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Application filed by Lee Chang Yung Chemical Industry CorpfiledCriticalLee Chang Yung Chemical Industry Corp
Priority to TW096117632ApriorityCriticalpatent/TW200739282A/en
Publication of TW200739282ApublicationCriticalpatent/TW200739282A/en
This invention relates to a method of washing photoresist which uses keto-alcohol compound cleansers to contact the photoresist adhered on a substrate and to remove the photoresist therefrom. In addition, this invention also provides a photoresist cleanser containing keto-alcohol compounds and a medium capable of washing photoresist. The keto-alcohol compounds are relatively cheap and may provide a great washing effect with small amount; thus, users may choose the ingredients of the cleanser of the present invention on the basis of their needs, and the costs may therefore be reduced. Therefore, this method and cleanser of this invention may provide a great washing effect with relatively low costs, enabling its mass use in the industry.
TW096117632A2007-05-172007-05-17Method of washing photoresist and photoresist cleanser
TW200739282A
(en)
NEW ASSOCIATION OF AN INHIBITOR OF THE SINUSAL CURRENT I, AND OF AN INHIBITOR OF THE CONVERSION ENZYME AND THE PHARMACEUTICAL COMPOSITIONS CONTAINING IT