JP5376393B2 - Color filter manufacturing method, photomask set - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter that includes a structure for forming photospacers of different heights and reducing the number of required photomasks, without having to install a dedicated process for forming the photomasks. <P>SOLUTION: This color filter 1 includes a substrate 4, filters 6-8 arranged so as to correspond to respective colors of RGB, and photospacers 11-16 for regulating interval between the substrate 4 and an opposite member 9. The photospacer 11 is constituted, by stacking a colored layer made of the same material as the filter 6 and a colored layer made of the same material as the filter 8. Each of the photospacers 12-16 is constituted by only a single colored layer, made of the same material as one of the filters 6-8. By changing the number of colored layers, the photospacer 11, and the photospacers 12-16 that are smaller in height than it are formed. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

  The present invention relates to a color filter for a liquid crystal display device, a method for manufacturing the same, and a photomask set used for manufacturing the color filter.

  A liquid crystal panel used for a color liquid crystal display device is mainly composed of a color filter, a substrate disposed opposite to the color filter, and liquid crystal molecules sealed therebetween.

  The color filter is configured by providing a lattice-like black matrix and color patterns corresponding to three colors of red, green, and blue on a substrate such as glass. In addition, a plurality of photo spacers having a predetermined height are arranged on the substrate of the color filter in order to regulate the distance from the opposing substrate (see, for example, Patent Documents 1 to 3).

The color pattern constituting the color filter is formed by a photolithography method in which a photosensitive material is applied on a substrate, and patterning is performed by exposure using a photomask and subsequent development processing. Similarly, the photo spacer is formed by a photolithography method using a photosensitive material for forming a photo spacer and a photo mask.
JP 2005-91853 A JP 2008-20732 A JP 7-318950 A JP-A-10-123534

  In recent years, as a liquid crystal display device has been increased in size and definition, a photomask for manufacturing a color filter is also required to have a larger size and higher accuracy. Since the photomask is manufactured using an ultra-fine processing technique, the photomask used for manufacturing a color filter for a large and high-definition liquid crystal display device is very expensive.

  In general, when three color patterns of red, green, and blue are formed on a color filter substrate, a process including application of a photosensitive material, exposure using a photomask, development, and baking is performed for each color. Do. Therefore, a general color filter manufacturing method requires at least three types of photomasks having an opening pattern corresponding to the pixel arrangement of each color. In addition to this, if you prepare a spare photomask for each color of red, green, and blue in preparation for damage to the photomask or cleaning of the photomask, you actually need six photomasks. The cost required for the photomask becomes extremely high. In particular, when a separate process using a photomask for forming a photospacer is provided in addition to a photomask for forming a color pattern, the cost is further increased.

  In addition, the photo spacer disposed between the pair of substrates is for defining a gap in which liquid crystal molecules are enclosed, but in order to disperse the load applied to the substrate and prevent plastic deformation and destruction of the substrate, It is preferable that a plurality of types of photo spacers having different heights are dispersed and arranged on the substrate.

  The present invention has been made in order to solve the above-described problems. Photo spacers having different heights can be formed without providing a dedicated process for forming a photo mask, and necessary photo can be formed. It is an object of the present invention to provide a color filter manufacturing method and a photomask that can reduce the number of masks.

  The method for manufacturing a color filter according to the present invention includes: a first to a third filter corresponding to pixels of first to third colors; and first and second spacers having different heights on a substrate. It is for manufacturing the color filter for liquid crystal display devices which has at least.

  The manufacturing method according to the present invention includes a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array in an arbitrary order. Patterning a first color filter-forming material on a substrate using the photomask, and forming a first filter and a first colored layer constituting a part of the first spacer; The second color filter forming material is patterned on the substrate using a photomask having the same opening pattern as that of the first photomask, and at least part of the second filter and the second spacer are formed. Forming a second colored layer, a plurality of third openings corresponding to the third filter arrangement, and a plurality of fourth openings corresponding to the first spacer arrangement. Use photomask 2 And patterning a third color filter forming material on the substrate to form a third filter and a third colored layer constituting a part of the first spacer. good. In this case, the first colored layer and the third colored layer are formed so as to overlap each other.

  Alternatively, the manufacturing method according to the present invention uses the first photomask having a plurality of first openings corresponding to the arrangement of the first filters in any order, and the first color filter on the substrate. Patterning the forming material to form the first filter and patterning the second color filter forming material on the substrate using a photomask having the same opening pattern as the first photomask Forming a second filter, a plurality of second openings corresponding to the arrangement of the third filters, a plurality of third openings corresponding to the arrangement of the first spacers, Using a second photomask having a fourth opening corresponding to the arrangement, a third color filter forming material is patterned on the substrate, and a third filter, a first spacer, The It may comprise a step of forming a Sa. In this case, at least one of the light transmittance, the opening shape, and the opening area is different between the third opening and the fourth opening.

  The photomask set according to the present invention is used for manufacturing the above-described color filter, and corresponds to the plurality of first openings corresponding to the first filter array and the first spacer array. A first photomask having a plurality of second openings, a plurality of third openings corresponding to the third filter array, and a plurality of fourth openings corresponding to the first spacer array. A second photomask.

  Alternatively, the photomask set according to the present invention includes a first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the third filter array. And a second photomask having a plurality of third openings corresponding to the first spacer arrangement and a fourth opening corresponding to the second spacer arrangement. In this case, at least one of the light transmittance, the opening shape, and the opening area is different between the third opening and the fourth opening.

  According to the present invention, it is possible to make a plurality of photo spacers having different heights by using the same material as the filter while making one opening pattern common to the formation of two-color filters. Cost can be reduced.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following, for ease of explanation, an example will be described in which the color filter is composed of three primary color patterns of red (R), green (G), and blue (B).

(First embodiment)
FIG. 1 is a plan view showing a part of a color filter according to a first embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1, and FIG. It is sectional drawing along the III-III line of 1. FIG.

  The color filter 1 includes a substrate 4 such as glass, a black matrix 5 (a portion with a right-up hatching), and filters 6 to 6 corresponding to pixels of first to third colors (red, green, and blue), respectively. 8 and photospacers 11-16. The color filter 1 according to the present embodiment includes, as a structural unit, a portion including six filters 6 to 8 that are continuous in the row direction and photo spacers 11 to 16 that are disposed adjacent to these pixels. It is composed of repetition.

  The black matrix 5 is formed in a lattice shape on the substrate 4 using a material containing a black pigment or the like, and partitions pixel formation regions. The black matrix 5 is provided in order to prevent light leakage from a backlight (not shown) and color mixing, and is formed by a photolithography method.

  The filters 6 to 8 are made of a material containing pigments of the respective colors, and each pixel region (that is, an opening portion of the black matrix 5) on the substrate 4 partitioned by the black matrix 5 and the black matrix 5 surrounding the pixel region. It is formed so as to cover a part of. The filters 6 to 8 have the same shape, and are two-dimensionally arranged on the substrate 4 in the row direction (left-right direction in FIG. 1) and the column direction (up-down direction in FIG. 1) with predetermined intervals. Yes. In the example of FIG. 1, the filters 6, 7, and 8 correspond to R, G, and B colors, respectively, and are repeatedly arranged in the order of RGB toward the right in FIG. 1.

  The photo spacers 11 to 16 are disposed on the surface of the black matrix 5 in order to regulate the distance between the substrate 4 of the color filter 1 and the facing member 9 disposed to face the substrate 4. In the present embodiment, the photo spacers 11 to 16 are aligned in a straight line along the pixel column with a predetermined interval (a pitch corresponding to one pixel) between adjacent pixel rows. The counter member 9 corresponds to a substrate (for example, a TFT side substrate) that constitutes a liquid crystal cell together with the substrate 4, and a liquid crystal panel is assembled in the space between the substrate 4 and the counter member 9 in the assembly process of the liquid crystal panel. The molecule is encapsulated.

  The photospacer 11 is composed of a colored layer 121 formed on the surface of the black matrix 5 using the same material as the filter 6 and a colored layer 123 formed on the colored layer 121 and formed of the same material as the filter 8. Has been.

  On the other hand, the photospacers 12 to 16 are composed of only one colored layer formed of the same material as any of the filters 6 to 8. For example, the photo spacer 12 is composed of a colored layer 122 formed on the surface of the black matrix 5 using the same material as the filter 7, and the photo spacer 13 is formed of the same material as that of the filter 8. It is comprised by the colored layer 124 formed in the surface. Similarly, the photospacers 14, 15 and 16 are constituted by colored layers 125, 126 and 127, respectively.

  As shown in FIG. 3, the upper end level of the photo spacers 12 to 16 is set to be lower than the upper end level of the photo spacer 11. With this configuration, when pressure is applied to the panel, the substrate 4 and the opposing member 9 are allowed to bend according to the difference in height between the photo spacer 11 and the photo spacers 12 to 16, and the substrate 4 It is possible to prevent deformation and destruction of the opposing member 9. More specifically, in the color filter 1 according to the present embodiment, the height is changed by changing the number of the colored layers constituting the photo spacer 11 and the number of the colored layers constituting each of the photo spacers 12 to 16. The difference is set.

  In the following description, the photo spacer 11 provided to define the maximum value of the distance between the substrate 4 and the opposing member 9 is referred to as “main PS”, which is lower in height than the main PS and causes plastic deformation of the panel. The allowed photo spacers 12 to 16 are referred to as “sub-PS”.

  1 and 3 show a state in which the upper end of the main PS 11 and the opposing member 9 are in contact with each other, but cover the surfaces of the black matrix 5, the filters 6 to 7, the main PS 11 and the sub PSs 12 to 16. In some cases, a transparent thin film, a protective film or the like formed on the substrate is further formed.

  Hereinafter, a method for manufacturing the color filter 1 according to the present embodiment will be described.

  FIG. 4 is a plan view showing a part of the photomask set used for manufacturing the color filter shown in FIG. 1, and the openings formed in the photomask and each part of the color filter 1 shown in FIG. It is shown correspondingly.

  In FIG. 4, a hatched area with a lower right portion represents a portion where light is not transmitted during exposure of the photosensitive material. White areas (111 to 117) indicated by solid lines represent openings that can transmit at least part of light having a predetermined wavelength used during exposure, and symbols R, G, B, PS11 to PS16 represent filters or photo spacers formed at positions corresponding to the respective openings. A broken line represents a formation position of a portion of the color filter that does not correspond to the opening formed in the photomask.

  In FIG. 4, only a part of each photomask is shown for the sake of illustration, but actually, along the structural units of the color filter, that is, six pixels continuous in the row direction and these pixels. Each photomask is constituted by a repeated pattern of regions corresponding to the six photospacers to be aligned.

  In the manufacturing method according to the present embodiment, in order to pattern the three color filter forming materials, photomasks 141a and 141b having the same opening pattern, and a photomask 142 having an opening pattern different from the photomask 141a, A photomask set comprising a combination of the above is used.

  As shown in FIG. 4A, the photomask 141a includes openings 111 corresponding to the arrangement of the first color (for example, red) filter 6, openings 112 corresponding to the main PS11, and openings corresponding to the sub-PS14. 116. Here, the “opening corresponding to the arrangement of the nth color filter” has the same or similar planar shape as the formed filter, and the same positional relationship as the relative positional relationship of the nth color filter arrangement The openings are arranged so that The “opening corresponding to the main PS (sub PS)” has the same or similar planar shape as any of the colored layers constituting the main PS (sub PS), and when forming the nth color filter, It means an opening arranged so that an image of the opening overlaps at least a part of a main PS (sub-PS) formation region.

  The openings 111, 112 and 116 are arranged so as to have the same positional relationship as the relative positional relationship of the filter 6, the main PS 11 and the sub-PS 14. Therefore, when the opening 111 is made to correspond to the formation region of the filter 6, the image of the opening 111 overlaps with the formation region of the main PS 11, and the image of the opening 116 overlaps with the formation region of the sub PS 14.

  The openings 111, 112, and 116 formed in the photomask 141a are arranged so as to have the same positional relationship as the relative positional relationship of the filter 7, the sub PS12, and the sub PS15 in FIG. Therefore, as shown in FIG. 4B, when the opening 111 is made to correspond to the formation region of the filter 7 of the second color (for example, green), the image of the opening 112 overlaps with the formation region of the sub PS 12, and The image of the opening 116 overlaps with the formation region of the sub PS 15.

  On the other hand, the photomask 142 corresponds to the openings 113 corresponding to the arrangement of the filters 8 of the third color (for example, blue), the openings 114 corresponding to the main PS11, the openings 115 corresponding to the sub PS13, and the sub PS16. And an opening 117. The openings 113, 114, 115 and 117 are arranged so as to have the same positional relationship as the relative positional relationship of the filter 8, the main PS 11, and the sub PSs 13 and 16. In the present embodiment, the opening 114 is similar to the opening 112, and the area of the opening 114 is set to be smaller than the area of the opening 112. Therefore, as shown in FIG. 4C, when the opening 114 is made to correspond to the formation region of the filter 8, the image of the opening 114 overlaps with the central portion of the formation region of the main PS11, and the image of the opening 115 is the sub PS13. It overlaps with the formation region, and further, the image of the opening 117 overlaps with the formation region of the sub PS 16.

  In the present embodiment, the main PS 11 and the sub PSs 12 and 13 correspond to first, second, and third photo spacers, respectively. In addition, the openings 111, 112, 113, 114, and 115 correspond to the first, second, third, fourth, and fifth openings, respectively. Further, the colored layers 121, 122, 123, and 124 correspond to the first, second, third, and fourth colored layers, respectively.

  FIG. 5 is a process chart schematically showing the manufacturing process of the color filter according to the first embodiment of the present invention. The left column in FIG. 5 corresponds to the cross section of the pixel portion shown in FIG. 2, and the right column corresponds to the cross section of the photospacer portion shown in FIG. In FIG. 5, for ease of explanation, each part of the formed color filter and the photomask are shown in a one-to-one dimensional ratio.

  First, as shown in FIG. 5A, a first color (for example, red) filter forming material is patterned on the substrate 4 using a photomask 141a (FIG. 4A), and the color filter 6 And a colored layer 121 that constitutes a part of the main PS 11.

  More specifically, a color resist of the first color is applied on the substrate 4 having the black matrix 5 formed on the surface, and the color resist is dried. Subsequently, the photomask 141a is disposed so as to face the substrate 4, and the openings 111 and 112 are made to correspond to the positions where the filter 6 and the main PS 11 are formed, respectively. When a part of the color resist corresponding to the image of each opening is exposed by irradiating light of a predetermined wavelength and then the color resist remaining on the substrate 4 is cured by performing development processing and baking, the substrate 4 The filter 6 and the colored layer 121 are formed on the top. In addition, since the opening 116 is formed in the photomask 141a according to this embodiment, the colored layer 125 that becomes the sub-PS 14 is formed at the position corresponding to the opening 116 simultaneously with the color filter 6 and the colored layer 121. .

  Next, as shown in FIG. 5B, a second color (for example, green) is formed on the substrate 4 using a photomask 141b (FIG. 4B) having the same opening pattern as the photomask 141a. The filter forming material is patterned to form the filter 7 and the colored layer 122 constituting the sub-PS 12.

  More specifically, a second color resist is applied to the substrate 4 on which the filter 6 is formed, and the color resist is dried. Subsequently, the photomask 141 b is disposed so as to face the substrate 4, and the opening 111 is made to correspond to the formation position of the filter 7. When a part of the color resist corresponding to the image of each opening is exposed and then developed and baked to cure the second color resist remaining on the substrate 4, the colored layer 122 is simultaneously formed with the filter 7. Is formed at a position corresponding to the opening 112. Further, a colored layer 126 serving as the sub PS 15 is formed at a position corresponding to the opening 116.

  Next, as shown in FIG. 5C, a third color (for example, blue) filter forming material is patterned on the substrate 4 using the photomask 142 (FIG. 4C), and the filter 8 And a colored layer 123 that constitutes a part of the main PS 11.

  More specifically, a third color resist is applied on the substrate 4 on which the filter 7 is formed, and the color resist is dried. Subsequently, the photomask 142 is disposed so as to face the substrate, and the openings 113 and 114 are made to correspond to the positions where the filter 8 and the main PS 11 are formed, respectively. When a part of the color resist corresponding to the image of each opening is exposed and then developed and baked to cure the third color resist remaining on the substrate 4, the colored layer 123 is simultaneously formed with the filter 8. Is formed at a position corresponding to the opening 114. As shown in FIG. 5A, since the colored layer 121 is already formed of the same material as the filter 6 at the formation position of the main PS 11, the colored layer 123 is laminated on the upper surface of the colored layer 121. A main PS11 is formed. In addition, since the openings 115 and 117 are formed in the photomask 142 according to this embodiment, the color layer 124 serving as the sub PS 13 is formed at the position corresponding to the opening 115 simultaneously with the color filter 8 and the color layer 123. Then, a colored layer 127 to be the sub PS 16 is formed at a position corresponding to the opening 117.

  The color filter 1 is manufactured through the above steps. When the size of the filter area formed by the photomask is smaller than the screen size of the color filter 1, the exposure process is repeatedly performed while moving the photomask in each step.

  In the present embodiment, the photomasks 141a and 141b having the same opening pattern are used to form the first color filter 6 and the second color filter 7, and the photomask has an opening pattern different from that of the photomask 141a. 142 is used to form the third color filter 8. The photomasks 141a and 142 are provided with openings 112 and 114 for forming an image that overlaps with the formation region of the main PS 11 in each use. Therefore, regardless of the order in which the photomasks 141a and 142 are used, the two colored layers 121 and 123 are formed on the main PS 11 formation region.

  On the other hand, when the filter 7 is formed, the photomask 141b having the same opening pattern as that of the photomask 141a is moved from the position of the first photomask 141a when the filter 6 is formed to (3k-2) pixels (k is Arranged at a position shifted by a distance corresponding to (any integer). As a result, the opening 112 of the photomask 141b forms an image at the formation position of the sub-PS 12, which is separated from the formation position of the main PS 11 by (3k-2) pixels. On the other hand, since the photomask 142 is not provided with an opening for forming an image that overlaps with the formation region of the sub-PS 12 when used, the sub-PS 12 has the colored layer 122 corresponding to the image of the opening 112 of the photomask 141b. Consists of only.

  By setting the formation positions of the openings 112 and 114 in this way, it is possible to form the main PS 11 and the sub PS 12 having different heights depending on the number of layers.

  As described above, in the color filter manufacturing method according to the present embodiment, the photomasks 141a and 141b having the same opening pattern are used to form the two-color filters 6 and 7, so that they are prepared when the color filter is manufactured. The spare photomasks to be shared can be made common, and the total number of necessary photomasks can be reduced.

  Specifically, as shown in FIG. 5, when three photomasks 141a, 141b, and 142 are used in the formation process of the filters 6, 7, and 8, one photomask 141a and 141b is used. Since it is only necessary to prepare a spare photomask and one spare photomask for the photomask 142, a total of five photomasks are required. On the other hand, when three types of photomasks having different patterns are used for forming the filters 6 to 8 as in the prior art, it is necessary to prepare one spare photomask for each of the photomasks. In total, six photomasks are required. Therefore, according to the manufacturing method according to the present embodiment, at least one photomask can be reduced as compared with the conventional manufacturing method, and the manufacturing cost of the color filter can be reduced.

  Further, in the manufacturing method according to the present embodiment, the photo spacers 11 to 16 can be configured by the colored layers 121 to 127 formed in the same process as the filters 6 to 8, and therefore, a dedicated process for forming the photo spacer is also included. It is unnecessary. In addition, the number and position of the colored layers formed on the surface of the black matrix 5 are appropriately combined by appropriately combining the number and position of the openings formed in the photomask 141a and the number and positions of the openings formed in the photomask 142. You can change the number. Therefore, according to the manufacturing method according to the present embodiment, the photo spacer 141 having various layers and heights using the same material as the filters 6 to 8 while using the same opening pattern of the photo mask 141a in two colors. ˜16 can be formed.

  In this embodiment, the openings 115 to 117 are provided in the photomask set in order to form the sub-PSs 13 to 16. However, an opening pattern without these openings 115 to 117 may be used. If at least the openings 112 and 114 are provided in the photomask set, it is possible to form the main PS 11 and the sub PS 12 having different heights.

(Second Embodiment)
6 is a plan view showing a part of the color filter according to the second embodiment of the present invention, FIG. 7 is a cross-sectional view taken along line VII-VII in FIG. 6 , and FIG. 6 is a sectional view taken along the VIII-VIII line.

  The color filter 2 according to the present embodiment regulates the distance between the substrate 4, the black matrix 5 formed on the substrate 4, the filters 6 to 8 arranged on the matrix, and the substrate 4 and the facing member 9. Photo spacers 21 to 23 are provided. The color filter 2 according to the present embodiment includes, as a structural unit, a portion including three filters 6 to 8 that are continuous in the row direction and photo spacers 21 to 23 that are disposed adjacent to these pixels. It is composed of repetition. Note that the substrate 4, the black matrix 5, and the filters 6 to 8 are the same as those described in the first embodiment, and thus repeated description thereof will be omitted.

  Similar to the first embodiment, the photo spacers (PS) 21 to 23 are arranged on the surface of the black matrix 5 along the pixel columns in order to regulate the distance between the substrate 4 and the facing member 9. . However, in the first embodiment, the main PS 11 composed of two colored layers and the sub-PSs 12 to 16 composed of one colored layer are provided. In the present embodiment, three layers of colored layers are colored. A main PS21 composed of layers, a sub-PS22 composed of two colored layers, and a sub-PS23 composed of one colored layer are provided.

  More specifically, the main PS 21 is made of the same material as the filter 6, and a colored layer 221 formed on the surface of the black matrix 5 and a colored layer made of the same material as the filter 7 and laminated on the upper surface of the colored layer 221. 224 and a colored layer 223 made of the same material as the filter 8 and laminated on the upper surface of the colored layer 224.

  The sub PS 22 is made of the same material as that of the filter 6 and includes a colored layer 222 formed on the surface of the black matrix 5 and a colored layer 226 made of the same material as that of the filter 8 and laminated on the upper surface of the colored layer 222. ing.

  The sub PS 23 is made of the same material as that of the filter 6 and includes only a colored layer 225 formed on the surface of the black matrix 5.

  Thus, in the present embodiment, the upper end level of the main PS 21 is higher than the upper end level of the sub PS 22 by changing the number of colored layers constituting each of the main PS 21 and the sub PSs 22 and 23. The level of the upper end of PS22 is set to be higher than the level of the upper end of sub-PS23.

  Hereinafter, a method for manufacturing the color filter 2 according to the present embodiment will be described.

  FIG. 9 is a plan view showing a part of a photomask set used for manufacturing the color filter shown in FIG.

  In FIG. 9, a hatched area with a lower right portion represents a portion where light is not transmitted during exposure of the photosensitive material. White areas (211 to 216) indicated by solid lines represent openings through which at least part of light used during exposure can be transmitted, and symbols R, G, B, PS21 to PS23 attached to the white areas. Represents a filter or photospacer formed at a position corresponding to each opening. A broken line represents a formation position of a portion of the color filter that does not correspond to the opening formed in the photomask.

  In FIG. 9, only a part of each photomask is shown for the sake of illustration, but in actuality, the color filter is composed of a unit of color filter, that is, three pixels continuous in the row direction and these pixels. Each photomask is constituted by a repeated pattern of regions corresponding to the three photospacers to be aligned.

As shown in FIG. 9A, the photomask 241a includes openings 211 corresponding to the arrangement of the first color (for example, red) filter 6, openings 212 corresponding to the main PS21, and openings corresponding to the sub PS23. 215. Opening 211, 212 and 21 5, a filter 6 are arranged so that the relative positional relationship same positional relationship with the main PS21 and sub PS23. Therefore, when the opening 211 is made to correspond to the formation region of the filter 6, the image of the opening 212 overlaps with the formation region of the main PS 21, and the image of the opening 215 overlaps with the formation region of the sub PS 23.

The opening 211,21 2 and 215 formed on the photomask 241a, a filter 7 of FIG. 6 are arranged to have the same positional relationship and relative positional relationship of the main PS21 and sub PS22. Further, in the present embodiment, the opening 215 is an opening 212 similar in shape and area of the opening 215 is set to be smaller than the area of the opening 21 2. Therefore, as shown in FIG. 9B, when the opening 211 is made to correspond to the formation region of the filter 7, the image of the opening 215 overlaps the central portion of the formation region of the main PS21, and the image of the opening 212 is the sub PS22. Overlaps the formation area.

  On the other hand, the photomask 242 has an opening 213 corresponding to the arrangement of the third color (for example, blue) filter 8, an opening 214 corresponding to the main PS 21, and an opening 216 corresponding to the sub PS 22. The openings 213, 214, and 216 are arranged so as to have the same positional relationship as the relative positional relationship of the filter 8, the main PS 21, and the sub PS 22. In this embodiment, the opening 214 is similar to the opening 215 (FIG. 9B), and the area of the opening 214 is set to be smaller than the area of the opening 215. Therefore, as shown in FIG. 9C, when the opening 213 is made to correspond to the formation region of the filter 8, the image of the opening 214 overlaps the central portion of the formation region of the main PS 21. Similarly, the opening 216 is similar to the opening 212 (FIG. 9B), and the area of the opening 216 is set to be smaller than the area of the opening 212. Therefore, when the opening 213 is made to correspond to the formation region of the filter 8, the image of the opening 216 overlaps with the central portion of the formation region of the sub PS22.

  In the present embodiment, the main PS 21 and the sub PSs 22 and 23 correspond to first, second, and third photo spacers, respectively. The openings 211, 212, 213, 214, 215, and 216 correspond to the first, second, third, fourth, fifth, and sixth openings, respectively. Further, the colored layers 221, 222, 223, 224, 225, and 226 correspond to the first, second, third, fourth, fifth, and sixth colored layers, respectively.

  FIG. 10 is a process chart schematically showing the manufacturing process of the color filter according to the second embodiment of the present invention. The left column in FIG. 10 corresponds to the cross section of the pixel portion shown in FIG. 7, and the right column corresponds to the cross section of the photospacer portion shown in FIG. In FIG. 10, for ease of explanation, each part of the formed color filter and the photomask are shown in a one-to-one dimensional ratio.

  First, as shown in FIG. 10A, a first color (for example, red) filter forming material is patterned on the substrate 4 using a photomask 241a (FIG. 9A), and the color filter 6 Then, a colored layer 221 constituting a part of the main PS 21 and a colored layer 225 constituting the sub PS 23 are formed.

  More specifically, a color resist of the first color is applied on the substrate 4 having the black matrix 5 formed on the surface, and the color resist is dried. Subsequently, the photomask 241a is disposed so as to face the substrate 4, and the openings 211 and 212 are made to correspond to the formation regions of the filter 6 and the main PS 21, respectively. When a part of the color resist corresponding to the image of each opening is exposed by irradiating light of a predetermined wavelength and then the color resist remaining on the substrate 4 is cured by performing development processing and baking, the substrate 4 At the same time as the filter 6, a colored layer 221 is formed at a position corresponding to the opening 212. A colored layer 225 is formed at a position corresponding to the opening 215.

  Next, as shown in FIG. 10B, a second color (for example, green) is formed on the substrate 4 using a photomask 241b (FIG. 9B) having the same opening pattern as the photomask 241a. The filter forming material is patterned to form a filter 7, a colored layer 224 that constitutes a part of the main PS 21, and a colored layer 222 that constitutes a part of the sub PS 22.

  More specifically, a second color resist is applied to the substrate 4 on which the filter 6 is formed, and the color resist is dried. Subsequently, the photomask 241b is disposed so as to face the substrate 4, and the openings 211, 215, and 212 correspond to the formation positions of the filter 7, the main PS21, and the sub PS22, respectively. When a part of the color resist corresponding to the image of each opening is exposed and then developed and baked to cure the second color resist remaining on the substrate 4, the colored layer 224 is simultaneously formed with the filter 7. Is formed at a position corresponding to the opening 215. As shown in FIG. 10A, since the colored layer 221 is already formed at the formation position of the main PS 21, the colored layer 224 formed in this step is stacked on the colored layer 221. It becomes. In addition, a colored layer 222 that is a part of the sub-PS 22 is formed at a position corresponding to the opening 212.

  Next, as shown in FIG. 10C, a third color (for example, blue) filter forming material is patterned on the substrate 4 using a photomask 242 (FIG. 9C), and the filter 8 Then, a colored layer 223 constituting a part of the main PS 21 and a colored layer 226 constituting a part of the sub PS 22 are formed.

  More specifically, a third color resist is applied on the substrate 4 on which the filter 7 is formed, and the color resist is dried. Subsequently, the photomask 242 is disposed so as to face the substrate 4, and the openings 213, 214, and 216 are made to correspond to the formation positions of the filter 8, the main PS21, and the sub PS22, respectively. When a part of the color resist corresponding to the image of each opening is exposed and then developed and baked to cure the third color resist remaining on the substrate 4, the colored layer 223 is simultaneously formed with the filter 8. Is formed at a position corresponding to the opening 114. Further, a colored layer 226 that is a part of the sub P22 is formed at a position corresponding to the opening 216.

  As shown in FIG. 10B, the colored layers 221 and 224 are already stacked at the formation position of the main PS 21, and the colored layer 222 is formed at the formation position of the sub PS 22. Therefore, the colored layers 223 and 226 are stacked on the upper surfaces of the colored layers 224 and 222, respectively, to form a three-layer main PS 21 and a two-layer sub-PS 22.

  The color filter 2 is manufactured through the above steps. When the size of the filter area formed by the photomask is smaller than the screen size of the color filter 2, the exposure process is repeatedly performed while moving the photomask in each step.

  Also in this embodiment, the photomasks 241a and 241b having the same opening pattern are used to form the first color filter 6 and the second color filter 7, and the photomask 241a has a different opening pattern from the photomask 241a. The filter 8 of the third color is formed using the mask 242. The photomasks 241a (241b) and 242 are provided with openings 212, 214, and 215 for forming an image that overlaps with the formation region of the main PS 21 in each use, so that the order of use of the photomasks 241a, 241b, and 242 Regardless, three colored layers 221, 224 and 223 are stacked on the main PS 21 formation region.

  The photomasks 241a (241b) and 242 are provided with openings 212 and 216 for forming an image that overlaps with the formation region of the sub-PS22 in each use, and the photomask 242 includes a formation region of the sub-PS23 in use. An opening 215 for forming an overlapping image is provided. Therefore, regardless of the order in which the photomasks 241a, 241b, and 242 are used, two colored layers 222 and 226 are stacked on the formation region of the sub-PS 22, and one colored layer 225 is formed on the formation region of the sub-PS 23. Is done.

  By forming the openings 212 and 214 to 216 as described above, it is possible to form the main PS 21 and the sub PSs 22 and 23 whose heights are changed depending on the number of layers.

  As described above, the manufacturing method of the color filter according to the present embodiment also uses the same material as the filters 6 to 8 while using the same material as the filters 6 to 8 while sharing the opening pattern of the photomask 241a in two colors. It is possible to form the photo spacers 21 to 23 having a thickness. Therefore, the required number of spare photomasks can be reduced as compared with the conventional manufacturing method, and a dedicated process for forming the photospacers 21 to 23 is not required, so that the manufacturing cost can be reduced. .

  In this embodiment mode, the opening 216 is provided in the photomask set. However, an opening pattern without the opening 216 may be used. When the opening 216 is not provided, the main PS 21 composed of three colored layers and the sub PSs 22 and 23 composed of only one colored layer are formed, so that the height of the main PS 21 and the sub PSs 22 and 23 is increased. It is possible to change.

(Third embodiment)
11 is a plan view showing a part of a color filter according to a third embodiment of the present invention, FIG. 12 is a cross-sectional view taken along line XII-XII in FIG. 11, and FIG. 1 is a sectional view taken along one of the XIII-XIII line.

  The color filter 3 according to the present embodiment regulates the distance between the substrate 4, the black matrix 5 formed on the substrate 4, the filters 6 to 8 arranged on the matrix, and the substrate 4 and the facing member 9. Photo spacers 31 to 33 are provided. The color filter 2 according to the present embodiment includes, as a structural unit, a portion including six filters 6 to 8 that are continuous in the row direction and photo spacers 31 to 33 disposed adjacent to these pixels. It is composed of repetition. Note that the substrate 4, the black matrix 5, and the filters 6 to 8 are the same as those described in the first embodiment, and thus repeated description thereof will be omitted.

  Similar to the first embodiment, the photo spacers (PS) 31 to 33 are arranged on the surface of the black matrix 5 along the pixel rows in order to regulate the distance between the substrate 4 and the facing member 9. . However, in the first embodiment, the heights of the main PS 11 and the sub-PSs 12 to 16 are changed by changing the number of colored layers, but in this embodiment, the main PS 31, There is a difference between the height of 33 and the sub-PS 32.

Specifically, as shown in FIG. 13, the main PSs 31 and 33 and the sub-PS 32 are configured by a single colored layer 321, 323, and 322, respectively. The planar shape of the sub PS 32 is similar to the planar shape of the main PSs 31 and 33, but the occupied area of the sub PS 32 is set to be smaller than the occupied area of the main PSs 31 and 33. Further, as shown in FIG. 1 3, substantially equal to the upper surface level of the main PS31 and 33, the upper surface level of the sub-PS32 is set to be lower than the main PS31 and 33.

  Hereinafter, a method for manufacturing the color filter 3 according to the present embodiment will be described.

  FIG. 14 is a plan view showing a part of a photomask set used for manufacturing the color filter shown in FIG.

  In FIG. 14, a hatched area with a lower right portion represents a portion where light is not transmitted during exposure of the photosensitive material. White areas (311 to 314) indicated by solid lines represent openings through which at least part of light used during exposure can be transmitted, and symbols R, G, B, PS31 to PS33 attached to the white areas. Represents a filter or photospacer formed at a position corresponding to each opening. A broken line represents a formation position of a portion of the color filter that does not correspond to the opening formed in the photomask.

  In FIG. 14, only a part of each photomask is shown for the sake of illustration, but in practice, the color filter is composed of a unit of color filters, that is, six pixels continuous in the row direction and these pixels. Each photomask is constituted by a repetitive pattern whose unit is a region corresponding to the six photospacers to be aligned.

  As shown in FIGS. 14A and 14B, the photomasks 341a and 341b have the same opening pattern and have openings 311 corresponding to the same color filter array (for example, the red filter 6 array). have.

  On the other hand, the photomask 342 includes openings 312 corresponding to the arrangement of the filters 8 of the same color (for example, blue), openings 313 corresponding to the main PS 31, openings 314 corresponding to the sub-PS 32, and openings corresponding to the main PS 33. 315. The openings 312, 313, 314, and 315 are arranged so as to have the same positional relationship as the relative positional relationship of the filter 8, the main PS 31, the sub PS 32, and the main PS 33. In the present embodiment, the planar shapes of the openings 313 and 315 are the same, and the planar shapes of the openings 314 and 313 are similar. Furthermore, the area of the opening 314 is set to be larger than the opening 313.

In the present embodiment, the main PS 31 and the sub PS 32 correspond to the first and second photo spacers, respectively. The openings 311, 312, 313 and 314 correspond to the first, second, third and fourth openings, respectively.

  FIG. 15 is a process chart schematically showing the manufacturing process of the color filter according to the third embodiment of the present invention. The left column in FIG. 15 corresponds to the cross section of the pixel portion shown in FIG. 12, and the right column corresponds to the cross section of the photospacer portion shown in FIG. In FIG. 15, for ease of explanation, each part of the formed color filter and the photomask are shown in a one-to-one dimensional ratio.

First, as shown in FIG. 15A, a first color (for example, red) filter forming material is patterned on the substrate 4 using a photomask 341a (FIG. 14A), and the color filter 6 Form. More specifically, a color resist of the first color is applied on the substrate 4 having the black matrix 5 formed on the surface, and the color resist is dried. Subsequently, the photomask 341 a is disposed so as to face the substrate 4, and the opening 311 is made to correspond to the formation region of the filter 6. When a part of the color resist corresponding to the image of each opening is exposed by irradiating light of a predetermined wavelength and then the color resist remaining on the substrate 4 is cured by performing development processing and baking, the substrate 4 A filter 6 is formed on the top.

  Next, as shown in FIG. 15B, a second color (for example, green) of the second color is formed on the substrate 4 using a photomask 341b (FIG. 14B) having the same opening pattern as the photomask 341a. The filter forming material is patterned to form the filter 7. More specifically, the second color resist is applied on the substrate 4 on which the filter 6 is formed in the process of FIG. 15A, and the color resist is dried. Subsequently, the photomask 341 b is disposed so as to face the substrate 4, and the opening 311 is made to correspond to the formation position of the filter 7. After a part of the color resist corresponding to the image of each opening is exposed, development processing and baking are performed to cure the second color resist remaining on the substrate 4, thereby forming the filter 7.

  Next, as shown in FIG. 15C, a third color (for example, blue) filter forming material is patterned on the substrate 4 using the photomask 342 (FIG. 14C), and the filter 8 Then, a colored layer 321 constituting the main PS 31, a colored layer 322 constituting the sub PS 32, and a colored layer 323 constituting the main PS 33 are formed.

  More specifically, a third color resist is applied to the substrate 4 on which the filter 7 is formed in the step of FIG. 15B, and the color resist is dried. Subsequently, the photomask 342 is disposed so as to face the substrate 4, and the openings 312, 313, 314, and 316 are made to correspond to the formation positions of the filter 8, the main PS 31, the sub PS 32, and the main PS 33, respectively. When a part of the color resist corresponding to the image of each opening is exposed and then developed and baked to cure the third color resist remaining on the substrate 4, the colored layer 321 is formed simultaneously with the filter 8. ˜323 are formed at positions corresponding to the openings 313 to 315.

  As described above, the area of the opening 314 formed in the photomask 342 is set smaller than the area of the opening 313. The influence of light diffraction that occurs during exposure is greater for the small aperture 314 than for the aperture 313, so that the light intensity in the image of the aperture 314 is lower than the light intensity in the image of the aperture 313. As a result, there is a difference in the amount of color resist remaining on the substrate 4 due to exposure between the formation region of the main PS 31 and the formation region of the sub-PS 32, and colored layers 321 and 322 having the same color and different thicknesses are formed.

  The color filter 3 is manufactured through the above steps. When the size of the filter area formed by the photomask is smaller than the screen size of the color filter 2, the exposure process is repeatedly performed while moving the photomask in each step.

  As described above, the color filter manufacturing method according to the present embodiment also uses the same material as that of the filter 8 while using the same material as the filter 8 while sharing the opening pattern of the photomask 341a in two colors. 33 can be formed. Therefore, the required number of spare photomasks can be reduced as compared with the conventional manufacturing method, and a dedicated process for forming the photo spacers 31 to 33 is not required, so that the manufacturing cost can be reduced. .

  In this embodiment, the thickness of the colored layers 321 and 322 to be formed is adjusted by changing the areas of the openings 313 and 314 provided in the photomask 342. However, instead of the area, the shape of the openings and Even if the light transmittance is varied, colored layers having different thicknesses can be formed.

(Other variations)
In each of the above embodiments, as an example, a color filter including three RGB filters has been described. However, the color filter and the manufacturing method thereof according to the present invention include a color filter including a color filter other than RGB, and 4 It can also be applied to a color filter having a color filter or more. In the case of forming four or more color filters, a step of forming a fourth color filter is further provided.

  In each of the above embodiments, a filter and a colored layer of two colors of red and green are formed using a photomask having a common pattern. However, the combination of the two colors is not limited to this, and is arbitrary. good.

  Furthermore, in each of the above-described embodiments, the example in which the three color filters are formed in the order of RGB has been described, but the order in which the filters are formed (the order of the colors) may be arbitrary.

  Furthermore, in each of the above-described embodiments, an example in which two color filters are formed using two photomasks having the same opening pattern has been described. However, two color filters are formed using a single photomask. It is also possible to do. In this case, the position of the single photomask with respect to the substrate may be changed in accordance with the color of the filter to be formed. For example, when two red and green filters among the three colors of red, green and blue are formed with the same photomask, a total of four photomasks (photomask for forming red and green filters, blue Filter formation photomasks, and these spare photomasks) may be prepared. Therefore, two photomasks can be reduced compared to the conventional manufacturing method that requires a photomask for each color, and the cost required for the photomask can be further reduced.

  Further, in each of the above embodiments, the photomask may be configured so that the size of the opening pattern is larger than the size of each part of the color filter, and the opening pattern may be reduced and transferred when the color resist is exposed.

  Furthermore, in each of the above embodiments, the formation material and formation conditions of the filter and the colored layer are not particularly limited, and any known material and formation conditions can be applied. For example, the methods described in Patent Documents 1 and 2 can be applied to each embodiment of the present invention.

  Further, in each of the above embodiments, the functions of the main PS and the sub PS are realized by changing the number of the colored layers, but by changing the contact area between the upper end of the photo spacer and the opposing member, A main PS and a sub PS may be created separately. In general, the smaller the contact area between the upper end of the photospacer and the opposing member, the more the substrate or the opposing member can be allowed to bend. Therefore, a photo spacer having a relatively large contact area with the opposing member may be used as the main PS, and a photo spacer having a relatively small contact area with the opposing member may be used as the sub PS. The contact area with the facing member can be adjusted by changing the area of the upper portion of the colored layer in accordance with the size of the opening formed in the photomask.

  Further, in each of the above embodiments, the planar shape of the photo spacer is a hexagon, but the planar shape of the photo spacer is not particularly limited and may be any shape.

  Further, in each of the above embodiments, the plurality of photo spacers are linearly arranged between the pixel columns, but the photo spacers can be arranged at arbitrary positions on the black matrix surface. In addition, the photo spacers are not necessarily arranged at regular intervals, and can be arranged at arbitrary intervals. The arrangement density of the photo spacers can also be appropriately adjusted according to the design matters of the color filter, such as the distance between the substrate and the opposing member.

  Further, in the first and second embodiments described above, in order to change the height of the main PS and the sub PS, a method of partially changing the thickness of the black matrix in combination with changing the number of colored layers. Alternatively, one or more methods may be combined to adjust the resin component composition, molecular weight, solvent, residual film sensitivity of the color resist, and to change the shape, size, and light transmittance of the opening provided in the photomask.

  Further, in the third embodiment, in order to change the height of the main PS and the sub PS, the shape / size / light transmittance of the opening provided in the photomask is changed, and the black matrix is changed. One or more methods for partially changing the thickness and methods for adjusting the resin component constitution, molecular weight, solvent, and residual film sensitivity of the color resist may be combined.

  The present invention can be used for a color filter used in a liquid crystal display device or the like and a manufacturing method thereof.

FIG. 2 is a plan view showing a part of the color filter according to the first embodiment of the present invention. Sectional drawing along the II-II line of FIG. Sectional view along line III-III in FIG. The top view which shows a part of photomask set used for manufacture of the color filter shown by FIG. Process drawing which shows typically the manufacturing process of the color filter which concerns on the 1st Embodiment of this invention. The top view which shows a part of color filter which concerns on the 2nd Embodiment of this invention. Sectional drawing along the VII-II line of FIG. Sectional drawing along the VIII-VIII line of FIG. The top view which shows a part of photomask set used for manufacture of the color filter shown by FIG. Process drawing which shows typically the manufacturing process of the color filter which concerns on the 2nd Embodiment of this invention. The top view which shows a part of color filter which concerns on the 3rd Embodiment of this invention. Sectional drawing along the XII-XII line of FIG. Sectional drawing along the XIII-XIII line of FIG. The top view which shows a part of photomask set used for manufacture of the color filter shown by FIG. Process drawing which shows typically the manufacturing process of the color filter which concerns on the 3rd Embodiment of this invention.

Explanation of symbols

1, 2, 3 Color filter 4 Substrate 5 Black matrix 6, 7, 8 Filters 11-16 Photo spacers 111-117 Openings 121-127 Colored layers 141a, 141b, 142 Photomasks 21-23 Photo spacers 211-216 Openings 221- 226 Colored layers 241a, 241b, 242 Photomasks 31-33 Photospacers 311-315 Openings 321-323 Colored layers 341a, 341b, 342 Photomask

Claims (8)

A method for manufacturing a color filter for a liquid crystal display device, comprising: first to third filters respectively corresponding to pixels of first to third colors on the substrate; and first to third spacers having different heights. There,
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array is formed on the substrate. Patterning a first color filter-forming material to form the first filter and a first colored layer constituting a part of the first spacer;
A second color filter forming material is patterned on the substrate using a photomask having the same opening pattern as the first photomask, and the second filter and the second spacer are formed. Forming a second colored layer,
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array is formed on the substrate. Patterning a third color filter forming material to form the third filter and a third colored layer constituting a part of the first spacer,
The second photomask further includes a plurality of fifth openings corresponding to the third spacer arrangement,
In the step of forming the third filter, a fourth colored layer is further formed simultaneously with the third filter and the third colored layer,
Forming the first spacer by forming the first colored layer and the third colored layer so as to overlap each other;
The second spacer is composed only of the second colored layer,
A method for producing a color filter, wherein the third spacer is constituted only by the fourth colored layer. A method for manufacturing a color filter for a liquid crystal display device, comprising: first to third filters respectively corresponding to pixels of first to third colors on the substrate; and first to third spacers having different heights. There,
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array is formed on the substrate. Patterning a first color filter-forming material to form the first filter and a first colored layer constituting a part of the first spacer;
A second color filter forming material is patterned on the substrate using a photomask having the same opening pattern as the first photomask, and the second filter and the second spacer are formed. Forming a second colored layer,
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array is formed on the substrate. Patterning a third color filter forming material to form the third filter and a third colored layer constituting a part of the first spacer,
The first photomask further includes a plurality of fifth openings corresponding to the arrangement of the first spacers when the first openings are made to correspond to the pixels of the second color,
In the step of forming the first filter, a fifth colored layer is further formed simultaneously with the first filter and the first colored layer,
In the step of forming the second filter, a fourth colored layer is further formed simultaneously with the second filter and the third colored layer,
Forming the first spacer by forming the first colored layer, the fourth colored layer, and the third colored layer so as to overlap each other;
The second spacer is composed only of the second colored layer,
A method for producing a color filter, wherein the third spacer is constituted only by the fifth colored layer. A method for manufacturing a color filter for a liquid crystal display device, comprising: first to third filters respectively corresponding to pixels of first to third colors on the substrate; and first to third spacers having different heights. There,
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array is formed on the substrate. Patterning a first color filter-forming material to form the first filter and a first colored layer constituting a part of the first spacer;
A second color filter forming material is patterned on the substrate using a photomask having the same opening pattern as the first photomask, and the second filter and one of the second spacers are patterned. Forming a second colored layer constituting the portion;
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array is formed on the substrate. Patterning a third color filter forming material to form the third filter and a third colored layer constituting a part of the first spacer,
The first photomask further includes a plurality of fifth openings corresponding to the arrangement of the first spacers when the first openings are made to correspond to the pixels of the second color,
In the step of forming the first filter, a fifth colored layer is further formed simultaneously with the first filter and the first colored layer,
In the step of forming the second filter, a fourth colored layer is further formed simultaneously with the second filter and the third colored layer,
The second photomask further includes a plurality of sixth openings corresponding to the second spacer arrangement,
In the step of forming the third filter, the sixth colored layer is further formed simultaneously with the third filter and the third colored layer,
Forming the first spacer by forming the first colored layer, the fourth colored layer, and the third colored layer so as to overlap each other;
Forming the second colored layer and the sixth colored layer so as to overlap each other to constitute the second spacer;
A method for producing a color filter, wherein the third spacer is constituted only by the fifth colored layer. A color used in a liquid crystal display device having at least first to third filters corresponding to pixels of first to third colors and first and second spacers having different heights on a substrate. A method for manufacturing a filter, in any order,
Patterning a first color filter forming material on the substrate using a first photomask having a plurality of first openings corresponding to the arrangement of the first filters; Forming, and
Patterning a second color filter forming material on the substrate using a photomask having the same opening pattern as the first photomask, and forming the second filter;
A plurality of second openings corresponding to the third filter array, a plurality of third openings corresponding to the first spacer array, and a fourth opening corresponding to the second spacer array A third color filter forming material is patterned on the substrate by using a second photomask having a third color filter, and the third filter, the first spacer, and the second spacer are formed. Comprising the steps of:
The method for producing a color filter, wherein the third opening and the fourth opening are different in at least one of light transmittance, opening shape, and opening area. A color filter for use in a liquid crystal display device having first to third filters corresponding to pixels of first to third colors and first to third spacers having different heights on a substrate. A photomask set comprising a set of photomasks used to produce
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array;
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array;
The second photomask further includes a plurality of fifth openings corresponding to the third spacer arrangement. A color filter for use in a liquid crystal display device having first to third filters corresponding to pixels of first to third colors and first to third spacers having different heights on a substrate. A photomask set comprising a set of photomasks used to produce
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array;
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array;
The first photomask further includes a plurality of fifth openings corresponding to the arrangement of the first spacers when the first openings are made to correspond to the pixels of the second color. set. A color filter for use in a liquid crystal display device having first to third filters corresponding to pixels of first to third colors and first to third spacers having different heights on a substrate. A photomask set comprising a set of photomasks used to produce
A first photomask having a plurality of first openings corresponding to the first filter array and a plurality of second openings corresponding to the first spacer array;
A second photomask having a plurality of third openings corresponding to the third filter array and a plurality of fourth openings corresponding to the first spacer array;
The first photomask further includes a plurality of fifth openings corresponding to the arrangement of the first spacers when the first openings are made to correspond to the pixels of the second color,
The second photomask further includes a plurality of sixth openings corresponding to the second spacer arrangement. A color used in a liquid crystal display device having at least first to third filters corresponding to pixels of first to third colors and first and second spacers having different heights on a substrate. A photomask set comprising a set of photomasks used to produce a filter,
A first photomask having a plurality of first openings corresponding to the first filter array;
A plurality of second openings corresponding to the third filter array, a plurality of third openings corresponding to the first spacer array, and a fourth opening corresponding to the second spacer array A second photomask having:
The photomask set, wherein the third opening and the fourth opening are different in at least one of light transmittance, opening shape, and opening area.

Images