TW200644079A - Exposure apparatus, exposure method, and device production method - Google Patents

Exposure apparatus, exposure method, and device production method

Info

Publication number
TW200644079A
TW200644079A TW095111162A TW95111162A TW200644079A TW 200644079 A TW200644079 A TW 200644079A TW 095111162 A TW095111162 A TW 095111162A TW 95111162 A TW95111162 A TW 95111162A TW 200644079 A TW200644079 A TW 200644079A
Authority
TW
Taiwan
Prior art keywords
exposure
liquid
substrate
land surface
device production
Prior art date
Application number
TW095111162A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200644079A publication Critical patent/TW200644079A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095111162A 2005-03-31 2006-03-30 Exposure apparatus, exposure method, and device production method TW200644079A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005100691 2005-03-31

Publications (1)

Publication Number Publication Date
TW200644079A true TW200644079A (en) 2006-12-16

Family

ID=37073458

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095111162A TW200644079A (en) 2005-03-31 2006-03-30 Exposure apparatus, exposure method, and device production method

Country Status (6)

Country Link
US (1) US20090253083A1 (zh)
EP (1) EP1873815A4 (zh)
KR (1) KR20080004540A (zh)
CN (1) CN100552881C (zh)
TW (1) TW200644079A (zh)
WO (1) WO2006106907A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8891059B2 (en) 2007-01-23 2014-11-18 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
TWI700557B (zh) * 2012-07-20 2020-08-01 日商尼康股份有限公司 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007201252A (ja) * 2006-01-27 2007-08-09 Canon Inc 露光装置及びデバイス製造方法
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
NL1035757A1 (nl) * 2007-08-02 2009-02-03 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL1036715A1 (nl) * 2008-04-16 2009-10-19 Asml Netherlands Bv Lithographic apparatus.
US8953143B2 (en) 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium

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US4346164A (en) * 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
SG88824A1 (en) * 1996-11-28 2002-05-21 Nikon Corp Projection exposure method
EP0890136B9 (en) * 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
CN101424881B (zh) * 2002-11-12 2011-11-30 Asml荷兰有限公司 光刻投射装置
JP4362867B2 (ja) * 2002-12-10 2009-11-11 株式会社ニコン 露光装置及びデバイス製造方法
KR101036114B1 (ko) * 2002-12-10 2011-05-23 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
JP4595320B2 (ja) * 2002-12-10 2010-12-08 株式会社ニコン 露光装置、及びデバイス製造方法
EP2945016B1 (en) * 2003-02-26 2017-09-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP2004320016A (ja) * 2003-04-11 2004-11-11 Nikon Corp 液浸リソグラフィシステム
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2261741A3 (en) * 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
JP4378136B2 (ja) * 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
WO2005029559A1 (ja) * 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
US7369217B2 (en) * 2003-10-03 2008-05-06 Micronic Laser Systems Ab Method and device for immersion lithography
JP4295712B2 (ja) * 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置製造方法
KR20180117228A (ko) * 2004-01-05 2018-10-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
CN102736446B (zh) * 2004-06-10 2014-09-17 尼康股份有限公司 曝光装置及元件制造方法
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) * 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006080516A1 (ja) * 2005-01-31 2006-08-03 Nikon Corporation 露光装置及びデバイス製造方法
US7411654B2 (en) * 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8891059B2 (en) 2007-01-23 2014-11-18 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
TWI468872B (zh) * 2007-01-23 2015-01-11 尼康股份有限公司 A liquid recovery system, a liquid immersion exposure apparatus, a liquid immersion exposure method, and a device manufacturing method
TWI700557B (zh) * 2012-07-20 2020-08-01 日商尼康股份有限公司 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體

Also Published As

Publication number Publication date
KR20080004540A (ko) 2008-01-09
CN101171668A (zh) 2008-04-30
WO2006106907A1 (ja) 2006-10-12
EP1873815A4 (en) 2010-11-24
CN100552881C (zh) 2009-10-21
EP1873815A1 (en) 2008-01-02
US20090253083A1 (en) 2009-10-08

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