200839314 95068 21295twf.doc/n 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種彩色濾光片，且特別是有關於一 種利用一光罩以在一片玻璃基板上曝出多種尺寸之彩色遽 光片。 “ 【先前技術】 隨著半導體產業的發展’液晶顯示器的技術也日漸成 熟。從1990年薄膜電晶體液晶顯示器（Thin Film Transistor200839314 95068 21295twf.doc/n IX. Description of the Invention: [Technical Field] The present invention relates to a color filter, and more particularly to a mask for exposing various sizes on a piece of glass substrate Colored calenders. "[Prior Art] With the development of the semiconductor industry, the technology of liquid crystal display is becoming more and more mature. From 1990, the film transistor liquid crystal display (Thin Film Transistor)
Liquid Crystal Display，TFT-LCD)產業剛囉起於曰本時，日 本設計建造了 一代廠(簡稱G1)的製程。 一代庭的玻璃基板大約是30 X 40公分大小，相當於 全開的雜誌，可做成一片15吋的面板。到了 1996年時， 技術已進步到3.5代廠（G3.5)，而玻璃基板的尺寸約為60 X 72公分。 世代 基板尺寸(公厘） 14·1， 15, 17, 19, 26, 32, 37, G3 550 X 700 4 4 2 2 1 0 0 G4 680 X 880 6 6 4 4 2 1 1 G4.5 730 X 920 9 6 6 4 2 1 1 G5 1100 X 1250 16 16 12 9 6 3 2 G6 1500 X 1850 42 30 24 20 12 8 6 表1 表1為三至六代廠的玻璃基板尺寸，以及各代廠之玻 璃基板依照面板尺寸大小而可以切割出的面板片數的對照 200839314 95068 21295twf.doc/n 表0 由表1可知，演進至今，六代廠的玻璃基板的尺寸已 達到了 150公分X 185公分，相當於一張雙人床大小。一 片G6的玻璃基板的經濟切割，可切割出30片15吋的面 板，與G3.5可切割4片、G1僅可做1片15对面板的規模 比較’六代廠的產能是以倍數放大，相對地製程成本便能 夠降低，並增加經濟效益。此外，G6玻璃基板的魔大尺寸 亦可切割出大尺寸的面板，如用以製作8片32吋的面板， 或是6片37吋的面板，大大地提高了面板產品應用的多元 性0 然而，為了符合使用者對於大尺寸面板的需求 ，面板 的尺寸也逐漸朝向40吋、42吋、50吋等甚至更為大型化。 以40吋的面板為例，〇7的玻璃基板尺寸為187公分又22〇 公分，而將G7 &玻璃基板切割多片力4〇忖面板，玻璃基 板的利用率可以達到92%。相較之下，/ ^ t t 仰钗之下，在7.5代廠的玻璃 基板尺寸為195公分x 225公分，但是將玻板切割多 片的40抑板時胃，玻璃基板的率只有抓至。 喊板的利用率以切割出更多的面板 疋目則各豕廠商積極研究的問題。 【發明内容】 ^發明之目的是提供—種彩色濾光片的製作方法，立 °以本時，提_基板的利用率’。 色濾光^。 k供—種上述方法製作出來的彩 200839314 95068 21295tw£doc/n 本發明之目的是提供一種液晶顯示面板的製作方法， 其在經潸切割玻璃基板時，可提升玻璃基板的利用率。 本發明之目的疋提供一種液晶顯示面板，其彩色渡光 片的彩色濾光層呈階梯狀排列。 • 本發明之目的是提供一種液晶顯示裝置，其彩色濾光 片的彩色濾光層呈階梯狀排列。 為達上述或是其他目的，本發明提出一種彩色濾光片 ⑩ 的製作方法，包括下列之步驟。首先，提供一光罩，其中 此光罩具有一長軸、一第一曝光圖案及一第二曝光圖案， 第一、第二曝光圖案分別具有垂直相連之一長邊及一短 邊，而第一曝光圖案之短邊垂直長軸，且第二曝光圖案之 短邊平行長軸。接著，提供一基板，並將基板置於光罩的 一側，其中基板具有多個預定區，而第一、第二曝光圖案 分別位於預定區内。之後，調整光罩與基板的相對位置， 並利用光罩對基板進行微影與蝕刻製程，以形成一彩色濾 絲列基板。最後，切割彩色濾光陣列基板，以形成多片 彩色濾光片。 在本發明之一實施例中，於提供基板前或後，更包括 於基板上形成一彩色光阻。 在本發明之一實施例中，上述之調整光罩與基板之相 對位置包括下列的步驟。首先，使基板沿著平行長軸的方 向移動-第-距離。然後，使基板沿著垂直長轴的方向移 動一第二距離。 在本發明之一實施例中，上述之第一距離為第二曝光 7 200839314 95068 21295twf.doc/n 圖案之短邊的長度，而第二距離為第一曝光圖案之短邊的 長度。 一在本發明之一實施例中，上述之第一曝光圖案的長邊 與第，曝光圖案的長邊的長度相同，而第一曝光圖案的短 邊與第一曝光圖案的短邊的長度相同。然後，切割彩色渡 光陣列基板，以形成多片尺寸相同的彩色濾光片。 在本發明之一實施例中，上述之第一曝光圖案的長邊 • #第=曝光圖案的長邊的長度不同，而第-曝光圖案的短 邊與第二曝光圖案的短邊的長度不同。然後，切割彩色濾 光陣列基板，以形成兩種以上尺寸的彩色濾光片。 本發明提出一種液晶顯示面板的製作方法，其包括下 ^之步驟：首先，提供—光罩，其中光罩具有-長軸、一 曝光圖案及-第二曝光圖案，且第―、第二曝光圖案 刀一別具有垂直相連之一長邊及一短邊，而第一曝光圖案之 短邊垂直長軸，第二曝光圖案之短邊平行長轴。然後，提 供一第一基板，並將第一基板置於光罩之一側，其中第一 ^板具有多個預定區，而第―、第二曝光圖案分別位於預 區内斤之後，调整光罩與第一基板之相對位置，並利用 光罩對第一基板進行微影與蝕刻製程，以形成一彩色濾光 陣列基板。接著，提供一主動式陣列基板。最後，貼^彩 色渡光陣列基板與主動式陣列基板，並於其中失置一液晶 材料層。 在本發明之-實施例中，於提供第一基板前或後，更 包括於第一基板上形成一彩色光阻。 8 200839314 95068 21295twf.d〇c/n 在本發明之一實施例中 位置包括下列之步驟：首先 方向移動一第一距離。然後 方向移動一第二距離。 調整光罩與第一基板之相對 使第一基板沿著平行長軸的 使第一基板沿著垂直長轴的The liquid crystal display (TFT-LCD) industry just started in Sakamoto, and Japan designed and built a manufacturing plant (G1). The glass substrate of the first generation is about 30 x 40 cm, which is equivalent to a full-open magazine, which can be made into a 15-inch panel. By 1996, technology had advanced to the 3.5th generation (G3.5), while the size of the glass substrate was approximately 60 x 72 cm. Generation substrate size (mm) 14·1, 15, 17, 19, 26, 32, 37, G3 550 X 700 4 4 2 2 1 0 0 G4 680 X 880 6 6 4 4 2 1 1 G4.5 730 X 920 9 6 6 4 2 1 1 G5 1100 X 1250 16 16 12 9 6 3 2 G6 1500 X 1850 42 30 24 20 12 8 6 Table 1 Table 1 shows the glass substrate dimensions of the third to sixth generation plants, as well as the various manufacturers. The glass substrate can be cut according to the size of the panel. The number of panels can be cut. 200839314 95068 21295twf.doc/n Table 0 It can be seen from Table 1 that the size of the glass substrate of the Sixth Generation Factory has reached 150 cm X 185 cm. Equivalent to a double bed size. Economical cutting of a G6 glass substrate, 30 pieces of 15 inch panels can be cut, and 4 pieces of G3.5 can be cut, and G1 can only be used for 1 piece of 15 pairs of panels. The production capacity of the six generation plants is multiplied. The relative process cost can be reduced and the economic benefits can be increased. In addition, the G6 glass substrate's magic size can also cut large-sized panels, such as 8 32-inch panels, or 6 37-inch panels, greatly improving the diversity of panel applications. In order to meet the user's demand for large-sized panels, the size of the panels is gradually becoming larger, such as 40吋, 42吋, 50吋, and the like. Taking a 40-inch panel as an example, the glass substrate of the crucible 7 has a size of 187 cm and 22 cm, and the G7 & glass substrate is cut into a multi-plate 4 inch panel, and the utilization rate of the glass substrate can reach 92%. In contrast, the glass substrate size of the 7.5-generation plant is 195 cm x 225 cm, but the rate of the glass substrate is only scratched when the glass plate is cut into 40 pieces of the plate. The utilization of shouting boards to cut out more panels is an issue that various manufacturers are actively studying. SUMMARY OF THE INVENTION The object of the invention is to provide a method for fabricating a color filter, in which the utilization ratio of the substrate is increased. Color filter ^. k is a color produced by the above method. The object of the present invention is to provide a method for fabricating a liquid crystal display panel, which can improve the utilization ratio of the glass substrate when the glass substrate is cut by a crucible. SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid crystal display panel in which color filter layers of a color light guide are arranged in a stepped manner. An object of the present invention is to provide a liquid crystal display device in which color filter layers of color filters are arranged in a stepped manner. To achieve the above or other objects, the present invention provides a method of fabricating a color filter 10 comprising the following steps. First, a photomask is provided, wherein the photomask has a long axis, a first exposure pattern and a second exposure pattern, and the first and second exposure patterns respectively have one long side and one short side connected vertically, and the first The short side of an exposure pattern is perpendicular to the major axis, and the short side of the second exposure pattern is parallel to the major axis. Next, a substrate is provided and the substrate is placed on one side of the reticle, wherein the substrate has a plurality of predetermined regions, and the first and second exposure patterns are respectively located in the predetermined regions. Thereafter, the relative position of the reticle and the substrate is adjusted, and the substrate is subjected to a lithography and etching process using a reticle to form a color filter column substrate. Finally, the color filter array substrate is cut to form a plurality of color filters. In an embodiment of the invention, a color photoresist is further formed on the substrate before or after the substrate is provided. In an embodiment of the invention, the adjusting the relative position of the reticle to the substrate comprises the following steps. First, the substrate is moved in the direction parallel to the long axis - the first distance. Then, the substrate is moved by a second distance in the direction of the vertical long axis. In one embodiment of the invention, the first distance is the length of the short side of the second exposure 7 200839314 95068 21295 twf.doc/n pattern, and the second distance is the length of the short side of the first exposure pattern. In an embodiment of the invention, the long side of the first exposure pattern is the same as the length of the long side of the first exposure pattern, and the short side of the first exposure pattern is the same as the short side of the first exposure pattern. . Then, the color light-emitting array substrate is cut to form a plurality of color filters of the same size. In an embodiment of the present invention, the long side of the first exposure pattern is different from the length of the long side of the first exposure pattern, and the short side of the first exposure pattern is different from the length of the short side of the second exposure pattern. . Then, the color filter array substrate is cut to form color filters of two or more sizes. The invention provides a method for fabricating a liquid crystal display panel, which comprises the steps of: firstly, providing a photomask, wherein the photomask has a long axis, an exposure pattern and a second exposure pattern, and the first and second exposures The pattern cutter has one of a long side and a short side vertically connected, and the short side of the first exposure pattern is perpendicular to the long axis, and the short side of the second exposure pattern is parallel to the long axis. Then, a first substrate is provided, and the first substrate is placed on one side of the reticle, wherein the first plate has a plurality of predetermined regions, and the first and second exposure patterns are respectively located after the pre-zone, and the light is adjusted. The cover is opposite to the first substrate, and the first substrate is lithographically and etched by the photomask to form a color filter array substrate. Next, an active array substrate is provided. Finally, the color light-emitting array substrate and the active array substrate are attached, and a liquid crystal material layer is lost therein. In an embodiment of the invention, a color photoresist is formed on the first substrate before or after the first substrate is provided. 8 200839314 95068 21295twf.d〇c/n In one embodiment of the invention the position comprises the step of first moving a first distance in the direction. Then move the direction a second distance. Adjusting the orientation of the reticle to the first substrate such that the first substrate is along a parallel long axis such that the first substrate is along a vertical long axis
短、真ίίΓ月之:實施例中，第-距離為第二曝光圖案之 二广’而第二距離為第—曝光圖案之短邊的長度。 ^發明之—實施例中，上述之第—曝光圖案之長邊 曝光圖案之長邊的長度相同，而第—曝光圖案之短 邊與弟二曝光圖案之短邊的長度相同。 f本發明之-實施例中，更包括切割失置有液晶材料 ^的’衫色濾光相基板與杨式_基板，⑽成尺寸相 同之液晶顯示面板。 在本發明之-實施例中，上述之第一曝光圖案之長邊 與第，曝光圖案之長邊的長度^同，而第—曝光圖案之短 邊與弟一曝光圖案之短邊的長度不同。 在本發明之一實施例中，更包括切割夾置有液晶材料 層之彩色濾光陣列基板與主動式陣列基板，以形成兩種以 上尺寸之液晶頒不面板。 本發明再提出一種彩色濾光片，包括一基板以及一第 一彩色濾光陣列。彩色濾光陣列配置於基板上，且第一彩 色濾光陣列具有一第一彩色濾光層、一第二彩色濾光層以 及一第三彩色濾光層，其中第一、第二及第三彩色濾光層 呈階梯狀排列。 在本發明之一實施例中，上述之第一、第二及第三彩 9 200839314 95068 21295twf.doc/n 色渡光層分別具有垂直相連之·一長邊及一短邊，且第_ 第二彩色濾光層以及第二、第三彩色濾光層的短邊之間維 持一距離，而第一、第三彩色濾光層的短邊之間維持兩倍 的距離。 ° 在本發明之一實施例中，上述之基板的材質為玻璃。 在本發明之一實施例中，上述之第一、第二及第三彩 色濾光層的材質為光阻。 ^ 本發明提出一種液晶顯示面板，包括一主動式陣列其 板、一彩色濾、光陣列基板以及一液晶材料層。彩色濾光陣 列基板配置於主動式陣列基板之一側，其包括一基板與一 第一彩色濾光陣列，其中第一彩色濾光陣列配置於基板 上。第一彩色濾光陣列具有一第一彩色濾光層、一第二彩 色濾光層以及一弟二彩色濾光層，且第一、第二及第二豪 色濾光層呈階梯狀排列。液晶材料層夾置於主動式陣列基 板與彩色濾光陣列基板之間。 1 在本發明之一實施例中，上述之第一、第二及第三彩 色濾、光層分別具有垂直相連之長邊及短邊，且第_、第一 彩色〉慮光層以及弟一、弟二彩色?慮光層之短邊之間維持一 距離，而第一、第三彩色濾光層之短邊之間維持兩倍的距 離。. 。 在本發明之一實施例中，上述之基板的材質為玻璃。 在本發明之一實施例中，上述之第一、第二及第三彩 色濾光層之材質為光阻。 本發明提出一種液晶顯示裝置，其包括一背光模組以 200839314 95068 21295twf.doc/nShort, true, in the embodiment: the first distance is the second wide of the second exposure pattern and the second distance is the length of the short side of the first exposure pattern. In the embodiment, the long side of the first exposure pattern has the same length of the long side, and the short side of the first exposure pattern has the same length as the short side of the second exposure pattern. In the embodiment of the present invention, the method further comprises: cutting the shirt color filter phase substrate with the liquid crystal material ^ and the Yang type substrate, and (10) forming the same size liquid crystal display panel. In the embodiment of the present invention, the length of the long side of the first exposure pattern is the same as the length of the long side of the first exposure pattern, and the short side of the first exposure pattern is different from the length of the short side of the first exposure pattern. . In an embodiment of the invention, the method further comprises cutting the color filter array substrate and the active array substrate sandwiching the liquid crystal material layer to form two or more liquid crystal panels. The invention further provides a color filter comprising a substrate and a first color filter array. The color filter array is disposed on the substrate, and the first color filter array has a first color filter layer, a second color filter layer, and a third color filter layer, wherein the first, second, and third The color filter layers are arranged in a stepped manner. In an embodiment of the present invention, the first, second, and third color 9 200839314 95068 21295 twf.doc/n color light-emitting layers respectively have a vertical side and a short side, and the first side The two color filter layers and the short sides of the second and third color filter layers are maintained at a distance, and the short sides of the first and third color filter layers are maintained at twice the distance. ° In one embodiment of the invention, the substrate is made of glass. In an embodiment of the invention, the materials of the first, second and third color filter layers are photoresist. The present invention provides a liquid crystal display panel comprising an active array of plates, a color filter, a light array substrate, and a layer of liquid crystal material. The color filter array substrate is disposed on one side of the active array substrate, and includes a substrate and a first color filter array, wherein the first color filter array is disposed on the substrate. The first color filter array has a first color filter layer, a second color filter layer and a second color filter layer, and the first, second and second um filter layers are arranged in a stepped manner. The liquid crystal material layer is sandwiched between the active array substrate and the color filter array substrate. In an embodiment of the present invention, the first, second, and third color filter and optical layers respectively have vertical and short sides that are vertically connected, and the first, first color, and light layers and the first one The second color is maintained at a distance between the short sides of the light layer, and the short sides of the first and third color filter layers are maintained at twice the distance. . . . In an embodiment of the invention, the substrate is made of glass. In an embodiment of the invention, the materials of the first, second and third color filter layers are photoresist. The invention provides a liquid crystal display device comprising a backlight module with 200839314 95068 21295twf.doc/n
及一配置於背光模組上的液晶顯示面板。液晶顯示面板包 括一主動式陣列基板、一彩色濾光陣列基板以及一液晶材 料層。衫色濾光陣列基板配置於主動式陣列基板的一側， 其包括一基板與一第一彩色濾光陣列，且一第一彩色濾光 陣列配置於基板上。第—彩色濾絲列具有—第一彩色濃 ，層、:第二彩色濾光層以及一第三彩色濾光層，且第一^ 第二及第三彩色濾光層呈階梯狀排列。液晶材料層失置於 主動式陣列基板與彩色濾光陣列基板之間。 本务明之一實施例中，上述之第一、第二及第三彩 ，濾光層分別具有垂直相連之長邊及短邊，且第一、^二 彩★色濾光層以及第二H色濾光層之短邊之間維持一 =而第—、第三彩色濾光層之短邊之間_兩倍的距 之一實施例中，上述之基板的材質為玻璃。 /施例中，上述之第―、第二及第三彩 巴C光層之材質為光阻。 數量本濾光片的製作方法可以減少使用的光罩 ，里/因此可以減少製程成本。此外，還可 : 板上形成兩種不同 片土 的利用率，Π心柏色，因此可以提升基板 』用：冋時增加基板的應用多元性。 易懂:ΐίϋ之其他目的、特徵和優點能更明顯 如下。下蛛舉—實施例’並配合所_式，作詳細說明 11 200839314 95068 21295twf.doc/n 【實施方式】 圖1A〜1C為本發明之彩色濾光片製作流程的剖面 圖，而圖2為用以製作本發明彩色濾光片之光罩的局部示 意圖。首先請參考圖1Α及圖2，提供一基板100以及一光 罩200，並將基板100置於光罩200下，其中基板1〇〇上 塗佈有一彩色光阻(圖未示），此彩色光阻可以是紅色光阻。 本實施例之基板100具有預定區100a及l〇〇b，而光 罩200具有一長軸210、一第一曝光圖案220以及一第二 曝光圖案230。第一曝光圖案220對應於基板1〇〇的預定 區100a，而第二曝光圖案230對應於基板1〇〇的預定區 100b。第一曝光圖案220具有兩垂直相連的一短邊222以 及一長邊224，而第二曝光圖案230也具有兩垂直相連的 一短邊232以及一長邊234。特別的是，本實施例之第— 曝光圖案220的短邊222垂直長轴210，而第二曝光圖案 230的短邊222則平行長轴210。 ^ 在本實施例中，第一曝光圖案220的短邊222的長度 Y1可與第二曝光圖案230的短邊232的長度X2不同，^ 第一曝光圖案220的長邊224的長度可與第二曝光圖案 230的長邊234的長度不同。 ' 值得注思的是，第一曝光圖案220的短邊222及長邊 224的長度以及第二曝光圖案230的短邊232及長邊234 的長度，是依照欲製作之面板的晝素長寬比及解析度來設 定。所以，第一曝光圖案220的短邊222的長度γι可以 疋與第二曝光圖案230的短邊232的長度X2相同，而第 12 200839314 95068 21295twf‘doc/n -曝光圖案220的長邊的長度亦可以是與第二曝光圖 案230的長邊234的長度相同，而在基板· ±所製作出 來的彩色濾iU的尺核會有所不同，端視使用需求來設 計。 然後，將光罩200與基板100對位，並利用光罩2〇〇 對基板100進行第一次的微影與蝕刻製程，以形成第一彩 色濾、光層112。 圖3為調整基板與光罩之相對位置時，基板與光罩之 相對位移的示意圖。請同時參考圖1B及圖3，先在基板 100上塗佈另-顏色的彩色光阻，此彩色光阻可以是綠色 ，阻。然後，使基板1〇〇沿著平行長軸21〇的方向移動一 第一距_ XI。值得注意的是，此第一距離χι盥二 圖案230之短邊232的長度χ2相同。 曝先 接著，使基板100沿著垂直長轴210的方向移動一第 距離Υ1並藉由光罩200對基板1⑽進行第二次的微影 與蝕刻製程，以形成第二彩色濾光層114。值得注意的是， 基板1〇〇所移動的第二距離Υ2與第一曝光圖案22〇之短 邊222的長度γι相同。 當然，上述先使基板100沿著平行長軸21〇的方向移 動，再使基板100沿著垂直長軸210的方向移動，僅為本 實，例制之用。熟習該項技藝者也可叹先使基板100 /口著垂直長軸210的方向移動，再使基板1〇〇沿著平行長 軸2U)的方向移動。更甚者，亦可以先計算出基板觸^ 本所在的位置與下—條㈣直線_，然後令基板1〇〇 13 200839314 95068 21295twf.doc/n 斜向移動。 之後請參考圖1C及圖3，重複上述之步驟， 100上塗佈料恤，轉色光阻可以是藍色光阻，ς後 =，牙反⑽與光罩200之相對位置。接著，藉由光罩测 對基板議進行第三次的微影與侧製程， 色濾光層116。 乐一 +And a liquid crystal display panel disposed on the backlight module. The liquid crystal display panel includes an active array substrate, a color filter array substrate, and a liquid crystal material layer. The shirt color filter array substrate is disposed on one side of the active array substrate, and includes a substrate and a first color filter array, and a first color filter array is disposed on the substrate. The first color filter array has a first color rich layer, a second color filter layer and a third color filter layer, and the first second and third color filter layers are arranged in a stepped manner. The liquid crystal material layer is lost between the active array substrate and the color filter array substrate. In one embodiment of the present invention, the first, second, and third colors, the filter layers respectively have vertically connected short sides and short sides, and the first, the second color, the color filter layer, and the second H One of the short sides of the color filter layer is maintained between one and the short sides of the first and third color filter layers are _ twice the distance. In the embodiment, the substrate is made of glass. / In the example, the material of the first, second and third color C light layers is a photoresist. The method of making the number of filters can reduce the use of the reticle, so that the process cost can be reduced. In addition, it can also be used to form two different kinds of soil on the board, which can be used to enhance the substrate. Easy to understand: Other purposes, features and advantages of ΐίϋ can be more obvious as follows. The following is a detailed description of the color filter manufacturing process of the present invention, and FIG. 1 is a cross-sectional view of the color filter manufacturing process of the present invention, and FIG. 1A to FIG. 1C are sectional views of the color filter manufacturing process of the present invention. A partial schematic view of a reticle used to make the color filter of the present invention. Referring first to FIG. 1 and FIG. 2, a substrate 100 and a mask 200 are provided, and the substrate 100 is placed under the mask 200. The substrate 1 is coated with a color photoresist (not shown). The photoresist can be a red photoresist. The substrate 100 of the present embodiment has predetermined regions 100a and 10b, and the mask 200 has a long axis 210, a first exposure pattern 220, and a second exposure pattern 230. The first exposure pattern 220 corresponds to a predetermined area 100a of the substrate 1〇〇, and the second exposure pattern 230 corresponds to a predetermined area 100b of the substrate 1〇〇. The first exposure pattern 220 has two short sides 222 and a long side 224 which are vertically connected, and the second exposure pattern 230 also has two short sides 232 and a long side 234 which are vertically connected. In particular, the short side 222 of the first exposure pattern 220 of the present embodiment is perpendicular to the long axis 210, and the short side 222 of the second exposure pattern 230 is parallel to the long axis 210. In this embodiment, the length Y1 of the short side 222 of the first exposure pattern 220 may be different from the length X2 of the short side 232 of the second exposure pattern 230, and the length of the long side 224 of the first exposure pattern 220 may be the same as The lengths of the long sides 234 of the two exposure patterns 230 are different. It is worth noting that the length of the short side 222 and the long side 224 of the first exposure pattern 220 and the length of the short side 232 and the long side 234 of the second exposure pattern 230 are in accordance with the length and width of the panel to be fabricated. Set by comparison and resolution. Therefore, the length γι of the short side 222 of the first exposure pattern 220 may be the same as the length X2 of the short side 232 of the second exposure pattern 230, and the length of the long side of the 12th 200839314 95068 21295twf'doc/n-exposure pattern 220 The length of the long side 234 of the second exposure pattern 230 may be the same, and the nucleus of the color filter iU produced on the substrate may be different depending on the use requirements. Then, the reticle 200 is aligned with the substrate 100, and the first lithography and etching process is performed on the substrate 100 by using the reticle 2 , to form the first color filter and the optical layer 112. Fig. 3 is a schematic view showing the relative displacement of the substrate and the reticle when the relative position of the substrate and the reticle is adjusted. Referring to FIG. 1B and FIG. 3 simultaneously, another color-colored photoresist is coated on the substrate 100, and the color photoresist may be green and resist. Then, the substrate 1 is moved by a first distance _ XI in the direction parallel to the long axis 21 。. It should be noted that the length χ2 of the short side 232 of the first distance χι盥2 pattern 230 is the same. First, the substrate 100 is moved along the vertical long axis 210 by a first distance Υ1 and the substrate 1 (10) is subjected to a second lithography and etching process by the reticle 200 to form the second color filter layer 114. It is to be noted that the second distance Υ2 of the substrate 1〇〇 is the same as the length γι of the short side 222 of the first exposure pattern 22〇. Of course, the above-described substrate 100 is first moved in the direction parallel to the major axis 21〇, and the substrate 100 is moved in the direction of the vertical long axis 210, which is only practical and exemplary. Those skilled in the art can also move the substrate 100/port in the direction of the vertical long axis 210 and move the substrate 1〇〇 in the direction of the parallel long axis 2U). What's more, you can also calculate the position of the substrate touch and the line of the bottom (4), and then move the substrate 1〇〇 13 200839314 95068 21295twf.doc/n diagonally. Then, referring to FIG. 1C and FIG. 3, the above steps are repeated. The 100-coated t-shirt can be a blue photoresist, and the relative position of the tooth (10) and the mask 200. Next, the third pass lithography and side process, color filter layer 116 is performed by the reticle. Le Yi +
圖4Α為利用圖1Α〜圖lc之步驟所形成之彩色濾光 陣列基板的上視圖，而目4 B及4 c分別為預定區内彩色滤 光陣列的局部示意圖。請同時參考圖4A、4B及4c，在重 複圖iA〜1C之步驟後，第一、第二及第三彩色渡光層 112、114及116會在基板100上的預定區1〇〇&形成彩色 渡光陣列12Ga’而在預定區腿_絲色濾光陣列 120b，而基板1〇〇與彩色濾光陣列12〇a、12%形成彩色濾 光陣列基板300。之後，切割彩色濾光陣列基板3〇〇，以形 成多片彩色濾光片350或彩色濾光片35〇、35〇,。 特別的是，在形成一彩色濾光層的步驟中，基板1〇〇 會同時具有垂直於長軸210以及平行於長軸21〇的移動， 以調整光罩200與基板1〇〇之相對位置時。此外，由於本 實施例光罩200之第一曝光圖案220的短邊222平行長軸 210 ’第二曝光圖案230的短邊232垂直長軸210，而基板 1〇〇垂直於長軸210的移動距離Y2為第一曝光圖案220 之短邊222的長度，且基板1〇〇平行於長軸210的移動距 離X2為第二曝光圖案220之短邊232的長度。因此，預 定區100a内的彩色濾光陣列120a及預定區l〇〇b内的彩色 14 200839314 95068 21295twf.doc/n 濾光陣列120b的排列方向不同，可為互相垂直，如圖4B 及4C示。 另外，由於本實施例之第一曝光圖案220的短邊222 的長度Y1與第二曝光圖案230的短邊X2不同，而第一曝 光圖案220的長邊224的長度與第二曝光圖案230的長邊 234的長度不同。因此由圖4A可知，彩色濾光陣列基板 300可以被切割成兩種不同尺寸的彩色濾光片350及350,。 當然，第一曝光圖案220的短邊222的長度Y1可與 第二曝光圖案230的短邊232的長度X2相同，而第一曝 光圖案220的長邊224的長度可與第二曝光圖案230的長 邊234的長度相同，因此切割彩色濾光陣列基板300之後 所得到的是相同尺寸的彩色濾光片350。 由上述可知，我們可以利用光罩200的第一曝光圖案 220以及第二曝光圖案230，以在同一片基板1〇〇上，同時 製作大尺寸的彩色濾光片及小尺寸的彩色濾光片。如此一 來，便可以提升基板的利用率。 請繼續參考圖4B，由上述可知，在彩色濾光片350 或350’中，位於彩色濾光陣列120a及120b最外圍之第一、 第二及第三彩色濾光層112、114及116是呈階梯狀排列， 與習知彩色濾光片之彩色濾光層的排列形狀亦有明顯地不 同。 最後，提供一主動式陣列基板(圖未示），並將利用上 述之方法以形成的彩色濾光片350或350,與主動式陣列基 板貼合，且在彩色濾光片350或350’與主動式陣列基板之 15 200839314 95068 21295tw£doc/n 間夾置一液晶材料層，以形成一液晶顯示面板。本技術領 域具通常知識者，可將本發明之彩色濾光片使用於一般公 開文件所舉例之液晶顯示面板中，因此本說明書中僅簡單 說明，不再贅述。 接著，我們更可以將上述之液晶顯示面板組立至一背 光模組，以形成一液晶顯示裝置。同樣地，本技術領域具 通常知識者，可由一般公開文件知悉背光模組的結構及背 光模組與液晶顯示面板的組立方法，因此不再詳述，也不 另以圖示說明。 綜上所述，在本發明之彩色濾光片、使用此彩色濾光 片之液晶顯示面板及液晶顯示器及彩色濾光片的製造方法 中，僅需利用一光罩便能於一基板上製作出兩種尺寸的彩 色濾光片，或是擺放方向相互垂直之彩色濾光片，因此本 發明之彩色濾光片及其製造方法至少具有下列之優點： 一、減少光罩的使用數目，進而節省成本。 一、提升基板的利用率。 三、增加基板的應用多元性。 雖然本發明已以一實施例揭露如上，然其並非用以限 定本發明，任何所屬技術領域中具有通常知識者，在不脫 離本發明之精神和範圍内，當可作些許之更動與潤飾，因 此本發明之保護範圍當視後附之申請專利範圍所界定者為 準。 ”'、 【圖式簡單說明】 16 200839314 95068 21295twf.doc/n4A is a top view of the color filter array substrate formed by the steps of FIGS. 1A to 1c, and the objects 4B and 4c are partial schematic views of the color filter array in the predetermined region, respectively. 4A, 4B, and 4c, after repeating the steps of FIGS. iA to 1C, the first, second, and third color light-emitting layers 112, 114, and 116 may be in a predetermined area on the substrate 100. The color light-emitting array 12Ga' is formed to form the color filter array substrate 300 in the predetermined region leg-filament filter array 120b, and the substrate 1 and the color filter arrays 12a, 12%. Thereafter, the color filter array substrate 3 is cut to form a plurality of color filters 350 or color filters 35A, 35A. In particular, in the step of forming a color filter layer, the substrate 1 同时 has a movement perpendicular to the long axis 210 and parallel to the long axis 21 , to adjust the relative position of the reticle 200 and the substrate 1 〇〇 Time. In addition, since the short side 222 of the first exposure pattern 220 of the reticle 200 of the present embodiment is parallel to the long axis 210 ′, the short side 232 of the second exposure pattern 230 is perpendicular to the long axis 210, and the substrate 1 〇〇 is perpendicular to the movement of the long axis 210. The distance Y2 is the length of the short side 222 of the first exposure pattern 220, and the moving distance X2 of the substrate 1 〇〇 parallel to the long axis 210 is the length of the short side 232 of the second exposure pattern 220. Therefore, the color filter array 120a in the predetermined area 100a and the color 14 200839314 95068 21295twf.doc/n filter array 120b in the predetermined area 100b are arranged in different directions, which may be perpendicular to each other, as shown in FIGS. 4B and 4C. . In addition, since the length Y1 of the short side 222 of the first exposure pattern 220 of the embodiment is different from the short side X2 of the second exposure pattern 230, the length of the long side 224 of the first exposure pattern 220 is different from that of the second exposure pattern 230. The length of the long side 234 is different. Therefore, as can be seen from FIG. 4A, the color filter array substrate 300 can be cut into two different sizes of color filters 350 and 350. Of course, the length Y1 of the short side 222 of the first exposure pattern 220 may be the same as the length X2 of the short side 232 of the second exposure pattern 230, and the length of the long side 224 of the first exposure pattern 220 may be the same as the length of the second exposure pattern 230. The long sides 234 have the same length, so that after the color filter array substrate 300 is cut, the color filters 350 of the same size are obtained. As can be seen from the above, we can use the first exposure pattern 220 and the second exposure pattern 230 of the reticle 200 to simultaneously produce a large-sized color filter and a small-sized color filter on the same substrate 1 〇〇. . In this way, the utilization of the substrate can be improved. Referring to FIG. 4B, it can be seen from the above that in the color filter 350 or 350', the first, second and third color filter layers 112, 114 and 116 located at the outermost periphery of the color filter arrays 120a and 120b are Arranged in a stepped manner, the arrangement of the color filter layers of the conventional color filter is also significantly different. Finally, an active array substrate (not shown) is provided, and the color filter 350 or 350 formed by the above method is bonded to the active array substrate, and the color filter 350 or 350' is A layer of liquid crystal material is interposed between the active array substrate 15 and the liquid crystal display panel. Those skilled in the art can use the color filter of the present invention in the liquid crystal display panel exemplified in the general public document, and therefore, the description is only briefly described and will not be described again. Then, the liquid crystal display panel can be assembled to a backlight module to form a liquid crystal display device. Similarly, those skilled in the art can understand the structure of the backlight module and the method of assembling the backlight module and the liquid crystal display panel from the general disclosure, and therefore will not be described in detail or illustrated. In summary, in the color filter of the present invention, the liquid crystal display panel using the color filter, and the manufacturing method of the liquid crystal display and the color filter, only a photomask can be used to fabricate on a substrate. The color filter of two sizes or the color filter perpendicular to each other is disposed. Therefore, the color filter of the present invention and the manufacturing method thereof have at least the following advantages: 1. Reduce the number of use of the mask, In turn, it saves costs. First, improve the utilization rate of the substrate. Third, increase the application diversity of the substrate. Although the present invention has been disclosed in an embodiment of the present invention, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. "', [Simple description of the diagram] 16 200839314 95068 21295twf.doc/n
圖1A〜1C為本發明之彩色濾光片製作流程的剖 圖2為肋製作本發卿色航#之光罩的局部示 面 意 相對板舆光罩之相對位置時’基板舆光罩之1A to 1C are cross-sectional views showing the process of fabricating the color filter of the present invention. FIG. 2 is a partial view of the reticle of the ribs of the present invention, when the relative position of the reticle is opposite to that of the reticle reticle.
圖4Α為利用圖ία〜圖ic 陣列基板的上視圖。 之步驟所形成之彩色濾光 圖4Β及4C分別為預定區内彩色濾光陣列的局部示咅 【主要元件符號說明】 100 ·基板Figure 4 is a top view of the substrate using the Figure ία to Figure ic array. The color filter formed by the steps of FIG. 4 and FIG. 4C are respectively partial representations of the color filter array in the predetermined area. [Main component symbol description] 100 · Substrate
100a、100b :預定區 112 :第一彩色濾光層 114 :第二彩色濾光層 116 :第三彩色濾光層 200 :光罩 210 :長軸 220 :第一曝光圖案 222、232 :短邊 224、234 :長邊 230 :第二曝光圖案 350、350’ ：彩色濾光片 17100a, 100b: predetermined area 112: first color filter layer 114: second color filter layer 116: third color filter layer 200: reticle 210: long axis 220: first exposure pattern 222, 232: short side 224, 234: long side 230: second exposure pattern 350, 350': color filter 17