TW200729451A - An alignment structure - Google Patents
An alignment structureInfo
- Publication number
- TW200729451A TW200729451A TW095103051A TW95103051A TW200729451A TW 200729451 A TW200729451 A TW 200729451A TW 095103051 A TW095103051 A TW 095103051A TW 95103051 A TW95103051 A TW 95103051A TW 200729451 A TW200729451 A TW 200729451A
- Authority
- TW
- Taiwan
- Prior art keywords
- alignment mark
- layer
- disposed
- alignment structure
- alignment
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
An alignment structure is disclosed. A first layer is disposed on a substrate, and a first alignment mark is disposed on or in the first layer, wherein the first alignment mark is composed of two symmetrical and discontinuous portions. A second layer is disposed on the first layer, and covers the first alignment mark. A second alignment mark is disposed on or in the second layer, wherein the second alignment mark is composed of two symmetrical and discontinuous portions. The first alignment mark does not overlaps the second alignment mark.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95103051A TWI288465B (en) | 2006-01-26 | 2006-01-26 | An alignment structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95103051A TWI288465B (en) | 2006-01-26 | 2006-01-26 | An alignment structure |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200729451A true TW200729451A (en) | 2007-08-01 |
TWI288465B TWI288465B (en) | 2007-10-11 |
Family
ID=39203027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95103051A TWI288465B (en) | 2006-01-26 | 2006-01-26 | An alignment structure |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI288465B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014134888A1 (en) * | 2013-03-08 | 2014-09-12 | 京东方科技集团股份有限公司 | Substrate alignment mark and manufacturing method therefor, and substrate |
CN104934413A (en) * | 2014-03-18 | 2015-09-23 | 中芯国际集成电路制造(上海)有限公司 | Overlapping alignment mark and substrate with the same |
-
2006
- 2006-01-26 TW TW95103051A patent/TWI288465B/en active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014134888A1 (en) * | 2013-03-08 | 2014-09-12 | 京东方科技集团股份有限公司 | Substrate alignment mark and manufacturing method therefor, and substrate |
CN104934413A (en) * | 2014-03-18 | 2015-09-23 | 中芯国际集成电路制造(上海)有限公司 | Overlapping alignment mark and substrate with the same |
CN104934413B (en) * | 2014-03-18 | 2018-03-23 | 中芯国际集成电路制造(上海)有限公司 | Overlapping alignment marks and the substrate with overlapping alignment mark |
Also Published As
Publication number | Publication date |
---|---|
TWI288465B (en) | 2007-10-11 |
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