TW200733226A - Apparatus for treating substrates and method of treating substrates - Google Patents
Apparatus for treating substrates and method of treating substratesInfo
- Publication number
- TW200733226A TW200733226A TW096101406A TW96101406A TW200733226A TW 200733226 A TW200733226 A TW 200733226A TW 096101406 A TW096101406 A TW 096101406A TW 96101406 A TW96101406 A TW 96101406A TW 200733226 A TW200733226 A TW 200733226A
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor chip
- solution
- supply pipe
- hydrogen peroxide
- sulfur acid
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Abstract
This invention relates to a treatment apparatus for effectively eliminating anti-resistant film disposed on a semiconductor chip, including a rotating platform for holding the semiconductor chip; a nozzle disposed in opposite to the semiconductor chip held by the rotating platform, mixing solution of sulfur acid and hydrogen peroxide and then applying the solution onto the semiconductor chip. The nozzle comprises a body with a longitudinal shape located along a radial direction of the semiconductor chip; a first supply pipe and a second supply pipe for supplying the solution of sulfur acid and hydrogen peroxide to the body; a first slit and curved-surface and a second slit and curved-surface for mixing the solution of sulfur acid and hydrogen peroxide from the first supply pipe and the second supply pipe, and applying the solution from the body all over the semiconductor chip in the radial direction.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006010027A JP2007194351A (en) | 2006-01-18 | 2006-01-18 | Method and device for processing substrate |
JP2006015266A JP4759395B2 (en) | 2006-01-24 | 2006-01-24 | Substrate processing apparatus and processing method |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200733226A true TW200733226A (en) | 2007-09-01 |
Family
ID=38501345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096101406A TW200733226A (en) | 2006-01-18 | 2007-01-15 | Apparatus for treating substrates and method of treating substrates |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20070076527A (en) |
TW (1) | TW200733226A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI450326B (en) * | 2009-06-23 | 2014-08-21 | Tokyo Electron Ltd | Liquid processing apparatus and liquid processing method |
TWI550680B (en) * | 2009-09-28 | 2016-09-21 | 尼康股份有限公司 | Substrate pressurization device and its control method |
-
2007
- 2007-01-15 TW TW096101406A patent/TW200733226A/en unknown
- 2007-01-17 KR KR1020070005200A patent/KR20070076527A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI450326B (en) * | 2009-06-23 | 2014-08-21 | Tokyo Electron Ltd | Liquid processing apparatus and liquid processing method |
TWI550680B (en) * | 2009-09-28 | 2016-09-21 | 尼康股份有限公司 | Substrate pressurization device and its control method |
Also Published As
Publication number | Publication date |
---|---|
KR20070076527A (en) | 2007-07-24 |
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