Loss of light and loss of 200,904,236 -An organic EL element using a fluorescent material in a luminescent material, which is used in the exciton (4) (4) generated by the recombination of charges injected from the electrodes 7 and 9: related to luminescence 'There is only a single-state exciton, and its probability of generation is 1/4. That is, the difference is that only considering this point' efficiency is 5% so low. In contrast, in recent years, the luminescent layer itself is illuminated. The method has progressed _ emits a luminescent material that emits light from the tri-state excitons, and further discovers the possibility of leaping forward to improve quantum efficiency. > However, even if the quantum efficiency is improved in this way, if the light When the extraction efficiency is low, the combined effect still causes the luminous efficiency of the organic EL element to be lowered. In other words, if the extraction efficiency is improved, the luminous efficiency should be improved according to the synergistic effect. On the surface of the light-transmitting substrate 1. When the organic EL element is formed by laminating the light-emitting layer 8 via the transparent electrode layer 7, as described above, about 8% of the lost light is lost, and most of the total reflection is at (1) the total reflection at the interface between the light-transmitting substrate 1 and the air. , (7) at The total reflection of the interface between the light-emitting substrate and the light-transmitting substrate 1 is that the light is incident from the high refraction to the low-refraction medium, and according to the concept of total reflection, the incident angle is greater than or equal to the boundary angle. The light is totally reflected at the interface and is sealed inside. ' : Total reflection of the interface between the transparent substrate 1 and the gas, and (2) Transparent electrode layer 7 Total reflection at the interface of the optical substrate 1 If the ratio is considered separately, the former is about 35%, and the latter is about 45%. Therefore, nowadays, in terms of the method of improving the light extraction efficiency, some people change the properties of the interface between the light-transmitting substrate 1 and the air, (2) There are two methods of changing the properties of the transparent electrode ^ the interface of the light-transmitting substrate 1. Regarding the former, it is mentioned that the 射 猝 在 在 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光 透光For example, Japanese special Kaiping (7) - Milk 37! bulletin). Regarding the latter, as shown in Fig. 3B, the light-scattering layer 2 is formed between the transparent electrode layer 7 and the light-transmissive beauty, and the light is scattered by the light-scattering layer 2. Thereby, the electrode layer 7 and the light-transmitting substrate are lowered! The ratio of total reflection generated by the interface increases the efficiency of J. The light-scattering portion 2 is finely formed on the surface of the scattering layer 2 of the transparent electrode layer 7 of the transparent electrode layer 7 of the transparent substrate 7 of the transparent substrate &. Therefore, as shown in FIG. 3B, the light-releasing layer is flat. 'The surface of the transparent electrode layer 7 which is flattened and smoothed, and which is thin in the ( ( 参照 参照 参照 参照 参照 参照 参照 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 咖 ' ' The layer 2 and the transparent electrode sound 7 are coming out of the door - the light will be all in the day of the sun (four) pole layer 7 and the relaxation layer 31. The king reflection will reduce the silking efficiency, so the light mosquito rate can be more [Explanation] In view of the above, the object is to provide total reflection of light at the interface between the bright electrode layer and the relaxation layer, and to provide the surface light-emitting body of the present invention, which comprises the soil material, a light-scattering layer is formed on the surface of the light-transmitting substrate. The light-emitting layer is formed on the surface of the light-scattering layer, and is formed by light or electric energy, or the germanium layer contains a binder and two kinds of fillers. The refractive index of the binder is Nb 1. The refractive index of one of the two kinds of fillers is Qiu. The refractive index Nf2 is satisfied Nf2 > Nb > Nf12 relationship. According to the configuration in which the light-scattering layer formed between the light-transmitting substrate and the light-emitting layer is formed by including a binder satisfying the above refractive index and two types of fillers, the light scattering effect is amplified by the light-emitting layer. When the light emitted from the film is emitted from the photo-emissive layer to the light-transmitting substrate, the critical angle is disturbed, and the incidence of light entering the light-transmitting substrate is increased, and the efficiency of light extraction to the outside is greater. [Embodiment] The best shape of the invention is described in the first embodiment of the present invention. The surface light-emitting body according to the first embodiment of the present invention will be described with reference to Figs. 1A and 1B. Fig. 1A shows the structure of the surface light-emitting body of the first embodiment, and Fig. 1 shows the light-scattering layer 2 formed on the surface of the light-transmitting substrate 1. 'You can use organic or non-mechanical components that are illuminated by light or electric energy. The hair button 3, the gamma axis on the light (four) layer 2, the coffee layer = the layer, the opposite layer (cathode) 9 and the hole to be placed in the hole, the second layer, and the like. The light emitted from the light-emitting layer 8 is transmitted through the light-scattering layer 2 and the light-transmitting substrate 1 through the light-emitting layer 7, as shown by the arrow in Fig. 1B, and is emitted to the outside. As the substrate 1, a known transparent substrate, for example, a substrate of nanoglass J, or a polycarbonate flexible substrate can be used. The refractive index of the substrate is 透, 146~丨6= inside. ^ίίίΐ layer 2 is formed by the inclusion of two kinds of filler materials 5, 6 in the bonding agent 4. a coating film formed on the surface of the light-transmitting substrate 1 which is formed by mixing a liquid coating material prepared by mixing a material and a binder forming material onto the surface of the light-transmitting substrate 1 and allowing formation The light-transmitting substrate 1 is formed by drying. Here, "drying" means removing a liquid or a hairy component from a coating film to leave a solid coating, meaning that it can be used during drying. Further, after the coating film is dried to obtain a coating film, the coating film may be heated and treated. Further, the method of forming a coating film by continuous drying may be a spin coating method, a spray coating method, a main cloth method, a printing coating method, or the like, but is not limited to those other than the above. The filaments are formed in the calender scattering layer 2, and the fillers 5, 6' formed by the binder forming material and the members form mutually opposite phases. The filler materials 5, 6 remain and are constrained to a dispersed state. This bonding was formed by drying the liquid coating material composition of ▲ into a coating film, and was formed by 200904236 = agent: ί material f. When dried, the binder forming material can chemically change chemically. By forming the material into the binder, from the dissolution and /; = two: = can be included as needed: 有 there is a coating agent, a uniformity of the coating used to form a smooth coating film; ::Sub;:2; Ethylene glycol such as acid glycol monoethyl ether, diethylene glycol derivative used to control the thickness of the tackifier, etc. Efficient agent, and one of the two types of filler materials 5, 6 used to impart a light-transmitting light-scattering layer 2f to the light-transmitting group Nb' 2 types of filling coffee, 6 4 and 2 kinds of filling Material 5,;,: 'The binder is selected so that the binder 4 and the two kinds of materials satisfy the relationship of Nf2>Nb>Nfi. If the refractive index is satisfied by the difference in refractive index, the transparent electrode layer 7 is formed on the surface of the transparent substrate (10), and the light emitted from the organic light-emitting layer 8 is generated at the f-angle. Chaos, in an increased ratio 'junction' electrode layer 7 is incident on the light-transmissive hollow cerium oxide particles, 5, for example: aerogels (caffe, particles, etc.. Further, particles, organic polymer particles Metal Oxygen Interfacial Active Material Treats S-Gland, 6, Particles' In order to improve the dispersibility, the surface should be treated with longitude. q, cloth treatment, etc. will not cause a significant change in refractive index. In the range of 1.2~2.5, A, "A kind of filling material has a refractive index Nfi of 200904236 ϋ ^3. The lower limit of the illuminating rate of rain 1 is not particularly limited, generally in the left material is " The refractive index of the filler material of the octa-type filler is lower than μ, so that the amplitude is lowered. As a result, the light scattering property is high, and the difference between the refractive index Nfi of the fillers 5 and 6 is good. 〇.5以上以上 ί ί The difference between the refractive index W and Nf2 of the fillers 5 and 6 is set at 0.5, and the extraction efficiency of the high light is increased. There is no particular limitation on the limit, but the difference between the ton and the ton is equal to 3 = the lower m 8 and the (iv) the i9 diameter is 5 or more for the i si / Γ filling material 5, 6 In the case of average granules (for example, Ra = 2 () nm ^ rough 1 large and layer (planarized layer) (refer to 3b). 辕 * δ on the surface of the second 又 置 slow Ra below 2 〇 nm or less 〇 曰 。 。 。 才 才 才 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度 粗糙度5 襄 襄 襄 — — 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充 充6 Dispersibility "I ^ ^ two adhesives 4 light scattering layer 2. Two kinds of filler materials 5, 6 and thousands of knives f have a solid material 5, 6 system, but the average particle size of the two The difference is not limited to the upper limit of the second and the second difference. The grain size or the average grain of the material 5 or 6 is better than the inner diameter. The filling is performed by the principle of using the laser light diffraction principle described later. Device_quantity value. The material of the agent 4, / the oxidized stone, the porous body, etc. = if the organic polymer, the metal oxidation rate is sufficient for the above relationship, the refraction of the filler material 5, 6 is generally at 1. H. 60 shouting The refractive index of the bonding agent 4 may be in the combination of the bonding agent 4 and the filling material $, the materials 5, 6 from the aerogel particles, and at least one of the filling materials, the viscosity = = at least one of fine particles and hollow particles of polymer is preferred. It is preferably selected from the range of organic polymers and metal oxides. Further, _^=4 is limited to ^', and it is generally suitable to be 100 to 2000 nm, and is not particularly limited. However, the general ratio ^ ==, the content ratio of the materials 5, 6 should be set at 10 · · 90 ~ 7 〇: 4 and the mass ratio of Luchong filler material 5, 6 is not particularly limited, but small refractive Further, it is preferable to blend the mass ratio of the ratio 1 of the two types of filler materials 5 and 6. In the case of the large refractive index (10), it is preferable that the filler material contained in the two types of charge = ^ 蜊 4 is not as above. At this time, at least two types of fillers 6 must be included, which may have included the refraction of the third filler material light-scattering layer 2; the above relationship with the binder B. It is determined that the refractive index of the light-transmitting substrate 1 is within the circumference of the light-transmitting substrate 1 , but it is still preferable to reduce the ratio of the light-scattering layer 2 to the same or smaller than the ratio of the light-scattering layer 2, so that the light pick-up material 1 (10) gauge occurs. In addition, the light scattering layer 2 has a haze of 2 to 5G, which is a good total transmittance. The mouth should be set to have a light and a light appearance, and the high light extraction efficiency can be achieved. \When the haze is high, even if it is mentioned, FM △, Γ white, damage the appearance of the surface illuminant. The light on the scattering layer 2 is clear. As described above, the light-based organic EL τ ” may have a well-known organic el 200904236 element structure, and may be, for example, a charge emitter and a cathode interposed between a plurality of electrodes, for example, a transparent electrode. The plurality of organic light-emitting layers 8 are disposed so that the light-emitting luminance ίβ direction is arranged in series in the electrodes 7 and 9 constituting the organic EL element. A transparent electrode sound 7 having light transmittance is used. 'To> one of the electrodes 7亟7 and 9 uses the effect of having light transmission; the electrode of the raw one, and any material can be used as and/or without hindering the invention Α^^(ΐτο). ^ ^ An organic layer of an extremely thin film, a conductive polymer, a conductive material, a metal such as a material or a gold, or a conductive substance, and an electric substance and a conductive substance (a gas phase shape such as a donor or an ion-mine film method) The electrode is usually coated by a surface method: the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the 2 The transparent electrode layer 7 having irregularities on the surface reflects the unevenness, and the shape used in the light scattering layer is lowered. In this case, if the conductive layer is used, the coating method of the _(4) is transparent to form a silky surface. a layer of conductive electrodes arranged on the surface of the light-scattering (four) 2 as a basement guide = a two-layer structure for the formation of a transparent phthalocyanine, a phthalocyanine, a phthalocyanine, a naphthoquinone (C_arin),, diazole, oxime ^ I : enelotetraphenyl butadiene, coumarin metal complex , (8-bis-phenylene, cyclopentadiene, oxime, complex, j (5-miS complex, ginseng (4-methyl-8)-based V-burst ~8-hydroxyl Quinoline) aluminum complex, aminoquinoline 12 200904236 metal complex, benzoquinoline metal complex, ginseng-(p-triphenyl-4-yl)amine, methane, ketone ketone I wish (4)), red fluorene-eneduct & coffee, and derivatives thereof, f 1 diaryl- 2,5-bis(2-thienyl)pyrrole derivatives, distyrylbenzene derivatives, a stupid ethylene arylene derivative, a styrylamine derivative, and a compound or a polymer comprising a part of these luminescent compounds, and a compound derived from a luminescent pigment represented by a sputum A compound or a polymer of various illuminating materials can be used. The carrier metal of the organic light-emitting layer 8 and the transparent electrode layer 7 and the counter electrode 9 from the transparent electrode layer 7 and the (four) electrode 9 can be used. , layer, matte cyanine layer, receptor, etc. 'to become alkalinized, so the components will be different due to external factors such as moisture or oxygen. Therefore; also; st; The vicinity of the power supply and the center of the light-emitting surface are bright. The auxiliary material can be used to make the electrode above or below the material. (10) Calling or using light energy =: = can be followed by the following embodiment of the surface light-emitting device of the present embodiment. In addition, 200904236 f average molecular weight, by gel permeation chromatography (gd permeati〇n chrormtography; GPC) 'TOSOH (shares) system "HLC-812〇" to Dong instrument, and standard polystyrene A calibration curve was prepared and measured as the conversion enthalpy. ' (Example 1) ', 86.8 parts by mass of tetraethoxy zebao was added with isopropyl alcohol 8 〇 3 5 parts by mass added with 7-methyl propylene oxime 75 parts by mass of propyltrimethoxydecane 34 7 was mixed well using a disperser to obtain a solution. The solution was allowed to swim overnight in a 40 C thermostat for 2 hours to obtain a weight average molecular weight i 〇 5 〇 as a 5% ketone resin solution of a ketone resin as a forming material.卞冯钻(10) Next, in this Shixi 嗣 resin solution, a 1 ΡΑ dispersion sol of hollow oxidized oxide particles (average granules 〇 s shell thickness 1 〇 nm) is added (solid content: 20 i amount Γ ^ catalyzed into 1 The company's resin) is obtained by diluting with isopropanol to a mass of oxidized oxide particles/side tree-incorporated compound, and obtaining a resin solution containing a hollow oxidation side & - Oxidation second component of titanium dioxide two-surface coating: 2 〇 Γ Γ LL 甲 甲 甲 溶胶 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙 异丙Two people two: oxidized stone evening particles / oxidized stone eve - titanium oxide composite particles / Shi Xi 酉 with resin == _ Ming « quantity of base material _ side, the shape of the sac: sf: = ί ί 3 3 = 炫 oxygen her situation, for the quality of Si〇2., placed in the second case of the milk base stone simmering in the form of Sio] 5 hollow Nd is 1 rate for UW system to meet Nf2> N:> Nf : ^二-Titanium particles refracting liquid coating; only. The binder forming material 'is the refractive index of the upper phase of the first phase of the film. Hollow oxidized oxide particles and oxidation 14 200904236: Xi-Titanium particles The refractive index is measured by the immersion method. Specifically, the particle size of the principle of the material is determined by the method of the device, and the laser is used to circulate Μηίί 1 using a glass plate (C胤ming company, "胤咖", refraction) At the rate, the coating film is made by a spin coater in the form of a surface - ί = dry, and the coating film is: the refractive index of the material is M5, which is smaller than the light-transmitting group. 1 fold ίί ΐΐ The haze of the scattering layer 2 is 30. The earth is so... the yoke is light and the __ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ F5:4^15 ^ Install ΐί空__ 7 suspected substrate 1 - diphenyl, ^ formed on layer 7 film thickness 4--, (NPB) (eRay S), ^ ^ ^ second, in Hole transport layer 1 〇 __q) (manufactured by eRay Co., Ltd.) ^^ Machine 6 = Forming the ginseng (H again, on which the thickness and electron transport layer are formed. Thick A 〇 A1 (high purity chemistry public H Above the sub-volume, the film is vacuum-vaporized and an organic EL element as the illuminant 3 is formed to form the counter electrode 9 as a cathode. After the test, the light-transmitting substrate 1 having the above layers is formed, and is not exposed thereto. The container was placed in a glove box having a dry nitrogen atmosphere with a dew point of 80 ° C or less. On the other hand, a water absorbing agent (manufactured by Dynic Co., Ltd.) was attached to a glass cap, and the portion was coated with an ultraviolet curable resin seal. In addition, by attaching a sealant to the light-transmitting substrate in a glove box, the organic EL element is surrounded and the sealant is hardened by the shot, and the organic EL element (light-emitting body) 3 is sealed. Surface illuminant. · π mesh in the seal (Example 2) on the clever closure 1 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The mass reference is _3G, and the coating material composition is prepared, and the refractive index of the coating 2 is smaller than the refractive index of the transparent substrate 1. The light 2 吏 is smaller than the refractive index L5 of the transparent substrate 1 and is dispersed in the light. Surface illuminant. Yangding $ into organic EL element (illuminant) 3, and obtained (Example 3) The body falsity standard was 6_/3G, and the coating material was prepared. ^= The tamping composition was the same as that of the actual gin 1 The refractive index of the 4 thief coating material is greater than that of the permeable substrate 丨 / ' ', the county scattering layer 2 1.63 is larger than the transparent substrate i; the refractive index of the luminescent f-layer k is the same as in the first embodiment. , forming an ancient, and, on the light scattering layer 2 and the light body. The organic EL element (light-emitting body) 3 is formed into a surface (Example 4). The thermally decomposable transparent conductive scattering layer 2 is placed on the rods, 丄, and 2 in the same manner as in the first embodiment. Next, it was printed and coated by a light-scattering layer printing method, and dried at 12 (Γγ 籾 ( (manufactured by Sumitomo Metal Mining Co., Ltd.) in a net and C for 2 minutes, and then heat-treated at 35 (TC for 0416 200904236 hours to form a transparent Electrode sample (ti is an organic component (illuminant) 3, which is ίίίί, which does not form a light-scattering layer 2, and is used in the evaluation of the glass, and the sample is counted as a mass). Material composition 'and Example / ) The cloth material consists of the shot layer 2, and the fish paste 2 is formed in the same manner to form a light-scattering body 3 to obtain a surface-emitting body. (5) The sample is carried out to form an organic EL element (the embodiment of the light-emitting body ^ and the surface of the comparative example 1-2), so that the flow passes through the organic Ε 元 yuan = ^ Jia, system, DC power supply (my company The meter (TOPCON male) - the internal state is set at 1GmA/em2, and the results of using the light-pressing characteristics in each case are shown in Table 1. Again, current-electricity

確認光取出效率高。 —— 亮度(cd/m2) 電流效率(cd/A) --— 476 4.76 ~ -— 490 4.90 400 4.00 450 4.50 330 3.30 340 3.40 17 200904236 (實施例5) 於二乙氧基石夕院86 8質量份中加入異丙醇购八 加入r-甲基丙烯醯氧基丙基三甲氧基 、里饧,再 石肖酸乃質量份,使用分散器充分混合^到2。^及0^ 於4〇 C惶溫槽中授拌2小時,得到重量平均分子〇 =到之〉谷液 結劑形成材料的矽酮樹脂5質量%溶液。 之作為黏 體成分:20質量%、觸媒化成工業2分散溶膠(固 %之溶膠’使得中空氧化夕微粒/氧、、欲、’稀釋成5質量 換算物 中if ’/述雜劑形紐料^崎脂之折射率Nd為1 48 ^化:微粒之折射率Nfi為U5,上:, 為谓,為滿足Nf2>Nb>Nfl之關係者。雜之折射率恥 ‘ΐ透折射率 ί塗=組成物塗布在透光性二: 膜將被覆膜於20(TC鍛燒30分鐘,進杆孰卢扭作被覆 約麵_之形成絲射層2 T,形成厚度 娜4二3:42,,「上八;『1〇〇細之厚度形成終 螢光體薄膜,得到面發光體。队)之膜,形成作為發光層8之 (實施例6) 粒/氧旨溶液中,爾空氧切微 49/2_,合化合物換算)使固體質量基準計成為 備主布侧組成物,制此塗布材料組成物,與實施 18 200904236 例5同樣進行,形成光散射層2^ ^ ^ 5同樣地進行,碱$辅_,射層2上與實施例 (實施例7) 鈦微粒/铜m (齡化 TZ^T:mJT' 樣式τ ’域光散射層2。並且,於光散射層2上, 與實施例5同樣地進行,形成螢光體薄膜,得到面發光體層 (比較例3) …不形成光散射層2 ’而在無驗玻璃之透光性基#丨表面,古拉 形成^’除此以外與實施例5同樣進行,得到面發光:: 跋ϊΐΐ例/得到之石烟樹脂溶液中,添力口中空氧化石夕微粒溶 膠,使中工乳化石夕微粒/秒酮樹脂(縮合化合物換算)以固體質量美 準計成為7_(不添加氧化鈦微粒),製備塗布材料組成物。、^ 此塗布材料域物,與實施例5 _地進行,形絲散射層2,再 者’與實關5囉地崎,形錢光體細,得到面發光體。 對於以上述方式得到之實施例5 — 7及比較例3 —4之面發 體,對於螢光體之薄膜照射20W紫外線螢光燈,使用 (TOPCON公司製)測定透光性基材}表面之亮度 ^所 示。又’各任—情形在發光光譜均未見到大的差異。 所 【表2】 ' 亮度(cd/m2) 實施例5 8.2 實施例6 13.3 實施例7 10.3 19 200904236 比較例3 _ 比較例4 確認:高各實施例5-7相較於各比較例3-4’亮度較高, (第2實施形態) 、#其―人關於本發明帛2實施形態之面發光體,參照圖2A及 伽Λ订1 兄明。圖2A顯示在光散射層2之與透光性基材1為相反 it光體3之面魏體構成,圖2B顯示在光散射 r 3.9 7.4 ί層31之構成。第2實施形態巾,在光散射層 2與透明電極層7之間形成有緩和層3卜 例如材料’只要能透射光即不特別限制可使用, 無鹼玻璃等剛性透明玻璃板、聚碳酸酯或聚 t本—甲酉文乙二g曰等可撓性透明塑膠板等。 迭即5於基Ϊ 1之表面的光散射層2 ’具有使光散射之構 上述第1實施形態,將含粒子之黏結 之矣g透級基板1之表面形成者’但亦可為在透光性基板1 之ίζ樹Γΐ布層圖案化形成者’以喷沙器等對於透光性基板1 ίί ίϊίϊ之=透1之表面形成之具微細凹凸之 欲取出===她麵編㈣射,可視 用為光散射層2之情形,此粒子可使 ,透^粒子,例如 ™2、s1〇2、Zr〇2、Al2〇3、Ta2〇3、Zn〇2、sb2〇3、 rS1〇4、彿石或此等之多孔性物質或以此等作為 子,或丙烯酸樹脂、*乙稀樹脂、聚對苯二甲酸乙S月 ,脂等有機粒子。此粒子之粒徑,為使有效的進行射, 以100nm〜20μιη之範圍較佳。 黏結劑,例如1乙烯、聚丙稀、聚對苯二 ^基丙稀酸曱|旨、聚苯乙烤、聚_、聚純、聚碳酸 : 來細旨、丙烯酸樹脂、聚丙烯腈、聚乙烯基乙_、聚醯胺、曰聚 20 200904236 :亞:偏酸ί鄰苯二甲酸酯樹脂、纖維素系樹脂、聚氯乙 等樹月乙酸乙湘旨、其減可雖樹脂,或構成此 氧烷構叙氧切體,例何使用聚石夕 編魏或其么=予==可將四乙氧基魏等 絲紐之粒仅㈣較差,通常以 射,將m折射率差若太小,則難以得到有效_散 率之虞。’率^大,職方魏增大,有紐制足夠光取出 身面推黏結劑得到之塗布材料塗布於透光性基板1之 旋轉塗布法、浸潰塗布法、壓鑄模塗布法、 布喷凹版塗布法等。此光散射層2之膜厚不特 別限制’以0.1〜20//m左右之範圍較佳。 、、 又’較佳的情況為··與上述第!實施形態之情形 用不同折群之2種微㈣成光散射層2 ^ 粒之光散射層2形成於透光性基板1之表面後,= 含上述Mie散射用粒徑之光散射層2亦可。 '、 滅 即便以上述任-方法形成之光散射層2,光散射層 為士凹凸之粗韃面。例如,以含粒子之塗布材料形成光散^ = ,情形於露出在光散射層2表面之粒子,產生凹凸。因曰 若在光散射層2之表面直接形成透明電極層7,則由於 風 7之膜厚薄,因此會形成反映凹凸之形狀。其結果,在U性= 會產生問題,或有發生短路之虞。因此,在盥 、=面 性基材1相反側之表面形成緩和層3卜並將光散射層曰2 光 =此緩和層填埋,在緩和層31之平滑表面上形成透明g 此緩和層31可以樹脂塗布層形成。塗布樹脂之 光透射性即可,不特別蚊。例如:聚自旨、聚_、聚u 亞胺、聚醯胺、»亞胺醯胺、環氧、聚動旨、聚_ ^醯 200904236 聚碳酸酯等。其中又以使用聚醯亞胺、聚醯胺醯亞胺、環 月女酉旨專熱硬化性樹脂較佳。 人 、將塗布樹脂塗布在光散射層2表面後,藉由加熱使硬化,形 成緩和層31。緩和層31之膜厚不特別限定,以1〜2〇以坩左六/ 範圍較佳。 之 4形成緩和層31之樹脂之折射率,為了減低在透明電極層7與 緩和層31之界面之全反射,使更多光導入光散射層2,希望高於 透明電極層7之折射率,或即使低於透明電極層7之折射率之主 形,希望其折射率差小。再者,光散射層2以塗布形成之情形二 形成緩=層31之樹脂之折射率,希望小於光散射層2之折射率, 或即使高於光散射層2之折射率之情形,希望其折射率差小。 理想而言,較佳為,使緩和層31之層内折射率,從透明電極 層7侧往光散射層2側逐漸升高或降低地傾斜,於與透明電極層7 之界面,舰和層31之折射率與透明電極層7之折射率大^ 同’於與光散射層2之界面’緩和層31之折射率與光散射声 致相同。於此情形,緩和層31與透㈣極層7或^射 ΐ損^折射率獨之光學界面,可使界面不存在全反 •ί麻^上述方式’在光散射層2之表面設置緩和層31後,在與緩 電^斧7之為相反側之表面,形成透龍極層7。透明 物或此專之疊層體荨。此等透明電極 錢膜法等氣相沉積法形成。透明雷姉曰7 11吊以錢鍍法或離子 50〜30_左^佳透謂極層7之臈厚不特別限定,以 力透:層7時’為了使電極材料回火,進行加執處理。 ”,、處理’係以超過用以使形成緩和層31之樹脂硬化^加熱溫 22 200904236 ‘之硬:溫。若於高於形成緩和層31之樹 (氣泡)32。丁加熱處理,則可見到緩和層3〗發生空隙 熱,會使此緩和層;:^一之 於魏溫度之溫度加 與透明雷肺7 M W純—步硬純縮’但由於緩和層31 ' θ抬δ之部分收縮受限,因此對於其他部分呈伸屏 U可能目此形成緩和層31之樹脂產生為空隙^。 、 因此,如圖2Β戶斤+,/-祕4 js· 11 b 附近產生料nH 與透明電極層7之界面 加執隙 疋在緩和層31之内部亦產生空隙32。 ίϊ力定。形成緩和層31之樹脂之硬化溫度若為T 。^^度設定在代+5卜代+崎之範圍較佳,二 蚪間以10分鐘〜2小時左右較佳。 … 1 ίί之空隙32大小,可藉由選定形成緩和層31之樹脂或選 ^處=件而調整,空隙32之直徑以5〜姻之範圍較佳: ί 32之直徑若不滿5nm,則使光散射之效果小,又,* ίΪίΐΪ過:麵’則緩和層31與透明電極層7之界面 1密合 r生#传不足,有損及裝置可靠度之虞。 極声將透明電極層7設於緩和層31之表面後,在透明電 出7於ΐ,、戍和層31為相反側之表面,形成發光層8。再者,葬 ίΐϋΐ 8之與透明電極層7為相反側之表面設置對向電極/ =成有機EL元件所構成之圖2Α所示面發光體。對向電極 ;耸。用A1等’亦可使用A1與其他電極材料組合之叠層構造 血鈕夕極材料之組合,例如:鹼金屬與A1之疊層體、鹼金屬 :二且f體、鹼金屬之鹵化物與A1之疊層體、鹼金屬之氧化物 。二^層體、驗土類金屬或稀土類金屬與A1之疊層體、此等 ί屬其他金屬之合金等。更具體而"^,例如納、鈉—钾合金 人、、專與Α1之疊層體、鎂—銀混合物、鎂—錮混合物、鋁— σ。、LiF/ΑΙ混合物/疊層體、Α1/Α!2〇3混合物等。 23 200904236 又’與第1實施形態之情形同樣地,在 。及:向電極9之間,可以形成電洞輸送㈡電極 衝層、’或用以減低電極製膜時損害之層。 冑子輸达層、緩 Μ方式形成之面發光體,藉由在透明電極層7 «仏 極9之間施加電壓而於發光層8發光之光,丄7與對向電 31及光散射層2 射透光性基板1而i透射 緩和層3卜與透明電極層7之界面形成有 =此時’在 7與緩和層31之界面形成有光散射構造,因此,彳電極層 入射到緩和層31之亦太r Λ 攸透明電極層7 # ΐ界面散射’能夠抑制透明電極層7轉/ j 'Γ"4", ^光性基板1之界S發絲之纽射。再^卩^與 内ί亦形成空隙32,因此,光在緩和層3i之内部二 =層二之 射層2往透光性基板丨人射之效率。以此方^射^提高 全反射,能從透明電極層7往緩和層31、光散射Λ制 板卜有效率地縣透射,並從透光 先二射層2、 於發光層8發光之光的取出效率提高。 坂1取出先,使 ,在緩和層31之表面形成透明電極層7後,亦可葬H 加熱處理,在透明電極層7與緩和層31之界面 伃 層7之材料與形成緩和層31樹脂混合 1、= ,射率,若從透明電極層7側往緩和層則則,則透=之 =率往緩和層31之折射率逐漸變化、傾斜 由丄二It is confirmed that the light extraction efficiency is high. —— Brightness (cd/m2) Current efficiency (cd/A) --- 476 4.76 ~ -— 490 4.90 400 4.00 450 4.50 330 3.30 340 3.40 17 200904236 (Example 5) at 2.8 ethoxy stone court 86 8 mass To the mixture, isopropyl alcohol was added, and r-methyl methacrylate methoxypropyltrimethoxy, ruthenium, and tartaric acid were added in mass portions, and the mixture was thoroughly mixed using a disperser to 2. ^ and 0^ were mixed in a 4 〇 C 惶 warm bath for 2 hours to obtain a weight average molecular 〇 = 〉 〉 谷 结 结 结 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 As a binder component: 20% by mass, catalytically industrial 2 dispersed sol (solid sol' makes hollow oxidized particles/oxygen, and wants to 'diluted into 5 mass conversion if' The refractive index Nd of the material is 7 48 ^: the refractive index Nfi of the particles is U5, and the above is the relationship of Nf2 > Nb > Nfl. The refractive index of the impurity is shame. Coating = composition coated in light transmissive two: the film will be coated on the film 20 (TC calcined for 30 minutes, into the rod 孰 扭 twisted to cover the surface _ to form the silk layer 2 T, forming the thickness of Na 2 2: 42, "Upper eight; "1" thin thickness to form a final phosphor film, to obtain a surface illuminant. Team), formed as a luminescent layer 8 (Example 6) granule / oxygen solution, The empty oxygen cut micro 49/2_, compound compound conversion) The solid mass reference was made into the main fabric side composition, and the coating material composition was prepared in the same manner as in Example 18, 200904236, to form a light scattering layer 2^^^5. In the same manner, base #辅_, shot layer 2 and the example (Example 7) titanium particles / copper m (aged TZ ^ T: mJT' pattern τ ' domain light scattering layer 2 On the light-scattering layer 2, in the same manner as in Example 5, a phosphor thin film was formed to obtain a surface light-emitting layer (Comparative Example 3) ... a light-scattering layer was not formed without a light-scattering layer 2' In the same manner as in Example 5, the surface of the crucible was formed in the same manner as in Example 5, and the surface luminescence was obtained: In the example of the obtained smoky resin solution, the hollow oxidized oxide granule sol was added to the emulsified stone. The granules/second ketone resin (converted in terms of a condensed compound) is 7-(without adding titanium oxide fine particles) to prepare a coating material composition, and the coating material domain is formed in the same manner as in Example 5 The silk scattering layer 2, in addition to the real-time 5 啰 啰,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The film of the light body was irradiated with a 20 W ultraviolet fluorescent lamp, and the brightness of the surface of the light-transmitting substrate was measured using (manufactured by TOPCON Co., Ltd.), and no difference was observed in the luminescence spectrum. Table 2] 'Brightness (cd/m2) Example 5 8.2 Example 6 13.3 Real Example 7 10.3 19 200904236 Comparative Example 3 _ Comparative Example 4 Confirmation: Each of Examples 5-7 is higher in luminance than Comparative Example 3-4' (Second Embodiment), and Referring to Fig. 2A and the gaze set1, Fig. 2A shows the surface of the light-scattering layer 2 opposite to the light-transmitting substrate 1 and the surface of the light-emitting body 3, FIG. 2B. The light scattering r 3.9 7.4 ί layer 31 is formed. In the second embodiment, a relaxation layer 3 is formed between the light scattering layer 2 and the transparent electrode layer 7. For example, the material 'is not particularly limited as long as it can transmit light. , Non-alkali glass and other rigid transparent glass plates, polycarbonate or poly-t---------------------------------------------------- The light-scattering layer 2' having a surface 5 on the surface of the substrate 1 has a structure in which the light is scattered, and the first embodiment is formed, and the surface of the substrate 1 in which the particles are bonded is formed, but it may be The patterned substrate of the optical substrate 1 is formed by a sandblaster or the like for the light-transmissive substrate 1 λίίίίϊ = 透 透 透 透 透 透 = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = In the case of the light scattering layer 2, the particles can be made, such as TM2, s1〇2, Zr〇2, Al2〇3, Ta2〇3, Zn〇2, sb2〇3, rS1〇 4. Fossil or such porous material or such as or as an organic solvent such as acrylic resin, *ethylene resin, polyethylene terephthalate, or fat. The particle diameter of the particles is preferably in the range of 100 nm to 20 μm for effective emission. Adhesives, such as 1 ethylene, polypropylene, poly(p-phenylene terephthalate), polystyrene, poly-, poly-pure, polycarbonate: acrylic, polyacrylonitrile, polyethylene Base B_, Polydecylamine, Polycondensation 20 200904236 : Sub-acid: phthalic acid ester resin, cellulose resin, polyvinyl chloride, etc., which can be reduced by resin or composition. This oxane structure oxidizes the oxygen cleavage body, for example, how to use the geisha Xiwei or its ==== can be used to make the tetraethoxy weiwei nucleus grain only (four) poor, usually by shooting, the m refractive index difference Too small, it is difficult to get the effective _ 率 rate. 'The rate is large, the employee Wei is enlarged, and there is a spin coating method, a dip coating method, a die casting method, a gravure coating method in which a coating material obtained by removing a body push adhesive is applied to the light-transmitting substrate 1 Law and so on. The film thickness of the light-scattering layer 2 is not particularly limited to a range of about 0.1 to 20/m. And, the better case is... and the above! In the case of the embodiment, two kinds of micro (four) light scattering layers of different light groups are formed on the surface of the light-transmitting substrate 1, and the light-scattering layer 2 containing the above-mentioned particle size for Mie scattering is also can. ', Destroy Even with the light-scattering layer 2 formed by the above-described method, the light-scattering layer is a rough surface of the concave and convex. For example, the dispersion is formed by a coating material containing particles, and in the case of particles exposed on the surface of the light-scattering layer 2, irregularities are generated. When the transparent electrode layer 7 is directly formed on the surface of the light-scattering layer 2, since the film thickness of the wind 7 is thin, a shape reflecting the unevenness is formed. As a result, there is a problem in U = = or there is a short circuit. Therefore, a relaxation layer 3 is formed on the surface on the opposite side of the 盥, = planar substrate 1, and the light scattering layer 曰 2 light = the relaxation layer is filled, and a transparent g is formed on the smooth surface of the relaxation layer 31. A resin coating layer may be formed. The light transmissive property of the coating resin is sufficient, and it is not particularly mosquito. For example: polysodium, poly-, poly-uimine, polyamine, imipenem, epoxy, polymethyl, poly _ ^ 200904236 polycarbonate. Among them, polypyrmine, polyamidimide, and cyclosporin are preferred. After coating the surface of the light-scattering layer 2 with a coating resin, it is hardened by heating to form a relaxation layer 31. The film thickness of the relaxation layer 31 is not particularly limited, and is preferably from 1 to 2 Å to 坩 left six/range. 4 forms the refractive index of the resin of the relaxation layer 31. In order to reduce the total reflection at the interface between the transparent electrode layer 7 and the relaxation layer 31, more light is introduced into the light scattering layer 2, and it is desirable to be higher than the refractive index of the transparent electrode layer 7. Or even if it is lower than the main shape of the refractive index of the transparent electrode layer 7, it is desirable that the refractive index difference is small. Further, the light scattering layer 2 is formed by coating to form a refractive index of the resin of the retardation layer 31, desirably smaller than the refractive index of the light scattering layer 2, or even higher than the refractive index of the light scattering layer 2, it is desirable The refractive index difference is small. Ideally, it is preferable that the refractive index in the layer of the relaxation layer 31 is gradually increased or decreased from the side of the transparent electrode layer 7 toward the side of the light-scattering layer 2, at the interface with the transparent electrode layer 7, the ship and the layer. The refractive index of 31 is larger than the refractive index of the transparent electrode layer 7 and is the same as that of the interface with the light-scattering layer 2. The refractive index of the relaxation layer 31 is the same as that of the light scattering. In this case, the optical interface of the mitigating layer 31 and the transmissive (tetra) pole layer 7 or the ΐ ^ ^ 折射率 折射率 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 独 界面 界面 界面 界面 界面 界面 界面 界面After 31, the through-pole layer 7 is formed on the surface opposite to the side of the retarding axe 7. Transparent or this special laminate. These transparent electrodes are formed by a vapor deposition method such as a money film method. Transparent Thunder 7 11 hanging with money plating or ion 50~30_ left ^ good through the thickness of the pole layer 7 is not particularly limited, to force: layer 7 'in order to temper the electrode material, add deal with. ", the treatment" is harder than the resin used to cure the formation of the relaxation layer 31, heating temperature 22 200904236 'hard: temperature. If higher than the tree (bubble) 32 forming the relaxation layer 31, it can be seen To the relaxation layer 3〗 The occurrence of void heat will make this relaxation layer;: ^ The temperature of the Wei temperature plus the transparent thunder lung 7 MW pure - step hard pure shrinking 'but due to the relaxation layer 31 ' θ lift δ part of the shrinkage Restricted, so for other parts of the stretch screen U, it is possible that the resin forming the relaxation layer 31 is generated as a void ^. Therefore, as shown in Fig. 2, the product nH and the transparent electrode are generated near the 4 js·11 b The interface plus layer 疋 of the layer 7 also creates a void 32 in the interior of the relaxation layer 31. The curing temperature of the resin forming the relaxation layer 31 is T. The ^^ degree is set in the range of +5 generation + saki Preferably, the distance between the two turns is preferably from 10 minutes to about 2 hours. The size of the gap 32 of 1 ίί can be adjusted by selecting the resin or the member for forming the relaxation layer 31, and the diameter of the gap 32 is 5~ The range of marriage is better: If the diameter of ί 32 is less than 5nm, the effect of light scattering is small, and, * ίΪίΐΪ: In the surface, the interface 1 of the relaxation layer 31 and the transparent electrode layer 7 is in close contact with each other, which is detrimental to the reliability of the device. The transparent electrode layer 7 is disposed on the surface of the relaxation layer 31 in an extremely transparent manner. 7 is formed on the surface on the opposite side, and the layer 31 is formed on the opposite side to form the light-emitting layer 8. Further, the surface of the opposite side of the transparent electrode layer 7 is provided with a counter electrode / = an organic EL element. Figure 2 shows the surface illuminator. The opposite electrode; the slab can be used. A1 or the like can also be used in combination with A1 and other electrode materials to form a combination of blood-bonded materials, for example, a laminate of alkali metal and A1. , alkali metal: two and f body, a mixture of an alkali metal halide and A1, an oxide of an alkali metal, a layer of a layer, a soil of a soil or a mixture of a rare earth metal and A1, etc. It is an alloy of other metals, etc. More specifically, "^, for example, sodium, sodium-potassium alloys, laminates with Α1, magnesium-silver mixtures, magnesium-bismuth mixtures, aluminum-σ, LiF/ΑΙ Mixture/laminate, Α1/Α!2〇3 mixture, etc. 23 200904236 Further, as in the case of the first embodiment, And: between the electrodes 9, a hole can be formed to transport (2) an electrode layer, or a layer for reducing damage during film formation of the electrode. The surface layer illuminator formed by the scorpion transport layer and the buffering method is The transparent electrode layer 7 «light is applied between the drain electrodes 9 to emit light in the light-emitting layer 8 , the turn 7 and the opposite power 31 and the light-scattering layer 2 transmit the light-transmitting substrate 1 and the i-transmission mitigation layer 3 and the transparent electrode layer The interface of 7 is formed with = at this time, a light scattering structure is formed at the interface between the layer 7 and the relaxation layer 31. Therefore, the tantalum electrode layer is incident on the relaxation layer 31, too, and the transparent electrode layer 7 #ΐ interface scattering can be suppressed. The transparent electrode layer 7 turns / j 'Γ"4", ^ the boundary of the light substrate 1 S hairline. Further, the gaps 32 are formed between the inner and lower layers, and therefore, the light is irradiated on the light-transmitting substrate by the inner layer 2 of the light-releasing layer 3i. In this way, the total reflection can be improved, and the transparent electrode layer 7 can be efficiently transmitted from the transparent layer 31 to the light-scattering layer 31 and the light-scattering layer, and the light emitted from the light-emitting layer 2 and the light-emitting layer 8 can be emitted. The extraction efficiency is improved.坂1 is taken out first, so that after the transparent electrode layer 7 is formed on the surface of the relaxation layer 31, it can also be heat-treated, and the material of the enamel layer 7 is mixed with the resin forming the relaxation layer 31 at the interface between the transparent electrode layer 7 and the relaxation layer 31. 1. If the ratio is from the side of the transparent electrode layer 7 to the mitigating layer, then the refractive index of the gradual layer 31 gradually changes and the slope is gradually changed.

Li ϋ 率柯^學界®,能使得在界面全反 ::近、中間層與緩和層31之界面附近、中間層内 其次’將第2實施形態之面發光體以實施例具體説明。又, 24 200904236 重量平均分子量,係利用GPC(凝膠滲透層析),使 為測_,以標準聚苯乙職作檢量‘ (實施例8) 於四乙氧基石夕烧8《8質量份中加入異丙醇8〇3·5質量份 加入r-T基丙烯醯氧基丙基三甲氧基矽烷34 7質量份及〇 石肖酸75質量份’使用分散器,充分混合,得到溶液。將得到之容 液於4叱恒溫射 2小時,制重#平均分子量為刪 峨脂5質量%紐。其次,於此__溶液巾,添加甲基 粒子(GE東芝糊公·「TQsp咖⑽」:平均粒徑2倾),使甲 基矽酮粒子/石夕酮樹脂(縮合化合物換算)以固體質量基準計, 80/20,以均質機使分散’得到曱基石夕酮粒子分散石夕酮樹脂溶液: 又,上述「縮合化合物換算」,於四烷氧基矽烷之情形,係以 形式存在Si之質量。 2 其次’使用無鹼玻璃板(Coming公司製「No.1737」)作為透光 性基板1,將曱基矽酮粒子分散矽酮樹脂溶液以旋轉塗布機,以 lOOOrpm之條件塗布在透光性基板表面並乾燥,反複此塗布、 燥6 -人後,於200 C進行30分鐘锻燒,形成厚度約之光散射 層2。以濁霧度計(日本電色工業公司製rNDH—2〇〇〇」)測定形成 有光散射層2之透光性基板1之光學物性,結果濁霧度値為% 4, 全光線透射率為73.4%。 ’ 其次’在光散射層2之表面,以旋轉塗布機,以2〇〇〇rpm之 條件,塗布醯亞胺系樹脂塗布材料(〇pTMATE公司製「HRn783」、 nD = 1.78、濃度18質量%),使乾燥,再於2〇(rc加熱3〇分鐘;| 硬化,以形成厚度約4/zm之緩和層31。 其次’使用ITO靶材(T0S0h公司製),藉由在緩和層31之表 面進行濺鍍’於緩和層31之上形成膜厚i2〇nm之ΓΓΟ膜。其次, 將形成有ιτο膜之透光性基板i,於Ar氛圍下,於300。(:進行】 小時加熱處理,使ITO膜回火,形成片電阻18Ω/□之透明電極層 25 200904236 7。此日t,以電子顯微鏡觀察緩和層31,沿著與透明電極層7之界 面,確認直控5〜l〇0nm之空隙32以約2〇%之面積之分布密度形 巧。又,雖,透明電極層7之界面形成之空隙32相比,分布密度 車父小’但確認在緩和層31之内部亦形成空隙%。 十-人j將开>成有透明電極層7之透光性基板丨,以丙酮、純水、 異1醇進行15分鐘超音波洗滌後,使乾燥,再以uv—〇3處理15 分鐘。之後,將此透絲基板丨钱在餘驗裝置,於透明電 極層7之上’形成膜厚4〇nm之N,N,一二苯基-n,N,—雙(1-萘 i)—1 士—聯苯—4’4’ —二胺_)_y公司製),作為電洞輸i 層’,者,於其形成膜厚60nm之上參(8-經基喧琳)銘(AlqXeRay 子輸送層兼發光層8,再於其上形細厚1之The Li ϋ rate can be made to be described in detail by way of example in the vicinity of the interface of the interface, the vicinity of the interface between the intermediate layer and the relaxation layer 31, and the intermediate layer. Also, 24 200904236 Weight average molecular weight, using GPC (gel permeation chromatography), for the test _, with standard polystyrene work as a check ' (Example 8) on tetraethoxy zexi 8 "8 quality To the mixture, 8 〇 3·5 parts by mass of isopropyl alcohol was added, and 7 parts by mass of rT-based acryloxypropyltrimethoxy decane 34 and 75 parts by mass of fluorite octanoic acid were added, and the mixture was thoroughly mixed to obtain a solution. The obtained liquid was irradiated at 4 Torr for 2 hours, and the weight average weight was 5% by mass. Next, in this __ solution towel, methyl particles (GE Toshiba paste, "TQsp coffee (10)": average particle diameter 2) were added, and methyl ketone ketone particles / lysin resin (converted compound conversion) were solid. On the basis of the mass standard, 80/20, the dispersion was obtained by a homogenizer to obtain a solution of the sulfhydryl ketone particles dispersed in the sulphuric acid: in addition to the above-mentioned "condensed compound conversion", in the case of tetraalkoxy decane, Si was present in the form of Quality. 2 Next, using an alkali-free glass plate ("No. 1737" manufactured by Coming Co., Ltd.) as the light-transmitting substrate 1, the fluorenyl ketone ketone particles were dispersed in an oxime resin solution and applied to a light-transmitting property at 1,000 rpm. The surface of the substrate was dried, and after repeated application and drying, the film was calcined at 200 C for 30 minutes to form a light-scattering layer 2 having a thickness of about 200 Å. The optical properties of the light-transmitting substrate 1 on which the light-scattering layer 2 was formed were measured by a haze meter (rNDH-2, manufactured by Nippon Denshoku Industries Co., Ltd.), and the haze haze was % 4, and the total light transmittance was measured. It is 73.4%. On the surface of the light-scattering layer 2, a ruthenium-based resin coating material ("HRn783" manufactured by 〇pTMATE Co., Ltd., nD = 1.78, concentration: 18% by mass) was applied by a spin coater at 2 rpm. ), drying, and then heating at 2 Torr (rc for 3 〇 minutes; | hardening to form a relaxation layer 31 having a thickness of about 4/zm. Next, using an ITO target (manufactured by Tosoh Corporation), by easing layer 31 The surface is sputtered to form a ruthenium film having a film thickness of i2 〇 nm on the relaxation layer 31. Next, a light-transmissive substrate i having an ITO layer formed thereon is formed in an Ar atmosphere at 300. (: The ITO film is tempered to form a transparent electrode layer 25 with a sheet resistance of 18 Ω/□. 200904236 7. On this day t, the relaxation layer 31 is observed by an electron microscope, and along the interface with the transparent electrode layer 7, the direct control 5~l〇 is confirmed. The void 32 of 0 nm is shaped by a distribution density of an area of about 2%. Further, although the gap 32 formed by the interface of the transparent electrode layer 7 is smaller than the distribution density of the carrier, it is confirmed that the inside of the relaxation layer 31 is also formed. % void. Ten-person j will open > into a transparent substrate with a transparent electrode layer 丨, to C The ketone, pure water and iso-alcohol were subjected to ultrasonic washing for 15 minutes, dried, and then treated with uv-〇3 for 15 minutes. Thereafter, the transparent substrate was saved in the remaining device, above the transparent electrode layer 7. 'Formation of N, N, diphenyl-n, N, -bis(1-naphthalene i)-1 bis-biphenyl-4'4'-diamine _)_y company made by film thickness 4 〇nm) As the hole-transmission layer i, it is formed on the surface of the film with a thickness of 60 nm (8-via 喧基琳) Ming (AlqXeRay sub-transport layer and luminescent layer 8, and then formed on the thin layer 1

LlF(咼純度化子製)’作為電子注入層。最後,於電子注入声之上LlF (manufactured by 咼 Purification) is used as an electron injection layer. Finally, above the electron injection sound

膜厚8〇nm之A1(高純度化學公司製),形成作為陰^之 向電極9。 JA1 (manufactured by High Purity Chemical Co., Ltd.) having a film thickness of 8 Å was formed as the cathode electrode 9. J

之後,將形成有上述各層之透光性基板卜不暴露於大 运到露點-8G°C以下之乾燥l氣氛圍之手套箱。另—方面 J 2,(Dynic公司製)貼在玻璃製封帽,同時’將封帽= t布紫外線硬化樹離密封劑。並且,於手套 ^ I的自⑽’細2域爾奴嫌l元件構 (實施例9) 於四乙氧基石夕烧86.8質量份中添加異丙醇8〇3 加入r_曱基丙烯醯氧基丙基三甲氧基石夕院34 、里广,再 猶質量份,使糊❻充分混合,得驰 於40 C恆溫槽中攪拌2小時,得到重量平均分 〇 之办液 脂5質量%溶液。其次’於此石夕酮樹脂溶液 =夕_樹 粒(平均粒徑6〇mn、外殼厚度10nm)之IPA = j化石夕微 卿。、分散介質:異丙醇、觸媒化成4㈣ 26 200904236 釋成5質量%之溶膠’使得中空氧化矽 換算)固體質量基準計成為35/30,得到^巾〇同樹脂(縮合化合物 樹脂溶液。再者,於此溶液中,添加“ 微粒之石夕酮 被覆之氧化矽一氧化鈦複合微粒(平均粒禋二、子表面以氧化矽 散溶膠(固體成分:2G質量%、觸媒化成二二Gnm)之曱乙酮分 成5質量%之溶膠,使得中空氧化石夕微粒;氧:J幻,異丙醇稀釋 粒/石夕酮樹脂(縮合化合物換算)固體質I其 7 了氣化鈦複合微 方式,得到最終的塗布材料組成物。、土 ’ 5十,成為35/35/30之 在此,上述黏結劑材料之矽酮樹脂之折射 氧化石夕微粒之折射率_為1.25,氧切·氧化中空 為1.85,為滿足Nf2>Nb>Nfl之關係者乳化鈦雜之折射率恥 其次,使用無驗玻璃板(Coming公g冑「Ν 1.增為透光性基板!,以旋轉塗布機;^:.1737」、折射率 , 7mm tit 覆膜,再於200 C進行30分鐘锻燒,進行埶處 ’ ^子 ,職之光散射層2。光散射層2之以;;此= 率為小。又光刪2之濁霧一 如此,形成厚度約500nm光散射層2後,盥實施例 r思二成t度約_之光散射層2,再與實施例8同樣地形成緩 二電極層7、發光層8、對向電極9,㈤時,以封帽密 子,付到有機EL元件構成之面發光體。 (比較例5) 光性基板1之表面直接麟IT0膜,於300°C進行1小 夺加…、處理,形成經回火之透明電極層7。 (比較例6) 27 200904236 理 於實施例8中,濺鍍ΓΓΟ骐後,於2()() ,形成經回火之透明電極層7。此外, 丁 1 =加熱處 實施例8相同,但是由於加熱處理之^低U 電子·峨察、k和層31時’未見猶和層31中有空隙發生。 使用D(^電源(Keithley公司製),將流經元件内部之電^固定 ,lOmA/cm ’以亮度計(T0PC0N公司製),評價上述方式得到之 貫施例8 —9及比較例5-6之有機EL元件構成的面發光體特性。 此時,將正面壳度與電流效率(cd/Α)同時,以每1〇。之角度方位測 定一180°〜+ 180。之範圍,並計算總光束(功率效率lm/w)。結果, ^比較例5之情形為1時,相對數値如表3所示。又,電流—電 壓特性’實施例8 — 9及比較例5 —6中未見大的差異。又,發光 光谱亦未見大的差異。 【表3】 電流效率(cd/A) 功率效率(lm/W) 實施例8 1.8 1.8 實施例9 1.8 2.0 比較例5 1 1 比較例6 1.4 1.4 由表3可知,確認實施例8 — 9相較於比較例5當然光取出效 率提高,相較於比較例6亦為光取出效率提高。 【圖式簡單說明】 圖1A顯示本發明第1實施形態之面發光體構成剖面圖,圖 1B顯示形成於該透光性基材表面之光散射層剖面圖° 圖2A顯示本發明第2實施形態之面發光體構成剖面圖,圖 28 200904236 2B顯示該緩和層剖面圖。 圖3A顯示習知面發光體構成之剖面圖,圖3B顯示其他習知 面發光體之構成剖面圖。Thereafter, the light-transmitting substrate on which the above layers are formed is not exposed to a glove box which is transported to a dry atmosphere of a dew point of -8 G ° C or less. On the other hand, J 2, (manufactured by Dynic Co., Ltd.) is attached to a glass cap, and the cap is replaced with a UV-cured tree. Moreover, in the glove (1) from the (10) 'fine 2 sinuo yi l element structure (Example 9) in the tetraethoxy zexi 88.2 parts by mass of isopropanol added 8 〇 3 added r 曱 醯 propylene oxime The propyl trimethoxy zexiyuan 34, Liguang, and then the mass parts, the paste is thoroughly mixed, and the mixture is stirred in a 40 C thermostat for 2 hours to obtain a 5 mass% solution of the liquid lipid of the average weight distribution. Next, the IPA = j fossil Xiqing, which is the solution of the sulphuric acid resin solution = _ _ tree granules (average particle size 6 〇 mn, shell thickness 10 nm). Dispersing medium: isopropyl alcohol, catalyzed into 4 (4) 26 200904236 Released 5% by mass of sol 'in terms of hollow cerium oxide" to a solid mass basis of 35/30, and obtained a resin (condensed compound resin solution. In this solution, "fine particles of cerium oxide-coated cerium oxide-titanium oxide composite fine particles (average granules, sub-surface oxidized cerium oxide sol (solid content: 2G mass%, catalytically formed into two or two Gnm) are added. Ethyl ketone is divided into 5% by mass of sol, so that hollow oxidized oxide particles; oxygen: J phantom, isopropyl alcohol diluted granules / lithographic resin (converted compound conversion) solid matter I 7 liquefied titanium composite micro In the manner, the final coating material composition is obtained. The soil is '50, which is 35/35/30. Here, the refractive index of the oxidized oxidized cerium particles of the above-mentioned binder material is 1.25, oxygen cutting· The oxidized hollow is 1.85, and the refractive index of the emulsified titanium miscellaneous is satisfied by the relationship of Nf2 > Nb > Nfl, and the glass is not used. (Coming public g胄 "Ν 1. Increased into a translucent substrate!, with a spin coater ;^:.1737", refractive index, 7mm tit film, The calcination is carried out at 200 C for 30 minutes, and the light scattering layer 2 is used for the light scattering layer 2; the light scattering layer 2 is; the ratio of this = is small, and the haze of the light is 2, forming a thickness of about After the 500 nm light-scattering layer 2, the light-scattering layer 2 of the t-thickness is formed by the second embodiment, and the slow second electrode layer 7, the light-emitting layer 8, and the counter electrode 9 are formed in the same manner as in the eighth embodiment, and (f). The surface light-emitting body composed of the organic EL element was applied to the cap-shell dense member. (Comparative Example 5) The surface of the optical substrate 1 was directly immersed in an ITO film, and subjected to a small addition at 300 ° C to form a tempering. Transparent Electrode Layer 7. (Comparative Example 6) 27 200904236 In Example 8, after sputtering, tempered transparent electrode layer 7 was formed at 2 () (). In addition, D 1 = heating Example 8 is the same, but due to the heat treatment of the low U electrons, the k and the layer 31, there is no gap in the layer 31. The D (^ power supply (manufactured by Keithley) is used to flow through the element. The internal electroluminescence was fixed, and the organic EL element of Example 8-9 and Comparative Example 5-6 obtained by the above method was evaluated by a luminance meter (manufactured by T0PC0N Co., Ltd.). Surface illuminant characteristics. At this time, the front shell degree and the current efficiency (cd/Α) are simultaneously measured at an angular orientation of 1 〇 to a range of 180° to +180, and the total beam is calculated (power efficiency lm/ w). As a result, when the case of Comparative Example 5 was 1, the relative number was as shown in Table 3. Further, no significant difference was observed in the current-voltage characteristics of Examples 8-9 and Comparative Examples 5-6. There is no large difference in luminescence spectrum. [Table 3] Current efficiency (cd/A) Power efficiency (lm/W) Example 8 1.8 1.8 Example 9 1.8 2.0 Comparative Example 5 1 1 Comparative Example 6 1.4 1.4 3, it was confirmed that the light extraction efficiency of Example 8-9 was improved as compared with Comparative Example 5, and the light extraction efficiency was improved as compared with Comparative Example 6. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A is a cross-sectional view showing a surface light-emitting body according to a first embodiment of the present invention, and FIG. 1B is a cross-sectional view showing a light-scattering layer formed on a surface of the light-transmitting substrate. FIG. 2A shows a second embodiment of the present invention. A cross-sectional view of the illuminant of the form is shown in Fig. 28. Fig. 28 200904236 2B shows a cross-sectional view of the mitigating layer. Fig. 3A is a cross-sectional view showing the structure of a conventional surface light-emitting body, and Fig. 3B is a cross-sectional view showing the structure of another conventional surface light-emitting body.

【主要元件符號說明】 1 透光性基材 2 光散射層 3 發光體 4 黏結劑 5 充填料 6 充填料 7 透明電極層(電極) 8 發光層 9 對向電極(電極) 10 電洞輸送層 11 電子輸送層 31 緩和層 32 空隙 29[Description of main components] 1 Translucent substrate 2 Light-scattering layer 3 Luminous body 4 Adhesive 5 Filling material 6 Filling material 7 Transparent electrode layer (electrode) 8 Light-emitting layer 9 Counter electrode (electrode) 10 Hole transport layer 11 electron transport layer 31 relaxation layer 32 gap 29

Claims (1)

200904236 十、申請專利範圍: 透光1 生’包含:透紐基材;級制,形成於該 面,“光或電能而ίί或無機發光體層,形成於該光散射層表 其特徵為: 天’ 為射層包含雜麻2種充養,#娜結劑之折射率 ^率為Ϊ日士種2料其中—填料之折射率為Nfl,另—填料之折 丰為’滿足财2>她>_之關係。 ㈣專利範圍第1項之面發光體,其中,該光散射層之折 射率小於等於該透光性基材之折射率。 何 霧产ϋΐϊί?範圍第1項之面發光體,其中,該光散射層之濁 務又値[(擴政透射率/全透射率)><1〇〇]為2〜5〇之範圍。 折^^ Ϊ專利範圍第1項之面發光體,其中,該2種充填料之 折射率Nfl與Nf2之差丨Nf「_丨為〇 5以上。 ^如申請專利範圍第i項之面發光體,其該2 平均粒徑各為5〜200·之範圍。 具竹之 中_6·如申請專利範圍第1項之面發光體’其中’該2種充填料其 —充填料的平均粒徑與另一充填料之平均粒徑相差2倍以上:、 7.如申請專利範圍第〗項之面發光體,其中,該2種 中—充填料之折射率Nfl為1.40以下。 、^、 8如中請專利範圍第丨項之面發光體,其中,該發光體層係以 电讀發而發光者,於該光散射層表面以塗布法形成透明電極。 如申請專利範M 1項之面發光體,其中,該光散射層與該 =體層之間’依序形·以使該光散騎之表面祕度均勻化 和層及透明電極層,且至少該緩和層與該透明電極層之界面 或/、附近’形成有使光散射之光散射構造。 传w1〇·如申請專利範圍第9項之面發光體,其中,該光散射構造, 牟形成在該緩和層與該透明電極層之界面或附近的空隙。 11.如申請專利範圍第10項之面發光體,其中,該空隙亦形成 30 200904236 在該緩和層之層内部。 12.如申請專利範圍第10項之面發光體,其中,該空隙的直徑 為 5〜300nm。 十一、圖式:200904236 X. Patent application scope: Light transmission 1 sheng' contains: through-base substrate; grade system, formed on the surface, "light or electric energy ίί or inorganic illuminant layer, formed on the light scattering layer table is characterized by: 'For the shot layer containing two kinds of hybrid hemp, the refractive index of #娜结剂^ is the material of the Ϊ日士2 material, the refractive index of the filler is Nfl, and the folding of the filler is 'satisfy 2' (4) The surface illuminator of the first aspect of the patent, wherein the refractive index of the light scattering layer is less than or equal to the refractive index of the light transmissive substrate. The body, wherein the light scattering layer has a turbidity [(expansion transmittance/total transmittance)><1〇〇] is in the range of 2 to 5 。. ^^ Ϊ Patent scope item 1 The surface illuminator, wherein the difference between the refractive indices Nfl and Nf2 of the two kinds of fillers is 丨Nf"_丨 is 〇5 or more. ^ As in the surface illuminant of the i-th aspect of the patent application, the 2 average particle diameters are each Range of 5~200·. Among the bamboos _6·If the surface illuminant of the first application of the patent scope is 'in the 'the two kinds of filling materials-filling The average particle diameter is different from the average particle diameter of the other filler by a factor of two or more. 7. The surface illuminant of claim 2, wherein the refractive index Nfl of the two medium-filling fillers is 1.40 or less. The surface illuminator of the ninth aspect of the invention, wherein the illuminant layer is illuminated by electro-acoustic emission, and a transparent electrode is formed on the surface of the light-scattering layer by a coating method. a surface illuminator, wherein the light scattering layer and the body layer are 'sequentially shaped' to homogenize the surface of the light scatter and the layer and the transparent electrode layer, and at least the mitigating layer and the transparent electrode The surface of the layer or the vicinity of the layer is formed with a light-scattering structure for scattering light. The surface light-emitting body of claim 9, wherein the light-scattering structure is formed in the light-reducing layer and the transparent layer. 11. The surface illuminator of claim 10, wherein the void is also formed 30 200904236 within the layer of the mitigation layer. 12. As claimed in claim 10 Illuminant, wherein the gap is straight The diameter is 5~300nm. XI. Schema:
TW97111687A 2007-03-30 2008-03-31 Surface light emitter TW200904236A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084012A1 (en) * 2012-11-30 2014-06-05 シャープ株式会社 Scatterer substrate
TWI466352B (en) * 2011-09-30 2014-12-21 Au Optronics Corp Organic electroluminescent element array and organic electroluminescent element
TWI577050B (en) * 2016-03-29 2017-04-01 華碩電腦股份有限公司 Lighting structure having patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466352B (en) * 2011-09-30 2014-12-21 Au Optronics Corp Organic electroluminescent element array and organic electroluminescent element
WO2014084012A1 (en) * 2012-11-30 2014-06-05 シャープ株式会社 Scatterer substrate
TWI577050B (en) * 2016-03-29 2017-04-01 華碩電腦股份有限公司 Lighting structure having patterns
US9930749B2 (en) 2016-03-29 2018-03-27 Asustek Computer Inc. Lighting structure with patterns

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