TW200644079A - Exposure apparatus, exposure method, and device production method - Google Patents
Exposure apparatus, exposure method, and device production methodInfo
- Publication number
- TW200644079A TW200644079A TW095111162A TW95111162A TW200644079A TW 200644079 A TW200644079 A TW 200644079A TW 095111162 A TW095111162 A TW 095111162A TW 95111162 A TW95111162 A TW 95111162A TW 200644079 A TW200644079 A TW 200644079A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- liquid
- substrate
- land surface
- device production
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005100691 | 2005-03-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200644079A true TW200644079A (en) | 2006-12-16 |
Family
ID=37073458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095111162A TW200644079A (en) | 2005-03-31 | 2006-03-30 | Exposure apparatus, exposure method, and device production method |
Country Status (6)
Country | Link |
---|---|
US (1) | US20090253083A1 (zh) |
EP (1) | EP1873815A4 (zh) |
KR (1) | KR20080004540A (zh) |
CN (1) | CN100552881C (zh) |
TW (1) | TW200644079A (zh) |
WO (1) | WO2006106907A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8891059B2 (en) | 2007-01-23 | 2014-11-18 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
TWI700557B (zh) * | 2012-07-20 | 2020-08-01 | 日商尼康股份有限公司 | 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007201252A (ja) * | 2006-01-27 | 2007-08-09 | Canon Inc | 露光装置及びデバイス製造方法 |
US8300207B2 (en) | 2007-05-17 | 2012-10-30 | Nikon Corporation | Exposure apparatus, immersion system, exposing method, and device fabricating method |
NL1035757A1 (nl) * | 2007-08-02 | 2009-02-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL1036715A1 (nl) * | 2008-04-16 | 2009-10-19 | Asml Netherlands Bv | Lithographic apparatus. |
US8953143B2 (en) | 2009-04-24 | 2015-02-10 | Nikon Corporation | Liquid immersion member |
US9323160B2 (en) * | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
JPH08316124A (ja) * | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
CN1144263C (zh) * | 1996-11-28 | 2004-03-31 | 株式会社尼康 | 曝光装置以及曝光方法 |
DE69735016T2 (de) * | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
US6897963B1 (en) * | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
US6208407B1 (en) * | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
TW529172B (en) * | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
CN101424881B (zh) * | 2002-11-12 | 2011-11-30 | Asml荷兰有限公司 | 光刻投射装置 |
JP4595320B2 (ja) * | 2002-12-10 | 2010-12-08 | 株式会社ニコン | 露光装置、及びデバイス製造方法 |
KR101101737B1 (ko) * | 2002-12-10 | 2012-01-05 | 가부시키가이샤 니콘 | 노광장치 및 노광방법, 디바이스 제조방법 |
CN100446179C (zh) * | 2002-12-10 | 2008-12-24 | 株式会社尼康 | 曝光设备和器件制造法 |
US7242455B2 (en) * | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
KR101643112B1 (ko) * | 2003-02-26 | 2016-07-26 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
JP2004320016A (ja) * | 2003-04-11 | 2004-11-11 | Nikon Corp | 液浸リソグラフィシステム |
TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7684008B2 (en) * | 2003-06-11 | 2010-03-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7317504B2 (en) * | 2004-04-08 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US6867844B2 (en) * | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
JP3862678B2 (ja) * | 2003-06-27 | 2006-12-27 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP4378136B2 (ja) * | 2003-09-04 | 2009-12-02 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
WO2005029559A1 (ja) * | 2003-09-19 | 2005-03-31 | Nikon Corporation | 露光装置及びデバイス製造方法 |
US7369217B2 (en) * | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
JP4295712B2 (ja) * | 2003-11-14 | 2009-07-15 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及び装置製造方法 |
KR101748504B1 (ko) * | 2004-01-05 | 2017-06-16 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
US8482716B2 (en) * | 2004-06-10 | 2013-07-09 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7251013B2 (en) * | 2004-11-12 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP3079164A1 (en) * | 2005-01-31 | 2016-10-12 | Nikon Corporation | Exposure apparatus and method for producing device |
US7411654B2 (en) * | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-03-30 TW TW095111162A patent/TW200644079A/zh unknown
- 2006-03-31 KR KR1020077024995A patent/KR20080004540A/ko active IP Right Grant
- 2006-03-31 EP EP06730757A patent/EP1873815A4/en not_active Withdrawn
- 2006-03-31 US US11/887,565 patent/US20090253083A1/en not_active Abandoned
- 2006-03-31 WO PCT/JP2006/306809 patent/WO2006106907A1/ja active Application Filing
- 2006-03-31 CN CNB2006800158822A patent/CN100552881C/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8891059B2 (en) | 2007-01-23 | 2014-11-18 | Nikon Corporation | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method |
TWI468872B (zh) * | 2007-01-23 | 2015-01-11 | 尼康股份有限公司 | A liquid recovery system, a liquid immersion exposure apparatus, a liquid immersion exposure method, and a device manufacturing method |
TWI700557B (zh) * | 2012-07-20 | 2020-08-01 | 日商尼康股份有限公司 | 液浸構件、曝光裝置、曝光方法、元件製造方法、程式、及記錄媒體 |
Also Published As
Publication number | Publication date |
---|---|
KR20080004540A (ko) | 2008-01-09 |
EP1873815A1 (en) | 2008-01-02 |
EP1873815A4 (en) | 2010-11-24 |
CN100552881C (zh) | 2009-10-21 |
CN101171668A (zh) | 2008-04-30 |
WO2006106907A1 (ja) | 2006-10-12 |
US20090253083A1 (en) | 2009-10-08 |
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