TW200806698A - Novel polyfluorodiene, method for producing the same, and novel fluorine-containing polymer - Google Patents

Novel polyfluorodiene, method for producing the same, and novel fluorine-containing polymer Download PDF

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TW200806698A
TW200806698A TW96120559A TW96120559A TW200806698A TW 200806698 A TW200806698 A TW 200806698A TW 96120559 A TW96120559 A TW 96120559A TW 96120559 A TW96120559 A TW 96120559A TW 200806698 A TW200806698 A TW 200806698A
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Yoko Takebe
Isamu Kaneko
Osamu Yokokoji
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Asahi Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00Preparation of halogenated hydrocarbons
    • C07C17/23Preparation of halogenated hydrocarbons by dehalogenation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00Preparation of halogenated hydrocarbons
    • C07C17/26Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton
    • C07C17/263Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00Preparation of halogenated hydrocarbons
    • C07C17/26Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton
    • C07C17/272Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by addition reactions
    • C07C17/278Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by addition reactions of only halogenated hydrocarbons
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C21/00Acyclic unsaturated compounds containing halogen atoms
    • C07C21/02Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
    • C07C21/19Halogenated dienes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18Monomers containing fluorine

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Abstract

Disclosed are a novel polyfluorodiene, a production method thereof, and a novel fluorine-containing polymer. Specifically disclosed are a compound represented by the following formula: CF2=CFCH2CHR(CH2)mCX=CH2, a polymer having a repeating unit obtained by polymerization of the compound, and a polymer having a repeating unit represented by the formula (A) below. (In the formulae, R represents an alkyl group having 1-12 carbon atoms or a fluoroalkyl group having 1-12 carbon atoms; m represents 0, 1 or 2; and X represents a hydrogen atom or an alkyl group having 1-12 carbon atoms.)

Description

200806698 (1) 九、發明說明 【發明所屬之技術領域】 本發明爲有關新穎之聚氟化二烯、其製造方法、及新 穎之含氟聚合物。 【先前技術】 專利文獻1及專利文獻 2中有著使用由 CF2 = • CFCF2CF2CH2CH = ch2、cf2 = cfcf(cf3)cf2ch2ch = ch2 及cf2 = cfcf2cf(cf3)ch2ch二CH2所成群所選出之聚氟 (1,6-庚二烯)類,經環化聚合而形成主鏈具有含氟脂肪 族環構造之聚合物等記載。專利文獻1及專利文獻2中亦 有記載前述聚合物具有優良之耐藥性與熱特性,使用標準 技術即可用於薄膜、塗覆劑、成形品加工等技術領域中。 專利文獻1 :特表平1 0-506666號公報 專利文獻2 :特表2000-5 1 1 1 92號公報 參 【發明內容】 但是,對於去除支鏈之碳原子(即,主鏈部份之碳原 子)中僅有1位與2位之碳原子上鍵結有氟原子之分支狀 聚氟化二烯係屬未知。此外,對於該聚氟化二烯之聚合 物、及其物性亦未有任何了解。 本發明之目的,即爲提供一種不含支鏈之碳原子(主 鏈部份之碳原子)上,僅有1位與2位之碳原子上鍵結氟 原子所得之分支狀之聚氟化二烯、及該氟化二烯經聚合所 -5- 200806698 (2) 得之具有優良耐藥性、耐熱性、透明性、耐久耐光性、撥 水撥油性,特別是具有優良撥水性之聚合物。 本發明爲具有下述特徵之發明。 〔1〕、一種下式(a )所示之化合物, cf2= cfch2chr ( ch2) mcx= ch2 其中,式中之記號具有下述之意義(以下相同), R:碳數1至12之烷基或碳數1至12之氟烷基, m : 0、1 或 2, X:氫原子或碳數1至12之烷基。 〔2〕、如〔1〕項之化合物,其中,R爲碳數3至6之烷 基或碳數3至6之多氟烷基。 〔3〕、如〔1〕或〔2〕項之化合物,其中,R爲式· CH2RF所示多氟院基(其中,RF爲碳數2至5之全氟烷 基)。 〔4〕、一種下述式(a )所示之化合物的製造方法,其特 徵爲,使下式(f)所示化合物與下述式(6)所示化合物 反應而得下述式(d )所示之化合物,其次,將該化合物 與下述式(c)所示化合物反應而得下述式(b)所示化合 物,其次,將該化合物與去鹵化劑反應之方法, CH2= CHR ( f) CF2YCFIY ( e) CF2YCFYCH2CHIR ( d) -6 - 200806698 (3) CH2 二 CX(CH2)mMgZ ( c ) CF2YCFYCH2CHR(CH2)mCX= CH2 ( b ) 其中,式中之記號具有下述之意義(以下相同), * Y、Z:各自獨立之氯原子或溴原子。 ' 〔5〕、一種含有下式(A)所示重複單位之聚合物, 〔化1〕200806698 (1) Description of the Invention [Technical Field of the Invention] The present invention relates to a novel polyfluorinated diene, a process for producing the same, and a novel fluoropolymer. [Prior Art] Patent Document 1 and Patent Document 2 have a polyfluoride selected from the group consisting of CF2 = • CFCF2CF2CH2CH = ch2, cf2 = cfcf(cf3)cf2ch2ch = ch2, and cf2 = cfcf2cf(cf3)ch2ch2 CH2 ( 1,6-Heptadiene) is described by cyclization polymerization to form a polymer having a fluorinated aliphatic ring structure in its main chain. Patent Document 1 and Patent Document 2 also disclose that the polymer has excellent chemical resistance and thermal properties, and can be used in technical fields such as a film, a coating agent, and a molded article by using standard techniques. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Among the carbon atoms, a branched polyfluorinated diene having only one and two carbon atoms bonded to a fluorine atom is unknown. Further, there is no knowledge of the polymer of the polyfluorinated diene and its physical properties. The object of the present invention is to provide a branch-like polyfluorination obtained by bonding a fluorine atom to a carbon atom having no one or two positions on a carbon atom (a carbon atom of a main chain portion) which does not contain a branch. The diene and the fluorinated diene have excellent resistance, heat resistance, transparency, durability and light resistance, water repellency and oil repellency, especially those having excellent water repellency, by polymerization -5 - 200806698 (2) Things. The present invention is an invention having the following features. [1], a compound of the following formula (a), cf2 = cfch2chr (ch2) mcx = ch2 wherein the symbols in the formula have the following meanings (the same applies hereinafter), R: an alkyl group having 1 to 12 carbon atoms Or a fluoroalkyl group having 1 to 12 carbon atoms, m: 0, 1 or 2, X: a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. [2] The compound according to [1], wherein R is an alkyl group having 3 to 6 carbon atoms or a polyfluoroalkyl group having 3 to 6 carbon atoms. [3] The compound according to [1] or [2] wherein R is a polyfluorol group represented by the formula CH2RF (wherein RF is a perfluoroalkyl group having 2 to 5 carbon atoms). [4] A method for producing a compound represented by the following formula (a), which is characterized in that a compound represented by the following formula (f) is reacted with a compound represented by the following formula (6) to obtain the following formula (d): a compound shown by the following formula, wherein the compound is reacted with a compound represented by the following formula (c) to obtain a compound represented by the following formula (b), and secondly, a method of reacting the compound with a dehalogenating agent, CH2=CHR (f) CF2YCFIY (e) CF2YCFYCH2CHIR ( d) -6 - 200806698 (3) CH2 di CX(CH2)mMgZ ( c ) CF2YCFYCH2CHR(CH2)mCX= CH2 ( b ) wherein the symbol in the formula has the following meaning ( The same as the following), * Y, Z: independent chlorine or bromine atoms. '[5], a polymer containing a repeating unit of the following formula (A), [Chemical 1]

.CF2 I XH2 ~CF—〆、 / \ /(ch2u ΌΗ I R (A) 使式(a )所示化合物聚合,含有該化合物之重複單位之 聚合物的製造方法。 〔6〕、如〔5〕項之聚合物,其中,R爲碳數3至6之烷 基或碳數3至6之多氟烷基。 〔7〕、如〔5〕或〔6〕項之聚合物,其中,:^爲式-CH2RF所示多氟烷基(其中,RF爲碳數2至5之全氟烷 基)。 〔8〕、如〔5〕至〔7〕項中任一項之聚合物,其中,重 量平均分子量爲1 0 0 0至1 0 0 0 0 0 0。 〔9〕、一種精密加工構件,其爲使用上述〔5〕、 〔6〕、〔 7〕或〔8〕項之聚合物。 本發明爲提供一種以往所未知之不含支鏈之碳原子 (主鏈部份之碳原子)上,僅有1位與2位之碳原子鍵結 氟原子之分支狀聚氟化二烯。本發明之氟.化二烯經由聚合 200806698 (4) 結果,可得到具有優良耐藥性、耐熱性、透明性、耐久耐 光性、撥水撥油性,特別是具有優良撥水性之聚合物。 本說明書中,式(a )所示之化合物記載爲化合物 (a),式(A )所示重複單位記載爲單位(A )。其他結 ' 構式所示之化合物,與其結構式所示之重複單位亦爲相同 ' 之記載方法。又,取代基中之記號於無特別記載下,係與 前述內容具有相同之意義。 φ 本發明爲提供下述化合物(a )。 CF2= CFCH2CHR(CH2)mCX= CH2 ( a)。 R以碳數1〜6之烷基或碳數1〜6之多氟烷基爲佳, 就化合物(a )之聚合物的物性(撥水撥油性等)的觀 點,以碳數3〜6之烷基或碳數3〜6之多氟烷基爲佳,以 碳數3〜6之多氟烷基爲特佳。R之碳數爲3以上時,R可 φ 爲直鏈狀之基或分支狀之基。R亦可爲具有環構造之基。 R爲碳數1〜6之多氟烷基時,就合成之容易性的觀 點,R以式-CH2RF所示之基爲佳。但,RF爲碳數2〜5之 全氟院基。 R爲碳數1〜12之烷基時,R之具體例如-CH2CH3、-(CH2)2CH3、-CH(CH3)2、-(CH2)3CH3、-CH2CH(CH3)2、- ch(ch3)(ch2ch3)、-(ch2)4ch3、-(ch2)5ch3 等。 R爲碳數1〜12之多氟烷基時,R之具體例-CH2CF3、-CH2CF2CF3、-CH2(CF2)2CF3、-CH2CF(CF3)2、- 200806698 (5) CH2(CF2)3CF3、-CF3、-CF2CF3、-(CF2)3CF3 等。 又’ R爲碳數1〜12之多氟院基時,R之氟含量以40 〜76質量%爲佳,以45〜70質量%爲特佳。 m以1爲佳。 ' X以氫原子或甲基爲佳,又以氫原子爲特佳。 - 化合物(a ),以下述化合物(a 1 )爲佳,(其中, R1爲碳數1〜6之烷基或碳數1〜6之多氟烷基)。 CF2- CFCH2CHR1CH2CH- CH2 ( al ) 化合物(a )之具體例如下述化合物等。 CF2 = CFCH2CH(CH2CH3)CH2CH = CH2、 CF2 = CFCH2CH((CH2)3CH3)CH2CH = CH2、 CF2 = CFCH2CH(CH2CH(CH3)2)CH2CH = CH2、 CF2 = CFCH2CH((CH2)5CH3)CH2CH = CH2、.CF2 I XH2 ~CF—〆, / \ /(ch2u ΌΗ IR (A) A method for producing a polymer represented by the formula (a) and containing a repeating unit of the compound. [6], such as [5] The polymer of the item, wherein R is an alkyl group having 3 to 6 carbon atoms or a polyfluoroalkyl group having 3 to 6 carbon atoms. [7] The polymer according to [5] or [6], wherein: The polyfluoroalkyl group of the formula -CH2RF, wherein the RF is a perfluoroalkyl group having a carbon number of 2 to 5, wherein the polymer of any one of [5] to [7], wherein The weight average molecular weight is from 10,000 to 10,000. [9] A precision-worked member which is a polymer using the above item [5], [6], [7] or [8]. The present invention provides a branched polyfluorinated diene in which a carbon atom (having a carbon atom of a main chain moiety) which is not known in the prior art has a fluorine atom bonded to only one carbon atom at the 2-position and the carbon atom. The fluorinated diene of the present invention can obtain excellent chemical resistance, heat resistance, transparency, durability, light resistance, water repellency, and particularly excellent water repellency by polymerization as a result of polymerization of 200,806,698 (4). In the present specification, the compound represented by the formula (a) is referred to as the compound (a), and the repeating unit represented by the formula (A) is referred to as the unit (A). The compound represented by the other structure of the structure and the structural formula thereof The repeating unit shown is also the same as the description of the same. Further, the symbol in the substituent has the same meaning as the above unless otherwise specified. φ The present invention provides the following compound (a): CF2 = CFCH2CHR ( CH2) mCX=CH2 (a) R is preferably an alkyl group having 1 to 6 carbon atoms or a polyfluoroalkyl group having 1 to 6 carbon atoms, and the physical properties of the polymer of the compound (a) (water-repellent property, etc.) The viewpoint is preferably an alkyl group having 3 to 6 carbon atoms or a polyfluoroalkyl group having 3 to 6 carbon atoms, particularly preferably a polyfluoroalkyl group having 3 to 6 carbon atoms. When the carbon number of R is 3 or more, R may be a linear or branched group, and R may be a group having a ring structure. When R is a polyfluoroalkyl group having 1 to 6 carbon atoms, R is a formula for the ease of synthesis. The group represented by -CH2RF is preferred. However, RF is a perfluorocarbon group having a carbon number of 2 to 5. When R is an alkyl group having 1 to 12 carbon atoms, specific examples of R are, for example, -CH2CH3, -(CH2)2CH3, - CH(CH3)2, -(CH2)3CH3 -CH2CH(CH3)2, -ch(ch3)(ch2ch3), -(ch2)4ch3, -(ch2)5ch3, etc. When R is a polyfluoroalkyl group having 1 to 12 carbon atoms, a specific example of R -CH2CF3 , -CH2CF2CF3, -CH2(CF2)2CF3, -CH2CF(CF3)2, - 200806698 (5) CH2(CF2)3CF3, -CF3, -CF2CF3, -(CF2)3CF3, and the like. Further, when R is a polyfluorene group having a carbon number of 1 to 12, the fluorine content of R is preferably 40 to 76% by mass, particularly preferably 45 to 70% by mass. m is preferably 1. 'X is preferably a hydrogen atom or a methyl group, and is particularly preferably a hydrogen atom. - Compound (a) is preferably the following compound (a 1 ) (wherein R1 is an alkyl group having 1 to 6 carbon atoms or a polyfluoroalkyl group having 1 to 6 carbon atoms). CF2-CFCH2CHR1CH2CH-CH2 (al) Specific examples of the compound (a) include the following compounds and the like. CF2 = CFCH2CH(CH2CH3)CH2CH = CH2, CF2 = CFCH2CH((CH2)3CH3)CH2CH = CH2, CF2 = CFCH2CH(CH2CH(CH3)2)CH2CH = CH2, CF2 = CFCH2CH((CH2)5CH3)CH2CH = CH2

CF2 = CFCH2CH(CH2CF3)CH2CH = CH2、 CF2 = CFCH2CH(CH2CF2CF3)CH2CH = CH2、 CF2 = CFCH2CH(CH2(CF2)2CF3)CH2CH = CH2、 CF2 = CFCH2CH(CH2CF(CF3)2)CH2CH = CH2、 CF2 = CFCH2CH(CH2(CF2)3CF3)CH2CH = CH2、 CF2 = CFCH2CH(CF3)CH2CH = CH2、 CF2 = CFCH2CH(CF2CF3)CH2CH = CH2、 CF2 = CFCH2CH((CF2)3CF3)CH2CH = CH2。 化合物(a ),可由下述化合物(f )與下述化合物 -9 - 200806698 (6) (e )反應而得下述化合物(d ),其次,將化合物(d ) 與下述化合物(c )反應而得下述化合物(b ),其次,將 化合物(b )與去鹵化劑反應而可製得, CH2= CHR ( f) CF2YCFIY ( e ) CF2YCFYCH2CHIR ( d ) CH2 二 CX(CH2)mMgZ ( c) CF2YCFYCH2CHR(CH2)mCX= CH2 ( b ) CF2= CFCH2CHR(CH2)mCX= CH2 ( a ) γ與z以氯原子爲佳。 化合物(f )與化合物(e )反應以製得化合物(d ) 之步驟中的反應條件並未有特別限定。前述步驟中之溫度 以4 0 °C〜1 0 0 °C爲佳。前述步驟中之壓力可於加壓、減 壓、大氣壓中任一環境下進行。前述步驟可於溶劑之存在 下進行亦可,溶劑不存在下進行亦可。 前述步驟中,相對於化合物(f),化合物(e )以使 用0.95〜1.20倍莫耳爲佳。 前述步驟,以於自由基引發劑之存在下進行爲佳。自 由基引發劑之具體例如,偶氮系化合物、有機過氧化物、 無機過氧化物等。更具體而言,例如苯醯過氧化物、二異 丙基過氧化二碳酸酯、二-t-丁基過氧化二碳酸酯、t-丁基 過氧化戊酸酯、全氟丁醯過氧化物、全氟苯醯過氧化物、 偶氮異雙丁腈等。 化合物(f)之具體例,如CH2= CHCH2CH3、 -10- 200806698 (7) CH2= CH(CH2)3CH3、CH2 = CHCH2CH(CH3)2、 CH2 = CH(CH2)5CH3、CH2 = CHCH2CF3、 CH2 = CHCH2CF2CF3、CH2 = CHCH2(CF2)2CF3、 CH2 = CHCH2CF(CF3)2、CH2 = CHCH2(CF2)3CF3、 CH2 = CHCF3、CH2 = CHCF2CF3、CH2 = CH(CF2)3CF3 等。 化合物(e)之具體例如CF2C1CFC1I等。CF2 = CFCH2CH(CH2CF3)CH2CH = CH2, CF2 = CFCH2CH(CH2CF2CF3)CH2CH = CH2, CF2 = CFCH2CH(CH2(CF2)2CF3)CH2CH = CH2, CF2 = CFCH2CH(CH2CF(CF3)2)CH2CH = CH2, CF2 = CFCH2CH(CH2(CF2)3CF3)CH2CH = CH2, CF2 = CFCH2CH(CF3)CH2CH = CH2, CF2 = CFCH2CH(CF2CF3)CH2CH = CH2, CF2 = CFCH2CH((CF2)3CF3)CH2CH = CH2. Compound (a), which can be obtained by reacting the following compound (f) with the following compound-9 - 200806698 (6) (e) to give the following compound (d), and secondly, compound (d) and the following compound (c) The reaction gives the following compound (b), and secondly, the compound (b) is reacted with a dehalogenating agent to obtain CH2=CHR(f)CF2YCFIY(e)CF2YCFYCH2CHIR(d)CH2 di CX(CH2)mMgZ (c CF2YCFYCH2CHR(CH2)mCX=CH2(b) CF2=CFCH2CHR(CH2)mCX=CH2 (a) γ and z are preferably chlorine atoms. The reaction conditions in the step of reacting the compound (f) with the compound (e) to obtain the compound (d) are not particularly limited. The temperature in the foregoing step is preferably from 40 ° C to 100 ° C. The pressure in the foregoing step can be carried out under any of the conditions of pressurization, depressurization, and atmospheric pressure. The above steps may be carried out in the presence of a solvent, and may be carried out in the absence of a solvent. In the foregoing step, the compound (e) is preferably used in an amount of from 0.95 to 1.20 moles relative to the compound (f). The foregoing steps are preferably carried out in the presence of a radical initiator. Specific examples of the radical initiator include an azo compound, an organic peroxide, an inorganic peroxide, and the like. More specifically, for example, phenylhydrazine peroxide, diisopropylperoxydicarbonate, di-t-butyl peroxydicarbonate, t-butylperoxyvalerate, perfluorobutyrate peroxidation , perfluorophenylhydrazine peroxide, azoisobutyronitrile, and the like. Specific examples of the compound (f), such as CH2=CHCH2CH3, -10-200806698 (7) CH2=CH(CH2)3CH3, CH2=CHCH2CH(CH3)2, CH2=CH(CH2)5CH3, CH2=CHCH2CF3, CH2 = CHCH2CF2CF3, CH2 = CHCH2(CF2)2CF3, CH2 = CHCH2CF(CF3)2, CH2 = CHCH2(CF2)3CF3, CH2 = CHCF3, CH2 = CHCF2CF3, CH2 = CH(CF2)3CF3, etc. Specific examples of the compound (e) include, for example, CF2C1CFC1I and the like.

化合物(d)之具體例如 CF2C1CFC1CH2CHICH2CH3、 CF2C1CFC1CH2CHI(CH2)3CH3、 CF2C1CFC1CH2CHICH2CH(CH3)2、 CF2C1CFC1CH2CHI(CH2)5CH3、 CF2C1CFC1CH2CHICH2CF3、 CF2C1CFC1CH2CHICH2CF2CF3、 CF2C1CFC1CH2CHICH2(CF2)2CF3、 CF2C1CFC1CH2CHICH2CF(CF3)2、Specific examples of the compound (d) are, for example, CF2C1CFC1CH2CHICH2CH3, CF2C1CFC1CH2CHI(CH2)3CH3, CF2C1CFC1CH2CHICH2CH(CH3)2, CF2C1CFC1CH2CHI(CH2)5CH3, CF2C1CFC1CH2CHICH2CF3, CF2C1CFC1CH2CHICH2CF2CF3, CF2C1CFC1CH2CHICH2(CF2)2CF3, CF2C1CFC1CH2CHICH2CF(CF3)2

CF2C1CFC1CH2CHICH2(CF2)3CF3、CF2C1CFC1CH2CHICF3、 CF2CICFCICH2CHICF2CF3 、 CF2C1CFC1CH2CHI(CF2)3CF 等。 化合物(d )與化合物(c )反應以製得化合物(b ) 之步驟中的反應條件並未有特別限定。前述步驟中之溫度 以-100°C〜+ 25°c爲佳。前述步驟中,壓力可於加壓、減 壓、大氣壓之任一環境下進行。前述步驟可於溶劑之存在 下進行亦可,溶劑不存在下進行亦可,又以在溶劑之存在 下進行爲佳。溶劑以非質子性極性溶劑爲佳。又,前述步 驟,以於自由基引發劑之存在下進行爲佳。 200806698 (8) 前述步驟中,相對於化合物(d ),化合物(c )以使 用1.0〜2.0倍莫耳爲佳。 化合物(c)之具體例如CH2= CHCH2MgCl。 化合物(b )之具體例如、 ' CF2C1CFC1CH2CH(CH2CH3)CH2CH = CH2、 CF2C1CFC1CH2CH((CH2)3CH3)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2CH(CH3)2)CH2CH = CH2、 • CF2C1CFC1CH2CH((CH2)5CH3)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2CF3)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2CF2CF3)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2(CF2)2CF3)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2CF(CF3)2)CH2CH = CH2、 CF2C1CFC1CH2CH(CH2(CF2)3CF3)CH2CH = CH2、 CF2C1CFC1CH2CH(CF3)CH2CH = CH2、 CF2C1CFC1CH2CH(CF2CF3)CH2CH = CH2、 • CF2C1CFC1CH2CH((CF2)3CF3)CH2CH= CH2 等。 化合物(b )與去鹵化劑反應以製得化合物(a )之步 驟中之反應條件並未有特別限定。去鹵化劑,爲使化合物 (b)中解離2個Y之反應劑,2個Y爲氯原子時,去鹵化 1 劑爲去氯化劑。去鹵化劑以使用鋅、鈉、鎂、錫、銅、或 鐵爲佳,就低溫反應性而言以使用鋅爲最佳。 前述步驟中之溫度以3 0 °c〜1 0 0 °C爲佳。前述步驟 中,壓力可於加壓、減壓、大氣壓之任一環境下進行。前 述步驟可於溶劑之存在下進行亦可,溶劑不存在下進行亦 -12- 200806698 Ο) 可,又以在溶劑之存在下進行爲佳。溶劑以極性溶劑爲 佳。極性溶劑之具體例如二甲基甲醯胺、二甲基乙醯胺、 N-甲基-2-吡咯烷二酮、1,4-二噁烷 '二乙二醇二甲基醚、 甲醇等之有機極性溶劑、水等。 * 前述步驟中,相對於化合物(b ),去鹵化劑以使用1 * 〜20倍莫耳爲佳,又以2〜8倍莫耳爲特佳。 本發明之化合物(a )爲文獻所未掲示之不含支鏈之 φ 碳原子(主鏈部份之碳原子)上,僅有1位與2位之碳原 子鍵結氟原子所得之分支狀聚氟化二烯。化合物(a )可 經由聚合製造聚合物。 本發明爲提供使化合物(a)聚合之含有化合物(a) 之重複單位的聚合物之製造方法。 化合物(a )之聚合,係使化合物(a )中具有形成 碳-碳雙重鍵結之4個碳原子中,未相隣接之2個鍵結形 成環的同時,與相隣接之另一碳原子形成鍵結鍵,再與其 0 他單體分子形成鍵結之方式進行。 下式(a’ )所示化合物(a)中之形成碳-碳雙重鍵 結之4個碳原子,依其順序依次賦予c1、C2、C3、C4,於 C2與C3之鍵結形成之環的同時,ci與C4形成鍵結鍵而生 成下述單位C Aa)。同樣地,C2與C4之鍵結形成環而生 成下述單位(Ab) ,C^與C3之鍵結形成環而生成下述單 位(Ac ) ’ C1與 C4之鍵結形成環而生成下述單位 (Ad) 〇 -13- 200806698 (10)CF2C1CFC1CH2CHICH2(CF2)3CF3, CF2C1CFC1CH2CHICF3, CF2CICFCICH2CHICF2CF3, CF2C1CFC1CH2CHI(CF2)3CF, etc. The reaction conditions in the step of reacting the compound (d) with the compound (c) to obtain the compound (b) are not particularly limited. The temperature in the foregoing step is preferably -100 ° C to + 25 ° C. In the foregoing steps, the pressure can be carried out under any of an environment of pressurization, depressurization, and atmospheric pressure. The above steps may be carried out in the presence of a solvent, may be carried out in the absence of a solvent, and preferably in the presence of a solvent. The solvent is preferably an aprotic polar solvent. Further, the above steps are preferably carried out in the presence of a radical initiator. 200806698 (8) In the foregoing step, the compound (c) is preferably used in an amount of 1.0 to 2.0 times by mole based on the compound (d). Specific to compound (c) is, for example, CH2=CHCH2MgCl. Specific examples of the compound (b) are, for example, 'CF2C1CFC1CH2CH(CH2CH3)CH2CH=CH2, CF2C1CFC1CH2CH((CH2)3CH3)CH2CH=CH2, CF2C1CFC1CH2CH(CH2CH(CH3)2)CH2CH=CH2, • CF2C1CFC1CH2CH((CH2)5CH3)CH2CH = CH2, CF2C1CFC1CH2CH(CH2CF3)CH2CH = CH2, CF2C1CFC1CH2CH(CH2CF2CF3)CH2CH = CH2, CF2C1CFC1CH2CH(CH2(CF2)2CF3)CH2CH = CH2, CF2C1CFC1CH2CH(CH2CF(CF3)2)CH2CH = CH2, CF2C1CFC1CH2CH(CH2(CF2)3CF3) CH2CH = CH2, CF2C1CFC1CH2CH(CF3)CH2CH = CH2, CF2C1CFC1CH2CH(CF2CF3)CH2CH = CH2, • CF2C1CFC1CH2CH((CF2)3CF3)CH2CH=CH2, etc. The reaction conditions in the step of reacting the compound (b) with the dehalogenating agent to obtain the compound (a) are not particularly limited. When the halogenating agent is removed, in order to dissociate two Y reactants in the compound (b), and two Y are chlorine atoms, the dehalogenation agent is a dechlorinating agent. The dehalogenating agent is preferably zinc, sodium, magnesium, tin, copper or iron, and zinc is most preferred in terms of low-temperature reactivity. The temperature in the foregoing step is preferably from 30 ° C to 100 ° C. In the foregoing step, the pressure can be carried out under any of an environment of pressurization, reduced pressure, and atmospheric pressure. The above steps may be carried out in the presence of a solvent, and may be carried out in the absence of a solvent. -12-200806698 Ο) may be carried out in the presence of a solvent. The solvent is preferably a polar solvent. Specific examples of the polar solvent include dimethylformamide, dimethylacetamide, N-methyl-2-pyrrolidone, 1,4-dioxane diethylene glycol dimethyl ether, methanol, and the like. Organic polar solvent, water, and the like. * In the foregoing step, the dehalogenating agent is preferably used in an amount of from 1 * to 20 times by mole, more preferably from 2 to 8 times by mole based on the compound (b). The compound (a) of the present invention is a branch of a carbon atom having no branched chain (a carbon atom of a main chain moiety) which is not shown in the literature, and has only one and two carbon atoms bonded to a fluorine atom. Polyfluorinated diene. Compound (a) can be polymerized by polymerization. The present invention provides a method for producing a polymer comprising a repeating unit of the compound (a) which polymerizes the compound (a). The polymerization of the compound (a) is such that, in the compound (a), four carbon atoms having a carbon-carbon double bond are formed, and two adjacent bonds are bonded to each other to form a ring, and another carbon atom adjacent thereto The formation of a bonding bond is carried out in such a manner as to form a bond with its other monomer molecule. a carbon-carbon double-bonded four carbon atom in the compound (a) represented by the following formula (a'), which is sequentially given to c1, C2, C3, and C4, and a ring formed by bonding C2 and C3. At the same time, ci forms a bonding bond with C4 to generate the following unit C Aa). Similarly, the bond of C2 and C4 forms a ring to form the following unit (Ab), and the bond of C^ and C3 forms a ring to form the following unit (Ac). The bond of C1 and C4 forms a ring to form the following Unit (Ad) 〇-13- 200806698 (10)

C1F2= C2FCH2CHR ( CH2) mc3x 二 C4HC1F2= C2FCH2CHR ( CH2) mc3x II C4H

化合物(a )之重複單位,爲由單位(Aa )、單位 (Ab )、單位(A〇及單位(Ad )所成群中所選出之1 種以上的重複單位所構成者。化合物(a )之重複單位爲 由何種重複單位所構成之部份,可依改變化合物(a )之 R及X的種類、聚合條件等方式而製得。通常’單位 (Aa )爲最安定者,其次爲單位(Ab )與單位(Ac )爲 安定,單位(Ad)爲不安定者。因此,化合物(a)之重 複單位中幾乎不含單位(Ad ),化合物(a )之重複單位 中亦較少含有單位(Ab )與單位(Ac )。因此,化合物 (a )之重複單位,通常係由單位(Aa )所構成。 化合物(a )之聚合,以在自由基引發劑劑之存在下 進行爲佳。自由基引發劑例如偶氮系化合物、有機過氧化 物、無機過氧化物等。具體而言例如偶氮雙異丁腈、 2,2’ -偶氮雙(2-脒基丙烷)二鹽酸鹽、4,4’ -偶氮雙(4- -14- 200806698 (11) 氰基戊酸)、2,2’-偶氮雙(4-甲氧基-2,4-二甲基戊腈)、 1,1’-偶氮雙(1-環己烷羰腈)、二異丙基全氧二碳酸酯、 全氟苯醯過氧化物、全氟苯醯全氧化物、全氟壬醯過氧化 物、甲基乙基酮過氧化物、二異丙基過氧二碳酸酯、 K2S2O8、(ΝΗ4)2§2〇8 等。 化合物(a )之聚合方法,並未有特別限定,其可使 用塊狀聚合法、溶液聚合法、懸濁聚合法、乳化聚合法等 任一方法。聚合中之溫度與壓力,並未有特別限定。聚合 溫度以0 °C〜2 0 0 °C爲佳,以3 0 °C〜1 〇 〇 °C爲特佳。聚合壓 力可爲減壓下、加壓下、大氣壓等任一種環境皆可。 化合物(a )之聚合,可僅由化合物(a )進行聚合, 或化合物(a )與化合物(a )共聚合後再與其他聚合性化 合物(以下,亦稱爲其他化合物)共聚合亦可。化合物 (a)之聚合中,可使用1種之化合物(a)亦可,或使用 2種以上之化合物(a )亦可。 其他聚合性化合物,並未有特別限定,例如以(甲 基)丙烯酸酯、非氟系烯烴、非環式氟單烯、環式氟單烯 或氟二烯爲佳。其中,(甲基)丙烯酸酯爲丙烯酸酯與甲 基丙烯酸酯之總稱。 (甲基)丙烯酸酯之具體例如(甲基)丙烯酸甲酯、 (甲基)丙烯酸乙酯、丁基(甲基)丙烯酸丁酯、(甲 基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基) 丙烯酸壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸二乙 基胺基乙酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯 -15- 200806698 (12) 酸1 -金剛烷酯,(甲基)丙烯酸3 -羥基-1 -金剛烷酯、 (甲基)丙烯酸2-甲基-2-金剛烷酯、(甲基)丙烯酸2_ 氧代四氫呋喃-3-基酯、(甲基)丙烯酸縮水甘油酯、(甲 基)丙烯酸苄酯等。 非氟系烯烴,除(甲基)丙烯酸酯以外,例如不含氟 原子之烯烴等,其具體例如,丙烯酸、甲基丙烯酸、丙烯 酸醯胺、乙烯、氯化乙烯、偏氯乙烯、丙烯、氯丁二烯、 丁二烯、烷基乙烯基醚(甲基乙烯基醚等)、烷基乙烯基 酯(乙酸乙酯等)等。 非環式氟單烯之具體例如氟化乙烯、偏氟乙烯、三氟 乙烯、氯基三氟乙烯、四氟乙烯、六氟丙烯、多氟乙烯基 醚(全氟丙基乙燒基醚等)° 環式氟單烯之具體例,例如下述任一化合物等。 〔化3〕The repeating unit of the compound (a) is composed of one or more repeating units selected from the group consisting of units (Aa), units (Ab), and units (A〇 and units (Ad). Compound (a) The repeating unit is a part of which repeating unit, which can be obtained by changing the kind of R and X of the compound (a), polymerization conditions, etc. Usually, the unit (Aa) is the most stable, followed by The unit (Ab ) and the unit (Ac ) are stable, and the unit (Ad) is unstable. Therefore, the repeating unit of the compound (a) contains almost no unit (Ad ), and the compound (a) has fewer repeating units. The unit (Ab ) and the unit (Ac ) are contained. Therefore, the repeating unit of the compound (a) is usually composed of the unit (Aa). The polymerization of the compound (a) is carried out in the presence of a radical initiator A free radical initiator such as an azo compound, an organic peroxide, an inorganic peroxide, etc. Specifically, for example, azobisisobutyronitrile, 2,2'-azobis(2-amidinopropane) Hydrochloride, 4,4'-azobis(4--14-200806698 (11) cyanovalerate), 2,2 '-Azobis(4-methoxy-2,4-dimethylvaleronitrile), 1,1'-azobis(1-cyclohexanecarbonitrile), diisopropylperoxydicarbonate , perfluorophenylhydrazine peroxide, perfluorophenylhydrazine total oxide, perfluoroantimony peroxide, methyl ethyl ketone peroxide, diisopropyl peroxydicarbonate, K2S2O8, (ΝΗ4)2 §2〇8, etc. The polymerization method of the compound (a) is not particularly limited, and any one of a bulk polymerization method, a solution polymerization method, a suspension polymerization method, and an emulsion polymerization method can be used. The pressure is not particularly limited. The polymerization temperature is preferably from 0 ° C to 200 ° C, preferably from 30 ° C to 1 ° C. The polymerization pressure can be under reduced pressure and under pressure. The polymerization of the compound (a) may be carried out only by the compound (a), or the compound (a) may be copolymerized with the compound (a) and then with other polymerizable compounds (hereinafter also referred to as Other compounds may be copolymerized. In the polymerization of the compound (a), one type of the compound (a) may be used, or two or more kinds of the compound (a) may be used. The other polymerizable compound is not particularly limited, and is preferably, for example, a (meth) acrylate, a non-fluoro olefin, an acyclic fluoromonoolefin, a cyclic fluoromonoolefin or a fluorodiene. Acrylate is a general term for acrylate and methacrylate. Specific examples of (meth) acrylate are methyl (meth) acrylate, ethyl (meth) acrylate, butyl butyl (meth) acrylate, (a) 2-ethylhexyl acrylate, octyl (meth) acrylate, decyl (meth) acrylate, decyl (meth) acrylate, diethylaminoethyl (meth) acrylate, (methyl) ) 2-hydroxyethyl acrylate, (meth) propylene-15- 200806698 (12) 1-adamantyl acid, 3-hydroxy-1-adamantyl (meth) acrylate, 2-methyl (meth) acrylate Alkyl-adamantyl ester, 2-oxo-tetrahydrofuran-3-yl (meth)acrylate, glycidyl (meth)acrylate, benzyl (meth)acrylate, and the like. Examples of the non-fluorine-based olefin other than the (meth) acrylate, such as an olefin having no fluorine atom, and the like, for example, acrylic acid, methacrylic acid, decylamine acrylate, ethylene, ethylene chloride, vinylidene chloride, propylene, chlorine Butadiene, butadiene, alkyl vinyl ether (methyl vinyl ether, etc.), alkyl vinyl ester (ethyl acetate, etc.), and the like. Specific examples of the acyclic fluoromonoolefin include, for example, fluorinated ethylene, vinylidene fluoride, trifluoroethylene, chlorotrifluoroethylene, tetrafluoroethylene, hexafluoropropylene, and polyfluorovinyl ether (perfluoropropyl ethene ether, etc.) Specific examples of the cyclic fluoromonoolefin are, for example, any of the following compounds. 〔化3〕

I CF2 CF2一CF(CF3)I CF2 CF2-CF (CF3)

CF 氟二烯,例如以下述化合物(g 1 )或(g2 )爲佳。 CF2==CF-Q1-CW1 = CF2 ( gl )、 CF2-CF.Q2-CW2 = CF2 ( g2 )。 其中,式中之記號具有下述之意義。 Q1 :全氟伸烷基或全氟(氧代伸烷基)基、碳數1〜 4之基。 W1:氫原子或氟原子。 -16- 200806698 (13) Q2:羥基、羧基、烷氧羰基,或具有烷氧羰基之碳數 3〜20的可含有氟原子之伸烷基。 W2:氫原子或碳數1〜12之烷基。 Q2 以·€Ρ2(:(εΡ3)(ΟΗ)(:Η2-、 -ch2ch(c(cf3)2(oh)ch2-、-ch2ch(ch2c(cf3)2(oh))ch2· 、-ch2ch(cooh)ch2-、-cf2c(cf3)(ococ(ch3)3)ch2-、 -CH2CH(C(CF3)2(OCOC(CH3)3)CH2-、 -CH2CH(CH2C(CF3)2(OCOC(CH3)3)CH2-、或 -CH2CH(COOCH3)CH2-爲佳。 w2以氫原子爲佳。 化合物(gl )之具體例如 CF2 = CFOCF2CF = CF2、 CF2 = CFOCF2CF2CF = CF2、CF2 = CFOCF2CF(CF3)CF = CF2、 CF2 = CFOCF(CF3)CF2CF = CF2 等。 化合物(g2)之具體例如The CF fluorodiene is preferably, for example, the following compound (g 1 ) or (g2 ). CF2==CF-Q1-CW1 = CF2 ( gl ), CF2-CF.Q2-CW2 = CF2 ( g2 ). Among them, the symbols in the formula have the following meanings. Q1: a perfluoroalkylene group or a perfluoro(oxoalkylene) group having a carbon number of 1 to 4. W1: a hydrogen atom or a fluorine atom. -16- 200806698 (13) Q2: a hydroxyl group, a carboxyl group, an alkoxycarbonyl group, or an alkylene group having a carbon atom number of 3 to 20 which may have a fluorine atom. W2: a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. Q2 is ·2(:(εΡ3)(ΟΗ)(:Η2-, -ch2ch(c(cf3)2(oh)ch2-, -ch2ch(ch2c(cf3)2(oh))ch2·, -ch2ch( Cooh)ch2-, -cf2c(cf3)(ococ(ch3)3)ch2-, -CH2CH(C(CF3)2(OCOC(CH3)3)CH2-, -CH2CH(CH2C(CF3)2(OCOC(CH3) 3) CH2-, or -CH2CH(COOCH3)CH2- is preferred. w2 is preferably a hydrogen atom. Specific compounds (gl) such as CF2 = CFOCF2CF = CF2, CF2 = CFOCF2CF2CF = CF2, CF2 = CFOCF2CF(CF3)CF = CF2, CF2 = CFOCF(CF3)CF2CF = CF2, etc. Specifics of compound (g2)

CF2 = CFCF2C(CF3)(OH)CF2CH = CH2、 CF2CFCH2CH(C(CF3)2(OH))CH2CH = CH2、 CF2 = CFCH2CH(CH2C(CF3)2(OH))CH2CH = CH2、 CF2 = CFCH2CH(COOH)CH2CH = CH2、 CF2 = CFCF2C(CF3)(OCOC(CH3)3)CH2CH = CH2、 cf2 = cfch2ch(c(cf3)2(ococ(ch3)3)ch2ch=ch2、 CF2 = CFCH2CH(CH2C(CF3)2(OCOC(CH3)3)CH2CH = CH2、 cf2 = cfch2ch(cooch3)ch2ch = ch2 等。 本發明爲提供含有下述單位(A )之聚合物。 〔化4〕 -17- 200806698 (14) 單位(〔化5〕單位(〔化6〕 ;cf2 ;cf2 〆 ;CF2 〆 ;cf2 本發物,或由CF2 = CFCF2C(CF3)(OH)CF2CH = CH2, CF2CFCH2CH(C(CF3)2(OH))CH2CH = CH2, CF2 = CFCH2CH(CH2C(CF3)2(OH))CH2CH = CH2, CF2 = CFCH2CH(COOH CH2CH = CH2, CF2 = CFCF2C(CF3)(OCOC(CH3)3)CH2CH = CH2, cf2 = cfch2ch(c(cf3)2(ococ(ch3)3)ch2ch=ch2, CF2 = CFCH2CH(CH2C(CF3) 2 (OCOC(CH3)3)CH2CH = CH2, cf2 = cfch2ch(cooch3)ch2ch = ch2, etc. The present invention provides a polymer containing the following unit (A). [Chemical 4] -17- 200806698 (14) Unit ([5] units ([6]; cf2; cf2 〆; CF2 〆; cf2 this hair, or by

,CF2、 i/CH2 CF一C/ \ JCH2)m ΌΗI R (A) :A)以下述單位(Al)爲佳 ,CF2 /CH2 \CF—CH 、 CH^, CF2, i/CH2 CF-C/\JCH2)m ΌΗI R (A) : A) is preferably in the following unit (Al), CF2 /CH2 \CF-CH , CH^

CHCH

CHI R 2 (At) :A)之具體例,例如下式所示重複單位等 ,ch2Specific examples of CHI R 2 (At) : A), for example, repeating units shown in the following formula, ch2

Vt-OH / \ C02 /CH2Vt-OH / \ C02 /CH2

CH ch2ch3 J 、CF—CH / \ CH2 ^ch2 、CH CH2CF3 、CF—CH / \ ch2 ch2 ,CF2 /CH; 、CF-CH / \ CH2 /CH2CH ch2ch3 J , CF—CH / \ CH2 ^ch2 , CH CH2CF3 , CF—CH / \ ch2 ch2 , CF2 /CH; , CF-CH / \ CH2 /CH2

rCF2 /GH2 ^CF-CHrCF2 /GH2 ^CF-CH

ClCl

H2 yCH2 CH XCH I L (ch2)3ch3」 CH2CH(CH3)2 :cf2 /CH2 Ί 〆 \CF-CH 〜 / \ ,cf2 ^ch2 \CF—CH 、 ch2 ^οη2 XCH J / \ CH2 χ〇Η2 、CH _ CH2CF2CF3 一 CH2(CF2)2〇F3 ,ch9 /CF2 /CH2 〆 、CF-CH 、 / \ ch2 ch2 ^CH | CH2(CF2)3CF3 I ch2cf(cf3>2 /CH2 、CF—CH / \ /CH2 Ί \CF—CH 、 / \ 、 〆 /CH: ^CF-CH % /CH2 CH2 /CH2 XCH / \ CH2 xch2 'CH cf3 J cf2cf3 一一 _ (CF2)3CF3 因之聚合物,可爲僅由單位(A)所形成之聚合 氧位(A )與其他化合物聚合所形成之重複單位 -18- 200806698 (15) (以下’亦稱爲其他單位)所得之共聚合物亦可。 爲共聚合物之情形中,本發明之聚合物,相對於全重 複單位而言,單位(A )以含有0.1〜99.9莫耳%爲佳, 相對於全重複單位而言,其他單位以含有〜99.9莫耳 、 %爲佳。又,單位(A ),可僅由1種單位(a )所構成 者亦可’或由2種以上之單位(A)所構成者亦可。又, 共聚合物中,單位(A)與其他單位之排列方式,可爲無 φ 規狀亦可,或爲嵌段狀亦可。 其他之重複單位’例如由(甲基)丙烯酸酯、非氟系 烯烴、非環式氟化單烯、環式氟化單烯或氟二烯經聚合所 形成之重複單位爲佳。 本發明之聚合物之重量平均分子量,並未有特別限 定,一般以1 000〜1 000000爲佳。 本發明之聚合物爲一種具有優良耐藥性、耐熱性、透 明性、耐久耐光性、撥水撥油性、特別是動態撥水性極佳 Φ 之聚合物。本發明之聚合物,極適合作爲光纖維材料、光 波導材料、薄膜(pellicle )材料、透鏡材料、封裝材料 (LED用等)、層間絶緣膜材料(半導體元件用、液晶顯 示體用、多層配線板用等)、顯示器用抗反射膜材料、油 封劑(通氣性布帛用、電動機流體軸承裝置中之軸承部份 用等)等。 本發明之聚合物,通常爲使其溶解於有機溶劑中以聚 合物溶液組成物之方式使用。例如,將前述聚合物溶液組 成物塗佈於基材表面後再經由乾燥,而於基材表面形成本 •19- 200806698 (16) 發明之聚合物的膜。塗佈之方法,例如可使用滾筒塗佈 法、丨発録法、浸漬法、旋轉塗佈法、水上塗佈法、塑模塗 佈法、Langmuir Blodgett 法等。 聚合物溶液組成物中所含之聚合物的量,可配合用途 作適當之調整,通常相對於有機溶劑爲使用0.01〜20質 量%。 有機溶劑可爲氟系有機溶劑或非氟系溶劑,就本發明 % 之聚合物對非氟系溶劑具有較高溶解性的觀點而言,以使 用氟系有機溶劑爲佳。有機溶劑,可使用1種有機溶劑亦 可,或使用2種以上之有機溶劑亦可。 非氟系溶劑之具體例如,甲基醇、乙基醇、二丙酮醇 等醇類;丙酮、甲基異丁酮、環己酮、環戊酮、2-庚酮、 N -甲基吡咯烷酮、r-丁內酯等酮類;丙二醇單甲基醚乙 酸酯、丙二醇單甲基醚丙酸酯、丙二醇單乙基醚乙酸酯、 卡必醇乙酸酯、3 -甲氧基丙酸甲酯、3 -乙氧基丙酸乙酯、 % yS-甲氧基異丁酸甲酯、丁酸乙酯、丁酸丙酯、甲基異丁 酮、乙酸乙酯、酢酸2_乙氧基乙酯、乙酸異戊酯、乳酸甲 、 酯、乳酸乙酯等酯類;甲苯、二甲苯等芳香族烴;丙二醇 單甲基醚、丙二醇甲基醚乙酸酯、丙二醇單乙基醚、乙二 醇單異丙基醚、二乙二醇單甲基醚、二乙二醇二甲基醚、 丙二醇單甲基醚等二醇系醚類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等。 氟系有機溶劑之具體例如全氟基苯、五氟基苯、I3, 雙(三氟甲基)苯等多氟芳香族化合物;全氟(三丁基 -20- 200806698 (17) 胺)、全氟(三丙基胺)等多氟烷基胺;2H,3H-全氟基戊 烷、1H-全氟基己烷、全氟萘烷、全氟環己烷等多氟烷 烴;甲基(全氟異丙基)醚、甲基(全氟丁基)醚、甲基 (全氟己基甲基)醚、甲基(全氟辛基)醚、乙基(全氟 丁基)醚、全氟(2-丁基四氫呋喃)等多氟基醚等。 【實施方式】 實施例 本發明將以實施例作具體之説明,但本發明並非解釋 爲受其所限定。 實施例中,數量平均分子量稱Μη,重量平均分子量 稱Mw,苯醯過氧化物稱ΒΡΟ,偶氮二異丁基稱ΑΙΒΝ,與 四氫呋喃稱THF,二氯基五氟丙烷稱R225,二異丙基過 氧二碳酸酯稱IPP。壓力於無特別記載下係指絶對壓力。 聚合物之Μη與Mw係使用凝膠滲透色層分析法(内 部標準:聚苯乙烯,展開溶劑:THF)進行測定。 〔例 1〕CF2 = CFCH2CH((CH2)3CH3)CH2CH = CH2 之製造 例H2 yCH2 CH XCH IL (ch2)3ch3" CH2CH(CH3)2 : cf2 /CH2 Ί 〆\CF-CH ~ / \ , cf2 ^ch2 \CF-CH , ch2 ^οη2 XCH J / \ CH2 χ〇Η2 , CH _ CH2CF2CF3 - CH2(CF2)2〇F3 , ch9 /CF2 /CH2 〆, CF-CH, / \ ch2 ch2 ^CH | CH2(CF2)3CF3 I ch2cf(cf3>2 /CH2, CF-CH / \ /CH2 Ί \CF—CH , / \ , 〆/CH: ^CF-CH % /CH2 CH2 /CH2 XCH / \ CH2 xch2 'CH cf3 J cf2cf3 _ (CF2)3CF3 polymer, can be only by unit (A) The formed polymer oxygen site (A) and the repeating unit formed by the polymerization of other compounds -18-200806698 (15) (hereinafter also referred to as "other units") may also be obtained as a copolymer. In the case of the polymer of the present invention, the unit (A) is preferably contained in an amount of 0.1 to 99.9 mol% relative to the total repeat unit, and the other unit contains ~99.9 mols, % relative to the total repeat unit. Further, the unit (A) may be composed of only one type of unit (a) or 'or two or more types of units (A). Also, in the copolymer, the unit ( A) The arrangement of other units may be either φ-free or block-like. Other repeating units 'for example, (meth) acrylate, non-fluoro olefin, acyclic fluorinated monoene, The repeating unit formed by polymerization of the cyclic fluorinated monoene or fluorodiene is preferred. The weight average molecular weight of the polymer of the present invention is not particularly limited, and is generally preferably from 1,000 to 1,000,000. The product is a polymer with excellent resistance, heat resistance, transparency, durability and light resistance, water repellency, especially dynamic water repellency Φ. The polymer of the invention is very suitable as an optical fiber material and light. Waveguide material, pellicle material, lens material, encapsulating material (for LED, etc.), interlayer insulating film material (for semiconductor elements, liquid crystal display, multilayer wiring board, etc.), antireflection film material for display, oil sealant (for a ventilating fabric, a bearing portion in a motor fluid bearing device, etc.), etc. The polymer of the present invention is usually dissolved in an organic solvent to form a polymer solution. Type used. For example, the group into the polymer solution was applied to a surface of a substrate and then dried via, the membrane (16) of the present invention is a polymer • 19- 200806698 formed on the surface of the substrate. As the coating method, for example, a roll coating method, a smear method, a dipping method, a spin coating method, a water coating method, a mold coating method, a Langmuir Blodgett method, or the like can be used. The amount of the polymer contained in the polymer solution composition can be appropriately adjusted depending on the use, and it is usually 0.01 to 20% by mass based on the organic solvent. The organic solvent may be a fluorine-based organic solvent or a non-fluorine-based solvent. From the viewpoint of having a high solubility of the polymer of the present invention to a non-fluorine-based solvent, it is preferred to use a fluorine-based organic solvent. The organic solvent may be one organic solvent or two or more organic solvents. Specific examples of the non-fluorine-based solvent include alcohols such as methyl alcohol, ethyl alcohol, and diacetone alcohol; acetone, methyl isobutyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, and N-methylpyrrolidone. Ketones such as r-butyrolactone; propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, carbitol acetate, 3-methoxypropionic acid Methyl ester, ethyl 3-ethoxypropionate, methyl yS-methoxyisobutyrate, ethyl butyrate, propyl butyrate, methyl isobutyl ketone, ethyl acetate, citric acid 2 ethoxy Ethyl ester, isoamyl acetate, methyl lactate, ester, ethyl lactate and other esters; aromatic hydrocarbons such as toluene and xylene; propylene glycol monomethyl ether, propylene glycol methyl ether acetate, propylene glycol monoethyl ether, Glycol ethers such as ethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether; N,N-dimethylformamide, N,N-dimethylacetamide and the like. Specific examples of the fluorine-based organic solvent include polyfluoro aromatic compounds such as perfluorobenzene, pentafluorobenzene, I3, bis(trifluoromethyl)benzene; perfluoro(tributyl-20-200806698 (17) amine), Polyfluoroalkylamines such as perfluoro(tripropylamine); polyfluoroalkanes such as 2H, 3H-perfluoropentane, 1H-perfluorohexane, perfluorodecalin, perfluorocyclohexane; methyl (perfluoroisopropyl)ether, methyl (perfluorobutyl)ether, methyl (perfluorohexylmethyl) ether, methyl (perfluorooctyl) ether, ethyl (perfluorobutyl) ether, A polyfluoroether such as perfluoro(2-butyltetrahydrofuran). [Embodiment] The present invention will be specifically described by way of examples, but the invention is not construed as being limited thereto. In the examples, the number average molecular weight is called Μη, the weight average molecular weight is called Mw, the benzoquinone peroxide is called ΒΡΟ, the azobisisobutyl group is called ΑΙΒΝ, the tetrahydrofuran is called THF, the dichloropentafluoropropane is called R225, the diisopropyl group. The base peroxydicarbonate is referred to as IPP. Pressure is the absolute pressure unless otherwise stated. The Μη and Mw of the polymer were measured by gel permeation chromatography (internal standard: polystyrene, developing solvent: THF). [Example 1] Production example of CF2 = CFCH2CH((CH2)3CH3)CH2CH = CH2

於反應器(内容積 300mL,玻璃製)中,加入 CF2C1CFC1I ( 192g)與 ΒΡΟ ( 5.8g),於反應器内溫 70°C 下將CH2 = CH ( CH2 ) 3CH3 ( 55g )緩緩滴下,滴下結束 後,於反應器內攪拌3小時。將反應器内溶液減壓蒸餾’ 得 80〜85 °C / 10hPa (絶對壓力)之餾份的 -21 - 200806698 (18) CF2C1CFC1CH2CHI((CH2)3CH3) ( 188g)。 於反應器(内容積 2L,玻璃製)中’加入 CF2C1CFC1CH2CHI((CH2)3CH3) ( 188g)與 THF ( 490g ), 於反應器内溫-70°C下,將含有CH2=CHCH2MgCl 2mol/ * L之T H F溶液(3 4 5 g )以1小時時間滴下。滴下結束後, 使反應器内溫爲0 °C下,再於反應器內攪拌1小時。 反應器中,於加入飽和氯化銨水溶液(1 L )後,將反 0 應器内溶液分液以回收有機層之溶液。將該溶液濃縮後’ 減壓蒸餾,得55°C/l〇hPa之餾份的 CF2C1CFC1CH2CH((CH2)3CH3)CH2CH = CH2 ( 96g )。 於反應器(内容積500mL,玻璃製)中,加入鋅 (32g)與N-甲基-2-吡咯烷酮( 244g),於反應器内溫 75 〇C 下,使 CF2C1CFC1CH2CH((CH2)3CH3)CH2CH 二 ch2 (96g )以1小時時間滴下。滴下結束後,於反應器内溫 7 5 °C下,於反應器內攪拌6小時。將反應器内溶液減壓蒸 φ 餾,得 62〜63 °C / 15hPa 之餾份的 CF2 = CFCH2CH((CH2)3CH3)CH2CH = CH2 ( 34g )(以下,亦稱 爲化合物(a-1 ))。 化合物(a-Ι )之NMR圖譜係如以下所示。 W-NMR ( 3 99·8ΜΗζ,溶劑:重丙酮,基準··四甲基 矽烷)5 ( ppm) : 0·90 ( m,3H) ,1·33 ( m,7H), 2.20 ( m,4H) ,5.05 ( m,2H) ,5·80 ( m,1H)。 19F-NMR ( 376·2ΜΗζ,溶劑 ··重丙酮,基準 : CFCb ) δ ( ppm ) : -106.4 ( m, IF ) ,-124.9 ( m, -22 - 200806698 (19) IF) ,-17 1 · 6 ( m,1 F)。 〔例 2〕CF2 = CFCH2CH(CH2CF(CF3)2)CH2CH = CH2 之製 造例 ' 於反應器(内容積500mL,玻璃製)中,加入CH2二 - CH2CH2OCOCH3 ( 158g )與 AIBN ( 4 · 7 7 g ),於反應器内 溫65°C下,將(CF3 ) 2CFI ( 43 0g )緩緩滴下,滴下結束 I 後,於該狀態下於反應器內攪拌4小時。 將反應器内溶液回收,於加入有鋅(105 g)與甲醇 (446g )之反應器(内容積1L,玻璃製)中,將回收之 前述反應器内溶液於25 °C下緩緩滴下。滴下結束後,於反 應器内溫25 °C下於反應器內攪拌1 3小時。將反應器内溶 液減壓蒸餾,得 50〜55 °C /大氣壓之餾份的 CH2 = CHCH2CF(CF3)2 ( 199g)。 於反應器(内容積 500mL,玻璃製)中,加入 φ CF2C1CFC1I ( 312g)與 AIBN ( 3 · 0 g ),於反應器内溫 7 0 °匚下,將CH2=CHCH2CF(CF3)2 ( 199g)緩緩滴下,滴下 結束後,於該狀態下於反應器內攪拌6小時。將反應器内 溶液減壓蒸餾,得77〜80 °C / 1 lhPa (絶對壓力)之餾份 的 CF2C1CFC1CH2CHI(CH2CF(CF3)2) ( 43 0g ) 〇In a reactor (300 mL internal volume, made of glass), CF2C1CFC1I (192g) and hydrazine (5.8g) were added, and CH2 = CH(CH2)3CH3 (55g) was slowly dropped at 70 °C in the reactor, and dripped. After completion, the mixture was stirred for 3 hours in the reactor. The solution in the reactor was distilled under reduced pressure to obtain a fraction of 80 to 85 ° C / 10 hPa (absolute pressure) of -21 - 200806698 (18) CF2C1CFC1CH2CHI ((CH2)3CH3) (188 g). Add CF2C1CFC1CH2CHI((CH2)3CH3) (188g) and THF (490g) to the reactor (internal volume 2L, made of glass), containing CH2=CHCH2MgCl 2mol/* L at the reactor internal temperature -70 °C The THF solution (3 4 5 g) was added dropwise over 1 hour. After the completion of the dropwise addition, the internal temperature of the reactor was allowed to stand at 0 ° C, and the mixture was further stirred in the reactor for 1 hour. In the reactor, after adding a saturated aqueous solution of ammonium chloride (1 L), the solution in the reactor was separated to recover a solution of the organic layer. After the solution was concentrated, it was distilled under reduced pressure to give a residue of <RTIgt;</RTI>></RTI>> C2C1CFC1CH2CH ((CH2)3CH3) CH2CH=CH2 (96 g). In a reactor (internal volume 500 mL, made of glass), zinc (32 g) and N-methyl-2-pyrrolidone (244 g) were added at a reactor temperature of 75 〇C to make CF2C1CFC1CH2CH((CH2)3CH3)CH2CH Two ch2 (96g) were dripped in 1 hour. After the completion of the dropwise addition, the mixture was stirred in a reactor at a temperature of 75 ° C for 6 hours. The solution in the reactor is distilled under reduced pressure to obtain a fraction of 62 to 63 ° C / 15 hPa of CF 2 = CFCH 2 CH ((CH 2 ) 3 CH 3 ) CH 2 CH = CH 2 ( 34 g ) (hereinafter, also referred to as compound (a-1 ) ). The NMR spectrum of the compound (a-Ι) is shown below. W-NMR (3 99·8 ΜΗζ, solvent: heavy acetone, standard · tetramethyl decane) 5 (ppm): 0·90 (m, 3H), 1·33 (m, 7H), 2.20 (m, 4H) ), 5.05 (m, 2H), 5·80 (m, 1H). 19F-NMR (376.2ΜΗζ, solvent··································· 6 ( m, 1 F). [Example 2] CF2 = CFCH2CH (CH2CF(CF3)2) CH2CH = CH2 Production Example' In a reactor (internal volume 500 mL, made of glass), CH2 di-CH2CH2OCOCH3 (158 g) and AIBN (4 · 7 7 g) were added. (CF3) 2CFI (43 0 g) was gradually dropped at a reactor internal temperature of 65 ° C, and after completion of dropwise addition I, the mixture was stirred in the reactor for 4 hours. The solution in the reactor was recovered, and a reactor (1 L of internal volume, made of glass) containing zinc (105 g) and methanol (446 g) was added, and the recovered solution in the above reactor was slowly dropped at 25 °C. After the completion of the dropwise addition, the mixture was stirred in a reactor at an internal temperature of 25 ° C for 13 hours. The solution in the reactor was distilled under reduced pressure to obtain CH2=CHCH2CF(CF3)2 (199 g) of a fraction of 50 to 55 °C / atmosphere. In the reactor (internal volume 500 mL, made of glass), add φ CF2C1CFC1I (312g) and AIBN (3 · 0 g ), and at the internal temperature of the reactor at 70 ° C, CH2=CHCH2CF(CF3)2 (199g) The mixture was slowly dropped, and after the completion of the dropwise addition, the mixture was stirred in the reactor for 6 hours. The solution in the reactor was distilled under reduced pressure to obtain a fraction of 77 to 80 ° C / 1 lhPa (absolute pressure) of CF2C1CFC1CH2CHI(CH2CF(CF3)2) (43 0g) 〇

於反應器(内容積 2L,玻璃製)中,加入 CF2C1CFC1CH2CHI(CH2CF(CF3)2) ( 43 0g ) 與 THF (935g),於反應器内溫-70°C下以1小時時間滴下含有 CH2=CHCH2MgCl 2mol/L 之 THF 溶液( 482g)。滴下結 -23- 200806698 (20) 束後,於反應器内溫25 °C下於反應器內攪拌12小時。 將反應器内溶液過濾所得之濾液濃縮所得之濃縮液, 以1 m ο 1 / L之鹽酸水溶液與飽和食鹽水洗淨進行分液,經 減壓蒸餾得於45〜48°C / 3hPa之餾份的 CF2C1CFC1CH2CH(CH2CF(CF3)2)CH2CH = CH2 ( 1 75g )。 於反應器(内容積500mL,玻璃製)中,加入鋅 (55g )與N-甲基-2-吡咯烷酮(310g ),於反應器内溫 75〇C 下,將 CF2C1CFC1CH2CH(CH2CF(CF3)2)CH2CH - ch2 (1 75 g )以1小時時間滴下,滴下結束後,於反應器内溫 7 5 °C下於反應器內攪拌17小時。 將反應器内溶液過濾所得之濾液濃縮所得之濃縮液, 以1 m ο 1 / L之鹽酸水溶液與飽和食鹽水洗淨進行分液,經 減壓蒸餾得於 42〜45 °C / 20hPa之餾份的〇?2 = CFCH2CH(CH2CF(CF3)2)CH2CH = CH2 ( 92g )(以下,亦 稱爲化合物(a-2 ))。 化合物(a-2 )之NMR圖譜係如以下所示。 !H-NMR ( 3 99.8MHz,溶劑:重丙酮,基準:四甲基 砍院)δ ( ppm ) : 2 · 4 2 ( m,7Η ) ,5 · 14 ( m,2 Η ), 5.80 (m 5 1H)。 19F-NMR ( 376·2ΜΗζ,溶劑:重丙酮,基準·· CFCls ) δ (ppm) : -185.1 ( m » IF) ,-172.3 (m, IF) ,-123.7 (m,IF) ,-104.9 (m,IF) ,-76.5 (m, 6F ) ° -24- 200806698 (21) 〔例3〕化合物(a-l)之聚合例 於耐壓反應器(内容積30mL,玻璃製)中,加入化 合物(a-1) (2.5g)與乙酸乙酯(9.7g),再加入含有50In a reactor (internal volume 2L, made of glass), CF2C1CFC1CH2CHI (CH2CF(CF3)2) (43 0g) and THF (935g) were added, and CH2= was added at a reactor temperature of -70 ° C for 1 hour. CHCH2MgCl 2mol/L in THF (482g). Dropping the knot -23- 200806698 (20) After the bundle, the reactor was stirred at the internal temperature of the reactor at 25 ° C for 12 hours. The concentrated liquid obtained by concentrating the filtrate obtained by filtering the solution in the reactor is washed with a 1 m ο 1 /L aqueous hydrochloric acid solution and a saturated saline solution to carry out liquid separation, and distilled under reduced pressure to obtain a distillation at 45 to 48 ° C / 3 hPa. Part of CF2C1CFC1CH2CH (CH2CF(CF3)2) CH2CH = CH2 (1 75 g). In a reactor (internal volume 500 mL, made of glass), zinc (55 g) and N-methyl-2-pyrrolidone (310 g) were added, and CF2C1CFC1CH2CH (CH2CF(CF3)2) was added at a reactor internal temperature of 75 °C. CH2CH-ch2 (1 75 g) was added dropwise over 1 hour, and after completion of the dropwise addition, the mixture was stirred in a reactor at an internal temperature of 75 ° C for 17 hours. The concentrate obtained by concentrating the filtrate obtained by filtering the solution in the reactor is washed with a 1 m ο 1 /L aqueous hydrochloric acid solution and a saturated saline solution, and separated by distillation under reduced pressure at a temperature of 42 to 45 ° C / 20 hPa. Part of 〇? 2 = CFCH2CH(CH2CF(CF3)2)CH2CH = CH2 (92g) (hereinafter, also referred to as compound (a-2)). The NMR spectrum of the compound (a-2) is shown below. !H-NMR (3 99.8MHz, solvent: heavy acetone, standard: tetramethyl cleavage) δ (ppm ) : 2 · 4 2 ( m,7Η ) , 5 · 14 ( m,2 Η ), 5.80 (m 5 1H). 19F-NMR (376.2ΜΗζ, solvent: heavy acetone, standard · CFCls) δ (ppm): -185.1 (m » IF), -172.3 (m, IF), -123.7 (m, IF), -104.9 ( m, IF), -76.5 (m, 6F) ° -24- 200806698 (21) [Example 3] Polymerization example of compound (al) In a pressure-resistant reactor (internal volume 30 mL, made of glass), a compound (a) was added. -1) (2.5g) with ethyl acetate (9.7g), then add 50

質量%聚合起始劑之IPP的R225溶液(0.63g)。耐壓反 應器内進行減壓脫氣後,於反應器内溫40 °C下進行1 8小 時之聚合反應。其次,回收反應器内溶液滴入甲醇中後所 生成之固體成份,該固體成份於70 °C下進行24小時真空 乾燥後,於25°C下得白色粉末.狀之聚合物(1.72g )(以 下,亦稱爲聚合物(A-1 ))。聚合物(A-1 )係爲下式 (A-1 )所示重複單位所形成之聚合物。A mass % polymerization initiator of IPP in R225 (0.63 g). After degassing under reduced pressure in a pressure-resistant reactor, polymerization was carried out at a reactor temperature of 40 ° C for 18 hours. Next, the solid component formed after the solution in the reactor was dropped into methanol was recovered, and the solid component was vacuum dried at 70 ° C for 24 hours, and then a white powder was obtained at 25 ° C (1.72 g). (hereinafter, also referred to as polymer (A-1)). The polymer (A-1) is a polymer formed by a repeating unit represented by the following formula (A-1).

「CF2 /CH2"CF2 /CH2

^CF-CH (A-1) /CH2 (CH2)3CH3 / \ cr " 聚合物(Α·1 )之Mn爲5400,Mw爲1 03 00。又,聚 合物(A-1 )對水之接觸角爲95° ,滾落角爲1Γ ,後退 接觸角爲84° 。 〔例4〕化合物(a-2 )之聚合例(其1 ) 於耐壓反應器(内容積3 OmL,玻璃製)中,加入化 合物(a-2) (2.5g)與乙酸乙酯(4.5g),再加入含有50 質量%聚合起始劑之IPP的R225溶液(0.21g)。耐壓反 應器内進行減壓脫氣後,於反應器内溫40°C下進行18小 時之聚合反應。其次,回收反應器内溶液滴入甲醇中後所 -25- 200806698 (22) 生成之固體成份,該固體成份於90 °C下進行24小時真空 乾燥後,於25°C下得白色粉末狀之聚合物(2.17g )(以 下,亦稱爲聚合物(A-2 ))。聚合物(A-2 )係爲下式 (A-2 )所示重複單位(以下,亦稱爲單位(A-2 ))所形 - 成之聚合物。 , 〔化 8〕 /CF2 /〇η2 \CF—CH / \ /CH2 XCH I ch2cf(cf 士 (A-2) 聚合物(A-2)之Μη爲7300,Mw爲15900。又,使 用掃描任分析法所測定之聚合物(A-2 )之玻璃移轉溫度 爲82°C。又,聚合物(A-2 )對水之接觸角爲107° ,滾 落角爲4° ,後退接觸角爲109° 。 聚合物(A-2 )相對於丙酮、THF、乙酸乙酯、R225 及二甲苯六氟化物爲可溶。 〔例5〕化合物(a-2 )之聚合例(其2 ) 於耐壓反應器(内容積3 OmL,玻璃製)中,加入化 合物(a-2 ) ( 2.5g )與乙酸乙酯(4.8g )與異丙醇 (〇.9g),再於耐壓容器內加入含有50質量%聚合起始 劑之IPP的R225溶液(0.25g)。耐壓反應器内進行減壓 脫氣後,於反應器内溫4(TC下進行18小時之聚合反應。 其次,回收反應器内溶液滴入甲醇中後所生成之固體成 份,該固體成份於90 °C下進行24小時真空乾燥後,於25 -26- 200806698 (23) °C下得白色粉末狀之聚合物(0.77g )(以下,亦稱爲聚 合物(A-3 ))。聚合物(a_3 )係爲單位(A-2 )所形成 之聚合物。 聚合物(A-3)之Μη爲4800,Mw爲6100。又,使 ^ 用掃描任分析法所測定之聚合物(A-3 )之玻璃移轉溫度 ' 爲74°C。又,聚合物(A-3 )相對於丙酮、THF、乙酸乙 酯、R225及二甲苯六氟化物爲可溶。 ^ 本發明可提供一種具有優良耐藥性、耐熱性、透明 性、耐久耐光性、撥水撥油性,特別是具有優良撥水性之 聚合物。本發明之聚合物,極適合作爲光纖維材料、光波 導材料、薄膜(pellicle )材料、透鏡材料、封裝材料 (LED用等)、層間絶緣膜材料(半導體元件用、液晶顯 示體用、多層配線板用等)、顯示器用抗反射膜材料、、油 封劑等。 又,申請人於2006年6月7日提出申請之日本專利 φ 申請第2006- 1 5 8667號之說明書、申請專利範圍,及摘要 等全部内容全部引用於本說明書中,並屬於本發明說明書 所揭示之內容。 -27-^CF-CH (A-1) /CH2 (CH2)3CH3 / \cr " The Mn of the polymer (Α·1) is 5400 and the Mw is 1 03 00. Further, the contact angle of the polymer (A-1) with respect to water was 95°, the rolling angle was 1 Γ, and the receding contact angle was 84°. [Example 4] Polymerization Example of Compound (a-2) (Part 1) In a pressure-resistant reactor (internal volume 3 OmL, made of glass), Compound (a-2) (2.5 g) and ethyl acetate (4.5) were added. g), a solution of R225 (0.21 g) containing IPP of 50% by mass of a polymerization initiator was further added. After degassing under reduced pressure in a pressure-resistant reactor, polymerization was carried out at a reactor temperature of 40 ° C for 18 hours. Next, the solid component formed by the solution in the reactor after dropping into the methanol -25-200806698 (22) is recovered, and the solid component is vacuum-dried at 90 ° C for 24 hours, and then obtained as a white powder at 25 ° C. Polymer (2.17 g) (hereinafter, also referred to as polymer (A-2)). The polymer (A-2) is a polymer formed by a repeating unit (hereinafter, also referred to as unit (A-2)) represented by the following formula (A-2). , [Chemical 8] /CF2 /〇η2 \CF—CH / \ /CH2 XCH I ch2cf (cf (A-2) The polymer (A-2) has a Μη of 7300 and a Mw of 15900. The glass transition temperature of the polymer (A-2) measured by the analytical method was 82 ° C. Further, the contact angle of the polymer (A-2 ) with respect to water was 107 °, the roll angle was 4 °, and the receding contact angle was It is 109°. The polymer (A-2) is soluble relative to acetone, THF, ethyl acetate, R225, and xylene hexafluoride. [Example 5] Polymerization of Compound (a-2) (Part 2) In a pressure-resistant reactor (internal volume 3 OmL, made of glass), compound (a-2) (2.5 g) and ethyl acetate (4.8 g) and isopropanol (〇.9 g) were added, and then placed in a pressure-resistant container. An R225 solution (0.25 g) containing IPP of 50% by mass of a polymerization initiator was added, and after degassing under reduced pressure in a pressure-resistant reactor, polymerization was carried out at a reactor internal temperature of 4 (TC for 18 hours. Second, recovery) The solid component formed after the solution in the reactor is dropped into methanol, and the solid component is vacuum dried at 90 ° C for 24 hours, and then obtained as a white powdery polymer at 25 -26 - 200806698 (23) ° C ( 0.77g ) ( Next, it is also called polymer (A-3). The polymer (a_3) is a polymer formed by the unit (A-2). The polymer (A-3) has a Μη of 4,800 and a Mw of 6,100. The glass transition temperature of the polymer (A-3) determined by the scanning analysis method is 74 ° C. Further, the polymer (A-3 ) is relative to acetone, THF, ethyl acetate, R225 and Xylene hexafluoride is soluble. ^ The present invention can provide a polymer having excellent chemical resistance, heat resistance, transparency, durability, light resistance, water repellency, and particularly excellent water repellency. It is very suitable as an optical fiber material, an optical waveguide material, a pellicle material, a lens material, a packaging material (for LEDs, etc.), an interlayer insulating film material (for semiconductor elements, liquid crystal display, multilayer wiring boards, etc.) And the anti-reflection film material for the display, the oil sealant, etc. Further, the applicant has filed the application of the Japanese Patent φ Application No. 2006-158866, the patent application scope, the abstract, and the like. All cited in this specification and belong to this issue DISCLOSURE The disclosed. -27-

Claims (1)

200806698 (1) 十、申請專利範圍 1 _ 一種下式(a )所示之化合物, CF2- CFCH2CHR(CH2)mCX= CH2 ( a) 其中,式中之記號具有下述之意義, ' R:碳數1至12之烷基或碳數1至12之氟烷基, ' m : 0、1 或 2, X:氫原子或碳數1至12之烷基。 φ 2-如申請專利範圍第1項之化合物,其中,R爲碳 數3至6之院基或碳數3至6之多氣垸基。 3 ·如申請專利範圍第1或2項之化合物,其中,R 爲式-CH2RF所示多氟烷基(其中,RF爲碳數2至5之全 氟烷基)。 4. 一種下述式(a)所示之化合物的製造方法,其特 徵爲,使下式(f)所示化合物與下述式(e )所示化合物 反應而得下述式(d )所示之化合物,其次,將該化合物 φ 與下述式(e )所示化合物反應而得下述式(b )所示化合 物,其次,將該化合物與去鹵化劑反應之方法, CH2 = CHR ( f) CF2YCFIY ( e ) CF2YCFYCH2CHIR ( d) cn2= CX(CH2)mMgZ ( c) CF2YCFYCH2CHR(CH2)mCX 二 ch2 ( b) CF2= CFCH2CHR(CH2)mCX = ch2 ( a ) 其中,式中之記號具有下述之意義, -28- 200806698 (2) R :碳數1至12之烷基或碳數1至12之氟烷基, Y、Z:各自獨立之氯原子或溴原子, m : 0、1 或 2, X:氫原子或碳數1至12之烷基。 5. —種含有下式(A)所示重複單位之聚合物, 〔化1〕 :CF、 K CF—C (A)200806698 (1) X. Patent application scope 1 _ A compound of the following formula (a), CF2-CFCH2CHR(CH2)mCX=CH2 (a) wherein the symbol in the formula has the following meaning, 'R: carbon An alkyl group of 1 to 12 or a fluoroalkyl group having 1 to 12 carbon atoms, ' m : 0, 1 or 2, X: a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. Φ 2- is the compound of claim 1, wherein R is a hospital base having 3 to 6 carbon atoms or a gas radical having 3 to 6 carbon atoms. A compound according to claim 1 or 2, wherein R is a polyfluoroalkyl group represented by the formula -CH2RF (wherein RF is a perfluoroalkyl group having 2 to 5 carbon atoms). 4. A method for producing a compound represented by the following formula (a), which comprises reacting a compound represented by the following formula (f) with a compound represented by the following formula (e) to obtain the following formula (d): The compound shown below, and the compound φ is reacted with a compound represented by the following formula (e) to obtain a compound represented by the following formula (b), and secondly, a method of reacting the compound with a dehalogenating agent, CH2 = CHR ( f) CF2YCFIY ( e ) CF2YCFYCH2CHIR ( d) cn2 = CX(CH2)mMgZ ( c) CF2YCFYCH2CHR(CH2)mCX two ch2 ( b) CF2 = CFCH2CHR(CH2)mCX = ch2 ( a ) where the symbol has the lower Meaning, -28- 200806698 (2) R: alkyl group having 1 to 12 carbon atoms or fluoroalkyl group having 1 to 12 carbon atoms, Y, Z: each independently chlorine atom or bromine atom, m: 0, 1 Or 2, X: a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. 5. A polymer containing a repeating unit represented by the following formula (A), [Chemical Formula 1]: CF, K CF-C (A) CH2 (CH2)n 、CH I R 其中,式中之記號具有下述之意義, R:碳數1至12之烷基或碳數1至12之氟烷基, m : 0、1 或 2, X:氫原子或碳數1至12之烷基。 6. 如申請專利範圍第5項之聚合物,其中,R爲碳 數3至6之烷基或碳數3至6之多氟烷基。 7. 如申請專利範圍第5或6項之聚合物,其中,R 爲式-CH2RF所示多氟烷基(其中,RF爲碳數2至5之全 氟烷基)。 8. 如申請專利範圍第5至7項中任一項之聚合物, 其中,重量平均分子量爲1000至1 000000。 9. 一種精密加工構件,其爲使用申請專利範圍第5、 6、7或8項之聚合物。 -29- 200806698 七、指定代表圖: (一) 、本案指定代表圖為:無 (二) 、本代表圖之元件符號簡單說明:無CH2 (CH2)n, CH IR wherein the symbol in the formula has the following meaning, R: alkyl group having 1 to 12 carbon atoms or fluoroalkyl group having 1 to 12 carbon atoms, m: 0, 1 or 2, X : a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. 6. The polymer of claim 5, wherein R is an alkyl group having 3 to 6 carbon atoms or a polyfluoroalkyl group having 3 to 6 carbon atoms. 7. The polymer of claim 5 or 6, wherein R is a polyfluoroalkyl group of the formula -CH2RF (wherein RF is a perfluoroalkyl group having 2 to 5 carbon atoms). 8. The polymer according to any one of claims 5 to 7, wherein the weight average molecular weight is from 1,000 to 1,000,000. 9. A precision machined component which is a polymer using the fifth, sixth, seventh or eighth aspect of the patent application. -29- 200806698 VII. Designated representative map: (1) The designated representative figure of this case is: None (2), the symbol of the representative figure is simple: no 八、本茶若有化宇式時,請揭示最能顯示發明特徵的化學 式:8. If there is a huayu type in this tea, please reveal the chemical formula that best shows the characteristics of the invention: GHz (CH2)m RGHz (CH2)m R -4--4-
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