TW200714391A - Method of making sputtering target and target - Google Patents

Method of making sputtering target and target

Info

Publication number
TW200714391A
TW200714391A TW095132730A TW95132730A TW200714391A TW 200714391 A TW200714391 A TW 200714391A TW 095132730 A TW095132730 A TW 095132730A TW 95132730 A TW95132730 A TW 95132730A TW 200714391 A TW200714391 A TW 200714391A
Authority
TW
Taiwan
Prior art keywords
target
sputtering target
produce
sputtering
microstructure
Prior art date
Application number
TW095132730A
Other languages
English (en)
Inventor
Michael G Launsbach
Tyrus W Hansen
Original Assignee
Howmet Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Howmet Corp filed Critical Howmet Corp
Publication of TW200714391A publication Critical patent/TW200714391A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D27/00—Treating the metal in the mould while it is molten or ductile ; Pressure or vacuum casting
    • B22D27/04—Influencing the temperature of the metal, e.g. by heating or cooling the mould
    • B22D27/045—Directionally solidified castings
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
TW095132730A 2005-09-07 2006-09-05 Method of making sputtering target and target TW200714391A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71467005P 2005-09-07 2005-09-07

Publications (1)

Publication Number Publication Date
TW200714391A true TW200714391A (en) 2007-04-16

Family

ID=37836360

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132730A TW200714391A (en) 2005-09-07 2006-09-05 Method of making sputtering target and target

Country Status (3)

Country Link
US (1) US20070051623A1 (zh)
TW (1) TW200714391A (zh)
WO (1) WO2007030406A2 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070062804A1 (en) * 2005-09-20 2007-03-22 Cp Technologies, Inc. Device and method of manufacturing sputtering targets
US20070062803A1 (en) * 2005-09-20 2007-03-22 Cp Technologies, Inc. Device and method of manufacturing sputtering targets
US20070074970A1 (en) * 2005-09-20 2007-04-05 Cp Technologies, Inc. Device and method of manufacturing sputtering targets
US20070169853A1 (en) * 2006-01-23 2007-07-26 Heraeus, Inc. Magnetic sputter targets manufactured using directional solidification
US20080105542A1 (en) * 2006-11-08 2008-05-08 Purdy Clifford C System and method of manufacturing sputtering targets
WO2008134516A2 (en) * 2007-04-27 2008-11-06 Honeywell International Inc. Novel manufacturing design and processing methods and apparatus for sputtering targets
DE102010021856A1 (de) * 2010-05-28 2011-12-01 Eto Magnetic Gmbh Verfahren zur Herstellung eines Einkristall-MSM-Körpers
US8551193B2 (en) 2011-07-21 2013-10-08 Taiwan Semiconductor Manufacturing Company, Ltd. Nickel alloy target including a secondary metal
CN103502505B (zh) * 2011-08-29 2015-09-30 吉坤日矿日石金属株式会社 Cu-Ga合金溅射靶及其制造方法
CN117127119B (zh) * 2023-10-24 2024-01-23 成都先进金属材料产业技术研究院股份有限公司 一种模具钢坯及其连铸方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3630809A (en) * 1965-01-04 1971-12-28 Monsanto Co Pellucid laminates
US3700023A (en) * 1970-08-12 1972-10-24 United Aircraft Corp Casting of directionally solidified articles
US4190094A (en) * 1978-10-25 1980-02-26 United Technologies Corporation Rate controlled directional solidification method
US5163498A (en) * 1989-11-07 1992-11-17 Lanxide Technology Company, Lp Method of forming metal matrix composite bodies having complex shapes by a self-generated vacuum process, and products produced therefrom
US5309976A (en) * 1993-03-16 1994-05-10 Howmet Corporation Continuous pour directional solidification method
JP3769761B2 (ja) * 1994-04-28 2006-04-26 住友化学株式会社 アルミニウム合金単結晶ターゲットおよびその製造方法
US5592984A (en) * 1995-02-23 1997-01-14 Howmet Corporation Investment casting with improved filling
JP2001505175A (ja) * 1996-06-05 2001-04-17 ゼネラル エレクトリック カンパニイ 方向性凝固鋳物を作るための方法と装置
US6148899A (en) * 1998-01-29 2000-11-21 Metal Matrix Cast Composites, Inc. Methods of high throughput pressure infiltration casting
US6875324B2 (en) * 1998-06-17 2005-04-05 Tanaka Kikinzoku Kogyo K.K. Sputtering target material
US6276432B1 (en) * 1999-06-10 2001-08-21 Howmet Research Corporation Directional solidification method and apparatus
US6190516B1 (en) * 1999-10-06 2001-02-20 Praxair S.T. Technology, Inc. High magnetic flux sputter targets with varied magnetic permeability in selected regions
US6878250B1 (en) * 1999-12-16 2005-04-12 Honeywell International Inc. Sputtering targets formed from cast materials
US6402912B1 (en) * 2000-11-09 2002-06-11 Honeywell International Inc. Sputtering target assembly
DE10063383C1 (de) * 2000-12-19 2002-03-14 Heraeus Gmbh W C Verfahren zur Herstellung eines Rohrtargets und Verwendung
US8241560B2 (en) * 2003-04-28 2012-08-14 Howmet Corporation Nickel base superalloy and single crystal castings
US20050155677A1 (en) * 2004-01-08 2005-07-21 Wickersham Charles E.Jr. Tantalum and other metals with (110) orientation
US20050183797A1 (en) * 2004-02-23 2005-08-25 Ranjan Ray Fine grained sputtering targets of cobalt and nickel base alloys made via casting in metal molds followed by hot forging and annealing and methods of making same

Also Published As

Publication number Publication date
US20070051623A1 (en) 2007-03-08
WO2007030406A3 (en) 2007-12-06
WO2007030406A2 (en) 2007-03-15

Similar Documents

Publication Publication Date Title
TW200714391A (en) Method of making sputtering target and target
WO2008127402A3 (en) Biopolymer sensor and method of manufacturing the same
WO2009069716A1 (ja) 内歯車の製造方法および金属ガラス製の内歯車
ATE440804T1 (de) Vorrichtung und verfahren zum kristallisieren von nichteisenmetallen
WO2008134516A3 (en) Novel manufacturing design and processing methods and apparatus for sputtering targets
GB2460774B (en) Composite article with magnetocalorically active material and method for its production
DE602005013809D1 (de) Verfahren und gerät zur kontinuierlichen dekoration von strukturformen mittels sublimation
PT1965900E (pt) Dispositivo e método de cristalização com zonas controladas por temperatura
SG149742A1 (en) Ultra-high purity nipt alloys and sputtering targets comprising same
EP1844881A3 (de) Verfahren zur Herstellung von offenporigen Bauteilen aus Metall, Kunststoff oder Keramik mit geordneter Schaumgitterstruktur
EP1577496A3 (en) Casting method for turbine blade
WO2007095034A3 (en) Method of inducing nucleation of a material
WO2006065441A3 (en) Manufacturing method for pixilated crystal
WO2006052995A3 (en) Method for producing crystals and screening crystallization conditions
TWI369406B (en) Co-fe-zr based alloy sputtering target material and process for production thereof
GB0524473D0 (en) A method and mould for casting articles with a pre-determined crystalline orientation
WO2012024464A3 (en) Method of making molds with production ready surfaces
TR201901101T4 (tr) Erimiş cüruf kullanarak metalik olmayan inorganik malzemeden düzlemsel bir ürünün imal edilmesine yönelik yöntem.
EP1752551A4 (en) HIGH MELANGE POINT-BASED ALLOY MATERIAL HAVING EXCELLENT RESISTANCE AND HIGH RECRYSTALLIZATION TEMPERATURE AND METHOD OF MANUFACTURING THE SAME
EP1837416A3 (en) Methods of forming metal matrix composites and metal matrix composites formed thereby
WO2011020912A3 (en) A method, apparatus, computer readable storage medium and computer program for forming an object
TW200722560A (en) Method of fabricating a poly-silicon thin film
WO2009025500A3 (en) Method for manufacturing glass or plastic or crystal product and glass or plastic or crystal product manufactured by said method
FR2903704B1 (fr) Procede de controle instantane de la precipitation de nickel et de cobalt presents dans la liqueur de lixiviation par ajustement du ph de la solution.
WO2006133930A8 (de) Verfahren zur herstellung eines aus einem thermoelektrischen trägermaterial mit thermischen streuzentren bestehenden thermoelektrischen werkstoffes und thermoelektrischer werkstoff