TW200713432A - Salicide process - Google Patents

Salicide process

Info

Publication number
TW200713432A
TW200713432A TW094131672A TW94131672A TW200713432A TW 200713432 A TW200713432 A TW 200713432A TW 094131672 A TW094131672 A TW 094131672A TW 94131672 A TW94131672 A TW 94131672A TW 200713432 A TW200713432 A TW 200713432A
Authority
TW
Taiwan
Prior art keywords
substrate
metal layer
salicide process
silicon layer
salicide
Prior art date
Application number
TW094131672A
Other languages
Chinese (zh)
Other versions
TWI297178B (en
Inventor
Yu-Lan Chang
Chao-Ching Hsieh
Yi-Yiing Chiang
Yi-Wei Chen
Tzung-Yu Hung
Jia Rung Li
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW94131672A priority Critical patent/TWI297178B/en
Publication of TW200713432A publication Critical patent/TW200713432A/en
Application granted granted Critical
Publication of TWI297178B publication Critical patent/TWI297178B/en

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  • Electrodes Of Semiconductors (AREA)

Abstract

A salicide process includes providing a substrate, in which the surface of the substrate contains at least a silicon layer; performing a degas process on the substrate; performing a cooling process on the substrate; depositing a metal layer over the surface of the substrate, in which the surface of the metal layer and the surface of the silicon layer are in contact with each other; and removing the unreacted metal layer.
TW94131672A 2005-09-14 2005-09-14 Salicide process TWI297178B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94131672A TWI297178B (en) 2005-09-14 2005-09-14 Salicide process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94131672A TWI297178B (en) 2005-09-14 2005-09-14 Salicide process

Publications (2)

Publication Number Publication Date
TW200713432A true TW200713432A (en) 2007-04-01
TWI297178B TWI297178B (en) 2008-05-21

Family

ID=45069003

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94131672A TWI297178B (en) 2005-09-14 2005-09-14 Salicide process

Country Status (1)

Country Link
TW (1) TWI297178B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115044881A (en) * 2022-08-15 2022-09-13 合肥新晶集成电路有限公司 Deposition equipment, metal silicide layer and preparation method of semiconductor structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115044881A (en) * 2022-08-15 2022-09-13 合肥新晶集成电路有限公司 Deposition equipment, metal silicide layer and preparation method of semiconductor structure

Also Published As

Publication number Publication date
TWI297178B (en) 2008-05-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees