KR101955766B1 - Composition for antireflection film, antireflection film prepared from the same, polarizing plate comprising the same and optical display apparatus comprising the same - Google Patents
Composition for antireflection film, antireflection film prepared from the same, polarizing plate comprising the same and optical display apparatus comprising the same Download PDFInfo
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- KR101955766B1 KR101955766B1 KR1020160125152A KR20160125152A KR101955766B1 KR 101955766 B1 KR101955766 B1 KR 101955766B1 KR 1020160125152 A KR1020160125152 A KR 1020160125152A KR 20160125152 A KR20160125152 A KR 20160125152A KR 101955766 B1 KR101955766 B1 KR 101955766B1
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- refractive index
- antireflection film
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- 239000000203 mixture Substances 0.000 title claims abstract description 81
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 150000001875 compounds Chemical class 0.000 claims abstract description 77
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003999 initiator Substances 0.000 claims abstract description 30
- 239000002216 antistatic agent Substances 0.000 claims abstract description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 40
- -1 fluorinated acrylic compound Chemical class 0.000 claims description 28
- 239000000178 monomer Substances 0.000 claims description 20
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 19
- 229910052731 fluorine Inorganic materials 0.000 claims description 19
- 239000011737 fluorine Substances 0.000 claims description 19
- 239000000654 additive Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 230000000996 additive effect Effects 0.000 claims description 13
- 239000010954 inorganic particle Substances 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 9
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 148
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- 230000001965 increasing effect Effects 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 19
- 239000000047 product Substances 0.000 description 11
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 150000002009 diols Chemical class 0.000 description 8
- 229920005862 polyol Polymers 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 5
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 5
- 229920002284 Cellulose triacetate Polymers 0.000 description 5
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 5
- 230000001588 bifunctional effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical group C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- WAKHLWOJMHVUJC-FYWRMAATSA-N (2e)-2-hydroxyimino-1,2-diphenylethanol Chemical compound C=1C=CC=CC=1C(=N/O)\C(O)C1=CC=CC=C1 WAKHLWOJMHVUJC-FYWRMAATSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- OYKPJMYWPYIXGG-UHFFFAOYSA-N 2,2-dimethylbutane;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(C)(C)C OYKPJMYWPYIXGG-UHFFFAOYSA-N 0.000 description 1
- CZZVAVMGKRNEAT-UHFFFAOYSA-N 2,2-dimethylpropane-1,3-diol;3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)CO.OCC(C)(C)C(O)=O CZZVAVMGKRNEAT-UHFFFAOYSA-N 0.000 description 1
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- OOVLMFMECLBCJR-UHFFFAOYSA-K O[Sb](O)(Cl)=O Chemical compound O[Sb](O)(Cl)=O OOVLMFMECLBCJR-UHFFFAOYSA-K 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- HKWWDSQUZURFQR-UHFFFAOYSA-N bis(4-methylphenyl)iodanium Chemical compound C1=CC(C)=CC=C1[I+]C1=CC=C(C)C=C1 HKWWDSQUZURFQR-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- FVXBCDWMKCEPCL-UHFFFAOYSA-N nonane-1,1-diol Chemical compound CCCCCCCCC(O)O FVXBCDWMKCEPCL-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
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-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
- C08F20/68—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
- C08F20/70—Nitriles; Amides; Imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/69—Polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/69—Polymers of conjugated dienes
- C08G18/694—Polymers of conjugated dienes containing carboxylic ester groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/005—Additives being defined by their particle size in general
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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Abstract
There is provided a composition for an antireflection film comprising a compound of the general formula (1), a compound of the general formula (2), a UV curable compound, an antistatic agent, an initiator and zirconia, an antireflection film formed therefrom, a polarizing plate comprising the same, and an optical display device .
Description
The present invention relates to a composition for an antireflection film, an antireflection film formed therefrom, a polarizing plate including the antireflection film, and an optical display device including the same.
The optical display device is used under an environment in which external light is incident. The incidence of external light may deteriorate the screen display quality of the optical display device. Therefore, an anti-reflection film is generally used in an optical display device.
The antireflection film usually has a structure in which a high refractive index layer and a low refractive index layer are repeated on a substrate layer. The antireflection film generally lowers the refractive index of the low refractive layer to lower the reflectance.
On the other hand, since the antireflection film is located outside the optical display device, it preferably has a hard coat function and an antistatic function. Therefore, in recent years, techniques for producing an antireflection film by laminating a high refractive index layer and a low refractive index layer having a hard coat function and an antistatic function on a substrate layer have been developed. However, even if it has a hard coat function and an antistatic function, there is a limit to lowering the reflectance of the antireflection film. There is a method of reducing the reflectance by increasing the refractive index of the high refractive index layer by including inorganic particles in the high refractive index layer. However, there is a limit to lowering the reflectance of the antireflection film, and when the refractive index is lowered by using inorganic hollow particles in the low refractive layer, the refractive index can be sufficiently lowered, but there may be a problem of lowering the surface physical property and increasing the material cost.
The background art of the present invention is disclosed in Korean Patent Publication No. 2015-0135662.
An object of the present invention is to provide a composition for an antireflection film capable of remarkably lowering the minimum reflectance of an antireflection film because of its excellent hard coat function and antistatic function and high refractive index.
Another object of the present invention is to provide a composition for an antireflection film capable of realizing an antireflection film excellent in optical characteristics and excellent in scratch resistance.
Another object of the present invention is to provide an antireflection film excellent in antireflection function, low in reflectance, and excellent in hardness and antistatic function.
The composition for an antireflection film of the present invention may comprise a compound of the following formula 1, a compound of the following formula 2, a UV curable compound, an antistatic agent, an initiator and zirconia:
≪ Formula 1 >
(Wherein m, n and R are as defined in the detailed description of the present invention)
(2)
(Wherein n and R are as defined in the detailed description of the present invention).
In the antireflection film of the present invention, the substrate layer, the high refractive index layer and the low refractive index layer are sequentially laminated, the high refractive index layer has a refractive index higher than that of the low refractive index layer, the antireflection film has a lowest reflectance of 0.5% And the refractive index difference between the low refractive index layer and the low refractive index layer may be 0.26 or more.
The polarizing plate of the present invention may include a polarizer and an antireflection film of the present invention formed on at least one side of the polarizer.
The optical display device of the present invention may include the antireflection film or the polarizing plate of the present invention.
The present invention provides a composition for an antireflection film capable of remarkably lowering the minimum reflectance of an antireflection film because of its excellent hard coat function and antistatic function and high refractive index.
The present invention provides a composition for an antireflection film capable of realizing an antireflection film having excellent optical characteristics and excellent scratch resistance.
The present invention provides an antireflection film excellent in antireflection function and excellent in hardness and antistatic function due to its low reflectance.
1 is a cross-sectional view of an antireflection film according to an embodiment of the present invention.
The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. The present invention may be embodied in many different forms and is not limited to the embodiments described herein. In order to clearly illustrate the present invention, parts not related to the description are omitted, and the same names are used for the same or similar components throughout the specification.
The terms "upper" and "lower" in this specification are defined with reference to the drawings, wherein "upper" may be changed to "lower", "lower" What is referred to as "on" may include not only superposition, but also intervening other structures in the middle. On the other hand, what is referred to as "directly on" or "directly above"
As used herein, "(meth) acrylic" means acrylic and / or methacrylic.
As used herein, the term "minimum reflectance" refers to a specimen prepared by laminating a CL-885 black acrylic sheet of Nitto resin having a refractive index of 1.46 to 1.50 with a laminate (a pressure-sensitive adhesive and a substrate layer laminated) Means a reflectance meter that measures the wavelength in the range of 320 nm to 800 nm in the reflection mode, and the lowest reflectance measured at a wavelength of 440 nm to 550 nm.
In the present specification, "average reflectance" means that CL-885 black acrylic sheet of Nitto resin having a refractive index of 1.46 to 1.50 is laminated on a base layer side of a laminate of a high refractive index layer and a base layer (laminated with a pressure- The specimen is measured with a reflectance meter in the reflection mode at a wavelength of 320 to 800 nm, and is an average value of the reflectance at a wavelength of 380 nm to 780 nm.
In the present specification, "composition for an antireflection film" may mean "composition for high refractive index layer ".
Hereinafter, the composition for an antireflection film according to an embodiment of the present invention may include a compound represented by the following Chemical Formula 1, a compound represented by Chemical Formula 2, a UV curable compound, an antistatic agent, an initiator, and zirconia.
The composition for an antireflection film of this example can form a high-refraction layer in an antireflection film in which a base layer, a high refractive index layer and a low refractive index layer are sequentially laminated. The refractive index of the high refractive index layer is higher than that of the low refractive index layer. The composition of this embodiment includes the compound of the following formula (1), the compound of the following formula (2), the zirconia and the UV curable compound so as to increase the refractive index of the high refractive index layer and the refractive index difference of the high refractive index layer and the low refractive index to 0.26 or more The lowest reflectance of the antireflection film can be remarkably lowered.
The composition for an antireflection film may have a refractive index of 1.530 to 1.700, specifically 1.550 to 1.650. In this range, the refractive index of the high refractive index layer can be increased.
The laminate of the cured product (high refractive index layer) and the base layer of the composition for an antireflection film may have an average reflectance of 5% or more, for example, 5.3% or more and 10% or less. In the above range, the lowest reflectance may be 0.5% or less when the low refraction layer is laminated on the laminate. In particular, when the low refraction layer formed of the composition containing the hollow particles, the fluorine-containing monomer, is laminated on the cured product, the lowest reflectance can be lowered in particular.
The laminate of the cured product of the antireflection film composition and the base layer may have a pencil hardness in the cured product of 2H or more, for example, 2H to 3H. Within the above range, the hardness of the antireflection film can be increased. In particular, the composition of the present invention can prevent the decrease in hardness even when a low refractive index layer is further laminated on the high refractive index layer.
Hereinafter, the composition for an antireflection film will be described in detail.
The compound of formula (1) has a higher refractive index than the UV curable compound. Therefore, the refractive index of the cured product (high refractive index layer) formed of the composition for an anti-reflection film can be increased. The refractive index of the compound of the following formula (1) may be 1.6 or more, specifically 1.615 to 1.635 or more specifically 1.62 to 1.63. Within this range, the refractive index of the cured product can be increased to lower the lowest reflectance of the antireflection film:
≪ Formula 1 >
(Wherein m and n are each an integer of 1 or more, m + n is an integer of 2 to 8, and R is hydrogen or a methyl group).
Preferably, m + n may be four. In this case, the refractive index and hardness of the cured product can be increased when used together with the UV curable compound, particularly the urethane (meth) acrylate described below, and the lowest reflectance can be lowered to 0.5% or less have.
The compound of formula (2) has a higher refractive index than the UV curable compound. Therefore, the refractive index of the cured product (high refractive index layer) formed of the composition for anti-reflection film can be increased. The refractive index of the compound of the following formula (2) may be 1.55 or more, specifically 1.56 to 1.59, more specifically 1.57 to 1.58. Within this range, the refractive index of the cured product can be increased to lower the lowest reflectance of the antireflection film:
(2)
(Wherein n is an integer of 1 to 4, and R is hydrogen or a methyl group).
The compounds of formulas (1) and (2) may be synthesized by a conventional method or commercially available products may be used.
The compound of Formula 1 and the compound of Formula 2 may be contained in an amount of 5 wt% to 60 wt% based on the solid content in the composition for an anti-reflection film. Within this range, the refractive index of the high-refraction layer can be sufficiently increased. By weight, preferably 10% by weight to 45% by weight. In the above range, the lowest reflectance can be sufficiently lowered when laminated with the low refractive index layer, and the hardness of the antireflection film can be sufficiently increased. As used herein, the term "solid content " means the entirety of the composition except for the solvent, and is not limited to the shape of a liquid phase, a solid phase, and the like.
The refractive index of the UV curable compound is lower than that of the compound of the formula (1) and the compound of the formula (2). However, the UV curable compound can form a matrix of a high refractive index layer and can increase the hardness of the high refractive index layer. When only the compound of Formula 1 and the compound of Formula 2 are included, the refractive index of the high refractive index layer can be increased to lower the lowest reflectance, but the hardness of the antireflection film is low and can not be used in an optical display device.
The UV curable compound may be preferably a compound having a UV curable group such as a (meth) acrylate group or an epoxy group. The UV curable compound may include at least one of a bifunctional or higher polyfunctional (meth) acrylate-based monomer, an oligomer formed therefrom, and a resin formed therefrom. For example, the UV curable compound may be a bifunctional to 10-functional (meth) acrylate compound.
The UV curable compound is a polyfunctional urethane (meth) acrylate synthesized from a polyfunctional (meth) acrylate such as a polyhydric alcohol and an ester of (meth) acrylic acid, or a polyhydric alcohol, an isocyanate compound, or a hydroxy ester of (meth) Acrylate. ≪ / RTI > Preferably, by using a polyfunctional urethane (meth) acrylate, the combination of the compound of Formula 1 and the compound of Formula 2 increases the refractive index and hardness, and the lowest reflectance can be lowered when the low refraction layer is laminated.
Examples of the bifunctional (meth) acrylate compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, butanediol di (meth) acrylate, hexanediol di (Meth) acrylate, nonane diol di (meth) acrylate, ethoxylated hexanediol di (meth) acrylate, propoxylated hexanediol di (meth) acrylate, diethylene glycol di Acrylate, neopentyl glycol di (meth) acrylate, ethoxylated neopentyl glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tripropylene glycol di ) Acrylate, and di (meth) acrylate such as hydroxypivalic acid neopentyl glycol di (meth) acrylate.
Examples of trifunctional or more (meth) acrylate compounds include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) Tri (meth) acrylate such as tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate and glycerin tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol tri (Meth) acrylate compounds such as ditrimethylolpropane tri (meth) acrylate and ditrimethylolpropane tri (meth) acrylate, and trifunctional (meth) acrylate compounds such as pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol tetra (Meth) acrylate, dipentaerythritol penta (meth) acrylate, ditrimethylolpropane penta (meth) acrylate, (Meth) acrylate compounds such as dipentaerythritol hexa (meth) acrylate and ditrimethylol propane hexa (meth) acrylate, and polyfunctional (meth) acrylate compounds having a part of these (meth) And a polyfunctional (meth) acrylate compound substituted with a lactone.
Among the UV curable compounds, polyfunctional urethane (meth) acrylates can be preferably used because they can design a desired molecular weight and molecular structure and can easily balance the physical properties of the formed high refractive index layer . The polyfunctional urethane (meth) acrylate is synthesized from a polyol, an isocyanate compound, and a hydroxy ester of (meth) acrylic acid. The polyol may include at least one of an aromatic polyol, an aliphatic polyol, and an alicyclic polyol. Preferably, it may be at least one of an aliphatic polyol and an alicyclic polyol. In such a case, the occurrence of yellowing of the antireflection film may be small. The polyol may include, but is not limited to, one or more of a polyester diol, a polycarbonate diol, a polyolefin diol, a polyether diol, a polythioether diol, a polysiloxane diol, a polyacetal diol, and a polyester amide diol. The isocyanate compound may be any aliphatic, alicyclic or aromatic polyfunctional isocyanate compound.
The UV curable compound may be contained in an amount of 20% by weight to 60% by weight based on the solid content in the composition for an antireflection film. In this range, the matrix of the high-refraction layer may have a high hardness. Preferably from 35% by weight to 50% by weight. In the above range, the lowest reflectance can be sufficiently lowered when laminated with the low refractive index layer, and the hardness of the antireflection film can be sufficiently increased.
The antistatic agent may include a material having a quaternary ammonium cation and an anion to lower the surface resistance of the antireflection film. The anion may be a halogen ion, HSO 4 - , SO 4 2- , NO 3 - , PO 4 3-, and the like. The antistatic agent may include a quaternary ammonium cation, but may include an acrylic material containing a quaternary ammonium cation as a functional group in the molecule.
The antistatic agent may be contained in an amount of 2% by weight to 10% by weight, preferably 3% by weight to 7% by weight, based on the solid content in the antireflection film composition. Within the above range, antistatic effect can be obtained and the hardness of the antireflection film and the like can be prevented from affecting, property deterioration such as hardness can be prevented, and migration of the antistatic agent can be prevented.
The initiator can form a high-refraction layer by curing the compound of Formula 1, the compound of Formula 2, and the UV-curable compound. The initiator may comprise one or more of the usual photoradical initiators, photon ionic initiators known to those skilled in the art. Although not particularly limited, by using an initiator having an absorption wavelength of 400 nm or less, it is possible to produce a high-refraction layer by photocuring only when the compound of formula (1) or the UV-curable compound is cured.
The photoradical initiator is a catalyst which generates radicals by light irradiation to catalyze curing and includes at least one of phosphorous, triazine, acetophenone, benzophenone, thioxanthone, benzoin, oxime, and phenylketone can do. Photo cationic initiators may include salts of cations and anions. Specific examples of the cation include diphenyliodonium, 4-methoxydiphenyliodonium, bis (4-methylphenyl) iodonium, (4-methylphenyl) Triarylsulfonium such as triphenylsulfonium, diphenyl-4-thiophenoxyphenylsulfonium and the like, bis [4- (diphenylsulfonyl) phenyl] (Diphenylsulfonyl) -phenyl] sulfide, bis [4- (di (4- (2-hydroxyethyl) phenyl) Dien-1-yl) [(1,2,3,4,5,6-η) - (1-methylethyl) benzene] iron (1+). Specific examples of the anion include tetrafluoroborate (BF 4 - ), hexafluorophosphate (PF 6 - ), hexafluoroantimonate (SbF 6 - ), hexafluoroarsenate (AsF 6 - And chlorantimonate (SbCl 6 - ).
The initiator may be contained in an amount of 2 wt% to 5 wt% based on the solid content in the composition for an antireflection film. In this range, the composition can be sufficiently cured and the light transmittance of the antireflection film can be prevented from being lowered due to the residual amount of the initiator. By weight, preferably 2% by weight to 4% by weight. Within the above range, it is possible to manufacture a high-refraction layer with only light curing.
Zirconia can add a function of increasing the refractive index and increasing the hardness of the coating film in the high refractive index layer. Zirconia may not be surface treated but may be surface treated (e.g., (meth) acrylate groups) to improve compatibility with other components in the composition and further increase the hardness of the high refractive index layer. The surface treatment can be from 5% to 50% of the total surface area of the zirconia. Within this range, it is possible to have a hardness increasing effect through bonding with the UV curable compound, the compound of the formula 1, and the compound of the formula 2. The zirconia may have an average particle diameter (D50) of 1 nm to 50 nm, specifically 5 nm to 20 nm. Within the above range, the antireflection film may have an effect of increasing hardness without deterioration of optical properties.
The zirconia may be contained in an amount of 2 to 35% by weight based on the solid content in the composition for an antireflection film. Within this range, there may be an effect of increasing the hardness without deteriorating the optical characteristics of the antireflection film. By weight, preferably 5% by weight to 30% by weight. Within this range, there may be an effect of increasing the hardness without deteriorating optical properties.
The composition for an antireflection film may further comprise conventional additives known to those skilled in the art. For example, it may include, but is not limited to, antifoaming agents, antioxidants, ultraviolet absorbers, light stabilizers, leveling agents and the like.
The composition for an antireflection film may further comprise a solvent to improve the coating property of the antireflection film composition. The solvent may include at least one of propylene glycol monomethyl ether and methyl ethyl ketone.
Hereinafter, an antireflection film according to an embodiment of the present invention will be described with reference to FIG. 1 is a cross-sectional view of an antireflection film according to an embodiment of the present invention.
Referring to FIG. 1, the
The
The
The high
The refractive index of the high
The refractive index of the high
The high
The low
The refractive index of the low
The
The
The inorganic particles have a hollow structure, and the refractive index of the low refractive layer can be lowered by lowering the refractive index. The refractive index of the inorganic particles may be 1.4 or less, for example, 1.2 to 1.38. The inorganic particles may be hollow silica. The inorganic particles may be untreated untreated hollow particles or surface treated with UV curable functional groups. The average particle diameter (D50) of the inorganic particles is equal to or less than the thickness of the low refractive index layer, and may be 30 nm to 150 nm, for example, 50 nm to 100 nm. In the above range, it can be included in the low refractive index layer, and optical properties such as haze and transmittance can be improved.
The fluorine-containing monomer or oligomer thereof together with the inorganic particles lowers the refractive index of the low refractive layer and forms a matrix of the low refractive layer together with the fluorine-free monomer or oligomer thereof. The fluorine-containing monomer may include a fluorine-containing (meth) acrylate-based compound. The fluorine-containing monomers may comprise conventional compounds known to those skilled in the art.
The fluorine-free monomer or oligomer thereof forms a matrix of the low refractive layer and may comprise a UV curable compound. The fluorine-free monomer or oligomer thereof may be a bifunctional or more (e.g., bifunctional to 10-functional) (meth) acrylate compound. Specifically, the fluorine-free monomer may include a polyfunctional (meth) acrylate such as the above-described polyhydric alcohol and an ester of (meth) acrylic acid.
The initiator may be the same as or different from those described above in the composition for a high refractive index layer.
The additive adds antifouling property and slimness to the low refraction layer, and conventional additives known to those skilled in the art can be used. The additive may include at least one of a fluorine-containing additive and a silicon-based additive. The fluorine-containing additive may be a UV-curable fluorinated acrylic compound. For example, a KY-1200 series (KY-1203) including KY-1203 can be used.
The composition for a low refractive layer comprises 20% by weight to 70% by weight of solid inorganic particles, 10% to 50% by weight of a fluorine-containing monomer or oligomer thereof, 5% to 25% by weight of a fluorine- To 5 wt%, and 1 wt% to 10 wt% of an additive. Within the above range, a pencil hardness of 2H or more can obtain a fingerprint prevention effect. Preferably, the composition for a low refractive layer comprises 40% by weight to 60% by weight of solid inorganic particles, 20% to 40% by weight of a fluorine-containing monomer or oligomer thereof, 5% to 15% From 2 wt% to 4 wt% of an initiator, and from 2 wt% to 7 wt% of an additive.
The composition for the low refractive layer may further include conventional additives known to those skilled in the art. For example, it may include, but is not limited to, antifoaming agents, antioxidants, ultraviolet absorbers, light stabilizers, leveling agents and the like.
The composition for the low refractive layer may further include a solvent to improve the coating property. The solvent may include at least one of methyl ethyl ketone, methyl isobutyl ketone, and ethylene glycol dimethyl ether.
Hereinafter, a polarizing plate according to an embodiment of the present invention will be described.
The polarizing plate according to the present embodiment may include an antireflection film according to an embodiment of the present invention. The polarizing plate includes a polarizer and an antireflection film formed on at least one side of the polarizer, and the antireflection film may include the antireflection film according to the present embodiment. In addition to the antireflection film, the polarizing plate may further include a conventional optical compensation film, a protective film, and the like.
Hereinafter, an optical display device according to an embodiment of the present invention will be described.
The optical display device according to the present embodiment may include an antireflection film or a polarizing plate according to the present embodiment. The optical display device may include, but is not limited to, a liquid crystal display device, an organic light emitting display device, and the like.
Hereinafter, the configuration and operation of the present invention will be described in more detail with reference to preferred embodiments of the present invention. It is to be understood, however, that the same is by way of illustration and example only and is not to be construed in a limiting sense.
Manufacturing example One: For low refractive layer Composition manufacturing
2.75 g of a fluorine-free monomer, M306 (TOAGOSEI), was added to 61.3 g of THRULYA 5320 (JGC Catalyst and chemicals LTD) which is a hollow silica-containing sol and completely dissolved to obtain a mixture. 5.17 g of a fluorine-containing monomer AR-110 (DAIKIN) was added to the mixture, followed by stirring for 5 minutes. 3.75 g of a fluorine-containing additive KY-1203 (Shinetsu) was added to the mixture, followed by stirring for 5 minutes. 0.75 g of Irgacure 127 (BASF) as an initiator was added to the mixture and completely dissolved. To the mixture was added 585 g of methyl ethyl ketone (Samseon Chemical), 197 g of methyl isobutyl ketone (Samseon Chemical), and 97.5 g of ethylene glycol dimethyl ether (Samcheon Chemical), followed by stirring for 30 minutes to prepare a composition for a low refractive layer.
The composition for the low refractive layer includes 50 wt% of solid silica based on the solid basis, 32 wt% of the fluorine-containing monomer, 10 wt% of the fluorine-free monomer, 3 wt% of the initiator and 5 wt% of the additive.
Example One
13 g of UV-curable compound UP111 (Entis, polyfunctional urethane acrylate), 14 g of BPS022S (enrichment solvent), which is a solution containing a mixture of the compound of Formula 1 and the compound of Formula 2, 14 g of surface treated zirconia- , 30 g of propylene glycol monomethyl ether (Samseon Chemical Co., Ltd.) and 25 g of methyl ethyl ketone (Samcheon Chemical Co., Ltd.) were added and completely dissolved. 1.25 g of Irgacure 184 (BASF) as an initiator was added thereto, followed by stirring for 5 minutes. 9.4 g of an antistatic agent-containing solution TBAS-2 (ARAKAWA) was added and stirred for 20 minutes to prepare a composition for a high-refractive-index layer.
The composition for the high refractive index layer contains 45% by weight of the compound of the formula (1) and the compound of the formula (2), 41% by weight of the UV curable compound, 5% by weight of the antistatic agent, 4% by weight of the initiator and 5% by weight of zirconia.
The thus prepared composition for a high refractive index layer was coated on a triacetyl cellulose film (FUJI, TG60UL) as a base layer using a Meyer bar 14. After drying at 80 DEG C for 2 minutes, the substrate was dried at 100 mJ / cm < 2 > Or more. The obtained coating layer was coated with the composition for a low refractive index of Production Example 1 using a Meyer bar 4, dried at 80 DEG C for 2 minutes, and then exposed to 250 mJ / cm < 2 > (Thickness: 7 nm, refractive index is shown in Table 1 below), a low refraction layer (thickness: 130 nm, refractive index: 1.30) was formed on the base layer (thickness: 60 m, refractive index: 1.485) Thereby sequentially fabricating an antireflection film having a three-layer structure.
Example 2
17 g of UV-curing compound UP111 (Entis, polyfunctional urethane acrylate), 5 g of BPS022S (a concentrating agent) solution containing a mixture of the compound of Formula 1 and the compound of Formula 2, the surface-treated zirconia- , 15 g of propylene glycol monomethyl ether (Samseon Chemical Co., Ltd.) and 20 g of methyl ethyl ketone (Samseon Chemical Co., Ltd.) were added and completely dissolved. 1.25 g of Irgacure 184 (BASF) as an initiator was added thereto, followed by stirring for 5 minutes. 9.4 g of an antistatic agent-containing solution TBAS-2 (ARAKAWA) was added and stirred for 20 minutes to prepare a composition for a high-refractive-index layer.
The composition for the high refractive index layer contains 15% by weight of the compound of the formula 1 and the compound of the formula 2, 50% by weight of the UV curable compound, 5% by weight of the antistatic agent, 4% by weight of the initiator and 26% by weight of the zirconia.
The above-prepared composition for a high refractive index layer was coated on a triacetyl cellulose film (FUJI, TG60UL) as a base layer using a No. 14 Meyer bar. After drying at 80 DEG C for 2 minutes, the substrate was dried at 100 mJ / cm < 2 > Or more. The obtained coating layer was coated with the composition for a low refractive index of Production Example 1 using a Meyer bar 4, dried at 80 DEG C for 2 minutes, and then exposed to 250 mJ / cm < 2 > (Thickness: 7 nm, refractive index is shown in Table 1 below), a low refraction layer (thickness: 130 nm, refractive index: 1.30) was formed on the base layer (thickness: 60 m, refractive index: 1.485) Thereby sequentially fabricating an antireflection film having a three-layer structure.
Comparative Example One
31 g of UV curable compound UP111 (Entis), 30 g of propylene glycol monomethyl ether (Samseon Chemical) and 30 g of methyl ethyl ketone (Samseon Chemical Co., Ltd.) were added and completely dissolved. 1.25 g of Irgacure 184 (BASF) as an initiator was added thereto, followed by stirring for 5 minutes. 9.4 g of an antistatic agent-containing solution TBAS-2 (ARAKAWA) was added and stirred for 20 minutes to prepare a composition for a high-refractive-index layer. An antireflection film was prepared in the same manner as in Example 1 using the above-prepared composition.
Comparative Example 2
31 g of CN120C80 (Sartomer), which is a mixture of bisphenol A epoxy acrylate (refractive index: 1.541) and trimethylpropane triacrylate, 30 g of propylene glycol monomethyl ether (Samseon Chemical) and 30 g of methyl ethyl ketone . 1.25 g of Irgacure 184 (BASF) as an initiator was added thereto, followed by stirring for 5 minutes. 9.4 g of an antistatic agent-containing solution TBAS-2 (ARAKAWA) was added and stirred for 20 minutes to prepare a composition for a high-refractive-index layer. An antireflection film was prepared in the same manner as in Example 1 using the above-prepared composition.
Comparative Example 3
23 g of UV-curable compound UP111 (Entis, polyfunctional urethane acrylate), 5 g of BPSO22S (concentrating agent) solution containing a mixture of the compound of Formula 1 and the compound of Formula 2, 5 g of surface treated TiO 2 nanoparticles , 30 g of propylene glycol monomethyl ether (Samseon Chemical Co., Ltd.), and 30 g of methyl ethyl ketone (Samseon Chemical Co., Ltd.) were added and completely dissolved. 1.25 g of Irgacure 184 (BASF) as an initiator was added thereto, followed by stirring for 5 minutes. 9.4 g of an antistatic agent-containing solution TBAS-2 (ARAKAWA) was added and stirred for 20 minutes to prepare a composition for a high-refractive-index layer.
The high refractive index layer composition comprises a total compound with a compound of formula 2 of the formula (1) based on solids 13 wt%, 59 wt% UV-curable compound, antistatic agent 5% by weight, initiator 3 wt%, TiO 2 20% by weight.
The following properties of the composition for the high refractive index layer of Examples and Comparative Examples were evaluated, and the results are shown in Table 1 below.
(1) Refractive index of high refractive index layer composition and refractive index of high refractive index layer: For the composition of the examples and comparative examples and for the high refractive index layer as a cured product thereof, the liquid refractive index was measured with an Abbe's refractive index measuring device. In the case of a high refractive index layer, The CL-885 black acrylic sheet of Nitto resin having a refractive index of 1.46 to 1.50 was coated on a coating layer composed of 100% of the composition, and the reflectance was measured with a UV-spectrometer to fit the graph and the result was interpolated or extrapolated Respectively.
(2) Average reflectance: The composition for a high refractive index layer in Examples and Comparative Examples was coated on a triacetyl cellulose film (FUJI, TG60UL, thickness: 60 탆) as a base layer using a Meyer bar 14 and dried at 80 캜 for 2 minutes , And cured at a light amount of 150 mJ / cm 2 in a nitrogen atmosphere to prepare a specimen (high refractive index layer thickness: 7 μm).
A CL-885 black acrylic sheet of Nitto resin having a refractive index of 1.46 to 1.50 on the base layer side of the specimen was laminated at 70 DEG C (laminated with a pressure-sensitive adhesive and a substrate layer) at 70 DEG C, VIS spectrometer Lambda 1050. The reflection mode was measured in a range of 320 nm to 800 nm, and the average value of the reflectance at 380 nm to 780 nm was the average reflectance.
(3) Pencil hardness: Measured using a HEIDON instrument and measured using a Mitsubishi pencil having a speed of 0.5 mm / sec, a weight of 500 g, and a hardness of 1, 2H or the like. If the surface of the film is not scratched after a test using a Mitsubishi pencil of 2H, it is considered to have a hardness of 2H. Measure 5 times each. If not scratched 5 times, mark 5/5. If scratched 5 times, mark 0/5.
(%)
(2H)
In Comparative Example 3, the haze was increased due to the TiO 2 dispersion problem, and the low refractive index layer was not coated.
The following properties of the antireflection films of Examples and Comparative Examples were evaluated, and the results are shown in Table 2 below.
(1) Haze and transmittance: The NDH 2000 (NIPPON DENSHOKU), which is a haze meter, was measured for the antireflection films of Examples and Comparative Examples in a wavelength range from 400 nm to 700 nm in visible light range.
(2) CL-885 black acrylic sheet of Nitto resin having a minimum reflectance of 1.46 to 1.50 with a refractive index of 1.46 to 1.50 was laminated on the base layer side of the antireflection films of Examples and Comparative Examples at 70 DEG C (laminated with a pressure- And the prepared specimens were measured with a UV / VIS spectrometer Lambda 1050 of a reflectance meter Perkin Elmer. The reflection was measured in the range of 320 nm to 800 nm in the reflection mode, and the lowest value among the reflectance at wavelengths of 440 nm to 550 nm was determined.
(3) Surface resistance: In the antireflection films of Examples and Comparative Examples, a surface resistance meter MCP-HT450 (MITSUBICHI) was used to measure the surface of the low refraction layer at a pressure of 100 V and a thickness of 10 m.
(4) Pencil hardness: Measured using a HEIDON machine and measured using a Mitsubishi pencil having a hardness of 0.5 mm / sec, a weight of 500 g, and a hardness of 2H. If the surface of the film is not scratched after a test using a Mitsubishi pencil of 2H, it is considered to have a hardness of 2H. Measure 5 times each. If not scratched 5 times, mark 5/5. If scratched 5 times, mark 0/5.
(5) Scratch resistance: HEIDON 14F equipment and steel wool are manufactured by LIBERON Company 0000. Place the antireflection film flat on a flat glass plate with tape. The area of contact with the film is circular and shall be 10 ± 2 mm in diameter. The speed is 4000mm / min, the moving distance is 50mm, the number of movements is 10, and the load is given by using 1kg weight. After 10 repetitions, check if scratches have occurred with naked eyes. If no scratches are found, it is evaluated as excellent, less than 10 is good, and 10 is evaluated as NG.
(%)
(%)
(%)
reflectivity
(%)
resistance
(Ω / □)
As shown in Tables 1 and 2, the composition for an antireflection film of the present invention is excellent in hard coat function and antistatic function and has a high refractive index, so that the lowest reflectance of the antireflection film can be remarkably lowered. In addition, the antireflection film composition of the present invention can realize an antireflection film having excellent optical characteristics and good scratch resistance.
On the other hand, in Comparative Examples 1 and 2 which were outside the composition of the present invention, the average reflectance and the lowest reflectance were higher than those of the present invention, so that the lowest reflectance of the present invention could not be obtained.
In Comparative Example 3 containing titania particles in the range of the present invention instead of zirconia particles, the dispersibility of TiO 2 was poor and the haze was high, so that it could not be used as an antireflection film.
It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (14)
The refractive index of the high refractive index layer is higher than that of the low refractive index layer,
The antireflection film has a minimum reflectance of 0.5% or less,
Wherein the refractive index difference between the high refractive index layer and the low refractive index layer is 0.26 or more,
The high refractive index layer is formed of a composition for a high refractive index layer comprising a compound of the following formula 1, a compound of the following formula 2, a UV curable compound, an antistatic agent, an initiator and zirconia,
≪ Formula 1 >
(Wherein m and n are each an integer of 1 or more, m + n is an integer of 2 to 8, and R is hydrogen or a methyl group)
(2)
(Wherein n is an integer of 1 to 4 and R is hydrogen or a methyl group)
The UV curable compound has a refractive index lower than that of the compound of Formula 1 and the compound of Formula 2,
Wherein the composition for high refractive index layer comprises 5 to 60% by weight of the total amount of the compound represented by Formula 1 and the compound represented by Formula 2, 20 to 60% by weight of the UV curable compound, 2 to 10% 2 wt% to 5 wt% of the initiator, and 2 wt% to 35 wt% of zirconia,
Wherein the low refraction layer is formed of a composition for a low refractive layer comprising inorganic particles, a fluorine-containing monomer or oligomer thereof, a fluorine-free monomer or oligomer thereof, an initiator, and a fluorine-containing additive.
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| PCT/KR2016/015363 WO2018062631A1 (en) | 2016-09-28 | 2016-12-28 | Antireflective film composition, antireflective film formed therefrom, polarizing plate including same, and optical display device including same |
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| JP2005257786A (en) | 2004-03-09 | 2005-09-22 | Fuji Photo Film Co Ltd | Antireflection film and its manufacturing method |
| JP2009132842A (en) | 2007-11-30 | 2009-06-18 | Jsr Corp | Curable resin composition and optical member |
| US20100028660A1 (en) * | 2008-08-01 | 2010-02-04 | Chemical Co., Ltd. | Polymerizable composition and its uses |
| JP2012189802A (en) * | 2011-03-10 | 2012-10-04 | Asahi Kasei Chemicals Corp | Antireflection film, polarizer and display device |
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| JP4678399B2 (en) * | 2006-12-01 | 2011-04-27 | Ｊｓｒ株式会社 | Anti-reflection coating |
| JP5840611B2 (en) * | 2010-08-09 | 2016-01-06 | 株式会社ダイセル | Curable composition and cured product thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005257786A (en) | 2004-03-09 | 2005-09-22 | Fuji Photo Film Co Ltd | Antireflection film and its manufacturing method |
| JP2009132842A (en) | 2007-11-30 | 2009-06-18 | Jsr Corp | Curable resin composition and optical member |
| US20100028660A1 (en) * | 2008-08-01 | 2010-02-04 | Chemical Co., Ltd. | Polymerizable composition and its uses |
| JP2012189802A (en) * | 2011-03-10 | 2012-10-04 | Asahi Kasei Chemicals Corp | Antireflection film, polarizer and display device |
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