TW200721496A - A method of manufacturing a thin film transistor matrix substrate - Google Patents
A method of manufacturing a thin film transistor matrix substrateInfo
- Publication number
- TW200721496A TW200721496A TW094141354A TW94141354A TW200721496A TW 200721496 A TW200721496 A TW 200721496A TW 094141354 A TW094141354 A TW 094141354A TW 94141354 A TW94141354 A TW 94141354A TW 200721496 A TW200721496 A TW 200721496A
- Authority
- TW
- Taiwan
- Prior art keywords
- channel region
- thin film
- manufacturing
- film transistor
- matrix substrate
- Prior art date
Links
Landscapes
- Thin Film Transistor (AREA)
Abstract
A method of manufacturing a thin film transistor matrix substrate is provided. The method at least comprises forming a channel region on the gate dielectric lying on the gate electrode, wherein the gate electrode is wider than the channel region. Thereafter, at least two contact holes are formed in the insulation layer covering the channel region to expose a portion of the channel region surface. An ion implantation process is performed to form ohmic contact on the exposed channel region. A conformal transparent conductive layer is formed covering on all structures. A lithographic/etching process is performed to define source/drain, pixel, gate electrode pad and data electrode pad.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94141354A TWI290372B (en) | 2005-11-24 | 2005-11-24 | A method of manufacturing a thin film transistor matrix substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94141354A TWI290372B (en) | 2005-11-24 | 2005-11-24 | A method of manufacturing a thin film transistor matrix substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200721496A true TW200721496A (en) | 2007-06-01 |
TWI290372B TWI290372B (en) | 2007-11-21 |
Family
ID=39301433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94141354A TWI290372B (en) | 2005-11-24 | 2005-11-24 | A method of manufacturing a thin film transistor matrix substrate |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI290372B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI576646B (en) * | 2015-04-30 | 2017-04-01 | 群創光電股份有限公司 | Display device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101506304B1 (en) | 2009-11-27 | 2015-03-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Semiconductor device and method for manufacturing the same |
-
2005
- 2005-11-24 TW TW94141354A patent/TWI290372B/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI576646B (en) * | 2015-04-30 | 2017-04-01 | 群創光電股份有限公司 | Display device |
US10325931B2 (en) | 2015-04-30 | 2019-06-18 | Innolux Corporation | Display device |
US10957715B2 (en) | 2015-04-30 | 2021-03-23 | Innolux Corporation | Display device |
Also Published As
Publication number | Publication date |
---|---|
TWI290372B (en) | 2007-11-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |