TW200701343A - Deposition technique for producing high quality compound semiconductor materials - Google Patents

Deposition technique for producing high quality compound semiconductor materials

Info

Publication number
TW200701343A
TW200701343A TW094122483A TW94122483A TW200701343A TW 200701343 A TW200701343 A TW 200701343A TW 094122483 A TW094122483 A TW 094122483A TW 94122483 A TW94122483 A TW 94122483A TW 200701343 A TW200701343 A TW 200701343A
Authority
TW
Taiwan
Prior art keywords
substrate
gas
high quality
extended diffusion
diffusion layer
Prior art date
Application number
TW094122483A
Other languages
English (en)
Inventor
Wan-Nan Wang
Han-Ping Shieh
Original Assignee
Wan-Nan Wang
Han-Ping Shieh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wan-Nan Wang, Han-Ping Shieh filed Critical Wan-Nan Wang
Priority to TW094122483A priority Critical patent/TW200701343A/zh
Publication of TW200701343A publication Critical patent/TW200701343A/zh

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
TW094122483A 2005-06-30 2005-06-30 Deposition technique for producing high quality compound semiconductor materials TW200701343A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094122483A TW200701343A (en) 2005-06-30 2005-06-30 Deposition technique for producing high quality compound semiconductor materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094122483A TW200701343A (en) 2005-06-30 2005-06-30 Deposition technique for producing high quality compound semiconductor materials

Publications (1)

Publication Number Publication Date
TW200701343A true TW200701343A (en) 2007-01-01

Family

ID=57910384

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094122483A TW200701343A (en) 2005-06-30 2005-06-30 Deposition technique for producing high quality compound semiconductor materials

Country Status (1)

Country Link
TW (1) TW200701343A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452632B (zh) * 2008-02-29 2014-09-11 Univ Columbia 製造均勻一致結晶矽膜的微影方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452632B (zh) * 2008-02-29 2014-09-11 Univ Columbia 製造均勻一致結晶矽膜的微影方法

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