TW200744858A - Method and apparatus for manufacturing a pattern on a substrate and a liquid crystal display - Google Patents

Method and apparatus for manufacturing a pattern on a substrate and a liquid crystal display

Info

Publication number
TW200744858A
TW200744858A TW096119956A TW96119956A TW200744858A TW 200744858 A TW200744858 A TW 200744858A TW 096119956 A TW096119956 A TW 096119956A TW 96119956 A TW96119956 A TW 96119956A TW 200744858 A TW200744858 A TW 200744858A
Authority
TW
Taiwan
Prior art keywords
substrate
manufacturing
pattern
liquid crystal
crystal display
Prior art date
Application number
TW096119956A
Other languages
English (en)
Inventor
Arie Glazer
David Bochner
Gershon Miller
Ofer Saphier
Mannie Dorfan
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Publication of TW200744858A publication Critical patent/TW200744858A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
TW096119956A 2006-06-08 2007-06-04 Method and apparatus for manufacturing a pattern on a substrate and a liquid crystal display TW200744858A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81178706P 2006-06-08 2006-06-08
US11/586,729 US20070287080A1 (en) 2006-06-08 2006-10-26 Enhancement of inkjet-printed elements using photolithographic techniques

Publications (1)

Publication Number Publication Date
TW200744858A true TW200744858A (en) 2007-12-16

Family

ID=38822383

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096119956A TW200744858A (en) 2006-06-08 2007-06-04 Method and apparatus for manufacturing a pattern on a substrate and a liquid crystal display

Country Status (3)

Country Link
US (3) US20070287080A1 (zh)
TW (1) TW200744858A (zh)
WO (1) WO2008015576A2 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080048761A (ko) * 2006-11-29 2008-06-03 삼성전자주식회사 액정디스플레이 제조방법
TWI395167B (zh) * 2008-12-12 2013-05-01 Au Optronics Corp 陣列基板與顯示面板
TWI398710B (zh) * 2009-08-04 2013-06-11 Au Optronics Corp 畫素結構的製作方法
TWI408447B (zh) * 2009-10-05 2013-09-11 Au Optronics Corp 主動元件陣列基板以及顯示面板
KR20180092328A (ko) * 2017-02-08 2018-08-20 삼성디스플레이 주식회사 표시 장치 및 이의 제조 방법

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822718A (en) * 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US4837098A (en) * 1985-02-05 1989-06-06 Kyodo Printing Co., Ltd. Color filter and method of producing the same
JPH03287103A (ja) * 1990-04-02 1991-12-17 Seiko Epson Corp カラーフィルターの形成法
US5340619A (en) * 1993-10-18 1994-08-23 Brewer Science, Inc. Method of manufacturing a color filter array
JPH07294725A (ja) * 1994-03-01 1995-11-10 Seiko Instr Inc カラーフィルター及び多色液晶表示装置の製造方法
US6061110A (en) * 1994-10-18 2000-05-09 Kabushiki Kaisha Toshiba Reflection type liquid crystal display device and method of manufacturing the same
US5853924A (en) * 1994-12-26 1998-12-29 Alps Electric Co., Ltd. Method of manufacturing color filters
US6154265A (en) * 1996-06-18 2000-11-28 Canon Kabushiki Kaisha Liquid crystal device and production process thereof
KR100256392B1 (ko) * 1996-09-30 2000-05-15 겐지 아이다 칼라필터용 감광성 수지 착색 조성물 및 이로부터 형성된 칼라필터 및 그 제조방법
US5948577A (en) * 1997-06-02 1999-09-07 Canon Kabushiki Kaisha Color filter substrate, liquid crystal display device using the same and method of manufacturing color filter substrate
JP2000029013A (ja) * 1998-07-10 2000-01-28 Rohm Co Ltd 液晶表示素子
US6309783B1 (en) * 1998-12-22 2001-10-30 Canon Kabushiki Kaisha Color filter and method of manufacturing the same
US6815125B1 (en) * 1999-06-30 2004-11-09 Dai Nippon Printing Co., Ltd. Color filter and process for producing the same
US6221543B1 (en) * 1999-05-14 2001-04-24 3M Innovatives Properties Process for making active substrates for color displays
JP4521741B2 (ja) * 1999-06-25 2010-08-11 大日本印刷株式会社 カラーフィルタの欠陥修正方法
KR100679521B1 (ko) * 2000-02-18 2007-02-07 엘지.필립스 엘시디 주식회사 액정표시장치 제조방법
JP3564417B2 (ja) * 2000-05-31 2004-09-08 Ｎｅｃ液晶テクノロジー株式会社 カラー液晶表示装置及びその製造方法
US6443571B1 (en) * 2000-08-03 2002-09-03 Creo Srl Self-registering fluid droplet transfer method
JP4200662B2 (ja) * 2001-02-19 2008-12-24 富士ゼロックス株式会社 画像表示媒体の製造方法
JP2003005168A (ja) * 2001-06-18 2003-01-08 Nec Corp 液晶表示装置の製造方法
JP3627728B2 (ja) * 2001-09-19 2005-03-09 セイコーエプソン株式会社 液晶パネル、液晶パネルの製造方法、液晶装置、並びに電子機器
TW574523B (en) * 2001-11-23 2004-02-01 Ind Tech Res Inst Color filter of liquid crystal display
JP3829710B2 (ja) * 2001-12-17 2006-10-04 セイコーエプソン株式会社 カラーフィルタ及びその製造方法、液晶装置及びその製造方法、並びに電子機器
US6875678B2 (en) * 2002-09-10 2005-04-05 Samsung Electronics Co., Ltd. Post thermal treatment methods of forming high dielectric layers in integrated circuit devices
US7221417B2 (en) * 2002-12-26 2007-05-22 Citizen Watch Co., Ltd. Liquid crystal display device and method for manufacturing the same
KR100909419B1 (ko) * 2002-12-27 2009-07-28 엘지디스플레이 주식회사 액정표시소자의 칼라필터 제조방법
KR20050105173A (ko) * 2003-01-17 2005-11-03 다이오드 설류션즈, 아이엔씨. 유기재료를 사용하는 디스플레이
US7061570B2 (en) * 2003-03-26 2006-06-13 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
KR100652214B1 (ko) * 2003-04-03 2006-11-30 엘지.필립스 엘시디 주식회사 액정표시장치의 제조방법
JP4289924B2 (ja) * 2003-04-07 2009-07-01 大日本印刷株式会社 パターン形成体
US6745102B1 (en) * 2003-04-10 2004-06-01 Powerchip Semiconductor Corp. Automatic transporting system and method for operating the same
JP4311084B2 (ja) * 2003-06-02 2009-08-12 セイコーエプソン株式会社 薄膜パターンの製造方法、有機電界発光素子の製造方法、カラーフィルタの製造方法、プラズマディスプレイパネルの製造方法、液晶表示パネルの製造方法
US7122489B2 (en) * 2004-05-12 2006-10-17 Matsushita Electric Industrial Co., Ltd. Manufacturing method of composite sheet material using ultrafast laser pulses
JP2006003571A (ja) * 2004-06-16 2006-01-05 Dainippon Printing Co Ltd Ｉｐｓ用カラーフィルタおよび液晶表示装置
DE102004034418B4 (de) * 2004-07-15 2009-06-25 Schott Ag Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten
US7301693B2 (en) * 2004-08-13 2007-11-27 Sipix Imaging, Inc. Direct drive display with a multi-layer backplane and process for its manufacture
JP2006064760A (ja) * 2004-08-24 2006-03-09 Dainippon Screen Mfg Co Ltd カラー画像表示装置の着色層の形成方法
TWI303728B (en) * 2004-11-12 2008-12-01 Ind Tech Res Inst Flexible color display with wide view angle and method for manufacturing the same
US7396618B2 (en) * 2004-12-03 2008-07-08 Lg. Display Co., Ltd Color filter substrate for liquid crystal display device and method of fabricating the same
TWI317828B (en) * 2004-12-07 2009-12-01 Ind Tech Res Inst Method and device of color cholesteric liquid crystal
TWI294529B (en) * 2004-12-22 2008-03-11 Ind Tech Res Inst Method of forming micro pattern

Also Published As

Publication number Publication date
WO2008015576A3 (en) 2009-04-23
US20070287351A1 (en) 2007-12-13
WO2008015576A2 (en) 2008-02-07
US20070287080A1 (en) 2007-12-13
US20070287103A1 (en) 2007-12-13

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