200821634 九、發明說明： 【發明所屬之技術領域】 本發明係有關一種彩色濾光片基板，特別關 上避免材料互相污染之擋牆。 < 【先前技術】200821634 IX. Description of the Invention: [Technical Field] The present invention relates to a color filter substrate, particularly to a retaining wall that avoids mutual contamination of materials. <Prior Art
液晶顯示器（Liquid Crystal Display，LCD)的構迭一船 係由液晶層夾設於薄膜電晶體陣列基板與彩色淚光片2 板之間。彩色濾光片之製作是於玻璃基板上，將1工、綠二 藍三原色之有機材料，製作在每一個晝素之内。彩色淚'光 片是液晶顯示器關鍵零組件中成本最高者。以筆記型電腦 用的14.1吋面板為例，彩色濾光片約佔所有材料成本的 28%左右’咼於背光模組（18%)與驅動Ic (17%)的成 本0 彩色濾光片著色部分的形成方法有染料法、顏料分散 法、印刷法、電解沉積法、噴墨法。目前以顏料分散法為 主，第一步是將顆粒均勻的微細顏料（R、G、b三色）分 散在透明感光樹脂中。然後用塗佈、曝光、顯影等方法， 依次形成R、G、B三色圖案。為了防止漏光，在rgb三 色交界處一般都要加黑色矩陣（BM)。以往多用濺射法 形成單層金屬鉻膜，現在也有改用金屬鉻和氧化鉻複合型 的BM膜或樹脂混合碳的樹脂型BM。此外，還需要在bm 上製作一層保護膜及形成1丁〇電極。由於彩色濾光片基板 與TFT基板一起構成液晶盒，兩基板彼此必須對準，使 彩色濾光片的晝素區與TFT基板之晝素區相對應。值得 注思的疋’此種製程需要昂貴的彩色光阻’且微影製程極A liquid crystal display (LCD) is formed by sandwiching a liquid crystal layer between a thin film transistor array substrate and a color tear film 2 plate. The color filter is produced on a glass substrate, and an organic material of three primary colors, one green and two blue colors, is produced in each of the elements. The Color Tear film is the most costly of the key components of LCDs. Taking the 14.1" panel for notebook computers as an example, color filters account for about 28% of all material costs. 'The cost of backlight module (18%) and driver Ic (17%) is 0 color filter coloring. Part of the formation method is a dye method, a pigment dispersion method, a printing method, an electrolytic deposition method, and an inkjet method. At present, the pigment dispersion method is mainly used, and the first step is to disperse fine particles of fine particles (R, G, and b) in a transparent photosensitive resin. Then, a three-color pattern of R, G, and B is sequentially formed by coating, exposure, development, or the like. In order to prevent light leakage, a black matrix (BM) is usually added at the rgb three-color junction. Conventionally, a single-layer metal chromium film has been formed by a sputtering method, and a resin type BM in which a metal chromium and a chromium oxide composite type BM film or a resin mixed carbon is used has been used. In addition, it is also necessary to form a protective film on bm and form a 1 〇 electrode. Since the color filter substrate and the TFT substrate constitute a liquid crystal cell, the two substrates must be aligned with each other such that the pixel region of the color filter corresponds to the pixel region of the TFT substrate. It’s worth noting that 'this process requires expensive color photoresist' and the lithography process
Client’s Docket No.:AU0602048 TT’s Docket N〇:0632-A50731 -TW/fmal/hsuhuche 5 200821634 耗工耗時’將大幅提南彩色滤光片基板之製作成本5同時 提高LCD之製作成本。 美國專利第5,340,619號揭示一種彩色濾光片基板的 形成方法。首先形成一黑色矩陣層於基板上後，以雷射剝 除部份之黑色矩陣層，並旋塗一色材填滿剝除區。接著硬 化色材後，以電漿製程或雷射製程移除剝除區外之色材。 重複雷射剝除、旋塗色材、硬化、及移除多餘之色材等步 驟即可形成彩色濾光片基板。顯而易見的是，此種作法將 耗費大量的色材。且旋塗之色材必需以額外的平勻化製程 0 以避免色材互相污染的問題。 第1A-1F圖係以喷墨法解決分散顏料法之色材成本 的問題。首先如第1A圖所示，於基板10上形成一感光 之擋牆層12如黑色矩陣層。接著如第1B-1C圖所示，利 用光罩11進行微影製程曝光及顯影擋牆層12，定義出複 數個擋牆14。值得注意的是，目前大部份的技術所製作 出之擋牆14其侧壁與基板10之夾角Θ小於60度。接著 如第1D圖所示，以表面處理製程使擋牆14其侧壁呈親 色材性，其上表面呈疏色材性。接著如第1E-1F圖所示， • 以色材噴頭17於不同的剝除區間填入墨水16，硬烤後形 成彩色濾光片19，即完成彩色濾光片基板18。如第1G 圖所示，當色材16互相混色時，彩色濾光片基板18之品 質便會降低。 【發明内容】 本發明為解決喷墨法製作彩色濾光片基板造成色料 混色之問題，特別提供一種彩色濾光片基板的形成方法，Client's Docket No.: AU0602048 TT’s Docket N〇: 0632-A50731 - TW/fmal/hsuhuche 5 200821634 Time-consuming and labor-saving will greatly increase the manufacturing cost of the color filter substrate of 5 and increase the manufacturing cost of the LCD. A method of forming a color filter substrate is disclosed in U.S. Patent No. 5,340,619. After forming a black matrix layer on the substrate, a portion of the black matrix layer is stripped by laser and a color material is spin-coated to fill the stripping region. After hardening the color material, the color material outside the stripping area is removed by a plasma process or a laser process. The color filter substrate can be formed by repeating the steps of laser stripping, spin coating, hardening, and removal of excess color material. Obviously, this practice will consume a lot of color materials. And the spin-coated color material must be treated with an additional leveling process 0 to avoid contamination of the color materials. The 1A-1F diagram solves the problem of the cost of the color material of the disperse pigment method by the ink jet method. First, as shown in Fig. 1A, a photosensitive barrier layer 12 such as a black matrix layer is formed on the substrate 10. Next, as shown in Fig. 1B-1C, the reticle process exposure and development of the barrier layer 12 are performed using the mask 11, and a plurality of retaining walls 14 are defined. It is worth noting that most of the current technology of the retaining wall 14 has an angle Θ of less than 60 degrees between the side wall and the substrate 10. Next, as shown in Fig. 1D, the sidewall of the retaining wall 14 is made of a color-sensitive material by a surface treatment process, and the upper surface thereof has a coloring property. Next, as shown in Fig. 1E-1F, the ink filter 16 is filled in the different stripping sections by the color material head 17, and the color filter 19 is formed by hard baking, that is, the color filter substrate 18 is completed. As shown in Fig. 1G, when the color materials 16 are mixed with each other, the quality of the color filter substrate 18 is lowered. SUMMARY OF THE INVENTION The present invention is to solve the problem of color mixing of a color filter substrate by an inkjet method, and particularly to provide a method for forming a color filter substrate.
Client’s Docket N〇.:AU06_48 TTJs Docket No:0632-A50731-TW/finaI/hsuhuche 6 200821634 ^提t、基1反:形成擋牆層於基板上;對檔牆層進行剝除 以开^、複數個剝除區及複數個檔牆，其中擋牆分隔 ^除區」進行表面處理製程，使擋牆之上表面呈疏色材 丄進行填充製秋，將至少―色材分別填人剝除區；以及 硬烤色材。 、本發明更提供-種彩色濾光片基板，包括基板；複數 個濾光片，以及複數個擋牆；其中些㈣分隔該些濾、光 片，且私牆之侧壁與基板之夾角介於⑼度至9〇度之間。 【實施方式】 如第2A圖所示，本發明提供一擋牆層22於一基板 20上。基板20例如可為可撓性透明材質如塑膠，或不可 撓性透明材質如玻璃或石英。檔牆層22也可為黑色矩陣 層，由於本發明係使用剝除製程，因此可視情況採用感光 材料或非感光材料。感光材料例如為含溶劑之液態光阻、 液悲樹脂、乾膜光阻、或轉移膜光阻，如具有感光基之壓 克力樹月曰（Acrylic)、環氧樹脂（Ep〇xy resin)、或聚醯亞胺 樹脂(PI)。為了減少感光材料之透光度，可混合顏料、染 料、或碳黑（carbon black)。非感光材料可為壓克力樹脂 (Acrylic)、環氧樹脂(Epoxy resin)、或聚醯亞胺樹脂（pi)， 一樣可混合顏料、染料、或碳黑（carbon black)。由於非感 光材料採用之樹脂不需具備感光基，可降低成本。此外， 非感光材料亦包括金屬材料如鉻或氧化鉻。若採用濕式之 感光材料作為播牆層22，較佳在剝除製程前先進行—石更 烤製程以除去感光材料所含之溶劑。較佳之硬烤溫度介於 約150°C至250°C，更佳約為220°C。 、Client's Docket N〇.:AU06_48 TTJs Docket No:0632-A50731-TW/finaI/hsuhuche 6 200821634 ^Tursing, base 1 reverse: forming a retaining wall layer on the substrate; stripping the wall layer to open ^, plural a stripping area and a plurality of partition walls, wherein the retaining wall is separated from the dividing zone to perform a surface treatment process, so that the upper surface of the retaining wall is filled with a coloring material, and at least the color material is filled into the stripping area. ; and hard-baked color materials. The invention further provides a color filter substrate, comprising a substrate; a plurality of filters, and a plurality of retaining walls; wherein (4) separating the filters and the light sheets, and the angle between the sidewalls of the private wall and the substrate Between (9) and 9 degrees. [Embodiment] As shown in Fig. 2A, the present invention provides a barrier layer 22 on a substrate 20. The substrate 20 may be, for example, a flexible transparent material such as plastic, or an inflexible transparent material such as glass or quartz. The barrier layer 22 can also be a black matrix layer. Since the present invention uses a stripping process, a photosensitive material or a non-photosensitive material can be used as appropriate. The photosensitive material is, for example, a solvent-containing liquid photoresist, a liquid-resistance resin, a dry film photoresist, or a transfer film photoresist, such as an acrylic resin having a photosensitive group, and an epoxy resin (Ep〇xy resin). Or polyimine resin (PI). In order to reduce the light transmittance of the photosensitive material, a pigment, a dye, or carbon black may be mixed. The non-photosensitive material may be an acrylic resin, an epoxy resin (Epoxy resin), or a polyimide resin (pi), and may be mixed with a pigment, a dye, or a carbon black. Since the resin used for the non-photosensitive material does not need to have a photosensitive group, the cost can be reduced. In addition, non-photosensitive materials also include metallic materials such as chromium or chromium oxide. If a wet photosensitive material is used as the wall layer 22, it is preferred to carry out a stone baking process to remove the solvent contained in the photosensitive material before the stripping process. Preferably, the hard roasting temperature is between about 150 ° C and 250 ° C, more preferably about 220 ° C. ,
Client’s Docket N〇.:AU0602048 TT^ Docket Ν〇:0632»Α50731-TW/final/hsuhuche 7 200821634 如第2B圖所示，接著利用光罩21進行剝除製程以定 義擋牆24,及被擋牆24分隔之剝除區25。若採用微影製 程定義擋牆24，則早先形成之檔牆層22必須為感光材 料。若採用雷射製程如固態雷射或準分子雷射定義檔牆 24,則可採用價格較低廉之非感光材料。雷射製程可視情 況直寫或採用光罩以定義擋牆24。此剝除製程形成之擋 牆24其侧壁與基板20之夾角θ’約介於60度至90度之 間。一般利用微影製程形成的擋牆其側壁與基板夾角無法 大於60度，因為光繞射使檔牆層22表面的曝光度大於擂 φ 牆層底部之曝光度。上述製程形成之檔牆層24厚度介於 約0.5微米至5.0微米之間。 如第2C圖所示，接著進行一表面處理製程如電漿表 面處理製程使擋牆24之上表面呈疏色材性，其侧壁呈親 色材性。當色材為親水性（水性）時，則需選擇適當之表面 處理製程使擋牆24之侧壁為親水性，上表面為疏水性。 若色材為疏水性（油性）時，則需採用另一種表面處理製程 使擋牆24之侧壁為疏水性，上表面為親水性。 如第2D圖所示，接著填入色材26於剝除區25内。 ⑩ 值得注意的是，此步驟可以單一色材喷頭27將色材26依 序填入剝除區25，亦可以多個色材喷頭（未圖示）將色材 26同時填入不同的剝除區25。色材可為紅色墨水、藍色 墨水、綠色墨水、或青色墨水，其性質可為親水性或疏水 性。由於擋牆24之侧壁與基板20之夾角介於60度與90 度之間，在較小尺寸後上表面仍具有一定之寬度而不致縮 小甚至消失，可避免色材混色之問題。 最後如第2Ε圖所示，進行一硬烤製程硬化色材26以Client's Docket N〇.: AU0602048 TT^ Docket Ν〇:0632»Α50731-TW/final/hsuhuche 7 200821634 As shown in Figure 2B, the stripping process is then performed using the reticle 21 to define the retaining wall 24, and the retaining wall 24 separate stripping areas 25. If the retaining wall 24 is defined by a lithography process, the previously formed barrier wall layer 22 must be a photosensitive material. If a laser process such as a solid-state laser or a quasi-molecular laser is used to define the barrier wall 24, a less expensive non-photosensitive material can be used. The laser process can be written directly or with a reticle to define the retaining wall 24. The stripping wall 24 formed by the stripping process has an angle θ' between the side wall and the substrate 20 of between about 60 and 90 degrees. Generally, the retaining wall formed by the lithography process may have an angle between the side wall and the substrate of not more than 60 degrees, because the light diffraction makes the surface of the barrier layer 22 more exposed than the bottom of the φ φ wall layer. The thickness of the barrier layer 24 formed by the above process is between about 0.5 microns and 5.0 microns. As shown in Fig. 2C, a surface treatment process such as a plasma surface treatment process is carried out to make the upper surface of the retaining wall 24 a color-repellent material, and the side walls are color-friendly. When the color material is hydrophilic (aqueous), an appropriate surface treatment process is required to make the sidewall of the retaining wall 24 hydrophilic and the upper surface hydrophobic. If the color material is hydrophobic (oily), another surface treatment process is required to make the sidewall of the retaining wall 24 hydrophobic and the upper surface hydrophilic. As shown in Fig. 2D, the color material 26 is then filled in the stripping zone 25. 10 It should be noted that in this step, the color material 26 may be sequentially filled into the stripping area 25 by the single color material nozzle 27, or the color material 26 may be filled in different colors by a plurality of color material nozzles (not shown). Stripping area 25. The color material may be red ink, blue ink, green ink, or cyan ink, and its properties may be hydrophilic or hydrophobic. Since the angle between the side wall of the retaining wall 24 and the substrate 20 is between 60 degrees and 90 degrees, the upper surface still has a certain width without shrinking or even disappearing after the smaller size, thereby avoiding the problem of color mixing of the color material. Finally, as shown in Figure 2, a hard baked process hardening color material 26 is performed.
Client’s Docket N〇_:AU0602048 TT5s Docket N〇:0632-A50731-TW/fmal/hsuhuche 8 200821634 形成彩色濾光片29，以完成彩色濾光片基板28。較佳之 硬烤溫度介於約150°C至250°C，更佳約為220°C。彩色濾 光片29的顏色視色材26而定，可為紅、藍、綠、或青色。 由於本發明之擋牆層24在尺寸縮小後仍具有較寬之 上表面並避免色材混色之問題，適合用於高解析度LCD 面板。 雖然本發明已以數個較佳實施例揭露如上，然其並非 用以限定本發明，任何所屬技術領域中具有通常知識者， 在不脫離本發明之精神和範圍内，當可作任意之更動與潤 _ 飾，因此本發明之保護範圍當視後附之申請專利範圍所界 定者為準。Client's Docket N〇_: AU0602048 TT5s Docket N〇: 0632-A50731-TW/fmal/hsuhuche 8 200821634 A color filter 29 is formed to complete the color filter substrate 28. Preferably, the hard baking temperature is between about 150 ° C and 250 ° C, more preferably about 220 ° C. The color of the color filter 29 depends on the color material 26 and may be red, blue, green, or cyan. Since the retaining wall layer 24 of the present invention has a wide upper surface after being downsized and avoids the problem of color mixing of the color material, it is suitable for use in a high resolution LCD panel. While the invention has been described above in terms of several preferred embodiments, it is not intended to limit the scope of the present invention, and it is possible to make any changes without departing from the spirit and scope of the invention. The scope of protection of the present invention is defined by the scope of the appended claims.
Client’s Docket No.:AU0602048 9 TT's Docket N〇:0632-A50731 -TW/fmal/hsuhuche 200821634 【圖式簡單說明】 第1A-1G圖係習知技藝之彩色遽光片基板之製程剖面 圖；以及 第2A-2E圖係本發明較佳實施例之彩色濾光片基板之 製程剖面圖。 【主要元件符號說明】 11、21〜光罩； 14、24〜擔牆； 16、26〜色材； 18'28〜彩色濾光片基板； θ、θ’〜擋牆之侧壁與基板間的夾角。 10、20〜基板， 12、22〜擋牆層； 15、25〜剝除區； 17、27〜色材喷頭； 19、29〜彩色濾光片；Client's Docket No.: AU0602048 9 TT's Docket N〇: 0632-A50731 - TW/fmal/hsuhuche 200821634 [Simplified Schematic] 1A-1G is a cross-sectional view of the process of the color slab substrate of the conventional technique; 2A-2E is a process cross-sectional view of a color filter substrate in accordance with a preferred embodiment of the present invention. [Main component symbol description] 11, 21~mask; 14, 24~ wall; 16, 26~ color material; 18'28~ color filter substrate; θ, θ'~ between the sidewall of the retaining wall and the substrate The angle of the. 10, 20~ substrate, 12, 22~ retaining wall layer; 15, 25~ stripping area; 17, 27~ color material nozzle; 19, 29~ color filter;
Client’s Docket N〇.:AU0602048 TT's Docket N〇:0632-A50731 -TW/final/hsuhuche 10Client’s Docket N〇.:AU0602048 TT's Docket N〇:0632-A50731 -TW/final/hsuhuche 10