TW200731253A - Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film - Google Patents

Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film

Info

Publication number
TW200731253A
TW200731253A TW095149234A TW95149234A TW200731253A TW 200731253 A TW200731253 A TW 200731253A TW 095149234 A TW095149234 A TW 095149234A TW 95149234 A TW95149234 A TW 95149234A TW 200731253 A TW200731253 A TW 200731253A
Authority
TW
Taiwan
Prior art keywords
reflection film
translucent
optical recording
recording medium
forming
Prior art date
Application number
TW095149234A
Other languages
English (en)
Chinese (zh)
Inventor
Shozo Komiyama
Gou Yamaguchi
Akifumi Mishima
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW200731253A publication Critical patent/TW200731253A/zh

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
TW095149234A 2005-12-29 2006-12-27 Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film TW200731253A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005380534 2005-12-29
JP2006243687A JP4553149B2 (ja) 2005-12-29 2006-09-08 光記録媒体用半透明反射膜および反射膜、並びにこれら半透明反射膜および反射膜を形成するためのAg合金スパッタリングターゲット

Publications (1)

Publication Number Publication Date
TW200731253A true TW200731253A (en) 2007-08-16

Family

ID=38454956

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095149234A TW200731253A (en) 2005-12-29 2006-12-27 Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film

Country Status (2)

Country Link
JP (1) JP4553149B2 (ja)
TW (1) TW200731253A (ja)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002319185A (ja) * 2001-04-23 2002-10-31 Sumitomo Metal Mining Co Ltd 光記録ディスク反射膜用銀合金
JP4379602B2 (ja) * 2003-08-20 2009-12-09 三菱マテリアル株式会社 半透明反射膜または反射膜を構成層とする光記録媒体および前記反射膜の形成に用いられるAg合金スパッタリングターゲット
EP1736558A4 (en) * 2003-12-10 2009-06-17 Tanaka Precious Metal Ind SILVER ALLOY FOR REFLECTIVE FILM

Also Published As

Publication number Publication date
JP2007200519A (ja) 2007-08-09
JP4553149B2 (ja) 2010-09-29

Similar Documents

Publication Publication Date Title
TW200735089A (en) Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
SG119296A1 (en) Silver alloy reflective film sputtering target therefor and optical information recording medium using the same
TW200641875A (en) Silver alloy reflective films for optical information recording media, silver alloy sputtering targets therefor, and optical information recording media
SG129404A1 (en) Silver alloy reflective films for optical information recording media, silver alloy sputterin targets therefor, and optical information recording media
ATE434255T1 (de) Aufzeichnungsschicht für optische aufzeichnungsmedien und sputtertarget
TW200643199A (en) Al-Ni-rare earth element alloy sputtering target
GB2433647B (en) Phase change memory materials, devices and methods
TW200508407A (en) Reflection film optical recording medium and silver alloy sputtering target for forming reflection film
TW200728236A (en) Sputtering target, transparent conductive film and transparent electrode
ATE482692T1 (de) Zusammensetzung enthaltend feine körner mit verzögerter freisetzung für in der mundhöhle schnell zerfallende tabletten
HK1088932A1 (en) Copper-based alloy
TW200731300A (en) Ruthenium alloy magnetic media and sputter targets
EP2045631A4 (en) THIN FILM FOR REFLECTIVE OR SEMI-REFLECTIVE FILM, SPRAY TARGET AND OPTICAL RECORDING MEDIUM
HK1123829A1 (en) Alloys, bulk metallic glass, and methods of forming the same
JP2004192702A5 (ja)
SG130155A1 (en) Recording layer and sputtering target for optical information recording media, as well as optical information recording media
TW200746130A (en) Translucent reflection film for optical recording medium, and Ag alloy sputtering target for forming the reflection film
MY169280A (en) Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same
WO2009075329A1 (ja) 分解性を調整したゼラチン組成物
TW200731253A (en) Translucent reflection film and reflection film for optical recording medium, and Ag alloy sputtering target for forming the translucent reflection film and the reflection film
ES2553730T3 (es) Composición de electrolito y procedimiento para la deposición de una capa de aleación de zinc-níquel sobre un sustrato de hierro fundido o de acero fundido
TW200519217A (en) Aluminum alloy film for wiring and sputter target material for forming the film
TW200732485A (en) Fired material and process for producing the same
TW200703311A (en) Two-layered optical recording medium
TW200611983A (en) Low oxygen content alloy compositions