TW200745144A - High purity diisopropyl zinc and its method for manufacture - Google Patents
High purity diisopropyl zinc and its method for manufactureInfo
- Publication number
- TW200745144A TW200745144A TW096114201A TW96114201A TW200745144A TW 200745144 A TW200745144 A TW 200745144A TW 096114201 A TW096114201 A TW 096114201A TW 96114201 A TW96114201 A TW 96114201A TW 200745144 A TW200745144 A TW 200745144A
- Authority
- TW
- Taiwan
- Prior art keywords
- high purity
- manufacture
- purity diisopropyl
- diisopropyl zinc
- zinc
- Prior art date
Links
- FRLYMSHUDNORBC-UHFFFAOYSA-N diisopropylzinc Chemical compound [Zn+2].C[CH-]C.C[CH-]C FRLYMSHUDNORBC-UHFFFAOYSA-N 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical group CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 abstract 1
- 125000004429 atom Chemical group 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 125000001309 chloro group Chemical group Cl* 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic Table
- C07F3/06—Zinc compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
This invention provides a high purity diisopropyl zinc and a method for making the high purity diisopropyl in a simple manner. The high purity diisopropyl zinc of this invention is characterized in having a chlorine atom content of 5.0 mass ppm or lower, and a metal atom content of a sum of 0.40 mass ppm or lower.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006119363 | 2006-04-24 | ||
JP2006316143 | 2006-11-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200745144A true TW200745144A (en) | 2007-12-16 |
Family
ID=38655372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096114201A TW200745144A (en) | 2006-04-24 | 2007-04-23 | High purity diisopropyl zinc and its method for manufacture |
Country Status (3)
Country | Link |
---|---|
JP (2) | JPWO2007125847A1 (en) |
TW (1) | TW200745144A (en) |
WO (1) | WO2007125847A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112028910A (en) * | 2020-08-10 | 2020-12-04 | 安徽亚格盛电子新材料有限公司 | Preparation method of high-purity dimethyl zinc |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5423212B2 (en) * | 2009-07-30 | 2014-02-19 | 宇部興産株式会社 | Method for producing aminoazaboracyclopentene compound |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06128269A (en) * | 1992-10-16 | 1994-05-10 | Shin Etsu Chem Co Ltd | Method and device for producing organic metal compound |
JPH07182939A (en) * | 1993-12-22 | 1995-07-21 | Mitsubishi Materials Corp | Transparent conducting film forming composition and transparent conducting film forming method |
JP3661825B2 (en) * | 1997-06-26 | 2005-06-22 | 信越化学工業株式会社 | Method for producing organic indium compound |
JP3605643B2 (en) * | 2002-07-08 | 2004-12-22 | 国立大学法人島根大学 | Growth method of zinc oxide based thin film |
JP2004104025A (en) * | 2002-09-12 | 2004-04-02 | Fujitsu Ltd | Method for forming film |
JP4248224B2 (en) * | 2002-10-31 | 2009-04-02 | 株式会社日本触媒 | Zinc oxide thin film |
-
2007
- 2007-04-23 JP JP2008513183A patent/JPWO2007125847A1/en active Pending
- 2007-04-23 TW TW096114201A patent/TW200745144A/en unknown
- 2007-04-23 WO PCT/JP2007/058706 patent/WO2007125847A1/en active Application Filing
-
2013
- 2013-03-11 JP JP2013047941A patent/JP5678977B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112028910A (en) * | 2020-08-10 | 2020-12-04 | 安徽亚格盛电子新材料有限公司 | Preparation method of high-purity dimethyl zinc |
CN112028910B (en) * | 2020-08-10 | 2023-06-30 | 安徽亚格盛电子新材料有限公司 | Preparation method of high-purity dimethyl zinc |
Also Published As
Publication number | Publication date |
---|---|
WO2007125847A1 (en) | 2007-11-08 |
JPWO2007125847A1 (en) | 2009-09-10 |
JP5678977B2 (en) | 2015-03-04 |
JP2013107908A (en) | 2013-06-06 |
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