TW200639577A - Imprint lithography template and method to facilitate control of liquid movement - Google Patents

Imprint lithography template and method to facilitate control of liquid movement

Info

Publication number
TW200639577A
TW200639577A TW095103740A TW95103740A TW200639577A TW 200639577 A TW200639577 A TW 200639577A TW 095103740 A TW095103740 A TW 095103740A TW 95103740 A TW95103740 A TW 95103740A TW 200639577 A TW200639577 A TW 200639577A
Authority
TW
Taiwan
Prior art keywords
template
substrate
liquid
forces
imprint lithography
Prior art date
Application number
TW095103740A
Other languages
English (en)
Inventor
Ian M Mcmackin
Edward B Fletcher
Pankaj B Lad
Michael N Miller
Van N Truskett
Nicholas A Stacey
Wesley Martin
Frank Y Xu
Christopher J Mackay
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/051,533 external-priority patent/US20060177532A1/en
Priority claimed from US11/051,941 external-priority patent/US20060177535A1/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of TW200639577A publication Critical patent/TW200639577A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
TW095103740A 2005-02-04 2006-02-03 Imprint lithography template and method to facilitate control of liquid movement TW200639577A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/051,533 US20060177532A1 (en) 2005-02-04 2005-02-04 Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US11/051,941 US20060177535A1 (en) 2005-02-04 2005-02-04 Imprint lithography template to facilitate control of liquid movement

Publications (1)

Publication Number Publication Date
TW200639577A true TW200639577A (en) 2006-11-16

Family

ID=36777962

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095103740A TW200639577A (en) 2005-02-04 2006-02-03 Imprint lithography template and method to facilitate control of liquid movement

Country Status (2)

Country Link
TW (1) TW200639577A (zh)
WO (1) WO2006084118A2 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI647738B (zh) * 2013-12-10 2019-01-11 佳能奈米科技股份有限公司 用於零間隙壓印之壓印微影模板及方法
CN111240151A (zh) * 2020-02-27 2020-06-05 京东方科技集团股份有限公司 模板转印方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10991582B2 (en) 2016-12-21 2021-04-27 Canon Kabushiki Kaisha Template for imprint lithography including a recession, an apparatus of using the template, and a method of fabricating an article

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3577593A (en) * 1968-10-29 1971-05-04 Bird & Son Apparatus for heat and vacuum-pressure machine molding
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI647738B (zh) * 2013-12-10 2019-01-11 佳能奈米科技股份有限公司 用於零間隙壓印之壓印微影模板及方法
CN111240151A (zh) * 2020-02-27 2020-06-05 京东方科技集团股份有限公司 模板转印方法
CN111240151B (zh) * 2020-02-27 2024-04-09 京东方科技集团股份有限公司 模板转印方法

Also Published As

Publication number Publication date
WO2006084118A3 (en) 2008-01-31
WO2006084118A2 (en) 2006-08-10

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