TW200902442A - Reactor for producing silicon material for solar cell - Google Patents

Reactor for producing silicon material for solar cell Download PDF

Info

Publication number
TW200902442A
TW200902442A TW97122477A TW97122477A TW200902442A TW 200902442 A TW200902442 A TW 200902442A TW 97122477 A TW97122477 A TW 97122477A TW 97122477 A TW97122477 A TW 97122477A TW 200902442 A TW200902442 A TW 200902442A
Authority
TW
Taiwan
Prior art keywords
reaction
chamber
solar cell
raw material
zinc
Prior art date
Application number
TW97122477A
Other languages
Chinese (zh)
Inventor
Hirofumi Tezuka
Original Assignee
Solar Silicon Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solar Silicon Technology Corp filed Critical Solar Silicon Technology Corp
Publication of TW200902442A publication Critical patent/TW200902442A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/033Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by reduction of silicon halides or halosilanes with a metal or a metallic alloy as the only reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

This invention provides a reactor for producing a silicon material for a solar cell, which can produce a silicon material for a solar cell at low cost in a continuous manner. Silicon having a diameter of several tens of micrometers to several hundreds of micrometers is continuously produced by a zinc reduction reaction of silicon tetrachloride with gasified silicon tetrachloride and gasified zinc. A reacting furnace (1) comprises a reaction chamber (2) and an output chamber (3) for withdrawing the produced silicon. A number of holes for supplying zinc is provided on a bottom plate (6) in a reaction chamber (2). Silicon tetrachloride is supplied into the reaction chamber (2) through an introduction pipe (21a) which stands up from the bottom plate (6). Further, a silicon seed, together with a carrier gas, is supplied into the reaction chamber (2) to promote the precipitation of granular silicon.

Description

200902442 九、發明說明: 【明戶斤屬彳,好>%:貝^^】 發明領域 本發明係有關於一種用以製造太陽電池用矽原料之反 5應袭置’更詳而言之,本發明係有關於一種用以將太陽電 池用矽原料之四氯化矽及鋅蒸氣化’並藉由流動層式鋅還 原連續地製造粒狀太陽電池用;g夕原料之反應装置。 C 前 标]| 發明背景 1〇 太陽電池用原料主要是利用矽原料,近年來,由於太 陽電池市場之擴大,因此太陽電池用矽原料之價格暴漲, 為了地球環境,必須以低成本使太陽電池普及,若由此種 觀點來看,則該價格上升會是個大問題。製造矽原料之製 造裝置目前揭示有各種原理,舉例言之矽原料之製造方 15法係廣泛地使用一般被稱作平爐法之方法,於該平爐法 中,適合製造純度為十一個九,即,99 999999999%之高純 度半導體用石夕,若藉由該平爐法來生產石夕原料,則會生產 四氯化矽等之副生成物。 以在使用在太陽電池之砂原料係將藉由平爐法所製作 20之半導體用多晶石夕、由此所製造之單晶旋等之殘潰進行再 溶融來製造,然而,利用該平爐法之太陽電池用石夕原料之 生產卻趕不上太陽電池市場之擴大,且生產量有其界限, 並造成原料市場中絕對量之不足。 最近在此種情況下,進行利用冶金法、鋅還原法等來 5 200902442 2㈣,然而,賴冶金法之太 石夕原料需要純度六個九至七個九,即,99.9999% :上,質文定性 '大量生產時巨額之設備投資額或能源 4,尚且具有許多問題。 吝開始即研相用鋅還原法之低成本#原料之生 歹1 1專利文獻丨),於非專利文獻〖中,試作内徑7吋之 =室並崎實驗(轉批獻1之第90頁),又,自細長反 應至之1供給SiCl4_,且自相對側之—端供給石夕之晶 種並生成碎粒子。 1〇本發明之發明人等亦針對利用鋅還原法之太陽電池用 石夕原料之生產進行開發,習知鋅還原法係於反應爐中生成 針狀或片狀之石夕原料(專利文獻1及專利文獻2),然而,利用 / 口金法或鋅還原法等該等方法之太陽電池用石夕原料之生產 係由於大量生產之困難度或難以實現低成本化等問題,據 15發明人所知並未到達實用化。 非專利文獻1 :低成本矽產品特定化學製程(一期及二 期)評估之最終報告(時間始於D75年1〇月9日至1978年7月9 曰)’矽原料作業低成本太陽能陣列專案,貝特立哥倫布實 驗室獻給加州理工學院喷氣推進實驗室,1978年7月9日 20 (FINAL REPORT (covering the period October 9, 1975, to200902442 IX. Description of the invention: [Ming jin 彳 彳 好 好 好 好 好 好 好 好 好 好 ^ 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明The present invention relates to a reaction apparatus for continuously producing a granular solar cell by using a fluidized layer of zinc to continuously vaporize a solar cell using a crucible of germanium and zinc. C. Precursor Background||Inventive Background 1 The raw materials for solar cells are mainly made of tantalum raw materials. In recent years, due to the expansion of the solar cell market, the price of raw materials for solar cells has skyrocketed. For the global environment, solar cells must be used at low cost. Popularization, from this point of view, the price increase will be a big problem. The manufacturing apparatus for producing niobium raw materials has disclosed various principles. For example, the method of manufacturing the raw material is widely used as a method generally called the open hearth method, and in the open hearth method, the purity is 11 to nine. In other words, 99 999999999% of high-purity semiconductors are used for the production of Shixia raw materials by the open-hearth method, and by-products such as ruthenium tetrachloride are produced. It is produced by re-melting the polycrystalline silicon for the semiconductor produced by the open-hearth method using the polycrystalline material for the semiconductor produced by the open-cell method, and the re-melting of the single crystal spinning or the like produced by the method. However, the open hearth method is used. The production of Shixi raw materials for solar cells has not kept pace with the expansion of the solar cell market, and the production has its limits, and it has caused an absolute shortage in the raw material market. Recently, in this case, the use of metallurgy, zinc reduction, etc. 5 200902442 2 (four), however, the Lai metallurgical method of Taishi Xi raw materials need purity of six nine to seven nine, that is, 99.9999%: on, quality Qualitative 'large amount of equipment investment or energy 4 in mass production, there are still many problems.吝 即 即 即 即 相 锌 锌 锌 锌 # # # # 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料 原料In addition, the SiCl4_ is supplied from the elongated reaction to the 1st, and the seed crystal of the Shixi is supplied from the opposite end to generate the crushed particles. The inventors of the present invention have also developed a production of a stone-like material for a solar cell using a zinc reduction method, and a zinc reduction method is conventionally used to produce a needle-like or sheet-like stone material in a reaction furnace (Patent Document 1) And the patent document 2), however, the production of the solar cell material for the solar cell using the methods such as the gold-based method or the zinc reduction method is due to the difficulty of mass production or the difficulty in achieving cost reduction, etc. Knowing that it has not reached practical use. Non-Patent Document 1: Final Report on the Evaluation of Low-Cost, Product-Specific Chemical Processes (Phase I and Phase II) (Times starting from January 9th, D75, and July 9th, 1978) Project, Betley Columbus Lab dedicated to the California Institute of Technology Jet Propulsion Laboratory, July 9, 1978, 20 (FINAL REPORT (covering the period October 9, 1975, to

July 9, 1978) on EVALUATION OF SELECTED CHEMICAL PROCESS FOR PRODUCTION OF LOW - COST SILICON(phase I and II), Silicon material Task Low-cost Solar Array Project, to JEP PROPULSION LABORATORY, 200902442 CALIFORNIA INSTITUTE OF TECHNOLOGY from BATTELLE Columbus Laboratories, July 9, 1978 ) 專利文獻1 :曰本專利公開公報特開2004 — 18370號公報 專利文獻2:特開2004— 196643號公報 5 【發明内容】 發明揭示 發明所欲解決之課題 於前述平爐法中會生產四氯化矽等之副生成物,且其 處理耗費成本’再者’由於平爐法係氫還原法,故,由於 10使用氫的關係,因此設備、程序數會增加,且反應速度亦 遲緩’因此無法避免成本會提高。依據該等理由,利用平 爐法之石夕原料之生產不易達成低成本化,且至少作為進行 太陽電池用石夕原料之大量生產的生產方法是有界限的。 利用則述冶金法之太陽電池用矽原料之生產必須提升 15品質安定性,且亦必須提升生產線之能源效率,再者,由 於必須具有用以大量生產之大規模設備,因此需要大筆資 金’依此,利用冶金法之太陽電池用矽原料之生產係具有 許多未解決之問題且並未到達實用化。又,利用前述鋅還 原法之太陽電池用矽原料之生產係批式生產,因此具有無 20法連續生產之問題,又’非專利文獻1中藉由利用流動層之 鋅還原法的碎生成並未到達實用化。 本發明係以前述技術背景為基礎並達成下述目的。 本發明之目的在提供一種用以連續地製造太陽電池用 矽原料之用以製造太陽電池用矽原料之反應裝置。 7 200902442 …本發明之其他目的係提供-種用以藉由粒狀或粉狀之 形式連續地製造太陽電池用石夕原料之反應裳置。 用以欲解決課題之手段 為了達成前述目的,本發明係採取以下方法。 5 树_有關於—則以藉由四氯切之辞還原法製 切之反應裝置,且前述四氣切之鋅還原法係使用業已 風化之四氣化石夕及業已氣化之鋅,同時為用以製造太陽電 池用矽原料之反應裝置。 本發明用以製造太陽電池用石夕原料之反應裝置係用以 10藉由四氣化石夕之鋅還原法製造石夕之反應裝置,且前述四氣 化石夕之辞還原法係使用業已氣化之四氣化石夕及業已氣化之 辞,又,前述反應裝置之反應爐係於業已於前述反應爐内 氣化之前述四氯化石夕中,使業已氣化之前述辞及載體氣體 自則述反應爐之底部喷出並形成流動層,且使前述鋅與前 15述四氯化矽於前述流動層中進行還原反應',並連續地生成 直徑數〜數mm之粒狀石夕。 本發明用以製造太陽電池用矽原料之反應裝置的反應 爐包含有:反應室,係用以使前述鋅與前述四氯化矽於兮 述流動層中反應者;及取出室,係配置於該反應室之下部 並用以取出於前述還原反應中所生成且因重力而掉落之^ 述矽者。於前述反應室之底板上設置有多數用以供给前述 鋅之鋅蒸氣供給口,且前述反應室具有用以供給前迷 θ氣 化矽並自前述底板立起之四氯化矽用導入管。 又,前述取出室係設置於前述反應爐之底部並與前述 20 200902442 反應室連結,且前述取出室包含有:第丨取出室,係放入自 剛述反應室掉落之前述矽者;及第2取出室,係用以將因重 力而自A述第1室掉落之前述矽之溫度降至低溫並取出 者。於取出室設置有載體氣體之載體氣體用導入管;及用 5以排出反應中與碎同時地生成之氯化辞、未反應之辞、未 反應之四氯化石夕及載體氣體之排氣管。反應中與矽同時地 生成之氯化鋅、未反應之四氯化矽及未反應之鋅係於蒸氣 狀態下進行分離處理並自排氣管排出。 業已洛氣化之鋅與四氯化矽可將惰性氣體作成載體氣 10體,業已蒸氣化之鋅係供給自配置於反應室之底板全領域 之貫通孔,並供給、充滿於反應爐。底板係具有多數貫通 孔或間隙,且所生成之矽係自設置於底板上之取出管或複 數貫通孔及/或間隙掉落至取出室。反應爐係藉由石英或碳 化石夕等陶瓷材料所作成,又,可於反應室之側壁設置複數 15加熱器,以於反應之最佳條件下進行溫度控制,並於反應 室之縱向形成複數溫度區。 複數溫度區係75(TC至1200°C之溫度區,複數溫度區可 分別設定成750°C至1200°C之不同溫度區,不過,還原反應 之流動層溫度宜於約900 °C至Η 〇〇 °C之範圍進行溫度控 20制。第1取出室之材質可藉由石英或碳化石夕等陶瓷材料所作 成,且第1取出室可於70(TC至1000°C進行溫度控制,又, 前述第2取出室之低溫溫度係常溫。 第2取出室可具有用以搬出所生成之矽之搬出機構, 又’可於反應室之内部設置玎通電之金屬芯(電熱線),並藉 9 200902442 由促進於溫度控制成高於爐壁之金屬芯上之矽析出,提高 反應室内之空間占積率並改善反應之反應率。於反應室之 内部宜具有導入管,且該導入管係用以供給載體氣體與直 徑數/zm之大小之矽晶種,又,將載體氣體與矽晶種自該導 5 入管供給至還原反應之流動層。 將該矽晶種作為核心並成長,且促進粒狀矽之生成, 該導入管亦可作成前述載體氣體用導入管。為了防止空氣 摻入反應室,以及為了防止反應室溫度降低之隔熱效果, 第1取出室與第2取出室之底部可藉由擋門來分隔,若掉落 10自反應室之矽掉落至第1取出室並到達預定量,則擋門會打 開並掉落至第2取出室。 於第2取出室宜設置:惰性載體氣體導入管,係用以供 給惰性載體氣體者;及排出管,係用以排出該惰性載體氣 體與掉落自第1取出室之矽中所包含之未反應氣體等者。若 15 依此排出反應氣體,則第2取出室之擋門會打開並將矽供給 至搬送程序。以下具體說明構成本發明之構成要素。 本發明用以製造太陽電池用矽原料之具體反應裝置宜 附設用以分離矽之分離器,該分離器係從排出自反應爐之 氣體分離矽,且該分離器係從排出自反應爐之氣體分離微 20 小之粒狀矽。又,該分離器宜為藉由離心力分離矽之旋風 式分離器,且自該分離器所分離之矽雖然亦可直接回收, 但以供給至反應爐者為佳。 又,可於分離器之側壁設置加熱機構,以將分離器内 之溫度進行溫度控制,或,可設置用以加熱分離器與反應 10 200902442 至兩者之加熱機構,以將分離器及反應室内部之溫度進行 溫度控制。該加熱機構可將分離器與反應室設置於例如呈 圓筒狀之加熱器中,又,該加熱機構宜於反應室之縱向(垂 直方向)配置複數溫度區,且可自由地控制前述各溫度區之 5 溫度大小。 在此,以數值計鼻為基礎來研究矽之生成機制,於反 應至内生成矽之機制可思考如下。矽之生成基本上係利用 將石夕晶種作為核心之蟲晶成長,此時,初期所生成之石夕結 晶係扮演石夕晶種之角色,該所生成之石夕晶種係於反應室内° 10進行蟲晶成長並維持其成長,且該蟲晶成長係依據生成物 之流量、濃度。 15 第7圖係以模式方式顯補私成長之概要,相期所生 成之石夕晶種為數nm〜數十nm,且該初期所生成之妙晶種會 成長並構成數百nm至1以m之石夕 種,又,該數百nm至1以 m之矽晶種更會成長而構成數十#m〜數百 mm級之石夕。 β m 進而是 20 第8圖之圖表係顯示碎之蟲晶成長之模式,第8圖圖表 之縱軸表㈣氣之料濃度Csi(g),圖表之橫軸則表示自石夕 晶種成長之大小,具體而言,初期碎晶種之半㈣設㈣, 石夕粒子之半㈣設為R,首I於反應室内之還原反應初0 會生成石夕晶種’於該時間點中,錢之莫耳濃度大致接、斤 零,又,將石夕晶種作為核心並進行蟲晶成長,且生成石夕^ 粒子。 此時,心種與料思核大致呈球形,⑦係自半經 11 200902442 R。持續成長至半徑r,隨著該石夕粒子之成長,石夕之莫耳濃度 會逐漸上升,然而,在矽粒子構成預定大小時,莫耳濃度 Cs^會不再上升,此係意味飽和莫耳濃度(Cs_)。 即,四氣化矽與辞反應並作成矽氣Si(g),該矽氣會附 5在石夕晶種及/或石夕粒子上,且石夕粒子會成長並構成固體狀之 石夕。藉由四氣切與鋅之反應所生成之魏si(g)的流入速 度與矽氣Si(g)構成固體矽Si⑻的速度平衡者係飽和狀態, 該飽和狀態之飽和莫耳濃度(:別⑷係於特定溫度及壓力條件 下矽氣si(g)的生成速度與自矽氣Si(g)構成固體矽Si(s)的反 1〇應速度(附著於矽晶種及/或矽粒子之速度)到達表觀上之平 衡之狀態。 該蟲晶成長可藉由下式模式化。 [數式1] R〇 \ PmR0 .....试1) 15 此時’ R〇[m]係初期石夕晶種之半徑,啊係業已蟲晶成 長之矽生成物之半徑,係矽之莫耳密度, Dti^xs—1]係矽之擴散係數,t係矽之滯留時間,Cs二二〇1 XnT3xs—Ί係矽之莫耳濃度。 lg 依據該式’ g晶成長係依存;帶留時m、初期石夕晶種之 2〇半徑R〇、莫耳密度心、擴散係數D,第9圖之圖表係顯示依 據式1之數值模擬結果,該圖表之縱軸表示矽之半徑,該圖 表之橫軸則麵反應_,由_表可知粒子錢之傾向。 發明效果 12 200902442 若依據本發明,則可具有以下效果。 本發明利用流動層式鋅還原法之太陽電池用矽原料之 製造町連續地生產矽原料,因此,相較於習知利用批式辞 還原法之太陽電池用石夕原料之生產,可藉由較少台數之反 5應爐製造矽原料,再者,由於可有效地生產,因此可削減 反應爐之台數並大幅地減少設備投資額。 又,本發明利用流動層式鋅還原法之太陽電池用石夕原 料之製造在取出自反應爐所製造之石夕原料時可輕易地達成 自動化,藉此,可大幅地削減矽原料之製造成本,又,可 10削減該等設備投資額及製造成本之結果,具有能大幅地降 低為目前最大問題之太陽電池成本之效果,因此,有助於 太陽電池之量產、大量普及,結果,對於防止地球暖化有 重大貢獻’再者’由於本發明可將與排氣氣體一同地排氣 之微小石夕分離並且再利用,因此亦可節省資源。 15圖式簡單說明 第1圖係圖示本發明第1實施形態之反應爐丨之概要圖。 第2圖係圖示利用流動層式鋅還原法之矽連續製造(矽 製造設備)之流程概要圖。 第3圖係圖示電解程序4〇之概要圖。 20 帛4圖係圖示本發明第2實施形態之反應爐! 〇!之概要 圖。 第5圖係例示本發明第2實施形態之反應爐1〇1之底板 106之示意圖。 第6圖係圖示本發明第2實施形態之反應爐1〇1其他變 13 200902442 形例之概要圖。 第7圖係顯示於反應室 示意圖。 内石夕晶種進行蟲晶成長之狀態 秘日日取贡镇式之圖表。 第9圖係顯示依據式1之數值模擬結果之圖表。 第10圖係藉由實施例1之表2各條件A〜c所生成之生 成物照片’㈣刚係條件A時,鄉则條件b時第 10(c)圖係條件C時。 10 第11圖係顯示在藉由x射線解析採樣自第10圖條件B 之矽的試樣時之結果圖表。 第12圖係顯示分析採樣自第_條件B之石夕的試樣雜 質量之結果圖表。 孜雜 【實施方式】 用以實施發明之最佳形態 15 說明本發明之第1實施形態,第1圖係圖示本發明第i 實施形態之反應爐1之概要圖,反麟⑽流動層式之辞還 原反應用反應爐’反應爐用以使業已蒸氣化之辞㈣與 四氯化石夕(SiCU)藉由流動層方式進行還原反應並連續处 成粒狀奴裝置’且反應爐m由位於反應爐丨上部之反應 20室2及位於下部之取出室3所構成,又,反應爐丨之詳細、i 構、機能之說明係於說明矽連續製造之概要後如後所述。 第2圖係圖示利用流動層式鋅還原法之矽連續製造(矽 製造設備)之流程概要圖,首先,依據流動層式之鋅還原 法,說明矽製造設備之一連串程序,然後詳細說明本實施 14 200902442 形態之反應爐丨。概略說明,利用流動層式鋅還原法之矽連 續製造係藉由材料供給程序10、氯化程序15、蒸餾精製程 序2〇、還原程序3〇、電解程序4〇及搬送程序5〇所構成,以 下針對各程序說明其概要。 5 [材料供給程序] 材料供給程序10係用以供給材料之金屬矽(Si)之程 序,材料之矽(Si)係純度97%〜99%之金屬矽,又,材料供 給程序10係將材料之金屬矽供給至氯化程序15,且材料供 給程序10亦於氯化程序15中供給氯(Clz)氣,並於還原程序 10 30中供給鋅(Zn)氣(未圖示)。氯((¾)氣、鋅(Zn)氣基本上除 了因漏洩等而減少之量以外,會將還原反應中所生成者進 行再循環。 [氯化程序] 氯化程序15係用以使材料之金屬矽(Si)與氣(Ci2)氣反 15應而生成四氯化矽(SiCl4)之程序,且該反應係藉由以下化 學式來表示。 [數式2] 液體狀之四氣化矽係於溫度約59艺沸騰,於氯化程序 20 15中所生成之四氯化矽係於氣體狀態下供給至蒸餾精製程 序20,由於用以進行該氯化程序之反應機器係公知反應機 益,因此省略其說明。於氯化程序15中所使用之氣氣原則 上會將電解程序40中所生成之氯氣進行再循環。 於本例中,供給至氣化程序15之材料矽為矽純度97% 15 200902442 〜99%之金財,金料亦可未必是粉體,“,為了有 效地進行金屬石夕之氣化,宜於粉體之狀態下供給至氣化程 序15。本實施形態之反應爐⑽藉由利用流動層式辞還原法 之石夕連續製造,將該金屬料成純度六個九至七個九,即, 5 99.9999%以上之品質的石夕。 [蒸餾精製程序] 蒸館精製_2〇彳㈣以使氣體及/或㈣之四氯化石夕 (sicu)蒸舰作成纽之程序,於蒸料製㈣2()中係供 給自還原程序30所排出之液體四氯切,χ,無法於蒸顧 1〇精製程序20中蒸館之液體四氯化石夕亦再度地供給至蒸館精 製程序2〇,蒸顧精製程序20之蒸館精製方法、裝置為公知, 且於該蒸德精製程序20中並非特別,可利用該公知技術。 舉例言之’於蒸餘精製中所使用之精顧塔係於該塔内 設置20〜25段之塔板,且該塔板係朝上下方向設置複數段 15於中央·通為貫軌之孔的水平蝴㈣㈣塔内進 打劃分。四虱化石夕之沸點為溫度59t(latm),蒸館精製程序 20係具有蒸發器(未圖示),且藉由該蒸發器使四氣化石夕之液 體蒸發並作成氣體狀,又,藉由流量計,檢測自蒸發器所 排出之氣體狀四氣化石夕流量,並控制蒸發器中的基發量 20如前所述,蒸館精製程序2〇之機能、精㈣、蒸發⑼ 結構、機能為公知技術,並省略進—步之詳細說明。 [還原程序] 還原程序30係用 以使氣體之四氣化矽(SiCM與氣體 鋅㈣反應Μ錄狀奴㈣且為反賴,所生成之石夕 16 200902442 為純度六個九以上,即,99.9999%以上之品質的矽。於還 原程序30中,四氯化矽與鋅係形成流動層而進行反應,該 反應係於後述反應爐1之說明中詳細說明。於還原程序3〇 中,四氣化矽與鋅係利用惰性氣體作為载體氣體,且該惰 5性氣體係供給至還原程序30之反應爐1。 還原程序30之流動層之還原反應係於小於約1〇〇(Γ(:2 溫度環境氣體中進行反應,且該反應係藉由下式來表示。 [數式3] 1〇 $原程序30係還原w氯化梦而作成石夕與氣化辞之程 序’且還原程序30係還原四氣化石夕而作成碎與氣化辞之反 應爐。藉由還原程序3〇之流動層之還原反應,可與石夕(si) 同時地生成氯化辞(ZnCl2),再者,自還原程序3〇排出未反 應之四氣化石夕、未反應之鋅,又,自還原程序3〇更排出載 15體氣體。藉由閘(未圖示)等過瀘自還原程序3〇所排出之該等 氣體並刀離氯化辞,氯化鋅係供給至電解程序,且電解 程序40係電解氣化辞並作錢與鋅之程序。 本貝鞑形恶之反應爐1係藉由利用流動層式辞還原法 之夕連續將该金屬⑦作成純度六個九至七個九,即, 2〇 99_9999%以上之品質的石夕。於下述表i中歸納出由利用本發 月反應爐1所生成之;^所構成㈣原料之評價結果。 17 200902442 [表1] 汗價項目 品質(測定法) 所製造之Si原料 之化學分析 Zn換入量 〇-5ppm以下 (高頻感應電漿發光分光 法·· ICP-AES) 重金屬雜ΐΐϊχ·一~ (Fe、Cr、Ni ' Cu、Cd、 Co、Μη、Mo、Na、Ni ' Pb、Ti、Sn 等) 0.1 ppm以下 (高頻感應電漿發光分光 法:ICP-AES) 多晶 多晶珍純度 比電阻(Ω ~ cm、 99.9999%(6N)以上 基板狀態 >斤製造之Si原料 之晶粒 ----- 1 生存期 10〜55範圍内 10/z sec 以上 直徑 數/im以上〜數百 ----—____ 同樣地’載體氣體亦進行分離,自還原程序30所排出 之氣體係自管排出,且藉由閘(未圖示)等補未圖示)管 之氣體並自目31之氣體分離氯化辞,又,可藉由間(未 圖示)等料(未㈣)管31之氣體,並自扣之氣體分離四 氯化夕與鋅。又,業經分離之四氣化石夕與辞可供給至還原 程序30並且再循環,同樣地分離之載體氣體亦可於還原程 序30中再循環,該業經分離之四氯化石夕會透過管η或直接 供給至蒸餾精製程序2〇。 乳化紗係於氣體狀態下藉由排出 >· 公,々日 UM N7「tM 目《3 j 還原程序30取出’ 5亥四氯化石夕會回收並於問(未圖示)中冷 沈澱而構成液體,χ,該液體之四氯化抑供給至蒸 :精製程序20並且再循環。於還原程序对,藉由前述還 ^應社成之料成長絲狀,並自配置於反應爐i下部 之取出至3排出。取出官3位命w 係與也送裝置50連結,且矽會供 、、&至該搬送程序(以下亦_搬«置)5〇,錄送至後段之 18 15 200902442 矽塊製造程序60。 另’於本實施形態中,搬送程序50係如帶式輸送機般 之連續式搬送裝置,不過,搬送程序50亦可為將矽貯藏於 儲槽中之批式形式而非連續式搬送裝置。又,為了使矽結 5晶粒徑成長,若混合載體氣體與矽晶種而將其供給至反應 爐1内,且將該矽晶種作為核心並成長時,則可輕易地形成 如球狀、變形球狀或橢圓球狀般之粒徑。 舉例言之,石夕晶種可利用矽粉末,又,舉例言之,矽 晶種可利用直徑數〆mi大小之矽粉末,微小之矽有時會與 1〇排出自管31或管Μ之氣體一同地排出,該微小之矽可自氣 體分離而加以利用,又,該分離宜利用旋風式分離機構, 且忒業經分離之微小矽係作為矽晶種而供給至反應爐i 内,或,該業經分離之微小矽可作為製品而流放至搬送裝 置50。 15 [電解程序] 電解程序40係用以將氯化鋅(ZnCl2)電解分離成鋅(Zn) 與氯(Cl2)之程序,業經分離之鋅係於氣體狀態下供給至還 原序30並且再循環’業經分離之氣則供給至氯化程序^ 並且再循壤(未圖示)。第3圖係圖示該電解程序4〇之概要, 2〇電解程序40係具有電解槽46,且於該電解槽46中進行氯化 鋅之分離。 於電解槽46中設置二條電極43、44,且分別與直流電 源、連接,該二條電極43、料之素材宜為碳棒,然而,該二 ir、電極43、44並未特別限制其材料及形狀,亦可使用公知 200902442 之其他電極材料。電解槽46係分別連接用以供給氯化鋅之 e 31及用以排出業經分離之鋅㈣與氯(㈤之管、々I 電極(碳棒)43係與正電極連接,電極(碳棒)44則與負電極連 接:又’於碳棒43附近配置有用以排出氣體狀之氯之管Μ, 5且該氣體狀之氯係供給至氯化程序15並且再循環。 於碳棒44附近連接用以排出液狀辞之管42,該鋅雖未 圖示,但可藉由公知方法來氣化,業已氣化之該辞係供給 至還原程序30並且再循環,又,以下所示之及式 解程序40中之反應式。 ' 10 [數式4] (式4) 2C1' Cl2 + 2e' [數式5] (式5)July 9, 1978) on EVALUATION OF SELECTED CHEMICAL PROCESS FOR PRODUCTION OF LOW - COST SILICON(phase I and II), Silicon material Task Low-cost Solar Array Project, to JEP PROPULSION LABORATORY, 200902442 CALIFORNIA INSTITUTE OF TECHNOLOGY from BATTELLE Columbus Laboratories, In the above-mentioned open hearth method, the object of the invention is to solve the problem to be solved by the invention in the open hearth method. It will produce by-products such as antimony tetrachloride, and the cost of its treatment is 'further'. Because of the open-furnace hydrogen reduction method, the number of equipment and procedures will increase due to the use of hydrogen. Slowness, so it is impossible to avoid the cost increase. For these reasons, it is not easy to achieve cost reduction in the production of the Shixia raw material by the flat furnace method, and at least there is a limit to the production method for mass production of the raw material for the solar cell. The production of tantalum raw materials for solar cells using the metallurgical method must improve the quality stability of the product, and must also improve the energy efficiency of the production line. Furthermore, since it is necessary to have large-scale equipment for mass production, it requires a large amount of money' Accordingly, the production of tantalum raw materials for solar cells using metallurgical methods has many unresolved problems and has not yet reached practical use. Moreover, the production of the raw material for the solar cell using the zinc reduction method is batch-produced, and therefore has the problem of continuous production without the 20-step method, and the non-patent document 1 is produced by the zinc reduction method using the fluidized layer. Not practical. The present invention is based on the foregoing technical background and achieves the following objects. SUMMARY OF THE INVENTION An object of the present invention is to provide a reaction apparatus for continuously producing a raw material for a solar cell for producing a raw material for a solar cell. 7 200902442 ... Another object of the present invention is to provide a reaction skirt for continuously manufacturing a solar cell material for a solar cell by means of a granular or powder form. Means for Solving the Problems In order to achieve the above object, the present invention adopts the following method. 5 tree _ related - then the reaction device is cut by the tetrachloropyre reduction method, and the above-mentioned four gas cut zinc reduction method uses the weathered four gas fossils and the already vaporized zinc, and at the same time A reaction device for producing a raw material for a solar cell. The reaction device for manufacturing the solar energy raw material for solar cells of the present invention is used for manufacturing a stone eve reaction device by using a four-gas fossil sulphate reduction method, and the above-mentioned four gasification fossils are used for gasification. The fourth gasification fossils have been gasified, and the reaction furnace of the above-mentioned reaction device is in the above-mentioned tetrachloride stone which has been gasified in the above-mentioned reaction furnace, so that the above-mentioned remarks and carrier gas are vaporized. The bottom of the reaction furnace is ejected to form a fluidized bed, and the zinc is subjected to a reduction reaction with the first 15 hafnium tetrachloride in the fluid layer, and a granular stone having a diameter of several to several mm is continuously produced. The reaction furnace for producing a reaction device for a raw material for a solar cell according to the present invention comprises: a reaction chamber for reacting the zinc with the antimony tetrachloride in the flow layer; and a take-out chamber The lower portion of the reaction chamber is used to take out the defects generated in the aforementioned reduction reaction and dropped by gravity. A plurality of zinc vapor supply ports for supplying the zinc are provided on the bottom plate of the reaction chamber, and the reaction chamber has an introduction tube for supplying ruthenium tetrachloride which is supplied from the bottom plate. Further, the take-out chamber is provided at the bottom of the reaction furnace and is connected to the reaction chamber of 20200902442, and the take-out chamber includes a third extraction chamber which is placed in the above-mentioned one which falls from the reaction chamber; and The second take-out chamber is for lowering the temperature of the crucible dropped from the first chamber of the A by gravity to a low temperature and taking it out. An introduction tube for a carrier gas provided with a carrier gas in the take-out chamber; and an exhaust pipe for chlorination, unreacted, unreacted tetrachloride, and a carrier gas which are generated simultaneously with the pulverization in the reaction. . In the reaction, zinc chloride formed at the same time as the ruthenium, unreacted ruthenium tetrachloride, and unreacted zinc are separated in a vapor state and discharged from the exhaust pipe. The zinc gas and the ruthenium tetrachloride which have been gasified can be used as a carrier gas 10, and the vaporized zinc is supplied from a through-hole which is disposed in the entire surface of the bottom plate of the reaction chamber, and is supplied and filled in the reaction furnace. The bottom plate has a plurality of through holes or gaps, and the generated turns are dropped from the take-out pipe or the plurality of through holes and/or the gaps provided on the bottom plate to the take-out chamber. The reactor is made of quartz or carbon stone ceramic material, and a plurality of heaters can be arranged on the side wall of the reaction chamber to control the temperature under the optimal conditions of the reaction, and form a plurality in the longitudinal direction of the reaction chamber. Temperature zone. The complex temperature zone is 75 (TC to 1200 ° C temperature zone, the complex temperature zone can be set to different temperature zones of 750 ° C to 1200 ° C, respectively, however, the flow temperature of the reduction reaction is preferably about 900 ° C to Η温度°C is temperature controlled by 20. The material of the first extraction chamber can be made of ceramic material such as quartz or carbon carbide, and the first extraction chamber can be temperature controlled at 70 (TC to 1000 ° C, Further, the low temperature of the second take-out chamber is normal temperature. The second take-out chamber may have a carry-out mechanism for carrying out the generated crucible, and a metal core (heating line) capable of being energized inside the reaction chamber may be provided. Borrowing 9 200902442 to promote the temperature control to be higher than the enthalpy on the metal core of the furnace wall, increase the space occupation rate in the reaction chamber and improve the reaction rate of the reaction. It is preferable to have an introduction tube inside the reaction chamber, and the introduction tube A seed crystal for supplying a carrier gas and a diameter of /zm, and a carrier gas and a seed crystal are supplied from the inlet 5 to the flow layer of the reduction reaction. The seed crystal is grown as a core. And promote the formation of granular mites, The introduction pipe can also be used as the introduction pipe for the carrier gas. In order to prevent air from being mixed into the reaction chamber and to prevent the heat insulation effect of the reaction chamber from being lowered, the bottoms of the first extraction chamber and the second extraction chamber can be separated by a gate. If the drop 10 falls from the reaction chamber to the first take-out chamber and reaches a predetermined amount, the shutter will open and fall to the second take-out chamber. In the second take-out chamber, it is preferable to provide an inert carrier gas introduction tube. And a discharge pipe for discharging the inert carrier gas and the unreacted gas contained in the crucible dropped from the first extraction chamber. If 15 discharges the reaction gas accordingly, The shutter of the second take-out chamber is opened and the crucible is supplied to the transport program. The constituent elements constituting the present invention will be specifically described below. The specific reaction device for manufacturing the raw material for solar cells of the present invention should be provided with a separator for separating the crucible. The separator separates the crucible from the gas discharged from the reaction furnace, and the separator separates the micro-sized crucible from the gas discharged from the reaction furnace. Further, the separator is preferably separated by centrifugal force. The cyclone separator, and the crucible separated from the separator can be directly recovered, but it is preferably supplied to the reactor. Further, a heating mechanism can be disposed on the side wall of the separator to set the temperature in the separator. Temperature control, or a heating mechanism for heating the separator and the reaction 10 200902442 to both, to control the temperature of the separator and the inside of the reaction chamber. The heating mechanism can set the separator and the reaction chamber to For example, in a cylindrical heater, the heating mechanism is preferably configured to arrange a plurality of temperature zones in the longitudinal direction (vertical direction) of the reaction chamber, and is free to control the temperature of each of the aforementioned temperature zones. Based on the nose, the mechanism of the formation of cockroaches is studied. The mechanism for the formation of cockroaches in the reaction can be considered as follows. The formation of cockroaches is basically based on the growth of worm crystals with the core of Shixia crystal as the core. The crystal system plays the role of the Shiyue seed crystal, and the produced Shishijing seed crystal grows in the reaction chamber at 10° to grow and maintain its growth, and the crystal growth system is based on the product. Flow rate and concentration. 15 Fig. 7 is a schematic diagram showing the outline of private growth. The phase of the seed crystal produced by the phase is from several nm to several tens of nm, and the seed crystals generated in the initial stage will grow and form hundreds of nm to 1 In addition, the seed crystals of hundreds of nm to 1 m will grow to form tens of meters #m to hundreds of mm. β m and then 20 Figure 8 shows the pattern of broken crystal growth, the vertical axis of Figure 8 (4) gas concentration Csi (g), the horizontal axis of the chart shows the growth of the crystal The size, specifically, the half of the initial crushed seeds (four) set (four), the half of the Shi Xi particles (four) is set to R, the first I in the reaction chamber at the beginning of the reduction reaction will generate the Shixia seed crystal 'at this point in time, The concentration of Qian Mo's ear is roughly the same, and the weight is zero. In addition, the Shixia crystal seed is taken as the core and the crystal growth is carried out, and the Shi Xi ^ particles are generated. At this time, the heart species and the material core are roughly spherical, and the 7 series are from the half of the 11 200902442 R. Continue to grow to a radius r. As the Shixi particle grows, the concentration of Moxi's Moer will gradually increase. However, when the 矽 particle constitutes a predetermined size, the molar concentration Cs^ will no longer rise, which means saturated Ear concentration (Cs_). That is, the four gasification 矽 矽 辞 并 并 并 并 并 并 并 并 并 Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si . The inflow velocity of Wei si (g) generated by the reaction of four gas cuts with zinc and the balance of the velocity of solid helium Si (8) formed by helium Si (g) are saturated state, and the saturated molar concentration of the saturated state (: (4) The rate of formation of helium si(g) at a specific temperature and pressure is the inverse of the solid 矽Si(s) formed by self-helium Si(g) (attached to strontium and/or strontium particles) The speed) reaches the apparent balance state. The crystal growth can be modeled by the following formula: [Expression 1] R〇\ PmR0 ..... Test 1) 15 At this time 'R〇[m] The radius of the early Shiyue seed crystals, the radius of the product of the insect crystal growth, the molar density of the system, the diffusion coefficient of the Dti^xs-1 system, the retention time of the t system, Cs II 2〇1 XnT3xs—the molar concentration of the Ί system. Lg is dependent on the formula 'g crystal growth system; the band is m, the initial radius of the crystal seed, the radius R〇, the molar density, the diffusion coefficient D, and the graph of Fig. 9 shows the numerical simulation according to formula 1. As a result, the vertical axis of the graph represents the radius of 矽, and the horizontal axis of the graph reflects the surface _, and the _ table shows the tendency of the particle money. Effect of the Invention 12 200902442 According to the present invention, the following effects can be obtained. According to the present invention, the raw material of the solar cell for the solar cell using the fluidized layer zinc reduction method is continuously produced, and therefore, the production of the solar cell for the solar cell using the batch-type reduction method can be compared with In the case of a small number of units, the number of reactors can be efficiently produced, and the number of reactors can be reduced and the amount of equipment investment can be drastically reduced. Moreover, in the production of the Shixia raw material for a solar cell using the fluidized layer zinc reduction method of the present invention, it is possible to easily automate the extraction of the raw materials produced from the reactor, thereby greatly reducing the manufacturing cost of the raw material of the tantalum raw material. Moreover, the result of reducing the investment amount of such equipment and the manufacturing cost, and having the effect of greatly reducing the cost of the solar battery which is currently the biggest problem, contributes to the mass production and mass production of solar cells, and as a result, There is a significant contribution to the prevention of global warming. 'There is another'. Since the present invention can separate and reuse the small stones that are exhausted together with the exhaust gas, resources can be saved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a reaction furnace according to a first embodiment of the present invention. Fig. 2 is a schematic flow chart showing the continuous manufacturing (矽 manufacturing equipment) of the crucible using the fluidized layer zinc reduction method. Fig. 3 is a schematic view showing an electrolysis program. 20 帛 4 is a reaction furnace according to a second embodiment of the present invention! 〇! Overview of the map. Fig. 5 is a schematic view showing a bottom plate 106 of a reactor 1〇1 according to a second embodiment of the present invention. Fig. 6 is a schematic view showing a configuration of a reaction furnace 1〇1 according to a second embodiment of the present invention. Figure 7 is a schematic representation of the reaction chamber. The state of the celestial crystal growth of the inner stone eve crystals. Figure 9 is a graph showing numerical simulation results according to Equation 1. Fig. 10 is a photograph of a raw material produced by each of the conditions A to c of Table 2 of Example 1, (4) when the condition is A, and when the condition is b, the 10th (c) is the condition C. 10 Fig. 11 is a graph showing the results of a sample sampled from condition B of Fig. 10 by x-ray analysis. Fig. 12 is a graph showing the results of analyzing the sample masses sampled from the _ condition B. EMBODIMENT OF THE INVENTION The first embodiment of the present invention is shown in the first embodiment of the present invention. FIG. 1 is a schematic view showing a reaction furnace 1 according to an i-th embodiment of the present invention, and a reverse layer (10) fluidized layer type. The reaction of the reduction reaction is carried out in a reaction furnace 'reaction furnace for refining the vaporized (4) and the silicon tetrachloride (SiCU) by a fluidized bed method and continuously forming a granular slave device' and the reaction furnace m is located The reaction 20 chamber 2 in the upper portion of the reaction furnace and the extraction chamber 3 located in the lower portion are constructed. The details of the reaction furnace, the configuration, and the function are described later, as will be described later. Fig. 2 is a schematic flow chart showing the continuous manufacturing (矽 manufacturing equipment) using the fluidized layer zinc reduction method. First, according to the fluidized layer zinc reduction method, a series of procedures for the manufacturing equipment of the crucible is explained, and then the detailed description is given. Implementation of the reaction furnace of the form of 200902442. Briefly, the continuous production system using the fluidized layer zinc reduction method is composed of a material supply program 10, a chlorination program 15, a distillation purification program 2, a reduction program 3, an electrolysis program 4, and a transfer program 5, The outline of each program is explained below. 5 [Material supply program] The material supply program 10 is a program for supplying metal bismuth (Si) of a material. The 矽 (Si) of the material is a metal yttrium having a purity of 97% to 99%, and the material supply program 10 is a material. The metal crucible is supplied to the chlorination procedure 15, and the material supply program 10 also supplies chlorine (Clz) gas to the chlorination procedure 15, and zinc (Zn) gas (not shown) is supplied to the reduction procedure 1030. Chlorine ((3⁄4) gas, zinc (Zn) gas is basically recycled in addition to the amount of reduction due to leakage, etc. [chlorination procedure] Chlorination procedure 15 is used to make materials The procedure for the formation of ruthenium tetrachloride (SiCl4) by the metal ruthenium (Si) and the gas (Ci2) gas is 15 and the reaction is represented by the following chemical formula. [Formula 2] Liquid-like gasification 矽The temperature is about 59 art boiling, and the ruthenium tetrachloride formed in the chlorination process 20 15 is supplied to the distillation refining process 20 in a gaseous state, because the reaction machine for performing the chlorination process is known as a reaction machine. Therefore, the description of the gas used in the chlorination process 15 is in principle recirculated by the chlorine gas generated in the electrolysis process 40. In this example, the material supplied to the gasification process 15 is 矽purity. 97% 15 200902442 ~99% of the gold, the gold material may not necessarily be powder, "In order to effectively carry out the gasification of the metal stone, it is suitable to supply to the gasification process 15 in the state of the powder. This embodiment The reaction furnace (10) is continuously manufactured by using the fluid layer type reduction method. The metal material has a purity of six nine to seven nine, that is, 5 99.9999% of the quality of Shi Xi. [Distillation refining procedure] steaming hall refining 2 〇彳 (4) to make gas and / or (four) tetrachloride eve (sicu) The steaming ship is used as a procedure for making a liquid. In the steaming system (4) 2 (), the liquid tetrachlorocene which is discharged from the reduction program 30 is supplied, and it is not possible to distill the liquid tetrachloride in the steaming station. The fossil eve is also supplied to the steaming furnace refining program 2, and the steaming method and apparatus for purifying the refining program 20 are known, and the steaming refining program 20 is not particularly special, and the known technique can be used. 'The elite tower used in the steam refining is provided with a tray of 20 to 25 sections in the tower, and the tray is provided with a plurality of sections 15 in the vertical direction in the horizontal direction. (4) (4) Dividing into the tower. The boiling point of the four fossils is 59t (latm), and the steaming refining program 20 has an evaporator (not shown), and the liquid of the four gasification fossils is evaporated by the evaporator. In the form of a gas, and by means of a flow meter, the gas discharged from the evaporator is detected. The gas flow rate of the fossils is controlled, and the amount of the base in the evaporator is controlled as described above. As described above, the functions of the steaming refining process, the fine (4), the evaporation (9) structure, and the function are well-known techniques, and the detailed description of the steps is omitted. [Reduction procedure] The reduction procedure 30 is used to make the gas four gasification enthalpy (SiCM and gas zinc (four) reaction Μ 状 slave (4) and is contrary, the generated Shi Xi 16 200902442 is the purity of six or more, that is, In the reduction procedure 30, the ruthenium tetrachloride and the zinc form a fluidized bed and react, and the reaction is described in detail in the description of the reactor 1 to be described later. The gasification crucible and the zinc system use an inert gas as a carrier gas, and the inert gas system is supplied to the reaction furnace 1 of the reduction program 30. The reduction reaction of the fluidized bed of the reduction program 30 is carried out in less than about 1 Torr (: 2 in a temperature ambient gas, and the reaction is represented by the following formula. [Expression 3] 1 〇 $ original procedure 30 The process of reducing the chlorination dream and making it into the stone eve and the gasification process, and the reduction process 30 is to reduce the four gas fossils and make the reaction furnace of the smashing and gasification. The reduction reaction of the flow layer by the reduction procedure Simultaneously, the chlorination (ZnCl2) can be generated simultaneously with Shi Xi (si), and further, the unreacted four gas fossils, unreacted zinc are discharged from the reduction process, and the self-reduction process is further discharged. The body gas is supplied to the electrolysis program by a gate (not shown) or the like which is discharged from the reduction process 3, and is supplied to the electrolysis program, and the electrolysis process 40 is electrolysis gasification. The procedure of reciting and making money and zinc. This beibei-shaped reaction furnace 1 continuously makes the metal 7 into a purity of six nine to seven nine by using the fluid layer type reduction method, that is, 2〇99_9999% The above-mentioned quality of Shi Xi. It is summarized in Table i below by using this month's reaction furnace 1; (4) Evaluation results of raw materials. 17 200902442 [Table 1] Sweat price quality (measurement method) Chemical analysis of Si raw materials produced Zn exchange amount 〇-5ppm or less (high-frequency induction plasma luminescence spectrometry··ICP- AES) Heavy metal cesium·one~ (Fe, Cr, Ni'Cu, Cd, Co, Μη, Mo, Na, Ni 'Pb, Ti, Sn, etc.) 0.1 ppm or less (High-frequency induction plasma luminescence spectrometry: ICP -AES) Polycrystalline polycrystalline purity ratio resistance (Ω ~ cm, 99.9999% (6N) or more substrate state> Grain of Si raw material manufactured by kg---- 1 lifetime 10~55 range 10/z Ses The number of diameters above /im is more than a few hundred-----____ Similarly, the carrier gas is also separated, and the gas system discharged from the reduction program 30 is discharged from the tube, and is supplemented by a gate (not shown) or the like. The gas of the tube is separated from the gas of the gas of the head 31, and the gas of the tube 31 can be separated by a gas (not shown) and the self-deducting gas is separated. Zinc. In addition, the separated four gas fossils can be supplied to the reduction program 30 and recycled, and the carrier gas is separated as well. It can be recycled in the reduction program 30, and the separated tetrachloride is passed through the tube η or directly to the distillation refining program 2〇. The emulsified yarn is in a gaseous state by discharging >· public, the next day UM N7 "tM head "3 j reduction procedure 30 takeout" 5 hai tetrachloride chlorite will be recovered and freeze-precipitated in a question (not shown) to form a liquid, χ, the liquid tetrachloride is supplied to the steam: refining procedure 20 And recirculating. In the reduction procedure, the material is grown into a filament shape by the above-mentioned material, and is taken out from the lower portion of the reactor i to the third discharge. The official 3rd position w is connected to the delivery device 50, and the delivery program, and & to the transfer program (hereinafter also referred to as "transfer") 5, and recorded to the later paragraph 18 15 200902442 制造 block manufacturing program 60 . Further, in the present embodiment, the transporting program 50 is a continuous conveyor such as a belt conveyor. However, the transporting program 50 may be a batch type in which the crucible is stored in the storage tank instead of the continuous conveying apparatus. In addition, in order to increase the particle size of the 矽5 crystal, if the carrier gas and the eutectic seed are mixed and supplied to the reaction furnace 1, and the crystallization seed crystal is grown as a core, it can be easily formed into a spherical shape. , spheroidal or ellipsoidal particle size. For example, Shixia crystal can use bismuth powder, and, for example, 矽 crystal can use 矽 powder with a diameter of 〆mi, and sometimes it is discharged with 1〇 from tube 31 or tube. The gas is discharged together, and the minute crucible can be utilized for separation from the gas. Further, the separation is preferably performed by a cyclone separation mechanism, and the separated micro-system is supplied as a seed crystal to the reaction furnace i, or The separated fine crucible can be discharged to the conveying device 50 as a product. 15 [Electrolysis procedure] The electrolysis procedure 40 is a procedure for electrolytically separating zinc chloride (ZnCl2) into zinc (Zn) and chlorine (Cl2), and the separated zinc is supplied to the reduction sequence 30 in a gaseous state and recycled. 'The separation gas is supplied to the chlorination process ^ and then to the soil (not shown). Fig. 3 is a view showing the outline of the electrolysis program. The electrolysis process 40 has an electrolytic cell 46, and the zinc chloride is separated in the electrolytic cell 46. Two electrodes 43 and 44 are disposed in the electrolytic cell 46, and are respectively connected to a direct current power source. The materials of the two electrodes 43 and the material are preferably carbon rods. However, the two ir electrodes 43 and 44 are not particularly limited in material and For the shape, other electrode materials of the known 200902442 can also be used. The electrolytic cell 46 is connected to the e 31 for supplying zinc chloride and for discharging the separated zinc (tetra) and chlorine (the tube of the (5), the 々I electrode (carbon rod) 43 system and the positive electrode, and the electrode (carbon rod) 44 is connected to the negative electrode: 'A pipe which is used to discharge gaseous chlorine is disposed near the carbon rod 43, and the gaseous chlorine is supplied to the chlorination program 15 and recycled. The carbon rod 44 is connected. The tube 42 for discharging the liquid is not shown, but the zinc can be vaporized by a known method, and the vaporized system is supplied to the reduction program 30 and recycled, and the following is shown. The reaction formula in the procedure 40 is solved. ' 10 [Expression 4] (Formula 4) 2C1' Cl2 + 2e' [Expression 5] (Equation 5)

Zn2+ + 2e' — Zn [搬出程序] 15 搬送程序50係搬出還原程序30中所生成之矽之程序, 矽係冷卻至常溫之室溫並自還原程序3〇排出,搬送程序% 係用以搬出至後段之Si塊製造程序60之程序,該後段之Si 塊製造程序60係用以使用例如於還原程序30中所製造之橢 圓球、圓球狀等之粒狀矽塊而製品化之程序,舉例言之, 20將該粒狀石夕塊作成材料來製造太陽電池用之石夕板。 目前為止依據流動層式之鋅還原法說明矽製造設備之 一連串程序之概要,以下詳細說明流動層式之鋅還原反應 爐。 [流動層式之鋅還原反應爐] 20 200902442 第1圖係圖示本發明反應爐1之概要之示意圖,該反應 爐1係流動層式之辞還原反應用爐,反應爐1係用以將惰性 氣體作為载體氣體而進行溫度控制、流量控制,並於反應 爐1内將鋅(Zn)與四氯化矽(SiCl4)之還原反應連續且高速而 5有效地進行還原反應之高溫反應爐。 藉由該反應爐1,連續地生成粒狀矽,又,藉由於載體 氣體中摻入矽晶種並自載體氣體用導入管35(參照第2圖)供 給’可將其作為核心而使結晶成長,並有效地生成橢圓球 狀或圓球狀等之粒狀矽塊。概略說明,反應爐丨係由設置於 10反應爐1上部之流動層之反應室2及設置於反應爐1下部之 取出室3所構成’取出室3係進行劃分且由第丨取出室4及第2 取出室5之上下二室所構成,又,於反應室2中作成高純度 石夕並自取出室3取出該高純度碎。 反應爐1具有容器7,且反應室2及用以調整反應室2之 15溫度之加熱器(未圖示)等係配置於該容器7内,於反應室2 之底板6上開通複數鋅供給口,且自為底板6之底部全體之 S亥荨鋅供給口供給業已蒸氣化之鋅’並使其供給、充滿於 反應至2。該專辞供給口係與電解程序之管42連結(參照 第4圖)’又,於底板6上配置有導入管21aJ_自底板6立起。 20 該導入管21a係與管21連結,並用以將業已蒸氣化之四 氣化矽供給至反應室2内,又,使依此供給並蒸氣化之辞與 四氣化矽於反應室2内之流動層有效地進行還原反應,依 此,藉由該反應室2之還原反應,可高速且連續地製造石夕之 直徑數〜數mm之粒子。於該還原反應中,與矽同時地 21 200902442 生成氣化鋅,又,於該還原反應中,氯化鋅'未反應之四 氣化石夕、鋅等係於蒸氣狀態下進行分離處理,並自排氣管 31、31 a排出。 進行還原反應之四氯化石夕與辞係利用惰性氣體作為載 5體氣體,且該惰性氣體供給自導入管34、35(參照第㉘), 又i、給自導入官35之惰性氣體係供給至反應室2,若於供 '口自導人㈣之惰性氣體巾混切晶種,則會將其作為核 〜而更有效地進行結晶成長,另—方面,供給自導入管34 之惰性氣體係供給至取出室3,殘留於取出室3之未反應氣 1〇體储由供給自導入管34之惰性氣體,如第i圖圖示般自排 出管3la連續地排出。 〜排出之載體氣體宜自其他氣體分離並且再循環,還 原反應中所生成之梦係自底板6上所開通之貫通孔及/或間 隙掉落至設置成與底板6連通之取出室3。概略說明,該貫 I孔及/或間隙與用以供給鋅之鋅供給口係配置成表面上 呈句等,又,依據耐熱性、防止雜質摻入之觀點等,反應 室2係藉由石英或碳化矽等陶瓷材料所作成,且於反應室2 之侧壁設置有加熱器(未圖示)。 藉由該加熱器,將反應室2之空間朝縱向(垂直方向)分 2 〇割,並將前述各空間形成溫度7 5 0 X:至1200 〇C左右之不同溫 ryg 1^· ° 又糟由该專各溫度區,將各反應之最佳條件進行 ' 控制,並於各個溫度區進行反應。供給自導入管2la之 化石夕與供給自設置於底板6上的辞供給口之辞雖然於 «至2内之全空間進行反應,然而,主要是在導入管 22 200902442 之上部領域進行反應,該領域係藉由第1圖中之虛線所示, 又’該領域係於流動層進行反應,且該領域之溫度係於約 9〇〇°C至ll〇(Tc之範圍進行控制。 载體氣體係自設置於反應室2之底板6上的導入管35供 5給至反應室2,又,載體氣體係藉由導入管34供給至取出室 3,導入取出室3之載體氣體係趕出取出室3内之氣體,並與 該氣體同時地自排出管31a排出。自排出管Ma排出之排氣 氣體包含有反應中與矽同時地生成之氯化鋅、載體氣體、 未反應之四氣化石夕及未反應之辞,該等排氣氣體係於蒸氣 10狀態下進行分離處理,並自排出管31a排出。 又’藉由設置於反應爐1與前述電解程序4〇途中的閉 (未圖示),從排出自反應船之氣體(為未反應氣體之鋅、四 氣切及載體氣體、氣化辞)分離氣化辞之該間係從排氣管 Μ、3la兩者自氯化鋅分離。氯化鋅係運送至電解程序仙之Zn2+ + 2e' - Zn [Loading out program] 15 The transfer program 50 is a program for carrying out the enthalpy generated in the restore program 30, and the system is cooled to room temperature at normal temperature and discharged from the reduction program 3, and the transfer program % is used for carrying out In the procedure of the Si block manufacturing program 60 in the latter stage, the Si block manufacturing program 60 in the subsequent stage is a program for producing a grained block such as an elliptical ball or a spherical ball produced in the reduction program 30, for example. For example, 20 the granular stone block is made into a material to manufacture a stone plate for a solar cell. Heretofore, a summary of a series of procedures for manufacturing equipment has been described in terms of a fluidized zinc reduction method, and a fluidized layer zinc reduction reactor is described in detail below. [Flow layer zinc reduction reactor] 20 200902442 Fig. 1 is a schematic view showing the outline of the reaction furnace 1 of the present invention, which is a fluidized bed type reduction reaction furnace, and the reaction furnace 1 is used for High-temperature reaction furnace in which the inert gas is used as a carrier gas for temperature control and flow rate control, and reduction reaction of zinc (Zn) and ruthenium tetrachloride (SiCl4) is carried out continuously and at high speed in the reaction furnace 1 . In the reactor 1, the granules are continuously formed, and the cerium is doped by the carrier gas in the carrier gas (see Fig. 2). It grows and effectively produces granular lumps of ellipsoidal or spherical shapes. Briefly, the reaction furnace is divided into a "removal chamber 3" by a reaction chamber 2 provided in a fluidized bed on the upper portion of the reactor 1 and a take-out chamber 3 installed in the lower portion of the reactor 1, and the second extraction chamber 4 and The second extraction chamber 5 is formed by the upper and lower chambers, and the high-purity stone is prepared in the reaction chamber 2, and the high-purity material is taken out from the take-out chamber 3. The reactor 1 has a container 7, and a reaction chamber 2 and a heater (not shown) for adjusting the temperature of the reaction chamber 2 are disposed in the container 7, and a plurality of zinc supplies are opened on the bottom plate 6 of the reaction chamber 2. The mouth is supplied with the vaporized zinc from the S 荨 zinc supply port of the bottom of the bottom plate 6, and is supplied and filled to the reaction to 2. This special word supply port is connected to the tube 42 of the electrolysis program (see Fig. 4). Further, the introduction tube 21aJ_ is placed on the bottom plate 6 and stands up from the bottom plate 6. 20 The introduction pipe 21a is connected to the pipe 21, and is used for supplying the vaporized four gasification ruthenium into the reaction chamber 2, and further supplying and vaporizing the gas and the gas into the reaction chamber 2 The fluidized layer is effectively subjected to a reduction reaction, whereby particles of a diameter of several to several mm can be produced at high speed and continuously by the reduction reaction of the reaction chamber 2. In the reduction reaction, zinc hydride is formed simultaneously with 矽 21 200902442, and in the reduction reaction, zinc chloride 'unreacted four gasification fossils, zinc, etc. are separated in a vapor state, and The exhaust pipes 31, 31a are discharged. The tetrachloride is used to carry out the reduction reaction, and the inert gas is used as the carrier gas, and the inert gas is supplied from the introduction tubes 34 and 35 (see the 28th), and i is supplied to the inert gas system from the introduction unit 35. In the reaction chamber 2, if the seed crystal is mixed with the inert gas towel for the self-guided person (4), it will be crystallized more efficiently as a core, and, in other words, the inert gas supplied from the introduction tube 34. It is supplied to the take-out chamber 3, and the unreacted gas 1 remaining in the take-out chamber 3 is stored by the inert gas supplied from the introduction pipe 34, and is continuously discharged from the discharge pipe 31a as shown in Fig. i. The discharged carrier gas is preferably separated from other gases and recycled, and the dream generated in the reduction reaction is dropped from the through holes and/or the gaps opened in the bottom plate 6 to the take-out chamber 3 provided to communicate with the bottom plate 6. Briefly, the through hole and/or the gap are arranged on the surface of the zinc supply port for supplying zinc, and the reaction chamber 2 is made of quartz according to the viewpoint of heat resistance and prevention of impurity incorporation. It is made of a ceramic material such as tantalum carbide, and a heater (not shown) is provided on the side wall of the reaction chamber 2. With the heater, the space of the reaction chamber 2 is split into 2 in the longitudinal direction (vertical direction), and the aforementioned spaces are formed at a temperature of 7 5 0 X: to about 1200 〇C, and the temperature ryg 1^·° is bad. From the specific temperature zones, the optimum conditions for each reaction are 'controlled' and the reaction is carried out in each temperature zone. The fossils supplied from the inlet pipe 2la and the words supplied from the refilling port provided on the bottom plate 6 are reacted in the entire space of «to 2, however, mainly in the upper field of the introduction pipe 22 200902442, the reaction is performed. The field is indicated by the dashed line in Fig. 1, and the field is reacted in the fluidized bed, and the temperature in the field is controlled in the range of about 9 ° C to 11 ° (Tc. The introduction pipe 35 provided on the bottom plate 6 of the reaction chamber 2 is supplied to the reaction chamber 2, and the carrier gas system is supplied to the take-out chamber 3 through the introduction pipe 34, and the carrier gas system introduced into the take-out chamber 3 is taken out and taken out. The gas in the chamber 3 is discharged from the discharge pipe 31a simultaneously with the gas. The exhaust gas discharged from the discharge pipe Ma contains zinc chloride, a carrier gas, and unreacted four gas fossils which are simultaneously generated in the reaction. In the evening, the exhaust gas system is separated and treated in the vapor 10 state, and is discharged from the discharge pipe 31a. Further, it is closed by the reaction furnace 1 and the electrolysis program 4 (not shown). Show), from the gas discharged from the reaction vessel (for The unreacted gas zinc, the four gas cut and the carrier gas, and the gasification word) are separated from the zinc chloride by the exhaust pipe 3 and 3la. The zinc chloride is transported to the electrolysis program.

15電解槽46,且載體氣體為惰性氣體,舉例言之,載體氣體 係氮或氬等惰性氣體。 20 還原反應中所生成之石夕係藉由載體氣體攪拌混合’並 於反應室2内相互地附著或結晶成長而結晶化並構成粒 狀,該顆粒之大小會構成直徑數_〜數_之大小。為了 促進石夕之成長,於反應室2内可配置金屬芯(未_,還原 反應中所生成之石夕係於該金屬芯上附著並結晶化,又,於 金屬芯上施加預定電壓並流動電流而促進矽之成長 —金屬芯係溫度控制成高於爐壁,依此,藉由進行金屬 心之溫度㈣,促進金以上之^^,減,可提高反 23 200902442 應爐!内之反應空間之反應效率,並改善利用還原反應所生 成之石夕之反應率。金屬芯之素材宜為纽芯或碎芯,又,為 了使藉由流動層之還原反應所構成之矽迅速地進行氣相成 長而作成顆粒狀,宜與載體氣體一同地供时晶種,'所生 5成之石夕會附著於♦晶種上並成長成粒狀石夕。 [取出室] 取出至3包含有:第1取出室4,係放入掉落自反應室2 之矽者;及第2取出室5,係用以將來自第丨取出室4之矽溫 度降至低溫並取出者。依此,反應爐”所生產之常溫石夕係 10自搬送程序50連續地排出,進入第2取出室5之矽會掉落並 收納於搬送程序50中所設置之貯留槽等,或,矽亦可儲存 於第2取出室5内且每隔預定時間取出,再者,矽亦可儲存 於第2取出室5内,且於構成預定量時取出。 第1取出室4之材質係藉由石英或碳化矽等陶瓷材料所 I5作成’第1取出室4係自該内部或外部加熱並於700°C至1000 °C進行溫度控制,又,用以將載體氣體供給至反應室2之導 入管35(參照第2圖)係與第丨取出室4連接。第2取出室5係取 出所生成之矽的房間,且將溫度降至常溫並具有搬出所生 成之矽原料之機構,又,第丨取出室4係連接載體氣體用導 2〇入管35、四氣化矽用管21及鋅氣供給用管42。 第1取出室4與第2取出室5之底部係分別藉由擋門8、9 分隔,掉落自反應室2之矽會掉落至第1取出室4並堆積於擋 Π8上,若該矽量到達預定量,則將擋門8打開並使其掉落 至第2取出室5。由於有時第1取出室4之矽中會含有一定量 24 200902442 之未反應氣體,因此,自導入管34供給载體氣體並流動一 定時間,且將未反應氣體自排氣管3ia排出,然後,將第2 取出室5之擋門9打開並使其掉落至搬送程序5〇之取出室 等,且於作成常温後連續地取出。 5 其他實施形態 說明本發明用以製造太陽電池用矽原料之反應裝置之 第2實施形態,第4圖係圖示本發明第2實施形態之反應爐 101及分離器200之概要圖。本發明第2實施形態之反應爐 101係具有於前述實施形態1之反應爐1中附加分離器2〇〇之 10結構,該第2實施形態之反應爐101與實施形態1之反應爐1 雖然基本上之技術思想相同’然而其詳細結構不同,在此, 僅說明反應爐101及分離器200,其他結構、機能係與前述 實施形態1相同且省略其說明。 [反應爐] 15 反應爐101係流動層式之鋅還原反應爐,反應爐101係 用以使業已蒸氣化之辞(Zn)與四氣化矽(siCl4)藉由流動層 方式進行還原反應並連續地生成石夕之裝置,又,反應爐101 係與可分離矽及除此以外之氣體的分離器200連接,概略說 明,反應爐101係由位於反應爐101上部之反應室102及位於 20 其下部之取出室103所構成。 反應爐1 〇 1係用以將惰性氣體作為載體氣體而進行溫 度控制、流量控制,並將業已於反應爐101内蒸氣化之鋅(Zn) 與四氯化矽(SiCU)之還原反應高速且有效地進行還原反應 之反應爐。藉由反應爐101,連續地生成粒狀石夕,石夕晶種係 25 200902442 自導入管111供給至反應室1()2内,又,可將該碎晶種作為 核心且使矽結晶成長,並有效地生成粒狀石夕。 該矽晶種可視為矽成長初期之矽晶種,又,反應爐101 包含有.没置於反應爐101上部之流動層之反應室1〇2 ;及 5連續地设置於反應室102下部之第1取出室104。第1取出室 104之下部連續地連接第2取出室1〇5,且反應室1〇2具有内 部為空洞之縱長圓筒狀結構,又,如第4圖中所圖示,反應 室102係構成上部區i〇2a與下部區1〇21)之連續二段結構,且 上部區102a與下部區i〇2b分別具有内部為空洞之圓筒狀結 10 構。 上部區102a之内孔内徑大於下部區1〇21?之内孔内徑, 且上部區職與T部區獅巾間之連㈣鋪㈣錐狀之 圓筒部連結,且使該兩内孔連續。反應爐1〇1係具有用以自 外。卩加熱反應室1〇2之加熱機構,若加熱機構12〇係可將 15反應室102之内部溫度控制成所期望之溫度者,則無論是藉 由任何加熱原理來進行加熱者,皆可為公知之該等加熱機 構,本例之加熱機構120係流動電流來進行加熱之電熱加熱 器。 雖未圖示,然而,反應室102與加熱機構12〇係收納於 2〇容器等,又,加熱機構120係具有與反應室1〇2之外形形狀 —致之形狀,換言之,加熱機構120係具有可有效地加熱反 應至102之結構,如第4圖所示,反應室1〇2係由上部區1〇2a 及下部區102b所構成,因此,加熱機構12〇係由第丨加熱機 構120a及第2加熱機構120b所構成,第丨加熱機構12〇&係加 26 200902442 熱上部區102a ’第2加熱機構120b則加熱下部區i〇2b。 於第2實施形態中,第!加熱機構12〇3與第2加熱機構 120b係相同結構者,不過,依據上部區1〇2a、下部區1〇处 溫度之不同,亦可使用能輕易地加熱至其溫度之不同結 5構、不同加熱原理之加熱機構,第1加熱機構120a與第2加 熱機構120b之結構係如後述。多數辞蒸氣供給口係於反應 室102之底板1〇6上形成開口,且自為底板1〇6之底部全體之 該等辞蒸氣供給口供給業已蒸氣化之辞,並使辞蒸氣充滿 於反應室102内。 1〇 又,為了自底板106立起,導入管21a係於下部區i〇2b 之下部配置成露出一部分,該導入管21a係與供給業已蒸氣 化之四氯化矽之管21連結,且導入管21a係用以將業已蒸氣 化之四氣化石夕供給至反應室1〇2内。又,於下部區i〇2b之下 鋅蒸氣係自管42供給至後述底板1 〇6,依此,同時地自 15導入管213供給四氯化矽及自底板106供給辞蒸氣,且使業 已蒸氣化之鋅與四氯化矽於反應室2内之流動層有效地進 行還原反應。 依此,藉由該還原反應,高速且連續地製造矽之直徑 數〜數mm之粒子、粉末等,又,供給自導入管21&之四 20氯化石夕係與鋅反應而生成粒狀石夕,或,供給自導入管化之 四氯化石夕係與鋅反應而使妙晶種結晶成長並生成粒狀石夕, 該反應係於反應室脱内之全體進行,然而,該反應主要是 集中在反應室102之中央(中心)領域。 若底板106係可將供給自管⑫之鋅蒸氣普遍地導入反 27 200902442 應室102中者,則可為任意之形狀,反應室1〇2内所生成之 矽係因重力而掉落,並自下部區1〇2b進入第1取出室丨〇4, 此時’矽係貫通底板106而自反應室1〇2進入第1取出室 104 ’因此’底板1〇6必須具有矽可穿越之多數貫通孔或間 5 隙。 第5圖係圖示底板1〇6之例子,該底板106包含有:可將 來自管42之鋅蒸氣導入反應室1〇2中之多數鋅蒸氣供給孔 107;及矽可穿越之環狀間隙1〇8。如第5圖所圖示,底板1〇6 係由同心圓之複數環狀管所構成,於第5圖圖示之例子中, 10底板106係藉由環狀管l〇9a' l〇9b、109c及109d以同心圓連 結四重圓管,即’四種曲率之環狀管的管所構成,又,各 個管109a、109b、109c及109d係與管42a或管42b連接。 管109d與管109a係藉由管ll〇b相互地連接,且管i〇9a 係與管42b連接,管l〇9b與管l〇9c係藉由管ll〇a相互地連 15接,且管1〇9b係與管42a連接,又,管42a與管42b係與管42 連接(未圖示)。管l〇9a、109b、l〇9c及109d係分別以預定間 隔開通複數辞蒸氣供給孔107,且供給自管42之辞蒸氣係通 過管42a及管42b,又,通過管l〇9a、109b、109c及109d分 別供給至反應室102内。 20 自管42供給至管42a之辞蒸氣係通過管1〇%、管ll〇a、 管l〇9c供給至反應室1〇2内,與該供給同時,自管42供給至 管42b之鋅蒸氣係通過管109a、管110b、管109d供給至反應 室102内《設置於管i〇9a、l〇9b、109c及109d之鋅蒸氣供給 孔107之大小及二個辞蒸氣供給孔107間之間隔必須依據反 28 200902442 應室102之大小、所供給之辞蒸氣之壓力、流量、流速等最 佳化。 同樣地,管109a、l〇9b、109c及109d之管各自之外徑 及内徑毋須相同,或,管109a、109b、109C及i〇9d之半徑 5方向之配置間隔必須依據反應室102之大小、所供給之鋅蒸 氣之壓力、流量、流速等最佳化,即,於反應室1〇2内’為 了使辞蒸氣與四氯化矽之蒸氣引起亂流而隨機有效地接觸 並製造矽粒,必須進行最佳化。於本實施形態中,反應室 102之大小係縱90cm〜150cm、内徑20cm〜40cm之圓筒狀。 10 於本例中’管42a及管42b係内徑為2cm〜4cm之管狀, 又,於本例中’管l〇9a、i〇9b、l〇9c及109d之粗度係内徑 2cm〜4cm之管狀。於反應室2内,依據情況之不同,若為 了促進矽成長而設置阻礙板110等,則只要是用以產生亂流 並促進辞與四氣化矽之反應即可,又,阻礙板11〇係具有防 15止所供給之原料未進行反應而直接進入排氣管31c並排出 之作用。 [生成物] 若藉由此種結構之反應室102内之還原反應,則可於反 應至102内連續地生成粒狀石夕,於該還原反應中,與石夕同時 20地生成氣化鋅,且所生成之氣化鋅、未反應之四氯化矽、 鋅等係於蒸氣狀態下自反應室102進行分離處理並自排氣 管31c排出。排氣管31c係與管31d連接,且自排氣管3ic及 管31 d排出之氣體有時會含有微小矽,該微小石夕宜藉由後段 之分離器200等進行分離並且再利用。 29 20090244215 electrolytic cell 46, and the carrier gas is an inert gas. For example, the carrier gas is an inert gas such as nitrogen or argon. 20 The stone formed in the reduction reaction is stirred and mixed by the carrier gas and crystallized and crystallized in the reaction chamber 2 to form a granular shape, and the size of the particles constitutes a diameter _~number_ size. In order to promote the growth of Shi Xi, a metal core can be disposed in the reaction chamber 2 (not _, the stone generated in the reduction reaction is attached to the metal core and crystallized, and a predetermined voltage is applied to the metal core and flows. The current promotes the growth of the crucible—the temperature of the metal core is controlled to be higher than the wall of the furnace. Accordingly, by performing the temperature of the metal core (4), the above-mentioned reduction and the reduction of the gold can be promoted, and the reaction in the furnace can be improved. The reaction efficiency of the space and the improvement of the reaction rate of the stone generated by the reduction reaction. The material of the metal core is preferably a core or a broken core, and in order to rapidly carry out the gas formed by the reduction reaction of the fluidized layer The phase is grown into a granular form, and it is preferable to supply the seed crystal together with the carrier gas, and the 50% of the stone will be attached to the seed crystal and grow into a granular stone. [Removal chamber] The first take-out chamber 4 is placed in a drop from the reaction chamber 2; and the second take-out chamber 5 is used to lower the temperature from the second take-out chamber 4 to a low temperature and take it out. The reaction furnace "produces the normal temperature Shi Xia 10 self-transportation program 50 companies After being discharged, the second take-out chamber 5 may be dropped and stored in the storage tank or the like provided in the transporting program 50, or may be stored in the second take-out chamber 5 and taken out at predetermined intervals. The crucible may be stored in the second take-out chamber 5 and taken out when the predetermined amount is formed. The material of the first take-out chamber 4 is made of a ceramic material such as quartz or tantalum carbide, I5. The internal or external heating is performed at a temperature of 700 ° C to 1000 ° C, and the introduction pipe 35 (see FIG. 2 ) for supplying the carrier gas to the reaction chamber 2 is connected to the second extraction chamber 4 . 2 The take-out chamber 5 is a mechanism for taking out the generated cockroaches, and lowering the temperature to a normal temperature and having a mechanism for carrying out the raw material generated by the sputum. Further, the second take-out chamber 4 is connected to the carrier gas guide 2, the immersing tube 35, and the four gas. The sputum tube 21 and the zinc gas supply tube 42. The bottom portions of the first extraction chamber 4 and the second extraction chamber 5 are separated by the shutters 8, 9 respectively, and are dropped from the reaction chamber 2 and then dropped to the first 1 takes out the chamber 4 and deposits it on the dam 8. If the amount reaches a predetermined amount, the door 8 is opened and dropped to the second Exit chamber 5. Since the first extraction chamber 4 may contain a certain amount of unreacted gas of 24 200902442, the carrier gas is supplied from the introduction tube 34 and flows for a certain period of time, and the unreacted gas is supplied from the exhaust pipe. 3ia is discharged, and then the shutter 9 of the second take-out chamber 5 is opened and dropped to the take-out chamber of the transport program 5, and the like, and taken out continuously at room temperature. 5 Other Embodiments The present invention is for manufacturing A second embodiment of a reaction apparatus for a raw material for a solar cell, and a fourth embodiment of the present invention are a schematic view of a reactor 101 and a separator 200 according to a second embodiment of the present invention. In the reactor 1 of the first embodiment, the structure of the separator 2 is added to the reactor 10, and the reactor 101 of the second embodiment is basically the same as the reactor 1 of the first embodiment. However, the detailed structure is different. Here, only the reaction furnace 101 and the separator 200 will be described, and other configurations and functions are the same as those of the first embodiment, and the description thereof will be omitted. [Reaction Furnace] 15 The reaction furnace 101 is a fluidized bed type zinc reduction reactor, and the reaction furnace 101 is used for reducing the vaporized (Zn) and the four vaporized cerium (siCl4) by a fluidized bed method. The apparatus of the Shiki is continuously generated, and the reactor 101 is connected to the separator 200 which is separable and other gases. The reactor 101 is schematically illustrated by the reaction chamber 102 located at the upper portion of the reactor 101 and at 20 The lower portion of the take-out chamber 103 is constructed. The reactor 1 〇1 is used for temperature control and flow rate control using an inert gas as a carrier gas, and the reduction reaction of zinc (Zn) and ruthenium tetrachloride (SiCU) which has been vaporized in the reactor 101 is high speed and A reaction furnace that efficiently performs a reduction reaction. By the reaction furnace 101, the granular granules are continuously produced, and the Shihwa crystal system 25 200902442 is supplied from the introduction tube 111 into the reaction chamber 1 () 2, and the crystal seed crystal can be used as a core and the ruthenium crystal can be grown. And effectively produce a granular stone eve. The seed crystal can be regarded as a seed crystal in the initial stage of growth, and the reaction furnace 101 includes a reaction chamber 1〇2 which is not placed in the flow layer in the upper portion of the reaction furnace 101; and 5 is continuously disposed in the lower portion of the reaction chamber 102. The first take-out chamber 104. The lower portion of the first take-out chamber 104 is continuously connected to the second take-out chamber 1〇5, and the reaction chamber 1〇2 has a vertically long cylindrical structure in which the inside is hollow, and as shown in Fig. 4, the reaction chamber 102 is The two-stage structure of the upper zone i〇2a and the lower zone 1〇21) is formed, and the upper zone 102a and the lower zone i〇2b each have a cylindrical structure 10 having a hollow inside. The inner diameter of the inner hole of the upper portion 102a is larger than the inner diameter of the inner hole of the lower portion 1〇21?, and the upper portion is connected with the shishi area of the T area (four) shop (four) tapered cylindrical portion, and the two inner portions are connected The holes are continuous. The reactor 1〇1 system has its own function.卩 heating the heating mechanism of the reaction chamber 1〇2, if the heating mechanism 12 can control the internal temperature of the 15 reaction chamber 102 to a desired temperature, the heating can be performed by any heating principle. These heating mechanisms are known, and the heating mechanism 120 of this example is an electrothermal heater that conducts electric current to heat. Although not shown, the reaction chamber 102 and the heating mechanism 12 are housed in a 2-inch container or the like, and the heating mechanism 120 has a shape similar to that of the reaction chamber 1 2, in other words, the heating mechanism 120 is There is a structure capable of efficiently heating the reaction to 102. As shown in Fig. 4, the reaction chamber 1〇2 is composed of the upper portion 1〇2a and the lower portion 102b. Therefore, the heating mechanism 12 is configured by the second heating mechanism 120a. And the second heating mechanism 120b, the second heating mechanism 12〇& is added 26 200902442 The hot upper portion 102a 'the second heating mechanism 120b heats the lower portion i〇2b. In the second embodiment, the first! The heating mechanism 12〇3 and the second heating mechanism 120b have the same structure. However, depending on the temperature of the upper region 1〇2a and the lower region 1〇, it is also possible to use a different structure that can be easily heated to its temperature. The heating mechanism of the different heating principle, the structure of the first heating mechanism 120a and the second heating mechanism 120b will be described later. The majority of the steam supply port is formed in the bottom plate 1〇6 of the reaction chamber 102 to form an opening, and the vapour supply port is supplied from the entire bottom of the bottom plate 1〇6, and the vapor is filled in the reaction. Inside the chamber 102. In addition, in order to rise from the bottom plate 106, the introduction pipe 21a is disposed to be exposed at a lower portion of the lower portion i2b, and the introduction pipe 21a is connected to the tube 21 of the silicon tetrachloride which is supplied with vaporization, and is introduced. The tube 21a is for supplying the vaporized four gas fossils to the reaction chamber 1〇2. Further, the zinc vapor is supplied from the tube 42 to the bottom plate 1 〇6 to be described later in the lower portion i2b, and accordingly, the ruthenium tetrachloride is supplied from the 15 introduction pipe 213 and the sulphur vapor is supplied from the bottom plate 106. The vaporized zinc and the flowing layer of antimony tetrachloride in the reaction chamber 2 are effectively subjected to a reduction reaction. According to the reduction reaction, the particles, the powder, and the like having a diameter of several to several mm are produced at a high speed and continuously, and the tetrachlorides supplied from the introduction tube 21 & are reacted with zinc to form a granular stone. On the eve of the day, or alternatively, the silicon tetrachloride supplied from the tube is reacted with zinc to crystallize and crystallize the crystal, and the reaction is carried out in the entire reaction chamber. However, the reaction is mainly Concentrated in the central (central) field of the reaction chamber 102. If the bottom plate 106 can generally introduce the zinc vapor supplied from the tube 12 into the chamber 102, it can be of any shape, and the lanthanum generated in the reaction chamber 1〇2 falls due to gravity, and The lower portion 1〇2b enters the first take-out chamber 丨〇4, at which time the 矽 system penetrates the bottom plate 106 and enters the first take-out chamber 104 from the reaction chamber 1〇2. Therefore, the bottom plate 1〇6 must have a majority that can pass through. Through hole or 5 gaps. Fig. 5 is a view showing an example of a bottom plate 1〇6 which includes a plurality of zinc vapor supply holes 107 which can introduce zinc vapor from the tube 42 into the reaction chamber 1〇2; and an annular gap through which the crucible can pass 1〇8. As shown in Fig. 5, the bottom plate 1〇6 is composed of a plurality of concentric annular tubes. In the example illustrated in Fig. 5, the bottom plate 106 is connected by a ring tube l〇9a' l〇9b. 109c and 109d are connected by concentric circles to a four-fold pipe, that is, a pipe of a four-curvature annular pipe, and each of the pipes 109a, 109b, 109c, and 109d is connected to the pipe 42a or the pipe 42b. The tube 109d and the tube 109a are connected to each other by the tube 11b, and the tube i〇9a is connected to the tube 42b, and the tube l〇9b and the tube l〇9c are connected to each other by the tube 11〇a, and The tube 1〇9b is connected to the tube 42a, and the tube 42a and the tube 42b are connected to the tube 42 (not shown). The tubes 10a, 109b, 10c, and 109d open the plurality of steam supply holes 107 at predetermined intervals, respectively, and the steam supplied from the tubes 42 passes through the tubes 42a and 42b, and passes through the tubes 10a, 109b. 109c and 109d are supplied to the reaction chamber 102, respectively. 20 The steam supplied from the tube 42 to the tube 42a is supplied into the reaction chamber 1〇2 through the tube 1〇%, the tube 11〇a, and the tube 10〇9c, and the zinc supplied from the tube 42 to the tube 42b simultaneously with the supply. The vapor is supplied to the reaction chamber 102 through the tube 109a, the tube 110b, and the tube 109d. The size of the zinc vapor supply hole 107 provided in the tubes i〇9a, l〇9b, 109c, and 109d and the two vapor supply holes 107 are provided. The interval must be optimized according to the size of the chamber 102, the pressure of the supplied steam, the flow rate, the flow rate, and the like. Similarly, the outer diameters and inner diameters of the tubes of the tubes 109a, 10b, 109c, and 109d are the same, or the arrangement intervals of the tubes 5a, 109b, 109C, and i〇9d in the direction of the radius 5 must be based on the reaction chamber 102. The size, the pressure of the supplied zinc vapor, the flow rate, the flow rate, and the like are optimized, that is, in the reaction chamber 1〇2, in order to cause the turbulent flow of the vapour vapor and the antimony tetrachloride, the particles are randomly and effectively contacted and manufactured. Granules must be optimized. In the present embodiment, the size of the reaction chamber 102 is a cylindrical shape having a length of 90 cm to 150 cm and an inner diameter of 20 cm to 40 cm. 10 In this example, the tube 42a and the tube 42b have a tubular shape with an inner diameter of 2 cm to 4 cm, and in this example, the inner diameters of the tubes 'tubes l〇9a, i〇9b, l〇9c, and 109d are 2 cm. 4cm tubular. In the reaction chamber 2, depending on the case, if the barrier plate 110 or the like is provided to promote the growth of the crucible, it is only necessary to generate a turbulent flow and promote the reaction between the reciprocating and the four gasification, and the obstruction plate 11〇 The raw material supplied with the anti-15 is directly reacted into the exhaust pipe 31c without being reacted. [Product] When the reduction reaction in the reaction chamber 102 having such a configuration is carried out, a granular granule can be continuously formed in the reaction to 102, and in the reduction reaction, zinc hydride is formed at the same time as the stone eve. The produced zinc oxide, unreacted hafnium tetrachloride, zinc or the like is separated from the reaction chamber 102 in a vapor state and discharged from the exhaust pipe 31c. The exhaust pipe 31c is connected to the pipe 31d, and the gas discharged from the exhaust pipe 3ic and the pipe 31d may contain minute turns, which are preferably separated and reused by the separator 200 or the like in the subsequent stage. 29 200902442

底板106上所設置之貫通孔或間隙1〇8钻仗^ 舉例言之, 利用來作為石夕晶Through hole or gap 1 〇 8 drilled on the bottom plate 106, for example, used as Shi Xijing

是進行蟲晶成長並結晶化而構成粒子, •吧附著或凝結,或 該粒子之大小係直 徑數十//m〜數百"m之大小。 [載體氣體] 載體氣體係與鋅蒸氣及氯化鋅同時地供給自導入管21 10及/或導入管42,又,載體氣體係與妙晶種_同地供給自管 111。載體氣體係利用惰性氣體,且載體氣體係供給用以進 行反應至102之攪拌、氣體濃度之調整等,若載體氣體為對 還原反應及其生成物沒有影響者,則可利用任意種類之氣 體,舉例言之,載體氣體係氮或氬等惰性氣體。殘留於第2 15取出室丨〇5之未反應氣體、載體氣體等係自管31b、31a連續 地排出’ §亥排出之載體氣體在減少载體氣體之使用量的意 圖下宜自其他氣體分離載體氣體並且再循環。 [加熱溫度] 藉由加熱機構120,於反應室102之縱向形成75CTC至 20 1200°C左右之不同溫度區,又,加熱機構120可將反應室102 加熱至900°C以上至1300°C,不過,該加熱機構120之加熱 溫度只要是至少可將反應室102加熱至900°C以上至l〇50°C 者即可’藉由該等溫度區’於反應之最佳條件下將反應室 102内進行溫度控制並進行反應。 30 200902442 於第2實施形態中,將反應室1〇2縱向區分成二空間益 進行控制,且將該二空間自其上側起作成上部區l〇2a、下 部區102b之二區’各區係於以下溫度範圍進行加熱。將反 應室10 2劃分成二個空間之理由係用以使小的矽粒子長期 5滯留於主反應部分之故,用以生成矽之反應的主反應係於 上部區102a進行’於上部區1〇2&中,使數"爪至數十/zm之 大小的矽晶種粒徑成長至數100"。 故’必須使數//m至數十μ m之大小的矽晶種於上部區 102a中長期滯留’依此,必須使下部區1〇21)之表觀速度(反 10應氣體及載體氣體自下方朝上方移動之速度)高於上部區 102a之表觀速度。矽粒子之掉落會在以下時候產生,即: 於該矽粒子中,因吹自下方之表觀速度之動壓所造成之浮 力與結晶時時刻刻成長並增加質量之該矽粒子之質量間的 平衡受到破壞時。 15 原則上,在矽粒子之質量大於因動壓所造成之浮力時 會因其本身重量而掉落,故,由於因重力所造成之物體掉 落速度係與時間的平方成比例,因此,某粒徑之矽粒子因 重力而掉落時之最終速度亦可以說是大於其表觀速度的速 度,故,加快矽粒子最終掉落之下部區1〇2b之領域的氣體 20速度原則上會使上部區102&中的矽粒滯留時間增長,故, 可使矽晶種滯留於上部區l〇2a並成長。 為了在該矽晶種成長至數#之粒徑前使其滯留於 上部區102a,必須提高下部區之表觀速度,舉例言之,為 了於下部區102b維持大於200# m之矽粒子之最終掉落速度 31 200902442 的表觀速度,上部區l〇2a與下部區i〇2b係作成内徑不同之 二個空間’且相對於上部區102a之内徑2〇cm〜6〇cm,下部 £ 102b之内位係形成為5cm〜10cm。 若假设自下部區i〇2b流入上部區i〇2a之氣體為非壓縮 5性,則藉由流體力學中所說的連續方式,使上部區i〇2a之 速度低於下部區l〇2b之氣體速度。上部區i〇2a係於9〇〇。〇〜 1050°C進行加熱,下部區i〇2b則於900t〜950。(:進行加 熱,再者’取出室104係於950°C〜100(TC進行加熱,取出 室105則於950°C〜1000°C進行加熱。雖未圖示,然而,取 10出室105係於其周圍設置加熱機構,且可於前述溫度範圍進 行溫度控制。 [原料及原料之供給速度] 於第2貫施形態中’反應室102之大小係全體為縱9〇cm 〜150cm、上部區l〇2a之内徑20cm〜40cm、下部區i〇2b之 15 内徑5cm〜10cm之圓筒狀,又,於第2實施形態中,供給至 該大小之反應爐101的各材料並不限於此,然而可藉由以下 流速來供給,舉例言之,供給自管42之鋅(Zn)可藉由以下 流速來供給’鋅之吹出口之線速度係以3m/sec〜20m/sec之 流速來供給。 20 較為理想的是7m/sec〜10m/sec,具體而言,鋅蒸氣之 吹出口之線速度係鋅(Zn)自辞蒸氣供給口 1〇7供給至反應 室102之速度。供給自管21之四氯化矽(SiCl4)可藉由以下流 速來供給,四氯化矽(SiCl4)之吹出口之線速度係以3m/sec 〜20m/sec之流速來供給’又’四氯化石夕(SiCl4)之吹出口之 32 200902442 線速度係四氯化矽自管21a供給至反應室1〇2之速度。 供給至反應室102之各材料並不限於此,於本例之反應 室102中,宜藉由以下流速來供給。鋅(Zn)、四氯化矽(siCl4) 及載體氣體之反應氣體係藉由前述表觀速度為〇 〇3m/sec〜 5 〇.7m/sec之流速來供給,不過,該表觀速度係管截面之平均 流速,四氯化矽(SiCl〇之吹出口之線速度(導入管21a之吐出 口之速度)係以3m/sec〜20m/sec之流速來供給,且較為理想 的是 7m/sec 〜10m/sec ° 又,供給至反應爐101之鋅(Zn)與四氯化矽(SiCl4)原則 10上係以2 . 1之莫耳比來供給,然而,於實際之設備中,依 據實際所運轉之數據等而藉由有效之修正值來運轉。鋅(Zn) 蒸氣係混合載體氣體來供給,與該辞(Zn)蒸氣混合之載體 氣體宜相對於鋅(Zn)為0.1〜0.5 : 1之範圍。四氯化石夕(siCl4) 之蒸氣係混合載體氣體來供給,與四氯化矽(SiCl4)之蒸氣 15混合之載體氣體宜相對於四氣化矽(SiCl4)為0.1〜0.5 : 1。 又,供給至反應室102a之矽晶種係以外徑為數# m之大小者 為佳。 所供給之>5夕晶種宜為/5夕生成量之4%〜6%,具體而言, 若將平均一小時之矽生成量設為10kg,則矽晶種之供給量 20 會構成平均一小時4〇〇g〜600g。矽晶種係與載體氣體同時 地供給,且供給自導入管21a之四氣化矽與供給自底板10.6 上所設置之鋅蒸氣供給口 107之鋅雖然於反應室102内之全 空間進行反應’然而,主要是在導入管21a之上部領域進行 反應,該領域係於呈現亂流狀態之流動層進行反應,且該 33 200902442 領域之溫度係於觸代幻刚。c之範圍進行控制。 自排出e31e所排出之排氣氣體包含有反應中與石夕同 庙地生成之氯化鋅、_氣體、未反應之四氣切及未反 ’=辞蒸氣鱗氣體係於蒸氣狀態下進行分離處理,且 ^終自管仏、管祀排出。又,藉由設置於反應細與電 解程序4〇途中的閘(未圖示),自含有為未反應氣體之鋅與四 氯切、«氣料之氯_分離,關餘排氣管灿、 a兩者自氣化鋅分離,且氯化辞係運送至電解程 解槽46。 10 [取出室] 第2取出至1〇5係用以將石夕溫度降至低溫並取出者, 又,該降低至接近常溫之發係供給至搬送程序%,進入第2 取出室1G5之石夕會掉落並收納於搬送程序兄中所設置之貯 留槽等,或,石夕係儲存於第2取出室1〇5内,且將撞門1〇9打 I5開而每隔預定時間取出,或,石夕係儲存於第2取出室1〇5内, 且於構成預定量時將擋門109打開並取出。 第1取出室104之材質係藉由石英或碳化矽等陶瓷材料 所作成第1取出至4係自該内部或外部加熱並於7〇〇。匸至 1000°c進行溫度控制,又,用以將載體氣體供給至反應室 20 1〇2之導入管21、42係配置於第1取出室104。再者,於第4 圖中,管111係設置成貫通反應室1〇2壁,該管U1係配置成 用以於反應室102之上部區102a吐出石夕晶種。 不過,管111亦可配置於第1取出室104而朝延長方向延 長,且將其前端111a設置成位於反應室1〇2中,第2取出室 34 200902442 105係劃分而用以取出妙之房間,並將石夕溫度降低至大致為 常溫,第2取出室1〇5係具有搬出所生成之矽原料之機構, 又,第1取出室104與第2取出室105之底部係分別藉由擋門 108、109分隔,且掉落自反應室1〇2之矽會掉落至第丨取出 5 室104並儲存。 若該矽到達預定量或經過預定時間,則打開擋門108 並使矽掉落至第2取出室5,未反應氣體等氣體有時會進入 第2取出室5 ’該氣體係自排氣管31a、仙廢棄,然後,將 擋門109打開並使其掉落至搬送程序5〇之取出室等。若取出 10室105内之矽到達預定量或經過預定時間,則將擋門109打 開並使石夕自第2取出室5掉落至搬送程序5〇之取出室等。 [分離器] 於反應爐101上附加矽粒之分離器2〇〇,分離器2〇〇係旋 風式分離器,且分離器200係由分離室2〇1、管2〇5、管204、 15第3取出室202及管203等所構成。管205係與管31d連接,換 言之,官31d之前端為管205 ,為了引起旋流,管2〇5係配置 成朝向圓筒狀分離室201之切線方向。 管204係扮演吸出分離室201中之氣體之角色的管,自 管31 c排出之排出氣體中含有微小之石夕,分離器2〇〇係自排 20出氣體分離該石夕,業經分離之石夕係通過分離器200最下部之 管203而進入反應器1〇2。管204係排出分離室201中之氣體 的管,相較於管205,管204之前端吸引口係設置於更下側, 此係利用旋風原理而依此設置以將矽分離。 即,供給自管205前端之吐出口之氣體與微小之矽不會 35 200902442 直接被吸引至管204之吸引口,供給自管205之吐出口之氣 體係於分離室201中旋繞後被吸引至管204之吸引口。矽係 與氣體一同地於分離室201中旋轉之期間藉由離心力沿著 分離室201之内周壁呈螺旋狀移動並掉落,此時,由於矽具 5有質量’因此可藉由離心力遠離管204之中心並掉落至第3 取出室202。 又’石夕係通過管203而進入反應室1〇2,進入反應室102 内之微小矽係具有作為用以使粒狀矽成長之核心的機能, 若该石夕為還原反應中所必須之量,則可停止來自管111之矽 10晶種之供給’依此’還原反應中不會自管ill供給矽晶種, 且可將藉由分離器200所分離之矽再利用作為矽晶種。 反之’亦可將還原反應之材料、載體氣體之供給量最 佳化而僅將藉由分離器2〇〇所分離之矽利用作為矽晶種。分 離器200係於温度900。(:〜1000。(:進行加熱,如第4圖所圖 15示’分離器200之加熱機構亦可為與分離器200之加熱機構 120c及反應室1〇2之加熱機構120相同之加熱機構,不過, 如後所述,為了精密地進行以使分離器200之加熱最佳化, 第6圖所示之分離器200之加熱與反應室1〇2之加熱機構係 使用其他加熱機構120c。 2〇 此時,分離器200係藉由加熱機構120c來加熱,反應爐 101則藉由加熱機構120來加熱,不過,加熱機構120c係與 加熱機構120相同原理,依此,若分離器200藉由獨立之加 熱機構120c來加熱,則可輕易地控制分離器2〇〇内之溫度, 又,可藉由與反應室102内之溫度不同之溫度,將分離器2〇〇 36 200902442 進行溫度控制。 [反應爐等之材質] 反應室102之耐熱性高,且若非雜質摻入製品之矽中 者,則可為任意材料,於本例中係藉由石英或碳化矽等陶 5兗材料或碳所作成,同樣地,管42a、42b可藉由石英或碳 之材料來構成,底板106之管109a、109b、109c及l〇9d可藉 由石英或碳之材料來構成’又’管110a、110b可藉由石英 或碳之材料來構成,第1取出室104之材質係藉由石英或碳 化矽等陶瓷材料所作成,第2取出室105之材質係藉由石英 10 或碳化矽等陶瓷材料所作成,且分離器200係藉由石英或碳 化矽等陶瓷材料所作成。 [其他] 第6圖係圖示本發明第2實施形態之反應爐101其他變 形例之概要圖,如第6圖所示’該反應爐1〇1之反應室1〇2係 15其上部與下部皆為相同内徑且呈圓筒狀者,如第6圖所示, 第2取出室1〇5係直徑隨著越往下方而縮小之圓錐結構, 又,管31b係自第1取出室104進入第2取出室之結構。該第6 圖所示之反應爐101係由於反應室102之上限為相同内徑, 因此無法使上部與下部之氣體速度改變,然而,卻具有結 20 構簡單且氣體流速之控制較為簡單之特徵。 實施例1 以下說明藉由前述反應爐實驗時之實驗例而作為實施 例1 ’實施例1之實驗係使用第6圖所示之反應爐1〇1來進 行’該反應爐101之反應室102之内徑為3〇〇mm,且高度為 37 200902442 900mm。於業已加熱至預定溫度之反應室102内供給矽生成 用原料來進行’具體而言,於反應室102内將四氯化矽與辞 分別與載體氣體混淆而自管21、32供給,且四氣化石夕與鋅 係於反應室102内進行反應並生成矽。 5 實施例1之實驗係批式進行,即,所生成之該石夕會掉落 而堆積於第1分離室104 ’若第1分離室104之堆積矽構成一 定量’則將擋門108打開並使矽自第1分離室104掉落至第2 分離室105 ’又’若堆積於第2分離室105内之石夕構成一定 量’則將播門109打開並取出石夕。分析該取出之石夕’且於反 10應室同時地供給辞氣、四氯化矽氣體及載體氣體。 載體氣體係氬氣,在供給鋅氣與載體氣體時,流速為 3.1m/See,在供給四氣化石夕氣體與載體氣體時’流速為 3.4m/sec,又,辞與四氣化硬之原料以Znf^Sicl4:^莫耳比 為2 : 1。以下所示之表2係顯示該實施例丨之實驗條件及生 15成物之特徵,表2之第1攔表示該實驗條件之記號,表2之第 2攔表示反應室1〇2内之溫度,表2之第3欄表示反應室1〇2内 所生成之矽形狀。 表2之第4攔表示反應室102内所生成之矽大小,該大小 為球狀或粒狀矽時係表示其粒徑,該大小為細長之矽生成 20物時則表示其長度。表2之第5欄表示藉由各條件A〜C所生 成之生成物照片之圖式號碼,又’表2之條件A係反應室102 内之溫度為1000X: ’在此所述之反應室1〇2内之溫度係反應 室102中央部之管壁溫度(以下相同)。 又’所生成之矽呈針狀或珊瑚狀,且其尺寸幾乎是100 38 200902442 以上者,拍攝該條件A所生成之矽的照片為第l〇(a)圖。 表2之條件B係反應室1〇2内之溫度為1〇5〇。〇,又,所生成之 矽呈顆粒狀,且其尺寸幾乎是1〇"111〜1〇〇"〇1者,拍攝該 條件B所生成之矽的照片為第1〇(的圖。表2之條件c係反應 室102内之溫度為110(rc,又,所生成之矽係微粒子,且其 尺寸幾乎是10/Zm以下者。 拍攝該條件C所生成之矽的照片為第i〇(c)圖。 _ [表 2] 條件 反應室 之温度 生成物之 形狀 生成物之 尺寸 生成物之 照片 條件A 1000°c 針狀、珊瑚狀 100以m以上 第10(a)圖 條件B 1050°C 顆粒狀 10 〜100 /2 m 第10(b)圖 條件C 1100°c 微粒子 10/zm以下 第10(c)圖 於條件A時生成物之採集率高,條件b時生成物之採集 率中等’條件C時生成物之採集率最低,在此所謂之採集率 係藉由Si採集量/理論生成量所定義之值,若自該等結果加 以研究,則可說明如下。於條件A時生成較大之矽,且自其 形狀判斷在物理上不易連續地流動 ,因此適合於批式反應。 15 於條件B時幾乎生成顆粒狀之矽,該顆粒狀之矽會連續It is a crystal growth and crystallization to form particles, • it adheres or condenses, or the size of the particles is a diameter of several tens / / m ~ hundreds of "m". [Carrier gas] The carrier gas system is supplied from the introduction tube 21 10 and/or the introduction tube 42 simultaneously with zinc vapor and zinc chloride, and the carrier gas system is supplied from the tube 111 in the same manner. The carrier gas system utilizes an inert gas, and the carrier gas system supplies the stirring for the reaction to 102, the adjustment of the gas concentration, etc., and if the carrier gas has no influence on the reduction reaction and the product thereof, any type of gas may be used. For example, the carrier gas system is an inert gas such as nitrogen or argon. The unreacted gas, the carrier gas, and the like remaining in the second extraction chamber 5 are continuously discharged from the tubes 31b and 31a. The carrier gas discharged from the chambers is preferably separated from other gases in order to reduce the amount of carrier gas used. The carrier gas is recycled. [Heating Temperature] By the heating mechanism 120, different temperature zones of about 75 CTC to about 20 1200 ° C are formed in the longitudinal direction of the reaction chamber 102, and the heating mechanism 120 can heat the reaction chamber 102 to 900 ° C or more to 1300 ° C. However, the heating temperature of the heating mechanism 120 can be used to heat the reaction chamber 102 to at least 1000 ° C to 100 ° C. The reaction chamber can be 'reacted under the optimum conditions of the reaction by the temperature zones'. Temperature control is carried out in 102 and the reaction is carried out. 30 200902442 In the second embodiment, the reaction chamber 1〇2 is longitudinally divided into two space benefits for control, and the two spaces are formed from the upper side as the upper area l〇2a and the lower area 102b. Heating is carried out in the following temperature range. The reason for dividing the reaction chamber 10 2 into two spaces is to allow the small ruthenium particles to remain in the main reaction portion for a long period of time 5, and the main reaction for generating the ruthenium reaction is carried out in the upper region 102a for the upper region 1 In 〇2&, the particle size of the 矽 seed crystal of the number "claw to tens/zm is increased to a number of 100". Therefore, it is necessary to make the seed crystals of the number /m to tens of μm long-term retention in the upper region 102a. Accordingly, the apparent velocity of the lower region 1〇21 must be made (reverse 10 gas and carrier gas). The speed of moving upward from below is higher than the apparent speed of the upper zone 102a. The drop of the ruthenium particles occurs at the following times: in the ruthenium particles, the buoyancy caused by the dynamic pressure blown from the apparent velocity below and the mass of the ruthenium particles which grow at the moment of crystallization and increase the mass When the balance is damaged. 15 In principle, when the mass of the ruthenium particles is greater than the buoyancy caused by the dynamic pressure, it will fall due to its own weight. Therefore, since the velocity of the object falling due to gravity is proportional to the square of time, therefore, The final velocity at which the particle size of the particle is dropped by gravity can also be said to be greater than the apparent velocity. Therefore, the velocity of the gas 20 in the region of the lower region of the lower region of the crucible is eventually increased. Since the retention time of the ruthenium in the upper region 102 & is increased, the strontium seed crystals can be retained in the upper region 10a and grow. In order to retain the seed crystal in the upper region 102a before it grows to the particle size of the number #, it is necessary to increase the apparent velocity of the lower region. For example, in order to maintain the final particle of greater than 200 #m in the lower region 102b, At the apparent speed of the drop speed 31 200902442, the upper zone l〇2a and the lower zone i〇2b are formed into two spaces having different inner diameters and the inner diameter of the upper zone 102a is 2〇cm~6〇cm, the lower part is £ The position within 102b is formed to be 5 cm to 10 cm. If it is assumed that the gas flowing from the lower zone i〇2b into the upper zone i〇2a is uncompressed, the velocity of the upper zone i〇2a is lower than that of the lower zone l〇2b by the continuous mode described in the fluid mechanics. Gas speed. The upper area i〇2a is tied to 9〇〇. 〇 ~ 1050 ° C for heating, the lower area i 〇 2b is between 900t ~ 950. (: heating is performed, and the 'extraction chamber 104 is 950 ° C to 100 (the TC is heated, and the take-out chamber 105 is heated at 950 ° C to 1000 ° C. Although not shown, the 10 exit chamber 105 is taken. A heating mechanism is provided around the temperature, and temperature control can be performed in the above temperature range. [Supply speed of raw materials and raw materials] In the second embodiment, the size of the reaction chamber 102 is 9 cm to 150 cm in length. The inner diameter of the region l〇2a is 20 cm to 40 cm, and the inner diameter of the lower region i〇2b is 15 cm to 10 cm. Further, in the second embodiment, the materials supplied to the reactor 101 of the size are not However, it is limited to this, but can be supplied by the following flow rate. For example, zinc (Zn) supplied from the tube 42 can be supplied by the following flow rate. The linear velocity of the zinc outlet is 3 m/sec to 20 m/sec. The flow rate is supplied. Preferably, it is 7 m/sec to 10 m/sec. Specifically, the linear velocity of the zinc vapor outlet is the rate at which zinc (Zn) is supplied to the reaction chamber 102 from the vapor supply port 1〇7. The ruthenium tetrachloride (SiCl4) supplied from the tube 21 can be supplied by the following flow rate, and the ruthenium tetrachloride (SiCl4) is blown out. The linear velocity is supplied to the outlet port of 'an' tetrachloride (SiCl4) at a flow rate of 3 m/sec to 20 m/sec. 200902442 Linear velocity barium tetrachloride is supplied from the tube 21a to the reaction chamber 1〇2 The materials supplied to the reaction chamber 102 are not limited thereto, and are preferably supplied in the reaction chamber 102 of the present example by the following flow rates: reaction gases of zinc (Zn), cerium tetrachloride (siCl4), and carrier gas. The above-mentioned apparent velocity is supplied at a flow rate of 〇〇3 m/sec to 5 〇.7 m/sec. However, the apparent velocity is the average flow velocity of the cross section of the tube, and the ruthenium tetrachloride (the line of the outlet of SiCl) The speed (the speed of the discharge port of the introduction pipe 21a) is supplied at a flow rate of 3 m/sec to 20 m/sec, and preferably 7 m/sec to 10 m/sec., and zinc (Zn) supplied to the reaction furnace 101. It is supplied with a molar ratio of 2.1 to ruthenium tetrachloride (SiCl4). However, in actual equipment, it is operated by an effective correction value based on actual operating data and the like. Zn) is a vapor-based mixed carrier gas, and the carrier gas mixed with the Zn vapor is preferably 0.1 to 0 with respect to zinc (Zn). The range of .5 : 1. The vapor of the tetrachloride (siCl4) is supplied by a mixed carrier gas, and the carrier gas mixed with the vapor 15 of the ruthenium tetrachloride (SiCl4) is preferably 0.1 with respect to the gasified ruthenium (SiCl4). Further, the number of the twin crystals supplied to the reaction chamber 102a is preferably the number of the outer diameter of the number #m. The supplied crystal seed crystals are preferably 4% to 6% of the amount of the eve of the eve. Specifically, if the average amount of enthalpy generated in one hour is 10 kg, the supply amount 20 of the eutectic seed crystals will constitute an average of 4 〇〇g to 600 g per hour. The twin seed system is supplied simultaneously with the carrier gas, and the zinc gas supplied from the introduction tube 21a and the zinc supplied from the zinc vapor supply port 107 provided on the bottom plate 10.6 react in the entire space in the reaction chamber 102. However, the reaction is mainly carried out in the upper region of the introduction pipe 21a, which is reacted in a flowing layer in a turbulent state, and the temperature in the field of the 2009 200902442 is in the dynasty. The range of c is controlled. The exhaust gas discharged from the e31e discharge contains zinc chloride, _gas, unreacted four gas cuts and non-reverse flames generated in the reaction. Treatment, and ^ end from the tube, tube discharge. Further, by means of a gate (not shown) provided on the middle of the reaction fineness and the electrolysis process 4, the zinc containing the unreacted gas is separated from the tetrachloro-cut, the chlorine of the gas material, and the exhaust pipe is closed. Both are separated from the vaporized zinc and the chlorination is transported to the electrolysis process tank 46. 10 [Extraction chamber] The second extraction to the 1〇5 system is used to reduce the temperature of the Shixia to a low temperature and is taken out. The hair system that has been lowered to near normal temperature is supplied to the transport program %, and enters the stone of the second extraction chamber 1G5. The eve will be dropped and stored in the storage tank provided in the transfer program brother, or the Shi Xi system will be stored in the second take-out chamber 1〇5, and the collision door 1〇9 will be opened I5 and taken out every predetermined time. Or, the Shi Xi system is stored in the second take-out chamber 1〇5, and when the predetermined amount is formed, the shutter 109 is opened and taken out. The material of the first take-out chamber 104 is made of a ceramic material such as quartz or tantalum carbide, and is first taken out to the fourth system and heated from the inside or the outside at 7 inches. The temperature is controlled to 1000 ° C, and the introduction tubes 21 and 42 for supplying the carrier gas to the reaction chamber 20 1〇 are disposed in the first extraction chamber 104. Further, in Fig. 4, the tube 111 is disposed to penetrate the wall of the reaction chamber 1〇2, and the tube U1 is disposed to discharge the seed crystal in the upper portion 102a of the reaction chamber 102. However, the tube 111 may be disposed in the first take-out chamber 104 and extended in the extension direction, and the front end 111a may be disposed in the reaction chamber 1〇2, and the second take-out chamber 34 200902442 105 may be divided to extract the wonderful room. And lowering the temperature of the Shixia to substantially normal temperature, and the second take-out chamber 1〇5 has a mechanism for carrying out the raw material generated by the raw material, and the bottom portions of the first take-out chamber 104 and the second take-out chamber 105 are respectively blocked by the block. The doors 108, 109 are separated, and after falling from the reaction chamber 1〇2, they are dropped to the third chamber 5 and stored. If the crucible reaches a predetermined amount or a predetermined time elapses, the shutter 108 is opened and the crucible is dropped to the second take-out chamber 5, and gas such as unreacted gas may enter the second take-out chamber 5'. 31a, the fairy is discarded, and then the shutter 109 is opened and dropped to the take-out room of the transport program 5, and the like. When the 内 in the ten-chamber 105 is taken out by a predetermined amount or a predetermined time elapses, the shutter 109 is opened and the shovel is dropped from the second take-out chamber 5 to the take-out chamber of the transport program 5, and the like. [Separator] A separator 2 is added to the reactor 101, and the separator 2 is a cyclone separator, and the separator 200 is composed of a separation chamber 2〇1, a tube 2〇5, a tube 204, 15 is formed by the third extraction chamber 202, the tube 203, and the like. The tube 205 is connected to the tube 31d, in other words, the front end of the official 31d is the tube 205, and the tube 2〇5 is disposed in a tangential direction toward the cylindrical separation chamber 201 in order to cause swirling. The tube 204 serves as a tube for sucking out the gas in the separation chamber 201, and the exhaust gas discharged from the tube 31c contains minute stones, and the separator 2 is separated from the gas by the exhaust gas 20, and is separated. The stone system enters the reactor 1〇2 through the lowermost tube 203 of the separator 200. The tube 204 is a tube for discharging the gas in the separation chamber 201, and the suction port of the front end of the tube 204 is disposed on the lower side than the tube 205, and this is set by the cyclone principle to separate the crucible. That is, the gas supplied from the discharge port at the tip end of the tube 205 and the minute sputum are not directly sucked into the suction port of the tube 204, and the gas system supplied from the discharge port of the tube 205 is circulated in the separation chamber 201 and then sucked to The suction port of the tube 204. The lanthanum is spirally moved and dropped along the inner peripheral wall of the separation chamber 201 by centrifugal force during the rotation in the separation chamber 201. At this time, since the cooker 5 has a mass, it can be separated from the tube by centrifugal force. The center of 204 is dropped to the third take-out chamber 202. Further, the stone system enters the reaction chamber 1〇2 through the tube 203, and the minute lanthanum entering the reaction chamber 102 has a function as a core for growing the granular ruthenium, which is necessary for the reduction reaction. The amount of the 矽10 seed crystal from the tube 111 can be stopped. In this case, the ruthenium seed is not supplied from the tube ill in the reduction reaction, and the ruthenium separated by the separator 200 can be reused as the eutectic seed crystal. . On the other hand, it is also possible to optimize the supply amount of the material for the reduction reaction and the carrier gas, and to use only the ruthenium separated by the separator 2 as a seed crystal. The separator 200 is attached to a temperature of 900. (:~1000. (: heating, as shown in Fig. 15 of Fig. 4) The heating mechanism of the separator 200 may be the same heating mechanism as the heating mechanism 120c of the separator 200 and the heating mechanism 120 of the reaction chamber 1〇2. However, as will be described later, in order to precisely perform the heating of the separator 200, the heating mechanism of the separator 200 shown in Fig. 6 and the heating mechanism of the reaction chamber 1〇2 use other heating means 120c. 2 At this time, the separator 200 is heated by the heating mechanism 120c, and the reaction furnace 101 is heated by the heating mechanism 120. However, the heating mechanism 120c is the same principle as the heating mechanism 120, and accordingly, if the separator 200 borrows By heating by the independent heating mechanism 120c, the temperature in the separator 2 can be easily controlled, and the temperature of the separator 2〇〇36 200902442 can be controlled by the temperature different from the temperature in the reaction chamber 102. [Material of Reactor, etc.] The reaction chamber 102 has high heat resistance, and may be any material if it is not incorporated into the crucible of the product. In this example, it is made of quartz or tantalum or the like. Made of carbon, similarly, tube 4 2a, 42b may be composed of quartz or carbon material, and the tubes 109a, 109b, 109c and 10' of the bottom plate 106 may be formed of quartz or carbon material. 'The' tubes 110a, 110b may be made of quartz or carbon. The material of the first extraction chamber 104 is made of a ceramic material such as quartz or tantalum carbide, and the material of the second extraction chamber 105 is made of a ceramic material such as quartz 10 or tantalum carbide, and the separator 200 It is made of a ceramic material such as quartz or tantalum carbide. [Others] Fig. 6 is a schematic view showing another modification of the reactor 101 according to the second embodiment of the present invention, as shown in Fig. 6 In the reaction chamber 1〇2 of the 〇1, the upper and lower portions are all of the same inner diameter and have a cylindrical shape. As shown in Fig. 6, the diameter of the second extraction chamber 1〇5 is reduced as it goes downward. In the conical structure, the tube 31b is configured to enter the second take-out chamber from the first take-out chamber 104. The reaction furnace 101 shown in Fig. 6 has the same inner diameter because of the upper limit of the reaction chamber 102, so that the upper and lower portions cannot be made. The gas velocity changes, however, it has a simple structure and a control of the gas flow rate. Brief Description of the Invention Example 1 The following is a description of the experimental example in the above reactor experiment. The experiment of Example 1 was carried out using the reactor 1〇1 shown in Fig. 6 to perform the reaction furnace 101. The reaction chamber 102 has an inner diameter of 3 mm and a height of 37 200902442 900 mm. The raw material for the production of ruthenium is supplied to the reaction chamber 102 which has been heated to a predetermined temperature to carry out 'specifically, four in the reaction chamber 102. The ruthenium chloride is supplied from the tubes 21 and 32 in confusion with the carrier gas, and the four gasifications are reacted with the zinc in the reaction chamber 102 to form ruthenium. 5 The experiment of the first embodiment is carried out in batch mode, that is, the generated stone will fall and accumulate in the first separation chamber 104'. If the stack of the first separation chamber 104 constitutes a certain amount, the shutter 108 is opened. The sputum 109 is dropped from the first separation chamber 104 to the second separation chamber 105', and if the stone slab accumulated in the second separation chamber 105 constitutes a certain amount, the sputum 109 is opened and taken out. The extracted stone was analyzed and the gas, the helium tetrachloride gas, and the carrier gas were simultaneously supplied to the chamber. The carrier gas system argon gas has a flow rate of 3.1 m/see when supplying zinc gas and carrier gas, and a flow rate of 3.4 m/sec when supplying four gasification gas and carrier gas, and again, reciprocating with four gasification hard The raw material has a Znf^Sicl4:^ molar ratio of 2:1. Table 2 shown below shows the experimental conditions of the examples and the characteristics of the raw materials. The first block of Table 2 indicates the sign of the experimental conditions, and the second block of Table 2 indicates the inside of the reaction chamber 1〇2. The temperature, column 3 of Table 2 shows the shape of the crucible formed in the reaction chamber 1〇2. The fourth block of Table 2 indicates the size of the crucible generated in the reaction chamber 102. When the size is spherical or granular, the particle size indicates the particle size. When the size is 20, the length is expressed by the slenderness. Column 5 of Table 2 shows the drawing number of the product photograph generated by each of the conditions A to C, and the condition A of the table A is the temperature in the reaction chamber 102: 1000X: 'The reaction chamber described here The temperature in 1〇2 is the wall temperature of the central portion of the reaction chamber 102 (the same applies hereinafter). Further, the generated enamel is needle-like or coral-like, and its size is almost 100 38 200902442 or more. The photograph of the cockroach generated by shooting the condition A is the first 〇 (a). The condition B in Table 2 is that the temperature in the reaction chamber 1〇2 is 1〇5〇. 〇 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 又 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 111 The condition c in Table 2 is that the temperature in the reaction chamber 102 is 110 (rc, and the generated fluorene-based fine particles are almost 10/Zm or less. The photograph of the enthalpy generated by shooting the condition C is the i-th. 〇 (c) Fig. _ [Table 2] Photograph of the size product of the temperature product of the conditional reaction chamber. Photograph A 1000°c Needle shape, coral shape 100 or more, 10th (a) condition B 1050°C granule 10~100 /2 m 10th (b) condition C 1100°c microparticle 10/zm or less 10(c) is high in the collection rate of the product under the condition A, and the product is produced under the condition b The acquisition rate is medium. The acquisition rate of the product is the lowest when the condition C is used. The so-called acquisition rate is defined by the amount of Si acquisition/theoretical amount. If these results are studied, the following conditions can be explained. A generates a large enthalpy, and it is physically difficult to continuously flow from its shape, so it is suitable for batch reaction. In the case of condition B, almost granules are formed, and the granules are continuous.

地流動’於條件3時,在藉由連續運轉連續地生成矽時為最 佳條件。於條件c時,由於採集率低,因此,相較於其他二 個條件A、B,在大量生產時較不適合。藉由X射線解析採 樣自條件B之矽的試樣,X射線解析係藉由思百吉 20 (SPECTRIS)股份有限公司(日本東京都港區)製造之χ射線 解析裝置(X’ pertMPD)來進行,X射線源係波長為1.5418A 39 200902442 之銅(Cu)之Κα線,第11圖係顯示該X射線解析之結果,第 11圖圖表之縱軸表示利用該X射線源之繞射反射強度,該圖 表之橫軸則表示繞射角度20,該解析係顯示試樣為純矽。 又,分析該試樣之雜質量,第12圖係顯示該分析結果, 5該雜質量係藉由橫河分析系統股份有限公司製造(日本東 京都八王子市)之ICP - MAS裝置(安捷倫(Agilent)7500s)來 測定’由第11及12圖之圖表可知,條件B之試樣為石夕純度 99.99992%與99.999967%,此係表示可生成最低6N之石夕。 由該實驗結果可知,依據反應室102内之溫度,可生成 10 不同形狀之矽’又,依據供給至反應室102之原料之流速' 莫耳比,決定反應室102内之原料滯留時間,再者,滯留於 反應室102内之原料滯留時間當然會影響矽之形狀及大小。 產業之可利用性 本發明之反應爐可運用在太陽電池單元用矽素材之生 15產’藉由本發明之反應爐所生產之高純度矽可使用在太陽 電池單元用之素材且不成問題。 【圖式簡單說明】 第1圖係圖示本發明第1實施形態之反應爐1之概要圖。 第2圖係圖示利用流動層式鋅還原法之矽連續製造(矽 2〇製造設備)之流程概要圖。 第3圖係圖示電解程序40之概要圖。 第4圖係圖示本發明第2實施形態之反應爐101之概要 圖。 第5圖係例示本發明第2實施形態之反應爐101之底板 200902442 106之示意圖。 第6圖係圖示本發明第2實施形態之反應爐1〇1其他變 形例之概要圖。 第7圖係顯示於反應室内矽晶種進行磊晶成長之狀態 5 示意圖。 第8圖係顯示石夕之蟲晶成長模式之圖表。 第9圖係顯示依據式1之數值模擬結果之圖表。 第1 〇圖係藉由實施例1之表2各條件A〜c所生成之生 成物照片’第10⑻圖係條件A時,第1〇⑼圖係條件叫,第 10 10(c)圖係條件C時。 第11圖係顯示在藉由x射線解析採樣自第10圖條件B 之矽的試樣時之結果圖表。 第12圖係顯不分析採樣自第職條件B之石夕的試樣雜 質量之結果圖表。 J 10…材料供給程序 15...氯化程序 20".蒸鶴精製程序 15【主要元件符號說明 1,101...反應爐The ground flow 'at condition 3 is the optimum condition for continuously generating enthalpy by continuous operation. In the case of condition c, since the collection rate is low, it is less suitable in mass production than the other two conditions A and B. X-ray analysis is performed by X-ray analysis of samples from condition B. The X-ray analysis system is based on X-ray per unit (X' pertMPD) manufactured by SPECTRIS 20 (Tokyo, Minato-ku, Japan). The X-ray source is a copper (Cu) Κα line with a wavelength of 1.5418A 39 200902442, the 11th image shows the result of the X-ray analysis, and the vertical axis of the 11th chart shows the diffraction reflection using the X-ray source. Intensity, the horizontal axis of the graph represents the diffraction angle 20, and the analytical system shows that the sample is pure ruthenium. Further, the impurity amount of the sample was analyzed, and Fig. 12 shows the result of the analysis. 5 The impurity mass was manufactured by Yokogawa Analytical Systems Co., Ltd. (Hachioji City, Tokyo, Japan) ICP-MAS device (Agilent (Agilent) 7500s) to determine 'from the chart of Figures 11 and 12, the sample of condition B is 99.99992% and 99.999967%, which means that the lowest 6N can be generated. From the experimental results, it can be seen that depending on the temperature in the reaction chamber 102, 10 different shapes can be generated, and the residence time of the raw materials in the reaction chamber 102 is determined according to the flow rate of the raw material supplied to the reaction chamber 102, and then The residence time of the raw materials retained in the reaction chamber 102 of course affects the shape and size of the crucible. INDUSTRIAL APPLICABILITY The reactor of the present invention can be used in the production of solar cells for the production of high-purity germanium produced by the reactor of the present invention, and can be used for materials for solar cells without problems. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a reaction furnace 1 according to a first embodiment of the present invention. Fig. 2 is a schematic flow chart showing the continuous manufacturing (矽 2〇 manufacturing equipment) by the fluidized layer zinc reduction method. Figure 3 is a schematic diagram showing the electrolysis program 40. Fig. 4 is a schematic view showing a reaction furnace 101 according to a second embodiment of the present invention. Fig. 5 is a schematic view showing a bottom plate 200902442 106 of a reactor 101 according to a second embodiment of the present invention. Fig. 6 is a schematic view showing another modification of the reactor 1〇1 according to the second embodiment of the present invention. Fig. 7 is a schematic view showing the state in which the seed crystal is epitaxially grown in the reaction chamber. Figure 8 is a graph showing the growth pattern of Shi Xizhi's insect crystal. Figure 9 is a graph showing numerical simulation results according to Equation 1. In the first diagram, when the product photograph '10th (8) diagram condition A generated by each of the conditions A to c of Table 2 of the first embodiment is used, the first 〇(9) diagram condition is called, and the 10th 10th (c) diagram is Condition C. Fig. 11 is a graph showing the results of a sample sampled from condition B of Fig. 10 by x-ray analysis. Figure 12 shows a graph showing the results of sample masses sampled from the first condition B. J 10...Material supply program 15...chlorination procedure 20". Steamer refining procedure 15 [Main component symbol description 1,101...reactor

2,102...反應室 3,103...取出室 4,104…第1取出室 5,105…第2取出室 6,106."底板 7...容器 8,9,108 ’ 109·..擋門 21,31,31b,31d,31e,31f, 32,33,41,42,42a,42b,109a, 109b,109c,109d,110a,110b, 203 > 204 > 205...f 21a,34,35, 111.··導入管 41 200902442 30…還原程序 107…鋅蒸氣供給孔 31a,31c...排氣管 110".阻礙板 40…電解程序 111a."前端 43,44...電極 120,120c...加熱機構 46...電解槽 HOa...第1加熱機構 50…搬送程序 120b…第2加熱機構 60...矽塊製造程序 200…分離器 102a...上部區 201…分離室 102b...下部區 202...第3取出室 422,102...reaction chambers 3,103...take out chambers 4,104...first take-out chambers 5,105...second take-out chambers 6,106."bottom plate 7...containers 8,9,108 ' 109·.. blocking doors 21, 31, 31b, 31d, 31e, 31f, 32, 33, 41, 42, 42a, 42b, 109a, 109b, 109c, 109d, 110a, 110b, 203 > 204 > ..f 21a,34,35, 111.·Introduction tube 41 200902442 30...Reduction procedure 107...zinc vapor supply holes 31a, 31c...exhaust pipe 110".obstruction plate 40...electrolysis program 111a." front end 43,44...electrodes 120,120c...heating mechanism 46...electrolytic cell HOa...first heating mechanism 50...transportation program 120b...second heating mechanism 60...block manufacturing program 200...separation The upper portion 201...the separation chamber 102b...the lower portion 202...the third extraction chamber 42

Claims (1)

200902442 十、申請專利範圍: 1·—種用以製造太陽電池用矽原料之反應裝置,係用以藉 由四氯化矽之辞還原法製造矽之反應裝置,且前述四氣 化石夕之辞還原法係使用業已氣化之四氯化矽及業已氣 5 化之鋅,又,前述反應裝置之反應爐係於業已於前述反 應爐内氣化之前述四氯化矽中,使業已氣化之前述鋅及 載體氣體自前述反應爐之底部喷出並形成流動層,且使 前述鋅與前述四氯化矽於前述流動層中進行還原反 應’並連續地生成直徑數"xn〜數mm之粒狀石夕。 10 2.如申請專利範圍第1項之用以製造太陽電池用矽原料之 反應農置,其中前述反應爐包含有: 反應室,係用以使前述鋅與前述四氯化石夕於前述流 動層中反應者;及 取出室,係配置於該反應室之下部,並用以取出於 15 前述還原反應中所生成且因重力而掉落之前述矽者, 又,於前述反應至之底板上設置有多數用以供給前 述鋅之鋅蒸氣供給口,且前述反應室具有用以供給前述 四氯化矽並自前述底板立起之四氯化矽用導入管,又, 前述取出室係設置於前述反應爐之底部並與前述反應 室連結,且前述取出室包含有: 第1取出室’係放入自前述反應室掉落之前述矽 者;及 第2取出室’係用以將因重力而自前述第1室掉落之 財述矽之溫度降至低溫並取出者。 43 200902442 3. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中前述取出室設置有: 前述載體氣體之載體氣體用導入管;及 排氣管,係用以排出前述還原反應中與前述矽同時 5 地生成之氣化辞、未反應之前述鋅、未反應之前述四氯 化矽及前述載體氣體者。 4. 如申請專利範圍第3項之用以製造太陽電池用矽原料之 反應裝置,其中前述載體氣體係惰性氣體。 5. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 10 反應裝置,其中前述鋅係供給自設置於前述底板全體之 前述多數貫通孔及/或狹縫,並供給、充滿於前述反應 室。 6. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中前述底板係具有多數第2貫通孔或間 15 隙,且所生成之前述矽係自設置於前述底板上之前述第 2貫通孔及/或前述間隙掉落至前述取出室。 7. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中前述反應爐係藉由石英或碳化矽等陶瓷 材料所作成。 20 8.如申請專利範圍第2或7項之用以製造太陽電池用矽原 料之反應裝置,其中於前述反應室之側壁設置有複數加 熱器,以於前述還原反應之最佳條件下將前述反應室内 進行溫度控制,並於前述反應室之縱向形成複數溫度之 複數溫度區。 44 200902442 9. 如申請專利範圍第8項之用以製造太陽電池用矽原料之 反應裝置,其中前述複數溫度區係850°C至1200°C之溫 度區。 10. 如申請專利範圍第8項之用以製造太陽電池用矽原料之 5 反應裝置,其中前述反應室之前述流動層溫度係於約 900°C至ll〇〇°C之範圍進行溫度控制。 11. 如申請專利範圍第2或3項之用以製造太陽電池用矽原 料之反應裝置,其中前述第1取出室之材質係石英或碳 化矽等陶瓷材料。 10 12.如申請專利範圍第2或3項之用以製造太陽電池用矽原 料之反應裝置,其中前述第1取出室係於700°C至1000°C 進行溫度控制。 13.如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中前述低溫之溫度係常溫。 15 14.如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中前述第2取出室係具有用以連續地搬出 所生成之前述矽之搬出機構。 15. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中於前述反應室之内部設置有可通電之金 20 屬芯,且藉由將溫度控制成高於前述反應室壁並促進於 前述金屬芯上之矽析出,提高前述反應爐内之空間占積 率並改善前述還原反應之反應率。 16. 如申請專利範圍第2項之用以製造太陽電池用矽原料之 反應裝置,其中於前述反應室之内部具有導入管,且該 45 200902442 導入管係用以供給載體氣體與直徑數//m之大小之矽晶 種,又,藉由將前述載體氣體與前述矽晶種自前述導入 管供給至前述還原反應之前述流動層,使前述矽晶種為 核心並成長且促進前述矽之生成。 5 17.如申請專利範圍第1或2項之用以製造太陽電池用矽原 料之反應裝置,更包含有分離器,且該分離器係用以從 排出自前述反應爐之氣體分離前述矽者,並為藉由離心 力分離前述矽之旋風式分離器。 18. 如申請專利範圍第17項之用以製造太陽電池用矽原料 10 之反應裝置,其中自前述分離器分離之矽係供給至前述 反應爐。 19. 如申請專利範圍第17項之用以製造太陽電池用矽原料 之反應裝置,其中於前述分離器之側壁設置有加熱機 構,以將前述分離器内進行温度控制。 15 20.如申請專利範圍第17項之用以製造太陽電池用矽原料 之反應裝置,其係設置有用以加熱前述分離器與前述反 應室兩者之加熱機構,以將前述分離器及前述反應室内 進行溫度控制,又,前述加熱機構係於前述反應室之縱 向形成複數溫度之複數溫度區。 46200902442 X. Patent application scope: 1. A reaction device for manufacturing raw materials for solar cells, which is used to manufacture a reaction device for ruthenium by the method of ruthenium tetrachloride, and the above four gasification words The reduction method uses the vaporized ruthenium tetrachloride and the zinc which has been gasified, and the reaction furnace of the above reaction apparatus is vaporized in the foregoing ruthenium tetrachloride which has been gasified in the aforementioned reactor, and has been vaporized. The zinc and the carrier gas are ejected from the bottom of the reaction furnace to form a fluidized layer, and the zinc and the foregoing antimony tetrachloride are subjected to a reduction reaction in the fluidized layer' and continuously generate a diameter number "xn~mm The grainy stone eve. 10 2. The reaction apparatus for manufacturing a raw material for a solar cell according to the first aspect of the patent application, wherein the reaction furnace comprises: a reaction chamber for causing the zinc and the foregoing tetrachloride to be in the fluid layer a middle reactor; and a take-out chamber disposed at a lower portion of the reaction chamber, and for taking out the above-mentioned flaws generated in the above-mentioned reduction reaction and falling by gravity, and further provided on the bottom plate of the reaction a plurality of zinc vapor supply ports for supplying the zinc, and the reaction chamber has an introduction tube for ruthenium tetrachloride for supplying the ruthenium tetrachloride and rising from the bottom plate, and the extraction chamber is provided in the reaction. The bottom of the furnace is connected to the reaction chamber, and the take-out chamber includes: the first take-out chamber is placed in the front of the reaction chamber; and the second take-out chamber is used to The temperature of the above-mentioned first room drop is lowered to a low temperature and taken out. 43 200902442 3. The reaction apparatus for manufacturing a raw material for a solar cell according to the second aspect of the patent application, wherein the take-out chamber is provided with: a carrier gas introduction tube for the carrier gas; and an exhaust pipe for discharging In the reduction reaction, the vaporization generated at the same time as the above-mentioned ruthenium, the unreacted zinc, the unreacted ruthenium tetrachloride, and the carrier gas. 4. The reaction apparatus for producing a raw material for a solar cell according to the third aspect of the patent application, wherein the carrier gas system is an inert gas. 5. The 10th reaction apparatus for producing a raw material for a solar cell according to the second aspect of the patent application, wherein the zinc is supplied from a plurality of through holes and/or slits provided in the entire bottom plate, and is supplied and filled. The aforementioned reaction chamber. 6. The reaction apparatus for manufacturing a raw material for a solar cell according to the second aspect of the patent application, wherein the bottom plate has a plurality of second through holes or between 15 gaps, and the generated lanthanum is disposed on the bottom plate. The second through hole and/or the gap are dropped into the take-out chamber. 7. The reaction apparatus for producing a raw material for a solar cell according to the second aspect of the patent application, wherein the reactor is made of a ceramic material such as quartz or tantalum carbide. 20. The reaction apparatus for manufacturing a raw material for a solar cell according to claim 2 or 7, wherein a plurality of heaters are disposed on a side wall of the reaction chamber to provide the foregoing under the optimum conditions of the reduction reaction. Temperature control is performed in the reaction chamber, and a plurality of temperature zones of a plurality of temperatures are formed in the longitudinal direction of the reaction chamber. 44 200902442 9. The reaction apparatus for manufacturing a raw material for solar cells according to item 8 of the patent application, wherein the plurality of temperature zones are temperature zones of 850 ° C to 1200 ° C. 10. The reaction apparatus for manufacturing a raw material for a solar cell according to the eighth aspect of the patent application, wherein the fluidized bed temperature of the reaction chamber is temperature controlled in a range of about 900 ° C to 11 ° C. 11. The reaction apparatus for producing a raw material for a solar cell according to the second or third aspect of the patent application, wherein the material of the first extraction chamber is a ceramic material such as quartz or tantalum carbide. 10. The reaction apparatus for producing a raw material for a solar cell according to the second or third aspect of the patent application, wherein the first extraction chamber is temperature-controlled at 700 ° C to 1000 ° C. 13. The reaction apparatus for producing a raw material for a solar cell according to the second aspect of the patent application, wherein the temperature of the low temperature is normal temperature. A reaction apparatus for producing a raw material for a solar cell according to the second aspect of the invention, wherein the second take-out chamber has a carry-out mechanism for continuously carrying out the generated crucible. 15. The reaction apparatus for manufacturing a raw material for a solar cell according to the second aspect of the patent application, wherein an energizable gold 20 core is disposed inside the reaction chamber, and the temperature is controlled to be higher than the foregoing reaction. The chamber wall promotes the precipitation of the ruthenium on the metal core, increases the space occupation ratio in the reactor, and improves the reaction rate of the reduction reaction. 16. The reaction apparatus for manufacturing a raw material for a solar cell according to the second aspect of the patent application, wherein the inside of the reaction chamber has an introduction tube, and the 45 200902442 introduction tube is used for supplying a carrier gas and a diameter number // The seed crystal of the size m of m is supplied to the fluidized layer of the reduction reaction from the introduction tube by the carrier gas and the seed crystal, and the seed crystal is grown as a core and promotes the formation of the foregoing . 5 17. The reaction device for manufacturing a raw material for solar cells according to claim 1 or 2, further comprising a separator for separating the aforementioned gas from the gas discharged from the reaction furnace And is a cyclone separator that separates the aforementioned crucible by centrifugal force. 18. The reaction apparatus for producing a raw material 10 for a solar cell according to claim 17, wherein the lanthanum separated from the separator is supplied to the reaction furnace. 19. The reaction apparatus for producing a raw material for a solar cell according to claim 17, wherein a heating mechanism is disposed on a side wall of the separator to perform temperature control in the separator. 15 20. The reaction apparatus for manufacturing a raw material for a solar cell according to claim 17, which is provided with a heating mechanism for heating both the separator and the reaction chamber to separate the separator and the foregoing reaction The temperature control is performed indoors, and the heating mechanism is formed in a plurality of temperature zones in which the plurality of temperatures are formed in the longitudinal direction of the reaction chamber. 46
TW97122477A 2007-06-15 2008-06-16 Reactor for producing silicon material for solar cell TW200902442A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007158363 2007-06-15

Publications (1)

Publication Number Publication Date
TW200902442A true TW200902442A (en) 2009-01-16

Family

ID=40129781

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97122477A TW200902442A (en) 2007-06-15 2008-06-16 Reactor for producing silicon material for solar cell

Country Status (3)

Country Link
JP (1) JPWO2008153181A1 (en)
TW (1) TW200902442A (en)
WO (1) WO2008153181A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI483768B (en) * 2011-10-12 2015-05-11 C S Lab In Technology Ltd Exhaust treatment device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5275213B2 (en) * 2009-12-25 2013-08-28 コスモ石油株式会社 Separation and recovery apparatus and separation and recovery method
WO2011089790A1 (en) * 2010-01-22 2011-07-28 コスモ石油株式会社 Polycrystalline silicon manufacturing method
JP5383604B2 (en) * 2010-07-22 2014-01-08 コスモ石油株式会社 Reactor for the production of polycrystalline silicon
KR101329033B1 (en) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 Fluidized Bed Reactor
CN102259862B (en) * 2011-06-24 2012-12-19 天津大学 Novel polysilicon reduction furnace with 42 rods and connection mode
DE102013208071A1 (en) * 2013-05-02 2014-11-06 Wacker Chemie Ag Fluidized bed reactor and process for producing granular polysilicon
JP2015040150A (en) * 2013-08-22 2015-03-02 Jnc株式会社 Method for producing almost spherical silicon powder, and almost spherical silicon powder

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3012862A (en) * 1960-08-16 1961-12-12 Du Pont Silicon production
JPS54134024A (en) * 1978-04-11 1979-10-18 Jiei Shii Shiyuumachiyaa Co Production of high purity silicon
JP2003342016A (en) * 2002-05-24 2003-12-03 Takayuki Shimamune Method for manufacturing polycrystalline silicon
JP4200703B2 (en) * 2002-06-19 2008-12-24 豊 蒲池 Silicon manufacturing apparatus and method
JP2004035382A (en) * 2002-06-28 2004-02-05 Takayuki Shimamune Method of manufacturing polycrystalline silicon
JP5087195B2 (en) * 2002-12-19 2012-11-28 コスモ石油株式会社 Method for producing silicon
WO2007021035A1 (en) * 2005-08-19 2007-02-22 Sumitomo Chemical Company, Limited Process for production of silicon
JP2007112691A (en) * 2005-10-21 2007-05-10 Yutaka Kamaike Apparatus and method for producing silicon

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI483768B (en) * 2011-10-12 2015-05-11 C S Lab In Technology Ltd Exhaust treatment device

Also Published As

Publication number Publication date
WO2008153181A1 (en) 2008-12-18
JPWO2008153181A1 (en) 2010-08-26

Similar Documents

Publication Publication Date Title
TW200902442A (en) Reactor for producing silicon material for solar cell
JP5719282B2 (en) Method for producing polycrystalline silicon
JP2002068753A (en) Quartz fusing crucible
CN104203819B (en) Polycrystalline silicon rod
TWI466825B (en) Process and apparatuses for preparing ultrapure silicon
TW200838799A (en) Apparatus and method for manufacturing high purity polycrystalline silicon
WO2004035472A1 (en) Process for producing high-purity silicon and apparatus
CN108330543A (en) A kind of N-type SnSe monocrystalline and preparation method thereof
JP5335075B2 (en) Method for producing polycrystalline silicon
KR101328521B1 (en) Method and apparatus for producing solid product
JP4392675B1 (en) High purity silicon production equipment
He et al. Growth of PbI2 single crystal by the top seed vertical zone melting method
TW200927649A (en) Silicon manufacturing apparatus and related method
TW200848367A (en) A method and a reactor for production of high-purity silicon
JP4392670B2 (en) Manufacturing method of high purity silicon
KR20140082638A (en) Cartridge reactor for production of materials via the chemical vapor deposition process
JP4817307B2 (en) Granular semiconductor manufacturing method and manufacturing apparatus
KR101525859B1 (en) Apparatus for manufacturing fine powder of high purity silicon
JP6870085B2 (en) Manufacturing method of polycrystalline silicon
JP5335074B2 (en) Method for producing polycrystalline silicon and reactor for producing polycrystalline silicon
TWI482736B (en) Manufacture of high purity silicon micropowder
JP5088966B2 (en) Method for producing polycrystalline silicon and reactor for producing polycrystalline silicon
JP2009234831A (en) Silicon production apparatus
TWI471267B (en) Manufacture of high purity silicon fine particles
CN118186566A (en) Large-size perovskite single crystal material with all-inorganic ABX structure and preparation method thereof