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Application filed by Metal Ind Res & Dev CtfiledCriticalMetal Ind Res & Dev Ct
Priority to TW095117041ApriorityCriticalpatent/TW200742620A/en
Publication of TW200742620ApublicationCriticalpatent/TW200742620A/en
Application grantedgrantedCritical
Publication of TWI294313BpublicationCriticalpatent/TWI294313B/zh
This invention relates to a compound method of cleaning surface contaminants of a substrate, including the steps of: providing a substrate; providing a plasma supply unit, providing a CO2 flakes supply unit; spray cleaning a substrate by means of the plasma; and spray cleaning the substrate by means of the plasma and CO2 flakes. By implementing this invention, there is no need to consume a large amount of resources and energies, water resources in particular, nor will this invention causes environmental problems, but can effectively eliminates various organic contaminants and particles, so as to enhance the cleaning effect of the substrate surface.
TW095117041A2006-05-122006-05-12Compound method of cleaning surface contaminants of a substrate
TW200742620A
(en)
Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be exposed, and method of imparting water repellency with the same to substrate to be exposed
A Field Intensive Approach to Understanding Relationships Between Vegetation, Landscape, and Management Factors and Their Effects on Stream Sediment and Nutrient Delivery in the Lake Tahoe Basin