TW200848531A - Stage for sputtering and sputtering apparatus using same - Google Patents

Stage for sputtering and sputtering apparatus using same Download PDF

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Publication number
TW200848531A
TW200848531A TW96119699A TW96119699A TW200848531A TW 200848531 A TW200848531 A TW 200848531A TW 96119699 A TW96119699 A TW 96119699A TW 96119699 A TW96119699 A TW 96119699A TW 200848531 A TW200848531 A TW 200848531A
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Taiwan
Prior art keywords
carrier
scope
protrusion
cooling fluid
steel
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TW96119699A
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Chinese (zh)
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TWI396763B (en
Inventor
Mong-Tung Lin
Ching-Chou Chang
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Hon Hai Prec Ind Co Ltd
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Priority to TW96119699A priority Critical patent/TWI396763B/en
Publication of TW200848531A publication Critical patent/TW200848531A/en
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Publication of TWI396763B publication Critical patent/TWI396763B/en

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Abstract

The present invention relates to a stage for sputtering including a first carrier and a second hollow carrier. The first carrier includes a carrier part and an opposite bottom part. The carrier part extrudes at least one protrusion. The shape of the protrusion is assorted with the workpiece to be sputtering. The protrusion is used for carrying the workpiece and transmits the heat to the bottom part of the first carrier. The second carrier, connecting with the bottom part of the first carrier tightly, is to absorbing the heat from the bottom of the first carrier. When sputtering, the heat of the workpiece will be transmitted from the first carrier to the second carrier. So it can avoid the workpiece being hurt by the high temperature. The present invention also relates to a sputtering apparatus.

Description

200848531 ,九、發明說明: •【發明所屬之技術領域】 本發明涉及-種鑛膜設備,尤其涉及—種減鑛式 承載台及镀膜机台。 、 【先前技術】 鍍膜技術係-種新穎之材料合成與加工新技術, 面,程技術領域之重要組成部分。鍍膜技術係利用物理、、 二j手&於固體表面塗覆—層特殊性能之薄膜,從而使固 體表面具有耐磨損、耐高溫、耐腐钱、抗氧化、防輕射、 Γ、導磁或絕緣等許多優越性能,從而制提高產品品 二用延長產品#命、節約能源和獲得顯著技術經濟效益之 2用。驗係㈣技術tn其制輝光 I子去撞_,絲材内之原子撞出而沈積於基材上。 m具有極佳之沈積效率、大尺寸之沈積厚度控制、 精確之成份_及較低之製造成本等伽,因此於 之應用非常廣泛。 、 件:t 了防止手機相機光學模組中之鏡筒、鏡座等元 =機中其他元件之電磁幹擾,通常需要於光學模組 鏡同、鏡座等組件上鐘一層抗職(Electro Magnetic et—。於業界,常用連續式濺鍵機㈣ine 機且Γ/Γ鏡筒、鏡座等元件進行賴,這種連續式濺鍍 產量高且鍍膜品質好等優點。然而,這種 倉匕=歲鍍機所包括之用於承載待鑛元件之載台之散熱性 土,導致載臺上之元件溫度過高進而造成扭曲變形等 6 200848531 •損傷。 .【發明内容】 有鑒'於此,提供— 台及鍍膜機台實為必^種散熱性能良好之濺鑛式鍍膜承載 本龟明提供了 一種濺 -載具及一中空之第二着又式鍍膜承载台,其包括:-第 與其相對之底部。兮°該第一載具包括一承載部及 具有與待鑛元件相::合:伸出至少一個突起,該突起 待鍍元件之熱量傳遞至Π呈用於承載待鍵元件,並將 第-載具之底部緊心Γ载具之底部。該第二载具與該 遞之熱量。 一合,用於吸收該第-載具之底部傳 本^明逛提供了—種賤鑛式 體二_源及—承载台,該承載台 第=:腔 之底部。該承S延具包括—承載部及與其相對 鍍元件相配合之形狀,用^—個突起’該突起具有與待 之熱量傳遞至第載待鑛元件’並將一 之底部緊密結合,用於吸收哕 載/、/、々弟—载具 相較於先前技術,哕μ十 部傳遞之熱量。 待錄膜元件之第膜承載台具有用於承載 獏之元件進行鑛膜時,待鑛膜之元:=配二於對待錢 於該第-載具及突起均由導妖性 起上’由 蚀一从長 …、1王犯良好之金屬製成,且佐 ’“套設於該突起之上,使待鍍元件與該突起及第—载 200848531 ί =觸面積最ΐ,可使待鍍元件之散熱面積達到最大, 而防二件之熱里可以通過第—載具傳導至該第二載具從 待鍍膜之元件上之溫度過高進而對其造成損傷。 【貫施方式】 :面將結合附圖’對本發明作進—步之詳細說明。 哉Α/閱圖1及圖2’本發明實施例提供之錢鑛式鍍膜承 載'⑽包括-第一載具10及—中空之第二載具2〇。 11及盘^载具1G為長方形平板狀結構,其包括—承載部 及”其相對之底部12,該承載部u延伸出至少一個突 1Γ-,该突起13具有與待鍍元件相配合之形狀,用於承載 {,又70件,亚將待鍍元件之熱量傳遞至第一載具之底部12。 该待鍍S件將套設於該至少—個突起13上。該至少— 们大起13為複數,其均勾排布於該第—載具⑺上。兮突 狀與亀元件相互配合。例如:此處待:膜 ^ '種鏡同,該鏡筒係一種中空圓柱體結構,那麼 大ί 13之結構可以設置成圓柱體,該圓柱體突起之大小盘 鏡筒内部之空間大小相同,以使該待鑛元件,即鏡筒之内、 跟:突起完全接觸,而達到接觸面積最大 熱量之傳遞。 J V、 可以理解的是,該突起13亦可以為其他結構 方體、圓錐體或其他不規則形狀,只要能夠承載待' ::亚使待鍍膜之元件與該突起13及承載部u緊密接觸 可以理解的是,該第一載具10之結構亦可以係其他結 8 200848531 -構,例如圓形板狀結構,扇形或其他形 .具體需要而設計。 、,/、可以根據 戎第一載具ίο之材料應選自導熱性处 料,例如··銅、銘、鐵、鋅、鈇 犯〈之金屬材 ^ , 欽鋼1鋼、不錄鋼,及 、’:、:、鐵、鎳、鈦之中至少兩種金屬之合金等。於本實 鈀例中,该第一載具10所用材料為銅。 、 該第二載具20為中空結構之長方 兮坌-哉目Α V/或其他形狀結構, ,載/、20_ 一載具1〇之底部。緊密結合,用於 吸收該苐一載具10之底部12傳遞之熱量。 、200848531, IX. Description of the invention: • Technical field to which the invention pertains The invention relates to a type of mineral film device, in particular to a reduced-mine type bearing platform and a coating machine. [Prior Art] Coating technology is a new component of the new technology of synthesis and processing of materials, surface and process technology. The coating technology utilizes the physical, the second hand & the solid surface coating - the layer of special properties of the film, so that the solid surface has wear resistance, high temperature resistance, corrosion resistance, oxidation resistance, anti-light, Γ, guide Many superior properties such as magnetic or insulation, so as to improve the product product, extend the product, save energy and obtain significant technical and economic benefits. Inspection system (4) Technology tn its glow G I strikes _, the atoms in the wire are knocked out and deposited on the substrate. m has excellent deposition efficiency, large thickness deposition thickness control, precise composition _ and lower manufacturing cost, so it is widely used. , piece: t to prevent the electromagnetic interference of the lens barrel, mirror base, etc. in the optical module of the mobile phone camera, etc., usually need to be on the optical module mirror, the mirror base and other components on the layer of a layer of resistance (Electro Magnetic Et—In the industry, it is commonly used in continuous splashing machine (4) ine machine and Γ/Γ lens barrel, mirror holder and other components. This continuous sputtering has high output and good coating quality. However, this warehouse = The heat-dissipating soil included in the stage for carrying the components to be mined, causing the temperature of the components on the stage to be too high and causing distortion, etc. 6 200848531 • Damage. [Invention] Providing - the table and the coating machine are really necessary to have a good heat dissipation performance of the splash coating. This turtle provides a splash-carrier and a hollow second coating carrier, including: - The bottom portion is opposite to the bottom portion. The first carrier includes a bearing portion and has a phase with the component to be mined: projecting at least one protrusion, the heat of the protrusion to be plated is transmitted to the crucible for carrying the component to be keyed. And the bottom of the first carrier is tightly loaded with the vehicle The bottom of the second carrier and the heat of the transfer, for absorbing the bottom of the first carrier, and providing a type of sputum-type body _ source and carrier, the carrier台第=: the bottom of the cavity. The bearing S includes a bearing portion and a shape matched with its opposite plating element, and the protrusion has the heat to be transferred to the first to-be-go component The bottom of the bottom is tightly combined to absorb the heat transferred from the 哕/// 々 —-carrier compared to the prior art, 十μ. The membrane carrier of the membrane element to be recorded has a component for carrying 貘When carrying out the mineral film, the element of the mineral film: = match the two to treat the money in the first - the vehicle and the protrusions are all made by the eclipse from the eclipse, and the king is made of good metal, and佐's sleeved on the protrusion, so that the component to be plated and the protrusion and the first contact area are the most sturdy, so that the heat dissipation area of the component to be plated can be maximized, and the heat of the two pieces can be passed. The first carrier is conducted to the second carrier from the temperature of the component to be coated and the temperature is too high to cause damage thereto [Comprehensive method]: The surface will be described in detail with reference to the accompanying drawings. 哉Α/Reading FIG. 1 and FIG. 2' The money mining type coating bearing provided by the embodiment of the present invention '(10) includes - first load The first carrier has a 10 and a hollow carrier. The 11 and the carrier 1G are rectangular flat-shaped structures including a carrier portion and an opposite bottom portion 12 thereof. The carrier portion u extends at least one protrusion. The protrusion 13 has a shape matching with the component to be plated for carrying {, 70 pieces, and transferring the heat of the component to be plated to the bottom 12 of the first carrier. The S piece to be plated will be sleeved on the At least one of the protrusions 13. The at least one of the plurality 13 is a plurality of hooks which are arranged on the first carrier (7). The protrusions and the cymbal elements cooperate with each other. For example: here: film ^ ' The mirror tube is a hollow cylindrical structure, and the structure of the large cylinder can be set as a cylinder. The size of the cylinder protrusion is the same as the space inside the lens barrel, so that the component to be mined, that is, the lens barrel Within, followed by: the protrusion is in full contact, and the maximum heat transfer of the contact area is achieved. JV, it can be understood that the protrusion 13 can also be other structural squares, cones or other irregular shapes, as long as it can carry the elements to be coated with the protrusions 13 and the bearing portion u. It is understood that the structure of the first carrier 10 can also be designed as other structures 8 200848531, such as a circular plate structure, a fan shape or other shapes. , /, can be based on 戎 first vehicle ίο material should be selected from thermal conductivity materials, such as · · copper, Ming, iron, zinc, 鈇 〈 之 之 之 之 之 之 之 之 钦 钦 钦 钦 钦 钦 钦 钦 钦 钦 钦 钦 钦And , ':,:, alloy of at least two metals such as iron, nickel and titanium. In the present palladium example, the material used for the first carrier 10 is copper. The second carrier 20 is a rectangular structure of a hollow structure, a V-or other shape structure, and a bottom of a carrier. Tightly coupled to absorb heat transferred from the bottom 12 of the carrier. ,

、於本實施例中,該第-載具1(Mnt空之第二載具2Q 均為平板形結構。可以理解的是,並 其具體形狀和結構可以 根據K際而要而设計,並不局限於此結構。 體2 /tUrf m㈣容有冷卻流體21,該冷卻流 可為:,屯水、氨水、甲醇、丙酮、庚烷或其混合液體, 率二:二21中亦可加入導熱粒子進-步提高導熱效 、不只奴官、奈米碳球、銅奈米粉或以上至少兩種成 分組合之粒子。 該第二載具20上具有進液口 22和出液口幻,該進液 士口 22和出液口 23分設於該第二載具加上。於本實施例中, -進液口 22和出液口 23分設於該長方形結構第二載具加 ^縱向方向之兩端’該冷卻流體21從該進液π 22流入並 從出液口曰23流出。可以理解的是,該進液口 22和出液口 23之數夏及設置位置可以根據實際需要進行設計。 可以理解的是,該第二載具2〇可以為其他形狀結構, 9 200848531 例如正方形,圓形等等’其亦可以係非— 少兩個熱管構成,同時1内部 右相廡夕” 内#具有冷部流體21 ’並且亦具 有相應之進液口 22和出液口 體21。 用I /爪入或流出該冷卻流 模组及圖4,本實施例中以待鍍膜之元件係鏡頭 杈、、且之鏡同為例加以說明,賤鐘源1〇1設置於該第一載呈 1°之正上方,即與該至少—個突起13相對。該至少一個鏡 同102被^別套設於該至少一個突起13之上,並且鏡筒搬 之内土兵大起13緊密接觸,該鏡筒1〇2與該第一載且忉 ^承載部U密切結合。當該至少一個鏡筒搬被進行鍵膜 呀,冷=流體21從該進液口 22流入並從出液口 23流出。 由於該第一載具10及其突起13由導熱性能良好之金屬製 成’該鏡筒102上之熱量會經由該第一載具1〇之承載部“ 傳導至其底部12,該熱量再經由與該第一載具11之底部 12緊在接觸之第一載具2〇傳給該冷卻流體21,最終該鏡 同102上之熱量會經由從進液口 22進入並從出液口 流 出之冷卻流體21帶走,從而防止鏡筒1〇2上之溫度過高進 而損傷該鏡筒102。 本發明實施例提供之一種濺鍍式鍍膜機台,其包括一 腔體、一濺鍍源及一如上所述之承載台。該腔體係一真空 濺鍍腔體,該腔體内包括有··一濺鍍源,及一如上所述之 承載台。鍍膜時,將複數個待鍍膜元件放置於承載台上, 對其進行鍍膜。詳細過程如前所述,此處不再贅述。 綜上所述,本發明確已符合發明專利之要件,遂依法 200848531 提出專利"。惟’以上所述者僅為本 式…能以此限制本案之申請專利範圍。= 交佳實施方 技蟄之人士援依本發明之精神所作之等效修:j悉本案 應涵蓋於以下申請專利範圍内。 乂或變化,皆 【圖式簡單說明】 圖1係本發明實施例提供之濺 圖。 犋承载台之立體示意 圖2係圖1中沿IMI之截面示意圖。 膜之一狀 ^係利用® 1中承載台對待鍍膜之元件進行梦 悲、示意圖。 圖4係圖3中沿IV-IV之截面示意圖。 【主要元件符號說明】 承載台 100 承載部 11 突起 13 冷卻流體 21 出液口 23 鏡筒 102 第一載具 10 底部 12 第二載具 20 進液〇 22 濺鍍源 101 ηIn the present embodiment, the first carrier 1 (the second carrier 2M of the Mnt space is a flat plate structure. It can be understood that the specific shape and structure thereof can be designed according to the K, and It is not limited to this structure. The body 2 /tUrf m(4) contains a cooling fluid 21, which may be: hydrophobic, ammonia, methanol, acetone, heptane or a mixed liquid thereof, rate 2: The particles further improve the heat conduction effect, not only the slave, the nano carbon sphere, the copper nano powder or the combination of the above two components. The second carrier 20 has a liquid inlet 22 and a liquid outlet, and the The liquid port 22 and the liquid outlet 23 are separately disposed on the second carrier. In the embodiment, the liquid inlet 22 and the liquid outlet 23 are respectively disposed on the rectangular structure and the second carrier is added in the longitudinal direction. The two ends of the cooling fluid 21 flow from the liquid inlet π 22 and flow out from the liquid outlet port 23. It can be understood that the number of the liquid inlet port 22 and the liquid outlet port 23 can be set according to actual needs. It can be understood that the second carrier 2 can be other shape structures, 9 200848531 Shape, circle, etc. 'It can also be composed of two less heat pipes, while the inner right phase has a cold portion fluid 21 ' and also has a corresponding liquid inlet 22 and liquid outlet body 21 The I/Claw is inserted into or out of the cooling flow module and FIG. 4, in this embodiment, the component to be coated is a lens 杈, and the mirror is taken as an example, and the 贱钟源1〇1 is set in the first A carrier is directly above 1°, that is, opposite to the at least one protrusion 13. The at least one mirror 102 is sleeved on the at least one protrusion 13 and the lens barrel is moved inside. In close contact, the lens barrel 1〇2 is intimately coupled to the first carrier and the carrier U. When the at least one lens barrel is loaded with the key film, the cold=fluid 21 flows in and out of the liquid inlet port 22. The liquid port 23 flows out. Since the first carrier 10 and its protrusions 13 are made of a metal having good thermal conductivity, the heat on the lens barrel 102 is "conducted to the bottom portion 12 thereof via the carrier portion of the first carrier 1". The heat is further transmitted to the cooling fluid 21 via the first carrier 2 in close contact with the bottom portion 12 of the first carrier 11, and finally The heat of the same 102 is carried away by the cooling fluid 21 that enters from the liquid inlet 22 and flows out of the liquid outlet, thereby preventing the temperature on the lens barrel 1 2 from being excessively high and thereby damaging the lens barrel 102. A sputter coating machine includes a cavity, a sputtering source, and a carrier as described above. The cavity system is a vacuum sputtering cavity, and the cavity includes a sputtering source And a loading platform as described above. When coating, a plurality of components to be coated are placed on a carrying table and coated. The detailed process is as described above, and will not be described herein. It is clear that it has met the requirements of the invention patent, and the patent is filed according to law 200848531. However, the above mentioned is only the form... This can limit the scope of patent application in this case. = The best practice of the person in charge of the implementation of the technology in accordance with the spirit of the present invention: j This case should be covered by the following patent application. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a splash diagram provided by an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view along the IMI in FIG. 1 . One of the membranes is a dream and a schematic diagram of the components to be coated on the bearing platform of the ® 1 . Figure 4 is a schematic cross-sectional view taken along line IV-IV of Figure 3. [Main component symbol description] Carrying table 100 Bearing portion 11 Projection 13 Cooling fluid 21 Liquid outlet 23 Lens barrel 102 First carrier 10 Bottom 12 Second carrier 20 Inlet 〇 22 Sputtering source 101 η

Claims (1)

200848531 .十、申請專利範圍: .1.二錢鍍式鍍膜承載台,其改良在於,包括: 广Γ載”所述第—載具包括—承載部及*其相斜夕 底4 ’該承載部延伸出至少一個突起,該突起且T之 鍍兀件相配合之形狀,用於? /、有14待 件之^量傳遞至第—載具之底部; I將待錢凡 二 ΐ:第::具,所述第二載具與該第-载具之底部 9 帛於吸收該第i具之底部傳遞之鼓量 2·如申請專利範圍繁 …、里 中,兮第^ 、处之濺鍍式鍍膜承載台,复 :、::—用材料選自:銅、紹、鐵、錄、鈦、、 鋼蛟鋼、不錄鋼m 種金屬之合金。 杲鈦之中至少兩 中申圍弟1項所述之濺鍍式鍍膜承載台,並 中。4具和第二載具均為平板形結構。 、 4. 如申料利範圍第!項所述之_式_ 中由:Ϊ第—載具之至少一個突起,為圓柱形結構。…、 5. 如%專利11目第1項所述之鬚切ma,1 :第::載具之至少一個突起為複數,其均勻:布: 6. 如申請專·圍第!項所述之騎切膜承載台,发 中’該h之第二載具内收容有冷卻流體,該冷卻流體 為純水、氨水、甲醇、丙酮、庚统或其混合液體。 7. 如申請專利範圍第i項所述之騎切料載台,兑 中’該中空之第二載具内收容有冷卻流體,該冷卻流體 12 200848531 •具有導熱粒子,其成份為奈米碳管、夺f ——卡粉或以上至少兩種成分組合之粒子。為球、銅奈 8.:申請料範” 2制述之麵式㈣ ,立 ’該第二載具設有冷卻流體入 σ ” 9·如申嗜直剎$ τ 7 <机體出口。 中,;第:二弟1項所述之_式_承載台,其 構成: 之結構為非—體結構,由至少兩個熱管 10. —種濺鍍式鍍膜機台,其包括一腔體 至少一承截A,6 濺鍍源及 —… 載口其改良在於,該承載台包括: 弟載具’所述第一載呈包括一承恭 底部,該承恭都… 載部及與其相對之 Μ祆载邛延伸出至少一個突起, 件相配合之形狀,用於承載待鑛元件, 件之熱量傳遞至第—載具之底部; I將待鑛凡 中空之第二載具,所述第二載呈鱼芎 緊密結合,用於吸收該第一載呈;底;t之底部 兮第Γ 項所述之難讀膜機台,其令, 二:一载具所用材料選自:銅、紹、鐵、鎳、鈦、、鋼、 ;鋼、不錄鋼,或銅、紹、鐵、鎳、鈦之中至少兩種八 屬之合金。 7王夕两種金 其中 申明專利㈣第1G項所述之魏式鑛膜機台 7_载具和第二載具均為平板形結構。 其中 .言广申料利範圍第10項所述之賤鑛式鑛膜機台 14二:**具之至少一個突起,為圓柱形結構。 其中 •申請專利範圍第1G項所述之缝式鑛膜機台 13 200848531 該第一載具之至少一個突起為複數, 一載具。 /、杓勾排布於該第 ΐ5·如申請專·^㈣所述线鍍式鍍膜機台,其中, 垓中空之第二載具内收容有冷卻流體,該冷卻流 水、氨水、甲醇、丙酮、庚烷或其混合液體。 — 16·如申請專利範圍第1〇項所述之濺鍍式鍍膜機台,其中, /中二之弟一載具内收谷有冷部流體,該冷卻流體中呈 有導熱粒子,其成份為奈米碳管、奈米碳球、銅奈米粉 或以上至少兩種成分組合之粒子。 17·如申請專利範圍第項所述之濺鍍式鍍膜機台,其中, 5亥第一載具設有冷卻流體入口和冷卻流體出口。 18·如申請專利範圍第1〇項所述之濺鍍式鍍膜機台,其中, 該第二載具之結構為非一體結構,由至少兩個熱管構成。 \ 14200848531 . X. Patent application scope: .1. Two-dot plating coating carrier, the improvement thereof includes: 广Γ载" said first carrier - bearing portion and * its phase slanting bottom 4 'the bearing The portion extends at least one protrusion, and the protrusion and the plated piece of T are matched for the shape, and the amount of 14 parts is transmitted to the bottom of the first carrier; I will wait for Qian Fan Er: The second carrier and the bottom portion 9 of the first carrier are disposed to absorb the amount of the drum transmitted at the bottom of the i-th member. 2. As in the scope of the patent application, the middle portion, the second portion Sputter-coated coating carrier, complex:::-Materials selected from: copper, sho, iron, recorded, titanium, steel, steel, metal alloys of non-recorded steel. At least two of the titanium The sputter-coated coating platform described in the 1st of the brothers, and the 4th and the second carrier are both flat-shaped structures. 4. As stated in the scope of the application of the item _ Ϊ第—The at least one protrusion of the carrier is a cylindrical structure...., 5. At least one of the required to be cut as described in Item 1 of Item 11 of the patent: 1:::: From the plural, it is uniform: cloth: 6. If you apply for the cutting film carrier as described in the article, the second carrier of the h contains the cooling fluid, which is pure water. Ammonia water, methanol, acetone, heptrine or a mixture thereof 7. As claimed in the scope of claim 1, the riding of the cutting stage, in the middle of the hollow second carrier contains a cooling fluid, the cooling Fluid 12 200848531 • Has a heat-conducting particle, the composition of which is a carbon nanotube, a f--card powder or a combination of at least two components of the above. For the ball, the copper nike 8.: application of the material" 2 description of the face (4), the 'the second vehicle is equipped with cooling fluid into the σ 》 9 · If the application of the direct brake $ τ 7 < body outlet. Medium, the first: the second brother of the _ type _ carrying platform, The structure is: a non-body structure, consisting of at least two heat pipes 10. A sputter coating machine comprising a cavity at least one bearing A, 6 sputtering source and -... The carrying platform comprises: a young carrier, wherein the first loading includes a bottom of a tribute, the Cheng Gong...对 Μ祆 邛 邛 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少 至少The second load-bearing fishbone is tightly coupled for absorbing the first load-bearing; the bottom; the bottom of the t-shaped 难 兮 兮 所述 难 , , , , , , , , , , , , , , , , , Copper, Shao, iron, nickel, titanium, steel, steel, non-recorded steel, or alloy of at least two of the eight genus of copper, Shao, iron, nickel, titanium. 7 Wang Xi two kinds of gold which declares the patent (4) The Welt film machine 7_ carrier and the second carrier described in Item 1G are both flat-shaped structures. Among them, the Yankuang type ore film machine described in item 10 of the Scope of the Scope of the Scope of the Scope is at least one protrusion of the **, which has a cylindrical structure. Wherein: the seam type film machine platform described in claim 1G of the patent scope 13 200848531 The at least one protrusion of the first carrier is plural, one carrier. /, 杓 排 排 该 · · · · · · · · 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线 线, heptane or a mixed liquid thereof. — 16 — The sputter coating machine as described in claim 1 , wherein the middle of the carrier has a cold fluid in the receiving trough, and the cooling fluid has heat conducting particles therein. It is a carbon nanotube, a nanocarbon sphere, a copper nanopowder or a combination of at least two components. 17. The sputter coating machine of claim 1, wherein the first carrier is provided with a cooling fluid inlet and a cooling fluid outlet. The sputter coating machine according to the first aspect of the invention, wherein the second carrier has a non-integral structure and is composed of at least two heat pipes. \ 14
TW96119699A 2007-06-01 2007-06-01 Satge for sputtering and sputtering apparatus using same TWI396763B (en)

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US5041757A (en) * 1990-12-21 1991-08-20 Hughes Aircraft Company Sputtered scandate coatings for dispenser cathodes and methods for making same
DE69230493T2 (en) * 1991-04-04 2000-05-04 Seagate Technology HIGH SPEED METHOD AND DEVICE
US6541375B1 (en) * 1998-06-30 2003-04-01 Matsushita Electric Industrial Co., Ltd. DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention
TWI236946B (en) * 2004-02-10 2005-08-01 Delta Electronics Inc Coating apparatus and clamping apparatus thereof
TWI352128B (en) * 2005-05-27 2011-11-11 Hon Hai Prec Ind Co Ltd Plating apparatus and method of forming a thin fil
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