TW200842523A - Apparatus for providing photoresist of slit coater - Google Patents

Apparatus for providing photoresist of slit coater Download PDF

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Publication number
TW200842523A
TW200842523A TW097114021A TW97114021A TW200842523A TW 200842523 A TW200842523 A TW 200842523A TW 097114021 A TW097114021 A TW 097114021A TW 97114021 A TW97114021 A TW 97114021A TW 200842523 A TW200842523 A TW 200842523A
Authority
TW
Taiwan
Prior art keywords
coating liquid
piston
slit coater
liquid supply
valve
Prior art date
Application number
TW097114021A
Other languages
Chinese (zh)
Other versions
TWI410284B (en
Inventor
Kang-Il Cho
Original Assignee
K C Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by K C Tech Co Ltd filed Critical K C Tech Co Ltd
Publication of TW200842523A publication Critical patent/TW200842523A/en
Application granted granted Critical
Publication of TWI410284B publication Critical patent/TWI410284B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026Valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/03Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
    • B05B9/04Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
    • B05B9/0403Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material
    • B05B9/0409Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material the pumps being driven by a hydraulic or a pneumatic fluid
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

The invention discloses an apparatus for providing photoresist of a slit coater. The apparatus comprises: a piston; a cylinder which forms a piston sliding part inserted in the piston for enabling the piston to perform reciprocating movement in a horizontal direction and a pipe expanding part for expanding the space in upper and lower directions at the end of the piston sliding part. In the present invention, the upper part of a slit nozzle is provided in the horizontal direction with a pump for supplying coating liquid so as to shorten the supply path of the coating liquid. Accordingly, this invention can realize the maximization of the pump capacity and at the same time solve the problem resulted from output delay, promoting the performances of the slit coater.

Description

200842523 九、發明說明: 【發明所屬之技術領域】 本發明係關於狹縫式塗佈機之塗佈液供應裝置,尤其係 關於抽吸填充於儲藏罐中之塗佈液供應給狹縫式塗佈機的 狹縫式塗佈機之塗佈液供應裝置。 【先前技術】200842523 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a coating liquid supply device for a slit coater, and more particularly to a coating solution for suction filling and filling in a storage tank. A coating liquid supply device for a slit coater of a cloth machine. [Prior Art]

通常,在光微影製程中均勻塗佈光阻材料(PR ••以下稱 為塗佈液)之方法包含··將塗佈液加載於圓形滾輪的外部 之後,在基板上向一定方向滾動該滾輪,由此將塗佈液塗 佈至基板上面的滾塗方法;將基板放置在圓盤支撐體上 面,在該基板中央滴落塗佈液之後進行轉動,從而利用離 心力在基板上進行塗佈的旋轉塗佈方法;、經由狹縫形態之 喷嘴在基板上喷出塗佈液的同時按照—定方向掃掠而進行 塗佈之狹縫塗層方法。Generally, a method of uniformly coating a photoresist material (PR • hereinafter referred to as a coating liquid) in a photolithography process includes: applying a coating liquid to the outside of a circular roller, and rolling it in a certain direction on the substrate The roller, thereby applying a coating liquid to a roll coating method on the substrate; placing the substrate on the disk support, rotating the coating liquid in the center of the substrate, and rotating the substrate to perform coating on the substrate by centrifugal force A spin coating method for a cloth; a slit coating method for applying a coating liquid on a substrate while ejecting a coating liquid through a nozzle in a slit direction.

但是,基板越大越重,高速轉動基板就越困難。而且在 高速轉動基板時存在基板破損及能量消耗大的問題,因此 液晶顯示面板用的玻璃基板等平板顯示裝置用的基板上主 要使用狹縫塗層方法。 用於進行該狹缝塗佈之狹縫塗層裝置包含:用於安妒美 板之基板夾盤;設置在該基板夹盤—側之預喷出部;位於 該基板夾盤及預喷出部之上部做水平移動的在基板上喷出 塗佈液之狹縫喷嘴。即,狹縫喷嘴在預噴出部之上部進行 預喷出之後,向安裝了基板之基板炎盤側水平移動,而: 了使塗佈液均句分布在基板上’狹縫噴嘴勾速移動並喷出 130496.doc 200842523 塗佈液。 圖1及圖2係根據先前技術之具備超聲波清洗裝置之基板 塗層裝置的側面圖及立體圖。 由圖可知,先前技術之基板塗層裝置包含:塗佈部 200 ,噴嘴部1〇〇 ;具備超聲波清洗裝置之預喷出部3〇()。 塗佈部200包含:在底座4〇〇上面以具備高度調整機構之 支架為媒介設置在中心部並形成多個上下貫通之貫通孔的 台子210,可以在該底座4〇〇與台子21〇之間升降並在上面 設置多個頂針220之水平板230。 該多個頂針220插入於該台子21〇之貫通孔内,隨著該水 平板230之升降,或者突出於該台子21〇上部,或者退至該 台子210内部。由此,該多個頂針22〇具有自台子21〇提昇 基板或者降下基板的作用。 同日守,底座400上面之左右兩側,即在該台子21〇左右外 側,配備了在縱向上延伸而形成的一對長導執24〇。該對 導執240上分別設置了移送裝置25〇做縱向移動。 在該對移送裝置250之間支撐著橫跨該台子21〇的將塗佈 液等塗層劑噴出至玻璃等基板5〇〇上進行塗佈之噴嘴部 1〇〇。該喷嘴部100之狹縫喷嘴i 10呈在橫向左右方向延伸 而形成的桿(bar)狀,通常大於基板之左右寬度。 該狹縫噴嘴110下面形成沿該橫向上延伸之微細噴出口 120,以噴出塗佈液。經由該線形噴出口 ι2〇可以在芙板 5 00上喷出一定量的塗佈液。 而且’該移送裝置250在支撐該噴嘴部1〇〇兩側的狀態 130496.doc 200842523 下’以一定速度沿縱向移動,由此在台子2 1 〇上移動喷嘴 4 100。同時’該移送裝置25〇可以在垂直方向上調整喷嘴 邛1〇〇之鬲度,對應塗佈液的量及黏度,可以精細地控制 該狹缝喷嘴110之輸出口 12〇與基板5〇〇之間的間距。 另外,給該喷嘴部100提供塗佈液之裝置包含:設置在 該移送裝置250—側之塗佈液供應部13〇 ;連通該塗佈液供 應部130與狹縫喷嘴11〇之間的第1供應管路丨糾;自外部供 應源(未圖示)給該塗佈液供應部13〇提供塗佈液之第2供應 管路150。 經由第2供應管路自該外部供應源給塗佈液供應部13〇提 供塗佈液。塗佈液供應部13〇利用設置在其内部的泵給塗 佈液施加預定壓力,以使塗佈液經過第丨供應管路14〇供應 至狹缝喷嘴110之後,以敎壓力自狹縫喷嘴㈣之喷出口 120噴出。 在该塗佈部200—側配備了預噴出部3〇〇。即,該預喷出 部300沿著噴嘴部100之移動方向設置,且位於該喷嘴部 100下部。 該預備輸出部300由機架310及位於該機架31〇内部之預 塗滾子320構成。 但是,如上所述先前技術之狹縫式塗佈機之塗佈液供應 部130由氣叙及活塞結構之加壓泵(未圖示)構成,並將加壓 泵垂直設置在底座400上部’因此若所處環境在室内,則 由於天花板高度的限制,在空間上會受到制約。 即’活塞之前進、後退行程將會受到空間的限制,因而 130496.doc 200842523 很難增大加壓泵之容量。 而且,若將先前技術之加壓泵不合理地設置在水平方向 上使用,則氣缸内的氣泡會被關在内部而無法排出至外 口 P由此發生硬化塗佈液之問題,最終引發無法使用整個 • 加壓泵之嚴重問題。 亚且,雖然利用第1供應管路14〇連接塗佈液供應部13〇 及狹縫噴嘴11〇,但相對於塗佈液供應部13〇之固定設置, f ,由於狹、,逢噴麵11G係、往復移送之結構,因此固S設置該第1 、 供應管路140將面臨諸多不便,而且由於塗佈液移送距離 忌超出必要距離,因而存在塗佈液輸出時點延遲的問題。 【發明内容】 本發明係為解決上述問題而提出,本發明之目的在於將 用於塗佈液供應之加壓泵沿水平方向設置在狹縫嗔嘴上 部〇 為了實現上述目的,根據本發明所提供之塗佈液供應裝 ( 置包含:活塞;氣缸,該氣缸形成插入該活塞並使該活塞 ί水平方向上做往復運動之活塞滑行部,並且形成在該: 塞滑行部末端朝上下方向擴張空間之擴管部。 此處,該活塞滑行部連接用於控制塗佈液供應之供應 閥在6亥擴官部之下端部連接用於控制塗佈液輸出之輸出 目’在該擴管部上端部中央設置用於排出氣缸内部氣泡之 氡泡排出閥。 而且’該活塞滑行部之内徑大於活塞之外徑,由此H 塞滑行部與活塞之間形成間隙,經由該間隙形成用於供應 130496.doc 200842523 塗佈液之塗佈液供應通道。 並且,在該活塞滑行部之内徑面上設置包圍活塞外徑之 圓環型密封塊,用以引導活塞之往復運動。 此處,與活塞相接觸之該密封塊之内面上設置多個用於 * 保持氣密性之密封圈。 而且,該等密封圈設置兩個以上,且多個密封圈相互保 持預定間距而設置。 f 纟該密封塊前方之活塞滑行部上連接用於純塗佈液之 ^ 供應閥。 此處,該供應閥在活塞的前進行程中閥門關閉,在後退 行程中閥門開放’而該輸出閥在活塞前進行程中闕門開 放,在後退行程中閥門封閉。 而且,在開放該供應閥的同時對於儲藏罐側之塗佈液施 壓,以協助填充。 *亥亂泡排出閥在活塞前進行程時開启欠,以向外部放出氣 缸内的氣泡,而氣泡排出進行過程中,輸出閥維持關閉狀 態。 此處,氣缸擴管部之稜角處全部進行圓角處理。 【實施方式】 以下,參照附圖來詳細說明本發明之較佳實施例。 . 圖3係知用本發明之塗佈液供應裝置之狹縫式塗佈機之 相乂略圖’圖4係表示本發明之塗佈液供應裝置之内部結構 之剖視圖。 回斤不,根據本發明實施例之狹縫塗佈機之塗佈液供 130496.doc 200842523 應裝置3沿水平方向設置在狹縫喷嘴4上側。該塗佈液供應 裝置3自另外設置之儲藏罐5接收塗佈液,在供應管路上設 置可以控制塗佈液供應之供應閥VI。 而且,該狹縫噴嘴4設置在底座1上部,由移送裝置做左 右往復移動’由此在基板(未圖示)表面噴射塗佈液形成塗 層。 參照圖4詳細說明本發明之塗佈液供應裝置3。本發明之 塗佈液供應裝置3包含氣缸1〇及插入至該氣缸1〇内部做往 復運動之活塞20。 該氣缸10形成插入活塞2〇並使其在水平方向上做往復運 動之活塞滑行部U及在該活塞滑行部u之末端朝上下方向 擴張空間之擴管部丨3。 此時,该活塞滑行部1丨之内徑大於活塞2〇之外徑,由此 在活塞滑行部11與活塞2〇之間形成間隙(GAp),從而經由 違間隙形成供應塗佈液之塗佈液供應通道12。 而且,在該活塞滑行部丨丨内部設置圓環型密封塊3 〇,以 穩定地支撐活塞20之往復運動。 此%,在與活塞2〇相接觸之該密封塊3〇内面設置多個密 封圈3 1,由此可以提高維持氣密性的能力。而且,該多個 密封圈3 1可以相隔預定間距設置。 此處,设置該密封塊3〇之前方側活塞滑行部丨丨上連通了 用於自外部儲藏罐5接收塗佈液之供應管路,該供應管路 上設置供應閥VI。 忒供應閥V1在活塞20處於前進行程時,閥門關閉,在活 130496.doc -10- 200842523 塞2 0處於後退行程時,閥門開放。 即’在活塞2〇處於前進行程時,供應和關閉,防止填 充於氣缸10内部之塗佈液由於受到活塞2〇的壓力而逆流至 儲藏罐5側,在活塞20的後退行程中,供應_開放,塗 • 佈液供應至氣缸1 0内部進行填充。 此時,可以在開放供應閥V1的同時對儲藏罐5側塗佈液 施加一定壓力進行供應,由此協助填充過程。為此,可以 在儲藏罐5側另外設置加壓泵。 ( 在該活塞2〇處於前進行程時,填充於活塞滑行部U内之 塗佈液將被送至擴管部13側。 該擴管部13形成剖面形狀大致為長方形之内部空間,在 其下鈿部中央形成直接連接於狹縫喷嘴4之輸出閥。 該輸出閥V2在活塞20處於前進行程時,閥門開放,在活 塞20處於後退行程時,閥門關閉。 即,活塞20處於前進行程時輸出閥又2開啟,使得填充於 ( 擴管部13内之塗佈液供應至狹縫喷嘴4側,而在活塞2〇處 ^ 於後退行程時輸出閥V2關閉,防止因活塞20後退時形成之 真空壓而將狹縫喷嘴4内之塗佈液吸入至氣缸1〇侧。 而且,該擴管部13上端部中央位置上形成氣泡排出閥 V3,該氣泡排出閥V3經由另外設置的管與擴管部連 接。 如上所述氣泡排出閥V 3在活塞2 0處於前進行程時開啟, 將氣缸10内部的氣泡排出至外部。 此時,當利用另外的加壓泵協助塗佈液填充於氣缸1〇内 130496.doc -11 - 200842523 4,加壓泵在氣缸10内部產i ^ 座生正壓,而為了消除此正壓開 放氧泡排出闕V3時,氣㈣内的氣泡就會排出至外部。 在該氣泡排出閥V3開啟之狀態下,若進行氣泡排氣,該 輸出閥V2維持關閉狀態。接著 尸 接者°亥虱泡排出結束之後,關閉 乳泡排出閥V3開放輸出閥V2,以輸出塗佈液。 此時’該氣泡排出閥V3必須設置在擴管和之上端部, 因為氣缸10内部的氣泡受到浮力作用浮至上側。 而且’為了防止浮至上伽 今 上W之乳泡被卡在擴管部13之稜角 處’應對稜角進行圓角13a處理。 如上構成之本發明提供之狹 〇 狄縫塗佈機之塗佈液供應裝置 取好平行於狹縫喷嘴4之上部設讯 i- σ又置時亦可以與狹 縫噴嘴4的上部之間形成一定角度。 此時,在傾斜設置塗佈液佴雍 卻從仏應裝置時,為了最小化塗佈 液之移送距離,擴管部13側最好 取野罪近狹縫贺嘴4之上面設 置。 具有如上所述之組成及作用少士 一 风及作用之本發明,可由熟習此項技 術者利用前面說明之各種實施例 、也1夕J進仃各種修改及變更,因 此本發明之技術範圍不限於說明蚩 所圮載之内容,而應由 申請專利範圍限定。 本發明在狹縫喷嘴上部沿皮承士 角丨,口水干方向設置用於供應塗佈液 的泵,縮短了塗佈液之供應路徑, 吩仕在解決輸出延遲引發之 問題的同時可以實現泵容量之女 承合里之大型化,因此具有提高狹缝 塗佈機效能之效果。 【圖式簡單說明】 130496.doc 12- 200842523 圖1及圖2係根據先前技術之基板塗層裝置之侧面圖及立 體圖。 圖3係採用本發明之塗佈液供應裝置之狹縫塗佈機之概 略圖。 圖4係表示本發明之塗佈液供應裝置内部結構之剖視 圖0 【主要元件符號說明】 1 底座 2 移送裝置 3 塗佈液供應裝置 4 狹縫噴嘴 5 儲藏罐 10 氣缸 11 活塞滑行部 12 塗佈液供應通道 13 擴管部 13a 圓角 20 活塞 30 密封塊 31 密封圈 100 噴嘴部 110 狹縫喷嘴 120 噴出口 /輸出口 130 塗佈液供應部 130496.doc -13- 200842523 140 第1供應管路 150 第2供應管路 200 塗佈部 210 台子 * 220 頂針 230 水平板 240 導軌 250 移送裝置 ί 300 預喷出部/預備輸出部 310 機架 320 預塗滾子 400 底座 500 基板 VI 供應閥 V2 輸出閥 V3 氣泡排出閥 130496.doc -14-However, the larger the substrate, the heavier it is, and the more difficult it is to rotate the substrate at high speed. Further, when the substrate is rotated at a high speed, there is a problem that the substrate is damaged and the energy consumption is large. Therefore, a slit coating method is mainly used for a substrate for a flat panel display device such as a glass substrate for a liquid crystal display panel. The slit coating device for performing the slit coating comprises: a substrate chuck for an ampoule plate; a pre-discharge portion disposed on the side of the substrate chuck; and the pre-discharge at the substrate chuck A slit nozzle that ejects a coating liquid on a substrate that moves horizontally above the upper portion. That is, after the pre-discharging of the slit nozzle is performed on the upper portion of the pre-discharging portion, the slit nozzle is horizontally moved toward the substrate side of the substrate on which the substrate is mounted, and the coating liquid is uniformly distributed on the substrate. Spray 130496.doc 200842523 coating solution. 1 and 2 are a side view and a perspective view of a substrate coating apparatus equipped with an ultrasonic cleaning apparatus according to the prior art. As is apparent from the figure, the substrate coating apparatus of the prior art includes a coating portion 200, a nozzle portion 1A, and a pre-discharging portion 3() of the ultrasonic cleaning device. The application unit 200 includes a table 210 that is provided on the base 4A with a bracket having a height adjustment mechanism as a medium, and is formed with a plurality of through holes penetrating vertically, and can be placed on the base 4 and the table 21 A horizontal plate 230 is provided which is raised and lowered and provided with a plurality of thimbles 220 thereon. The plurality of thimbles 220 are inserted into the through holes of the table 21, and as the water plate 230 rises and falls, protrudes from the upper portion of the table 21 or retreats to the inside of the table 210. Thereby, the plurality of thimbles 22 have the function of lifting the substrate from the table 21, or lowering the substrate. On the same day, the left and right sides of the base 400, that is, on the left and right sides of the table, are provided with a pair of long guides 24〇 extending in the longitudinal direction. The pair of guides 240 are respectively provided with a transfer device 25 for longitudinal movement. Between the pair of transfer devices 250, a nozzle portion 1A that ejects a coating agent such as a coating liquid onto the substrate 5 such as glass across the table 21 is supported. The slit nozzle i 10 of the nozzle portion 100 has a bar shape extending in the lateral direction and is formed to be larger than the left and right widths of the substrate. A fine discharge port 120 extending in the lateral direction is formed under the slit nozzle 110 to eject a coating liquid. A certain amount of the coating liquid can be ejected on the slab 500 through the linear discharge port ι2. Further, the transfer device 250 is moved in the longitudinal direction at a certain speed under the state of supporting the nozzle portion 1 130 130496.doc 200842523, thereby moving the nozzle 4 100 on the table 2 1 〇. At the same time, the transfer device 25 can adjust the nozzle 邛1〇〇 in the vertical direction, and the output port 12〇 and the substrate 5 of the slit nozzle 110 can be finely controlled corresponding to the amount and viscosity of the coating liquid. The spacing between them. Further, the apparatus for supplying the coating liquid to the nozzle unit 100 includes: a coating liquid supply unit 13 disposed on the side of the transfer device 250; and a communication between the coating liquid supply unit 130 and the slit nozzle 11? 1 Supply line correction; a second supply line 150 for supplying a coating liquid to the coating liquid supply unit 13A from an external supply source (not shown). The coating liquid is supplied from the external supply source to the coating liquid supply unit 13 via the second supply line. The coating liquid supply unit 13 applies a predetermined pressure to the coating liquid by means of a pump provided inside the coating liquid, so that the coating liquid is supplied to the slit nozzle 110 through the second supply line 14〇, and the pressure is applied from the slit nozzle. (4) The discharge port 120 is ejected. A pre-discharging portion 3A is provided on the side of the coating portion 200. That is, the pre-discharging portion 300 is provided along the moving direction of the nozzle portion 100 and is located at the lower portion of the nozzle portion 100. The preliminary output unit 300 is composed of a frame 310 and a pre-coating roller 320 located inside the frame 31. However, the coating liquid supply portion 130 of the slit coater of the prior art as described above is constituted by a pressurizing pump (not shown) of a pneumatic and piston structure, and the pressurizing pump is vertically disposed at the upper portion of the base 400' Therefore, if the environment is indoors, it will be restricted in space due to the limitation of the ceiling height. That is, the piston advances and retreats will be limited by space, so it is difficult to increase the capacity of the pressure pump. Further, if the prior art pressure pump is unreasonably disposed in the horizontal direction, the air bubbles in the cylinder are shut off inside and cannot be discharged to the outer port P, thereby causing a problem of hardening the coating liquid, which eventually causes the failure. Use the entire • Pressure pump for serious problems. In addition, although the coating liquid supply part 13〇 and the slit nozzle 11〇 are connected by the first supply line 14〇, the fixed setting of the coating liquid supply unit 13〇, f, due to the narrowness, the spray surface Since the 11G system and the reciprocating transfer structure are provided, the first S supply line 140 is inconvenient, and since the transfer distance of the coating liquid is prevented from exceeding the necessary distance, there is a problem that the coating liquid is delayed at the time of output. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a pressurizing pump for supplying a coating liquid in a horizontal direction in an upper portion of a slit nozzle, in order to achieve the above object, according to the present invention. The coating liquid supply device provided includes: a piston; a cylinder that forms a piston sliding portion that inserts the piston and reciprocates the piston ί in a horizontal direction, and is formed at: the end of the plug sliding portion is expanded upward and downward a pipe expansion portion of the space. Here, the piston sliding portion is connected to a supply valve for controlling the supply of the coating liquid, and is connected at a lower end portion of the expansion portion for controlling the output of the coating liquid. A bubble discharge valve for discharging air bubbles inside the cylinder is disposed at the center of the upper end portion. Further, 'the inner diameter of the piston sliding portion is larger than the outer diameter of the piston, thereby forming a gap between the H-plug sliding portion and the piston, and the gap is formed through the gap. Supply 130496.doc 200842523 coating liquid supply passage of the coating liquid. Further, a ring-shaped sealing block surrounding the outer diameter of the piston is disposed on the inner diameter surface of the piston sliding portion for The reciprocating movement of the pilot piston is provided. Here, a plurality of sealing rings for maintaining airtightness are provided on the inner surface of the sealing block which is in contact with the piston. Moreover, the sealing rings are provided with two or more sealing rings. The valve is disposed at a predetermined distance from each other. f ^ The piston sliding portion in front of the sealing block is connected to a supply valve for pure coating liquid. Here, the supply valve is closed during the forward stroke of the piston, and the valve is in the backward stroke. The opening valve is open during the forward stroke of the piston, and the valve is closed during the retracting stroke. Moreover, the supply valve is opened while the coating liquid on the storage tank side is pressurized to assist in filling. The discharge valve opens and owes during the forward stroke of the piston to discharge the air bubbles in the cylinder to the outside, and the output valve is kept closed during the bubble discharge process. Here, the corners of the cylinder expansion portion are all rounded. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Fig. 3 is a view showing the phase of a slit coater using the coating liquid supply device of the present invention. Figure 4 is a cross-sectional view showing the internal structure of the coating liquid supply device of the present invention. The coating liquid for the slit coater according to the embodiment of the present invention is 130496.doc 200842523 The device 3 is horizontally oriented. It is disposed on the upper side of the slit nozzle 4. The coating liquid supply device 3 receives the coating liquid from the separately disposed storage tank 5, and supplies a supply valve VI that can control the supply of the coating liquid on the supply line. Moreover, the slit nozzle 4 The coating liquid is sprayed on the surface of the substrate (not shown) to form a coating layer on the upper portion of the base 1 and reciprocated by the transfer device. The coating liquid supply device 3 of the present invention will be described in detail with reference to Fig. 4 . The coating liquid supply device 3 includes a cylinder 1 and a piston 20 inserted into the cylinder 1 to reciprocate. The cylinder 10 forms a piston sliding portion U that is inserted into the piston 2 and reciprocated in the horizontal direction. The end of the piston sliding portion u expands the expansion portion 丨3 of the space in the vertical direction. At this time, the inner diameter of the piston sliding portion 1丨 is larger than the outer diameter of the piston 2〇, thereby forming a gap (GAp) between the piston sliding portion 11 and the piston 2〇, thereby forming a coating solution for supplying the coating liquid via the gap. Cloth supply channel 12. Further, a ring-shaped seal block 3 设置 is provided inside the piston sliding portion 以 to stably support the reciprocating motion of the piston 20. At this %, a plurality of seal rings 3 1 are provided on the inner surface of the seal block 3 which is in contact with the piston 2A, whereby the ability to maintain airtightness can be improved. Moreover, the plurality of seal rings 31 may be disposed at a predetermined interval. Here, the supply side of the sealing block 3 is connected to the side piston sliding portion 连通 for supplying a supply line for receiving the coating liquid from the external storage tank 5, and the supply line VI is provided on the supply line. The 忒 supply valve V1 is closed when the piston 20 is in the forward stroke, and the valve is open when the piston 20 is in the reverse stroke. That is, when the piston 2 is in the forward stroke, it is supplied and closed, and the coating liquid filled in the inside of the cylinder 10 is prevented from flowing back to the side of the storage tank 5 due to the pressure of the piston 2, and in the backward stroke of the piston 20, supply_ Open, coated • The cloth supply is supplied to the inside of the cylinder 10 for filling. At this time, it is possible to supply a certain pressure to the coating liquid on the side of the storage tank 5 while opening the supply valve V1, thereby assisting the filling process. For this purpose, a pressure pump can be additionally provided on the side of the storage tank 5. (When the piston 2 is in the forward stroke, the coating liquid filled in the piston sliding portion U is sent to the side of the expanded portion 13. The expanded portion 13 forms an internal space having a substantially rectangular cross-sectional shape, under which The center of the crotch portion forms an output valve directly connected to the slit nozzle 4. The output valve V2 opens when the piston 20 is in the forward stroke, and the valve is closed when the piston 20 is in the retracting stroke. That is, the piston 20 is output when the forward stroke is performed. The valve 2 is opened again so that the coating liquid filled in the expansion pipe 13 is supplied to the slit nozzle 4 side, and the output valve V2 is closed when the piston 2 is at the backward stroke to prevent the piston 20 from being formed when it is retracted. The coating liquid in the slit nozzle 4 is sucked to the side of the cylinder 1 by vacuum pressure. Further, a bubble discharge valve V3 is formed at the center of the upper end portion of the expanded portion 13, and the bubble discharge valve V3 is separately provided through the tube and the expansion The tube discharge valve V 3 is opened as described above when the piston 20 is in the forward stroke, and the air bubbles inside the cylinder 10 are discharged to the outside. At this time, when the additional pressure pump is used to assist the coating liquid to be filled in the cylinder 1 〇内1304 96.doc -11 - 200842523 4, the pressure pump produces a positive pressure inside the cylinder 10, and in order to eliminate the positive pressure open oxygen bubble discharge 阙V3, the air bubbles in the gas (4) are discharged to the outside. When the bubble discharge valve V3 is opened, the discharge valve V2 is maintained in a closed state when the bubble is exhausted. Then, after the corpse is discharged, the bubble discharge valve V3 is closed and the output valve V2 is closed to output the coating. At this time, the bubble discharge valve V3 must be placed at the expansion pipe and the upper end portion, because the air bubbles inside the cylinder 10 are floated to the upper side by the buoyancy force. And 'to prevent the floating of the bubble onto the upper gamma, the bubble is stuck. The corners of the expanded portion 13 are treated as rounded corners 13a. The coating liquid supply device of the narrow slit coater provided by the present invention is configured to be parallel to the upper portion of the slit nozzle 4 When σ is again set, a certain angle can be formed between the upper portion of the slit nozzle 4. At this time, when the coating liquid is obliquely disposed from the damper device, the pipe expansion portion is minimized in order to minimize the transfer distance of the coating liquid. The 13 side is best to take the wild sin near the slit The present invention has the above-described composition and function, and the present invention can be utilized by those skilled in the art, and various modifications and changes can be made by using the various embodiments described above. The technical scope of the invention is not limited to the contents described in the description, but should be defined by the scope of the patent application. The present invention is provided with a pump for supplying a coating liquid in the upper part of the slit nozzle along the direction of the stalk of the mouth. With the supply path of the coating liquid, the company can increase the size of the pump capacity while solving the problem caused by the output delay, so it has the effect of improving the performance of the slit coater. [Simplified illustration] 130496 .doc 12- 200842523 Figures 1 and 2 are side and perspective views of a substrate coating apparatus according to the prior art. Fig. 3 is a schematic view of a slit coater using the coating liquid supply device of the present invention. Figure 4 is a cross-sectional view showing the internal structure of the coating liquid supply device of the present invention. [Main element symbol description] 1 Base 2 Transfer device 3 Coating liquid supply device 4 Slit nozzle 5 Storage tank 10 Cylinder 11 Piston sliding portion 12 Coating Liquid supply passage 13 Expansion pipe portion 13a Rounded corner 20 Piston 30 Sealing block 31 Sealing ring 100 Nozzle portion 110 Slit nozzle 120 Discharge port/Outlet port 130 Coating liquid supply unit 130496.doc -13- 200842523 140 First supply line 150 2nd supply line 200 Coating part 210 Table* 220 Thimble 230 Horizontal plate 240 Guide rail 250 Transfer unit ί 300 Pre-spray part / preliminary output part 310 Rack 320 Pre-coating roller 400 Base 500 Substrate VI Supply valve V2 output Valve V3 bubble discharge valve 130496.doc -14-

Claims (1)

200842523 十、申請專利範圍: :種狹缝式塗佈機之塗佈液供應裝置,其特徵在於包 活塞; 氣缸,該氣缸形成插入該活塞並使該活塞在水平方向 上㈣復運動之活塞滑行部,並且形成在該活塞滑行部 末端朝上下方向擴張空間之擴管部。 2·如請求項1之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於該活塞滑行部連接用於控制塗佈液供應之供應閥, 在該擴管部之下端部連接用於控制塗佈液輸出之輸出 閥’在該擴管部上端部中央設置用於排出氣缸内部氣泡 之氣泡排出閥。 3 ·如凊求項1之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於該活塞滑行部之内徑大於活塞之外徑,由此在活夷 滑行部與活塞之間形成間隙,經由該間隙形成用於供應 塗佈液之塗佈液供應通道。 4.如請求項1之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於在該活塞滑行部之内徑面上設置包圍活塞外徑之圓 環型密封塊,用以引導活塞之往復運動。 5 ·如請求項4之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於,與活塞相接觸之該密封塊之内面上設置多個用於 保持氣密性之密封圈。 6·如請求項5之狹縫式塗佈機之塗佈液供應裝置,其特徵 在於該多個密封圈相互之間保持預定間距而設置。 130496.doc 200842523 7·如請求項5之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於在《封塊前方之活塞滑行部上連制於接收塗佈 液之供應閥。 8.如請求項2之狹縫式塗佈機之塗佈液供應裝置,其特徵 在於該供應閥在活塞的前進行程中閥門關閉,在後退行 程中閥門開放,而該輸出閥在活塞前進行程中闕門開 放,在後退行程中閥門關閉。 9_如請求項8之狹縫式塗佈機之塗佈液供應裝置,其特徵 在於在開放該供應閥的同時對於儲藏罐側之塗 壓,以協助填充。 土 / & 10·如請求項2之狹缝式塗佈機之塗佈液供應裝置,其特徵 在於該氣泡排出閥在活塞前進行程時開啟,以向外部放 出氣缸内的氣泡,而在氣泡排出過程中,輸出閥維持 閉狀態。 、、 11 ·如請求項1之狹缝式塗佈機之塗佈液供應裝 关将徵 在於氣缸擴管部之稜角處全部進行圓角處理。 130496.doc200842523 X. Patent application scope: A coating liquid supply device for a slit coater, characterized in that a piston is included; a cylinder which forms a piston slide into which the piston is inserted and the piston is re-moved in a horizontal direction (four) And a tube expansion portion that expands the space in the vertical direction at the end of the piston sliding portion. 2. The coating liquid supply device of the slit coater of claim 1, wherein the piston sliding portion is connected to a supply valve for controlling the supply of the coating liquid, and the lower end portion of the expansion pipe is connected for An output valve that controls the output of the coating liquid is provided with a bubble discharge valve for discharging air bubbles inside the cylinder at the center of the upper end portion of the expansion portion. 3. The coating liquid supply device of the slit coater of claim 1, wherein the inner diameter of the piston sliding portion is larger than the outer diameter of the piston, thereby forming a gap between the sliding portion and the piston. A coating liquid supply passage for supplying a coating liquid is formed through the gap. 4. The coating liquid supply device of the slit coater of claim 1, wherein a ring-shaped sealing block surrounding an outer diameter of the piston is provided on an inner diameter surface of the piston sliding portion for guiding the piston Reciprocating motion. The coating liquid supply device of the slit coater of claim 4, wherein a plurality of seal rings for maintaining airtightness are provided on the inner surface of the seal block in contact with the piston. 6. The coating liquid supply device of the slit coater of claim 5, wherein the plurality of seal rings are disposed at a predetermined interval from each other. The coating liquid supply device of the slit coater of claim 5 is characterized in that a supply valve for receiving a coating liquid is connected to the piston sliding portion in front of the block. 8. The coating liquid supply device of the slit coater of claim 2, wherein the supply valve is closed during a forward stroke of the piston, the valve is open during a reverse stroke, and the output valve is advanced at a piston stroke The middle door is open and the valve is closed during the retreat. The coating liquid supply device of the slit coater of claim 8, wherein the supply valve is opened while applying pressure to the storage tank side to assist in filling. (10) The coating liquid supply device of the slit coater of claim 2, wherein the bubble discharge valve is opened when the piston advances to release air bubbles in the cylinder to the outside, and in the bubble During the discharge process, the output valve remains closed. 11. The coating liquid supply device of the slit coater of claim 1 is to be rounded at all corners of the cylinder expansion portion. 130496.doc
TW097114021A 2007-04-17 2008-04-17 Apparatus for providing photoresist of slit coater TWI410284B (en)

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