TW200736593A - Apparatus for measuring reflectance, method for measuring reflectance and method for manufacturing display panel - Google Patents

Apparatus for measuring reflectance, method for measuring reflectance and method for manufacturing display panel

Info

Publication number
TW200736593A
TW200736593A TW095142030A TW95142030A TW200736593A TW 200736593 A TW200736593 A TW 200736593A TW 095142030 A TW095142030 A TW 095142030A TW 95142030 A TW95142030 A TW 95142030A TW 200736593 A TW200736593 A TW 200736593A
Authority
TW
Taiwan
Prior art keywords
illumination light
substrate
light source
measuring reflectance
display panel
Prior art date
Application number
TW095142030A
Other languages
Chinese (zh)
Inventor
Naoki Koto
Kazunori Inoue
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of TW200736593A publication Critical patent/TW200736593A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G02F1/13318—Circuits comprising a photodetector
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/58—Arrangements comprising a monitoring photodetector
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/69—Arrangements or methods for testing or calibrating a device

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Liquid Crystal (AREA)

Abstract

The invention is to provide a reflectance measuring device capable of efficiently measuring the reflection characteristics and scattering characteristics inside the substrate surface. This reflectance measuring device 100 in one mode is equipped with a stage 102 for placing thereon a substrate 101 which is a measuring object, the first illumination light source 103 and the second illumination light source 105 for irradiating illumination light toward the substrate 101 placed on the stage 102, and the first detector 104 and the second detector 106 equipped with each light-receiving element for receiving reflected light, reflected by the substrate 101 in the illumination light irradiated from the first illumination light source 103 and the second illumination light source 105. The first illumination light source 103 irradiates light at an arbitrary angle with respect to the substrate 101, and the second illumination light source 105 irradiates light in a ring shape, with respect to the substrate 101.
TW095142030A 2006-02-09 2006-11-14 Apparatus for measuring reflectance, method for measuring reflectance and method for manufacturing display panel TW200736593A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006031804A JP2007212260A (en) 2006-02-09 2006-02-09 Reflectance measuring device, reflectance measuring method, and manufacturing method of display panel

Publications (1)

Publication Number Publication Date
TW200736593A true TW200736593A (en) 2007-10-01

Family

ID=38490849

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142030A TW200736593A (en) 2006-02-09 2006-11-14 Apparatus for measuring reflectance, method for measuring reflectance and method for manufacturing display panel

Country Status (4)

Country Link
JP (1) JP2007212260A (en)
KR (1) KR100795853B1 (en)
CN (1) CN100464210C (en)
TW (1) TW200736593A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012063269A (en) * 2010-09-16 2012-03-29 Sony Corp Measuring apparatus and measuring method
JP2012063321A (en) * 2010-09-17 2012-03-29 Hamamatsu Photonics Kk Reflectivity measurement device, reflectivity measurement method, film thickness measurement device, and film thickness measurement method
CN103344613B (en) * 2013-07-26 2016-09-28 杭州远方光电信息股份有限公司 A kind of material reflection characteristic measurement apparatus and method
CN105195468B (en) * 2014-06-25 2017-08-18 核工业西南物理研究院 A kind of method and apparatus of on-line cleaning and the detection mirror of fusion facility first
CN104503118B (en) * 2015-01-22 2017-04-26 合肥京东方光电科技有限公司 Panel lead wire detection device and detection method
CN106596403A (en) * 2016-11-25 2017-04-26 中国科学院长春光学精密机械与物理研究所 Clamping device for measuring reflectivity of curved mirror
KR102089232B1 (en) * 2016-11-29 2020-03-13 가부시키가이샤 리가쿠 X-ray reflectance measuring device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4385419B2 (en) * 1998-11-30 2009-12-16 株式会社ニコン Appearance inspection method and appearance inspection apparatus
JP4671573B2 (en) * 2000-03-24 2011-04-20 オリンパス株式会社 Substrate transport device and visual inspection device
TWI285738B (en) * 2000-09-26 2007-08-21 Olympus Corp Defect detecting apparatus and computer readable medium
JP2002162360A (en) * 2000-11-22 2002-06-07 Seiko Epson Corp Method and equipment for evaluating liquid crystal panel
JP2003028756A (en) * 2001-07-11 2003-01-29 Chuo Seiki Kk Reflected light measuring device
JP2004177162A (en) * 2002-11-25 2004-06-24 Alps Electric Co Ltd Reflection rate measuring instrument
KR100568725B1 (en) * 2003-12-30 2006-04-07 삼성전자주식회사 Apparatus for inspecting a defect
JP2006029833A (en) * 2004-07-12 2006-02-02 Hikari Physics Kenkyusho:Kk Method and apparatus for evaluating optical element
KR100732349B1 (en) * 2005-04-29 2007-06-27 주식회사 에이디피엔지니어링 Apparatus for inspecting the substrate

Also Published As

Publication number Publication date
CN101017254A (en) 2007-08-15
KR20070081079A (en) 2007-08-14
JP2007212260A (en) 2007-08-23
CN100464210C (en) 2009-02-25
KR100795853B1 (en) 2008-01-21

Similar Documents

Publication Publication Date Title
TW200736593A (en) Apparatus for measuring reflectance, method for measuring reflectance and method for manufacturing display panel
EP2081015A3 (en) Apparatus for inspecting food
TW200626870A (en) Apparatus and method of inspecting mura-defect and method of fabricating photomask
EP2228685A3 (en) Level sensor arrangement for lithographic apparatus and device manufacturing method
TW200617372A (en) Method and apparatus for angular-resolved spectroscopic lithography characterization
TW200951430A (en) Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
WO2009104871A3 (en) Dark-field examination device
TW200707088A (en) Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
SG169314A1 (en) Method and device for detecting defects in an object
EP2108919A3 (en) Interferometer for determining characteristics of an object surface
MY182409A (en) Surface inspection method and surface inspection apparatus
GB2470698A (en) Dimensional probe and methods of use
WO2006015046A3 (en) Presenting display objects in a gaming machine
TW200643472A (en) Apparatus and methods for scatterometry of optical devices
JP2010519515A5 (en)
JP2012002601A5 (en)
WO2009049834A3 (en) Optical sensor device
UA101622C2 (en) method for optical analysis of a sample
EP1777493A3 (en) Methods and apparatus for inspecting an object using structured light
WO2009131892A3 (en) Methods and apparatus for measuring substrate edge thickness during polishing
TW200736577A (en) Visual inspection apparatus
TW200745530A (en) Lighting-assisted testing of an optoelectronic module
ATE479157T1 (en) SCANNING METHOD AND APPARATUS
WO2009014844A3 (en) Method and device for identifying an unknown biological substance
WO2005067663A3 (en) Devices and methods for optical endpoint detection during semiconductor wafer polishing