TW200833769A - Curable resin composition and antireflection film - Google Patents

Curable resin composition and antireflection film

Info

Publication number
TW200833769A
TW200833769A TW096145158A TW96145158A TW200833769A TW 200833769 A TW200833769 A TW 200833769A TW 096145158 A TW096145158 A TW 096145158A TW 96145158 A TW96145158 A TW 96145158A TW 200833769 A TW200833769 A TW 200833769A
Authority
TW
Taiwan
Prior art keywords
resin composition
curable resin
antireflection film
low
cured film
Prior art date
Application number
TW096145158A
Other languages
Chinese (zh)
Other versions
TWI427116B (en
Inventor
Kensuke Miyao
Mitsunobu Doimoto
Takahiro Kawai
Takaro Yashiro
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200833769A publication Critical patent/TW200833769A/en
Application granted granted Critical
Publication of TWI427116B publication Critical patent/TWI427116B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L57/00—Compositions of unspecified polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C08L57/06—Homopolymers or copolymers containing elements other than carbon and hydrogen
    • C08L57/08—Homopolymers or copolymers containing elements other than carbon and hydrogen containing halogen atoms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)

Abstract

The objective of the present invention is to provide a curable resin composition which can form a cured film with low refraction index (RI) and excellent scratch resistance even at low amount of irradiation, and an antireflection film composed of a low RI layer formed by the cured film. The invented curable resin composition comprises (A) an ethylenically unsaturated group-containing fluoropolymer, (B) (meth)acrylate compound, c silica particles with number average particle sized of 1-100 nm, and (D) an photo initiator with chemical structure represented by formula (d-1), in which R1, R2, R4 and R5 independently represent C1-C4 alkyl groups, and R3 is C1-C4 alkylidene group or C2-C3 alkylene group.
TW096145158A 2006-12-01 2007-11-28 Hardened resin composition and antireflective film TWI427116B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006325396 2006-12-01
JP2007291799A JP4678399B2 (en) 2006-12-01 2007-11-09 Anti-reflection coating

Publications (2)

Publication Number Publication Date
TW200833769A true TW200833769A (en) 2008-08-16
TWI427116B TWI427116B (en) 2014-02-21

Family

ID=39657883

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096145158A TWI427116B (en) 2006-12-01 2007-11-28 Hardened resin composition and antireflective film

Country Status (3)

Country Link
JP (1) JP4678399B2 (en)
KR (1) KR101462683B1 (en)
TW (1) TWI427116B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2762540B1 (en) 2011-09-29 2017-01-11 LG Chem, Ltd. Anti-reflective coating composition providing improved scratch resistance, anti-reflective film using same, and production method therefor
WO2015002042A1 (en) * 2013-07-05 2015-01-08 株式会社カネカ Anti-glare film for solar cell module, solar cell module provided with anti-glare film, and method for manufacturing same
JP6244760B2 (en) * 2013-09-10 2017-12-13 日油株式会社 Antireflection film
JP6381354B2 (en) * 2013-09-19 2018-08-29 日本合成化学工業株式会社 Active energy ray-curable resin composition and coating agent composition
WO2015049842A1 (en) * 2013-10-04 2015-04-09 日本曹達株式会社 Acrylic-modified, pb-curable composition having excellent light resistance and exceptional mechanical strength
JP6609895B2 (en) * 2014-03-11 2019-11-27 三菱ケミカル株式会社 Curable resin composition
EP3239203A4 (en) * 2014-12-25 2018-09-05 Asahi Glass Company, Limited Curable resin composition
EP3251832B1 (en) 2016-03-09 2020-12-16 LG Chem, Ltd. Anti-reflection film
KR101955766B1 (en) * 2016-09-28 2019-03-07 삼성에스디아이 주식회사 Composition for antireflection film, antireflection film prepared from the same, polarizing plate comprising the same and optical display apparatus comprising the same
JP2019143076A (en) * 2018-02-22 2019-08-29 冨士薬品工業株式会社 Curable composition
JP7428468B2 (en) * 2018-08-23 2024-02-06 日東電工株式会社 Antireflection film, antireflection film manufacturing method, optical member, and image display device
JP7495256B2 (en) 2020-03-19 2024-06-04 東山フイルム株式会社 Highly abrasion-resistant anti-reflective film

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI312786B (en) * 2001-11-08 2009-08-01 Ciba Sc Holding Ag Novel difunctional photoinitiators
JP4085630B2 (en) * 2001-12-21 2008-05-14 Ｊｓｒ株式会社 Ethylenically unsaturated group-containing fluoropolymer, curable resin composition and antireflection film using the same
EP1523506B1 (en) * 2002-07-19 2012-09-12 Basf Se New difunctional photoinitiators
TWI266073B (en) * 2002-08-15 2006-11-11 Fuji Photo Film Co Ltd Antireflection film, polarizing plate and image display device
JP2005089536A (en) * 2003-09-12 2005-04-07 Jsr Corp Curable resin composition and antireflection coating
JP4669279B2 (en) * 2004-12-27 2011-04-13 三菱レイヨン株式会社 Curable composition
KR20070089718A (en) * 2004-12-28 2007-08-31 제이에스알 가부시끼가이샤 Antireflective film
TW200704702A (en) * 2005-05-24 2007-02-01 Jsr Corp The cured composition, the cured film, the multi-layer article with anti-reflective film and the manufacturing method of cured film
JP5045052B2 (en) * 2005-11-10 2012-10-10 Ｊｓｒ株式会社 Curable resin composition and antireflection film
JP2008044979A (en) * 2006-08-11 2008-02-28 Jsr Corp Curable resin composition and antireflection film

Also Published As

Publication number Publication date
KR101462683B1 (en) 2014-11-17
KR20080050335A (en) 2008-06-05
TWI427116B (en) 2014-02-21
JP2008156609A (en) 2008-07-10
JP4678399B2 (en) 2011-04-27

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