TW200714439A - System to transfer a template transfer body between a motion stage and a docking plate - Google Patents

System to transfer a template transfer body between a motion stage and a docking plate

Info

Publication number
TW200714439A
TW200714439A TW095125846A TW95125846A TW200714439A TW 200714439 A TW200714439 A TW 200714439A TW 095125846 A TW095125846 A TW 095125846A TW 95125846 A TW95125846 A TW 95125846A TW 200714439 A TW200714439 A TW 200714439A
Authority
TW
Taiwan
Prior art keywords
docking plate
motion stage
transfer
distance
motion
Prior art date
Application number
TW095125846A
Other languages
Chinese (zh)
Other versions
TWI309198B (en
Inventor
Philip D Schumaker
Angelo Fancello
Jae H Kim
Byung-Jin Choi
Daniel A Babbs
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/211,763 external-priority patent/US20070064384A1/en
Priority claimed from US11/211,785 external-priority patent/US20070074635A1/en
Priority claimed from US11/211,766 external-priority patent/US7665981B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of TW200714439A publication Critical patent/TW200714439A/en
Application granted granted Critical
Publication of TWI309198B publication Critical patent/TWI309198B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.
TW95125846A 2005-08-25 2006-07-14 System to transfer a template transfer body between a motion stage and a docking plate TWI309198B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/211,763 US20070064384A1 (en) 2005-08-25 2005-08-25 Method to transfer a template transfer body between a motion stage and a docking plate
US11/211,785 US20070074635A1 (en) 2005-08-25 2005-08-25 System to couple a body and a docking plate
US11/211,766 US7665981B2 (en) 2005-08-25 2005-08-25 System to transfer a template transfer body between a motion stage and a docking plate

Publications (2)

Publication Number Publication Date
TW200714439A true TW200714439A (en) 2007-04-16
TWI309198B TWI309198B (en) 2009-05-01

Family

ID=37772079

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95125846A TWI309198B (en) 2005-08-25 2006-07-14 System to transfer a template transfer body between a motion stage and a docking plate

Country Status (3)

Country Link
EP (1) EP1934669A4 (en)
TW (1) TWI309198B (en)
WO (1) WO2007024345A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104523285B (en) * 2014-12-12 2016-09-21 广东东邦科技有限公司 A kind of electronic skin and preparation method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5905566A (en) * 1997-04-10 1999-05-18 International Business Machines Corporation Laser ablation top surface reference chuck
US6842221B1 (en) * 1999-03-12 2005-01-11 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
EP1085382B1 (en) * 1999-09-17 2006-06-14 Fuji Photo Film Co., Ltd. Positioning method and positioning device
US6515736B1 (en) * 2000-05-04 2003-02-04 International Business Machines Corporation Reticle capturing and handling system
US6630988B2 (en) * 2001-06-28 2003-10-07 Intel Corporation Reticle stop block apparatus and method
EP1622750B1 (en) * 2003-05-14 2010-11-10 Molecular Imprints, Inc. Method, system, holder and assembly for transferring templates during imprint lithography processes
EP1500980A1 (en) * 2003-07-22 2005-01-26 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
WO2007024345A3 (en) 2009-04-30
EP1934669A4 (en) 2009-12-16
WO2007024345A2 (en) 2007-03-01
EP1934669A2 (en) 2008-06-25
TWI309198B (en) 2009-05-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees