EP1934669A4 - System to transfer a template transfer body between a motion stage and a docking plate - Google Patents

System to transfer a template transfer body between a motion stage and a docking plate

Info

Publication number
EP1934669A4
EP1934669A4 EP06786500A EP06786500A EP1934669A4 EP 1934669 A4 EP1934669 A4 EP 1934669A4 EP 06786500 A EP06786500 A EP 06786500A EP 06786500 A EP06786500 A EP 06786500A EP 1934669 A4 EP1934669 A4 EP 1934669A4
Authority
EP
European Patent Office
Prior art keywords
transfer
motion stage
docking plate
template
transfer body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06786500A
Other languages
German (de)
French (fr)
Other versions
EP1934669A2 (en
Inventor
Philip D Schumaker
Angelo Fancello
Jae H Kim
Byung-Jin Choi
Daniel A Babbs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/211,763 external-priority patent/US20070064384A1/en
Priority claimed from US11/211,785 external-priority patent/US20070074635A1/en
Priority claimed from US11/211,766 external-priority patent/US7665981B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of EP1934669A2 publication Critical patent/EP1934669A2/en
Publication of EP1934669A4 publication Critical patent/EP1934669A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP06786500A 2005-08-25 2006-07-06 System to transfer a template transfer body between a motion stage and a docking plate Withdrawn EP1934669A4 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/211,763 US20070064384A1 (en) 2005-08-25 2005-08-25 Method to transfer a template transfer body between a motion stage and a docking plate
US11/211,785 US20070074635A1 (en) 2005-08-25 2005-08-25 System to couple a body and a docking plate
US11/211,766 US7665981B2 (en) 2005-08-25 2005-08-25 System to transfer a template transfer body between a motion stage and a docking plate
PCT/US2006/026366 WO2007024345A2 (en) 2005-08-25 2006-07-06 System to transfer a template transfer body between a motion stage and a docking plate

Publications (2)

Publication Number Publication Date
EP1934669A2 EP1934669A2 (en) 2008-06-25
EP1934669A4 true EP1934669A4 (en) 2009-12-16

Family

ID=37772079

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06786500A Withdrawn EP1934669A4 (en) 2005-08-25 2006-07-06 System to transfer a template transfer body between a motion stage and a docking plate

Country Status (3)

Country Link
EP (1) EP1934669A4 (en)
TW (1) TWI309198B (en)
WO (1) WO2007024345A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104523285B (en) * 2014-12-12 2016-09-21 广东东邦科技有限公司 A kind of electronic skin and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004103666A2 (en) * 2003-05-14 2004-12-02 Molecular Imprints, Inc. Method, system, holder and assembly for transferring templates during imprint lithography processes
US6842221B1 (en) * 1999-03-12 2005-01-11 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
EP1500980A1 (en) * 2003-07-22 2005-01-26 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5905566A (en) * 1997-04-10 1999-05-18 International Business Machines Corporation Laser ablation top surface reference chuck
EP1085382B1 (en) * 1999-09-17 2006-06-14 Fuji Photo Film Co., Ltd. Positioning method and positioning device
US6515736B1 (en) * 2000-05-04 2003-02-04 International Business Machines Corporation Reticle capturing and handling system
US6630988B2 (en) * 2001-06-28 2003-10-07 Intel Corporation Reticle stop block apparatus and method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6842221B1 (en) * 1999-03-12 2005-01-11 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
WO2004103666A2 (en) * 2003-05-14 2004-12-02 Molecular Imprints, Inc. Method, system, holder and assembly for transferring templates during imprint lithography processes
EP1500980A1 (en) * 2003-07-22 2005-01-26 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
TWI309198B (en) 2009-05-01
EP1934669A2 (en) 2008-06-25
TW200714439A (en) 2007-04-16
WO2007024345A3 (en) 2009-04-30
WO2007024345A2 (en) 2007-03-01

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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A4 Supplementary search report drawn up and despatched

Effective date: 20091118

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