TW200710270A - Two-piece dome with separate RF coils for inductively coupled plasma reactors - Google Patents

Two-piece dome with separate RF coils for inductively coupled plasma reactors

Info

Publication number
TW200710270A
TW200710270A TW095128919A TW95128919A TW200710270A TW 200710270 A TW200710270 A TW 200710270A TW 095128919 A TW095128919 A TW 095128919A TW 95128919 A TW95128919 A TW 95128919A TW 200710270 A TW200710270 A TW 200710270A
Authority
TW
Taiwan
Prior art keywords
dome
gas
process chamber
coils
separate
Prior art date
Application number
TW095128919A
Other languages
English (en)
Inventor
Siqing Lu
Qiwei Liang
Canfeng Lai
Robert T Chen
Jason T Bloking
Irene Chou
Steven H Kim
Young S Lee
Ellie Y Yieh
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200710270A publication Critical patent/TW200710270A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
TW095128919A 2005-08-11 2006-08-07 Two-piece dome with separate RF coils for inductively coupled plasma reactors TW200710270A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/202,043 US7651587B2 (en) 2005-08-11 2005-08-11 Two-piece dome with separate RF coils for inductively coupled plasma reactors

Publications (1)

Publication Number Publication Date
TW200710270A true TW200710270A (en) 2007-03-16

Family

ID=37605836

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128919A TW200710270A (en) 2005-08-11 2006-08-07 Two-piece dome with separate RF coils for inductively coupled plasma reactors

Country Status (3)

Country Link
US (1) US7651587B2 (zh)
TW (1) TW200710270A (zh)
WO (1) WO2007021521A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111613508A (zh) * 2019-02-25 2020-09-01 北京北方华创微电子装备有限公司 进气装置及反应腔室

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US7109114B2 (en) * 2004-05-07 2006-09-19 Applied Materials, Inc. HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performance
CN102197714A (zh) * 2008-10-21 2011-09-21 应用材料股份有限公司 清洁腔室及工艺所用的等离子体源
TW201123291A (en) * 2009-09-25 2011-07-01 Applied Materials Inc Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor
US8920599B2 (en) * 2010-10-19 2014-12-30 Applied Materials, Inc. High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity
US20120152900A1 (en) * 2010-12-20 2012-06-21 Applied Materials, Inc. Methods and apparatus for gas delivery into plasma processing chambers
US9336996B2 (en) 2011-02-24 2016-05-10 Lam Research Corporation Plasma processing systems including side coils and methods related to the plasma processing systems
US9941100B2 (en) * 2011-12-16 2018-04-10 Taiwan Semiconductor Manufacturing Company, Ltd. Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzle
KR101383291B1 (ko) * 2012-06-20 2014-04-10 주식회사 유진테크 기판 처리 장치
WO2014092856A1 (en) * 2012-12-14 2014-06-19 The Penn State Research Foundation Ultra-high speed anisotropic reactive ion etching
CN104798446B (zh) * 2013-03-12 2017-09-08 应用材料公司 具有方位角与径向分布控制的多区域气体注入组件
KR20160021958A (ko) 2014-08-18 2016-02-29 삼성전자주식회사 플라즈마 처리 장치 및 기판 처리 방법
CN113130285B (zh) * 2019-12-31 2022-04-15 江苏鲁汶仪器有限公司 一种陶瓷进气接射频清洗装置
US20220307129A1 (en) * 2021-03-23 2022-09-29 Applied Materials, Inc. Cleaning assemblies for substrate processing chambers

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111613508A (zh) * 2019-02-25 2020-09-01 北京北方华创微电子装备有限公司 进气装置及反应腔室

Also Published As

Publication number Publication date
US20070037397A1 (en) 2007-02-15
US7651587B2 (en) 2010-01-26
WO2007021521A3 (en) 2007-05-03
WO2007021521A2 (en) 2007-02-22

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