200848828 九、發明說明 【發明所屬之技術領域】 本發明有關一被組構成固持光學元件之固持設備。 【先前技術】 一被組構成固持光學元件之固持設備係用於各設備中 ，諸如半導體曝光設備。 該半導體曝光設備係一用於藉由將光罩之圖案轉印在 矽晶圓上而形成電路之設備。爲了形成一高度整合之電路 ，其係需要改善被轉印於該矽晶圓上之多數圖案的覆疊準 確性。 爲了改善該覆疊準確性，其係需要減少對齊誤差、放 大誤差、及影像扭曲。該對齊誤差能藉由調整該光罩及該 晶圓之相對位置而減少。該放大誤差能藉由在該光學軸方 向中運動一部份光學元件而減少，該部份光學元件構成投 射光學系統的一部份。 當該光學元件係在該光學軸方向中運動時，具有異於 該光學軸之方向的誤差分量、特別是平行之偏心及傾斜誤 差需要被控制，以致它們不會增加。該影像扭曲能藉由平 行偏心或傾斜偏心構成該投射光學系統之光學元件的一部 份所減少。 在上面之情況下，一具有用於光學元件之運動機件的 固持設備正吸引吾人注意，其允許該覆疊準確性中之改善 。譬如，.日本專利特許公開申請案第2 00 1 -3 43 5 75號討論 200848828 此一固持設備。圖14說明日本專利特許公開申請案第 200 1 -3 43 5 75號中所討論之固持設備的組構。 於圖1 4中，可運動透鏡3 8a係藉由複數承納底座所 支撐，該等底座由第一透鏡單元46之內部圓周突出，且 藉由一透鏡壓按構件等固定至該第一透鏡單元46。該第 一透鏡單元46係固定至一內環部份44a。該內環部份44a 係藉由一致動器5 0經由一連結支臂5 9驅動於該光學軸方 向中。 三個致動器5 0係在相等角度間隔沿著一對於該內環 部份44a橫向地坐落之外環部份44b的周邊提供。再者， 一感測器72係提供於該等致動器50之間。該感測器72 量測該內環部份44a關於該外環部份44b之位置。感測器 72之數目係三個，且每一感測器72能於該光學軸方向中 測量該內環部份44a至該外環部份44b之相對位移數量。 圖1 5說明一在日本專利特許公開申請案第 1 0-0 5 4932號中所討論之固持設備。 於圖1 5所說明之投射光學系統1 〇中，複數透鏡元件 2a之每一個被一環狀透鏡機架所固持。每一透鏡機架被 透鏡筒62a、62b、及62c的一內部突出部份所支撐。再 者，被組構成驅動該等透鏡筒62a、62b、及62c之致動 器6 0b及60c、與被組構成偵測該等透鏡筒62a、62b、及 62c間之位移的位移偵測器64a及64b被安裝在該等透鏡 筒62a、62b、及62c之外部突出部份36a、36b、及36c 上。 -5- 200848828 根據日本專利特許公開申請案第200 1 -343 5 75號中所 討論之組構，當該內環部份4 4 a係傾斜時，該內環部份 44a可變形。此變形係藉由一在該內環部份44a及該致動 器5 0間之耦接部份於旋轉方向中之不足邊際所造成，其 主要地驅動該內環部份4 4 a。然後，該內環部份4 4 a之變 形可藉由該感測器72在傾斜數量之偵測結果上具有一不 利影響，以致該感測器72不能正確地偵測該內環部份 44a之傾斜。如此，可於該可運動透鏡38a及該內環部份 44a之間發生傾斜中之偏差。 在日本專利特許公開申請案第1 0-054932號中所討論 之固持設備中，該位移偵測器64a及64b偵測該等透鏡筒 62a、62b、及62c間之位移，且該等致動器60b及60c驅 動該等透鏡筒62a、62b、及62c。據此，其係難以正確地 定位該等相當重之透鏡筒62a、62b、及62c。 【發明內容】 本發明係針對一固持設備，其係能夠測量一光學元件 之位置，同時減少藉由支撐該光學元件之支撐構件的變形 、或藉由該光學元件與該支撐構件間之傾斜的差異所造成 之測量誤差。 根據本發明的一態樣，一被組構成固持光學元件之固 持設備包括一支撐構件，其被組構成支撐該光學元件；一 圓柱形構件，其被組構成支撐該支撐構件；複數感測器’ 其被組構成偵測該光學元件及該支撐構件之位置；及一驅 -6 - 200848828 動器單元，其被組構成基於來自該複數感測器之輸出驅動 該支撐構件。該支撐構件包括複數接觸該光學元件之突出 部份。藉由連接該複數突出部份與一直線所形成之多邊形 的每一頂點之方向，實質上與藉由連接該複數感測器及一 直線所形成之多邊形的每一頂點之.方向一致。 根據本發明之另一態樣，一被組構成固持光學元件之 固持設備包括一支撐構件，其被組構成支撐該光學元件； 一圓柱形構件，其被組構成支撐該支撐構件；複數感測器 ，其被組構成偵測該光學元件及該支撐構件之位置；及一 驅動器單元，其被組構成基於來自該複數感測器之輸出驅 動該支撐構件。該支撐構件包括複數與該光學元件接觸之 突出部份。該複數突出部份實質上存在於一相同平面上。 如果一垂直於該平面及通過藉由連接該複數突出部份與一 直線所形成之多邊形的重心之軸心被設定爲一轉軸，則該 複數突出部份係於一環繞著該轉軸之旋轉方向中位在實質 上與該複數感測器相同之方向中。 根據本發明之又另一態樣，一被組構成固持光學兀件 之固持設備包括一支撐構件，其被組構成支撐該光學元件 ;一圓柱形構件，其被組構成支撐該支撐構件；複數感測 器，其被組構成偵測該光學元件及該支撐構件之位置；及 一驅動器單元，其被組構成基於來自該複數感測器之輸出 驅動該支撐構件。該支撐構件包括複數與該光學元件接觸 之突出部份。該複數突出部份實質上存在於一相同平面上 。如果一垂直於該平面及通過該光學元件的重心之軸心被 200848828 設定爲一轉軸，則該複數突出部份係於一環繞著該轉軸之 旋轉方向中位在實質上與該複數感測器相同之方向中。 本發明之進一步特色及態樣將參考所附圖面由示範具 體實施例之以下詳細敘述變得明顯。 【實施方式】 本發明之各種示範具體實施例、特色、及態樣將在下 面參考該等圖面詳細地敘述。 第一示範具體實施例 現在將敘述根據本發明之第一示範具體實施例的光學 元件固持設備。根據本示範具體實施例，該固持設備固持 一光學元件，其構成一曝光設備之投射光學系統的一部份 。然而，該固持設備能被用於其他設備、諸如一用於光學 元件之高準確性定位的定位設備。 圖1係一掃描曝光設備之槪要視圖，該固持設備係安 裝在該掃描曝光設備上。該曝光設備包括一照明單元4， 其被組構成發射狹縫光線至一光罩（原始板件）上；光罩 工作台6，其被組構成固持及運動該光罩5 ; —投射光學 系統7，其被組構成將該光罩5之圖案投射至一晶圓（基 板）8上；與一晶圓工作台9，其被組構成固持及運動該 晶圓（基板）8。 該投射光學系統7包括當它們被彼此重疊安裝時在該 光學軸方向中接合之複數透鏡筒1 1 (圓柱形構件），該 -8- 200848828 光學軸方向係一平行於圖1中之Z軸的方向。該投射光學 系統7被一用作支撐本體之透鏡筒支撐構件1 2所支撐。 該透鏡筒支撐構件1 2經由一震動隔離機件1 4被一主要本 體13所支撐，該主要本體係放置在該地板上。該震動隔 離機件1 4可防止來自該地板之震動被傳送至該投射光學 系統7。 根據上述組構，當開始曝光時，該光罩工作台6係以 掃描方式與該晶圓工作台9之運動同步地運動。該晶圓工 作台9包括一運動機件，其允許該晶圓工作台9在該光學 軸方向中運動。依據此運動機件，可於該曝光期間施行焦 點調整。 圖2A係如由該光學軸方向中所視之透鏡筒1 1的內 部平面圖。圖2B係取自圖2A沿著剖線2B-2B之橫截面 圖。於圖2B中，一在該光學軸方向中延伸之軸心係該Z 軸。該X軸及該Y軸係在一平面上彼此垂直，該Z軸係 垂直在該平面上。該光學元件1之光學軸係藉由一點虛線 AX所代表。該投射光學系統7包括複數光學元件1，每 一光學元件具有一預定之光學動力。該光學元件1係位在 該透鏡筒1 1中。根據本示範具體實施例，該光學元件1 係一透鏡。然而，該光學元件1亦可爲另一光學元件，諸 如一面鏡片。再者，該光學元件1之形狀不受限制。 其次，將參考圖2A至5B敘述一固持該光學元件1 之固持設備1〇〇。 該固持設備100包括一支撐機架（支撐構件）104。 -9 - 200848828 該支撐機架104在複數位置接觸該光學元件1之周邊及支 撐該光學元件1。再者，該固持設備100包括複數位置感 測器1 02，其被組構成偵測該光學元件1或一安裝在該光 學元件1上之目標構件的位移；及一驅動器機件1 1 〇，其 包括一被組構成基於來自該等位置感測器1 〇 2之輸出而運 動該光學元件1之致動器。該等位置感測器1 02係設在複 數位置。 該支撐機架104於該光學軸方向中在一突出部份106 接觸該光學元件1，該突出部份係設在該支撐機架上 ，且支撐該光學元件1。該光學元件1係在該徑向中被一 塡入該支撐機架1 04及該光學元件1間之小間隙的黏接劑 所支撐。該突出部份1 06係一在此使該光學元件1及該支 撐機架1 04接觸之部份，如在圖9B所說明。該突出部份 106係在環繞著該光學軸之於大約120度的角度間隔之三 位置中沿著該光學元件1之周邊提供。 換句話說，該支撐機架1 04於環繞著該光學軸之三位 置中在相等間隔於該旋轉方向中支撐該光學兀件1 °依據 此藉由該支撐機架104之支撐，該光學元件1之變形在該 光學性能上之影響能被減少。該光學元件1及該支撐機架 1 04間之0 · 0 5至0.2毫米間隙將爲充分的。該黏接劑可大 約沿著該光學元件1之整個圓周充塡。該黏接劑在該間隙 中根據一黏性及該黏接劑之表面張力而硬化。 六刻槽係提供沿著支撐該光學元件1的支撐機架1 04 之周邊。出自該六刻槽的三刻槽之每一個以一支撐機架安 -10- 200848828 裝螺絲1 05被接合至該驅動器機件1 1 〇的一輸出部份。應 注意的是藉由使用一提供於該驅動器機件110及該支撐機 架1 04間之間隔裝置（未示出），將該三刻槽之三接頭部 份的高度調整至一相對地相同之高度’可防止變形被傳送 至該支撐機架104與該光學元件1。再者，其餘之刻槽被 配置在一與該等位置感測器1 02相向之位置中。在該支撐 機架1 04之刻槽的內部側面，該固持設備之尺寸能藉由配 置一將被該位置感測器1 02所偵測之部份所減少。 該驅動器機件11 〇及該位置感測器1 〇2在該透鏡筒 11之平坦部份被安裝在該透鏡筒上，且在環繞著該光學 軸於大約1 2 0度的角度間隔之三位置中配置。該驅動器機 件1 1 〇 (或壓電致動器1 1 2 )及該位置感測器1 02關於彼 此位移6 0度。此配置促成改善空間效率及減少該固持設 備之尺寸。該驅動器機件1 1 0被一光學元件控制系統2 0 所控制。藉由驅動一預定之光學元件，該驅動器機件1 1 〇 係能夠最佳化該投射光學系統7之光學性能。該光學元件 控制系統20基於由諸如壓力感測器的各種感測器所送出 之資訊、及一事先儲存於記憶體中之程式控制該驅動器機 件 1 1 0。 其次，將敘述該位置感測器1 02之細節。 該位置感測器102係用於在該光學軸方向中及於一垂 直於該光學軸之徑向中偵測該光學元件1之位移。雖然各 種型式之工具、諸如使用半導體雷射之量規干涉儀、靜電 電容位移計、線性編碼器、差動變壓器位移計、及渦電流 -11 - 200848828 位移計能視所需之準確性而定被用作該位置感測器1 02， 在本示範具體竇施例中使用該靜電電容位移計。 圖3 A係圖1所說明之位置感測器1 〇2的一橫截面透 視圖。圖3 B係一感測器頭部及一托架之透視圖。 該位置感測器1 02包括一感測器托架1 22及一以螺絲 固定至該感測器托架1 22之感測器頭部。該感測器頭部包 括一 Z-感測器頭部12〇及一 R-感測器頭部121。該z-感 測器頭部120於該光學軸方向中量測該支撐機架104對該 透鏡筒1 1之相對位移。該R-感測器頭部1 2 1在垂直於該 光學軸之徑向中量測該支撐機架1 04之相對位移。 再者’一目標構件丨23係安裝在該光學元件1之側面 上。該目標構件1 23係藉由該位置感測器1 02所偵測。該 目標構件123可與該光學元件1被一體地形成或藉由黏著 、焊接、或旋緊而固定至於該光學元件1。該目標構件 1 23可爲由一與該光學元件1具有大、約相同之線性熱膨脹 係數的材料所製成，且亦可由與該光學元件1相同之材料 所製成。 Μ W ’當~電容型感測器被用作該位置感測器丨〇2時 ’待被偵測之部份需要爲導電的。如此，該目標構件1 23 之表面（待偵測部份）需要以一金屬薄膜、諸如鋁薄膜藉 由 '灘鑛或藉由真空蒸發沈積所覆蓋。譬如，如果該目標構 件1 23係由玻璃材料所製成，金屬薄膜能形成在該目標構 件123的偵測部份上。 102時 胃# ’胃~電容型感測器被用作該位置感測器 -12- 200848828 ’該目標構件1 23之電極及該位置感測器1 02之轉換器需 要被配線。根據本示範具體實施例，該配線被固定至該支 撐機架1 04，以致震動不會經由該配線被傳送至該光學元 件1。 如參考圖2A所敘述，該位置感測器1 02被安裝在環 繞著該光學軸於大約1 20度的角度間隔之三位置上。該等 位置感測器1 02之每一個係配置於離該光學軸大約相等之 間隔中。依據此組構，該X軸、該Y軸、及該Z軸方向 中之位移與環繞著該X軸及該Y軸的旋轉方向中之角度 位移（旋轉量）能被測量。換句話說，由該三個Z-感測 器頭部所取得之三位移値的平均値可被計算爲該光學元件 1之中心在該Z軸方向中之位移。再者，能基於藉由一包 括三點而對應於該三位移値的平面及一垂直於該光學軸之 平面所形成之角度計算一環繞著該X軸及該Y軸之角度 位移。 根據本示範具體實施例，該光學元件1可於三方向中 (該Z軸方向、環繞著該X軸之旋轉、及環繞著該Y軸 之旋轉）藉由該驅動器機件1 1 0所驅動。如此，能基於在 該三方向中由該三位置感測器1 02所獲得之三位移値控制 該光學元件1之位置。應注意的是在該X軸及該γ軸方 向中由該等位置感測器1 02所獲得之位移能被用於校正該 晶圓工作台9之驅動量或對於另一光學元件所提供之驅動 器機件的驅動量。 根據本示範具體實施例，安裝在該光學元件1上之目 -13- 200848828 標構件1 23的位移被偵測。然而，該光學元件1或該支撐 機架1 04之位移能被偵測。於此一組構中，亦可減少該光 學元件1及該支撐機架1 04間之傾斜中之差異，其係藉由 該支撐機架1 〇4之變形所造成。譬如，藉由偵測該光學元 件1或安裝在該光學元件1上之目標構件123的位移，可 減少由於該支撐機架104之變形或該支撐機架104及該光 學元件1的傾斜中之差異的測量誤差。 再者，該光學元件1可在異於那些藉由該突出部份 1 06所支撐之部份在該光學軸方向中被重力所變形。另外 ，當該光學元件1係藉由該驅動器機件1 1 〇繞著該X軸 或該Y軸旋轉時，該支撐機架1 04可爲稍微變形。 根據本示範具體實施例，該突出部份1 0 6接觸該光學 元件1之部份及一待藉由該位置感測器1 02所偵測之目標 構件1 2 3的部份》係實質上在環繞著一轉軸之旋轉方向中 位於相同方向中。關於此點，該突出部份1 06接觸該光學 元件1之接觸部份實質上存在第一平面上，且該轉軸係垂 直於該第一平面及通過該光學元件1之重心的軸心。然後 ，該突出部份1 06接觸該光學元件1的部份、及藉由該位 置感測器1 02於該相同方向中所偵測的部份間之可容許的 差異限制視該光學元件1之光學敏感性、換句話說該光學 元件1之可允許誤差而定。例如，如果該差異係在± 5度 之範圍內，於大部份之案例中，該差異不會造成一傾斜之 角度偵測誤差。再者，該光學元件1能被坐落，以致縱使 該光學元件1之直徑係相當小，其不會妨礙該驅動器機件 -14- 200848828 1 1 〇。這樣一來’能施行該偵測，在此該上述變形係小的 。換句話說，藉由變形之測量誤差可被進一步減少。 再者，代替通過該光學元件1之重心的轉軸，一垂直 於該第一平面及通過一多邊形之重心的軸心可被用作該轉 軸，該多邊形藉由連接複數接觸部份與一直線所形成。自 然地，通過該光學元件1之重心的轉軸可與通過該多邊形 之重心的軸心一致。 根據本示範具體實施例，該光學元件1之光學軸與上 述轉軸一致。然而，本發明亦可應用至一案例，在此該光 學軸不會與該轉軸一致。此案例將在該第三示範具體實施 例中敘述。於該第一示範具體實施例中，該光學軸能以上 述轉軸替換。 再者，如另一選擇之視圖，關於本示範具體實施例， 如果該等接觸部份及該等感測器之數目係三個或更多，藉 由連接該複數接觸部份與一直線所形成之多邊形的頂點之 方向，實質上可與藉由連接用該等感測器所偵測之部份與 一直線所形成之多邊形的頂點之方向一致。 如上面所述，該位置感測器1 0 2偵測該光學元件1或 該目標構件1 23至該透鏡筒1 1之相對位移。 其次，將敘述該驅動器機件1 1 0之細節。圖4Α係該 驅動器機件1 1 0之分解平面圖，如由該光學軸方向所視。 圖4B係一側視圖，且圖4C係一透視圖。 該驅動器機件1 1 〇包括該壓電致動器1 1 2、傳送該壓 電致動器112之位移的主要本體111、及一改變由該主要 -15- 200848828 本體1 1 1所傳送之位移的方向之改變方向構件1 1 5。該壓 電致動器1 1 2包括一驅動源，電致伸縮元件及電極係交互 地建立在該驅動源中；及一可擴張的氣密式圓柱形容器， 其被組構成容置該驅動源。該壓電致動器1 1 2之長度在該 X軸方向中大約隨著一施加之電壓成比例地延伸。應注意 的是雖然在本示範具體實施例中使用一壓電致動器，亦可 使用一具有馬達及滾珠螺桿之結合的直接作用機件。 該主要本體11 1具有構成一連桿機件之約略“ H”的 形狀，且包括複數連桿（例如1 1 1 a、1 1 1 b、及1 1 1 h )。 該改變方向構件1 1 5具有二孔口及包括構成另一連桿機件 之複數連桿（例如1 1 5 a、1 1 5 b、1 1 5 C、及1 1 5 d )。根據 這些連桿機件，於該X方向中之壓電致動器112的位移 係由該主要本體1 1 1傳送至該改變方向構件1 i 5，且再者 藉由該改變方向構件115所輸出，當作該Z方向中之位移 。該連桿機件之細節將在下面敘述。 其次，該主要本體111及該改變方向構件115之製造 方法將被敘述。 首先，藉由處理一底層材料、藉由銑切或藉由金屬線 放電切削加工形成該主要本體或該連桿機件之外形，該底 層材料係一金屬塊。其次，在藉由一鑽孔工具形成一用於 該固疋連桿11 1 h的螺絲孔之後，在製作用於一安裝螺絲 孔及一用於該安裝螺絲孔之放空孔的螺紋之前，一孔洞係 由該等位移恢復連桿1 1 1 a及1 1 1 b之側面所製成。然後， 製作一用於壓電調整螺絲1 1 3之壓電調整螺絲孔1丨丨m。 -16- 200848828 同樣地’該改變方向構件丨丨5或該連桿機件之外形係 藉由處理一底層材料、藉由銑切或藉由金屬線放電切削加 工所形成，該底層材料係一金屬塊。其次，在製作用於一 透鏡機架安裝螺絲孔i丨5 j的螺紋之前形成一孔洞之後， 一在製作用於該安裝螺絲孔的螺紋之前的孔洞及用於該安 裝螺絲孔之放空孔係形成在該塊件之兩側面上。然後，製 成該透鏡機架安裝螺絲孔1 1 5j及一在製作用於該等水平 連桿1 1 5 a及1 1 5b之螺絲孔的螺紋之前的孔洞。 其A ’組§5^該驅動益機件1 1 〇之程序將被欽述。 首先，該等位移恢復連桿1 1 1 a及1 1 1 b與連接連桿 llle及lllf被插入該改變方向構件115上所形成之二孔 口。其次’該等位移恢復連桿及該等連接連桿係藉由改變 構件接頭螺絲1 1 6所連接。然後，該壓電致動器1 1 2係經 由壓電承接連桿1 1 1 q及1 1 1 r固定至該等位移恢復連桿 1 1 1 a及1 1 1 b。在此之後，藉由將該等壓電調整螺絲1 1 3 由該壓電調整螺絲孔1 1 1 m之外面旋緊進入該等位移恢復 連桿111a及111b，該壓電致動器112被設定至該等壓電 承接連桿1 1 1 q及1 1 1 r。 如上面所述，該壓電調整螺絲1 1 3被用於調整該壓電 致動器112之尺寸誤差，且再者被用於提供預負載。既然 該壓電調整螺絲Π 3被旋緊進入該位移恢復連桿1 1 1 a或 1 1 1 b之數量大致上係與該壓電致動器1 1 2之預負載的數 量成比例，藉由該壓電致動器1 1 2的特性中之變化所造成 的效應能藉由調整此數量而減少。 -17- 200848828 該壓電調整螺絲1 1 3被旋緊進入該位移恢復連桿 量能藉由一伸縮規所調整。譬如，一透鏡機架驅動 1 1 5 g在該Z軸方向中運動之數量能以一伸縮規測量 者，該壓電調整螺絲11 3能藉由一螺帽被固持在適當 中。 最後，使用驅動機件安裝螺絲，該改變方向構件 之未被位移部份、及該固定連桿lllh係固定至該透 1 1之平坦部份，且該組裝製程終止。於圖4C中，該 方向構件1 1 5係在三位置在其底部固定至該透鏡筒 這促成防止藉由該驅動器機件的驅動力量所造成之測 差。如果該改變方向構件1 1 5不會在三位置在其底部 至該透鏡筒11，該驅動力量被傳送至該透鏡筒11， 可產生不需要之變形，且該位置感測器1 02的一安裝 可被變形。如果該透鏡筒1 1被製成硬式的，譬如藉 厚其平坦部份，該改變方向構件11 5之底部側面的整 域能被接合至該透鏡筒1 1。 其次，將參考圖5A及5B敘述該主要本體1 1 1 改變方向構件1 15的連桿機件之運動。圖5A及5B 該驅動器機件1 10，如圖4A及4B之槪要版本。 該等位移恢復連桿1 1 1 a及1 1 1 b係經由彈性鉸鏈 及H21連接至該等壓電承接連桿11 lq及1 1 lr。再者 等位移恢復連桿1 1 1 a及1 1 1 b係經由彈性鉸鏈Η 1 2及 連接至該固定連桿Π 1 h。再者，該等位移恢復連桿 及1 1 lb係經由彈性鉸鏈H1 3及H23連接至該等連接 之數 連桿 〇再 位置 115 鏡筒 改變 1 1 〇 =tp 里δ吳 固定 以致 側面 由加 個區 及該 說明 HI 1 ，該 Η22 111a 連桿 -18- 200848828 1 1 le 及 1 1 If。 這些彈性鉸鏈之位置能藉由上述壓電調整螺絲1 1 3所 調整，該螺絲係設在該壓電承接連桿1 1 1 q及1 1 1 r之兩側 面上。設在該主要本體111上之彈性鉸鏈H11、H12及 Η 1 3能於一平行於該Y軸之直線中對齊，且由運動準確性 之觀點，該等彈性鉸鏈Η21、Η22及Η23亦可在一平行於 該Υ軸之直線中對齊。 當一電壓係施加至該壓電致動器1 1 2之二電極端子（ 未示出）時，該壓電致動器112之全長係在該X軸方向 中延伸達一長度dL。然後，該壓電承接連桿1 1 1 q係位移 至該左側達dXl=dL/2，且該壓電承接連桿lllr係位移至 該右側達dX2 = dL/2，如圖5A所示。其結果是，該位移恢 復連桿1 1 1 a繞著該Z軸在一微小角度以該鉸鏈Η 1 2在該 中心旋轉，且該連接連桿1 1 1 e係位移至該右側達dX3 ° 同樣地，該位移恢復連桿1 1 1 b繞著該Z軸在一微小角度 以該鉸鏈H22在該中心旋轉，且該連接連桿1 1 If係位移 至該右側達dX4。 如在圖5A所說明，在該壓電致動器1 1 2的位移之前 ，如藉由一實線所示，如果該等位移恢復連桿1 1 1 a及 111b之每一個的長度被界定爲a + b，該位移dX3及 之每一個將爲該位移dXl及dX2的b/a倍。根據本示範具 體實施例，此倍率被定義爲該主要本體1 1 1之幾何倍率α 。當位移恢復連桿1 1 1 a及1 1 1 b係藉由彎曲而變形時’或 當該等彈性鉸鏈係過份地伸展時，既然可在該幾何倍率α -19- 200848828 減少之時發生一驅動損失，應該額外地注意該等連桿之形 狀。 如在圖5 B所說明，該等連接連桿1 1 1 e及1 1 1 f於該 X軸方向中之位移係傳送至該改變方向構件11 5之水平連 桿115a及115b。當該等水平連桿115a及115b係在該X 軸方向中位移時，該等相對該X軸配置在一角度0之改 變方向連桿115c及115d旋轉，且一連結至該等改變方向 連桿1 1 5 c及1 1 5 d之透鏡機架驅動連桿1 1 5 g係在該Z軸 方向中位移達長度dZ5。 該等水平連桿1 15a及1 15b與該等改變方向連桿 1 15c及1 15d係經由彈性鉸鏈H15及H25連結，而該等改 變方向連桿115c及115d與該透鏡機架驅動連桿115g係 經由彈性鉸鏈Η 1 4及H24連結。 該位移dZ5大致上係該水平連桿1 15a及1 1 5b之位移 (平均値）的cot 0倍。根據本示範具體實施例，此倍率 被定義爲該改變方向構件115之幾何倍率/3。包括該主要 本體1 1 1及該改變方向構件〗丨5的整個驅動器機件i i 〇之 幾何倍率被表示爲幾何倍率r。該幾何倍率7係該主要本 體Π 1與該改變方向構件i〗5之幾何倍率的乘積（^ χ石 )° 爲了由該壓電致動器1 1 2之小位移dL恢復一大位移 H2，以增加該光學元件1之驅動範圍，“與々其中之至 少一個可爲大的。藉由減少該等位移恢復連桿 n〗a及 1 1 1 b之形狀參數“ a”與增加該形狀參數“ b ” ，該幾何 -20- 200848828 倍率α可被製成爲大的。該幾何倍率/3可藉由減少該角度 0被製成爲大的。 然而，增加該長度b導致增加該透鏡筒Π之直徑， 且可能不會滿足設計限制。在另一方面，增加該放大比率 將導致該驅動器機件1 1 〇之較低的自然頻率，其由於譬如 從該透鏡筒11之外面傳送至該光學元件1之震動造成一 圖案影像之降級的特性或驅動速度中之減少，且如此考慮 係需要的。考慮該震動，該幾何倍率r可爲在0.7及2.0 之間。再者，考慮該Z軸方向中之空間，形成於該等改變 方向連桿115c及U5d與該X軸間之角度0能被設定在 30度至60度之範圍內。於此案例中，該幾何倍率/3可爲 大約在0.57及1.72之間。 如上面所述，根據該壓電致動器1 1 2之延伸，該透鏡 機架驅動連桿1 1 5 g係在該Z軸方向中位移。該透鏡機架 驅動連桿1 1 5 g可僅只在該Z軸方向中位移，且不會於該 X軸及該Y軸方向中位移。據此，提供輔助連桿。 連結至該透鏡機架驅動連桿11 5 g之左及右側面的支 撐連桿115e及115f控制該透鏡機架驅動連桿115g於該 X軸方向中之位移。根據該等支撐連桿115e及115f，該 透鏡機架驅動連桿1 1 5 g可在該Z軸方向中運動，但不能 在該X軸方向中運動。 額外地，提供支撐連桿1 15s及115t，以控制該透鏡 機架驅動連桿115g於該Y軸方向中之位移。該等支撐連 桿1 1 5 s及1 1 5 t係經由彈性鉸鏈Η 1 6及H2 6連結至該等水 -21 - 200848828 平連桿1 15a及1 15b，且進一步經由彈性鉸鏈HI 7 連結至一固定連桿115w。該等支撐連桿115s及 配置在該等水平連桿115a及115b較近至該中心的 且限制該等水平連桿1 1 5 a及1 1 5 b於該Y軸方向中 ，而允許它們在該X軸方向中之運動。 既然該等水平連桿115a及115b於該Y軸方向 動被限制，該等改變方向連桿1 1 5 c及1 1 5 d與該透 驅動連桿1 1 5 g於該Y軸方向中運動被限制。根據 之組構，於該透鏡機架驅動連桿1 1 5 g中之透鏡機 螺絲孔1 1 5 j的區域係僅只在該Z軸方向中及不會 軸與該Y軸方向中位移。據此，接合至該透鏡機 連桿115g之支撐機架104可在該Z軸方向中正確 〇 組構該主要本體1 1 1，使得該等位移恢復連I 及111b之每一個與該等彈性鉸鏈H12及H22之每 其中心旋轉。如此，於一嚴格之意義中，該改變方 115之水平連桿115a及115b傾向於在該γ軸方向 一小位移，且該透鏡機架驅動連桿1 1 5 g傾向於根 平連桿115a及115b之位移在該Y軸方向中位移。 位移被該等輔助連桿所控制，該控制不會足夠地依 之驅動準確性。此異於該Z軸方向中之位移的位移 該支撐機架104之變形，且進一步可導致該透鏡之 及可導致該光學性能之惡化。如此，其係想要盡可 限制該透鏡機架驅動連桿1 1 5 g於該Y軸方向中之{ 及H27 • 1 51 係 端部， 之運動 中之運 鏡機架 該前述 架安裝 在該X 架驅動 地驅動 ^ 111a 一個在 向構件 中造成 據該水 雖然此 靠所需 可造成 變形， 能小地 r移0 -22- 200848828 該致動器1 1 2如上面所述相對該透鏡筒1 1驅動 撐機架104。 其次’將參考圖6敘述一被組構成控制該光學元 之光學元件控制系統2 0。 該光學元件控制系統2 0包括複數光學元件中央 單元（CPUs )(或控制電路）22，其被組構成控制 光學元件。每一光學元件CPU 22基於來自該等位置 器102之輸出控制每一光學元件之驅動。三壓電致 21及三位置感測器102係連接至每一光學元件CPU 該壓電致動器1 1 2係連接至每一壓電驅動器2 1。每 置感測器1 02包括二感測器，如上面所述。一感測器 於偵測該光學軸方向中之位移，且另一感測器係用於 該徑向中之位移。 再者，被組構成控制該光學元件之每一光學元件 22係連接至一曝光設備CPU 23，其被組構成控制該 設備。該曝光設備CPU 23係連接至一震動隔離機件 系統24、一被組構成控制該照明單元4之照明模式 線強度的照明控制系統25、光罩工作台控制系統26 一晶圓工作台控制系統2 7。 其次，將參考圖7敘述一使用圖6所說明之光學 控制系統2 0而用於該光學元件之控制順序。 於步驟S101中，該光學元件CPU 22與該曝光 CPU 23通訊，以開始該光學元件驅動例行程式。 於步驟S103中，該光學元件CPU 22經由該曝 該支 件1 處理 複數 感測 動器 22 ° 一位 係用 偵測 CPU 曝光 控制 及光 、及 元件 設備 光設 -23· 200848828 備CPU 23存取一包括用於該光學元件1的驅動波形之資 訊的查詢表，及由該查詢表取回資料。此查詢表包括於〜 照明模式中之校正參數，諸如用於該光學元件1之驅動校 正量、用於在掃描期間所產生的各種型式之像差的即時校 正之驅動波形、及一用於校正該光學元件1的光學特性中 之變化的校正量。當一照明光被該光學元件所吸收時，藉 由譬如熱產生而發生該光學元件1的光學特性中之改變。 其次，於步驟S105中，該光學元件CPU 22以一壓 力感測器（未示出）偵測繞著該光學元件1之周遭壓力。 基於此氣壓，該光學元件CPU 22計算一用於校正該光學 元件1之位置的校正量。藉由以此方式校正該光學元件1 之位置，能減少藉著由於氣壓的折射率變化所造成之效果 〇 其次，於步驟S107中，該光學元件CPU 22基於在 步驟S 1 0 3及S 1 0 5中所取得之資訊於該Z軸、該0 X、及 該Θ Y方向中產生用於該光學元件1之驅動波形。 於步驟S1 09中，該光學元件CPU 22將於三軸心方 向中（Z、0x、及0y)在步驟S107中所產生之波形的軸 心，轉變成用於每一驅動器機件1 1 〇的Z軸方向（Za、 Zb、Zc )中之驅動波形。 於步驟SI 1 1中，該光學元件CPU 22等待，直至其 由該曝光設備CPU 23接收一驅動開始命令。如果該光學 元件CPU 22不會接收該驅動開始命令（步驟SI 1 1中之 NO)，則該C P U 2 2於該狀態中等待。如果該光學兀件 -24- 200848828 CPU 22接收該驅動開始命令（步驟si 1 1中之YES )，則 於步驟S1 13中，該光學元件CPU 22開始驅動該光學元 件1 〇 於步驟S1 13中，該光學元件CPU 22驅動該光學元 件1，同時根據步驟S 1 09中所產生之驅動波形，監視來 自該等位置感測器1 02之輸出。 在該製程通過步驟S101至S113之後，終止一光學元 件驅動例行程式。當該製程持續至步驟S 1 1 5時，重複此 例行程式。 藉由執行上面之製程，能改善該光學元件1之影像形 成性能。再者，藉由施行複數光學元件1之驅動的類似控 制，該投射光學系統7之整個影像形成性能能被最佳化， 且該光罩5之圖案能以高精確性被投射於該晶圓8上。 第二示範具體實施例 其次，將參考圖8A至9B敘述一用於根據本發明之 第二示範具體實施例的光學元件之固持設備。類似於那些 在該第一示範具體實施例中之零組件被標以相同之參考數 字，且那些未在本示範具體實施例中提及者被視爲類似於 該第一示範具體實施例。 圖8A係圖1所說明之透鏡筒1 1的內部平面圖，如 由該光學軸方向中所視。圖8 B係一取自圖8 A沿著剖線 8B-8B之橫截面圖。 該固持設備200包括一支撐機架（支撑構件）104。 -25- 200848828 該支撐機架104在複數位置接觸該光學元件1之周邊及支 撐該光學元件1。再者，該固持設備200包括一位置感測 器1 02，其被組構成偵測該光學元件1或一安裝在該光學 元件1上之目標構件的位移；及一驅動器機件，其包括一 被組構成基於來自該位置感測器1 02之輸出而運動該光學 元件1之致動器。該位置感測器1 02係設在複數位置。 該支撐機架104於該光學軸方向中在一突出部份（支 撐部份）1 06接觸該光學元件1，該突出部份設在該支撐 機架104上，且支撐該光學元件1。該光學元件1係在該 徑向中被一塡入該支撐機架1 04及該光學元件1間之小間 隙的黏接劑所支撐。該突出部份1 06係在環繞著該光學軸 之於大約1 20度的角度間隔之三位置中沿著該光學元件1 之周邊提供。換句話說，該支撐機架1 04於環繞著該光學 軸之三位置中在相等間隔於該旋轉方向中支撐該光學元件 1 ° 六刻槽係提供沿著支撐該光學元件1的支撐機架1 04 之周邊。出自該六刻槽的三刻槽之每一個藉由一支撐機架 安裝螺絲1 05被接合至該驅動器機件1 1 0的一輸出部份。 再者，其餘之刻槽被配置在一與該等位置感測器102 相向之位置中。在該支撐機架1 04之刻槽的內部側面，該 固持設備2 0 0之尺寸能藉由配置一被該位置感測器1 0 2所 偵測之部份所減少。本示範具體實施例中之刻槽可被製成 爲比那些於該第一示範具體實施例中者較小，且再者，該 三刻槽可被省略。 -26- 200848828 該驅動器機件110及該位置感測器102係環繞著該光 學軸配置在大約1 20度的角度間隔之三位置中。該驅動器 機件1 1 0 (或壓電致動器1 1 2 )及該位置感測器1 0 2關於 彼此位移6 0度。此配置促成改善空間效率及減少該固持 設備200之尺寸。 圖9A係圖8A所說明之位置感測器102的詳細圖示 。該位置感測器1 02包括第一感測器1 24，其係安裝在該 透鏡筒11上，被組構成偵測該支撐機架104對該透鏡筒 1 1之相對位移。再者，該位置感測器1 02包括第二感測 器125，其係安裝在該支撐機架104上，被組構成偵測該 光學元件1或一安裝在該光學元件1上之目標構件131對 該支撐機架1 04的相對位置。圖9A說明一範例，在此該 第二感測器1 25偵測該目標構件1 3 1之位置。 該第一感測器1 24包括一安裝在該透鏡筒Η上之感 測器托架1 26、及一以螺絲固定至該感測器托架1 26之感 測器頭部。該感測器頭部包括一 Ζ-感測器頭部1 27及一 R-感測器頭部128。該Ζ-感測器頭部127偵測該光學軸方 向中之相對位移。該R-感測器頭部1 28偵測垂直於該光 學軸的徑向中之相對位移。 再者，待藉由該Ζ-感測器頭部127及該R-感測器頭 部1 28所偵測之部份係設在該支撐機架1 04上。根據本示 範具體實施例，一垂直於該支撐機架104之光學軸的平面 及一垂直於該支撐機架1 04之徑向的平面被設定待偵測之 部份。然而，具有待偵測部份之目標構件可藉由黏著、焊 -27- 200848828 接、或旋緊被固定至該支撐機架104。 圖9B係該第二感測器125之分解圖。該第二位置感 測器1 2 5包括一設在該支撐機架1 0 4之感測器托架1 2 9、 及一以螺絲固定至該感測器托架1 29之感測器頭部。該感 測器頭部包括一 Z-感測器頭部1 30，其被組構成偵測該光 學軸方向中之相對位移。 再者，一目標構件131係安裝在該光學元件1上。該 目標構件1 3 1被該感測器頭部1 3 0所偵測。該目標構件 1 3 1之材料係類似於該第一示範具體實施例中所敘述之目 標材料1 2 3的材料。 根據本示範具體實施例，安裝在該光學元件1上之目 標構件1 2 3的位移被偵測。然而，該光學元件1本身之位 移能被偵測。藉由偵測該光學元件1或安裝在該光學元件 1上之目標構件123的位移，可減少由於該支撐構件104 的變形、或該支撐構件1 04與該光學元件1的傾斜中之差 異所造成之測量誤差。 再者，該光學元件1可於該光學軸方向中藉由重力而 在異於那些藉由該等突出部份1 06所支撐之部份變形。另 外，當該光學元件1係藉由該驅動器機件1 1 〇繞著該X 軸或該Y軸旋轉時，該支撐機架1 04可稍微變形。根據 本示範具體實施例，該突出部份1 06接觸該光學元件1之 部份、及一待藉由該位置感測器1 2 5所偵測而爲該目標構 件1 3 1之部份，在圍繞一轉軸之旋轉方向中係實質上位於 相同方向中。 -28 - 200848828 關於此點，該突出部份1 06接觸該光學元件1之接觸 部份實質上存在於第一平面上，且該轉軸係一垂直於該第 一平面及通過該光學元件1之重心的軸心。然後，該突出 部份1 06接觸該光學元件1之部份的配置、及藉由該位置 感測器1 25於同一方向中所偵測之部份間之可容許的差異 極限，視該光學元件1之光學敏感性而定，換言之，即該 光學元件1之可允許的誤差。譬如，如果該差異係在土5 度之範圍內，於大部份案例中，該差異不會造成一傾斜角 度偵測誤差。再者，能坐落該光學元件1，以致其不會妨 礙該驅動器機件1 1 0，縱使該光學元件1之直徑係相當小 。這樣一來，該偵測能被施行，在此上述變形係小的。換 句S舌說’藉由變形之測量誤差可被進一^步減少。 再者，代替通過該光學元件1之重心的轉軸，一垂直 於該第一平面及通過一多邊形的重心之軸心可被用作該轉 軸，該多邊形藉由連接複數接觸部份與一直線所形成。自 然地，通過該光學元件1之重心的轉軸可與通過該多邊形 之重心的軸心一致。 根據本示範具體實施例’該光學元件1之光學軸與上 述轉軸一致。然而，本發明亦可應用至一案例，在此該光 學軸不會與該轉軸一致。此案例將在該第三示範具體實施 例中敘述。於該第二示範具體實施例中，該光學軸能以上 述轉軸替換。 再者’當作另一選擇之觀點，關於本示範具體實施例 ’如果該等接觸部份及該等感測器之數目係三個或更多， -29 - 200848828 藉由連接該複數接觸部份與一直線所形成之多 頂點之方向，實質上可與藉由連接該等感測器 份及一直線所形成之多邊形的頂點之方向一致 該第一感測器1 2 4能被安裝在該突出部份 者，該第一感測器124及該第二感測器丨25能 向中繞著用於一節省空間設計之光學軸被配置 既然它們係類似於那些在該第一示範具體 敘述者’該驅動器機件1 1 0及本示範具體實施 統的敘述將不會被重複。 如上面所述，該位置感測器（第一感測器 該支撐機架1 〇 4對該透鏡筒1 1之相對位移， 測器（第二感測器）1 25偵測該光學元件1或 1 3 1對該支撐機架1 04之相對位移。 再者，根據本示範具體實施例，該第二感 測該光學元件1對該支撐機架1 04之傾斜角度 傾斜角度被用於控制該光學元件1之位置。換 光學元件1係基於該第一感測器1 24之輸出及 測器1 2 5之輸出的組合所控制。如此，當該光 傾斜時，即使當藉由該支撐機架1 04之變形發 件1及該支撐機架1 〇4間之傾斜中之差異時， 1能被控制至停留在一想要之位置。這樣一來 支撐機架104係未充分堅硬’能減少藉由該支 之變形所造成的不利影響。換句話說’藉由在 104上形成一刻槽或藉由造成該支撐機架104 邊形的每一 所偵測之部 〇 106上。再 在該旋轉方 在一角度。 實施例中所 例之控制系 )124偵測 且該位置感 該目標構件 測器125偵 。所偵測之 句話說，該 該該第二感 學元件1係 生該光學元 該光學元件 ，即使當該 撐機架104 該支撐機架 較薄，該固 -30- 200848828 持設備之尺寸及重量能被減少，且該空間效率能被改善。 該第二感測器1 25僅只在該光學軸方向中偵測該光學 元件1之傾斜角度。然而，該第二感測器1 25亦可被組構 成偵測該徑向中之傾斜角度。譬如，當該光學元件1及該 支撐機架1 〇4係藉由該光學元件1之驅動於該徑向中不對 齊，以在該光學性能上給與顯著之影響時，此組構係有效 的。 第三示範具體實施例 將參考圖10A及10B敘述一用於根據本發明之第三 示範具體實施例的光學元件之固持設備。圖1 0 A係圖1 1 所說明之透鏡筒1 1的一內部平面圖，如由該光學軸方向 所視。圖10B係一取自圖10A中沿著剖線10B-10B之橫 截面。類似於那些在該第一示範具體實施例中之零組件被 標以相同之參考數字，且那些未在本示範具體實施例中提 及者被視爲類似於該第一示範具體實施例。 於該第一及該第二示範具體實施例中，一透鏡係意欲 被用作該光學元件1，且該位置感測器1 02及該突出部份 1 06係配置環繞著該光學軸。於一案例中，在此一鏡片被 用作該光學元件1，諸如於具有反射型光學系統之案例中 ，如在圖1 〇 A所說明，該光學元件1之形狀不能爲圓形 的。於此案例中，該支撐機架1 04接觸該光學元件1之突 出部份1 0 6能關於該光學元件1之重心C G位在均勻位置 。追是因爲藉由在上面之位置中配置該寺突出部份106， -31 - 200848828 該光學兀件1施加至配置在三位置中之突出部份106的重 量將變得均勻。 根據本示範具體實施例，該突出部份i 接觸該光學 元件1之部份及一將藉由該位置感測器1 〇2所偵測而爲該 目標構件1 3 1之部份，在繞著一轉軸之旋轉方向中係實質 上位於該相同方向中。關於此點，該突出部份i 〇 6接觸該 光學元件1之接觸部份實質上存在於第一平面上，且該轉 軸係一垂直於該第一平面及通過該光學元件i之重心的軸 心。然後’該突出部份1 06接觸該光學元件1之部份的配 置、及藉由該位置感測器1 2 5於同一方向中所偵測之部份 間之可容許的差異極限，視該光學元件1之光學敏感性而 定’換言之，即該光學元件1之可允許的誤差。然而，如 果該差異係在± 5度之範圍內，於大部份案例中，該差異 不會造成一傾斜角度偵測誤差。再者，能坐落該光學元件 1，以致其不會妨礙該驅動器機件1 1 0，縱使該光學元件1 之直徑係相當小。 再者，代替通過該光學元件1之重心的轉軸，一垂直 於該第一平面及通過一多邊形的重心之軸心可被用作該轉 軸，該多邊形藉由連接複數接觸部份與一直線所形成。通 過該光學元件1之重心的轉軸可與通過該多邊形之重心的 軸心一致。 雖然該一致性之程度視該光學元件1之光學敏感性及 重量而定，兩軸心可爲在上述平面上之30毫米半徑的範 圍內。再者，當作另一選擇之觀點，關於本示範具體實施 -32- 200848828 例，如果該等接觸部份及該等感測器之數目係三個或更多 ，藉由連接複數接觸部份與一直線所形成之多邊形的頂點 之方向，實質上可與藉由連接該等感測器所偵測之部份及 一直線所形成之多邊形的頂點之方向一致。 第四示範具體實施例 將參考圖1 1 A及1 1 B敘述一用於根據本發明之第四 示範具體實施例的光學元件之固持設備。於該第一示範具 體實施例中，該光學元件1及該支撐機架104於三位置中 以黏接劑被接合至該寺哭出部份1 0 6。於該第四不軔具體 實施例中，該光學元件1及該支撐機架104地機械式地夾 住。 於圖1 1 A及1 1 B中，藉由在三位置沿著該光學元件1 之周邊接觸，當作一被組構成支撐該光學元件1之支撐構 件，提供三個夾子機件1 40。雖然感測器及致動器係由該 等圖面省略，它們係如於該第一及該第二示範具體實施例 中般提供。 根據本示範具體實施例，該夾子機件1 40接觸該光學 元件1之部份及一將由該位置感測器所偵測之部份實質上 係於繞著一轉軸之旋轉方向中位在相同方向中。關於此點 ，該夾子機件1 4 0接觸該光學元件1之接觸部份實質上存 在於第一平面上，且該轉軸係一垂直於該第一平面及通過 該光學元件1之重心的軸心。然後，該夾子機件1 4 0接觸 該光學元件1之部份的配置、及藉由該位置感測器於同一 -33- 200848828 方向中所偵測之部份間之可容許的差異極限，視該光學元 件1之光學敏感性而定，換言之，即該光學元件1之可允 許的誤差。譬如，如果該差異係在± 5度之範圍內，於大 部份案例中，該差異不會造成一傾斜角度偵測誤差。再者 ，能坐落該光學元件1，以致其不會妨礙該驅動器機件 Π 0，縱使該光學元件1之直徑係相當小。 這樣一來，該偵測能被施行，在此上述變形係小的。 換句話說，藉由變形之測量誤差可被進一步減少。 再者，代替通過該光學元件1之重心的轉軸，一垂直 於該第一平面及通過一多邊形的重心之軸心可被用作轉軸 ’該多邊形藉由連接複數接觸部份與一直線所形成。自然 地，通過該光學元件1之重心的轉軸可與通過該多邊形之 重心的軸心一致。 根據本示範具體實施例，該光學元件1之光學軸與上 述轉軸一致。然而，本發明亦可應用至一情況，在此該光 學軸不會與該轉軸一致。 再者，當作另一選擇之觀點，關於本示範具體實施例 ，如果該等接觸部份及該等感測器之數目係三個或更多， 藉由連接該複數接觸部份與一直線所形成之多邊形的頂點 之方向，實質上可與藉由連接該等感測器所偵測之部份及 一直線所形成之多邊形的頂點之方向一致。應注意的是該 等接觸部份之區域的重心能被當作該接觸區域的一代表點 〇 其次，參考圖12及13，將敘述一使用上述曝光設備 -34- 200848828 之裝置製造方法。圖1 2係一流程圖，說明用於半導體裝 置（例如積體電路（IC )、大型積體電路（LSI )、液晶 顯示器（LCD )、及電荷耦合裝置（CCD ))之示範製造 製程。於圖1 2中，半導體晶片係取作該半導體裝置之範 例。 步驟S 1係一用於設計半導體裝置之電路的電路設計 製程。步驟S 2係用以基於所設計之電路圖案製作一罩幕 之罩幕製造製程，該罩幕能被稱爲一原始板件或一光罩。 步驟S 3係一用於由矽或同等材料製造晶圓之晶圓製造製 程，該晶圓能被稱爲一基板。步驟S 3可爲一光罩製造製 程。步驟S4係一晶圓製程，其能被意指“前製程”，用 於在晶圓上使用一曝光設備以上述預先製備之罩幕根據該 微影技術形成一實際電路。步驟S 5係一組裝製程，其能 被稱爲“後製程”，用以使用步驟S4中所製成之晶圓形 成半導體晶片。該後製程包括一組裝製程（例如切丁、接 合等）及一封裝製程（晶片密封）。步驟S 6係一檢查製 程，用於檢查步驟S5中所製成之該半導體裝置。該檢查 包括一操作確認測試及一耐用測試。步驟S 7係一裝運製 程，用於經過上述製程裝運已完成之半導體裝置。 如在圖1 3所說明，步驟S 4中之上述晶圓製程包括〜 用於氧化晶圓表面之氧化步驟S 1 1、一用於在該晶圓表面 上形成隔離薄膜之化學蒸氣沈積（CVD )步驟S12、及~ 用於在該晶圓藉由蒸發形成電極之電極形成步驟S13。再 者，步驟S4中之晶圓製程包括一用於將離子植入該晶圓 -35- 200848828 之離子植入步驟s 1 4、一用於以感光性材料塗覆該晶圓之 抗鈾劑製程步驟S 1 5、及一用於使用上述曝光設備以一具 有電路圖案之罩幕將已遭受該抗蝕劑處理之晶圓曝光至光 線的曝光步驟S 1 6。再者，步驟S4中之晶圓製程包括一 用於使在該曝光步驟S 1 6中曝光之晶圓顯影的顯影步驟 S 1 7、一用於切割異於在該顯影步驟S 1 7中所顯影之抗蝕 劑影像的部份之蝕刻步驟S 1 8、及一用於移除在該蝕刻步 驟S 1 8之後所留下的不須要之抗蝕劑的抗蝕劑剝除步驟 S 1 9。重複上述步驟之製程能在一晶圓上形成多數電路圖 案。 根據本發明之上述示範具體實施例，可實現一能夠測 量光學元件之位置、同時減少測量誤差之固持設備，該測 量誤差係藉由一支撐該光學元件的支撐構件之變形、或藉 由該光學元件與該支撐構件間之傾斜的差異所造成。 雖然已參考示範具體實施例敘述本發明，將了解本發 明不限於所揭示之示範具體實施例。以下申請專利之範圍 將給與最寬廣之解釋，以便涵括所有修改、同等結構、及 功能。 【圖式簡單說明】 倂入及構成該說明書的一部份之所附圖面說明本發明 之示範具體實施例、特色、及態樣，且隨同該敘述，具有 說明本發明之原理的作用。 圖1係一範例曝光設備之槪要視圖。 -36- 200848828 圖2A及2B說明一根據本發明之第一示範具體實施 例的範例固持設備。 圖3 A及3 B係該固持設備之範例位置感測器的細部 圖面。 圖4A至4C說明一範例驅動機件。 圖5A及5B說明該驅動機件之連結機件的運動。 圖6說明一被組構成控制光學元件之範例控制系統。 圖7係一說明該光學元件之控制的流程圖。 圖8A及8B說明一根據本發明之第二示範具體實施 例的範例固持設備。 圖9A及9 B係根據本發明之第二示範具體實施例的 範例位置感測器之細部圖面。 圖10A及10B說明一根據本發明之第三示範具體實 施例的範例固持設備。 圖1 1 A及1 1 B說明一根據本發明之第四示範具體實 施例的範例固持設備。 圖1 2係一流程圖，說明一使用曝光設備之範例裝置 製造方法。 圖1 3係一流程圖，說明圖1 〇中所說明流程圖中之步 驟S 4中之晶圓處理的細節。 圖1 4說明一傳統固持設備。 圖1 5說明另一傳統固持設備。 【主要元件符號說明】 -37- 200848828 1 :光學元件 2a :透鏡元件 4 :照明單元 5 :光罩 6 :光罩工作台 7 :投射光學系統 8 :晶圓 9 :晶圓工作台 1 〇 :投射光學系統 1 1 :透鏡筒 1 2 :透鏡筒支撐構件 13 :主要本體 1 4 :震動隔離機件 20 :光學元件控制系統 2 1 :壓電驅動器 22 :中央處理單元 23 :中央處理單元 2 4 :控制系統 25 :照明控制系統 26 :光罩工作台控制系統 2 7 :晶圓工作台控制系統 3 6a :突出部份 3 6b :突出部份 3 6 c :突出部份 -38- 200848828 3 8 a :可運動透鏡 4 4 a .內環部份 4 4 b :外環部份 46 :透鏡單元 5 〇 :致動器 59 :連結支臂 60b :致動器 6 0 c :致動器 6 2 a :透鏡筒 62b :透鏡筒 62c :透鏡筒 64a :位移偵測器 64b :位移偵測器 72 :感測器 1 0 0 :固持設備 102 :位置感測器 1 〇 4 :支撐機架 1 〇 5 :安裝螺絲 106 :突出部份 1 1 0 :驅動器機件 1 η :主要本體 1 1 1 a :連桿 1 1 1 b :連桿 1 1 1 e :連桿 -39 200848828 1 1 1 f :連桿 1 1 1 h :連桿 111m:壓電調整螺絲孔 1 1 1 q :連桿 1 1 1 r :連桿 1 1 2 :壓電致動器 1 1 3 :壓電調整螺絲 1 1 5 :改變方向構件 1 1 5 a :連桿 115b：連桿 1 1 5 C :連桿 1 1 5 d :連桿 1 1 5 e :連桿 1 1 5 f :連桿 1 1 5 g :連桿 1 15j :螺絲孔 1 1 5 s :螺絲孔 1 1 5 t :螺絲孔 1 1 5 w :螺絲孔 1 1 6 :接頭螺絲 120 : Z-感測器頭部 12 1 : R-感測器頭部 122 :感測器托架 123 :目標構件 -40- 200848828 124 :第一感測器 1 2 5 :第二感測器 1 2 6 :感測器托架 127 : Z-感測器頭部 128 : R-感測器頭部 129 :感測器托架 130 : Z-感測器頭部 1 3 1 :目標構件 140 :夾子機件 2 0 0 :固持設備 Η 1 1 :鉸鏈 Η 1 2 :鉸鏈 Η 1 3 :鉸鏈 Η 1 4 :鉸鏈 Η 1 5 :鉸鏈 Η 1 6 :鉸鏈 Η 1 7 :鉸鏈 Η21 :鉸鏈 Η22 :鉸鏈 Η23 :鉸鏈 Η24 :鉸鏈 Η25 :鉸鏈 Η26 :鉸鏈 Η27 :鉸鏈200848828 IX. Description of the Invention [Technical Field] The present invention relates to a holding device that is configured to hold an optical element. [Prior Art] A holding device that constitutes a holding optical element is used in each device, such as a semiconductor exposure device. The semiconductor exposure apparatus is an apparatus for forming an electric circuit by transferring a pattern of a photomask onto a crucible wafer. In order to form a highly integrated circuit, it is desirable to improve the overlay accuracy of most of the patterns transferred onto the germanium wafer. In order to improve the overlay accuracy, it is necessary to reduce alignment errors, amplification errors, and image distortion. The alignment error can be reduced by adjusting the relative position of the mask and the wafer. The amplification error can be reduced by moving a portion of the optical component in the direction of the optical axis that forms part of the projection optics. When the optical element is moved in the optical axis direction, error components having a direction different from the optical axis, particularly parallel eccentricity and tilt error, need to be controlled so that they do not increase. The image distortion can be reduced by a portion of the optical components of the projection optical system by parallel eccentricity or oblique eccentricity. In the above case, a holding device having a moving mechanism for an optical element is attracting attention, which allows an improvement in the overlay accuracy. for example,. Japanese Patent Laid-Open Application No. 2 00 1 - 3 43 5 No. 75 Discussion 200848828 This is a holding device. Fig. 14 illustrates the configuration of the holding device discussed in Japanese Patent Laid-Open Application No. 200 1 - 3 43 5 75. In FIG. 14, the movable lens 38a is supported by a plurality of receiving bases which are protruded from the inner circumference of the first lens unit 46 and fixed to the first lens by a lens pressing member or the like. Unit 46. The first lens unit 46 is fixed to an inner ring portion 44a. The inner ring portion 44a is driven in the optical axis direction by an actuator 50 via a link arm 59. The three actuators 50 are provided at equal angular intervals along a periphery of the outer ring portion 44b that is laterally seated for the inner ring portion 44a. Furthermore, a sensor 72 is provided between the actuators 50. The sensor 72 measures the position of the inner ring portion 44a with respect to the outer ring portion 44b. The number of sensors 72 is three, and each sensor 72 can measure the relative displacement of the inner ring portion 44a to the outer ring portion 44b in the optical axis direction. Figure 15 illustrates a holding device as discussed in Japanese Patent Laid-Open Publication No. 1 0-0 5,932. In the projection optical system 1 illustrated in Fig. 15, each of the plurality of lens elements 2a is held by an annular lens frame. Each lens frame is supported by an inner projection of the lens barrels 62a, 62b, and 62c. Furthermore, the actuators 60b and 60c that drive the lens barrels 62a, 62b, and 62c, and the displacement detectors that are configured to detect the displacement between the lens barrels 62a, 62b, and 62c are grouped. 64a and 64b are mounted on the outer protruding portions 36a, 36b, and 36c of the lens barrels 62a, 62b, and 62c. The configuration of the inner ring portion 44a is deformable when the inner ring portion 44a is inclined, in accordance with the configuration discussed in Japanese Patent Application Laid-Open No. 2001-343-575. This deformation is caused by an insufficient margin in the direction of rotation of the coupling portion between the inner ring portion 44a and the actuator 50, which mainly drives the inner ring portion 4 4 a. Then, the deformation of the inner ring portion 44 a can have an adverse effect on the detection result of the tilt amount of the sensor 72, so that the sensor 72 cannot correctly detect the inner ring portion 44a. Tilt. Thus, a deviation in the inclination between the movable lens 38a and the inner ring portion 44a occurs. The displacement detectors 64a and 64b detect displacement between the lens barrels 62a, 62b, and 62c in the holding device discussed in Japanese Patent Application Laid-Open No. Hei No. 0-054932, and the actuating The lenses 60b and 60c drive the lens barrels 62a, 62b, and 62c. Accordingly, it is difficult to accurately position the relatively heavy lens barrels 62a, 62b, and 62c. SUMMARY OF THE INVENTION The present invention is directed to a holding device that is capable of measuring the position of an optical component while reducing distortion by a support member supporting the optical component or by tilting between the optical component and the support member. Measurement error caused by the difference. According to an aspect of the present invention, a holding device configured to hold a holding optical element includes a supporting member that is configured to support the optical member; a cylindrical member that is configured to support the supporting member; a plurality of sensors 'It is configured to detect the position of the optical element and the support member; and a drive-6 - 200848828 actuator unit that is configured to drive the support member based on the output from the complex sensor. The support member includes a plurality of protruding portions that contact the optical member. By connecting the direction of each vertex of the polygon formed by the complex protrusion and the straight line, substantially each vertex of the polygon formed by connecting the complex sensor and a straight line. The direction is the same. According to another aspect of the present invention, a holding device configured to hold an optical element includes a support member that is configured to support the optical member; a cylindrical member that is configured to support the support member; And being configured to detect the position of the optical component and the support member; and a driver unit configured to drive the support member based on an output from the complex sensor. The support member includes a plurality of protruding portions in contact with the optical member. The plurality of protruding portions are substantially present on a same plane. If an axis perpendicular to the plane and passing through the center of gravity of the polygon formed by connecting the plurality of protruding portions and the straight line is set as a rotating shaft, the plurality of protruding portions are in a rotation direction around the rotating shaft The bit is in substantially the same direction as the complex sensor. According to still another aspect of the present invention, a holding device configured to hold a holding optical member includes a supporting member that is configured to support the optical member, and a cylindrical member that is configured to support the supporting member; a sensor configured to detect a position of the optical component and the support member; and a driver unit configured to drive the support member based on an output from the complex sensor. The support member includes a plurality of protruding portions in contact with the optical member. The plurality of protruding portions are substantially present on a same plane. If an axis perpendicular to the plane and passing through the center of gravity of the optical element is set to a rotation axis by 200848828, the plurality of protrusions are centered in a rotation direction around the rotation axis substantially opposite to the complex sensor. In the same direction. Further features and aspects of the present invention will become apparent from the following detailed description of exemplary embodiments. [Embodiment] Various exemplary embodiments, features, and aspects of the invention are described in detail below with reference to the drawings. First Exemplary Embodiment An optical component holding device according to a first exemplary embodiment of the present invention will now be described. In accordance with an exemplary embodiment of the present invention, the holding device holds an optical component that forms part of the projection optics of an exposure device. However, the holding device can be used for other devices, such as a positioning device for high accuracy positioning of optical components. Figure 1 is a schematic view of a scanning exposure apparatus mounted on the scanning exposure apparatus. The exposure apparatus comprises a lighting unit 4 which is configured to form a slit light to a reticle (original plate); a reticle stage 6 which is configured to hold and move the reticle 5; 7. The group is configured to project the pattern of the mask 5 onto a wafer (substrate) 8; and a wafer stage 9 is configured to hold and move the wafer (substrate) 8. The projection optical system 7 includes a plurality of lens barrels 1 1 (cylindrical members) joined in the optical axis direction when they are mounted one on another, the -8-200848828 optical axis direction being parallel to the Z axis in FIG. The direction. The projection optical system 7 is supported by a lens barrel supporting member 12 serving as a supporting body. The lens barrel supporting member 12 is supported by a main body 13 via a vibration isolating mechanism 14 which is placed on the floor. The vibration isolating member 14 prevents vibration from the floor from being transmitted to the projection optical system 7. According to the above configuration, when the exposure is started, the mask table 6 is moved in synchronization with the movement of the wafer table 9 in a scanning manner. The wafer table 9 includes a moving mechanism that allows the wafer table 9 to move in the optical axis direction. According to this moving mechanism, focus adjustment can be performed during the exposure. Fig. 2A is an internal plan view of the lens barrel 11 as viewed in the direction of the optical axis. Figure 2B is a cross-sectional view taken along line 2B-2B of Figure 2A. In Fig. 2B, an axis extending in the direction of the optical axis is the Z axis. The X-axis and the Y-axis are perpendicular to each other on a plane, the Z-axis being perpendicular to the plane. The optical axis of the optical element 1 is represented by a dotted line AX. The projection optical system 7 includes a plurality of optical elements 1, each of which has a predetermined optical power. The optical element 1 is tied in the lens barrel 1 1 . According to an exemplary embodiment of the present invention, the optical element 1 is a lens. However, the optical element 1 can also be another optical element, such as a lens. Furthermore, the shape of the optical element 1 is not limited. Next, a holding device 1 that holds the optical element 1 will be described with reference to Figs. 2A to 5B. The holding device 100 includes a support frame (support member) 104. -9 - 200848828 The support frame 104 contacts the periphery of the optical element 1 at a plurality of positions and supports the optical element 1. Furthermore, the holding device 100 includes a plurality of position sensors 102 that are configured to detect displacement of the optical element 1 or a target member mounted on the optical element 1; and a driver mechanism 1 1 〇, It comprises an actuator configured to move the optical element 1 based on the output from the position sensors 1 〇2. The position sensors 102 are located at a plurality of positions. The support frame 104 contacts the optical component 1 in a direction of the optical axis in a protruding portion 106. The protruding portion is disposed on the support frame and supports the optical component 1. The optical element 1 is supported in the radial direction by an adhesive that breaks into a small gap between the support frame 104 and the optical element 1. The projection 106 is a portion where the optical component 1 and the support frame 104 are contacted, as illustrated in Figure 9B. The projections 106 are provided along the periphery of the optical element 1 in three positions spaced about an angular interval of about 120 degrees from the optical axis. In other words, the support frame 104 supports the optical element 1 at equal intervals in the rotation direction in three positions around the optical axis, and the optical element is supported by the support frame 104. The effect of the deformation of 1 on this optical performance can be reduced. 0. 0 5 to 0 between the optical component 1 and the support frame 104. A 2 mm gap will be sufficient. The adhesive can be filled approximately along the entire circumference of the optical element 1. The adhesive hardens in the gap according to a viscosity and a surface tension of the adhesive. A six-groove system provides a perimeter along the support frame 104 that supports the optical component 1. Each of the three notches from the six notches is joined to an output portion of the drive member 11 1 by a support frame -10- 200848828. It should be noted that the height of the three joint portions of the three grooves is adjusted to be relatively the same by using a spacer (not shown) provided between the driver member 110 and the support frame 104. The height ' prevents deformation from being transmitted to the support frame 104 and the optical element 1. Further, the remaining slots are disposed in a position facing the position sensors 102. At the inner side of the groove of the support frame 104, the size of the holding device can be reduced by configuring a portion to be detected by the position sensor 102. The driver mechanism 11 and the position sensor 1 〇 2 are mounted on the lens barrel at a flat portion of the lens barrel 11 and at an angular interval of about 120 degrees around the optical axis. Configured in the location. The driver mechanism 1 1 〇 (or piezoelectric actuator 1 1 2 ) and the position sensor 102 are displaced by 60 degrees with respect to each other. This configuration contributes to improved space efficiency and reduced size of the holding device. The drive mechanism 110 is controlled by an optical component control system 20. The driver mechanism 1 1 can optimize the optical performance of the projection optical system 7 by driving a predetermined optical component. The optical component control system 20 controls the drive mechanism 110 based on information sent by various sensors such as pressure sensors and a program previously stored in the memory. Next, the details of the position sensor 102 will be described. The position sensor 102 is configured to detect the displacement of the optical element 1 in the optical axis direction and in a radial direction perpendicular to the optical axis. Although various types of tools, such as gauge interferometers using semiconductor lasers, electrostatic capacitance displacement meters, linear encoders, differential transformer displacement meters, and eddy currents -11 - 200848828 displacement meters can be determined depending on the required accuracy. Used as the position sensor 102, the electrostatic capacitance displacement meter is used in the specific sinus embodiment of the present invention. Figure 3A is a cross-sectional perspective view of the position sensor 1 〇 2 illustrated in Figure 1. Figure 3B is a perspective view of a sensor head and a bracket. The position sensor 102 includes a sensor bracket 1 22 and a sensor head that is screwed to the sensor bracket 1 22 . The sensor head includes a Z-sensor head 12A and an R-sensor head 121. The z-sensor head 120 measures the relative displacement of the support frame 104 to the lens barrel 11 in the optical axis direction. The R-sensor head 1 1 1 measures the relative displacement of the support frame 104 in a radial direction perpendicular to the optical axis. Further, a target member 丨 23 is attached to the side of the optical element 1. The target member 1 23 is detected by the position sensor 102. The target member 123 may be integrally formed with the optical element 1 or may be fixed to the optical element 1 by adhesion, soldering, or screwing. The target member 213 may be made of a material having a large, approximately the same linear thermal expansion coefficient as the optical element 1, and may also be made of the same material as the optical element 1. ΜW ’ When the capacitive sensor is used as the position sensor 丨〇2, the part to be detected needs to be electrically conductive. Thus, the surface of the target member 231 (the portion to be detected) needs to be covered by a metal film, such as an aluminum film, by "mineral or by vacuum evaporation deposition." For example, if the target member 1 23 is made of a glass material, a metal film can be formed on the detecting portion of the target member 123. At 102 o'clock, the stomach #'s stomach-capacitive sensor is used as the position sensor -12- 200848828' The electrode of the target member 1 23 and the transducer of the position sensor 102 need to be wired. According to the exemplary embodiment of the present invention, the wiring is fixed to the support frame 104 so that vibration is not transmitted to the optical element 1 via the wiring. As described with reference to Figure 2A, the position sensor 102 is mounted at three positions spaced about an angular interval of about 1 20 degrees about the optical axis. Each of the position sensors 102 is disposed in approximately equal intervals from the optical axis. According to this configuration, the angular displacement (rotation amount) in the X-axis, the Y-axis, and the Z-axis direction and the rotation direction around the X-axis and the Y-axis can be measured. In other words, the average 値 of the three displacement 取得 obtained by the three Z-sensor heads can be calculated as the displacement of the center of the optical element 1 in the Z-axis direction. Further, an angular displacement around the X-axis and the Y-axis can be calculated based on an angle formed by a plane including the three displacements and a plane perpendicular to the optical axis by a three-point. According to an exemplary embodiment of the present invention, the optical component 1 can be driven by the driver mechanism 110 in three directions (the Z-axis direction, the rotation around the X-axis, and the rotation around the Y-axis). . Thus, the position of the optical element 1 can be controlled based on the three displacements 由 obtained by the three-position sensor 102 in the three directions. It should be noted that the displacement obtained by the position sensors 102 in the X-axis and the γ-axis direction can be used to correct the driving amount of the wafer table 9 or provided for another optical component. The amount of drive of the drive mechanism. According to the exemplary embodiment of the present invention, the displacement of the target member 13 23 mounted on the optical element 1 is detected. However, the displacement of the optical component 1 or the support frame 104 can be detected. In this configuration, the difference in the tilt between the optical component 1 and the support frame 104 can also be reduced by the deformation of the support frame 1 〇4. For example, by detecting the displacement of the optical component 1 or the target member 123 mounted on the optical component 1, the deformation of the support frame 104 or the tilt of the support frame 104 and the optical component 1 can be reduced. The measurement error of the difference. Further, the optical element 1 can be deformed by gravity in a direction different from those supported by the protruding portion 106 in the optical axis direction. In addition, when the optical component 1 is rotated around the X-axis or the Y-axis by the driver mechanism 1, the support frame 104 may be slightly deformed. According to the exemplary embodiment of the present invention, the portion of the protruding portion 106 that contacts the optical element 1 and the portion of the target member 1 2 3 that is to be detected by the position sensor 102 are substantially Located in the same direction in the direction of rotation around a rotating shaft. In this regard, the contact portion of the protruding portion 106 contacting the optical element 1 substantially exists on a first plane, and the rotation axis is perpendicular to the first plane and the axis passing through the center of gravity of the optical element 1. Then, the portion of the protruding portion 106 that contacts the optical element 1 and the allowable difference between the portions detected by the position sensor 102 in the same direction are restricted to the optical element 1 The optical sensitivity, in other words the allowable error of the optical element 1 is determined. For example, if the difference is within ± 5 degrees, in most cases, the difference does not cause a tilted angle detection error. Furthermore, the optical element 1 can be seated such that the diameter of the optical element 1 is relatively small, which does not interfere with the drive mechanism -14 - 200848828 1 1 〇. In this way, the detection can be performed, and the above-described deformation is small. In other words, the measurement error by deformation can be further reduced. Furthermore, instead of the axis of rotation passing through the center of gravity of the optical element 1, an axis perpendicular to the first plane and passing through the center of gravity of a polygon can be used as the axis of rotation, which is formed by connecting a plurality of contact portions and a straight line . Naturally, the axis of rotation through the center of gravity of the optical element 1 can coincide with the axis passing through the center of gravity of the polygon. According to an exemplary embodiment of the present invention, the optical axis of the optical element 1 coincides with the axis of rotation. However, the invention can also be applied to a case where the optical axis does not coincide with the axis of rotation. This case will be described in this third exemplary embodiment. In the first exemplary embodiment, the optical axis can be replaced by the above-described rotating shaft. Furthermore, as another alternative embodiment, with respect to the exemplary embodiment, if the number of the contact portions and the sensors are three or more, the connection between the plurality of contact portions and the straight line is formed. The direction of the vertices of the polygons may substantially coincide with the direction of the vertices of the polygon formed by connecting the portions detected by the sensors with the straight lines. As described above, the position sensor 102 detects the relative displacement of the optical element 1 or the target member 132 to the lens barrel 11. Next, the details of the drive mechanism 110 will be described. Figure 4 is an exploded plan view of the actuator member 110 as viewed from the direction of the optical axis. Fig. 4B is a side view, and Fig. 4C is a perspective view. The driver mechanism 1 1 includes the piezoelectric actuator 1 1 2, the main body 111 transmitting the displacement of the piezoelectric actuator 112, and a change transmitted by the main -15-200848828 body 11 1 The direction of the displacement changes direction member 1 1 5. The piezoelectric actuator 112 includes a driving source, an electrostrictive element and an electrode system are alternately built in the driving source, and an expandable airtight cylindrical container configured to accommodate the driving source. The length of the piezoelectric actuator 112 is approximately proportional to an applied voltage in the X-axis direction. It should be noted that although a piezoelectric actuator is used in the exemplary embodiment of the present invention, a direct acting member having a combination of a motor and a ball screw can be used. The main body 11 1 has a shape of an approximate "H" constituting a link member, and includes a plurality of links (e.g., 1 1 1 a, 1 1 1 b, and 1 1 1 h). The redirecting member 1 15 has two apertures and includes a plurality of links (e.g., 1 15 a, 1 1 5 b, 1 1 5 C, and 1 15 5 ) that form another linkage member. According to these link members, the displacement of the piezoelectric actuator 112 in the X direction is transmitted from the main body 11 1 to the change direction member 1 i 5 , and again by the direction changing member 115 The output is taken as the displacement in the Z direction. Details of the link mechanism will be described below. Next, the manufacturing method of the main body 111 and the direction changing member 115 will be described. First, the primary body or the outer shape of the link member is formed by processing an underlying material, by milling, or by wire discharge machining, the underlayer material being a metal block. Next, after forming a screw hole for the fixing link 11 1 h by a drilling tool, before making a thread for a mounting screw hole and a vent hole for the mounting screw hole, The holes are made by the sides of the displacement recovery links 1 1 1 a and 1 1 1 b. Then, a piezoelectric adjusting screw hole 1丨丨m for the piezoelectric adjusting screw 1 1 3 is formed. -16- 200848828 Similarly, the shape changing member 丨丨5 or the outer shape of the connecting rod member is formed by processing an underlying material, by milling or by wire discharge machining, and the underlying material is a Metal block. Next, after forming a hole before the thread for mounting the screw hole i丨5 j of a lens frame, a hole before the thread for the mounting screw hole and a vent hole for the mounting screw hole are formed. Formed on both sides of the block. Then, the lens frame mounting screw holes 1 1 5j and a hole before the threads for the screw holes of the horizontal links 1 15 5 and 1 15 5 are formed. The procedure for its A' group §5^ The drive unit 1 1 将 will be described. First, the displacement recovery links 1 1 1 a and 1 1 1 b and the connecting links 1111 and 11f are inserted into the two openings formed in the direction changing member 115. Next, the displacement recovery links and the connecting links are connected by changing the component joint screws 1 16 . Then, the piezoelectric actuator 1 1 2 is fixed to the displacement recovery links 1 1 1 a and 1 1 1 b via the piezoelectric receiving links 1 1 1 q and 1 1 1 r. After that, by pressing the piezoelectric adjusting screws 1 1 3 from the outer faces of the piezoelectric adjusting screw holes 1 1 1 m into the displacement restoring links 111a and 111b, the piezoelectric actuator 112 is Set to the piezoelectric receiving links 1 1 1 q and 1 1 1 r. As described above, the piezoelectric adjusting screw 1 13 is used to adjust the dimensional error of the piezoelectric actuator 112, and is used to provide a preload. Since the piezoelectric adjustment screw Π 3 is screwed into the displacement recovery link 1 1 1 a or 1 1 1 b is substantially proportional to the number of preloads of the piezoelectric actuator 1 1 2, The effect caused by the change in the characteristics of the piezoelectric actuator 1 1 2 can be reduced by adjusting this amount. -17- 200848828 The piezoelectric adjusting screw 1 1 3 is screwed into the displacement recovery link. The amount can be adjusted by a telescopic gauge. For example, the number of movements of a lens frame drive 1 1 5 g in the Z-axis direction can be measured by a telescopic gauge, and the piezoelectric adjustment screw 11 3 can be held in place by a nut. Finally, the drive member mounting screw is used, the undisplaced portion of the direction changing member, and the fixed link 111h are fixed to the flat portion of the through hole, and the assembly process is terminated. In Fig. 4C, the directional member 1 15 is fixed to the lens barrel at its bottom at three positions, which contributes to the prevention of the measurement caused by the driving force of the actuator member. If the redirecting member 1 15 is not at its bottom to the lens barrel 11 at the three positions, the driving force is transmitted to the lens barrel 11, an unnecessary deformation can be generated, and one of the position sensors 102 The installation can be deformed. If the lens barrel 11 is made rigid, such as by thickening its flat portion, the entire field of the bottom side of the direction changing member 115 can be joined to the lens barrel 11. Next, the movement of the link member of the main body 1 1 1 changing direction member 1 15 will be described with reference to Figs. 5A and 5B. Figures 5A and 5B show the drive mechanism 10, as shown in the accompanying versions of Figures 4A and 4B. The displacement recovery links 1 1 1 a and 1 1 1 b are connected to the piezoelectric receiving links 11 lq and 1 1 lr via elastic hinges and H21. Furthermore, the equal displacement recovery links 1 1 1 a and 1 1 1 b are connected to the fixed link Π 1 h via the elastic hinge Η 1 2 . Furthermore, the displacement recovery links and the 1 1 lb are connected to the connected links via the elastic hinges H1 3 and H23 and the position 115 is changed by the lens barrel 1 1 〇=tp in which the δ wu is fixed so that the side is added The area and the description HI 1 , the Η 22 111a connecting rod -18- 200848828 1 1 le and 1 1 If. The positions of the elastic hinges can be adjusted by the above-mentioned piezoelectric adjusting screws 1 1 3 which are provided on both sides of the piezoelectric receiving links 1 1 1 q and 1 1 1 r. The elastic hinges H11, H12 and Η 13 provided on the main body 111 can be aligned in a line parallel to the Y axis, and the elastic hinges Η 21, Η 22 and Η 23 can also be viewed from the viewpoint of motion accuracy. Aligned in a line parallel to the x-axis. When a voltage system is applied to the two electrode terminals (not shown) of the piezoelectric actuator 112, the entire length of the piezoelectric actuator 112 extends in the X-axis direction by a length dL. Then, the piezoelectric receiving link 1 1 1 q is displaced to the left side up to dXl = dL/2, and the piezoelectric receiving link 111r is displaced to the right side up to dX2 = dL/2, as shown in Fig. 5A. As a result, the displacement recovery link 1 1 1 a rotates around the Z axis at a slight angle with the hinge Η 1 2 at the center, and the connecting link 1 1 1 e is displaced to the right side up to dX3 ° Similarly, the displacement recovery link 1 1 1 b rotates around the Z axis at a slight angle with the hinge H22 at the center, and the connection link 1 1 If is displaced to the right side up to dX4. As illustrated in FIG. 5A, before the displacement of the piezoelectric actuator 112, as indicated by a solid line, if the length of each of the displacement recovery links 1 1 1 a and 111b is defined For a + b, the displacement dX3 and each of them will be b/a times the displacements dX1 and dX2. According to a specific embodiment of the present exemplary embodiment, this magnification is defined as the geometric magnification α of the main body 11 1 . When the displacement recovery links 1 1 1 a and 1 1 1 b are deformed by bending, or when the elastic hinges are excessively stretched, they may occur when the geometric magnification α -19- 200848828 is reduced. A drive loss should be paid extra attention to the shape of the links. As illustrated in Fig. 5B, the displacements of the connecting links 1 1 1 e and 1 1 1 f in the X-axis direction are transmitted to the horizontal links 115a and 115b of the direction changing member 115. When the horizontal links 115a and 115b are displaced in the X-axis direction, the X-axis arrangement is rotated at an angle 0 to change the direction links 115c and 115d, and is coupled to the change direction links. The lens frame drive link 1 1 5 g of 1 1 5 c and 1 1 5 d is displaced in the Z-axis direction by a length dZ5. The horizontal links 1 15a and 1 15b are coupled to the change direction links 1 15c and 1 15d via elastic hinges H15 and H25, and the direction changing links 115c and 115d and the lens frame drive link 115g are connected. It is connected via elastic hinges Η 14 and H24. The displacement dZ5 is substantially 0 times the cot of the displacement (average 値) of the horizontal links 1 15a and 1 15b. According to the exemplary embodiment of the present invention, this magnification is defined as the geometric magnification /3 of the direction changing member 115. The geometric magnification of the entire actuator mechanism i i 包括 including the main body 11 1 and the direction changing member 丨 5 is expressed as a geometric magnification r. The geometric magnification 7 is the product of the geometrical magnification of the main body Π 1 and the direction changing member i 5 5 (^ χ stone) ° In order to restore a large displacement H2 from the small displacement dL of the piezoelectric actuator 1 1 2, In order to increase the driving range of the optical element 1, "at least one of the 々 and 々 may be large. By reducing the shape of the displacement recovery link n 〗 〖 and 1 1 1 b shape parameter "a" and increase the shape parameter "b", the geometry -20-200848828 magnification α can be made large. The geometric magnification /3 can be made large by reducing the angle 0. However, increasing the length b leads to an increase in the lens barrel The diameter, and may not meet the design constraints. On the other hand, increasing the magnification ratio will result in a lower natural frequency of the actuator member 1 1 , which is transmitted to the optical component, for example, from the outside of the lens barrel 11 The vibration of 1 causes a degradation in the characteristics of a pattern image or a decrease in the driving speed, and is considered in this way. Considering the vibration, the geometric magnification r can be 0. 7 and 2. Between 0. Further, considering the space in the Z-axis direction, the angle 0 formed between the changing direction links 115c and U5d and the X-axis can be set within a range of 30 to 60 degrees. In this case, the geometric magnification /3 can be about 0. 57 and 1. Between 72. As described above, according to the extension of the piezoelectric actuator 112, the lens frame drive link 1 1 5 g is displaced in the Z-axis direction. The lens frame drive link 1 1 5 g can be displaced only in the Z-axis direction and is not displaced in the X-axis and the Y-axis direction. Accordingly, an auxiliary link is provided. The support links 115e and 115f connected to the left and right sides of the lens frame drive link 11 5 g control the displacement of the lens frame drive link 115g in the X-axis direction. According to the support links 115e and 115f, the lens frame drive link 1 1 5 g is movable in the Z-axis direction but cannot move in the X-axis direction. Additionally, support links 1 15s and 115t are provided to control the displacement of the lens frame drive link 115g in the Y-axis direction. The support links 1 1 5 s and 1 1 5 t are coupled to the water 21 - 200848828 flat links 1 15a and 1 15b via elastic hinges Η 16 and H2 6 and further connected via elastic hinges HI 7 To a fixed link 115w. The support links 115s are disposed closer to the center of the horizontal links 115a and 115b and limit the horizontal links 1 1 5 a and 1 1 5 b in the Y-axis direction, thereby allowing them to The movement in the X-axis direction. Since the horizontal links 115a and 115b are restricted in the Y-axis direction, the direction changing links 1 1 5 c and 1 1 5 d and the through-driving link 1 1 5 g move in the Y-axis direction. Is limited. According to the configuration, the area of the lens screw hole 1 1 5 j in the lens frame drive link 1 1 5 g is displaced only in the Z-axis direction and not in the Y-axis direction. Accordingly, the support frame 104 coupled to the lens link 115g can correctly assemble the main body 11 1 in the Z-axis direction such that the displacements restore each of the I and 111b and the elasticity Each of the hinges H12 and H22 rotates. Thus, in a strict sense, the horizontal links 115a and 115b of the changing side 115 tend to be slightly displaced in the γ-axis direction, and the lens frame driving link 1 1 5 g tends to the root flat connecting rod 115a and The displacement of 115b is displaced in the Y-axis direction. The displacement is controlled by the auxiliary links and the control is not sufficiently dependent on the drive accuracy. This displacement, which is different from the displacement in the Z-axis direction, deforms the support frame 104 and can further cause the lens to cause deterioration of the optical performance. In this way, it is desirable to limit the lens frame drive link 1 1 5 g to the { and H27 • 1 51 line ends in the Y-axis direction, and the moving mirror frame is mounted on the frame. The X-frame drive drive 111 111a causes a deformation in the component to be caused by the water, and can be slightly displaced by 0 -22- 200848828. The actuator 1 1 2 is opposite to the lens as described above. The cartridge 1 1 drives the support frame 104. Next, an optical element control system 20 configured to control the optical element will be described with reference to FIG. The optical component control system 20 includes a plurality of optical component central units (CPUs) (or control circuits) 22 that are grouped to form control optical components. Each optical component CPU 22 controls the drive of each optical component based on the output from the positioners 102. A tri-piezoelectric 21 and three-position sensor 102 are connected to each optical element CPU. The piezoelectric actuator 112 is connected to each piezoelectric actuator 21. Each sensor 102 includes two sensors, as described above. A sensor detects the displacement in the direction of the optical axis and another sensor is used for the displacement in the radial direction. Further, each of the optical elements 22 which are grouped to control the optical element is connected to an exposure apparatus CPU 23 which is grouped to control the apparatus. The exposure device CPU 23 is connected to a vibration isolation mechanism system 24, a lighting control system 25 configured to control the intensity of the illumination mode line of the illumination unit 4, a reticle stage control system 26, a wafer table control system 2 7. Next, a control sequence for the optical element using the optical control system 20 illustrated in Fig. 6 will be described with reference to Fig. 7. In step S101, the optical component CPU 22 communicates with the exposure CPU 23 to start the optical component driving routine. In step S103, the optical component CPU 22 processes the complex senser 22 by the exposure of the support member 1 . The system detects the exposure control of the CPU and the optical device, and the component device optical device -23·200848828 A lookup table including information for the driving waveform of the optical component 1 is taken, and the data is retrieved from the lookup table. This lookup table includes correction parameters in the ~ illumination mode, such as the drive correction amount for the optical element 1, the drive waveform for the instantaneous correction of the various types of aberrations generated during the scan, and one for correction The amount of correction of the change in the optical characteristics of the optical element 1. When an illumination light is absorbed by the optical element, a change in the optical characteristics of the optical element 1 occurs by, for example, heat generation. Next, in step S105, the optical component CPU 22 detects the surrounding pressure around the optical component 1 with a pressure sensor (not shown). Based on this air pressure, the optical element CPU 22 calculates a correction amount for correcting the position of the optical element 1. By correcting the position of the optical element 1 in this manner, the effect by the refractive index change due to the air pressure can be reduced. Secondly, in step S107, the optical element CPU 22 is based on the steps S 1 0 3 and S 1 The information obtained in 0 5 generates a driving waveform for the optical element 1 in the Z axis, the 0 X, and the Y direction. In step S1 09, the optical element CPU 22 converts the axis of the waveform generated in step S107 in the triaxial direction (Z, 0x, and 0y) into a function for each driver member 1 1 〇 The driving waveform in the Z-axis direction (Za, Zb, Zc). In step SI 1 1 , the optical element CPU 22 waits until it receives a drive start command from the exposure device CPU 23. If the optical element CPU 22 does not receive the drive start command (NO in step S111), the C P U 2 2 waits in this state. If the optical component -24, 200848828 CPU 22 receives the drive start command (YES in step si 1 1), then in step S13, the optical component CPU 22 starts driving the optical component 1 in step S1 13 The optical component CPU 22 drives the optical component 1 while monitoring the output from the position sensors 102 in accordance with the driving waveforms generated in step S1 09. After the process passes through steps S101 to S113, an optical element driving example stroke is terminated. This routine is repeated when the process continues to step S1 15 . By performing the above process, the image forming performance of the optical element 1 can be improved. Furthermore, by performing similar control of the driving of the plurality of optical elements 1, the entire image forming performance of the projection optical system 7 can be optimized, and the pattern of the reticle 5 can be projected onto the wafer with high accuracy. 8 on. Second Exemplary Embodiment Next, a holding device for an optical element according to a second exemplary embodiment of the present invention will be described with reference to Figs. 8A to 9B. Components that are similar to those in the first exemplary embodiment are labeled with the same reference numerals, and those not mentioned in the exemplary embodiment of the present invention are considered similar to the first exemplary embodiment. Fig. 8A is an internal plan view of the lens barrel 11 illustrated in Fig. 1, as viewed from the direction of the optical axis. Figure 8B is a cross-sectional view taken along line 8B-8B of Figure 8A. The holding device 200 includes a support frame (support member) 104. -25- 200848828 The support frame 104 contacts the periphery of the optical element 1 at a plurality of positions and supports the optical element 1. Furthermore, the holding device 200 includes a position sensor 102 configured to detect a displacement of the optical component 1 or a target member mounted on the optical component 1; and a driver mechanism including a The actuators that move the optical element 1 based on the output from the position sensor 102 are grouped. The position sensor 102 is disposed at a plurality of positions. The support frame 104 contacts the optical element 1 in a direction of the optical axis in a protruding portion (support portion) 106. The protruding portion is disposed on the support frame 104 and supports the optical element 1. The optical element 1 is supported in the radial direction by an adhesive that breaks into the small gap between the support frame 104 and the optical element 1. The projections 106 are provided along the periphery of the optical element 1 in three positions angularly spaced about 1 20 degrees from the optical axis. In other words, the support frame 104 supports the optical element 1° in the three positions surrounding the optical axis at equal intervals in the rotational direction. The six-dimensional groove system is provided along the support frame supporting the optical element 1. Around 1 04. Each of the three grooves from the six grooves is joined to an output portion of the drive member 110 by a support frame mounting screw 105. Furthermore, the remaining slots are disposed in a position opposite the position sensors 102. At the inner side of the slot of the support frame 104, the size of the holding device 200 can be reduced by configuring a portion detected by the position sensor 102. The grooves in the exemplary embodiment of the present invention can be made smaller than those in the first exemplary embodiment, and further, the three grooves can be omitted. -26- 200848828 The driver mechanism 110 and the position sensor 102 are disposed around the optical axis in three positions of angular separation of approximately 1 20 degrees. The actuator member 110 (or piezoelectric actuator 1 1 2) and the position sensor 102 are displaced by 60 degrees with respect to each other. This configuration contributes to improved space efficiency and reduces the size of the holding device 200. Figure 9A is a detailed illustration of the position sensor 102 illustrated in Figure 8A. The position sensor 102 includes a first sensor 1 24 mounted on the lens barrel 11 and configured to detect the relative displacement of the support frame 104 to the lens barrel 11. Furthermore, the position sensor 102 includes a second sensor 125 mounted on the support frame 104 and configured to detect the optical component 1 or a target component mounted on the optical component 1. The relative position of the support frame 104 to the 131. Figure 9A illustrates an example in which the second sensor 125 detects the position of the target member 132. The first sensor 1 24 includes a sensor holder 126 mounted on the lens barrel and a sensor head screwed to the sensor holder 126. The sensor head includes a Ζ-sensor head 127 and an R-sensor head 128. The Ζ-sensor head 127 detects the relative displacement in the optical axis direction. The R-sensor head 128 senses a relative displacement in a radial direction perpendicular to the optical axis. Furthermore, the portion to be detected by the Ζ-sensor head 127 and the R-sensor head 182 is attached to the support frame 104. In accordance with an exemplary embodiment of the present invention, a plane perpendicular to the optical axis of the support frame 104 and a plane perpendicular to the radial direction of the support frame 104 are set to be detected. However, the target member having the portion to be inspected may be fixed to the support frame 104 by adhesion, welding -27-200848828, or screwing. FIG. 9B is an exploded view of the second sensor 125. The second position sensor 1 2 5 includes a sensor bracket 1 29 disposed in the support frame 104, and a sensor head fixed to the sensor bracket 1 29 by screws. unit. The sensor head includes a Z-sensor head 130 that is configured to detect relative displacement in the direction of the optical axis. Furthermore, a target member 131 is mounted on the optical element 1. The target member 133 is detected by the sensor head 130. The material of the target member 133 is similar to the material of the target material 1 2 3 described in the first exemplary embodiment. According to the exemplary embodiment of the present invention, the displacement of the target member 1 2 3 mounted on the optical element 1 is detected. However, the displacement of the optical element 1 itself can be detected. By detecting the displacement of the optical element 1 or the target member 123 mounted on the optical element 1, the variation due to the deformation of the support member 104 or the inclination of the support member 104 and the optical element 1 can be reduced. The measurement error caused. Furthermore, the optical element 1 can be deformed by gravity in a direction different from those supported by the protruding portions 106 in the optical axis direction. In addition, when the optical component 1 is rotated around the X-axis or the Y-axis by the driver mechanism 1 1 , the support frame 104 can be slightly deformed. According to the exemplary embodiment of the present invention, the protruding portion 106 contacts a portion of the optical component 1 and a portion to be detected by the position sensor 125 is a portion of the target member 133. It is substantially in the same direction in the direction of rotation about a rotating shaft. -28 - 200848828 In this regard, the contact portion of the protruding portion 106 contacting the optical element 1 is substantially present on a first plane, and the rotation axis is perpendicular to the first plane and passes through the optical element 1 The axis of gravity. Then, the arrangement of the protruding portion 106 to the portion of the optical element 1 and the allowable difference limit between the portions detected by the position sensor 125 in the same direction are regarded as the optical The optical sensitivity of the component 1 depends, in other words, the permissible error of the optical component 1. For example, if the difference is within 5 degrees of the soil, in most cases, the difference does not cause a tilt angle detection error. Furthermore, the optical component 1 can be positioned such that it does not interfere with the actuator member 110, even though the diameter of the optical component 1 is relatively small. In this way, the detection can be performed, and the above deformation is small. In other words, the S tongue says that the measurement error by deformation can be further reduced. Furthermore, instead of the axis of rotation passing through the center of gravity of the optical element 1, an axis perpendicular to the first plane and passing through the center of gravity of a polygon can be used as the axis of rotation, the polygon being formed by connecting a plurality of contact portions and a straight line . Naturally, the axis of rotation through the center of gravity of the optical element 1 can coincide with the axis passing through the center of gravity of the polygon. According to the exemplary embodiment of the present invention, the optical axis of the optical element 1 coincides with the above-mentioned rotation axis. However, the invention can also be applied to a case where the optical axis does not coincide with the axis of rotation. This case will be described in this third exemplary embodiment. In the second exemplary embodiment, the optical axis can be replaced by the above-described rotating shaft. Furthermore, as an alternative, with regard to the present exemplary embodiment, 'if the number of contact portions and the number of such sensors are three or more, -29 - 200848828 by connecting the plurality of contacts The direction of the plurality of vertices formed by the portion and the straight line may substantially coincide with the direction of the apex of the polygon formed by connecting the sensor portions and the straight line. The first sensor 1 24 can be mounted on the protrusion In some cases, the first sensor 124 and the second sensor 丨 25 can be configured to be optically oriented around a space for a space-saving design, since they are similar to those in the first exemplary specific narrator. 'The description of the drive mechanism 110 and the exemplary embodiment will not be repeated. As described above, the position sensor (the first sensor of the support frame 1 〇 4 relative to the lens barrel 1 1 , the detector (second sensor) 125 detects the optical element 1 Or a relative displacement of the support frame 104. Further, according to the exemplary embodiment, the second sensing angle of the tilt angle of the optical component 1 to the support frame 104 is used for control. The position of the optical element 1. The optical switching element 1 is controlled based on a combination of the output of the first sensor 1 24 and the output of the detector 1 25. Thus, when the light is tilted, even when by the support When the difference between the deformation of the frame 1 04 and the inclination of the support frame 1 〇 4, 1 can be controlled to stay at a desired position. Thus, the support frame 104 is not sufficiently rigid. It is possible to reduce the adverse effects caused by the deformation of the branch. In other words, by forming a groove on the 104 or by causing each of the detected portions 106 of the support frame 104 to be edge-shaped. At the angle of the rotation, the control system 124 in the embodiment detects and the position senses Measuring standard member 125 investigation. The detected sentence says that the second sensible component 1 is the optical component of the optical component, even when the support frame of the struts 104 is thin, the size of the -30-200848828 device and The weight can be reduced and the space efficiency can be improved. The second sensor 125 detects the tilt angle of the optical element 1 only in the optical axis direction. However, the second sensor 125 can also be configured to detect the tilt angle in the radial direction. For example, when the optical element 1 and the support frame 1 〇 4 are misaligned in the radial direction by the driving of the optical element 1 to impart a significant influence on the optical performance, the configuration is effective. of. Third Exemplary Embodiment A holding device for an optical element according to a third exemplary embodiment of the present invention will be described with reference to Figs. 10A and 10B. Figure 10 is an internal plan view of the lens barrel 11 illustrated in Figure 11 as viewed from the direction of the optical axis. Figure 10B is a cross section taken along line 10B-10B in Figure 10A. The components that are similar to those in the first exemplary embodiment are labeled with the same reference numerals, and those not mentioned in the exemplary embodiment of the present invention are considered to be similar to the first exemplary embodiment. In the first and second exemplary embodiments, a lens system is intended to be used as the optical element 1, and the position sensor 102 and the protruding portion 106 are disposed around the optical axis. In one case, where a lens is used as the optical element 1, such as in the case of a reflective optical system, as illustrated in Fig. 1A, the shape of the optical element 1 cannot be circular. In this case, the protruding portion 106 of the support frame 104 contacting the optical element 1 can be in a uniform position with respect to the center of gravity C G of the optical element 1. The chase is because the weight of the optical element 1 applied to the protruding portion 106 disposed in the three positions will become uniform by arranging the temple protruding portion 106 in the upper position, -31 - 200848828. According to the exemplary embodiment, the protruding portion i contacts a portion of the optical component 1 and a portion of the target member 133 that is detected by the position sensor 1 〇 2 is wound around The direction of rotation of a rotating shaft is substantially in the same direction. In this regard, the contact portion of the protruding portion i 〇6 contacting the optical element 1 is substantially present on the first plane, and the rotation axis is an axis perpendicular to the first plane and passing through the center of gravity of the optical element i heart. Then, the configuration of the portion of the protruding portion 106 that contacts the optical element 1 and the allowable difference between the portions detected by the position sensor 1 in the same direction are regarded as The optical sensitivity of the optical element 1 depends, in other words, the permissible error of the optical element 1. However, if the difference is within ± 5 degrees, in most cases, the difference does not cause a tilt angle detection error. Furthermore, the optical component 1 can be positioned such that it does not interfere with the actuator member 1 10 even though the diameter of the optical component 1 is relatively small. Furthermore, instead of the axis of rotation passing through the center of gravity of the optical element 1, an axis perpendicular to the first plane and passing through the center of gravity of a polygon can be used as the axis of rotation, the polygon being formed by connecting a plurality of contact portions and a straight line . The axis of rotation through the center of gravity of the optical element 1 can coincide with the axis passing through the center of gravity of the polygon. Although the degree of uniformity depends on the optical sensitivity and weight of the optical element 1, the two axes may be within a radius of 30 mm on the plane. Furthermore, as an alternative, in the case of the specific implementation of the example -32-200848828, if the number of the contact portions and the number of the sensors are three or more, by connecting the plurality of contact portions The direction of the vertices of the polygon formed by the straight line may substantially coincide with the direction of the vertices of the polygon formed by connecting the portions detected by the sensors and the straight lines. Fourth Exemplary Embodiment A holding device for an optical element according to a fourth exemplary embodiment of the present invention will be described with reference to Figs. 1 1 A and 1 1 B. In the first exemplary embodiment, the optical component 1 and the support frame 104 are bonded to the temple crying portion 106 in three positions with an adhesive. In the fourth embodiment, the optical component 1 and the support frame 104 are mechanically clamped. In Figs. 1 1 A and 1 1 B, three clip members 140 are provided as a support member for supporting the optical member 1 by being brought into contact at the three positions along the periphery of the optical element 1. Although the sensors and actuators are omitted from the drawings, they are provided as in the first and second exemplary embodiments. According to the exemplary embodiment of the present invention, the clip member 140 contacts a portion of the optical component 1 and a portion detected by the position sensor is substantially in the same direction of rotation about a rotation axis. In the direction. In this regard, the contact portion of the clip member 140 contacting the optical element 1 is substantially present on the first plane, and the shaft is perpendicular to the first plane and the axis passing through the center of gravity of the optical element 1. heart. Then, the configuration of the portion of the clip member 140 that contacts the optical component 1 and the allowable difference between the portions detected by the position sensor in the same -33-200848828 direction, Depending on the optical sensitivity of the optical element 1, in other words, an allowable error of the optical element 1. For example, if the difference is within ± 5 degrees, in most cases, the difference does not cause a tilt angle detection error. Furthermore, the optical component 1 can be positioned such that it does not interfere with the actuator member Π 0, even though the diameter of the optical component 1 is relatively small. In this way, the detection can be performed, and the above deformation is small. In other words, the measurement error by deformation can be further reduced. Further, instead of the axis of rotation passing through the center of gravity of the optical element 1, an axis perpendicular to the first plane and passing through the center of gravity of a polygon can be used as the axis of rotation. The polygon is formed by connecting a plurality of contact portions and a straight line. Naturally, the axis of rotation passing through the center of gravity of the optical element 1 can coincide with the axis passing through the center of gravity of the polygon. According to an exemplary embodiment of the present invention, the optical axis of the optical element 1 coincides with the axis of rotation. However, the invention can also be applied to a situation where the optical axis does not coincide with the axis of rotation. Furthermore, as an alternative, with respect to the exemplary embodiment of the present invention, if the number of the contact portions and the sensors are three or more, by connecting the plurality of contact portions and the line The direction of the vertices of the formed polygons may substantially coincide with the direction of the vertices of the polygon formed by connecting the portions detected by the sensors and the straight lines. It should be noted that the center of gravity of the regions of the contact portions can be regarded as a representative point of the contact region. Next, referring to Figures 12 and 13, a device manufacturing method using the above-described exposure apparatus -34-200848828 will be described. Fig. 1 is a flow chart showing an exemplary manufacturing process for a semiconductor device such as an integrated circuit (IC), a large integrated circuit (LSI), a liquid crystal display (LCD), and a charge coupled device (CCD). In Fig. 12, a semiconductor wafer is taken as an example of the semiconductor device. Step S1 is a circuit design process for designing a circuit of a semiconductor device. Step S2 is a mask manufacturing process for fabricating a mask based on the designed circuit pattern, which can be referred to as an original panel or a mask. Step S3 is a wafer fabrication process for fabricating wafers from tantalum or equivalent material, which wafer can be referred to as a substrate. Step S3 can be a reticle manufacturing process. Step S4 is a wafer process which can be referred to as a "pre-process" for forming an actual circuit in accordance with the lithography technique using an exposure apparatus on the wafer in accordance with the pre-prepared mask. Step S5 is an assembly process which can be referred to as "post-process" for forming a semiconductor wafer using the crystal formed in step S4. The post process includes an assembly process (e.g., dicing, bonding, etc.) and a packaging process (wafer sealing). Step S6 is an inspection process for inspecting the semiconductor device fabricated in the step S5. The inspection includes an operational confirmation test and a durability test. Step S7 is a shipping process for shipping the completed semiconductor device through the above process. As illustrated in FIG. 13, the wafer process in step S4 includes an oxidation step S1 1 for oxidizing the surface of the wafer, and a chemical vapor deposition (CVD) for forming a barrier film on the surface of the wafer. Steps S12, and # are used to form an electrode forming electrode on the wafer by evaporation to form step S13. Furthermore, the wafer process in step S4 includes an ion implantation step s 14 for implanting ions into the wafer-35-200848828, and an anti-uranium agent for coating the wafer with a photosensitive material. Process step S15, and an exposure step S16 for exposing the wafer that has been subjected to the resist treatment to light using a mask having a circuit pattern using the above-described exposure apparatus. Furthermore, the wafer process in step S4 includes a development step S17 for developing the wafer exposed in the exposure step S16, and a process for cutting different from the development step S17. An etching step S 18 of the portion of the developed resist image and a resist stripping step S 1 9 for removing the unnecessary resist left after the etching step S 18 . The process of repeating the above steps can form a majority of the circuit pattern on a wafer. According to the above exemplary embodiment of the present invention, a holding device capable of measuring the position of the optical element while reducing the measurement error can be realized, the measurement error being caused by deformation of a supporting member supporting the optical element, or by the optical The difference in inclination between the component and the support member. Although the present invention has been described with reference to the preferred embodiments thereof, it is understood that the invention is not limited to the exemplary embodiments disclosed. The scope of the following patents is to be accorded the broadest description, and all modifications, equivalent structures and functions. BRIEF DESCRIPTION OF THE DRAWINGS Exemplary embodiments, features, and aspects of the present invention are described in the accompanying drawings, and in the claims Figure 1 is a schematic view of an exemplary exposure apparatus. -36- 200848828 Figures 2A and 2B illustrate an example holding device in accordance with a first exemplary embodiment of the present invention. Figures 3A and 3B are detailed views of the example position sensor of the holding device. 4A through 4C illustrate an example drive mechanism. Figures 5A and 5B illustrate the movement of the coupling mechanism of the drive mechanism. Figure 6 illustrates an example control system that is constructed to control optical components. Figure 7 is a flow chart illustrating the control of the optical component. 8A and 8B illustrate an example holding device in accordance with a second exemplary embodiment of the present invention. Figures 9A and 9B are detailed views of an exemplary position sensor in accordance with a second exemplary embodiment of the present invention. Figures 10A and 10B illustrate an example holding device in accordance with a third exemplary embodiment of the present invention. 1A and 1 1B illustrate an example holding device in accordance with a fourth exemplary embodiment of the present invention. Fig. 1 is a flow chart showing an exemplary device manufacturing method using an exposure apparatus. Figure 1 is a flow chart showing the details of wafer processing in step S4 of the flow chart illustrated in Figure 1. Figure 14 illustrates a conventional holding device. Figure 15 illustrates another conventional holding device. [Main component symbol description] -37- 200848828 1 : Optical component 2a: Lens component 4: Illumination unit 5: Photomask 6: Photomask table 7: Projection optical system 8: Wafer 9: Wafer table 1 〇: Projection optical system 1 1 : lens barrel 1 2 : lens barrel support member 13 : main body 1 4 : vibration isolation mechanism 20 : optical element control system 2 1 : piezoelectric actuator 22 : central processing unit 23 : central processing unit 2 4 : Control System 25 : Lighting Control System 26 : Photomask Table Control System 2 7 : Wafer Table Control System 3 6a : Projection 3 6b : Projection 3 6 c : Projection - 38 - 200848828 3 8 a : movable lens 4 4 a . Inner ring portion 4 4 b : outer ring portion 46 : lens unit 5 〇 : actuator 59 : connecting arm 60 b : actuator 6 0 c : actuator 6 2 a : lens barrel 62b : lens barrel 62c : Lens tube 64a : Displacement detector 64b : Displacement detector 72 : Sensor 1 0 0 : Holding device 102 : Position sensor 1 〇 4 : Support frame 1 〇 5 : Mounting screw 106 : Projection 1 1 0 : Drive mechanism 1 η : Main body 1 1 1 a : Connecting rod 1 1 1 b : Connecting rod 1 1 1 e : Connecting rod -39 200848828 1 1 1 f : Connecting rod 1 1 1 h : Connecting rod 111m: Piezoelectric adjustment screw hole 1 1 1 q : Connecting rod 1 1 1 r : Connecting rod 1 1 2 : Piezoelectric actuator 1 1 3 : Piezoelectric adjusting screw 1 1 5 : Changing direction member 1 1 5 a : Connecting rod 115b: connecting rod 1 1 5 C : connecting rod 1 1 5 d : connecting rod 1 1 5 e : connecting rod 1 1 5 f : connecting rod 1 1 5 g : connecting rod 1 15j : screw hole 1 1 5 s : Screw hole 1 1 5 t : Screw hole 1 1 5 w : Screw hole 1 1 6 : Connector screw 120 : Z-Sensor head 12 1 : R-Sensor head 122 : Sensor bracket 123 : Target member -40 - 200848828 124 : First sensor 1 2 5 : Second sensor 1 2 6 : Sensor bracket 127 : Z-sensor head 128 : R- Detector head 129: sensor bracket 130: Z-sensor head 1 3 1 : target member 140: clip mechanism 2 0 0: holding device Η 1 1 : hinge Η 1 2 : hinge Η 1 3 : Hinges Η 1 4 : Hinges Η 1 5 : Hinges Η 1 6 : Hinges Η 1 7 : Hinges Η 21 : Hinges Η 22 : Hinges Η 23 : Hinges Η 24 : Hinges Η 25 : Hinges Η 26 : Hinges Η 27 : Hinge