TW200827789A - Manufacturing method of composite polarizing plate-based chip - Google Patents

Manufacturing method of composite polarizing plate-based chip Download PDF

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Publication number
TW200827789A
TW200827789A TW96131856A TW96131856A TW200827789A TW 200827789 A TW200827789 A TW 200827789A TW 96131856 A TW96131856 A TW 96131856A TW 96131856 A TW96131856 A TW 96131856A TW 200827789 A TW200827789 A TW 200827789A
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Taiwan
Prior art keywords
polarizing plate
phase difference
composite
difference plate
composite polarizing
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TW96131856A
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Chinese (zh)
Inventor
Yuichiro Kunai
Akiko Nakazono
Yoshiki Matsuoka
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Sumitomo Chemical Co
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Publication of TW200827789A publication Critical patent/TW200827789A/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)

Abstract

A composite polarizing plate is formed by overlaying at least a phase difference plate (20) formed by a coating layer having a thickness of not greater than 30 μm and a polarizing plate (10). The composite polarizing plate is sandwiched by pressure-sensitive adhesive layers (30, 30) having an elastic modulus in tension not greater than 100 Mpa. When cutting the composite polarizing plate into a product size of a chip, a cutting blade is introduced from the side not including the optical member having the largest F which is defined by Expression: F [Mpa.mm] = elastic modulus intension in the direction vertical to the cut side among all optical members existing above and below the phase difference plate (20) formed by the coating layer, i.e., from the surface of the side not including the polarizing plate (10).

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200827789 九、發明說明 【發明所屬之技術領域】 本發明係關於液晶顯示器中所組裝之複合偏光板製品 晶片之製造方法。詳細而言,係關於提供一種,在包含由 塗膜層所構成之脆弱的光學構件之複合偏光板中,於裁切 爲製品尺寸的晶片時,可抑制該脆弱的光學構件中所可能 產生之龜裂或起伏等現象之複合偏光板製品晶片之製造方 法。 【先前技術】 近年來,消耗電力低、能夠於低電壓進行動作、輕量 且薄型之液晶顯示器,係作爲行動電話或可攜式資訊終端 、電腦用的顯示器、電視等之資訊用顯示裝置而急速普及 。隨著液晶技術的發展,各種模式的液晶顯示器逐漸被提 出,並且如反應速度或對比、窄視角之液晶顯示器的特有 問題點亦逐漸被消除。然而,液晶顯示器之視角仍舊被視 爲較映像管(Cathode Ray Tube:陰極射線管)還狹窄, 因此目前仍進行擴大視角之各種嘗試。 一般爲了擴大液晶顯示器的視角,較多係採用稱爲相 位差板之光學構件。相位差板存在有種種型式,例如有將 高分子樹脂薄膜予以定向而產生相位差之樹脂定向型式的 相位差板,或是將具有光學異向性的化合物塗膜於基材薄 膜上使產生配向之塗膜型式的相位差板,此外,亦有將具 有光學異向性的化合物分散於黏結樹脂中而製膜之後,再 -5* 200827789 予以定向之塗膜+定向型式的相位差板。 最近,於液晶顯示器的薄化及成本降低的潮流當中, 此等相位差板的薄膜化亦急速進行,目前,20 μηι以下的 相位差板亦不難見到。當中,較多亦逐漸採用可實現 1 5 μιη以下的終極厚度之由塗膜層所構成之相位差板。 在此,所謂由塗膜層所構成之相位差板,是指將由樹 脂的溶液、或是如具有折射率異向性之塡充劑般的物質予 φ 以分散而成之溶液、或是液晶化合物的溶液等所形成之塗 佈液,塗佈於基材上而製作之光學層,以下亦有略稱爲「 塗膜相位差板」之情況。該塗膜相位差板,可因應必要與 其他相位差板組合而構成複合相位差板,較多係與偏光板 層積而使用。若形成塗膜層之基材具有期望的光學功能, 則可直接作爲複合相位差板使用,或是可於經脫模處理後 的聚乙烯對苯二甲酸酯薄膜等之剝離性較佳的基材上先形 成塗膜層,之後再轉印至其他光學構件而使用。 # 例如於曰本特開2〇〇5_3〇929〇號公報(專利文獻1 ) 中係揭示有,依序層積有偏光板、黏著劑層、及塗膜相位 差板之複合偏光板。此外,於日本特開2005-338215號公 報(專利文獻2 )中係揭示有,在由往面內配向之透明樹 脂薄膜所形成之相位差板上,夾介黏著劑層而層積有塗膜 相位差板,且於該塗膜相位差板的表面上設置黏著劑層而 構成複合相位差板,並記載有於該樹脂相位差板側層積偏 光板者。再者,於日本特開2006_1 0912號公報(專利文 獻3 )中係揭示有,將以脂肪族二異氰酸酯(Diis〇cyanate 200827789 )爲基質之氨基甲酸酯樹脂作爲黏結劑,且將包含其與有 機改質黏土複合體之組成物形成爲薄膜狀而構成塗膜相位 差板,並記載有夾介黏著劑層將該塗膜相位差板層積於偏 光板而構成複合偏光板者。 然而,此塗膜相位差板,由於其厚度較薄而無法獲得 可承受衝擊之充分的強度,因而具有於加工製程中的應力 可能形成龜裂或起伏之問題點。於形成此龜裂或起伏時, 會產生因相位差的局部變化所造成之光漏或是因光的散射 所造成之光漏,而導致液晶顯示品質的顯著降低之問題。 尤其於行動電話或PDA之中小型液晶顯示器中,近 年來除了顯示部之大型化的發展外,顯示器外型尺寸的小 型化亦逐漸進行,因此,貼合於液晶單元之複合偏光板, 其從偏光板開始至實際用於顯示之部分(顯示區)爲止的 邊限極爲狹窄之「窄框緣」構成,係逐漸成爲主流。於該 「窄框緣」構成時,從複合偏光板的大型板切割爲製品晶 片時,於由塗膜層所構成之相位差板當中所產生之龜裂或 起伏的行進距離,極可能造成問題。就該成因來看,降低 晶片切割時之龜裂或起伏的行進距離者,係成爲重要的課 題。在此所謂龜裂或起伏的行進距離,是指從切割邊所產 生之龜裂或起伏,往製品晶片的內側所延伸之距離。 因此’本發明之目的在於提供一種,於進行包含較薄 且脆弱的層之複合偏光板的晶片切割時,可減少所產生之 龜裂或起伏等現象之複合偏光板製品晶片之製造方法。 本發明者們,係針對於進行包含如塗膜相位差板般之 -7- 200827789 極薄且脆弱的層之複合偏光板的晶片切割時,如何抑制容 易產生之龜裂或起伏等現象者進行精心的硏究。結果發現 ,於至少層積有塗膜相位差板及偏光板,且該塗膜相位差 板的上下方由感壓式接著劑層所包夾之複合偏光板中,若 以上述塗膜相位差板的位置爲基準,從與存在有偏光板的 一側爲相反之一側切入刀刃而進行晶片切割,則可降低龜 裂或起伏的行進距離。 此外亦發現到,對於配置於較薄且脆弱之塗膜相位差 板的兩側之所有的層,求取各層的抗張彈性率與厚度的積 ,並著眼於該値爲最大之光學構件,以上述塗膜相位差板 的位置爲基準,若從包含上述抗張彈性率與厚度的積爲最 大之光學構件之一側切入刀刃而裁切複合偏光板,則塗膜 相位差板中所產生之龜裂或起伏的行進距離會變大,相反 的,若從不包含上述抗張彈性率與厚度的積爲最大之光學 構件之一側切入刀刃而進行裁切,則可充分減少龜裂或起 伏的行進距離。因此,本發明係根據如此的發現,進行更 進一步的探討而完成本發明。 【發明內容】 亦即,根據本發明,係提供一種複合偏光板製品晶片 之製造方法,爲將複合偏光板予以晶片切割成製品尺寸之 複合偏光板製品晶片之製造方法,此複合偏光板係至少層 積有由厚度3 0 μηι以下的塗膜層所形成之相位差板及偏光 板’由該塗膜層所形成之相位差板,其上下方係由抗張彈 -8- 200827789 性率爲lOOMPa以下的感壓式接著劑層所包夾,其特 :以由該塗膜層所形成之相位差板的位置爲基準,於 於其上下方之所有的光學構件中,係從不包含由右支 (MPa · mm )=與切割邊垂直之方向的抗張彈性率( )X厚度(mm)所定義的F値爲最大之光學構件之一 面,切入切割用刀刃。 此外,根據本發明,亦一種複合偏光板製品晶片 φ 造方法,爲將複合偏光板予以晶片切割成製品尺寸之 偏光板製品晶片之製造方法,此複合偏光板係至少層 :由厚度30μχη以下的塗膜層所形成之相位差板;及 光元件的兩側具有透明保護層之偏光板,由該塗膜層 成之相位差板,其上下方係由抗張彈性率爲lOOMPa 的感壓式接著劑層所包夾,其特徵爲:以由該塗膜層 成之相位差板的位置爲基準,從與存在有上述偏光板 側爲相反側,切入切割用刀刃。 【實施方式】 以下係適當地參照附加圖式,詳細說明本發明的 型態。於本發明中,係以下列複合偏光板爲對象並將 合偏光板予以晶片切割成製品尺寸,此複合偏光板係 層積有由厚度30μπι以下的塗膜相位差板及偏光板, 膜相位差板的上下方係由抗張彈性率爲lOOMPa以下 壓式接著劑層所包夾。 第1圖係顯示,於本發明中設定爲對象之複合偏 徵爲 存在 :·· F MPa 側的 之製 複合 積有 於偏 所形 以下 所形 之一 實施 此複 至少 該塗 的感 光板 -9- 200827789 的層構成之例子之剖面模式圖。此例的複合偏光板,從圖 式的上側依序層積有保護膜60/偏光板10/感壓式接著劑層 30/由定向樹脂所構成之相位差板40/感壓式接著劑層30/ 塗膜相位差板20/感壓式接著劑層30/剝離膜70之合計爲 8層。 偏光板1 〇 —般係於偏光件的兩面具有保護層。偏光 件係由,於聚乙烯醇系樹脂薄膜上使碘或雙色性有機染料 等之雙色性色素吸附配向而成者所構成。配置於該兩面之 保護層,例如可由三醋酸纖維素或二醋酸纖維素般之纖維 素系樹脂、以雙環庚烯般之多環式的環狀烯烴爲主要單體. 之環狀聚烯烴系樹脂、以乙烯或丙烯般之鏈狀烯烴爲主要 單體之聚烯烴系樹脂、由聚碳酸酯系樹脂等所構成之透明 樹脂薄膜所構成。此外,亦可採用由這些透明樹脂所構成 且具有相位差板的功能之薄膜,構成保護層。此外,亦可 於這些保護層上,設置反射防止層或硬膜等之表面處理層 。於包含偏光件及保護層且設置有表面處理層時,偏光板 1 0可將包含這些層之全體視爲1層。 塗膜相位差板20,如上述般,爲將由樹脂的溶液、或 是如具有折射率異向性之塡充劑般的物質予以分散而成之 溶液、或是液晶化合物的溶液等所形成之塗佈液,塗佈於 基材上而製作之光學構件。塗膜相位差板20之較佳的例 子’例如有將於有機溶劑中含有有機改質黏土複合體及黏 結劑樹脂之塗佈液塗佈於基材上,並去除溶劑而形成者。 由於塗膜相位差板20爲藉由塗膜所形成之層,因此其厚 -10- 200827789 度相對較小,具體而言可形成爲30μπι以下,且更可形成 爲15μιη以下。關於塗膜相位差板20,其厚度的下限並無 特別限制’例如可形成爲1 μπι。 於本發明中設定爲對象之複合偏光板,其塗膜相位差 板2 0的上下兩面係由感壓式接著劑層3 0、3 0所包夾。因 此,此塗膜相位差板20與其周邊的構件,例如可藉由下 列方法予以層積。亦即,於經脫模處理後的聚乙烯對苯二 甲酸酯薄膜等之剝離性較佳的轉印基材上先形成塗膜層, 之後於該塗膜層的暴露面上形成一邊的感壓式接著劑層30 ,將轉印基材予以剝離去除後,於該剝離面上因應必要再 與其他光學構件一同設置另一邊的感壓式接著劑層30。第 1圖所示之構成可藉由下列方法所製造,首先於轉印基材 (圖中未顯示)的表面預先形成塗膜相位差板20,於該暴 露面上,將剝離膜70上所設置之感壓式接著劑層3 0或相 位差板40的單面上所設置之感壓式接著劑層30予以貼著 ,將轉印基材予以剝離去除後,於該剝離面上,將另一邊 附有相位差板40之感壓式接著劑層30或附有剝離膜70 之感壓式接著劑層30予以貼合。 於以有機改質黏土複合體及黏結劑樹脂構成塗膜相位 差板20時,所使用之有機改質黏土複合體,爲有機物與 黏土礦物之複合體,具體而言,例如可使用將具有層狀構 造之黏土礦物與有機化合物予以複合化而成,且可分散於 有機溶劑者。具有層狀構造之黏土礦物,例如有膨潤石( Smectite )族或膨潤性雲母等,可藉由其陽離子交換能而 -11 - 200827789 與有機化合物複合化。在這當中,由於膨潤石族具有較佳 的透明性,因而較爲理想。屬於膨潤石族者,例如有矽酸 鎂鋰黏土(Hector ite)、蒙特石(Montmorillonite)、音 土( Bentonite )等。在這當中,就不純物較少且透明性較 佳等之方面來看,經化學合成者較爲理想。尤其粒徑控制 爲較小之合成矽酸鎂鋰黏土,由於可抑制可見光之散射, 因而較爲理想。 與黏土礦物複合化之有機化合物,例如有可與黏土礦 物的氧原子或氫氧基反應之化合物,以及可與交換性陽離 子進行交換之離子性化合物等,有機改質黏土複合體只要 可於有機溶劑中膨潤或分散,則並無任何限制,具體而言 有含氮化合物等。含氮化合物例如有1級、2級或3級的 胺、4級銨化合物等。在這當中,就容易進行陽離子交換 等之方面來看,4級銨化合物較爲理想。4級銨化合物, 例如有具有長鏈烷基者,以及具有烷醚鏈者等。在這當中 ,較理想爲具有碳數1〜30的烷基,n=l〜50的-(CH2CH ( CH3) Ο) nH 基,或是-(CH2CH2CH20) nH 基之 4 級銨化 合物。更理想爲具有碳數6〜10的烷基者。 於以有機化合物及屬於膨潤石族之黏土礦物構成有機 改質黏土複合體時,該屬於膨潤石族之黏土礦物,只要爲 與有機化合物形成複合體之狀態下可於有機溶劑中膨潤或 分散,則並無任何限制,但是交換性陽離子於離子性有機 化合物中不易進行交換之黏土礦物,乃不易於有機溶劑中 分散。於屬於膨潤石族之黏土礦物的合成品中,較多係於 -12- 200827789 該表面上附著有氫氧化鎂等之鎂化合物,若鎂化合物的量 較多,則會妨礙交換性陽離子部位。因此,以酸洗淨等將 存在於表面之鎂化合物予以去除而降低鎂的存在比例者, 具體而言,鎂對矽的4原子之原子比(Mg/Si4 )爲未滿 2.73者,由於在有機溶劑中容易分散,因而較爲理想。例 如,屬於膨潤石族之矽酸鎂鋰黏土,如化學大辭典編輯委 員會編「化學大辭典」(共立出版社株式會社(日本), 昭和.3 7年2月2 8日出版發行)所表示般,典型係以 Na〇.66(Mg5.34Li〇.66)Si8〇2〇(〇H)4.nH2〇 或 Nai/3(Mg8/3Lii/3) Si4〇iG(〇H)2.mH20之組成式所表示,該狀態下的Mg/Si4 原子比爲2.67,於合成矽酸鎂鋰黏土中,由於上述存在於 表面之鎂化合物,Mg/Si4原子比係較2.67稍大。 較理想爲,以酸洗淨等將該存在於表面之鎂化合物予 以去除,使Mg/Si4原子比盡可能接近於2.67。於包含矽 酸鎂鋰黏土或合成矽酸鎂鋰黏土之膨潤石族黏土礦物中, 鈉係成爲交換性陽離子,由於此與有機化合物,例如4級 銨基交換而成爲有機改質黏土複合體,所以於改質前後 Mg/Si4原子比並未改變。因此,對於將有機改質黏土複合 體的Mg/Si4原子比設定爲未滿2.73,以酸洗淨由有機物 所改質前的黏土礦物之方式較爲有效。 於有機改質黏土複合體中,較多係因製造時所使用的 原料而混入有含氯化合物之不純物。若氯化物的量較多, 則於形成塗膜相位差板後,可能從薄膜中滲出。此時於夾 介感壓式接著劑將塗膜相位差板貼合於液晶單元玻璃時, -13- 200827789 黏著力可能會隨著時間的經過而大幅降低。因此,較理想 係藉由洗淨從有機改質黏土複合體中去除氯化物,若在使 當中所含之氯的量成爲2000ppm以下之狀態下含有於有機 溶劑中,則可抑制該黏著力的降低。氯化物的去除可藉由 對有機改質黏土複合體進行水洗之方法而進行。 有機改質黏土複合體可組合2種以上而使用。適合的 有機改質黏土複合體市售品,例如有分別由 CO-OP Chemical株式會社(日本)以“Rusentit STN(音譯)”或 “Rusentit SPN(音譯)”的商品名稱所販售之合成矽酸鎂鋰 黏土與4級銨化合物之複合體等。 可分散於有機溶劑之有機改質黏土複合體,就塗膜的 容易度或光學特性的發現性、力學特性等觀點來看,可與 黏結劑樹脂組合使用。與有機改質黏土複合體倂用之黏結 劑樹脂,較理想係使用可溶解於甲苯、二甲苯、丙酮、醋 酸乙酯等有機溶劑者,尤其是玻璃轉移溫度爲室溫以下者 (約20°C以下者)。此外,爲了獲得適用於液晶顯示器時 所需之良好的耐濕特性及處置性,較理想爲具有排水性。 此類較理想的黏結劑樹脂,例如有聚乙烯醇縮丁醛( Polyvinyl Butyral)或聚乙烯醇縮甲醛(Polyvinyl Formal )般之聚乙燒醇縮醛(Polyvinyl Acetal)樹脂;醋酸丁酸 纖維素(Cellulose Acetate Butyrate)般之纖維素系樹脂 ;丙烯酸丁酯般之丙烯系樹脂;氨基甲酸酯樹脂;丙烯酸 甲酯系樹脂;環氧樹脂;聚酯樹脂等。 關於適當的黏結劑樹脂市售品,例如有電氣化學工業 -14- 200827789 株式會社(日本)以“Denka Butyral # 3000-K”的商品名稱 所販售之聚乙烯醇的醛變性樹脂;東亞合成株式會社(曰 本)以“ARON S1601”的商品名稱所販售之丙烯酸系樹脂 :住化Bayer Urethane株式會社(日本)以“SBU Lacquer 0866”的商品名稱所販售之以二異氰酸異佛爾酮( Isopho rone Diisocyanate )爲基質之氨基甲酸酯樹脂等。 在這當中,黏結劑樹脂較理想爲以二異氰酸異佛爾酮爲基 質之氨基甲酸酯樹脂。 可分散於有機溶劑之有機改質黏土複合體與黏結劑樹 脂的比例,前者:後者的重量比爲1 : 2〜1 0 : 1的範圍, 尤其是1 : 1〜2 : 1的範圍者,就由有機改質黏土複合體與 黏結劑樹脂所形成之層的破裂防止等之力學特性的提升之 觀點,乃較爲理想。 有機改質黏土複合體與黏結劑樹脂,係含有於有機溶 劑而構成塗佈液,並例如塗佈於轉印基材上。此時,一般 而言黏結劑樹脂係溶解於有機溶劑中,且有機改質黏土複 合體於有機溶劑中分散。此分散液的固形分濃度,只要其 調製後的分散液在實用的範圍內不會膠體化或白濁化,則 並無任何限制,一般而言,係使有機改質黏土複合體與黏 結劑樹脂之合計固形分濃度成爲3〜15重量%的範圍中使用 。最適的固形分濃度,係因有機改質黏土複合體與黏結劑 樹脂個別的種類或兩者的組成比而有所不同,因此係於每 種組成中予以設定。此外,亦可添加用以提升製膜時的塗 佈性之黏度調整劑,或是用以提升排水性及/或耐久性之 -15- 200827789 架橋劑等之各種添加劑。 形成塗膜相位差板2 0時所使用之塗佈方式並無特別 限制,可使用直接凹版法、反向凹版法、壓模塗佈法、刮 刀式塗佈法、棒塗佈法等之一般所知的塗佈法。200827789 IX. Description of the Invention [Technical Field] The present invention relates to a method of manufacturing a composite polarizing plate product wafer assembled in a liquid crystal display. More specifically, it is to provide a composite polarizing plate comprising a fragile optical member composed of a coating layer, which can suppress the possibility of occurrence of the fragile optical member when the wafer is cut into a product size. A method of manufacturing a composite polarizing plate product wafer having a phenomenon such as cracking or undulation. [Prior Art] In recent years, a liquid crystal display that consumes low power and can operate at a low voltage and is lightweight and thin is used as a display device for information such as a mobile phone, a portable information terminal, a display for a computer, and a television. Rapid popularity. With the development of liquid crystal technology, liquid crystal displays of various modes have been gradually proposed, and the unique problems of liquid crystal displays such as reaction speed or contrast and narrow viewing angles have been gradually eliminated. However, the viewing angle of the liquid crystal display is still considered to be narrower than that of the cathode ray tube (Cathode Ray Tube), and various attempts to expand the viewing angle are still in progress. In general, in order to expand the viewing angle of a liquid crystal display, an optical member called a phase difference plate is often used. There are various types of phase difference plates, such as a resin-oriented retardation plate in which a polymer resin film is oriented to cause a phase difference, or a compound having optical anisotropy is coated on a substrate film to cause alignment. A phase difference plate of a coating type, and a phase difference plate of a coating film + orientation type which is formed by dispersing a compound having optical anisotropy in a binder resin and then forming a film, and then aligning with -5*200827789. Recently, in the trend of thinning and cost reduction of liquid crystal displays, the thinning of such phase difference plates has also been rapidly progressed. Currently, phase difference plates of 20 μηη or less are not difficult to see. Among them, a phase difference plate composed of a coating layer which can achieve a final thickness of 15 μm or less is gradually used. Here, the phase difference plate composed of the coating layer refers to a solution obtained by dispersing a solution of a resin or a substance having a refractive index anisotropy, or a liquid crystal. The coating liquid formed by the solution of the compound or the like is applied to the optical layer produced by the substrate, and is also referred to as a "coating film phase difference plate" hereinafter. The film phase difference plate can be combined with other phase difference plates to form a composite phase difference plate, and is often used by laminating a polarizing plate. If the substrate forming the coating layer has a desired optical function, it can be used directly as a composite phase difference plate, or can be preferably peeled off from a polyethylene terephthalate film after release treatment. A coating layer is first formed on the substrate, and then transferred to another optical member for use. For example, a composite polarizing plate in which a polarizing plate, an adhesive layer, and a coating film phase difference plate are laminated in this order is disclosed in Japanese Laid-Open Patent Publication No. Hei. Further, Japanese Laid-Open Patent Publication No. 2005-338215 (Patent Document 2) discloses that a coating film is laminated on a phase difference plate formed of a transparent resin film which is aligned in the in-plane direction. In the retardation plate, an adhesive layer is provided on the surface of the coating film retardation plate to form a composite phase difference plate, and a polarizing plate is laminated on the resin phase difference plate side. Further, Japanese Laid-Open Patent Publication No. 2006_1 0912 (Patent Document 3) discloses that a urethane resin based on an aliphatic diisocyanate (Diis〇cyanate 200827789) is used as a binder, and The composition of the organically modified clay composite is formed into a film shape to form a coating film phase difference plate, and a sandwich adhesive layer is formed by laminating the coating film phase difference plate on a polarizing plate to form a composite polarizing plate. However, this coated phase difference plate is incapable of obtaining sufficient strength to withstand impact due to its thin thickness, and thus has a problem that cracks or undulations may occur in the processing process. When such cracks or undulations are formed, there is a problem that light leakage due to local variations in phase difference or light leakage due to scattering of light causes a significant decrease in liquid crystal display quality. In particular, in the small-sized liquid crystal display of a mobile phone or a PDA, in recent years, in addition to the development of the size of the display unit, the size of the display is gradually reduced, and therefore, the composite polarizing plate attached to the liquid crystal cell is The "narrow frame edge" whose edge is extremely narrow from the start of the polarizing plate to the portion (display area) actually used for display is gradually becoming the mainstream. In the case of the "narrow frame edge", when the large-sized plate of the composite polarizing plate is cut into a product wafer, the traveling distance of cracks or undulations generated in the phase difference plate composed of the coating layer layer is highly likely to cause a problem. . In view of this, it is an important subject to reduce the travel distance of cracks or undulations during wafer cutting. The travel distance of the crack or undulation here refers to the distance from the crack or undulation generated by the cut edge to the inside of the product wafer. Accordingly, it is an object of the present invention to provide a method of manufacturing a composite polarizing plate product wafer which can reduce the occurrence of cracks or undulations during wafer dicing of a composite polarizing plate comprising a thin and fragile layer. The present inventors have conducted a method of suppressing cracks or undulations which are likely to occur when wafer dicing is performed on a composite polarizing plate including a layer which is extremely thin and fragile as a coating film phase difference plate--7-200827789. Careful study. As a result, it has been found that in the composite polarizing plate in which at least the coating film phase difference plate and the polarizing plate are laminated and the upper and lower sides of the coating film phase difference plate are sandwiched by the pressure-sensitive adhesive layer, the phase difference of the coating film is With the position of the plate as a reference, by cutting the blade from the side opposite to the side on which the polarizing plate is present and performing wafer cutting, the traveling distance of the crack or the undulation can be reduced. Further, it has been found that for all the layers disposed on both sides of the thin and fragile coated phase difference plate, the product of the tensile modulus and the thickness of each layer is obtained, and the optical member which is the largest is considered. When the composite polarizing plate is cut by cutting the blade from one side of the optical member including the tensile modulus and the thickness of the coating film based on the position of the coating film retardation plate, the film is formed in the phase difference plate. The traveling distance of the crack or the undulation is increased. Conversely, if the cutting edge is cut from one side of the optical member that does not include the product of the tensile modulus and the thickness, the crack can be sufficiently reduced or Undulating travel distance. Therefore, the present invention has been completed in view of such findings and has been further explored. SUMMARY OF THE INVENTION According to the present invention, there is provided a method for manufacturing a composite polarizing plate product wafer, which is a method for manufacturing a composite polarizing plate product wafer by cutting a composite polarizing plate into a product size, the composite polarizing plate being at least A phase difference plate formed by a coating layer having a thickness of 30 μm or less and a retardation plate formed by the coating layer are laminated, and the upper and lower portions are made of tensile modulus-8-200827789. The pressure-sensitive adhesive layer of 100 MPa or less is sandwiched, and the position of the phase difference plate formed by the coating layer is based on the position of the upper and lower optical members. The right branch (MPa · mm ) = the tensile modulus of the direction perpendicular to the cutting edge ( ) X thickness (mm) defined by F 値 is the largest of the optical members, and cut into the cutting edge. In addition, according to the present invention, a method for fabricating a composite polarizing plate product wafer is a method for manufacturing a polarizing plate product wafer in which a composite polarizing plate is wafer-cut into a product size, the composite polarizing plate being at least a layer having a thickness of 30 μχη or less. a phase difference plate formed by the coating layer; and a polarizing plate having a transparent protective layer on both sides of the optical element, the phase difference plate formed by the coating film layer, and the upper and lower portions thereof are pressure-sensitive type having a tensile modulus of 100 MPa. The coating layer is sandwiched by a cutting blade which is cut from the side opposite to the side on which the polarizing plate is present, based on the position of the phase difference plate formed of the coating film layer. [Embodiment] Hereinafter, the form of the present invention will be described in detail with reference to the accompanying drawings. In the present invention, the following composite polarizing plate is used as a target and the polarizing plate is wafer-cut into a product size. The composite polarizing plate is laminated with a film phase difference plate and a polarizing plate having a thickness of 30 μm or less, and the film phase difference is obtained. The upper and lower sides of the plate are sandwiched by a pressure-sensitive adhesive layer having a tensile modulus of 100 MPa or less. Fig. 1 is a view showing that the composite partial sign set as the object in the present invention is present: · The composite of the F MPa side is formed by one of the following shapes: A cross-sectional pattern diagram of an example of the layer composition of 9-200827789. In the composite polarizing plate of this example, a protective film 60/polarizing plate 10/pressure-sensitive adhesive layer 30/phase difference plate 40/pressure-sensitive adhesive layer composed of oriented resin is laminated in this order from the upper side of the drawing. 30/ The coating film phase difference plate 20/pressure-sensitive adhesive layer 30/release film 70 is a total of 8 layers. The polarizing plate 1 is generally provided with a protective layer on both sides of the polarizing member. The polarizer is composed of a dichroic dye such as iodine or a dichroic organic dye adsorbed on a polyvinyl alcohol resin film. The protective layer disposed on the two sides may be, for example, a cellulose-based resin such as cellulose triacetate or cellulose diacetate or a cyclic olefin having a polycycloheptene-like polycyclic ring as a main monomer. A resin, a polyolefin resin containing a chain olefin such as ethylene or propylene as a main monomer, and a transparent resin film composed of a polycarbonate resin or the like. Further, a film composed of these transparent resins and having a function of a phase difference plate may be used to form a protective layer. Further, a surface treatment layer such as an antireflection layer or a hard film may be provided on these protective layers. When the polarizing member and the protective layer are provided and the surface treatment layer is provided, the polarizing plate 10 can treat all of the layers including the layers as one layer. The coating film phase difference plate 20 is formed by dispersing a solution of a resin or a substance having a refractive index anisotropy as described above, or a solution of a liquid crystal compound, as described above. The coating liquid is an optical member produced by being applied to a substrate. A preferred example of the coating film phase difference plate 20 is formed by applying a coating liquid containing an organically modified clay composite and a binder resin in an organic solvent to a substrate, and removing the solvent. Since the coating film phase difference plate 20 is a layer formed by a coating film, the thickness -10-200827789 is relatively small, and specifically, it can be 30 μm or less, and more preferably 15 μm or less. Regarding the coating film phase difference plate 20, the lower limit of the thickness thereof is not particularly limited, for example, it can be formed to be 1 μm. In the composite polarizing plate set as the object of the present invention, the upper and lower surfaces of the coating film phase difference plate 20 are sandwiched by the pressure-sensitive adhesive layers 30 and 30. Therefore, the coating film phase difference plate 20 and its peripheral members can be laminated, for example, by the following method. That is, a coating layer is formed on the transfer substrate having a good peeling property such as a polyethylene terephthalate film after the release treatment, and then one side is formed on the exposed surface of the coating layer. After the pressure-sensitive adhesive layer 30 is peeled off and removed from the transfer substrate, the other pressure-sensitive adhesive layer 30 is provided on the peeling surface together with other optical members. The configuration shown in Fig. 1 can be produced by the following method. First, a coating film phase difference plate 20 is formed in advance on the surface of a transfer substrate (not shown), and the release film 70 is placed on the exposed surface. The pressure-sensitive adhesive layer 30 provided on one surface of the pressure-sensitive adhesive layer 30 or the phase difference plate 40 is attached, and after the transfer substrate is peeled off, on the peeling surface, The pressure-sensitive adhesive layer 30 on the other side with the phase difference plate 40 or the pressure-sensitive adhesive layer 30 with the release film 70 attached thereto is bonded. When the coating phase retardation plate 20 is composed of an organically modified clay composite and a binder resin, the organically modified clay composite used is a composite of an organic matter and a clay mineral, and specifically, for example, a layer may be used. The clay mineral of the structure is compounded with an organic compound and can be dispersed in an organic solvent. A clay mineral having a layered structure, such as a bentonite (Smectite) group or a swellable mica, can be compounded with an organic compound by its cation exchange energy -11 - 200827789. Among them, the bentonite family is preferable because it has better transparency. Those belonging to the bentonite group include, for example, Hector ite, Montmorillonite, Bentonite, and the like. Among them, chemical synthesis is preferred in terms of less impurities and better transparency. In particular, synthetic lithium magnesium niobate clay having a small particle size control is preferable because it suppresses scattering of visible light. An organic compound compounded with a clay mineral, for example, a compound which can react with an oxygen atom or a hydroxyl group of a clay mineral, and an ionic compound which can be exchanged with an exchangeable cation, and the organically modified clay complex can be organically There is no limitation on swelling or dispersion in the solvent, specifically, a nitrogen-containing compound or the like. The nitrogen-containing compound may, for example, be a grade 1, 2 or 3 grade amine, a grade 4 ammonium compound or the like. Among them, the quaternary ammonium compound is preferable in terms of cation exchange and the like. A quaternary ammonium compound, for example, those having a long-chain alkyl group, and those having an alkyl ether chain. Among them, an alkyl group having a carbon number of 1 to 30, a -(CH2CH(CH3)Ο) nH group of n = 1 to 50, or a 4-grade ammonium compound of -(CH2CH2CH20) nH group is preferable. More preferably, it is an alkyl group having a carbon number of 6 to 10. When an organic modified clay composite is composed of an organic compound and a clay mineral belonging to the bentonite group, the clay mineral belonging to the bentonite group may be swollen or dispersed in an organic solvent as long as it forms a complex with the organic compound. There is no limitation, but the exchangeable cation is a clay mineral which is difficult to exchange in an ionic organic compound, and is not easily dispersed in an organic solvent. Among the synthetic products of the clay minerals belonging to the bentonite group, most of them are -12-200827789. The magnesium compound such as magnesium hydroxide adheres to the surface, and if the amount of the magnesium compound is large, the exchangeable cation site is hindered. Therefore, the magnesium compound present on the surface is removed by acid washing or the like, and the ratio of the presence of magnesium is lowered. Specifically, the atomic ratio (Mg/Si4) of magnesium to germanium of 4 atoms is less than 2.73. It is preferred because it is easily dispersed in an organic solvent. For example, lithium magnesium silicate, which belongs to the bentonite family, is represented by the "Chemical Dictionary" edited by the Chemical Dictionary Dictionary (Kyoritsu Press Co., Ltd. (Japan), Showa. 3, February 28, 2007) Typically, Na〇.66(Mg5.34Li〇.66)Si8〇2〇(〇H)4.nH2〇 or Nai/3(Mg8/3Lii/3) Si4〇iG(〇H)2.mH20 The atomic ratio of Mg/Si4 in this state is 2.67. In the synthetic lithium magnesium niobate clay, the Mg/Si4 atomic ratio is slightly larger than 2.67 in the above-mentioned magnesium compound present on the surface. Preferably, the magnesium compound present on the surface is removed by acid washing or the like so that the atomic ratio of Mg/Si4 is as close as possible to 2.67. In a bentonite clay mineral comprising lithium magnesium niobate clay or a synthetic lithium magnesium niobate clay, the sodium is an exchangeable cation, and since it is exchanged with an organic compound, such as a 4-grade ammonium group, it becomes an organically modified clay composite. Therefore, the atomic ratio of Mg/Si4 did not change before and after the modification. Therefore, it is effective to set the Mg/Si4 atomic ratio of the organically modified clay composite to less than 2.73, and to wash the clay mineral before the modification by the organic substance by acid. In the organically modified clay composite, many impurities containing chlorine-containing compounds are mixed in the raw materials used in the production. If the amount of the chloride is large, it may ooze out of the film after the formation of the coating film retardation plate. At this time, when the coating phase difference plate is bonded to the liquid crystal cell glass by the intervening pressure sensitive adhesive, the adhesion may be greatly lowered as time passes. Therefore, it is preferable to remove the chloride from the organically modified clay composite by washing, and if it is contained in an organic solvent in a state in which the amount of chlorine contained therein is 2,000 ppm or less, the adhesion can be suppressed. reduce. The removal of the chloride can be carried out by a method of washing the organically modified clay composite with water. The organically modified clay composite can be used in combination of two or more kinds. Commercially available products of suitable organically modified clay composites, for example, those sold by CO-OP Chemical Co., Ltd. (Japan) under the trade names of "Rusentit STN" or "Rusentit SPN". a composite of lithium magnesium phosphate clay and a grade 4 ammonium compound. The organically modified clay composite which can be dispersed in an organic solvent can be used in combination with a binder resin from the viewpoints of easiness of coating film, discovery of optical properties, and mechanical properties. The binder resin used in the organic modified clay composite is preferably used in an organic solvent such as toluene, xylene, acetone or ethyl acetate, especially when the glass transition temperature is below room temperature (about 20°). C below)). Further, in order to obtain good moisture resistance characteristics and handleability required for use in a liquid crystal display, it is preferred to have drainage properties. Such preferred binder resins, such as Polyvinyl Butyral or Polyvinyl Formal, Polyvinyl Acetal resin; cellulose acetate butyrate (Cellulose Acetate Butyrate) cellulose-based resin; butyl acrylate-like resin; urethane resin; methyl acrylate resin; epoxy resin; For the commercial product of a suitable binder resin, for example, an aldehyde-denatured resin of polyvinyl alcohol sold under the trade name "Denka Butyral # 3000-K" by the electric chemical industry-14-200827789 (Japan); East Asia synthesis Acrylic resin sold under the trade name "ARON S1601" by Sumitomo Co., Ltd.: Sumitomois, sold by the Bayer Urethane Co., Ltd. (Japan) under the trade name "SBU Lacquer 0866" Isopho rone Diisocyanate is a matrix urethane resin or the like. Among them, the binder resin is preferably a urethane resin based on isophorone diisocyanate. The ratio of the organically modified clay composite and the binder resin which can be dispersed in an organic solvent, the former: the latter has a weight ratio of 1:2 to 1 0:1, especially in the range of 1:1 to 2:1, It is preferable from the viewpoint of improving the mechanical properties such as crack prevention of the layer formed of the organically modified clay composite and the binder resin. The organically modified clay composite and the binder resin are contained in an organic solvent to form a coating liquid, and are applied, for example, to a transfer substrate. At this time, in general, the binder resin is dissolved in an organic solvent, and the organically modified clay composite is dispersed in an organic solvent. The solid content concentration of the dispersion is not limited as long as the prepared dispersion does not colloidal or white cloud in a practical range, and generally, the organically modified clay composite and the binder resin are used. The total solid content concentration is used in the range of 3 to 15% by weight. The optimum solid concentration is different depending on the type of the organic modified clay composite and the binder resin, or the composition ratio of the two, and is therefore set in each composition. Further, a viscosity adjusting agent for improving the coating property at the time of film formation, or a variety of additives such as a bridging agent for improving drainage and/or durability may be added. The coating method used when forming the coating film retardation film 20 is not particularly limited, and a general gravure method, a reverse gravure method, a die coating method, a knife coating method, a bar coating method, or the like can be used. Known coating method.

塗膜相位差板之厚度方向的折射率異向性,係以面內 遲相軸方向的折射率爲nx,以於面內與其直交之方向(進 相軸方向)的折射率爲ny,以厚度方向的折射率爲nz, 以薄膜的厚度爲d ’並以下列第(2 )式所定義之厚度方向 的相位差値Rth所表示。此値可從以面內的遲相軸爲傾斜 軸傾斜40度所測定之相位差値R4G以及面內的相位差値 R〇所算出。亦即,依據第(2 )式之厚度方向的相位差値 Rth,可使用面內的相位差値R〇、以遲相軸爲傾斜軸傾斜 4 0度所測定之相位差値R4 〇、薄膜的厚度d、及薄膜的平 均折射率no,藉由數値計算從下列第(3 )式〜第(5 )式 中算出nx、ny、nz,並將這些値代入於第(2 )式而算出 。第(3)式爲表不面內的相位差値之定義式。The refractive index anisotropy in the thickness direction of the coating film phase difference plate is such that the refractive index in the in-plane slow axis direction is nx, and the refractive index in the in-plane direction (the direction of the phase axis) is ny, The refractive index in the thickness direction is nz, and the thickness of the film is d' and is expressed by the phase difference 値Rth in the thickness direction defined by the following formula (2). This 値 can be calculated from the phase difference 値 R4G measured by tilting the skew axis in the plane by 40 degrees and the phase difference 値 R 面 in the plane. That is, according to the phase difference 値Rth in the thickness direction of the formula (2), the phase difference 値R〇 in the in-plane, the phase difference 値R4 测定 measured by tilting the slow axis as the tilt axis by 40 degrees, and the film can be used. The thickness d and the average refractive index no of the film are calculated by the number 値 calculation from the following formulas (3) to (5) to calculate nx, ny, nz, and substituting these enthalpies into the formula (2) Calculated. The formula (3) is a definition formula of the phase difference 表 in the surface.

Rth = [ ( nx + ny) /2-nz] ···——·.( 2) R〇=(nx-ny) xd· · · . · · · . (3) R4〇= ( nx-ny5 ) xd/cos ( φ ) · · · ( 4 ) (nx + ny + nz) = n〇 · .......( 5 ) 在此,/n0] ny?=nyxnz/[ny2xsin2 ( φ ) +nz2xcos2 ( φ ) ] 172 塗膜相位差板之厚度方向的相位差値Rth,較理想係 配合其用途,尤其是液晶單元的特性,從40〜3 OOnm的範 -16- 200827789 圍當中適當的選擇。該厚度方向的相位差値Rth ’較理想 爲50nm以上200nm以下。 感壓式接著劑層3 0亦稱爲黏著劑,可由以丙烯酸系 聚合物、矽系聚合物、聚酯、聚氨基甲酸酯、聚醚等爲基 質聚合物者所構成。在這當中,較理想爲選擇如丙烯酸系 的感壓式接著劑般,具有良好的光學透明性,可保持適度 的潤濕性或凝聚力,且具有與基材之良好的接著性,此外 φ 亦具有耐氣候性及耐熱性等,而不會於加熱或加濕的條件 下不會產生浮起或剝落等之剝離問題者。於丙烯酸系的感 壓式接著劑中,較有用的基質聚合物,爲可將具有甲基或 乙基、丁基等之碳數20以下的烷基之丙烯酸烷基醚,以 及由(甲基)丙烯酸或(甲基)丙烯酸羥乙酯等含官能基 之丙烯酸系單體,以調配爲玻璃轉移溫度較理想爲25。(:以 下’更理想爲0°C以下之方式地調配出之重量平均分子量 1 〇萬以上的丙烯酸系共聚物。 φ 感壓式接著劑層30,可由上述般以柔軟的基質聚合物 所構成,該抗張彈性率爲 lOOMPa以下,一般例如爲 lOMPa以下。於感壓式接著劑層30中,該抗張彈性率的 下限並無特別限定,例如可設定爲0.01 MPa。 因應必要所設置之相位差板40,可藉由透明的熱可塑 性樹脂的定向薄膜所構成。熱可塑性樹脂,具體而言例如 有聚碳酸酯、聚芳基酸酯(Poly ary late )、聚磺酸、聚醚 磺酸、纖維素系樹脂、以丙烯或乙烯般之烯烴爲主要單體 之聚烯烴系樹脂、以雙環庚烯般之多環式的環狀烯烴爲主 -17- 200827789 層3 0、3 0所包夾之複合偏光板。此外,於考量到各層的 抗張彈性率時,如上述般,於偏光板1 〇包含偏光件及保 護層且設置有表面處理層時,亦包含這些層而將偏光板10 全體視爲1層,其他光學構件則分別視爲1層而決定抗張 彈性率。於第1圖所示的例子中,塗膜相位差板20、感壓 式接著劑層30、相位差板40、保護膜60及剝離膜70,係 相當於其他光學構件。感壓式接著劑層3 0係以包夾塗膜 相位差板20的形式至少存在2層,於第1圖的例子中係 存在3層,而分別決定各層的抗張彈性率。此外,即使於 設置上述所I兌明之売度提升膜等,亦分別考量各層。 此外,於本發明中,以塗膜相位差板20爲基準,於 存在於其上下方之所有的光學構件中,係從不包含上述第 (1)式所定義的F値爲最大之光學構件之一側的面,切 入切割用刀刃,並裁切爲複合偏光板製品晶片。在以與各 光學構件的切割邊垂直之方向的抗張彈性率爲α,以厚度 爲d時,第(1 )式亦可如下列第(〗a )式所表示。 F ( MPa · mm ) = a ( MPa ) xd ( mm ) · · · ( la) 在此所謂抗張彈性率a ’爲使用萬能抗張測試機等, 在室溫條件下將對象的光學構件予以拉引時,於彈性變形 區域內由下列第(6 )式所求取之値,一般亦稱爲楊氏模 數等。 a [MPa]='施加壓力[MPa]/應變......(6 ) 此抗張彈性率α ’爲於等向性材料時可單一決定之値 ,但於具有異向性之材料時,該値會受到拉引方向的影響 •19- 200827789 而改變’因此係使用垂直於切割邊之方向上的抗張彈性率 。將裁切爲製品晶片時之長邊的抗張彈性率(亦即製品晶 片之短邊的抗張彈性率)設爲α 1,將短邊的抗張彈性率 (亦即製品晶片之長邊的抗張彈性率)設爲α 2。上述F 値的計算中,係使用α 1及α 2當中較大者作爲α。其理 由爲’若抗張彈性率較大,切割時之龜裂或起伏的行進距 離亦呈比例變大,因此於實際的系統中,係避免彈性率爲 最大之情況,以降低龜裂等的行進距離。 抗張彈性率α 1及α 2,雖然可根據實際的裁切角度而 測定,但若具有表示出最大彈性率之方向上的抗張彈性率 測定値及與此垂直之方向上的抗張彈性率測定値,則可根 據下列第(7 )式而計算出所有方向的抗張彈性率。亦即 ’以於表示出最大彈性率之方向上進行拉引時之抗張彈性 率爲α//,以面內與其垂直之方向上進行拉引時之抗張彈 性率爲α丄時,從表示出最大彈性率之方向僅往逆時針方 向旋轉0之方向上進行拉引時之抗張彈性率αθ ,可由下 列第(7 )式所表示。 αΘ = a//xcos40 + a 丄 xsin40 + 2xQxcos20xsin20 + 4xGxcos20xsin26.....(7) 惟Q及G分別爲下列之値。 Q= ^爲稱爲帕松比(Poisson’s Ratio )之値,爲於— 定方向拉引時之拉引方向的應變量與垂直於拉引方向之方 向的應變量之比値所定義之物性値,在此,係將一般材料 之値的0.3用於所有的計算中。 -20- 200827789 若爲一般的高分子定向薄膜,則較多情況爲平行於定 向軸之方向係成爲最大抗張彈性率。 此外,關於各光學構件,厚度d例如可使用接觸式膜 厚計等而簡單的測定。 根據以上所說明之基準,若以每個光學構件來分割第 1圖所示之複合偏光板,則係成爲保護膜60/偏光板10/感 壓式接著劑層30/相位差板40/感壓式接著劑層30/塗膜相 位差板20/感壓式接著劑層30/剝離膜70之合計爲8層。 此時,存在於塗膜相位差板2 0的單側(第1圖的上方) 之光學構件,爲保護膜60/偏光板10/感壓式接著劑層3 相位差板40/感壓式接著劑層3 0之5層,存在於塗膜相位 差板20的另一側(第1圖的下方)之光學構件;爲感壓 式接著劑層30/剝離膜70之2層。在這7層當中,F値爲 最大之光學構件,一般爲偏光板1〇。 於本發明中,以塗膜相位差板2 0的位置爲基準,從 不包含偏光板1 〇之一側,亦即於第1圖所示之例子中從 下方側切入晶片切割用刀刃,藉此可縮短龜裂或起伏的行 進距離。 因此,亦可不需求取構成複合偏光板之各光學構件的 抗張彈性率α,對於至少層積有厚度3 0 // m以下的塗膜相 位差板20及於偏光件的兩側具有透明保護層之偏光板1 〇 ,且該塗膜相位差板由抗張彈性率爲l〇〇MPa以下的感壓 式接著劑層從上下方所包夾之複合偏光板,以該塗膜相位 差板20的位置爲基準,從與存在有偏光板1 〇之一側爲相 -21 - 200827789 反側切入切割用刀刃,而裁切爲製品尺寸。 以下係說明,藉由以塗膜相位差板20的位置爲基準 ,從不包含由上述第(1)式或第(la)式所定義的F値 爲最大之光學構件之一側的面,切入切割用刀刃進行裁切 而縮短龜裂或起伏的行進距離之原理。 於裁切複合偏光板時,係從位於切入刀刃的一側之最 上方的構件,依序進行切割。隨著依序切割各構件,施加 於塗膜相位差板2 0之應力分布,由於取決於切割的構件 之彈性率,因此係因各層的切割而改變。若於塗膜相位差 板20之前存在有F値較大之構件,亦即存在有較硬的構 件,由於切割時所產生的應力會分散至相對較大的範圍, 因此,應力係從複合偏光板的切割面到達至更遠的位置, 使塗膜相位差板2 0中所產生之龜裂的行進距離增加。此 係由於,因爲應力到達更寬廣範圍者愈不易引起構件的變 形,因此如第2圖所示,愈是較硬的構件其應力愈會到達 更寬廣範圍之故。第2圖係顯示從較硬構件側切入刀刃時 的變形模樣之示意圖,爲表示出因切入切割用刀刃所產生 之應力P的存在,使其變形以該處爲中心擴散至寬廣範圍 之情況。 相反的,若於切入切割用刀刃之一側,於塗膜相位差 板20之前存在有彈性率較大之構件,亦即不存在較硬的 構件,如第3圖所示,由於構件容易變形,因此切割時所 產生之應力P的影響僅停留在局部,龜裂或起伏的行進距 離亦不會擴散至寬廣範圍。第3圖係顯示從較軟構件側切 -22- 200827789 入刀刃時的變形模樣之示意圖,爲表示出因切入切割用刀 刃所產生之應力P所造成之變形僅停留在局部之情況。 以下係顯不實施例而更具體說明本發明,但是本發明 並不限定於這些實施例。 [實施例1] 關於第4圖所示的構成之複合偏光板,係製作出有限 要素模型,且進行依據有限要素法之破壞進展模擬,而解 析所發生之應力及應變。第4圖(A )係模式性顯示層構 成之剖面圖,同圖(B )係模式性顯示各層的軸關係之立 體圖。 第4圖所示之複合偏光板,從圖式的上側依序層積有 保護膜60/偏光板10/感壓式接著劑層30/第一相位差板 4 1/感壓式接著劑層30/第二相位差板42/感壓式接著劑層 30/塗膜相位差板20/感壓式接著劑層30之合計爲9層。 在這當中,保護膜60、4層的感壓式接著劑層30及塗膜 相位差板20,係構成爲於面內呈光學等向性。此外,以第 4圖(B)所示之切割後的短邊方向爲W,偏光板10、第 一相位差板4 1及第二相位差板4 2的流動方向,係以分別 成爲同圖所示的角度之方式地配置。在此所謂的流動方向 ,是指滾輪狀所供應之各薄膜的流動方向(滾輪的長度方 向)。偏光板1 〇的流動方向爲定向方向且相當於吸收軸 ,第一相位差板4 1及第二相位差板42的流動方向均爲定 向方向且相當於遲相軸。於此條件下,係進行以複合偏光 -23- 200827789 板的短邊方向爲切割邊時之模擬。 各光學構件的抗張彈性率α及厚度d,係設定如第1 表所示者,且第1表係表示出從這些値當中所求取之F値 。第1表中,F値爲最大者係附加底線。根據此,由於F 値爲最大之光學構件爲偏光板1 0,因此係針對從不包含此 偏光板1 〇之一側(第4圖的下側)進行切割時,解析施 加於塗膜相位差板20之應力及應變。 此外,由於切割邊亦如第4圖(B )所示般設定爲短 邊側,因此設定爲α = α 2 (亦即爲切割後之晶片的長邊方 向抗張彈性率)。 第5圖係顯示應力·應變解析的結果。此圖係顯示, 將ζ軸設爲複合偏光板的厚度方向,將y軸(垂直穿入紙 面之軸)設爲切割邊方向,將X軸設爲垂直於切割邊之方 向,且於z軸方向施加特定位移時之複合偏光板全體的變 形動作。方格狀白線係表示,施加位移前分割爲完全方格 狀之單元,藉由施加位移會產生如何的變形之情況。上下 白線間的距離,係相當於複合偏光板的厚度。此外,左端 相當於施加位移後之位置。由於位移以此位置爲中心呈左 右對稱,因此僅表示施加位移之點的右側。從該圖中可得 知,應力(應變)僅於切割邊附近產生,因此其影響範圍 較小。 -24- 200827789 第1表 d(厚度) [mm] 貼合軸角度 (流動方向)[巧 α(抗張彈性率) [MPa] F=axd [MPa.mm] 保護膜 5χ1〇·3 (面內等向性) 8,821 a ncc 44.1 偏光板 105χΚΓ3 118 499.3 感壓式接著劑層 15χ10'3 (面內等向性) 4?/JJ 490 A one 7.4 第一相位差板 33χ1〇·3 102 160.9 感壓式接著劑層 15χ10·3 (面內等向性) 4,875 490 yl r 1 ο 7.4 第二相位差板 28χ10·3 45 126.3 感壓式接著劑層 15χ1〇·3 (面內等向性) 45j1 J 490 490 490 7.4 塗膜相位差板 9χ10'3 (面內等向性) 4.4 感壓式接著劑層 25 χΙΟ·3 湎內等向性) 12.3Rth = [ ( nx + ny) /2-nz] ···——·.( 2) R〇=(nx-ny) xd· · · · · · · (3) R4〇= ( nx-ny5 ) xd/cos ( φ ) · · · ( 4 ) (nx + ny + nz) = n〇· .......( 5 ) Here, /n0] ny?=nyxnz/[ny2xsin2 ( φ ) +nz2xcos2 ( φ ) ] 172 The phase difference 値Rth in the thickness direction of the coated phase difference plate is ideally matched with its use, especially the characteristics of the liquid crystal cell, from the range of 40 to 30,000 nm to the range of -16-27728789. select. The phase difference 値Rth ' in the thickness direction is preferably 50 nm or more and 200 nm or less. The pressure-sensitive adhesive layer 30 is also called an adhesive, and may be composed of an acrylic polymer, a fluorene-based polymer, a polyester, a polyurethane, a polyether or the like as a base polymer. Among them, it is preferable to select a photosensitive pressure-sensitive adhesive such as acrylic, which has good optical transparency, maintains moderate wettability or cohesive force, and has good adhesion to a substrate, and φ is also It has weather resistance, heat resistance, etc., and does not cause peeling problems such as lifting or peeling under conditions of heating or humidification. In the acrylic pressure-sensitive adhesive, a more useful matrix polymer is an alkyl acrylate having an alkyl group having a carbon number of 20 or less, such as a methyl group, an ethyl group, a butyl group or the like, and a (methyl group). The functional group-containing acrylic monomer such as acrylic acid or hydroxyethyl (meth)acrylate is preferably formulated to have a glass transition temperature of preferably 25. (The following is more preferably an acrylic copolymer having a weight average molecular weight of 1,000,000 or more formulated at 0 ° C or less. φ The pressure-sensitive adhesive layer 30 may be composed of a soft matrix polymer as described above. The tensile modulus is preferably 100 MPa or less, and is usually, for example, 10 MPa or less. In the pressure-sensitive adhesive layer 30, the lower limit of the tensile modulus is not particularly limited, and may be, for example, 0.01 MPa. The phase difference plate 40 can be formed by an oriented film of a transparent thermoplastic resin. The thermoplastic resin is specifically, for example, polycarbonate, polyarylate, polysulfonic acid, polyethersulfonate. An acid-based resin, a polyolefin-based resin containing propylene or an ethylene-like olefin as a main monomer, and a polycyclic cyclic olefin having a bicycloheptene-based -17-200827789 layer 30, 30 In addition, when considering the tensile modulus of each layer, as described above, when the polarizing plate 1 〇 includes the polarizing member and the protective layer and the surface treatment layer is provided, the layers are also included and the polarizing is included. Board 10 It is regarded as one layer, and the other optical members are regarded as one layer to determine the tensile modulus. In the example shown in Fig. 1, the coating film phase difference plate 20, the pressure-sensitive adhesive layer 30, and the phase difference plate 40 are used. The protective film 60 and the release film 70 correspond to other optical members. The pressure-sensitive adhesive layer 30 has at least two layers in the form of the coated film phase difference plate 20, and is present in the example of Fig. 1 . In each of the three layers, the tensile modulus of each layer is determined. Further, each layer is separately considered in addition to the above-described thickness enhancement film, etc. Further, in the present invention, the coating film phase difference plate 20 is used as a reference. In all of the optical members present in the upper and lower sides, the surface of one side of the optical member having the largest F 定义 defined by the above formula (1) is cut out, cut into a cutting blade, and cut into a composite The polarizing plate product wafer has a tensile modulus of elasticity α in a direction perpendicular to the cut edge of each optical member, and when the thickness is d, the formula (1) can also be expressed by the following formula (a). ( MPa · mm ) = a ( MPa ) xd ( mm ) · · · ( la) The so-called tensile modulus a 'In order to use a universal tensile tester, etc., when the optical member of the object is pulled at room temperature, it is generally referred to as Young's in the elastic deformation region by the following formula (6). Modulus, etc. a [MPa]='applying pressure [MPa]/strain...(6) This tensile modulus α 'is a single decision for an isotropic material, but it is different In the case of a directional material, the crucible is affected by the direction of the pull. • 19- 200827789 and changes 'so the tensile modulus in the direction perpendicular to the cutting edge is used. The long side of the wafer is cut. The tensile modulus (i.e., the tensile modulus of the short side of the product wafer) is set to α 1, and the tensile modulus of the short side (i.e., the tensile modulus of the long side of the product wafer) is set to α 2 . In the above calculation of F ,, the larger of α 1 and α 2 is used as α. The reason is that if the tensile modulus is large, the travel distance of the crack or undulation at the time of cutting is also increased. Therefore, in the actual system, the elastic modulus is prevented from being the largest, and the crack is reduced. Travel distance. The tensile modulus α 1 and α 2 can be measured according to the actual cutting angle, but the tensile modulus of elasticity in the direction indicating the maximum modulus of elasticity and the tensile elasticity in the direction perpendicular thereto When the rate is measured, the tensile modulus of elasticity in all directions can be calculated according to the following formula (7). That is, when the tensile modulus is α// when the drawing is performed in the direction in which the maximum elastic modulus is expressed, and the tensile modulus is α丄 when the drawing is performed in the direction perpendicular to the plane, The tensile modulus of elasticity αθ when the direction of the maximum modulus of elasticity is pulled only in the direction of the counterclockwise rotation of 0 is expressed by the following formula (7). αΘ = a//xcos40 + a 丄 xsin40 + 2xQxcos20xsin20 + 4xGxcos20xsin26.....(7) Only Q and G are the following. Q= ^ is the 称为 of Poisson's Ratio, which is the physical property defined by the ratio of the strain in the pull direction and the strain in the direction perpendicular to the pull direction. Here, 0.3 of the general material is used for all calculations. -20- 200827789 In the case of a general polymer oriented film, it is often the case that the direction parallel to the orientation axis becomes the maximum tensile modulus. Further, the thickness d of each optical member can be easily measured by, for example, a contact type film thickness meter or the like. According to the above-described specifications, when the composite polarizing plate shown in Fig. 1 is divided by each optical member, the protective film 60 / polarizing plate 10 / pressure-sensitive adhesive layer 30 / phase difference plate 40 / sense The total of the pressure-sensitive adhesive layer 30 / the coating film phase difference plate 20 / the pressure-sensitive adhesive layer 30 / the release film 70 is 8 layers. In this case, the optical member existing on one side of the coating film phase difference plate 20 (above the first drawing) is the protective film 60 / the polarizing plate 10 / the pressure sensitive adhesive layer 3, the phase difference plate 40 / the pressure sensitive type Next, five layers of the agent layer 30 are present on the other side of the coating film phase difference plate 20 (below the first drawing), and two layers of the pressure-sensitive adhesive layer 30/release film 70. Among the 7 layers, F is the largest optical member, generally a polarizing plate. In the present invention, the wafer cutting blade is cut from the lower side without using the position of the coating film phase difference plate 20 as a reference, and the wafer cutting blade is cut from the lower side. This can shorten the travel distance of cracks or undulations. Therefore, it is not necessary to take the tensile modulus α of each of the optical members constituting the composite polarizing plate, and to provide transparent protection for at least the coating film phase difference plate 20 having a thickness of 30 // m or less and both sides of the polarizing member. a layered polarizing plate 1 〇, and the coated film phase difference plate is composed of a pressure-sensitive adhesive layer having a tensile modulus of 1 MPa or less, and a composite polarizing plate sandwiched from above and below, and the coating film phase difference plate The position of 20 is used as a reference, and the cutting blade is cut into the opposite side from the side where the polarizing plate 1 is present, and the cutting edge is cut into the product size. In the following, the surface of one side of the optical member that does not include F 定义 defined by the above formula (1) or (la) is used as a reference, based on the position of the coating film phase difference plate 20, The principle of cutting the cutting edge to cut and shorten the travel distance of cracks or undulations. When the composite polarizing plate is cut, the cutting is performed in order from the member located at the uppermost side of the side cut into the cutting edge. As each member is sequentially cut, the stress distribution applied to the coating film phase difference plate 20 varies depending on the elastic modulus of the member to be cut, due to the cutting of the respective layers. If there is a member having a large F値 before the coating phase difference plate 20, that is, there is a hard member, since the stress generated during the cutting is dispersed to a relatively large range, the stress is from the composite polarized light. The cut surface of the sheet reaches a further position, and the traveling distance of the crack generated in the coating film phase difference plate 20 is increased. This is because, as the stress reaches a wider range, the deformation of the member is less likely to occur, so as shown in Fig. 2, the harder the member, the more the stress reaches a wider range. Fig. 2 is a view showing a deformation pattern when the blade is cut from the side of the hard member, and shows the case where the stress P generated by cutting the cutting blade is spread to a wide range around the center. On the contrary, if one side of the cutting blade is cut, there is a member having a large modulus of elasticity before the coating film phase difference plate 20, that is, there is no hard member, as shown in Fig. 3, since the member is easily deformed Therefore, the influence of the stress P generated during cutting only stays local, and the travel distance of cracks or undulations does not spread to a wide range. Fig. 3 is a view showing a deformation pattern when the cutting edge is cut from the soft member -22-200827789, and the deformation caused by the stress P generated by cutting the cutting edge is only partially stopped. The present invention will be more specifically described below, but the present invention is not limited to these examples. [Embodiment 1] With respect to the composite polarizing plate having the configuration shown in Fig. 4, a finite element model is created, and the stress and strain generated by the finite element method are simulated. Fig. 4(A) is a cross-sectional view showing the structure of the display layer, and Fig. 4(B) is a schematic view showing the axial relationship of each layer. In the composite polarizing plate shown in Fig. 4, a protective film 60 / a polarizing plate 10 / a pressure-sensitive adhesive layer 30 / a first phase difference plate 4 1 / a pressure-sensitive adhesive layer are sequentially laminated from the upper side of the drawing. The total of the 30/second retardation film 42/pressure-sensitive adhesive layer 30/coating film phase difference plate 20/pressure-sensitive adhesive layer 30 is nine layers. Among these, the pressure-sensitive adhesive layer 30 and the coating film phase difference plate 20 of the protective film 60 and the four layers are configured to be optically isotropic in the plane. Further, the short side direction after the cutting shown in Fig. 4(B) is W, and the flow directions of the polarizing plate 10, the first retardation film 4 1 and the second retardation film 4 2 are respectively shown in the same figure. The angles shown are configured in a manner. The term "flow direction" as used herein refers to the flow direction of each film supplied in the form of a roller (the length direction of the roller). The flow direction of the polarizing plate 1 为 is the orientation direction and corresponds to the absorption axis, and the flow directions of the first phase difference plate 41 and the second phase difference plate 42 are both the directional direction and correspond to the slow phase axis. Under these conditions, the simulation was carried out with the short side direction of the composite polarized -23-200827789 plate as the cutting edge. The tensile modulus α and the thickness d of each optical member are set as shown in Table 1, and the first expression indicates F 求 obtained from these enthalpy. In the first table, F値 is the largest, and the bottom line is added. According to this, since the optical member having the largest F 为 is the polarizing plate 10, the phase difference applied to the coating film is analyzed when cutting is performed on one side (the lower side of FIG. 4) that does not include the polarizing plate 1 The stress and strain of the plate 20. Further, since the cut edge is also set to the short side as shown in Fig. 4(B), it is set to α = α 2 (i.e., the long-side tensile modulus of the wafer after the cutting). Fig. 5 shows the results of stress and strain analysis. This figure shows that the ζ axis is set to the thickness direction of the composite polarizer, the y axis (the axis perpendicular to the paper surface) is set to the cutting edge direction, the X axis is set to the direction perpendicular to the cutting edge, and the z axis The deformation operation of the entire composite polarizing plate when a specific displacement is applied in the direction. The checkered white line indicates how the unit is divided into a completely square shape before the displacement is applied, and how the deformation is caused by the displacement. The distance between the upper and lower white lines corresponds to the thickness of the composite polarizer. In addition, the left end is equivalent to the position after the displacement is applied. Since the displacement is left-right symmetric about this position, it only indicates the right side of the point at which the displacement is applied. It can be seen from the figure that the stress (strain) is generated only in the vicinity of the cutting edge, so that the influence range is small. -24- 200827789 Table 1 d (thickness) [mm] Fitting shaft angle (flow direction) [巧α (tensile modulus) [MPa] F=axd [MPa.mm] Protective film 5χ1〇·3 (face) Internal isotropic) 8,821 a ncc 44.1 Polarizing plate 105χΚΓ3 118 499.3 Pressure-sensitive adhesive layer 15χ10'3 (in-plane isotropic) 4?/JJ 490 A one 7.4 First phase difference plate 33χ1〇·3 102 160.9 Sense Pressurized adhesive layer 15χ10·3 (in-plane isotropic) 4,875 490 yl r 1 ο 7.4 Second phase difference plate 28χ10·3 45 126.3 Pressure-sensitive adhesive layer 15χ1〇·3 (in-plane isotropic) 45j1 J 490 490 490 7.4 Film phase difference plate 9χ10'3 (in-plane isotropic) 4.4 Pressure-sensitive adhesive layer 25 χΙΟ·3 等 Internal isotropic) 12.3

第1表之感壓式接著劑層30的抗張彈性率490MPa, 就經驗上可確認爲遠較其他光學構件的抗張彈性率還小, 因此該値爲暫定之値。如後述之實施例2所示般,感壓式 接著劑層的抗張彈性率雖然遠較此値還小,但於本發明中 ,由於係決定F値爲最大之光學構件,因此就該模擬結果 而言可充分判斷。 [比較例1 ] 關於與實施例1相同之複合偏光板的構成,係製作出 有限要素模型,且進行依據有限要素法之破壞進展模擬, 而解析所發生之應力及應變。並且針對從與實施例1爲相 反側,亦即從包含表示出F値爲最大之偏光板10的一側 且爲第4圖的上側進行切割時進行解析。此外,由於切割 邊亦如第4圖(B.)所示般設定爲短邊側,因此設定爲α = α 2。第6圖係顯示應力·應變解析的結果。第6圖的顯 -25- 200827789 示方式與第5圖相同。於以塗膜相位差板2 0的位置爲基 準,從包含表示出F値爲最大之偏光板1 〇的一側切入切 割用刀刃時,應力(應變)係影響從切割邊至複合偏光板 的內側之廣泛範圍,其影響範圍較大。 [實施例2] 首先以第7圖所示的構成製作出大片的複合偏光板。 第7圖(A )係模式性顯示層構成之剖面圖,同圖(Β )係 模式性顯示各層的軸關係之立體圖。此例中所製作之複合 偏光板,係從第7圖的上側依序以保護膜60/亮度提升膜 50/感壓式接著劑層30/偏光板10/感壓式接著劑層30/第一 相位差板41/感壓式接著劑層30/第二相位差板42/感壓式 接著劑層30/塗膜相位差板20/感壓式接著劑層30/剝離膜 70之合計爲12層所構成。在這當中,5層的感壓式接著 劑層30及塗膜相位差板20,係構成爲於面內呈光學等向 性。此外,以第7圖(B)所示之切割後的短邊方向爲00 ,亮度提升膜50及設置於其上之保護膜60、偏光板10、 第一相位差板4 1、第二相位差板42、及感壓式接著劑層 3 〇上的剝離膜70之流動方向,係以分別成爲同圖所示的 角度之方式地配置。在此所謂的流動方向,是指滾輪狀所 供應之各薄膜的流動方向(滾輪的長度方向)。亮度提升 膜5 〇的流動方向相當於透射軸,偏光板1 〇的流動方向爲 定向方向且相當於吸收軸,第一相位差板4 1及第二相位 差板42的流動方向均爲定向方向且相當於遲相軸。 -26- 200827789 此例中所使用之光學構件,除了塗膜 外,市售品例如分別有下列所示者。 亮度提升膜50 :住友3M株式會社所 分子薄膜交互層積多數層而成之“DBEF” 此商品可於其兩面貼合有由聚乙烯對苯二 保護膜之狀態下購入。 感壓式接著劑層3 0 ( 5層均相同): (曰本)所販售之丙烯酸系的感壓式接著 品名稱)。此商品可於其兩面貼合有由聚 酯所構成之剝離膜之狀態下購入。係使用 使厚度有所不同者。 偏光板10:住友化學株式會社(日本 乙烯醇-碘系偏光件的兩面貼合有三醋酸 保護層之“SRW062A”(商品名稱)。 第一相位差板4 1 :住友化學株式會社 之雙環庚烯系樹脂的定向薄膜,面內相β “SES430240Z” (商品名稱)。 第二相位差板42 :住友化學株式會社 之雙環庚烯系樹脂的定向薄膜,面內相fi “SES430120Z” (商品名稱)。 此外,塗膜相位差板20,係採用於圖 二相位差板42及感壓式接著劑層3 0以及 膜7 0及感壓式接著劑層3 0之組合,以下 相位差板20之 販售之將2種高 (商品名稱)。 甲酸酯所構成之 Lintec株式會社 劑 “ P - 3 1 3 2 ”(商 乙烯對苯二甲酸 因配置處的不同. )所販售之於聚 纖維素薄膜做爲 (曰本)所販售 i差爲 240nm之 (曰本)所販售 ί差爲 120nm之 中位於上側之第 位於下側之剝離 列方式製作而成 -27- 200827789 於經脫模處理後之厚度3 8 μπι的聚乙烯對苯二甲酸酯 薄膜(以下稱爲「脫模薄膜」)的脫模處理面,塗佈具有 下列組成之塗膜相位差板用塗佈液,之後於90。(:中進行3 分鐘的乾燥,而形成塗膜相位差板2 0。之後將附有感壓式 接著劑層30之上述第二相位差板42(“SES430120Z”), 以該感壓式接著劑層側貼合於該塗膜層側。然後從塗膜相 位差板20將上述脫模薄膜剝離後,於該塗膜相位差板20 之脫模薄膜剝離面,將設置於上述剝離膜70上之感壓式 接著劑層30 ( “P-3 13 2”)予以貼合,而形成第二相位差板 42/感壓式接著劑層30/塗膜相位差板20/感壓式接著劑層 30/剝離膜70之構成。 塗膜相位差板用塗佈液的組成: 氨基甲酸酯樹脂漆液“SBU Lacquer 0 8 66” ” 16.0份 有機改質黏土複合體“Rusentit STN” ^ 7·2份 甲苯 7 6 · 8份 水 〇 · 3份 ” “SBU Lacquer 0866”(商品名稱):住化 Bayer Urethane株式會社(日本)所販售之以二異氰酸異佛爾酮 爲基質之氨基甲酸酯樹脂,固形分濃度爲3 0%之樹脂漆液 〇 *2 “Rusentit STN”(商品名稱):CO-OP Chemical 株 式會社(日本)所販售之合成砂酸鎂鋰黏土與二午基甲基 銨離子之複合體。 -28- 200827789 對於第7圖所示之各層,係使用萬能抗張測試機[島 津製作所株式會社(日本)所販售之精密萬能測試機 “Autograph AG- Γ’],測定最大抗張彈性率α,並且以使用 接觸式膜厚計測定厚度d,這些數値均於第2表中顯示, 並且計算出這些數値的積作爲F値而一同顯示於第2表中 。於第2表中,F値爲最大之値係以底線標示出。根據此 ,F値爲最大之光學構件爲偏光板1 0。 第2表 mm [mm] 商品名稱 貼合軸角度 (流動方向)[Q] α(抗張彈性率) [MPa] F=axd [MPa.mm] 保護膜 38χ1〇·3 (*l) 28 3J10 118,2 亮度提升膜 116xl〇·3 DBEF-P2HC 28 2,381 276.2 感壓式接著劑層 15χ10·3 Ρ-3132 偭內等向性) 0.19 0.003 偏光板 ι〇5χΐσ3 SRW062A 118 5,705 599.0 感壓式接著劑層 15χ10'3 Ρ-3132 (面內等向性) 0.19 0.003 第一相位差板 33x10'3 SES430240Z 12 2,370 78.2 感壓式接著劑層 15χ1〇·3 Ρ-3132 湎內等向性) 0.19 0.003 第二相位差板 28 ΧΙΟ-3 SES430120Z 135 2,229 62.4 感壓式接著劑層 15χ1〇·3 Ρ-3132 (面內等向性) 0.19 0.003 塗膜相位差板 9x1 Ο·3 - 湎內等向性) 2.0 0.02 感壓式接著劑層 25χ1〇·3 Ρ-3132 (面內等向性) 0.19 0.005 剝離膜 38χ1〇·3 (*2) 135 3,110 118.2 註 (* 1 )保護膜爲附屬於亮度提升膜者。 (*2 )分離膜爲附屬於感壓式接著劑層者。 因此,係從第7圖的下側(以塗膜相位差板20的位 置爲基準且不包含偏光板1 〇之一側)切入切割用單片刀 刃,而切割爲對角約爲2吋尺寸(41.4mmx31.3mm)之製 品晶片。針對切割後的製品晶片,以顯微鏡調查塗膜相位 -29- 200827789 差板2 0中所產生之龜裂或起伏等缺陷的行進 ,缺陷行進距離的定義,爲於存在於1片晶) 缺陷當中,以從切割面(製品晶片的端部)受 (製品晶片的中央)之缺陷[亦即最大(最長 kt象’所算出之從該缺陷的內側端部至最接丄 晶片的端部爲止之距離。第8圖係顯示,對: 的製品晶片調查其缺陷行進距離並以直方圖| 圖式。 [比較例2] 首先製作出與實施例2相同之大片的複合 後以塗膜相位差板20的位置爲基準,從包含 爲最大之偏光板1 0的一側(第7圖的上側) 單片刀刃,而切割成與實施例2爲相同尺寸之 以與實施例1相同之方法,針對切割後的製品 微鏡調查塗膜相位差板20中所產生之龜裂或 的行進距離。第9圖係顯示,對大約5 00片的 查其缺陷行進距離並以直方圖顯示其分布之圖 從第8圖及第9圖的比較中可得知,於t 9圖)中,缺陷係於複合偏光板的內部廣泛產 此,於實施例2 (第8圖)中,缺陷行進距_ 合偏光板的端部附近,因此可縮短缺陷行進距 產業上之可利用性: 距離。在此 ‘中之多數個 :入至最內側 )的缺陷]爲 該點之製品 :約2 0 0 0片 丨示其分布之 Μ扁光板。之 表示出F値 切入切割用 :製品晶片。 3晶片,以顯 ί起伏等缺陷 J製品晶片g周 式。 匕較例2 (第 [生,相對於 i係集中於複 離0 -30- 200827789 根據本發明之方法,關於至少層積有塗膜相位差板及 偏光板之複合偏光板,於對此複合偏光板進行晶片切割時 ,可大幅減少於塗膜相位差板的端面所容易產生之龜裂或 起伏的現象,提高製品的良率,並且提升適用此複合偏光 板之液晶顯示器的顯示畫質。 【圖式簡單說明】 φ 第1圖係模式性顯示複合偏光板的構成例之剖面圖。 第2圖係顯示從較硬構件側切入刀刃時的變形模樣之 示意圖。 第3圖係顯示從較軟構件側切入刀刃時的變形模樣之 示意圖。 第4圖係模式性顯示於實施例1及比較例1當中,於 依據有限要素法之解析中所使用之複合偏光板的構成之剖 面圖(A )及立體圖(B )。 # 第5圖係顯示實施例1之應力·應變解析的結果之圖 式。 第6圖係顯示比較例1之應力·應變解析的結果之圖 式。 第7圖係模式性顯示於實施例2及比較例2當中,於 實驗中所使用之複合偏光板的構成之剖面圖(A )及立體 圖(B )。 第8圖係顯示於實施例2當中,製品晶片中所產生的 龜裂之最大行進距離的分布之直方圖。 -31 - 200827789 第9圖係顯示於比較例2當中,製品晶片中所產生的 龜裂之最大行進距離的分布之直方圖。 【主要元件符號說明】 10 :偏光板 20 :塗膜相位差板 3 0 :感壓式接著劑層 40、41、42 :由定向樹脂所構成之相位差板 5 〇 :亮度提升膜 60 :保護膜 70 :剝離膜The tensile modulus of the pressure-sensitive adhesive layer 30 of the first table has a tensile modulus of 490 MPa, which is empirically confirmed to be much smaller than the tensile modulus of other optical members. Therefore, the enthalpy is tentative. As shown in the second embodiment to be described later, the tensile modulus of the pressure-sensitive adhesive layer is much smaller than this, but in the present invention, since the optical member having the largest F値 is determined, the simulation is performed. The results can be fully judged. [Comparative Example 1] With respect to the configuration of the composite polarizing plate similar to that of the first embodiment, a finite element model was produced, and the stress and strain generated by the finite element method were analyzed. Further, it is analyzed from the side opposite to the first embodiment, that is, from the side including the side of the polarizing plate 10 in which F 値 is the largest and the upper side of the fourth drawing. In addition, since the cutting edge is also set to the short side as shown in Fig. 4 (B.), α = α 2 is set. Fig. 6 shows the results of stress and strain analysis. The display of Fig. 6 -25-200827789 is the same as that of Fig. 5. When the cutting blade is cut from the side including the polarizing plate 1 表示 indicating the maximum F 为 based on the position of the coating film phase difference plate 20, the stress (strain) affects the cutting edge to the composite polarizing plate. The wide range of the inner side has a large range of influence. [Example 2] First, a large composite polarizing plate was produced in the configuration shown in Fig. 7. Fig. 7(A) is a cross-sectional view showing the configuration of a pattern display layer, and Fig. 7 is a perspective view showing the axial relationship of each layer. The composite polarizing plate produced in this example is sequentially provided with a protective film 60 / brightness enhancement film 50 / pressure-sensitive adhesive layer 30 / polarizing plate 10 / pressure-sensitive adhesive layer 30 / from the upper side of FIG. A phase difference plate 41 / a pressure sensitive adhesive layer 30 / a second phase difference plate 42 / a pressure sensitive adhesive layer 30 / a coating film phase difference plate 20 / a pressure sensitive adhesive layer 30 / a release film 70 are It consists of 12 layers. Among these, the five-layer pressure-sensitive adhesive layer 30 and the coating film phase difference plate 20 are configured to be optically isotropic in the plane. Further, the short side direction after the dicing shown in Fig. 7(B) is 00, the brightness enhancement film 50, and the protective film 60, the polarizing plate 10, the first phase difference plate 4, and the second phase disposed thereon. The flow direction of the peeling film 70 on the difference plate 42 and the pressure-sensitive adhesive layer 3 is arranged so as to be an angle shown in the same figure. The term "flow direction" as used herein refers to the flow direction of each film supplied in the form of a roller (the longitudinal direction of the roller). The flow direction of the brightness enhancement film 5 相当于 corresponds to the transmission axis, and the flow direction of the polarizing plate 1 为 is the orientation direction and corresponds to the absorption axis, and the flow directions of the first phase difference plate 4 1 and the second phase difference plate 42 are both the orientation directions. And equivalent to the slow phase axis. -26- 200827789 In the optical member used in this example, in addition to the coating film, commercially available products are, for example, the following. Brightness-enhancing film 50: "DBEF" in which a plurality of layers of molecular films are alternately laminated in Sumitomo 3M Co., Ltd. This product can be purchased in a state in which a polyethylene terephthalic protective film is bonded to both surfaces thereof. The pressure-sensitive adhesive layer 30 (all of the five layers are the same): (named after the acrylic pressure-sensitive adhesive article sold by the company). This product can be purchased in a state in which a release film composed of a polyester is bonded to both sides thereof. Use to make the thickness different. Polaroid plate 10: Sumitomo Chemical Co., Ltd. ("SRW062A" (trade name) with a triacetate protective layer bonded to both sides of a Japanese vinyl alcohol-iodine-based polarizer. First phase difference plate 4 1 : Bicycloheptene of Sumitomo Chemical Co., Ltd. Oriented film of resin, in-plane phase β "SES430240Z" (trade name). Second phase difference plate 42: Orientation film of bicycloheptene resin of Sumitomo Chemical Co., Ltd., in-plane phase fi "SES430120Z" (trade name) Further, the coating film phase difference plate 20 is used in the combination of the phase difference plate 42 and the pressure-sensitive adhesive layer 30 of FIG. 2 and the film 70 and the pressure-sensitive adhesive layer 30, and the following phase difference plate 20 Two kinds of high (commodity name) are sold. The Lintec Co., Ltd. "P - 3 1 3 2" consisting of formic acid esters (commercially different from ethylene ethylene terephthalate) is sold in poly The cellulose film is sold as a shovel (sho), and the difference is 240 nm (曰本). The difference is 120 nm. The upper side is located on the lower side of the peeling column. -27- 200827789 Polyethylene with a thickness of 3 8 μm after demolding A release coating surface of a terephthalate film (hereinafter referred to as "release film") is applied to a coating liquid for a coating film phase difference plate having the following composition, and then at 90 minutes (for 3 minutes) After drying, the coating film phase difference plate 20 is formed. Thereafter, the second phase difference plate 42 ("SES430120Z") of the pressure-sensitive adhesive layer 30 is attached, and the pressure-sensitive adhesive layer side is attached thereto. After the release film is peeled off from the coating film phase difference plate 20, the pressure-sensitive adhesive provided on the release film 70 is applied to the release film release surface of the coating film phase difference plate 20. The layer 30 ("P-3 13 2") is bonded to form the second phase difference plate 42 / the pressure-sensitive adhesive layer 30 / the coating film phase difference plate 20 / the pressure-sensitive adhesive layer 30 / the release film 70 Composition of coating liquid for coating phase difference plate: urethane resin lacquer "SBU Lacquer 0 8 66" ” 16.0 parts of organically modified clay composite “Rusentit STN” ^ 7.2 parts toluene 7 6 · 8 parts of leeches · 3 copies" "SBU Lacquer 0866" (trade name): Sumitomo Bayer Urethane Co., Ltd. (Japan) A urethane resin based on isophorone diisocyanate, a resin paint liquid with a solid concentration of 30%, 2*2 "Rusentit STN" (trade name): CO-OP Chemical Co., Ltd. (Japan) a composite of synthetic lithium magnesium silicate clay and diamyl methylammonium ion. -28- 200827789 For each layer shown in Fig. 7, a universal tensile tester is used [Shimadzu Corporation] (Autograph AG- Γ'], which is sold in Japan (Japan), measures the maximum tensile modulus α, and measures the thickness d using a contact film thickness meter. These numbers are shown in Table 2. And the product of these numbers is calculated as F値 and displayed together in the second table. In Table 2, the largest enthalpy of F 标 is indicated by the bottom line. According to this, the optical member in which F値 is the largest is the polarizing plate 10. Table 2 mm [mm] Product name fit shaft angle (flow direction) [Q] α (tensile modulus) [MPa] F=axd [MPa.mm] Protective film 38χ1〇·3 (*l) 28 3J10 118,2 Brightness Enhancement Film 116xl〇3 DBEF-P2HC 28 2,381 276.2 Pressure-sensitive adhesive layer 15χ10·3 Ρ-3132 偭In-situ isotropic) 0.19 0.003 Polarizing plate ι〇5χΐσ3 SRW062A 118 5,705 599.0 Pressure-sensitive adhesive Layer 15χ10'3 Ρ-3132 (in-plane isotropic) 0.19 0.003 First phase difference plate 33x10'3 SES430240Z 12 2,370 78.2 Pressure-sensitive adhesive layer 15χ1〇·3 Ρ-3132 湎I-isotropic) 0.19 0.003 Two phase difference plate 28 ΧΙΟ-3 SES430120Z 135 2,229 62.4 Pressure-sensitive adhesive layer 15χ1〇·3 Ρ-3132 (in-plane isotropic) 0.19 0.003 Film phase difference plate 9x1 Ο·3 - 湎内 isotropic 2.0 0.02 Pressure-sensitive adhesive layer 25χ1〇·3 Ρ-3132 (in-plane isotropic) 0.19 0.005 Release film 38χ1〇·3 (*2) 135 3,110 118.2 Note (* 1 ) Protective film is attached to brightness Lift the film. (*2) The separation membrane is attached to the pressure-sensitive adhesive layer. Therefore, the cutting single blade is cut from the lower side of Fig. 7 (based on the position of the coating film phase difference plate 20 and does not include one side of the polarizing plate 1), and is cut to a diagonal size of about 2 inches. (41.4mmx31.3mm) product wafer. For the product wafer after cutting, the defect of the crack or undulation generated in the film phase -29-200827789 difference plate 20 is investigated by microscope, and the defect travel distance is defined as being in the defect of one crystal. From the cut surface (the end of the product wafer) to the defect (the center of the product wafer) [that is, the maximum (the longest kt image] calculated from the inner end of the defect to the end of the most connected wafer Fig. 8 shows the defect travel distance of the product wafer of: and the histogram|pattern. [Comparative Example 2] First, the same large-sized composite film as in Example 2 was used to form a film phase difference plate. The position of 20 is the same as that of the first embodiment from the side (the upper side of FIG. 7) including the largest polarizing plate 10, and is cut into the same size as in the second embodiment, in the same manner as in the first embodiment, The cut product micromirror investigates the crack or travel distance generated in the coated phase difference plate 20. Fig. 9 shows a plot of the defect travel distance of about 500 pieces and a histogram showing the distribution thereof. Ratio from Figure 8 and Figure 9 As can be seen from the above, in Fig. 9), the defect is widely produced in the interior of the composite polarizing plate. In the second embodiment (Fig. 8), the defect travel distance is near the end of the polarizing plate, so Shorten the defect travel distance from the industry: Distance. Here, the deficiencies of the majority: into the innermost side are the products of this point: about 200 pieces of Μ flat light plates whose distribution is shown. The figure shows the F値 cut-in cutting: product wafer. 3 wafers to show defects such as undulations, etc. J-product wafer g-cycle.匕Comparative Example 2 (the first [raw, relative to the i-series focused on the detachment 0 -30-200827789] according to the method of the present invention, a composite polarizing plate having at least a coating film phase difference plate and a polarizing plate laminated thereon When the polarizing plate is subjected to wafer dicing, the crack or undulation which is likely to occur at the end surface of the coating film phase difference plate can be greatly reduced, the yield of the product can be improved, and the display quality of the liquid crystal display to which the composite polarizing plate is applied can be improved. BRIEF DESCRIPTION OF THE DRAWINGS φ Fig. 1 is a schematic cross-sectional view showing a configuration example of a composite polarizing plate. Fig. 2 is a schematic view showing a deformation pattern when cutting a blade from a side of a hard member. Fig. 3 shows a comparison of the deformation pattern. Schematic diagram of the deformation pattern when the soft member is cut into the blade side. Fig. 4 is a cross-sectional view showing the configuration of the composite polarizing plate used in the analysis of the finite element method in the first embodiment and the comparative example 1 (A). Fig. 5 is a diagram showing the results of the stress/strain analysis of the first embodiment. Fig. 6 is a diagram showing the results of the stress/strain analysis of the comparative example 1. mold The cross-sectional view (A) and the perspective view (B) of the composite polarizing plate used in the experiment are shown in Example 2 and Comparative Example 2. Fig. 8 is shown in Example 2, in the product wafer. A histogram of the distribution of the maximum travel distance of the generated crack. -31 - 200827789 Fig. 9 is a histogram showing the distribution of the maximum travel distance of the crack generated in the product wafer in Comparative Example 2. DESCRIPTION OF REFERENCE NUMERALS 10: polarizing plate 20: coating film phase difference plate 30: pressure-sensitive adhesive layer 40, 41, 42: phase difference plate 5 made of oriented resin 亮度: brightness enhancement film 60: protective film 70: Release film

-32--32-

Claims (1)

200827789 十、申請專利範圍 1. 一種複合偏光板製品晶片之製造方法,爲將複合 偏光板予以晶片切割成製品尺寸之複合偏光板製品晶片之 製造方法,此複合偏光板係至少層積有由厚度3 0 μ m以下 的塗膜層所形成之相位差板及偏光板,由該塗膜層所形成 之相位差板,其上下方係由抗張彈性率爲10OMPa以下的 感壓式接著劑層所包夾,其特徵爲: 以由該塗膜層所形成之相位差板的位置爲基準,於存 在於其上下方之所有的光學構件中,係從不包含由右式: F ( MPa · mm )=與切割邊垂直之方向的抗張彈性率(MPa )X厚度(mm )所定義的F値爲最大之光學構件之一側的 面,切入切割用刀刃。 2·如申請專利範圍第1項所記載之複合偏光板製品 晶片之製造方法,其中,偏光板係於偏光件的兩側具有透 明保護層,且F値爲最大之光學構件爲該偏光板。 # 3.如申請專利範圍第1或2項所記載之複合偏光板 製品晶片之製造方法,其中由塗膜層所形成之相位差板, 係將於有機溶劑中含有有機改質黏土複合體及黏結劑樹脂 之塗佈液塗佈於基材上,並去除溶劑而形成。 4·如申請專利範圍第3項所記載之複合偏光板製品 晶片之製造方法’其中有機改質黏土複合體,爲具有碳數 1〜30的院基之4級銨化合物及屬於膨潤石(smectite )族 之黏土礦物之複合體。 5 ·如申請專利範圍第4項所記載之複合偏光板製品 -33- 200827789 晶片之製造方法,其中,屬於膨潤石族之黏土礦物爲合成 砂酸錶鋰黏土( Hectorite)。 6·如申請專利範圍第3項所記載之複合偏光板製品 晶片之製造方法,其中有機改質黏土複合體,其鎂對矽的 4原子之原子比(Mg/Si4 )爲未滿2.73。 7·如申請專利範圍第3項所記載之複合偏光板製品 晶片之製造方法,其中有機改質黏土複合體,係在其中所 包含之氯的量爲2000PPm以下之狀態下含有於有機溶劑中 〇 8 ·如申請專利範圍第3項所記載之複合偏光板製品 晶片之製造方法,其中黏結劑樹脂,爲以二異氰酸異佛爾 酮(Isophorone Diisocyanate)爲基質之氨基甲酸酯樹脂 〇 9· 一種複合偏光板製品晶片之製造方法,爲將複合 偏光板予以晶片切割成製品尺寸之複合偏光板製品晶片之 製造方法,此複合偏光板係至少層積有:由厚度3 0 μ m以 下的塗膜層所形成之相位差板;及於偏光元件的兩側具有 透明保護層之偏光板,由該塗膜層所形成之相位差板,其 上下方係由抗張彈性率爲lOOMPa以下的感壓式接著劑層 所包夾,其特徵爲: 以由該塗膜層所形成之相位差板的位置爲基準,從與 存在有上述偏光板之一側爲相反側,切入切割用刀刃。 -34-200827789 X. Patent Application Range 1. A method for manufacturing a composite polarizing plate product wafer, which is a manufacturing method of a composite polarizing plate product wafer in which a composite polarizing plate is wafer-cut into a product size, the composite polarizing plate is laminated with at least a thickness A phase difference plate and a polarizing plate formed of a coating layer of 300 μm or less, and a phase difference plate formed of the coating layer has a pressure-sensitive adhesive layer having a tensile modulus of 10 OMPa or less. The package is characterized in that, based on the position of the phase difference plate formed by the coating layer, all of the optical members present above and below are never included by the right type: F (MPa) Mm) = the surface on the side of one of the optical members defined by the tensile modulus (MPa) X thickness (mm) in the direction perpendicular to the cutting edge, and cut into the cutting edge. The method for producing a composite polarizing plate product wafer according to the first aspect of the invention, wherein the polarizing plate has a transparent protective layer on both sides of the polarizing member, and the optical member having the largest F 为 is the polarizing plate. 3. The method for producing a composite polarizing plate product wafer according to claim 1 or 2, wherein the phase difference plate formed by the coating layer contains an organically modified clay composite in an organic solvent and The coating liquid of the binder resin is applied onto a substrate and formed by removing the solvent. 4. The method for producing a composite polarizing plate product wafer as described in claim 3, wherein the organically modified clay composite is a tertiary ammonium compound having a carbon number of 1 to 30 and belonging to bentonite (smectite) a complex of clay minerals of the family. 5. The composite polarizing plate product as described in claim 4, the method for producing a wafer, wherein the clay mineral belonging to the bentonite group is a synthetic lithium acid lithium clay (Hectorite). 6. The method for producing a composite polarizing plate product wafer according to the third aspect of the invention, wherein the organically modified clay composite has an atomic ratio of 4 atoms (Mg/Si4) of magnesium to yttrium of less than 2.73. 7. The method for producing a composite polarizing plate product wafer according to the third aspect of the invention, wherein the organically modified clay composite is contained in an organic solvent in a state in which the amount of chlorine contained therein is 2000 ppm or less. The method for producing a composite polarizing plate product wafer according to the third aspect of the invention, wherein the binder resin is a urethane resin based on Isophorone Diisocyanate. A method for manufacturing a composite polarizing plate product wafer, which is a method for manufacturing a composite polarizing plate product wafer in which a composite polarizing plate is wafer-cut into a product size, the composite polarizing plate being laminated at least with a thickness of 30 μm or less a phase difference plate formed by the coating layer; and a polarizing plate having a transparent protective layer on both sides of the polarizing element, and the phase difference plate formed by the coating layer has a tensile modulus of 100 MPa or less. The pressure-sensitive adhesive layer is sandwiched by the position of the phase difference plate formed by the coating layer, and the polarizing plate is present Side to the opposite side, cut with the cutting blade. -34-
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