TW200725781A - A substrate processing device, a substrate processing method and a production method for a substrate - Google Patents

A substrate processing device, a substrate processing method and a production method for a substrate

Info

Publication number
TW200725781A
TW200725781A TW095142763A TW95142763A TW200725781A TW 200725781 A TW200725781 A TW 200725781A TW 095142763 A TW095142763 A TW 095142763A TW 95142763 A TW95142763 A TW 95142763A TW 200725781 A TW200725781 A TW 200725781A
Authority
TW
Taiwan
Prior art keywords
substrate
drug liquid
temperature
processing
substrate processing
Prior art date
Application number
TW095142763A
Other languages
Chinese (zh)
Other versions
TWI319213B (en
Inventor
Yoshihiro Moriguchi
Takao Kamaishi
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005342641A external-priority patent/JP2007144315A/en
Priority claimed from JP2005342639A external-priority patent/JP4557872B2/en
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of TW200725781A publication Critical patent/TW200725781A/en
Application granted granted Critical
Publication of TWI319213B publication Critical patent/TWI319213B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Abstract

A substrate processing device, a substrate processing method and a production method for a substrate are provided in this present invention. A drug liquid processing of an inclined substrate is uniformly performed under the condition that, on the one hand, the substrate is kept in an inclined state, and, on the other hand, the drug liquid with a temperature higher than a normal temperature is used. When the substrate 1 passes beneath a heater 11, the heater 11 heats the surface of the substrate 1 to a temperature close to the temperature of the drug liquid supplied by a drug liquid nozzle 21. The drug liquid nozzle 21 supplies the drug liquid, whose temperature is higher than a normal temperature, towards the surface of the substrate 1. By means of the drug liquid supplied to the surface of the substrate 1, the drug liquid processing on the surface of the substrate 1 is performed. Before the drug liquid processing of the substrate 1 is performed, the substrate 1 is heated to a temperature close to the temperature of the drug liquid used in the drug liquid processing. Thus the difference in the increased temperatures of the surfaces at the upper side and the bottom side of the surface of the substrate 1 becomes small, and then the surface temperature of the substrate 1 will quickly become roughly uniformed.
TW095142763A 2005-11-28 2006-11-20 A substrate processing device, a substrate processing method and a production method for a substrate TWI319213B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005342641A JP2007144315A (en) 2005-11-28 2005-11-28 Substrate treatment device, substrate treatment method and manufacturing method of substrate
JP2005342639A JP4557872B2 (en) 2005-11-28 2005-11-28 Substrate processing apparatus, substrate processing method, and substrate manufacturing method

Publications (2)

Publication Number Publication Date
TW200725781A true TW200725781A (en) 2007-07-01
TWI319213B TWI319213B (en) 2010-01-01

Family

ID=38277205

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142763A TWI319213B (en) 2005-11-28 2006-11-20 A substrate processing device, a substrate processing method and a production method for a substrate

Country Status (2)

Country Link
KR (1) KR100870524B1 (en)
TW (1) TWI319213B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI562942B (en) * 2013-12-24 2016-12-21 Manz Taiwan Ltd Guiding mechanism and processing device having the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5599754B2 (en) * 2010-05-31 2014-10-01 東京エレクトロン株式会社 Substrate processing apparatus, substrate processing method, and recording medium on which a computer program for executing the substrate processing method is recorded

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100593709B1 (en) * 2002-03-27 2006-06-28 다이닛뽕스크린 세이조오 가부시키가이샤 Substrate Processing Equipment
JP4421956B2 (en) * 2003-07-18 2010-02-24 芝浦メカトロニクス株式会社 Substrate processing apparatus and processing method
JP4152871B2 (en) * 2003-12-03 2008-09-17 東京エレクトロン株式会社 Nozzle and substrate processing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI562942B (en) * 2013-12-24 2016-12-21 Manz Taiwan Ltd Guiding mechanism and processing device having the same

Also Published As

Publication number Publication date
KR100870524B1 (en) 2008-11-26
KR20070055954A (en) 2007-05-31
TWI319213B (en) 2010-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees