TW200843847A - Selective hydrogenation processes using functional surface catalyst composition - Google Patents

Selective hydrogenation processes using functional surface catalyst composition Download PDF

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TW200843847A
TW200843847A TW096142320A TW96142320A TW200843847A TW 200843847 A TW200843847 A TW 200843847A TW 096142320 A TW096142320 A TW 096142320A TW 96142320 A TW96142320 A TW 96142320A TW 200843847 A TW200843847 A TW 200843847A
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Taiwan
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glass
substrate
treatment
catalyst
matrix
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TW096142320A
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Chinese (zh)
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Robert L Bedard
Jeffery C Bricker
Dean E Rende
Ally Seng Yoot Chan
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Uop Llc
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    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
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    • B01J21/12Silica and alumina
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    • B01J27/14Phosphorus; Compounds thereof
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    • C07C5/03Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of non-aromatic carbon-to-carbon double bonds
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    • C07C5/08Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of carbon-to-carbon triple bonds
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    • C10G45/00Refining of hydrocarbon oils using hydrogen or hydrogen-generating compounds
    • C10G45/32Selective hydrogenation of the diolefin or acetylene compounds
    • C10G45/34Selective hydrogenation of the diolefin or acetylene compounds characterised by the catalyst used
    • C10G45/40Selective hydrogenation of the diolefin or acetylene compounds characterised by the catalyst used containing platinum group metals or compounds thereof
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Abstract

Selective hydrogenation processes using a catalyst composition which, preferably comprises a glass substrate, with one or more functional surface active constituents integrated on and/or in the substrate surface. A substantially nonmicroporous substrate having mesopores and macropores, has (i) a total surface area between about 5 m<2>/g and 300 m<2>/g; and (ii) a predetermined isoelectric point (IEP) obtained in a pH range less than or equal to 14, preferably less than or equal to 7.8 and more preferably less than or equal to 6.0, but greater than 0. At least one catalytically-active region may be contiguous or discontiguous and has a mean thickness less than or equal to about 30 nm, preferably less than or equal to 20 nm and more preferably less than or equal to 10 nm. Preferably, the substrate is a glass composition having a SARCNa less than or equal to about 0.5.

Description

200843847 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種觸媒組合物及其製備方法,該觸媒組 合物可用於各種化學製造方法及各種排放控制方法。更具 體而g,本發明係關於一種較佳包括玻璃基質之觸媒組合 物’且在基質表面上及/或基質表面中整合一或多種官能 性表面活性成分,該觸媒組合物可用於各種選擇性氫化方 法應用。 〇 【先前技術】 觸媒組合物用於促進一類一般被描述為催化反應或催化 作用的化學反應,而催化作用對於有效操作各種化學製程 至關重要。 大部分工業反應及幾乎所有的生物反應若非催化反應, 即疋涉及為催化反應的反應前或反應後處理。僅就美國而 言,在其中某階段包括催化作用之製程所出產之產品價值 就接近一兆美元(USD)。使用觸媒組合物生產之產品包括 : :如食品、服裝、㈣勿、日用化學品、肖製或精細化學 品、塑膠、洗滌劑、燃料及潤滑劑等。觸媒組合物還可用 , &amp;處理排放物(例如汽車尾氣排放物、煉製廠排放物、公 • 用没施工廠排放物等)及其他製程排放流,以降低可能對 人類健康或%境造成負面影響之有害成分的含量。 、就市場銷售額而言1於異相催化反應之固載觸媒在全 ' 球市%之銷售額約為每年30億美元。固載觸媒通常分為三 類即石油煉製觸媒、化學加工觸媒及排放控制觸媒。該 126433.doc 200843847 三類觸媒之市場銷售基本上三分天下。例如,年,在 美國18¼、美兀之固體觸媒市場中,石 排放控制觸媒分佔市場之37%、34%及29%。以石油煉製 觸媒市場⑽〇年約為1〇億美元)為例,鄉之收益來自流 體媒裂法(FCC)觸媒,而315%、65%及45%之收益分別來 自加氫處理觸媒、氫化裂解觸媒及重整觸媒。200843847 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a catalyst composition and a method of preparing the same, which can be used in various chemical manufacturing methods and various emission control methods. More specifically, the present invention relates to a catalyst composition comprising a glass substrate and incorporating one or more functional surface active ingredients on the surface of the substrate and/or in the surface of the substrate. The catalyst composition can be used in various Application of selective hydrogenation methods. 〇 [Prior Art] Catalyst compositions are used to promote a class of chemical reactions that are generally described as catalytic or catalytic, and catalysis is critical for efficient operation of various chemical processes. Most industrial reactions and almost all biological reactions, if not catalyzed, involve pre- or post-reaction treatments that are catalytic reactions. In the United States alone, the value of a product produced at a stage including a catalytic process is close to one trillion dollars (USD). Products produced using catalyst compositions include: : such as food, clothing, (4), household chemicals, xiao or fine chemicals, plastics, detergents, fuels and lubricants. Catalyst compositions are also available, &amp; treat emissions (eg, vehicle exhaust emissions, refinery emissions, public use, no construction plant emissions, etc.) and other process emissions streams to reduce potential for human health or The amount of harmful ingredients that cause negative effects. In terms of market sales, the sales of the solid-loaded catalyst in the heterogeneous catalytic reaction is about US$3 billion per year. The solid-carrying catalysts are generally classified into three types: petroleum refining catalysts, chemical processing catalysts, and emission control catalysts. The 126433.doc 200843847 three types of catalyst market sales are basically three-point world. For example, in the United States 181⁄4, the United States in the solid catalyst market, stone emission control catalysts accounted for 37%, 34% and 29% of the market. For example, in the petroleum refining catalyst market (10), which is about $100 million in the following year, the township revenue comes from the fluid-vehicle cracking (FCC) catalyst, while the 315%, 65%, and 45% revenues come from hydrotreating. Catalyst, hydrocracking catalyst and reforming catalyst.

C) 就:學機理觀點而言,觸媒通常可在自身實質上沒有消 /之U况下’冑兩使化學反應在反應物與產物之間達到平 衡狀怨的速率。所以,對於任何相關之反應而言,觸媒雖 然不能改變反應物與產物之間的平衡狀態,但若經適當設 計及/或挑選,觸媒可加快化學反應之速率。 ^出於各種目的將觸媒用於範圍廣泛之商業實用製 耘,該等目的包括提高製程之反應性、選擇性及能量效率 及其他用途。例如,按照規定的製程條件生產出所需之產 物時高反應物之反應速率或反應性可縮短處理時間, 用以獲得更高的產物生產能力(例如,增加每單位小時之 f物體積或質量)。所以,觸媒活性係指觸媒組合物在每 早位時間内有效將反應物轉化成所需產物的能力。同樣 地,提高反應選擇性可在一組可能的反應產物中提高所需 產物之產出百分率··在該等可能之反應產物中,有些產物 可能並非所需且需要進-步處理以進行相應之移除或轉 ,。因此’觸媒選擇性為觸媒組合物將一部分反應物在規 定之製程條件下轉化成特定產物的能力。另外,觸媒组合 物可用於在某一製程中轉化並降低污染物或非所需反應物 126433.doc 200843847 或產物之含量。另外一項用s伞目丨丨去a ^ $用途則為在維持或改善產物生產 月色力及/或反應選擇性的同日專蔣古 J N f徒π反應製程之總體能量效 率。 冑媒之使用圍相差很大。例如(但不限於)觸媒能夠用 , 於降低諸如烴、—氧化碳(CQ)、氮氧化物(NQX)及硫氧化 • 4勿(SOx)等污染物含量,該等污染物可存在於一系列製程 (例如車輛之邝油發動機或柴油機内的燃燒廢氣、分類石 &amp;煉製或燃煤製程等)之排放物中。同樣地,觸媒可用於 k之處理製程’該製程用於對許多不同來源(例如直餾之 石油鶴分、再循環石油镏分、重油、遞青、葉岩、天然氣 - 及g έ可文催化反應作用之材料的其他碳物質)之烴製程 流進行轉化或改質。 催化反應通常分成兩種不同的反應類型,亦即均相催化 及異相催化。 均相催化廣泛描述一類催化反應,在其中反應物及觸媒 ◎ 混合在一溶液相中。儘管某些案例曾使用氣相催化反應, 但均相催化在典型情況下為一液相系統。因此,濃度梯度 及反應物遷移到觸媒會變成控制均相催化反應之重要因 - 素。另外’在有些情況下,,,溶液相”催化反應能夠越過兩 • 個液相之界面發生,並非形成一真正溶液,而是形成一乳 化相。一些一般類別的均相催化包括酸鹼催化、有機金屬 催化、相轉移催化等。 另一方面’異相催化描述如下的一類催化反應:在反應 製程中’呈氣相或液相之反應物暴露於實質上為固相或半 126433.doc 200843847 固相之觸媒。所以,在異相催化製程中,觸媒及反應物產 生了 一種混合的固相-液相或固相-氣相反應。與均相催化 相比’異相催化具有許多優點,例如固體觸媒一般(a)腐蝕 性較低’因而與許多均勻溶液相觸媒相比,安全及環境風 險相對較低,(b)提供範圍較廣的經濟上可行之溫度與壓力 條件而且(C)更能控制較為強烈之放熱化學反應及吸熱化 學反應,等。C) As far as the mechanism is concerned, the catalyst can usually achieve a rate of equilibrium between the reactants and the product in a chemical reaction that does not substantially eliminate the U. Therefore, for any related reaction, the catalyst does not change the equilibrium state between the reactants and the product, but if properly designed and/or selected, the catalyst can accelerate the rate of the chemical reaction. ^ Catalysts are used for a wide range of commercial and practical processes for a variety of purposes, including improving process responsiveness, selectivity and energy efficiency, and other uses. For example, the reaction rate or reactivity of the high reactants can be reduced in the production of the desired product according to the specified process conditions to reduce the processing time for higher product throughput (eg, increase the volume or mass per unit hour). ). Thus, catalyst activity refers to the ability of the catalyst composition to effectively convert the reactants to the desired product in each of the early hours. Similarly, increasing the selectivity of the reaction increases the percent yield of the desired product in a set of possible reaction products. Among these possible reaction products, some products may not be required and require further processing to effect Remove or turn,. Thus &apos;catalyst selectivity is the ability of a catalyst composition to convert a portion of the reactants to a particular product under specified process conditions. In addition, the catalyst composition can be used to convert and reduce the amount of contaminants or undesired reactants in a process. Another use of snails to a ^ $ is the overall energy efficiency of the same day of the process of maintaining or improving the product's lunar color and / or reaction selectivity. The use of the media varies greatly. For example, but not limited to, a catalyst can be used to reduce the amount of contaminants such as hydrocarbons, carbon monoxide (CQ), nitrogen oxides (NQX), and sulfur oxides (SOx), which may be present in A series of processes (such as the exhaust gas engine of a vehicle or the combustion exhaust gas in a diesel engine, classified stone &amp; refining or coal burning process, etc.). Similarly, catalysts can be used in the process of k. 'This process is used for many different sources (such as straight-running oil cranes, recirculating oil, heavy oil, advancing green, leaf rock, natural gas - and g έ 可文) The hydrocarbon process stream of the other carbon species of the material that catalyzes the reaction is converted or upgraded. The catalytic reaction is usually divided into two different reaction types, namely homogeneous catalysis and heterogeneous catalysis. Homogeneous catalysis broadly describes a class of catalytic reactions in which the reactants and catalysts are mixed in a solution phase. Although gas phase catalytic reactions have been used in some cases, homogeneous catalysis is typically a liquid phase system. Therefore, the concentration gradient and the migration of the reactants to the catalyst will become an important factor in controlling the homogeneous catalytic reaction. In addition, 'in some cases, the solution phase' catalytic reaction can occur across the interface of two liquid phases, instead of forming a true solution, but forming an emulsified phase. Some general classes of homogeneous catalysis include acid-base catalysis, Organometallic catalysis, phase transfer catalysis, etc. On the other hand, heterogeneous catalysis describes a type of catalytic reaction in which the reactants in the gas phase or liquid phase are exposed to a substantially solid phase or half 126433.doc 200843847 In contrast, in heterogeneous catalytic processes, the catalyst and reactants produce a mixed solid-liquid phase or solid-gas phase reaction. Heterogeneous catalysis has many advantages over homogeneous catalysis, such as Solid catalysts are generally (a) less corrosive' and thus have lower safety and environmental risks than many homogeneous solution catalysts, and (b) provide a wide range of economically viable temperature and pressure conditions and (C) ) It is more capable of controlling more intense exothermic chemical reactions and endothermic chemical reactions.

另方面’固體可具有質量傳遞限制,進而顯著降低觸 媒之最終有效性。典型情況下,固體觸媒(有時稱為觸媒 顆粒)在一種具有很高内表面積之多孔材料上包括一或多 種催化成分(例如,貴金屬,如鈀(Pd)、鉑(pt)、釕(Ru)、 銖(Re)等)’在催化成分所在之内表面積,通常數量級為每 a克数百平方公尺。所以,習知觸媒組合物或觸媒顆粒包 具有很大内表面積之特別多孔載體,催化反應即在該 多孔載體上發生。然而,此類觸媒結構經常會產生質量傳 遞W亲J it而降低觸媒顆粒關於觸媒活性及選擇性的有效 性能,並引發其他觸媒性能問題。 在此種更具代表性的觸媒結構中,反應物必須擴散通過 孔隙之網狀物才能到達觸媒顆粒之内部區域,而產物必須 向回擴散’退出觸媒顆粒之内部區域。因&amp;,習知觸媒組 合物之多孔性除其他因素外還取決於平衡,亦即取決於習 知觸媒組合物之兩種特性之間的權衡,即觸媒表面積與促 =量傳遞之能力之間的權衡。例如,許多催化成分在典 h况下存在於具有微細而複雜之孔隙結構的載體中(經 126433.doc 200843847 ¥為U孔隙結才冓,即&lt;2奈米平均最大直徑)&amp;增加觸媒 顆粒之表面積。此較高表面積通常又將增加觸媒活性。 2,由於較高之觸媒顆粒表面積而導致的觸媒活性增加, 4曰引起貝里傳遞阻力之問題(亦即阻止反應物及產物 ^、出觸媒顆粒之運動),特別是載體包括較高百分率之 微孔結構時’該問題更為明顯。藉由增加較大尺寸孔隙 如50不米奈米之大孔隙)在載體中之百分率,可降低 質量傳遞之阻力(亦即加快質量傳遞)。然而,該解決方案 傾向於降低觸媒顆粒之物理強度及持久性。換言之,自力 學之觀點而言,觸媒顆粒之穩健性降低。 旦同時’若反應物在觸媒顆粒之孔隙結構中受到明顯的質 里傳遞阻力’則在反應條件下將存在濃度梯度。因 此,在孔隙結構中,反應物之濃度在觸媒顆粒之周圍最 大,在觸媒顆粒之中心則最小。另一方面,反應產物濃度 在::顆粒之中心要高於觸媒顆粒之周圍。該等濃度梯度 為質量傳遞提供了推動力。該等濃度梯度變得越大,催化 反應之速率就越低。如此一來,觸媒顆粒之有效性能⑼ :反應性、選擇性、再生處理之間的壽命週期及抗結焦性 能等)亦相應降低。 通吊情況下’開發觸媒組合物之目的在於:自商業之角 又出I,改進如上所述之一或多種加工目標。在某些情況 L影響觸媒性能的因素之一就是其促進反應物之間快速 應的I力。因此,經常需要具有較低擴散限制之觸 、組合物。然❿,在其他情況下,為了獲得較佳之產物, 126433.doc 200843847 對於產生特定產物之選擇性可能更為重要。由&amp;,得以淘 汰用於移除或轉化非所需反應產物之附加製程及相關處理 設備。 〇 在1976年,γ·τ· shah等人提議使用酸浸鋁棚石夕酸 鹽纖維、具體而言為E型玻璃(更具體而言,Ε_62ι)來產生 種觸媒載體。與習知觸媒相比,該觸媒載體具有較高之 表面積-體積比,$而減小用於汽車排氣系統的催化轉化 恭之K寸(例如參l 〇xidati〇n 〇jr⑽⑽以On the other hand, solids can have mass transfer limitations that in turn significantly reduce the ultimate effectiveness of the catalyst. Typically, solid catalysts (sometimes referred to as catalyst particles) include one or more catalytic components on a porous material having a high internal surface area (eg, noble metals such as palladium (Pd), platinum (pt), ruthenium). (Ru), 铢 (Re), etc.) 'The internal surface area where the catalytic component is located, usually on the order of hundreds of square meters per a gram. Therefore, conventional catalyst compositions or catalyst particles comprise a particularly porous support having a large internal surface area on which the catalytic reaction takes place. However, such catalyst structures often produce mass transfer ties that reduce the effective performance of the catalyst particles with respect to catalyst activity and selectivity and cause other catalyst performance problems. In such a more representative catalyst structure, the reactants must diffuse through the network of pores to reach the interior region of the catalyst particles, and the product must diffuse back into the interior region of the catalyst particles. Because &, the porosity of the conventional catalyst composition depends, among other things, on the balance, that is, on the trade-off between the two characteristics of the conventional catalyst composition, namely the surface area of the catalyst and the transfer of the amount of the catalyst. The trade-off between capabilities. For example, many catalytic components are present in a carrier with a fine and complex pore structure in the general case (via 126433.doc 200843847 ¥ for U pores, ie &lt; 2 nm average maximum diameter) &amp; increase touch The surface area of the media particles. This higher surface area will in turn generally increase catalyst activity. 2. The increase in catalytic activity due to the higher surface area of the catalyst particles, 4 曰 causes the problem of resistance to the transfer of Berry (ie, prevents the movement of reactants and products, and the particles of the catalyst), especially the carrier includes This problem is more pronounced when the percentage of microporous structure is high. By increasing the percentage of larger pores such as 50 mm of nanopores in the carrier, the resistance to mass transfer (i.e., accelerated mass transfer) can be reduced. However, this solution tends to reduce the physical strength and durability of the catalyst particles. In other words, the robustness of the catalyst particles is reduced from the point of view of self-reliance. At the same time, if the reactants are subjected to significant mass transfer resistance in the pore structure of the catalyst particles, a concentration gradient will exist under the reaction conditions. Therefore, in the pore structure, the concentration of the reactants is the largest around the catalyst particles and the smallest at the center of the catalyst particles. On the other hand, the concentration of the reaction product is higher at the center of the :: particle than around the catalyst particles. These concentration gradients provide a driving force for mass transfer. The greater the concentration gradient becomes, the lower the rate of the catalytic reaction. As a result, the effective properties of the catalyst particles (9): reactivity, selectivity, life cycle between regeneration treatments, and anti-coking properties are also reduced accordingly. The purpose of developing a catalyst composition in the case of a crane is to improve the one or more processing targets as described above from the corner of the business. In some cases, one of the factors that affect the performance of the catalyst is its ability to promote rapid response between reactants. Therefore, touches and compositions with lower diffusion limits are often required. Then, in other cases, in order to obtain a better product, 126433.doc 200843847 may be more important for the selectivity of a particular product. By &amp;, additional processes and associated processing equipment for removing or converting undesired reaction products are eliminated. 〇 In 1976, γ·τ·shah et al. proposed the use of acid-impregnated aluminum shed rock powder fibers, specifically E-glass (more specifically, Ε_62ι) to produce a seed vehicle carrier. Compared with conventional catalysts, the catalyst carrier has a higher surface area to volume ratio, and the catalytic conversion of the vehicle exhaust system is reduced by K. (for example, ll 〇xidati〇n 〇jr(10)(10)

Gas Mixture by Fiber Catalysts, Ind. Eng. Chem.5 Prod. ReS· Dev·,PP· 29-35, V〇l· 15, No· 1,1976)。同時,Shah等 人w為,一般在汽車排氣混合物中產生之反應性氣體(例 如氧化奴、二氧化碳、氮氧化物、甲烷、乙烷、丙烷、 乙烯、丙烯、乙炔、苯及甲苯等)容易接觸到在酸浸E型玻 璃中所產生之較大的表面積。Gas Mixture by Fiber Catalysts, Ind. Eng. Chem.5 Prod. ReS· Dev·, PP· 29-35, V〇l· 15, No. 1, 1976). At the same time, Shah et al., are generally reactive gases (such as oxidized slaves, carbon dioxide, nitrogen oxides, methane, ethane, propane, ethylene, propylene, acetylene, benzene, toluene, etc.) that are produced in automotive exhaust mixtures. Contact with the large surface area produced in acid leached E-glass.

Shah等人表明,與兩種習知觸媒(以氧化鋁珠為載體之 鉑或以矽膠珠為載體之鉑)相比,具有相對較小表面積(75 m'g)之較少數量纖維E型玻璃觸媒載體的性能效果要優於 以氧化铭為載體或以二氧化矽為載體之觸媒(分別為18〇 m2/g及317 m2/g),其中E型玻璃觸媒之平均孔徑大於以氧 化銘為載體之觸媒或以二氧化矽為載體之觸媒。儘管如 此处此專人並未提議或建議有效的汽車排氣氧化能夠在 小於75 m2/g之表面積發生。 將近25年後,Kiwi-Minsker等人在19&quot;年研究了在另一 種酸浸鋁硼矽酸鹽E型玻璃纖維(EGF)中減小表面積後,相 126433.doc • 11 - 200843847 對於用在苯甲醛之選擇性液相氫化的二氧化矽玻璃纖維 (SGF)有關生成苯甲醇(使用以鉑為主之觸媒)或曱苯(使用 以I巴為主之觸媒)的效果(例如參見G7(2W FAers Catalysts for Novel Multi-phase Reactor Design,Chem. Eng. Sci· pp. 4785-4790, Vol. 54,1999)。在該項研究中, Kiwi-Minsker等人發現,SGF不能自酸浸中獲得增大之表 面積,所以相對於用於承載I巴以作為以妃為主之觸媒組合 物之催化成分的EGF樣品(表面積分別為1 5 m2/g及75 (λ m2/g),SGF之表面積保持在2 m2/g之低水平。但,Kiwi·Shah et al. showed that a relatively small number of fibers E with a relatively small surface area (75 m'g) compared to two conventional catalysts (platinum supported on alumina beads or platinum supported on silica beads) The performance of the glass-catalyst carrier is better than that of the catalyst with oxidized etch or cerium oxide as carrier (18 〇m2/g and 317 m2/g, respectively), and the average pore size of the E-type glass catalyst It is larger than the catalyst with oxidized imprint as carrier or the catalyst with cerium oxide as carrier. Although the person does not propose or suggest effective automotive exhaust oxidation as described herein, it can occur at surface areas of less than 75 m2/g. Nearly 25 years later, Kiwi-Minsker et al. studied the reduction of surface area in another acid-impregnated aluminum borosilicate type E glass fiber (EGF) in 19&quot;, 126433.doc • 11 - 200843847 for use in The selective liquid phase hydrogenation of bismuth oxide glass fiber (SGF) for benzaldehyde is related to the formation of benzyl alcohol (using a platinum-based catalyst) or toluene (using a catalyst based on I bar) (see, for example, G7 (2W FAers Catalysts for Novel Multi-phase Reactor Design, Chem. Eng. Sci. pp. 4785-4790, Vol. 54, 1999). In this study, Kiwi-Minsker et al. found that SGF cannot be self-leached An increased surface area is obtained, so that the EGF sample (surface area is 15 m 2 /g and 75 (λ m 2 /g), respectively, relative to the catalytic component used to carry I bar as a catalyst composition based on ruthenium, The surface area of SGF is kept at a low level of 2 m2/g. However, Kiwi·

Minsker等人注意到,SGF/把觸媒之把實質上具有與其 , EGF/鈀觸媒對應物(即約0.1 mmol/m2)相同的有效表面積濃 度(毫莫耳金屬/平方公尺莫耳),可是SGF/鈀觸媒組合物表 明,與其EGF/鈀觸媒對應物相比,每公克鈀之活性或反應 速率有所降低。Minsker et al. noted that the SGF/catalyst has essentially the same effective surface area concentration as its EGF/palladium catalyst counterpart (ie, about 0.1 mmol/m2) (mole metal per square meter of moiré). However, the SGF/palladium catalyst composition showed a decrease in activity or reaction rate per gram of palladium compared to its EGF/palladium catalyst counterpart.

Kiwi-Minsker等人提出,此種SGF/鈀觸媒因表面積減小 而活性降低的現象,可能可解釋為活性成分(亦即催化成 &quot; 分,在本例為鈀)與SGF載體之相互作用增強,而非由於其 表面積(即2 m2/g)較小。然而,他們未能藉由證明以下論 . 據來驗證此論點··表面積較小(亦即可與2 m2/g之SGF/鈀相 比)的EGF/鈀觸媒,至少與表面積較大(亦即分別為15 m2/g 及75 m2/g)的EGF/鈀觸媒樣品具有相同的催化活性。因 此,Kiwi-Minsker等人提出有關SGF/鈀之活性限制(亦即由 • 於SGF與EGF相比具有較高的酸性,鈀與SGF之間的相互 作用增強)為何是主要因素,而非由於實質上SGF/Pd之表 126433.doc -12- 200843847 面積較小,原因並不明確。無論如何,Kiwi_Minsker並未 報告說明,相對於75 m2/g EGF/把樣品,15 m2/g EGf/^ 樣品因為擴散速率提高而催化活性增強。否則,這或許將 表明由於較小觸媒表面積而產生之有益效果。 ^ 、 最近,在 US 7,060,651 及 EP 1 247 575 A1(EP,575)中,Kiwi-Minsker et al. suggest that the SGF/palladium catalyst has a reduced surface area due to reduced surface area and may be explained by the interaction of the active ingredient (ie, the catalyzed &quot;, in this case, palladium) with the SGF carrier. The effect is enhanced, not because of its small surface area (ie 2 m2/g). However, they failed to prove the following argument by using the following theory: EGF/palladium catalyst with a small surface area (ie, comparable to 2 m2/g of SGF/palladium), at least with a large surface area ( That is, the EGF/palladium catalyst samples of 15 m2/g and 75 m2/g, respectively, have the same catalytic activity. Therefore, Kiwi-Minsker et al. proposed the limitation of SGF/palladium activity (that is, the higher acidity of SGF compared with EGF, and the enhanced interaction between palladium and SGF), which is the main factor, not due to Substantially SGF/Pd Table 126433.doc -12- 200843847 is small in size and the reason is not clear. In any case, Kiwi_Minsker did not report that the 15 m2/g EGf/^ sample was enhanced in catalytic activity due to the increased diffusion rate relative to the 75 m2/g EGF/ sample. Otherwise, this may indicate a beneficial effect due to the smaller catalyst surface area. ^, and recently, in US 7,060,651 and EP 1 247 575 A1 (EP, 575),

Barelko等人揭示了使用富含二氧化矽之載體(包括二氧化 矽及包含非二氧化矽之氧化物(例如Al2〇3、B2〇3、Na2〇、 MgO、CaO等)作為觸媒載體的有益效果,其中該富含二氧 化矽之載體在載體之表面下層具有偽分層之多微孔結構 (例如參見 EP,575之第 11、13、15、17、18、23、31及32 段内容)。正如向歐洲專利局(”Ep〇”)更為完整的說明,在 區分EP ’575與Kiwi-Minsker等人在上述文件所揭示之催化 載體(’’Kiwi-Minsker載體”)時,Barelko等人斷言,他們所 主張的富含二氧化矽之載體具有帶狹窄夾層空間的偽分層 夕从孔結構,而Kiwi-Minsker載體則沒有此種結構。更具 體而a ’ Barelko等人認為,在Kiwi-Minkser等人之論文中 沒有依據可假定(a)在Kiwi-Minsker載體中有形成帶狹窄夾 層空間的偽分層多微孔結構;(b)所述帶有狹窄夾層空間的 偽分層多微孔結構有助於增強應用於載體之金屬的活性 (例如參見EP,575之第13、17-18、23及32段内容)。Barelko et al. disclose the use of a cerium-rich carrier (including cerium oxide and an oxide comprising non-cerium oxide (eg, Al 2 〇 3, B 2 〇 3, Na 2 〇, MgO, CaO, etc.) as a catalyst carrier. The beneficial effect is that the cerium-enriched carrier has a pseudo-layered microporous structure in the lower surface of the carrier (see, for example, paragraphs 11, 13, 15, 17, 18, 23, 31 and 32 of EP, 575) In the case of a more complete description to the European Patent Office ("Ep"), in distinguishing the catalytic carrier (''Kiwi-Minsker carrier') disclosed by EP '575 and Kiwi-Minsker et al. Barelko et al. assert that the cerium-enriched carrier they claim has a pseudo-layered crater structure with a narrow interlayer space, while the Kiwi-Minsker carrier does not. This is more specific than a 'Barelko et al. In Kiwi-Minkser et al., there is no basis for assuming that (a) there is a pseudo-stratified microporous structure with a narrow interlayer space in the Kiwi-Minsker carrier; (b) the pseudo-separated space with pseudo-separation Layered microporous structure helps to enhance The support for the active metal (see e.g. EP, 575 and 32 of the first piece of content 13,17-18,23).

Barelko等人藉由向歐洲專利局說明下述内容,進一步 將其富含二氧化矽之載體與Kiwi_Minsker等人提出之載體 加以區分:由於”催化成分以高度分散之活性狀態在載體 之表面工^ 優勢分布(a predominant distribution of the 126433.doc -13· 200843847 catalytic components in the sub-surface layers of the support in a highly dispersed active statey\在玲、X 髮氣、,Barelko et al. further clarify the carrier of the cerium oxide-enriched carrier with the carrier proposed by Kiwi_Minsker et al. by explaining the following contents to the European Patent Office: because the catalytic component is highly active on the surface of the carrier. a dominant distribution of the 126433.doc -13· 200843847 catalytic components in the sub-surface layers of the support in a highly dispersed active statey\in Ling, X qi,

CC

富含二氧化矽之載體具有更高活性的催化狀態,因此該更 高活性之催化狀態使得催化成分能夠耐受燒結、聚集及自 載體剝落及觸殺劑之影響(例如參見EP,575之第11段)。EP *575確認,擴散限制可能會阻礙陽離子混入載體之夾層空 間,並因此阻礙陽離子藉由化學吸附進入載體(例如參見 £?’575之第17段)。為了解決該擴散限制問題,;6&amp;1^1]&lt;:0等 人提出(並主張)一種載體結構,在該載體結構中,,,薄,,層 之矽-氧碎片經分離形成狹窄夾層空間(即偽分層之多微孔 結構),該狹窄的夾層空間包含,,大量的„ 〇H基團,該等 基團之質子可被陽離子交換。Barelk〇等人揭示,充分,,薄&quot; 的矽-氧碎片層為高Q3至Q4比率所特有,並且他們進一步 聲明,帶有大量夾在狹窄夾層空間之間的〇H基團之偽分 層多微孔結構,已藉由29Si NMR(核磁共振)及汛(紅外)光 «曰里測結合氬BET及驗滴定表面積量測得到證實。 像該等玻璃觸媒組合物中的一些一樣,許多習知觸媒試 圖解决至J 一項上述確認之加工問題,但在觸媒性能之其 他方面則表現欠佳。所以,該等習知觸媒經常侷限於較窄 之製程反應範圍内,在要求再生或置換之前的使用週期有 限及/或需要大量裝填昂貴之催化成分(例如鉑、鈀等貴金 屬),因而顯著增加觸媒生產及進行催化製程之成本。 因此,需要-種改進之觸媒組合物,能夠用於各種加工 反應’同時改進諸如製程反應性、選擇性及/或能量效率 126433.doc -14- 200843847 等。該觸额合物較佳可對相#歧之製程條件 行改進’同時增強穩健性及持久性,並保持相對較長的声 命週期。中請人已發現-種官能性表面觸媒組合物,預: 月b夠滿足该適用廣泛催化反應的需要。 【發明内容】The cerium-rich carrier has a more active catalytic state, so the catalytic state of higher activity allows the catalytic component to withstand sintering, aggregation and self-carrier flaking and contact agents (see, for example, EP, 575, 11). segment). EP * 575 confirms that diffusion limitations may hinder the incorporation of cations into the interlayer space of the support and thus hinder the entry of cations into the support by chemisorption (see, for example, paragraph 17 of £?'575). In order to solve the problem of diffusion limitation, 6&1^1]&lt;:0 et al. propose (and claim) a carrier structure in which thin, layered helium-oxygen fragments are separated to form a narrow The interlayer space (ie, the pseudo-layered microporous structure), the narrow interlayer space contains, a large number of 〇H groups, the protons of which can be exchanged by cations. Barelk〇 et al. The thin &quot; 矽-oxygen fragment layer is unique for high Q3 to Q4 ratios, and they further declare that pseudo-layered microporous structures with a large number of 〇H groups sandwiched between narrow interlayer spaces have been 29Si NMR (nuclear magnetic resonance) and 汛 (infrared) light «曰里 measured combined with argon BET and titration surface area measurement confirmed. Like some of these glass catalyst compositions, many conventional catalysts attempt to solve to J A previously identified processing problem, but not performing well in other aspects of catalyst performance. Therefore, such conventional catalysts are often limited to a narrower range of process reactions and have a limited life cycle before regeneration or replacement is required. And/or need to be big Filling expensive catalytic components (such as precious metals such as platinum and palladium), thus significantly increasing the cost of catalyst production and catalytic processes. Therefore, there is a need for an improved catalyst composition that can be used in a variety of processing reactions while improving processes such as processes. Reactivity, selectivity and / or energy efficiency 126433.doc -14- 200843847, etc. The conjugate is preferably improved on the process conditions of the phase, while enhancing robustness and durability, and maintaining a relatively long period of time. The life cycle of the user has been found to be a kind of functional surface catalyst composition, pre: month b enough to meet the needs of the application of a wide range of catalytic reactions.

C 本發明之一個態樣提供一種製程流的選擇性氫化方法, 其利用-種觸媒組合物對製程流之至少一部分進行選擇性 氫化’該製程流含有至少-種具有至少—個目標可氯化位 點的化合物,其十,觸媒組合物包括: -具有中孔隙、大孔隙、外表面、開口孔隙壁表面、 表面區域及表面下區域之實質上無微孔隙基質, -至少一種催化成分,及 -至少一個催化活性區域,其包括該至少一種催化成 分,其中 a)該實質上無微孔隙之基質具有 i)當以選自S·’ S·及其組合組成之群 之方法量測時,所測得之介於約5 m2/g至300 m2/g 之間的總表面積; Π)在大於0但小於或等於14的pH值範圍内獲得之預定 等電點(IEP); b) 該至少一個催化活性區域可為連續或不連續,且具有 i) 小於或等於約30奈米之平均厚度;及 ii) 催化有效量之至少一種催化成分,·且 c) 該至少一個催化活性區域之位置實質上 126433.doc -15- 200843847 0 在外表面上, ii) 在開口孔隙壁表面, iii) 在表面區域内, iv) 部分在外表面上,部分在開口孔隙壁表面上,部 分在表面區域内及其組合;&lt; v) (c)(i)、(ii)、(iii)及(iv)之組合。 基於以下實施方式及所附之申請專利範圍及附圖,熟習 此項技術者蔣能清楚草握本發明之其他熊、樣。 【實施方式】 定義 本文中所使用的術語具有以下定義之含義。 π孔隙π表示深度大於寬度之空穴或通道。 ,,互連孔隙,,表示與一或多個其他孔隙相通之孔隙。 ▼’閉口孔隙,,表示與閉口孔隙所在材料的外表面沒有任何 通道之孔隙。 ”開口孔隙”表示與開口孔隙所在材料的外表面有直接通 道,或經由另一孔隙或互連孔隙相連之孔隙(亦即不屬於 閉口孔隙之孔隙)。 ”孔隙寬度,,表示按照指定方法確定之孔隙的内徑或相對 壁之間的距離。 π孔隙鍾積表示知:知L疋方法確定之所有孔隙的總體積 效應,但不包括閉口孔隙之體積效應。 ,,多孔性”表示一材料中孔隙體積與該材料所占總體積之 比率。 126433.doc -16- 200843847 ’’微孔隙τ’表示内部寬度小於2奈米(nm)之孔隙。 ’中孔隙’’表示内部寬度在2奈米至50奈米之間的孔隙 ’’大孔隙’’表示内部寬度大於5〇奈米之孔隙。 ’’外表面’’表示一材料之外邊界或表皮(厚度接近零),包 括外邊界或表皮上與缺陷(若有)有關的規則或不規則之輪 廓。 箪壁表面’’指内邊界或表皮(厚度接近零),包括在内 Γ ί,' 邊界或表皮上的任何與缺陷(若有)有關的規則或不規則之 輪廊實貝上疋義在一具有至少一種或多種類型孔隙之材 料中任何開口孔隙的形狀。 ’’表面”總體表示-材料之孔隙壁表面(若存在任何開口 孔隙)、材料之外表面及其表面區域。 ’’表面區域”表示可根據材料而改變的不包括任何由材料 之開口孔隙(若存在任何開口孔隙)所定義之區域的材料區 域,但該表面區域⑷在材料的外表面以下小於或等於30奈 =(較佳為㈣奈米,更佳為㈣奈米);在材料有任何開口 隙時,該表面區域(b)在材料的孔隙壁 於30奈米(較佳為&lt;20太本击、 A辱 —不y、,更佳為幺10奈米)。對於具有可 谓测之表面高程變化的分 的材枓,無淪該等變化是否規則,沿 者外部邊界或内部邊本 平均高程用於4 1 或内部邊界或表皮的 ;確疋表面區域之平均深度。 料之” T區域表不可根據材料而改變的不包括任何由材 ^二隙(若存在任•孔隙)所定義之區域: 域’但該表面下區域⑷在材料的外表面《下大於二 i26433.doc -17- 200843847 (較佳為&gt;20奈米,更佳為&gt;1〇奈米广在 隙時’該表面下區域(b)在材 面任何開口孔 米(較佳為〉叫米,更佳為&gt;1()奈米表“下大於3〇奈 ’,内表面積”或”開口孔隙壁表面積 之在材料中所有開口孔隙壁之表面積效應,方法確定 ,、&quot;外表面積&quot;表㈣衫方法衫^包括材料巾所有孔 隙壁之表面積效應的材料表面積效應。 二表面積”表示用指定方法確定:材料内表面積 表面積之和。 鈉化學吸附表面積,,或S.A-表示藉由使用化學吸附法 由鈉陽離子的化學吸附而確定之材料表面積,該⑷化學 吸附法在 G.W. Sears 如/. cw,1956, ν〇ι 28, p 蘭 MR. Iler, Chemistry of Silica, John Wiley &amp; Sons 1979, p. 203及353中說明。 ”鈉-化學吸附表面積變化率”或,,sARC^,,,其中sarc^=C. An aspect of the invention provides a process for the selective hydrogenation of a process stream for selectively hydrogenating at least a portion of a process stream using a catalyst composition comprising at least one species having at least one target chlorine The compound of the site, the catalyst composition comprises: - a substantially microporous matrix having mesopores, macropores, outer surfaces, open pore wall surfaces, surface regions and subsurface regions, - at least one catalytic component And at least one catalytically active region comprising the at least one catalytic component, wherein a) the substantially microporous matrix has i) when measured in a group selected from the group consisting of S·' S· and combinations thereof The total surface area measured between about 5 m2/g and 300 m2/g; Π) the predetermined isoelectric point (IEP) obtained over a pH range greater than 0 but less than or equal to 14; b The at least one catalytically active region may be continuous or discontinuous and have i) an average thickness of less than or equal to about 30 nanometers; and ii) a catalytically effective amount of at least one catalytic component, and c) the at least one catalytic activity Regional Substantially 126433.doc -15- 200843847 0 on the outer surface, ii) on the open pore wall surface, iii) in the surface area, iv) partially on the outer surface, partly on the open pore wall surface, and partly in the surface area And combinations thereof; &lt; v) (c) combinations of (i), (ii), (iii) and (iv). Based on the following embodiments and the accompanying claims and drawings, those skilled in the art will be able to clearly grasp other bears and samples of the present invention. [Embodiment] Definition The terms used herein have the meanings defined below. The π pore π represents a hole or channel having a depth greater than the width. , interconnecting pores, representing pores in communication with one or more other pores. ▼ 'Closed pores, indicating that there are no channels of pores on the outer surface of the material where the closed pores are located. "Open pores" means pores that have a direct path to the outer surface of the material in which the open pores are located, or that are connected via another pore or interconnected pores (i.e., pores that are not part of the closed pores). "Pore width," means the inner diameter of the pore or the distance between the opposing walls determined by the specified method. π pore clock product indicates that the total volume effect of all pores determined by the L疋 method is known, but does not include the volume of the closed pore. The effect ", porosity" means the ratio of the pore volume in a material to the total volume of the material. 126433.doc -16- 200843847 ''Microporosity τ' denotes pores having an internal width of less than 2 nanometers (nm). 'Intermediate pores'' means pores having an internal width of between 2 nm and 50 nm. The ''large pores'' indicate pores having an internal width of more than 5 Å. The 'outer surface' indicates a boundary or skin of a material (near thickness is zero), including a regular or irregular contour on the outer boundary or skin associated with the defect, if any. The surface of the wall refers to the inner boundary or the skin (thickness is close to zero), including any rules or irregularities on the inner or 表 ί, ' boundary or skin that are related to defects (if any). A shape having any open pores in the material of at least one or more types of pores. ''Surface'' generally means - the pore wall surface of the material (if any open pores are present), the outer surface of the material and its surface area. ''Surface area'' means that it can vary depending on the material and does not include any open pores from the material ( If there is any material region of the region defined by the open pores, but the surface region (4) is less than or equal to 30 nanometers below the outer surface of the material (preferably (four) nanometers, more preferably (four) nanometers); In any open gap, the surface area (b) is at the pore wall of the material at 30 nm (preferably &lt;20 too, A, and not y, more preferably 10 nm). For a material with a measurable surface elevation change, whether or not the change is regular, the average elevation of the outer boundary or the inner edge of the edge is used for 4 1 or the inner boundary or the skin; the average depth of the surface area is determined . "T-zone table can not be changed according to the material does not include any area defined by the material ^ two gaps (if there is any pores): domain 'but the subsurface area (4) on the outer surface of the material "below is greater than two i26433 .doc -17- 200843847 (preferably &gt; 20 nm, more preferably > 1 〇 nano wide in the gap 'the subsurface area (b) any open hole in the material surface (preferably 〉 M, more preferably &gt;1() nanometer "under 3 〇 奈 ', internal surface area" or "open surface wall surface area of all open pore walls in the material surface effect, method to determine, &quot; external surface area &quot;Table (four) shirt method shirt ^ material surface surface effect including the surface area effect of all the pore walls of the material towel. "Two surface area" means determined by the specified method: the sum of the surface area of the surface area of the material. The surface area of the sodium chemisorption, or SA- The surface area of the material determined by chemical adsorption of the sodium cation by chemisorption, (4) chemisorption method in GW Sears such as /. cw, 1956, ν〇ι 28, p lan MR. Iler, Chemistry of Silica, John Wiley &amp; Sons 1979, p. 203 and 35 Described in 3. "Sodium-chemical adsorption surface area change rate" or, sARC^,,, where sarc^=

Vyb/V初,其中⑴v初為用於最初滴定一含水漿液混合物 的稀NaOH滴定溶液之初始體積,在約25它溫度下在3·4 M NaCl溶液中包括實質上不溶於水之材料,溶液ρΗ值在零 時間t。自最初的ΡΗ 4.0到达ΡΗ 9.0,及(ii) %至15係指用於 使漿液混合物在15分鐘時間内保持在pH 9的相同濃度 NaOH滴定液的總體積,每隔5分鐘(總共3個5分鐘的間 隔,分別為h、^及^5)該總體積按照需要儘快進行相應調 整0 所以,V總係指在以下更詳細描述之滴定程序中所使用 126433.doc -18- 200843847 之NaOH滴定液的總體積,其中V#”+V5至i5=v總。因此,^至15 可表示為v總與v初之差,其中%至15=¥總_v初。 就本定義而言,藉由將30公克NaC1(試劑級)添加到15〇 毫升水中製備3·4 M NaCl溶液,將1β5公克樣品材料添加到 NaCl溶液中以產生含水漿液混合物。含水漿液混合物必須 首先調整為pH 4.0。為了在滴定之前進行此調整,可相應 地使用少量稀酸(例如HC1)或稀鹼(例如Na0H)。滴定時, 為了首先獲得V初,先使用稀NaOH滴定液(例如〇el 1^或0 〇1 N)’然後使用Vpm進行SARC^測定。另外,就本定義而 言’ Vs至is為在、^及“5使用之NaOH滴定液的累積體 積’其中使用NaOH滴定液每隔5分鐘(共3個5分鐘的間隔) 盡快滴定,以按照需要自t。至最終時間。的15分鐘内將漿 液混合物之pH值調整為9.0。 就本定義而言,在用任何可選擇的離子交換(ΙΕχ)、反 離子交換(BIX)及/或靜電吸附(ΕΑ)處理方法進行處理以將 一或多種2型成分前驅物(以下說明)整合至基質表面上及/ 或基質表面中之前,確定樣品材料之S ARC^。 ’,初濕”表示,對於包括固體或半固體材料之含水漿液或 糊狀混合物,正在測定該材料之等電點(”IEp”)的一時間 點’此时’去離子水實質上覆蓋了固體或半固體材料之整 個表面,並於目前的程度填充了該材料可能具有的任何可 通水之孔隙體積’進而允許水進入含水漿液或糊狀混合 物,以提供玻璃電極觸面與其參考電極觸面及二者之間充 分的液體接觸,進而測定材料的IEP。 126433.doc •19· 200843847 ”等電點”或IEP表示一固體或半固體材料在初濕時之淨 表面電荷為零的pH值。在本文中使用之ΙΕΡ亦可稱為電荷 零點(zero point charge,ZPC)或零電荷點(point 〇f zer〇 charge,PZC) o n催化有效量,f表示在適當的加工條件下,足以將至少一 種反應物轉化成足夠產量之至少一種預定產物,以支援試 驗工廠或商業級製程的催化成分之量。 ”硫屬化物(Chalconide)”表示包括至少一種來自由硫 (S)、石西(Se)及碲(Te)組成之群的第16族(以前的第VIA族)元 素及至少一種正電性強於其對應的第16族元素之元素或基 團的化合物。 ’’貴金屬,,表示來自铑(Rh)、鈀(Pd)、銀(Ag)、銥(Ir)、鉑 (Pt)及金(Au)之群的過渡金屬,除非另有說明以金屬錯合 物、金屬鹽、金屬陽離子或金屬陰離子之形式處於荷電狀 態,否則各種過渡金屬均處於零氧化狀態(同時處於未反 應狀態)。 ’’抗腐蝕基質”表示一種能夠抵抗表面下區域的基質組成 結構發生實質改變的基質,料改變係由於大部分酸或稀 鹼在標準溫度及壓力條件下造成結構組成元素之改變及/ 或損失、冑的孔隙生成、孔隙大小膨脹等。然而,耐腐餘 基質之組成結構可能實質上被高強度酸(例如濃肝)、高強 度驗(例#濃他⑽)或其他強腐㈣試劑(無論係單獨或係 與高溫、高壓及/或高振動頻率條件結合)所改變,就本定 義而§,此類基質仍視為”抗腐蝕&quot;基質。 126433.doc • 20 - 200843847 ’,表面活性’’表示一材料之表面充分地裝有一或多種荷電 成分之狀態,該装有一或多種荷電成分之材料係用以⑴在 穩態反應條件下促進催化反應而不進一步改質,或者(ii) 另外,藉由與一或多種荷電成分之間的靜電相互作用及/ 或離子交換相互作用,用於進一步改质,進而隨後可在穩 態反應條件下作為催化成分。At the beginning of Vyb/V, wherein (1)v is initially used to initially titrate a dilute NaOH titration solution of an aqueous slurry mixture, and at a temperature of about 25, a substantially water-insoluble material is included in the solution of 3·4 M NaCl, the solution The value of ρΗ is at zero time t. From the initial ΡΗ 4.0 to ΡΗ 9.0, and (ii) % to 15 means the total volume of the same concentration of NaOH titrant used to maintain the slurry mixture at pH 9 for 15 minutes, every 5 minutes (3 total) The 5 minute interval, h, ^ and ^5 respectively, the total volume is adjusted as needed as soon as possible. Therefore, V total refers to the NaOH used in the titration procedure described in more detail below. 126433.doc -18- 200843847 The total volume of the titrant, where V#"+V5 to i5=v total. Therefore, ^ to 15 can be expressed as the difference between v total and v initial, where % to 15 = ¥ total _v initial. For the purposes of this definition A 3?4 M NaCl solution was prepared by adding 30 grams of NaC1 (reagent grade) to 15 milliliters of water, and 1 beta 5 grams of sample material was added to the NaCl solution to produce an aqueous slurry mixture. The aqueous slurry mixture must first be adjusted to pH 4.0. In order to make this adjustment before titration, a small amount of dilute acid (such as HCl) or a dilute base (such as NaOH) can be used accordingly. In order to obtain the initial V, first use a dilute NaOH titration solution (for example, 〇el 1^ or 0 〇1 N)' Then use Vpm for SARC^ determination. For the purposes of this definition, 'Vs to is is the cumulative volume of NaOH titration solution used in , ^ and 5, where NaOH titration solution is used every 5 minutes (3 3 minute intervals) as soon as possible to titrate as needed . To the final time. The pH of the slurry mixture was adjusted to 9.0 within 15 minutes. For the purposes of this definition, it is treated with any alternative ion exchange (ΙΕχ), counter ion exchange (BIX) and/or electrostatic adsorption (ΕΑ) treatment to produce one or more Type 2 component precursors (described below) The S ARC^ of the sample material is determined prior to integration onto the surface of the substrate and/or in the surface of the substrate. 'Incipient wetness' means that for an aqueous slurry or paste mixture comprising a solid or semi-solid material, a point in time at which the isoelectric point ("IEp") of the material is being measured 'this time' is substantially covered by deionized water. The entire surface of the solid or semi-solid material, and to the extent that it can be filled with any water-permeable pore volume that the material may have, thereby allowing water to enter the aqueous slurry or paste mixture to provide contact of the glass electrode contact with its reference electrode The surface and the sufficient liquid contact between the two to determine the IEP of the material. 126433.doc •19· 200843847 “Isoelectric point” or IEP indicates the pH of a solid or semi-solid material with a zero surface charge at initial humidity. The value used herein may also be referred to as a zero point charge (ZPC) or a point 〇f zer〇charge (PZC) on catalytically effective amount, and f is sufficient under appropriate processing conditions. Converting at least one reactant to at least one predetermined product of sufficient yield to support the amount of catalytic component of the pilot plant or commercial grade process. "Chalcogenide" e)" means that at least one element of group 16 (formerly Group VIA) derived from a group consisting of sulfur (S), sulphur (Se) and cerium (Te) and at least one positively charged stronger than its corresponding a compound of a group or element of a group 16 element. ''Precious metal, representing a group derived from rhodium (Rh), palladium (Pd), silver (Ag), iridium (Ir), platinum (Pt), and gold (Au). The transition metal, unless otherwise stated, is in a charged state in the form of a metal complex, metal salt, metal cation or metal anion, otherwise the transition metals are in a zero oxidation state (while in an unreacted state). ''Anti-corrosion matrix "" indicates a matrix that is capable of resisting substantial changes in the matrix composition of the subsurface region. The change in the composition is due to changes and/or loss of structural constituent elements and pore formation of the crucible due to the majority of acid or dilute alkali under standard temperature and pressure conditions. , pore size expansion, etc. However, the composition of the antiseptic matrix may be substantially high-intensity acid (eg, concentrated liver), high-intensity test (eg #浓他(10)) or other strong rot (four) reagents (whether alone or in combination with high temperature, high pressure and / Or a combination of high vibration frequency conditions), as defined by this definition, such matrices are still considered to be "corrosion resistant" substrates. 126433.doc • 20 - 200843847 ', surface activity '' indicates that the surface of a material is adequately loaded In the state of one or more charged components, the material containing one or more charged components is used to (1) promote catalytic reaction under steady state reaction conditions without further modification, or (ii) additionally, by reacting with one or more charged components The electrostatic interaction and/or ion exchange interaction between them is used for further modification, which in turn can be used as a catalytic component under steady state reaction conditions.

U ”基質,,表示任何固體或半固體材料,包括但不限於玻璃 及玻璃樣材料,IEP大於〇但小於或等於14,表面活性狀態 可按照基質在觸媒組合物(具有催化有效量之催化成分)中 之預定用途進行更改。 ”整合,,表示藉由電子及/或物理化學相互作用(例如離 子、靜電或共價相互作用’包括但不限於氫鍵合、離子鍵 合、靜電鍵合、凡得瓦力(Vander Waals)/偶極鍵合、親和 力鍵合K賈鍵合及其組合)將&amp;學成分與基質進行結 合。 實施方式概述 本實施方式概述下的註解❹於說明與附隨巾請專利範 圍有關之選^態樣及因因此僅用於以簡要之措詞方便 表述可能與讀者的潛在利益有關之實施方式的某些離樣。 因此’本實施方式註解不應視為對附隨申請發明範圍之限 不發明 -九、樣係關於—種觸媒組合物,其表面活性之 催化活性區域的平均厚度小於或等於約3〇奈米,較佳為&lt; 約2〇奈米,且更佳為-1〇奈米(&quot;觸媒組合物”)。本發明之 126433.doc -21- 200843847 另一態樣係關於各種製造新型觸媒組合物之方法。本發明 之另一態樣係產生複合形式之觸媒組合物,無論有沒有成 形介質。本發明之又一個態樣係關於在各種製程中使用觸 媒組合物,該等製程例如為烴、雜烴及/或非烴處理、轉 化、精煉及/或排放控制及處理製程及其他類型的製程。 例如’新型觸媒組合物可提高烴、雜烴及/或非烴處理、 轉化、精煉及/或排放控制及處理製程及其他類型製程的 反應選擇性、反應速率、成品良率及能量效率。 在產生觸媒組合物時應考慮到若干項因素,該等因素包 括但不限於: (1)鑒於預期用途’獲得具有預定等電點(,,ΙΕΡΠ)之基 質’無論按原樣獲得或經後續處理後獲得; (ii) 蓉於預定用途,基質之抗腐蝕性程度; (iii) 鑒於預定用途,為了獲得所需表面性質,基質之多 孔性程度(若有),及相關之元素組成(特別係在表面 上), (iv) 取決於組合物之預定用途,適當時,基質對於產生 適當專電點之化學敏感度,且藉由一或多種具有第 一類與基質之離子及/或靜電相互作用的第一成 分’使基質具有表面活性,該基質能夠但不一定產 生一催化活性區域,該催化活性區域在基質表面上 及/或内的平均厚度為 &lt;約30奈米,較佳為 &lt;約2〇奈 米,更佳為S約10奈米; (v) 基質對於一可選擇之離子交換(ΙΕχ)、反離子交換 126433.doc -22- 200843847 (BIX)及/或靜電吸附(EA)處理方法的化學敏感性, 該等處理方法用於將一或多種第二成分整合至基質 表面上及/或内,該基質表面具有第二類與基質離 子及/或靜電相互作用’並因此產生^一催化活性區 域,該催化活性區域在基質表面上及/或内的平均 厚度為S約30奈米,較佳為 &lt; 約20奈米,更佳為$約 10奈米;及 (vi)取決於組合物之預定用途,處理過之基質對於下述 反應的化學敏感性:可選的緞燒及/或還原、氧化 或進一步使處理過之基質在使用觸媒組合物之前與 第一或第二催化成分起化學反應。 I.基質說明 對於許多潛在應用之通常及較佳範圍說明的IEp選擇 較佳地,用於產生本發明之觸媒組合物的基質為玻璃組 合物’無論係表面活性按原樣接收或經處理產生表面活性 之狀悲,IEP均大於約〇但小於或等於14。能否獲得具有適 當IEP(適於產生用於預定用途之觸媒組合物)的基質取決於 各種因素,其中部分因素已在上文中概要說明(在,,實施方 式概述中)。鑒於下文提供更詳細之論述,熟習此項技術 者將會更清楚掌握與選擇適當IEP有關的其他因素。 例如,對於許多具有商業利益之製程,玻璃(或玻璃樣) 組合物及其表面活性產物較佳具有大於或等於約4·5但小 於14之ΙΕΡ,而預計ΙΕΡ大於或等於約6〇但小於14之玻璃 、、且ά物更佳’且預計ΙΕΡ大於或等於約7·8但小於14之玻璃 126433.doc -23- 200843847 組合物最佳。缺 “、、而’取決於觸媒組合物之預定用途及在組 合物的基質中&amp; f 、τ夕孔性之程度及類型,較佳的IEP範圍可能 受到影變。&amp; 曰乃外’某些催化製程對於在較低pH範圍具有表 面活丨生之觸媒組合物更為敏感。因此,在該等情況下, IEP小於7·8(較佳為t佳為&lt;4·5)的基質很可能更適用 於此類製程。戶斤$ ^ ^ α ^ ^ , 所以,再次申明,在適當的ΙΕΡ範圍内選擇 基負時*僅要考慮觸媒組合物之預定用途這一因素,還 要結合基質之多孔性、化學組合物及處理程序(若有)等。 另外取决於預期催化用途,許多玻璃類型可成為潛在 的基f候選對象,謂得適當的IEP及多孔性的程度及類 $,無論係按原樣接收或使用以下-或多種處理方法。通 常,該等玻璃類型之實例包括但不限於E型玻璃、無硼£型 玻璃、S型玻璃、R型玻璃' AR型玻璃、稀土 ·矽酸鹽玻 璃鋇鈦-矽酸鹽玻璃、氮化物玻璃如矽-鋁_氧_氮玻璃、 A里玻璃、c型玻璃及CC型玻璃。然❿,以下將舉例說明 通常預期用於一系列催化應用及某些可能處理之玻璃類 型〇 酸浸之E型玻璃說明 用於生產本發明觸媒組合物之基質較佳採用由實質上無 微孔隙,但至少有一些中孔隙及大孔隙(&quot;無微孔隙。之玻 璃組合物構成的玻璃材料,且IEp 一般 力又」、於7.8,較佳為$ 約6,且更佳為&lt;約4.5’但無論如何均大於〇。例如但不限 於,某錢浸之” E型”玻璃為一組範圍很廣 &lt; 玻璃組合( 物’無論表面活性係按原樣接收或經處理甚 处主座生表面活性狀 126433.doc -24- 200843847 態,ΙΕΡ均小於4·5但大於0。 通常,此種酸浸之Ε型玻璃將包括酸性或鹼性氧化物型 玻璃網狀物改質劑,包括(例如)但不限於辞(Ζη)、鎂 (Mg)、鈣(Ca)、鋁(Α1)、硼(Β)、鈦(Ti)、鐵(Fe)、鈉(Na)及 鉀(K)專元素的氧化物。若使用驗性網狀物改質劑,則包 括在該等酸浸之E型玻璃内之量傾向於為&lt;5 wt·%。包含 Γ 鎂、鈣、鋁、鋅、鈉及鉀之玻璃係較佳。生產本發明之觸 媒組合物較佳採用無微孔隙玻璃基質,IEp ,但&gt;〇,且 中孔性及大孔性相應於小於基質總表面積約95%,且相應 或何外表面積之範圍約為基質總表面積之5%至4〇%。 多孔性說明 基質之多孔性係產生本發明觸媒組合物之另一相關態 樣田通吊,基質應為實質上無微孔隙,但實際上可能存在 數ϊ上無關緊要’對於觸媒組合物之預定用途沒有不利影 響的中孔隙及/或大孔隙體積。由於材料中的微孔隙體積 =難則貞測’故本說明使用兩種表面積量測法來測定基 貝二否實質上無微孔隙’以則本發明之觸媒組合物。 第:項表面積量測資料係藉由適用於接受量測之預期表 ==圍的熱吸附/脫附方法進行測定,τ用於㈣微孔 旦孔隙及/或2大孔隙之程度β例如,對於較大表面積 二:如&gt;約3 mvg) Ν2 ΒΕΤ,按照astm議3,所述 而,Γ (1AK)可能係、較佳的表面積量測技術。然 ASTM於較小表面積量測(例如,A) Kr BET,按昭 D侧_95所述的方法,(&quot;sa.咖”)可能係較佳的 126433.doc -25- 200843847 表面積量測技術。熟習分析固體及半固體材料表面積之技 術者將很清楚用於偵測微孔隙、中孔隙及/或大孔隙程度 的最佳表面積量測方法。第二項量測係鈉_化學吸附表面 積(S.A.w ) ’可使用某類分析方法(R. Iler在 &amp;·/—,John Wiley &amp; Sons (1979)在第 203及 353 頁描述)表 不為NaOH滴定液的變化與時間比,並按照S A -變化率 (’’SARC-”)更具體的定義。 因此’如本文所定義,基質實質上無微孔隙,前提為基 夤之灯或S.A.hwr—廣處於約5 m2/g至約300 m2/g 之間’較佳為5 m2/g至約150 m2/g,而更佳為5 m2/g至約 75 m2/g ;無論如何,其sarC-小於或等於〇·5。如以上更 «羊細的时論’ 8八尺0心為NaOH滴定液的兩種體積之比,其 分母為最初使用的NaOH滴定液液之體積,即最初用於在 零時間t。滴定一基質漿液混合物,該基質漿液混合物在4 M NaCl溶液(pH 4至pH 9)中在約25°C中包含1.5公克之基 質。但,如上所述,在最初的NaOH滴定開始用於SARC^ 測定之前’含水漿液混合物必須首先相應地用少量酸U ” matrix, means any solid or semi-solid material, including but not limited to glass and glass-like materials, IEP greater than 〇 but less than or equal to 14, surface active state can be in accordance with the matrix in the catalyst composition (catalytic effective amount of catalysis The intended use in the component is changed. "Integration, means interaction by electrons and/or physicochemical interactions (eg, ionic, electrostatic or covalent interactions including, but not limited to, hydrogen bonding, ionic bonding, electrostatic bonding) Vander Waals/Dipole Bonding, Affinity Bonding KJ Bonding, and combinations thereof combine the & ingredients with the matrix. MODES FOR CARRYING OUT THE INVENTION The notes underlying the present embodiments are set forth in the description of the scope of the patents that accompany the patent application and are therefore only used to facilitate the presentation of embodiments that may be of potential interest to the reader in a simplified wording. Some are out of shape. Therefore, 'the annotations of this embodiment should not be regarded as not limiting the scope of the invention appended to the application. IX. Samples relating to the catalyst composition, the average thickness of the catalytically active region of the surface active is less than or equal to about 3 〇. The meter, preferably &lt; about 2 〇 nanometer, and more preferably -1 〇 nanometer (&quot;catalyst composition"). 126433.doc -21- 200843847 of the invention is another aspect related to various manufacturing A method of the novel catalyst composition. Another aspect of the invention is to produce a composite form of the catalyst composition, with or without a forming medium. Yet another aspect of the invention relates to the use of a catalyst composition in various processes, Such processes are, for example, hydrocarbon, hydrocarbon and/or non-hydrocarbon treatment, conversion, refining and/or emission control and treatment processes and other types of processes. For example, 'new catalyst compositions can enhance hydrocarbons, hydrocarbons and/or non-hydrocarbons. Reaction selectivity, reaction rate, yield yield and energy efficiency of hydrocarbon treatment, conversion, refining and/or emission control and treatment processes and other types of processes. Several factors should be considered in the production of catalyst compositions. Including but It is not limited to: (1) In view of the intended use, 'obtaining a substrate having a predetermined isoelectric point (,, ΙΕΡΠ)' obtained either as it is or after subsequent processing; (ii) the degree of corrosion resistance of the substrate for the intended use; (iii) in view of the intended use, in order to obtain the desired surface properties, the degree of porosity of the substrate, if any, and the associated elemental composition (particularly on the surface), (iv) depending on the intended use of the composition, as appropriate The substrate is chemically sensitive to the generation of a suitable electrical point, and the substrate is surface active by one or more first components having a first type of ion and/or electrostatic interaction with the substrate, which matrix can, but does not necessarily produce, a catalytically active region having an average thickness on and/or within the surface of the substrate of &lt; about 30 nm, preferably &lt; about 2 nanometers, more preferably about 10 nanometers; The chemical sensitivity of the substrate to a selective ion exchange (ΙΕχ), counter ion exchange 126433.doc -22- 200843847 (BIX) and/or electrostatic adsorption (EA) treatment methods, which are used to Various The two components are integrated onto and/or within the surface of the substrate having a second type of interaction with the matrix ions and/or electrostatics and thereby producing a catalytically active region on and/or within the surface of the substrate The average thickness is about 30 nm, preferably &lt; about 20 nm, more preferably about 10 nm; and (vi) depending on the intended use of the composition, the treated substrate is reacted as follows Chemical Sensitivity: Optional satin burning and / or reduction, oxidation or further chemically reacting the treated substrate with the first or second catalytic component prior to use of the catalyst composition. I. Matrix Description For many potential applications Preferably, the preferred embodiment and preferred range of IEp selections are preferred. The matrix used to produce the catalyst composition of the present invention is a glass composition. The surface activity is either received as received or treated to produce surface activity, and the IEP is greater than About 〇 but less than or equal to 14. The availability of a matrix with a suitable IEP (suitable for producing a catalyst composition for the intended use) depends on various factors, some of which have been outlined above (in, in an overview of the implementation). In view of the more detailed discussion below, those skilled in the art will be more aware of other factors associated with selecting an appropriate IEP. For example, for many processes of commercial interest, the glass (or glass-like) composition and its surface active product preferably have a enthalpy of greater than or equal to about 4. 5 but less than 14, and are expected to be greater than or equal to about 6 〇 but less than The glass of 14 and the preferred material of the crucible is more than or equal to about 7·8 but less than 14 glass 126433.doc -23- 200843847 The composition is the best. The absence of ", and" depends on the intended use of the catalyst composition and the extent and type of & f and tau pores in the matrix of the composition. The preferred IEP range may be affected. & 'Some catalytic processes are more sensitive to catalyst compositions that have surface activity at lower pH ranges. Therefore, in these cases, IEP is less than 7.8 (preferably t is preferably &lt;4·5) The matrix is likely to be more suitable for such processes. The household is $ ^ ^ α ^ ^ , so, again, when choosing the base negative within the appropriate range * only consider the intended use of the catalyst composition It is also necessary to combine the porosity of the substrate, the chemical composition and the processing procedure (if any), etc. Depending on the intended catalytic use, many glass types can be potential base f candidates, the appropriate degree of IEP and porosity. And class $, whether received or used as follows - or a variety of treatment methods. Typically, examples of such glass types include, but are not limited to, E-glass, boron-free glass, S-glass, R-glass 'AR type Glass, rare earth, bismuth silicate glass 钡 titanium-tannic acid Salt glass, nitride glass such as bismuth-aluminum_oxygen-nitrogen glass, A-glass, c-glass and CC-type glass. Then, the following is an example of glass that is generally expected for a range of catalytic applications and some possible treatments. Type bismuth leaching E-glass indicates that the substrate used to produce the catalyst composition of the present invention preferably comprises a glass composition substantially free of micropores, but at least some of the mesopores and macropores (&quot;no microporosity. The constituting glass material, and the IEp generally has a force of 7.8, preferably about 6, and more preferably &lt; about 4.5' but in any case is greater than 〇. For example, but not limited to, a certain money dip" E type "Glass is a wide range of &lt; glass combinations (whatever the surface active system receives or is treated as the main surface active 126433.doc -24- 200843847 state, the enthalpy is less than 4. 5 but greater than 0. Typically, such acid immersed bismuth glasses will include acidic or basic oxide type glass mesh modifiers including, for example, but not limited to, (Ζη), magnesium (Mg), calcium (Ca) , aluminum (Α1), boron (Β), titanium (Ti), iron (Fe), sodium (Na) and (K) an oxide of a specific element. If an organic network modifier is used, the amount included in the acid-impregnated E-glass tends to be &lt;5 wt.%, including strontium magnesium, calcium, The glass of aluminum, zinc, sodium and potassium is preferred. The catalyst composition of the present invention is preferably a microporous glass substrate, IEp, but &gt;〇, and the mesoporosity and macroporosity correspond to less than the total matrix. The surface area is about 95%, and the corresponding or external surface area ranges from about 5% to about 4% of the total surface area of the matrix. Porosity indicates that the porosity of the matrix produces another related aspect of the catalyst composition of the present invention. The matrix should be substantially free of microporosity, but there may actually be a number of mesopores and/or macropore volumes that do not adversely affect the intended use of the catalyst composition. Since the micropore volume in the material = is difficult to detect, it is described that two surface area measurements are used to determine whether the base 2 is substantially free of micropores' to the catalyst composition of the present invention. The first item surface area measurement data is determined by a thermal adsorption/desorption method suitable for accepting the measurement of the expected table ==, and the τ is used for (4) the degree of microporous pores and/or 2 large pores β, for example, For larger surface area two: eg &gt; about 3 mvg) Ν2 ΒΕΤ, according to astm 3, Γ (1AK) may be a preferred surface area measurement technique. However, ASTM is measured on a smaller surface area (for example, A) Kr BET, as described in the paragraph _95, (&quot;sa. coffee) may be better 126433.doc -25- 200843847 surface area measurement Techniques. Those skilled in the art of analyzing the surface area of solid and semi-solid materials will be aware of the best surface area measurement method for detecting microporosity, mesopores and/or macroporosity. The second measurement is sodium _ chemical adsorption surface area. (SAw) 'A certain type of analytical method can be used (R. Iler in &amp;·/—, John Wiley &amp; Sons (1979) on pages 203 and 353) to indicate the change in time versus time for NaOH titrant, and A more specific definition according to the SA-rate of change (''SARC-'). Thus, as defined herein, the matrix is substantially free of micropores, provided that the lamp or SAhwr of the substrate is between about 5 m2/g and about 300 m2/g, preferably from 5 m2/g to about 150. M2/g, and more preferably from 5 m2/g to about 75 m2/g; in any case, its sarC- is less than or equal to 〇·5. For example, the above is more than the ratio of the two volumes of the NaOH titration solution. The denominator is the volume of the initially used NaOH titration solution, which is initially used at zero time t. A matrix slurry mixture was titrated and the matrix slurry mixture contained 1.5 grams of substrate in a 4 M NaCl solution (pH 4 to pH 9) at about 25 °C. However, as mentioned above, before the initial NaOH titration is used for SARC^ determination, the aqueous slurry mixture must first be used with a small amount of acid.

(HC1)或鹼(NaOH)調整為pH 4。另外,仍如上所述,NaOH 滴定液(用於3個5分鐘的時間間隔、在丨5分鐘内將基質漿 液混合物保持在pH 9)之累積體積為v^-V初(即Vy 15),此 為比率SARCw之分子。所以,若v總-V初小於或等於〇·5 V初 ,相應的SARCw則小於或等於〇·5。因此,如本文所定 義’ SARCa^^O.5的基質實質上無微孔隙(亦即中孔隙和大 孔隙),鈾提為基質之8.八.#2』灯或s.A.hja亦在約5 m2/g至 126433.doc •26- 200843847 約300 m2/g之間,較佳為5 m2/g至約150 m2/g,更佳為約5 m2/g至約75 m2/g。若滿足了該等表面積參數,就基質有任 何其他類型之孔隙體積而言,可有不充分之濃度、分布及/ 或類型’因而可對觸媒組合物達成預期用途的期望性能產 生不利影響。 納表面積(&quot;S.A.w”)係一種經驗上的滴定程序,係為粒 狀、粉末狀及懸浮凝膠形式(SUSpended sol form)的基本上 純二氧化矽(Si〇2)所開發。s.A.w係測定表面質子位置 (Glass-CTH—)之反應性及可及性的量度,對於純的二氧化 矽,相當於Si-CrH+位置。矽酸鹽玻璃及晶體矽酸鹽與純 的二氧化矽(Si〇2)在組成上有顯著不同,關於此種滴定程 序之化學計量法,矽酸鹽玻璃及晶體矽酸鹽之行為不能根 據在S.A·^實驗中測定之Na〇H滴定液的絕對值得知或預 測。因此,Sears及Iler用來將s.A-實驗的Na〇H體積與所 研究之二氧化矽材料之N2_BET表面積關聯的方程式,並不 適合可靠預測更複雜的矽酸鹽組合物之絕對表面積。此係 預期情況,因為能夠存在於組成不同之玻璃的G][ass_〇_H+ 基團可包括如 AWIT、Β_〇·Η+、Ti_〇-H+、Mg 〇_H+及與 單個矽2位置的多個si-o-ir部分結合之更多不同結構的質 子群(Q2群)。另一方面,,,矽樣”玻璃組合物(例如酸浸石 英)的總表面積可能可使用S.A.W實驗可靠地確定,前提為 最小的孔隙大小在標準氣相贿量測可達到的範圍内,因 為其主要由連網的Si02及Si_〇-H+部分组成。然而,Giass_ OH部分對於氫氧根離子及納離子的擴散可及性,及多微 126433.doc -27- 200843847 孔對比中孔隙、大孔隙及/或實質上無孔區域的相對百分 率’應可根據NaOH的量(在S.A.w實驗中為保持最終之 值9,必須對比時間添加)(滴定劑)進行偵測。所以,總言 之,Glass-〇-H+部分對於oh-及Na+對比時間的可及性,如 在上述SARCw實驗所確定,可作為存在微孔隙的合理可 靠量度,包括標準氣相BET量測不可及的某類多孔性。 同樣,基質實質上無微孔隙。但,若基質網狀物上有明 顯的離子消耗及伴生之浸出,在基質中則很可能產生多微 孔區域。因此,如上所述,SARC&amp;大於約〇 5可作為基質 上存在大量微孔隙的一個指標。 基質形狀、形式及尺寸說明 用於產生本發明觸媒組合物之基質具有多種形狀及形 式。合適形狀的實例包括但不限於:纖維、原纖化纖維、 圓柱形顆粒(例如球粒)、球狀顆粒(例如球體)、橢圓形顆 粒(例如橢圓體)、扁平顆粒(例如薄片)、不規則斷裂顆 粒、螺旋形或螺旋狀的顆粒及其組合。。 了形成此專基質开&gt; 狀之合適成形體或複合材料的實例包 括但不限於:機織複合材料、非機織複合材料、網眼織 物、壓出物、環形物、鞍狀物、柱體、薄膜、螺旋結合 膜、濾器、纖維絲、切短纖維及其組合。 在某些情況下,視觸媒組合物之預定用途而定,可使用 任何一種合適材料作為成形介質,與催化基質形成成形體 或複合材料(總稱”複合材料”),包括但不限於軟水鋁石 (boehmite)、水合二氧化鈦及Ti〇2、水合氧化锆及,丫 126433.doc 200843847 氧化鋁、α氧化鋁、二氧化矽、黏土、天然及合成聚合纖 維、聚合樹脂及溶劑及水溶性聚合物,無論基質是否包括 1型或2型催化成分(以下更詳細說明)。較佳地,催化基質 應位於或實質接近複合材料之外表面(即位於複合材料之 外周邊)。在不受理論約束的情況下,據認為,若將催化 基質之實質部分置於觸媒複合材料之外部周圍區域(,,複合 材料周邊&quot;)上及/或内,將減小產生非想要之内部複合材料 擴散效應的程度。 所以,應理解,用以將催化基質之實質部分定位在複合 材料周邊内及/或上的合適距離,將取決於觸媒複合材料 之預定用途、觸媒複合材料之整體尺寸及形狀及催化基質 之整體尺寸及形狀。因此,在各種複合材料形狀及尺寸 中,該複合材料周邊的平均厚度(在該複合材料周邊上及/ 或内可置放催化基質)通常為約1微米至約4〇〇微米之間。 然而,該複合材料周邊的平均厚度較佳在約米至約25q 微米之間,更佳在約1微米至約15〇微米之間。 然而,視觸媒組合物之預定用途而定,在某些情況下,(HC1) or base (NaOH) was adjusted to pH 4. In addition, as described above, the cumulative volume of the NaOH titrant (for three 5 minute intervals, maintaining the matrix slurry mixture at pH 9 within 5 minutes) is v^-V initial (ie, Vy 15), This is the numerator of the ratio SARCw. Therefore, if v--V is less than or equal to 〇·5 V at the beginning, the corresponding SARCw is less than or equal to 〇·5. Therefore, as defined herein, the matrix of 'SARCa^^O.5 is substantially free of microporosity (ie, mesopores and macropores), and uranium is extracted as a matrix. 8.8.#2』 lamp or sAhja is also about 5 M2/g to 126433.doc •26- 200843847 is between about 300 m2/g, preferably from 5 m2/g to about 150 m2/g, more preferably from about 5 m2/g to about 75 m2/g. If such surface area parameters are met, there may be insufficient concentration, distribution, and/or type of the matrix in any other type of pore volume&apos; which may adversely affect the desired performance of the catalyst composition for its intended use. The nano surface area (&quot;SAw") is an empirical titration procedure developed for substantially pure cerium oxide (Si〇2) in the form of granulated, powdered and suspended gels. sAw determination The measure of the reactivity and accessibility of the surface proton position (Glass-CTH-) corresponds to the Si-CrH+ position for pure cerium oxide. The bismuth silicate glass and crystalline bismuth silicate and pure cerium oxide (Si) 〇 2) There are significant differences in composition. For the stoichiometry of this titration procedure, the behavior of bismuth silicate glass and crystalline citrate cannot be determined from the absolute value of the Na〇H titrant determined in the SA·^ experiment. Or prediction. Therefore, the equations used by Sears and Iler to correlate the 〇A-experimental Na〇H volume with the N2_BET surface area of the ceria material studied are not suitable for reliably predicting the absolute surface area of more complex citrate compositions. This is expected because G][ass_〇_H+ groups that can exist in different compositions of glass can include, for example, AWIT, Β_〇·Η+, Ti_〇-H+, Mg 〇_H+, and a single 矽Multiple si-o-ir parts of 2 positions combined more The same structure of the proton group (Q2 group). On the other hand, the total surface area of the 矽-like glass composition (such as acid immersion quartz) may be reliably determined using the SAW experiment, provided that the minimum pore size is in the standard gas phase. The bribe measurement can be reached because it consists mainly of the networked Si02 and Si_〇-H+ parts. However, the diffusion accessibility of the Giass_OH moiety to hydroxide ions and nanoions, and the relative percentage of pores, macropores, and/or substantially non-porous regions in the 126433.doc -27- 200843847 pores should be Detected according to the amount of NaOH (in the SAw experiment to maintain the final value of 9, must be added over time) (titrant). Therefore, in summary, the accessibility of the Glass-〇-H+ part to the oh- and Na+ contrast time, as determined by the above-mentioned SARCw experiment, can be used as a reasonable and reliable measure of the presence of micro-pores, including standard gas-phase BET measurements. And some kind of porosity. Again, the matrix is substantially free of micropores. However, if there is significant ion depletion and associated leaching on the matrix network, microporous regions are likely to be produced in the matrix. Therefore, as described above, SARC &amp; greater than about 〇 5 can be used as an indicator of the presence of a large amount of micropores on the substrate. Matrix Shape, Form and Size Description The matrix used to produce the catalyst composition of the present invention has a variety of shapes and forms. Examples of suitable shapes include, but are not limited to, fibers, fibrillated fibers, cylindrical particles (eg, pellets), spherical particles (eg, spheres), elliptical particles (eg, ellipsoids), flat particles (eg, sheets), no Regular broken particles, spiral or helical particles, and combinations thereof. . Examples of suitable shaped bodies or composites that form such a dedicated matrix include, but are not limited to, woven composites, non-woven composites, mesh fabrics, extrudates, rings, saddles, cylinders, Films, spiral bonded films, filters, filaments, chopped fibers, and combinations thereof. In some cases, depending on the intended use of the catalyst composition, any suitable material may be used as the forming medium to form a shaped body or composite (collectively "composite") with the catalytic substrate, including but not limited to soft water aluminum. Boehmite, hydrated titanium dioxide and Ti〇2, hydrated zirconia and 丫126433.doc 200843847 Alumina, alpha alumina, ceria, clay, natural and synthetic polymeric fibers, polymeric resins and solvents, and water soluble polymers Whether or not the matrix includes a type 1 or type 2 catalytic component (described in more detail below). Preferably, the catalytic substrate should be at or substantially adjacent to the outer surface of the composite (i.e., at the outer periphery of the composite). Without being bound by theory, it is believed that if a substantial portion of the catalytic substrate is placed on and/or within the outer surrounding region of the catalytic composite, the resulting non-conceived The extent to which the internal composite material diffuses. Therefore, it should be understood that the proper distance for positioning a substantial portion of the catalytic substrate within and/or over the periphery of the composite will depend on the intended use of the catalytic composite, the overall size and shape of the catalytic composite, and the catalytic substrate. The overall size and shape. Thus, in various composite shapes and sizes, the average thickness of the perimeter of the composite (the catalytic substrate can be placed on and/or within the periphery of the composite) is typically between about 1 micrometer and about 4 micrometers. However, the average thickness of the periphery of the composite is preferably between about 1 meter and about 25 nanometers, more preferably between about 1 micrometer and about 15 micrometers. However, depending on the intended use of the composition, in some cases,

顆粒之平均最大尺寸)通常在大於約〇 之敢小尺寸(即基質 〇5微米至小於或等於 126433.doc -29- 200843847 約150微米之間,較佳在約〇2微米至小於或等於約i5〇微 米之間,更佳在約0.2微米到約5〇微米之間。然而,視組 合物之預定用途及其他可能受到觸媒組合之形狀及形式影 響的製程變數而定,超出該範圍的基質仍然可有效,例如 在上述之連續纖維形式中,不會對觸媒組合物之期望性能 產生不利影響。 熟習此項技術者應理解,複合操作可能將潛在的微孔隙 及額外的大孔隙及/或中孔隙引入成品複合材料。然而, 在複合操作製程中,如本文所述,此多孔性未引入觸媒組 合物之官能化表面組分。 π·基質表面活化 用於產生本發明觸媒組合物之基f可藉由—或多種第一 成分使表面活化,該第一成分具有與基質的第一類離子及/ 或靜電相互作用(丨丨1形赤八乂邮仏n、 t 1 1成刀刖驅物)。如以下更詳細所述, 1型成分前驅物可能太I料、士 身就有催化效力或係可經進一步處 理來產生催化活性區域,在基質表面上及/或内的平均厚 度為S約30奈米’較佳為S約2〇奈米奈米之平均厚度,更佳 為如〇奈米奈米之平均厚度。例如,在某些情況下,取 決於觸媒組合物之預定用途,若所獲得之基質在適於預定 用途的範圍内具有適當類型及程度之孔隙結構(若有)及等 電點(IEP)’基質在接收時可能具有充分表面活性,可有效 催化雖非必要但較佳,基質可經處理來進—步修改及/ 〆進八表面活性。另外,基質亦可藉由處理來移除任何 預計可能干擾觸媒組合物性能的有機塗料或其他可能之污 126433.doc &gt;30- 200843847 染物。此外,如以下更詳細論述,在”2型成分前驅物整合 處理’’下,取決於觸媒組合物之預定用途,更佳的做法可 能是用離子交換(IEX)、反離子交換(BIX)及/或靜電吸附 (EA)處理方法進一步處理基質之表面,該等處理方法將一 或多種第二成分整合至基質表面上及/或内,該基質表面 具有第二類與基質之離子及/或靜電相互作用,並因此產 生催化活性區域’在基質表面上及/或内的平均厚度為〇 奈米’較佳為&lt;20奈米,更佳為&lt;1〇奈米。 基質污染物移除處理 視典型情況下在基質表面上發現之物質的組成及該物質 是否預計會干擾觸媒組合物之製備及/或干擾觸媒組合物 達成預定用途的期望性能而定,可選擇進行污染物移除處 理。例如,典型情況下,AR型玻璃使用有機塗層製造(亦 即施膠)’該有機塗層用於促進加工處理,例如在含水調 配物中之分散。然而,即使不會干擾觸媒組合物之大部分 (若非全部)預定用途之催化性能,該有機塗層或施膠亦可 能會干擾觸媒組合物之製備。所以應移除有機塗層。 锻燒係適用於移除此種有機塗層的一種較佳方法。因為 此項處理之主要目標係將污染物自基質移除,因此此類锻 燒處理的條件對於基質成功的表面活化並非特別重要。在 某些情況下,取決於欲自基質移除之污染物的性質,溶 劑、界面活性劑、水溶液清洗或其他適用的方法可用於移 除污染物,達到滿意的效果。 然而,根據所使用之煅燒程度,較佳地在氧化性氣气 126433.doc •31· 200843847 (例如在空氣或氧氣中)中煅燒基質。另外很重要的係,要 選擇夠高的燒溫度來移除目標污染物,但煅燒溫度又要夠 低以合理避免材料之軟化點。通常,煅燒溫度應至少比所 選基質材料之軟化點低約50。(:。較佳地,煅燒溫度應至少 比所選基質材料之軟化點低約1 〇〇。例如,在使用AR型 玻璃時,大部分AR型玻璃可接受之移除污染物的煅燒溫 度在約300°C至約700°C之間。通常,所選擇之基質材料應 锻燒約2至14小時,較佳锻燒4至8小時。儘管如此,取決 於所獲基質之性質及欲自基質移除之目標污染物的性質, 锻燒時間可在該等時間範圍外變化。 藉由離子浸出處理達成表面活化 在任何潛在之污染物實質上自基質移除以後,基質可藉 由處理來產生表面活性狀態及所要之等電點(,,ΙΕρπ),前提 為以基質獲得的最初ΙΕΡ不在所要之範圍内。然而,在某 些情況下’所接收的基質可能具有足夠的表面活性,需要 使用一或多種其他處理(在以下更詳細說明)進一步改質, 而不使用第一類離子浸出(ΙΕΧ_υ處理(此會在以下更詳細 說明的其他處理中首先論述)。換言之,基質之元素組 成,特別係在外表面或實質上接近外表面上的元素組成, 可能足以獲得所要之ΙΕρ。然而,在很多情況下,基質之 兀素組成將需要一些改質來改變最初的ΙΕρ並獲得適合的 ΙΕΡ,接著按照觸媒組合物之預定用途,獲得在類型及程 度上符合要求的表面活性狀態。 名表面活性狀態,在一或多種第一成分具有⑴第一氧化 126433.doc -32- 200843847 狀態及(ϋ)第一類與基質的離子及/或靜電相互作用的情況 下,可能足以產生催化活性區域,在基質表面上及/或内 的平均厚度為S約30奈米,較佳為 &lt;約2〇奈米,更佳為&lt;約 1〇奈米,且因此提供觸媒組合物達成預定用途的期望性 能。例如但不限於,基質表面上及/或内的布忍司特 (Bronsted)或路易士(Lewis)酸位及布忍司特或路易士鹼位 能夠有效促進一些烴、杂烴(例如含氧烴)及非烴處理、轉 化及/或精煉製程。 然而,在其他情況下,基於觸媒組合物之預定用途,可 能更佳的方式係用一或多種如下所述的離子交換法來進一 步處理基質表面,以達成⑴可與第一氧化狀態相同或不同 的第二氧化狀態,及(Π)第二類與基質的離子及/或靜電相 互作用,足以產生催化活性區域,在基質表面上及/或内 的平均厚度為S約30奈米,較佳為 &lt;約20奈米,更佳為&lt;約 10奈米。 ' 現轉至表面活化處理,表面活化處理包括至少一种離子 浸出處理,用以獲得第一類或丨類離子交換(正尽丨)基質。 然而,應理解,若所接收的基質具有適合觸媒組合物達成 預定用途之IEP,則IEX_;[亦準備用於說明該第一類基質。 通常,該離子浸出處理係藉由任何適當的方法執行、,亦 即以實質異質之方式自整個基質表面有效移除所需之離子 種類,而不會明顯侵蝕基質網狀物(例如,避免在表面區 域及/或表面下區域產生任何微孔結構)。例如但不限於大 部分酸類物質,無論係無機酸或有機酸,及各種螯合劑, 126433.doc -33- 200843847 均適用於離子浸出處理。較佳地,使用無機酸,例如但不 限於硝酸、磷酸、硫酸、鹽酸、乙酸、過氯酸、氫溴酸、 氯磺酸、三氟乙酸及其組合。 通常,用於離子浸出處理之酸溶液的濃度取決於基質之 特性(例如,欲自玻璃網狀物移除之離子的親和力、在移 除網狀物離子後玻璃之強度)、基質之IEP需要改變的程度 及觸媒組合物之預定用途。較佳地,用於離子浸出處理之 酸溶液的濃度可在約〇_5 wt·%至約50 wt.%之間,更佳在約 2·5 wt·%至約25 wt·%之間,最佳在約5 wt·%至約1〇 wt 〇/〇 之間。 螯:亦可用於離子浸出處理,例如,但不限於乙二胺 四乙酸(’’EDTA”)、冠醚、乙二酸鹽、聚胺、聚羧酸及其組 合。 通常,用於離子浸出處理之螯合劑溶液的濃度取決於基 質之特性(例如,欲自玻璃網狀物移除之離子的親和力、 在移除網狀物離子後玻璃之強度)及觸媒組合物之預定用 途。較佳地,用於離子浸出處理之螯合劑溶液的濃度可在 約0.001 wt·%至飽和度之間,更佳在約〇〇1 wt%至飽和度 之間。 通#,會根據所使用之酸或螯合劑之類型及濃度及基質 之特性,選擇用於離子浸出處理的熱處理條件,例如加熱 溫度、加熱時間及混合條件。 視酸溶液或螯合劑溶液之濃度而定,加熱溫度的變化範 圍很大。然而,較佳地,適用於酸離子浸出處理的加熱溫 126433.doc -34- 200843847 度在約20 °C至約200 °C之間,更佳在約40 °C至約95 °C之 間,最佳在約60°C至約9(TC之間。,適用於螯合劑離子浸 出處理的加熱溫度在約20°C至約200°C的範圍,更佳在約 4〇°C至約90°C的範圍。 視酸溶液或螯合劑溶液之濃度及加熱時間而定,適用於 離子次出處理的加熱時間可改變。較佳地,用於離子浸出 處理的加熱時間在約15分鐘至約48小時之間,更佳在約3〇 分鐘至約12小時之間。 fThe average maximum size of the particles is typically between about 5 microns to less than or equal to 126433.doc -29 to 200843847 and about 150 microns, preferably about 2 microns to less than or equal to about 〇. More preferably between about 5 microns and about 5 microns. However, depending on the intended use of the composition and other process variables that may be affected by the shape and form of the combination of catalysts, beyond this range The matrix can still be effective, for example, in the continuous fiber form described above, without adversely affecting the desired properties of the catalyst composition. Those skilled in the art will appreciate that the compounding operation may have potential micropores and additional macropores and / or the mesopores are introduced into the finished composite. However, in a composite operation process, as described herein, this porosity does not introduce a functionalized surface component of the catalyst composition. π. Matrix surface activation is used to produce the catalyst of the present invention. The base f of the composition may be activated by - or a plurality of first components having a first type of ion and/or electrostatic interaction with the substrate (丨丨1形赤八乂 仏 n, t 1 1 into a knives drive). As described in more detail below, the type 1 precursor may be too material, the body has catalytic effect or can be further processed to produce catalytically active areas, The average thickness on and/or within the surface of the substrate is S about 30 nm. Preferably, the average thickness of S is about 2 nanometer nanometers, more preferably the average thickness of nanometer nanometers. For example, at some In some cases, depending on the intended use of the catalyst composition, if the matrix obtained has a suitable type and extent of pore structure (if any) and an isoelectric point (IEP) matrix in the range suitable for the intended use, It may have sufficient surface activity to effectively catalyze, although not necessarily, preferably, the substrate may be treated to further modify and/or entangle the eight surface activity. In addition, the substrate may also be treated to remove any expected interference. An organic coating or other possible stain of the properties of the composition 126433.doc &gt;30-200843847. Further, as discussed in more detail below, under "type 2 component precursor integration treatment", depending on the catalyst composition For intended use, better It may be possible to further treat the surface of the substrate by ion exchange (IEX), counter ion exchange (BIX) and/or electrostatic adsorption (EA) treatments which integrate one or more second components onto the surface of the substrate and/or Or internally, the surface of the substrate has a second type of ionic and/or electrostatic interaction with the substrate, and thus the catalytically active region 'average thickness on and/or within the surface of the substrate is 〇 nanometer' preferably &lt;20 Nano, more preferably &lt;1 〇 nanometer. Substrate contamination removal treatment depends on the composition of the material typically found on the surface of the substrate and whether the material is expected to interfere with the preparation and/or interference of the catalyst composition. Depending on the desired properties of the media composition for the intended use, a contaminant removal process may be selected. For example, typically, the AR-type glass is made using an organic coating (i.e., sized). The organic coating is used to facilitate processing, such as dispersion in aqueous formulations. However, the organic coating or sizing may interfere with the preparation of the catalyst composition, even if it does not interfere with most, if not all, of the catalytic properties of the intended use of the catalyst composition. Therefore, the organic coating should be removed. Calcination is a preferred method for removing such organic coatings. Because the primary goal of this treatment is to remove contaminants from the matrix, the conditions of such forging treatments are not particularly important for successful surface activation of the matrix. In some cases, depending on the nature of the contaminant to be removed from the substrate, solvents, surfactants, aqueous washes, or other suitable methods can be used to remove contaminants for satisfactory results. However, depending on the degree of calcination used, the substrate is preferably calcined in an oxidizing gas 126433.doc • 31· 200843847 (e.g., in air or oxygen). In addition, it is important to select a high enough firing temperature to remove the target contaminant, but the calcination temperature is low enough to avoid the softening point of the material. Generally, the calcination temperature should be at least about 50 lower than the softening point of the selected matrix material. Preferably, the calcination temperature should be at least about 1 Torr lower than the softening point of the selected matrix material. For example, when using AR-type glass, the calcination temperature at which most AR-type glasses can be removed to remove contaminants is Between about 300 ° C and about 700 ° C. Typically, the selected matrix material should be calcined for about 2 to 14 hours, preferably calcined for 4 to 8 hours. However, depending on the nature of the substrate obtained and desired The nature of the target contaminant removed by the matrix, the calcination time can vary outside of these time ranges. Surface activation by ion leaching treatment After any potential contaminants are substantially removed from the matrix, the matrix can be processed by Producing a surface active state and a desired isoelectric point (, ΙΕρπ), provided that the initial enthalpy obtained from the matrix is not within the desired range. However, in some cases the 'substrate received may have sufficient surface activity, requiring Further modification using one or more other treatments (described in more detail below) without using the first type of ion leaching (ΙΕΧ_υ treatment (this will be the first of the other treatments described in more detail below) In other words, the elemental composition of the matrix, especially on the outer surface or substantially close to the outer surface, may be sufficient to obtain the desired enthalpy. However, in many cases, the matrix composition of the matrix will require some modification. Varying the initial ΙΕρ and obtaining a suitable ΙΕΡ, and then obtaining a surface state that meets the requirements of the type and degree according to the intended use of the catalyst composition. Surface state, one or more first components having (1) first oxidation 126433.doc -32- 200843847 State and (ϋ) The first type of interaction with the ionic and/or electrostatic interaction of the substrate may be sufficient to produce a catalytically active region having an average thickness on and/or within the surface of the substrate. 30 nm, preferably &lt; about 2 〇 nanometers, more preferably &lt; about 1 〇 nanometer, and thus providing the desired properties of the catalyst composition to achieve the intended use, such as, but not limited to, on the surface of the substrate and/or Or within the Bronsted or Lewis acid sites and Brunsett or Lewis bases can effectively promote some hydrocarbons, hydrocarbons (such as oxygenated hydrocarbons) and non-hydrocarbons Process, conversion and/or refining process. However, in other cases, based on the intended use of the catalyst composition, it may be preferable to further treat the substrate surface by one or more ion exchange methods as described below to achieve (1) a second oxidation state which may be the same as or different from the first oxidation state, and (第二) a second type of interaction with the ions and/or electrostatics of the matrix, sufficient to produce a catalytically active region, on the surface of the substrate and/or within the average The thickness is about 30 nm, preferably &lt; about 20 nm, more preferably &lt; about 10 nm. ' Now the surface activation treatment, the surface activation treatment includes at least one ion leaching treatment to obtain The first type or hydrazine ion exchange (positive) matrix. However, it should be understood that if the substrate received has an IEP suitable for the intended use of the catalyst composition, then IEX_; [also prepared to illustrate the first class Matrix. Typically, the ion leaching process is performed by any suitable means, i.e., effective removal of the desired ionic species from the entire substrate surface in a substantially heterogeneous manner without significant erosion of the matrix network (eg, avoiding The surface area and/or the subsurface area produces any microporous structure). For example, but not limited to, most of the acids, whether inorganic or organic, and various chelating agents, 126433.doc -33-200843847 are suitable for ion leaching. Preferably, mineral acids such as, but not limited to, nitric acid, phosphoric acid, sulfuric acid, hydrochloric acid, acetic acid, perchloric acid, hydrobromic acid, chlorosulfonic acid, trifluoroacetic acid, and combinations thereof are used. Generally, the concentration of the acid solution used for the ion leaching treatment depends on the characteristics of the substrate (for example, the affinity of the ions to be removed from the glass network, the strength of the glass after removal of the network ions), the IEP of the substrate needs The extent of the change and the intended use of the catalyst composition. Preferably, the concentration of the acid solution used for the ion leaching treatment may be between about 〇5 wt.% to about 50 wt.%, more preferably between about 2.5 wt.% and about 25 wt.%. Preferably, it is between about 5 wt.% and about 1 〇wt 〇/〇. Chelating: It can also be used in ion leaching treatments such as, but not limited to, ethylenediaminetetraacetic acid (''EDTA'), crown ethers, oxalates, polyamines, polycarboxylic acids, and combinations thereof. The concentration of the treated chelating agent solution depends on the nature of the substrate (e.g., the affinity of the ions to be removed from the glass network, the strength of the glass after removal of the network ions) and the intended use of the catalyst composition. Preferably, the concentration of the chelating agent solution for ion leaching treatment may be between about 0.001 wt.% and saturation, more preferably between about 1 wt% and saturation. The type and concentration of the acid or chelating agent and the characteristics of the substrate, and the heat treatment conditions for the ion leaching treatment, such as the heating temperature, the heating time, and the mixing conditions, are selected. The range of the heating temperature depends on the concentration of the acid solution or the chelating agent solution. However, preferably, the heating temperature for the acid ion leaching treatment is 126433.doc -34 - 200843847 degrees between about 20 ° C and about 200 ° C, more preferably between about 40 ° C and about 95 ° Between C, preferably at about 60 ° C Between 9 and TC., the heating temperature suitable for the chelating agent ion leaching treatment is in the range of from about 20 ° C to about 200 ° C, more preferably in the range of from about 4 ° C to about 90 ° C. The heating time suitable for the ion secondary treatment may vary depending on the concentration of the chelating agent solution and the heating time. Preferably, the heating time for the ion leaching treatment is between about 15 minutes and about 48 hours, more preferably Between about 3 minutes and about 12 hours. f

通常,會根據所使用之酸劑或螯合劑類型及濃度及基質 之特性(例如,欲自玻璃網狀物移除之離子的親和力、在 移除網狀物離子後玻璃之強度等)及熱處理之持續時間, 選擇混合條件。例如但不限於,混合條件可為連續或斷 續,亦可為機械混合、流化、翻滾、滾動或手動混合。 總之,酸劑或螯合劑濃度、熱處理條件及混合條件的組 合,會根據在酸劑或螯合劑與目標基質離子之間達成足夠 的離子交換(”鮮)程度予以確定,用以產生合適的等電胃: 及表面電狀類型及程度,以達成基f的後處理或觸媒組 合物的預定用途所需之表面活性狀態。 一隹離于次出處理完成後,較佳地以任何合適的方法分離 經離子浸出處理之基質,包括但不限 “万式、離心方 式、傾析及其組合。鍾,用一或多種適當的清洗液(例 如去離子水及/或適用的水溶性有機溶劑,例如甲醇、乙 醇或丙_)清洗經離子浸出處理之基 貝 並在約室内溫产 至110°c之溫度下乾燥約20至24小時。 又 126433.doc -35- 200843847 反離子交換處理 在有一 b況下,取決於觸媒組合物之預定用途,可能較 L的方式係對選定之基質進行反離子交換或兩步 2離子又換處理(在本文中統稱為處理)。MX處理通常 '為G不限於)反離子”交換,因為將經離子浸出之基質 I括最初移除之一種離子的鹽溶液(例如NaCl)混合,經 離子浸出處理而_其@ ^ t ^ 叫目基質移除之此種離子(例如Na+)隨後會Generally, depending on the type and concentration of the acid or chelating agent used and the characteristics of the substrate (for example, the affinity of the ions to be removed from the glass network, the strength of the glass after removal of the network ions, etc.) and heat treatment The duration, select the mixing conditions. For example, without limitation, the mixing conditions can be continuous or intermittent, or mechanical mixing, fluidization, tumbling, rolling, or manual mixing. In summary, the combination of acid or chelating agent concentration, heat treatment conditions, and mixing conditions will be determined based on the degree of sufficient ion exchange between the acid or chelating agent and the target matrix ion to produce a suitable Electrostomosis: and the type and extent of surface electrical properties to achieve the surface active state required for the post-treatment of the base f or the intended use of the catalyst composition. Preferably, after completion of the secondary treatment, preferably any suitable The method separates the substrate subjected to ion leaching, including but not limited to "10,000", centrifugation, decantation, and combinations thereof. Washing the ion-leached scallops with one or more suitable cleaning solutions (such as deionized water and/or a suitable water-soluble organic solvent such as methanol, ethanol or propylene) and warming to about 110° in a chamber Dry at a temperature of c for about 20 to 24 hours. 126433.doc -35- 200843847 In the case of a b-exchange treatment, depending on the intended use of the catalyst composition, it may be possible to carry out counter-ion exchange or two-step 2-ion exchange treatment for the selected substrate compared to the L mode. (collectively referred to as processing in this article). The MX treatment is usually 'not limited to G' for counter ion exchange) because the ion-leached matrix I is mixed with a salt solution (eg, NaCl) of an ion that is initially removed, and is subjected to ion leaching treatment _ its @ ^ t ^ This type of ion (eg Na+) removed from the substrate will then

&quot;或1回基貝。目前尚不清楚自基質中移除之離子是否 :定會返回最初在基質中佔據的相同位置。但,無論最初 被置換之離子是否t因為BIX處理而完全或部分改變位置 ,根本不改變位置,都應理解,本文中說明的處理涵 皿由於任何該等可能的離子位點之置放變化而產生之所有 觸媒組合物。 通吊’用於處理經離子浸出處理之基f的鹽溶液類型, 取決於將進行反離子交換之離子類型。較佳地,只進行一 離子的反離子父換,但在某些情況下,可能需要進行兩 種或更多種離子的反離子交換。 任何易於藉由上述離子浸出處理方法移除之離子均可進 行t離t交換。該等離子之一些實例包括但不限於第1族 (以刚的第IA族)鹼金屬離子,例如鋰、鈉及鉀離子,及來 自第2族(以前的第IIA族)的驗土金屬離子,例如皱、鎂、 約離子、NH/及院基銨陽離子,及小型有機聚陽離子。'較 佳地,鹼金屬離子及NH,係用於ΒΙχ處理的較佳目標= 子,而Na+及ΝΗ/係較佳的ΒΙΧ離子,且Na+係更佳的 126433.doc -36- 200843847 離子。 通常,用於BIX處理之鹽溶液濃度,取決於經離子浸出 • 處理而要經BIX處理的基質類型及用於返回經離子浸出處 理基質之BIX離子的相對親和力’同樣,與Βΐχ離子返回 • 基質網狀物中的位點無關(例如,Na+對於基質對比H+的相 . 對親和力)°對於大部分類型的玻璃基質,例如但不限於 AR型玻璃、A型玻璃或石英玻璃,約〇 〇〇ι则丨化至$ mol/L濃度之BIX-鹽溶液係較佳,而約〇 〇5则 f\ 1 ; mol/L BIX-鹽溶液係更佳。 典型情況下,會根據所使用之BIX-鹽溶液之類型及濃度 * 及基質之特性,選擇用於BIX處理的熱處理條件,例如加 熱溫度、加熱時間及混合條件。 較佳地,用於使用BIX-鹽溶液進行ΒΙχ處理的加熱溫 度,可在約2(TC至約20(TC之間,更佳在約3(Γ(:至約95〇c 之間。 〇 視扪1鹽溶液之濃度及所選擇之加熱溫度而定,用於 BDC處理的加熱時間可改變。較佳地,Βιχ處理的加熱時 間在約5分鐘至約24小時之間,更佳在約3〇分鐘至約8‘小時 • 之間。 . 通#,會根據所使用之ΒΙΧ溶液類型及濃度及基質之特 . 性(例如,欲自玻璃網狀物移除之離子的亲和力、在移除 、、罔狀物離子後玻璃之強度等)及熱處理之持續時間,選擇 S’合條件。例如但不限於’混合條件可為連續或斷續,亦 可為機械混合、流化、翻滾、滾動或手動混合。 126433.doc -37- 200843847 總之’ BIX鹽溶液濃度、熱處理條件及混合條件的組 合’實貝上係基於返回足夠數量及分配足夠數量之•離 , 子回到基質進行確定,而與離子於基質網狀物中之位點無 關。返回及分布足夠數量之BIX-離子係用以產生所需之表 • 面電荷類型及程度,以產生達成基質的後處理或觸媒組合 物的預定用途所要之表面活性狀態。 藉由調整pH來調整基質表面電荷 較佳地,需要用基質上的負表面電荷來支援與帶正電荷 之成分(例如陽離子性鹼土金屬、陽離子性過渡金屬成分 等)的靜電相互作用或親和力。然而,對於一些潛在的觸 • 媒組合物應用,可能需要使用正表面電荷來支持與帶負電 何之成分(例如陰離子性過渡金屬氧離子、硫酸根陰離 子、貴金屬多齒化物陰離子等)的靜電相互作用或親和 力。 通常’可藉由將經離子浸出處理之基質/IEX混合物之pH I 值調整為低於或高於基質等電點(,,IEP”),將基質之表面電 荷改變為淨正性狀態或淨負性狀態。請回想,IEp又稱為 零點電何(&quot;zpc”)。因此,換言之,IEP(或ZPC)可視為材 • 料在初濕時之表面具有淨零表面電荷的pH值。所以,將基&quot; or 1 back to Kibe. It is unclear whether the ions removed from the matrix will return to the same position originally occupied in the matrix. However, regardless of whether the initially displaced ion completely or partially changes position due to BIX processing, and does not change position at all, it should be understood that the processing vessel described herein changes due to any such possible ionic site placement. All catalyst compositions produced. The type of salt solution used to treat the radical f of the ion leaching treatment depends on the type of ions that will undergo reverse ion exchange. Preferably, only one ion counter ion exchange is performed, but in some cases, counter ion exchange of two or more ions may be required. Any ion that is easily removed by the above ion leaching process can be subjected to t-t exchange. Some examples of such plasmas include, but are not limited to, Group 1 (in the immediate Group IA) alkali metal ions, such as lithium, sodium, and potassium ions, and soiled metal ions from Group 2 (former Group IIA), For example, wrinkles, magnesium, about ions, NH/ and amyl ammonium cations, and small organic polycations. Preferably, alkali metal ions and NH are preferred targets for hydrazine treatment, while Na+ and ΝΗ/ are preferred cesium ions, and Na+ is better for 126433.doc -36-200843847 ions. Typically, the concentration of the salt solution used for BIX treatment depends on the type of substrate to be treated by BIX via ion leaching • treatment and the relative affinity of the BIX ions used to return to the ion leaching matrix. Similarly, with yttrium ion return • matrix Site-independent in the network (eg, Na+ for phase versus H+ for matrix). For most types of glass substrates, such as, but not limited to, AR-type glass, A-glass or quartz glass, about 〇〇〇 Preferably, the BIX-salt solution is preferably at a concentration of $mol/L, and about 5 is f\1; the mol/L BIX-salt solution is more preferred. Typically, the heat treatment conditions for the BIX treatment, such as the heating temperature, the heating time, and the mixing conditions, are selected depending on the type and concentration of the BIX-salt solution used and the characteristics of the substrate. Preferably, the heating temperature for the hydrazine treatment using the BIX-salt solution may be between about 2 (TC to about 20 (TC), more preferably between about 3 (Γ(: to about 95 〇c). The heating time for the BDC treatment may vary depending on the concentration of the salt solution and the selected heating temperature. Preferably, the heating time of the Βιχ treatment is between about 5 minutes and about 24 hours, more preferably about Between 3 minutes and about 8' hours • . #, depending on the type and concentration of the solution used and the specificity of the substrate (for example, the affinity of the ions to be removed from the glass mesh, moving) In addition to, the strength of the glass after the bismuth ion, and the duration of the heat treatment, the S' combination condition is selected. For example, but not limited to 'the mixing condition may be continuous or intermittent, or may be mechanical mixing, fluidization, tumbling, Rolling or manual mixing. 126433.doc -37- 200843847 In summary 'BIX salt solution concentration, heat treatment conditions and combination of mixing conditions' are based on returning a sufficient amount and allocating a sufficient amount of separation, sub-back to the matrix to determine, And with ions in the matrix network The point is irrelevant. A sufficient amount of BIX-ion is returned and distributed to produce the desired surface charge type and extent to produce the surface active state desired for the intended use of the substrate or for the intended use of the catalyst composition. Adjusting the pH to adjust the surface charge of the substrate preferably requires the use of a negative surface charge on the substrate to support electrostatic interaction or affinity with positively charged components (e.g., cationic alkaline earth metals, cationic transition metal components, etc.). For some potential catalyst composition applications, it may be necessary to use a positive surface charge to support electrostatic interactions with negatively charged components such as anionic transition metal oxygen ions, sulfate anions, noble metal polydentate anions, etc. Affinity. Generally, the surface charge of the substrate can be changed to a net positive state by adjusting the pH I value of the ion/leaching substrate/IEX mixture to be lower or higher than the substrate isoelectric point (, IEP). Or net negative state. Please think back, IEp is also called zero point electricity (&quot;zpc"). So, in other words, IEP ( ZPC) can be regarded as having a pH of sheet material • net zero surface charge at the time of the beginning of the wet surface. Therefore, the group

• 質/IEX水混合物之PH值調整為大於基質IEP(或ZPC)的pH• The pH of the mass/IEX water mixture is adjusted to be greater than the pH of the matrix IEP (or ZPC)

. 值,可在基質上產生淨的負表面電荷。另外,將基質/IEX 水/心合物2pH值調整為小於基質IEP(或ZPC)的pH值,可 在基質上產生淨的正表面電荷。 例如但不限於,若ARS玻璃之IEP等於9.6,若將經離子 126433.doc •38- 200843847 π出處理之AR型玻璃的阳值調整為〉9·6的值,則將會 在玻:表面產生淨的負表面電荷。視AR型玻璃之IEP分布 圖而疋軚么的方式可能為將pH值調整為大於基質之IEp -或兩個或更多個pH值單位,以保證其表面電荷得到充分 支持。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、玻璃穩定性及所要之電荷密度及其他因 素。通常,任何稀鹼均可用於將基質表面電荷調至其IEp 的右側(亦即產生淨的負表面電荷),而任何稀酸可用於將 基質表面電荷調至其IEP的左侧(亦即產生淨的正表面電 荷)。無機酸及鹼或有機酸及鹼均可以稀浓度使用,而通 ¥較佳為無機酸。通常,稀酸溶液或稀鹼溶液之濃度將取 決於所使用的酸或鹼類型、其解離常數及適於獲得所要表 面電荷類型及密度的pH值。 在某些情況下,可能需要在使表面電荷產生與某催化成 分或前驅物相同符號的pH值下,整合該催化成分或前驅 物。在該等條件下,靜電吸附(EA)型整合機制係很可能不 會發生的。然而,在不受理論約束的情況下,在可交換之 表面位置上可能發生直接的離子交換(IEX)或反交換 (BIX),導致催化成分或前驅物之表面整合,該催化成分 或前驅物可能在物理上及/或化學上不同於在靜電吸附 (EA)機制下整合的相同組分。例如,某些基質表面部分包 括可由相同符號的離子催化成分或前驅物置換之陽離子 (或陰離子),該等基質表面部分可提供用於與基質表面部 126433.doc -39- 200843847 分進行適量但有效的IEX或BIX之交換位置。例如但不限 於’該等部分,如矽烷氧基(_si_crNa+)部分包括可至少部 • 分由帶正電荷之催化金屬或金屬錯合物前驅物(例如但不 • _Pd⑽3),+)置換的Na+離子,進而產生具有催化有效 . 量之催化成分的基質。 藉由調整pH值來控制經ΒΙχ處理之基質的表面電荷 如同在IEX處理或第二ΙΕχ處理(&quot;ΙΕχ_2處理”,如下論 述)的情況一樣’對於某些BIX處理,可能需要調整pH值, C 但並非必需。同樣,根據將要在IEX-2處理中整合至表面 之第二成分及交換之BIX_離子類型,所需ipH調整程度通 .常取決於基質的1EP、其IEP對比表面電荷分布曲線及:要 之電荷類型。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相谷性、基質在相關pH值範圍内的穩定性及所要之 電荷雄度及其他因素。通常,任何稀驗均可用於將基質表 〇 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 何稀酸可用於將基質表面電荷調至其IEP的左側(亦即產生 淨的正表面電荷)。無機酸或驗或有機酸或驗均可以稀濃 纟使用。通常,稀酸溶液或稀驗溶液之濃度,將取決於所 .冑用之酸或驗類型、其解離常數及適於獲得所要表面電荷 類型及密度的pH值。 HI· 2型成分前驅物整合處理 . 無論基質表面活性係按原樣接收,或係經離子浸出處理 (亦即經脱·1處理之基質),或細X處理,較佳地,在⑴ 126433.doc -40- 200843847 第二離子交換(”ΙΕΧ·2,,)處理,(ii)靜電吸附(EA)處理或(丨⑴ 某些ΙΕΧ·2與EA處理之組合中使用至少一種第二成分前驅 物(”2型成分前驅物”)進一步處理基質,以便將一或多種第 二成分前驅物整合在具有第二種與基質的離子及/或靜電 相互作用之基質表面上及/或内。接下來,按照預定用 途,某些2型成分前驅物在未經進一步處理的情況下可產 生催化活性區域,或經進一步處理而產生包括一或多種2 型成分之催化活性區域。但,無論該催化活性區域係由 2型成分前驅物組成,(b)由產生於2型成分前驅物之2型成 分組成,或(c)由(a)及(b)之某組合組成,催化區域在基質 表面上及/或内的平均厚度均為S約3〇奈米,較佳為&lt;約2〇 奈米,更佳為S約10奈米。 如前所述,在某些情況下,取決於觸媒組合物之預定用 途,按原樣接收或經離子浸出處理之基質可具有催化效 力。然而,對於許多潛在應用,通常更佳的方式為對選定 之基質進行IEX-2及/或E A處理。例如但不限於,許多適合 使用本發明觸媒組合物之製程的反應速率、選擇性及/或 能量效率,可藉由置換至少一部分第一成分(,,丨型成分,,)並 將第二種成分(”2型成分”)與基質表面整合而顯著提高。 在不受理論約束的情況下,藉由與基質表面上及/或内 帶相反電荷之特定離子交換位點進行直接或間接的離子相 互作用,藉由與帶相反電荷之基質表面進行靜電吸附相互 作用,及某些離子相互作用與靜電吸附相互作用之組合或 某些其他類型之有待瞭解的前驅物-電荷-表面間相互作 126433.doc -41 - 200843847 用 2型成分前驅物離子可得以整合。但,不論相互作用 之性質如何,在按原樣接收之基質、經IEX-1處理之基質 或經BIX-處理之基質產生第二種前驅物電荷-表面間相互 作用的情況下,2型成分前驅物可能因此產生催化活性區 域,該催化活性區域在基質表面上及/或内的平均厚度為$ 約30奈米,較佳為 &lt;約2〇奈米,更佳為 &lt;約1〇奈米。 只是為了便於進行以下討論,且無意限制本文所述本發A value that produces a net negative surface charge on the substrate. In addition, adjusting the pH of the matrix/IEX water/heart composition 2 to less than the pH of the matrix IEP (or ZPC) produces a net positive surface charge on the substrate. For example, but not limited to, if the IEP of the ARS glass is equal to 9.6, if the positive value of the AR-type glass treated by the ion 126433.doc •38-200843847 π is adjusted to a value of >9·6, it will be on the surface of the glass: Produces a net negative surface charge. Depending on the IEP profile of the AR-type glass, the pH may be adjusted to be greater than the IEp - or two or more pH units of the matrix to ensure that its surface charge is adequately supported. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, glass stability and desired charge density and other factors. Generally, any dilute base can be used to adjust the surface charge of the substrate to the right of its IEp (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left of its IEP (ie, produce Net positive surface charge). The inorganic acid and the alkali or the organic acid and the base can be used in a dilute concentration, and the inorganic acid is preferably used. Generally, the concentration of the dilute acid solution or the dilute alkali solution will depend on the type of acid or base used, its dissociation constant, and the pH at which it is suitable to obtain the type and density of the surface charge desired. In some cases, it may be desirable to integrate the catalytic component or precursor at a pH that causes the surface charge to produce the same sign as a catalytic component or precursor. Under these conditions, electrostatic adsorption (EA) type integration mechanisms are likely to not occur. However, without being bound by theory, direct ion exchange (IEX) or reverse exchange (BIX) may occur at the exchangeable surface location, resulting in surface integration of the catalytic component or precursor, the catalytic component or precursor It may be physically and/or chemically different from the same components that are integrated under the electrostatic adsorption (EA) mechanism. For example, certain substrate surface portions include cations (or anions) that may be replaced by ionic catalytic components or precursors of the same symbol, which may be provided for proper amount with the surface portion of the substrate 126433.doc -39 - 200843847 but A valid exchange location for IEX or BIX. For example, but not limited to, such moieties, such as the decyloxy (_si_crNa+) moiety, include Na+ which can be at least partially replaced by a positively charged catalytic metal or metal complex precursor (eg, but not _Pd(10)3), +). The ions, in turn, produce a matrix having a catalytically effective amount of catalytic component. The surface charge of the ruthenium treated substrate is controlled by adjusting the pH as in the case of IEX treatment or second treatment (&quot;ΙΕχ_2 treatment, as discussed below). For some BIX treatments, pH adjustment may be required, C, but not required. Similarly, depending on the type of BIX_ion that will be integrated into the surface and exchanged in the IEX-2 treatment, the degree of ipH adjustment required will often depend on the 1EP of the matrix, its IEP contrast surface charge distribution. Curves and: Types of Charges to be used. The type of solution used to carry out the pH adjustment will depend on the phase of the other reactants, the stability of the matrix in the relevant pH range, and the desired charge male and others. In general, any thin test can be used to adjust the surface charge of the substrate to the right of its IEP (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left of its IEP ( That is, a net positive surface charge is generated. The inorganic acid or organic acid or organic acid can be used in a dilute concentration. Usually, the concentration of the dilute acid solution or the rare solution will depend on the The type of the test, its dissociation constant, and the pH suitable for obtaining the type and density of the surface charge to be obtained. HI· Type 2 component precursor integration treatment. Whether the substrate surface active system is received as it is, or is subjected to ion leaching treatment (ie, Desin 1 treated substrate, or fine X treatment, preferably at (1) 126433.doc -40- 200843847 second ion exchange ("ΙΕΧ·2,,) treatment, (ii) electrostatic adsorption (EA) treatment or (丨(1) In some combinations of ΙΕΧ·2 and EA treatment, at least one second component precursor ("type 2 component precursor") is used to further process the substrate to integrate one or more second component precursors in a second On and/or within the surface of the substrate that interacts with the ions and/or static of the substrate. Next, certain Type 2 precursors can produce catalytically active regions without further treatment, or according to the intended use. Further processing produces a catalytically active region comprising one or more Type 2 components. However, regardless of whether the catalytically active region is comprised of a Type 2 component precursor, (b) is derived from a Type 2 component precursor. Or, (c) consisting of a combination of (a) and (b), the average thickness of the catalytic region on and/or within the surface of the substrate is about 3 〇N, preferably < about 2 奈奈More preferably, S is about 10 nm. As mentioned above, in some cases, depending on the intended use of the catalyst composition, the substrate received as received or treated by ion leaching may have catalytic efficacy. For many potential applications, it is generally preferred to subject the selected substrate to IEX-2 and/or EA treatment, such as, but not limited to, many reaction rates, selectivities, and/or energies suitable for use in the process of using the catalyst composition of the present invention. Efficiency can be significantly improved by replacing at least a portion of the first component (, the quinoid component, and integrating the second component ("type 2 component") with the surface of the substrate. Without being bound by theory, direct or indirect ionic interactions are carried out by specific ion exchange sites on the surface of the substrate and/or in the opposite charge, by electrostatic adsorption to the surface of the oppositely charged substrate. Role, and some combinations of ionic and electrostatic adsorption interactions or some other type of precursor-charge-surface interaction to be understood 126433.doc -41 - 200843847 can be integrated with type 2 precursor ions . However, regardless of the nature of the interaction, the precursor of the type 2 precursor is produced in the case where the substrate received as received, the substrate treated with IEX-1 or the substrate treated with BIX produces a charge-surface interaction of the second precursor. The material may thus produce a catalytically active region having an average thickness on and/or within the surface of the substrate of from about 30 nanometers, preferably &lt; about 2 nanometers, more preferably &lt; about 1 nano. Meter. Just for the convenience of the following discussion, and is not intended to limit the present invention described herein.

(J 明之範圍,本文使用ΙΕΧ·2來統稱通常稱為2_型成分前驅 物電荷-表面間相互作用或2型成分前驅物相互作用之廣泛 的相互作用。 ' 通常,用於處理經ΙΕΧ-1處理或經ΒΙχ_處理之基質的鹽 溶液類型,將取決於要在正尽2處理中進行離子交換之離 子類型。或是一種離子將進行離子交換,或在某些情況下 需要進行兩種或更多種離子之交換,或是同時進行離子交 換’或是按順序進行離子交換。 在兩種不同類型的成分前驅物離子與基質整合之情況 下,本文中該ΙΕΧ-2處理稱為兩次離子交換或兩㈣^處 理。因此,在三種不同類型的成分前驅物離子與基質整人 之情況下’ IEX-2處理稱為三次離子交換或三次勝 理。 &amp; 2型成分及前驅物說明 ΙΕΧ-2離子之任何鹽溶液,若對 私原樣接收、經ΙΕΧ-1 處理或經3^-處理之基質表面置換 .« . ^ 啡于有化學敏感性,或 疋八有電荷親和力來達成與經虑 1處理或經BIX-處理之 126433.doc -42- 200843847 基質表面的靜電相互作用,即可使用。 所以,IEX-2離子能夠作為2型成分之前驅物。如上所 述,根據其預定用途,該等離子性ΙΕχ_2前驅物(即2型成 分前驅物)可能具有催化效力,若是如此,該等離子性 IEX-2前驅物就能夠像某類觸媒組合物中的2型成分一樣以 其前驅物狀態工作,但所述離子亦可作為在製備另一類型 之觸媒組合物製程中的比尽2前驅物工作。然而,通常情 況下,離子性ΙΕΧ·24前驅物(可用於獲得與基質表面整合 之2型成分)包括但不限於布忍司特或路易士酸、布忍㈣ 或路易士豸、貴金屬帛離子及貴金屬錯合陽離子及陰離 子、過渡金屬陽離子及過渡金屬错合陽離子及陰離子、過 渡金屬氧陰離子、過渡金屬硫屬化物陰離子、主族氧阶離 子、齒離子、稀土離子、稀土錯合陽離子及陰離子及:組(In the scope of J, this article uses ΙΕΧ·2 to collectively refer to the extensive interactions of precursor-charge-surface interactions or type 2 component precursor interactions commonly referred to as 2_type components. 'Generally, for the treatment of warp- 1 The type of salt solution of the treated or treated substrate will depend on the type of ion to be ion exchanged in the course of 2 treatments. Or an ion will be ion exchanged or, in some cases, two Exchange of more or more ions, or simultaneous ion exchange' or sequential ion exchange. In the case where two different types of component precursor ions are integrated with the matrix, the ΙΕΧ-2 treatment is referred to herein as two Sub-ion exchange or two (four) treatment. Therefore, in the case of three different types of component precursor ions and matrix as a whole, 'IEX-2 treatment is called three-ion ion exchange or three-winning. &amp; type 2 composition and precursor Explain any salt solution of ΙΕΧ-2 ion, if it is received by ectopically, treated with ΙΕΧ-1 or treated with 3^-treated surface. The chemical is sensitive, or The charge affinity can be used to achieve electrostatic interaction with the surface of the substrate treated by the treatment or the BIX-treated 126433.doc -42-200843847. Therefore, the IEX-2 ion can be used as a precursor of the type 2 component. Said that the plasma ΙΕχ_2 precursor (ie, the type 2 component precursor) may have catalytic effect depending on its intended use, and if so, the plasma IEX-2 precursor can be like type 2 in a certain type of catalyst composition. The composition works in its precursor state, but the ions can also function as a precursor in the preparation of another type of catalyst composition process. However, in general, the ionic ΙΕΧ24 precursor ( It can be used to obtain the type 2 component integrated with the surface of the substrate, including but not limited to, Blenbuter or Lewis acid, Bruce (4) or Lewis, noble metal cerium ions and noble metal complex cations and anions, transition metal cations and transition metals Cation and anion, transition metal oxyanion, transition metal chalcogenide anion, main group oxygenate ion, tooth ion, rare earth ion, rare earth Cation and anion and: group

同樣’取決於觸媒組合物之預定用途’某些啦_2離子 本身在前驅物狀態下有催化效力,與適當的基質整合時可 產生2型成分。可選擇在不進一步處理的情況下具有催化 性1Γ-2前驅物,某些實例包括但不限於布忍 。s路易士酸、布忍㈣或路易 土虱虱根離子、稀土氧化物離子及其組合。 :作為2型成分前驅物之某些貴金屬及過渡金 、弟1b族、第Vb族及第彻族),例如叙、把、錄、 126433.doc -43- 200843847 銅、銀、金、铑、銥、釕、銖、餓、鈷、鐵、錳、辞的離 子鹽及錯合離子鹽及其組合。對於IEX-2處理,鈀、鉑、 铑、銥、釕、銖、銅、銀、金及鎳的離子鹽尤其較佳。為 了方便起見,該等族之元素可藉由使用國際理論及應用化 學聯合會(IUPAC)命名系統之元素族編號在 http://pearii.iani.gov/peri〇dic/default上加中顯示的化學元 素週期表(並顯示以前使用的族編號)中查詢。Similarly, depending on the intended use of the catalyst composition, certain ions are catalytically effective in the precursor state and can form a type 2 component when integrated with a suitable matrix. It is optional to have a catalytic 1 Γ-2 precursor without further processing, some examples including but not limited to. s Lewis acid, cloth tolerant (four) or Louis soil root ions, rare earth oxide ions and combinations thereof. : Certain precious metals as precursors of type 2 components and transitional metals, brothers 1b, Vb and Dichu), such as Syrian, Shi, Lu, 126433.doc -43- 200843847 copper, silver, gold, bismuth,铱, 钌, 铢, hungry, cobalt, iron, manganese, ionic salts and complex ion salts and combinations thereof. For the IEX-2 treatment, ionic salts of palladium, platinum, rhodium, ruthenium, osmium, iridium, copper, silver, gold and nickel are especially preferred. For convenience, the elements of these groups can be displayed by http://pearii.iani.gov/peri〇dic/default by using the element family number of the International Union of Theoretical and Applied Chemistry (IUPAC) nomenclature system. The chemical element of the periodic table (and shows the previously used family number) is queried.

可作為2型成分前驅物之某些過渡金屬氧陰離子實例, 包括但不限於第5族及第6族(以前的第vb族及第vib族)的 離子鹽,例如 V(V-、W〇42-、H2Wi2〇4q6-、M〇〇42.、 M〇70246_、Nb6〇196-、以〇4-及其組合。對於 ΐΕχ_2處理, 銖、錮、鎢及釩的離子鹽尤其較佳。 可作為2型成分前驅物之某些過渡金屬硫屬化物陰離子 實例,包括但不限於第6族(以前的第VIb族)的離子鹽,例 如M〇S42-、Ws42-及其組合。 可作為2型成分前驅物之某些主族氧陰離子實例,包括 但不3限於第16族(以前的第VIa族)的離子鹽,例如S〇42·、 Ρ〇Ά〇42·及其組合。對於IEx_2處理,s〇?·的離子鹽 可作為2型成分前驅物之某 ^ ^ ^ 示二囪離子實例,包括但不限 於弟17族(以前的第νπ族 知)的離子鹽,例如F、Cl·、Br-、 I及其組合。對於ΙΕΧ_2處理,f 及C的離子鹽尤其較佳。 作為2型成分前驅物 子或離, 卡一稀土離子及稀土錯合陽離 子戈離子“素及㈣元素的離子 126433.doc -44- 200843847 鹽,例如 La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、 Ho、Er、Tm、Yb、Lu、Th、U及其組合。 可用於產生作為2型成分之過渡金屬-碳化物、過渡金 屬-氮化物、過渡金屬-硼化物及過渡金屬-磷化物的某些過 渡金屬實例,包括但不限於鉻、鉬、鎢、銳、组、鐵、 鈷、鎳的離子鹽及其組合。 IEX-2處理說明 通常,用於IEX-2處理之鹽溶液濃度,取決於經庄又巧處 理或BIX-處理並要經IEX-2處理之基質類型及用於與經 IEX_1處理之基質相互作用及/或整合的ΙΕχ-2離子之相對 親和力。對於大部分類型之玻璃基質(例如但不限於AR 型、A型或鈉鈣(soda_lime)玻璃),約〇 〇〇i wt·%至餘和的 IEX·2鹽溶液係較佳,而約0.001 Wt·%至5 wt·% IEX_2鹽溶 液係更佳。然而,視被視為達成觸媒組合物之預定用途所 必需之催化成分的官能性表面濃度而定,正又_2鹽溶液可 能為小於〇. 〇 〇 1 Wt. %。 若多種離子類型與基質交換,無論為同時進行或按順序 進行,鹽溶液之濃度將按照對於基質上各種成分前驅物所 需的相對負載及基質適用於一成分前驅物對比另一種成分 前驅物的相對親和力進行調整。例如但不限於,在兩次 IEX-2處理(亦即兩種不同催化成分前驅物與經i戋 BIX-處理之基質整合)或三次IEX_2處理(亦即三種不同的 催化成分前驅物與經ΪΕΧ]或經ΒΙχ_處理之基質整人)中, 用於沈澱各種離子的鹽溶液濃度將取決於適用於各類與其 126433.doc -45- 200843847 質表面整合之成分前驅物的目標相對濃度及對於各種離子 之表面親和力。 , 典型情況下,會根據所使用之IEX-2鹽溶液類型及濃度 及基質之特性,選擇適用於IEX-2處理的熱處理條件,例 . 如加熱溫度、加熱時間及混合條件。 較佳地,適合於使用酸進行IEX-2處理的加熱溫度可在 約20°C至約200°C之間,更佳在約30°C至約90。(:之間。 取決於IEX-2鹽溶液之濃度及選定之加熱溫度,用於 f' 、 IEX-2處理的加熱時間可改變。較佳地,適用於正12處理 的加熱時間在約5分鐘至約48小時之間,更佳在約30分鐘 . 至約5小時之間。 通常,會根據所使用之IEX-2鹽溶液類型及濃度及基質 之特性(例如,欲自玻璃網狀物移除之離子的親和力、在 移除網狀物離子後玻璃之強度等)及熱處理之持續時間, 選擇混合條件。例如但不限於,混合條件可為連續或斷 ( 續,亦可為機械混合、流化、翻滾、滾動或手動混合。 總言之,IEX-2鹽溶液濃度、熱處理狀態及混合條件的 組合,實質上係基於在基質上及/或内整合足夠數量之 • 聰_2離子及IEX_2離子之分布予以確定,而與基質表面之 • ㉟理化學結合的性質無關,用以產生所需之表面電荷類型 及私度,以產生達成觸媒組合物之預定用途所需的表面活 性狀態。 藉由調整pH來調整基質表面電荷 如上所述,考慮到在第二ΙΕχ(,,ΙΕχ·2&quot;)處理中將與表面 126433.doc •46- 200843847 整合之2型成分前驅物,所需的pH調整程度通常將取決於 基質之IEP、基質之IEp對比表面電荷分布曲線及所要之電 • 何類型。例如但不限於,對於IEP等於8的基質,較佳地, 基負/IEX-2混合物之pH值調整為約8至約12之間,更佳為 . 約9至約11之間。 • 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、基質在相關pH值範圍内的穩定性及所要之 广 電荷岔度及其他因素。通常,任何稀鹼均可用於將基質表 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 何稀酸可用於將基質表面電荷調至其IEp的左側(亦即產生 . 淨的正表面電荷)。無機酸或鹼或有機酸或鹼均可以稀濃 又使用而通#較佳為有機驗。通常,稀酸溶液或稀驗溶 液之濃度,將取決於所使用之酸或鹼類型、其解離常數及 適於獲得所要表面電荷類型及密度的pH值。 在IEX-2處理完成後,較佳地,經ΙΕχ_2處理之基質可使 ❼ 用任何合適的方法分離,包括但不限於過濾方式、離心方 式、傾析及其組合。然後,經ΙΕΧ_2處理之基質用一或多 種合適的清洗液(例如蒸餾水或去離子水、稀鹼或稀酸及/ _ 或合適的水溶性有機溶劑,例如甲醇、乙醇或丙酮)清 ” 洗’並在約ll〇°C之溫度下乾燥約20至24小時。 ϊν·沈澱後處理說明 視耑要,在經ΙΕΧ-2處理之基質得以分離後,可僅乾 燥、煅燒,在氧化條件下煅燒,隨後還原或進一步氧化, 在不煅燒的情況下還原或在不烺燒的情況下氧化。可按照 126433.doc -47- 200843847 需要,用合適的還原、硫化、碳化、氮化、磷化或硼化試 劑(-IDING試劑),在氣相或液相中執行表面沈澱之過渡金 • 屬離子、氧陰離子及/或硫陰離子的反應,以產生相應的 催化有效之金屬硫化物/硫氧化物、金屬碳化物/碳氧化 • 物、金屬氮化物/氮氧化物、金屬硼化物或金屬磷化物成 分。 通常但不限於,沈澱後烺燒處理的目的實質上為分解金 ^平衡離子或配體,且將金屬、金屬氧化物、金屬硫屬化 物等更緊密地與基質表面整合,並移除任何未在先前的乾 燥處理中移除的殘餘水。 用於經IEX-2處理之基質的煅燒處理條件,對於基質之 力功表面活化並非特別重要,然而,該等條件只應足夠嚴 格,能夠以催化有效量產生至少—個具有錢之成分前驅 物的催化活性區域。但就使用煅燒而言,基質首先在氧化 性氣氛(例如在空氣或氧氣)中煅燒。另外,重要的係,選 C #夠高的烺燒溫度以確保所關注之2型成分前驅物被氧化 而且任何殘餘水得到移除(若仍有任何殘餘水存在),但煅 燒溫度亦應夠低,能夠合理避免基質之軟化點及非所要之 - 沈殿成分前驅物分解。 • 例如但不限於,沈澱之硫酸鹽需要煅燒條件來分解所結 合之陽離子並將硫酸根固定於表面上,但該等條件不得顯 著將硫酸鹽分解成揮發性的硫氧化物。同樣地,金屬氧陰 • 冑子要求锻燒條件來分解所結合之陽離子並將陰離子以^ 化物形式固定於表面上,但條件不得嚴格到使金屬氧化物 126433.doc -48- 200843847 自表面揮發或造成金屬氧化物溶入基質。最後,貴金屬及 錯ΠΤ物應在以下條件锻燒:分解所存在的配體及陰離子, 但不得嚴格到使貴金屬聚集在表面上。鑒於此原因,如以 下更詳細說明’責金屬較佳在沒有锻燒的情況下直接還 原。 通常,锻燒溫度應至少t匕選定基質軟化點低至少約100 °C。煅燒溫度應在約丨⑻^至7〇(rc之間,更佳在約2〇(rc 至6〇〇C之間,最佳在約30(TC至500°C之間。 典型情況下,經IEX—2處理之基質煅燒約工至約24個小 時,較佳煅燒約2至約12個小時。儘管如此,視與基質整 合之2型成分而定,該項煅燒時間可在該等範圍以外變 化。 通常但不限於,沈澱後還原處理目的為至少實質上(若 非完全)將催化成分前驅物(例如金屬、金屬氧化物或金屬 石瓜化物)還原成與基質表面整合的較低氧化狀態。合適還 原劑的實例包括但不限於C0及Hr Η:係較佳的還原劑, 其流動速率較佳在每公克基質約001 L/hr·至約1〇〇 L/hr•之 間,更佳其流動速率在每公克基質〇1 L/hr•至1 L/hr•之 間。 典型情況下,還原溫度應在0 °C至6 0 0 °C之間,前提為戶斤 選擇之溫度比基質之軟化點至少低1 〇〇。〇。 通常,經IEX-2處理之基質要經約〇·ι小時至約48小時之 還原處理,較佳經約1小時至約8小時之還原處理。 或者,經IEX-2處理之基質可藉由溶液相處理進行還 126433.doc -49- 200843847 原,該溶液相處理使用可溶性還原劑(例如但不限於肼、 氫化鈉、氫化鋁鋰及其組合)在合適的溶劑(例如水或乙醚) 中進行。 通常但不限於,沈澱後-IDING反應處理的目的為在另外 使還原的金屬與包含較低原子量-IDING元素之試劑反應的 同時,還原金屬離子、金屬氧陰離子及/或金屬硫陰離 子。在某些情況下,直接-IDING會在沒有同時發生金屬氧 化態還原的情況下發生,例如某些硫化處理。 典型的氣相-IDING試劑包括但不限於硫化氫、甲硫醇及 二甲基硫(硫化試劑)、氨(氮化試劑)、甲烷、乙烷及其他 幸工質k類(¼化试劑)。該等氣相_iding試劑可在環境壓力 下或加壓下直接與經IEX-2處理之基質起反應,或是在與 惰性氣體或氫氣混合之氣體中與與經ΙΕχ_2處理之基質起 反應,進而產生相應的硫化物、碳化物或氮化物。可能有 催化效力之部分-IDED產物(包括硫氧化物、碳氧化物及氮 氧化物)亦可藉由下述方式產生:與實質上原樣接收/獲得 之基質、經IEX-2處理之整合基質、經ΙΕχ-2處理之煅燒基 質或經IEX-2處理之還原基質進行不完全反應。 藉由兩次離子交換(兩次IEX-2處理)基質之還原處理, 可產生金屬磷化物,其中一項IEX_2處理係一或多種過渡 金屬離子,而另一項IEX-2處理係磷酸根離子。較佳地, 該兩項IEX-2處理可按順序執行。另外,金屬磷化物可藉 由使用氣相磷化試劑(例如但不限於磷化氫(PH3))來產生所 要之金屬磷化物。例如,以處於合適氧化態之所需過渡金 126433.doc -50 - 200843847 屬進行單一離子交換之基質(經單一 IEX-2處理之基質),可 進一步用PH3處理來產生所需的金屬磷化物。 溶液相處理可用於產生金屬硫化物、金屬爛化物及金屬 填化物催化成分。產生金屬硫化物之典型溶體處理包括但 不限於在室溫至回流溫度之範圍内,以有效濃度之六甲基 一碎硫烧有機溶液處理經IEX-2處理之金屬-離子-整合基 質’歷時之時間足以在基質表面上及/或内產生催化有效 量之催化成分。 產生硼化物之典型溶液相處理包括但不限於,對於經 IEX-2處理之金屬-離子_整合基質,在室溫至回流溫度之 間,歷時有效時間進行硼氫化鈉或硼氫化鉀水溶液處理。 產生構化物之典型溶液相處理包括在室溫至回流之範圍 内,對於經IEX-2處理之金屬-離子-整合基質進行次磷酸鈉 水溶液處理,歷時時間之足以在基質表面上及/或内產生 催化有效量之催化成分。 V · 催化活性區域說明 由於任何上述基質處理而產生的催化活性區域,將具有 ⑴小於或等於約30奈米奈米之平均厚度,較佳為$約2〇奈 米,更佳為€約10奈米,及(ii)催化有效量之至少一種催化 成为。較佳地,使用XPS光譜學確定催化區域的平均厚 度XPS光邊學使用稱為濺射深度分布圖之分層餘刻技術 (&gt;會在以下提供實例中的分析方法下更詳細說明)。然而, …、白此員技術者所知的其他分析技術亦可用來確定催化成 分對比成分之相關基質表面的大體位置。所以,基質催化 126433.doc -51· (Examples of certain transition metal oxyanions which may be used as precursors for the type 2 component, including but not limited to ionic salts of Groups 5 and 6 (formerly Groups vb and vib), such as V (V-, W〇) 42-, H2Wi2〇4q6-, M〇〇42., M〇70246_, Nb6〇196-, 〇4- and combinations thereof. For ΐΕχ_2 treatment, ionic salts of lanthanum, cerium, tungsten and vanadium are particularly preferred. Examples of certain transition metal chalcogenide anions as precursors of the type 2 component include, but are not limited to, ionic salts of Group 6 (formerly Group VIb), such as M〇S42-, Ws42-, and combinations thereof. Examples of certain main group oxygen anions of type component precursors, including but not limited to Group 16 (former Group VIa) ionic salts, such as S〇42·, Ρ〇Ά〇42·, and combinations thereof. For IEx_2 The ionic salt of the s?? can be used as a precursor of the type 2 component, and the ionic salt of the group II, including but not limited to the group 17 (formerly the νπ group), such as F, Cl ·, Br-, I and combinations thereof. For the ΙΕΧ_2 treatment, the ionic salts of f and C are especially preferred. As a type 2 component precursor or ion, Card-Rare Earth Ions and Rare Earth Miscellaneous Cationic Ions "Ion and (4) Element Ions 126433.doc -44- 200843847 Salts, such as La, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Th, U, and combinations thereof. Examples of transition metals that can be used to produce transition metal-carbides, transition metal-nitrides, transition metal-borides, and transition metal-phosphides as type 2 components. Including, but not limited to, ionic salts of chromium, molybdenum, tungsten, sharp, group, iron, cobalt, nickel, and combinations thereof. IEX-2 Treatment Description Generally, the concentration of the salt solution used for IEX-2 treatment depends on The type of matrix that is processed or BIX-treated and treated with IEX-2 and the relative affinity of the ΙΕχ-2 ion for interaction with and/or integration with the IEX_1 treated substrate. For most types of glass substrates (eg but Not limited to AR type, A type or soda (lima) glass, about wti wt·% to the balance of IEX·2 salt solution is preferred, and about 0.001 Wt·% to 5 wt·% IEX_2 salt The solution is better. However, it is considered necessary to achieve the intended use of the catalyst composition. Depending on the functional surface concentration of the chemical component, the positive _2 salt solution may be less than 〇. 〇〇1 Wt. %. If multiple ion types are exchanged with the matrix, either simultaneously or sequentially, the concentration of the salt solution will be The relative affinities required for the precursors of the various components on the substrate and the relative affinities of the matrix for one component precursor versus the other component precursor are adjusted, such as, but not limited to, two IEX-2 treatments (ie, two Used to precipitate various precursors of different catalytic components and integrated with i戋BIX-treated matrix or three times of IEX_2 treatment (ie, three different catalytic component precursors and warts) or ruthenium-treated substrates The concentration of the salt solution of the ions will depend on the target relative concentration of the constituent precursors that are suitable for integration with the 126433.doc -45-200843847 surface and the surface affinity for various ions. Typically, heat treatment conditions suitable for IEX-2 treatment, such as heating temperature, heating time and mixing conditions, are selected depending on the type and concentration of the IEX-2 salt solution used and the characteristics of the substrate. Preferably, the heating temperature suitable for the IEX-2 treatment using an acid may be between about 20 ° C and about 200 ° C, more preferably between about 30 ° C and about 90. (: Between. Depending on the concentration of the IEX-2 salt solution and the selected heating temperature, the heating time for the f' and IEX-2 treatments may vary. Preferably, the heating time for the positive 12 treatment is about 5 Between minutes and about 48 hours, more preferably between about 30 minutes and about 5 hours. Usually, depending on the type and concentration of the IEX-2 salt solution used and the characteristics of the substrate (for example, from a glass mesh) The mixing conditions are selected for the affinity of the removed ions, the strength of the glass after removal of the network ions, and the duration of the heat treatment. For example, but not limited to, the mixing conditions may be continuous or discontinuous (continued or mechanically mixed). , fluidization, tumbling, rolling or manual mixing. In summary, the combination of IEX-2 salt solution concentration, heat treatment conditions and mixing conditions is essentially based on the integration of a sufficient amount of sigma-2 ions on and/or within the substrate. And the distribution of IEX_2 ions is determined irrespective of the nature of the physicochemical bonding of the surface of the substrate to produce the desired surface charge type and privacy to produce the surface activity required to achieve the intended use of the catalyst composition. Adjusting the surface charge of the substrate by adjusting the pH as described above, taking into account the type 2 component precursors that will be integrated with the surface 126433.doc •46-200843847 in the second ,(,,ΙΕχ2&quot;) treatment. The degree of pH adjustment required will generally depend on the IEP of the substrate, the IEp versus surface charge distribution curve of the substrate, and the type of electricity desired. For example, but not limited to, for substrates having an IEP equal to 8, preferably, basal negative / IEX- 2 The pH of the mixture is adjusted to between about 8 and about 12, more preferably between about 9 and about 11. • The type of solution used to effect the pH adjustment will depend on compatibility with other reactants. Properties, the stability of the matrix in the relevant pH range and the desired wide charge mobility and other factors. Generally, any dilute base can be used to adjust the surface charge of the substrate to the right of the IEP (ie, to produce a net negative surface charge). And any dilute acid can be used to adjust the surface charge of the substrate to the left side of its IEp (ie, to produce a net positive surface charge). The inorganic acid or base or organic acid or base can be used in a thick and concentrated manner. For organic testing. Usually, dilute acid is dissolved. Or the concentration of the dilute solution will depend on the type of acid or base used, its dissociation constant, and the pH appropriate to obtain the desired surface charge type and density. After the IEX-2 treatment is completed, preferably by ΙΕχ_2 treatment The substrate can be separated by any suitable means including, but not limited to, filtration, centrifugation, decantation, and combinations thereof. The substrate treated with ΙΕΧ_2 is then treated with one or more suitable cleaning solutions (e.g., distilled or deionized water). , dilute alkali or dilute acid and / or a suitable water-soluble organic solvent, such as methanol, ethanol or acetone, "wash" and dry at a temperature of about 11 ° C for about 20 to 24 hours. ϊ ν · post-precipitation treatment According to the description, after the matrix treated by hydrazine-2 is separated, it can be dried only, calcined, calcined under oxidizing conditions, then reduced or further oxidized, reduced without calcination or without smoldering. Oxidation. Transitional gold can be surface-precipitated in the gas or liquid phase using a suitable reducing, sulfurizing, carbonizing, nitriding, phosphating or boriding reagent (-IDING reagent) as required by 126433.doc -47- 200843847 The reaction of ions, oxyanions and/or sulfur anions to produce the corresponding catalytically effective metal sulfides/sulfur oxides, metal carbides/carbon oxides, metal nitrides/nitrogen oxides, metal borides or metal phosphorus Compound composition. Usually, but not limited to, the purpose of the post-precipitation calcination treatment is essentially to decompose the gold counterion or ligand and to more closely integrate the metal, metal oxide, metal chalcogenide, etc. with the surface of the substrate and remove any Residual water removed in the previous drying process. The calcination conditions for the IEX-2 treated substrate are not particularly important for the surface activation of the matrix. However, these conditions should only be sufficiently stringent to produce at least one precursor with a catalytically effective amount. Catalytic active region. However, in the case of calcination, the substrate is first calcined in an oxidizing atmosphere (e.g., in air or oxygen). In addition, the important system is to select a high temperature of C # high to ensure that the precursor of the type 2 component of interest is oxidized and any residual water is removed (if any residual water remains), but the calcination temperature should also be sufficient. Low, can reasonably avoid the softening point of the matrix and the undesired - the decomposition of the precursor components of the Shendian. • For example, but not limited to, precipitated sulfates require calcination conditions to decompose the bound cations and immobilize the sulfate on the surface, but such conditions do not significantly decompose the sulfate into volatile sulfur oxides. Similarly, metal oxo • scorpion requires calcination conditions to decompose the combined cations and immobilize the anions on the surface, but the conditions must not be so strict that the metal oxides 126433.doc -48- 200843847 self-surface volatilization Or cause the metal oxide to dissolve into the matrix. Finally, precious metals and erroneous materials should be calcined under the following conditions: decomposition of the ligands and anions present, but not so strict that the precious metals accumulate on the surface. For this reason, as explained in more detail below, the metal is preferably returned directly without calcination. Generally, the calcination temperature should be at least about 100 ° C lower than the softening point of the selected substrate. The calcination temperature should be between about 8(8)^ and 7〇(rc, more preferably about 2〇(rc to 6〇〇C, optimally between about 30 (TC to 500°C). Typically, The substrate treated by IEX-2 is calcined to about 24 hours, preferably calcined for about 2 to about 12 hours. However, depending on the type 2 component integrated with the matrix, the calcination time can be in the ranges Typically, but not limited to, the post-precipitation reduction treatment aims to reduce, at least substantially, if not completely, the catalytic component precursor (eg, metal, metal oxide or metal cassava) to a lower oxidation state integrated with the surface of the substrate. Examples of suitable reducing agents include, but are not limited to, C0 and Hr®: preferred reducing agents, preferably having a flow rate of from about 001 L/hr to about 1 〇〇L/hr• per gram of matrix, more The flow rate is between 1 L/hr and 1 L/hr• per gram of matrix. Typically, the reduction temperature should be between 0 °C and 600 °C, provided that the temperature is selected by the household. It is at least 1 低 lower than the softening point of the matrix. 通常. Usually, the substrate treated with IEX-2 is subjected to about ι·ι hours. The reduction treatment of 48 hours is preferably carried out by a reduction treatment of about 1 hour to about 8 hours. Alternatively, the substrate treated by IEX-2 can be treated by solution phase treatment, also 126433.doc -49-200843847, the solution phase treatment The use of soluble reducing agents such as, but not limited to, hydrazine, sodium hydride, lithium aluminum hydride, and combinations thereof, is carried out in a suitable solvent, such as water or diethyl ether. Typically, but not limited to, after precipitation, the purpose of the IDING reaction treatment is to Reducing metal ions, metal oxyanions, and/or metal sulfide anions while reacting the reduced metal with a reagent containing a lower atomic weight-IDING element. In some cases, direct-IDING will occur without simultaneous metal oxide reduction. In the case of, for example, some vulcanization treatments. Typical gas phase-IDING reagents include, but are not limited to, hydrogen sulfide, methyl mercaptan and dimethyl sulfide (vulcanization reagent), ammonia (nitride reagent), methane, ethane and Other lucky materials, class k (1⁄4 reagent). These gas phase _iding reagents can react directly with IEX-2 treated substrate under ambient pressure or under pressure, or with inert gas. The gas mixed with hydrogen or hydrogen reacts with the substrate treated with ruthenium _2 to produce the corresponding sulfide, carbide or nitride. Part of the catalytic effect may be - IDED product (including sulfur oxides, carbon oxides and nitrogen) Oxide) can also be produced by: substantially as received/obtained substrate, IEX-2 treated integrated substrate, ruthenium-2 treated calcined substrate or IEX-2 treated reduced substrate Complete reaction. Metal phosphide can be produced by two ion exchange (two IEX-2 treatment) reduction treatments, one of which is one or more transition metal ions and the other is IEX-2 treatment system. Phosphate ion. Preferably, the two IEX-2 processes can be performed in sequence. Alternatively, the metal phosphide can be produced using a gas phase phosphating reagent such as, but not limited to, phosphine (PH3) to produce the desired metal phosphide. For example, a single ion exchanged substrate (a single IEX-2 treated substrate) with the desired transitional gold 126433.doc -50 - 200843847 in a suitable oxidation state can be further treated with PH3 to produce the desired metal phosphide. . Solution phase treatment can be used to produce metal sulfides, metal sinters, and metal filler catalytic components. Typical solution treatments for the production of metal sulfides include, but are not limited to, treatment of IEX-2 treated metal-ion-integrated matrices at an effective concentration of hexamethyl-sulfur-burned organic solution at temperatures ranging from room temperature to reflux temperature. The time is sufficient to produce a catalytically effective amount of catalytic component on and/or within the surface of the substrate. Typical solution phase treatments for the formation of boride include, but are not limited to, treatment with an aqueous solution of sodium borohydride or potassium borohydride over a period of effective time between room temperature and reflux temperature for an IEX-2 treated metal-ion-integrated substrate. Typical solution phase treatment of the formation of the composition comprises treatment of the IEX-2 treated metal-ion-integrated substrate with an aqueous solution of sodium hypophosphite for a time sufficient to be on and/or within the surface of the substrate, from room temperature to reflux. A catalytically effective amount of a catalytic component is produced. The V · catalytically active region indicates that the catalytically active region resulting from any of the above substrate treatments will have an average thickness of (1) less than or equal to about 30 nanometers, preferably about 2 nanometers, more preferably about 10 Nano, and (ii) at least one catalytically effective amount of catalyzed. Preferably, XPS spectroscopy is used to determine the average thickness of the catalytic region. XPS optical edge learning uses a layered residual technique called a sputter depth profile (&gt; which will be described in more detail below in the analytical methods provided in the Examples below). However, other analytical techniques known to those skilled in the art can be used to determine the approximate location of the surface of the associated substrate associated with the catalytic component. Therefore, matrix catalysis 126433.doc -51· (

200843847 區域的平均厚度可使用(例如但不限於)透射電子顯微鏡術 (TEM)或掃描TEM(STEM,亦在以下更詳細說明)予以確 定。熟習此項技術者對XPS或TEM程序均有透徹的瞭解。 應理解,在極限情況下,無論催化活性區域係由 處理或IEX-2處理(有或無ΒΙχ處理)所產生,對於本發明之 任何觸媒組合物而言,催化活性區域的厚度—般⑷;會在 實質上穿過基質之表面區域或(b)不會超過基質之外表面 3〇奈米厚度,較佳不超過約2〇奈米厚度,更佳不超過叫 米厚度。關於在經處理之基質上及/或内一或多個催化活 性區域的定位,亦應理解催化活性區域可能: ⑷在基質之外表面,及存在任何孔隙日夺,在基質之孔 隙壁表面; ' ㈨在基質之表面區域中’亦即在基質外表面以下㈣ 奈米’車父佳在基質外表面以下約2〇奈米,更佳在基 質外表面以下約10奉半·木 土 木,當存在任何孔隙時,在基 質孔隙壁表面以下約30奈米’較佳在基質孔隙壁表 面:乂下約20奈米’更佳在基質孔隙壁表面以下約⑺ 奈米’但在基質表面下區域以上; (C)在基質之外表面上面或 部分在基質孔隙壁表面 之表面區域中,或 (d) (a)、(b)及(c)之組合。 以上,當存在任何孔隙時, 上或以上,而部分位於基質 通常,無論為1型成分或2型 刀催化成分之量可為幼 0.0002 wt·%至約 5 wt·%之間,击 、’、 間較佳在約0.0002 wt.%至約2 126433.doc -52- 200843847The average thickness of the region of 200843847 can be determined using, for example, but not limited to, transmission electron microscopy (TEM) or scanning TEM (STEM, also described in more detail below). Those skilled in the art have a thorough understanding of XPS or TEM programs. It should be understood that in the extreme case, regardless of whether the catalytically active region is produced by treatment or IEX-2 treatment (with or without hydrazine treatment), for any of the catalyst compositions of the present invention, the thickness of the catalytically active region is generally (4) ; will substantially pass through the surface area of the substrate or (b) will not exceed the surface of the substrate by 3 nanometers, preferably no more than about 2 nanometers thick, more preferably no more than the thickness of the rice. With regard to the localization of one or more catalytically active regions on the treated substrate and/or within the catalytically active region, it is also understood that the catalytically active region may: (4) be on the surface outside the substrate, and any pores present in the pore wall surface of the substrate; '(9) In the surface area of the matrix 'that is, below the outer surface of the substrate (4) Nano's car is about 2 nanometers below the outer surface of the substrate, more preferably about 10% below the outer surface of the substrate. When there are any pores, about 30 nm below the surface of the pore wall of the matrix is preferred. The surface of the pore wall of the matrix is about 20 nm below the armpit. It is better to be below the surface of the pore wall of the matrix (7) nanometer but below the surface of the substrate. Above; (C) in the surface region of the outer surface of the substrate or partially in the surface of the pore wall of the matrix, or (d) a combination of (a), (b) and (c). Above, when there are any pores, above or above, and partially located in the matrix, the amount of the catalytic component of either type 1 or type 2 can be between 0.0002 wt.% and about 5 wt.%. Preferably, it is between about 0.0002 wt.% and about 2 126433.doc -52- 200843847

Wt·%之間,更佳在約〇 〇〇〇5 wt %至約1 wt %之間。而且, 本發明觸媒組合物之催化活性區域可為連續或不連續。 不受理論約束的情況下,據認為,覆蓋有不連續的催化 活性區域之觸媒組合物,與實質上覆蓋有連續或更廣泛之 連續催化活性區域的催化成分相比,至少同樣有效,而且 在有些情況下更為有效。催化有效區域在基質上的外表面 覆蓋範圍之程度,可在低至〇.〇〇〇1%覆蓋至高達1〇〇%覆蓋 之間。較佳地,催化有效區域之外表面覆蓋的程度在約 0.0001%至約10%之間,更佳在約0 0001%至約之間。 但,在不受理論約束的情況下,據認為,觸媒組合物,特 別係具有較低催化成分wt·%負載之觸媒組合物,很可能催 化有效性更強,因為在經處理之基質上及/或内的催化活 性區域變得更為分散(亦即在催化活性區域之間更大程度 的分布及分開)。 催化活性區域及其他上述觸媒組合物特性,均係基於發 明人對於進入穩態反應條件之前觸媒組合物狀態的最佳可 得資訊。一或多種所述特性可改變的程度並不確定,而且 大部分不可預測。儘管如此,在不受理論約束的情況下認 為,由於觸媒組合物促進其預定製程反應,本文所述之觸 媒組合物的官能性表面活性將允許與基質整合之催化成分 的電荷及/或幾何定位及其他成分特性顯著變化。因此, 應理解,本文所述的本發明範目,同樣擴展至在穩態反應 條件下由所主張之組合物產生的所有觸媒組合物。 VI·觸媒組合物在選擇性氩化方法中的應用 126433.doc -53- 200843847 -般而言,上述類型的觸媒組 之粒子内擴散阻力而使觸媒活性及選擇性二=反應物 (亦即擴散受限製程)最為有 、制的製程 、丄μ 成寻觸媒組合鉍、罟1 被用於不一定受到擴散限制的製程。例如 物還可 一歧製程僅僅兩|卜 /又有限制, 催:相觸媒組合物提供單-類型之 :化二作用,以幫助降低某個製程反應之活 ⑽如,驅動該製程所二!=有更好的熱力學特性 而之㈣❹),因此,進行商業化 生產亦就更具成本效益。 選擇性氫化方法(亦即,SHP處理)係上述觸媒組合物可 有利用於處理烴、雜煙及其混合物的_類方法。本文所使 用之烴係指僅由碳原子(C)及氫原子⑻構成的一群化合 物,而本文所使用之雜烴係指主要由碳原子(c)及氫原= (H)構成,但同時還含有除碳及氫以外的至少一種其他原 子(例如但不限於氧(〇)、氮(N)A/或硫(s))的一群化合物。 在一 SHP處理中,適於使用上述類型之觸媒組合物進行 選擇性氫化的含有烴及/或雜烴之製程流一般包括具有is 約30個碳原子但在某些情況下可具有3〇個以上碳原子及可 月b —或多個雜原子(例如氧、氮…)、硫等)的烴,其 中’煙有至少一個可氫化位點(亦即目標可氫化位點),在 針對所需產物、產率及/或製程效率的適當氫化條件下(以 下更詳細描述),易於選擇性氫化。 製程流包括但不限於原料流、中間轉移流、再循環流及/ 或排放流。本文所使用之目標可氫化位點係指具有至少一 126433.doc -54 - 200843847 個碳原子(c)或雜原子的原子位置,但_般為含碳的原子 位置,而雜原子可為(但不限於)氧(〇)、氮(N)或硫⑻。益 論如何’目標可氫化位點都具有至少一個不飽和度,而且 在適當的反應條件下,有觸媒組合物參與時,容易達到至 少部分飽和。 另外,烴中不飽和位的程度及類型可能有所不同。因 此,多烯烴、多炔烴及環烯烴可能有連續(僅限連續雙-雙 鍵)、共軛或间隔一或多個飽和及/或取代碳之雙鍵及/或參 鍵位,在所關注之烴中可能存在的可氫化位點中,其中一 個比其他可氫化位點優先飽和(至少部分)。 適於SHP處理之製程流還可有烯烴或多烯烴及芳香烴或 ¥烯輕之混合物’用於烯烴或多烯烴之選擇性氫化;或稀 经或夕烯L及炔烴或多炔烴之混合物,用於炔烴或多炔烴 之選擇性氫化。因&amp;,對於至少兩類烴或雜烴具有至少一 個可氫化位點的烴和/或雜烴混合物而言,將預先確定用 :選擇性氫化的可氫化位點視為目標可氫化位點(例如, 方香烴+烯烴,其中烯烴包含目標可氫化位點,相對於芳 香烴優先經氫化)。 口此,適於使用上述類型之觸媒組合物進行處理的 烴及雜烴包括(但不限於)烯烴、二烯烴、多烯烴、炔烴、 夕炔k %烯烴、芳香烴、不飽和植物油及可氫化含氧化 口物。可虱化含氧化合物包括(但不限於、醛、羥酸、 酿及其他具有—或多個氮或硫等除氧以外之雜原子的雜 烴0 126433.doc •55- 200843847 適於使用上述類型觸媒組合物進行SHP處理的一類較佳 烴為具有約2至20個碳原子的正鏈烯烴、正鏈多烯烴及2 鏈炔烴及具有6至丨2個(取代或未取代)碳原子的芳香烴。更 佳的烴為具有2至15個碳原子的正鏈烯烴、正鏈多烯烴、 烯烴取代之芳香烴、正鏈炔烴、稀烴醛及烯烴酮。二 -般而言,可使用具有-或多個氫化區之各類反應器執 行SHP處理,使得,反應烴原料流可與保持在選擇性氯化 條件下的-個選擇性氫化區中之觸媒組合物充分接觸(以 下更詳細描述)。該接觸可在固定觸媒床系統、移動觸媒 床系統、流化床系統中進行,亦可使用上述各類不同觸媒 複合物,在批次操作中進行。 -般而言’較佳採用固定床系統。在^床系統中,煙 原料流首先經預加熱至所需之反應溫度,然後流人含_ 定觸媒複合物床之氫化區。該選擇性氫化區自身可能包括 -或多個獨立的反應區,它們之間有加熱手段,可確保各 反應區輸人端保持所需之反應溫度。烴能夠以向上、向下 或仅向&quot;動方式接觸觸媒床。較佳使烴徑向流過觸媒床。 該煙在接觸觸媒時可為液相、氣液混合相或氣相,較佳為 氣相。 上述觸媒組合物在何種選擇性氫化條件下可用於許多選 擇性氫化方法’同樣取決於所需之產物、產率及/或势程 效率’該等氫化條件包括⑷溫度範圍一般在約代至約_ 。。’且更佳在3(TC至約28〇c&gt;c;⑻壓力範圍一般在約⑻ kPa至卿9kPa,⑷氫氣與目#可氫化煙之莫耳比範 126433.doc -56- 200843847 圍一般在約0.1:1至約20:1,較佳為約〇·5:1至約丨5:1,且更 仏為、、、勺0·8· 1至約1 ·2:1,及(d)反應器中的液時空速(lhsv) 範圍一般在約〇· 1 hr-1至約20 hr-1。 實例 現在結合以下實例更詳細說明本發明,以下實例說明或 模擬了涉及本發明實踐的多個態樣。應理解,在本發明精 神實質内的所有改變均希望得到保護,因此不能認為本發 明僅侷限於該等實例。 具有酸浸之E玻璃基質之觸媒組合物 實例1 酸浸E-06F玻璃上之把 獲付由Lauscha Fiber International生產,平均直徑為 500-600奈米之E-06F玻璃纖維。 第一步,對於按原樣接收、未經煅燒之E_〇6F$璃樣品 進行酸浸處理。在本實例中,用於酸浸處理之酸溶液以石 英玻璃進行預飽和。具體而言,將3公升之15 N硝酸及 150公克石英玻璃各自置入4公升之塑膠廣口容器内。將該 塑膠谷器置於95C之通風烘箱内5小時,每3〇分鐘用手稍 微搖晃一下。預飽和處理完成後,對樣品進行傾析,使預 飽和之靖酸與石奂玻璃分離。預飽和之硝酸用於以下步 驟。然後將約20公克E-06F玻璃及3公升預飽和之硝酸各自 置入4公升之塑膠廣口容器内。將該塑膠容器置於95。〇之 通風烘箱内4小時,每30分鐘用手稍微搖晃一下。酸浸處 理完成之後’使用帶有Whatman 541濾紙之布氏漏斗過濾 126433.doc -57- 200843847Between Wt·%, more preferably between about wt5 wt% and about 1 wt%. Moreover, the catalytically active regions of the catalyst compositions of the present invention can be continuous or discontinuous. Without being bound by theory, it is believed that the catalyst composition covered with the discontinuous catalytically active region is at least as effective as the catalytic component substantially covered with a continuous or broader continuous catalytically active region, and In some cases it is more effective. The extent to which the catalytically active region covers the outer surface of the substrate can range from as low as 〇.〇〇〇1% coverage to as high as 1% coverage. Preferably, the extent of surface coverage outside the catalytically active region is between about 0.0001% and about 10%, more preferably between about 00001% and about. However, without being bound by theory, it is believed that the catalyst composition, particularly the catalyst composition having a lower catalytic component wt% loading, is likely to be more catalytically effective because of the treated substrate. The upper and/or inner catalytically active regions become more dispersed (i.e., more widely distributed and separated between the catalytically active regions). The catalytically active regions and other characteristics of the above-described catalyst compositions are based on the best available information from the inventors regarding the state of the catalyst composition prior to entering the steady state reaction conditions. The degree to which one or more of the described characteristics can vary is not certain and is largely unpredictable. Nevertheless, without being bound by theory, it is believed that the functional surface activity of the catalyst compositions described herein will permit the charge and/or charge of the catalytic component integrated with the matrix as the catalyst composition promotes its intended process reaction. Geometric positioning and other component characteristics vary significantly. Thus, it should be understood that the inventive subject matter described herein extends to all of the catalyst compositions produced by the claimed compositions under steady state reaction conditions. Application of VI·catalyst composition in selective argonization process 126433.doc -53- 200843847 - In general, the intraparticle diffusion resistance of the above-mentioned catalyst group makes the catalyst activity and selectivity two = reactant (that is, the diffusion limited process) is the most efficient process, the 寻μ into the finder combination, and 罟1 is used in processes that are not necessarily limited by diffusion. For example, the material can also be ambiguously only two |b/restricted, reminder: the catalyst composition provides a single-type: two-effect, to help reduce the reaction of a certain process (10), for example, to drive the process !=There is better thermodynamics and (4)❹), so commercial production is more cost effective. The selective hydrogenation process (i.e., SHP treatment) is a process for treating hydrocarbons, miscellaneous tobacco, and mixtures thereof. The hydrocarbon used herein refers to a group of compounds consisting only of a carbon atom (C) and a hydrogen atom (8), and the heterocarbon used herein means mainly composed of a carbon atom (c) and a hydrogen source = (H), but at the same time Also included is a group of compounds other than carbon and hydrogen, such as, but not limited to, oxygen (oxime), nitrogen (N) A, or sulfur (s). In a SHP process, a process stream comprising hydrocarbons and/or heterohydrocarbons suitable for selective hydrogenation using a catalyst composition of the above type generally comprises having about 30 carbon atoms, but in some cases 3 Å. a hydrocarbon having more than one carbon atom and a bi- or more hetero atom (e.g., oxygen, nitrogen, etc.), sulfur, etc., wherein 'the smoke has at least one hydrogenatable site (ie, a target hydrogenatable site), Under suitable hydrogenation conditions (described in more detail below) of the desired product, yield and/or process efficiency, it is readily hydrogenated selectively. Process streams include, but are not limited to, feed streams, intermediate transfer streams, recycle streams, and/or discharge streams. As used herein, a target hydrogenatable site refers to an atomic position having at least one of 126,433.doc -54 - 200843,847 carbon atoms (c) or a hetero atom, but is generally a carbon-containing atomic position, and a hetero atom can be But not limited to) oxygen (〇), nitrogen (N) or sulfur (8). It is believed that the target hydrogenation sites have at least one degree of unsaturation, and that under appropriate reaction conditions, it is easy to achieve at least partial saturation with the participation of the catalyst composition. In addition, the extent and type of unsaturation in the hydrocarbons may vary. Thus, multiolefins, polyalkynes, and cyclic olefins may have continuous (only continuous double-double bonds), conjugated or one or more double bonds and/or substituted carbons that are saturated and/or substituted for carbon. Of the hydrogenatable sites that may be present in the hydrocarbon of interest, one of them is preferentially saturated (at least partially) than the other hydrogenatable sites. The process stream suitable for SHP treatment may also be a mixture of olefins or multiolefins and aromatic hydrocarbons or light olefins for selective hydrogenation of olefins or multiolefins; or sulphur or eutectic L and alkyne or polyalkyne Mixture for the selective hydrogenation of alkynes or polyalkynes. For &lt;, for hydrocarbons and/or hetero hydrocarbon mixtures having at least one hydrogenatable site for at least two types of hydrocarbons or heterohydrocarbons, it is predetermined to use: a selectively hydrogenatable hydrogenatable site as a target hydrogenatable site (for example, a perylene hydrocarbon + olefin in which the olefin comprises a target hydrogenatable site, preferably hydrogenated relative to the aromatic hydrocarbon). Thus, hydrocarbons and hydrocarbons suitable for treatment with a catalyst composition of the type described above include, but are not limited to, olefins, diolefins, multiolefins, alkynes, acetylene k% olefins, aromatic hydrocarbons, unsaturated vegetable oils and It can be hydrogenated with an oxidizing agent. The deuterated oxygenates include, but are not limited to, aldehydes, hydroxy acids, brewed, and other heteroatoms having a heteroatom other than oxygen or sulfur such as nitrogen or sulfur. 0 126433.doc • 55- 200843847 Suitable for use A preferred class of hydrocarbons for SHP treatment of a type of catalyst composition is a normal chain olefin having from about 2 to 20 carbon atoms, a normal chain polyene and a 2 chain alkyne, and having from 6 to 2 (substituted or unsubstituted) carbons. Aromatic aromatic hydrocarbons. More preferred hydrocarbons are normal chain olefins having from 2 to 15 carbon atoms, normal chain polyenes, olefin-substituted aromatic hydrocarbons, normal chain alkynes, dilute alkanes and alkenyl ketones. The SHP treatment can be performed using various types of reactors having one or more hydrogenation zones such that the reaction hydrocarbon feed stream can be in sufficient contact with the catalyst composition in a selective hydrogenation zone maintained under selective chlorination conditions. (described in more detail below.) The contacting can be carried out in a fixed catalyst bed system, a moving catalyst bed system, a fluidized bed system, or in a batch operation using the various types of different catalyst composites described above. Generally speaking, it is better to use a fixed bed system. In the ^ bed system The flue feed stream is first preheated to the desired reaction temperature and then passed to a hydrogenation zone containing a bed of catalytic catalyst. The selective hydrogenation zone may itself comprise - or a plurality of separate reaction zones between There are heating means to ensure that the input end of each reaction zone maintains the desired reaction temperature. The hydrocarbon can contact the catalyst bed in an upward, downward or only dynamic manner. Preferably, the hydrocarbon flows radially through the catalyst bed. The smoke may be in a liquid phase, a gas-liquid mixed phase or a gas phase when contacting the catalyst, preferably a gas phase. The above-mentioned catalyst composition can be used in many selective hydrogenation conditions under which selective hydrogenation conditions are also determined. The desired product, yield and/or potential efficiency </ RTI> such hydrogenation conditions include (4) a temperature range generally from about 约 to about 约 '. and more preferably from 3 (TC to about 28 〇 c &gt;c; (8) pressure range Generally, it is from about (8) kPa to 9 kPa, and (4) hydrogen and mesh #hydrogenated oxime Mo Erfan 126433.doc -56- 200843847 is generally from about 0.1:1 to about 20:1, preferably about 〇·5: 1 to about 5:1, and more 、, , , spoon 0·8·1 to about 1 · 2:1, and (d) liquid space and time in the reactor The range of (lhsv) is generally from about 〇 1 hr-1 to about 20 hr-1. EXAMPLES The invention will now be described in more detail in connection with the following examples which illustrate or emulate various aspects relating to the practice of the invention. All changes within the spirit of the invention are intended to be protected, and therefore the invention is not to be construed as limited to the examples. Example 1 of a catalyst composition with an acid immersed E glass matrix E-06F glass fiber produced by Lauscha Fiber International with an average diameter of 500-600 nm. In the first step, the E_〇6F$ glass sample received as received and not calcined was subjected to acid leaching treatment. In this example, the acid solution used for the acid leaching treatment was presaturated with quartz glass. Specifically, 3 liters of 15 N nitric acid and 150 gram of quartz glass were placed in a 4 liter plastic wide-mouth container. Place the plastic barn in a 95C ventilated oven for 5 hours and shake it slightly with your hands every 3 minutes. After the presaturation treatment is completed, the sample is decanted to separate the presaturated sulphuric acid from the sarcophagus glass. Presaturated nitric acid is used in the following steps. Then, about 20 grams of E-06F glass and 3 liters of pre-saturated nitric acid were placed in a 4 liter plastic wide-mouth container. Place the plastic container at 95. 4 4 4 hours in a ventilated oven, shake it slightly with your hands every 30 minutes. After the acid leaching process is completed ‘Filtering with a Buchner funnel with Whatman 541 filter paper 126433.doc -57- 200843847

樣品,並使用約7.6公弁本μ工u、太、A 开去離子水清洗。然後,在11(TC之 溫度下,將酸浸後之樣品乾燥22小時。 • 第二步,對經酸浸處理之E.玻璃樣品進行離子交換 . 處理在本實例中,使用二氫氧四胺把[Pd(NH3)4](〇H)2製 備1.5公升0·01 wt.%之把溶液用於離子交換(,,ΐΕχ溶液,,)。 將約Η)公克Ε-_破璃加入離子交換溶液中(&quot;玻璃/離子交 換此合物)。里测玻璃/離子交換混合物之^11值。根據需 要,連續逐滴添加約29.8 Wt·%之氫氧化銨(ΝΗ4〇η),將該 混合物之pH值調整至大於1〇(在本實例中,得到的^^值約 為10.8)。然後,將該玻璃/離子交換混合物移入4公升之燒 杯中,且在50°C溫度下加熱兩小時,同時使用一台不鏽鋼 槳式攪拌機以300至500 rpm之速度進行機械攪拌。離子交 換處理元成之後’使用帶有Whatman 541濾紙之布氏漏斗 過據玻璃/離子交換混合物並收集離子交換_玻璃樣品,然 後使用約7.6公升之稀NH4〇H溶液清洗。稀NHUOH溶液係 採用混合10公克之29.8 wt·%濃NKUOH溶液與約3.8公升去 離子水而製備。然後,在11 (TC溫度下,將離子交換破璃 樣品乾燥22小時。 採用電感耦合電漿-原子發射光譜法(ICP-AES)分析樣 品’鈀濃度之結果約為1.00 wt.%。 實例2 E-06F玻璃上之把 獲得由Lauscha Fiber International生產,平均直徑為 500_600奈米之e-〇6F玻璃纖維。 126433.doc -58- 200843847 第步’對於按原樣接收、未經煅燒之E-06F玻璃樣品 進行I浸處理。在本實例中,用於酸浸處理之酸溶液以石 夬玻璃進行預飽和。具體而言,將3公升之1.5 N硝酸及 150公克石英玻璃各自置入4公升之塑膠廣口容器内。將該 塑膠容器置於951之通風烘箱内5小時,每3〇分鐘用手稍 微搖晃一下。預飽和處理完成後,對樣品進行傾析,使硝 酸與石英玻璃分離。 第一步,將約15公克E-06F玻璃及3公升1.5N預飽和之硝 酸各自置入4公升之塑膠廣口容器内。將該塑膠容器置於 95°C之通風烘箱内4小時,每3〇分鐘用手稍微搖晃一下。 酉文汉處理完成之後,使用帶有whatman 541濾紙之布氏漏 斗過濾樣品,並使用約7·6公升去離子水清洗。然後,在 110 C之溫度下,將酸浸後之樣品乾燥22小時。 第三步,對經酸浸處理之匕〇奸玻璃樣品進行離子交換 處理。在本實例中,使用二氫氧四胺鈀[pd(NH3川⑴Η)2製 備1公升0.003 wt·%之鈀溶液用於離子交換(&quot;ΙΕχ溶液&quot;)。 將約14.22公克E-06F玻璃加入離子交換溶液中(”玻璃/離子 交換混合物”)。量測玻璃/離子交換混合物之?11值。根據 需要,連續逐滴添加約29.8 wt.%之氫氧化銨(ΝΗ4〇Η),將 該混合物之pH值調整至大於10(在本實例中,得到的?11值 約為10.88)。將玻璃/離子交換混合物移入4公升之塑膠廣 口容器。將該塑膠容器置於50t;之通風烘箱内2小時f = 30分鐘用手稍微搖晃一下。離子交換處理完成之後,使用 帶有W h a t m a η 5 41濾紙之布氏漏斗過濾破璃/離子交換混合 126433.doc -59- 200843847 物並收集離子交換-玻璃樣品,然後使用約7·6公升之稀 ΝΗ4〇Η溶液清洗。稀NEUOH溶液係採用混合1〇公克之298 wt.%濃NH4〇H溶液與約3.8公升去離子水而製備。然後, 在11 〇 c溫度下,將離子交換玻璃樣品乾燥22小時。 第四步,對離子交換玻璃樣品進行還原處理,其中離子 交換玻璃在氫氣(H2)流速為2 L/hr之氫氣氣氛及30(rc溫度 下還原4小時。 採用ICP-AES進行樣品分析,纪濃度之結果約為〇 wt·%。採用如(下面)實例所述之掃描透射電子顯微鏡 (STEM)刀析對樣品之截面部分進行檢測,結果表明,把 顆粒(對比度較亮的點)一般分散在與孔隙壁表面距離小於 或等於約30奈米之範圍内(亦即,相對於對比度相對較亮 的基質周圍材料區域,對比度較暗的陰影區域之周界)。 實例3 E-Q6F玻璃上之銘 獲侍由Lauscha Fiber International生產,平均直徑為 500-600奈米之E-〇6F玻璃纖維。 第一步’對於按原樣接收、未經煅燒之^_0617玻璃樣品 進仃酸浸處理。在本實例中,用於酸浸處理之酸溶液以石 英玻璃進行預飽和。具體而言,將3公升之1·5 N硝酸及 150公克石英玻璃各自置入4公升之塑膠廣口容器内。將該 塑膠容器置於95°C之通風烘箱内5小時,每30分鐘用手稍 微搖晃一下。預飽和處理完成後,對樣品進行傾析,使預 飽和之硝酸與石英玻璃分離。 126433.doc 200843847 第二步,將約15公克E-06F玻璃及3公升n預飽和之 硝酸各自置入4公升之塑膠廣口容器内。將該塑膠容器置 於95 C之通風烘箱内4小時,每30分鐘用手稍微搖晃一 下。酸浸處理完成之後,使用帶有Whatman 541濾紙之布 氏漏斗過濾樣品,並使用約7.6公升去離子水清洗。然 後,在ii〇°c之溫度下,將酸浸後之樣品乾燥22小時。 第三步,對經酸浸處理之E-06F玻璃樣品進行離子交換 處理。在本實例中,使用二氣四胺鉑[Pt(NH3)4](cl)2製備工 公升0.05 wt·%之鉑溶液用於離子交換(”ΙΕχ溶液,,)。將約 8.2公克E-06F玻璃加入離子交換溶液中(”玻璃/離子交換混 合物”)。量測玻璃/離子交換混合物之阳值。根據需要, 連續逐滴添加約40%之氫氧化四丙基銨,將該混合物之 值調整至大於10(在本實例中,得到WpH值約為1〇〇9)。然 後’將5亥玻璃/離子父換混合物移入4公升之燒杯中,且在 50°C溫度下加熱兩小時,同時使用一台不鏽鋼槳式攪拌機 以300至500 rpm之速度進行機械攪拌。離子交換處理完成 之後,使用帶有Whatman 541濾紙之布氏漏斗過濾玻璃/離 子交換混合物並收集離子交換-玻璃樣品,然後使用約7 6 公升之稀NH4〇H溶液清洗。稀NH4〇H溶液係採用混合1〇公 克之29_8 wt·%濃NH4〇H溶液與約3.8公升去離子水而製 備。然後,在iio°c溫度下,將離子交換破璃樣品乾燥22 小時。 第四步,對離子交換玻璃樣品進行還原處理,其中離子 交換玻璃在氫氣(HO流速為2 L/hr之氫氣氣氛及25〇t?c溫度 126433.doc 61 - 200843847 下還原4小時。 採用ICP-AES進行樣品分析,鉑濃度之結果約為5 99 wt·% 〇 實例4 E-06F玻璃上之銘 獲付由Lauscha Fiber International生產,平均直徑為 500-600奈米之E-06F玻璃纖維。 第一步,對於按原樣接收、未經煅燒之E-06F玻璃樣品 進行酸次處理。在本實例中,用於酸浸處理之酸溶液以石 英玻璃進行預飽和。具體而言,將3公升之15 N硝酸及 150公克石英玻璃各自置入4公升之塑膠廣口容器内。將該 塑膠容器置於95。(:之通風烘箱内5小時,每30分鐘用手稍 微搖晃一下。預飽和處理完成後,對樣品進行傾析,使預 飽和之硝酸與石英玻璃分離。 第二步,將約30.64公克E-06F玻璃及3公升丨_5 N預飽和 之硝酸置入4公升之塑膠廣口容器内。將該塑膠容器置於 95 C之通風烘箱内4小時,每30分鐘用手稍微搖晃一下。 酸次處理完成之後,使用帶有Whatman 54丨濾紙之布氏漏 斗過濾樣品,並使用約7.6公升去離子水清洗。然後,在 noc之溫度下,將酸浸後之樣品乾燥22小時。 第三步,對經酸浸處理之匕061?玻璃樣品進行離子交換 處理。在本實例中,使用二氯四胺鉑[ρ^ΝΗ3)4]^^製備'工 公升0.005 wt·%之鉑溶液用於離子交換(,,ΙΕχ溶液。。將約 9·5 1公克E_06F玻璃加人離子交換溶液中(,,玻璃/離子交換 126433.doc -62- 200843847 混合物”)。量測玻璃/離子交換混合物之pH值。根據需 要’連續逐滴添加約40%之氫氧化四丙基銨,將該混合物 之PH值調整至大於ι〇(在本實例中,得到的阳值約為 10·85)。然後,將該玻璃/離子交換混合物移入4公升之玻 璃燒杯中,且在50°C溫度下加熱兩小時,同時使用一台不 鏽鋼槳式攪拌機以3〇〇至500 rpm之速度進行機械攪拌。離 子交換處理完成之後,使用帶有whatman 濾紙之布氏 漏斗過據玻璃/離子交換混合物並收集離子交換-玻璃樣 品’然後使用約7.6公升之稀NHWH溶液清洗。稀1^^4〇11 溶液係採用混合丨〇公克之29 8 wt %濃胃4〇11溶液與約3·8 公升去離子水而製備。然後,在ll〇°C溫度下,將離子交 換玻璃樣品乾燥22小時。 第四步,對離子交換玻璃樣品進行還原處理,其中離子 交換玻璃在氫氣(HO流速為2 L/hr之氫氣氣氛及3〇〇 χ:溫度 下還原4小時。 採用ICP-AES進行樣品分析,鉑濃度之結果約為〇 56 wt%。 實例5 E-06F玻璃上之銘 獲句·由Lauscha Fiber International生產,平均直押為 500-600奈米之E-06F玻璃纖維。 第一步,對於按原樣接收、未經煅燒之E-〇6F玻璃樣品 進行酸浸處理。在本實例中,用於酸浸處理之酸溶液以石 英玻璃進行預飽和。具體而言,將3公升之15 n硝酸及 126433.doc -63- 200843847 100公克石英玻璃各自置入4公升之塑膠廣口容器内。將該 塑膠容器置於95 °c之通風烘箱内5小時,每30分鐘用手稍 被搖晃下。預飽和處理完成後,對樣品進行傾析,使預 飽和之硝酸與石英玻璃分離。 第二步,將約50.21公克E-06F玻璃及3公升1.5 N預飽和 之硝酸各自置入4公升之塑膠廣口容器内。將該塑膠容器 置於95°C之通風烘箱内4小時,每3〇分鐘用手稍微搖晃一 下。酸浸處理完成之後,使用帶有Whatman 541濾紙之布 氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。然 後,在110 c之溫度下,將酸浸後之樣品乾燥22小時。 第三步,對經酸浸處理之匕0617玻璃樣品進行離子交換 處理。在本實例中,使用二氣四胺鉑備i 公升0.14 wt·%之鉑溶液用於離子交換(”ΙΕχ溶液,將約 33.68公克E-06F玻璃加入離子交換溶液中(,,玻璃/離子交換 混合物”)。量測玻璃/離子交換混合物之1)11值。根據需 要,連續逐滴添加約40%之氫氧化四丙基銨,將該混合物 之PH值調整至大於10(在本實例中,得到的阳值約為 10.94)。將玻璃/離子交換混合物移入4公升之塑膠廣口容 器。將廣口容器置於5〇t之通風烘箱内兩小日夺,每3〇分鐘 用手稍微搖晃-下。|子交換處理完成之後,使用帶有 Whatman 541濾、紙之布氏漏斗過遽玻璃/離子交換混合物並 收集離子交換·玻璃樣&amp;,然後使料7·6公升之稀卿〇h 溶液清洗。稀nh:4〇h溶液係採用混合1〇公克之29 8 - %濃 NH4〇H溶液與約3.8公升去離子水而製備。然後,在= 126433.doc •64- 200843847 溫度下,將離子交換玻璃樣品乾燥22小時。 第四步,對離子交換玻璃樣品進行還原處理,其中離子 交換玻璃在氫氣(H2)流速為2 L/hr之氫氣氣氛及300°C溫度 下還原4小時。 採用ICP-AES進行樣品分析,鉑濃度之結果約為1.38 wt% 〇 實例CH-1 分析方法re/XPS濺射,SARCNa, 、等電點(IEP)及 S.A.N2-BET 或 S.A.Kr-BET 測定 X射線光電子光譜學(XPS)濺射深度分布法 使用一台帶有1486.7 eV微聚焦、單色化Α1 Κα X射線源 ^ PHI Quantum 200 Scanning ESCA Microprobe™ (Physical Electronics公司)獲得XPS濺射深度分布。儀器具有雙中和 能力,在光譜採集過程中,利用低能電子及陽離子提供電 荷補償。 XPS譜通常在以下條件下測得: k - X射線束直徑10-200 μιη -X射線束功率2-40 W . -樣品分析區10-200 |ΐιπι -電子發射角度與樣品法線呈45° 所有XPS譜及濺射深度分布均在室溫下記錄,不對樣品 • 進行預處理,但將樣品置於XPS儀器真空環境中的情況除 - 外。 藉由交替幾個週期之樣品表面光譜採集,然後在每個週 126433.doc -65- 200843847 ^對樣品表面進行15錢秒的2 kv Ar+濺射以清除表面材 枓來產生濺射深度分布。❹—層已知厚度的 濺射深度速率。 又早Samples were washed with approximately 7.6 mm of μμ, u, and A deionized water. Then, the acid immersed sample was dried for 22 hours at a temperature of 11 (TC). • In the second step, the acid-impregnated E. glass sample was subjected to ion exchange. Treatment In this example, dihydrogen-oxygen was used. The amine was prepared by using [Pd(NH3)4](〇H)2 to prepare 1.5 liters of 0·01 wt.% of the solution for ion exchange (,, ΐΕχ solution, )). In the ion exchange solution (&quot;glass/ion exchange of this compound). The value of the glass/ion exchange mixture was measured. About 29.8 Wt·% of ammonium hydroxide (ΝΗ4〇η) was added dropwise as needed, and the pH of the mixture was adjusted to be greater than 1 〇 (in the present example, the obtained value was about 10.8). Then, the glass/ion exchange mixture was transferred to a 4 liter beaker and heated at 50 ° C for two hours while mechanically stirring at a speed of 300 to 500 rpm using a stainless steel paddle mixer. After the ion exchange treatment was carried out, a Buchner funnel with Whatman 541 filter paper was used to pass the glass/ion exchange mixture and the ion exchange glass sample was collected, and then washed with a solution of about 7.6 liters of a diluted NH4 〇H solution. The dilute NHUOH solution was prepared by mixing 10 grams of a 29.8 wt.% concentrated NKUOH solution with about 3.8 liters of deionized water. Then, the ion exchange glass sample was dried at 11 °C for 22 hours. The result of analyzing the sample 'palladium concentration by inductively coupled plasma-atomic emission spectroscopy (ICP-AES) was about 1.00 wt.%. The E-06F glass was obtained from e-〇6F glass fiber produced by Lauscha Fiber International with an average diameter of 500-600 nm. 126433.doc -58- 200843847 Step 'For E-06F received as received, uncalcined The glass sample was subjected to I immersion treatment. In the present example, the acid solution used for the acid leaching treatment was pre-saturated with samarium glass. Specifically, 3 liters of 1.5 N nitric acid and 150 gram of quartz glass were each placed in 4 liters. In a plastic wide-mouth container, place the plastic container in a ventilated oven for 951 for 5 hours, and shake it slightly by hand every 3 minutes. After the pre-saturation treatment, the sample is decanted to separate the nitric acid from the quartz glass. One step, put about 15 grams of E-06F glass and 3 liters of 1.5N pre-saturated nitric acid into a 4 liter plastic wide-mouth container. Place the plastic container in a 95 ° C ventilated oven for 4 hours, every 3 hours. Minutes by hand Shake it. After the treatment was completed, the sample was filtered using a Buchner funnel with whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, at 110 C, the acid leached sample was taken. Drying for 22 hours. In the third step, the acid leached glass sample was subjected to ion exchange treatment. In this example, 1 liter of 0.003 wt· was prepared using palladium dihydrogen tetraamine [pd(NH3川(1)Η) 2 % palladium solution for ion exchange (&quot;ΙΕχsolution&quot;). Add about 14.22 grams of E-06F glass to the ion exchange solution ("glass/ion exchange mixture"). Measure the glass/ion exchange mixture? A value of about 29.8 wt.% ammonium hydroxide (ΝΗ4〇Η) was added dropwise as needed, and the pH of the mixture was adjusted to be greater than 10 (in the present example, the ?11 value was about 10.88). The glass/ion exchange mixture was transferred to a 4 liter plastic wide-mouth container. The plastic container was placed in a ventilated oven for 2 hours at f = 30 minutes with a slight shake. After the ion exchange treatment was completed, use W hatma η 5 41 filter Paper Buchner funnel filter broken glass / ion exchange mixing 126433.doc -59- 200843847 and collect ion exchange - glass sample, then use about 7 · 6 liters of diluted 〇Η 4 〇Η solution to clean. Dilute NEUOH solution is mixed 1 An ionic solution of 298 wt.% concentrated NH4 〇H was prepared with about 3.8 liters of deionized water. The ion exchange glass sample was then dried at a temperature of 11 〇c for 22 hours. In the fourth step, the ion exchange glass sample is subjected to a reduction treatment, wherein the ion exchange glass is reduced in a hydrogen atmosphere at a hydrogen (H2) flow rate of 2 L/hr and at a temperature of 30 (rc temperature for 4 hours. Sample analysis by ICP-AES) The result of the concentration was about 〇wt·%. The cross-section of the sample was examined by scanning transmission electron microscopy (STEM) as described in the example below (the following example), and the results showed that the particles (higher contrast points) were generally dispersed. In the range of less than or equal to about 30 nm from the surface of the pore wall (i.e., the perimeter of the darker shaded area relative to the material region of the substrate that is relatively brighter than the contrast). Example 3 E-Q6F glass Zhi Ming was awarded the E-〇6F glass fiber produced by Lauscha Fiber International with an average diameter of 500-600 nm. The first step was to carry out acid leaching treatment on the ^_0617 glass sample received as received and not calcined. In this example, the acid solution used for the acid leaching treatment is pre-saturated with quartz glass. Specifically, 3 liters of 1·5 N nitric acid and 150 g of quartz glass are placed in a 4 liter plastic wide mouth. Inside the container, the plastic container was placed in a ventilated oven at 95 ° C for 5 hours, and shaken by hand every 30 minutes. After the pre-saturation treatment, the sample was decanted to separate the pre-saturated nitric acid from the quartz glass. 126433.doc 200843847 In the second step, approximately 15 grams of E-06F glass and 3 liters of n presaturated nitric acid were placed in a 4 liter plastic wide-mouth container. The plastic container was placed in a 95 C ventilated oven for 4 hours. Shake it slightly by hand every 30 minutes. After the acid leaching process, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, at a temperature of ii 〇 °c, The acid leached sample was dried for 22 hours. In the third step, the acid leached E-06F glass sample was subjected to ion exchange treatment. In this example, dioxetamine platinum [Pt(NH3)4] (cl) was used. 2) A platinum solution of 0.05 wt.% was prepared for ion exchange ("ΙΕχ solution,"). About 8.2 g of E-06F glass was added to the ion exchange solution ("glass/ion exchange mixture"). /positive value of ion exchange mixture As needed, about 40% of tetrapropylammonium hydroxide was added dropwise continuously, and the value of the mixture was adjusted to be greater than 10 (in the present example, the WpH value was about 1〇〇9). Then 'Ha 5 The glass/ion parent blend was transferred to a 4 liter beaker and heated at 50 ° C for two hours while mechanically stirring at 300 to 500 rpm using a stainless steel paddle mixer. After ion exchange treatment was completed, use The Buchner funnel was filtered with a Whatman 541 filter paper/ion exchange mixture and the ion exchange-glass samples were collected and then washed with a solution of about 7 6 liters of dilute NH4 〇H. The dilute NH4〇H solution was prepared by mixing 1 〇g of 29_8 wt·% concentrated NH4〇H solution with about 3.8 liters of deionized water. The ion exchange glass samples were then dried for 22 hours at iio °c. In the fourth step, the ion exchange glass sample is subjected to reduction treatment, wherein the ion exchange glass is reduced in hydrogen gas (hydrogen atmosphere with a HO flow rate of 2 L/hr and 25 〇t?c temperature 126433.doc 61 - 200843847 for 4 hours. -AES for sample analysis, the platinum concentration was approximately 5 99 wt.%. Example 4 E-06F glass was obtained from Euscha Fiber International and produced with E-06F glass fibers having an average diameter of 500-600 nm. In the first step, an acid treatment is performed on the E-06F glass sample which is received as it is and which is not calcined. In this example, the acid solution used for the acid leaching treatment is presaturated with quartz glass. Specifically, 3 liters is used. 15 N nitric acid and 150 g of quartz glass were placed in a 4 liter plastic wide-mouth container. Place the plastic container in 95. (: 5 hours in a ventilated oven, shake it slightly by hand every 30 minutes. Presaturation treatment After completion, the sample is decanted to separate the presaturated nitric acid from the quartz glass. In the second step, about 30.64 grams of E-06F glass and 3 liters of 丨5 N presaturated nitric acid are placed in a 4 liter plastic wide mouth. Inside the container The container was placed in a 95 C ventilated oven for 4 hours and shaken slightly by hand every 30 minutes. After the acid treatment was completed, the sample was filtered using a Buchner funnel with Whatman 54 丨 filter paper and rinsed with approximately 7.6 liters of deionized water. Then, the acid immersed sample was dried for 22 hours at a temperature of noc. In the third step, the acid leached 匕061? glass sample was subjected to ion exchange treatment. In the present example, tetrachlorotetramine platinum was used. [ρ^ΝΗ3)4]^^ Preparation of 'gong liters of 0.005 wt·% of platinum solution for ion exchange (,, ΙΕχ solution.. about 9. 5 1 gram E_06F glass plus human ion exchange solution (,, glass /ion exchange 126433.doc -62- 200843847 mixture"). Measure the pH of the glass / ion exchange mixture. Add about 40% of tetrapropylammonium hydroxide as needed, continuously adjust the pH of the mixture To be greater than ι (in this example, the positive value is about 10.85). The glass/ion exchange mixture is then transferred to a 4 liter glass beaker and heated at 50 ° C for two hours while Use a stainless steel paddle mixer Mechanical agitation at a speed of 3 to 500 rpm. After ion exchange treatment, use a Buchner funnel with whatman filter paper to pass the glass/ion exchange mixture and collect the ion exchange-glass sample' then use about 7.6 liters of thin The NHWH solution was cleaned. The diluted 1^^4〇11 solution was prepared by mixing 29 8 wt% concentrated stomach 4〇11 solution with about 3·8 liters of deionized water. Then, the ion exchange glass sample was dried at a temperature of 11 ° C for 22 hours. In the fourth step, the ion exchange glass sample is subjected to reduction treatment, wherein the ion exchange glass is reduced in hydrogen gas (hydrogen atmosphere at a flow rate of 2 L/hr and 3 Torr: temperature for 4 hours. Sample analysis is performed by ICP-AES, The result of platinum concentration is about wt56 wt%. Example 5 E-06F glass on the inscriptions · E-06F glass fiber produced by Lauscha Fiber International with an average weight of 500-600 nm. The un-calcined E-〇6F glass sample was subjected to acid leaching treatment as it is. In this example, the acid solution used for the acid leaching treatment was pre-saturated with quartz glass. Specifically, 3 liters of 15 n nitric acid was used. And 126433.doc -63- 200843847 100 grams of quartz glass were placed in a 4 liter plastic wide-mouth container. The plastic container was placed in a 95 °c ventilated oven for 5 hours, and was shaken slightly by hand every 30 minutes. After the pre-saturation treatment is completed, the sample is decanted to separate the pre-saturated nitric acid from the quartz glass. In the second step, about 50.21 g of E-06F glass and 3 liters of 1.5 N pre-saturated nitric acid are placed in 4 liters of plastic. Inside the wide mouth container. Will The plastic container was placed in a ventilated oven at 95 ° C for 4 hours and shaken slightly by hand every 3 minutes. After the acid leaching treatment, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and used for about 7.6 liters. The ion-washed water is washed. Then, the acid-immersed sample is dried for 22 hours at a temperature of 110 c. In the third step, the acid-impregnated 匕0617 glass sample is subjected to ion exchange treatment. In this example, two are used. Gas tetraamine platinum i.e. 0.14 wt.% platinum solution for ion exchange ("ΙΕχ solution, about 33.68 grams of E-06F glass was added to the ion exchange solution (,, glass / ion exchange mixture"). / Ion exchange mixture 1) 11 value. As needed, about 40% of tetrapropylammonium hydroxide is added dropwise continuously, and the pH of the mixture is adjusted to be greater than 10 (in this example, the positive value obtained is about 10.94). Move the glass/ion exchange mixture into a 4 liter plastic wide-mouth container. Place the wide-mouth container in a 5 〇t ventilated oven for two days, shaking it slightly by hand every 3 〇 minutes.|Sub-exchange After processing is complete, use There is a Whatman 541 filter, paper Buchner funnel over the glass / ion exchange mixture and collect ion exchange · glass sample &amp;, then the material 7 6 liters of rare 〇h solution is cleaned. Rare nh: 4 〇 h solution system The ion exchange glass samples were dried for 22 hours at a temperature of = 126433.doc • 64-200843847 by mixing 1 gram of a 29 8 -% concentrated NH 4 〇H solution with about 3.8 liters of deionized water. In the fourth step, the ion-exchanged glass sample was subjected to a reduction treatment in which the ion-exchanged glass was reduced in a hydrogen atmosphere at a hydrogen (H2) flow rate of 2 L/hr and at a temperature of 300 ° C for 4 hours. Sample analysis by ICP-AES showed a platinum concentration of approximately 1.38 wt%. Example CH-1 analytical method re/XPS sputtering, SARCNa, isoelectric point (IEP) and SAN2-BET or SAKr-BET determination X-ray photoelectron spectroscopy (XPS) sputter depth distribution method uses a 1486.7 eV microfocus, monochromated Α1 Κα X-ray source ^ PHI Quantum 200 Scanning ESCA MicroprobeTM (Physical Electronics) to obtain XPS sputter depth distribution . The instrument has a dual neutralization capability that provides charge compensation using low-energy electrons and cations during spectral acquisition. The XPS spectrum is usually measured under the following conditions: k - X-ray beam diameter 10-200 μηη - X-ray beam power 2-40 W . - Sample analysis area 10-200 | ΐιπι - Electron emission angle is 45° to the sample normal All XPS spectra and sputter depth profiles were recorded at room temperature without pretreatment of the sample, except when the sample was placed in a vacuum environment of the XPS instrument. The sputter depth profile was generated by alternately collecting the sample surface spectra for several cycles and then performing a 15 ksec 2 kv Ar+ sputtering on the surface of the sample every week at 126433.doc -65 - 200843847^ to remove the surface material. The thickness of the sputtering depth of the known thickness of the layer. Early

Pd及Si原子濃度值的獲取 峰面積並針對其各自的原子 進行修正。 方法為’取Pd 3d3/2及si 靈敏度因數及分析儀傳輸 2p之 函數The peak area of the Pd and Si atomic concentration values is corrected for their respective atoms. The method is 'take Pd 3d3/2 and si sensitivity factor and the analyzer transmits 2p function.

熟習XPS分析技術者應瞭解,濺射深度參數的測定既受 人為不確定度亦受機械不確定度之影響,兩者結合可能對 採用XPS濺射深度分布技術敎之_深度的每個報主值 造成約25%之不確定度。因&amp;,該不確定度表現在深:值 上。該不精確在整個XPS分析技術中都很普遍,但,對於 在本文所揭示之催化活性區域的平均厚度及其他材料屬性 而言’該不精確不足以妨礙對本文所述n组合物進行 區分,亦不會影響該等組合物與其他未在本文描述及主張 的組合物進行區分。 透射電子顯微鏡(TEM)分析法 透射電子顯微鏡(TEM)樣品檢測使用在3〇〇 !^¥加速電壓 下工作的JEOL 3000F場發射掃描透射電子顯微鏡(stem) 儀器。該儀器裝有牛津儀器公司(〇xf〇rd Instruments)的Those skilled in the art of XPS analysis should understand that the measurement of the sputter depth parameter is affected by both human uncertainty and mechanical uncertainty. The combination of the two may be for each reporter using the XPS sputter depth distribution technique. The value causes an uncertainty of approximately 25%. Because of &amp;, the uncertainty is expressed in the depth: value. This inaccuracy is common throughout the XPS analysis technique, but for the average thickness and other material properties of the catalytically active regions disclosed herein, the inaccuracy is insufficient to prevent differentiation of the n compositions described herein. It also does not affect the differentiation of such compositions from other compositions not described and claimed herein. Transmission Electron Microscopy (TEM) Analysis Transmission electron microscopy (TEM) sample detection uses a JEOL 3000F field emission scanning transmission electron microscope (stem) instrument operating at an acceleration voltage of 3 〇〇 !^¥. The instrument is equipped with Oxford Instruments (〇xf〇rd Instruments)

Inca X射線光譜儀系統,使用能量色散光譜儀執行局部化 學分析。 樣品之製備首先將樣品材料嵌入熟習TEM分析技術者所 知的標準環氧包埋劑中。固化後,使用超薄切片機將環氧 包埋的樣品材料切割為約8〇奈米厚的切片。切片收集在薄 126433.doc -66- 200843847 臈有孔碳載體上,不需要進一步加工,適當定位於上述 STEM儀器的電子束場中,以供檢測及分析。 熟習TEM分析技術者應瞭解,使用TEM分析方法測定目 標分析物之位置及關心區域相對於基質表面之平均厚度既 受人為不確定度的影響,亦受機械不確定度的影響,取決 於樣品之圖像解析度、目標分析物之物理化學特性及樣品 形態等因素,可能造成約土20%2TEM垂直深度量測結果 (相對於某個具體參照點)不確定度及約士5%之側位量測結 果(相對於某個具體參照點)不確定度。因此,該不確定性 表現在測得的催化成分相對於樣品基質表面的距離上,如 圖1所示。該不精確在整個TEM分析過程中都很普遍,但 並不足以妨礙觸媒組合物之間的區分。 SARCNa測定、SARCNa空樣及相關統計分析 由於以上討論之原因,鈉的表面積變化率(nSARC^,,)報 告為NaOH滴定液體積之比率。 根據上述SARCw程序,測定以下實例中給定之每個樣 品之SARC^。藉由配製3.5M NaCl溶液(亦即在15〇毫升去 離子水中加入30公克NaCl)製備一份空樣,其不含基質樣 品。但,為了解決S ARC勤實驗程序中之統計上的變異 性,應滴定四份獨立的空樣,且使用獲取v初及(亦 即,V總-V初)所用之規定濃度(本實例中為〇 〇1 N)滴定量平 均值來調整(亦即修正)各基質樣品SARC^測定所使用之滴 定液體積。根據與上述SARCy^測定相同的程序調整空樣 pH值並滴定空樣,但同樣不含基質。 126433.doc -67- 200843847 在以下提供的各空樣品及其各自的平均值及標準偏差 (或V總的σ)分析測試結果表格中報告空樣滴定量的統計分 :。同樣’亦報告了由於各自V總所引起之相應於各滴定 里V5、V10和vu的固有統計上之波動。從統計學的角 度使用、、先计t分布,在平均值附近,所指定之信賴區間 以外的數值可罪’並非源於實驗方法自身固有偏差的確定 度達到95 /〇。所以,空樣平均值附近信賴區間内的基質樣 。口測彳于的V初及Vt值被視為在統計學上與空樣沒有差別。因 此,此類樣品不計算SARC^值。 等電點(IEP)測定 根據以下程序測定下面給定之各樣品的等電點(,,ΐΕρπ)。 使用帶 pH mWORP模組的 Mettler T〇led〇 SevenMuhi表,配 &amp; Mettler Toledo INLAB 413 pH複合電極進行 IEP量測。在 所關心的整個IEP範圍内,利用pH值為2、4、7及1〇的標準 pH緩衝溶液校準儀錶。使用足以使樣品達到初濕狀態的一 定量16 ΜΩ去離子水(在約25t:下)潤濕樣品,測定每份樣 品的IEP,由此可產生比較稠密的漿狀或糊状混合物。而 3初濕狀悲可使玻璃電極及其參考電極觸面與接觸受測固 體樣品的液體(在本實例中為漿狀或糊状混合物)之間達成 液體接觸。根據樣品的形態(例如玻璃微纖維、粒狀粉 末、切短纖維等)及其多孔性(若有)程度,該程序需要不同 的水量。但在所有情況中,添加的水量應該僅僅足以使充 分的液體與玻璃電極及參考電極觸面接觸。換句話說,對 文測樣品加水應該儘可能避免使樣品超過初濕狀態。在所 126433.doc -68- 200843847 有情況下使用電極頭,用手將固體樣品與去離子水(添加 用於產生初濕)混合,直至測得的pH值穩定,然後從儀錶 讀取所得pH值。 Ν2 BET或Kr BET表面積(S.A.)測定 根據以上提及之ASTM程序,對以下給定之每份樣品適 當進行S.A.N2-BET或S.A.Kr-BET測定。如根據以上更充分之 討論,對於較高的表面積量測值(例如約3至6 m2/g),按照 ASTM D3663-03所述之方法,N2 BET很可能為較佳的表面 f 積量測技術。而對於較低的表面積量測值(例如,&lt; 約3 11124),按照八8丁^1〇4780-95(’’8.八.心_5灯”)所述之方法,1^ BET可能為較佳的表面積量測技術。 用於修正SARCNy^定值的SARCNa空樣量測及統計分析The Inca X-ray spectrometer system performs local chemical analysis using an energy dispersive spectrometer. Sample Preparation The sample material is first embedded in a standard epoxy embedding agent known to those skilled in TEM analysis. After curing, the epoxy-embedded sample material was cut into approximately 8 inch thick slices using an ultramicrotome. The sections were collected on a thin 126433.doc-66-200843847 crucible carbon carrier and were not properly processed and properly positioned in the electron beam field of the above STEM instrument for detection and analysis. Those familiar with TEM analysis should understand that the location of the target analyte and the average thickness of the region of interest relative to the substrate surface using TEM analysis are both subject to human uncertainty and mechanical uncertainty, depending on the sample. Factors such as image resolution, physicochemical properties of the target analyte, and sample morphology may cause uncertainty in the 20% 2 TEM vertical depth measurement (relative to a specific reference point) and a side position of about 5%. Measurement results (relative to a specific reference point) uncertainty. Therefore, the uncertainty is expressed in the distance of the measured catalytic component relative to the surface of the sample substrate, as shown in Figure 1. This inaccuracy is common throughout the TEM analysis process, but is not sufficient to prevent discrimination between the catalyst compositions. SARCNa determination, SARCNa empty sample and related statistical analysis For the reasons discussed above, the surface area change rate of sodium (nSARC^,) is reported as the ratio of the volume of NaOH titrant. According to the above SARCw program, the SARC^ of each sample given in the following examples was determined. An empty sample was prepared by formulating a 3.5 M NaCl solution (i.e., adding 30 grams of NaCl in 15 mL of deionized water), which contained no matrix sample. However, in order to resolve the statistical variability in the SAARC test procedure, four separate empty samples should be titrated and used to obtain the specified concentration used for initial and (ie, V-V initial) (in this example) The mean titer of the 〇〇1 N) titration was used to adjust (ie, correct) the volume of the titrant used for the determination of the SARC of each matrix sample. The pH of the empty sample was adjusted according to the same procedure as described above for the SARCy^ and the empty sample was titrated, but also contained no matrix. 126433.doc -67- 200843847 The statistical summary of the empty sample titer is reported in the empty sample and its respective mean and standard deviation (or V total σ) analysis test results table provided below. Similarly, the inherent statistical fluctuations corresponding to V5, V10 and vu in each titration caused by the respective V totals are also reported. From the statistical angle of use, the t-distribution is pre-calculated, and the value outside the specified confidence interval near the average value is not sinful because the degree of certainty of the inherent deviation of the experimental method is 95/〇. Therefore, the matrix sample within the confidence interval is near the average value of the empty sample. The V initial and Vt values measured by the mouth were considered to be statistically indistinguishable from the empty samples. Therefore, such samples do not calculate the SARC^ value. Isoelectric point (IEP) measurement The isoelectric point (, ΐΕρπ) of each sample given below was determined according to the following procedure. IEP measurements were performed using a Mettler T〇led〇 SevenMuhi watch with a pH mWORP module and a &amp; Mettler Toledo INLAB 413 pH composite electrode. Calibrate the meter with a standard pH buffer solution of pH 2, 4, 7 and 1 整个 over the entire IEP range of interest. The sample is wetted with a quantity of 16 Μ Ω deionized water (at about 25 t:) sufficient to bring the sample to its incipient state, and the IEP of each sample is determined, thereby producing a relatively dense slurry or paste mixture. 3 Incipient wetness can make a liquid contact between the glass electrode and its reference electrode contact surface and the liquid contacting the test solid sample (in this example, a slurry or paste mixture). Depending on the morphology of the sample (e.g., glass microfibers, granulated powder, chopped fibers, etc.) and its porosity (if any), the procedure requires a different amount of water. In all cases, however, the amount of water added should be sufficient to bring the sufficient liquid into contact with the glass electrode and the reference electrode. In other words, adding water to the sample should avoid as much as possible the sample is exposed to the initial humidity. In the case of 126433.doc -68- 200843847, the electrode tip is used, and the solid sample is mixed with deionized water (added for generating incipient wetness) by hand until the measured pH is stable, and then the pH is read from the meter. value. Ν2 BET or Kr BET surface area (S.A.) determination According to the ASTM procedure mentioned above, the S.A.N2-BET or S.A.Kr-BET assay is suitably performed for each of the samples given below. As discussed more fully above, for higher surface area measurements (eg, about 3 to 6 m2/g), N2 BET is likely to be a preferred surface f-product measurement according to the method described in ASTM D3663-03. technology. For the lower surface area measurement (for example, &lt; about 3 11124), according to the method described in 8 8 ^ ^ 1 〇 4780-95 (''8. VIII. Heart _5 lamp)), 1^ BET It may be a better surface area measurement technique. SARCNa empty sample measurement and statistical analysis for correcting SARCNy^

樣品 號 稀 NaOH 滴定液 濃度(N) S.A.N2-BET (m2/g) 在 NaOI 始值調3 pH值1 I滴定中,使pH值從t0(V初) 备至9.0,並在t5、 丨呆持在9.0所需的滴定液髏^ 時4.0的初 ^5至1S)時將 味(毫升) V總= V初+V5至15 V初 0分鐘 v5 5分鐘 Vi〇 10分鐘 Vl5 15分鐘 V5^is 之和 空樣A 0.01 不適用 1.5 0.3 0.1 0.2 0.6 2.1 空樣B 0.01 不適用 2.2 0.1 0.1 0.2 0.4 2.6 空樣C 0.01 不適用 2.4 0.1 0.1 0.1 0.3 2.7 空樣D 0.01 不適用 2.2 0.1 0.2 0.1 0.4 2.6 空樣 平均值 0.01 不適用 2.075 0.15 0.125 0.15 0.325 2.5 空樣標準 偏差 0.01 不適用 0.3947 0.1 0.05 0.0577 不適用 0.2708 空樣95% 信賴區間 1.45- 2.70 2.07-2.9T 實例CH-2 E玻璃-SARCNa 獲取由 Lauscha Fiber International 生產之 E-06F 玻璃樣 126433.doc •69- 200843847 品’即平均直徑為500至600奈米奈米之玻璃纖維。 比較樣品Comp-A-1為按原樣接收之e玻璃樣品,而 Comp-A-2為經由煅燒但未經酸浸製備的按原樣接收之e玻 璃。對於比較樣品Comp-A-1及Comp_A-2,非酸浸E玻璃樣 品接受煅燒熱處理。在該處理過程中,非酸浸£玻璃在空 氣ML速為1公升/小時之空氣氣氛及6〇〇〇c之溫度下锻燒4小 時。 對按原樣接收之非煅燒E玻璃進行酸浸處理,由此製備 樣品B。在本實例中,用於酸浸處理之酸溶液以石英玻璃 進行預飽和。具體而言,將3公升之15 N硝酸及15〇公克 石英玻璃各自置入4公升之塑膠廣口容器内。將該塑膠容 器置於95°C之通風烘箱内5小時,每3〇分鐘用手稍微搖晃 一下。預飽和處理完成後,對樣品進行傾析,使預飽和之 肖酉文與石英玻璃分離。預飽和之硝酸將用於以下步驟。然 後將、力20公克E-06F玻璃及3公升預飽和之確酸各自置入4 公升之塑膠廣口容器内。將該塑膠容器置於95。〇之通風烘 箱内4小時,每30分鐘用手稍微搖晃一下。酸浸處理完成 之後,使用帶有Whatman 541濾紙之布氏漏斗過濾樣品, 並使用約7·6公升去離子水清洗。然後,在11(Γ(:之温度 下,將酸浸後之樣品乾燥22小時。 採用上述用於測定sARC,a的分析方法對比較樣品c〇mp_ A-1、Comp-A-2及樣品B進行分析。結果如下表所示。 126433.doc -70- 200843847 樣品 號 樣品 說明 稀 NaOH 滴定液濃 在NaOH滴定中,使pH值從t〇(V初)時4.0的初始值 調整至9.0,並在t5、纟1〇及纟15(¥5幻5)時將pH值保持 在9.0所需的滴定液實際體積(毫升) 度(N) V初 〇分鐘 v5 5分鐘 Vi〇 10分鐘 Vis! 15分鐘」 V嫌 V總-V初 空樣 空樣平均值 0.01 2.1 0.15 0.125 0.15 Ί Γ1.5 不適用 Comp A-1 原樣E-06F 0.01 20.5 0.5 0.4 0.3 1 21.7 1.2 Comp A-2 烺燒E-06F 0.1 0.7 0 0.1 0 0.8 0.1 B 酸浸E-06F 0.1 22.6 1.9 0.9 0.4 25.8 3.2 樣品 號 空樣 /Jr 樣品 說明 3樣平 均值 IEP ^適用 S.A.N2-BET (m2/g) 不適用 在SAI 測, 定+所需之滴定液體積 (亳升 SARC 胸 (V绝-V初)/V初 不適用 V初 0分鐘 2.1 V5 5分鐘 ~αϊ?~ Vio ^〇Λ2Γ Vis 15分鐘 V總 0.15 2.5| 修正之 Comp-A«l P Jbr -一 原樣E-06F 8.9 2.7 18.4 0.35 0.25 0.15 19.2 0.04 未修正之 Comp-A-9* 煅燒E-06F 9.5 &lt;7 0.7 0 0.1 0 0.8 〈〜0.2* 禾修正之 B* --—— 酸浸E-06F 4.1 161 22.6 1.9 0.9 ---. 0.4 25.8 〈〜0.2* 因為空樣修正值使用〇·〇1 N的NaOH滴定液濃度獲得,而 非該等特殊樣品SARCw分析所使用的〇·ι N Na〇H滴定 液’所以空樣滴定不用於修正該樣品滴定。 結合以下實例對上述觸媒組合物進行更詳細的描述,該 實例說明了上述不同類型之觸媒組合物可如何用於選擇性 氫化方法。符合本發明精神之所有修改及實施例均受到保 護。因此,以下實例並非用來限制於本文描述及主張之發 明。 選擇性氫化方法(SHP)實例 在以下非限制性實例中,選定之觸媒組合物經實驗室級 否又備進行試驗。一般程序如下所述。 126433.doc -71 - 200843847 百先’將觸媒樣品載入1//4&quot;内徑之反應器中。使用携之 Wc/min流速之氮中於啊下還原觸媒一個小時。 接著使由99.4 wt.%乙婦及〇6 wt%乙块構成之煙進料 在100 psig麼力下流過該觸媒。H2與乙炔之莫耳莫耳比率 約為1.2比卜且液時空速約為〇 63/hr。溫度大致每工小時 穩定地自35°C增加至5(rc,至价,至啊,至价,然 後回到65°C。 … 實例P-1 使用酸浸E玻璃上之把進行sjjp 在本實例_,將根據上面實例2之程序製備的約丨公克於 酸浸E玻璃上0·〇18 *%之㈣入反應器中。冑媒根據上 述SHP實例程序進行測試。 下表列出了最終溫度65°C下本試驗之結果。Sample No. Dilute NaOH Titration Concentration (N) SAN2-BET (m2/g) In the initial value of NaOI adjusted to 3 pH 1 I titration, the pH is prepared from t0 (V initial) to 9.0, and at t5, 丨Hold the required titration solution at 9.0 时^ 4.0 at the beginning of ^5 to 1S) will taste (ml) V total = V initial + V5 to 15 V initial 0 minutes v5 5 minutes Vi 〇 10 minutes Vl5 15 minutes V5 ^ Is and the sample A 0.01 Not applicable 1.5 0.3 0.1 0.2 0.6 2.1 Empty sample B 0.01 Not applicable 2.2 0.1 0.1 0.2 0.4 2.6 Empty sample C 0.01 Not applicable 2.4 0.1 0.1 0.1 0.3 2.7 Empty sample D 0.01 Not applicable 2.2 0.1 0.2 0.1 0.4 2.6 Average value of empty sample 0.01 Not applicable 2.075 0.15 0.125 0.15 0.325 2.5 Empty sample standard deviation 0.01 Not applicable 0.3947 0.1 0.05 0.0577 Not applicable 0.2708 Empty sample 95% Trust interval 1.45- 2.70 2.07-2.9T Example CH-2 E glass-SARCNa E-06F glass-like 126433.doc •69- 200843847 produced by Lauscha Fiber International is a glass fiber with an average diameter of 500 to 600 nanometers. The comparative sample Comp-A-1 was an e-glass sample received as it was, and Comp-A-2 was an e-glass which was received as it was by calcination but not prepared by acid leaching. For the comparative samples Comp-A-1 and Comp_A-2, the non-acid leached E glass sample was subjected to a calcination heat treatment. During this treatment, the non-acid leached glass was calcined for 4 hours at an air atmosphere having an air ML speed of 1 liter/hour and a temperature of 6 〇〇〇c. Sample B was prepared by subjecting non-calcined E glass received as it was to acid leaching. In this example, the acid solution used for the acid leaching treatment was presaturated with quartz glass. Specifically, 3 liters of 15 N nitric acid and 15 ounces of quartz glass were placed in a 4 liter plastic wide-mouth container. The plastic container was placed in a ventilated oven at 95 ° C for 5 hours and shaken slightly by hand every 3 minutes. After the presaturation treatment is completed, the sample is decanted to separate the presaturated Xiaoyu text from the quartz glass. Presaturated nitric acid will be used in the following steps. Then, 20 grams of E-06F glass and 3 liters of pre-saturated acid were placed in a 4 liter plastic wide-mouth container. Place the plastic container at 95. Shake it in your oven for 4 hours and shake it with your hands every 30 minutes. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, the sample after acid leaching was dried at 11 (at a temperature of 22 ° for 22 hours. Using the above analytical method for measuring sARC, a for comparative samples c〇mp_ A-1, Comp-A-2, and sample B. The results are shown in the following table. 126433.doc -70- 200843847 Sample No. Sample Description Diluted NaOH The titration solution is concentrated in the NaOH titration to adjust the pH from the initial value of 4.0 at t〇 (V initial) to 9.0. And the actual volume (ml) of the titration required to maintain the pH at 9.0 at t5, 纟1〇 and 纟15 (¥5 幻5) (N) V first minute v5 5 minutes Vi 〇 10 minutes Vis! 15 minutes" V-V total-V initial sample empty sample 0.01 2.1 0.15 0.125 0.15 Ί Γ1.5 Not applicable Comp A-1 as it is E-06F 0.01 20.5 0.5 0.4 0.3 1 21.7 1.2 Comp A-2 烺E -06F 0.1 0.7 0 0.1 0 0.8 0.1 B Acid leaching E-06F 0.1 22.6 1.9 0.9 0.4 25.8 3.2 Sample number empty sample / Jr Sample description 3 sample average IEP ^ for SAN2-BET (m2/g) Not applicable in SAI Measure, determine the required volume of titration solution (swelling SARC chest (V--V-pre-V) / V at the beginning is not applicable V first 0 minutes 2.1 V5 5 minutes ~ αϊ?~ Vio ^〇Λ2Γ Vis 15 minutes V total 0.15 2.5| Corrected Comp-A«l P Jbr - as it is E-06F 8.9 2.7 18.4 0.35 0.25 0.15 19.2 0.04 Uncorrected Comp-A-9* Calcined E-06F 9.5 &lt;7 0.7 0 0.1 0 0.8 <~0.2 * He revised B* --- Acid leaching E-06F 4.1 161 22.6 1.9 0.9 ---. 0.4 25.8 〈~0.2* Because the empty sample correction value is obtained using 〇·〇1 N NaOH titrant concentration instead of The 样品·ι N Na〇H titration used in the special sample SARCw analysis is therefore not used to correct the sample titration. The above catalyst composition is described in more detail in conjunction with the following examples, which illustrate the above How the different types of catalyst compositions can be used in the selective hydrogenation process. All modifications and examples that are within the spirit of the invention are protected. Therefore, the following examples are not intended to be limited to the invention described and claimed herein. (SHP) Example In the following non-limiting examples, the selected catalyst composition was tested at the laboratory level. The general procedure is as follows. 126433.doc -71 - 200843847 百先' Load the catalyst sample into the 1/4&quot; inner diameter reactor. The catalyst was reduced in nitrogen at a flow rate of Wc/min for one hour. The soot feed consisting of 99.4 wt.% and 6 wt% of the block was then passed through the catalyst at 100 psig. The molar ratio of H2 to acetylene is about 1.2 and the liquid hourly space velocity is about / 63/hr. The temperature is roughly increased from 35 ° C to 5 (rc, valence, ah, valence, and then back to 65 ° C per hour). Example P-1 using acid leached E glass on the sjjp Example _, about 丨 gram prepared according to the procedure of Example 2 above, on the acid immersion E glass, 0·〇18 *% (4) into the reactor. The sputum was tested according to the above SHP example procedure. The following table lists the final The result of this test at a temperature of 65 °C.

實例P-1 酸浸E玻璃上 0.6449 6 0.018 wt·%之始 儘管在前面的實施方式中,根據本發明的某些較佳實施 例對發明進行了描述,且為說明之目的,還提出了許多細 節’然熟習此項技術者顯而易見本發明很可能有其它一此 實施例,且在不偏離本發明基本原則的基礎上,於此所描 述的某些細節可能有較大不同。 【圖式簡單說明】 圖1為由一台JEOL 3000F場發射透射電子顯微鏡在3〇〇千 126433.doc -72- 200843847 伏加速電壓下所拍攝,眚 實裊上無微孔隙、但有中孔隙及大 孔隙之玻璃基質樣品「你丨1 ’、 、 (例如,酸浸E玻璃)橫截面部分的掃 描透射電子顯微鏡(STEivn fi # ^ , V 圖像,其中鈀顆粒一般分 與孔隙壁表面距離小於或笪 於次#於約30奈米奈米之範圍内。EXAMPLE P-1 Acid Leached E Glass Starting at 0.6449 6 0.018 wt% Although in the foregoing embodiments, the invention has been described in accordance with certain preferred embodiments of the invention, and for purposes of illustration, Many of the details are apparent to those skilled in the art, and it is obvious that the present invention may have other embodiments, and some of the details described herein may vary widely without departing from the basic principles of the invention. [Simple diagram of the diagram] Figure 1 is taken by a JEOL 3000F field emission transmission electron microscope at 3 〇〇 126 433.doc -72 - 200843847 volts accelerating voltage, the 眚 袅 has no microporosity, but has a medium porosity And scanning electron microscopy (STEivn fi # ^ , V image of the cross-section of the large-porosity glass matrix sample "you 丨 1 ', (for example, acid leached E glass), where the palladium particles are generally separated from the pore wall surface distance Less than or less than 次 in the range of about 30 nanometers.

C 126433.doc -73-C 126433.doc -73-

Claims (1)

200843847 十、申請專利範圍: -種製程流之選擇性氫化方法,其利用一種觸媒组合物 對该製程流之至少一部分進行選擇性氫化,該製程流含 有至少一種具有至少一個目標可氫化位點的化合物,其 中’該觸媒組合物包括: •具有中孔隙、大孔隙、外表面、開口孔隙壁表面、 表面區域及表面下區域的實質上無微孔隙基質, 一 至少一種催化成分,及 —至少一個催化活性區域,其包括該至少一種催化成 分,其中 (a) 該實質上無微孔隙基質具有 i)當以選自S.A.A^wr,S.A.hjw及其組合組成之群 之方法量測時,所測得之介於約5 m2/g至300 m2/g之間的總表面積;及 Π)在大於0但小於或等於14的pH值範圍内獲得之預 定等電點(IEP); (b) 該至少一個催化活性區域可為連續或不連續,且具有 i) 小於或等於約30奈米之平均厚度;及 Π)催化有效量之該至少一種催化成分;且 (c) 該至少一個催化活性區域之位置實質上 i) 在該外表面上, ii) 在該開口孔隙壁表面上, iii) 在該表面區域内, iv) 部分在該外表面上,部分在該開口孔隙壁表面 126433.doc 200843847 上,部分在該表面區域内及其組合;或 v) (c)(〇、(ii)、(iii)及(iv)之組合。 2. T請求項i之選擇性氫化方法,其中該至少一種催化成 分係選自由以下成分組成之群:布忍司特(Browed)或路 f 士(Lewis)酸、布忍、司特或路易士驗、貴金屬陽離子及 貴金屬錯合陽離子及陰離子、過渡金屬陽離子及過渡金 屬錯合陽料及陰離子、較金屬含氧陰料、過渡金 屬硫屬化物陰離子、主族含氧陰離子、豳化物、稀土離 子、稀土錯合陽離子及陰離子、貴金屬、過渡金屬、過 渡金屬氧化物、過渡金屬硫化物、過渡金屬氧硫化物、 過渡金屬碳化物、過渡金屬氮化物、過渡金相化物、 過渡金屬磷化物、稀土氫氧化物、稀土氧化物及其組 合0 如請求項1之選擇性箭#古、、土 ^ _ 伴庄1L化方法,其中在該觸媒組合物處 於穩態選擇性氯化反庫條株 &gt; 應保件下之則,该至少一種催化成 分為苐一催化成分,其具有 (a)第一預反應氧化態,及 ⑻與該基質之間的第一預反應相互作用,其係選自 由離子電荷相互作用、靜電電荷相互作用及其組 合組成之群。 4. 如請求項3之選擇性^ 俘注辽化方法’其中該第—催化成分係 選自由酸、鹼、硫屬化物及其組合組成之群。 5·如請求項3之選擇性氣化方法,其中在該觸媒組合物處 於穩悲選擇性氫化反應條件下之前,該第—催化成分之 126433.doc 200843847 至少一部分經改質或置換,以生成第二催化成分,其具有 (a) 第二預反應氧化態,及 (b) 與該基質之間相應的第二預反應相互作用; 其中’該第二催化成分之第二預反應氧化態小於、大於 或等於該第一催化成分之第一預反應氧化態。 6.如叫求項5之選擇性氫化方法,其中該第二催化成分係 選自由 Pd、Pt、Rh、Ir、Ru、0s、cu、Ag、Au、Ru、 Re Λ Ni ' c〇、Fe、Mn、Cr及其組合組成之群。 7·如清求項1之選擇性氫化方法,其中該基質為SARCNa小 於或等於約〇·5之玻璃組合物。 8·如清求項1之選擇性氫化方法,其中該至少一個催化活 性區域之至少5〇%實質上集中在平均厚度小於或等於約 2〇奈米之區域中。 9·如請求項1之選擇性氫化方法,其中該實質上無微孔隙 基質係選自由AR玻璃、稀土矽酸鈉玻璃、硼鋁矽酸鹽玻 璃、E玻璃、無硼E玻璃、s玻璃、R玻璃、稀土玻璃、矽 酉文鹽玻璃、Ba-Ti-矽酸鹽玻璃、氮化玻璃、a玻璃、C玻 璃及CC玻璃及其組合組成之群。 10 ·如凊求項1之選擇性氫化方法,其中在第一次浸出處理 之前或之後,該實質上無微孔隙基質所獲得之IEp係小 於或等於約7.8,但大於〇。 126433.doc 200843847 七、指定代表囷: (一) 本案指定代表圖為:第(1 )圖。 (二) 本代表圖之元件符號簡單說明: (無元件符號說明) 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無) 126433.doc200843847 X. Patent Application Scope: - A selective hydrogenation process for a process stream, wherein a selective hydrogenation of at least a portion of the process stream is carried out using a catalyst composition comprising at least one target hydrogenatable site having at least one target a compound, wherein the catalyst composition comprises: • a substantially microporous matrix having a mesoporous, macroporous, outer surface, open pore wall surface, surface region, and subsurface region, at least one catalytic component, and At least one catalytically active region comprising the at least one catalytic component, wherein (a) the substantially microporous matrix has i) when measured by a method selected from the group consisting of SAA^wr, SAhjw, and combinations thereof, The total surface area measured between about 5 m2/g and 300 m2/g; and 预定) the predetermined isoelectric point (IEP) obtained over a pH range greater than 0 but less than or equal to 14; The at least one catalytically active region may be continuous or discontinuous, and having i) an average thickness of less than or equal to about 30 nanometers; and Π) a catalytically effective amount of the at least one catalytic component; (c) the position of the at least one catalytically active region is substantially i) on the outer surface, ii) on the open pore wall surface, iii) in the surface region, iv) is partially on the outer surface, and partially The open pore wall surface 126433.doc 200843847 is partially in the surface region and combinations thereof; or v) (c) (combination of 〇, (ii), (iii) and (iv). 2. T request item i A selective hydrogenation process, wherein the at least one catalytic component is selected from the group consisting of: Browed or Lewis acid, Bruce, Stuart or Lewis, precious metal cations and precious metals Combined cations and anions, transition metal cations and transition metal miscible anodes and anions, metal oxide oxygenates, transition metal chalcogenide anions, main oxyanions, tellurides, rare earth ions, rare earth complex cations and anions, Precious metals, transition metals, transition metal oxides, transition metal sulfides, transition metal oxysulfides, transition metal carbides, transition metal nitrides, transition metallizations, transitions Is a phosphide, a rare earth hydroxide, a rare earth oxide and a combination thereof. The selective arrow #古, 土^ _ 扎1L method of claim 1 wherein the catalyst composition is in a steady state selective chlorine The at least one catalytic component is a ruthenium-based catalytic component having (a) a first pre-reactive oxidation state, and (8) a first pre-reaction with the substrate. The action is selected from the group consisting of ionic charge interactions, electrostatic charge interactions, and combinations thereof. 4. Selective method according to claim 3, the method of catalyzing columnization, wherein the first catalytic component is selected from the group consisting of acids and bases. a group of chalcogenides and combinations thereof. 5. The selective gasification method of claim 3, wherein at least a portion of the first catalytic component 126433.doc 200843847 is modified or replaced before the catalyst composition is subjected to a stable selective hydrogenation reaction condition Generating a second catalytic component having (a) a second pre-reactive oxidation state, and (b) a corresponding second pre-reaction interaction with the substrate; wherein 'the second pre-reactive oxidation state of the second catalytic component Less than, greater than or equal to the first pre-reactive oxidation state of the first catalytic component. 6. The selective hydrogenation process of claim 5, wherein the second catalytic component is selected from the group consisting of Pd, Pt, Rh, Ir, Ru, 0s, cu, Ag, Au, Ru, Re Λ Ni ' c〇, Fe a group of Mn, Cr, and combinations thereof. 7. The selective hydrogenation process of claim 1, wherein the substrate is a glass composition having a SARCNa of less than or equal to about 〇·5. 8. The selective hydrogenation process of claim 1, wherein at least 5% by weight of the at least one catalytically active region is substantially concentrated in a region having an average thickness of less than or equal to about 2 nanometers. 9. The selective hydrogenation method of claim 1, wherein the substantially microporous matrix is selected from the group consisting of AR glass, rare earth citrate glass, boroaluminosilicate glass, E glass, boron-free E glass, s glass, A group consisting of R glass, rare earth glass, bismuth salt glass, Ba-Ti-silicate glass, nitrided glass, a glass, C glass, and CC glass, and combinations thereof. 10. The selective hydrogenation process of claim 1, wherein the substantially non-microporous matrix obtains an IEp system of less than or equal to about 7.8, but greater than 〇 before or after the first leaching treatment. 126433.doc 200843847 VII. Designation of representatives: (1) The representative representative of the case is: (1). (2) A brief description of the symbol of the representative figure: (No description of the symbol of the component) 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) 126433.doc
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