TWI410284B - Apparatus for providing photoresist of slit coater - Google Patents

Apparatus for providing photoresist of slit coater Download PDF

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Publication number
TWI410284B
TWI410284B TW097114021A TW97114021A TWI410284B TW I410284 B TWI410284 B TW I410284B TW 097114021 A TW097114021 A TW 097114021A TW 97114021 A TW97114021 A TW 97114021A TW I410284 B TWI410284 B TW I410284B
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Taiwan
Prior art keywords
piston
coating liquid
valve
slit coater
liquid supply
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TW097114021A
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Chinese (zh)
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TW200842523A (en
Inventor
Kang Il Cho
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K C Tech Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026Valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B9/00Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
    • B05B9/03Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
    • B05B9/04Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
    • B05B9/0403Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material
    • B05B9/0409Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump with pumps for liquids or other fluent material the pumps being driven by a hydraulic or a pneumatic fluid
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

A device for supplying a coating solution of a slit coater is provided to shorten the path through which the coating solution is supplied, thereby preventing a delay in ejection of the coating solution, and to enable scale up of the capacity of a pump, thereby improving the quality of a slit coater. A device(3) for supplying a coating solution of a slit coater comprises: a piston(20); and a cylinder(30) including a piston running portion(11) into which the piston is inserted so that the piston reciprocates along the horizontal direction, and an extended portion(13) formed by enlarging the space from the end of the piston running portion along the longitudinal direction. A feeding valve(V1) for controlling the supply of the coating solution is linked to the piston running portion, and an ejection valve(V2) for controlling the ejection of the coating solution is linked to the bottom of the extended portion.

Description

狹縫式塗佈機之塗佈液供應裝置Coating liquid supply device for slit coater

本發明係關於狹縫式塗佈機之塗佈液供應裝置,尤其係關於抽吸填充於儲藏罐中之塗佈液供應給狹縫式塗佈機的狹縫式塗佈機之塗佈液供應裝置。The present invention relates to a coating liquid supply device for a slit coater, and more particularly to a coating liquid for a slit coater that supplies a coating liquid filled in a storage tank to a slit coater. Supply device.

通常,在光微影製程中均勻塗佈光阻材料(PR:以下稱為塗佈液)之方法包含:將塗佈液加載於圓形滾輪的外部之後,在基板上向一定方向滾動該滾輪,由此將塗佈液塗佈至基板上面的滾塗方法;將基板放置在圓盤支撐體上面,在該基板中央滴落塗佈液之後進行轉動,從而利用離心力在基板上進行塗佈的旋轉塗佈方法;經由狹縫形態之噴嘴在基板上噴出塗佈液的同時按照一定方向掃掠而進行塗佈之狹縫塗層方法。Generally, a method of uniformly coating a photoresist (PR: hereinafter referred to as a coating liquid) in a photolithography process includes: after loading a coating liquid on the outside of a circular roller, rolling the roller in a certain direction on the substrate a method of applying a coating liquid onto the substrate, thereby placing the substrate on the disk support, rotating the coating liquid in the center of the substrate, and rotating the substrate to perform coating on the substrate by centrifugal force. A spin coating method is a slit coating method in which a coating liquid is sprayed onto a substrate while being sprayed in a predetermined direction through a nozzle in a slit form.

但是,基板越大越重,高速轉動基板就越困難。而且在高速轉動基板時存在基板破損及能量消耗大的問題,因此液晶顯示面板用的玻璃基板等平板顯示裝置用的基板上主要使用狹縫塗層方法。However, the larger the substrate, the heavier it is, and the more difficult it is to rotate the substrate at high speed. Further, there is a problem that the substrate is damaged and the energy consumption is large when the substrate is rotated at a high speed. Therefore, a slit coating method is mainly used for a substrate for a flat panel display device such as a glass substrate for a liquid crystal display panel.

用於進行該狹縫塗佈之狹縫塗層裝置包含:用於安裝基板之基板夾盤;設置在該基板夾盤一側之預噴出部;位於該基板夾盤及預噴出部之上部做水平移動的在基板上噴出塗佈液之狹縫噴嘴。即,狹縫噴嘴在預噴出部之上部進行預噴出之後,向安裝了基板之基板夾盤側水平移動,而為了使塗佈液均勻分布在基板上,狹縫噴嘴勻速移動並噴出 塗佈液。The slit coating device for performing the slit coating comprises: a substrate chuck for mounting a substrate; a pre-discharging portion disposed on a side of the substrate chuck; and a top portion of the substrate chuck and the pre-ejection portion A horizontally moving slit nozzle that ejects a coating liquid on a substrate. In other words, the slit nozzle is horizontally moved toward the substrate chuck side on which the substrate is mounted after being pre-discharged from the upper portion of the pre-discharge portion, and the slit nozzle is uniformly moved and ejected in order to uniformly distribute the coating liquid on the substrate. Coating solution.

圖1及圖2係根據先前技術之具備超聲波清洗裝置之基板塗層裝置的側面圖及立體圖。1 and 2 are a side view and a perspective view of a substrate coating apparatus equipped with an ultrasonic cleaning device according to the prior art.

由圖可知,先前技術之基板塗層裝置包含:塗佈部200;噴嘴部100;具備超聲波清洗裝置之預噴出部300。As is apparent from the drawings, the substrate coating apparatus of the prior art includes an application unit 200, a nozzle unit 100, and a pre-discharge unit 300 including an ultrasonic cleaning device.

塗佈部200包含:在底座400上面以具備高度調整機構之支架為媒介設置在中心部並形成多個上下貫通之貫通孔的台子210;可以在該底座400與台子210之間升降並在上面設置多個頂針220之水平板230。The coating unit 200 includes a table 210 that is disposed on the base 400 with a bracket having a height adjustment mechanism as a medium and is formed with a plurality of through holes penetrating vertically; the base 400 and the table 210 can be lifted and lowered A plurality of horizontal plates 230 of thimbles 220 are provided.

該多個頂針220插入於該台子210之貫通孔內,隨著該水平板230之升降,或者突出於該台子210上部,或者退至該台子210內部。由此,該多個頂針220具有自台子210提昇基板或者降下基板的作用。The plurality of thimbles 220 are inserted into the through holes of the table 210, and as the horizontal plate 230 rises and falls, protrudes from the upper portion of the table 210 or retreats into the interior of the table 210. Thus, the plurality of thimbles 220 have the function of lifting the substrate from the table 210 or lowering the substrate.

同時,底座400上面之左右兩側,即在該台子210左右外側,配備了在縱向上延伸而形成的一對長導軌240。該對導軌240上分別設置了移送裝置250做縱向移動。At the same time, the left and right sides of the base 400, that is, on the left and right sides of the table 210, are provided with a pair of long guide rails 240 extending in the longitudinal direction. The pair of guide rails 240 are respectively provided with a transfer device 250 for longitudinal movement.

在該對移送裝置250之間支撐著橫跨該台子210的將塗佈液等塗層劑噴出至玻璃等基板500上進行塗佈之噴嘴部100。該噴嘴部100之狹縫噴嘴110呈在橫向左右方向延伸而形成的桿(bar)狀,通常大於基板之左右寬度。A nozzle unit 100 that sprays a coating agent such as a coating liquid onto the substrate 500 such as glass across the table 210 is applied between the pair of transfer devices 250. The slit nozzle 110 of the nozzle unit 100 has a bar shape extending in the lateral direction and is generally larger than the left and right widths of the substrate.

該狹縫噴嘴110下面形成沿該橫向上延伸之微細噴出口120,以噴出塗佈液。經由該線形噴出口120可以在基板500上噴出一定量的塗佈液。A fine discharge port 120 extending in the lateral direction is formed under the slit nozzle 110 to eject a coating liquid. A certain amount of the coating liquid can be ejected onto the substrate 500 via the linear ejection port 120.

而且,該移送裝置250在支撐該噴嘴部100兩側的狀態 下,以一定速度沿縱向移動,由此在台子210上移動噴嘴部100。同時,該移送裝置250可以在垂直方向上調整噴嘴部100之高度,對應塗佈液的量及黏度,可以精細地控制該狹縫噴嘴110之輸出口120與基板500之間的間距。Moreover, the transfer device 250 is in a state of supporting both sides of the nozzle portion 100. Next, it moves in the longitudinal direction at a certain speed, thereby moving the nozzle portion 100 on the table 210. At the same time, the transfer device 250 can adjust the height of the nozzle portion 100 in the vertical direction, and the distance between the output port 120 of the slit nozzle 110 and the substrate 500 can be finely controlled corresponding to the amount and viscosity of the coating liquid.

另外,給該噴嘴部100提供塗佈液之裝置包含:設置在該移送裝置250一側之塗佈液供應部130;連通該塗佈液供應部130與狹縫噴嘴110之間的第1供應管路140;自外部供應源(未圖示)給該塗佈液供應部130提供塗佈液之第2供應管路150。Further, the apparatus for supplying the coating liquid to the nozzle unit 100 includes a coating liquid supply unit 130 provided on the transfer device 250 side, and a first supply between the coating liquid supply unit 130 and the slit nozzle 110. The line 140; the second supply line 150 for supplying the coating liquid to the coating liquid supply unit 130 from an external supply source (not shown).

經由第2供應管路自該外部供應源給塗佈液供應部130提供塗佈液。塗佈液供應部130利用設置在其內部的泵給塗佈液施加預定壓力,以使塗佈液經過第1供應管路140供應至狹縫噴嘴110之後,以預定壓力自狹縫噴嘴110之噴出口120噴出。The coating liquid is supplied from the external supply source to the coating liquid supply unit 130 via the second supply line. The coating liquid supply unit 130 applies a predetermined pressure to the coating liquid by means of a pump provided inside the coating liquid so that the coating liquid is supplied from the first supply line 140 to the slit nozzle 110 at a predetermined pressure from the slit nozzle 110. The discharge port 120 is ejected.

在該塗佈部200一側配備了預噴出部300。即,該預噴出部300沿著噴嘴部100之移動方向設置,且位於該噴嘴部100下部。A pre-discharging portion 300 is provided on the side of the coating portion 200. That is, the pre-discharge portion 300 is provided along the moving direction of the nozzle portion 100 and is located at the lower portion of the nozzle portion 100.

該預備輸出部300由機架310及位於該機架310內部之預塗滾子320構成。The preliminary output unit 300 is composed of a frame 310 and a precoat roller 320 located inside the frame 310.

但是,如上所述先前技術之狹縫式塗佈機之塗佈液供應部130由氣缸及活塞結構之加壓泵(未圖示)構成,並將加壓泵垂直設置在底座400上部,因此若所處環境在室內,則由於天花板高度的限制,在空間上會受到制約。However, as described above, the coating liquid supply unit 130 of the slit coater of the prior art is constituted by a cylinder and a pump (not shown) having a piston structure, and the pressurizing pump is vertically disposed at the upper portion of the base 400, If the environment is indoors, it will be restricted in space due to the height of the ceiling.

即,活塞之前進、後退行程將會受到空間的限制,因而 很難增大加壓泵之容量。That is, the forward and reverse strokes of the piston will be limited by space, thus It is difficult to increase the capacity of the pressurizing pump.

而且,若將先前技術之加壓泵不合理地設置在水平方向上使用,則氣缸內的氣泡會被關在內部而無法排出至外部,由此發生硬化塗佈液之問題,最終引發無法使用整個加壓泵之嚴重問題。Further, if the prior art pressure pump is unreasonably disposed in the horizontal direction, the air bubbles in the cylinder are shut off inside and cannot be discharged to the outside, thereby causing a problem of hardening the coating liquid, which eventually causes the use to be unusable. A serious problem with the entire pressurized pump.

並且,雖然利用第1供應管路140連接塗佈液供應部130及狹縫噴嘴110,但相對於塗佈液供應部130之固定設置,由於狹縫噴嘴110係往復移送之結構,因此固定設置該第1供應管路140將面臨諸多不便,而且由於塗佈液移送距離會超出必要距離,因而存在塗佈液輸出時點延遲的問題。Further, although the coating liquid supply unit 130 and the slit nozzle 110 are connected by the first supply line 140, the slit nozzle 110 is reciprocally transferred with respect to the fixed installation of the coating liquid supply unit 130, and thus is fixedly disposed. The first supply line 140 faces a lot of inconvenience, and since the transfer distance of the coating liquid exceeds the necessary distance, there is a problem that the coating liquid is delayed at the time of output.

本發明係為解決上述問題而提出,本發明之目的在於將用於塗佈液供應之加壓泵沿水平方向設置在狹縫噴嘴上部。The present invention has been made to solve the above problems, and an object of the present invention is to provide a pressurizing pump for supplying a coating liquid in a horizontal direction in an upper portion of a slit nozzle.

為了實現上述目的,根據本發明所提供之塗佈液供應裝置包含:活塞;氣缸,該氣缸形成插入該活塞並使該活塞在水平方向上做往復運動之活塞滑行部,並且形成在該活塞滑行部末端朝上下方向擴張空間之擴管部。In order to achieve the above object, a coating liquid supply device according to the present invention includes: a piston; a cylinder that forms a piston sliding portion that inserts the piston and reciprocates the piston in a horizontal direction, and is formed to slide on the piston The end of the portion expands the expansion portion of the space in the vertical direction.

此處,該活塞滑行部連接用於控制塗佈液供應之供應閥,在該擴管部之下端部連接用於控制塗佈液輸出之輸出閥,在該擴管部上端部中央設置用於排出氣缸內部氣泡之氣泡排出閥。Here, the piston sliding portion is connected to a supply valve for controlling the supply of the coating liquid, and an output valve for controlling the output of the coating liquid is connected to the lower end portion of the expansion pipe portion, and the center of the upper end portion of the expansion pipe portion is provided for A bubble discharge valve that discharges air bubbles inside the cylinder.

而且,該活塞滑行部之內徑大於活塞之外徑,由此在活塞滑行部與活塞之間形成間隙,經由該間隙形成用於供應 塗佈液之塗佈液供應通道。Moreover, the inner diameter of the piston sliding portion is larger than the outer diameter of the piston, thereby forming a gap between the piston sliding portion and the piston, via which the gap is formed for supply The coating liquid supply channel of the coating liquid.

並且,在該活塞滑行部之內徑面上設置包圍活塞外徑之圓環型密封塊,用以引導活塞之往復運動。Further, a ring-shaped sealing block surrounding the outer diameter of the piston is provided on the inner diameter surface of the piston sliding portion for guiding the reciprocating motion of the piston.

此處,與活塞相接觸之該密封塊之內面上設置多個用於保持氣密性之密封圈。Here, a plurality of seal rings for maintaining airtightness are provided on the inner surface of the seal block that is in contact with the piston.

而且,該等密封圈設置兩個以上,且多個密封圈相互保持預定間距而設置。Moreover, the seal rings are provided in two or more, and the plurality of seal rings are disposed at a predetermined interval from each other.

在該密封塊前方之活塞滑行部上連接用於接收塗佈液之供應閥。A supply valve for receiving the coating liquid is connected to the piston sliding portion in front of the sealing block.

此處,該供應閥在活塞的前進行程中閥門關閉,在後退行程中閥門開放,而該輸出閥在活塞前進行程中閥門開放,在後退行程中閥門封閉。Here, the supply valve is closed during the forward stroke of the piston, the valve is open during the reverse stroke, and the valve is open during the forward stroke of the piston, and the valve is closed during the reverse stroke.

而且,在開放該供應閥的同時對於儲藏罐側之塗佈液施壓,以協助填充。Further, the coating liquid on the storage tank side is pressed while the supply valve is opened to assist in filling.

該氣泡排出閥在活塞前進行程時開啟,以向外部放出氣缸內的氣泡,而氣泡排出進行過程中,輸出閥維持關閉狀態。The bubble discharge valve is opened at the forward stroke of the piston to discharge the air bubbles in the cylinder to the outside, and the output valve is maintained in the closed state while the bubble is being discharged.

此處,氣缸擴管部之稜角處全部進行圓角處理。Here, all the corners of the cylinder expansion portion are rounded.

以下,參照附圖來詳細說明本發明之較佳實施例。Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

圖3係採用本發明之塗佈液供應裝置之狹縫式塗佈機之概略圖,圖4係表示本發明之塗佈液供應裝置之內部結構之剖視圖。Fig. 3 is a schematic view showing a slit coater using the coating liquid supply device of the present invention, and Fig. 4 is a cross-sectional view showing the internal structure of the coating liquid supply device of the present invention.

如圖所示,根據本發明實施例之狹縫塗佈機之塗佈液供 應裝置3沿水平方向設置在狹縫噴嘴4上側。該塗佈液供應裝置3自另外設置之儲藏罐5接收塗佈液,在供應管路上設置可以控制塗佈液供應之供應閥V1。As shown in the figure, a coating liquid for a slit coater according to an embodiment of the present invention is provided. The device 3 is disposed on the upper side of the slit nozzle 4 in the horizontal direction. The coating liquid supply device 3 receives the coating liquid from the separately provided storage tank 5, and supplies a supply valve V1 that can control the supply of the coating liquid on the supply line.

而且,該狹縫噴嘴4設置在底座1上部,由移送裝置做左右往復移動,由此在基板(未圖示)表面噴射塗佈液形成塗層。Further, the slit nozzle 4 is provided on the upper portion of the base 1, and is reciprocated left and right by the transfer device, whereby the coating liquid is sprayed on the surface of the substrate (not shown) to form a coating layer.

參照圖4詳細說明本發明之塗佈液供應裝置3。本發明之塗佈液供應裝置3包含氣缸10及插入至該氣缸10內部做往復運動之活塞20。The coating liquid supply device 3 of the present invention will be described in detail with reference to Fig. 4 . The coating liquid supply device 3 of the present invention comprises a cylinder 10 and a piston 20 inserted into the cylinder 10 to reciprocate.

該氣缸10形成插入活塞20並使其在水平方向上做往復運動之活塞滑行部11及在該活塞滑行部11之末端朝上下方向擴張空間之擴管部13。The cylinder 10 forms a piston sliding portion 11 that is inserted into the piston 20 and reciprocates in the horizontal direction, and a pipe expanding portion 13 that expands the space in the vertical direction at the end of the piston sliding portion 11.

此時,該活塞滑行部11之內徑大於活塞20之外徑,由此在活塞滑行部11與活塞20之間形成間隙(GAP),從而經由該間隙形成供應塗佈液之塗佈液供應通道12。At this time, the inner diameter of the piston sliding portion 11 is larger than the outer diameter of the piston 20, thereby forming a gap (GAP) between the piston sliding portion 11 and the piston 20, thereby forming a coating liquid supply for supplying the coating liquid via the gap. Channel 12.

而且,在該活塞滑行部11內部設置圓環型密封塊30,以穩定地支撐活塞20之往復運動。Further, a ring-shaped seal block 30 is provided inside the piston sliding portion 11 to stably support the reciprocating motion of the piston 20.

此時,在與活塞20相接觸之該密封塊30內面設置多個密封圈31,由此可以提高維持氣密性的能力。而且,該多個密封圈31可以相隔預定間距設置。At this time, a plurality of seal rings 31 are provided on the inner surface of the seal block 30 which is in contact with the piston 20, whereby the ability to maintain airtightness can be improved. Moreover, the plurality of seal rings 31 may be disposed at a predetermined interval.

此處,設置該密封塊30之前方側活塞滑行部11上連通了用於自外部儲藏罐5接收塗佈液之供應管路,該供應管路上設置供應閥V1。Here, before the sealing block 30 is disposed, the side side piston sliding portion 11 communicates with a supply line for receiving the coating liquid from the external storage tank 5, and the supply line is provided with a supply valve V1.

該供應閥V1在活塞20處於前進行程時,閥門關閉,在活 塞20處於後退行程時,閥門開放。The supply valve V1 is closed when the piston 20 is in the forward stroke, and is alive. When the plug 20 is in the retracting stroke, the valve is open.

即,在活塞20處於前進行程時,供應閥V1關閉,防止填充於氣缸10內部之塗佈液由於受到活塞20的壓力而逆流至儲藏罐5側,在活塞20的後退行程中,供應閥V1開放,塗佈液供應至氣缸10內部進行填充。That is, when the piston 20 is in the forward stroke, the supply valve V1 is closed, and the coating liquid filled in the inside of the cylinder 10 is prevented from flowing back to the storage tank 5 side by the pressure of the piston 20, and in the reverse stroke of the piston 20, the supply valve V1 is supplied. Open, the coating liquid is supplied to the inside of the cylinder 10 for filling.

此時,可以在開放供應閥V1的同時對儲藏罐5側塗佈液施加一定壓力進行供應,由此協助填充過程。為此,可以在儲藏罐5側另外設置加壓泵。At this time, it is possible to supply a certain pressure to the coating liquid on the side of the storage tank 5 while opening the supply valve V1, thereby assisting the filling process. To this end, a pressure pump can be additionally provided on the side of the storage tank 5.

在該活塞20處於前進行程時,填充於活塞滑行部11內之塗佈液將被送至擴管部13側。When the piston 20 is in the forward stroke, the coating liquid filled in the piston sliding portion 11 is sent to the expansion tube portion 13 side.

該擴管部13形成剖面形狀大致為長方形之內部空間,在其下端部中央形成直接連接於狹縫噴嘴4之輸出閥V2。The expanded portion 13 has an inner space having a substantially rectangular cross-sectional shape, and an output valve V2 directly connected to the slit nozzle 4 is formed at the center of the lower end portion.

該輸出閥V2在活塞20處於前進行程時,閥門開放,在活塞20處於後退行程時,閥門關閉。The output valve V2 is open when the piston 20 is in the forward stroke, and is closed when the piston 20 is in the reverse stroke.

即,活塞20處於前進行程時輸出閥V2開啟,使得填充於擴管部13內之塗佈液供應至狹縫噴嘴4側,而在活塞20處於後退行程時輸出閥V2關閉,防止因活塞20後退時形成之真空壓而將狹縫噴嘴4內之塗佈液吸入至氣缸10側。That is, the output valve V2 is opened when the piston 20 is in the forward stroke, so that the coating liquid filled in the expanded portion 13 is supplied to the slit nozzle 4 side, and the output valve V2 is closed when the piston 20 is in the backward stroke, preventing the piston 20 from being closed. The coating liquid in the slit nozzle 4 is sucked into the cylinder 10 side by the vacuum pressure formed at the time of retreating.

而且,該擴管部13上端部中央位置上形成氣泡排出閥V3,該氣泡排出閥V3經由另外設置的管與擴管部13連接。Further, a bubble discharge valve V3 is formed at a central position of the upper end portion of the expanded portion 13, and the bubble discharge valve V3 is connected to the expanded portion 13 via a separately provided tube.

如上所述氣泡排出閥V3在活塞20處於前進行程時開啟,將氣缸10內部的氣泡排出至外部。The bubble discharge valve V3 is opened as described above when the piston 20 is in the forward stroke, and the air bubbles inside the cylinder 10 are discharged to the outside.

此時,當利用另外的加壓泵協助塗佈液填充於氣缸10內 時,加壓泵在氣缸10內部產生正壓,而為了消除此正壓開放氣泡排出閥V3時,氣缸10內的氣泡就會排出至外部。At this time, when the additional pressure pump is used to assist the coating liquid to be filled in the cylinder 10 At this time, the pressure pump generates a positive pressure inside the cylinder 10, and in order to eliminate the positive pressure open bubble discharge valve V3, the air bubbles in the cylinder 10 are discharged to the outside.

在該氣泡排出閥V3開啟之狀態下,若進行氣泡排氣,該輸出閥V2維持關閉狀態。接著該氣泡排出結束之後,關閉氣泡排出閥V3開放輸出閥V2,以輸出塗佈液。When the bubble discharge valve V3 is opened, the discharge valve V2 is maintained in the closed state when the bubble exhaust is performed. After the bubble discharge is completed, the bubble discharge valve V3 is closed to open the output valve V2 to output the coating liquid.

此時,該氣泡排出閥V3必須設置在擴管部13之上端部,因為氣缸10內部的氣泡受到浮力作用浮至上側。At this time, the bubble discharge valve V3 must be provided at the upper end portion of the expanded portion 13, because the air bubbles inside the cylinder 10 are floated to the upper side by buoyancy.

而且,為了防止浮至上側之氣泡被卡在擴管部13之稜角處,應對稜角進行圓角13a處理。Further, in order to prevent the air bubbles floating to the upper side from being caught at the corners of the expanded portion 13, the corners should be rounded 13a.

如上構成之本發明提供之狹縫塗佈機之塗佈液供應裝置最好平行於狹縫噴嘴4之上部設置,但設置時亦可以與狹縫噴嘴4的上部之間形成一定角度。The coating liquid supply device of the slit coater provided by the present invention constructed as above is preferably disposed parallel to the upper portion of the slit nozzle 4, but may be disposed at a certain angle with the upper portion of the slit nozzle 4.

此時,在傾斜設置塗佈液供應裝置時,為了最小化塗佈液之移送距離,擴管部13側最好靠近狹縫噴嘴4之上面設置。At this time, in order to minimize the transfer distance of the coating liquid when the coating liquid supply device is disposed obliquely, it is preferable that the expansion portion 13 side is disposed close to the upper surface of the slit nozzle 4.

具有如上所述之組成及作用之本發明,可由熟習此項技術者利用前面說明之各種實施例進行各種修改及變更,因此本發明之技術範圍不限於說明書所記載之內容,而應由申請專利範圍限定。The present invention having the above-described composition and function can be variously modified and modified by those skilled in the art using the various embodiments described above, and thus the technical scope of the present invention is not limited to the contents described in the specification, but should be patented. The scope is limited.

本發明在狹縫噴嘴上部沿水平方向設置用於供應塗佈液的泵,縮短了塗佈液之供應路徑,在解決輸出延遲引發之問題的同時可以實現泵容量之大型化,因此具有提高狹縫塗佈機效能之效果。The present invention provides a pump for supplying a coating liquid in a horizontal direction in the upper portion of the slit nozzle, shortens the supply path of the coating liquid, and can solve the problem caused by the output delay, and can realize an increase in pump capacity, thereby improving the narrowness. The effect of the coater performance.

1‧‧‧底座1‧‧‧Base

2‧‧‧移送裝置2‧‧‧Transfer device

3‧‧‧塗佈液供應裝置3‧‧‧ Coating liquid supply device

4‧‧‧狹縫噴嘴4‧‧‧Slit nozzle

5‧‧‧儲藏罐5‧‧‧ storage tank

10‧‧‧氣缸10‧‧‧ cylinder

11‧‧‧活塞滑行部11‧‧‧Piston Sliding Department

12‧‧‧塗佈液供應通道12‧‧‧ Coating liquid supply channel

13‧‧‧擴管部13‧‧‧Extension Department

13a‧‧‧圓角13a‧‧‧ fillet

20‧‧‧活塞20‧‧‧Piston

30‧‧‧密封塊30‧‧‧ Sealing block

31‧‧‧密封圈31‧‧‧ Sealing ring

100‧‧‧噴嘴部100‧‧‧Nozzle Department

110‧‧‧狹縫噴嘴110‧‧‧Slit nozzle

120‧‧‧噴出口/輸出口120‧‧‧ spout/outlet

130‧‧‧塗佈液供應部130‧‧‧ Coating Liquid Supply Department

140‧‧‧第1供應管路140‧‧‧1st supply line

150‧‧‧第2供應管路150‧‧‧2nd supply line

200‧‧‧塗佈部200‧‧‧ Coating Department

210‧‧‧台子210‧‧‧Table

220‧‧‧頂針220‧‧‧ thimble

230‧‧‧水平板230‧‧‧ horizontal board

240‧‧‧導軌240‧‧‧rail

250‧‧‧移送裝置250‧‧‧Transfer device

300‧‧‧預噴出部/預備輸出部300‧‧‧Pre-ejection/prepared output

310‧‧‧機架310‧‧‧Rack

320‧‧‧預塗滾子320‧‧‧Pre-coated roller

400‧‧‧底座400‧‧‧Base

500‧‧‧基板500‧‧‧Substrate

V1‧‧‧供應閥V1‧‧‧ supply valve

V2‧‧‧輸出閥V2‧‧‧ output valve

V3‧‧‧氣泡排出閥V3‧‧‧ bubble discharge valve

圖1及圖2係根據先前技術之基板塗層裝置之側面圖及立體圖。1 and 2 are side and perspective views of a substrate coating apparatus according to the prior art.

圖3係採用本發明之塗佈液供應裝置之狹縫塗佈機之概略圖。Fig. 3 is a schematic view of a slit coater using the coating liquid supply device of the present invention.

圖4係表示本發明之塗佈液供應裝置內部結構之剖視圖。Fig. 4 is a cross-sectional view showing the internal structure of the coating liquid supply device of the present invention.

1‧‧‧底座1‧‧‧Base

2‧‧‧移送裝置2‧‧‧Transfer device

3‧‧‧塗佈液供應裝置3‧‧‧ Coating liquid supply device

4‧‧‧狹縫噴嘴4‧‧‧Slit nozzle

5‧‧‧儲藏罐5‧‧‧ storage tank

V1‧‧‧供應閥V1‧‧‧ supply valve

V3‧‧‧氣泡排出閥V3‧‧‧ bubble discharge valve

Claims (8)

一種狹縫式塗佈機之塗佈液供應裝置,其特徵在於包含:活塞;氣缸,該氣缸形成插入該活塞並使該活塞在水平方向上做往復運動之活塞滑行部,並且形成在該活塞滑行部末端朝上下方向擴張空間之擴管部;其中,在該活塞滑行部之內徑面上設置包圍活塞外徑之圓環型密封塊,用以引導活塞之往復運動。 A coating liquid supply device for a slit coater, comprising: a piston; a cylinder that forms a piston sliding portion that inserts the piston and reciprocates the piston in a horizontal direction, and is formed on the piston The end portion of the sliding portion expands the space in the up-and-down direction; wherein a ring-shaped sealing block surrounding the outer diameter of the piston is disposed on the inner diameter surface of the piston sliding portion for guiding the reciprocating movement of the piston. 如請求項1之狹縫式塗佈機之塗佈液供應裝置,其中,與活塞相接觸之該密封塊之內面上設置多個用於保持氣密性之密封圈。 The coating liquid supply device of the slit coater of claim 1, wherein a plurality of seal rings for maintaining airtightness are provided on an inner surface of the seal block that is in contact with the piston. 如請求項2之狹縫式塗佈機之塗佈液供應裝置,其中,該多個密封圈相互之間保持預定間距而設置。 The coating liquid supply device of the slit coater of claim 2, wherein the plurality of seal rings are disposed at a predetermined interval from each other. 如請求項2之狹縫式塗佈機之塗佈液供應裝置,其中,在該密封塊前方之活塞滑行部上連接用於接收塗佈液之供應閥。 The coating liquid supply device of the slit coater of claim 2, wherein a supply valve for receiving the coating liquid is connected to the piston sliding portion in front of the sealing block. 如請求項1之狹縫式塗佈機之塗佈液供應裝置,其中,該活塞滑行部連接用於控制塗佈液供應之供應閥,在該擴管部之下端部連接用於控制塗佈液輸出之輸出閥,在該擴管部上端部中央設置用於排出氣缸內部氣泡之氣泡排出閥;且其中,該氣泡排出閥在活塞前進行程時開啟,以向外部放出氣缸內的氣泡,而在氣泡排出過程中,輸出閥維 持關閉狀態。 The coating liquid supply device of the slit coater of claim 1, wherein the piston sliding portion is connected to a supply valve for controlling supply of the coating liquid, and the lower end portion of the expanded portion is connected for controlling coating a liquid output output valve in which a bubble discharge valve for discharging air bubbles inside the cylinder is disposed at a center of an upper end portion of the expansion pipe portion; and wherein the bubble discharge valve is opened at a forward stroke of the piston to discharge air bubbles in the cylinder to the outside. Output valve dimension during bubble discharge Closed. 如請求項5之狹縫式塗佈機之塗佈液供應裝置,其中,該供應閥在活塞的前進行程中閥門關閉,在後退行程中閥門開放,而該輸出閥在活塞前進行程中閥門開放,在後退行程中閥門關閉。 The coating liquid supply device of the slit coater of claim 5, wherein the supply valve is closed during the forward stroke of the piston, the valve is opened during the reverse stroke, and the valve is open during the forward stroke of the piston The valve closes during the retraction stroke. 如請求項6之狹縫式塗佈機之塗佈液供應裝置,其中,在開放該供應閥的同時對於儲藏罐側之塗佈液施壓,以協助填充。 The coating liquid supply device of the slit coater of claim 6, wherein the coating liquid on the storage tank side is pressurized while the supply valve is opened to assist in filling. 如請求項1之狹縫式塗佈機之塗佈液供應裝置,其中,該活塞滑行部之內徑大於活塞之外徑,由此在活塞滑行部與活塞之間形成間隙,經由該間隙形成用於供應塗佈液之塗佈液供應通道;且其中,氣缸擴管部之稜角處全部進行圓角處理。The coating liquid supply device of the slit coater of claim 1, wherein an inner diameter of the piston sliding portion is larger than an outer diameter of the piston, thereby forming a gap between the piston sliding portion and the piston, forming a gap through the gap a coating liquid supply passage for supplying a coating liquid; and wherein the corners of the cylinder expansion portion are all rounded.
TW097114021A 2007-04-17 2008-04-17 Apparatus for providing photoresist of slit coater TWI410284B (en)

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CN103170432B (en) * 2011-12-20 2015-07-29 龙焱能源科技(杭州)有限公司 Solution coating machine
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CN105080789B (en) * 2015-08-10 2017-11-07 深圳市华星光电技术有限公司 Apparatus for coating and spreader
CN107398396A (en) * 2017-08-24 2017-11-28 武汉华星光电技术有限公司 The apparatus for coating and coating method of photoresist
CN112289964B (en) * 2020-10-30 2022-09-27 合肥维信诺科技有限公司 Preparation method of display substrate and preparation method of display panel

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