TW200705095A - Coloring photosensitive resin composition - Google Patents
Coloring photosensitive resin compositionInfo
- Publication number
- TW200705095A TW200705095A TW095120918A TW95120918A TW200705095A TW 200705095 A TW200705095 A TW 200705095A TW 095120918 A TW095120918 A TW 095120918A TW 95120918 A TW95120918 A TW 95120918A TW 200705095 A TW200705095 A TW 200705095A
- Authority
- TW
- Taiwan
- Prior art keywords
- formula
- resin composition
- photosensitive resin
- coloring photosensitive
- iii
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
Abstract
This invention provides a coloring photosensitive resin composition contains: (A) colorant, (B) binder resin, (C) photopolymerizable compound, (D) photopolymerization initiator, (E) organic solvent, and (F) at least one compound represented by any one of formula (I) to formula (III), wherein the content of the at least one compound of any one of formula (I) to formula (III) is 0.0010 to 5.0 mass% by mass percentage with respect to solid part of the coloring photosensitive resin composition. [in formula (I) to formula (III), R1 to R5 each independently represents a hydrogen atom or a C1-C10 alkyl, R6 and R7 each independently represents a C1-C4 alkyl, m and n each independently represents an integral of 0 to 20, provided m and n are not 0 at the same time.]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005206626 | 2005-07-15 | ||
JP2005240829 | 2005-08-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200705095A true TW200705095A (en) | 2007-02-01 |
Family
ID=38011209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095120918A TW200705095A (en) | 2005-07-15 | 2006-06-13 | Coloring photosensitive resin composition |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20070009419A (en) |
TW (1) | TW200705095A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100849360B1 (en) * | 2007-02-13 | 2008-07-29 | 동우 화인켐 주식회사 | A colored photosensitive resin composition, patterning method thereof, color filter, liquid crystal display device and imaging device having the same |
KR101373895B1 (en) * | 2007-04-13 | 2014-03-12 | 동우 화인켐 주식회사 | A colored photosensitive resin composition, color filter, liquid display device and imaging device having the same |
JP5439860B2 (en) * | 2008-03-06 | 2014-03-12 | 住友化学株式会社 | Colored photosensitive resin composition |
-
2006
- 2006-06-13 TW TW095120918A patent/TW200705095A/en unknown
- 2006-07-12 KR KR1020060065199A patent/KR20070009419A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR20070009419A (en) | 2007-01-18 |
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