TW200635057A - Back junction solar cell and process for producing the same - Google Patents
Back junction solar cell and process for producing the sameInfo
- Publication number
- TW200635057A TW200635057A TW094140452A TW94140452A TW200635057A TW 200635057 A TW200635057 A TW 200635057A TW 094140452 A TW094140452 A TW 094140452A TW 94140452 A TW94140452 A TW 94140452A TW 200635057 A TW200635057 A TW 200635057A
- Authority
- TW
- Taiwan
- Prior art keywords
- diffusion layer
- type diffusion
- producing
- same
- solar cell
- Prior art date
Links
- 238000009792 diffusion process Methods 0.000 abstract 10
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Abstract
A minute arrangement of p<SP>+</SP> type diffusion layer and n<SP>+</SP> type diffusion layer without contact with each other. On the backside 1a of semiconductor substrate 1, there are simultaneously formed p<SP>+</SP> type diffusion layer 2 and n<SP>+</SP> type diffusion layer 3 in close vicinity of each other. Recessed groove 1b is formed from the backside 1a of the semiconductor substrate 1 to a border portion where outer edges of the p<SP>+</SP> type diffusion layer 2 and n<SP>+</SP> type diffusion layer 3 are brought into contact with each other to thereby separate the outer edges of the p<SP>+</SP> type diffusion layer 2 and n<SP>+</SP> type diffusion layer 3 from each other. As a result, the p<SP>+</SP> type diffusion layer 2 and n<SP>+</SP> type diffusion layer 3 are arranged in close vicinity of each other with the recessed groove 1b interposed therebetween.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004376604A JP2008066316A (en) | 2004-12-27 | 2004-12-27 | Backside bonding solar cell, and its fabrication process |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200635057A true TW200635057A (en) | 2006-10-01 |
Family
ID=36677461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094140452A TW200635057A (en) | 2004-12-27 | 2005-11-17 | Back junction solar cell and process for producing the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008066316A (en) |
TW (1) | TW200635057A (en) |
WO (1) | WO2006075427A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5303828B2 (en) * | 2006-09-14 | 2013-10-02 | 大日本印刷株式会社 | Organic thin film solar cell |
JP5093821B2 (en) * | 2007-08-23 | 2012-12-12 | シャープ株式会社 | Back junction solar cell with wiring board, solar cell string and solar cell module |
EP2324509A2 (en) * | 2008-08-27 | 2011-05-25 | Applied Materials, Inc. | Back contact solar cells using printed dielectric barrier |
US7999175B2 (en) * | 2008-09-09 | 2011-08-16 | Palo Alto Research Center Incorporated | Interdigitated back contact silicon solar cells with laser ablated grooves |
US9150966B2 (en) | 2008-11-14 | 2015-10-06 | Palo Alto Research Center Incorporated | Solar cell metallization using inline electroless plating |
KR101149173B1 (en) | 2010-12-17 | 2012-05-25 | 현대중공업 주식회사 | Back contact solar cell and method for fabricating the same |
US8962424B2 (en) | 2011-03-03 | 2015-02-24 | Palo Alto Research Center Incorporated | N-type silicon solar cell with contact/protection structures |
US9812592B2 (en) * | 2012-12-21 | 2017-11-07 | Sunpower Corporation | Metal-foil-assisted fabrication of thin-silicon solar cell |
JP5708695B2 (en) * | 2013-04-12 | 2015-04-30 | トヨタ自動車株式会社 | Solar cells |
US9231129B2 (en) | 2014-03-28 | 2016-01-05 | Sunpower Corporation | Foil-based metallization of solar cells |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5641362A (en) * | 1995-11-22 | 1997-06-24 | Ebara Solar, Inc. | Structure and fabrication process for an aluminum alloy junction self-aligned back contact silicon solar cell |
JP2002057352A (en) * | 2000-06-02 | 2002-02-22 | Honda Motor Co Ltd | Solar battery and manufacturing method |
JP2003124483A (en) * | 2001-10-17 | 2003-04-25 | Toyota Motor Corp | Photovoltaic element |
JP2004071763A (en) * | 2002-08-05 | 2004-03-04 | Toyota Motor Corp | Photovoltaic element |
-
2004
- 2004-12-27 JP JP2004376604A patent/JP2008066316A/en active Pending
-
2005
- 2005-10-21 WO PCT/JP2005/019384 patent/WO2006075427A1/en active Application Filing
- 2005-11-17 TW TW094140452A patent/TW200635057A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2008066316A (en) | 2008-03-21 |
WO2006075427A1 (en) | 2006-07-20 |
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