TW200728333A - Side-chain unsaturated polymers, radiation-sensitive resin composition and spacer for liquid crystal display device - Google Patents

Side-chain unsaturated polymers, radiation-sensitive resin composition and spacer for liquid crystal display device

Info

Publication number
TW200728333A
TW200728333A TW095127315A TW95127315A TW200728333A TW 200728333 A TW200728333 A TW 200728333A TW 095127315 A TW095127315 A TW 095127315A TW 95127315 A TW95127315 A TW 95127315A TW 200728333 A TW200728333 A TW 200728333A
Authority
TW
Taiwan
Prior art keywords
spacer
formula
integer
radiation
liquid crystal
Prior art date
Application number
TW095127315A
Other languages
Chinese (zh)
Other versions
TWI394001B (en
Inventor
Isamu Yonekura
Daigo Ichinohe
Toshihiro Nishio
Hiroshi Shiho
Toru Kajita
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200728333A publication Critical patent/TW200728333A/en
Application granted granted Critical
Publication of TWI394001B publication Critical patent/TWI394001B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

This invention provides a radiation-sensitive resin composition which is featured in that the polymer comprises (a1) unsaturated carboxylic acid and/ or unsaturated acid anhydride and (a2) the following formula (1) being the unsaturated compound containing more than two hydroxyl gropes and (a3) other unsaturated compounds on the copolymer. In that the polymer is the reaction product of this compound reacts with isocynates as indicated in formula (2). In formula (1) R1 is hydrogen atom or methyl group; p is an integer of 0~ 3 and q is integer of 1~ 12. And in formula (2) R2 is hydrogen atom or methyl group; p is an integer of 1~ 12. This resin owns high sensitivity and high resolution, the shape of spacer can be sufficiently formed even under low degree of exposure. This resin has excellent properties such as elastic recovery, abrasion resistance, adhesion with transparent substrate, heat resistance, stripping solution resistance etc, and is used as spacer for liquid crystal display devices.
TW095127315A 2005-07-27 2006-07-26 Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements TWI394001B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005217644 2005-07-27

Publications (2)

Publication Number Publication Date
TW200728333A true TW200728333A (en) 2007-08-01
TWI394001B TWI394001B (en) 2013-04-21

Family

ID=38013612

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095127315A TWI394001B (en) 2005-07-27 2006-07-26 Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements

Country Status (3)

Country Link
KR (1) KR101290855B1 (en)
CN (1) CN1975573B (en)
TW (1) TWI394001B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467271B (en) * 2012-04-23 2015-01-01 Au Optronics Corp Liquid crystal panel

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466923B (en) 2010-10-29 2014-09-24 京东方科技集团股份有限公司 Thin film transistor-liquid crystal display (TFT-LCD), driving method thereof and manufacture method of color film substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3650985B2 (en) * 1997-05-22 2005-05-25 Ｊｓｒ株式会社 Negative-type radiation-sensitive resin composition and pattern production method
US6140019A (en) * 1997-07-24 2000-10-31 Jsr Corporation Radiation sensitive composition
US7323232B2 (en) * 2002-10-31 2008-01-29 Fujifilm Corporation Resin composition for spacer, spacer, and liquid crystal display device
JP4351519B2 (en) * 2003-11-26 2009-10-28 東洋インキ製造株式会社 Photosensitive composition and color filter
JP2006301240A (en) * 2005-04-20 2006-11-02 Jsr Corp Radiation-sensitive resin composition, protrusion and spacer formed of the same, and liquid crystal display element equipped with them

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467271B (en) * 2012-04-23 2015-01-01 Au Optronics Corp Liquid crystal panel

Also Published As

Publication number Publication date
CN1975573A (en) 2007-06-06
CN1975573B (en) 2011-10-12
KR20070014066A (en) 2007-01-31
KR101290855B1 (en) 2013-07-29
TWI394001B (en) 2013-04-21

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