TW200830933A - High efficiency organic light emitting diode and manufacturing method thereof - Google Patents

High efficiency organic light emitting diode and manufacturing method thereof Download PDF

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TW200830933A
TW200830933A TW96100235A TW96100235A TW200830933A TW 200830933 A TW200830933 A TW 200830933A TW 96100235 A TW96100235 A TW 96100235A TW 96100235 A TW96100235 A TW 96100235A TW 200830933 A TW200830933 A TW 200830933A
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layer
light emitting
light
emitting diode
organic light
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TW96100235A
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TWI393479B (en
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Jwo-Huei Jou
Ming-Hsuan Wu
Chun-Jan Wang
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Jwo-Huei Jou
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Abstract

A high efficiency organic light emitting diode (OLED) and a manufacturing method are disclosed. The OLED apparatus includes a substrate, a first electrically conductive layer, a hole-transporting-layer, a doped emissive-layer, an electron-transporting-layer, an electron-injection-layer and a second electrically conductive layer. The arrangement from bottom to top is the substrate, the first electrically conductive layer, the hole-transporting-layer, the doped emissive-layer, the electron-transporting-layer, the electron-injection-layer and the second electrically conductive layer. The emissive layer is composed of one host material and more than one light-emitting guest materials. The barrier for carrier, hole or electron, to inject into the host is smaller than that into the guest(s).

Description

200830933 八、 本案若有化學辑,請揭錢能顯示發明特 徵的化學式: 九、 發明說明: 【發明所屬之技術領域】 本發明係關於一種有機發光二極體及其製造方 法,其中二極體中發光層之組成包含主體材料及一種 以上之客體材料,而電子或電洞載子注入主體之能障 • 小於注入客體之能障。 【先前技術】 有機電激發光顯示器(Organic Electroluminescence Display, Organic EL Display) 又稱為有 機發光二極體(Organic Light Emitting Diode,OLED) 是在1987年由柯達(Kodak)公司的C. W. Tang與S. A. • VanSlyk等人,率先使用真空蒸鍍方式製成,分別將 電洞傳輸材料及電子傳輸材料,鍍覆於透明之氧化銦 錫(indium tin oxide,簡稱ITO)玻璃上,其後再蒸鍍一 金屬電極形成具有自發光性之OLED裝置,由於擁有 咼梵度、螢幕反應速度快、輕薄短小、全彩、無視角 差、不需液晶顯示器式背光板以及節省燈源及耗電 量’因而成為新一代顯示器。 請參閱第一圖,其係依據習知之一 OLED裝置之 200830933 結構剖面圖。在此實施例中,OLED裝置的構造由下 至上依序包含一透明基板11、一透明之陽極12 (Indium Tin Oxide,IT0)、電洞傳輸層 13 (H〇le Transporting Lay er,HTL )、一有機發光層 14( 〇rganie Emitting Layer,EL)、一電子傳輸層 15( Electron Transporting Lay er,ETL )、一電子注入層 16( Electron200830933 VIII. If there is a chemical series in this case, please uncover the chemical formula that can show the characteristics of the invention: IX. Description of the invention: [Technical Field] The present invention relates to an organic light-emitting diode and a method of manufacturing the same, wherein the diode The composition of the middle luminescent layer comprises a host material and more than one guest material, and the energy barrier of the electron or hole carrier injected into the body is less than the energy barrier of the implanted object. [Prior Art] Organic Electroluminescence Display (Organic Electroluminescence Display) is also known as Organic Light Emitting Diode (OLED) in 1987 by Kodak's CW Tang and SA • VanSlyk et al., the first to use vacuum evaporation method, respectively, the hole transport material and the electron transport material are plated on transparent indium tin oxide (ITO) glass, and then vapor-deposited a metal. The electrode forms a self-luminous OLED device, which is new because it has a 咼 度 、, fast response speed, light and thin, full color, no viewing angle difference, no need for liquid crystal display backlight, and saves light source and power consumption. A generation of displays. Please refer to the first figure, which is a structural cross-sectional view of the 200830933 OLED device according to one of the conventional ones. In this embodiment, the OLED device is configured to include a transparent substrate 11 , an indium tin Oxide (IT0), and a hole transport layer 13 (HTL) in order from bottom to top. An organic light emitting layer 14 (electron transporting layer), an electron transport layer 15 (electron transporting Lay er, ETL), an electron injecting layer 16 (electron

Injection Layer,EIL)及一金屬陰極17。當施以一順 向偏壓電壓時,電洞131由陽極12注入,而電子151 φ 由陰極17注入,由於外加電場所造成的電位差,使 電子151及電洞131在薄膜中移動,進而在有機發光 • 層14中產生覆合(recombination)。部分由電子電洞 結合所釋放的能量,將有機發光層14的發光分子激 發而成為激發態’當發光分子由激發態衰變至基態 時,其中一定比例的能量以光子的形式放出,所放出 的光為有機電致發光。 請參閱第二圖,其係依據習知之另一 OLED裝置 • 之結構剖面圖,此結構由柯達(Kodak)公司的C. w. Tang於1982年在美國專利第4,356,429號中已敘述此 OLED裝置。在此實施例中,OLED裝置的構造由下 至上依序包含一透明基板21、一透明之陽極22、一 電洞注入層23、一發光層24及—金屬陰極25。當施 以一順向偏壓電壓時,電洞由陽極22注入,而電子 由陰極25注入,由於外加電場所造成的電位差,使 電子及電洞在薄膜中移動’進而在發光層24中產生 200830933 覆合。部分由電子電洞結合所釋放的能量,將發光層 24的發光分子激發而成為激發態,當發光分子由激發 態哀變至基態時,其中一定比例的能量以光子的形式 放出,所放出的光為有機電致發光。 請參閱第三圖,亦為習知之OLED裝置結構剖面 圖’此結構由柯達(Kodak)公司的C· W· Tang於1988 年提出在美國專利第4,720,432號。在此實施例中, OLED裝置的構造由下至上依序包含一透明基板31、 _ 一透明之陽極32、一電洞注入層33、一具電子傳輸 功能之發光層34及一金屬陰極35。當施以一順向偏 〆 廢龟壓日守’電洞由陽極32注入,而電子由陰極35注 . 入,由於外加電場所造成的電位差,使電子及電洞在 薄膜中移動,進而在發光層34中產生覆合。部分由 笔子電洞結合所釋放的能量,將發光層的發光分 子激發而成為激發態,當發光分子由激發態衰變至基 態時,其中一定比例的能量以光子的形式放出,所放 Φ 出的光為有機電致發光。 請參閱第四圖,係為習知之OLED裝置,此結構 是由Saito等人於1992年,在美國專利第5,085,946 號中提出,此0LED裝置之構造由下至上依序包含一 透明基板41、一透明之陽極42、——電洞傳輸層43、 一具備電子傳輸功能之發光層44及一金屬陰極45, 可產生有機電致發光。 200830933 請參閱第五圖,亦為Saito等人於美國專·利第 5,085,947號所提出〇LED裝置結構,此OLED裝置 之構造由下至上依序包含一透明基板51、一透明之陽 極52、一具備電洞傳輪功能之發光層53、一電子傳 輸層54及一金屬陰極55,亦可產生有機電致發光。 請參閱第六圖,為c w Tang等人於J〇urnal 〇fInjection Layer, EIL) and a metal cathode 17. When a forward bias voltage is applied, the hole 131 is injected from the anode 12, and the electron 151 φ is injected from the cathode 17, and the potential difference caused by the applied electric field causes the electron 151 and the hole 131 to move in the film, thereby Organic Luminescence • Recombination occurs in layer 14. Part of the energy released by the electron hole combination excites the luminescent molecules of the organic luminescent layer 14 to become an excited state. When the luminescent molecules decay from the excited state to the ground state, a certain proportion of the energy is released in the form of photons, and the emitted Light is organic electroluminescence. Please refer to the second figure, which is a cross-sectional view of a conventional OLED device according to the prior art, which is described in U.S. Patent No. 4,356,429, issued toK.W. . In this embodiment, the OLED device is constructed to sequentially include a transparent substrate 21, a transparent anode 22, a hole injection layer 23, a light-emitting layer 24, and a metal cathode 25 from bottom to top. When a forward bias voltage is applied, the holes are injected from the anode 22, and electrons are injected from the cathode 25, causing electrons and holes to move in the film due to the potential difference caused by the applied electric field, thereby generating in the light-emitting layer 24. 200830933 Coverage. Part of the energy released by the electron hole combination excites the luminescent molecules of the luminescent layer 24 to become an excited state. When the luminescent molecules sorrow from the excited state to the ground state, a certain proportion of the energy is released in the form of photons, and the emitted Light is organic electroluminescence. Please refer to the third figure, which is also a cross-sectional view of a conventional OLED device structure. This structure was proposed by Kodak Company, C. W. Tang, in U.S. Patent No. 4,720,432. In this embodiment, the OLED device has a transparent substrate 31, a transparent anode 32, a hole injection layer 33, an electron-emitting layer 34, and a metal cathode 35, which are sequentially arranged from bottom to top. When a forward biased tortoise is applied, the hole is injected by the anode 32, and the electron is injected from the cathode 35. The potential difference caused by the applied electric field causes the electron and the hole to move in the film, and then Lamination occurs in the luminescent layer 34. Part of the energy released by the combination of the pen holes, the luminescent molecules of the luminescent layer are excited to become an excited state. When the luminescent molecules decay from the excited state to the ground state, a certain proportion of the energy is released in the form of photons, and the Φ is released. The light is organic electroluminescence. Please refer to the fourth figure, which is a conventional OLED device. The structure is proposed by Saito et al., 1992, and U.S. Patent No. 5,085,946. The structure of the OLED device includes a transparent substrate 41, a sequence from bottom to top. The transparent anode 42 , the hole transport layer 43 , the light-emitting layer 44 having an electron transport function, and a metal cathode 45 can generate organic electroluminescence. </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; An organic electroluminescence can also be produced by the light-emitting layer 53, which has a hole-passing function, an electron-transport layer 54, and a metal cathode 55. Please refer to the sixth picture for c w Tang et al. at J〇urnal 〇f

Applied Physics 第 65 卷,第 361 〇 頁 〇989)中提出之 換雜型OLED裝置’此〇LED裝置之構造由下至上依 序包含一透明基板61、一透明之陽極62、一電洞傳 輸層63、一單一成分發光層64、一含摻雜染料之發 光層65、一單一成分發光層66及一金屬陰極67,亦 可產生有機電致發光。 請參閱第七圖,為C· H· Chen等人於Applied Physics Letters第85卷,第33〇1頁(2〇〇4)中提出之摻 雜型OLED裝置’此0LED裝置之構造由下至上依序 泰包含-透明基板71、〜透明之陽極72、一電洞注入 層73、一電洞傳輸層74、一含摻雜染料之發光層75、 一電子傳輸層76、-電子注人層77及―金屬陰極 78,可產生有機電致發先。 請參閱第八圖,為SeT.Lee等人於Advaneed FlmCti〇nal Materials 第 15 卷,第 i7i6 頁(2〇〇5)中提 出之OLED裝置,此〇LED t置之構造由下至上依序 包含一透明基板81、1明之陽極82、一電洞注入 200830933 層83、一電洞傳輸層84、一單一成分發光層85、一 電子注入層86及一金屬陰極87,亦可產生有機電致 發光。 本發明人基於多年從事研究與諸多實務經驗,經 多方研究設計與專題探討,遂於本發明提出一種有機 發光二極體及其製造方法,可有效提升有機發光二極 體元件之能量效率,以作為前述期望之實現方式與依 據0 200830933 【發明内容】 有鑑於上述課題,本發明之目的為提供一種有機 發光二極體及其製造方法,其中發光層之組成包含主 體材料及一種以上之客體材料,而電子或電洞載子注 入主體之能障小於注入客體之能障。 緣是,為達上述目的,依本發明之有機發光二極 體裝置’其至少包含有一基板、一第一導電層、一含 Φ 摻雜染料之發光層及一第二導電層,其中,特別是發 光層之組成包含主體材料及一種以上之客體材料,其 中電子或電洞注入主體之能障小於注入客體之能 -障,而能產生高效率的元件效果,有效提升製作元件 ‘ 之良率與品質。元件結構順序為第一導電層位於基板 上,發光層位於第一導電層上方,及第二導電層位於 發光層上方。 茲為使貴審查委員對本發明之技術特徵及所 • 達成之功效有更進一步之暸解與認識,下文謹提供較 佳之實施例及相關圖式以為辅佐之用,並以詳細之說 明文字配合說明如後。 【實施方式】 為讓本發明之上述目的、特徵、和優點能更明顯 易懂,下文依本發明之有機發光二極體裝置及其製造 方法特舉較佳實施例,並配合所附相關圖式,作詳細 200830933 說明如下,其中相同的元件將以相同的元件符號 說明。 请參閱第十—圖,其係本發明之較佳實施 OLED裝置之結構剖面圖。在此實施例中,〇LE: 置的構造由下至上依序包含一基板 121、一第一 層122、一電洞傳輪層123、一含摻雜染料之發 124、一電子傳輸層125---電子注入層126及一 、導電層127。其中,第一導電層122位於基板121 • 電洞傳輸層123位於第一導電層122上方,含摻 料之發光層124位於電洞傳輸層ι23上方,電子 - 層125位於發光層124上方,電子注入層126位 子傳輸層125上方,及第二導電層127位於電子 層126上方。 承上所述,含摻雜染料之發光層124係包含 體材料及一種以上之客體材料,可為螢光發光材 ^ 磷光發光材料,藉以使發光層124發光,其中該 • 層之組成包含主體材料及一種以上之客體材料, 子或電洞載子注入主體材料之能障小於注入客 料之能障。 同時電洞傳輸層 123 —般可 N,N’-bis-( 1 -naphthy)-N,N’ -dipheny 1-1,1 ’ -bi-pheny 4’-diamine (NPB)等電洞傳輸材料,電子傳輸層 一般可為 l,3,5,tris(N-phenyl-benzimidazol- 200830933 benzene(TPBi) ^ tris(8-hydroxyquinoline)alumi- num (Alq3)等電子傳輸材料;電子注入層126 一般可為 lithium fluoride (LiF)等電子注入材料;第二導電層 127 —般可為A1等導電材料;基板121 —般可為玻璃 基板、塑膠基板或金屬基板;第一導電層122 —般可 為氧化銦錫(indium tin oxide,IT0)層或氧化銦鋅 (indium zinc oxide,IZ0 )層。 丨 請參閱第十五圖,其係本發明之較佳實施例之 • 〇LED裝置製造方法之流程圖。此方法包含下列步驟: 步驟S151 :提供一基板; 步驟S152 :形成一第一導電層,位於基板上; 步驟S153 :形成一電洞傳輸層,位於第一導電層 上; 9 步驟S154 :形成一含摻雜染料之發光層,位於電 &gt; 洞傳輪層上方; ⑩ 步驟S155:形成一電子傳輸層,位於發光層上方; 步驟S156.形成一電子注入層,位於電子傳輸層 上方,以及Modified OLED device proposed in Applied Physics, vol. 65, p. 361 〇 989) The structure of the LED device includes a transparent substrate 61, a transparent anode 62, and a hole transport layer from bottom to top. 63. A single component luminescent layer 64, a doped dye-containing luminescent layer 65, a single component luminescent layer 66, and a metal cathode 67 may also produce organic electroluminescence. Please refer to the seventh figure, which is a doped OLED device proposed by C. H. Chen et al. in Applied Physics Letters, Vol. 85, pp. 33〇1 (2〇〇4). The structure of the OLED device is from bottom to top. The sequence includes a transparent substrate 71, a transparent anode 72, a hole injection layer 73, a hole transport layer 74, a doped dye-containing light-emitting layer 75, an electron transport layer 76, and an electron-injecting layer. 77 and the "metal cathode 78" can produce organic electricity. Please refer to the eighth figure, which is an OLED device proposed by SeT. Lee et al. in Advaneed Flm Cti〇nal Materials, Vol. 15, i7i6 (2〇〇5). The structure of the LED t is sequentially included from bottom to top. A transparent substrate 81, an anode 82, a hole injection layer 200830933, a hole transport layer 84, a single component light-emitting layer 85, an electron injection layer 86, and a metal cathode 87 can also produce organic electroluminescence. . The inventor has been engaged in research and many practical experiences for many years, and has been researched and designed by many parties. The present invention proposes an organic light emitting diode and a manufacturing method thereof, which can effectively improve the energy efficiency of the organic light emitting diode element. The present invention provides an organic light-emitting diode and a method for fabricating the same, wherein the composition of the light-emitting layer comprises a host material and more than one guest material. The energy barrier of the electron or hole carrier injected into the body is smaller than the energy barrier of the injected object. In order to achieve the above object, an organic light-emitting diode device according to the present invention includes at least one substrate, a first conductive layer, a light-emitting layer containing a Φ-doped dye, and a second conductive layer, wherein The composition of the light-emitting layer comprises a host material and more than one guest material, wherein the energy barrier of the electron or the hole injected into the body is smaller than the energy barrier of the injected object, and the high-efficiency component effect can be produced, thereby effectively improving the yield of the fabricated component. With quality. The component structure is such that the first conductive layer is on the substrate, the light emitting layer is above the first conductive layer, and the second conductive layer is above the light emitting layer. In order to provide a better understanding and understanding of the technical features of the present invention and the effects achieved by the reviewers, the following examples are provided to facilitate the use of the preferred embodiments and related drawings, with detailed explanations such as Rear. DETAILED DESCRIPTION OF THE INVENTION In order to make the above objects, features, and advantages of the present invention more comprehensible, the organic light-emitting diode device and the method of manufacturing the same according to the present invention are specifically described in the following, and the related drawings are attached. In the following, the detailed description of 200830933 is as follows, wherein the same elements will be denoted by the same element symbols. Please refer to the tenth-figure, which is a cross-sectional view showing the structure of a preferred embodiment of the present invention. In this embodiment, the structure of the 〇LE: includes a substrate 121, a first layer 122, a hole transport layer 123, a doped dye-containing hair 124, and an electron transport layer 125, which are sequentially arranged from bottom to top. --- Electron injection layer 126 and a conductive layer 127. The first conductive layer 122 is located on the substrate 121. The hole transport layer 123 is located above the first conductive layer 122, and the light-emitting layer 124 containing the dopant is located above the hole transport layer ι23. The electron-layer 125 is located above the light-emitting layer 124. The injection layer 126 is above the bit transfer layer 125, and the second conductive layer 127 is above the electron layer 126. As described above, the doped dye-containing luminescent layer 124 comprises a bulk material and more than one guest material, which may be a fluorescent luminescent material, a phosphorescent luminescent material, whereby the luminescent layer 124 emits light, wherein the layer comprises a main body The material and more than one guest material, the energy barrier of the sub- or hole carrier injected into the host material is less than the energy barrier of the injected material. At the same time, the hole transport layer 123 can generally be N, N'-bis-(1 -naphthy)-N, N'-dipheny 1-1, 1 '-bi-pheny 4'-diamine (NPB) and other hole transport materials. The electron transport layer may generally be an electron transport material such as 1,3,5, tris (N-phenyl-benzimidazol-200830933 benzene (TPBi) ^ tris (8-hydroxyquinoline) alumi- num (Alq3); the electron injection layer 126 is generally The material is injected into the electrons such as lithium fluoride (LiF); the second conductive layer 127 is generally a conductive material such as A1; the substrate 121 is generally a glass substrate, a plastic substrate or a metal substrate; and the first conductive layer 122 is generally oxidized. Indium tin oxide (IT0) layer or indium zinc oxide (IZ0) layer. Please refer to the fifteenth figure, which is a flow chart of the method for manufacturing the LED device according to the preferred embodiment of the present invention. The method includes the following steps: Step S151: providing a substrate; Step S152: forming a first conductive layer on the substrate; Step S153: forming a hole transport layer on the first conductive layer; 9 Step S154: forming a light-emitting layer containing a doped dye, located in the electric &gt;Square; ⑩ Step S155: forming an electron transport layer disposed over the light emitting layer; forming a step S156 the electron injection layer, an electron transporting layer located above, and.

步驟S157:形成一第二導電層’位於電子注入層 上方; S 其中,發光層之組成包含主體材料及—種以上之 客體材料,而電子或電洞注入主體之能障小於注入客 200830933 體之能障。電洞傳輸層一般可為NPB等電洞傳輸材 料,電子傳輸層一般可為TPBi、Alq3等電子傳輸材料; 電子注入層一般可為LiF等電子注入材料;第二導電 層一般可為A1等導電材料;基板一般可為玻璃基板、 塑膠基板或金屬基板。 請參閱表一,係為依據本發明所列舉之實施例及 比較例之發光效能對照表。 200830933 【實施例1】 實施例1為應用本發明所製成之OLED裝置, 裝置結構係可參照第十二圖所示,而能階圖請參考 第十四圖,其製作過程為:將ITO透明導電玻璃依 序以清潔劑、去離子水、丙酮及異丙醇作超音波震 盪清洗,並置入煮沸之雙氧水中進行表面處理,隨 φ 後以氮氣流乾燥其表面後,將其置入一真空腔體 中,待真空達l(T5Torr壓力下,以熱蒸鍍方式,依 ^ 序鍍製45奈米之NPB電洞傳輸層123、30奈米的 • 發光層124、40奈米的TPBi電子傳輸層125、0.5 奈米的LiF電子注入層126、及150奈米的鋁電極 127於ITO透明導電玻璃上。其中發光層124為摻 雜染料之發光層,其主體材料為DPASN,攙雜之客 體染料為Rubrene,摻雜濃度為0.5 wt%,於亮度100 cd/m2時,其能量轉換效率為9.5 lm/W,最大發光 亮度 18,100 cd/m2,其 CIE 色座標為(0.32, 0.36)。 〆 *s 、Ο〆 13 200830933Step S157: forming a second conductive layer 'being above the electron injection layer; S wherein the composition of the light-emitting layer comprises the host material and more than one of the guest materials, and the energy barrier of the electron or hole injection body is less than that of the injected user 200830933 Energy barrier. The hole transport layer can generally be a hole transport material such as NPB, and the electron transport layer can generally be an electron transport material such as TPBi or Alq3; the electron injection layer can generally be an electron injection material such as LiF; and the second conductive layer can generally be a conductive material such as A1. Material; the substrate can generally be a glass substrate, a plastic substrate or a metal substrate. Referring to Table 1, the luminous efficacy comparison table of the examples and comparative examples according to the present invention is shown. 200830933 [Embodiment 1] Embodiment 1 is an OLED device manufactured by applying the present invention. The device structure can be referred to the twelfth figure, and the energy diagram can be referred to the fourteenth figure. The fabrication process is as follows: ITO The transparent conductive glass is ultrasonically pulverized and cleaned with detergent, deionized water, acetone and isopropanol, and placed in boiling hydrogen peroxide for surface treatment. After φ, the surface is dried by nitrogen flow, and then placed. In a vacuum chamber, the vacuum is up to 1 (T5Torr pressure, hot-drafting, 45 nm NPB hole transport layer 123, 30 nm • luminescent layer 124, 40 nm The TPBi electron transport layer 125, the 0.5 nm LiF electron injection layer 126, and the 150 nm aluminum electrode 127 are on the ITO transparent conductive glass. The luminescent layer 124 is a dye-doped luminescent layer, and the host material is DPASN, noisy. The guest dye is Rubrene with a doping concentration of 0.5 wt%. At a luminance of 100 cd/m2, the energy conversion efficiency is 9.5 lm/W, the maximum luminance is 18,100 cd/m2, and the CIE color coordinate is (0.32, 0.36). 〆*s, Ο〆13 200830933

【實施例2】[Example 2]

ΐ 為比較本發明方式與先前技藝所製造之OLED i 裝置之差異,附上實施例2為依據習知之OLED裝 置,其裝置結構如第十二圖所示,相較於實施例1, 其OLED裝置結構之發光層124為含摻雜染料之發 光層,其主體材料為ADN,摻雜之客體染料為 Rubrene,其摻雜濃度為0.3 wt%,能階圖請參考第十 六圖,由於電子及電洞注入主體材料ADN之能障均 ) • 大於注入客體材料Rubrene之能障,使得此OLED 裝置之效能大幅下降,其各項發光效能如表一所示。ΐ In order to compare the difference between the method of the present invention and the OLED i device manufactured by the prior art, the embodiment 2 is attached to the conventional OLED device, and the device structure is as shown in the twelfth figure. Compared with the embodiment 1, the OLED is The light-emitting layer 124 of the device structure is a light-emitting layer containing a doping dye, the host material is ADN, the doped guest dye is Rubrene, and the doping concentration is 0.3 wt%, and the energy level diagram is referred to the sixteenth figure, due to the electron And the energy barrier of the hole injection into the host material ADN) • The energy barrier of the injection of the guest material Rubrene makes the performance of the OLED device greatly reduced, and the luminous efficacy of each of the OLED devices is shown in Table 1.

14 200830933 以上所述僅為舉例性,而非為限制性者。任何未脱離 本發明之精神與範嘴,而對其進行之等效修改或變更,均 應包含於後附之申請專利範圍中。 【圖式簡單說明】 第-圖其係依據習知之0LED裝置之結構剖面圖; ‘ 第二圖其係依據習知之另一 0 L E D裝置之結構剖面 圖, 第三圖為習知之OLED裝置之結構剖面圖; - 第四圖為習知之另一 OLED裝置之結構剖面圖; 第五圖為習知之OLED裝置之結構剖面圖; 第六圖為習知之另一 OLED裝置之結構剖面圖; ^ 第七圖為習知之另一 OLED裝置之結構剖面圖; 第八圖為習知之另一 OLED裝置之結構剖面圖; 第九圖其係本發明之0LED裝置結構剖面圖及其能 階示意圖; 第十圖其係本發明之OLED裝置結構剖面圖及其能 階示意圖; 第十一圖其係本發明之OLED裝置結構剖面圖及其 能階示意圖; 15 200830933 第十二圖其係本發明之OLED裝置結構剖面圖及其 能階示意圖; 第十三圖其係本發明之OLED裝置結構剖面圖及其 能階示意圖; 第十四圖其係本發明之較佳實施例之OLED裝置之 能階圖; 第十五圖其係本發明之較佳實施例之O L E D裝置之 製造方法之流程圖; 第十六圖其係比較本發明與先前技藝之差異,所例 舉之OLED裝置之能階圖。 【主要元件符號說明】 II、 21、31、41、51、61、71、81、91、101、 III、 121、131、:基板; 12 :陽極; 13、43、63、74、84、103、123、133 :電洞傳 輸層; 1301 :電洞; 23、33、73、83 :電洞注入層; 14 :有機發光層; 15、54、76、114、125、135 :電子傳輸層; 16 200830933 1501 :電子; 16、77、86、94、105、115、126、136 :電子注 入層; 17 :陰極; 22 、 32 、 42 、 52 、 62 、 72 、 82 、 92 、 102 、 112 、 122、132 :第一導電層; 24 :發光層;14 200830933 The above description is for illustrative purposes only and not as a limitation. Any equivalent modifications or alterations of the present invention are intended to be included in the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a structural sectional view of a conventional OLED device according to a conventional one; FIG. 2 is a structural sectional view of another 0 LED device according to a conventional one, and FIG. 3 is a structure of a conventional OLED device. FIG. 4 is a structural sectional view of another conventional OLED device; FIG. 5 is a structural sectional view of a conventional OLED device; and FIG. 6 is a structural sectional view of another conventional OLED device; BRIEF DESCRIPTION OF THE DRAWINGS FIG. 8 is a cross-sectional view showing the structure of another OLED device; FIG. 9 is a cross-sectional view showing the structure of another OLED device according to the present invention; FIG. 9 is a cross-sectional view showing the structure of the OLED device of the present invention and its energy level diagram; It is a sectional view of the structure of the OLED device of the present invention and a schematic diagram of its energy level; FIG. 11 is a cross-sectional view of the structure of the OLED device of the present invention and a schematic diagram thereof. 15 200830933 FIG. 12 is a structure of the OLED device of the present invention. FIG. 13 is a cross-sectional view showing the structure of the OLED device of the present invention and its energy level diagram; FIG. 14 is an energy level diagram of the OLED device according to the preferred embodiment of the present invention; FIG fifteen lines which the present invention is preferably a flowchart of a method for producing L E D O Example of embodiment of the device; FIG its sixteenth invention based comparison with the previous art of the difference, give the energy level of the OLED device of FIG embodiment. [Explanation of main component symbols] II, 21, 31, 41, 51, 61, 71, 81, 91, 101, III, 121, 131, substrate; 12: anode; 13, 43, 63, 74, 84, 103 , 123, 133: hole transport layer; 1301: hole; 23, 33, 73, 83: hole injection layer; 14: organic light-emitting layer; 15, 54, 76, 114, 125, 135: electron transport layer; 16 200830933 1501 : electrons; 16, 77, 86, 94, 105, 115, 126, 136: electron injection layer; 17: cathode; 22, 32, 42 , 52 , 62 , 72 , 82 , 92 , 102 , 112 , 122, 132: a first conductive layer; 24: a light-emitting layer;

34、44 :具電子傳輸功能之發光層; 53 :具電洞傳輸功能之發光層; 64、 8 5 :單一成份發光層; 65、 75、93、104、113、124、134 :含摻雜染料 之發光層; 25 、 35 、 45 、 55 、 67 、 78 、 87 、 95 、 106 、 116 、 127、137 :第二導電層; S151〜S157 :流程步驟。 1734, 44: luminescent layer with electron transport function; 53: luminescent layer with hole transmission function; 64, 8 5: single component luminescent layer; 65, 75, 93, 104, 113, 124, 134: doped Light-emitting layer of dye; 25, 35, 45, 55, 67, 78, 87, 95, 106, 116, 127, 137: second conductive layer; S151~S157: process steps. 17

Claims (1)

200830933 十、申請專利範圍: 1、 一種有機發光二極體裝置結構,至少包含: 一基板; 一第一導電層,位於該基板上; 一發光層,位於該第一導電層上方;以及 一第二導電層,位於該發光層上方; 其中該發光層之組成包含主體材料及一種以 上之客體材料,而電子或電洞載子注入主體材 料之能障小於注入客體材料之能障。 2、 如申請專利範圍第1項所述之有機發光二極體 裝置,其中該發光層可為螢光發光材料,藉以使 該發光層發出螢光。 3、 如申請專利範圍第1項所述之有機發光二極體 裝置,其中該發光層可為磷光發光材料,藉以使 該發光層發出構光。 4、 如申請專利範圍第1項所述之有機發光二極體 裝置,其中該發光層可同時為螢光及磷光發光材 料,藉以使該發光層發光。 5、 如申請專利範圍第1項所述之有機發光二極體 裝置,其中該第一導電層及該發光層間更包含 形成至少一功能性辅助層。 6、 如申請專利範圍第1項所述之有機發光二極體 裝置,其中該發光層及該第二導電層間更包含形 成至少一功能性辅助層。 7、 如申請專利範圍第5項所述之該功能性辅助 層,包含載子注入、載子傳輸層亦或是載子阻擋 200830933 ο 8、 如申請專利範圍第6項所述之該功能性辅助 層,包含載子注入、載子傳輸層亦或是載子阻擋 層。 9、 一種有機發光二極體裝置之製造方法,至少包 含·· 一基板; 一第一導電層,位於該基板上; 一發光層,位於該第一導電層上方;以及 一第二導電層,位於該發光層上方; 其中該發光層之組成包含主體材料及一種以 上之客體材料,而電子或電洞载子注入主體材 料之能障小於注入客體材料之能障。 10、 如申請專利範圍第9項所述之有機發光二極體 裝置之製造方法,其中該發光層可為螢光發光材 料,藉以使該發光層發出螢光。 11、 如申請專利範圍第9項所述之有機發光二極體 裝置之製造方法,其中該發光層可為磷光發光材 料,藉以使該發光層發出磷光。 12、 如申請專利範圍第9項所述之有機發光二極體 裝置之製造方法,其中該發光層可同時為螢光及 磷光發光材料,藉以使該發光層發光。 13、 如申請專利範圍第9項所述之有機發光二極體 裝置之製造方法,其中該第一導電層及該發光 層間更包含形成至少一功能性辅助層。 14、 如申請專利範圍第9項所述之有機發光二極體 200830933 裝置之製造方法,其中該發光層及該第二導電層 間更包含形成至少一功能性辅助層。 15、 如申請專利範圍第13項所述之該功能性辅助 層,包含載子注入、載子傳輸層亦或是載子阻擋 層。 16、 如申請專利範圍第14項所述之該功能性辅助 層,包含載子注入、載子傳輸層亦或是載子阻擋 層0200830933 X. Patent application scope: 1. An organic light emitting diode device structure, comprising at least: a substrate; a first conductive layer on the substrate; a light emitting layer above the first conductive layer; and a first The second conductive layer is located above the light emitting layer; wherein the light emitting layer comprises a host material and more than one guest material, and the electron or hole carrier is injected into the host material with an energy barrier smaller than that of the implanted guest material. 2. The organic light emitting diode device of claim 1, wherein the light emitting layer is a fluorescent light emitting material, whereby the light emitting layer emits fluorescence. 3. The organic light emitting diode device of claim 1, wherein the light emitting layer is a phosphorescent material, whereby the light emitting layer emits light. 4. The organic light emitting diode device of claim 1, wherein the light emitting layer is simultaneously a fluorescent and phosphorescent material, whereby the light emitting layer emits light. 5. The organic light emitting diode device of claim 1, wherein the first conductive layer and the light emitting layer further comprise at least one functional auxiliary layer. 6. The organic light emitting diode device of claim 1, wherein the light emitting layer and the second conductive layer further comprise at least one functional auxiliary layer. 7. The functional auxiliary layer as described in claim 5, comprising a carrier injection, a carrier transport layer or a carrier block 200830933. 8. The functionality as described in claim 6 The auxiliary layer includes a carrier injection, a carrier transport layer or a carrier blocking layer. 9. A method of fabricating an organic light emitting diode device, comprising: at least one substrate; a first conductive layer on the substrate; a light emitting layer over the first conductive layer; and a second conductive layer, Located above the luminescent layer; wherein the luminescent layer comprises a host material and more than one guest material, and the energy barrier of the electron or hole carrier injected into the host material is less than the energy barrier of the implanted guest material. 10. The method of fabricating an organic light-emitting diode device according to claim 9, wherein the light-emitting layer is a fluorescent light-emitting material, whereby the light-emitting layer emits fluorescence. 11. The method of fabricating an organic light-emitting diode device according to claim 9, wherein the light-emitting layer is a phosphorescent material, whereby the light-emitting layer emits phosphorescence. 12. The method of fabricating an organic light-emitting diode device according to claim 9, wherein the light-emitting layer is simultaneously a fluorescent and phosphorescent material, whereby the light-emitting layer emits light. 13. The method of fabricating an organic light-emitting diode device according to claim 9, wherein the first conductive layer and the light-emitting layer further comprise at least one functional auxiliary layer. 14. The method of fabricating an organic light emitting diode according to claim 9, wherein the light emitting layer and the second conductive layer further comprise at least one functional auxiliary layer. 15. The functional auxiliary layer according to claim 13 of the patent application, comprising a carrier injection, a carrier transport layer or a carrier blocking layer. 16. The functional auxiliary layer as described in claim 14 of the patent application, comprising a carrier injection, a carrier transport layer or a carrier blocking layer. 2020
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