TW200839439A - Coloring photosensitive resin composition - Google Patents

Coloring photosensitive resin composition Download PDF

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Publication number
TW200839439A
TW200839439A TW096147587A TW96147587A TW200839439A TW 200839439 A TW200839439 A TW 200839439A TW 096147587 A TW096147587 A TW 096147587A TW 96147587 A TW96147587 A TW 96147587A TW 200839439 A TW200839439 A TW 200839439A
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Taiwan
Prior art keywords
acid
resin composition
photosensitive resin
compound
group
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TW096147587A
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Chinese (zh)
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Koji Ichikawa
Yuji Akiyama
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Sumitomo Chemical Co
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/04Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10Amino derivatives of triarylmethanes
    • C09B11/24Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a novel coloring photosensitive resin composition from which the residue remains after development in the preparation of color filter is few, even pigment is contained therein in high concentration. The coloring photosensitive resin composition, comprising pigment (A), a binder resin (B), a photopolymerizable initiator (D), and a solvent (E), is characterized in that the content of the pigment (A) based on mass fraction with respect to the solid matter of the composition is 35 to 60 mass%, and the photopolymerizable compound (C) contains the compound represented by the formula (I)

Description

200839439 i 九、發明說明: 【發明所屬之技術領域】 本發明係有關一種著色感光性樹脂組成物。 【先前技術】 著色感光性樹脂組成物係用在CCD (電荷耦合元件)、 CM0S(comPlementary metap〇xide semic〇nduct〇厂互補 金屬氧化半導體)等影像感測器,或液晶顯示面板、電致L 籲光、電漿顯示面板等顯示裝置所使用的彩色濾光片之製造X。 其中,在影像感測器用彩色濾光片中,已隨著影像感 測器之高像素化,而需求一種高解析度且膜厚度較薄者。 由於單使膜厚度變薄時會使色濃度變淡,因此為了確保充 刀勺色/辰度而必須&南开〉成彩色濾、光片之像素的感光性樹 =組成物中之顏料濃度。然而,在使用含有高濃度顏料之 著色感光性樹脂組成物形成膜”·並使用預定形狀之遮罩使 之曝光後,以顯影液去除不用部分而製造彩色濾光片時, φ而有大1以頒衫液無法去除的顯影殘渣餘留之問題點(例 如,參照專利文獻D。 、口此已正著手於檢討即使含有高濃度之顏料而顯影 殘,為少之彩色濾光片製造用的著色感光性樹脂組成物, 而提木種在由著色劑、黏合劑樹脂、光聚合性化合物、 光=合起始劑以及溶劑所成之著色感光性樹脂組成物中, 光♦。忮化合物係由乙氧化二季戊四醇六丙烯酸酯以及乙 氧化季戊四醇所構成者(例如,參照專利文獻2),然而在 〜像感測盗用彩色濾光片之製造時,於顯影殘渣之改善方 319803 6 200839439 v 面尚有改良的空間。 [專利文獻1]日本特開平8-271723號公報 [專利文獻2]日本特開平10-62986號公報 【發明内容】 、本孓月之目的係提供一種著色感光性組成物,該著色 感光性樹脂組成物即使含有高濃度之顏料,在彩色濾光片 之製造中亦少有顯影殘渣。 籲 本案發明人等為了發現可解決如上述之問題的著色感 光性樹脂組成物而進行檢討之結果,發現一種含有甘油三 丙烯酸醋衍生物作為光聚合性化合物的著色感光性樹脂組 成物可解決上述之問題。 亦即,本發明係提供以下[1]至[6]者。 [1 ]·種者色感光性樹脂組成物,係包含(A)顏料、(β)黏 合劑樹脂、(C)光聚合性化合物、(D)光聚合起始劑,以及 (Ε)溶劑者,其特徵係:相對於該著色感光性樹脂組成物之 _固开^刀’(A)顏料之含量以質量分率計,為35至質量%, 而且(C)光聚合性化合物包含式(丨)所示之化合物 Ο200839439 i IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a colored photosensitive resin composition. [Prior Art] The coloring photosensitive resin composition is used in an image sensor such as a CCD (Charge Coupled Device), a CM0S (comPlementary metap〇xide semiconductor) or a liquid crystal display panel or an electro-induced L Manufacturing of color filters used in display devices such as light and plasma display panels. Among them, in the color filter for image sensor, a high resolution and a thin film thickness have been required along with the high pixelation of the image sensor. Since the film thickness is made thinner when the thickness of the film is thinned, it is necessary to ensure the color/length of the knife, and it is necessary to make a color filter, a photosensitive tree of the pixel of the light film, and a pigment concentration in the composition. . However, when a coloring photosensitive resin composition containing a high concentration of pigment is used to form a film, and a mask having a predetermined shape is used for exposure, and a color filter is produced by removing a portion of the developer with a developer, φ is large. The problem of remaining the development residue that cannot be removed by the shirting liquid (for example, refer to Patent Document D. The mouth is already working on the development of a color filter which is less developed even if it contains a high concentration of pigment. The coloring photosensitive resin composition is colored, and the wood is colored in a coloring photosensitive resin composition made of a coloring agent, a binder resin, a photopolymerizable compound, a photo-initiator, and a solvent. It is composed of dipentaerythritol hexaacrylate hexaacrylate and ethoxylated pentaerythritol (for example, refer to Patent Document 2). However, in the manufacture of the image-sensing smear color filter, the improvement of the development residue is 319803 6 200839439 v There is a space for improvement. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. Hei 8-- No. Hei. It is an object of the present invention to provide a coloring photosensitive composition which does not have a development residue in the production of a color filter even if it contains a high concentration of pigment. As a result of reviewing the problem of the colored photosensitive resin composition, it was found that a colored photosensitive resin composition containing a glycerin triacrylate vinegar derivative as a photopolymerizable compound can solve the above problems. That is, the present invention provides the following [ 1] to [6]. [1] The color of the photosensitive resin composition includes (A) pigment, (β) binder resin, (C) photopolymerizable compound, and (D) photopolymerization initiation. The agent and the (Ε) solvent are characterized in that the content of the pigment of the coloring photosensitive resin composition is 35 to 3% by mass, and (C) The photopolymerizable compound contains a compound represented by the formula (丨)Ο

、0 0 ο (I) [式(I )中,1、JQ以及n為各自獨立,表示Q以上之整數, Hm+n表示3至20之整數]。 319803 7 200839439 [2 ] ·如[1 1 合物,式己載之組成物,其中,相對於⑹光聚合性化 暂吾所不化合物之含量以質量分率計,為5至100 :生Si且^2]所記載之組成物,其中,相對於著色感光 :、且成物之固形分,(c)光聚合性化合物之含量以質量 刀平。十’為5至45質量%。 [4]·如[1]所記載之組成物,其中,式(1)所示之化合物中, Hm+n表示3至12之整數。 []•如[1 ]所記載之組成物,其中,式(I)所示之化合物中, l+m+n表示6至12之整數。 []種圖案,係使用[1 ]至[5 ]中任一項所記載之組成物 所形成者。 [7 ] · 種彩色濾光片,係包含[6 ]所記載之圖案者。 [8]·—種影像感測器”係具備[7]之彩色濾光片者。. 【實施方式】 本發明之著色感光性樹脂組成物,係包含(A)顏料、(B) 黏合姻樹脂、(C)光聚合性化合物、(D )光聚合起始劑,以 及(E)溶劑者,其特徵係:相對於著色感光性樹脂組成物之 固形分,(A)顏料之含量以質量分率計,為35至60質量%, 而且(C )光聚合性化合物包含式(I)所示之化合物 8 319803 2008394390 0 ο (I) [In the formula (I), 1, JQ and n are independent, each represents an integer of Q or more, and Hm+n represents an integer of 3 to 20]. 319803 7 200839439 [2] The composition of the compound of the formula (1), wherein the content of the photopolymerizable compound is 5 to 100 in terms of mass fraction relative to (6) photopolymerization: Further, in the composition described in the above, the content of the photopolymerizable compound is equal to the mass of the photopolymerizable compound, and the content of the photopolymerizable compound is equal to the mass. Ten' is 5 to 45% by mass. [4] The composition according to [1], wherein, in the compound represented by the formula (1), Hm+n represents an integer of from 3 to 12. [1] The composition according to [1], wherein, in the compound represented by the formula (I), l+m+n represents an integer of from 6 to 12. The [] pattern is formed by using the composition described in any one of [1] to [5]. [7 ] · A color filter containing the pattern described in [6]. [8] The image sensor is provided with the color filter of [7]. [Embodiment] The colored photosensitive resin composition of the present invention comprises (A) a pigment, and (B) a bond. The resin, (C) photopolymerizable compound, (D) photopolymerization initiator, and (E) solvent are characterized in that (A) the content of the pigment is in mass relative to the solid content of the colored photosensitive resin composition. a fraction of 35 to 60% by mass, and (C) a photopolymerizable compound comprising the compound of the formula (I) 8 319803 200839439

式(I)中,卜m以及η為各自獨立,表示〇以上之整 數’1偏η表示3至2G之整數。由所得膜之穿透率的觀點 而言,1 +m+n表示3至12之整數。 (C)光聚合性化合物係為可藉由經光照射而由(D)光聚 合起始劑所產生的活性自由基或酸等聚合而得之化合物。 本發明中所使用之(C)光聚合性化合物係包含式(1)所 示之化合物。 上述(C)光聚合性化合物中之式⑴中所示化合物之含 量以質量分率計,以5至100質量%為佳,以1〇至1〇〇質 量%為更佳,又以20至1〇〇質量%為特佳。 、 • 本發明所使用之(C)光聚合性化合物之中,亦可併用呈 現其他之光聚合性的化合物。在呈現其他之光聚合性的化 合物方面,以呈現3官能以上之多官能光聚合性的化合物 為佳。呈現3官能以上之多官能光聚合性的化合物之例可 列舉如:季戊四醇四丙稀酸酷、季戊四醇四甲基丙烤酸酉旨、 ,季戊四醇五?基丙稀_、二季戊四醇六甲基丙烯酸 酯、具有羧基之二季戊四醇五丙烯酸酯衍生物等。 相對於著色感光性樹脂組成物之固形分,上述(c)光聚 合性化合物之含量以質量分率計,以5至5〇質量%為佳: 319803 9 200839439In the formula (I), b and η are each independent, and the integer Δ1 above 〇 represents an integer of 3 to 2G. From the viewpoint of the transmittance of the resulting film, 1 + m + n represents an integer of 3 to 12. (C) The photopolymerizable compound is a compound obtainable by polymerization of an active radical or an acid generated by (D) a photopolymerization initiator by light irradiation. The (C) photopolymerizable compound used in the present invention contains a compound represented by the formula (1). The content of the compound represented by the formula (1) in the above (C) photopolymerizable compound is preferably 5 to 100% by mass, more preferably 1 to 1% by mass, and further preferably 20 to 10 parts by mass. 1% by mass is particularly good. In the (C) photopolymerizable compound used in the present invention, other photopolymerizable compounds may be used in combination. In the case of exhibiting other photopolymerizable compounds, a compound exhibiting a polyfunctional photopolymerizable property of three or more functional groups is preferred. Examples of the compound having a trifunctional or higher polyfunctional photopolymerizable property include, for example, pentaerythritol tetraacrylic acid, pentaerythritol tetramethylpropanoate, and pentaerythritol. A propylene group, a dipentaerythritol hexamethacrylate, a dipentaerythritol pentaacrylate derivative having a carboxyl group, and the like. The content of the above (c) photopolymerizable compound is preferably 5 to 5 % by mass based on the mass fraction of the coloring photosensitive resin composition: 319803 9 200839439

I 以10至40質量%為更佳,又以12至35質量%為特佳。(c) 光聚合性化合物之含量如在上述之範圍時,則會充分產生 硬化’顯影前後之膜厚比率得以提高,底凹(undercut)不 易混入圖案中而有密著性優異化的傾向,故較佳。 在此’著色感光性樹脂組成物之固形分係指(A)顏料、 (B)黏合劑樹脂、(c)光聚合性化合物、(D)光聚合起始劑, 以及依必要所添加成分在2 5 C中不為液狀之成分的總 量。 (A)顏料方面,具體上可列舉如:色彩索引(TheI is preferably from 10 to 40% by mass, and particularly preferably from 12 to 35% by mass. (c) When the content of the photopolymerizable compound is within the above range, the curing is sufficiently caused to increase the film thickness ratio before and after development, and the undercut is less likely to be mixed into the pattern, and the adhesion is excellent. Therefore, it is better. Here, the solid fraction of the coloring photosensitive resin composition means (A) pigment, (B) binder resin, (c) photopolymerizable compound, (D) photopolymerization initiator, and, if necessary, added components. 2 5 The total amount of liquid that is not liquid. (A) In terms of pigments, specifically, for example, color index (The

Society of Dyers and Colourists 出版)中分類在顏料 部分之化合物。具體而言係如: 顏料黃(C· I· pigment yellow )1、3、12、14、15、16、17、 20、24、31、53、83、86、93、94、109、110、117、125、 128、137、1·38、139、147、148、150、153、154、166、 173、194、214等黃色顏料。 φ 顏料橙(C· I· pigment orange)13、31、36、38、40、42、 43、51、55、59、6卜 64、65、71、73 等橙色顏料。 顏料紅(C· I, pigment red)9、97、105、122、123、144、 149、166、168、176、177、180、192、20 9、215、216、 224、242、254、255、264、265 等紅色顏料。 顏料藍(C· I · pigment blue)15、15: 3、15: 4、15:6、60 等藍色顏料。 顏料紫(C· I. pigment violet )1、19、23、29、32、36、38 等紫色顏料。 10 319803 200839439 顏料綠(C. I. pigment green)7、36等綠色顏料。 顏示(C. I. pigment brown)23、25 等棕色顏料。 顏料黑(C. I.pigment black”、7等黑色顏料等。 其中,以含有選自顏料黃138、139、15〇;顏料紅177、2〇9、 咖;顏料紫23;顏料藍15:3、15:6以及顏料綠7、36 所成組群之至少一種顏料為佳。 在形成紅色像素時,顏料之組合可列舉如:顏料紅Η? 與顏料紅254之組人、雜刺_廿ιπ:α t _ 顏枓頁15〇與顏料紅177與顏料紅 ^54之組合等。 •在形成綠色像素時,顏料之組合可列舉如:顏料普15〇 與顏料綠36之組合、多首袓至Ί Qri七 15ϋ 之組合等。 多、” Κ 9與顏料綠7與顏料綠36 在形絲色像切,㈣m刊舉如··該 15 · 3與顏料紫23之紐人 现 組合等。 口頒枓‘ 15 .名與顏料紫23之 分或含有:广咖 中之狀態的分散液。 仔至’顏科均勻地分散在溶液 上述分散劑之例可列舉如 離子系、兩性、聚萨备取 &離子糸、非 猸^ a 糸、聚胺系等界面活性劑,嗲箄 獨或組合兩種以上使用。 刎这4可早 氧乙:::==舉:··聚氧―類、聚 ㈣、脂肪酸改質 319803 11 200839439 V、 聚乙撐亞胺(polyethyleneimine)類等之外,尚可以商品名 稱列舉如KP(信越化學工業(股)製造)、P0LYFL0W(共榮化 學(股)製造)、FT0P(Tohkem products Corporation 製 造)、MEGAFACE(大日本油墨化學工業(股)製造)、FLUORAD (Sumitomo 3M Limited 製造)、ASAHIGUARD、SURFL0N(以 上為旭玻璃(股)製造)、SOLSPERSECZENECA(股)製造)、EFKA (EFKA Chemicals公司製造)、PB821(味之素(股)製造)等。 使用分散劑時,相對於顏料100質量%,其使用*以質 ⑩量分率計,以〇· 1至1〇〇質量%為佳,5至50質量%更佳。 •分散劑之使用量如在上述範圍時,因有可得均勻分散液之 傾向,故較佳。 相對於著色感光性樹脂組成物之固形分,本發明中所 使用(A)顏料之含量以質量分率計,為35至60質量% ’以 35至55質量%為佳,以35至50質量%為更佳。 其中,本說明書中所稱之固形分係指著色感光性樹月旨 •組成物之(A)顏料、(B)黏合劑樹脂、(C)光聚合性化合物、 (D)光聚合起始劑,以及視需要所添加之成分中在25°C下 不為液狀之成分的總量。 (A )顏料之含量如在上述之範圍時,由於作成彩色濾光 片時有充分之色濃度,且在組成物中可含有需要量以上之 黏合劑樹脂,故可形成機械強度足夠之圖案而佳。 本發明之著色感光性樹脂組成物在無損及本發明之效 果的範圍内,除了(A)顏料之外亦可與染料併用。 .上述染料係如:油溶性染料、酸性染料、酸性染料之 12 319803 200839439 月女鹽或酸性染料之續蕴胺衍生物等。 上述油溶性染料之例可列舉如:溶劑黃(C. I. solvent ㈣㈣4[以下,省略溶劑黃(C.I· solvent yellow)之記 載而僅以號碼記载。對於其他之染料種類以及色相(㈤ 亦以同樣省略方式記載]、14、15、23、、38、β2、β3、 68、82、94、98、99、162,溶劑紅(C· l s〇lvent red)45、 49,溶劑橙(C. I. s〇iven1: 〇range)2 籲;谷劑藍(C· I· sol vent blue )35、37、59、67 等。 C· I ·酸性染料之例示係如:酸性黃17、29、4〇、76, :酸性紅 91、92、97、114、138、151,酸性橙 51、63,酸 性藍80、83、90,酸性綠9、16、25、27等染料^ 染料(A)中,亦可使用例如式(i)至(vii)所示酸性染料 之胺鹽、以及式(viii)至(ix)所示酸性染料之磺醯胺衍生 -物0 - dddddddddCompounds classified in the pigment section of the Society of Dyers and Colourists. Specifically, for example, pigment yellow (C·I· pigment yellow) 1, 3, 12, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, Yellow pigments such as 117, 125, 128, 137, 1.38, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214. φ Pigment orange (C·I· pigment orange) 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 6 b 64, 65, 71, 73 and other orange pigments. Pigment red (C·I, pigment red) 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 20 9, 215, 216, 224, 242, 254, 255 , 264, 265 and other red pigments. Pigment blue (C·I · pigment blue) 15, 15: 3, 15: 4, 15: 6, 60 and other blue pigments. Pigment violet (C.I. pigment violet) 1, 19, 23, 29, 32, 36, 38 and other purple pigments. 10 319803 200839439 Pigment green (C. I. pigment green) 7, 36 and other green pigments. C. I. pigment brown 23, 25 and other brown pigments. Pigment black (CIpigment black), 7 black pigments, etc., wherein the content is selected from pigment yellow 138, 139, 15 〇; pigment red 177, 2 〇 9, coffee; pigment purple 23; pigment blue 15: 3, 15 : 6 and at least one pigment of the group of pigment greens 7 and 36 is preferable. When the red pixel is formed, the combination of the pigments may be, for example, a pigment red Η 与 and a pigment red 254 group, a thorn _ 廿 π ππ: α t _ 枓 枓 page 15 〇 and pigment red 177 and pigment red ^ 54 combination, etc. • When forming a green pixel, the combination of pigments can be listed, for example, the combination of pigment 15 颜料 and pigment green 36, Ί Qri seven 15 ϋ combination, etc. More, " Κ 9 and Pigment Green 7 and Pigment Green 36 are cut in the shape of the silk, (4) m is published as ······················枓 15 ' 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 15 Use surfactants such as & oxime, non-猸 a 糸, polyamine, etc., either alone or in combination of two or more. 4 can be pre-oxygen B:::==: polyoxy--, poly (four), fatty acid modification 319803 11 200839439 V, polyethyleneimine (polyethyleneimine), etc., can also be listed as a commodity name such as KP (manufactured by Shin-Etsu Chemical Co., Ltd.), P0LYFL0W (manufactured by Kyoei Chemical Co., Ltd.), FT0P (manufactured by Tohkem Products Corporation), MEGAFACE (manufactured by Dainippon Ink Chemicals Co., Ltd.), FLUORAD (manufactured by Sumitomo 3M Limited), ASAHIGUARD, SURFL0N (above is manufactured by Asahi Glass Co., Ltd.), manufactured by SOLSPERSECZENECA Co., Ltd., EFKA (manufactured by EFKA Chemicals Co., Ltd.), PB821 (manufactured by Ajinomoto Co., Ltd.), and the like. When the dispersant is used, it is preferably used in an amount of 10 parts by mass based on 100% by mass of the pigment, more preferably 1 to 1% by mass, more preferably 5 to 50% by mass. When the amount of the dispersing agent used is in the above range, it tends to be preferable because a uniform dispersion liquid tends to be obtained. The content of the (A) pigment used in the present invention is 35 to 60% by mass based on the mass fraction of the coloring photosensitive resin composition, preferably 35 to 55 mass%, and 35 to 50 mass%. % is better. Here, the solid fraction referred to in the present specification means (A) pigment, (B) binder resin, (C) photopolymerizable compound, (D) photopolymerization initiator, which is a coloring photosensitive tree composition. And the total amount of the components which are not liquid at 25 ° C as needed. (A) When the content of the pigment is in the above range, a sufficient color density is obtained when the color filter is formed, and a binder resin having a required amount or more is contained in the composition, so that a pattern having sufficient mechanical strength can be formed. good. The colored photosensitive resin composition of the present invention may be used in combination with a dye in addition to the (A) pigment, insofar as it does not impair the effects of the present invention. The above dyes are, for example, oil-soluble dyes, acid dyes, acid dyes 12 319803 200839439 month female salt or acid dye continuation amine derivative. Examples of the above oil-soluble dyes include solvent yellow (CI solvent (4) 4 [hereinafter, the description of the solvent yellow is omitted, and only the number is described. For other dye types and hue ((5), the same is omitted) Method description], 14, 15, 23, 38, β2, β3, 68, 82, 94, 98, 99, 162, solvent red (C· ls〇lvent red) 45, 49, solvent orange (CI s〇iven1 : 〇range) 2 ;; 剂 蓝 blue (C· I· sol vent blue ) 35, 37, 59, 67, etc. C · I · Acid dyes such as: acid yellow 17, 29, 4 〇, 76, : Acid red 91, 92, 97, 114, 138, 151, acid orange 51, 63, acid blue 80, 83, 90, acid green 9, 16, 25, 27, etc. dyes (A), can also be used For example, an amine salt of an acid dye represented by the formulas (i) to (vii), and a sulfonamide derivative of the acid dye represented by the formulas (viii) to (ix) - ddddddddd

XI/ \I/ \J/ \I/ Nt/ \J/ \1/ N N 1111*111 2 2 3 3 3 3 3 3 3 o ow 00〇0〇〇OSS sssssss{{ /i\ /tv r\ /IV /»N /i\ /V I—~I I_I cXI/ \I/ \J/ \I/ Nt/ \J/ \1/ NN 1111*111 2 2 3 3 3 3 3 3 3 o ow 00〇0〇〇OSS sssssss{{ /i\ /tv r\ /IV /»N /i\ /VI—~I I_I c

Tu Jx Jx 2 Tr* Tr* Tr- 2 Tr- ΤΓΛ 2 2 Η nnnH ΠΠΗΗ nccc ecc Π ^ ^((( ^y((c c it /t\ /l\ c 2 2 e 3 2 m H ) 3 p } m + 2 o } 2 } w N m \—/ H } f c f )+ + + 2h+ 2 3NNNH(py3H H2 3 4 f p p f + \/ \t/ Λ1/ c \/ \y } o 111 C3 1 1 \JrTu Jx Jx 2 Tr* Tr* Tr- 2 Tr- ΤΓΛ 2 2 Η nnnH ΠΠΗΗ nccc ecc Π ^ ^((( ^ y((cc it /t\ /l\ c 2 2 e 3 2 m H ) 3 p } m + 2 o } 2 } w N m \—/ H } fcf )+ + + 2h+ 2 3NNNH(py3H H2 3 4 fppf + \/ \t/ Λ1/ c \/ \y } o 111 C3 1 1 \ Jr

NN

LL

m 1/ Hm 1/ H

V o sV o s

\ί/ L \J/ V7 \1/ \J/ SI/ \ϊ/ \)/ \—/ \J/ •1»1 ·1 V V *1 ·1 X /l\ y{\ 7 •1 ·1 ·1 *1 ·1 /tN /ν' /IV Γ [ /f\ »1 V *1 /fv [式(i)至(ix)中’ D表不色素母體; m表示1至20之整數; η表示1至20之整數; e以及f各自獨立’表不1至之整數; Ph表示苯基; 13 319803 200839439 y\ί/ L \J/ V7 \1/ \J/ SI/ \ϊ/ \)/ \—/ \J/ •1»1 ·1 VV *1 ·1 X /l\ y{\ 7 •1 · 1 ·1 *1 ·1 /tN /ν' /IV Γ [ /f\ »1 V *1 /fv [Formula (i) to (ix) 'D is not a pigment precursor; m is an integer from 1 to 20 ; η represents an integer from 1 to 20; e and f are each independently' represent an integer from 1 to 1; Ph represents a phenyl group; 13 319803 200839439 y

Py表示以氮原子連接CnH2n+1之% 殘 基; 殘基或甲H定壤 P表示1至8之整數; q表示0至8之整數; L表示氫原子或一價之陽離子。] —^本弁旅喃 三苯甲烷染料母 D可具體列舉如:偶氮染料母體 (xanthene)染料母體、蒽藏染料母燿 以及酞青染料母體。 m宜為1至10之整數,以丨至8之整數更佳。 Π宜為1至10之整數,以1至8之整數更佳。 e以及f各自獨立’宜為}至8之整數,以1 整數更佳。 又Py represents a residue in which a nitrogen atom is bonded to CnH2n+1; a residue or a H-bonded P represents an integer of 1 to 8; q represents an integer of 0 to 8; and L represents a hydrogen atom or a monovalent cation. ] —^ 本 本 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三 三m is preferably an integer of from 1 to 10, more preferably from 丨 to an integer of 8. It is preferably an integer from 1 to 10, preferably from an integer of from 1 to 8. e and f are each independently 'should be an integer from 0 to 8, preferably 1 integer. also

Ph宜為甲基。比唆環殘基。 P宜為1至6之整數,·以1至5之整數更佳。 q宜為0至6之整數,以0至5之整數更佳。 L為一價陽離子之例可列舉如:鋰離子、鈉離子、鉀 離子⑽5)·.等4級銨離子等,其中以鈉離子為佳。 含偶氮染料母體之染料例,可列舉如:式(1〇)所示之 染料、以及式(11)至(13)所示之染料。 319803 14 200839439Ph should be a methyl group. More than an anthracene ring residue. P is preferably an integer of 1 to 6, and more preferably an integer of 1 to 5. q is preferably an integer of 0 to 6, more preferably an integer of 0 to 5. Examples of the monovalent cation of L include a lithium ion, a sodium ion, a potassium ion (10), a lithium ion, and the like, and a sodium ion is preferable. Examples of the dye containing the azo dye precursor include a dye represented by the formula (1) and a dye represented by the formulas (11) to (13). 319803 14 200839439

CH3 -CH—CH2CH2CH3 -CH-CH2CH2

Ο R36—C r36hno2sm^^_n ,36 S02NHR, 36 (12)Ο R36—C r36hno2sm^^_n ,36 S02NHR, 36 (12)

o II HO-Co II HO-C

HO NO- CH3 so2nh-ch-ch2ch2 o (13) [式(10)中,表示碳數2至20之烷基、烷基鏈之碳數為 2至12之環己基烷基、烷基鏈之碳數為1至4之烷基環己 基、經碳數2至12之烷氧基取代的碳數2至12之烷基、 式(10-1-1)所示之烷基羧基烷基、式(HM-2)所示之烷氧 基羰基烷基、經碳數1至2〇之烷基取代的苯基、或經苯基 取代的後數1至20之烧基。 (10-1-1) (10-1-2) L1 - C0-0 - L2- L3-0 - C0 - L4-(式(10-1-1)中,L1表示碳數2至12之烷基。L2表示碳數 .2至12之烷撐基。 式(10_1-2)中,L3表示碳數2至12之烷基。L4表示碳數2 至12之烷撐基。)] 15 319803 200839439 碳數2至20之烷基係可列舉如:乙基、正丙基、異丙 基、正己基、正壬基、正癸基、正十二基、2_乙基己基、 1,3-二曱基丁基、1 一曱基丁基、— 四甲基丁基等。 -甲基己基、 烷基鏈之碳數為2至12之環己基烧基係可列舉如:環 己基乙基、3-環己基丙基、8_環己基辛基等。 烷基鏈之碳數為1至4之烷基環己基係可列舉如:2_ 乙基環己基、2-丙基環己基、2-(正丁基)環己基等。 經碳數2至12之燒氧基取代的石炭數2112之烧基係 可列舉如:3-乙氧基-正丙基、丙氧基丙基、4_丙氧基正丁 基、3-甲基-正己氧基乙基、3_(2一乙基己氧基)丙基等。 經碳數^至20之烧基取代的苯基係可列舉如:鄰異丙 經苯基取代的碳數1至20之烷基係可列舉如: 苯基乙基、苄基、3-苯基-正丁基等。 L1以及L3中碳數2至12之烷基係可列舉如:乙基、 丙基、正己基、正壬基、正癸基、正十二基、2_乙基己基、 1,3一二f基丁基q一甲基丁基、ί,5-二T基己基、l j 四甲基丁基等。 ,,, L2以及L4中碳數2至12之烷撐基係可列舉如:乙撐 基、己撐基等。 牙 R1至R34之例可列舉如:氫原子、甲基、乙基、正丙 基、正丁基、異丙基、第二丁基、第三丁基、氟原子、氯 原子、溴原子、碘原子等,其中以氫原子、〒基、乙基、 319803 16 200839439 正丙基、正丁基、異丙基、第二丁基、第三丁基、氟原子、 氯原子為佳。 式(10)所示之染料中,較佳染料在具體上可列舉如 (14 )所示之化合物。 具有蒽酿染料母體之染料可列舉如式(]5)所示之化合 具有三本甲烧染料母 化合物HO NO-CH3 so2nh-ch-ch2ch2 o (13) [In the formula (10), an alkyl group having 2 to 20 carbon atoms, a cyclohexylalkyl group having 2 to 12 carbon atoms in the alkyl chain, and an alkyl chain An alkylcyclohexyl group having 1 to 4 carbon atoms, an alkyl group having 2 to 12 carbon atoms substituted by an alkoxy group having 2 to 12 carbon atoms, an alkylcarboxyalkyl group represented by the formula (10-1-1), An alkoxycarbonylalkyl group represented by the formula (HM-2), a phenyl group substituted with an alkyl group having 1 to 2 carbon atoms, or a post group 1 to 20 substituted with a phenyl group. (10-1-1) (10-1-2) L1 - C0-0 - L2- L3-0 - C0 - L4- (in the formula (10-1-1), L1 represents a carbon number of 2 to 12 L2 represents an alkylene group having a carbon number of from 2 to 12. In the formula (10-1-2), L3 represents an alkyl group having 2 to 12 carbon atoms. L4 represents an alkylene group having 2 to 12 carbon atoms.)] 15 319803 200839439 The alkyl group having 2 to 20 carbon atoms may, for example, be ethyl, n-propyl, isopropyl, n-hexyl, n-decyl, n-decyl, n-dodecyl, 2-ethylhexyl, 1,3. - Dimercaptobutyl, 1-decylbutyl, -tetramethylbutyl, and the like. Examples of the cyclohexylalkyl group having a methylhexyl group or an alkyl chain having 2 to 12 carbon atoms include a cyclohexylethyl group, a 3-cyclohexylpropyl group, and an 8-cyclohexyloctyl group. Examples of the alkylcyclohexyl group having 1 to 4 carbon atoms in the alkyl chain include 2-ethylcyclohexyl group, 2-propylcyclohexyl group, 2-(n-butyl)cyclohexyl group and the like. The charcoal number 2112 substituted by an alkoxy group having 2 to 12 carbon atoms may, for example, be 3-ethoxy-n-propyl, propoxypropyl, 4-propoxy-n-butyl, 3- Methyl-n-hexyloxyethyl, 3-(2-ethylhexyloxy)propyl and the like. The phenyl group substituted with a carbon group of from 2 to 20 may, for example, be an alkyl group having 1 to 20 carbon atoms which is substituted with a phenyl group and an isopropyl group. Examples thereof include a phenylethyl group, a benzyl group, and a 3-benzene group. Base-n-butyl and the like. Examples of the alkyl group having 2 to 12 carbon atoms in L1 and L3 include ethyl group, propyl group, n-hexyl group, n-decyl group, n-decyl group, n-dodecyl group, 2-ethylhexyl group, and 1,3-two. F-butyl butyl q-methylbutyl, ί, 5-di-T-hexyl, lj tetramethylbutyl and the like. The alkylene group having 2 to 12 carbon atoms in L2 and L4 may, for example, be an ethylene group or a hexylene group. Examples of the teeth R1 to R34 include a hydrogen atom, a methyl group, an ethyl group, a n-propyl group, a n-butyl group, an isopropyl group, a second butyl group, a tert-butyl group, a fluorine atom, a chlorine atom, and a bromine atom. An iodine atom or the like is preferably a hydrogen atom, a decyl group, an ethyl group, 319803 16 200839439 n-propyl group, n-butyl group, isopropyl group, a second butyl group, a tert-butyl group, a fluorine atom or a chlorine atom. Among the dyes represented by the formula (10), preferred dyes are specifically exemplified by the compounds shown in (14). The dye having the precursor of the enamel dye may be exemplified by a compound represented by the formula (5) having three bases of a formazan dye.

一有一本开哌喃染料母體之染料 之化合物。另外,且古μ主 歹』舉如式(17)所示 鄉另外,具有酞青染料母體 所示之化合物等。 卞卄了列舉如式(18)A compound having a dye of the parent of the penicillin dye. In addition, the ancient μ main 举 举 举 举 举 举 举 举 举 举 举 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外 另外I cite the enumeration as in (18)

319803 17 200839439319803 17 200839439

(18) 18 319803 200839439 驗 該等染料係配合對著色組成物用溶劑之溶解度、使用 含有該著色組成物之著色感光性㈣組成物 光片圖案時的耐光退色性或分光光譜而適當加以選擇。^ 本發明之著色感紐樹脂組成物含有(_合劑樹 =上述⑻黏合劑樹脂宜含有由(^基)丙蝉酸衍生之構成 早凡。其中,(尹基)丙烯酸表示丙稀酸及/或甲基丙稀酸。 由上述之(甲基)丙烯酸衍生之構成單元的含量,在構成⑻ 黏合劑樹脂之總構成單元中,以莫耳分率計,以至Μ 莫耳…圭’以13至35莫耳%更佳。由(甲基)丙稀酸所衍 生之構成單元的含量如在上述之範圍,於顯影時,溶解性 良好,且顯影後有不易殘留殘渣之傾向故佳。 除了衍生自(甲基)丙烯酸之構成單元以外,其他可衍 生黏合劑樹脂之構成單元的單體之例可列舉如··芳族乙烯 化合物、不飽和羧酸酯類、不飽和羧酸胺基烷基酯類、不 飽和羧酸縮水甘油酯類、羧酸乙烯酯類、不飽和醚類、氰 |化乙烯化合物、不飽和醯胺類、不飽和醯亞胺類、脂肪= 共軛二烯類、聚合物分子鏈之末端具有單丙烯醯基^單^ 基丙烯醯基之大分子單體類。上述構成單元可列舉例如式 (Ό所示之單元以及式(VI)所示之單元等。 工 319803 19 200839439(18) 18 319803 200839439 These dyes are appropriately selected in accordance with the solubility of the solvent for the coloring composition and the light fading resistance or the spectral spectrum when the coloring photosensitive composition (4) composition containing the colored composition is used. The color-sensitive resin composition of the present invention contains (_mixture tree = the above (8) binder resin preferably contains a composition derived from (meth) propionate. Among them, ( Yin) acrylic acid means acrylic acid and / Or methacrylic acid. The content of the constituent unit derived from the above (meth)acrylic acid, in the total constituent unit constituting the (8) binder resin, in terms of molar fraction, to Μ 莫... The content of the constituent unit derived from (meth)acrylic acid is in the above range, and the solubility is good at the time of development, and there is a tendency that residue is hard to remain after development. Examples of the monomer derived from the constituent unit of the (meth)acrylic acid, and other constituent units of the derivatizable binder resin include, for example, an aromatic vinyl compound, an unsaturated carboxylic acid ester, and an unsaturated carboxylic acid aminoalkylene. Base esters, unsaturated carboxylic acid glycidyl esters, vinyl carboxylates, unsaturated ethers, cyanide|vinyl compounds, unsaturated guanamines, unsaturated quinones, fats = conjugated dienes At the end of the polymer molecular chain The macromolecular monomer of a monopropenyl fluorenyl group, and the above-mentioned structural unit, for example, a unit represented by the formula (Ό) and a unit represented by the formula (VI), etc. 319803 19 200839439

[在式(V)以及式(VI)中,Rlfl以及R11係各自獨立,表示氫 原子或碳數1至6之烷基。] • R °以及Rl1之例可列舉如:氫原子、甲基、乙基、正 丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、 1-曱基丁基、2-甲基丁基、3一曱基丁基、卜乙基丙基、2一 乙基丙基、正己基、1-甲基戊基、2_甲基戊基、3_甲基戊 基、4-甲基戊基、1-乙基丁基、2_乙基丁基、3_乙基丁基 等,其中以氫原子、曱基、乙基、正丙基、異丙基、正丁 基、第二丁基、第三丁基為佳,以氫原子、曱基、乙基為 •更佳。 上述黏合劑樹脂在具體上可列舉如:甲基丙烯酸/甲基 丙烯酸苄酯共聚物、曱基丙烯酸/曱基丙烯酸苄酯/苯乙烯 共聚物、曱基丙烯酸/甲基丙烯酸苄酯/曱基丙烯酸異冰片 (isobornyl)酯共聚物、甲基丙烯酸/苯乙烯/甲基丙烯酸苄 酯/N-苯基馬來醯亞胺共聚物、甲基丙烯酸/式(1〇所示構成 成为(R表示甲基,rii表示氫原子)/曱基丙烯酸苄酯共聚 物式(V)所示構成成分(Ru表示曱基,R11表示氫原子)/ 甲基丙烯酸苄酯共聚物、曱基丙烯酸/式(VI)所示構成成分 319803 20 200839439 (R表不甲基’R表示氫原子)/苯乙烯共聚物/甲基丙稀酸 三環癸酯共聚物等。 本lx明中所使用(B)黏合劑樹脂之酸值value) 以30至150為佳,以 心至135更佳,又以4〇至120為特 佳。酸值如在上述之範圍時,則對顯影液之溶解性會提高, 未曝光部變得易於溶解,且於以高靈敏顯影時,曝光部之 圖案會保留,而有提昇殘膜率之傾向故佳。其卜酸值係 =和二丙稀酸系聚合物所需之氯氧化卸之量㈣ 可經由使用氫氧化鉀水溶液進行滴定而 相對於該著色感光性樹脂組成物之固形、 樹脂之含量以質量分率計’以10至读口: 皙吾社 π 、里乂為佳’以12 至35貝里心土,又以14至32質量%為特佳 科 樹脂之含量如在上述之範圍時,則可形安'"弹 度以及殘膜率有提高的傾向而佳。 I卞’而且解析 験 4有式(V)所示構成單元之黏合劑 酸/式(V)所示構成成分(R1。表示甲基,R11 =甲基丙烯 基丙烯酸Μ共聚物,係使甲基丙烯酸:氳原子)/甲 共聚而得二成分聚合物,並使所得之二虚土丙烯酸苄酯 ΟΜ)所示化合物(Rn表示氫原子)反應—即m物與式[In the formula (V) and the formula (VI), Rlf1 and R11 are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. Examples of R ° and Rl1 include hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, second butyl group, tert-butyl group, n-pentyl group, and 1-fluorene group. Butyl, 2-methylbutyl, 3-tert-butylbutyl, ethylidenepropyl, 2-ethylpropyl, n-hexyl, 1-methylpentyl, 2-methylpentyl, 3-methyl Pentyl, 4-methylpentyl, 1-ethylbutyl, 2-ethylbutyl, 3-ethylbutyl, etc., wherein a hydrogen atom, a decyl group, an ethyl group, a n-propyl group, an isopropyl group The n-butyl group, the second butyl group and the third butyl group are preferred, and more preferably a hydrogen atom, a mercapto group or an ethyl group. Specific examples of the above binder resin include methacrylic acid/benzyl methacrylate copolymer, methacrylic acid/benzyl methacrylate/styrene copolymer, methacrylic acid/benzyl methacrylate/mercapto group. Isobornyl acrylate copolymer, methacrylic acid/styrene/benzyl methacrylate/N-phenylmaleimide copolymer, methacrylic acid/form (1〇 is represented by (R represents Methyl, rii represents a hydrogen atom) / benzyl methacrylate copolymer (V) represents a constituent (Ru represents a mercapto group, R11 represents a hydrogen atom) / benzyl methacrylate copolymer, mercapto acrylic / formula ( VI) The constituents shown are 319803 20 200839439 (R represents a non-methyl 'R represents a hydrogen atom) / styrene copolymer / trimethyl decyl methacrylate copolymer, etc. (B) bonding used in this lx The acid value of the resin is preferably from 30 to 150, more preferably from 135 to 1200, and particularly preferably from 4 to 120. When the acid value is in the above range, the solubility in the developer is improved, the unexposed portion is easily dissolved, and when developing with high sensitivity, the pattern of the exposed portion is retained, and the tendency to increase the residual film ratio is increased. So good. The acidity of the acid value = and the amount of chlorine oxidizing agent required for the diacrylic acid polymer (4) can be determined by titration with an aqueous potassium hydroxide solution relative to the solid content of the colored photosensitive resin composition, and the mass of the resin. The fractional meter 'from 10 to the reading port: 皙 社 π, 乂 乂 is good' with 12 to 35 Berry heart, and 14 to 32% by mass for the content of Tejiako resin as in the above range, It is better to have a tendency to increase the degree of resilience and residual film. I卞' and the analytical composition 4 has a binder acid of the structural unit represented by the formula (V) / a component represented by the formula (V) (R1 represents a methyl group, and R11 = a methacrylic acid ruthenium acrylate copolymer, which is a Acrylic acid: ruthenium atom) / copolymerization to obtain a two-component polymer, and the resulting compound (wherein Rn represents a hydrogen atom) is reacted - that is, a substance and a formula

(V4) 319803 21 0 200839439 甲基丙稀酸/式(νι)所示之構成成分(R1。表示甲基,眇 表示氫原子)/曱基丙烯酸节醋1基丙烯酸三環癸醋共聚 物,係可使甲基丙烯酸节酯、甲基丙婦酸、三環癸院骨竿 之單甲基丙烯酸共聚物與甲基丙稀酸縮水甘油醋反應而一 得。 (B)黏合劑樹脂以聚苯乙烯換算的重量平均分子量係 以5000至looooo為佳,以6〇〇〇至8〇〇〇〇更佳,又以⑽ 鲁=上0000為特佳。如分子量在上述之範圍時,則塗膜硬度 提南,㈣率亦高,對未曝光部分之顯影液的溶解性良好 而有提高解析度之傾向,故佳。 本發明之著色感光性樹脂組成物包含⑼光聚合起始 劑。上述之(D)光聚合起始劑可列舉如:三哄(triazine) 系化合物、乙醯苯系化合物、聯咪唑系化合物、活性自由 基產生劑、酸產生劑等。 上述之三畊系化合物之例可列舉如:2, 4—雙(三氯甲基) 籲刊-(4-甲氧基苯基Μι、三啡、2,4一雙(三氯甲基)一6: (4-甲氧基萘基)— ι,3,5-三啡、2,4—雙(三氯甲基)一6一(4一 甲氧基苯乙烯基)-1,3,5-三π井、2,4 一雙(三氯甲基)一 6-[2一 (5甲基吱喃-2 一基)乙烯基]一ι,3, 5—三哄、2,4-雙(三氯甲 基)-6-[2-(呋喃-2-基)乙烯基]一;|,3, 5一三畊、2, 4—雙(三氯 :基)-6-[2-(4-二乙基胺基-2-甲基苯基)乙烯基μι 3, 5一 井2’4雙(二氣曱基)一6—[2 一(3, 4 一二曱氧基苯基)乙烯 土] 1 ’ 3, 5 —哄、2, 4-雙(二氯甲基)一β-胡椒基(piper〇ny 1) -1,3,5-三哄等;其中之較佳者為:2,4一雙(三氯甲基)一6一 319803 22 200839439 (4-曱氧基苯基)-1,3, 5-三啡、2, 4-雙(三氯曱基)-6-(4-曱氧基萘基)-1,3, 5-三畊、2, 4-雙(三氯曱基)-6-(4-曱氧 基苯乙稀基)-1,3, 5-三哄、2, 4-雙(三氣曱基)-6-胡椒基 -1,3, 5-三畊;其中之更佳者為:2,4-雙(三氯曱基)-6-胡 椒基-1,3,5 -三哄。 上述之乙醯苯系化合物之例可列舉如:二乙氧基乙醯 苯、2-曱基-2嗎福啉基-1-(4-甲基硫苯基)丙烷一1 —酮、2- 羥基-2-甲基-1-苯基丙烷-:[-酮、苯偶醯二曱基縮酮、2一 羥基-2-甲基-1-[4-(2-羥基乙氧基)苯基]丙烷一丨-酮、2一 經基環己基苯基酮、2-苄基-2-二曱基胺基—1 —(4-嗎福淋基 苯基)丁烷-1-酮、2-(4-甲基苄基)一2-二甲基胺基—^(斗一 嗎福啉基苯基)丁烷-1-酮、2-羥基一2-曱基一ι — [4—d-甲基 乙烯基)苯基]丙烷-1-酮之低聚物等;其中之較佳者為:2一 甲基-2嗎福啉基-1一(4-甲基硫苯基)丙烯—】一酮、· 2—苄基 -2-二曱基胺基-1-(4-嗎福啉基苯基)丁烷y一酮、2一一甲 基苄基)-2-二甲基胺基4-(4-嗎福啉基苯基)丁烷酮; 其中之更佳者為H基-2-二甲基胺基小(4_嗎福琳基苯 基)丁烧+酮、2-(4—甲基节基)_2_二甲基胺基]—(4一嗎福 啉基苯基)丁烷—丨—酮。 上述之聯咪唾系化合物之例可列舉如:2,2,— 苯基)-4’ 4’,5’ 5,-四苯基聯咪唑、2, 2, _雙(2, 3_二二美 -4,4’’5,5’-四苯基聯咪唑(參照例如:曰 門平、本^ 6-75372號公報、日本牿鬥承R ποπ 雔p 寸開千6-75373號公報等)、2 2,- 又(虱本基)-4,4,,5,5’-四苯基聯咪唑、2, , 主 A 2 -雙(2-氯苯 319803 23 200839439 基)4,4,5,5 -四(烧氧基笨基)聯味σ坐、2, 2,—雙(2 —氯苯 土)4 ’ 4,5, 5四(一烧氧基苯基)聯咪唾、2,2,-雙(2^ 一氯 苯基)-4, 4,,5, 5,-四(三烷氧基苯基)聯咪唑(參照例如:曰 ^特公昭,48-38403號公報、日本特開昭62 —1742〇4號公報 等)、4, 4’,5, 5,-位之苯基經碳烷氧基取代之咪唑化合物 (參照例如:日本特開平7—1〇913號公報)等;其中之較佳 者為2, 2,—雙(2 —氯苯基)—4,4,,5,5,-四苯基聯咪唑、 _ 2’ 2雙(2, 3-二氣苯基)—4, 4’,5, 5,-四苯基聯咪唑。 、活性自由基產生劑係藉由照射光而產生活性自由基。 ^述之活性自由基產生劑之例可列舉如:苯偶因❹⑸沉“) 系化合物、二苯甲酮系化合物、噻嘧酮““⑽抓让⑽幻系 化合物、肟(0Xime)系化合物等。 上述之苯偶因系化合物之例可列舉如··苯偶因、苯偶 口甲基本偶因乙基趟、苯偶因異丙基_、苯偶因異丁 •基醚等。 /、 籲上述之二苯甲酮系化合物之例可列舉如:二苯甲酮、 〇—苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、4-苯甲醯基-4,- 甲基二苯硫趟、3, 3,,4, 4,-四(第三-丁基過氧幾基)二苯曱 酮、2, 4, 6-三甲基二苯甲酮等。 上述之噻噸酮系化合物之例可列舉如:2-異丙基噻噸 綱、4—異丙基噻噸酮、2, 4-二乙基噻噸酮、2,4_二氯噻噸 酮、1-氯-4-丙氧基噻噸酮等。 上述之肟系化合物之例可列舉如·· 0-醯基肟系化合 物,而其具體例係如·· i — 苯基硫基—苯基)—丁烷-U一 319803 24 200839439 二酮2-肟-〇-苯曱酸酯、i — (4—苯基硫基-苯基)-辛烷-u- 二酮2-肟-〇-苯甲酸酯、;μ(4—苯基硫基—苯基)-辛烷—】一酮 肟0乙1函曰、:I-(4-苯基硫基-苯基)-丁炫一 1 —酮肟—乙酸 酯等。 除了上述例示以外,可使用其他之活性自由基產生 劑,其例可列舉如·· 2,4, 6-三甲基苯甲醯基二苯基膦氧化 物 10 丁基 2-氣。丫咬顯j (chi〇roacrid〇ne)、2 -乙基慧靦、 _ 一苯基乙二酮、9, 10-菲醌、樟腦醌、苯基乙醛酸甲酯、二 茂鈦(titanocene)化合物等。 上述之酸產生劑之例可列舉如··對甲苯磺酸4__羥基苯 基一甲基硫輪、六氟銻酸4一經基苯基二甲基硫鑌、對甲苯 戸、酉文4乙氧基笨基二甲基硫鏽、六氟銻酸4 一乙酸氧基苯 基甲基苄基硫鏽、對甲苯磺酸三苯基硫鑌、六氟銻酸三苯 基石瓜銪對甲笨境酸二苯基鐄鏽、六氟銻酸二苯基鐄鏽等 鏽鹽類、硝基苄基甲苯磺酸類、苯偶因甲苯磺酸類等。 » 在上述化合物之中,以上述之活性自由基產生劑而 5,亦有與活性自由基同時產生酸之化合物,例如三畊系 光聚合起始劑亦可作為酸產生劑使用。 相對於(B)黏合劑樹脂以及(c)光聚合性化合物,(D) 光聚合起始劑之含量以質量分率計,為〇1至2〇質量%, =1至15質量%為佳。光聚合起始劑之含量如在上述範圍 時,則靈敏度會提高而縮短曝光時間並提高生產性,另一 方面,因靈敏度過高,而在線/間距之圖案解析的最小線寬 上有線寬度不致有過粗之傾向而佳。 319803 25 200839439 * 本發明之著色感光性樹脂組成物中,另可包含(G)光聚 合起始助齊卜⑹光聚合起始助劑通常可與(D)光聚合起始 劑組合使用,且其係用以促進藉由光聚合起始劑開始聚合 之光聚合性化合物之聚合的化合物。 / β )光聚合起始助劑之例可列舉如:胺系化合物、烷氧 基蒽系化合物、噻噸酮系化合物等。 上述之胺系化合物之例可列舉如:三乙醇胺、甲基二 麄乙醇胺、三異丙醇胺、4-二甲基胺基苯甲酸曱酯、4 一二曱 基胺基苯甲酸乙醋、4-二甲基胺基苯甲酸異戊醋、苯甲酸 2-二甲基胺基乙酯、4-二甲基胺基苯甲酸2一乙基己酯、 Ν,Ν-二甲基對甲苯胺、4,4,-雙(二甲基胺基)二苯甲酮、 4, 4 -雙(一乙基胺基)二苯曱酮、4, 4,一雙^乙基甲基胺基) 二苯甲酮等,其中以4, 4,-雙(二乙基胺基)二苯甲酮為佳。 -上述之烷氧基蒽系化合物之例可列舉如:9, 一二甲氧 基恩、2-乙基-9, 10-二曱氧基蒽、9, 1〇一二乙氧基蒽、2一 鲁乙基-9,10-二乙氧基蒽等。 上述之噻噸酮系化合物之例可列舉如:2—異丙基噻噸 酮、4-異丙基噻噸酮、2, 4-二乙基噻噸酮、2, 4-二氯噻噸 酮、1-氯-4-丙氧基嗟領_酮。 (G)光聚合起始助劑可單獨使用,亦可組合2種以上使 用。(G)光聚合起始助劑可使用市售者,而市售之(G)光聚 合起始助劑可列舉如··商品名稱為EAB-F(保土谷化學工業 (月又)i ie · 4,4 -雙(二乙基胺基)二苯甲酮)等有機胺化合 物等。 319803 26 200839439 在本發明之著色感光性樹脂組成物中,(D)光聚合起始 劑/(G)光聚合起始劑之組合例可列舉如:2, 4—雙(三氯甲基) - 6-胡椒基-1,3, 5-三畊/4, 4, -雙(二乙基胺基)二苯曱酮、 二乙氧基乙醯苯/4, 4’-雙(二乙基胺基)二苯甲酮、2—甲基 2馬福琳基-1 -(4-曱基硫苯基)丙烧—1一酮/ 4,4’ -雙(二乙 基胺基)二苯甲酮、2-羥基-2-甲基-1一苯基丙烷一1 —酮/4, 4, -雙(一乙基胺基)二苯曱酮、苄基二曱基縮酮/4, 4, 一雙(二 乙基胺基)二苯甲酮、2-羥基-2-甲基-1-[4-(2-羥基乙氧基) 苯基]丙烷-1-酮/4, 4,-雙(二乙基胺基)二苯甲酮、丨—羥基 環己基苯基酮/4, 4, -雙(二乙基胺基)二苯曱酮、2 —羥基一2一 曱基-1-[4-(1-甲基乙烯基)苯基]丙烷—^一酮之低聚物/ 4, 4 -雙(二乙基胺基)二苯曱酮、2一苄基一2一二甲基胺基^一 (4-嗎福啉基苯基)丁烷一卜酮“,4,一雙(二乙基胺基)二苯 甲酮、2-苄基-2-二曱基胺基一1二(4-嗎福啉基苯基)丁院一1 一 酮/ 4,4 _雙(一乙基胺基)二苯甲酮、2一(4一曱基苄基)一2一 ❿二甲基胺基_1-(4_嗎福啉基苯基)丁烷-丨―酮/4, 4,—雙(二 乙基胺基)二苯曱酮等,較佳者係如:2-苄基—2-二甲基胺 基-1-(4-嗎福啉基苯基)丁烷—】-酮/4, 4,-雙〈二乙基胺基) 二苯甲酮、2, 4-雙(三氯甲基)一6一胡椒基一J,3, 5 —三哄/4, 4, -雙(二乙基胺基)二苯甲酮、2一(4一甲基苄基)-2一二甲基胺 基-1-(4-嗎福啉基苯基)丁烷―卜酮/4, 4,-雙(二乙基胺基) 二苯甲酮。 如使用(G)光聚合起始助劑時,相對於每1質量份之(〇) 光聚合起始劑,其使用量以0.01至10質量份為佳,以〇.〇1 319803 27 200839439 至5質量份更佳。 4: &amp;月^使用之(E)溶劍之例可列舉如··醚類、芳族烴 類、酮類、醇類、酷類、II胺類等。 上述醚類之例可列粜· 卜 夕J 丁如·四氣呋喃、四氫哌喃 (、tetrahyd_yran)、以―二曙燒 趟乙一醇單乙峻、乙二醇單丙醚、乙二醇單丁醚、二乙 :醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、二乙二 醇二甲醚、二乙二醇二乙醚、二乙二醇二丙醚、二乙二醇 一 @-醚單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙 一醇早丙_乙酸酯、甲基溶纖劑(methyleellQSlQVe)乙酸 酯、乙基溶纖劑乙酸酯、乙基卡必醇(ethylcarbitol)乙酸 酉曰丁基卡必醇乙酸酯、丙二醇甲謎乙酸醋、甲氧基丁基 -欠酉曰甲氧基戊基乙酸酯、苯甲醚、苯乙醚、甲基苯曱 醚等。 上述芳族烴類之例可列舉如:苯、甲苯、二甲苯、均 籲三甲苯等。 上述酮類之例可列舉如:丙酮、2_ 丁酮、2_庚酮、3一 庚綱、4-庚酮、4—甲基I戊閑、環戊酮、環己剩、4_經基 〜4一甲基—2-戊酮等。 上述醇類之例可列舉如··甲醇、乙醇、丙醇、丁醇、 己醇、環己醇、乙二醇、丙三醇等。 上述酯類之例可列舉如··乙酸乙酯、乙酸正丁酯、乙 酸異丁酯、甲酸戊酯、乙酸異戊酯、乙酸異丁酯、丙酸丁 酯、丁酸異丙酯、丁酸乙酯、丁酸丁酯、烷基醋類、乳酸 319803 28 200839439 ψ 曱S旨、乳酸乙酯、氧基乙酸曱酯、氧基乙酸乙酯、氧基乙 酸丁酯、曱氧基乙酸曱酯、曱氧基乙酸乙酯、曱氧基乙酸 丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯、3一氧基丙酸甲(V4) 319803 21 0 200839439 Methyl acrylate / ν ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( The monomethacrylic acid copolymer of methacrylic acid ester, methyl acetoacetate, and tricyclic brothel can be reacted with methyl methacrylate glycidol. (B) The weight average molecular weight of the binder resin in terms of polystyrene is preferably 5,000 to looooo, more preferably 6 Å to 8 Å, and particularly preferably (10) 鲁 = 0000. When the molecular weight is in the above range, the hardness of the coating film is increased, and the rate of (4) is also high, and the solubility in the unexposed portion of the developer is good, which tends to improve the resolution. The colored photosensitive resin composition of the present invention comprises (9) a photopolymerization initiator. The (D) photopolymerization initiator may, for example, be a triazine compound, an acetophenone compound, a biimidazole compound, an active radical generator or an acid generator. Examples of the above-mentioned three tillage-based compounds include, for example, 2,4-bis(trichloromethyl)---(4-methoxyphenylphosphonium, trimorphine, 2,4-bis(trichloromethyl) a 6: (4-methoxynaphthyl)- ι,3,5-triphthyl, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3 , 5--three-well, 2,4-double (trichloromethyl)- 6-[2-(5-methylpyran-2-yl)vinyl]-, 3, 5-three, 2, 4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl]-;|,3,5-three tillage, 2,4-bis(trichloro:yl)-6- [2-(4-Diethylamino-2-methylphenyl)vinyl μι 3, 5 a well 2'4 double (di- gas fluorenyl)- 6-[2 one (3, 4 one two 曱Oxyphenyl) vinylene] 1 ' 3, 5 - fluorene, 2, 4-bis(dichloromethyl)-β-piperonyl (piper〇ny 1) -1,3,5-triterpene, etc.; The preferred one is: 2,4-bis(trichloromethyl)-6-319803 22 200839439 (4-decyloxyphenyl)-1,3,5-triphthyl, 2,4-bis(trichloro) Indenyl)-6-(4-decyloxynaphthyl)-1,3, 5-trin, 2,4-bis(trichloroindenyl)-6-(4-decyloxystyrene) -1,3, 5 - triterpenoid, 2, 4-bis(trimethylsulfonyl)-6-piperidin-1,3, 5-trin; the better of them: 2,4-bis(trichloroindenyl)-6 -Pepperyl-1,3,5-triazine. Examples of the above-mentioned acetophenone-based compound may be exemplified by diethoxyethyl benzene, 2-mercapto-2 phenolyl-1-(4- Methylthiophenyl)propane-1-ketone, 2-hydroxy-2-methyl-1-phenylpropane-: [-ketone, benzoin-didecyl ketal, 2-hydroxy-2-methyl- 1-[4-(2-hydroxyethoxy)phenyl]propane mono-ketone, 2-monocyclohexyl phenyl ketone, 2-benzyl-2-didecylamino group 1-(4-? Fluoryl phenyl) butan-1-one, 2-(4-methylbenzyl)- 2-dimethylamino-((piperidinylphenyl)butan-1-one, Oligomers of 2-hydroxy-2-indolyl-ι-[4-d-methylvinyl)phenyl]propan-1-one; etc.; preferred ones are: 2-methyl-2-one Lolinyl-1-(4-methylthiophenyl)propene-]-one, 2-benzyl-2-didecylamino-1-(4-morpholinophenyl)butane y Ketone, 2-monomethylbenzyl)-2-dimethylamino 4-(4-morpholinophenyl)butanone; the better of them Is H-yl-2-dimethylamino small (4-norfosylphenyl) butanone + ketone, 2-(4-methylphenyl)_2-dimethylamino]-(4? Polaline-based phenyl)butane-indole-ketone. Examples of the above-mentioned bis-salt compound include, for example, 2,2,-phenyl)-4' 4', 5' 5,-tetraphenylbiimidazole, 2, 2, _bis (2, 3_2) Ermei-4,4''5,5'-tetraphenylbiimidazole (refer to, for example, 曰门平, 本^6-75372号, Japanese 牿斗承R ποπ 雔p inch 千千6-75373 Et.), 2 2,- (indenyl)-4,4,5,5'-tetraphenylbiimidazole, 2, main A 2 -bis(2-chlorobenzene 319803 23 200839439 base) 4, 4,5,5 - four (alkoxy phenyl) yttrium, 2, 2, bis (2-chlorobenzene) 4 ' 4,5, 5 tetra (an oxyphenyl) carbamide Saliva, 2,2,-bis(2^-chlorophenyl)-4, 4,5,5,-tetrakis(trialkoxyphenyl)biimidazole (see, for example, 曰^特公昭, 48-38403 No. 4, 4', 5, 5, and 5-position of the phenyl group substituted by a carbon alkoxy group (see, for example, Japanese Patent Laid-Open No. 7-1) 〇 913 (a), etc.; preferred of these are 2, 2,-bis(2-chlorophenyl)-4,4,5,5,-tetraphenylbiimidazole, _ 2' 2 bis (2 , 3-diphenyl) —4, 4′,5,5,-Tetraphenylbiimidazole. The living radical generating agent generates active radicals by irradiating light. For example, the active radical generating agent can be exemplified by a benzoic acid. ❹(5) sinking ") compound, benzophenone-based compound, thiazolone ""(10) grabbing (10) phantom compound, oxime (0Xime) compound, etc. Examples of the above benzoin-based compound can be exemplified by Benzocaine, benzophenomethyl methionine ethyl hydrazine, benzoin isopropyl _, benzoin isobutyl ether, etc. /, exemplified by the above benzophenone-based compounds, for example: Benzophenone, methyl benzoyl benzoyl benzoate, 4-phenyl benzophenone, 4-benzylidene-4,-methyldiphenyl sulfonium, 3, 3, 4, 4 , -tetrakis(tert-butylperoxymethyl)dibenzophenone, 2,4,6-trimethylbenzophenone, etc. Examples of the above thioxanthone-based compound can be exemplified by: 2-iso Propyl thioxanthene, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like. Examples of the above-mentioned oxime-based compound include, for example, a quinone-based quinone-based compound. Specific examples thereof are: i. phenylthio-phenyl)butane-U-319803 24 200839439 diketone 2-indole-quinone-benzoate, i — (4-phenylthio-benzene) )-octane-u-diketone 2-indole-indole-benzoate, μ(4-phenylthio-phenyl)-octane-]one-ketone oxime 0-B-anion,: I -(4-Phenylthio-phenyl)-butan-1 - ketoxime-acetate. Other active radical generating agents may be used in addition to the above examples, and examples thereof include 2,4,6-trimethylbenzimidyldiphenylphosphine oxide 10 butyl 2-gas.丫 显 显 j (chi〇roacrid〇ne), 2-ethyl acetamidine, _ phenyl ethanedione, 9, 10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene ) Compounds and the like. Examples of the above acid generator include, for example, p-toluenesulfonic acid 4__hydroxyphenyl monomethylsulfanium, hexafluoroantimonic acid 4-monophenylene dimethylsulfonium, p-toluene, and oxime 4 Oxyphenyl dimethyl sulphide, hexafluoroantimonic acid 4-acetic acid oxyphenylmethyl benzyl rust, p-toluenesulfonic acid triphenyl sulfonium sulfonate Oleic acid diphenyl sulfonium rust, hexafluoroantimonate diphenyl sulfonium rust and other rust salts, nitrobenzyl toluene sulfonic acid, benzoin toluene sulfonic acid and the like. » Among the above compounds, the above-mentioned living radical generating agent 5, and a compound which simultaneously generates an acid with an active radical, for example, a tri-grain photopolymerization initiator can also be used as an acid generator. The content of the (D) photopolymerization initiator is preferably from 1 to 2% by mass, preferably from 1 to 15% by mass, based on the mass of the (B) binder resin and (c) the photopolymerizable compound. . When the content of the photopolymerization initiator is in the above range, the sensitivity is increased to shorten the exposure time and the productivity is improved. On the other hand, the sensitivity is too high, and the line width of the line/space pattern resolution is not the line width. It has a tendency to be too thick. 319803 25 200839439 * The coloring photosensitive resin composition of the present invention may further comprise (G) photopolymerization initiation aid (6) photopolymerization initiation assistant generally used in combination with (D) photopolymerization initiator, and It is a compound for promoting polymerization of a photopolymerizable compound which starts polymerization by a photopolymerization initiator. Examples of the photopolymerization initiation aid include an amine compound, an alkoxy oxime compound, and a thioxanthone compound. Examples of the above-mentioned amine-based compound include triethanolamine, methyldiethanolamine, triisopropanolamine, 4-dimethylaminobenzoate, and ethyl 4-didecylaminobenzoate. Isoleyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, hydrazine, hydrazine-dimethyl-p-methyl Aniline, 4,4,-bis(dimethylamino)benzophenone, 4,4-bis(monoethylamino)benzophenone, 4, 4, mono-ethylmethylamino Benzophenone and the like, among which 4, 4,-bis(diethylamino)benzophenone is preferred. - Examples of the above alkoxy fluorene-based compound may, for example, be 9, dimethyloxy, 2-ethyl-9, 10-dimethoxy oxime, 9, 1 dimethyl di oxime, 2-Ruethyl-9,10-diethoxyanthracene, and the like. Examples of the above thioxanthone-based compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, and 2,4-dichlorothioxanthene. Ketone, 1-chloro-4-propoxy oxime-ketone. (G) The photopolymerization initiation aid may be used singly or in combination of two or more. (G) a photopolymerization initiation aid can be used by a commercially available one, and a commercially available (G) photopolymerization initiation aid can be exemplified by the trade name EAB-F (Budonggu Chemical Industry Co., Ltd.) An organic amine compound such as 4,4-bis(diethylamino)benzophenone). 319803 26 200839439 In the colored photosensitive resin composition of the present invention, a combination of (D) photopolymerization initiator/(G) photopolymerization initiator may be exemplified by 2,4-bis(trichloromethyl). - 6-Pepperyl-1,3,5-three tillage/4,4,-bis(diethylamino)benzophenone, diethoxyethyl benzene/4, 4'-double (two Aminophenone) benzophenone, 2-methyl 2 mazeprin-1 -(4-mercaptothiophenyl)propanone- 1 ketone / 4,4'-bis(diethylamino)diphenyl Methyl ketone, 2-hydroxy-2-methyl-1 phenylpropan-1-one/4,4,-bis(monoethylamino)benzophenone, benzyldidecyl ketal/4, 4, a double (diethylamino) benzophenone, 2-hydroxy-2-methyl-1-[4-(2-hydroxyethoxy)phenyl]propan-1-one / 4, 4 ,-bis(diethylamino)benzophenone, fluorenyl-hydroxycyclohexyl phenyl ketone/4,4,-bis(diethylamino)benzophenone, 2-hydroxyl-2-ylhydrazine Oligomer of 1-[4-(1-methylvinyl)phenyl]propane- ketone / 4,4-bis(diethylamino)benzophenone, 2-benzyl- 2 Monomethyleneamino-(4-morpholinophenyl)butane "Busone", 4, mono-(diethylamino)benzophenone, 2-benzyl-2-didecylamino-l-2 (4-morpholineylphenyl) Ketone / 4,4 bis(monoethylamino)benzophenone, 2 -(4-mercaptobenzyl)- 2 - dimethylaminol-1 -(4_morpholinophenyl) Butane-indole-ketone/4,4,-bis(diethylamino)benzophenone, etc., preferably such as: 2-benzyl-2-methylamino-1-(4) -morpholinylphenyl)butane-]-keto/4,4,-bis <diethylamino)benzophenone, 2,4-bis(trichloromethyl)-6-one-potassium J,3,5-trisole/4,4,-bis(diethylamino)benzophenone, 2-mono(4-methylbenzyl)-2-dimethylamino-1-(4) -Morfolinylphenyl)butane-buxone/4,4,-bis(diethylamino)benzophenone. When using (G) photopolymerization initiation aid, relative to each mass The photopolymerization initiator is preferably used in an amount of 0.01 to 10 parts by mass, more preferably 〇.1 319803 27 200839439 to 5 parts by mass. 4: &amp; month ^ (E) Examples of swords include, for example, ethers, aromatic hydrocarbons, and ketones. Alcohols, cools, II amines, etc. Examples of the above ethers can be listed as 粜·························································· , ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol Diethyl ether, diethylene glycol dipropyl ether, diethylene glycol mono-@-ether monomethyl ether acetate, propylene glycol monoethyl ether acetate, propanol early c-acetate, methyl cellosolve (methyleellQSlQVe ) acetate, ethyl cellosolve acetate, ethylcarbitol, butyl carbitol acetate, propylene glycol, methoxy acetate, methoxybutyl Oxypentyl acetate, anisole, phenethyl ether, methyl benzoate, and the like. Examples of the above aromatic hydrocarbons include benzene, toluene, xylene, and trimethylbenzene. Examples of the above ketones include acetone, 2-butanone, 2-heptanone, 3-g-heptane, 4-heptanone, 4-methyl-I, pentanone, cyclohexanone, and cyclohexanone. ~4 monomethyl- 2-pentanone and the like. Examples of the above alcohols include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin. Examples of the above esters include ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, and butyl. Ethyl acetate, butyl butyrate, alkyl vinegar, lactic acid 319803 28 200839439 ψ 曱S, ethyl lactate, decyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, cesium oxyhydroxide Ester, ethyl decyloxyacetate, butyl oxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate

酯、3-氧基丙酸乙酯、3一甲氧基丙酸甲酯、3一甲氧基丙酸 乙酯、3-乙氧基丙酸甲酯、3—乙氧基丙酸乙酯、2 —氧基丙 酸曱酯、2-氧基丙酸乙酯、2-氧基丙酸丙酯、2一甲氧基丙 酸曱酯、2-甲氧基丙酸乙酯、2一甲氧基丙酸丙酯、2一乙氧 基丙酸斤甲酯、2-乙氧基丙酸乙酯、2一氧基一2一甲基丙酸曱 酉曰、2^氧基-2-甲基丙酸乙酯、2—甲氧基一2一甲基丙酸甲酯、 2乙氧基2-甲基丙酸乙酯、丙酮酸甲酯、丙酮酸乙酯、丙 嗣酸丙醋、丁_酸甲酯、丁酮酸乙醋、2-側氧基(咖)丁酸 甲酉曰二2-側氧基丁酸乙酯、3_甲氧基丁基乙酸酯、3 一甲基 -3-甲乳基丁基乙酸酯、r—丁内酯㈤㈣咖狀)等。 胺類之例可列舉如·鲁二甲基甲酿胺、 一甲基乙酸胺等。Ester, ethyl 3-oxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate , 2-oxopropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, decyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2 Propyl methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, bismuth 2-methoxy-2-methylpropanoate, 2oxy 2 -ethyl methacrylate, methyl 2-methoxy-2-methylpropanoate, ethyl 2-ethoxy 2-methylpropionate, methyl pyruvate, ethyl pyruvate, propionate Vinegar, methyl butyl ketone, ethyl ketone butyrate, 2-sided oxy (caffeine), butyric acid, acenaphthyl 2-ethyl acetobutyrate, 3-methoxybutyl acetate, 3 Monomethyl-3-methyllactylbutyl acetate, r-butyrolactone (5) (iv) coffee-like), and the like. Examples of the amines include, for example, dimethyl dimethylamine, monomethylacetic acid amine, and the like.

其他溶劑之例可列舉如 等。 甲基吡咯烷酮 二甲基亞 上述溶劑可各單獨# 在上述之溶劑中,以含丙二::二種以上使用。 較好用。當⑻溶劑含有丙1 „一知早甲醚乙酸醋之溶, 劑總量,丙二醇單甲越乙;:早甲峻乙酸酯時’相對於; 為至97質:之含量以質量分率計, 、 更&quot;f土為60至95曾晉γ。 ——至90質量%,更佳為75至8δ質量%。 319803 29 200839439 ψ 如(Ε)溶劑之含量在上範圍時,由於塗佈時之面内均勻性 佳,且形成彩色濾光片時之色濃度很充足,顯示特性良好, 故佳。 另外,亦可含有界面活性劑。界面活性劑方面可列舉 如:石夕酮(s i 1 i cone)系界面活性劑、氟系界面活性劑以及 含氟原子之石夕酮系界面活性劑。 上述之矽酮系界面活性劑可列舉如具有矽氧鍵之界面 活性劑等。具體上,以商品名稱而言可列舉如Toray ® Si 1 icone DC3PA、Toray Si 1 icone SH7PA、Toray Si 1 icone DC11PA、Toray Si 1 icone SH21PA、Toray Si 1 icone SH28PA、 Toray Silicone SH29PA、Toray Silicone SH30PA、聚酯 改質矽油SH8400(東麗矽酮(股)製造);KP321、KP322、 IP323、KP324、KP326、KP340、KP34K信越矽酮製造); TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、 TSF4446、TSF4452、TSF4460CGE 東芝矽酮(股)製造)等。 • 上述之氟系界面活性劑係如:具有氰碳鏈之界面活性 劑等。具體上,以商品名稱而言可列舉如:Fluorad FC430、 Fluorad FC431(住友 3M(股)製造);Megafac F142D、 Megafac F171 、 Megafac F172 、 Megafac F173 、 Megafac F177、Megafac F183、Megafac F470、Megafac F475、Megafac R30(大日本油墨化學工業(股)製造);EFTOP EF301、EFTOP EF303、EFTOP EF351、EFT0P EF352(新秋田化成(股)製造); Surflon S381 、 Surflon S382 、 Surflon SC101 、 Surflon SCI05(旭玻璃(股)製造);E5844((股)大金精密化學研究所 30 319803 200839439 筝 製造);BM-1000、BM 一 11〇〇(腿 Chemie 公司製造)等。 上述含氟原子之矽酮系界面活性劑係如:具有矽氧鍵 以及氟碳鏈之界面活性劑等。具體上,以商品名稱而言可 列舉如:Megafac R〇8、Megafac 乩2〇、Megafac “π、Examples of other solvents include, for example. Methylpyrrolidone dimethyl amide The above solvents may be used alone. In the above solvents, two or more kinds of propylene:: are used. Better to use. When (8) solvent contains C1 „一知早 methyl ether acetate vinegar solution, the total amount of the agent, propylene glycol monomethyl acetonitrile;: early methyl acetate acetate 'relative to; to 97 quality: the content by mass fraction计 , , , , , , 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 The uniformity in the surface of the cloth is good, and the color density is sufficient when the color filter is formed, and the display property is good, and it is also preferable to contain a surfactant. The surfactant may be exemplified by: Si 1 i cone) is a surfactant, a fluorine-based surfactant, and a fluorine atom-containing surfactant. The above-mentioned anthrone-based surfactant may, for example, be a surfactant having a oxime bond. For example, Toray ® Si 1 icone DC3PA, Toray Si 1 icone SH7PA, Toray Si 1 icone DC11PA, Toray Si 1 icone SH21PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Poly Ester-modified oyster oil SH8400 (Torayone (manufacturing)); KP321, KP322, IP323, KP324, KP326, KP340, KP34K manufactured by Shinkoone); TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, TSF4460CGE Toshiba ketone (manufactured by Toshiba Ketone) • The above-mentioned fluorine-based surfactants are, for example, surfactants having a cyanocarbon chain. Specific examples of the product include: Fluorad FC430, Fluorad FC431 (manufactured by Sumitomo 3M); Megafac F142D , GFTOP EF301, EFTOP EF303, EFTOP EF351, EFT0P Chemical (share) manufacturing); Surflon S381, Surflon S382, Surflon SC101, Surflon SCI05 (made by Asahi Glass); E5844 ((D) Daikin Institute of Precision Chemistry 30 319803 200839439 kite manufacturing); BM-1000, BM One 11 〇〇 (made by Leg Chemie) and so on. The above-mentioned fluorine atom-containing anthrone-based surfactant is, for example, a surfactant having a siloxane bond or a fluorocarbon chain. Specifically, the name of the product may be, for example, Megafac R〇8, Megafac 乩2〇, Megafac “π,

Megafac F477、Megafac F443(大日本油墨化學工業(股) 製造)等。 '、 該等之界面活性劑可各單獨使用,亦可組合2種以上 使用。 籲 本發明之著色感光性樹脂組成物中,可含有分子量 1000以下之有機酸。上述有機酸係如日本特開平5 —343631 號中揭示之有機酸。具體上可列舉如··丙二酸、乙二酸、 丁二酸、戊二酸、己二酸、苯甲酸、鄰苯二甲酸、異苯二 甲酸、對苯二甲酸、檸康酸(citrac〇nic acid)、衣康酸 (itaconicacid)、中康酸(mesaconicacid)、富馬酸、丙 烯酸、甲基丙烯酸,其中以丙二酸、乙二酸、富馬酸、苯 ❿曱酸為佳。在含有分子量100〇以下之有機酸之情形下,因 殘渣有變更良好之傾向而佳。 本發明之著色感光性樹脂組成物中,可另含有充填 劑、黏合劑樹脂以外之高分子化合物、密著促進劑、抗氧 化劑、紫外線吸收劑、抗凝聚劑、有機胺化合物、硬化劑 等添加劑。 上述充填劑之例可列舉如:玻璃、氧化鋁等微粒。 上述黏合劑樹脂以外之兩分子化合物之例可列舉如· 聚乙烯醇、聚丙烯酸、聚乙二醇單烷基醚、聚氟烧基丙歸 319803 31 200839439 酸酯等。 上述密著促進劑之例可列舉如:乙烯基三曱氧矽烷、 乙烯基三乙氧矽烷、乙烯基參(2-甲氧基乙氧基)矽烷、 (2-胺基乙基)-3 —胺基丙基甲基二甲氧矽烷、N—(2_胺基乙 基)-3-胺基丙基三甲氧矽烷、3 —胺基丙基三乙氧矽烷、3一 裱氧丙氧基丙基三甲氧矽烷、3一環氧丙氧基甲基二甲氧矽 ^ 2 (3, 4-環氧環己基)乙基三甲氧石夕烧、g —氯丙基甲基 二:氧矽烷、3-氯丙基三甲氧矽烷、3一甲基丙烯醯氧基丙 基二甲氧石夕烷、3-巯基丙基三甲氧矽烷等。 上述抗氧化劑之例可列舉如·· 4,4,—硫基雙(6__第三丁 基-3-甲基酚)、2, 6-二第三丁基一4一甲基酚等。 上述紫外線吸收劑之例可列舉如: 2-(2-羥基-3—第三丁基_5-甲基苯基)-5—氯苯并三唑 等苯并三唑系; 2-羥基-4-辛氧基二苯曱酮等二苯曱酮系;Megafac F477, Megafac F443 (manufactured by Dainippon Ink Chemical Industry Co., Ltd.), etc. 'These surfactants may be used singly or in combination of two or more. The colored photosensitive resin composition of the present invention may contain an organic acid having a molecular weight of 1,000 or less. The above organic acid is an organic acid as disclosed in Japanese Laid-Open Patent Publication No. Hei 5-343631. Specifically, for example, malonic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, citraconic acid (citrac) 〇nic acid), itaconic acid, mesaconic acid, fumaric acid, acrylic acid, methacrylic acid, among which malonic acid, oxalic acid, fumaric acid, benzoic acid are preferred. In the case of an organic acid having a molecular weight of 100 Å or less, the residue tends to be changed well. The colored photosensitive resin composition of the present invention may further contain additives such as a filler, a polymer compound other than the binder resin, an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, an organic amine compound, and a curing agent. . Examples of the above filler include fine particles such as glass and alumina. Examples of the two-molecular compound other than the above-mentioned binder resin include, for example, polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl group 319803 31 200839439 acid ester, and the like. Examples of the above adhesion promoter include vinyl trioxoxane, vinyl triethoxy decane, vinyl ginseng (2-methoxyethoxy) decane, and (2-aminoethyl)-3. -Aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxyoxane, 3-aminopropyltriethoxyoxane, 3-oxopropoxylate Propyltrimethoxyoxane, 3-glycidoxymethyldimethoxysulfonium^(3,4-epoxycyclohexyl)ethyltrimethoxide, g-chloropropylmethyldioxide Decane, 3-chloropropyltrimethoxydecane, 3-methylpropenyloxypropyl dimethoxide, 3-mercaptopropyltrimethoxydecane, and the like. Examples of the above antioxidants include, for example, 4,4,-thiobis(6-_tributyl-3-methylphenol), 2,6-di-t-butyl-4-methylphenol, and the like. Examples of the ultraviolet absorber include, for example, a benzotriazole system such as 2-(2-hydroxy-3-t-butyl-5-methylphenyl)-5-chlorobenzotriazole; 2-hydroxy- a diphenyl fluorenone such as 4-octyloxybenzophenone;

2, 4-二第三丁基苯基一3 5一一 — 土 0, 0 —弟二丁基一4-羥基苯甲酸 酯等苯甲酸酯系; ^ 三哄-2-基)-5-己基氧基酚等 2-(4, 6-二笨基—1,3, 三哄系等。 上述抗凝聚劑之例可列舉如:聚丙烯酸鈉等。 經添加有機胺化合物,顯影時在未曝光部之基板 曰產生U ’且可提供對基板密著性優異之像素。 上述有機胺化合物之例可列舉如: 正丙基胺、異丙基脸、τ ^ 第 丞妝正丁基胺、異丁基胺 319803 32 200839439 ψ 基胺、第三丁基胺、正戊基胺、正己基胺、正庚基胺、正 辛基胺、正壬基胺、正癸基胺、正十一烷基胺、正十二烷 基胺等單烷基胺類; 環己基胺、2-曱基環己基胺、3-甲基環己基胺、4-曱 基環己基胺等單環烷基胺類; 甲基乙基胺、二乙基胺、曱基正丙基胺、乙基正丙基 胺、二正丙基胺、二異丙基胺、二正丁基胺、二異丁基胺、 二第二丁基胺、二第三丁基胺、二正戊基胺、二正己基胺 —等二烷基胺類; 甲基環己基胺、乙基環己基胺等單烷基單環烷基胺類; 二環己基胺等二環烷基胺類; 二曱基乙基胺、甲基二乙基胺、三乙基胺、二曱基正 丙基胺、二乙基正丙基胺、甲基二正丙基胺、乙基二正丙 基胺、三正丙基胺、三異丙基胺、三正丁基胺、三異丁基 胺、三第二丁基胺、三第三丁基胺、三正戊基胺、三正己 •基胺等三烧基胺類; 二曱基環己基胺、二乙基環己基胺等二烷基單環烷基 胺類; 甲基二環己基胺、乙基二環己基胺、三環己基胺等單 烷基二環烷基胺類; 2-胺基乙醇、3-胺基-1-丙醇、卜胺基-2-丙醇、4-胺 基-1-丁醇、5-胺基-1-戊醇、6-胺基-1-己醇等單烷醇胺類; 4-胺基-:l-環己醇等單環烷醇胺類; 二乙醇胺、二正丙醇胺、二異丙醇胺、二正丁醇胺、 33 319803 200839439 一異丁 ^ &amp;c、一正戊醇胺、二正己醇胺等二烷朵 二(4-環己醇)脸笙 ^ 醇胺頭; 一、衣巳醉)胺寺二環烷醇胺類; 三乙醇胺、三正丙醇胺、三異丙 三異丁醇胺、三正戊醇胺_ τ^^ —正丁醇胺、 三(…旷、知胺、二正己醇胺等三烷醇胺類; 一(衣己%)胺等三環烷醇胺類; 3- 月女基-1,2-丙二醇、2-脸其Ί q 一 ]2 丁 1 2 基],3-丙一醇、4,基 兩,… 胺基丁二醇、3_二曱基胺基十2- j &gt; 3 :乙基胺基―1,2—丙二醇、2—二甲基胺基H 一%、2-一乙基胺基__丨,3—丙二醇等胺基烷二醇類; 4- 胺基-1,2-環己二醇、4_胺基環己等 環烷二醇類; 哔寺胺基 卜胺基環戊酉同甲醇、4_胺基環戊酮醇 烷酮甲醇類; 予各妝基之% 1-胺基環己垸甲醇、4_胺基環己烧甲醇、4_ 基環戊烷甲醇、4- - Γ其咬I;A m &gt; 土 4 一乙基胺基裱戊烷甲醇、4-二甲基胺美 環己烷甲醇、4-二r其欧I声口 w » —乙基版基壞己燒甲醇等含胺基之環烧甲 醇類; 、石丙胺酸、2-胺基丁酸、3-胺基丁酸、4—胺基丁酸、 土 /、乙S夂3胺基兴乙酸、2-胺基戊酸、5—胺基戊酸、 ^胺基己酸、卜胺基環丙烷羧酸、卜胺基環己烷羧酸、4-胺基環己烷羧酸等胺基羧酸類; 苯胺、鄰甲基苯胺、間甲基苯胺、對,基苯胺、對乙 基、對正丙基苯胺、對異丙基苯胺、對正丁基苯胺、 對弟三丁基苯胺、卜萘基胺、2-萘基胺、N,N-二甲基苯胺、 319803 34 200839439 曹 N,N—二乙基苯胺、對甲基U二甲基苯胺等芳_,. 鄰:基节基醇、間胺基节基醇、對胺基:對_ 甲基胺基?基醇、對二乙基胺㈣基醇等胺基¥ =一 鄰胺基酚、間胺基酚、對胺基 颂, 對二乙基胺基料胺基_ &amp;對―甲基胺基驗、 對- 酸、對胺基苯甲酸、對二甲基胺基苯甲酸、 對一乙基胺基本甲酸等胺基苯甲酸類等。 脂中劑:Γ列舉如:可經由加熱而與黏合劑樹 二=Γ交聯黏合_之化合物、經單獨 吏者色L硬化而得之化合物等。上述化合物之例係 /减合物、氧雜環丁炫(_咖)化合物等,而以^ 本隹% 丁烷化合物較為好用。 年 其中’環氧化合物之例可列舉如:雙酚 =㈣型環氧樹脂、謝型環氧樹腊、^ 衣氧树月日、舰清漆型環氧樹月旨、其他 匕 i月旨環族系環氧_、雜環型環氧静㈤^糸衣乳树月曰、 樹脂之漠化衍生物、产= 以及該等環氧 族、月匕产A 树月曰以及該漠化衍生物以外之脂 環'化:夫1歹知之核氧化合物、丁二埽之(共)聚合物的 婦Irn異紅敎(共)聚合物的環氧化物、(甲基)丙 醋^、、’。7油酯之(共)聚合物、三縮水甘油基三聚異象酸 上,氧雜環丁垸化合物之例可列舉如:碳酸二氧雜環 曰本—甲基二氧雜環丁燒、己二酸二氧雜環丁醋、對 319803 35 200839439 苯二T酸二氧雜環丁醋、環己烧二碳酸二氧雜環丁 。 本發明之著色感光性樹脂組成物,在含有 之環氧化合物、氧雜環丁烧化合物等時,亦可含有人产= 化合物之環氧基、氧雜環丁统化合物之氧雜 = 行開環聚合而得之化合物。該化合物之例可列兴^ =進 羧酸類、、多元羧酸酐類、酸產生劑等。 牛 夕兀 上述多元羧酸類之例可列舉如: -苯二甲酸、3, 4_二甲基苯二甲酸、異苯二甲 -甲酸、均苯四甲酸、偏苯三酸、U,5, 8 —萘四甲酸: 3,3’,4,4’-二苯g同四羧酸等芳族多元羧酸類; 忠丁 t酸、戊二酸、己二酸、U,3,4-丁烷四羧酸、馬 來酸、富馬酸、衣康酸等脂族多元羧酸類; 、、、 六氫苯二甲酸、3, 4—二甲基四氯苯二甲酸、六氣 二甲酸、六氫對苯二甲酸、U,4-環戊垸三綾酸、1 2、4 二^叛酸、環戊燒四叛酸、U,4,5,己燒四幾酸等2, 4-di-tert-butylphenyl- 3 5 -1 - benzoate such as 0, 0-dibutyl- 4-hydroxybenzoate; ^ triterpene-2-yl)- 2-(4,6-diphenyl)-1,3, triterpene, etc., such as 5-hexyloxyphenol, etc. Examples of the anti-agglomerating agent include sodium polyacrylate, etc. When an organic amine compound is added, development is carried out. U' is generated in the substrate 未 of the unexposed portion, and a pixel excellent in adhesion to the substrate can be provided. Examples of the organic amine compound include n-propylamine, isopropyl face, and τ^ 丞 butyl butyl Amine, isobutylamine 319803 32 200839439 decylamine, tert-butylamine, n-pentylamine, n-hexylamine, n-heptylamine, n-octylamine, n-decylamine, n-decylamine, positive ten Monoalkylamines such as monoalkylamine and n-dodecylamine; monocycloalkyl groups such as cyclohexylamine, 2-mercaptocyclohexylamine, 3-methylcyclohexylamine, 4-mercaptocyclohexylamine Amines; methyl ethylamine, diethylamine, decyl-n-propylamine, ethyl-n-propylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutyl Amine, dibutylamine, ditributylamine a dialkylamine such as di-n-pentylamine or di-n-hexylamine; a monoalkylmonocycloalkylamine such as methylcyclohexylamine or ethylcyclohexylamine; a dicycloalkyl group such as dicyclohexylamine Amines; dimercaptoethylamine, methyldiethylamine, triethylamine, dimercapto-n-propylamine, diethyl-n-propylamine, methyldi-n-propylamine, ethyldi-n-butyl Propylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, tri-tert-butylamine, tri-t-butylamine, tri-n-pentylamine, tri-n-hexane • a trialkylamine such as a base amine; a dialkyl monocycloalkylamine such as dimercaptocyclohexylamine or diethylcyclohexylamine; methyl dicyclohexylamine, ethyl dicyclohexylamine, tricyclic Monoalkyldicycloalkylamines such as hexylamine; 2-aminoethanol, 3-amino-1-propanol, amidino-2-propanol, 4-amino-1-butanol, 5- Monoalkanolamines such as amino-1-pentanol and 6-amino-1-hexanol; monocycloalkanolamines such as 4-amino-:1-cyclohexanol; diethanolamine, di-n-propanol Amine, diisopropanolamine, di-n-butanolamine, 33 319803 200839439 Isobutyl ^ & c, a n-pentanolamine, two Dioxane bis(4-cyclohexanol) such as hexanolamine, 笙 醇 醇 醇 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; Isobutanolamine, tri-n-pentanolamine _ τ^^-n-butanolamine, trialkylolamines such as tris(..., hydrazine, di-n-hexanolamine, etc.; tricycloalkane such as amine (%) Alcoholamines; 3-month-female-1,2-propanediol, 2-face Ί q-]2 butyl 1 2 yl], 3-propanol, 4, yl 2,... Aminobutanediol, 3 _Didecylamino group X2-j &gt; 3 : ethylamino-1,2-propanediol, 2-dimethylamino H-%, 2-ethylamino __丨, 3-propanediol Aminoalkanediols; 4-amino-1,2-cyclohexanediol, 4-aminocyclohexane and other cycloalkanediols; 哔 胺 胺 胺 卜 基 环 环 酉 酉Aminocyclopentanol alkanone methanol; % of each makeup base 1-aminocyclohexane methanol, 4-aminocyclohexane methanol, 4-cyclopentane methanol, 4- - Γ bite I; A m &gt; soil 4 monoethylamino pentane methanol, 4-dimethylamine meto-hexane methanol, 4-di-r-European I mouth w » ethyl ester-based bad hexane burning methanol, etc. Base ring-burning methanol; stone alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, earth/, ethyl S夂3 amine-based acetic acid, 2-aminopentylene An amine carboxylic acid such as acid, 5-aminolevulinic acid, aminocaproic acid, acetocyclopropanecarboxylic acid, acetocyclohexanecarboxylic acid or 4-aminocyclohexanecarboxylic acid; aniline, adjacent Methylaniline, m-methylaniline, p-phenylaniline, p-ethyl, n-propylaniline, p-isopropylaniline, p-n-butylaniline, p-tert-butylaniline, naphthylamine, 2-naphthyl Amine, N,N-dimethylaniline, 319803 34 200839439 Cao N,N-diethylaniline, p-methyl U-dimethylaniline, etc. aryl,, o-: benzyl alcohol, m-amino benzyl alcohol , Amino group: p-_Methylamino group? Alkyl alcohol, p-diethylamine (tetra)yl alcohol, etc. Amine group ==ortho-aminophenol, m-aminophenol, p-amino hydrazine, p-diethylamine amide amino group &amp; Test, p-acid, p-aminobenzoic acid, p-dimethylaminobenzoic acid, p-monoethylamine, basic formic acid and other aminobenzoic acids. The fat agent: Γ is exemplified by a compound which can be cross-linked with a binder tree by heating, and a compound obtained by hardening the color L alone. Examples of the above compounds are / a compound, an oxetane compound, and the like, and a compound of the present invention is preferably used. Examples of 'epoxy compounds' can be exemplified by: bisphenol = (four) type epoxy resin, Xie type epoxy tree wax, ^ clothing oxygen tree month, ship varnish type epoxy tree month, other 匕i month purpose ring Family epoxy _, heterocyclic epoxy static (five) 糸 乳 乳 曰 曰, resin desertification derivatives, production = and these epoxy, moon 匕 A tree 曰 and the desertification derivatives Other than the alicyclic ring: the epoxide of the female Irn isoindene (co)polymer of the nuclear oxygen compound and the bismuth (co) polymer, (meth) propyl vinegar, . Examples of the oleyl ester (co)polymer and the triglycidyl trimeric isocyanate, and examples of the oxetane compound are, for example, dioxinium carbonate-methyldioxane, Adipic acid dioxetane vinegar, 319803 35 200839439 benzoic acid dioxetane vinegar, cyclohexene dicarbonate dioxetane. When the colored photosensitive resin composition of the present invention contains an epoxy compound, an oxequid compound, or the like, it may contain an epoxy group or a oxetane compound of a compound = compound. A compound obtained by ring polymerization. Examples of the compound include a carboxylic acid, a polycarboxylic acid anhydride, an acid generator, and the like. Examples of the above polycarboxylic acid of Niu Xiyu include: - phthalic acid, 3, 4 - dimethyl phthalic acid, isophthalic acid - formic acid, trimellitic acid, U, 5, 8 —naphthalene tetracarboxylic acid: 3,3′,4,4′-diphenyl g and tetracarboxylic acid and other aromatic polycarboxylic acids; zhongding t acid, glutaric acid, adipic acid, U, 3,4-butyl An aliphatic polycarboxylic acid such as an alkyltetracarboxylic acid, maleic acid, fumaric acid or itaconic acid; ,, hexahydrophthalic acid, 3,4-dimethyltetrachlorophthalic acid or hexa-hexane dicarboxylic acid, Hexahydroterephthalic acid, U,4-cyclopentamidine tridecanoic acid, 1, 2,4 di-repulsive acid, cyclopentan-tetracarboxylic acid, U, 4,5, hexap-dissolved acid

脂裱族多70羧酸類等。 T 上述多元羧酸酐類之例可列舉如: 苯二甲酸酐、均苯四甲酸酐、偏苯三酸酐、3,3, 4 4, 二苯甲酮四羧酸二酐等芳族多元羧酸酐類; ’ 衣康酸酐、琥珀酸酐、檸康酸酐、十二烯基琥珀酸酐、 丙二甲酸酐、馬來酸軒、U,3, 4_丁烷四羧 多元羧酸酐類; 曰万矢 六氮苯二甲酸肝、3,4~二甲基四氫苯二甲酸酐、i 24— 環戊烧三幾酸酐、U’4〜環己烧三羧酸酐、環戊烧四緩酸 319803 36 200839439 二酐、1,2, 4, 5-環己烷四羧酸二酐、降冰片烯二酸酐(Himic anhydride)、納迪克酸酐(nadic anhydride)等脂環族多元 羧酸酐類; ^ 乙一醇雙(均苯二酸)、甘油三偏苯三酸酐等含酯基之 致酸酐類等。 在上述羧酸酐類方面,可使用市售者作為環氧樹脂硬 化劑。上述環氧樹脂硬化劑之例可列舉如:以商品名稱而 言為ADEKA HARDENER EH-700(旭電化工業(股)製造)、 Rikacid HH、MH-700(均為新日本理化(股)製造)等。 上述硬化劑可各單獨使用,亦可組合2種以上使用。 凋製本發明之著色感光性樹脂組成物之方法可列舉 如:經由使分散劑併存於溶劑(E)中,使顏料等著色劑分散 而調成著色劑之分散液,再使(B)黏合劑樹脂、(C)光聚合 ^化s物、(D)光聚合起始劑,以及因應需要之其他添加劑 $ /夺解於洛劑,再與上述之(A)著色劑之分散液混合,如有 _需要再添加溶劑之方法等。 ^月之者色感光性樹脂組成物一般係密封於容器中 以供流通、保存。 ^ 使用本發明之著色感光性樹脂組成物之影像感測器用 衫色濾、光片的_般製法係如下所述。依序進行下列步驟: ^本备日月之著色感光性樹脂組成物塗佈於基板上並使之乾 =之y驟’在所得乾燥塗佈膜上將圖案以丨線步進機等進 4 丁曝光之步驟;曝光後進行鹼顯影之步驟及接著進行加熱 處理之步驟 W 故由對每個顏色(3色或4色)反覆地依序進 37 319803 200839439 行上述步驟以形成像素,即可得到彩色濾光片。 更具體而言,係將本發明之著色感光性樹脂組成物以 旋轉塗佈機(Spin Coater)等塗佈在適當的基板上,使乾燥 時之膜厚一般成為〇· 1至5/zm(以〇· 2至2//πι為佳),在 10 0 C的烘相中放置3分鐘後得到平滑之塗膜。 基板方面並無特別限定,除了玻璃板、塑膠板、鋁板、 攝影元件用矽晶圓等電子元件之基板以外,另可列舉如: 馨透用樹脂板、樹脂膜、陰極射線管顯示面、攝影管之受光 面、形成CCD、BBD、CID、BASIS等固體攝影元件之晶圓、 使用薄膜半導體之密著型影像感測器、液晶顯示面、彩色 電子照相用感光體、電致變色(EC)顯示器之基板等。而且, 為了提昇基板與彩色濾光片層之接著性,以實施高密著處 理者為佳。具體而言,係預先以矽烷偶合劑等薄層塗佈在 基板上之後”形成著色感光性樹脂組成物之圖案,或亦可 預先使著色感光性樹腊組成物中含有石夕燒偶合劑。 | 另外,如基板上有段差時,在基板上塗布用以消除該 段差而使塗裝面平滑之平坦化膜之後,即可塗佈本發明之 著色感光性樹脂組成物。例如·· CCD等影像感測器之感測 部係由矽基板上因應受光量而產生電子的光電轉換部(光 電二極體·· photod i ode)與用以輪出所產生之該電子的讀岀 間部(read out gate)所構成,如光線射到讀出閘部即^為 雜訊之原因而無法輸出正確數據,因此在讀出閘部之上部 形成遮光膜層,則會有在與不具遮光膜層之光電二極體部 之間形成段差之情形。在如此之段差上塗佈彩色光阻並直 319803 38 200839439 接形成衫色濾光片時,因光程長度加長 聚光性亦變差。為了改善該^ 暗,且 ^ ^ rrn ^ - 以彌補該段差為目的, 且在⑽與彩色濾光片之間形成透明 々 化膜之材料方面可列舉如: ―㈣斜坦 私工β / %月中之感光性樹脂組成 物、丙烯酸系、環氧系等埶 城 …、更化(生树月曰或光硬化性樹脂等。 &quot;二感光嶋組成物之後,為了去除溶劑以得到 乾^佈㈣’通常係進行㈣乾燥或預供梧 0.1至讀附之㈣,5G至峨之溫度下進行之方法在 預烘培之方法可列舉如:經$ , 、、工回/皿工乳荨的加熱乾燥、由埶 i專的加熱乾燥(8〇至14CTC,50至200秒)等方法。 為I使顯影後所得圖案充分硬化並提高機械強度而作 二、欠久膜乃進行後烘培(p〇s卜bake)。例如在製造3色彩 色濾光^之際,最先形成之圖案係在之後再接受2次其他 顏色之著色感光性樹脂組成物的塗佈、曝光、顯影。此時, ^進行後烘焙,使圖案不致由於與業經塗佈之著色感光性 樹脂組成物混色、曝光、顯影而發生脫落。該後烘焙雖使 用與預烘焙之相同方法,惟係在比預烘焙更高溫與更長時 間之條件下進行。例如在〗⑽至25(rc下進行丨至6〇分鐘。 在著色感光性樹脂組成物之顯影中所使用的顯影液並 無特別限制,可使用以往習知之顯影液。其中,以氫氧化 四甲銨(TMAH)等四級銨鹽類之有機鹼系水溶液為適用。 在此,具備本發明之彩色濾光片_之影像感測器係如上 述,在形成於基板上之感測部上形成平坦化膜,並於其上 319803 39 200839439The lipid steroids are more than 70 carboxylic acids. Examples of the polyvalent carboxylic acid anhydrides include, for example, phthalic anhydride, pyromellitic anhydride, trimellitic anhydride, 3,3,4 4, benzophenone tetracarboxylic dianhydride, and the like; Itaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, propionic anhydride, maleic acid, U, 3, 4-butane tetracarboxylic acid anhydride; 曰万矢六氮苯二Formic acid liver, 3,4-dimethyltetrahydrophthalic anhydride, i 24 - cyclopentane triacid anhydride, U'4~ cyclohexane tricarboxylic anhydride, cyclopentane tetrazoic acid 319803 36 200839439 dianhydride, 1,2,4, 5-cyclohexanetetracarboxylic dianhydride, normic dianhydride, nadic anhydride, and the like, alicyclic polycarboxylic acid anhydride; ^ ethyl alcohol bis (isophthalic acid) An acid anhydride containing an ester group such as diacid) or triglyceride. As the carboxylic acid anhydride, a commercially available one can be used as an epoxy resin hardener. Examples of the epoxy resin hardeners include, for example, ADEKA HARDENER EH-700 (manufactured by Asahi Kasei Kogyo Co., Ltd.), Rikacid HH, and MH-700 (all manufactured by Nippon Chemical and Chemical Co., Ltd.). Wait. These hardeners may be used alone or in combination of two or more. The method of immersing the colored photosensitive resin composition of the present invention includes, for example, dispersing a dispersing agent in a solvent (E), dispersing a coloring agent such as a pigment to prepare a dispersion of a coloring agent, and further (B) a binder. Resin, (C) photopolymerization s, (D) photopolymerization initiator, and other additives as needed, / occupies the agent, and then mixed with the dispersion of the above (A) colorant, such as There are _ need to add solvent and so on. ^ The color of the photosensitive resin composition is generally sealed in a container for distribution and storage. The method of using the color filter and the light film of the image sensor using the colored photosensitive resin composition of the present invention is as follows. The following steps are carried out in sequence: ^ The coloring photosensitive resin composition of the preparation date is applied to the substrate and allowed to dry = y'. On the obtained dried coating film, the pattern is entered into a stepping machine. The step of exposing the butyl; the step of performing alkali development after the exposure and the step of performing the heat treatment, respectively, so that each of the colors (3 colors or 4 colors) is sequentially passed through the steps of 37 319803 200839439 to form a pixel. A color filter is obtained. More specifically, the colored photosensitive resin composition of the present invention is applied to a suitable substrate by a spin coater or the like so that the film thickness during drying is generally 〇·1 to 5/zm ( Preferably, 〇·2 to 2//πι is placed in a baking phase of 10 0 C for 3 minutes to obtain a smooth coating film. The substrate is not particularly limited, and other than the substrate of the electronic component such as a glass plate, a plastic plate, an aluminum plate, or a photographic wafer for a photographic element, a resin plate, a resin film, a cathode ray tube display surface, and photography are also exemplified. a light-receiving surface of a tube, a wafer forming a solid-state imaging element such as CCD, BBD, CID, or BASIS, an image sensor using a thin film semiconductor, a liquid crystal display surface, a photoreceptor for color electrophotography, and electrochromism (EC) The substrate of the display, etc. Further, in order to improve the adhesion between the substrate and the color filter layer, it is preferable to perform a high-density process. Specifically, a pattern of a colored photosensitive resin composition is formed by applying a thin layer such as a decane coupling agent to a substrate, or a coloring photosensitive resin composition may be contained in advance. Further, when there is a step on the substrate, the colored photosensitive resin composition of the present invention can be applied by applying a flattening film for eliminating the step and smoothing the coating surface on the substrate. For example, CCD, etc. The sensing portion of the image sensor is a photoelectric conversion portion (photodiode and photod i ode) that generates electrons on the substrate according to the amount of received light, and a read portion of the electron generated by the rotation (read) Out gate), if the light hits the read gate, that is, the noise cannot be output due to the noise. Therefore, the light-shielding layer is formed on the upper portion of the read gate, and there is a light-shielding layer. A step is formed between the photodiode portions. When such a difference is applied to the color photoresist and the 319803 38 200839439 is connected to form a shirt color filter, the concentrating property is also deteriorated due to the length of the optical path length. The ^ is dark, and ^ ^ rrn ^ - For the purpose of making up the difference, and the material for forming a transparent bismuth film between (10) and the color filter can be exemplified as: ―(4) The composition of the photosensitive resin in the β / % month Materials, acrylics, epoxys, etc., etc., and furtherification (raw tree sputum or photocurable resin, etc. &quot; after the second sensitization composition, in order to remove the solvent to obtain a dry cloth (four) 'usually (4) Drying or pre-supplying 梧0.1 to read (4), the method of pre-baking in the method of pre-baking can be exemplified by: heating, drying by $, ,,,,,,,,,,,,,,,, Special heating and drying (8〇 to 14CTC, 50 to 200 seconds), etc. I can make the pattern obtained after development hardened and improve the mechanical strength, and the film is post-baked (p〇sb bake) For example, when a three-color color filter is manufactured, the first formed pattern is subjected to application, exposure, and development of the color-sensitive photosensitive resin composition of the other color two times later. The pattern is not caused by color mixing with the coated colored photosensitive resin composition The film is peeled off by exposure and development. Although the same method as that of prebaking is used for the post-baking, it is carried out under conditions of higher temperature and longer time than pre-baking. For example, 〗(6) to 25 (r. The developing solution used for the development of the coloring photosensitive resin composition is not particularly limited, and a conventional developing solution can be used. Among them, an organic base of a quaternary ammonium salt such as tetramethylammonium hydroxide (TMAH). The aqueous solution is suitable for use. Here, the image sensor having the color filter of the present invention is formed as described above, and a planarizing film is formed on the sensing portion formed on the substrate, and 319803 39 200839439

形成本發明之彩色濾光片後,塗佈透鏡材,再經曝光步驟 與熱處理將透鏡圖案成形,接著藉由將全面進行回飿 back)形成微型鏡頭(0CL: 〇n chip lens),即可製成e。C 如使用本發明之著色感光性樹脂組成物製造薄膜之彩 色濾光片時,即可製成顯影後之殘渣變少,色純度變高^ 製造不良品較少之彩色濾光片。 (實施例) 以下係依據實施例將本發明加以詳細說明,惟本發明 並不受該等實施例所限定。 〈樹脂(B1)之合成〉 在備有攪拌機、溫度計、回流冷卻管、滴液漏斗以及 氣體導入管之1L燒瓶中導入333g之丙二醇單曱醚乙酸 酉曰其後’將氮氣經由氣體導入管導入燒瓶内,且使燒瓶 内之氣體以氮氣取代。其後,使燒瓶内之溶液昇溫至1〇〇 ^後,使用滴液漏斗將由22 0g(〇 l〇莫耳)之甲基丙烯酸 籲二環戊酯(FA-513M;日立化成工業(股)製造)、7〇.5g(〇.4〇 莫耳)之曱基丙烯酸苄酯、43· 0g(0· 5莫耳)之曱基丙烯 酸、3· 6g之偶氮雙異丁腈以及164g之丙二醇單甲醚乙酸 醋所組成之混合物以2小時滴入燒瓶中,結束滴加後再於 下持續攪拌5小時。 結束攪拌後,將空氣經由氣體導入管導入燒瓶内,使 燒瓶内之氣體經空氣取代後,將35· 5g之甲基丙烯酸縮水 甘油酯[0· 25莫耳(相對於本反應中使用之曱基丙烯酸,以 莫耳分率計為50莫耳%)]、〇· 9g之參(二曱胺基曱基)酚以 40 319803 200839439 / 及0. 145g之氫醌投入燒瓶内,在110°C下持續進行反應6 小時,獲得含有樹脂B1之溶液(固形分38.5質量%,酸值 80mgKOH/g) ° 在此,酸值係測定中和1 g具有叛酸等酸基之聚合物所 需之氫氧化鉀量(mg)之值,通常係經由使用已知濃度之氫 氧化鉀水溶液進行測定而求得。 所得樹脂B1之聚苯乙烯換算重量平均分子量為9000。 在上述黏合劑樹脂之聚苯乙烯換算重量平均分子量之 ®測定方面,係使用GPC法並在下述條件下進行。 裝置:HLC-8120GPC(東槽(股)製造)After the color filter of the present invention is formed, the lens material is coated, and then the lens pattern is formed by an exposure step and a heat treatment, and then a micro lens (0CL: chipn chip lens) is formed by performing a full back. Made into e. When the colored color filter of the film is produced by using the colored photosensitive resin composition of the present invention, the residue after development can be reduced, and the color purity can be increased to produce a color filter having less defective products. (Embodiment) The present invention is described in detail below based on the examples, but the present invention is not limited by the examples. <Synthesis of Resin (B1)> 333 g of propylene glycol monoterpene ether acetate was introduced into a 1 L flask equipped with a stirrer, a thermometer, a reflux cooling tube, a dropping funnel, and a gas introduction tube, and then nitrogen gas was introduced through a gas introduction tube. Inside the flask, the gas in the flask was replaced with nitrogen. Thereafter, the solution in the flask was heated to 1 Torr, and 22 g of methacrylic acid called dicyclopentanyl ester (FA-513M; Hitachi Chemical Industry Co., Ltd.) was used using a dropping funnel. Manufactured, 7 〇.5g (〇.4〇莫) of benzyl methacrylate, 43.0 g (0.5 mol) of methacrylic acid, 3.6 g of azobisisobutyronitrile and 164 g A mixture of propylene glycol monomethyl ether acetate vinegar was dropped into the flask over 2 hours, and after the completion of the dropwise addition, stirring was continued for 5 hours. After the completion of the stirring, the air was introduced into the flask through a gas introduction tube, and after the gas in the flask was replaced by air, 35. 5 g of glycidyl methacrylate [0·25 mol (relative to the use in the reaction) Acrylic acid, 50 mol% based on mole fraction), 〇·9 g of ginseng (diammonium fluorenyl) phenol was introduced into the flask at 40 319803 200839439 / and 0.145 g of hydroquinone at 110 ° The reaction was continued for 6 hours at C to obtain a solution containing the resin B1 (solid content: 38.5% by mass, acid value: 80 mgKOH/g). Here, the acid value was determined by neutralizing 1 g of a polymer having an acid group such as a tickic acid. The value of the amount of potassium hydroxide (mg) is usually determined by measurement using an aqueous solution of potassium hydroxide having a known concentration. The obtained resin B1 had a polystyrene-equivalent weight average molecular weight of 9000. The measurement of the polystyrene-equivalent weight average molecular weight of the above-mentioned binder resin was carried out by the GPC method under the following conditions. Device: HLC-8120GPC (manufactured by East Tank)

管柱:TSK-GELG2000HXL 管柱溫度· 4 0 C 溶劑:THF -流速· 1. OmL/min - 被檢液固形分濃度:0. 001至0. 01質量% •注入量:5 0 // L· 檢測器:11 校正用基準物:TSK STANDARD POLYSTYRENE F-40、F-4、 F-1、A-2500、A-500(東槽(股)製造) 本實施例所使用之成分係如下述,以下亦有簡稱之情 形。 (A-1)著色劑:C. I.顏料紅254 (A-2)著色劑:C. I.顏料黃139 (B-1)樹脂Bl(固形分38. 5質量%之丙二醇單甲醚乙酸酯溶 41 319803 200839439 u 液) (C-1)光^^合性化合物· DPHA (—季戊四醇六丙稀酸g旨)(日 本化藥(股)製造) (C-2)光聚合性化合物:A-GLY-3E(新中村化學工業(股)萝 造)環氧乙烧化(3個)甘油三丙稀酸酯(1 +m+n=3) (C - 3)光聚合性化合物:A-GLY-6E(新中村化學工業(股)萝 造)環氧乙烷化(6個)甘油三丙'烯酸酯(i+m+n=6) (C - 4)光聚合性化合物:A-GLY-9E(新中村化學工業(股)樂j 造)環氧乙烷化(9個)甘油三丙烯酸酯(i+m+n=9) (C - 5)光聚合性化合物:A-GLY-20E(新中村化學工業(股) 製造)環氧乙烧化(20個)甘油三丙婦酸g旨(i+m+n=2〇) (C-6)光聚合性化合物·· A-DPH-6E(新中村化學工業(股)製 造)環氧乙烧化(6個)二季戊四醇六丙烯酸酯 (C-7)光聚合性化合物:a“DPH-6P(新中村化學工業(股)製/ 造)環氧丙烷化(6個)二季戊四醇六丙烯酸酯 (C-8)光聚合性化合物:ATM-4E(新中村化學工業(股)製造) 環氧乙烷化(4個)季戊四醇 (C - 9)光聚合性化合物:a-TMPT-3E0(新中村化學工業(股) 製造)環氧乙烷化(3個)三羥曱基丙烷三丙烯酸酯 (C-10)光聚合性化合物:A-TMPT_6E0(新中村化學工業(股) 製造)環氧乙烷化(6個)三羥甲基丙烷三丙烯酸酯 (C- Π)光聚合性化合物:A-TMPT-9E0(新中村化學工業(股) 製造)環氧乙烷化(9個)三羥甲基丙烷三丙烯酸酯 (C-12)光聚合性化合物:sR9020(Sartomer Japan(股)製造) 42 319803 200839439 環氧丙烷化(3個)甘油三丙烯酸酯 (C-13)光聚合性化合物:CD9〇21(Sart〇mer Japan(股)製造) 裱氧丙烷化(5· 5個)甘油三丙烯酸酯 (D-1)光聚合起始劑:2-苄基-2-二曱胺基-l-(4-嗎福啉基 苯基)丁烧-1-酮 CG-1)光聚合起始助劑:4,4,-雙(二乙胺基)二苯曱酮 (E-1)溶劑:丙二醇單曱醚乙酸酯 ⑩(E-2)溶劑:3-乙氧基丙酸乙酯 (FM)Megafac F475(大曰本油墨化學工業(股)製造) 豐施例1 : [者色感光性树脂組成物1之調製] (A-1) : 6· 333 質量份· (A-2) : 1· 892 質量份 (相對於固形分(A)之-總量;47質量.. 丙烯酸系分散劑·· 1· 602質量份 • 〇1).11.664質量份(相對於固形分;25 7質量%) (c 2) · 2· 418質置份(相對於固形分;13. 8質量 (i) · 〇· 622貝里伤(相對於(B)之固形分+ (c)之總量;9 質量 (G 1) · 0· 138質量份(相對於⑻;22·2質量 (Ε〜1)67. 077質量份 (£〜2) : 8. 250質量份 (相對於(Ε)之(Ε-1)總量;9〇質量%) (相對於組成物之(Ε)總量;82 5質量%) 43 319803 200839439 u (F-l) : 0· 004 質量份 將上述物質混合而得著色感光性樹脂組成物工。 [圖案之形成1 ] 其次’在玻璃(#1737; CORNING)上,將 SUM I RESIST PR - 1300Y-PG(住友化學(股)製造)施行旋轉塗佈,在1 〇 〇。^下 加熱1分鐘以去除揮發性成分,形成膜厚度〇· 5/zm之樹脂 層。接著,將該玻璃在230 °C下加熱15分鐘使樹脂層硬化, 馨形成附有平坦化覆膜之支撐體。在該支撐體上將上述所得 著色感光性樹脂組成物(紅色)以旋塗法塗佈後,在1〇〇它 下加熱3分鐘以去除揮發性成分,形成著色感光性樹脂組 成物膜。冷卻後,在該著色感光性樹脂組成物膜上隔著光 罩照射1射線(波長365nm)並曝光。在丨射線之光源中以 超南壓水銀燈作為平行光進行照射。照射光量設為15〇mJ/ cm2。在光罩方面,係用以形成線寬3//m、“m、·^m、6 9/zm、1〇&quot;、2〇//111、3〇//111、40//111、 鲁50//m以及100# m之線狀色像素的光罩。接著,將曝光後 之玻璃基板[表面上形成有著色感光性樹脂組成物膜]在 23 C 之顯影液(CIS DEVELOPER ; ENF Techno logy (股)製造) 中浸潰80秒而顯影,以純水清洗,得到寬度/間距已經圖 案化之玻璃基板。 [評估1] 上述所得基板之塗膜層溶解後的穿透率(55〇nm)為 99. 4% 〇 (圖案之形成2) 319803 44 200839439 另在矽晶圓上將SUM I RESIST PR-1300 Y-PG(住友化學 (股)製造)施行旋轉塗佈,在1 Q 〇 下加熱1分鐘以去除揮 發性成分,形成膜厚度〇· 5 Am之樹脂層。接著,將該矽晶 圓在2 3 0 C下加熱15分鐘使樹脂層硬化,形成附有平坦化 覆膜之支撐體。在該支撐體上事先將所得著色感光性樹脂 組成物1以旋塗法塗佈後,藉由在10(rc下加熱i分鐘以 去除揮發性成分,形成著色感光性樹脂組成物層。接著, 修在所得著色感光性樹脂組成物層上,以曝光機(Nik⑽ i9C; Nikon(股)製造)隔著光罩圖案(2//111正方像素形成格 子狀)在20至310msec期間,以i〇msec之間隔對3〇處進 行階段性的1射線照射後,將經曝光之各支撐體浸潰在. t:之顯影液(CIS developer; ENF Technology(股)’夢迕) 中60秒鐘使之顯影。顯影後,以純水清洗並使之乾1後, 得到於支撐體上具有由線寬、厚度之格子 狀圖案所形成之像素的彩色濾光片。 _ [評估2] /以掃插式電子顯微鏡(s_侧;(股)日立製作所製 硯察圖案之剖面結果,發現可得到顯影溶解部分,尤其是 圖案之邊緣部分並無殘逢附著之密著性良好的順斜度圖疋 實施例2 : [者色感光性樹脂組成物2之調製] 同 —除了將實施例1之(C_2)變更為(c_3)之外, 實施例1進行混合,得到著多 ’、Ά 丁彳嘗已玖先性樹脂組成物2。 319803 45 200839439 ★ [評估1] 除了將實施例1之著色感光性樹脂組成物丨變更為著 色感光性樹脂組成物2之外,其餘如同實施例1,基板之 塗膜層溶解後,測定穿透率(550nm)之結果為99. 8%。 [評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現可 得顯影溶解部分並無殘渣附著之圖案。 實施例3 : ⑩[著色感光性樹脂組成物3之調製] 除了將實施例1之(C-2)變更為(〇4)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物3。 [評估1] 除了將實施例1之著色感光性樹脂組成物i變更為著 色感光牲樹脂組成物3之外,其餘如同實施例1,基板之 塗膜層溶解後,測定穿透率(550nm)之結果為1〇〇〇/0。 •[評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現可 得顯影溶解部分並無殘渣附著之圖案。 實施例4 : [著色感光性樹脂組成物4之調製] 除了將實施例1之(C-2)變更為(c_5)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物4。 [評估1] 除了將實施例1之著色感光性樹脂組成物丨變更為著 319803 46 200839439 色感光性樹脂組成物4之外,其餘如同實施例丨,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為99. 2%。 [評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現可 得顯影溶解部分並無殘渣附著之圖案。 比較例1 : [著色感光性樹脂組成物5之調製] 除了將實施例1之(C-2)變更為(C-1)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物5。 [評估1] 除了將實施例1之著色感光性樹脂組成物丨變更為著 色感光性樹脂組成物5之外,其餘如同實施例1,基板之 塗膜層溶解後’測定穿透率(55〇nm)之結果為52· 4%。 [評估2] . 與貫施例1相同地進行圖案之剖面觀察結果,發現顯 _影溶解部分未完全溶解,無形成圖案。 比較例2 : [著色感光性樹脂組成物6之調製] 除了將實施例1之(C-2)變更為(C-6)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物6。 [評估1] 除了將實施例1之著色感光性樹脂組成物1變更為著 色感光性樹脂組成物6之外,其餘如同實施例1,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為89.4%。 47 319803 200839439 [評估2] 與貫施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分未完全溶解,在圖案邊緣部分附有殘渣。 比較例3 : [著色感光性樹脂組成物7之調製] 除了將實施例1之(02)變更為(c—7)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物7。 [評估1] 除了將貫施例1之著色感光性樹脂組成物丨變更為著 色感光性樹脂組成物7之外,其餘如同實施例丨,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為85.4%。 [評估2] 與貝把例1相同地進行圖案之剖面觀察結果,發現顯 衫/谷解部分未完全溶解,在圖案邊緣部分附有殘渣。而且, 所付圖案係格子狀圖案有部分剝離的圖案。 %比較例4 : [著色感光性樹脂組成物8之調製] 除了將實施例1之(C-2)變更為(C-8)之外,其餘如同 貝施例1進彳于混合’得到著色感光性樹脂組成物8。 [評估1] 除了將實施例1之著色感光性樹脂組成物1變更為著 色感光性樹脂組成物8之外,其餘如同實施例1,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為95. 4%。 [評估2] 319803 48 200839439 與實施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分有殘渣附著。 / 比較例5 : [著色感光性樹脂組成物9之調製] 除了將實施例1之(C-2)變更為(C-9)之外,其餘如同 實施例1進行混合,得到著色感光性樹脂組成物9。 [評估1] _ 除了將實施例1之著色感光性樹脂組成物1變更為著 色感光性樹脂組成物9之外,其餘如同實施例丨,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為95.9%。 [評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分有殘渣附著。 比較例6 : - [著色感光性樹脂組成物1〇之調製] 鲁—除了將實施例1之(C-2)變更為(C_1〇)之外,其餘如同 貫施例1進行混合,得到著色感光性樹脂組成物1〇。 [評估1] 除了將實施例1之著色感光性樹月旨組成物i變更為著 色感光性樹脂組成物10之外,其餘如同實施例丨,基板之 塗膜層溶解後,測定穿透率(55〇nm)之結果為 [評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分有殘渣附著。 、 319803 49 200839439Column: TSK-GELG2000HXL Column temperature · 4 0 C Solvent: THF - Flow rate · 1. OmL / min - Solid concentration of the test liquid: 0. 001 to 0. 01% by mass • Injection volume: 5 0 // L · Detector: 11 Calibration reference: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by East Tank) The components used in this example are as follows The following is also referred to as the abbreviation. (A-1) Colorant: CI Pigment Red 254 (A-2) Colorant: CI Pigment Yellow 139 (B-1) Resin Bl (solid content 38.5 mass% of propylene glycol monomethyl ether acetate solution 41 319803 200839439 u liquid) (C-1) photo-compound compound DPHA (-pentaerythritol hexa-acrylic acid g) (manufactured by Nippon Kayaku Co., Ltd.) (C-2) Photopolymerizable compound: A-GLY- 3E (Xinzhongcun Chemical Industry Co., Ltd.) Ethylene Ethylene Ethylene (3) Triglyceride (1 + m + n = 3) (C - 3) Photopolymerizable Compound: A-GLY-6E (Xinzhongcun Chemical Industry Co., Ltd.) Ethylene oxide (6) glycerol tripropionate (i+m+n=6) (C-4) Photopolymerizable compound: A-GLY- 9E (made by Shin-Nakamura Chemical Industry Co., Ltd.) Ethylene oxide (9) glycerol triacrylate (i+m+n=9) (C-5) Photopolymerizable compound: A-GLY-20E (Manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) Epoxy Ethylene (20) Glycerol Triacetate G (i+m+n=2〇) (C-6) Photopolymerizable Compound·· A-DPH- 6E (manufactured by Shin-Nakamura Chemical Co., Ltd.) Epoxy Ethylene (6) Dipentaerythritol Hexacrylate (C-7) Photopolymerizable Compound: a DPH-6P (manufactured by Shin-Nakamura Chemical Co., Ltd.) epoxidized (6) dipentaerythritol hexaacrylate (C-8) photopolymerizable compound: ATM-4E (manufactured by Shin-Nakamura Chemical Co., Ltd.) Ethylene oxide (4) pentaerythritol (C-9) photopolymerizable compound: a-TMPT-3E0 (manufactured by Shin-Nakamura Chemical Co., Ltd.) Ethylene oxide (3) trihydroxydecyl propane Triacrylate (C-10) photopolymerizable compound: A-TMPT_6E0 (manufactured by Shin-Nakamura Chemical Co., Ltd.) Ethylene oxide (6) trimethylolpropane triacrylate (C-fluorene) photopolymerization Compound: A-TMPT-9E0 (manufactured by Shin-Nakamura Chemical Co., Ltd.) Ethylene oxide (9) Trimethylolpropane triacrylate (C-12) photopolymerizable compound: sR9020 (Sartomer Japan ( (manufacturing) 42 319803 200839439 Propylene oxide (3) glycerol triacrylate (C-13) photopolymerizable compound: CD9〇21 (manufactured by Sart〇mer Japan Co., Ltd.) 裱 丙烷 丙烷 (5·5 Glycerol triacrylate (D-1) photopolymerization initiator: 2-benzyl-2-diguanylamino-l-(4-morpholinophenyl)butan-1-one CG-1 Light gathering Starting additive: 4,4,-bis(diethylamino)benzophenone (E-1) solvent: propylene glycol monoterpene ether acetate 10 (E-2) solvent: 3-ethoxypropane Ethyl acetate (FM) Megafac F475 (manufactured by Otsuka Ink Chemical Industry Co., Ltd.) Example 1: Preparation of [Photochromic Resin Composition 1] (A-1) : 6 · 333 parts by mass ( A-2) : 1· 892 parts by mass (relative to the solid content (A) - total amount; 47 mass: acrylic dispersant · · 1 · 602 parts by mass • 〇 1). 11.66 parts by mass (relative to solid form 25 7 mass%) (c 2) · 2· 418 mass fraction (relative to solid fraction; 13.8 mass (i) · 〇 · 622 bergere injury (relative to (B) solid fraction + (c Total amount; 9 mass (G 1) · 0 · 138 parts by mass (relative to (8); 22·2 mass (Ε~1) 67. 077 parts by mass (£~2): 8. 250 parts by mass (relative to (Ε) (总量-1) total amount; 9〇 mass%) (relative to the total amount of (组成) of the composition; 82 5 mass%) 43 319803 200839439 u (Fl) : 0· 004 parts by mass of the above substances The coloring photosensitive resin composition is mixed. [Formation of pattern 1] Next, SUM I RESIST PR - 1300Y-PG (manufactured by Sumitomo Chemical Co., Ltd.) was spin-coated on glass (#1737; CORNING) at 1 〇 〇. The mixture was heated for 1 minute to remove volatile components to form a resin layer having a film thickness of 〇·5/zm. Next, the glass was heated at 230 ° C for 15 minutes to harden the resin layer, and a support having a flattened film was formed. The coloring photosensitive resin composition (red) obtained above was applied by spin coating on the support, and then heated under a pressure of 3 Torr for 3 minutes to remove volatile components to form a colored photosensitive resin composition film. After cooling, the colored photosensitive resin composition film was irradiated with 1 ray (wavelength: 365 nm) through a mask and exposed. In the light source of the x-ray, the ultra-high pressure mercury lamp is used as the parallel light. The amount of illumination light was set to 15 〇 mJ/cm 2 . In the case of a photomask, it is used to form a line width of 3//m, "m, ·^m, 6 9/zm, 1〇&quot;, 2〇//111, 3〇//111, 40//111, A mask of a linear color pixel of 50/m and 100# m. Next, a glass substrate (a film formed with a colored photosensitive resin composition film formed on the surface) in a developing solution of 23 C (CIS DEVELOPER; ENF) Techno logy (manufactured by Technology) was developed by dipping for 80 seconds, and washed with pure water to obtain a glass substrate having a width/pitch pattern. [Evaluation 1] Transmissibility of the coating layer of the above obtained substrate after dissolution (55) 〇nm) is 99.4% 〇 (pattern formation 2) 319803 44 200839439 Another SUM I RESIST PR-1300 Y-PG (manufactured by Sumitomo Chemical Co., Ltd.) was spin-coated on a 矽 wafer at 1 Q The underarm was heated for 1 minute to remove volatile components to form a resin layer having a film thickness of Am·5 Am. Then, the ruthenium wafer was heated at 260 C for 15 minutes to harden the resin layer to form a flattened film. The support is obtained by previously applying the obtained colored photosensitive resin composition 1 to the support by spin coating, and removing the volatile by heating at 10 (rc for 1 minute). The composition was formed into a colored photosensitive resin composition layer, and then applied to the obtained colored photosensitive resin composition layer, and exposed to a mask pattern (2//111 square pixel) by an exposure machine (Nik (10) i9C; Nikon (manufactured by Nikon)). Forming a lattice shape), after performing a stepwise 1 ray irradiation at 3 〇 at intervals of i〇msec during 20 to 310 msec, the exposed support bodies are immersed in a developing solution (CIS developer; ENF) Technology developed in 60 seconds to develop it. After development, it is washed with pure water and dried for 1 to obtain a pixel having a lattice pattern of line width and thickness on the support. Color filter. _ [Evaluation 2] / Sweep-input electron microscope (s_ side; (share) Hitachi Manufacture's profile of the inspection pattern, found that the developed dissolved part, especially the edge of the pattern is not Example 2: [Preparation of the color photosensitive resin composition 2] The same as in the case of changing the (C_2) of the first embodiment to (c_3) Example 1 was mixed to get more ', Ά 彳 彳Precursor resin composition 2. 319803 45 200839439 ★ [Evaluation 1] Except that the colored photosensitive resin composition 实施 of Example 1 was changed to the colored photosensitive resin composition 2, as in Example 1, the substrate was coated. After the film layer was dissolved, the transmittance (550 nm) was measured and found to be 99.8%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that a pattern in which the developed-dissolved portion had no residue adhered was obtained. Example 3: 10 [Preparation of Colored Photosensitive Resin Composition 3] Except that (C-2) of Example 1 was changed to (〇4), the mixture was mixed as in Example 1 to obtain a coloring photosensitive resin composition. Item 3. [Evaluation 1] Except that the colored photosensitive resin composition i of Example 1 was changed to the colored photosensitive resin composition 3, as in Example 1, the coating layer of the substrate was dissolved, and the transmittance (550 nm) was measured. The result is 1〇〇〇/0. • [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that a pattern in which the developed-dissolved portion had no residue adhered was obtained. Example 4: [Preparation of the coloring photosensitive resin composition 4] The coloring photosensitive resin composition 4 was obtained as in Example 1 except that (C-2) of Example 1 was changed to (c_5). . [Evaluation 1] Except that the colored photosensitive resin composition of Example 1 was changed to 319803 46 200839439 color photosensitive resin composition 4, as in the example, after the coating layer of the substrate was dissolved, the penetration was measured. The result of the rate (55 〇 nm) is 99.2%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1. It was found that a pattern in which the developed-dissolved portion had no residue adhered was obtained. Comparative Example 1: [Preparation of Colored Photosensitive Resin Composition 5] Except that (C-2) of Example 1 was changed to (C-1), the mixture was mixed as in Example 1 to obtain a coloring photosensitive resin composition. Matter 5. [Evaluation 1] Except that the colored photosensitive resin composition of Example 1 was changed to the colored photosensitive resin composition 5, as in Example 1, after the coating layer of the substrate was dissolved, the transmittance was measured (55 〇). The result of nm) is 52.4%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that the visible portion was not completely dissolved, and no pattern was formed. Comparative Example 2: [Preparation of Colored Photosensitive Resin Composition 6] Except that (C-2) of Example 1 was changed to (C-6), the mixture was mixed as in Example 1 to obtain a coloring photosensitive resin composition. Matter 6. [Evaluation 1] Except that the colored photosensitive resin composition 1 of Example 1 was changed to the colored photosensitive resin composition 6, the transmittance was measured after the coating layer of the substrate was dissolved as in Example 1. The result of nm) was 89.4%. 47 319803 200839439 [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that the developed dissolved portion was not completely dissolved, and a residue was attached to the edge portion of the pattern. Comparative Example 3: [Preparation of the coloring photosensitive resin composition 7] The coloring photosensitive resin composition 7 was obtained by mixing the same as in Example 1 except that (02) of Example 1 was changed to (c-7). . [Evaluation 1] The transmittance was measured after the coating layer of the substrate was dissolved, except that the colored photosensitive resin composition 贯 of Example 1 was changed to the colored photosensitive resin composition 7. The result of 〇nm) was 85.4%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that the portion of the shirt/gluten solution was not completely dissolved, and the residue was attached to the edge portion of the pattern. Further, the pattern to be applied has a partially peeled pattern in a lattice pattern. %Comparative Example 4: [Preparation of Colored Photosensitive Resin Composition 8] Except that (C-2) of Example 1 was changed to (C-8), the same as in Example 1 Photosensitive resin composition 8. [Evaluation 1] Except that the colored photosensitive resin composition 1 of Example 1 was changed to the colored photosensitive resin composition 8, the transmittance was measured as in Example 1, after the coating layer of the substrate was dissolved (55 〇). The result of nm is 95.4%. [Evaluation 2] 319803 48 200839439 The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that residue was observed in the visible portion. /Comparative Example 5: [Preparation of Colored Photosensitive Resin Composition 9] Except that (C-2) of Example 1 was changed to (C-9), the mixture was mixed as in Example 1 to obtain a colored photosensitive resin. Composition 9. [Evaluation 1] In addition to changing the colored photosensitive resin composition 1 of Example 1 to the colored photosensitive resin composition 9, the transmittance was measured after the coating layer of the substrate was dissolved as in Example (. The result of 〇nm) is 95.9%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that residue was observed in the visible portion. Comparative Example 6: - [Preparation of Colored Photosensitive Resin Composition 1 ]] - In addition to changing (C-1) of Example 1 to (C_1 〇), the same as Example 1 was carried out to obtain coloration. The photosensitive resin composition was 1 Torr. [Evaluation 1] The transmittance was measured after the coating layer of the substrate was dissolved, except that the coloring photosensitive composition i of Example 1 was changed to the colored photosensitive resin composition 10. The result of 55 〇 nm) was [Evaluation 2]. The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that residue was adhered to the developed-dissolved portion. , 319803 49 200839439

'V 比較例7 ·· [著色感光性樹脂組成物11之調製] 除了將實施例1之(C-2)變更為(c-h)之外,其餘如同 貫施例1進行混合,得到著色感光性樹脂組成物丨i。 [評估1] 除了將實施例1之著色感光性樹脂組成物丨變更為著 色感光性樹脂組成物11之外,其餘如同實施例丨,基板之 塗膜層溶解後,測定穿透率(550nm)之結果為96.4%。 _ [評估2] 與貫施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分有殘潰附著。所得圖案係格子狀圖案有部分剝 離的圖案。 比較例8 : [者色感光性樹脂組成物12之調製] 除了將實施例1之(C-2)變更為(CM2)之外,其餘如同 修實施例1進行混合’得到著色感紐樹脂組成物12。 [評估1] 除了將實施例1之著色感光性樹腊組成物】變更為著 色感光性樹脂組成物12之外,其餘如同實施例1,基板之 塗膜層溶解後,測定穿透率(55Gnm)之結果為871%。 [評估2] 與實施例1相同地進行圖案之剖面觀察結果,發現顯 影溶解部分有殘渣附著。 比較例9 : 319803 50 200839439 [著色感光性樹脂組成物13之調製] 除了將實施例1之(C-2)變更為(c—丨3)之外,其餘如同 貫施例1進行混合,得到著色感光性樹脂組成物13。 [評估1] 除了將貫施例1之著色感光性樹脂組成物i變更為著 色感光性樹脂組成物13之外,苴 具餘如冋貫施例1,基板之 塗胺層溶解後,测定穿透率'V Comparative Example 7 · [Preparation of Colored Photosensitive Resin Composition 11] Except that (C-2) of Example 1 was changed to (ch), the mixture was mixed as in Example 1 to obtain coloring sensitivity. Resin composition 丨i. [Evaluation 1] Except that the coloring photosensitive resin composition of Example 1 was changed to the colored photosensitive resin composition 11, the transmittance was measured (550 nm) after the coating layer of the substrate was dissolved as in Example 溶解. The result was 96.4%. _ [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that the visible portion of the film was broken. The resulting pattern was a partially stripped pattern in a lattice pattern. Comparative Example 8: [Preparation of the color photosensitive resin composition 12] Except that (C-2) of Example 1 was changed to (CM2), the mixture was mixed as in Example 1 to obtain a coloring resin composition. Matter 12. [Evaluation 1] Except that the colored photosensitive resin composition of Example 1 was changed to the colored photosensitive resin composition 12, as in Example 1, the coating layer of the substrate was dissolved, and the transmittance was measured (55 Gnm). The result is 871%. [Evaluation 2] The cross-sectional observation of the pattern was carried out in the same manner as in Example 1, and it was found that residue was observed in the visible portion. Comparative Example 9: 319803 50 200839439 [Preparation of Colored Photosensitive Resin Composition 13] Except that (C-2) of Example 1 was changed to (c-丨3), the same was carried out as in Example 1 to obtain The photosensitive resin composition 13 was colored. [Evaluation 1] Except that the colored photosensitive resin composition i of Example 1 was changed to the colored photosensitive resin composition 13, the remainder of the method was as shown in Example 1, and the coated amine layer of the substrate was dissolved and then measured. Transmittance

[評估2] +C550nm)之結果為Θ4· 3%。 案之剖面觀察結果,發覌顯 案邊緣部分附有殘渣。 與貫施例1相同地進行圖 影溶解部分未完全溶解,在^ 【圖式簡單說明】 。 無 【主要元件符號說明】 無The result of [Evaluation 2] + C550nm) was Θ4·3%. As a result of the cross-sectional observation of the case, the edge of the hairpin display was accompanied by residue. The image-dissolved portion was not completely dissolved in the same manner as in Example 1, and was simply described in the figure. None [Main component symbol description] None

319803319803

Claims (1)

200839439 . a 十、申請專利範圍: 1. 一種著色感光性樹脂組成物,係包含(Ak ^ 、(B)黏合 劑樹脂、(C)光聚合性化合物、(D)光聚合起如南以及 物之固形分,(A)顏料之含量以質量分率計,為至 60質量%,而且(C)光聚合性化合物包含式(1)所示之化 合物200839439 . a Ten, the scope of application for patents: 1. A colored photosensitive resin composition comprising (Ak ^, (B) binder resin, (C) photopolymerizable compound, (D) photopolymerization as South and The solid content, (A) the content of the pigment is 60% by mass by mass fraction, and (C) the photopolymerizable compound contains the compound represented by the formula (1) [式(I)中,l、m以及η為各自獨立,表示〇以上之整 數,i+m+n表示3至20之整數]。 . 2 ·如申清專利範圍第1項之組成物,其中,相對於([)光 聚合性化合物,式(I)所示化合物之含量以質量分率 計,為5至100質量%。 3·如申請專利範圍第1或2項之組成物,其中,相對於著 色感光性樹脂組成物之固形分,(C )光聚合性化合物之 含量以質量分率計,為5至45質量%。 4·如申請專利範圍第1項之組成物,其中,式(1)所示之 化合物中,l+m+n表示3至12之整數。 5·如申請專利範圍第1項之組成物,其中,式(I)所示之 化合物中,1 表示6至12之整數。 319803 52 200839439 V 6. -種圖案’係使用申請專利範圍第up 組成物所形成者。 7. :種彩色據光片,係包含申請專利範圍第 8. 像感測器’係具備申請專利範圍第, 丨中任一項之 6項之圖案 項之彩色濾 319803 53 200839439 七、指定代表圖:無 (一) 本案指定代表圖為:第()圖。 (二) 本代表圖之元件符號簡單說明: 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式:[In the formula (I), l, m and η are each independently, and represent an integer above 〇, and i+m+n represents an integer of 3 to 20]. 2. The composition of the first aspect of the invention, wherein the content of the compound represented by the formula (I) is from 5 to 100% by mass based on the mass fraction of the ([) photopolymerizable compound. 3. The composition of claim 1 or 2, wherein the content of the (C) photopolymerizable compound is 5 to 45% by mass based on the mass fraction relative to the solid content of the colored photosensitive resin composition. . 4. The composition of claim 1, wherein, in the compound represented by the formula (1), l+m+n represents an integer of from 3 to 12. 5. The composition of claim 1, wherein, in the compound of the formula (I), 1 represents an integer of 6 to 12. 319803 52 200839439 V 6. - Patterns are formed using the first composition of the patent application scope. 7. : Color film according to the scope of patent application. The image sensor is a color filter with a pattern of 6 items in any of the patent scopes. 319803 53 200839439 VII. Designated representative Figure: None (1) The representative representative of the case is: (). (2) A brief description of the symbol of the representative figure: 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 00 0 5 3198030 5 319803
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