TW200639584A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
TW200639584A
TW200639584A TW095104924A TW95104924A TW200639584A TW 200639584 A TW200639584 A TW 200639584A TW 095104924 A TW095104924 A TW 095104924A TW 95104924 A TW95104924 A TW 95104924A TW 200639584 A TW200639584 A TW 200639584A
Authority
TW
Taiwan
Prior art keywords
formula
resin composition
photosensitive resin
group
represent
Prior art date
Application number
TW095104924A
Other languages
Chinese (zh)
Other versions
TWI378322B (en
Inventor
Kazuo Takebe
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200639584A publication Critical patent/TW200639584A/en
Application granted granted Critical
Publication of TWI378322B publication Critical patent/TWI378322B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

A photosensitive resin composition comprising (A) a binder resin, (B) a photo-polymerizable compound, (C) a photo-polymerization initiator, (D) a solvent and a compound of the formula (I): (in the formula (I), X, Y and Z represent each independently a single bond, a group of the formula (I-1) or a group of the formula (I-2), R1 to R3 represent each independently a hydrogen atom, halogen atom, alkyl group having 1 to 6 carbon atoms or alkoxyl group having 1 to 6 carbon atoms, R1, R2 and R3 on the same benzene ring may be the same or different, and R4 to R6 represent each independently a hydrogen atom or alkyl group having 1 to 4 carbon atoms).
TW095104924A 2005-02-17 2006-02-14 Photosensitive resin composition TWI378322B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005040279 2005-02-17

Publications (2)

Publication Number Publication Date
TW200639584A true TW200639584A (en) 2006-11-16
TWI378322B TWI378322B (en) 2012-12-01

Family

ID=36923308

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095104924A TWI378322B (en) 2005-02-17 2006-02-14 Photosensitive resin composition

Country Status (3)

Country Link
KR (1) KR20060092092A (en)
CN (1) CN1821873B (en)
TW (1) TWI378322B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100973644B1 (en) * 2007-07-18 2010-08-02 동우 화인켐 주식회사 A colored photosensitive resin composition, color filter and liquid crystal display device having the same
KR101999803B1 (en) * 2012-11-02 2019-07-12 롬엔드하스전자재료코리아유한회사 Photosensitive resin composition and spacer prepared therefrom
KR101611836B1 (en) * 2015-01-13 2016-04-12 동우 화인켐 주식회사 Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the pattern
JP7047559B2 (en) * 2018-04-12 2022-04-05 Jnc株式会社 Thermosetting composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1522387A (en) * 2001-05-30 2004-08-18 钟渊化学工业株式会社 Photosensitive resin composition and photosensitive dry film resist and photosensitive cover ray film using the same

Also Published As

Publication number Publication date
TWI378322B (en) 2012-12-01
CN1821873A (en) 2006-08-23
CN1821873B (en) 2011-09-14
KR20060092092A (en) 2006-08-22

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