TW200702254A - Reticle pod with isolation system - Google Patents
Reticle pod with isolation systemInfo
- Publication number
- TW200702254A TW200702254A TW095106555A TW95106555A TW200702254A TW 200702254 A TW200702254 A TW 200702254A TW 095106555 A TW095106555 A TW 095106555A TW 95106555 A TW95106555 A TW 95106555A TW 200702254 A TW200702254 A TW 200702254A
- Authority
- TW
- Taiwan
- Prior art keywords
- container
- reticle
- isolation system
- reticle pod
- primary
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65761605P | 2005-02-27 | 2005-02-27 | |
US65735505P | 2005-02-27 | 2005-02-27 | |
US77483406P | 2006-02-18 | 2006-02-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200702254A true TW200702254A (en) | 2007-01-16 |
TWI370093B TWI370093B (en) | 2012-08-11 |
Family
ID=55856094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095106555A TWI370093B (en) | 2005-02-27 | 2006-02-27 | Reticle pod with isolation system |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI370093B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI384322B (en) * | 2008-08-07 | 2013-02-01 | Gudeng Prec Industral Co Ltd | Carrier of reticle pod and the buffer position device therein |
TWI666510B (en) * | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Euv reticle pod |
TWI687760B (en) * | 2019-04-16 | 2020-03-11 | 家登精密工業股份有限公司 | Mask box with spoiler structure |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI634383B (en) | 2017-01-26 | 2018-09-01 | 家登精密工業股份有限公司 | Reticle pod |
-
2006
- 2006-02-27 TW TW095106555A patent/TWI370093B/en active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI384322B (en) * | 2008-08-07 | 2013-02-01 | Gudeng Prec Industral Co Ltd | Carrier of reticle pod and the buffer position device therein |
TWI666510B (en) * | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Euv reticle pod |
TWI687760B (en) * | 2019-04-16 | 2020-03-11 | 家登精密工業股份有限公司 | Mask box with spoiler structure |
Also Published As
Publication number | Publication date |
---|---|
TWI370093B (en) | 2012-08-11 |
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