TW200836831A - Selective hydrogenation processes using functional surface catalyst composition - Google Patents

Selective hydrogenation processes using functional surface catalyst composition Download PDF

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Publication number
TW200836831A
TW200836831A TW096142321A TW96142321A TW200836831A TW 200836831 A TW200836831 A TW 200836831A TW 096142321 A TW096142321 A TW 096142321A TW 96142321 A TW96142321 A TW 96142321A TW 200836831 A TW200836831 A TW 200836831A
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Taiwan
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glass
substrate
sample
treatment
catalyst
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TW096142321A
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Chinese (zh)
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Robert L Bedard
Jeffery C Bricker
Dean E Rende
Ally Seng Yoot Chan
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Uop Llc
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    • C07C5/08Preparation of hydrocarbons from hydrocarbons containing the same number of carbon atoms by hydrogenation of carbon-to-carbon triple bonds
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    • C10G45/00Refining of hydrocarbon oils using hydrogen or hydrogen-generating compounds
    • C10G45/32Selective hydrogenation of the diolefin or acetylene compounds
    • C10G45/34Selective hydrogenation of the diolefin or acetylene compounds characterised by the catalyst used
    • C10G45/40Selective hydrogenation of the diolefin or acetylene compounds characterised by the catalyst used containing platinum group metals or compounds thereof
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Abstract

Selective hydrogenation processes using a catalyst composition which, preferably comprises a glass substrate, with one or more functional surface active constituents integrated on and/or in the substrate surface. A substantially nonmicroporous/nonmesoporous substrate having macropores has (I) a total surface area between about 0.1 m<SP>2</SP>/g and 50 m<SP>2</SP>/g; and (ii) a predetermined isoelectric point (IEP) obtained in a pH range greater than 0, preferably greater than or equal to 4.5, or more preferably greater than or equal to 6.0, but less than or equal to 14. At least one catalytically-active region may be contiguous or discontiguous and has a mean thickness less than or equal to about 30 nm, preferably less than or equal to 20 nm and more preferably less than or equal to 10 nm. Preferably, the substrate is a glass composition having a SARCNa less than or equal to about 0.5.

Description

200836831 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種觸媒組合物及其製備方法,該觸媒組 合物可用於各種化學製造方法及各種排放控制方法。更具 體而言,本發明係關於一種較佳包括玻璃基質之觸媒組合 物’且在基質表面上及/或基質表面中整合一或多種官能 性表面活性成分,該觸媒組合物可用於各種選擇性氫化方 法應用。 【先前技術】 觸媒組合物用於促進一類一般被描述為催化反應或催化 作用的化學反應,而催化作用對於有效操作各種化學製程 至關重要。 大部分工業反應及幾乎所有的生物反應若非催化反應, 即疋涉及為催化反應的反應前或反應後處理。僅就美國而 σ ’在其中某階段包括催化作用之製程所出產之產品價值 就接近一死美元(USD)。使用觸媒組合物生產之產品包括 例如食品、服裝、藥物、曰用化學品、特製或精細化學 品、塑膠、洗滌劑、燃料及潤滑劑等。觸媒組合物還可用 於處理排放物(例如汽車尾氣排放物、煉製廠排放物、公 用&quot;又^工廠排放物等)及其他製程排放流,以降低可能對 人類健康或環境造成負面影響之有害成分的含量。 就市場銷售額而言,用於異相催化反應之固載觸媒在全 球市場之銷售額約為每年30億美元。固載觸媒通常分為三 類’即石油煉製觸媒、化學加工觸媒及排放控制觸媒。該 126432.doc 200836831200836831 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a catalyst composition and a method of preparing the same, which can be used in various chemical manufacturing methods and various emission control methods. More particularly, the present invention relates to a catalyst composition comprising a glass substrate and incorporating one or more functional surface active ingredients on the surface of the substrate and/or in the surface of the substrate. The catalyst composition can be used in various Application of selective hydrogenation methods. [Prior Art] Catalyst compositions are used to promote a class of chemical reactions that are generally described as catalytic or catalytic, and catalysis is critical for efficient operation of various chemical processes. Most industrial reactions and almost all biological reactions, if not catalyzed, involve pre- or post-reaction treatments that are catalytic reactions. For the United States alone, σ's products at a certain stage including catalytic processes are close to a dead dollar (USD). Products produced using catalyst compositions include, for example, foods, clothing, pharmaceuticals, pharmaceuticals, specialty or fine chemicals, plastics, detergents, fuels, and lubricants. Catalyst compositions can also be used to treat emissions (such as vehicle exhaust emissions, refinery emissions, utilities, and plant emissions) and other process emissions streams to reduce potential negative impacts on human health or the environment. The content of harmful ingredients. In terms of market sales, the sales of solid carrier catalysts for heterogeneous catalytic reactions in the global market are approximately $3 billion per year. The solid-carrying catalysts are generally classified into three categories, namely, petroleum refining catalysts, chemical processing catalysts, and emission control catalysts. The 126432.doc 200836831

三類觸媒之市場銷售基本上三分天下。例如,i99〇年,在 美國18億美元之固體觸媒市場中,石油煉製、化學加工及 排放控制觸媒分佔市場之37%、34%及29%。以石油煉製 觸媒市場(1990年約為1〇億美元)為例,娜之收益來自产' _ , „31.50/0 . 6.5〇/〇^4.5〇/〇^^^^,J3,L 自加氫處理觸媒、氫化裂解觸媒及重整觸媒。 • 就:學機理觀點而言,觸媒通常可在自身實質上沒有消 《之情況下,提高使化學反應在反應物與產物之間達到平 衡狀態的速率。所以,對於任何相關之反應而言,觸媒雖 然不此改變反應物與產物之間的平衡狀態,但若經適當設 計及/或挑選,觸媒可加快化學反應之速率。 口此出於各種目的將觸媒用於範圍廣泛之商業實用製 私該等目的包括提高製程之反應性、選擇性及能量效率 及其他用途。例如,按照規定的製程條件生產出所需之產 物時,提高反應物之反應速率或反應性可縮短處理時間, # 用以獲侍更高的產物生產能力(例如,增加每單位小時之 j物體積或質量)。所以,觸媒活性係指觸媒組合物在每 早位時間内有效將反應物轉化成所需產物的能力。同樣 . 地,提高反應選擇性可在一組可能的反應產物中提高所需 . 產物之產出百分率:在該等可能之反應產物中,有些產物 11 b並非所需且需要進一步處理以進行相應之移除或轉 口此,觸媒選擇性為觸媒組合物將一部分反應物在規 疋之製程條件下轉化成特定產物的能力。另外,觸媒組合 ;在某一製程中轉化並降低污染物或非所需反應物 126432.doc 200836831 或產物之含量。另外—項用途則為在維持或改善產物生產 能力及/或反應選擇性的同時提高反應製程之總體能量效 率 〇The market sales of the three types of catalysts are basically three-thirds. For example, in the year of i99, in the US$1.8 billion solid catalyst market, petroleum refining, chemical processing and emissions control catalysts accounted for 37%, 34% and 29% of the market. Take the petroleum refining catalyst market (about 100 million U.S. dollars in 1990) as an example. Na’s income comes from ' _ , „ 31.50/0 . 6.5〇/〇^4.5〇/〇^^^^, J3, L From hydrotreating catalysts, hydrocracking catalysts, and reforming catalysts. • As far as the mechanism is concerned, the catalyst can generally improve the chemical reaction in the reactants and products without substantially eliminating it. The rate at which equilibrium is reached. Therefore, for any relevant reaction, the catalyst does not change the equilibrium state between the reactants and the product, but if properly designed and/or selected, the catalyst accelerates the chemical reaction. The rate of use of the catalyst for a wide range of commercial and practical purposes for a variety of purposes includes improving the reactivity, selectivity and energy efficiency of the process and other uses. For example, producing the plant according to the specified process conditions. When the product is desired, increasing the reaction rate or reactivity of the reactants can shorten the processing time, and # is used to obtain higher product productivity (for example, increase the volume or mass per unit hour). Therefore, the catalytic activity Catalyst group The ability of the material to effectively convert the reactants to the desired product in each morning time. Similarly, increasing the selectivity of the reaction increases the desired amount of the desired reaction product. Percentage of output of the product: at such possible Of the reaction products, some of the products 11b are not required and require further processing for corresponding removal or re-transfer. The catalyst selectivity is a catalyst composition that converts a portion of the reactants to a specific product under standard process conditions. In addition, the combination of catalysts; the conversion and reduction of pollutants or undesired reactants in a process 126432.doc 200836831 or the content of the product. The other use is to maintain or improve product production capacity and / or Selective reaction while increasing the overall energy efficiency of the reaction process〇

觸媒之使用範圍相差很大。例如(但不限於)觸媒能多句用 於降低諸如烴、-氧化碳(co)、氮氧化物㈣X)及硫氧化 物(sox)等污染物含量’該等污染物可存在於―系列製程 ⑴如車輛之由發動機或柴油機内的燃燒廢氣、分類石 油煉製或燃煤製程等)之排放物中。同樣地,觸媒可用於 烴之處理製程’該製程用於對許多不同來源(例如直館之 石油餾分、再循環石油餾分、重油、瀝青、葉岩、天然氣 及包含可受催化反應作用之材料的其他碳物質)之烴製程 流進行轉化或改質。 催化反應通常分成兩種不同的反應類型,亦即均相催化 及異相催化。 均相催化廣泛描述一類催化反應,在其中反應物及觸媒 混合在一溶液相中。儘管某些案例曾使用氣相催化反應, 仁句相催化在典型情況下為一液相系統。因此,濃度梯度 及反應物遷移到觸媒會變成控制均相催化反應之重要因 素。另外,在有些情況下,”溶液相&quot;催化反應能夠越過兩 個液相之界面發生,並非形成一真正溶液,而是形成一乳 化相。一些一般類別的均相催化包括酸鹼催化、有機金屬 催化、相轉移催化等。 另方面’異相催化描述如下的一類催化反應:在反應 製程中’呈氣相或液相之反應物暴露於實質上為固相或半 126432.doc 200836831 α相H所以’在異相催化製程中,觸媒及反應物產 生了 U的固相-液相或固相 '氣相反應。與均相催化 相比,異相催化具有許多優點,例如固體觸媒一般⑷腐钕 性較低1而與許多均勻溶液相觸媒相比,安全及環境風 . 彳目對n (b)提供11較廣的經濟上可行之溫度與壓力 條件ffii且(C)更能控制較為強烈之放熱化學反應及吸熱化 • 學反應,等。 • 另方面’固體可具有質量傳遞限制’進而顯著降低觸 某之最、、有放性。典型情況下,固體觸媒(有時稱為觸媒 顆粒)在-種具有很高内表面積之多孔材料上包括一或多 種催化成分(例如’貴金屬’如他㈣、_〇、⑽U)、 銖㈣等),在催化成分所在之内表面積,通常數量級為每 公克數百平方公尺。所以,習知觸媒組合物或觸媒顆粒包 括一具有报大内表面積之特別多孔載體’催化反應即在該 多孔載體上發生。然而,此類觸媒結構經常會產生質量傳 • ϋ限制it而降低觸媒顆粒關於觸媒活性及 性能,並引發其他觸媒性能問題。 擇後的有效 在此種更具代表性的觸媒結構中,反應物必須擴散通過 孔隙之網狀物才能到達觸媒顆粒之内部區域,而產物必須 - _散,退出觸媒顆粒之内部區域。因此,習知觸媒組 合物之多孔性除其他因素外還取決於平衡,亦即取決於習 知觸媒組合物之兩種特性之間的權衡,即觸媒表面積鱼促 進質量傳遞之能力之間的權衡。例如’許多催化成分在典 型情況下存在於具有微細而複雜之孔隙結構的载體中(經 126432.doc 200836831 恭為微孔隙結構,即&lt;2奈米平均最大直徑),以增加觸媒 顆粒之表面積。此較高表面積通常又將增加觸媒活性。 但,由於較高之觸媒顆粒表面積而導致的觸媒活性增加, # ^引起質量傳遞阻力之問題(亦即阻止反應物及產物 進、出觸媒顆粒之運動),特別是載體包括較高百分率之 微孔結構時,該問題更為明顯。藉由增加較大尺寸孔隙 (例如&gt;50奈米的大孔隙)在載體中之百分率,可降低質量 _ 傳遞之阻力(亦即加快質量傳遞)。然而,該解決方案傾向 於降低觸媒顆粒之物理強度及持久性。換言之,自力學之 觀點而言,觸媒顆粒之穩健性降低。 同時,若反應物在觸媒顆粒之孔隙結構中受到明顯的質 置傳遞阻力,則在穩態反應條件下將存在濃度梯度。因 在孔隙、、Ό構中,反應物之濃度在觸媒顆粒之周圍最 大,在觸媒顆粒之中心則最小。另一方面,反應產物濃度 在觸媒顆粒之中心要高於觸媒顆粒之周圍。該等濃度梯度 • 為質量傳遞提供了推動力。該等濃度梯度變得越大,催化 反應之速率就越低。如此一來,觸媒顆粒之有效性能(例 如反應性、選擇性、再生處理之間的壽命週期及抗結焦性 ' 能等)亦相應降低。 • 通常情況下,開發觸媒組合物之目的在於:自商業之角 度出發,改進如上所述之-或多種加工目標。在某些情況 下,影響觸媒性能的因素之-就是其促進反應物之間快速 有效反應的能力。因此,經常需要具有較低擴散限制之觸 媒組合物。然而,在其他情況下,為了獲得較佳之產物, 126432.doc -10- 200836831 對於產生特定產物之選擇性可能更為重要。由此,得以淘 汰用於移除或轉化非所需反應產物之附加製程及相關處理 設備。 例如,在1976年,Y.T. Shah等人提議使用酸浸鋁硼矽酸 鹽纖維、具體而言為E型玻璃(更具體而言,E-621)來產生 一種觸媒載體。與習知觸媒相比,該觸媒載體具有較高之 表面積-體積比,進而減小用於汽車排氣系統的催化轉化 器之尺寸(例如參見 Oxidation of an Automobile Exhaust Gas Mixture by Fiber Catalysts, Ind. Eng. Chem·,Prod. Res. Dev·,pp. 29-35, Vol· 15, No. 1,1976)。同時,Shah等 人認為,一般在汽車排氣混合物中產生之反應性氣體(例 如一氧化碳、二氧化碳、氮氧化物、曱烷、乙烷、丙烷、 乙烯、丙烯、乙炔、苯及甲苯等)容易接觸到在酸浸E型玻 璃中所產生之較大的表面積。The range of use of the catalyst varies greatly. For example, but not limited to, the catalyst can be used to reduce the amount of contaminants such as hydrocarbons, carbon monoxide (co), nitrogen oxides (tetra) X), and sulfur oxides (sox). These contaminants may exist in the series. The process (1) is such as emissions from a combustion exhaust gas in an engine or a diesel engine, a classified petroleum refining or a coal burning process, and the like. Similarly, catalysts can be used in hydrocarbon processing processes. The process is used for many different sources (eg, direct petroleum fractions, recycled petroleum fractions, heavy oil, bitumen, phyllo, natural gas, and materials containing catalytic reactions). The hydrocarbon process stream of other carbonaceous materials is converted or upgraded. The catalytic reaction is usually divided into two different reaction types, namely homogeneous catalysis and heterogeneous catalysis. Homogeneous catalysis broadly describes a type of catalytic reaction in which the reactants and catalyst are mixed in a solution phase. Although gas phase catalytic reactions have been used in some cases, the phrase phase catalysis is typically a liquid phase system. Therefore, concentration gradients and migration of reactants to the catalyst can become important factors in controlling homogeneous catalytic reactions. In addition, in some cases, the "solution phase" catalytic reaction can occur across the interface between the two liquid phases, rather than forming a true solution, but forming an emulsified phase. Some general classes of homogeneous catalysis include acid-base catalysis, organic Metal catalysis, phase transfer catalysis, etc. In another aspect, heterogeneous catalysis describes a type of catalytic reaction in which a reactant in a gas phase or a liquid phase is exposed to a substantially solid phase or a half 126432.doc 200836831 alpha phase H Therefore, in the heterogeneous catalytic process, the catalyst and the reactants produce a solid phase-liquid phase or solid phase gas phase reaction of U. Compared with homogeneous catalysis, heterogeneous catalysis has many advantages, such as solid catalyst (4) rot.钕 is less than 1 and compared with many homogeneous solution catalysts, safety and environmental wind. 彳目 provides n a wide range of economically feasible temperature and pressure conditions for ffii and (C) is more controllable Strong exothermic chemical reactions and endothermic and chemical reactions, etc. • In other respects, 'solids can have mass transfer restrictions' and thus significantly reduce the most specific and reproducible. Typically, solid catalysts (sometimes referred to as catalyst particles) includes one or more catalytic components (eg, 'precious metals' such as he (four), _〇, (10) U), 铢 (four), etc.) in a porous material having a high internal surface area, in a catalytic component The internal surface area is typically on the order of hundreds of square meters per gram. Therefore, conventional catalyst compositions or catalyst particles comprise a special porous support having a large internal surface area. The catalytic reaction occurs on the porous support. However, such catalyst structures often produce mass transports that limit it and reduce the activity and performance of the catalyst particles with respect to the catalyst and cause other catalyst performance problems. The latter is more effective in this more representative catalyst. In the structure, the reactants must diffuse through the network of pores to reach the inner region of the catalyst particles, and the product must be dispersed to exit the inner region of the catalyst particles. Therefore, the porosity of the conventional catalyst composition is other than The factors also depend on the balance, that is, on the trade-off between the two characteristics of the conventional catalyst composition, namely the trade-off between the ability of the catalyst surface area fish to promote mass transfer. For example, 'many catalytic components are typically present in carriers with fine and complex pore structures (via 126432.doc 200836831 for microporous structures, ie &lt; 2 nm average maximum diameter) to increase catalyst particles Surface area. This higher surface area will generally increase the activity of the catalyst. However, due to the increased catalyst activity due to the higher surface area of the catalyst particles, #^ causes a problem of mass transfer resistance (ie, preventing reactants and products from entering). The problem is more pronounced when the carrier comprises a higher percentage of microporous structure. By increasing the size of the pores (for example, &gt; 50 nm large pores) in the carrier Percentage, which reduces the resistance of the mass _ transfer (ie, speeds up mass transfer). However, this solution tends to reduce the physical strength and durability of the catalyst particles. In other words, from the viewpoint of mechanics, the robustness of the catalyst particles is lowered. At the same time, if the reactants are subjected to significant texture transfer resistance in the pore structure of the catalyst particles, a concentration gradient will exist under steady state reaction conditions. In the pores and structures, the concentration of the reactants is the largest around the catalyst particles and the smallest at the center of the catalyst particles. On the other hand, the concentration of the reaction product is higher in the center of the catalyst particles than in the vicinity of the catalyst particles. These concentration gradients • provide a driving force for mass transfer. The greater the concentration gradient becomes, the lower the rate of the catalytic reaction. As a result, the effective properties of the catalyst particles (e.g., reactivity, selectivity, life cycle between the regeneration treatment, and anti-coking ability, etc.) are also reduced accordingly. • In general, the purpose of developing catalyst compositions is to improve the above-mentioned or multiple processing objectives from a commercial perspective. In some cases, the factor that affects the performance of the catalyst is its ability to promote rapid and efficient reaction between reactants. Therefore, a catalyst composition having a lower diffusion limit is often required. However, in other cases, in order to obtain a better product, 126432.doc -10- 200836831 may be more important for the selectivity of a particular product. Thereby, additional processes and associated processing equipment for removing or converting undesired reaction products can be eliminated. For example, in 1976, Y.T. Shah et al. proposed the use of acid leached aluminum borosilicate fibers, specifically E-glass (more specifically, E-621) to produce a catalyst carrier. The catalyst carrier has a higher surface area to volume ratio than conventional catalysts, thereby reducing the size of the catalytic converter used in automotive exhaust systems (see, for example, Oxidation of an Automobile Exhaust Gas Mixture by Fiber Catalysts, Ind. Eng. Chem., Prod. Res. Dev., pp. 29-35, Vol. 15, No. 1, 1976). At the same time, Shah et al. believe that reactive gases (such as carbon monoxide, carbon dioxide, nitrogen oxides, decane, ethane, propane, ethylene, propylene, acetylene, benzene, toluene, etc.) are generally accessible in automotive exhaust mixtures. To the large surface area produced in acid leached E-glass.

Shah等人表明,與兩種習知觸媒(以氧化鋁珠為載體之 鉑或以矽膠珠為載體之鉑)相比,具有相對較小表面積(75 m2/g)之較少數量纖維E型玻璃觸媒載體的性能效果要優於 以氧化鋁為載體或以二氧化矽為載體之觸媒(分別為1 80 m2/g及317 m2/g),其中E型玻璃觸媒之平均孔徑大於以氧 化鋁為載體之觸媒或以二氧化矽為載體之觸媒。儘管如 此,Shah等人並未提議或建議有效的汽車排氣氧化能夠在 小於75 m2/g之表面積發生。 將近25年後,Kiwi-Minsker等人在1999年研究了在另一 種酸浸鋁硼矽酸鹽E型玻璃纖維(EGF)中減小表面積後,相 126432.doc -11 - 200836831 對於用在苯甲醛之選擇性液相氫化的二氧化矽玻璃纖維 (SGF)有關生成苯甲醇(使用以鉑為主之觸媒)或甲苯(使用 以把為主之觸媒)的效果(例如參見Supported Glass Fibers Catalysts for Novel Multi-phase Reactor Design, Chern. Eng· Sci. pp· 4785-4790, Vol· 54,1999)。在該項研究中, Kiwi-Minsker等人發現,SGF不能自酸浸中獲得增大之表 面積,所以相對於用於承載鈀以作為以鈀為主之觸媒組合 物之催化成分的EGF樣品(表面積分別為15 m2/g及75 m2/g),SGF之表面積保持在2 m2/g之低水平。但,Kiwi-Minsker 等人注 意到, SGF/鈀觸媒 之鈀實 質上具有與其 EGF/把觸媒對應物(即約0· 1 mmol/m2)相同的有效表面積濃 度(毫莫耳金屬/平方公尺莫耳),可是SGF/鈀觸媒組合物表 明,與其EGF/鈀觸媒對應物相比,每公克鈀之活性或反應 速率有所降低。Shah et al. showed that a relatively small number of fibers E with a relatively small surface area (75 m2/g) compared to two conventional catalysts (platinum supported on alumina beads or platinum supported on silica beads) The performance of the glass-catalyst carrier is better than that of alumina-supported or cerium oxide-supported catalyst (1 80 m2/g and 317 m2/g, respectively), and the average pore size of the E-type glass catalyst It is larger than the catalyst supported by alumina or the catalyst supported by cerium oxide. Despite this, Shah et al. did not propose or suggest that effective vehicle exhaust oxidation can occur at surface areas of less than 75 m2/g. Nearly 25 years later, Kiwi-Minsker et al. studied the reduction of surface area in another acid-impregnated aluminum borosilicate type E glass fiber (EGF) in 1999, phase 126432.doc -11 - 200836831 for benzene The selective liquid phase hydrogenation of cerium oxide glass fiber (SGF) for formaldehyde is related to the effect of producing benzyl alcohol (using a platinum-based catalyst) or toluene (using a catalyst for the main one) (see, for example, Supported Glass Fibers). Catalysts for Novel Multi-phase Reactor Design, Chern. Eng. Sci. pp. 4785-4790, Vol· 54, 1999). In this study, Kiwi-Minsker et al. found that SGF does not achieve an increased surface area from acid leaching, so it is relative to an EGF sample used to carry palladium as a catalytic component of a palladium-based catalyst composition ( The surface area is 15 m2/g and 75 m2/g, respectively, and the surface area of SGF is kept at a low level of 2 m2/g. However, Kiwi-Minsker et al. noted that the SGF/palladium catalyst palladium essentially has the same effective surface area concentration as its EGF/catalyst counterpart (ie about 0.1 mmol/m2) (mole metal/square The MGF/Palladium catalyst composition shows a decrease in activity or reaction rate per gram of palladium compared to its EGF/palladium catalyst counterpart.

Kiwi-Minsker等人提出,此種SGF/把觸媒因表面積減小 而活性降低的現象,可能可解釋為活性成分(亦即催化成 分,在本例為鈀)與SGF載體之相互作用增強,而非由於其 表面積(即2 m2/g)較小。然而,他們未能藉由證明以下論 據來驗證此論點:表面積較小(亦即可與2 m2/g之SGF/把相 比)的EGF/鈀觸媒,至少與表面積較大(亦即分別為15 m2/g 及75 m2/g)的EGF/把觸媒樣品具有相同的催化活性。因 此,Kiwi-Minsker等人提出有關SGF/把之活性限制(亦即由 於SGF與EGF相比具有較高的酸性,鈀與SGF之間的相互 作用增強)為何是主要因素,而非由於實質上SGF/鈀之表 126432.doc -12· 200836831 面積較小,原因並不明確。無論如何,Kiwi-Minsker並未 報告說明,相對於75 m2/g EGF/鈀樣品,15 m2/g EGF/鈀 樣品因為擴散速率提高而催化活性增強。否則,這或許將 表明由於較小觸媒表面積而產生之有益效果。 最近,在 US 7,060,651 及 EP 1 247 575 A1 (EP ’575)中, Barelko等人揭示了使用富含二氧化矽之載體(包括二氧化 矽及包含非二氧化矽之氧化物(例如Al2〇3、B203、Na20、 MgO、CaO等)作為觸媒載體的有益效果,其中該富含二氧 化矽之載體在載體之表面下層具有偽分層之多微孔結構 (例如參見£?’575之第11、13、15、17、18、23、31及32 段内容)。正如向歐洲專利局ΓΕΡΟ”)更為完整的說明,在 區分ΕΡ ’575與Kiwi-Minsker等人在上述文件所揭示之催化 載體(nKiwi-Minsker載體&quot;)時,Barelko等人斷言,他們所 主張的富含二氧化矽之載體具有帶狹窄夾層空間的偽分層 多微孔結構,而Kiwi-Minsker載體則沒有此種結構。更具 體而言,Barelko等人認為,在Kiwi-Minkser等人之論文中 沒有依據可假定(a)在Kiwi-Minsker載體中有形成帶狹窄夾 層空間的偽分層多微孔結構;(b)所述帶有狹窄夾層空間的 偽分層多微孔結構有助於增強應用於載體之金屬的活性 (例如參見EP ’575之第13、17-18、23及32段内容)。Kiwi-Minsker et al. suggest that such SGF/reduction of the activity of the catalyst due to reduced surface area may be explained by the enhanced interaction of the active ingredient (ie, the catalytic component, in this case palladium) with the SGF carrier. Not because of its small surface area (ie 2 m2/g). However, they failed to verify this argument by proving the following argument: EGF/palladium catalysts with a small surface area (ie, comparable to 2 m2/g SGF/bar), at least with a larger surface area (ie, respectively The EGF/catalyst samples of 15 m2/g and 75 m2/g) have the same catalytic activity. Therefore, Kiwi-Minsker et al. proposed a limitation on the activity of SGF/ (ie, because SGF has a higher acidity than EGF, and the interaction between palladium and SGF is enhanced), not because of SGF/Palladium Table 126432.doc -12· 200836831 The area is small, the reason is not clear. In any case, Kiwi-Minsker did not report that the 15 m2/g EGF/palladium sample has enhanced catalytic activity due to increased diffusion rates relative to the 75 m2/g EGF/palladium sample. Otherwise, this may indicate a beneficial effect due to the smaller catalyst surface area. Recently, in US 7,060,651 and EP 1 247 575 A1 (EP '575), Barelko et al. disclose the use of a cerium-rich-rich carrier (including cerium oxide and an oxide comprising non-cerium oxide (for example, Al2〇3). , B203, Na20, MgO, CaO, etc.) as a catalyst carrier, wherein the cerium-enriched carrier has a pseudo-layered microporous structure in the lower surface of the carrier (see, for example, the first? Sections 11, 13, 15, 17, 18, 23, 31 and 32), as explained in more detail to the European Patent Office, in the distinction between ΕΡ '575 and Kiwi-Minsker et al. In the case of the catalytic carrier (nKiwi-Minsker carrier), Barelko et al. asserted that their claimed ceria-rich carrier has a pseudo-layered microporous structure with a narrow interlayer space, whereas the Kiwi-Minsker carrier does not. More specifically, Barelko et al. believe that there is no basis in Kiwi-Minkser et al.'s paper that (a) a pseudo-layered microporous structure with a narrow interlayer space is formed in the Kiwi-Minsker carrier; (b) said with a narrow clip The pseudo-layered microporous structure of the layer space helps to enhance the activity of the metal applied to the carrier (see, for example, paragraphs 13, 17-18, 23 and 32 of EP '575).

Barelko等人藉由向歐洲專利局說明下述内容,進一步 將其富含二氧化矽之載體與Kiwi-Minsker等人提出之載體 加以區分:由於”催化成分以高度分散之活性狀態在載體 之表面下層優勢分布(a predominant distribution of the 126432.doc -13- 200836831 catalytic components in the sub-surface layers of the support in a highly dispersed active state),,(在原文劃線), 富含二氧化矽之載體具有更高活性的催化狀態,因此該更 高活性之催化狀態使得催化成分能夠耐受燒結、聚集及自 載體剝落及觸殺劑之影響(例如參見EP,575之第11段)。EP ’575確認,擴散限制可能會阻礙陽離子混入載體之夾層空 間’並因此阻礙陽離子藉由化學吸附進入載體(例如參見 £?’575之第17段)。為了解決該擴散限制問題,]8&amp;1^1]&lt;:0等 人提出(並主張)一種載體結構,在該載體結構中,”薄,,層 之矽-氧碎片經分離形成狹窄夾層空間(即偽分層之多微孔 結構),該狹窄的夾層空間包含,,大量的,,〇H基團,該等〇H 基團之質子可被陽離子交換。Barelko等人揭示,充分&quot;薄” 的矽-氧碎片層為高Q3至Q4比率所特有,並且他們進一步 奪明,f有大$夾在狹窄夾層空間之間的〇H基團之偽分 層多微孔結構,已藉由29Si NMR(核磁共振)及伙(紅外)光 譜置測結合氬BET及鹼滴定表面積量測得到證實。 像該等玻璃觸媒組合物中的—些—樣,許多習知觸媒試 圖解决至7 i述確認之加工問冑,但在觸女某性能之其 他方面貝j表現欠佳。所以,該等習知觸媒經常侷限於較窄 之製程反應範圍内,在要求再生或置換之前的使用週期有 限及/或需要大量裝填昂貴之催化成分(例㈣、把等貴金 屬),因而顯著增加觸媒生產及進行催化製程之成本。 因此,需要-種改進之觸媒組合斗勿,能夠用於各種加工 反應’同時改進諸如製程反應性、選擇性及/或能量效率 126432.doc -14- 200836831 等。該觸媒組合物較佳可對相當廣泛之製程條件及要求進 行改進,同時增強穩健性及持久性,並保持相對較長的壽 命週期。申請人已發現一種官能性表面觸媒組合物,預期 能夠滿足該適用廣泛催化反應的需要。 【發明内容】 本發明之一個態樣提供一種製程流的選擇性氫化方法, • 其利用一種觸媒組合物對製程流之至少一部分進行選擇性 Φ 氫化’該製程流含有至少一種具有至少一個目標可氫化位 點的化合物,其中,觸媒組合物包括: -具有大孔隙、外表面、開口孔隙壁表面、表面區域及 表面下區域之實質上無微孔隙/無中孔隙基質, -至少一種催化成分,及 -至少一個催化活性區域,其包括該至少一種催化成 分,其中 Ο)實質上無微孔隙/無中孔隙基質具有 ⑩ 1) ▲以選自S · Α·ΑΓ2-ΜΓ ’ S · A.D-MT及其組合組成之群之 方法量測時,所測得之介於約〇 · 1 m2/g至5 0 m2/g之 間的總表面積;及 u)在大於0但小於或等於14的pH值範圍内獲得之預定 • 等電點(IEP); b)至少一個催化活性區域可為連續或不連續,且具有 0 小於或等於約30奈米的平均厚度;及 U)催化有效量的至少一種催化成分;及 (c)至少一個催化活性區域之位置實質上 126432.doc -15- 200836831 D 在外表面上, i〇在開口孔隙壁表面上, 在表面區域内, iv)部分在開口孔隙壁表面上,部分在表面區域内及其 組合;或 V) (C)(i)、(ii)、(in)及(iv)之組合。 - 基於以下實施方式及所附之申請專利範圍及附圖,熟習 此項技術者將能清楚掌握本發明之其他態樣。 【實施方式】 定義 本文中所使用的術語具有以下定義之含義。 孔隙”表示深度大於寬度之空穴或通道。 ’’互連孔隙π表示與一或多個其他孔隙相通之孔隙。 ’▼閉口孔隙,,表示與閉口孔隙所在材料的外表面沒有任何 通道之孔隙。 • ’’開口孔隙”表示與開口孔隙所在材料的外表面有直接通 道,或經由另一孔隙或互連孔隙相連之孔隙(亦即不屬於 閉口孔隙之孔隙)。 π孔隙寬度’’表示按照指定方法確定之孔隙的内徑或相對 • 壁之間的距離。 孔隙艘積表示按照指定方法確定之所有孔隙的總體積 效應,但不包括閉口孔隙之體積效應。 π多孔性&quot;表示一材料中孔隙體積與該材料所占總體積之 比率。 126432.doc -16- 200836831 微孔隙’’表示内部寬度小於2奈米(nm)之孔隙。 中孔隙&quot;表示内部寬度在2奈米至50奈米之間的孔隙 ”大孔隙’’表示内部寬度大於50奈米之孔隙。 外表面’’表示一材料之外邊界或表皮(厚度接近零),包 括外邊界或表皮上與缺陷(若有)有關的規則或不規則之輪 孔隙壁表面”指内邊界或表皮(厚度接近零),包括在内 邊界或表皮上的任何與缺陷(若有)有關的規則或不規則之 輪廓,實質上定義在一具有至少一種或多種類型孔隙之材 料中任何開口孔隙的形狀。 ’’表面”總體表示一材料之孔隙壁表面(若存在任何開口 孔隙)、材料之外表面及其表面區域。 表面區域”表示可根據材料而改變的不包括任何由材料 之開口孔隙(若存在任何開口孔隙)所定義之區域的材料區 域’但該表面區域⑷在材料的外表面以下小於或等於咐 未(較佳為㈣奈米,更佳為錢奈米在材料有任何開 口孔隙時,該表面區域(b)在材料的孔隙壁表面以下 :㈣奈米(較佳為㈣奈米,更佳為0 於且 有可谓測之表面高程變化的材料,無論該等變化是否規 :皮^外部邊界或内部邊界或表皮,外部或内部邊^ 表皮的平均高程用於確定表面區域之平均深度。 一 料=面下區域,,表示可根據材料而改變的不包括任何由材 科之開口孔隙(若存在任何開口孔隙)所 ^材 區域,作該表面下之£域的材料 表面下£域⑷在材料的外表面以下大於3〇奈米 126432.doc -17- 200836831 :為&gt;=米,更佳為&gt;1〇奈米);在材料有任何開口孔 二::表面下區域(b)在材料的孔隙壁表面以下 未(較佳為&gt;20奈米,更佳為&gt;1〇奈米)。 ^表面積孔㈣表面積,,表示用指定方法確定 之在材料中所有開口孔隙壁之表面積效應。 隙it表/積”表示用指定方法確定之不包括材料中所有孔 隙土之表面積效應的材料表面積效應。Barelko et al. further clarify the carrier of the cerium oxide-enriched carrier with the carrier proposed by Kiwi-Minsker et al. by explaining to the European Patent Office that the catalytic component is on the surface of the carrier in a highly dispersed active state. a dominant distribution of the 126432.doc -13-200836831 catalytic components in the sub-surface layers of the support in a highly dispersed active state), (in the original line), a carrier rich in cerium oxide A catalytic state with higher activity, and thus the catalytic state of higher activity allows the catalytic component to withstand sintering, aggregation and self-carrier flaking and contact agents (see, for example, paragraph 11 of EP, 575). EP '575 confirmation The diffusion limitation may hinder the cation mixing into the interlayer space of the carrier and thus hinder the cation from entering the carrier by chemisorption (see, for example, paragraph 17 of £?575). To solve this diffusion limitation problem,]8&1^1] &lt;:0 et al. propose (and claim) a carrier structure in which "thin, layer 矽-oxygen fragments Forming a narrow space separating interlayer (i.e., pseudo-layered microporous structure as much), the narrow interlayer space contains a large amount of ,, ,, 〇H group, such 〇H groups of protons can be cation exchange. Barelko et al. revealed that a sufficiently thin &quot;thin&quot; layer of bismuth-oxygen fragments is unique for high Q3 to Q4 ratios, and they further clarify that f has a large pseudo-point of 〇H groups sandwiched between narrow interlayer spaces. The layered microporous structure has been confirmed by 29Si NMR (nuclear magnetic resonance) and spectroscopy (infrared) spectroscopy combined with argon BET and alkali titration surface area measurements, such as those in the glass catalyst composition, Many conventional catalysts attempt to solve the processing problems identified in the 7th, but they are not good in other aspects of the performance of the female. Therefore, these conventional catalysts are often limited to a narrow range of process reactions. The use period is limited before the regeneration or replacement is required and/or a large amount of expensive catalytic components (such as (4), precious metals) are required to be charged, thereby significantly increasing the cost of catalyst production and catalytic process. Therefore, it is necessary to improve Catalysts can be used in a variety of processing reactions while improving such as process responsiveness, selectivity and/or energy efficiency 126432.doc -14-200836831, etc. The catalyst composition is preferably suitable for a wide range of process strips. Improvements in requirements and requirements while enhancing robustness and durability, and maintaining a relatively long life cycle. Applicants have discovered a functional surface catalyst composition that is expected to meet the needs of this wide range of catalytic reactions. An aspect of the invention provides a process for the selective hydrogenation of a process stream, comprising: selectively Φ hydrogenating at least a portion of a process stream using a catalyst composition comprising at least one target hydrogenatable group having at least one target a compound of a point, wherein the catalyst composition comprises: - a substantially microporous/non-porous matrix having a large pore, an outer surface, an open pore wall surface, a surface region, and a subsurface region, - at least one catalytic component, and At least one catalytically active region comprising the at least one catalytic component, wherein the ruthenium is substantially free of microporous/non-porous matrix having 10 1) ▲ selected from the group consisting of S · Α·ΑΓ2-ΜΓ 'S · AD-MT and The total surface area measured between about 〇·1 m2/g to 50 m2/g when measured by a combination of methods; and u) Predetermined • isoelectric point (IEP) obtained at a pH range of 0 but less than or equal to 14; b) at least one catalytically active region may be continuous or discontinuous and have an average thickness of 0 less than or equal to about 30 nm. And U) catalytically effective amount of at least one catalytic component; and (c) at least one catalytically active region positioned substantially 126432.doc -15-200836831 D on the outer surface, i〇 on the open pore wall surface, in the surface region Inside, iv) is partially on the open pore wall surface, partially in the surface region and combinations thereof; or V) (C) (i), (ii), (in) and (iv). Other aspects of the invention will be apparent to those skilled in the art from the <RTIgt; [Embodiment] Definition The terms used herein have the meanings defined below. "Pore" means a cavity or channel having a depth greater than the width. ''Interconnecting pore π denotes a pore that communicates with one or more other pores. '▼ Closed pore, indicating that there is no pore in the outer surface of the material where the closed pore is located • ''Open pores') means direct passages to the outer surface of the material in which the open pores are located, or pores connected through another pore or interconnected pores (ie, pores that are not part of the closed pores). The π pore width '' indicates the inner diameter of the pore or the distance between the opposing walls determined by the specified method. The pore volume product represents the total volume effect of all pores determined by the specified method, but does not include the volume effect of the closed pores. π Porosity &quot; denotes the ratio of the pore volume in a material to the total volume of the material. 126432.doc -16- 200836831 Micropores '' denote pores having an internal width of less than 2 nanometers (nm). Mesoporous &quot; denotes an internal width between 2 nm and 50 nm. The "large pores" indicate pores with an internal width greater than 50 nm. The outer surface '' indicates the outer boundary or skin of a material (thickness is near zero) ), including the outer boundary or the surface of the skin with respect to the defect (if any) or the irregular wheel wall surface" refers to the inner boundary or skin (thickness near zero), including any defects on the inner boundary or the skin (if There are related rules or irregular contours that are substantially defined in the shape of any open pores in a material having at least one or more types of pores. ''Surface' generally indicates the surface of a pore wall of a material (if any open pores exist), the surface of the material and its surface area. The surface area means that it may vary depending on the material and does not include any open pores of the material (if present) The material region of the region defined by any open pores' but the surface region (4) is less than or equal to 咐 (preferably (four) nanometers below the outer surface of the material, more preferably when the carbon nanotube has any open pores in the material, The surface region (b) is below the surface of the pore wall of the material: (4) nanometer (preferably (four) nanometer, more preferably 0, and there is a material that can be said to have a surface elevation change, regardless of whether the change is: External boundary or internal boundary or skin, external or internal edge ^ The average elevation of the skin is used to determine the average depth of the surface area. One material = subsurface area, indicating that it can be changed according to the material does not include any open pores of the material (If there is any open pores), the surface of the material under the surface is less than 3 〇 126432.doc -1 below the surface of the material. 7-200836831: for &gt;=m, more preferably &gt;1〇N); in the material there is any open hole 2:: subsurface area (b) below the pore wall surface of the material (preferably &gt; 20 nm, more preferably &gt; 1 〇 nanometer. ^ Surface area pores (4) Surface area, which represents the surface area effect of all open pore walls in the material determined by the specified method. The gap table / product" means determined by the specified method It does not include the material surface area effect of the surface area effect of all pores in the material.

”總表面積”表示用指定方法確定之材料内表面積及其外 表面積之和。 鈉化學吸附表面積,,或SA*表示藉由使用化學吸附法 由鈉陽離子的化學吸附而確定之材料表面積,該⑷化學 吸附法在G.w· Sears Anal. Chem,1956, vQl 28, p 刪 與 R· Iler,Chemistry of Silica,J〇hn Wiley &amp; s〇ns 1979, p 203及353中說明。 ”鈉化學吸附表面積變化率”或”SARC^”,其中 SARQfVy U/V初,其中⑴v初為用於最初滴定一含水漿 液混合物的稀NaOH滴定溶液之初始體積,在約25它溫度 下在3·4 M NaCl溶液中包括實質上不溶於水之材料,溶液 pH值在零時間t0自最初的pH 4 〇到達pH 9 〇,及(ϋ)%至&quot; 係指用於使漿液混合物在15分鐘時間内保持在pH 9的相同 、/辰度NaOH滴定液的總體積,每隔5分鐘(總共3個5分鐘的 間隔,分別為ts、t1()及tH)該總體積按照需要儘快進行相應 調整。 所以,V總係指在以下更詳細描述之滴定程序中所使用 126432.doc -18- 200836831 之NaOH滴定液的總體積,其中V^+V5q5=v總。因此, 可表不為v總與v初之差,其中V5q5=v總_v相。 就本定義而言,藉由將3〇公克NaCl(試劑級)添加到150 笔升水中製備3.4 M NaCl溶液,將ι·5公克樣品材料添加到 NaCl溶液中以產生含水漿液混合物。含水漿液混合物必須 、/先調正為pH 4.0。為了在滴定之前進行此調整,可相應 地使用少量稀酸(例如HC1)或稀鹼(例如Na〇H)。滴定時,為 了首先獲得V初,先使用稀NaOH滴定液(例如0.1 N或0,01 N), 然後使用Vy 進行SARC心測定。另外,就本定義而言, Vs至15為在t5、言1〇及115使用之NaOH滴定液的累積體積,其 中使用NaOH滴定液每隔5分鐘(共3個5分鐘的間隔)盡快滴 定,以按照需要自t。至最終時間…的15分鐘内將漿液混合 物之pH值調整為9.0。 就本定義而言,在用任何可選擇的離子交換(ΙΕχ)、反 離子交換(BIX)及/或靜電吸附(ΕΑ)處理方法進行處理以將 一或多種2型成分前驅物(以下說明)整合至基質表面上及/ 或基質表面中之前’確定樣品材料之Sarc^。 初濕’’表示,對於包括固體或半固體材料之含水漿液或 糊狀混合物,正在測定該材料之等電點(&quot;IEp”)的一時間 點,此時,去離子水實質上覆蓋了固體或半固體材料之整 個表面,並於目前的程度填充了該材料可能具有的任何可 通水之孔隙體積,進而允許水進入含水漿液或糊狀混合 物,以提供玻璃電極觸面與其參考電極觸面及二者之間充 分的液體接觸,進而測定材料的IEP。 126432.doc -19- 200836831 π等電點π或IEP表示一固體或半固體材料在初濕時之淨 表面電荷為零的pH值。在本文中使用之ΙΕΡ亦可稱為電荷 零點(zero point charge,ZPC)或零電荷點(point 〇f zero charge,PZC)。 ”催化有效量”表示在適當的加工條件下,足以將至少一 種反應物轉化成足夠產量之至少一種預定產物,以支援試 驗工廠或商業級的催化成分之量。 ’’硫屬化物(Chalconide)”表示包括至少一種來自由硫 (S)、砸(Se)及碲(Te)組成之群的第16族(以前的第VIA族)元 素及至少一種正電性強於其對應的第16族元素之元素或基 團的化合物。 貝金屬’’表示來自鍺(仙)、鈀(Pd)、銀(Ag)、銥(lr)、鉑 (Pt)及金(Au)之群的過渡金屬,除非另有說明以金屬錯合 物、金屬鹽、金屬陽離子或金屬陰離子之形式處於荷電狀 態,否則各種過渡金屬均處於零氧化狀態(同時處於未反 應狀態)。 ’,抗腐蝕基質”表示一種能夠抵抗表面下區域的基質組成 結構發生實質改變的基質’肖等改變係由於大部分酸或稀 鹼在標準溫度及壓力條件下造成結構組成元素之改變及/ 或損失、新的孔隙生成、孔隙大小膨脹等n财腐餘 基質之組成結構可能實f上被高強度酸(例如濃HF)、高強 度驗(例如濃NaOH)或其他強腐姓性試劑(無論係單獨或係 與局溫 ' 高壓及/或高振動頻率條件結合)所改變,就本定 義而言,此類基質仍視為&quot;抗腐蝕&quot;基質。 126432.doc 200836831 表面活性”表示一材料之表面充分地裝有—或多種荷電 成刀之狀&amp; ’ $裝有_或多種荷電成分之材料係用以⑴在 穩恶反應條件下促進催化反應而不進一步改質,或者(^) 另外,错由與—或多種荷電成分之間的靜電相互作用及/ 或離子又換相互作用,用於進一步改質,$而隨後可在穩 態反應條件下作為催化成分。 ’’基質”表示任何固體或半固體材料,包括但不限於玻璃"Total surface area" means the sum of the internal surface area of the material and its external surface area determined by the specified method. The sodium chemisorption surface area, or SA*, represents the surface area of the material as determined by chemisorption of sodium cations using a chemisorption method. (4) chemisorption method in Gw·Sears Anal. Chem, 1956, vQl 28, p and R · Iler, Chemistry of Silica, J〇hn Wiley & s〇ns 1979, p 203 and 353. "Sodium chemisorption surface area change rate" or "SARC^", where SARQfVy U/V is initially, where (1)v is initially the initial volume of the dilute NaOH titration solution used to initially titrate an aqueous slurry mixture, at about 25 at its temperature at 3 • The 4 M NaCl solution includes a material that is substantially insoluble in water, and the pH of the solution reaches pH 9 最初 from the initial pH 4 零 at zero time t0, and (ϋ)% to &quot; is used to make the slurry mixture at 15 The total volume of the same / / NaOH titration solution maintained at pH 9 for a period of 5 minutes, every 5 minutes (a total of 3 5 minute intervals, respectively ts, t1 () and tH) the total volume as needed Adjust accordingly. Therefore, the term "V" refers to the total volume of NaOH titration solution used in the titration procedure described in more detail below, where V^+V5q5=v total. Therefore, it can be expressed as the difference between v total and v initial, where V5q5=v total _v phase. For the purposes of this definition, a 3.4 M NaCl solution was prepared by adding 3 gram grams of NaCl (reagent grade) to 150 liters of water, and 1 gram of sample material was added to the NaCl solution to produce an aqueous slurry mixture. The aqueous slurry mixture must be adjusted to pH 4.0 first. In order to carry out this adjustment before titration, a small amount of a dilute acid (e.g., HCl) or a dilute base (e.g., Na〇H) may be used accordingly. For the timing of the titration, in order to obtain the V initial, first use a dilute NaOH titration solution (for example, 0.1 N or 0,01 N), and then use Vy for the SARC heart measurement. Further, for the purposes of this definition, Vs to 15 is the cumulative volume of the NaOH titration solution used at t5, 〇1〇, and 115, wherein the NaOH titration solution is titrated as quickly as possible every 5 minutes (3 3 minute intervals). Take t as needed. The pH of the slurry mixture was adjusted to 9.0 within 15 minutes of the final time. For the purposes of this definition, it is treated with any alternative ion exchange (ΙΕχ), counter ion exchange (BIX) and/or electrostatic adsorption (ΕΑ) treatment to produce one or more Type 2 component precursors (described below) Determine the Sarc^ of the sample material before it is integrated onto the surface of the substrate and/or before the surface of the substrate. "Incipient wetness" means that for an aqueous slurry or a paste mixture comprising a solid or semi-solid material, a point in time at which the isoelectric point (&quot;IEp" of the material is being measured, at which point the deionized water substantially covers The entire surface of a solid or semi-solid material, and to the present extent, fills any water-permeable pore volume that the material may have, thereby allowing water to enter the aqueous slurry or paste mixture to provide contact between the glass electrode contact and its reference electrode The surface and the sufficient liquid contact between the two, and then determine the IEP of the material. 126432.doc -19- 200836831 π isoelectric point π or IEP represents the pH of a solid or semi-solid material with zero net surface charge at initial humidity. The value used herein may also be referred to as a zero point charge (ZPC) or a point 〇f zero charge (PZC). "Catalytic effective amount" means sufficient under appropriate processing conditions The at least one reactant is converted to at least one predetermined product in sufficient yield to support the amount of catalytic component of the pilot plant or commercial grade. ''Chalconide' table Illustrated to include at least one Group 16 (formerly Group VIA) element from a group consisting of sulfur (S), cerium (Se), and cerium (Te) and at least one element having a positive charge that is stronger than its corresponding Group 16 element a compound of the element or group. The shell metal '' indicates a transition metal from the group of lanthanum, palladium (Pd), silver (Ag), lanthanum (lr), platinum (Pt), and gold (Au), unless otherwise specified as a metal complex. The form of the metal salt, metal cation or metal anion is in a state of charge, otherwise the various transition metals are in a zero oxidation state (at the same time in an unreacted state). ', corrosion-resistant matrix' means a matrix that can resist substantial changes in the matrix composition of the subsurface region. The change in the structure is due to changes in the structural elements of most acids or dilute bases under standard temperature and pressure conditions and/or The structure of the loss, new pore formation, pore size expansion, etc. may be high-strength acid (such as concentrated HF), high-intensity test (such as concentrated NaOH) or other strong-resistance reagents (regardless of It is changed either alone or in combination with the local temperature 'high pressure and/or high vibration frequency conditions. For the purposes of this definition, such a matrix is still considered to be &quot;corrosion resistant&quot; matrix. 126432.doc 200836831 Surface activity" means The surface of the material is sufficiently filled with - or a plurality of charged knives &amp; ' $ _ or a plurality of charged components of the material used to (1) promote the catalytic reaction under the conditions of stable reaction without further modification, or (^ In addition, the error is caused by electrostatic interactions with / or a plurality of charged components and/or ions are exchanged for further modification, and then can be used under steady state reaction conditions. Catalytic component. ''Substrate' means any solid or semi-solid material, including but not limited to glass

及玻«材料,IEP大於❹但小於或等於14,表面活性狀態 可按照基質在觸媒組合物(具有催化有效量之催化成分)中 之預定用途進行更改。 ”整合,,表示藉由電子及/或物理化學相互❹⑼μ 子、靜電或共價相互作用,包括但不限於氫鍵合、離子鍵 合、靜電鍵合、凡得瓦力(Van der Waals)/偶極鍵合、親和 力鍵合、共價鍵合及其組合)將化學成分與基質進行結 合0 實施方式概述 本實施方式減下的註解制於㈣與附隨巾請專利範 圍有關之選定態樣及因素,因此僅用於以簡要之措詞方便 表述可能與讀者的潛在利益有關之實施方式的某些態樣。 因此’本實施方式註解不應視為對附隨中請發明範圍之限 制。 本發明之一態樣係關於一種觸媒組合物,其表面活性之 催化活性區域的平均厚度小於或等於約30奈来,較佳為$ 約20奈米’且更佳㈣10奈米(,,觸媒組合物&quot;)。本發明 126432.doc -21 - 200836831 之另一態樣係關於各種製造新型觸媒組合物之方法。本發 明之另一態樣係產生複合形式之觸媒組合物,無論有沒有 成形介質。本發明之又一個態樣係關於在各種製程中使用 觸媒組合物,該等製程例如為烴、雜烴及/或非烴處理、 轉化、精煉及/或排放控制及處理製程及其他類型的製 程。例如,新型觸媒組合物可提高烴、雜烴及/或非烴處 理、轉化、精煉及/或排放控制及處理製程及其他類型製 程的反應選擇性、反應速率、成品良率及能量效率。 在產生觸媒組合物時應考慮到若干項因素,該等因素包 括但不限於: (〇鑒於預期用途,獲得具有預定等電點(”IEP&quot;)之基 質’無論按原樣獲得或經後續處理後獲得; (ii) 雲於預定用途,基質之抗腐蝕性程度; (iii) 鑒於預定用途,為了獲得所需表面性質,基質之多 孔性程度(若有),及相關之元素組成(特別係在表面 上), (iv) 取決於組合物之預定用途,適當時,基質對於產生 適當等電點之化學敏感度,且藉由一或多種具有第 一類與基質之離子及/或靜電相互作用的第一成 分,使基質具有表面活性,該基質能夠但不一定產 生一催化活性區域,該催化活性區域在基質表面上 及/或内的平均厚度為$約30奈米,較佳為$約2〇 奈米’更佳為$約10奈米; (V)基質對於—可選擇之離子交換(ΙΕχ)、反離子交換 126432.doc -22- 200836831 (BIX)及/或靜電吸附(EA)處理方法的化學敏感性, 該等處理方法用於將一或多種第二成分整合至基質 表面上及/或内,該基質表面具有第二類與基質離 子及/或靜電相互作用,並因此產生一催化活性區 域’該催化活性區域在基質表面上及/或内的平均 厚度為$約30奈米,較佳為$約2〇奈米,更佳為$ 約10奈米;及 (vi)取決於組合物之預定用途,處理過之基質對於下述 反應的化學敏感性:可選的煅燒及/或還原、氧化 或進一步使處理過之基質在使用觸媒組合物之前與 第一或第二催化成分起化學反應。 I· 基質說明 對於許多潛在應用之通常及較佳範圍說明的IEp選擇 較佳地,用於產生本發明之觸媒組合物的基質為玻璃組 合物,無論係表面活性按原樣接收或經處理產生表面活性 之狀態,IEP均大於約〇但小於或等於14。能否獲得具有適 當IEP(適於產生用於預定用途之觸媒組合物)的基質取決於 各種因素,其中部分因素已在上文中概要說明(在”實施方 式概述&quot;中)。鑒於下文提供更詳細之論述,熟習此項技術 者將會更清楚掌握與選擇適當IEP有關的其他因素。 例如,對於許多具有商業利益之製程,玻璃(或玻璃樣) 組合物及其表面活性產物較佳具有大於或等於約4·5但小 於14之ΙΕΡ,而預計ΙΕΡ大於或等於約6〇但小於14之玻璃 組合物更佳,且預計ΙΕΡ大於或等於約7·8但小於14之玻璃 126432.doc -23- 200836831 組合物最佳。然而,取決於觸媒組合物之預定用途及在組 合物的基質中多孔性之程度及類型,較佳的IEP範圍可能 受到影響。另外,某些催化製程對於在較低pH範圍具有表 面活性之觸媒組合物更為敏感。因此,在該等情況下, IEP小於7.8(較佳為,更佳為$4·5)的基質很可能更適 用於此類製程。所以,再次申明,在適當的ΙΕΡ範圍内選 擇基質時’不僅要考慮觸媒組合物之預定用途這一因素, 還要結合基質之多孔性、化學組合物及處理程序(若有) 等。 另外,取決於預期催化用途,許多玻璃類型可成為潛在 的基質候選對象,以獲得適當的ΙΕΡ及多孔性的程度及類 型’無論係按原樣接收或使用以下一或多種處理方法。通 常’該等玻璃類型之實例包括但不限於Ε型玻璃、無硼ε型 玻璃、S型玻璃、R型玻璃、AR型玻璃、稀土-矽酸鹽玻 璃、鋇-鈦-石夕酸鹽玻璃、氮化物玻璃如石夕-鋁-氧-氮玻璃、 Α型玻璃、C型玻璃及CC型玻璃。然而,以下將舉例說明 通常預期用於一系列催化應用及某些可能處理之玻璃類 型0 大孔隙玻璃說明 用於生產本發明觸媒組合物之基質較佳採用由實質上無 微孔隙、無中孔隙,但有一些大孔隙(”無微孔隙/無中孔隙,,) 之玻璃組合物構成的玻璃材料,無論原本就具有表面活 性’還是經處理形成表面活性狀態,IEP 一般大於7,8。 通吊,IEP大於7·8之無微孔隙/無中孔隙玻璃組合物將包 126432.doc -24- 200836831 括酸性或鹼性氧化物型玻璃網狀物改質劑,包括(例如)但 不限於鋅(Zn)、鎂(Mg)、鈣(Ca)、鋁(A1)、硼(B)、鈦 (Ti)、鐵(Fe)、鈉(Na)及鉀(&amp;)等元素的氧化物。若使用鹼 性網狀物改質劑’則包括在該等較低IEp玻璃内的量傾向 於為&lt;15 wt.%。含有鎂、鈣、鋁、鋅、鈉及鉀之玻璃係較 . 佳,而含有大於或等於約70 wt·%的二氧化矽之玻璃組合 ' ㈣更佳。但,大孔性相應於小於總表面積約98%,且相 應幾何外表面之範圍約為總表面積2%至50%的實質上無微 孔隙、無中孔隙玻璃組合物亦可用於生產本發明之觸媒组 合物’且該組合物⑽Piif大於78但小於或等於14。 多孔性說明 基質之多孔性係產生本發明觸媒組合物的另一相關態 樣。通常’基質應為實質上無微孔隙,無中孔隙,但實際 f可月b存在數里上無關緊要,對於觸媒組合物之預定用途 /又有不利影響的微孔隙及/或中孔隙體積。由於材料中的 ⑩ ㈣㈣積經常難以備測,本說明使用兩種表面積量測法 ’、疋i質7C否實質上無微孔隙/無巾孔隙,以鑑別本發 明之觸媒組合物。 :項表面積里测係藉由適用於接受量測之预期表面積 , 2圍的熱吸附7脫附方法進行測^,可用於㈣微孔隙、 孔隙及/或大孔隙之程度。例如,對於較大表面積量測 (例如 &gt;約3 V/g) N2贿,按照ASTM D3663_〇3所述的方 法,(&quot;S A &quot;、 ,(可能係較佳的表面積量測技術。然 而對於較小表面積量測(例如 &lt;約3 m2/g) Kr BET,按照 126432.doc -25 - 200836831 ASTM D4780-95所述的方法,可能係較佳 的表面積量測技術。熟習分析固體及半固體材料表面積之 技術者將很清楚用於偵測微孔隙、中孔隙及/或大孔隙程 度的最佳表面積量測方法。第二項量測係鈉-化學吸附表 面積C’S.A.O可使用某類分析方法(r· Iler在chemistry of Silica,John Wiley &amp; Sons (1979)第 203及 353 頁描述)表 示為NaOH滴定液的變化與時間比,並按照s.A.w變化率 (’’SARC〇更具體的定義。 因此,如本文所定義,基質實質上無微孔隙/無中孔 隙’兩誕為基質的灯或!§·Α·^:γ-5£γ處於約0· 1 m2/g至 約50 m2/g之間,而其SARCw小於或等於0.5。如以上更詳 細的討論,SARCN“f、NaOH滴定液的兩種體積之比,其分 母為最初使用的NaOH滴定溶液的體積,即最初用於在零 時間t。滴定一基質漿液混合物,該基質漿液混合物在3.4M NaCl溶液(pH 4至pH 9)中在約25°C中包含1·5公克之基質。 但,如上所述,在最初的NaOH滴定開始用於8八11(:^測定 之前,含水漿液混合物必須首先相應地用少量酸(HCi)或 鹼(NaOH)調整為pH 4。另外,仍如上所述,NaOH滴定液 (用於3個5分鐘的時間間隔、在15分鐘内將基質漿液混合 物保持在pH 9)之累積體積為初(即v#i5),此為比率 SARCw的分子。所以’若V總-V初小於或等於0.5V初,相應 的SARC—則小於或等於0.5。因此,如本文所定義, SARC心‘0.5的基質實質上無微孔隙/無中孔隙(亦即大孔 隙)’前提為基質之S.A.#2·以滅S.A.u£r亦在約〇·ι m2/g至 126432.doc -26- 200836831 約50 m /g之間。右滿足了該等表面積參數,就基質有任何 其他類型的孔隙體積而言,可有不充分的濃度、分布及/ 或類型,因而可對觸媒組合物達成預期用途的期望性能產 生不利影響。 鈉表面積(&quot;S.A.a^&quot;)係一種經驗上的滴定程序,係為粒 狀、粉末狀及懸浮凝膠形式(suspended sol form)的基本上 純二氧化石夕(Si〇2)所開發。8.八.^係測定表面質子位置 (Glass-CTH+)之反應性及可及性的量度,對於純的二氧化 石夕,相當於Si-0 H+位置。石夕酸鹽玻璃及晶體石夕酸鹽與純 的二氧化矽(Si〇2)在組成上有顯著不同,關於此種滴定程 序之化學計量法,矽酸鹽玻璃及晶體矽酸鹽之行為不能根 據在S.A·.實驗中測定之NaOH滴定液的絕對值得知或預 測。因此,Sears及Iler用來將S·Α·實驗的NaOH體積與所 研究之二氧化矽材料之Ν^ΒΕΤ表面積關聯的方程式,並不 適合可靠預測更複雜的矽酸鹽組合物之絕對表面積。此係 預期情況’因為能夠存在於組成不同之玻璃的Giass_〇-H+ 基團可包括如 Α1_ΟΉ+、Β-ΟΉ+、Ti-0_H+、Mg_CTH+及與 單個石夕位置的多個Si-0_H+部分結合之更多不同結構的質 子群(Q2群)。另一方面,”矽樣&quot;玻璃組合物(例如酸浸石 英)的總表面積可能可使用S.A·-實驗可靠地確定,前提為 最小的孔隙大小在標準氣相BET量測可達到的範圍内,因為 其主要由連網的Si〇2及Si-CTH+部分組成。然而, 部分對於氫氧根離子(OH)及鈉離子的擴散可及性, 及多微孔對比中孔隙、大孔隙及/或實質上無孔區域的相 126432.doc •27- 200836831 對百分率,應可根據Na〇 欲 (在·Α.如實驗中為保持最 _9’必須對比時間添加)(滴定劑)進行仙。所 以,總言之,GW〇.H+部分對於OH·及Na+對比時間的可及 性,如^上述SAR‘實驗所確定,可作為存在微孔隙的合 理可罪讀,包括標準氣相贿量測不可及的某類多孔性。 較佳地’基質之表面積在其離子浸出處理後將實質上保 持不變,對於大部分耐驗(,,AR”)玻璃而言,此為常見情And the glass material, IEP is greater than ❹ but less than or equal to 14, and the surface active state can be modified according to the intended use of the substrate in the catalyst composition (having a catalytically effective amount of the catalytic component). "Integration, means (9) mu, electrostatic or covalent interactions by electron and/or physicochemical, including but not limited to hydrogen bonding, ionic bonding, electrostatic bonding, Van der Waals / Dipole bonding, affinity bonding, covalent bonding, and combinations thereof) Combining chemical components with a substrate. 0. Overview of the Embodiments The subtraction of the annotations in this embodiment is based on (4) selected aspects related to the patent scope of the accompanying towel. And the factors are therefore only used in a concise manner to facilitate the presentation of certain aspects of the embodiments that may be related to the potential benefits of the reader. Therefore, the description of this embodiment should not be construed as limiting the scope of the invention. One aspect of the invention is directed to a catalyst composition having a surface active catalytically active region having an average thickness of less than or equal to about 30 nanoliters, preferably about 20 nanometers and more preferably (four) 10 nanometers (,, Catalyst composition &quot;). Another aspect of the invention is 126432.doc-21-200836831 for various methods of making novel catalyst compositions. Another aspect of the invention is to produce a composite form of a catalyst composition ,no There is no forming medium. Yet another aspect of the invention relates to the use of catalyst compositions in various processes, such as hydrocarbon, hydrocarbon and/or non-hydrocarbon treatment, conversion, refining and/or emission control and treatment. Processes and other types of processes. For example, new catalyst compositions can increase the selectivity of reactions, reaction rates, hydrocarbons, hydrocarbons, and/or non-hydrocarbon treatment, conversion, refining, and/or emission control and treatment processes, and other types of processes. Yield and energy efficiency of the finished product. Several factors should be considered in the production of the catalyst composition, including but not limited to: (In view of the intended use, obtain a substrate with a predetermined isoelectric point ("IEP&quot;)" Obtained as it is or after subsequent processing; (ii) the degree of corrosion resistance of the substrate for the intended use of the cloud; (iii) the degree of porosity (if any) of the substrate in order to obtain the desired surface properties for the intended use, and Related elemental composition (particularly on the surface), (iv) depending on the intended use of the composition, and where appropriate, the chemical sensitivity of the substrate to the generation of an appropriate isoelectric point, and The substrate is surface active by one or more first components having a first type of ion and/or electrostatic interaction with the substrate, the substrate being capable of, but not necessarily, producing a catalytically active region on the surface of the substrate and / or within the average thickness of about 30 nanometers, preferably about 2 〇 nanometers 'better than about 10 nanometers; (V) matrix for - optional ion exchange (ΙΕχ), counterion exchange 126432.doc -22- 200836831 (BIX) and/or chemical susceptibility of electrostatic adsorption (EA) treatment methods for integrating one or more second components onto and/or within the surface of a substrate The surface has a second type of interaction with the matrix ions and/or electrostatics and thus produces a catalytically active region having an average thickness on the surface of the substrate and/or within the substrate of about 30 nanometers, preferably about $about 2 〇 nanometers, more preferably about 10 nanometers; and (vi) depending on the intended use of the composition, the chemical sensitivity of the treated substrate to the following reactions: optional calcination and/or reduction, oxidation or Further processing the treated substrate in use The composition of the media prior to chemically react with the first or second catalytic component. I. Substrate Description IEp selection for the general and preferred ranges of many potential applications. Preferably, the matrix used to produce the catalyst composition of the present invention is a glass composition, whether the surface activity is received as received or processed. The state of surface activity, IEP is greater than about 〇 but less than or equal to 14. The availability of a matrix with a suitable IEP (suitable for producing a catalyst composition for the intended use) depends on various factors, some of which have been outlined above (in the "Overview of the Implementation"). In more detail, those skilled in the art will be more aware of other factors associated with the selection of an appropriate IEP. For example, for many processes of commercial interest, glass (or glass-like) compositions and their surface active products preferably have A glass composition greater than or equal to about 4. 5 but less than 14, and a glass composition having a ΙΕΡ greater than or equal to about 6 〇 but less than 14 is preferred, and a glass having a ΙΕΡ greater than or equal to about 7.8 but less than 14 is expected to be 126432.doc -23- 200836831 The composition is optimal. However, depending on the intended use of the catalyst composition and the extent and type of porosity in the matrix of the composition, the preferred range of IEP may be affected. In addition, certain catalytic processes are A surfactant composition having a surface activity at a lower pH range is more sensitive. Therefore, in such cases, a substrate having an IEP of less than 7.8 (preferably, more preferably $4·5) It is likely to be more suitable for such processes. Therefore, it is again stated that when selecting a matrix within the appropriate range, it is not only necessary to consider the intended use of the catalyst composition, but also to combine the porosity of the substrate, the chemical composition and Processing procedures, if any, etc. In addition, depending on the intended catalytic use, many glass types can be potential matrix candidates to achieve the appropriate degree and type of porosity and porosity' whether received or used as received Various treatment methods. Usually, examples of such glass types include, but are not limited to, bismuth-type glass, boron-free ε-type glass, S-type glass, R-type glass, AR-type glass, rare earth-silicate glass, strontium-titanium-stone. Niobate glass, nitride glass such as Shixi-aluminum-oxygen-nitrogen glass, bismuth glass, C-glass and CC-type glass. However, the following examples are generally intended for a range of catalytic applications and some possible treatments. The glass type 0 macroporous glass indicates that the substrate used to produce the catalyst composition of the present invention preferably has substantially no microporosity, no mesoporosity, but some macropores ( No microvoids / pores ,, No Glass) made of the glass composition, whether originally having a surface active 'or a surfactant treated formed state, the IEP is generally greater than 7,8. Bypassing, the microporous/no-porous glass composition having an IEP greater than 7.8 will include 126432.doc -24-200836831 including an acidic or basic oxide type glass mesh modifier, including, for example, but not Limited to oxidation of elements such as zinc (Zn), magnesium (Mg), calcium (Ca), aluminum (A1), boron (B), titanium (Ti), iron (Fe), sodium (Na), and potassium (&amp;) Things. If an alkali network modifier is used, the amount included in the lower IEp glass tends to be &lt;15 wt.%. A glass containing magnesium, calcium, aluminum, zinc, sodium, and potassium is preferred, and a glass combination containing more than or equal to about 70 wt.% of ceria is preferable. However, the macroporosity corresponds to less than about 98% of the total surface area, and the substantially geometrically non-porous, void-free glass composition having a corresponding geometric outer surface ranging from about 2% to about 50% of the total surface area can also be used to produce the present invention. Catalyst composition 'and the composition (10) Piif is greater than 78 but less than or equal to 14. Porosity indicates that the porosity of the matrix produces another relevant aspect of the catalyst composition of the present invention. Generally, the matrix should be substantially non-microporous and free of mesopores, but the actual f can be in the presence of the number of b, irrespective of the microporosity and/or mesoporosity of the intended use of the catalyst composition. . Since the 10 (four) (four) product in the material is often difficult to prepare, the description uses two surface area measurements, 疋i 7C, which is substantially free of microporosity/non-woven pores to identify the catalyst composition of the present invention. The term surface area is measured by the thermal adsorption 7 desorption method applicable to the measurement, and can be used for (4) the degree of microporosity, pores and/or macropores. For example, for larger surface area measurements (eg, >3 V/g) N2 bribes, as described in ASTM D3663_〇3, (&quot;SA &quot;, , (may be a preferred surface area measurement technique) However, for smaller surface area measurements (eg &lt; about 3 m2/g) Kr BET, the method described in 126432.doc -25 - 200836831 ASTM D4780-95 may be a preferred surface area measurement technique. The surface area measurement method for solid and semi-solid materials will be clear for the best surface area measurement method for detecting microporosity, mesoporosity and/or macroporosity. The second measurement system is sodium-chemical adsorption surface area C'S.AO A certain type of analytical method (r·Iler described in chemistry of Silica, John Wiley &amp; Sons (1979) pp. 203 and 353) is expressed as the change in time for the NaOH titrant and in accordance with the rate of change of sAw (''SARC〇) More specifically defined. Thus, as defined herein, the matrix is substantially free of microporosity/no mesoporosity's two-battery-based lamps or §·Α·^: γ-5£γ is at about 0·1 m2/g Up to about 50 m2/g, and its SARCw is less than or equal to 0.5. More details above For a detailed discussion, SARCN "f, the ratio of the two volumes of NaOH titrant, the denominator is the volume of the initially used NaOH titration solution, that is, initially used to titrate a matrix slurry mixture at zero time t, the matrix slurry mixture is A 3.4 M NaCl solution (pH 4 to pH 9) contains 1·5 gram of matrix at about 25 ° C. However, as described above, the initial NaOH titration is used for 8 8 11 (: The slurry mixture must first be adjusted accordingly to a pH of 4 with a small amount of acid (HCi) or base (NaOH). In addition, as described above, the NaOH titrant (for three 5 minute intervals, the matrix slurry in 15 minutes) The cumulative volume of the mixture maintained at pH 9) is initial (i.e., v#i5), which is the numerator of the ratio SARCw. Therefore, if the initial value of V-V is less than or equal to 0.5 V, the corresponding SARC is less than or equal to 0.5. Therefore, as defined herein, the matrix of the SARC core '0.5 is substantially free of microporosity/no mesoporosity (ie, macropores)' premise that the matrix SA#2· is destroyed by SAu£r also in about 〇·ι m2/ g to 126432.doc -26- 200836831 between about 50 m / g. The right surface area parameters are satisfied For any matrix will have a pore volume of other types, it may be insufficient concentration, distribution and / or type, which can achieve a desired performance produce adverse effects on the intended use of the catalyst composition. The sodium surface area (&quot;S.A.a^&quot;) is an empirical titration procedure developed for substantially pure silica dioxide (Si〇2) in the form of granules, powders and suspended sol forms. 8. VIII. The measure of the reactivity and accessibility of the surface proton position (Glass-CTH+) is equivalent to the Si-0 H+ position for pure silica. The composition of the sulphate glass and the crystalline sulphate is significantly different from that of the pure cerium oxide (Si〇2). The stoichiometry of the titration procedure, the behavior of bismuth silicate glass and crystalline citrate It cannot be known or predicted based on the absolute value of the NaOH titration solution measured in the SA·. experiment. Therefore, the equations used by Sears and Iler to correlate the NaOH volume of the S·Α· experiment with the ΒΕΤ^ΒΕΤ surface area of the ceria material studied are not suitable for reliably predicting the absolute surface area of more complex citrate compositions. This is expected [because the Giasss_〇-H+ groups that can exist in different compositions of glass can include, for example, Α1_ΟΉ+, Β-ΟΉ+, Ti-0_H+, Mg_CTH+, and multiple Si-0_H+ portions with a single Shishi position. A combination of more different structures of protons (Q2 group). On the other hand, the total surface area of a "glass-like" glass composition (such as acid-impregnated quartz) may be reliably determined using SA·- experiments, provided that the minimum pore size is within the range achievable by standard gas-phase BET measurements. Because it is mainly composed of networked Si〇2 and Si-CTH+ parts. However, part of the diffusion accessibility of hydroxide ions (OH) and sodium ions, and microporous contrast in the pores, macropores and / Or the phase of the substantially non-porous area 126432.doc •27- 200836831 The percentage should be based on the Na 〇 desire (in the experiment, if the experiment is to keep the most _9' must be added in time) (titrant). Therefore, in summary, the accessibility of GW〇.H+ for OH· and Na+ contrast time, as determined by the above SAR' experiment, can be used as a reasonable guilty read of microporosity, including standard vapor brittle measurements. A certain type of porosity that is not accessible. Preferably, the surface area of the substrate will remain substantially unchanged after its ion leaching process, which is common for most test (, AR) glasses.

况然而,在某些情況下,某些自基質網狀物消耗之離子 不曰』著心響基貝之微孔結構(若有),因而避免對觸媒組 合物達成預定用途的期望性能產生不利影響。但,若基質 網狀物上有顯著的離子消耗及伴生之浸出,在基質中則报 可能士產生多微孔區域。因此,如上所述,⑽‘大於約 〇·5日守表示存在此種多微孔結構。顯示該等特性之基質網 狀物已產生了足夠的微孔結構,特別係在基質區域中,此 種微孔結構將對基f維持表面活性狀態之能力產生不利影 響,因此對觸媒組合物達成預定用途的期望性能產生不利 影響。 基質形狀、形式及尺寸說明 用於產生本發明觸媒組合物之基質具有多種形狀及形 式。合適形狀的實例包括但不限於:纖維、原纖化纖維、 圓柱形顆粒(例如球粒)、球狀顆粒(例如球體)、橢圓形顆 粒(例如橢圓體)、扁平顆粒(例如薄片)、不規則斷裂顆 粒、螺旋形或螺旋狀的顆粒及其組合。 可形成此等基質形狀之合適成形體或複合材料的實例包 126432.doc -28 - 200836831 括但不限於:機織複合材料、非機織複合材料、網眼織 物、壓出物、環形物、鞍狀物、柱體、薄膜、螺旋結合 膜、濾器'纖維絲、切短纖維及其組合。 在某些情況下,視觸媒組合物之預定用途而定,可使用 任何一種合適材料作為成形介質,與催化基質形成成形體 或複合材料(總稱&quot;複合材料&quot;),包括但不限於軟水|呂石 (boehmite)、水合二氧化鈦及Ti〇2、水合氧化錘及Ζγ〇2,γHowever, in some cases, some of the ions consumed from the matrix network do not sway the microporous structure of the base, if any, thereby avoiding the desired performance of the intended use of the catalyst composition. Negative Effects. However, if there is significant ion depletion and associated leaching on the matrix network, it is reported that a microporous region is produced in the matrix. Therefore, as described above, (10) 'greater than about 〇·5 守 守 indicates that such a microporous structure exists. The matrix network exhibiting such properties has produced sufficient microporous structure, particularly in the matrix region, which will adversely affect the ability of the radical f to maintain a surface active state, thus the catalyst composition The desired performance to achieve the intended use has an adverse effect. Matrix Shape, Form and Size Description The matrix used to produce the catalyst composition of the present invention has a variety of shapes and forms. Examples of suitable shapes include, but are not limited to, fibers, fibrillated fibers, cylindrical particles (eg, pellets), spherical particles (eg, spheres), elliptical particles (eg, ellipsoids), flat particles (eg, sheets), no Regular broken particles, spiral or helical particles, and combinations thereof. Examples of suitable shaped bodies or composites that can form such matrix shapes 126432.doc -28 - 200836831 include but are not limited to: woven composites, non-woven composites, mesh fabrics, extrudates, rings, saddles Objects, cylinders, membranes, spiral bonded membranes, filters 'fiber filaments, chopped fibers, and combinations thereof. In some cases, depending on the intended use of the catalyst composition, any suitable material may be used as the forming medium to form a shaped body or composite with the catalytic matrix (collectively &quot;composite &quot;), including but not limited to Soft water|boehmite, hydrated titanium dioxide and Ti〇2, hydrated oxidized hammer and Ζγ〇2,γ

氧化鋁、α氧化鋁、二氧化矽、黏土、天然及合成聚合纖 維、聚合樹脂及溶劑及水溶性聚合物,無論基質是否包括 1型或2型催化成分(以下更詳細說明)。較佳地,催化基質 應位於或實質接近複合材料之外表面(即位於複合材料之 外周邊)。在不受理論約束的情況下,據認為,若將催化 基質之實質部分置於觸媒複合材料之外部周圍區域(&quot;複合 材料周邊’)上及/或内,將減小產生非想要之内部複合材料 擴散效應的程度。 所以,應料,用以將催化基質之實質部分定位在複人 材料周邊内及/或上的合適距離,將取決於觸媒複合材料 之預定用途、觸媒複合材料之整體尺寸及形狀及催化基質 之整體尺寸及形狀。因此,在各種複合材料形狀及尺寸 中,該複合材料周邊的平均厚度(在該複合材料周邊上及/ 或内可置放催化基請常為約丨㈣至約彻微米之間。 然而’該複合材料周邊的平均厚度較佳在約m米至約250 微米之間,更佳在約m米至約15〇微米之間。 然而’視觸媒組合物之預定用途而定,在某些情況下, 126432.doc -29- 200836831 可能需要將基質實質上分布於整個成形介質上。例如但不 限於’在需要擴大反應物及/或反應中間物暴露之製程 中’較佳在整個成形介質上複合基質(無論係1型或2型催 化活性基質)’具有可控之孔隙大小分布雖然較佳但並非 必要。 用於產生成形體或複合材料的基質之最小尺寸(即基質 顆粒之平均最大尺寸)通常在大於約〇 〇5微米至小於或等於 約150微米之間,較佳在約〇·2微米至小於或等於約15〇微 米之間’更佳在約〇·2微米到約5〇微米之間。然而,視組 合物之預定用途及其他可能受到觸媒組合之形狀及形式影 響的製程變數而定,超出該範圍的基質仍然可有效,例如 在上述之連續纖維形式中,不會對觸媒組合物之期望性能 產生不利影響。 熟習此項技術者應理解,複合操作可能將潛在的中孔隙 及/或微孔隙度引入成品複合材料。然而,在複合操作製 転中,如本文所述,此多孔性未引入觸媒組合物之官能化 表面組分。 II·基質表面活化 用於產生本發明觸媒組合物之基質可藉由-或多種第一 成们吏表面活化,該第—成分具有與基質的第—類離子及/ 或靜電相互作用(!型成分前驅物&quot;)。如以下更詳細所述, !型成分前驅物可能本身就有催化效力或係可經進 理來產生催化活性區域,在 处Alumina, alpha alumina, ceria, clay, natural and synthetic polymeric fibers, polymeric resins and solvents, and water soluble polymers, whether or not the matrix comprises a Type 1 or Type 2 catalytic component (described in more detail below). Preferably, the catalytic substrate should be at or substantially adjacent to the outer surface of the composite (i.e., at the outer periphery of the composite). Without being bound by theory, it is believed that if a substantial portion of the catalytic substrate is placed on and/or within the outer surrounding region of the catalyst composite (&quot;composite material'), it will reduce the occurrence of unwanted The extent of the internal composite diffusion effect. Therefore, it should be noted that the proper distance for positioning a substantial portion of the catalytic substrate within and/or over the periphery of the composite material will depend on the intended use of the catalytic composite, the overall size and shape of the catalytic composite, and the catalysis. The overall size and shape of the substrate. Therefore, in various composite shapes and sizes, the average thickness of the periphery of the composite (the catalytic group may be placed on and/or within the periphery of the composite, usually between about 四 (4) and about tens of micrometers. The average thickness of the periphery of the composite is preferably between about m and about 250 microns, more preferably between about m and about 15 microns. However, depending on the intended use of the composition, in some cases Next, 126432.doc -29- 200836831 may require the matrix to be substantially distributed throughout the forming medium. For example, but not limited to, 'in the process of expanding the exposure of reactants and/or reaction intermediates', preferably on the entire forming medium The composite matrix (whether type 1 or type 2 catalytically active matrix) has a controlled pore size distribution which is preferred but not essential. The minimum size of the matrix used to produce the shaped body or composite (ie the average maximum size of the matrix particles) Typically between about 〇〇5 microns and less than or equal to about 150 microns, preferably between about 〇2 microns to less than or equal to about 15 microns, more preferably from about 2 microns to about 5 microns. Between microns. However, depending on the intended use of the composition and other process variables that may be affected by the shape and form of the combination of catalysts, substrates outside this range may still be effective, for example, in the continuous fiber form described above, The desired performance of the catalyst composition is adversely affected. Those skilled in the art will appreciate that the composite operation may introduce potential mesopores and/or microporosity into the finished composite. However, in composite operating systems, such as this article Said porosity is not introduced into the functionalized surface component of the catalyst composition. II. Matrix surface activation The matrix used to produce the catalyst composition of the invention can be activated by - or a plurality of first adult surface, The first component has a first-class ion and/or electrostatic interaction with the matrix (!-type component precursor &quot;). As described in more detail below, the !-component precursor may have catalytic activity or may pass through Rationally to produce catalytically active regions, everywhere

牡丞貝表面上及/或内的平均I 度為$約3 〇奈米,較佳為&lt; 馬=約20奈米的平均厚度,更佳為 126432.doc -30 - 200836831 :約1〇奈米的平均厚度。例如,在某些情況下,取決於觸 合物之預定料,若所獲得之基質在適於預定用途的 乾圍内具有適當類型及程度之孔隙結構(若有)及等電點 _),基質在接收時可能具有充分表面活性,可有效摧 化雖非必要但較佳,基質可經處理來進一步修改及/或 改進其表面活性。另外,基質亦可藉由處理來移除任何預 計可能干擾觸媒組合物性能的有機塗The average I degree on and/or within the surface of the oyster shell is about 3 〇 nanometers, preferably &lt; horse = an average thickness of about 20 nanometers, more preferably 126432.doc -30 - 200836831: about 1 inch The average thickness of the nano. For example, in some cases, depending on the intended composition of the conjugate, if the substrate obtained has a suitable type and degree of pore structure (if any) and an isoelectric point _) in a dry perimeter suitable for the intended use, The matrix may be sufficiently surface active upon receipt, and may be effectively catalyzed, although not necessarily, but preferably, the substrate may be treated to further modify and/or improve its surface activity. In addition, the substrate can also be treated to remove any organic coating that is expected to interfere with the performance of the catalyst composition.

物:此外,如以下更詳細論述,在&quot;2型成分前驅物整合: ,下,取決於觸媒組合物之預定用途,更佳的做法可能 用離子又換(IEX)、反離子交換(ΒΙχ)及/或靜電吸附(ea) 處:方法進一步處理基質之表面,該等處理方法將一或多 種第二成分整合至基質表面上及/或β,該I質表面具有 第二類與基質之離子及/或靜電相互作用,並因此產生催 化活性區域,在基質表面上及/或内的平均厚度為$3〇奈 米’較佳為$ 20奈米,更佳為$ 1〇奈米。 基質污染物移除處理 視典型情況下在基質表面上發現之物質的組成及該物質 疋否預计會干擾觸媒組合物之製備及/或干擾觸媒組合物 達成預定用途的期望性能而定,可選擇進行污染物移除處 理。例如,典型情況下,AR型玻璃使用有機塗層製造(亦 即施膠),該有機塗層用於促進加工處理,例如在含水調 配物中之分散。然而,即使不會干擾觸媒組合物之大部分 (若非全部)預定用途之催化性能,該有機塗層或施膠亦可 能會干擾觸媒組合物之製備。所以應移除有機塗層。 126432.doc •31- 200836831 浪燒係適用於移除此種有機塗層的一種較佳方法。因為 此項處理之主要目標係將污染物自基質移除,因此此類烺 燒處理的條件對於基質成功的表面活化並非特別重要。在 某些情況下,取決於欲自基質移除之污染物的性質,溶 劑、界面活性劑、水溶液清洗或其他適用的方法可用於移 除污染物,達到滿意的效果。 然而,根據所使用之煅燒程度,較佳地在氧化性氣氛 (例如在二氣或氧氣中)中锻燒基質。另外很重要的係,要 選擇夠局的锻燒溫度來移除目標污染物,但煅燒溫度又要 夠低以合理避免材料之軟化點。通常,煅燒溫度應至少比 所選基質材料之軟化點低約5〇°C。較佳地,锻燒溫度應至 少比所選基質材料之軟化點低約1 〇〇它。例如,在使用ar 型玻璃時,大部分AR型玻璃可接受之移除污染物的煅燒 溫度在約300 C至約700°C之間。通常,所選擇之基質材料 應煅燒約2至14小時,較佳煅燒4至8小時。儘管如此,取 決於所獲基質之性質及欲自基質移除之目標污染物的性 質’煅燒時間可在該等時間範圍外變化。 藉由離子浸出處理達成表面活化 在任何潛在之污染物實質上自基質移除以後,基質可藉 由處理來產生表面活性狀態及所要之等電點,前提 為以基質獲得的最初IEP不在所要之範圍内。然而,在某 些情況下,所接收的基質可能具有足夠的表面活性,需要 使用或夕種其他處理(在以下更詳細說明)進一步改質, 而不使用第-類離子浸出(ΙΕχ])處理(此會在以下更詳細 126432, doc -32- 200836831 說明的其他處理中首先論述)。換言之,基質之元素組 成,特別係在外表面或實質上接近外表面上的元素組成, 可月匕足以獲得所要之IEP。然而,在很多情況下,基質之 凡素組成將需要一些改質來改變最初的IEP並獲得適合的 接著备照觸媒組合物之預定用途,獲得在類型及程 • 度上符合要求的表面活性狀態。 • =表面活性狀態,在一或多種第一成分具有⑴第一氧化 ^ 狀態及(丨丨)第一類與基質的離子及/或靜電相互作用的情況 下,可能足以產生催化活性區域,在基質表面上及/或内 的平均厚度為$約30奈米,較佳為^約2〇奈米,更佳為^ 約10奈米,且因此提供觸媒組合物達成預定用途的期望性 能。例如但不限於,基質表面上及/或内的布忍司特 (Bronsted)或路易士(Lewis)酸位及布忍司特或路易士鹼位 能夠有效促進一些烴、雜烴(例如含氧烴)及非烴處理、轉 化及/或精煉製程。 _ 然而,在其他情況下,基於觸媒組合物之預定用途,可 能更佳的方式係用一或多種如下所述的離子交換法來進一 步處理基質表面,以達成⑴可與第一氧化狀態相同或不同 • 的第二氧化狀態,及(ϋ)第二類與基質的離子及/或靜電相 • 互作用,足以產生催化活性區域,在基質表面上及/或内 的平均厚度為S約30奈米,較佳為$約2〇奈米,更佳為‘ 約10奈米。 現轉至表面活化處理,表面活化處理包括至少一種離子 浸出處理,用以獲得第一類或i類離子交換(IEX_0基質。 126432.doc -33 - 200836831 然而,應理解,若所接收的基質具有適合觸媒組合物達成 預定用途之IEP,則正^!亦準備用於說明該第一類基質。 通常,該離子浸出處理係藉由任何適#的方法執行,亦 即以實質異質之方式自整個基質表面有效移除所需之離子 種類,、而不會明顯侵蝕基質網狀物(例如,避免在表面區 域及/或表面下區域產生任何微孔結構)。例如但不限於大 P刀酉夂類物貝,無論係無機酸或有機酸,及各種螯合劑, 均適用於離子浸出處理。較佳地,使用無機酸,例如但不 限於硝酸、磷酸、硫酸、鹽酸、乙酸、氯酸、氫溴酸、氯 磺酸、三氟乙酸及其組合。 通常,用於離子浸出處理之酸溶液的濃度取決於基質之 特性(例如,欲自玻璃網狀物移除之離子的親和力、在移 除網狀物離子後玻璃之強度)、基質之IEP需要改變的程度 及觸媒組合物之預定用途。較佳地,用於離子浸出處理之 酸、/谷液的濃度可在約0 ·5 Wt %至約5〇 wt .Q/G之間,更佳在約 2.5 wt./〇至約25 wt·%之間,最佳在約5 wt·。/。至約1〇 wt % 之間。 整合劑亦可用於離子浸出處理,例如,但不限於乙二胺 四乙酸(&quot;EDTA&quot;)、冠醚、乙二酸鹽、聚胺、聚羧酸及其組 合0 通常’用於離子浸出處理之螯合劑溶液的濃度取決於基 質之特性(例如,欲自玻璃網狀物移除之離子的親和力、 在移除網狀物離子後玻璃之強度)及觸媒組合物之預定用 途。車父佳地’用於離子浸出處理之螯合劑溶液的濃度可在 126432.doc -34- 200836831 約0 · 0 01 wt · %至餘和度之間 之間。 更佳在約0·01 Wt·%至飽和度In addition, as discussed in more detail below, in the &quot;type 2 precursor precursor integration: , depending on the intended use of the catalyst composition, it may be better to use ion exchange (IEX), counter ion exchange ( ΒΙχ) and/or electrostatic adsorption (ea): the method further processes the surface of the substrate, the processing method integrating one or more second components onto the surface of the substrate and/or β, the surface of the I having a second type and matrix The ions and/or electrostatic interactions, and thus the catalytically active regions, have an average thickness on the surface and/or within the substrate of $3 nanometers, preferably $20 nanometers, more preferably $1 nanometers. Substrate contaminant removal treatment depends on the composition of the material typically found on the surface of the substrate and whether the material is expected to interfere with the preparation of the catalyst composition and/or interfere with the desired properties of the catalyst composition for the intended use. , optional for removal of contaminants. For example, typically, AR-type glass is made using an organic coating (i.e., sized) that is used to facilitate processing, such as dispersion in aqueous formulations. However, the organic coating or sizing may interfere with the preparation of the catalyst composition, even if it does not interfere with most, if not all, of the catalytic properties of the intended use of the catalyst composition. Therefore, the organic coating should be removed. 126432.doc •31- 200836831 Wave Burner is a preferred method for removing such organic coatings. Because the primary goal of this treatment is to remove contaminants from the matrix, the conditions of such sinter treatment are not particularly important for successful surface activation of the matrix. In some cases, depending on the nature of the contaminant to be removed from the substrate, solvents, surfactants, aqueous washes, or other suitable methods can be used to remove contaminants for satisfactory results. However, depending on the degree of calcination used, the substrate is preferably calcined in an oxidizing atmosphere (e.g., in dioxane or oxygen). In addition, it is important to select a sufficient calcination temperature to remove the target contaminant, but the calcination temperature is low enough to avoid the softening point of the material. Generally, the calcination temperature should be at least about 5 ° C lower than the softening point of the selected matrix material. Preferably, the calcination temperature is at least about 1 Torr lower than the softening point of the selected matrix material. For example, when using ar-type glass, the majority of the AR-type glass can be cured to remove contaminants at a calcination temperature of between about 300 C and about 700 °C. Typically, the selected matrix material should be calcined for about 2 to 14 hours, preferably for 4 to 8 hours. Nonetheless, the calcination time depending on the nature of the substrate obtained and the target contaminant to be removed from the substrate can vary outside of these time ranges. Surface activation by ion leaching treatment After any potential contaminants are substantially removed from the substrate, the substrate can be treated to produce a surface active state and a desired isoelectric point, provided that the initial IEP obtained from the substrate is not desired. Within the scope. However, in some cases, the substrate being received may have sufficient surface activity to be further modified using other treatments (described in more detail below) without the use of first-class ion leaching (ΙΕχ) treatment. (This will be discussed first in the other processing described in more detail below, 126432, doc-32-200836831). In other words, the composition of the elements of the matrix, particularly on the outer surface or substantially close to the outer surface, can be sufficient to obtain the desired IEP. However, in many cases, the composition of the matrix will require some modification to alter the original IEP and obtain a suitable intended use of the subsequent photocatalyst composition to achieve surface activity that meets the requirements in terms of type and degree. status. • a surface active state in which one or more of the first components have (1) a first oxidation state and (丨丨) a first type of ion and/or electrostatic interaction with the substrate, which may be sufficient to generate a catalytically active region, The average thickness on and/or within the surface of the substrate is about 30 nanometers, preferably about 2 nanometers, more preferably about 10 nanometers, and thus provides the desired properties of the catalyst composition for the intended use. For example, but not limited to, Bronsted or Lewis acid sites and Brunsett or Lewis bases on and/or within the surface of the substrate are effective to promote some hydrocarbons, hydrocarbons (eg, oxygenated hydrocarbons). And non-hydrocarbon treatment, conversion and / or refining processes. _ However, in other cases, based on the intended use of the catalyst composition, it may be preferable to further treat the substrate surface by one or more ion exchange methods as described below to achieve (1) the same as the first oxidation state. Or a different second oxidation state, and (ϋ) the second type interacts with the ion and/or electrostatic phase of the substrate to produce a catalytically active region having an average thickness of about 30 on and/or within the surface of the substrate. The nanometer is preferably about 2 nanometers, more preferably about 10 nanometers. Turning now to surface activation treatment, the surface activation treatment comprises at least one ion leaching treatment to obtain a first type or class I ion exchange (IEX_0 matrix. 126432.doc -33 - 200836831 However, it should be understood that if the substrate received has The IEP suitable for the intended use of the catalyst composition is also intended to be used to describe the first type of substrate. Generally, the ion leaching treatment is performed by any suitable method, that is, in a substantially heterogeneous manner. The entire substrate surface effectively removes the desired ionic species without significantly eroding the matrix network (eg, avoiding the creation of any microporous structures in the surface region and/or subsurface regions), such as, but not limited to, large P-knife Anthraquinones, whether inorganic or organic, and various chelating agents, are suitable for ion leaching. Preferably, inorganic acids such as, but not limited to, nitric acid, phosphoric acid, sulfuric acid, hydrochloric acid, acetic acid, chloric acid, Hydrobromic acid, chlorosulfonic acid, trifluoroacetic acid, and combinations thereof. Generally, the concentration of the acid solution used for ion leaching treatment depends on the characteristics of the substrate (for example, from a glass mesh) The affinity of the removed ions, the strength of the glass after removal of the network ions, the extent to which the IEP of the substrate needs to be altered, and the intended use of the catalyst composition. Preferably, the acid, valley for ion leaching treatment The concentration of the liquid may range from about 0. 5 Wt% to about 5 〇 wt. Q/G, more preferably between about 2.5 wt./〇 to about 25 wt.%, most preferably about 5 wt·. Between about 1 〇 wt %. The integrator can also be used in ion leaching treatments such as, but not limited to, ethylenediaminetetraacetic acid (&quot;EDTA&quot;), crown ethers, oxalates, polyamines, polycarboxylic acids And its combination 0. Usually the concentration of the chelating agent solution used for ion leaching depends on the properties of the substrate (eg, the affinity of the ions to be removed from the glass network, the strength of the glass after removal of the network ions) And the intended use of the catalyst composition. The concentration of the chelating agent solution used for ion leaching treatment by the rider may be between 126432.doc -34 - 200836831 about 0 · 0 01 wt · % to the sum More preferably at about 0·01 Wt·% to saturation

通常,會根據所使用之酸$ 之特性,選搔用於雜工、類型及濃度及基質 、、田声“钣⑼ ^處理的熱處理條件,例如加熱 /皿度、加熱時間及混合條件。 視酸溶液或螯合劑溶液 又/辰度而疋,加熱溫度的變化範 圍很大。W而,較佳地,適用^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 于次出處理的加熱溫 度在約20 C至約200之ρ弓 ^ , WL之間,更佳在約4〇ΐ:至約%。。之 間’最佳在約6〇。〇至約9〇。厂夕ρ卩^ 7 L之間。較佳地,適用於螯合劑 離子浸出處理的加熱溫度在約2(rc至約細t的範圍,更 佳在约40°c至約90°C的範圍。 視酸溶液或螯合劑溶液之濃度及加熱時間而定,適用於 離子/又出處理的加熱時間可改變。較佳地,用於離子浸出 處理的加熱時間在約15分鐘至約48小時之間,更佳在約3〇 分鐘至約12小時之間。 ^ ^ 會根據所使用之酸劑或螯合劑類型及濃度及基質 之特性(例如,欲自玻璃網狀物移除之離子的親和力、在 移除網狀物離子後玻璃之強度等)及熱處理之持續時間, 選擇混合條件。例如但不限於,混合條件可為連續或斷 、”貝亦可為機械混合、流化、翻滾、滾動或手動混合。 總之’酸劑或螯合劑濃度、熱處理條件及混合條件的組 合’會根據在酸劑或螯合劑與目標基質離子之間達成足夠 的離子交換(,,IEX”)程度予以確定,用以產生合適的等電點 及表面電荷之類型及程度,以達成基質的後處理或觸媒組 126432.doc -35- 200836831 合物的預定用途所需之表面活性狀態。 在離子浸出處理完成後,較佳地以任何合適的方法分離 經離子浸出處理之基質,包括但不限於過濾方式、離心方 式、傾析及其組合。然後,用一或多種適當的清洗液(例 如去離子水及/或適用的水溶性有機溶劑,例如甲醇、乙 醇或丙酮)清洗經離子浸出處理之基質,並在約室内溫度 至11G C之温度下乾燥約2〇至24小時。 反離子交換處理 在有些情況下,取決於觸媒組合物之預定用途,可能較 佳的方式係對選定之基質進行反離子交換(”Βιχ”)或兩步 式離子交換處理(在本文中統稱為ΒΙχ處理)。βΙχ處理通常 稱為(仁不限於)反離子&quot;父換,因為將經離子浸出之基質 與包括最初移除之一種離子的鹽溶液(例如NaC1)混合,經 離子/文出處理而自基質移除之此種離子(例如Na+)隨後會 置回或返回基貝。目前尚不清楚自基質中移除之離子是否 一定會返回最初在基質中佔據的相同位置。但,無論最初 被置換之離子是否會因為BIX處理而完全或部分改變位置 或根本不改變位置,都應理解,本文中說明的BIX處理涵 蓋由於任何該等可能的離子位點之置放變化而產生之所有 觸媒組合物。 通常,用於處理經離子浸出處理之基質的鹽溶液類型, 取决於將進行反離子交換之離子類型。較佳地,只進行一 種離子的反離子交換,但在某些情況下,可能需要進行兩 種或更多種離子的反離子交換。 126432.doc -36· 200836831 任何易於藉由上述離子浸出處理方法移除之離子均可進 行反離子交換。該等離子之一些實例包括但不限於第1族 (以前的第IA族)驗金屬離子,例如链、納及舒離子,及來 自第2族(以前的第IIA族)的鹼土金屬離子,例如鈹、鎂、 鈣離子、NH4+及烷基銨陽離子,及小型有機聚陽離子。較 佳地,鹼金屬離子及NEU+係用於BIX處理的較佳目標離 子,而Na+及NH/係較佳的BIX離子,且Na+係更佳的BIX 離子。 通常,用於BIX處理之鹽溶液濃度,取決於經離子浸出 處理而要經BIX處理的基質類型及用於返回經離子浸出處 理基質之BIX離子的相對親和力,同樣,與BIX離子返回 基質網狀物中的位點無關(例如,Na+對於基質對比H+的相 對親和力)。對於大部分類型的玻璃基質,例如但不限於 AR型玻璃、A型玻璃或石英玻璃,約0.001 mol/L至5 mol/L濃度之BIX-鹽溶液係較佳,而約0.05 mol/L至3 mol/L BIX-鹽溶液係更佳。 典型情況下,會根據所使用之BIX-鹽溶液之類型及濃度 及基質之特性,選擇用於BIX處理的熱處理條件,例如加 熱温度、加熱時間及混合條件。 較佳地,用於使用BIX-鹽溶液進行BIX處理的加熱溫 度,可在約20°C至約200°C之間,更佳在約30°C至約95°C 之間。 視BIX-鹽溶液之濃度及所選擇之加熱溫度而定,用於 BIX處理的加熱時間可改變。較佳地,BIX處理的加熱時 126432.doc -37- 200836831 間在約5分鐘至約24小時之間,更佳在約30分鐘至約8小時 之間。 通常’會根據所使用之BIX溶液類型及濃度及基質之特 性(例如,欲自玻璃網狀物移除之離子的親和力、在移除 網狀物離子後玻璃之強度等)及熱處理之持續時間,選擇 混合條件。例如但不限於,混合條件可為連續或斷續,亦 可為機械混合、流化、翻滾、滾動或手動混合。 總之,BIX鹽溶液濃度、熱處理條件及混合條件的組 合,貝貝上係基於返回足夠數量及分配足夠數量之離 子回到基質進行確定,而與離子於基質網狀物中之位 關。返回及分布足夠數量之Βιχ_離子係用以產生所需之表 面電荷類型及程度,以產生達成基質的後處理或觸媒組合 物的預定用途所要之表面活性狀態。 藉由調整pH來調整基質表面電荷 較佳地,需要用基質上的負表面電荷來支援與帶正電荷 之成分(例如陽離子性鹼土金屬、陽離子性過渡金屬成分 等)的靜電相互作用或親和力。然而,對於一些潛在的觸 j組合物應用,可能需要使用正表面電荷來支持與帶負電 何之成 &gt;(例#陰離子性過渡金屬氧離子、石荒酸根陰離 子、貴金屬多i化物陰離子等)的靜電相互作用或親和 力。 通吊,可错由將經離子浸出處理之基質/ΙΕχ混合物之^^ 周整為低於或高於基f等電點(管,,),將基質之表面電 ’ t:為淨正性狀恶或淨負性狀態。請回想,又稱為 126432.doc -38- 200836831 零點電荷(nZPCn)。因此,換言之,IEP(或ZPC)可視為材 料在初濕時之表面具有淨零表面電荷的pH值。所以,將基 質/IEX水混合物之pH值調整為大於基質IEP(或ZPC)的pH 值,可在基質上產生淨的負表面電荷。另外,將基質/IEX 水混合物之pH值調整為小於基質IEP(或ZPC)的pH值,可 在基質上產生淨的正表面電荷。 例如但不限於,若AR型玻璃之IEP等於9·6,若將經離子 浸出處理之AR型玻璃的pH值調整為&gt;9.6的pH值,則將會 在玻璃表面產生淨的負表面電荷。視AR型玻璃之IEP分布 而定,較佳的方式可能為將pH值調整為大於基質之IEP — 或兩個或更多個pH值單位,以保證其表面電荷得到充分支 持。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、玻璃穩定性及所要之電荷密度及其他因 素。通常,任何稀鹼均可用於將基質表面電荷調至其IEP 的右側(亦即產生淨的負表面電荷),而任何稀酸可用於將 基質表面電荷調至其IEP的左侧(亦即產生淨的正表面電 荷)。無機酸及鹼或有機酸及鹼均可以稀濃度使用,而通 常較佳為無機酸。通常,稀酸溶液或稀鹼溶液之濃度將取 決於所使用的酸或鹼類型、其解離常數及適於獲得所要表 面電荷類型及密度的pH值。 在某些情況下,可能需要在使表面電荷產生與某催化成 分或前驅物相同符號的pH值下,整合該催化成分或前驅 物。在該等條件下,靜電吸附(EA)型整合機制係很可能不 126432.doc -39- 200836831 會發生的。然而,在不受理論約束的情況下,在可交換之 表面位置上可能發生直接的離子交換(IEX)或反交換 (BIX) ’導致催化成分或前驅物之表面整合,該催化成分 或前驅物可能在物理上及/或化學上不同於在靜電吸附 (EA)機制下整合的相同組分。例如,某些基質表面部分包 括可由相同符號的離子催化成分或前驅物置換之陽離子 (或陰離子),該等基質表面部分可提供用於與基質表面部 分進行適量但有效的IEX或BIX之交換位置。例如但不限 於,該等部分,如矽烷氧基(-Si-〇· Na+)部分包括可至少部 分由帶正電荷之催化金屬或金屬錯合物前驅物(例如但不 限於Pd(NH3)42+)置換的Na+離子,進而產生具有催化有效 量之催化成分的基質。 藉由調整pH值來控制經BIX處理之基質的表面電荷 如同在IEX處理或第二;[EX處理(”ΙΕχ_2處理&quot;,如下論 述)的情況一樣,對於某些BIX處理,可能需要調整1)11值, 但並非必需。同樣,根據將要在ΙΕχ_2處理中整合至表面 之第一成分及交換之BIX-離子類型,所需ipH調整程度通 常取決於基質的IEP、其IEP對比表面電荷分布曲線及所要 之電荷類型。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、基質在相關pH值範圍内的穩定性及所要之 電荷密度及其他因素。通常,任何稀鹼均可用於將基質表 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 何稀酸可用於將基質表面電荷調至其IEp的左側(亦即產生 126432.doc 40- 200836831 淨的正表面電荷)。無機酸或驗或有機酸或驗均可以稀濃 度使用。通常,稀酸溶液或稀鹼溶液之濃度,將取決於所 使用之酸或鹼類型、其解離常數及適於獲得所要表面電荷 類型及密度的pH值。 ΪΙΙ· 2型成分前驅物整合處理 無論基質表面活性係按原樣接收,或係經離子浸出處理 (亦即經IEX-1處理之基質),或經BIX處理,較佳地,在⑴ 第二離子交換(&quot;IEX_2&quot;)處理,(ii)靜電吸附(EA)處理或(iii) 某些IEX-2與EA處理之組合中使用至少一種第二成分前驅 物(’’2型成分前驅物&quot;)進一步處理基質,以便將一或多種第 二成分前驅物整合在具有第二種與基質的離子及/或靜電 相互作用之基質表面上及/或内。接下來,按照預定用 途’某些2型成分兩驅物在未經進一步處理的情況下可產 生催化活性區域,或經進一步處理而產生包括一或多種2 型成分之催化活性區域。但,無論該催化活性區域係由(a) 2型成分前驅物組成,(b)由產生於2型成分前驅物之2型成 分組成,或(c)由(a)及(b)之某組合組成,催化區域在基質 表面上及/或内的平均厚度均為$約3〇奈米,較佳為^約 2〇奈米,更佳為$約10奈米。 如前所述,在某些情況下,取決於觸媒組合物之預定用 途,按原樣接收或經離子浸出處理之基質可具有催化效 力。然而,對於許多潛在應用,通常更佳的方式為對選定 之基夤進行IEX-2及/或EA處理。例如但不限於,許多適合 使用本發明觸媒組合物之製程的反應速率、選擇性及/或 126432.doc -41 - 200836831 月匕里效率,可藉由置換至少一部分第一成分(&quot;ι型成分”)並 將第二種成分(&quot;2型成分,,)與基質表面整合而顯著提高。 册在不受理論約束的情況下,藉由與基質表面上及/或内 帶相反f荷之料料交齡點進行直接或w接的離子相 互作用’藉由與帶相反電荷之基質表面進行靜電吸附相互 作用,及某些離子相互作用與靜電吸附相互作用之組合或 某些其他類型之有待瞭解的前驅物·電荷·表面間相互作 用,2型成分前驅物離子可得以整合。但,不論相互作用 之性質如何,在按原樣接收之基質、經ΖΕΧ」處理之基質 或經BIX -處理之基質產生第二種前驅物電荷-表面間相互 作用的情況下’ 2型成分前驅物可能因此產生催化活性區 域該催化活性區域在基質表面上及/或内的平均厚度為 S約30奈米,較佳為$約2〇奈米,更佳為$約1〇奈米。 只是為了便於進行以下討論’且無意限制本文所述本發 明之範圍’本文使用ΙΕΧ·2來統稱通常稱為2_型成分前驅 物電荷-表面間相互作用或2型成分前驅物相互作用之廣泛 的相互作用。 μ 通常,用於處理經IEX-丨處理或經ΒΙχ_處理之基質的趟 溶液類型,將取決於要在压\_2處理中進行離子交換之= 子類型。或是一種離子將進行離子交換’或在某些情況下 需要進行兩種或更多種離子之交換,或是同時進行離子交 換,或是按順序進行離子交換。 在兩種不同類型的成分前驅物離子與基質整合之情況 下,本文中該ΙΕΧ-2處理稱為兩次離子交換或兩次压乂_2處 126432.doc -42- 200836831 理。因此,在三種不同類型的成分前驅物離子與基質整合 之情況下’ IEX-2處理稱為三次離子交換或三次正\_2處 理。 2型成分及前驅物說明Usually, depending on the characteristics of the acid used, the heat treatment conditions for the handy, type and concentration, and the matrix, and the sound of “钣(9) ^, such as heating/dish, heating time and mixing conditions are selected. The temperature of the solution or the chelating agent is again/decreased, and the heating temperature varies widely. W, and preferably, the heating temperature of the ^^^^^^^^^ is about 20 C to the secondary treatment. About 200 ρ bow ^, between WL, better at about 4 〇ΐ: to about %. Between the best between about 6 〇. 〇 to about 9 〇. Factory 卩 卩 卩 ^ 7 L between. Preferably, the heating temperature suitable for the chelating agent ion leaching treatment is in the range of about 2 (rc to about fine t, more preferably in the range of about 40 ° C to about 90 ° C. Depending on the concentration of the acid solution or the chelating agent solution The heating time suitable for the ion/removal treatment may vary depending on the heating time. Preferably, the heating time for the ion leaching treatment is between about 15 minutes and about 48 hours, more preferably about 3 minutes to Between about 12 hours. ^ ^ depending on the type and concentration of the acid or chelating agent used and the characteristics of the substrate (for example, from glass) The affinity of the ion removed by the glass mesh, the strength of the glass after removing the mesh ions, etc., and the duration of the heat treatment, and the mixing conditions are selected. For example, but not limited to, the mixing condition may be continuous or broken, It can be mechanical mixing, fluidization, tumbling, rolling or manual mixing. In short, 'the combination of acid or chelating agent concentration, heat treatment conditions and mixing conditions' will be based on the formation of sufficient ions between the acid or chelating agent and the target matrix ions. The degree of exchange (,, IEX) is determined to produce the appropriate isoelectric point and the type and extent of surface charge to achieve the intended use of the substrate for post-treatment or catalyst group 126432.doc-35-200836831 The surface active state is required. After the ion leaching treatment is completed, the ion leaching substrate is preferably separated by any suitable method, including but not limited to filtration, centrifugation, decantation, and combinations thereof. Ion leaching treatment with a variety of suitable cleaning solutions (such as deionized water and / or a suitable water-soluble organic solvent such as methanol, ethanol or acetone) The substrate is dried for about 2 to 24 hours at a temperature of about room temperature to 11 G C. The reverse ion exchange treatment may, in some cases, be based on the intended use of the catalyst composition, possibly in a preferred manner for the selected substrate. Perform reverse ion exchange ("Βιχ") or two-step ion exchange treatment (collectively referred to herein as "ruthenium treatment"). βΙχ treatment is often referred to as (in addition to) counterion &quot;parent replacement, because the ion-leached matrix Mixing with a salt solution (eg, NaCl) that includes one of the ions initially removed, such ions (eg, Na+) removed from the substrate by ion/texture treatment are then returned or returned to the base. It is not clear from Whether the ions removed from the matrix will necessarily return to the same position originally occupied in the matrix. However, regardless of whether the initially displaced ion will completely or partially change position or not change position at all due to BIX treatment, it should be understood that the BIX treatment described herein covers the placement of any such possible ionic sites. All catalyst compositions produced. Generally, the type of salt solution used to treat the substrate subjected to ion leaching treatment depends on the type of ions that will undergo reverse ion exchange. Preferably, only one type of ion counter ion exchange is performed, but in some cases, counter ion exchange of two or more ions may be required. 126432.doc -36· 200836831 Any ion that is easily removed by the above ion leaching process can be subjected to counter ion exchange. Some examples of such plasmas include, but are not limited to, Group 1 (former Group IA) metal ions, such as chain, nano and Shu ions, and alkaline earth metal ions from Group 2 (former Group IIA), such as ruthenium. , magnesium, calcium ions, NH4+ and alkylammonium cations, and small organic polycations. Preferably, alkali metal ions and NEU+ are preferred target ions for BIX treatment, while Na+ and NH/ are preferred BIX ions, and Na+ is preferred for BIX ions. Generally, the concentration of the salt solution used for the BIX treatment depends on the type of the substrate to be treated by the BIX by the ion leaching treatment and the relative affinity of the BIX ion for returning to the ion leaching treatment substrate, and, similarly, the BIX ion return matrix network. Site-independent (eg, Na+ relative affinity for matrix versus H+). For most types of glass substrates, such as, but not limited to, AR-type glass, A-glass or quartz glass, a BIX-salt solution having a concentration of about 0.001 mol/L to 5 mol/L is preferred, and about 0.05 mol/L to about A 3 mol/L BIX-salt solution is preferred. Typically, the heat treatment conditions for the BIX treatment, such as the heating temperature, the heating time, and the mixing conditions, are selected depending on the type and concentration of the BIX-salt solution used and the characteristics of the substrate. Preferably, the heating temperature for the BIX treatment using the BIX-salt solution may be between about 20 ° C and about 200 ° C, more preferably between about 30 ° C and about 95 ° C. Depending on the concentration of the BIX salt solution and the heating temperature selected, the heating time for the BIX treatment can be varied. Preferably, the heating of the BIX treatment is between 126,432.doc -37 and 200836831 between about 5 minutes and about 24 hours, more preferably between about 30 minutes and about 8 hours. Usually 'will depend on the type and concentration of the BIX solution used and the characteristics of the substrate (eg, the affinity of the ions to be removed from the glass mesh, the strength of the glass after removing the mesh ions, etc.) and the duration of the heat treatment , choose the mixing conditions. For example, without limitation, the mixing conditions can be continuous or intermittent, or mechanical mixing, fluidization, tumbling, rolling, or manual mixing. In summary, the combination of BIX salt solution concentration, heat treatment conditions, and mixing conditions is determined by returning a sufficient amount and dispensing a sufficient amount of ions back to the matrix to correlate with the ions in the matrix network. Returning and distributing a sufficient amount of Βιχ_ion is used to produce the desired type and extent of surface charge to produce the surface active state desired for the intended use of the post-treatment or catalyst composition of the substrate. Adjusting the surface charge of the substrate by adjusting the pH Preferably, the negative surface charge on the substrate is required to support electrostatic interaction or affinity with positively charged components (e.g., cationic alkaline earth metals, cationic transition metal components, etc.). However, for some potential touch composition applications, it may be necessary to use a positive surface charge to support the negative charge. (Example # an anionic transition metal oxygen ion, a rock anion anion, a noble metal polyanion anion, etc.) Electrostatic interaction or affinity. By hanging, the substrate/germanium mixture subjected to ion leaching treatment is rounded to a lower or higher than the base f isoelectric point (tube, and), and the surface of the substrate is electrically: a net positive property Evil or net negative state. Think back, also known as 126432.doc -38- 200836831 Zero charge (nZPCn). Therefore, in other words, IEP (or ZPC) can be regarded as the pH of the material having a net zero surface charge on the surface at the time of initial humidity. Therefore, adjusting the pH of the matrix/IEX water mixture to a pH greater than the matrix IEP (or ZPC) produces a net negative surface charge on the substrate. Additionally, adjusting the pH of the matrix/IEX water mixture to less than the pH of the matrix IEP (or ZPC) produces a net positive surface charge on the substrate. For example, but not limited to, if the IEP of the AR-type glass is equal to 9.6, if the pH of the AR-type glass subjected to the ion leaching treatment is adjusted to a pH of &gt; 9.6, a net negative surface charge will be generated on the surface of the glass. . Depending on the IEP distribution of the AR-type glass, it may be preferred to adjust the pH to be greater than the IEP of the substrate - or two or more pH units to ensure that the surface charge is adequately supported. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, glass stability and desired charge density and other factors. In general, any dilute base can be used to adjust the surface charge of the substrate to the right of its IEP (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left of its IEP (ie, produce Net positive surface charge). The inorganic acid and the base or the organic acid and the base can be used in a dilute concentration, and a mineral acid is usually preferred. Generally, the concentration of the dilute acid solution or the dilute alkali solution will depend on the type of acid or base used, its dissociation constant, and the pH at which it is suitable to obtain the type and density of the surface charge desired. In some cases, it may be desirable to integrate the catalytic component or precursor at a pH that causes the surface charge to produce the same sign as a catalytic component or precursor. Under these conditions, the electrostatic adsorption (EA) type integration mechanism is likely to occur without 126432.doc -39- 200836831. However, without being bound by theory, direct ion exchange (IEX) or reverse exchange (BIX) may occur at the exchangeable surface location resulting in surface integration of the catalytic component or precursor, which is a catalytic component or precursor. It may be physically and/or chemically different from the same components that are integrated under the electrostatic adsorption (EA) mechanism. For example, certain substrate surface portions include cations (or anions) that may be replaced by ionic catalytic components or precursors of the same symbol, which may provide an appropriate but effective exchange of IEX or BIX with the surface portion of the substrate. . For example, without limitation, such moieties, such as a decyloxy (-Si-〇·Na+) moiety, include at least a portion of a positively charged catalytic metal or metal complex precursor (such as, but not limited to, Pd(NH3)42 +) Substituted Na+ ions, which in turn produce a matrix having a catalytically effective amount of catalytic component. Controlling the surface charge of the BIX treated substrate by adjusting the pH is as in the case of IEX processing or second; [EX processing ("ΙΕχ_2 processing", as discussed below), for some BIX processing, adjustments may be required 1 11 value, but not required. Similarly, depending on the type of BIX-ion that will be integrated into the surface and the exchange of BIX-ions in the ΙΕχ_2 treatment, the degree of ipH adjustment required will usually depend on the IEP of the matrix and its IEP versus surface charge distribution curve. And the type of charge desired. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, stability of the matrix over the relevant pH range, and desired charge density and other factors. Any dilute base can be used to adjust the surface charge of the substrate to the right of its IEP (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left of its IEp (ie, yielding 126432. Doc 40- 200836831 net positive surface charge). Inorganic acid or organic acid or test can be used in dilute concentrations. Usually, the concentration of dilute acid solution or dilute alkali solution will be taken The type of acid or base used, its dissociation constant, and the pH suitable for obtaining the type and density of the surface charge. ΪΙΙ· Type 2 component precursor integration treatment Whether the substrate surface active system is received as it is, or is ion leached (ie, the substrate treated with IEX-1), or treated with BIX, preferably, (1) second ion exchange (&quot;IEX_2&quot;), (ii) electrostatic adsorption (EA) treatment or (iii) certain The combination of IEX-2 and EA treatment further processes the substrate using at least one second component precursor (''type 2 component precursor&quot;) to integrate one or more second component precursors with the second and matrix Ion and/or electrostatic interaction on and/or within the surface of the substrate. Next, according to the intended use, certain 2 type component two-drivers can produce catalytically active regions without further treatment, or can be further processed. Producing a catalytically active region comprising one or more Type 2 components. However, the catalytically active region is composed of (a) a type 2 component precursor, and (b) is composed of a type 2 component derived from a type 2 component precursor. Or (c) consisting of a combination of (a) and (b), the average thickness of the catalytic region on the surface of the substrate and/or within the substrate is about 3 nanometers, preferably about 2 nanometers, more preferably Preferably, it is about 10 nanometers. As mentioned above, in some cases, depending on the intended use of the catalyst composition, the substrate received as received or ion-leached may have catalytic efficacy. However, for many potential applications It is generally preferred to subject the selected substrate to IEX-2 and/or EA treatment, such as, but not limited to, many reaction rates, selectivities, and/or 126,432.doc suitable for use in the process of using the catalyst composition of the present invention. -41 - 200836831 The efficiency of the month can be significantly improved by replacing at least a portion of the first component (&quot;ι-type component) and integrating the second component (&quot;2 component,) with the surface of the substrate. Without being bound by theory, direct or w-bonded ionic interactions are carried out by the age of the material on the surface of the substrate and/or the inner band of the f-loaded by the surface of the oppositely charged substrate Type 2 component precursor ions can be integrated by electrostatic adsorption interactions, and combinations of certain ionic interactions with electrostatic adsorption interactions or some other type of precursor, charge, and surface interactions to be understood. However, regardless of the nature of the interaction, in the case of a substrate received as received, a substrate treated with a ruthenium or a matrix treated with a BIX-form, a second precursor charge-surface interaction is produced. It is thus possible to produce a catalytically active region having an average thickness on the surface of the substrate and/or within the substrate having a thickness S of about 30 nm, preferably about 2 Å nm, more preferably about 1 Å nm. It is only for the convenience of the following discussion 'and is not intended to limit the scope of the invention as described herein'. This article uses ΙΕΧ·2 to collectively refer to the broad range of charge-surface interactions or type 2 component precursor interactions commonly referred to as 2_type component precursors. Interaction. μ In general, the type of ruthenium solution used to treat IEX-丨 treated or ΒΙχ-treated substrates will depend on the subtype of ion exchange to be performed in the press _2 treatment. Either an ion will undergo ion exchange or, in some cases, exchange of two or more ions, or simultaneous ion exchange, or sequential ion exchange. In the case where two different types of component precursor ions are integrated with the matrix, the ΙΕΧ-2 treatment herein is referred to as two ion exchanges or two pressures at _2 126432.doc -42-200836831. Thus, in the case where three different types of component precursor ions are integrated with the substrate, the 'EXEX-2 treatment is referred to as three-ion ion exchange or three positive-thickness treatments. Type 2 ingredients and precursor description

IEX-2離子之任何鹽溶液,若對於按原樣接收、經ΙΕχβ1 處理或經BIX·處理之基質表面置換離子有化學敏感性,或 是具有電荷親和力來達成與·ΙΕχ]處理或經Βΐχ_處理之 基質表面的靜電相互作用,即可使用。 所以,ΙΕΧ-2離子能夠作為2型成分之前驅物。如上所 述,根據其預定用途,該等離子性mx_2前驅物(即2型成 分前驅物)可能具有催化效力,若是如此,該等離子性 IE X - 2前驅物就能夠像某類觸媒組合物中的2型成分一樣以 其前驅物狀態X作’但所述離子亦可作為在製備另一類型 之觸媒組合物製程中的膨2前驅物工作。然而,通常情 況下,離子性ΙΕΧ·2前驅物(可用於獲得與基質表面整合之 2型成分)包括但不限於布忍司特或路易士酸、布忍司特或 路易士驗、貴金屬陽離子及貴金屬錯合陽離子及陰離子、 過渡金屬陽離子及過渡金屬錯合陽離子及陰離子、過渡全 屬氧陰離子、過渡金屬硫屬化物陰離子、主族氧陰離子、 函離子、稀土離子、稀土錯合陽離子及陰離子及其組合。 同樣,取決於觸媒組合物之預定用途,某些ΐΕχ·2離子 本身在前驅物狀態下有催化效力,與適當的基質整合時可 產生2型成分。可選擇在不進-步處理的情況下具有催化 效力之離子性ΙΕΧ·2前驅物,某些實例包括但不限於布忍 126432.doc -43- 200836831 、=:路“酸、布忍司特或路易士驗、貴金屬陽離子、 k渡至屬%離子、過声令厪 又、,屬乳陰離子、主族氧陰離子、鹵Any salt solution of IEX-2 ion, if it is chemically sensitive to the substrate surface-replacement ion received as it is, treated with ΙΕχβ1 or treated with BIX·, or has charge affinity to achieve or Βΐχ treatment The electrostatic interaction of the surface of the substrate can be used. Therefore, ΙΕΧ-2 ion can be used as a precursor to the type 2 component. As described above, the plasma mx_2 precursor (i.e., the type 2 component precursor) may have catalytic efficiency depending on its intended use, and if so, the plasma IE X-2 precursor can be like a certain type of catalyst composition. The type 2 component is the same as its precursor state X. 'But the ion can also function as a bulk 2 precursor in the preparation of another type of catalyst composition process. However, in general, ionic ΙΕΧ·2 precursors (which can be used to obtain a type 2 component integrated with the surface of the substrate) include, but are not limited to, Blenzel or Lewis acid, Blenz or Lewis, precious metal cations and precious metals. Mismatched cations and anions, transition metal cations and transition metal complex cations and anions, transitional oxyanions, transition metal chalcogenide anions, main oxyanions, functional ions, rare earth ions, rare earth complex cations and anions and combination. Also, depending on the intended use of the catalyst composition, certain ΐΕχ2 ions themselves have catalytic potencies in the precursor state and can form a type 2 component when combined with a suitable matrix. Selective ionic ΙΕΧ 2 precursors with catalytic potency without further processing, some examples include but are not limited to Bu 126432.doc -43- 200836831, =: Road "Acid, Blenz or Louis Test, precious metal cation, k to the genus, ion, sputum, and, is a milk anion, main oxygen anion, halogen

子稀土氫氧根離子、稀土氧化物離子及其組合。 可作為2型成分前驅物之某些貴金層及過渡金屬實例, I括但不限於第7族至第_ (以前的第化族、第職、第 %族、第VIb族、第Vb族及第彻族),例如始、飽、錄、 銅、銀、金、姥、銥、釕、鍊、鐵、姑、鐵、猛、鋅的離 子鹽及錯合離子鹽及其組合。對於ΐΕχ_2處理,鈀、銘、 錢、銀、#、銖、銅、銀、金及錄的離子鹽尤其較佳。 為了方便起見,該等族之元素可藉由使用國際理論及應 用化學聯合會(IUPAC)命名系統之元素族編號^ httP://pearll.lanl g〇v/peri〇dic/defauh上恤中顯示的化學元 素週期表(並顯示以前使用的族編號)中查詢。 可作為2型成分前驅物之某些過渡金屬氧陰離子實例, 包括但不限於第5族及第6族(以前的第Vb族及第VIb族)的 離子鹽,例如 VO,、W(V-、聊12〇4。6_、Μ。#、 M〇7〇246·' Nb6〇196-、Re〇4-及其組合。對於ΐΕχ·2處理, 銖、錮、鎢及飢的離子鹽尤其較佳。 可作為2型成分前驅物之某些過渡金屬硫屬化物陰離子 貝例,包括但不限於第6族(以前的第vib族)的離子鹽,例 如MoS42·、WS42-及其組合。 * 可作為2型成分前驅物之某些主族氧陰離子實例,包括 但不限於第16族(以前的第Via族)的離子鹽,例如sa^、 P〇43·、Se〇42·及其組合。對於ΙΕΧ·2處理,s〇42•的離子鹽 126432.doc -44- 200836831 尤其較佳。 可作為2型成分前驅物之某些鹵離子實例,包括但不限 於第17族(以前的第Vila族)的離子鹽,例如F_、Cl·、Br·、 Γ及其組合。對於IEX-2處理,F_&amp;Cr的離子鹽尤其較佳。 可作為2型成分前驅物之某些稀土離子及稀土錯合陽離 • 子或離子實例,包括但不限於鑭系元素及锕系元素的離子 ^ 鹽,例如 La、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Sub-rare hydroxide ions, rare earth oxide ions, and combinations thereof. Examples of certain precious gold layers and transition metals that can be used as precursors for type 2 components, including but not limited to groups 7 through _ (formerly the first, the first, the first, the sixth, the fourth, and the And the Techu), such as the beginning, full, recorded, copper, silver, gold, bismuth, bismuth, bismuth, chain, iron, abundance, iron, fission, zinc ionic salts and complex ion salts and combinations thereof. For the ΐΕχ_2 treatment, palladium, inscription, money, silver, #, bismuth, copper, silver, gold and recorded ionic salts are especially preferred. For the sake of convenience, the elements of these groups may be obtained by using the element family number of the International Union of Theoretical and Applied Chemistry (IUPAC) nomenclature system ^ httP://pearll.lanl g〇v/peri〇dic/defauh The query is displayed in the chemical element periodic table (and shows the previously used family number). Examples of certain transition metal oxyanions that can be used as precursors for type 2 components, including but not limited to ionic salts of Groups 5 and 6 (formerly Groups Vb and VIb), such as VO, W (V- Chatting 12〇4.6_,Μ.#, M〇7〇246·' Nb6〇196-, Re〇4- and combinations thereof. For the treatment of ΐΕχ·2, especially the ionic salts of strontium, barium, tungsten and hunger Some transition metal chalcogenide anion examples which may be used as precursors of type 2 components include, but are not limited to, ionic salts of Group 6 (formerly Group vib), such as MoS42., WS42-, and combinations thereof. Examples of certain main oxygen anions that may be used as precursors for type 2 components, including but not limited to ionic salts of Group 16 (formerly Via), such as sa^, P〇43, Se〇42, and combinations thereof For the ΙΕΧ·2 treatment, s〇42• ionic salt 126432.doc -44- 200836831 is especially preferred. Some examples of halides that can be used as precursors for type 2 components, including but not limited to group 17 (formerly Ion salts of the Vila family, such as F_, Cl·, Br·, ruthenium, and combinations thereof. For the IEX-2 treatment, an ionic salt of F_&amp;Cr is particularly preferred. Examples of certain rare earth ions and rare earth misaligned cations or ions that can be used as precursors for type 2 components, including but not limited to lanthanides and lanthanides, such as La, Pr, Nd, Pm, Sm , Eu, Gd, Tb, Dy,

Ho、Er、Tm、Yb、Lu、Th、U及其組合。 • 可用於產生作為2型成分之過渡金屬-碳化物、過渡金 屬-氮化物、過渡金屬·棚化物及過渡金屬-填化物的某些過 渡金屬實例,包括但不限於鉻、鉬、鐵、錕、钽、鐵、 鈷、鎳的離子鹽及其組合。 IEX-2處理說明 通常,用於IEX_2處理之鹽溶液濃度,取決於經IEX-1處 理或BIX-處理並要經IEX-2處理之基質類型及用於與經 0 IEX-1處理之基質相互作用及/或整合的IEX-2離子之相對 親和力。對於大部分類型之玻璃基質(例如但不限於AR 型、A型或鈉躬(soda-lime)玻璃),約0·001 wt·%至飽和的 • IEX-2鹽溶液係較佳,而約0.001 wt.%至5 wt·% IEX-2鹽溶 . 液係更佳。然而,視被視為達成觸媒組合物之預定用途所 必需之催化成分的官能性表面濃度而定,IEX-2鹽溶液可 能為小於G · 0 G1 wt. % 〇 若多種離子類型與基質交換,無論為同時進行或按順序 進行,鹽溶液之濃度將按照對於基質上各種成分前驅物所 126432.doc -45- 200836831 需的相對負載及基質適用於一成分前驅物對比另一 前驅物的相對親和力進行調整。例如但不限於, 兩 ΙΕΧ-2處理(亦即兩種不同催化成分前驅物與經或 BIX·處理之基質整合)或三次IEX-2處理(亦卽:接π \ &quot;丨二禋不同的 催化成分前驅物與經ΙΕΧ-1或經BIX-處理之基質整人)中 用於沈澱各種離子的鹽溶液濃度將取決於適用於各類與美 質表面整合之成分前驅物的目標相對濃度及對於各種離子 之表面親和力。Ho, Er, Tm, Yb, Lu, Th, U, and combinations thereof. • Examples of certain transition metals that can be used to produce transition metal-carbides, transition metal-nitrides, transition metal slats, and transition metal-fillers as type 2 components, including but not limited to chromium, molybdenum, iron, niobium Ion salts of barium, iron, cobalt, nickel and combinations thereof. IEX-2 Treatment Description Generally, the concentration of the salt solution used for IEX_2 treatment depends on the type of substrate treated by IEX-1 or BIX-treated and treated with IEX-2 and used to interact with the substrate treated with 0 IEX-1. The relative affinity of the action and/or integrated IEX-2 ions. For most types of glass substrates (such as, but not limited to, AR type, A type, or soda-lime glass), about 0.001 wt.% to saturated • IEX-2 salt solution is preferred, and about 0.001 wt.% to 5 wt.% IEX-2 salt solution. The liquid system is better. However, depending on the functional surface concentration of the catalytic component necessary to achieve the intended use of the catalyst composition, the IEX-2 salt solution may be less than G · 0 G1 wt. % 〇 if multiple ion types are exchanged with the substrate Whether carried out simultaneously or sequentially, the concentration of the salt solution will be relative to the relative load required for the precursors of the various components on the substrate 126432.doc -45-200836831 and the matrix is suitable for the relative of one component precursor versus the other precursor. Affinity adjustments. For example, but not limited to, two ΙΕΧ-2 treatments (ie, two different catalytic component precursors integrated with a BIX-treated substrate) or three IEX-2 treatments (also: π & & & 禋 禋 禋The concentration of the salt solution used to precipitate the various ions in the catalytic component precursor and the ruthenium-1 or BIX-treated substrate will depend on the target relative concentration of the component precursors that are suitable for various types of surface integration with the aesthetic surface and Surface affinity for various ions.

典型情況下’會根據所使用之IEX_2鹽溶液類型及濃度 及基質之特性’選擇適用於ΙΕΧ·2處理的熱處理條件,^ 如加熱溫度、加熱時間及混合條件。 較佳地,適合於使用酸進行IEX_2處理的加熱溫度可在 約20 C至約200 C之間,更佳在約3〇。〇至約90°C之間。 取決於IEX-2鹽溶液之濃度及選定之加熱溫度,用於 IEX-2處理的加熱時間可改變。較佳地,適用κΐΕχ·2處理 的加熱時間在約5分鐘至約48小時之間,更佳在約3〇分鐘 至約5小時之間。 通常,會根據所使用之ΙΕΧ—2鹽溶液類型及濃度及基質 之特性(例如,欲自玻璃網狀物移除之離子的親和力、在 移除網狀物離子後玻璃之強度等)及熱處理之持續時間, 迖擇此δ條件。例如但不限於,混合條件可為連續或斷 、、亦了為機械混合、流化、翻滾、滾動或手動混合。 〜^之,ΙΕΧ-2鹽溶液濃度、熱處理狀態及混合條件的 、 耳貝上係基於在基質上及/或内整合足夠數量之 126432.doc -46- 200836831 IEX-2離子及ΙΕΧ·2離子之分布μ確定,而與基質表面之 物理化學結合的性質無關’用以產生所需之表面電荷類型 及耘度,以產生達成觸媒組合物之預定用途所需的表面活 性狀態。 / 藉由調整pH來調整基質表面電荷 如上所述,考慮到在第二ΙΕχ (,,ΙΕχ_2,,)處理中將與表面 整合之2型成分丽驅物,所需的?}1調整程度通常將取決於 基質之IEP、基質之ιΕρ對比表面電荷分布曲線及所要之電 荷類型。例如但不限於,對於IEp等於8的基質,較佳地, 基質/IEX-2混合物之pH值調整為約8至約12之間,更佳為 約9至約11之間。 用於進行所述pH值調整之溶液類型,將取決於與其他反 應物之相容性、基質在相關pH值範圍内的穩定性及所要之 電何密度及其他因素。通常,任何稀鹼均可用於將基質表 面電荷調至其IEP的右側(亦即產生淨的負表面電荷),而任 何稀酸可用於將基質表面電荷調至其IEp的左側(亦即產生 淨的正表面電荷)。無機酸或鹼或有機酸或鹼均可以稀濃 度使用’而通常較佳為有機鹼。通常,稀酸溶液或稀鹼溶 液之濃度,將取決於所使用之酸或鹼類型、其解離常數及 適於獲得所要表面電荷類型及密度的pH值。 在IEX-2處理完成後,較佳地,經ΙΕχ_2處理之基質可使 用任何合適的方法分離,包括但不限於過濾方式、離心方 式、傾析及其組合。然後,經ΙΕΧ-2處理之基質用一或多 種合適的清洗液(例如蒸餾水或去離子水、稀鹼或稀酸及/ 126432.doc •47- 200836831 或合適的水溶性有機溶劑,例如甲醇、乙醇或丙酮)清 洗,並在約iio°c之溫度下乾燥約20至24小時。 IV·沈澱後處理說明 視需要,在經IEX-2處理之基質得以分離後,可僅乾 燥、煅燒,在氧化條件下煅燒,隨後還原或進一步氧化, 在不煅燒的情況下還原或在不煅燒的情況下氧化。可按照 需要,用合適的還原、硫化、碳化、氮化、磷化或硼化試 劑(-IDING试劑)’在氣相或液相中執行表面沈澱之過渡金 屬離子、氧陰離子及/或硫陰離子的反應,以產生相應的 催化有效之金屬硫化物/硫氧化物、金屬碳化物/碳氧化 物、金屬氮化物/氮氧化物、金屬硼化物或金屬磷化物成 分。 通常但不限於,沈澱後煅燒處理的目的實質上為分解金 屬平衡離子或配體,且將金屬、金屬氧化物、金屬硫屬化 物等更緊密地與基質表面整合,並移除任何未在先前的乾 燥處理中移除的殘餘水。 用於經IEX-2處理之基質的煅燒處理條件,對於基質之 成功表面活化並非特別重要,然而,該等條件只應足夠嚴 格,能夠以催化有效量產生至少一個具有沈澱之成分前驅 物的催化活性區域。但就使用煅燒而言,基質首先在氧化 性氣氛(例如在空氣或氧氣)中锻燒。另外,重要的係,選 擇夠高的锻燒溫度以確保所關注之2型成分前驅物被氧化 而且任何殘餘水得到移除(若仍有任何殘餘水存在),但锻 燒溫度亦應夠低,能夠合理避免基質之軟化點及非所要之 126432.doc -48- 200836831 沈殿成分前驅物分解。Typically, the heat treatment conditions suitable for the ΙΕΧ·2 treatment, such as the heating temperature, the heating time, and the mixing conditions, are selected depending on the type and concentration of the IEX_2 salt solution used and the characteristics of the substrate. Preferably, the heating temperature suitable for the IEX 2 treatment using an acid may be between about 20 C and about 200 C, more preferably about 3 Torr. 〇 to about 90 ° C. The heating time for the IEX-2 treatment can vary depending on the concentration of the IEX-2 salt solution and the selected heating temperature. Preferably, the heating time for the κΐΕχ·2 treatment is between about 5 minutes and about 48 hours, more preferably between about 3 minutes and about 5 hours. Usually, depending on the type and concentration of the ΙΕΧ2 salt solution used and the characteristics of the substrate (for example, the affinity of the ions to be removed from the glass mesh, the strength of the glass after removal of the network ions, etc.) and heat treatment For the duration, choose this δ condition. For example, without limitation, the mixing conditions can be continuous or broken, mechanical mixing, fluidization, tumbling, rolling, or manual mixing. ~^, ΙΕΧ-2 salt solution concentration, heat treatment state and mixing conditions, the ear is based on the integration of a sufficient amount on the substrate and / or within the 126432.doc -46-200836831 IEX-2 ion and ΙΕΧ · 2 ion The distribution μ is determined irrespective of the nature of the physicochemical bonding of the substrate surface to produce the desired surface charge type and twist to produce the surface active state required to achieve the intended use of the catalyst composition. / Adjusting the surface charge of the substrate by adjusting the pH As mentioned above, what is required for the type 2 component drive that will be integrated with the surface in the second , (, ΙΕχ_2,,) treatment? The degree of adjustment of the }1 will usually depend on the IEP of the matrix, the ιΕρ versus surface charge distribution curve and the type of charge required. For example, without limitation, for a substrate having an IEp equal to 8, preferably, the pH of the matrix/IEX-2 mixture is adjusted to be between about 8 and about 12, more preferably between about 9 and about 11. The type of solution used to effect the pH adjustment will depend on compatibility with other reactants, stability of the matrix over the relevant pH range, and desired density and other factors. Generally, any dilute base can be used to adjust the surface charge of the substrate to the right of its IEP (ie, to produce a net negative surface charge), and any dilute acid can be used to adjust the surface charge of the substrate to the left of its IEp (ie, to produce a net Positive surface charge). The inorganic acid or base or the organic acid or base can be used in a dilute manner, and an organic base is usually preferred. Generally, the concentration of the dilute acid solution or the dilute alkali solution will depend on the type of acid or base used, its dissociation constant, and the pH at which it is suitable to obtain the desired surface charge type and density. Preferably, after the IEX-2 treatment is completed, the substrate treated by ΙΕχ_2 can be separated by any suitable method including, but not limited to, filtration, centrifugation, decantation, and combinations thereof. The ΙΕΧ-2 treated substrate is then treated with one or more suitable cleaning solutions (eg distilled or deionized water, dilute or dilute acid and / 126432.doc • 47-200836831 or a suitable water-soluble organic solvent such as methanol, Wash with ethanol or acetone and dry at about iio °c for about 20 to 24 hours. IV. Post-precipitation treatment description If necessary, after the IEX-2 treated substrate is separated, it can be dried only, calcined, calcined under oxidizing conditions, then reduced or further oxidized, reduced without calcination or not calcined. In the case of oxidation. Surface precipitation of transition metal ions, oxyanions and/or sulfur in the gas or liquid phase can be carried out as appropriate using suitable reduction, sulfurization, carbonization, nitridation, phosphating or boring reagents (-IDING reagents) The anion is reacted to produce the corresponding catalytically effective metal sulfide/sulfur oxide, metal carbide/carbon oxide, metal nitride/nitrogen oxide, metal boride or metal phosphide component. Typically, but not limited to, the purpose of the post-precipitation calcination treatment is essentially to decompose the metal counterion or ligand and to more closely integrate the metal, metal oxide, metal chalcogenide, etc. with the surface of the substrate and remove any previously unreceived Residual water removed during the drying process. The calcination conditions for the IEX-2 treated substrate are not particularly important for successful surface activation of the substrate, however, these conditions should only be sufficiently stringent to produce at least one precursor with precipitated components in a catalytically effective amount. Active area. However, in the case of calcination, the substrate is first calcined in an oxidizing atmosphere (e.g., in air or oxygen). In addition, the important system is to choose a high calcination temperature to ensure that the precursor of the type 2 component of interest is oxidized and any residual water is removed (if any residual water remains), but the calcination temperature should be low enough. It can reasonably avoid the softening point of the matrix and the undesired decomposition of the precursor component of the 126432.doc -48-200836831.

例如但不限於’沈澱之硫酸鹽需要锻燒條件來分解所結 合之陽離子並將硫酸„定於表面上,但該等條件不得領 著將硫酸好解成揮發性的硫氧化物1樣地,金屬氧陰 離子要求锻燒條件來分解所結合之陽離子並將陰離子以氧 化物形式固定於表面上,但條件不得嚴格到使金屬氧化物 自表面揮發或造成金屬氧化物溶人基質。最後,貴金屬及 錯合物應在以下條件煅燒:分解所存在的配體及陰離子, 但不得嚴格到使貴金屬聚集在表面上。鑒於此原因,如以 下更詳細說明,責金屬較佳在沒有煅燒的情況下直接還 原0 通苇,煅燒溫度應至少比選定基質軟化點低至少約工 c。煅燒溫度應在約100。(:至700。〇:之間,更佳在約2〇〇它 至600 C之間,最佳在約3〇〇。〇至5〇〇。〇之間。 典型情況下,經IEX-2處理之基質煅燒約i至約μ個小 時,較佳煅燒約2至約12個小時。儘管如此,視與基質整 合之2型成分而定,該項煅燒時間可在該等範圍以外變 化0 通常但不限於,沈澱後還原處理目的為至少實質上(若 非完全)將催化成分前驅物(例如金屬、金屬氧化物或金屬 硫化物)還原成與基質表面整合的較低氧化狀態。合適還 原劑的實例包括但不限於C〇及h2。h2係較佳的還原劑, 其流動速率較佳在每公克基質約0.01 L/hr至約1〇〇 L/hr之 間’更佳其流動速率在每公克基質〇1 L/hril L/hr•之間。 126432.doc -49- 200836831 典型情況下,還原溫度應在0°C至600°C之間,前提為所 選擇之溫度比基質之軟化點至少低100°C。 通常,經IEX-2處理之基質要經約0· 1小時至約48小時之 還原處理,較佳經約1小時至約8小時之還原處理。 或者,經IEX-2處理之基質可藉由溶液相處理進行還 原,該溶液相處理使用可溶性還原劑(例如但不限於肼、 氫化鈉、氫化铭鋰及其組合)在合適的溶劑(例如水或乙醚) 中進行。 通常但不限於,沈澱後-IDING反應處理的目的為在另外 使還原的金屬與包含較低原子量-IDING元素之試劑反應的 同時,還原金屬離子、金屬氧陰離子及/或金屬硫陰離 子。在某些情況下,直接-IDING會在沒有同時發生金屬氧 化態還原的情況下發生,例如某些硫化處理。 典型的氣相-IDING試劑包括但不限於硫化氫、曱硫醇及 二甲基硫(硫化-IDING試劑)、氨(氮化-IDING試劑)、甲烷、 乙烷及其他輕質烴類(碳化-IDING試劑)。該等氣相-IDING試 劑可在環境壓力下或加壓下直接與經IEX-2處理之基質起反 應,或是在與惰性氣體或氫氣混合之氣體中與與經IEX-2處 理之基質起反應,進而產生相應的硫化物、碳化物或氮化 物。可能有催化效力之部分-IDED產物(包括硫氧化物、碳氧 化物及氮氧化物)亦可藉由下述方式產生:與實質上原樣接 收/獲得之基質、經IEX-2處理之整合基質、經IEX-2處理之 煅燒基質或經IEX-2處理之還原基質進行不完全反應。 藉由兩次離子交換(兩次IEX-2處理)基質之還原處理, 126432.doc -50- 200836831 可產生金屬磷化物,其中一項ΙΕχ-2處理係一或多種過渡 金屬離子,而另一項ΙΕΧ-2處理係磷酸根離子。較佳地, 該兩項ΙΕΧ-2處理可按順序執行。另外,金屬填化物可藉 由使用氣相磷化試劑(例如但不限於磷化氫(ρη3))來產生所 要之金屬磷化物。例如,以處於合適氧化態之所需過渡金 屬進行單一離子交換之基質(經單-ΙΕΧ_2處理之基質),可 進一步用ΡΗ3處理來產生所需的金屬磷化物。For example, but not limited to, 'precipitated sulfates require calcination conditions to decompose the bound cations and set the sulfuric acid on the surface, but such conditions do not lead to the good solution of sulfuric acid to volatile sulfur oxides. Metal oxyanions require calcination conditions to decompose the bound cations and immobilize the anions as oxides on the surface, provided that the conditions are not critical to volatilize the metal oxides from the surface or cause the metal oxides to dissolve in the matrix. Finally, the precious metals and The complex should be calcined under the following conditions: decomposition of the ligands and anions present, but not so strict that the precious metals accumulate on the surface. For this reason, as explained in more detail below, the responsible metal is preferably directly in the absence of calcination. Reduction 0 苇, the calcination temperature should be at least about 50 lower than the softening point of the selected matrix. The calcination temperature should be about 100. (: to 700. 〇: between, more preferably between about 2 〇〇 and 600 C Preferably, it is between about 3 Torr and 5 Torr. Typically, the IEX-2 treated substrate is calcined for about i to about μ hours, preferably for about 2 to about 12 hours. Nonetheless, depending on the type 2 component of the matrix integration, the calcination time can vary outside of these ranges. Typically, but not limited to, the post-precipitation reduction treatment aims to at least substantially (if not completely) catalyze the component precursor ( For example, metals, metal oxides or metal sulfides are reduced to a lower oxidation state integrated with the surface of the substrate. Examples of suitable reducing agents include, but are not limited to, C〇 and h2. The preferred reducing agent for h2 is a preferred flow rate. Between about 0.01 L/hr and about 1 〇〇L/hr per gram of matrix 'better flow rate is between 1 L/hril L/hr• per gram of substrate. 126432.doc -49- 200836831 Typical The reduction temperature should be between 0 ° C and 600 ° C, provided that the selected temperature is at least 100 ° C lower than the softening point of the substrate. Typically, the substrate treated with IEX-2 is passed for about 0.1 hour. The reduction treatment is carried out for about 48 hours, preferably for about 1 hour to about 8 hours. Alternatively, the substrate treated with IEX-2 can be reduced by solution phase treatment using a soluble reducing agent (for example, Not limited to hydrazine, sodium hydride, hydrogen Lithium and combinations thereof are carried out in a suitable solvent such as water or diethyl ether. Usually, but not limited to, after precipitation, the purpose of the IDING reaction treatment is to additionally react the reduced metal with a reagent containing a lower atomic weight-IDING element. At the same time, metal ions, metal oxyanions and/or metal sulphide anions are reduced. In some cases, direct-IDING can occur without simultaneous reduction of the metal oxidation state, such as some sulphurization treatments. -IDING reagents include, but are not limited to, hydrogen sulfide, sulfonium thiol and dimethyl sulfide (vulcanization-IDING reagent), ammonia (nitriding-IDING reagent), methane, ethane and other light hydrocarbons (carbonization-IDING reagent) . The gas phase-IDING reagents can be directly reacted with the IEX-2 treated substrate under ambient pressure or under pressure, or in a gas mixed with an inert gas or hydrogen and with an IEX-2 treated substrate. The reaction, which in turn produces the corresponding sulfide, carbide or nitride. Part of the catalytically potent component - IDED products (including sulfur oxides, carbon oxides and nitrogen oxides) can also be produced by: Substrate received/obtained as it is, IEX-2 treated integrated matrix The incomplete reaction was carried out by the IEX-2 treated calcined substrate or the IEX-2 treated reducing substrate. Metal phosphide can be produced by two ion exchange (two IEX-2 treatments) substrate reduction treatment, 126432.doc -50-200836831, wherein one ΙΕχ-2 treatment is one or more transition metal ions, and the other The ΙΕΧ-2 treatment is a phosphate ion. Preferably, the two ΙΕΧ-2 processes can be performed in sequence. Alternatively, the metal fill can be produced by using a gas phase phosphating reagent such as, but not limited to, phosphine (ρη3) to produce the desired metal phosphide. For example, a single ion exchanged substrate (matrix treated with mono-indole_2) with the desired transition metal in the appropriate oxidation state can be further treated with hydrazine 3 to produce the desired metal phosphide.

溶液相處理可用於產生金屬硫化物、金屬硼化物及金屬 磷化物催化成分。產生金屬硫化物之典型溶體處理包括但 不限於在室溫至回流溫度之範圍内,以有效濃度之六甲基 二矽硫烧有機溶液處理經ΙΕΧ-2處理之金屬·離子_整合基 質,歷時之時間足以在基質表面上及/或内產生催化有效 量之催化成分。 產生硼化物之典型溶液相處理包括但不限於,對於經 ΙΕΧ-2處理之金屬-離子-整合基質,在室溫至回流溫度之 間,歷時有效時間進行硼氫化鈉或硼氫化鉀水溶液處理。 產生磷化物之典型溶液相處理包括在室溫至回流之範圍 内,對於經ΙΕΧ-2處理之金屬-離子_整合基質進行次磷酸鈉 水溶液處理,歷時時間之足以在基質表面上及/或内產生 催化有效量之催化成分。 V. 催化活性區域說明 由於任何上述基質處理而產生的催化活性區域,將且有 ⑴小於或等於約30奈米的平均厚度,較佳為^約2()夺米, 更佳為$約H)奈米及(Π)催化有效量之至少一種催化成 126432.doc -51· 200836831Solution phase treatment can be used to produce metal sulfides, metal borides, and metal phosphide catalytic components. The typical solution treatment for producing metal sulfides includes, but is not limited to, treating the metal-ion-integrated matrix treated with cerium-2 at an effective concentration of a hexamethyldisulfide-sintered organic solution at a temperature ranging from room temperature to reflux temperature. The time is sufficient to produce a catalytically effective amount of catalytic component on and/or within the surface of the substrate. Typical solution phase treatments for the production of boride include, but are not limited to, treatment of a sodium borohydride or potassium borohydride aqueous solution over a period of effective time between room temperature and reflux temperature for a ruthenium-2 treated metal-ion-integrated substrate. Typical solution phase treatment for the production of phosphides comprises treatment of a ruthenium-2 treated metal-ion-integrated substrate with an aqueous solution of sodium hypophosphite for a time sufficient to be on and/or within the surface of the substrate, from room temperature to reflux. A catalytically effective amount of a catalytic component is produced. V. The catalytically active region indicates that the catalytically active region resulting from any of the above substrate treatments will have (1) an average thickness of less than or equal to about 30 nm, preferably about 2 () of rice, more preferably about $ a catalytically effective amount of at least one of nano and (Π) catalyzed to 126432.doc -51· 200836831

分。較佳地,使用XPS光譜學確定催化區域的平均厚度, XPS光譜學使用稱為濺射深度分布之分層蝕刻技術(會在以 下提供實例中的分析方法下更詳細說明)。然而,熟習此 項技術者所知的其他分析技術亦可用來確定催化成分對比 成分之相關基質表面的大體位置。所以,基質催化區域的 平均厚度可使用(例如但不限於)透射電子顯微鏡術(tem) 或掃描TEM (STEM,亦在以下更詳細說明)予以確定。熟 舀此項技術者對XPS或TEM程序均有透徹的瞭解。 應理解,在極限情況下,無論催化活性區域係由还叉」 處理或IEX-2處理(有或無BIX處理)所產生,對於本發明之 任何觸媒組合物而言,催化活性區域的厚度一般(a)不會在 κ質上穿過基質之表面區域或不會超過基質之外表面約 3〇奈米厚度,較佳不超過約2〇奈米厚度,更佳不超過丨〇奈 米厚度。關於在經處理之基質上及/或内一或多個催化= 性區域的定位,亦應理解催化活性區域可能: (a)在基質之外表面,及存在任何孔隙時,在基質之孔 隙壁表面; ' (b)在基f之表面區域中,亦即在基質外表面以下約30 奈米,較佳在基f外表面以下約20奈米,更佳在基 質外表面以下約10奈米;冬左 土 丁、下,田存在任何孔隙時,在基 質孔隙壁表面以下約30奉半,击丄从上 土 “ ’較佳在基質孔隙壁表 面以下約20奈米,更佳在基 土 # 貝孔隙壁表面以下約1 〇 不米,但在基質表面下區域以上; (C)在基質之外表面上面或以上,合 田存在任何孔隙時, 126432.doc •52- 200836831 部分在基質孔隙壁表面上或以上,而部分位於基質 之表面區域中,或 (d) (a)、(b)及(c)之組合。 通常’無論為1型成分或2型成分,催化成分之量可在約 0.0002 wt·%至約5 wt·%之間,較佳在約0.0002 wt·%至約2 wt·%之間,更佳在約〇·〇〇〇5 wt·%至約1 wt·%之間。而且, 本發明觸媒組合物之催化活性區域可為連續或不連續。Minute. Preferably, the average thickness of the catalytic region is determined using XPS spectroscopy, and XPS spectroscopy uses a layered etching technique known as sputter depth distribution (described in more detail below in the analytical methods provided in the Examples below). However, other analytical techniques known to those skilled in the art can be used to determine the general location of the substrate surface associated with the catalytic component contrast component. Therefore, the average thickness of the matrix catalytic region can be determined using, for example, but not limited to, transmission electron microscopy (TEM) or scanning TEM (STEM, also described in more detail below). Those skilled in the art have a thorough understanding of XPS or TEM programs. It should be understood that in the extreme case, regardless of whether the catalytically active region is produced by a reciprocating treatment or an IEX-2 treatment (with or without BIX treatment), the thickness of the catalytically active region for any of the catalyst compositions of the present invention. Generally, (a) does not pass through the surface area of the substrate on the κ mass or exceeds the surface of the substrate by about 3 Å, preferably not more than about 2 Å, more preferably not more than 丨〇 nanometer. thickness. With regard to the localization of one or more catalytic = regions on the treated substrate and/or within the catalytic region, it is also understood that the catalytically active region may: (a) be on the outer surface of the substrate, and in the presence of any pores, in the pore walls of the substrate Surface; '(b) in the surface region of the base f, i.e., about 30 nm below the outer surface of the substrate, preferably about 20 nm below the outer surface of the base f, more preferably about 10 nm below the outer surface of the substrate. When there is any pore in the winter left soil, the lower, the field is about 30 half below the surface of the pore wall of the matrix, and the shot is from the upper soil. 'It is preferably about 20 nm below the surface of the pore wall of the matrix, preferably in the base soil. # Beside the surface of the pore wall, about 1 〇 is not more than the area below the surface of the substrate; (C) Above or above the surface of the substrate, when there is any pore in Hetian, 126432.doc •52- 200836831 Part of the pore wall of the matrix On the surface or above, partially in the surface area of the matrix, or (d) a combination of (a), (b) and (c). Usually 'whether it is a type 1 component or a type 2 component, the amount of the catalytic component can be Between about 0.0002 wt.% to about 5 wt.%, preferably about 0.0002 wt.% Between about 2 wt ·%, more preferably between about billion-〇〇〇5 wt ·% to about 1 wt ·%. Further, the catalyst composition of the catalytically active region of the present invention may be continuous or discontinuous.

不受理論約束的情況下,據認為,覆蓋有不連續的催化 活性區域之觸媒組合物,與實質上覆蓋有連續或更廣泛之 連續催化活性區域的催化成分相比,至少同樣有效,而且 在有些情況下更為有效。催化有效區域在基質上的外表面 覆盍範圍之程度,可在低至〇 〇〇〇1%覆蓋至高達1〇〇%覆蓋 之間。較佳地,催化有效區域之外表面覆蓋的程度在約 0.0001%至約10%之間,更佳在約〇〇〇〇1%至約以之間。 但,在不文理淪約束的情況下,據認為,觸媒組合物,特Without being bound by theory, it is believed that the catalyst composition covered with the discontinuous catalytically active region is at least as effective as the catalytic component substantially covered with a continuous or broader continuous catalytically active region, and In some cases it is more effective. The extent to which the catalytically effective region covers the outer surface of the substrate can range from as low as 1% coverage to as high as 1% coverage. Preferably, the extent of surface coverage outside the catalytically active region is between about 0.0001% and about 10%, more preferably between about 1% and about 1%. However, in the absence of cultural constraints, it is believed that the catalyst composition,

別係具有較低催化成分〜.%負載之觸媒組合物,很可能催 化有效性更強,因為在經處理之基質上及/或内的催化活A catalyst composition having a lower catalytic component of ~.% loading is likely to be more catalytically effective because of catalytic activity on and/or within the treated substrate.

性區域變得更為分散(亦即在催化活性區域之間更大程度 的分布及分開)。 X 催化活性區域及其他上述觸 明人對於進入穩態反應條件之 得資訊。一或多種所述特性可 大部分不可預測。儘管如此, 為,由於觸媒組合物促進其預 媒組合物特性,均係基於發 鈾觸媒組合物狀態的最佳可 改變的程度並不確定,而且 在不受理論約束的情況下認 疋製私反應,本文所述之觸 126432.doc •53- 200836831 媒組合物的官能性表面活性將允許與基f整合之催化成分 的電荷及/或幾何定位及其他成分特性顯著變化。因此, 應理解’本文所述的本發明範圍,同樣擴展至在穩態反應 條件下由所主張之組合物產生的所有觸媒組合物。 νι·觸媒組合物在選擇性氫化方法中的應用The sexual regions become more dispersed (i.e., more widely distributed and separated between catalytically active regions). X The catalytically active region and other above-mentioned sensitizers have access to steady-state reaction conditions. One or more of the described characteristics can be largely unpredictable. Nonetheless, since the catalyst composition promotes its pre-polymer composition characteristics, the degree of optimal change based on the state of the uranium-catalyst composition is not determined, and is not subject to theoretical constraints. The proprietary reaction, the functional surface activity of the 126432.doc •53-200836831 media composition described herein will allow for significant changes in the charge and/or geometric positioning and other component characteristics of the catalytic component integrated with the base f. Thus, it is to be understood that the scope of the invention described herein extends to all of the catalyst compositions produced by the claimed compositions under steady state reaction conditions. Application of νι·catalyst composition in selective hydrogenation method

般而s,上述類型的觸媒組合物對由於產物或反應物 之粒子内擴散阻力而使觸媒活性及選擇性受到限制的製程 (亦即擴散受限製程)最為有利。但,該等觸媒組合物還可 被用於不一定受到擴散限制的製程。例如,若沒有限制, 一些製程僅僅需要上述類型的觸媒組合物提供單一類型之 催化相互作用,以幫助降低某個製程反應之活化能量。因 此,較低的活化能量可使該製程具有t好的熱力學特性 (例如,驅動該製程所需之能量變少),因此,進行商業化 生產亦就更具成本效益。 選擇性氫化方法(亦即SHp處理)係上述觸媒組合物可有 利用於處理煙、雜烴及其混合物的-類方法。本文所使用 之煙係指僅由礙原子(C)及氫原子(H)構成的-群化合物, 而本文所使用之雜烴係指主要由碳原子(c)及氫原子⑻構 成,但同時還含有除碳及氫以外的至少一種其他原子(例 如但不限於氧(〇)、氮⑻及/或硫(S))的一群化合物。 在SHP處理中,適於使用上述類型之觸媒組合物進行 選擇性氫化的含有烴及,或雜烴之製程流一般包括具有」至 約30個石反原子但在某些情況下可具有個以上碳原子及可 此一或多個雜原子(例如氧(〇)、氮(N)、硫(S)等)的烴,其 126432.doc -54- 200836831 中,烴有至少一個可氫化位點(亦即目標可氫化位點),在 針對所需產物、產率及/或製程效率的適當氫化條件下(以 下更詳細描述),易於選擇性氫化。In general, catalyst compositions of the above type are most advantageous for processes in which catalyst activity and selectivity are limited (i.e., diffusion limited) due to intraparticle diffusion resistance of the product or reactant. However, such catalyst compositions can also be used in processes that are not necessarily limited by diffusion. For example, if not limited, some processes require only a single type of catalytic composition to provide a single type of catalytic interaction to help reduce the activation energy of a process reaction. Therefore, the lower activation energy allows the process to have good thermodynamic properties (e.g., less energy required to drive the process), so commercial production is also more cost effective. The selective hydrogenation process (i.e., SHp treatment) is a process for treating the smoke, hydrocarbons, and mixtures thereof. As used herein, a smoke refers to a group of compounds consisting only of an atom (C) and a hydrogen atom (H), and a heteroalkyl as used herein means mainly composed of a carbon atom (c) and a hydrogen atom (8), but at the same time Also included is a group of compounds other than carbon and hydrogen, such as, but not limited to, oxygen (oxime), nitrogen (8), and/or sulfur (S). In SHP processing, a process stream comprising hydrocarbons or, or a heterohydrocarbon, suitable for selective hydrogenation using a catalyst composition of the above type generally comprises from about to about 30 stone counter atoms but in some cases may have a hydrocarbon having at least one hydrogenatable group in the above carbon atom and a hydrocarbon which may be one or more heteroatoms (e.g., oxygen (nitrogen), nitrogen (N), sulfur (S), etc.), 126,432.doc -54 - 200836831 The point (i.e., the target hydrogenatable site) is readily hydrogenated under appropriate hydrogenation conditions (described in more detail below) for the desired product, yield, and/or process efficiency.

製程流包括但不限於原料流'中間轉移流、再循環流及/ 或排玫流。本文所使用之目標可氫化位點係指具有至少一 個碳原子(c)或雜原子的原子位置,但一般為含碳的原子 位置,而雜原子可為(但不限於)氧(0)、氮(N)或硫(s)。無 論如何,目標可氫化位點都具有至少一個不飽和度,而且 在適當的反應條件下,有觸媒組合物參與時,容易達到至 少部分飽和。 另外,烴中不飽和位的程度及類型可能有所不同。因 此,多烯烴、多炔烴及環烯烴可能有連續(僅限連續雙_雙 鍵)、共輛或間隔一或多個飽和及/或取代碳之雙鍵及/或參 鍵位,在所關注之烴中可能存在的可氫化位點中,其中二 個比其他可氫化位點優先飽和(至少部分)。 適於SHP處理之製程流還可有烯烴或多稀煙及芳香煙或 裱烯烴之混合物,用於烯烴或多烯烴之選擇性氫化丨或烯 烴或多烯烴及快烴或多炔煙之混合物,用於快煙或多块煙 之選擇性氫化。因此,對於至少兩類烴或雜烴具有至少: 個可氫化位點的烴和/或雜烴混合物而言,將預先確定用 於選擇性氫化的可氫化位點視為目標可氫化位點⑽如&gt; 芳香烴+稀烴’其中稀烴包含目標可氫化位點,相 香烴優先經氫化)。 ' 因此, 適於使用上述類型之觸 媒組合物進行SHP處理的 126432.doc -55- 200836831 烴及雜烴包括(但不限於)烯烴、二烯烴、多烯烴、炔烴、 多炔烴、環烯烴、芳香烴、不飽和植物油及可氫化含氧化 合物。可氫化含氧化合物包括(但不限於)酮、醛、羥酸、 醌及其他具有一或多個氮或硫等除氧以外之雜原子的雜 烴。 適於使用上述類型觸媒組合物進行SHP處理的一類較佳 烴為具有約2至20個碳原子的正鏈烯烴、正鏈多烯烴及正 鏈炔烴及具有6至12個(取代或未取代)碳原子的芳香烴。更 仫的烴為具有2至15個碳原子的正鏈烯烴、正鏈多烯烴、 烯烴取代之芳香烴、正鏈炔烴、烯烴醛及烯烴酮。 般而s,可使用具有一或多個氫化區之各類反應器執 打SHP處理,使得,反應烴原料流可與保持在選擇性氫化 條件下的一個選擇性氫化區中之觸媒組合物充分接觸(以 下更詳細描述)。該接觸可在固定觸媒床系統、移動觸媒 =系統、流化床系統中進行,亦可使用上述各類不同觸媒 複合物,在批次操作中進行。 一般而言,較佳採用固定床系統。在固定床系統中,烴 :料流首先經預加熱至所需之反應溫度,然後流入含有固 定觸媒複合物床之氫化區。該選擇性氫化區自身可能包括 一或多個獨立的反應區,它們之間有加熱手段,可確保各 反應區輸入端保持所需之反應溫度。烴能夠以向上、向下 或徑向流動方式接觸觸媒床。較佳使烴徑向流過觸媒床。 該煙在接觸觸媒時可為液相'氣液混合相或氣相,較佳為 126432.doc -56- 200836831 上,觸媒組合物在何種選擇性氫化條件下可驗許多選 擇度虱化方法,同樣取決於所需之產物、產率及/或製程 效率’該等氫化條件包括⑷溫度範圍—般在約代至約 彻。c,且更佳在抓至約鳩。c; (b)壓力範圍—般在約 101 kPa至約13,789 kpa,⑷氫氣與目標可氫化烴之莫耳比 範圍-般在約0.1:1至約20:1,較佳為約〇 5:1至約】51,且 :佳為約0.8:1至約及⑷反應器中的液時空速⑽sv) 範圍一般在約0.1 hr1至約20 hr.1。 實例 現在、纟σ合以下實例更詳細說明本發明,以下實例說明或 模擬了涉及本發明實踐的多個態樣。應理解,在本發明精 神實質内的所有改變均希望得到保護,因此不能認為本發 明僅侷限於該等實例。 具有大孔隙玻璃基質之觸媒組合物 實例1 大孔隙玻璃上之鈀 獲得由Dennert Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品’即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約25公克大孔隙玻璃及3公升5.5 wt.%之 硝酸各自置入4公升之塑膠廣口容器内。將該塑膠容器置 於30°C之通風烘箱内30分鐘,每10分邊用手稍微搖晃一 下。酸浸處理完成之後,使用帶有,Whatman 541濾紙之布 氏(Buchner)漏斗過?慮樣品’並使用約7 ·6公升去離子水清 126432.doc -57-, 200836831 洗。然後,在11(rc之溫度了,將酸浸後之樣品乾燥 時。 、 第二步,對經酸浸處理之大孔隙玻璃進行離子交換 (IEX)處理。在本實例中,使用二氫氧四胺把 [Pd(NH3)4](〇H)2製備80毫升0.1 wt.%之鈀溶液用於離子交 換(&quot;ΊΕΧ溶液&quot;)。將4公克大孔隙玻璃加入離子交換溶液中 (π玻璃/離子交換混合物”)。量測玻璃/離子交換混合物之Process streams include, but are not limited to, feed stream 'intermediate transfer streams, recycle streams, and/or streams. As used herein, a target hydrogenatable site refers to an atomic position having at least one carbon atom (c) or a hetero atom, but is generally a carbon-containing atomic position, and the hetero atom may be, but is not limited to, oxygen (0), Nitrogen (N) or sulfur (s). In any case, the target hydrogenatable sites have at least one degree of unsaturation, and under appropriate reaction conditions, it is easy to achieve at least partial saturation with the participation of the catalyst composition. In addition, the extent and type of unsaturation in the hydrocarbons may vary. Thus, multiolefins, polyacetylenes and cyclic olefins may have continuous (only continuous double-double bonds), a total of one or more double bonds and/or substitutions of one or more saturated and/or substituted carbons. Of the hydrogenatable sites that may be present in the hydrocarbon of interest, two of them are preferentially saturated (at least in part) than the other hydrogenatable sites. Process streams suitable for SHP treatment may also be a mixture of olefins or fluffy and aromatic or terpene olefins, for selective hydrogenation of olefins or multiolefins or mixtures of olefins or multiolefins and fast hydrocarbons or polyacetylenes, For selective hydrogenation of fast smoke or multiple pieces of cigarettes. Thus, for hydrocarbons and/or heterocarbon mixtures having at least two hydrogenatable sites of at least two types of hydrocarbons or heterohydrocarbons, the hydrogenatable sites predetermined for selective hydrogenation are regarded as target hydrogenatable sites (10) For example, &gt; aromatic hydrocarbons + dilute hydrocarbons where the dilute hydrocarbons contain the target hydrogenatable sites and the phase aromas are preferentially hydrogenated. ' Thus, suitable for SHP treatment using a catalyst composition of the above type 126432.doc -55 - 200836831 Hydrocarbons and hydrocarbons include, but are not limited to, olefins, diolefins, multiolefins, alkynes, polyalkynes, rings Olefins, aromatic hydrocarbons, unsaturated vegetable oils and hydrogenated oxygenates. Hydrogen-containing oxygenates include, but are not limited to, ketones, aldehydes, hydroxy acids, hydrazines, and other heteroatoms having one or more nitrogen or sulfur-containing heteroatoms other than oxygen. A preferred class of hydrocarbons suitable for SHP treatment using a catalyst composition of the above type is a normal chain olefin having from about 2 to 20 carbon atoms, a normal chain multiolefin and a normal chain alkyne and having from 6 to 12 (substituted or not) Substituting an aromatic hydrocarbon of a carbon atom. More noble hydrocarbons are normal chain olefins having from 2 to 15 carbon atoms, normal chain multiolefins, olefin substituted aromatic hydrocarbons, normal chain alkyne, alkene aldehydes and olefin ketones. As such, the SHP treatment can be performed using a variety of reactors having one or more hydrogenation zones such that the reaction hydrocarbon feed stream can be combined with a catalyst composition maintained in a selective hydrogenation zone under selective hydrogenation conditions. Full contact (described in more detail below). The contacting can be carried out in a fixed catalyst bed system, a mobile catalyst = system, a fluidized bed system, or a plurality of different catalyst composites as described above, in batch operations. In general, a fixed bed system is preferred. In a fixed bed system, the hydrocarbon: stream is first preheated to the desired reaction temperature and then passed to a hydrogenation zone containing a bed of fixed catalyst complex. The selective hydrogenation zone itself may include one or more separate reaction zones with heating means to ensure that the desired reaction temperature is maintained at the input of each reaction zone. The hydrocarbon can contact the catalyst bed in an upward, downward or radial flow. Preferably, the hydrocarbon flows radially through the catalyst bed. The smoke may be in the liquid phase 'gas-liquid mixed phase or gas phase when contacting the catalyst, preferably 126432.doc -56-200836831. Under the selective hydrogenation conditions, the catalyst composition can be tested for many options. The method, also depends on the desired product, yield, and/or process efficiency. The hydrogenation conditions include (4) temperature ranges, generally from about to about. c, and better to catch about. c; (b) The pressure range is generally from about 101 kPa to about 13,789 kPa, and (4) the molar ratio of hydrogen to the target hydrogenatable hydrocarbon is generally from about 0.1:1 to about 20:1, preferably about 〇5: 1 to about 51, and preferably: about 0.8:1 to about and (4) the liquid hourly space velocity (10) sv) in the reactor generally ranges from about 0.1 hr1 to about 20 hr.1. EXAMPLES The present invention will now be described in more detail by the following examples in which the following examples illustrate or simulate various aspects of the practice of the invention. It is to be understood that all changes in the spirit of the invention are intended to be protected, and therefore the invention is not to be construed as limited to the examples. Catalyst Composition with Large Porous Glass Substrate Example 1 Palladium on Large Porous Glass A macroporous soda lime calcium glass sample produced by Dennert Poraver was obtained, i.e., glass beads having an average diameter of about 40 to 125 microns. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 25 grams of macroporous glass and 3 liters of 5.5 wt.% nitric acid were placed in a 4 liter plastic wide mouth container. The plastic container was placed in a ventilated oven at 30 ° C for 30 minutes, and shaken slightly by hand every 10 minutes. After the acid leaching treatment was completed, a sample was taken using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water 126432.doc -57-, 200836831. Then, at 11 (the temperature of rc, the acid immersed sample is dried. In the second step, the acid leached macroporous glass is subjected to ion exchange (IEX) treatment. In this example, dihydrogen oxygen is used. Tetraamine [Pd(NH3)4](〇H)2 was prepared by using 80 ml of a 0.1 wt.% palladium solution for ion exchange (&quot;ΊΕΧsolution&quot;). 4 g of macroporous glass was added to the ion exchange solution ( π glass/ion exchange mixture"). Measurement of glass/ion exchange mixture

pH值,測得約10.3。然後,將混合物移入15〇毫升之塑膠 廣口容器内。將該塑膠容器置於501之通風烘箱内2小 時’母30分鐘用手稍微搖晃一下。離子交換處理完成之 後’使用▼有Whatman 541渡紙之布氏漏斗過濾、玻璃/離子 交換混合物,並使用約3.8公升去離子水清洗。然後,在 110°C溫度下,將離子交換玻璃樣品乾燥22小時。 第三步’對離子交換玻璃進行還原處理,其中離子交換 玻璃先在空氣流速為2 L/hr之空氣氣氛及300°C之溫度下煅 燒2小時,然後在氫氣(h2)流速為2 L/hr之氫氣(H2)氣氛及 300°C之溫度下還原4小時。 採用電感耦合電漿-原子發射光譜法(ICP-AES)分析樣 品,鈀濃度之結果約為0.098 wt.%。 實例2 大孔隙玻璃上之鈀 獲得由Dennert Poraver生產之大孔隙泡沫鈉#5玻璃樣 品,即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經锻燒之大孔隙玻璃樣品 126432.doc -58 - 200836831 進行酸浸處理。將約25公克大孔隙玻璃及3公升5·5〜%之 硝酸各自置入4公升之塑膠廣口容器内。將該塑膠容器置 於30 C之通風烘箱内3〇分鐘,每1〇分鐘用手稍微搖晃一 下目文’又處理元成之後,使用帶有Whatman 541濾:紙之布 氏漏斗過濾樣品,並使用約7.6公升去離子水清洗。然 後,在uo°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃進行離子交換 (IEX)處理。在本實例中,使用二氯四胺鈀[pd(NH仏](ci)2 製備80毫升o.i以.%之鈀溶液用於離子交換(,,ΐΕχ溶液。 將4么克大孔隙玻璃加入離子交換溶液中(,,玻璃/離子交換 此合物)。量測玻璃/離子交換混合物之卩11值,測得約 8·1。然後,將混合物移入15〇毫升之塑膠廣口容器内。將 該塑膠容器置於5(TC之通風烘箱内2小時,每3〇分鐘用手 稍微搖晃一下。離子交換處理完成之後,使用帶有 Whatman 541濾紙之布氏漏斗過濾玻璃/離子交換混合物, 並使用約3.8公升去離子水清洗。然後,在11〇。(:溫度下, 將離子交換玻璃樣品乾燥22小時。 第三步,對離子交換玻璃進行還原處理,其中離子交換 玻璃先在空氣流速為2 L/hr之空氣氣氛及300°c之溫度下緞 燒2小時,然後在氫氣⑽流速為2 L/hr之氮氣旧丄氣氛及 3 0 0 C之溫度下還原4小時。 採用ICP-AES進行樣品分析,飽濃度之結果約為0.045 wt.% 〇 實例3 126432.doc 59- 200836831 反離子交換之大孔隙玻璃上之鈀 獲得由Dennert Poraver生產之大孔隙泡沬鈉妈玻璃樣 品,即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約50公克之大孔隙玻璃及4公升5.5 wt.% 之硝酸各自置入4公升之玻璃燒杯内。使用一台不鏽鋼槳 式攪拌機以300至500 rpm之速度在90°C下進行機械攪拌2 小時。酸浸處理完成之後,使用帶有Whatman 541濾紙之 布氏漏斗過濾樣品,並使用約7.6公升去離子水清洗。然 後,在ll〇°C之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃進行Na+-反離子交 換(&quot;Na-BIXn)處理。將在第一步中得到的經酸浸之樣品與4 公升3 mol/L氯化鈉(NaCl)溶液混合(&quot;玻璃/氯化鈉混合物”)。 量測玻璃/NaCl混合物之pH值。根據需要,連續逐滴添加 約40 wt.%之氫氧化四丙基銨,將玻璃/NaCl混合物之pH值 調整至大於1〇(在本實例中,得到的pH值約為10.5)。然 後,將該玻璃/NaCl混合物移入4公升之玻璃燒杯中,且在 50°C溫度下加熱4小時,同時使用一台不鏽鋼槳式攪拌機 以300至500 rpm之速度攪拌。Na-BIX處理完成之後,使用 帶有Whatman 541濾、紙之布氏漏斗過濾玻璃/氯化納混合物 並收集Na-BIX/玻璃樣品,然後使用約7.6公升去離子水清 洗。然後,在ll〇°C之溫度下,將Na-BIX/玻璃樣品乾燥22 小時。 第三步,對Na-BIX/大孔隙玻璃樣品進行第二次離子 126432.doc -60- 200836831 交換(&quot;ΙΕΧ·2&quot;)處理。在本實例中,使用二氯四胺把 [Pd(NH3)4](Cl)2製備3公升〇·〇1 wt·%之鈀溶液用於離子交 換(”IEX_2溶液”)。將35公克大孔隙玻璃加入ΙΕχ_2溶液中 (&quot;玻璃/ΙΕΧ-2混合物”)。量測玻璃/離子交換混合物之ρΗ 值’測得約8 · 1。然後’將該混合物移入2公升之玻璃燒杯 中’且在5 0 C溫度下加熱4小時,同時使用一台不鏽鋼禁 式攪拌機以300至500 rpm之速度攪拌。離子交換處理完成 之後,使用帶有Whatman 541濾紙之布氏漏斗過渡玻璃/離 子交換混合物,並使用約7.6公升去離子水清洗。然後, 在11 〇°C溫度下,將離子交換玻璃樣品乾燥22小時。 第四步,對IEX-2玻璃樣品進行還原處理,其中樣品在 氫氣(H2)流速為2 L/hr之氫氣氣氛及300之溫度下還原4 小時。 採用ICP-AES進行樣品分析,|巴濃度之結果約為〇 wt·%。 實例4 大孔隙玻璃上之纪 獲得由Dennert Poraver生產之大孔隙泡沫鈉鈣玻璃樣 品’即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約20公克之大孔隙玻璃及4公升55 wt% 之硝酸各自置入4公升之玻璃燒杯内。使用一台不鏽鋼槳 式攪拌機以300至500 rpm之速度在9(rc下進行機械攪拌2 小時。酸浸處理完成之後,使用帶有Whatman 541濾紙之 126432.doc -61· 200836831 布氏漏斗過濾樣品,並使用約7.6公升去離子水清洗。铁 後’在not之溫度下,將酸浸後之樣品乾燥22小時。 第二步’對經㈣處理之大孔隙玻璃樣品進行離子交換 處理在本貝例中,使用二氯四胺叙㈣膽丄]⑹)2製備3 公升0.01 wt.%之鈀溶液用於離子交換(&quot;ΙΕχ溶液將約 似克經酸浸之大㈣玻璃加人離子交換溶液中(”玻璃/離 子交換混合物&quot;)。量測玻璃/離子交換混合物之?11值。根 據需要,連續逐滴添加約29.8 wt.%之氳氧化銨(ΝΗ4〇η), 將該混合物之pH值調整至大於1〇(在本實例中得到的ρΗ 值約為10.8)。然後,將該玻璃/離子交換混合物移入4公升 之玻璃燒杯中,且在5(TC溫度下加熱兩小時,同時使用一 台不鏽鋼槳式攪拌機以300至500 rpm之速度攪拌。離子交 換處理完成之後,使用帶有Whatman 541濾紙之布氏漏斗 過濾玻璃/離子交換混合物,並使用約7·6公升去離子水清 洗然後,在11 〇 C溫度下,將離子交換玻璃樣品乾燥22 小時。 第三步,對離子交換玻璃樣品進行還原處理,其中樣品 在氲氣(Hi)流速為2 L/hr之氫氣氣氛及300°C之溫度下還原 4小時。 採用ICP-AES進行樣品分析’把濃度之結果約為〇 047 wt·%。 實例5 大孔隙玻璃上之鈀 獲得由Dennert Poraver生產之大孔隙泡沫鈉弼玻璃樣 126432.doc •62- 200836831 品’即平均直徑約為40至125微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒且未經酸浸之大孔 隙玻璃樣品進行離子交換處理。在本實例中,使用二氫氧 四胺鈀[Pd(NH3)4](OH)2製備1 ·5公升〇·〇〇 1 wt·。/。之鈀溶液用 於離子交換(&quot;IEX溶液&quot;)。將約8公克大孔隙玻璃加入離子 • 交換溶液中Γ玻璃/離子交換混合物,’)。量測玻璃/離子交換 • 混合物之pH值。根據需要,連續逐滴添加約29 8 wt%之 氫氧化銨(NH4〇H),將該混合物之pH值調整至大於1〇(在 籲 本實例中’得到的pH值約為10.5)。將玻璃/離子交換混合 物移入2公升之塑膠廣口容器。將該塑膠容器置於$ 〇 之 通風烘箱内2小時,每30分鐘用手稍微搖晃一下。離子交 換處理完成之後,使用帶有Whatman 541濾紙之布氏漏斗 過濾玻璃/離子交換混合物並收集離子交換_玻璃樣品,然 後使用約7_6公升之稀NH4〇H溶液清洗。稀nh4〇H溶液係 採用混合10公克之29.8 wt·%濃NHWH溶液與約3·8公升去 φ 離子水而製備。然後’在110 °C溫度下,將離子交換玻璃 樣品乾燥22小時。 第二步,對離子交換玻璃樣品進行還原處理,其中離子 父換樣在氫氣(H2)流速為2 L/hr之氫氣氣氛及3 〇q之、、w β 度下還原4小時。 採用ICP-AES進行樣品分析,鈀濃度之結果約為〇 1 wt.%。 實例6 大孔隙玻璃上之鉑 126432.doc -63 - 200836831 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。The pH was measured to be about 10.3. The mixture was then transferred to a 15 inch plastic wide mouthed container. The plastic container was placed in a ventilated oven at 501 for 2 hours. The mother was shaken slightly by hand for 30 minutes. After the ion exchange treatment was completed, the mixture was filtered using a Buchner funnel with Whatman 541 paper, a glass/ion exchange mixture, and washed with about 3.8 liters of deionized water. Then, the ion exchange glass sample was dried at a temperature of 110 ° C for 22 hours. The third step is to reduce the ion-exchanged glass, wherein the ion-exchanged glass is first calcined in an air atmosphere at an air flow rate of 2 L/hr and at a temperature of 300 ° C for 2 hours, and then at a hydrogen (h 2 ) flow rate of 2 L / The hydrogen (H2) atmosphere of hr was reduced at a temperature of 300 ° C for 4 hours. The sample was analyzed by inductively coupled plasma-atomic emission spectroscopy (ICP-AES) and the palladium concentration was about 0.098 wt.%. Example 2 Palladium on Macroporous Glass A macroporous sodium foam #5 glass sample produced by Dennert Poraver, a glass bead having an average diameter of about 40 to 125 microns, was obtained. In the first step, the macroporous glass sample 126432.doc -58 - 200836831, which was received as received and not calcined, was subjected to acid leaching treatment. Approximately 25 grams of macroporous glass and 3 liters of 5·5 to % of nitric acid were placed in a 4 liter plastic wide mouth container. Place the plastic container in a 30 C ventilated oven for 3 minutes, shake it slightly by hand every 1 minute. After processing the ingredients, filter the sample using a Buchner funnel with Whatman 541 filter: paper. Wash with approximately 7.6 liters of deionized water. The acid immersed sample was then dried for 22 hours at a temperature of uo °c. In the second step, the acid-impregnated macroporous glass is subjected to ion exchange (IEX) treatment. In this example, 80 ml of oi was used as a .% palladium solution for the ion exchange (palladium solution) using dichlorotetramethylene palladium [pd(NH仏](ci) 2 ). 4 gram of macroporous glass was added to the ion. Exchange the solution (, glass/ion exchange of this compound). Measure the value of 卩11 of the glass/ion exchange mixture and measure about 8.1. Then, transfer the mixture into a 15 liter plastic wide-mouth container. The plastic container was placed in a 5 (TC ventilated oven for 2 hours, shaken by hand every 3 minutes. After the ion exchange treatment was completed, filter the glass/ion exchange mixture using a Buchner funnel with Whatman 541 filter paper, and use Approximately 3.8 liters of deionized water was cleaned. Then, at 11 Torr (the temperature of the ion exchange glass sample was dried for 22 hours. The third step, the ion exchange glass was reduced, wherein the ion exchange glass was first at an air flow rate of 2 The air atmosphere of L/hr and the temperature of 300 ° C were satin-sintered for 2 hours, and then reduced under a nitrogen gas atmosphere of 2 L/hr at a flow rate of 2 L/hr and a temperature of 300 ° C for 4 hours. Sample analysis, results of saturating concentration 0.045 wt.% 〇Example 3 126432.doc 59- 200836831 Palladium on Porous Ion Exchanged Porous Glass Obtains a sample of macroporous soda sap from Born, made by Dennert Poraver, a glass with an average diameter of about 40 to 125 microns. The first step is to perform acid leaching on the macroporous glass sample received as received and uncalcined. Place about 50 grams of macroporous glass and 4 liters of 5.5 wt.% nitric acid in a 4 liter glass beaker. Mechanically agitate at a temperature of 300 to 500 rpm at 90 ° C for 2 hours using a stainless steel paddle mixer. After the acid leaching process, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and used approximately 7.6 liters. The ion-washed water is washed. Then, the acid-impregnated sample is dried for 22 hours at a temperature of 11 ° C. The second step is to carry out Na + - counter ion exchange on the acid-impregnated macroporous glass (&quot;Na- BIXn) Treatment. Mix the acid leached sample obtained in the first step with 4 liters of 3 mol/L sodium chloride (NaCl) solution (&quot;glass/sodium chloride mixture"). Measure glass/NaCl mixture pH value. , about 40 wt.% of tetrapropylammonium hydroxide was added dropwise continuously, and the pH of the glass/NaCl mixture was adjusted to be greater than 1 Torr (in this example, the obtained pH was about 10.5). Then, The glass/NaCl mixture was transferred to a 4 liter glass beaker and heated at 50 ° C for 4 hours while stirring at 300 to 500 rpm using a stainless steel paddle mixer. After Na-BIX treatment was completed, the belt was used. Whatman 541 filter, paper Buchner funnel filter glass / chloride mixture and collect Na-BIX / glass samples, then rinse with about 7.6 liters of deionized water. The Na-BIX/glass sample was then dried for 22 hours at a temperature of 11 °C. In the third step, a second ion 126432.doc -60-200836831 exchange (&quot;ΙΕΧ·2&quot;) treatment was performed on the Na-BIX/large pore glass sample. In the present example, 3 liters of a palladium solution of ruthenium ruthenium (1 wt.%) was prepared for ion exchange ("IEX_2 solution") using [Pd(NH3)4](Cl)2. Add 35 grams of macroporous glass to the ΙΕχ_2 solution (&quot;glass/ΙΕΧ-2 mixture"). Measure the ρΗ value of the glass/ion exchange mixture to measure about 8.1. Then 'move the mixture into 2 liters of glass. Heat in a beaker and heat at 50 °C for 4 hours while stirring at 300 to 500 rpm using a stainless steel forcing mixer. After the ion exchange treatment, use a Buchner funnel transition glass with Whatman 541 filter paper / The ion exchange mixture was washed with about 7.6 liters of deionized water. Then, the ion exchange glass sample was dried for 22 hours at a temperature of 11 ° C. In the fourth step, the IEX-2 glass sample was subjected to reduction treatment, in which the sample was The hydrogen (H2) flow rate was 2 L/hr of hydrogen atmosphere and the temperature was reduced for 4 hours at 300. The sample analysis by ICP-AES showed that the concentration of Ba was about 〇wt·%. Example 4 On the large-porosity glass Obtained a macroporous foamed soda lime glass sample produced by Dennert Poraver, a glass bead with an average diameter of about 40 to 125 microns. The first step is for macropores that are received as received and not calcined. The glass samples were subjected to acid leaching. Approximately 20 grams of macroporous glass and 4 liters of 55 wt% nitric acid were placed in a 4 liter glass beaker using a stainless steel paddle mixer at a speed of 300 to 500 rpm at 9 ( Mechanical stirring was carried out for 2 hours under rc. After the acid leaching treatment was completed, the sample was filtered using a Buchblad funnel with Whatman 541 filter paper 126432.doc -61·200836831 and washed with about 7.6 liters of deionized water. At the temperature, the acid leached sample was dried for 22 hours. The second step was to perform ion exchange treatment on the (four) treated macroporous glass sample. In this example, tetrachlorotetramine (tetra) cholesteric] (6)) 2 was prepared. 3 liters of 0.01 wt.% palladium solution for ion exchange (&quot; ΙΕχ solution will be similar to the large (four) glass plus human ion exchange solution ("glass / ion exchange mixture"). The value of the ion exchange mixture is 11. If necessary, about 29.8 wt.% of ammonium cerium oxide (ΝΗ4〇η) is continuously added dropwise, and the pH of the mixture is adjusted to be greater than 1 〇 (the ρ 得到 value obtained in this example) About 10.8). Then, will The glass/ion exchange mixture was transferred to a 4 liter glass beaker and heated at 5 (TC temperature for two hours while stirring at 300 to 500 rpm using a stainless steel paddle mixer. After the ion exchange treatment was completed, the belt was used. The Buchner funnel filter glass/ion exchange mixture with Whatman 541 filter paper was washed with about 7.6 liters of deionized water and the ion exchange glass samples were dried for 22 hours at 11 〇C. In the third step, the ion-exchanged glass sample was subjected to a reduction treatment in which the sample was reduced in a hydrogen atmosphere at a helium (Hi) flow rate of 2 L/hr and at a temperature of 300 ° C for 4 hours. Sample analysis by ICP-AES was performed with a concentration of approximately 〇 047 wt·%. Example 5 Palladium on Large Porosity Glass A large pore foamed sodium bismuth glass material produced by Dennert Poraver was obtained. 126432.doc • 62- 200836831 The product was a glass bead having an average diameter of about 40 to 125 microns. In the first step, ion exchange treatment is performed on a large pore glass sample which is received as it is, which is not calcined and which has not been acid leached. In the present example, 1 · 5 liters of 〇·〇〇 1 wt· was prepared using palladium hydroxide (Pd(NH3)4](OH)2. /. The palladium solution is used for ion exchange (&quot;IEX solution&quot;). Approximately 8 grams of macroporous glass was added to the ion exchange glass/ion exchange mixture in the ion exchange solution,&apos;). Measuring glass/ion exchange • pH of the mixture. About 29 8 wt% of ammonium hydroxide (NH 4 〇 H) was continuously added dropwise as needed, and the pH of the mixture was adjusted to be greater than 1 Torr (a pH obtained in the present example was about 10.5). Transfer the glass/ion exchange mixture into a 2 liter plastic wide mouth container. Place the plastic container in a ventilated oven for 2 hours and shake it slightly by hand every 30 minutes. After the ion exchange treatment was completed, the glass/ion exchange mixture was filtered using a Buchner funnel with Whatman 541 filter paper and the ion exchange glass sample was collected, and then washed with a solution of about 7-6 liters of a dilute NH4 〇H solution. The dilute nh4〇H solution was prepared by mixing 10 g of a 29.8 wt·% concentrated NHWH solution with about 3·8 liters of de-ionized ion water. The ion exchange glass samples were then dried for 22 hours at a temperature of 110 °C. In the second step, the ion-exchanged glass sample was subjected to a reduction treatment in which the ion parent was exchanged for 4 hours under a hydrogen atmosphere of hydrogen (H2) flow rate of 2 L/hr and 3 〇q, w β degree. Sample analysis was performed using ICP-AES, and the palladium concentration was about 〇 1 wt.%. Example 6 Platinum on Macroporous Glass 126432.doc -63 - 200836831 A sample of macroporous foamed soda lime glass produced by Siscor, a glass bead having an average diameter of about 45 to 75 microns, was obtained.

第步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約49·61公克大孔隙玻璃及4公升5 5 wt·%之硝酸各自置入4公升之塑膠廣口容器内。將該塑膠 容器置於90。〇之通風烘箱内2小時,每3〇分鐘用手稍微搖 晃一下。酸浸處理完成之後,使用帶有Whatman 541濾紙 之布氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。 然後,在11 o°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氯四胺鉑[Pt(NH3)4](ci)2製備工 公升〇·16 wt·%之鉑溶液用於離子交換(”ΙΕχ溶液,,)。將約 15.86公克經酸浸之大孔隙玻璃加入離子交換溶液中(&quot;玻璃/ 離子交換混合物”)。量測玻璃/離子交換混合物之ρΗ值。 根據需要’以約40%之氫氧化四丙基銨調整pH值。連續添 加氫氧化四丙基鈹,將pH值調整至大於ι〇(在本實例中, 得到的pH值約為11.83)。將玻璃/離子交換混合物移入斗公 升之塑膠廣口容器。將該塑膠容器置於5〇。〇之通風烘箱内 2小時,且每30分鐘用手稍微搖晃_下。離子交換處理完 成之後,使用帶有Whatman 541渡紙之布氏漏斗過濾玻璃/ 離子交換混合物,並使用約7.6公升去離子水清洗。然 後,在11〇t:溫度下,將離子交換破璃樣品乾燥22小時。… 採用ICP-AES進行樣品分析,在白濃度之結果約為… wt.%。 -64- 126432.doc / 200836831 實例7 大孔陈玻璃上之顧 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約50.37公克大孔隙玻璃及4公升5.5 wt·%之硝酸置入4公升之塑膠廣口容器内。將該塑膠容器 置於90 C之通風烘箱内2小時,每3〇分鐘用手稍微搖晃_ 下。酸浸處理完成後,傾析出溶液,然後使用約7·6公升 去離子水清洗固態物。然後,在! 1〇〇c之溫度下,將酸浸 後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氯四胺鉑[Pt(NH3)4](Cl)2製備1 公升0.18 wt·%之鉑溶液用於離子交換(”ΙΕχ溶液。。將約 41.79公克經酸浸之大孔隙玻璃加入離子交換溶液中玻璃/ 離子父換混合物”)。玻璃/離子交換混合物之1)11值測得為 6·8 ’在本μ例中’ ρΗ值並未調整。將玻璃/離子交換混合 物移入4公升之塑膠廣口容器。將該塑膠容器置於9〇。〇之 通風烘箱内4小時,每3〇分鐘用手稍微搖晃一下。離子交 換處理完成後,傾析出溶液,然後使用約7·6公升去離子 水清洗固悲物。然後,在u〇〇c温度下,將離子交換玻璃 樣品乾燥22小時。 採用ICP-AES進行樣品分析,鉑濃度之結果約為〇13 wt·% 〇 126432.doc -65 - 200836831 實例8 大孔隙玻璃上之鈀 獲得由Siscor生產之大孔隙泡沫鈉I弓玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約20公克之大孔隙玻璃及4公升5.5 wt.0/〇 之硝酸置入4公升之玻璃燒杯内。使用一台不鏽鋼槳式擾 拌機以300至500 rpm之速度在90 °C下進行機械攪拌2小 時。酸浸處理完成之後,使用帶有Whatman 541濾、紙之布 氏漏斗過濾樣品,並使用約7 · 6公升去離子水清洗。然 後,在110°C之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氣四胺鈀[Pd(NH3)4](Cl)2製備3 公升0·01 wt·%之鈀溶液用於離子交換(”ιΕΧ溶液”)。將約 18公克經酸浸之大孔隙玻璃加入離子交換溶液中(”玻璃/離 子交換混合物”)。量測玻璃/離子交換混合物之pH值。根 據需要,連續逐滴添加約29.8 wt·%之氫氧化錢(nh4〇H), 將該混合物之pH值調整至大於1〇(在本實例中,得到的pH 值約為10.78)。然後,將該玻璃/離子交換混合物移入4公 升之玻璃燒杯中,且在5(TC溫度下加熱兩小時,同時使用 一台不鏽鋼槳式擾拌機以3〇〇至500 rpm之速度擾拌。離子 父換處理完成之後,使用帶有Whatman 541濾紙之布氏漏 斗過濾破璃/離子交換混合物,並使用約7·6公升去離子水 清洗。然後,在1HTC溫度下,將離子交換玻璃樣品乾燥 126432.doc -66- 200836831 22小時。 第三步,對離子交換玻璃樣品進行還原處理,其中樣品 在氫氣(HO流速為2 L/hr之氫氣氣氛及3〇0°C之溫度下還原 4小時。 採用ICP-AES進行樣品分析,鈀濃度之結果約為〇 〇47 wt·%。 實例9 大孔隙玻璃上之鈀 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 進行酸浸處理。將約49.61公克大孔隙玻璃及4公升5·5 wt·%之硝酸各自置入4公升之塑膠廣口容器内。將該塑膠 容器置於90°C之通風烘箱内2小時,每30分鐘用手稍微搖 晃一下。酸浸處理完成之後’使用帶有Whatman 54 1濾紙 之布氏漏斗過濾樣品’並使用約7 · 6公升去離子水清洗。 然後,在110°c之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本實例中,使用二氫氧四胺|巴[Pd(NH3)4](〇H)2製 備1公升0.0003 wt·%之把溶液用於離子交換(&quot;IEX溶液&quot;)。 將約15.06公克經酸浸之大孔隙玻璃加入離子交換溶液中(&quot;玻 璃/離子交換混合物”)。量測玻璃/離子交換混合物之pH 值。根據需要,連續逐滴添加約29·8 wt·%之氫氧化銨 (ΝΙί4ΟΙ·Ι),將該混合物之pH值調整至大於1()(在本實例 126432.doc -67- 200836831 中,得到的pH值約為10.2)。將玻璃/離子交換混合物移入4 公升之塑膠廣口容器。將該塑膠容器置於5(TC之通風烘箱 内2小時,每30分鐘用手稍微搖晃一下。離子交換處理完 成之後,使用帶有Whatman 541濾紙之布氏漏斗過濾樣 品,並使用約7.6公升稀NH4〇H溶液清洗。稀NH4〇H溶液 • 係採用混合10公克之29.8 wt·%濃ΝΗβΗ溶液與約3.8公升 • 去離子水而製備。然後,在110°C溫度下,將離子交換玻 璃樣品乾燥22小時。 _ 採用ICP-AES進行樣品分析,鈀濃度之結果約為〇〇165 wt·%。採用如(下面)實例chj所述之掃描透射電子顯微鏡 (STEM)分析對樣品之一部分進行檢測,結果表明,鈀顆 粒(對比度較亮的點)一般散布在與孔隙壁表面距離小於或 等於約30奈米之範圍内(亦即,相對於對比度相對較亮之 基質周圍材料區域,對比度較暗之陰影區域的周界)。 實例10 Φ 大孔隙玻璃上之鎢 獲得由Siscor生產之大孔隙泡沫鈉鈣玻璃樣品,即平均 直徑約為45至75微米之玻璃珠。 • 第一步,對於按原樣接收、未經煅燒之大孔隙玻璃樣品 • 進行酸浸處理。將約20公克之大孔隙玻璃及4公升5.5 wt% 之硝酸置入4公升之玻璃燒杯内。使用一台不鏽鋼槳式授 拌機以300至500 rpm之速度在90。(:下進行機械攪拌2小 時。酸浸處理完成之後,使用帶有Whatman 541濾紙之布 氏漏斗過濾樣品,並使用約7·6公升去離子水清洗。然 126432.doc -68- 200836831 後,在110°C之溫度下,將酸浸後之樣品乾燥22小時。 第二步,對經酸浸處理之大孔隙玻璃樣品進行離子交換 處理。在本例中,用偏鎢酸銨(NH4)6H2W12O40 · ηΗ20製備 3公升0.05 wt.%之鎢溶液用於離子交換(&quot;IEX溶液”)。將約 18公克經酸浸之大孔隙玻璃加入離子交換溶液中(”玻璃/離 β 子交換混合物&quot;)。量測玻璃/離子交換混合物之pH值。根 . 據需要,連續逐滴添加約29.8 wt·%之氫氧化銨(NH4OH), 將該混合物之pH值調整至大於8。然後,將該玻璃/離子交 ® 換混合物移入4公升之玻璃燒杯中,且在50°C溫度下加熱 兩小時,同時使用一台不鏽鋼槳式攪拌機以300至500 rpm 之速度擾拌。離子交換處理完成之後,使用帶有Whatman 541濾紙之布氏漏斗過濾玻璃/離子交換混合物,並使用約 5公升去離子水清洗。然後,在110°C溫度下,將離子交換 玻璃樣品乾燥22小時。 第三步,對離子交換玻璃樣品進行煅燒處理,其中樣品 _ 在空氣流速為2 L/hr之空氣及500°C之溫度下煅燒4小時。 採用ICP-AES進行樣品分析,鎢濃度之結果預期約為 0.01 wt·% 〇 實例CH-1 分析方法re/XPS濺射,SARCNa, 等電點(IEP)及S.A.N2 -BET 或 S.A.Ki*_BET 測定 X射線光電子光譜學(XPS)濺射深度分布法 使用一台帶有1486.7 eV微聚焦單色化Α1 Κα X射線源的 PHI Quantum 200 Scanning ESCA Microprobe™ (Physical 126432.doc -69- 200836831In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching treatment. Approximately 49.61 grams of macroporous glass and 4 liters of 5 5 wt.% nitric acid were placed in a 4 liter plastic wide mouth container. Place the plastic container at 90. Shake it in your ventilated oven for 2 hours every 3 minutes. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, the acid immersed sample was dried at a temperature of 11 ° C for 22 hours. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In this example, a solution of platinum (16 wt. %) in platinum (Pt(NH3)4)(ci) 2 was prepared for ion exchange ("ΙΕχ solution,"). It will be about 15.86 g. The acid immersed macroporous glass is added to the ion exchange solution (&quot;glass/ion exchange mixture"). The pH value of the glass/ion exchange mixture was measured. The pH was adjusted as needed with about 40% tetrapropylammonium hydroxide. The tetrapropyl hydrazine hydroxide was continuously added to adjust the pH to be greater than ι (in the present example, the pH obtained was about 11.83). Move the glass/ion exchange mixture into the plastic wide-mouth container of Douglas. Place the plastic container at 5 inches. The ventilated oven was simmered for 2 hours and shaken slightly by hand every 30 minutes. After the ion exchange treatment was completed, the glass/ion exchange mixture was filtered using a Buchner funnel with Whatman 541 paper and washed with about 7.6 liters of deionized water. The ion exchange glass sample was then dried for 22 hours at 11 Torr: temperature. ... Sample analysis by ICP-AES, the result in white concentration is about... wt.%. -64- 126432.doc / 200836831 Example 7 Macroporous Glass Glass A large pore foamed soda lime glass sample produced by Siscor, a glass bead having an average diameter of about 45 to 75 microns, was obtained. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 50.37 grams of macroporous glass and 4 liters of 5.5 wt.% nitric acid were placed in a 4 liter plastic wide mouth container. The plastic container was placed in a 90 C ventilated oven for 2 hours, and shaken slightly by hand every 3 minutes. After the acid leaching treatment was completed, the solution was decanted, and then the solid matter was washed with about 7.6 liters of deionized water. Then, at! The acid immersed sample was dried for 22 hours at a temperature of 1 〇〇c. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In this example, 1 liter of a 0.18 wt.% platinum solution was prepared for the ion exchange ("ΙΕχ solution" using tetrachlorotetramine platinum [Pt(NH3)4](Cl)2. About 41.79 grams was acid leached. Large pore glass is added to the glass/ion parent exchange mixture in the ion exchange solution"). The 1) 11 value of the glass/ion exchange mixture was measured to be 6.8 ′. In this μ case, the ρ Η value was not adjusted. The glass/ion exchange mixture was transferred to a 4 liter plastic wide mouth container. Place the plastic container at 9 inches. 4 4 4 hours in a ventilated oven, shake it slightly with your hands every 3 minutes. After the ion exchange treatment is completed, the solution is decanted, and then the solid obscurant is washed with about 7.6 liters of deionized water. The ion exchange glass sample was then dried for 22 hours at a temperature of u〇〇c. Sample analysis by ICP-AES, the platinum concentration was about wt13 wt·% 〇126432.doc -65 - 200836831 Example 8 Palladium on macroporous glass obtained a large pore foamed sodium I bow glass sample produced by Siscor, ie Glass beads having an average diameter of about 45 to 75 microns. In the first step, the macroporous glass sample received as it is and not calcined is subjected to acid leaching. Approximately 20 grams of macroporous glass and 4 liters of 5.5 wt.0/〇 of nitric acid were placed in a 4 liter glass beaker. Mechanical agitation at 90 °C for 2 hours using a stainless steel paddle stirrer at 300 to 500 rpm. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter, paper, and washed with about 7.6 liters of deionized water. Then, the acid immersed sample was dried at a temperature of 110 ° C for 22 hours. In the second step, the acid-impregnated macroporous glass sample is subjected to ion exchange treatment. In the present example, 3 liters of a 0.011 wt% palladium solution was prepared for ion exchange ("Im solution") using dioxetamine palladium [Pd(NH3)4](Cl)2. About 18 grams of acid immersed macroporous glass was added to the ion exchange solution ("glass/ion exchange mixture"). The pH of the glass/ion exchange mixture was measured. About 29.8 wt% of hydrogen hydroxide (nh4〇H) was added dropwise as needed, and the pH of the mixture was adjusted to be greater than 1 Torr (in this example, the obtained pH was about 10.78). The glass/ion exchange mixture was then transferred to a 4 liter glass beaker and heated at 5 (TC temperature for two hours while using a stainless steel paddle stirrer to scramble at a speed of 3 to 500 rpm. After the ion parent treatment was completed, the glass/ion exchange mixture was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. Then, the ion exchange glass sample was dried at 1HTC temperature. 126432.doc -66- 200836831 22 hours. The third step is to reduce the ion-exchanged glass sample, wherein the sample is reduced in hydrogen gas (hydrogen atmosphere with a flow rate of 2 L/hr and a temperature of 3 〇 0 ° C for 4 hours). Sample analysis by ICP-AES, the palladium concentration results in about wt47 wt.%. Example 9 Palladium on macroporous glass obtained a large pore foamed soda lime glass sample produced by Siscor, ie an average diameter of about 45 to 75 micron glass beads. In the first step, the macroporous glass sample received as received and not calcined is subjected to acid leaching treatment. About 49.61 grams of macroporous glass and 4 liters of 5·5 wt% of nitric acid are placed separately. 4 liters of plastic wide-mouth container. Place the plastic container in a ventilated oven at 90 ° C for 2 hours, shake it slightly by hand every 30 minutes. After acid leaching, 'Use Brinell with Whatman 54 1 filter paper The funnel filters the sample' and rinses with about 7.6 liters of deionized water. Then, the acid immersed sample is dried for 22 hours at a temperature of 110 ° C. The second step is to treat the acid leached macroporous glass sample. Ion exchange treatment was carried out. In this example, 1 liter of 0.0003 wt% of a solution was prepared for ion exchange using dihydrooxytetramine|bar [Pd(NH3)4](〇H)2 (&quot;IEX solution&quot ;). Add about 15.06 grams of acid-impregnated macroporous glass to the ion exchange solution (&quot;glass/ion exchange mixture). Measure the pH of the glass/ion exchange mixture. Add about 29 drops as needed. 8 wt.% ammonium hydroxide (ΝΙί4ΟΙ·Ι), the pH of the mixture was adjusted to be greater than 1 () (in this example 126432.doc -67-200836831, the pH obtained is about 10.2). The glass/ion exchange mixture was transferred to a 4 liter plastic wide-mouth container. The plastic container was placed in a 5 (TC ventilated oven for 2 hours and shaken slightly by hand every 30 minutes. After the ion exchange treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper, and approximately 7.6 liters of dilute NH4 was used. 〇H solution cleaning. Dilute NH4〇H solution • Prepared by mixing 10 g of 29.8 wt·% concentrated ΝΗβΗ solution with about 3.8 liters • deionized water. Then, the ion-exchanged glass sample was dried at a temperature of 110 ° C for 22 hours. _ Sample analysis by ICP-AES, the result of palladium concentration is about 〇〇165 wt.%. A portion of the sample was examined by scanning transmission electron microscopy (STEM) analysis as described in Example (j) below, and the results showed that the palladium particles (higher contrast points) were generally spread at a distance of less than or equal to about 30 from the surface of the pore wall. Within the range of nanometers (i.e., the perimeter of the shaded area with a darker contrast relative to the region of the material surrounding the relatively bright contrast). Example 10 Φ Tungsten on Large Porous Glass A sample of macroporous foamed soda lime glass produced by Siscor, i.e., glass beads having an average diameter of about 45 to 75 microns, was obtained. • The first step is to perform acid leaching on large pore glass samples that are received as received and that have not been calcined. Approximately 20 grams of macroporous glass and 4 liters of 5.5 wt% nitric acid were placed in a 4 liter glass beaker. Use a stainless steel paddle mixer at 90 to 500 rpm. (: Mechanical agitation for 2 hours. After the acid leaching treatment was completed, the sample was filtered using a Buchner funnel with Whatman 541 filter paper and washed with about 7.6 liters of deionized water. After 126432.doc -68-200836831, The acid immersed sample was dried for 22 hours at a temperature of 110 ° C. In the second step, the acid leached macroporous glass sample was subjected to ion exchange treatment. In this example, ammonium metatungstate (NH 4 ) was used. 6H2W12O40 · ηΗ20 Prepare 3 liters of 0.05 wt.% tungsten solution for ion exchange (&quot;IEX solution). Add about 18 grams of acid-impregnated macroporous glass to the ion exchange solution ("glass/iso-β-exchange mixture &quot;). Measure the pH of the glass/ion exchange mixture. Root. Add about 29.8 wt% ammonium hydroxide (NH4OH) continuously as needed, and adjust the pH of the mixture to more than 8. Then, The glass/ion exchange mixture was transferred to a 4 liter glass beaker and heated at 50 ° C for two hours while using a stainless steel paddle mixer to scramble at 300 to 500 rpm. Ion exchange was completed. After making The Buchner funnel filter glass/ion exchange mixture with Whatman 541 filter paper was washed with about 5 liters of deionized water. Then, the ion exchange glass sample was dried at 110 ° C for 22 hours. The glass sample was exchanged for calcination, wherein the sample _ was calcined for 4 hours at an air flow rate of 2 L/hr of air and at a temperature of 500 ° C. Sample analysis by ICP-AES, the result of tungsten concentration is expected to be about 0.01 wt·% 〇Example CH-1 Analytical method re/XPS sputtering, SARCNa, isoelectric point (IEP) and SAN2 -BET or SAKi*_BET Determination of X-ray photoelectron spectroscopy (XPS) sputtering depth distribution method with one 1486.7 eV microfocus monochromator Α1 Κα X-ray source of PHI Quantum 200 Scanning ESCA MicroprobeTM (Physical 126432.doc -69- 200836831

Electronics公司)獲得xps濺射深度分布。儀器具有雙中和 能力,在光譜採集過程中,利用低能電子及陽離子提供電 荷補償。 XPS譜通常在以下條件下測得:Electronics) obtained the xps sputtering depth profile. The instrument has a dual neutralization capability that provides charge compensation using low-energy electrons and cations during spectral acquisition. The XPS spectrum is usually measured under the following conditions:

-X射線束直徑10-200 μπι - X射線束功率2-40 W , -樣品分析區10-200 μπι -電子發射角度與樣品法線呈45。 _ 所有XPS譜及濺射深度分布均在室溫下記錄,不對樣品 進行預處理,但將樣品置於XPS儀器真空環境中的情況除 外。 藉由交替幾個週期的樣品表面光譜採集,然後在每個週 期對樣品表面進行15至30秒的2 kV Ar+濺射以清除表面材 料來生成錢射殊度分布。使用一層已知厚度的石夕薄膜校準 濺射深度速率。 _ Pd&amp;Si原子濃度值之獲取方法為,取Pd 3d3/2及Si 2p之 峰面積並針對其各自的原子靈敏度因數及分析儀傳輸函數 進行修正。 * 熟習XPS分析技術者應瞭解,濺射深度參數的測定既受 • 人為不確疋度亦受機械不確定度之影響,兩者結合可能對 採用XPS濺射深度分布技術測定之濺射深度的每個報告值 造成約25%之不確定度。因此,該不確定度表現在圖 所示之深度值上。該不精確在整個xps分析技術中都很普 遍’但’對於在本文所揭示之催化活性區域的平均厚度及 126432.doc •70- 200836831 其他材料屬性來說,該不精確不足以妨礙對本文所述之觸 媒組合物進行區分,亦不會影響該等組合物與其他未在本 文描述及主張的組合物進行區分。 透射電子顯微鏡(TEM)分析法 透射電子顯微鏡(TEM)樣品檢測使用在300 kV加速電壓 下工作的JEOL 3000F場發射掃描透射電子顯微鏡(STEM) 儀器。該儀器裝有牛津儀器公司(Oxford Instruments)的 Inca X射線光譜儀系統,使用能量色散光譜儀執行局部化 學分析。 樣品之製備首先將樣品材料嵌入熟習TEM分析技術者所 知的標準環氧包埋劑中。固化後,使用超薄切片機將環氧 包埋的樣品材料切割為約8 0奈米厚的切片。切片收集在薄 膜有孔碳載體上,不需要進一步加工,適當定位於上述 STEM儀器的電子束場中,以供檢測及分析。 熟習TEM分析技術者應瞭解,使用TEM分析方法測定目 標分析物的位置及關心區域相對於基質表面的平均厚度既 受人為不確定度之影響,亦受機械不確定度之影響,取決 於樣品之圖像解析度、目標分析物之物理化學特性及樣品 形態等因素,可能造成約±20%的TEM垂直深度量測結果 (相對於某個具體參照點)不確定度及約±5%之側位量測結 果(相對於某個具體參照點)不確定度。因此,如圖1所看到 的,該不確定度表現在測得的催化成分相對於樣品基質表 面的距離上。該不精確在整個TEM分析過程中都很普遍, 但並不足以妨礙觸媒組合物之間的區分。 126432.doc -71- 200836831 SARC^測定、SAm及相關統計分析 由於以上讨論之原因,麵的矣 鈉的表面積變化率(&quot;SARC心”)報 告為NaOH滴定液體積之比率。 根據上述說‘程式,測定以下實例中給定之每個樣 品之SAR心藉由配製3·5 M Naa溶液(亦即在⑼毫升去 離子水中加人30公克NaC1)製備—份空樣,1不含基質樣 品。但,為了解決SA心實驗程序中之統計上的土變显 性,應滴定四份獨立的空樣,且使用獲得V初及〜15(亦 即,H)所用之規定濃度(本實例中為〇〇ι n)滴定量平 均值來調整(亦即修正)久其# 〇 、 l )各基貝樣品SARc勤測定所使用之滴 定液體積0根據盘上诚ς; A R Γ 、日j 像,、上迷SARC-測定相同的程序調整空樣 pH值並滴定空樣,但同樣不含基質。 在以下提供的各空樣品及其各自的平均值及標準偏差 (或v總的σ)分析測試結果表格中報μ樣滴定量的統計分 析同樣,亦報告了由於各自V總所引起之相應於各滴定 量V初、V5、Vl0及Vl5的固有統計上之波動。從統計學的角 度,使用統計t分布,在平均值附近,所指定之信賴區間 以外的數值可靠’並非源於實驗方法自身固有偏差的確定 度達到95%。所以’對於空樣平均值附近信賴區間内的基 質樣品測得的V初及Vt值被視為在統計學上與空樣沒有差 別。因此,此類樣品不計算SARC^值。 等電點(IEP)測定 根據以下私式測疋下面給定之各樣品的等電點(&quot;IE?&quot;)。 使用帶 pH mv/0RP模組的 Mettler T〇led〇 SevenMuhi表,配 126432.doc -72· 200836831 合Mettler Toledo INLAB 413 pH複合電極進行IEP量測。在 所關心的整個ΙΕΡ範圍内,利用pH值為2、4、7及10的標準 pH值緩衝溶液校準儀錶。使用足以使樣品達到初濕狀態的 一定量16 ΜΩ去離子水(在約25°C下)潤濕樣品,測定每份 樣品的IEP,由此可產生比較稠密的漿或糊狀混合物。而 該初濕狀態可使玻璃電極及其參考電極觸面與接觸受測固 體樣品的液體(在本實例中為漿或糊狀混合物)之間達成液 體接觸。根據樣品的形態(例如玻璃微纖維、粒狀粉末、 切短纖維等)及其多孔性(若有)程度,該程序需要不同的水 量。但在所有情況下,添加的水量應該僅僅足以使充分的 液體與玻璃電極及參考電極觸面接觸。換句話說,對受测 樣品加水應該儘可能避免使樣品超過初濕狀態。在所有情 况下使用電極頭,用手將固體樣品與去離子水(添加用於 產生初濕)混合,直至測得的pH值穩定,然後從儀錶讀取 所得pH值。 N2 BET或Kr BET表面積(S.A·)測定 根據以上提及之ASTM程序,對以下給定之每份樣品適 當進行S _ A .N2-BET或S · Α ·ΚιΙ-ΒΕΤ測定。如根據以上更充分之 討論,對於較高的表面積量測值(例如約3至6 m2/g),按照 ASTM D3 663-03所述之方法,N2 BET很可能為較佳的表面 積量測技術。而對於較低的表面積量測值(例如,&lt; 約3 m2/g),按照ASTM D4780-95 (”S.A.um&quot;)所述之方法,Kr BET可能為較佳的表面積量測技術。 126432.doc -73- 200836831 用於修正SARCNp^定值的SARCNa空樣量測及統計分析 樣品號 稀 NaOH 滴定液 S.A.N2.BET (m2/g) 在NaOH滴定中,使pH值從t0(V初)時4·0的初始值 調整至9.0,並在ts、t10及tls(V^ls)時將pH值保持 在9.0所需的滴定液體積(毫升) V旗= V相+V5至15 濃度(N) V勒 〇分鐘 v5 5分鐘 Vio 10分鐘 v15 15分鐘 Vs^is 之和 空樣A 0.01 不適用 1.5 0.3 0.1 0.2 0.6 2.1 空樣B 0.01 不適用 2.2 0.1 0.1 0.2 0.4 2.6 空樣C 0.01 不適用 2.4 0.1 0.1 0.1 0.3 2.7 空樣D 0.01 不適用 2.2 0.1 0.2 0.1 0.4 2.6 空樣平均值 0.01 不適用 2.075 0.15 0.125 0.15 0.325 2.5 空樣標準偏差 0.01 不適用 0.3947 0.1 0.05 0.0577 不適用 0.2708 空樣95% 信賴區間 1.45-2.70 2.07-2.93- X-ray beam diameter 10-200 μπι - X-ray beam power 2-40 W, - Sample analysis area 10-200 μπι - The electron emission angle is 45 with the sample normal. _ All XPS spectra and sputter depth profiles were recorded at room temperature without pre-treatment of the sample, except when the sample was placed in a vacuum environment of the XPS instrument. The carbon intensity distribution is generated by alternately collecting the sample surface spectra for several cycles and then subjecting the sample surface to 2 kV Ar+ sputtering for 15 to 30 seconds per cycle to remove the surface material. The sputter depth rate is calibrated using a layer of known thickness of the stone. The _Pd&amp;Si atomic concentration value is obtained by taking the peak areas of Pd 3d3/2 and Si 2p and correcting their respective atomic sensitivity factors and analyzer transfer functions. * Those familiar with XPS analysis should understand that the measurement of the sputter depth parameter is affected by both the inaccuracy and the mechanical uncertainty. The combination of the two may be the sputtering depth measured by the XPS sputtering depth profile technique. Each reported value caused an uncertainty of approximately 25%. Therefore, the uncertainty is expressed in the depth value shown in the figure. This inaccuracy is common throughout the xps analysis technique 'but' for the average thickness of the catalytically active regions disclosed herein and for other material properties of 126432.doc •70-200836831, this inaccuracy is not sufficient to hinder this article. The differentiation of the described catalyst compositions does not affect the differentiation of such compositions from other compositions not described and claimed herein. Transmission Electron Microscopy (TEM) Analysis Transmission electron microscopy (TEM) samples were measured using a JEOL 3000F field emission scanning transmission electron microscope (STEM) instrument operating at 300 kV accelerating voltage. The instrument is equipped with an Oxford Instruments Inca X-ray spectrometer system that performs a local chemical analysis using an energy dispersive spectrometer. Sample Preparation The sample material is first embedded in a standard epoxy embedding agent known to those skilled in TEM analysis. After curing, the epoxy-embedded sample material was cut into approximately 80 nm thick sections using an ultramicrotome. The sections were collected on a thin film porous carbon support and were not properly processed and properly positioned in the electron beam field of the above STEM apparatus for detection and analysis. Those familiar with TEM analysis should understand that the use of TEM analysis to determine the position of the target analyte and the average thickness of the region of interest relative to the surface of the substrate are both subject to human uncertainty and mechanical uncertainty, depending on the sample. Factors such as image resolution, physicochemical properties of the target analyte, and sample morphology may result in an uncertainty of about ±20% of the TEM vertical depth measurement (relative to a specific reference point) and about ±5% of the side The measurement results (relative to a specific reference point) uncertainty. Thus, as seen in Figure 1, the uncertainty is expressed in terms of the measured distance of the catalytic component relative to the surface of the sample substrate. This inaccuracy is common throughout the TEM analysis process, but is not sufficient to interfere with the differentiation between the catalyst compositions. 126432.doc -71- 200836831 SARC^ Determination, SAm and related statistical analysis For the reasons discussed above, the surface area change rate of the surface sodium (&quot;SARC heart) is reported as the ratio of the volume of the NaOH titrant. Procedure, the SAR of each sample given in the following examples was determined by preparing a 3·5 M Naa solution (i.e., adding 30 g of NaC1 in (9) ml of deionized water) to prepare a blank sample, 1 containing no matrix sample. However, in order to solve the statistical soil variability in the SA heart test procedure, four independent empty samples should be titrated, and the specified concentration used to obtain V initial and ~15 (ie, H) is used (in this example 〇〇ι n) The average value of the titer is adjusted (that is, corrected) for a long time. #, l) The volume of the titration solution used for the determination of the SARc sample of each of the base samples is based on the sincerity of the plate; AR Γ , 日 j像, The same procedure was used to adjust the pH of the empty sample and titrate the empty sample, but also did not contain the matrix. The empty sample and its respective mean and standard deviation (or v total σ) analysis test are provided below. The statistical analysis of the μ sample titer in the results table is also the same. The inherent statistical fluctuations corresponding to the initial V, V5, V10 and Vl5 of each titer due to the respective V totals are also reported. From a statistical point of view, the statistical t distribution is used, near the mean, specified The reliability of the value outside the confidence interval is not due to the fact that the inherent deviation of the experimental method itself is 95%. Therefore, the V initial and Vt values measured for the matrix sample in the confidence interval near the average of the empty sample are regarded as statistical. There is no difference between the upper and the empty samples. Therefore, the sample does not calculate the SARC value. The isoelectric point (IEP) determines the isoelectric point (&quot;IE?&quot;) of each sample given below according to the following private method. Mettler T〇led〇SevenMuhi watch with pH mv/0RP module, with 126432.doc -72· 200836831 and Mettler Toledo INLAB 413 pH composite electrode for IEP measurement. Use pH value for the entire range of enthalpy of interest Standard pH buffer solution calibration instruments for 2, 4, 7 and 10. Wet samples with a quantity of 16 Μ Ω deionized water (at approximately 25 ° C) sufficient to bring the sample to its incipient state, and determine the IEP for each sample. , which can be produced A denser slurry or paste mixture, and the incipient wet state allows liquid contact between the glass electrode and its reference electrode contact surface and the liquid (in this example, a slurry or paste mixture) that contacts the solid sample under test. Depending on the morphology of the sample (eg glass microfibers, granulated powder, chopped fibers, etc.) and its porosity (if any), the procedure requires a different amount of water. However, in all cases, the amount of water added should only be sufficient to The liquid is in contact with the glass electrode and the reference electrode. In other words, adding water to the sample to be tested should avoid making the sample exceed the initial humidity as much as possible. In all cases, the electrode tip was used and the solid sample was mixed by hand with deionized water (added for generating incipient wetness) until the measured pH was stable, and the resulting pH was read from the meter. N2 BET or Kr BET surface area (S.A·) determination According to the ASTM procedure mentioned above, the S _ A . N2-BET or S · Α · Κ Ι Ι ΒΕΤ measurement is suitably performed for each of the samples given below. As discussed more fully above, for higher surface area measurements (eg, about 3 to 6 m2/g), N2 BET is likely to be the preferred surface area measurement technique according to the method described in ASTM D3 663-03. . For lower surface area measurements (e.g., &lt; about 3 m2/g), Kr BET may be a preferred surface area measurement technique as described in ASTM D4780-95 ("SAum&quot;). .doc -73- 200836831 SARCNa empty sample measurement and statistical analysis for the correction of SARCNp^ sample number Dilute NaOH titrant SAN2.BET (m2/g) In NaOH titration, the pH value is from t0 (V initial When the initial value of 4·0 is adjusted to 9.0, and the pH of the titrant required to maintain the pH at 9.0 at ts, t10, and tls (V^ls) (ml) V flag = V phase + V5 to 15 concentration (N) V 〇 minute v5 5 minutes Vio 10 minutes v15 15 minutes Vs^is sum and sample A 0.01 Not applicable 1.5 0.3 0.1 0.2 0.6 2.1 Empty sample B 0.01 Not applicable 2.2 0.1 0.1 0.2 0.4 2.6 Empty sample C 0.01 No Applicable 2.4 0.1 0.1 0.1 0.3 2.7 Empty sample D 0.01 Not applicable 2.2 0.1 0.2 0.1 0.4 2.6 Empty sample average 0.01 Not applicable 2.075 0.15 0.125 0.15 0.325 2.5 Empty sample standard deviation 0.01 Not applicable 0.3947 0.1 0.05 0.0577 Not applicable 0.2708 Empty sample 95% Trust interval 1.45-2.70 2.07-2.93

實例CH_2 大孔隙玻璃基質-SARCNa 獲得由Dennert Poraver生產之大孔隙泡沫鈉舞玻璃樣 品,即平均直徑約為40至125微米之玻璃珠。 樣品A為按原樣接收之大孔隙玻璃珠。 採用上述用於測定SARC^之分析方法對樣品A進行分 # 析。結果如下表所示。 樣品號 樣品說明 豨 NaOH 滴定液 濃度(N) 在滴定中,使pH值從時4·0的初始值調整至9.0,並在 ts、t1G及tls(VSMS)時將pH值保持在9·0所需的滴定液實際 體積(毫升) V初 0分鐘 v5 5分鐘 v10 10分鐘 v15 15分鐘 V嫌 v^v初 空樣 空樣平 一0.01 2.1 0.15 0.125 0.15 2.5 ~ 不適用 A 原樣多孔 玻璃珠 _ 0.01 5.2 0.8 0.4 0.1 6.5 1.3 B 酸浸多孔玻瑀 珠_一 未測定 1 未測定 126432.doc -74- 200836831 樣品號 樣品說明 IEP saN2. BET (m2/g) 在SARQva_定中所用的修正滴定液體積 (毫升) SARC^fl (WV初)/V相 V初 0分鐘 v5 5分鐘 v10 10分鐘 v15 15分鐘 V绝 空樣 空樣平均值 不適用 不適用 2.1 0.15 0.125 0.15 2.5 不適用 修正之A 原樣多孔 玻璃珠 10.2 0.4 I 3.1 0.65 0.275 -0.05 3.97 0.28 修正之B 酸浸多孔 玻璃珠 8.9 6.0 未測定 未測定 結合以下實例對上述觸媒組合物進行更詳細的描述,該 等實例說明了上述不同類型的觸媒組合物可如何用於選擇 性氫化方法。符合本發明精神的所有修改及實施例均受到 保護。因此,以下實例並非用來限制於本文描述及主張之 發明。 選擇性氫化方法(SHP)實例 在以下非限制性實例中,選定之觸媒組合物經實驗室級 設備進行試驗。一般程序如下所述。 首先,將觸媒樣品載入1/4”内徑之反應器中。使用33%之 H2在125 cc/min流速之氮中於80°C下還原觸媒一個小時。 接著,使由99.4 wt.%乙烯及0.6 wt.%乙炔構成之烴進料 在100 psig壓力下流過該觸媒。H2與乙炔之莫耳莫耳比率 約為1.2比1,且液時空速約為0.63/hr。溫度大致每1小時 穩定地自35°C增加至50°C、至65°C、至80°C、至95°C,然 後回到65°C。 實例P-1EXAMPLE CH_2 Macroporous Glass Matrix - SARCNa A large pore foam sodium dance glass sample produced by Dennert Poraver, a glass bead having an average diameter of about 40 to 125 microns, was obtained. Sample A is a macroporous glass bead that is received as it is. Sample A was analyzed by the above-described analytical method for determining SARC^. The results are shown in the table below. Sample No. Sample Description 豨 NaOH Titration Concentration (N) In the titration, the pH is adjusted from the initial value of 4:00 to 9.0, and the pH is maintained at 9·0 at ts, t1G and tls (VSMS). The actual volume of the required titration solution (ml) V initial 0 minutes v5 5 minutes v10 10 minutes v15 15 minutes V suspect v^v initial empty sample flat one 0.01 2.1 0.15 0.125 0.15 2.5 ~ not applicable A original porous glass beads _ 0.01 5.2 0.8 0.4 0.1 6.5 1.3 B Acid-immersed porous glass beads _ one unmeasured 1 not determined 126432.doc -74- 200836831 sample number sample description IEP saN2. BET (m2/g) modified titration solution used in SARQva_ Volume (ml) SARC^fl (WV)/V-phase V first 0 minutes v5 5 minutes v10 10 minutes v15 15 minutes V-air sample empty sample mean not applicable 2.1 0.15 0.125 0.15 2.5 Not applicable Correction A Porous Glass Beads 10.2 0.4 I 3.1 0.65 0.275 -0.05 3.97 0.28 Modified B Acid-Immersed Porous Glass Beads 8.9 6.0 Not Determined Undetermined Binding The above catalyst compositions are described in more detail in the following examples, which illustrate the different types described above. Catalyst composition It selective hydrogenation methods. All modifications and embodiments that conform to the spirit of the invention are protected. Therefore, the following examples are not intended to be limited to the invention described and claimed herein. Examples of Selective Hydrogenation Process (SHP) In the following non-limiting examples, selected catalyst compositions were tested on laboratory grade equipment. The general procedure is as follows. First, the catalyst sample was loaded into a 1/4" inner diameter reactor. The catalyst was reduced for one hour at 80 ° C using 33% H 2 at a flow rate of 125 cc / min. Next, by 99.4 wt A hydrocarbon feed of .% ethylene and 0.6 wt.% acetylene flows through the catalyst at a pressure of 100 psig. The molar ratio of H2 to acetylene is about 1.2 to 1, and the liquid hourly space velocity is about 0.63/hr. It is steadily increased from 35 ° C to 50 ° C, to 65 ° C, to 80 ° C, to 95 ° C every 1 hour, and then back to 65 ° C. Example P-1

使用大孔隙玻璃上之鈀進行SHP 在本實例中,將根據上面實例3之程序製備的約1公克於 大孔隙玻璃珠上0.021 wt·%之鈀載入反應器中。觸媒根據 126432.doc -75- 200836831 上述SHP實例程序進行測試。 下表列出了最終溫度651下本試驗之結果。 實例P-2SHP using palladium on macroporous glass In this example, about 1 gram of palladium on the macroporous glass beads prepared according to the procedure of Example 3 above was loaded into the reactor at 0.021 wt.% palladium. The catalyst is tested according to the above SHP example program 126432.doc -75- 200836831. The table below lists the results of this test at a final temperature of 651. Example P-2

使用大孔隙玻璃上之鈀進行SHP 在本實例中,將根據上面實例5之程序製備的約1公克於 大孔隙玻璃上0.031 wt·%之鈀載入反應器中。觸媒根據上 述SHP實例程序進行測試。 下表列出了最終溫度65°C下本試驗之結果。 樣品說明 觸媒 觸媒裝載 (g) 轉化率 (%) 選擇率 (%) 實例P-1 大孔隙玻璃上0.021 wt·%之把 1.004 44 12 實例P-2 大孔隙玻璃上0.031 wt·%之把 1.005 32 54 儘管在前面的實施方式中,根據本發明的某些較佳實施 例對本發明進行了描述,且同時為了說明之目的,還提出 了許多細節,但熟習此項技術者顯而易見,本發明很可能 有其它一些實施例,且在不偏離本發明基本原則之基礎 上’於此所描述之某些細卽可能有較大不同。 【圖式簡單說明】 圖1為由一台JEOL 3000F場發射透射電子顯微鏡在3〇〇千 伏加速電壓下所拍攝,實質上無微孔隙/無中孔隙、但有 大孔隙之玻璃基質樣品(例如,酸浸鈉鈣玻璃)橫截面部分 的掃描透射電子顯微鏡(STEM)圖像,其中鈀顆粒一般散 布在與孔隙壁表面距離小於或等於約3〇奈米的範圍内。 126432.doc • 76 -SHP using palladium on macroporous glass In this example, about 1 gram of palladium 0.031 wt% palladium on macroporous glass prepared according to the procedure of Example 5 above was loaded into the reactor. The catalyst is tested according to the SHP example program described above. The table below lists the results of this test at a final temperature of 65 °C. Sample Description Catalyst Catalyst Loading (g) Conversion Rate (%) Selectivity (%) Example P-1 0.021 wt% on large pore glass 1.004 44 12 Example P-2 0.031 wt% on macroporous glass 1.005 32 54 Although in the foregoing embodiments, the invention has been described in terms of certain preferred embodiments thereof, and at the same time, numerous details are set forth for the purpose of illustration, The invention is likely to have other embodiments, and some of the details described herein may vary widely without departing from the basic principles of the invention. [Simple diagram of the diagram] Figure 1 is a glass matrix sample taken by a JEOL 3000F field emission transmission electron microscope at an acceleration voltage of 3 〇〇 kV, which is substantially free of microporosity/no pores but has large pores. For example, a scanning transmission electron microscope (STEM) image of a cross-sectional portion of an acid immersion soda lime glass, wherein the palladium particles are generally dispersed within a range of less than or equal to about 3 nanometers from the surface of the pore walls. 126432.doc • 76 -

Claims (1)

200836831 十、申請專利範圍: 1· 一種製程流之選擇性氫化方法,其利用一種觸媒組合物 對該製辁机之至少一部分進行選擇性氫化,該製程流含 有至少一種具有至少一個目標可氫化位點的化合物,其 中’該觸媒組合物包括·· ‘ •具有大孔隙、外表面、開口孔隙壁表面、表面區域及 • 表面下區域之實質上無微孔隙/無中孔隙基質, -至少一種催化成分,及 • -至少一個催化活性區域,其包括該至少一種催化成 分,其中 (a) 該實質上無微孔隙/無中孔隙基質具有 i) 富以選自S.’ S·Α·^&gt;·ϋ及其組合組成 之群之方法量測時,所測得之介於約〇. 1 m2/g 與50 m2/g之間的總表面積;及 U) 在大於0但小於或等於14的pH值範圍内獲得之 預定等電點(IEP); (b) 該至少一個催化活性區域可為連續或不連續,且 具有 4 i) 小於或等於約30奈米之平均厚度;及 H) 催化有效量之該至少一種催化成分;且 (c) 該至少一個催化活性區域之位置實質上 i) 在該外表面上, ii) 在該開口孔隙壁表面上, iii) 在該表面區域内, 126432.doc 200836831 iv)部分在該外表面上,部分在該開口孔隙壁表 面上’部分在該表面區域内及其組合;或 V) (c)(i)、(ii)、(iii)及(iv)之組合。 2·如請求項1之選擇性氫化方法,其中該至少一種催化成 分係選自由以下成分組成之群:布忍司特(Br〇nsted)或路 易士(Lewis)酸、布忍司特或路易士鹼、貴金屬陽離子及 貴金屬錯合陽離子及陰離子、過渡金屬陽離子及過渡金 屬錯合陽離子及陰離子、過渡金屬含氧陰離子、過渡金 屬硫屬化物陰離子、主族含氧陰離子、_化物、稀土離 子、稀土錯合陽離子及陰離子、貴金屬、過渡金屬、過 渡至屬氧化物、過渡金屬硫化物、過渡金屬氧硫化物、 過渡金屬碳化物、過渡金屬氮化物、過渡金屬硼化物、 過渡孟屬磷化物、稀土氫氧化物、稀土氧化物及其組 合0 3.如請求们之選擇性氫化方法,其中在該觸媒組合物處 籲 於穩恶選擇性氫化反應條件下之前,該至少一種催化成 分為第一催化成分,其具有 (a)第一預反應氧化態,及 ‘ ⑻與該基質之間的第—預反應相互作用,其係選自由 , _子電何相互作用、靜電電荷相互作用及其組合紐 成之群。 4·如請求項3之選擇性氫化方、土 # „ 虱化方去,其中該第一催化成分禮 酸、鹼、硫屬化物及其組合組成之群。 5.如明未項3之選擇性氣化方法,其中在該觸媒組合物處 126432.doc 200836831 於穩態選擇性氫化反應條件下之前,該第一催化成分之 至少—部分經改質或置換,以生成第二催化成分,其具 有 (a)第二預反應氧化態,及 ( )/、該基質之間相應的第二預反應相互作用; =^,該第二催化成分之第二預反應氧化態小於、大於 或等於該第一催化成分之第一預反應氧化態。 6·如請求項5之選擇性氫化方法,其中該第二催化成分係 k 自由 Pd、Pt、Rh、Ir、Ru、〇s、Cu、Ag、Au、Ru、 Re' Ni' c〇、Fe、Mn、Cr及其組合組成之群。 7·如#求項丨之選擇性氫化方法,其中該基質為小 於或等於約〇·5之玻璃組合物。 8·如請求項1之選擇性氫化方法,其中該至少一個催化活 14區域只貝上集中在平均厚度小於或等於約奈米之區 域中。 9·如請求項1之選擇性氫化方法,其中該實質上無微孔隙/ 無中孔隙基質係選自由AR玻璃、稀土矽酸鈉玻璃、硼鋁 矽酸鹽玻璃、E玻璃、無硼e玻璃、S玻璃、R玻璃、稀土 玻璃^夕®^鹽玻璃、Ba-Ti-石夕酸鹽玻璃、氮化玻璃、a玻 璃、C玻璃及CC玻璃及其組合組成之群。 1〇·如请求項1之選擇性氫化方法,其中在第一次浸出處理 之如或之後’該實質上無微孔隙/無中孔隙基質所獲得之 ΪΕΡ係大於或等於約6 〇,但小於14。 126432.doc 200836831 七、指定代表圖: (一) 本案指定代表圖為:第(1)圖。 (二) 本代表圖之元件符號簡單說明: (無元件符號說明) φ 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式: (無)200836831 X. Patent Application Range: 1. A selective hydrogenation process for a process stream, wherein a selective hydrogenation of at least a portion of the masher is carried out using a catalyst composition comprising at least one hydrogenate having at least one target a compound of a site, wherein 'the catalyst composition comprises ··' has a macroporous, outer surface, open pore wall surface, surface region, and a substantially microporous/non-porous matrix of the subsurface region, - at least a catalytic component, and - at least one catalytically active region comprising the at least one catalytic component, wherein (a) the substantially microporous/non-porous matrix has i) rich in selected from the group consisting of S.' S·Α· ^&gt;·ϋ and its combination of methods for measuring the total surface area measured between about 1 m2/g and 50 m2/g; and U) at greater than 0 but less than or a predetermined isoelectric point (IEP) obtained within a pH range equal to 14; (b) the at least one catalytically active region may be continuous or discontinuous, and having an average thickness of 4 i) less than or equal to about 30 nm; H) Catalysis An effective amount of the at least one catalytic component; and (c) the position of the at least one catalytically active region is substantially i) on the outer surface, ii) on the open pore wall surface, iii) in the surface region, 126432 .doc 200836831 iv) partially on the outer surface, partially on the surface of the open pore wall 'partially in the surface area and combinations thereof; or V) (c)(i), (ii), (iii) and Iv) combination. 2. The selective hydrogenation process according to claim 1, wherein the at least one catalytic component is selected from the group consisting of Bronsted or Lewis acid, Blenzide or Lewisine. , noble metal cations and noble metal complex cations and anions, transition metal cations and transition metal complex cations and anions, transition metal oxyanions, transition metal chalcogenide anions, main oxyanions, _ compounds, rare earth ions, rare earths Combined cations and anions, noble metals, transition metals, transition to genus oxides, transition metal sulphide, transition metal oxysulfides, transition metal carbides, transition metal nitrides, transition metal borides, transitional phosphides, rare earth hydrogens Oxide, rare earth oxide, and combinations thereof. 3. 3. A selective hydrogenation process as claimed, wherein the at least one catalytic component is first catalyzed prior to the catalyst composition being stabilized under selective hydrogenation conditions. a composition having (a) a first pre-reactive oxidation state, and a first pre-reverse between '(8) and the substrate Should interact, it is selected from the group consisting of, _ sub-electron interaction, electrostatic charge interaction and their combination. 4. The selective hydrogenation side of the claim 3, the soil # „ 虱 方 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , a gasification process wherein at least a portion of the first catalytic component is modified or displaced to form a second catalytic component prior to the steady-state selective hydrogenation reaction conditions at the catalyst composition 126432.doc 200836831, It has (a) a second pre-reaction oxidation state, and ( )/, a corresponding second pre-reaction interaction between the substrates; =^, the second pre-reaction oxidation state of the second catalytic component is less than, greater than or equal to a first pre-reaction oxidation state of the first catalytic component. 6. The selective hydrogenation process according to claim 5, wherein the second catalytic component is k free Pd, Pt, Rh, Ir, Ru, 〇s, Cu, Ag a group consisting of Au, Ru, Re'Ni' c〇, Fe, Mn, Cr, and combinations thereof. 7. A method for selectively hydrogenating a substrate, wherein the substrate is a glass of less than or equal to about 〇·5 8. The selective hydrogenation method of claim 1, wherein the at least one reminder The living 14 region is concentrated only in a region having an average thickness of less than or equal to about nanometer. 9. The selective hydrogenation method of claim 1, wherein the substantially microporous/non-porous matrix is selected from the group consisting of AR glass, Rare earth strontium silicate glass, boroaluminosilicate glass, E glass, boron-free e-glass, S-glass, R-glass, rare earth glass, 夕 ®® salt glass, Ba-Ti-lithite glass, nitrided glass, a group consisting of glass, C glass, and CC glass, and combinations thereof. 1) The selective hydrogenation method of claim 1, wherein, after or after the first leaching treatment, the material is substantially free of micropores/no pores The lanthanide obtained by the matrix is greater than or equal to about 6 〇, but less than 14. 126432.doc 200836831 VII. Designated representative map: (1) The representative representative of the case is: (1). (2) The components of the representative figure Brief description of the symbol: (No component symbol description) φ VIII. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (none) 126432.doc126432.doc
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