TW200741834A - Systems and methods for drying a rotating substrate - Google Patents
Systems and methods for drying a rotating substrateInfo
- Publication number
- TW200741834A TW200741834A TW096101976A TW96101976A TW200741834A TW 200741834 A TW200741834 A TW 200741834A TW 096101976 A TW096101976 A TW 096101976A TW 96101976 A TW96101976 A TW 96101976A TW 200741834 A TW200741834 A TW 200741834A
- Authority
- TW
- Taiwan
- Prior art keywords
- dispenser
- liquid
- substrate
- drying fluid
- drying
- Prior art date
Links
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
A method of drying a surface of a substrate is provided. The method includes supporting and rotating a substrate; applying a liquid to the substrate surface at or near a rotational center point via a liquid dispenser (so that a film of the liquid is formed on the surface); applying a drying fluid to the substrate surface at a predetermined distance from the rotational center point via one or more drying fluid dispensers; and manipulating the drying fluid dispenser(s) so that the location at which the drying fluid is applied to the substrate is moved in a direction toward the rotational center point, while at the same time manipulating the liquid dispenser so that the location at which the liquid is applied to the substrate is moved in a direction outward from the rotational center point. The liquid dispenser and drying fluid dispenser(s) noted above can be located on and/or within an assembly. The assembly can include a first dispenser, a second dispenser, and a third dispenser. The first dispenser supplies liquid while the second and third dispensers supply drying fluid, where the second dispenser has a larger opening than the third dispenser. The second and third dispensers are positioned on the assembly next to one another and spaced from the first dispenser. Further, the second dispenser is located between the third dispenser and the first dispenser, such that the first dispenser is capable of linearly leading the second and third dispensers during movement.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75994806P | 2006-01-18 | 2006-01-18 | |
| US83948706P | 2006-08-23 | 2006-08-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200741834A true TW200741834A (en) | 2007-11-01 |
| TWI467640B TWI467640B (en) | 2015-01-01 |
Family
ID=52784738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96101976A TWI467640B (en) | 2006-01-18 | 2007-01-18 | Systems and methods for drying a rotating substrate |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI467640B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6938248B2 (en) * | 2017-07-04 | 2021-09-22 | 東京エレクトロン株式会社 | Substrate processing equipment, substrate processing method and storage medium |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4989345A (en) * | 1989-12-18 | 1991-02-05 | Gill Jr Gerald L | Centrifugal spin dryer for semiconductor wafer |
| US6247479B1 (en) * | 1997-05-27 | 2001-06-19 | Tokyo Electron Limited | Washing/drying process apparatus and washing/drying process method |
-
2007
- 2007-01-18 TW TW96101976A patent/TWI467640B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI467640B (en) | 2015-01-01 |
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